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JP6285156B2 - Recovery jig and board inspection device - Google Patents

Recovery jig and board inspection device Download PDF

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JP6285156B2
JP6285156B2 JP2013239360A JP2013239360A JP6285156B2 JP 6285156 B2 JP6285156 B2 JP 6285156B2 JP 2013239360 A JP2013239360 A JP 2013239360A JP 2013239360 A JP2013239360 A JP 2013239360A JP 6285156 B2 JP6285156 B2 JP 6285156B2
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良夫 桜井
良夫 桜井
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有限会社Nas技研
有限会社Nas技研
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Description

本発明は、基板を検査するための基板検査装置とそれに用いる回収治具とに係る。特に、基板を検査するために基板の縁部に液滴を付着させて縁部に沿って移動させるのに好適な基板検査装置とそれに用いる回収治具とに関する。   The present invention relates to a substrate inspection apparatus for inspecting a substrate and a recovery jig used therefor. In particular, the present invention relates to a substrate inspection apparatus suitable for causing a droplet to adhere to an edge of a substrate and moving it along the edge in order to inspect the substrate, and a recovery jig used therefor.

半導体や液晶の製造設備や検査設備において、基板検査装置が使用される。
基板検査装置は、基板を検査する装置である。例えば、基板は、半導体ウエハー、液晶基板等の基板である。半導体ウエハーは、シリコン、ガリウム、炭化ケイ素等のウエハーである。
基板検査装置は、基板を位置決めする必要がある。通常、基板のコンタミネーションを防止するために、簡易で確実な位置決め機構が要求される。
また、一部の基板検査装置が、半導体ウエハーの表面に形成された酸化膜や窒化膜等の薄膜の中の、ナトリウム、カリウム、鉄等の不純物の量を正確に測定するのに用いられる。この基板検査装置では、基板を正確に位置決めすることが、不純物の量を正確に測定するために重要である。
Substrate inspection devices are used in semiconductor and liquid crystal manufacturing facilities and inspection facilities.
The substrate inspection apparatus is an apparatus that inspects a substrate. For example, the substrate is a substrate such as a semiconductor wafer or a liquid crystal substrate. The semiconductor wafer is a wafer of silicon, gallium, silicon carbide or the like.
The substrate inspection apparatus needs to position the substrate. Usually, a simple and reliable positioning mechanism is required to prevent substrate contamination.
In addition, some substrate inspection apparatuses are used to accurately measure the amount of impurities such as sodium, potassium, and iron in thin films such as oxide films and nitride films formed on the surface of a semiconductor wafer. In this substrate inspection apparatus, it is important to accurately position the substrate in order to accurately measure the amount of impurities.

半導体ウエハーの表面の不純物を正確に測定する目的とその方法を簡単に説明する。
半導体ウエハーの表面に形成された酸化膜や窒化膜等の薄膜中に、不純物が含まれていいると、その不純物の量が微量であっても、半導体素子の電気的特性に大きな影響を与える。
従って、半導体素子の製造設備において、ウエハー表面から不純物の混入をできる限り抑制することが要請されている。
そのために、半導体ウエハーの表面に存在する不純物の量を正確に測定することが行われている。
The purpose and method for accurately measuring impurities on the surface of a semiconductor wafer will be briefly described.
If an impurity is contained in a thin film such as an oxide film or a nitride film formed on the surface of a semiconductor wafer, even if the amount of the impurity is very small, the electrical characteristics of the semiconductor element are greatly affected.
Accordingly, there is a demand for suppressing the contamination of impurities from the wafer surface as much as possible in a semiconductor device manufacturing facility.
For this purpose, the amount of impurities present on the surface of the semiconductor wafer is accurately measured.

最近、ウエハー表面に存在する不純物の量を測定するのに用いられていた二次イオン質量分析法やオージェ分光分析法や中性子放射化分析法に代わって、ふっ化物溶液を持ちいて、不純物の量を測定する。例えば、ふっ化物溶液はHF(ふっ化水素)水溶液である。
シリコンウエハーの表面の酸化膜をHF(ふっ化水素)水溶液で溶解した後で、そのHF(ふっ化水素)水溶液を捕集して、HF(ふっ化水素)水溶液中の不純物を分析することが行われる。捕集したHF(ふっ化水素)水溶液の量が少なくすると、不純物の濃度が高くなり、測定精度が向上するという特徴を有する。
例えば、HF(ふっ化水素)水溶液の蒸気に基板を曝し、基板の酸化層を溶解した後で、基板の表面にHF(ふっ化水素)水溶液の液滴を滴下し、その液滴を基板の表面に付着したまま移動する。液滴に酸化膜の中の不純物が捕集される。その液滴中の不純物の量を計測することにより、基板表面の不純物の量を検査する。
Instead of secondary ion mass spectrometry, Auger spectroscopy, or neutron activation analysis, which has recently been used to measure the amount of impurities present on the wafer surface, it has a fluoride solution, and the amount of impurities Measure. For example, the fluoride solution is an aqueous HF (hydrogen fluoride) solution.
After the oxide film on the surface of the silicon wafer is dissolved in an HF (hydrogen fluoride) aqueous solution, the HF (hydrogen fluoride) aqueous solution is collected and the impurities in the HF (hydrogen fluoride) aqueous solution are analyzed. Done. When the amount of the collected HF (hydrogen fluoride) aqueous solution is small, the impurity concentration increases, and the measurement accuracy is improved.
For example, after exposing the substrate to the vapor of HF (hydrogen fluoride) aqueous solution and dissolving the oxide layer of the substrate, a droplet of HF (hydrogen fluoride) aqueous solution is dropped on the surface of the substrate, and the droplet is applied to the substrate. Move while attached to the surface. Impurities in the oxide film are collected in the droplets. The amount of impurities on the substrate surface is inspected by measuring the amount of impurities in the droplet.

測定精度を向上させるために、基板の位置決めを精度良くおこない、また、特定の測定領域のみの不純物の量を測定できる基板検査装置が求められている。特に、液滴を基板の縁部に付着されたまま移動し、液滴に不純物を捕集するのに好適な基板検査装置と基板検査方法と回収治具が求められている。例えば、液滴が基板の表面に対し親水性であるとき、液滴に不純物を捕集するのに好適な基板検査装置と基板検査方法と回収治具が求められている。   In order to improve measurement accuracy, there is a need for a substrate inspection apparatus that can accurately position a substrate and measure the amount of impurities only in a specific measurement region. In particular, there is a need for a substrate inspection apparatus, a substrate inspection method, and a recovery jig that are suitable for moving a droplet while adhering to the edge of the substrate and collecting impurities in the droplet. For example, when the droplet is hydrophilic to the surface of the substrate, there is a need for a substrate inspection apparatus, a substrate inspection method, and a recovery jig suitable for collecting impurities in the droplet.

本発明は以上に述べた問題点に鑑み案出されたもので、測定精度をより向上させることのできる基板検査装置と回収治具、及び基板の縁部に液滴を付着させて縁部に沿って移動させるのに好適な基板検査装置と回収治具とを提供しようとする。   The present invention has been devised in view of the above-described problems. A substrate inspection apparatus and a recovery jig that can further improve the measurement accuracy, and a droplet attached to the edge of the substrate to the edge. An object of the present invention is to provide a substrate inspection apparatus and a recovery jig suitable for moving along a substrate.

上記目的を達成するため、本発明に係る基板を検査するために基板に液滴を付着させて保持する回収治具を、ガスを供給するガス供給手段と、基板の縁部に付着した液滴を保持する第一治具と、前記ガスを前記第一治具に保持される液滴が基板の縁部に付着する領域である付着領域の輪郭に沿って基板の面に吹き付ける様に案内する第二治具と、を備える、ものとした。   In order to achieve the above object, a recovery jig for attaching and holding droplets on the substrate for inspecting the substrate according to the present invention, gas supply means for supplying gas, and droplets attached to the edge of the substrate A first jig that holds the gas, and guides the gas to be sprayed onto the surface of the substrate along the outline of the adhesion region, which is an area where the droplets retained by the first jig adhere to the edge of the substrate. And a second jig.

上記本発明の構成により、ガス供給手段が、ガスを供給する。第一治具が、基板の縁部に付着した液滴を保持する。第二治具が、前記ガスを前記第一治具に保持される液滴が基板の縁部に付着する領域である付着領域の輪郭に沿って基板の面に吹き付ける様に案内する。
その結果、基板の縁部に付着した液滴を付着領域から漏らすことなく保持できる。
With the configuration of the present invention, the gas supply means supplies gas. The first jig holds the droplets attached to the edge of the substrate. The second jig guides the gas so as to be sprayed onto the surface of the substrate along the outline of the adhesion area, which is an area where the droplet held by the first jig adheres to the edge of the substrate.
As a result, the droplets adhering to the edge of the substrate can be held without leaking from the adhesion region.

以下に、本発明の実施形態に係る回収治具を説明する。本発明は、以下に記載した実施形態のいずれか、またはそれらの中の二つ以上が組み合わされた態様を含む。   Below, the collection jig | tool which concerns on embodiment of this invention is demonstrated. The present invention includes any of the embodiments described below, or a combination of two or more of them.

また、本発明の実施形態に係る回収治具は、前記第一治具が軸芯を基板の中心軸に沿う方向に向ける筒状部を持ち、前記筒状部が側面に基板の縁部に付着した液滴を保持する凹みを設けられ、前記第二治具が前記筒状部を側面の少なくとも前記凹みを設けられる箇所との間に隙間空間を設けて覆う壁部を持ち、該壁部は前記凹みに対面する箇所に該隙間空間と雰囲気の空間と連通する開口を設けられ、前記ガスが前記隙間空間へ供給される様になった。
上記本発明に係る実施形態の構成により、前記第一治具が軸芯を基板の中心軸に沿う方向に向ける筒状部を持ち、前記筒状部が側面に基板の縁部に付着した液滴を保持する凹みを設けられる。前記第二治具が前記筒状部を側面の少なくとも前記凹みを設けられる箇所との間に隙間空間を設けて覆う壁部を持ち、該壁部は前記凹みに対面する位置に該隙間空間と雰囲気の空間と連通する開口を設けられる。
前記ガスが前記隙間空間へ供給される様になった。
その結果、ガスが前記隙間空間に入り、凹みに保持される液滴の前記付着領域の輪郭に沿って開口から基板の表面に吹き付けられて、基板の縁部に付着した液滴を前記付着領域から漏らすことなく保持できる、
Further, in the recovery jig according to the embodiment of the present invention, the first jig has a cylindrical portion whose axis is directed in a direction along the central axis of the substrate, and the cylindrical portion is on a side surface on the edge of the substrate. There is provided a recess for holding the attached droplet, and the second jig has a wall portion that covers the cylindrical portion by providing a gap space between at least a portion of the side surface where the recess is provided. Is provided with an opening communicating with the gap space and the atmosphere space at a position facing the recess, and the gas is supplied to the gap space.
With the configuration of the embodiment according to the present invention, the first jig has a cylindrical portion that directs the axis in the direction along the central axis of the substrate, and the cylindrical portion adheres to the edge of the substrate on the side surface. A recess is provided to hold the drop. The second jig has a wall portion that covers the cylindrical portion by providing a clearance space between at least a portion of the side surface where the recess is provided, and the wall portion and the clearance space at a position facing the recess. An opening communicating with the atmosphere space is provided.
The gas is supplied to the gap space.
As a result, gas enters the gap space and is sprayed from the opening to the surface of the substrate along the contour of the adhesion region of the droplet held in the depression, and the droplet adhered to the edge of the substrate is the adhesion region. Can be held without leaking,

また、本発明の実施形態に係る回収治具は、前記開口が基板の厚みより僅かに大きい幅寸法をもち基板の中心軸に交差する方向に延びる溝である第二溝により形成される。
上記本発明に係る実施形態の構成により、
前記開口が基板の厚みより僅かに大きい幅寸法をもち基板の中心軸に交差する方向に延びる溝である第二溝により形成される。
その結果、前記開口に挿入される基板の縁部と第二溝で形成される開口との隙間寸法を安定して維持できる。
The recovery jig according to the embodiment of the present invention is formed by a second groove which is a groove having a width dimension slightly larger than the thickness of the substrate and extending in a direction intersecting the central axis of the substrate.
With the configuration of the embodiment according to the present invention,
The opening is formed by a second groove which is a groove having a width dimension slightly larger than the thickness of the substrate and extending in a direction intersecting the central axis of the substrate.
As a result, the gap dimension between the edge of the substrate inserted into the opening and the opening formed by the second groove can be stably maintained.

また、本発明の実施形態に係る回収治具は、使用時の姿勢において、前記第二溝が基板の表面に対面する面と基板の裏面に対面する面と基板の縁部に対面する一対の面とで形成される。
上記本発明に係る実施形態の構成により、
使用時の姿勢において、使用時の姿勢において、前記第二溝が基板の表面に対面する面と基板の裏面に対面する面と基板の縁部に対面する一対の面とで形成される。
その結果、前記開口に挿入される基板の縁部と第二溝で形成される開口との隙間寸法をより安定して維持できる。
In addition, the recovery jig according to the embodiment of the present invention is a pair of a pair of the second groove facing the surface of the substrate, the surface facing the back surface of the substrate, and the edge of the substrate. Formed with a surface.
With the configuration of the embodiment according to the present invention,
In the in-use posture, the second groove is formed by a surface facing the surface of the substrate, a surface facing the back surface of the substrate, and a pair of surfaces facing the edge of the substrate.
As a result, the gap size between the edge of the substrate inserted into the opening and the opening formed by the second groove can be maintained more stably.

また、本発明の実施形態に係る回収治具は、前記壁部が前記筒状部を前記側面と間に前記隙間空間を設けて覆う。
上記本発明に係る実施形態の構成により、前記壁部が前記筒状部を前記側面と間に前記隙間空間を設けて覆う。
その結果、ガスが側面の全周との間に設けた隙間空間に一端充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
Further, in the recovery jig according to the embodiment of the present invention, the wall portion covers the cylindrical portion by providing the gap space between the side surfaces.
With the configuration of the embodiment according to the present invention, the wall portion covers the cylindrical portion with the gap space between the side surfaces.
As a result, after the gas fills the gap space provided between the entire circumference of the side surface, it exits from the gap between the opening and the edge of the substrate, and the droplets adhering to the edge of the substrate are removed from the attached fishing area. Can be held without leaking.

また、本発明の実施形態に係る回収治具は、前記ガスが前記隙間空間へ前記筒状部の一方の端の側から供給される。
上記本発明に係る実施形態の構成により、前記ガスが前記隙間空間へ前記筒状部の一方の端の側から供給される。
その結果、ガスが前記隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
In the recovery jig according to the embodiment of the present invention, the gas is supplied to the gap space from one end side of the cylindrical portion.
With the configuration of the embodiment according to the present invention, the gas is supplied to the gap space from one end side of the cylindrical portion.
As a result, after the gas fills the gap space, it can be held out without leaking from the attached fishing area by coming out of the gap between the opening and the edge of the substrate and adhering to the edge of the substrate.

また、本発明の実施形態に係る回収治具は、前記筒状部が他方の端に端面をもち、
前記壁部が前記筒状部を前記側面と前記端面と間に前記隙間空間を設けて覆う。
上記本発明に係る実施形態の構成により、前記筒状部が他方の端に端面をもち、前記壁部が前記筒状部を前記側面と前記端面と間に前記隙間空間を設けて覆う。
その結果、側面の全周と端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
Further, in the recovery jig according to the embodiment of the present invention, the cylindrical portion has an end face at the other end,
The wall portion covers the tubular portion by providing the gap space between the side surface and the end surface.
With the configuration of the embodiment according to the present invention, the cylindrical portion has an end surface at the other end, and the wall portion covers the cylindrical portion with the gap space between the side surface and the end surface.
As a result, the gap space between the entire circumference of the side face, the end face, and the wall portion is filled, and then the liquid droplets attached to the edge portion of the substrate are leaked from the attached fishing region through the gap between the opening and the edge portion of the substrate. It can be held without.

また、本発明の実施形態に係る回収治具は、前記筒状部が他方の端に凸の形状をした端面をもち、前記壁部が前記筒状部を前記側面の全周と前記端面と間に前記隙間空間を設けて覆う。
上記本発明に係る実施形態の構成により、前記筒状部が他方の端に凸の形状をした端面をもつ。前記壁部が前記筒状部を前記側面の全周と前記端面と間に前記隙間空間を設けて覆う。
その結果、側面の全周と凸の形状をした端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
Further, in the recovery jig according to the embodiment of the present invention, the cylindrical portion has an end surface that has a convex shape at the other end, and the wall portion defines the cylindrical portion as a whole circumference of the side surface and the end surface. The gap space is provided between and covered.
According to the configuration of the embodiment according to the present invention, the cylindrical portion has an end face having a convex shape at the other end. The wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface and the end surface.
As a result, after filling the gap space between the wall with the entire circumference of the side surface and the convex shape, it comes out of the gap between the opening and the edge of the substrate and attaches the droplets attached to the edge of the substrate. Can be held without leaking from the fishing area.

また、本発明の実施形態に係る回収治具は、前記凹みが基板の中心軸に交差する方向に延びる溝である第一溝により形成され、前記開口を正面から見て前記第一溝が前記第二溝から覗ける様になった、
上記本発明に係る実施形態の構成により、前記凹みが基板の中心軸に交差する方向に延びる溝である第一溝により形成される、
前記開口を正面から見て前記第一溝が前記第二溝から覗ける様になった。
その結果、第二溝に倣って開口に挿入された基板の縁が第一溝に倣って凹みに対面し、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
Further, the recovery jig according to the embodiment of the present invention is formed by a first groove that is a groove extending in a direction in which the dent intersects the central axis of the substrate, and the first groove is the first groove when the opening is viewed from the front. I began to peek through the second groove,
With the configuration of the embodiment according to the present invention, the recess is formed by a first groove that is a groove extending in a direction intersecting the central axis of the substrate.
The first groove can be seen from the second groove when the opening is viewed from the front.
As a result, the edge of the substrate inserted into the opening following the second groove faces the dent following the first groove, and the droplets adhering to the edge of the substrate can be held without leaking from the attached fishing region.

また、本発明の実施形態に係る回収治具は、前記第一治具が液滴を貯留可能な内部空間をもち、前記凹みが該内部空間に連通する。
上記本発明に係る実施形態の構成により、前記第一治具が液体を貯留可能な内部空間をもつ。前記凹みが該内部空間に連通する。
その結果、内部空間に貯留される液体の一部が液滴として基板の縁部に付着できる。
In the recovery jig according to the embodiment of the present invention, the first jig has an internal space in which droplets can be stored, and the recess communicates with the internal space.
With the configuration of the embodiment according to the present invention, the first jig has an internal space in which liquid can be stored. The recess communicates with the internal space.
As a result, a part of the liquid stored in the internal space can adhere to the edge of the substrate as a droplet.

また、本発明の実施形態に係る回収治具は、前記壁部が前記筒状部を前記側面の全周と間に前記隙間空間を設けて覆う。
上記本発明に係る実施形態の構成により、前記壁部が前記筒状部を前記側面の全周と間に前記隙間空間を設けて覆う。
その結果、ガスが側面の全周との間に設けた隙間空間に一端充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
In the recovery jig according to the embodiment of the present invention, the wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface.
According to the configuration of the embodiment according to the present invention, the wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface.
As a result, after the gas fills the gap space provided between the entire circumference of the side surface, it exits from the gap between the opening and the edge of the substrate, and the droplets adhering to the edge of the substrate are removed from the attached fishing area. Can be held without leaking.

また、本発明の実施形態に係る回収治具は、前記筒状部が他方の端部に端面をもち、
前記壁部が前記筒状部を前記端面と間に前記隙間空間を設けて覆う。
上記本発明に係る実施形態の構成により、前記筒状部が他方の端部に端面をもつ。前記壁部が前記筒状部を前記端面と間に前記隙間空間を設けて覆う。
その結果、端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
Further, in the recovery jig according to the embodiment of the present invention, the cylindrical portion has an end face at the other end,
The wall portion covers the tubular portion by providing the gap space between the end surfaces.
With the configuration of the embodiment according to the present invention, the cylindrical portion has an end face at the other end. The wall portion covers the tubular portion by providing the gap space between the end surfaces.
As a result, after filling the gap space between the end face and the wall portion, the liquid droplets coming out from the gap between the opening and the edge portion of the substrate and attached to the edge portion of the substrate can be held without leaking from the attached fishing region.

上記目的を達成するため、本発明に係る基板を検査するための基板に液滴を付着して移動させる基板検査装置を、基板を保持して基板の中心軸の回りに回転させる基板回転機器と、上記のうちの一つに記載の回収治具と、前記回収治具を保持可能な回収治具保持機器と、を備えるものとした。   In order to achieve the above object, a substrate inspection apparatus for adhering and moving droplets to a substrate for inspecting the substrate according to the present invention, a substrate rotating device that holds the substrate and rotates it about the central axis of the substrate, and The recovery jig according to one of the above and a recovery jig holding device capable of holding the recovery jig.

上記本発明の構成により、基板回転機器が、基板を保持して基板の中心軸の回りに回転させる。回収治具保持機器が、上記のうちの一つに記載の回収治具を保持可能である。
その結果、液滴を基板の縁部に付着させて基板の周囲に沿って移動させることをできる。
With the configuration of the present invention, the substrate rotating device holds the substrate and rotates it around the central axis of the substrate. The collection jig holding device can hold the collection jig described in one of the above.
As a result, the droplets can adhere to the edge of the substrate and move along the periphery of the substrate.

以下に、本発明の実施形態に係る基板検査装置を説明する。本発明は、以下に記載した実施形態のいずれか、またはそれらの中の二つ以上が組み合わされた態様を含む。   Below, the board | substrate inspection apparatus which concerns on embodiment of this invention is demonstrated. The present invention includes any of the embodiments described below, or a combination of two or more of them.

また、本発明の実施形態に係る基板検査装置は、基板の縁部が前記開口に挿入されるときに、前記隙間空間の圧力に応じて基板と前記回収治具との相対距離を調整する。
上記本発明に係る実施形態の構成により、基板の縁部が前記開口に挿入されるときに、前記隙間空間の圧力に応じて基板と前記回収治具との相対距離を調整する。
その結果、前記隙間空間の圧力を基に基板の面と回収治具の開口と凹みとのギャップを調整できる。
The substrate inspection apparatus according to the embodiment of the present invention adjusts the relative distance between the substrate and the recovery jig according to the pressure in the gap space when the edge of the substrate is inserted into the opening.
With the configuration of the embodiment according to the present invention, when the edge portion of the substrate is inserted into the opening, the relative distance between the substrate and the recovery jig is adjusted according to the pressure in the gap space.
As a result, the gap between the surface of the substrate, the opening of the recovery jig and the recess can be adjusted based on the pressure in the gap space.

また、本発明の実施形態に係る基板検査装置は、基板の縁部が前記開口に挿入されるときに、前記基板の表面または裏面のどちらか一方の面の前記開口に近い箇所の圧力に応じて基板と前記回収治具との相対距離を調整する。
上記本発明に係る実施形態の構成により、基板の縁部が前記開口に挿入されるときに、前記基板の表面または裏面のどちらか一方の面の前記開口に近い箇所の圧力に応じて基板と前記回収治具との相対距離を調整する。
その結果、基板の面の前記開口に近い個所の圧力を基に基板の面と回収治具の開口と凹みとのギャップを調整できる。
In addition, the substrate inspection apparatus according to the embodiment of the present invention responds to pressure at a location close to the opening on either the front surface or the back surface of the substrate when the edge of the substrate is inserted into the opening. Adjusting the relative distance between the substrate and the recovery jig.
According to the configuration of the embodiment according to the present invention, when the edge of the substrate is inserted into the opening, the substrate and the substrate according to the pressure at the location near the opening on either the front surface or the back surface of the substrate. The relative distance from the collection jig is adjusted.
As a result, the gap between the surface of the substrate and the opening and the recess of the recovery jig can be adjusted based on the pressure at a location near the opening on the surface of the substrate.

以上説明したように、本発明に係る回収治具は、その構成により、以下の効果を有する。
第一治具が基板の縁部に付着した液滴を保持し、ガスを第一治具に保持される液滴が縁部に付着する付着領域の輪郭に沿って基板の面に吹き付ける様にしたので、基板の縁部に付着した液滴を付着領域から漏らすことなく保持できる。
また、基板の中心軸に沿う方向に向ける軸芯をもつ筒状部に基板の縁部に付着した液滴を保持する凹みを設け、第二治具の壁部が筒状部を側面の少なくとも前記凹みを設けられる箇所との間に隙間空間を設けて覆い、隙間空間と雰囲気を連通する開口を壁部の前記凹みに対面する位置に設け、前記隙間空間へガスを供給する様にしたので、ガスが前記隙間空間に入り、凹みDに保持される液滴の前記付着領域の輪郭に沿って基板の表面に吹き付けられて、基板1の縁部に付着した液滴を前記付着領域から漏らすことなく保持できる、
また、前記開口が基板の厚みより僅かに大きい幅寸法をもち基板の中心軸に交差する方向に延びる溝である第二溝により形成される様にしたので、前記開口に挿入される基板の縁部と第二溝で形成される開口Wとの隙間寸法を安定して維持できる。
また、使用時の姿勢において、前記第二溝が基板の表面に対面する面と基板の裏面に対面する面と基板の縁部に対面する一対の面とで形成される様にしたので、前記開口に挿入される基板の縁部と第二溝で形成される開口との隙間寸法をより安定して維持できる。
また、前記壁部が前記筒状部を前記側面と間に前記隙間空間を設けて覆う様にしたので、ガスが側面の全周との間に設けた隙間空間Sに一端充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着領域から漏らすことなく保持できる。
また、前記ガスが前記隙間空間へ前記筒状部の一方の端の側から供給される様にしたので、ガスが前記隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着領域から漏らすことなく保持できる。
また、前記壁部が前記筒状部を前記側面と前記端面と間に前記隙間空間を設けて覆う様にしたので、側面の全周と端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
また、前記壁部が前記筒状部を前記側面の全周と凸の形状をした前記端面と間に前記隙間空間を設けて覆う様にしたので、側面の全周と凸の形状をした端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
また、前記開口を正面から見て基板の中心軸に交差する方向に延びる前記第一溝が前記第二溝から覗ける様にしたので、第二溝に倣って開口に挿入された基板の縁が第一溝に倣って凹みに対面し、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
また、凹みが液体を貯留可能な内部空間に連通する様にしたので、内部空間に貯留される液体の一部が液滴として基板の縁部に付着できる。
また、前記壁部が前記筒状部を前記側面の全周と間に前記隙間空間を設けて覆う様にしたので、ガスが側面の全周との間に設けた隙間空間に一端充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
また、前記壁部が前記筒状部を前記端面と間に前記隙間空間を設けて覆う様にしたので、端面と壁部との隙間空間に充満してから開口と基板の縁部との隙間から出て、基板の縁部に付着した液滴を付着漁領域から漏らすことなく保持できる。
As described above, the recovery jig according to the present invention has the following effects due to its configuration.
The first jig holds the droplets attached to the edge of the substrate, and the gas is sprayed on the surface of the substrate along the outline of the adhesion region where the droplets held by the first jig adhere to the edge. As a result, the droplets adhering to the edge of the substrate can be held without leaking from the adhesion region.
In addition, the cylindrical portion having an axis oriented in the direction along the central axis of the substrate is provided with a recess for holding droplets adhering to the edge of the substrate, and the wall portion of the second jig has at least the cylindrical portion on the side surface. Since a gap space is provided and covered with the portion where the recess is provided, an opening that communicates the gap space and the atmosphere is provided at a position facing the recess of the wall portion, and gas is supplied to the gap space. The gas enters the gap space and is sprayed onto the surface of the substrate along the outline of the adhesion region of the droplet held in the recess D, and the droplet adhered to the edge of the substrate 1 is leaked from the adhesion region. Can be held without
In addition, since the opening is formed by the second groove which is a groove having a width dimension slightly larger than the thickness of the substrate and extending in a direction intersecting the central axis of the substrate, the edge of the substrate inserted into the opening The gap dimension between the opening and the opening W formed by the second groove can be stably maintained.
Further, in the posture during use, the second groove is formed by a surface facing the surface of the substrate, a surface facing the back surface of the substrate, and a pair of surfaces facing the edge of the substrate. The gap dimension between the edge of the substrate inserted into the opening and the opening formed by the second groove can be maintained more stably.
In addition, since the wall portion covers the cylindrical portion with the gap space provided between the side surfaces, the gas is opened after the gap space S provided between the side surfaces and the entire circumference of the side surface is fully filled. The liquid droplets coming out of the gap between the substrate and the edge of the substrate and adhering to the edge of the substrate can be held without leaking from the adhesion region.
Further, since the gas is supplied to the gap space from one end side of the cylindrical portion, the gas fills the gap space and then comes out of the gap between the opening and the edge of the substrate. In addition, the droplets attached to the edge of the substrate can be held without leaking from the attachment region.
In addition, since the wall portion covers the cylindrical portion by providing the gap space between the side surface and the end surface, the gap portion between the entire circumference of the side surface and the end surface and the wall portion is filled before opening. The liquid droplets coming out of the gap between the substrate and the edge of the substrate and adhering to the edge of the substrate can be held without leaking from the attached fishing area.
Further, since the wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface and the end surface having a convex shape, the end surface having a convex shape and the entire circumference of the side surface. After the space between the wall and the wall is filled, the liquid droplets coming out from the gap between the opening and the edge of the substrate and adhering to the edge of the substrate can be held without leaking from the attached fishing area.
Further, since the first groove extending in the direction intersecting the central axis of the substrate when viewed from the front is viewed from the second groove, the edge of the substrate inserted into the opening following the second groove is It follows the first groove to face the dent and can hold the droplets adhering to the edge of the substrate without leaking from the attached fishing area.
Further, since the recess communicates with the internal space where the liquid can be stored, a part of the liquid stored in the internal space can adhere to the edge of the substrate as a droplet.
In addition, since the wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface, the gas fills the gap space provided between the entire circumference of the side surface. The liquid droplets coming out from the gap between the opening and the edge of the substrate and adhering to the edge of the substrate can be held without leaking from the attached fishing area.
Further, since the wall portion covers the cylindrical portion with the gap space between the end surfaces, the gap space between the opening and the edge of the substrate is filled after filling the gap space between the end surface and the wall portion. It is possible to hold the liquid droplets coming out of the substrate and adhering to the edge of the substrate without leaking from the attached fishing area.

以上説明したように、本発明に係る基板検査装置は、その構成により、以下の効果を有する。
回収治具保持機器が上記にうちの一つに記載の回収治具を保持し、基板回転機器が基板を保持して基板の中心軸の回りに回転させる様にしたので、液滴を基板の縁部に付着させて基板の周囲に沿って移動させることをできる。
また、基板の縁部が前記開口に挿入されるときに、前記隙間空間の圧力に応じて基板と前記回収治具との相対距離を調整する様にしたので、前記隙間空間の圧力を基に基板の面と回収治具の開口と凹みとのギャップを調整できる。
また、基板の縁部が前記開口に挿入されるときに、前記基板の表面または裏面のどちらか一方の面の前記開口に近い箇所の圧力に応じて基板と前記回収治具との相対距離を調整する様にしたので、基板の面の前記開口に近い個所の圧力を基に基板の面と回収治具の開口と凹みとのギャップを調整できる。、
その結果、測定精度をより向上させることのできる基板検査装置と回収治具、及び基板の縁部に液滴を付着させて縁部に沿って移動させるのに好適な基板検査装置と回収治具とを提供できる。
As described above, the substrate inspection apparatus according to the present invention has the following effects due to its configuration.
The recovery jig holding device holds the recovery jig described in one of the above, and the substrate rotating device holds the substrate and rotates it around the central axis of the substrate. It can be attached to the edge and moved along the periphery of the substrate.
In addition, when the edge of the substrate is inserted into the opening, the relative distance between the substrate and the recovery jig is adjusted according to the pressure in the gap space. The gap between the surface of the substrate and the opening and recess of the recovery jig can be adjusted.
Further, when the edge of the substrate is inserted into the opening, the relative distance between the substrate and the recovery jig is set according to the pressure at a location near the opening on either the front surface or the back surface of the substrate. Since the adjustment is made, the gap between the surface of the substrate and the opening and recess of the recovery jig can be adjusted based on the pressure at a location near the opening of the surface of the substrate. ,
As a result, the substrate inspection apparatus and the recovery jig that can further improve the measurement accuracy, and the substrate inspection apparatus and the recovery jig suitable for attaching a droplet to the edge portion of the substrate and moving it along the edge portion. And can provide.

本発明の実施形態に係る基板検査装置の平面図である。It is a top view of the board | substrate inspection apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る基板検査装置の正面図である。It is a front view of the board | substrate inspection apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る基板検査装置の側面図である。It is a side view of the board | substrate inspection apparatus which concerns on embodiment of this invention. 本発明の第一の実施形態に係る回収治具の正面断面図である。It is a front sectional view of the recovery jig concerning a first embodiment of the present invention. 本発明の第一の実施形態に係る回収治具の側面断面図である。It is side surface sectional drawing of the collection jig | tool which concerns on 1st embodiment of this invention. 本発明の第一の実施形態に係る回収治具のA−A断面図である。It is an AA sectional view of a recovery jig concerning a first embodiment of the present invention. 本発明の第一の実施形態に係る回収治具の部分断面図である。It is a fragmentary sectional view of the recovery jig concerning a first embodiment of the present invention. 本発明の第二の実施形態に係る回収治具の部分断面図である。It is a fragmentary sectional view of the recovery jig concerning a second embodiment of the present invention. 本発明の第三の実施形態に係る回収治具の部分断面図である。It is a fragmentary sectional view of the recovery jig concerning a third embodiment of the present invention.

以下、本発明を実施するための最良の形態を、図面を参照して説明する。   The best mode for carrying out the present invention will be described below with reference to the drawings.

最初に、本発明の実施形態に係る基板検査装置を、図を基に、説明する
図1は、本発明の実施形態に係る基板検査装置の平面図である。図2は、本発明の実施形態に係る基板検査装置の正面図である。図3は、本発明の実施形態に係る基板検査装置の側面図である。
以下では、基板1の中心軸が垂直である場合を例に、説明する。
First, a substrate inspection apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a plan view of the substrate inspection apparatus according to the embodiment of the present invention. FIG. 2 is a front view of the substrate inspection apparatus according to the embodiment of the present invention. FIG. 3 is a side view of the substrate inspection apparatus according to the embodiment of the present invention.
Hereinafter, a case where the central axis of the substrate 1 is vertical will be described as an example.

本発明の実施形態にかかる基板検査装置2は、基板1を検査するための基板1に液滴4を付着して移動させる装置である。   A substrate inspection apparatus 2 according to an embodiment of the present invention is an apparatus that attaches and moves droplets 4 to a substrate 1 for inspecting the substrate 1.

以下では、基板1に存在する不純物の量を検査する場合を例に、基板検査装置2を説明する。
基板1がシリコンウェハーである場合に、基板1に存在する不純物の量を検査するには、第一の方法では、基板の表面を液体蒸気(例えば、HF(ふっ化水素)水溶液の蒸気)に晒して、液体により基板1の表面の酸化膜を溶かす。その後、基板検査装置を用いて、基板1を検査するために基板1に液滴4を付着して移動させる。第二の方法では、基板の表面に液体(例えば、HF(ふっ化水素)水溶液の蒸気)を滴下する。液体により基板1の表面の酸化膜を溶かす。その後、基板検査装置を用いて、基板1を検査するために基板1に液滴4を付着して移動させる。
基板検査装置2は、基板1の表面に液滴(例えば、HF(ふっ化水素)水溶液)を滴下し、液滴4を基板1の表面を所定の領域をなぞる様に移動させ、その液滴4を回収する。その液滴4に混ざった不純物の量を測定すると、基板1の表面の所定の領域に存在した不純物の量を特定できる。
Below, the board | substrate inspection apparatus 2 is demonstrated to an example when the quantity of the impurity which exists in the board | substrate 1 is test | inspected.
When the substrate 1 is a silicon wafer, the first method for inspecting the amount of impurities present in the substrate 1 is to convert the surface of the substrate into liquid vapor (for example, vapor of HF (hydrogen fluoride) aqueous solution). By exposing, the oxide film on the surface of the substrate 1 is dissolved by the liquid. Thereafter, using the substrate inspection apparatus, the droplet 4 is attached to the substrate 1 and moved in order to inspect the substrate 1. In the second method, a liquid (for example, vapor of HF (hydrogen fluoride) aqueous solution) is dropped onto the surface of the substrate. The oxide film on the surface of the substrate 1 is dissolved by the liquid. Thereafter, using the substrate inspection apparatus, the droplet 4 is attached to the substrate 1 and moved in order to inspect the substrate 1.
The substrate inspection apparatus 2 drops a droplet (for example, HF (hydrogen fluoride) aqueous solution) on the surface of the substrate 1 and moves the droplet 4 so as to trace the surface of the substrate 1 in a predetermined region. 4 is collected. When the amount of impurities mixed in the droplet 4 is measured, the amount of impurities present in a predetermined region on the surface of the substrate 1 can be specified.

基板検査装置2は、基板回転機器10と回収治具30と回収治具保持機器20とで構成される。
基板検査装置2は、下部構造体3と基板回転機器10と回収治具保持機器20と回収治具30と液体回収機器40と基板芯だし機器50とで構成されてもよい。
The substrate inspection apparatus 2 includes a substrate rotating device 10, a recovery jig 30, and a recovery jig holding device 20.
The substrate inspection apparatus 2 may include the lower structure 3, the substrate rotating device 10, the recovery jig holding device 20, the recovery jig 30, the liquid recovery device 40, and the substrate centering device 50.

下部構造体3は、基板回転機器10と回収治具保持機器20と回収治具30と液体回収機器40と基板芯だし機器50を上面に乗せ、これらの機器を制御するためのコントローラや制御盤面を備えた構造体である。   The lower structure 3 has a substrate rotating device 10, a collecting jig holding device 20, a collecting jig 30, a liquid collecting device 40, and a substrate centering device 50 on the upper surface, and a controller or control panel surface for controlling these devices. It is a structure provided with.

基板回転機器10は、基板1を保持して基板1の中心軸の回りに回転させる機器である。
例えば、基板回転機器10は、水平になった基板1の下面を下方から保持面で保持して垂直な回転中心軸まわりに回転させる機器であり、基板保持部材(図示せず)と基板保持基台(図示せず)とで構成される。
基板保持部材は、水平になった基板1の下面を下方から保持面Mで保持する部材である。真空チャック機構が、保持面Mに設けられる。真空チャック機構は、負圧により保持面Mに保持された基板1を固定する。
基板保持基台は、基板保持部材を回転中心軸の回りに回転自在に支持する機器である。
The substrate rotating device 10 is a device that holds the substrate 1 and rotates it around the central axis of the substrate 1.
For example, the substrate rotating device 10 is a device that holds the lower surface of the horizontal substrate 1 with a holding surface from below and rotates it around a vertical rotation center axis, and includes a substrate holding member (not shown) and a substrate holding base. And a stand (not shown).
The substrate holding member is a member that holds the lower surface of the horizontal substrate 1 with the holding surface M from below. A vacuum chuck mechanism is provided on the holding surface M. The vacuum chuck mechanism fixes the substrate 1 held on the holding surface M by negative pressure.
The substrate holding base is a device that supports a substrate holding member so as to be rotatable about a rotation center axis.

回収治具30は、基板1を検査するために基板1に液滴4を付着させて保持する治具である。
回収治具30の詳細は、後述する。
The recovery jig 30 is a jig that holds the droplets 4 attached to the substrate 1 in order to inspect the substrate 1.
Details of the recovery jig 30 will be described later.

回収治具保持機器20は、回収治具30を保持できる機器である。
回収治具保持機器20は、基板1の縁部1aに付着した液滴4を保持する姿勢をとる回収治具を保持できる。
The collection jig holding device 20 is a device that can hold the collection jig 30.
The collection jig holding device 20 can hold a collection jig that takes a posture for holding the droplet 4 attached to the edge 1 a of the substrate 1.

例えば、回収治具保持機器20は、水平アーム21とアーム回転軸22とアーム回転基台23と回転治具ホルダー24とで構成される。
水平アーム21は、先端部に回収治具フォルダー24を固定し、後端部をアーム回転軸22に固定した梁構造である。
アーム回転軸22は、水平アーム21の後端部を固定し、垂直な回転軸の回りに回転する構造体である。
アーム回転基台23は、アーム回転軸22を回転自在に保持する構造体であり、下部構造3に取り付けられる。
回収治具フォルダー24は、回収治具30を保持する構造体である。回収治具フォルダー24の先端部は、回収治具30が嵌合する嵌合部を持つ。
For example, the recovery jig holding device 20 includes a horizontal arm 21, an arm rotation shaft 22, an arm rotation base 23, and a rotation jig holder 24.
The horizontal arm 21 has a beam structure in which the recovery jig folder 24 is fixed to the front end portion and the rear end portion is fixed to the arm rotation shaft 22.
The arm rotation shaft 22 is a structure that fixes the rear end portion of the horizontal arm 21 and rotates around a vertical rotation shaft.
The arm rotation base 23 is a structure that rotatably holds the arm rotation shaft 22, and is attached to the lower structure 3.
The collection jig folder 24 is a structure that holds the collection jig 30. The distal end portion of the collection jig folder 24 has a fitting portion into which the collection jig 30 is fitted.

液体回収機器40は、回収治具30から液体を回収する機器である。
例えば、液体回収機器40は、回収治具30が保持する液滴4を容器に回収する。
The liquid recovery device 40 is a device that recovers the liquid from the recovery jig 30.
For example, the liquid recovery device 40 recovers the droplet 4 held by the recovery jig 30 in a container.

基板芯だし機器50は、基板1の芯を出して、基板回転機器10にセットする機器である。   The substrate centering device 50 is a device that takes out the core of the substrate 1 and sets it on the substrate rotating device 10.

以下に、本発明の実施形態にかかる回収治具を、図を基に、説明する。
図4は、本発明の第一の実施形態に係る回収治具の正面断面図である。図5は、本発明の第一の実施形態に係る回収治具の側面断面図である。図6は、本発明の第一の実施形態に係る回収治具のA−A断面図である。図7は、本発明の第一の実施形態に係る回収治具の部分断面図である。図8は、本発明の第二の実施形態に係る回収治具の部分断面図である。図9は、本発明の第三の実施形態に係る回収治具の部分断面図である。
Below, the collection jig concerning the embodiment of the present invention is explained based on a figure.
FIG. 4 is a front sectional view of the recovery jig according to the first embodiment of the present invention. FIG. 5 is a side sectional view of the recovery jig according to the first embodiment of the present invention. FIG. 6 is an AA cross-sectional view of the recovery jig according to the first embodiment of the present invention. FIG. 7 is a partial cross-sectional view of the recovery jig according to the first embodiment of the present invention. FIG. 8 is a partial cross-sectional view of the recovery jig according to the second embodiment of the present invention. FIG. 9 is a partial cross-sectional view of the recovery jig according to the third embodiment of the present invention.

本発明の実施形態にかかる回収治具30は、基板1を検査するために基板1に液滴4を付着させて保持するものである。
回収治具30は、ガス供給手段34と第一治具31と第二治具32とで構成される。
例えば、回収治具30は、ガス供給手段34と第一治具31と第二治具32とフランジ33とで構成される。
回収治具30は、ガス供給手段34と第一治具31と第二治具32と圧力測定器35とで構成されてもよい。
例えば、回収治具30は、ガス供給手段34と第一治具31と第二治具32とフランジ33と圧力測定器35とで構成される。
The recovery jig 30 according to the embodiment of the present invention holds the droplets 4 attached to the substrate 1 in order to inspect the substrate 1.
The recovery jig 30 includes a gas supply means 34, a first jig 31, and a second jig 32.
For example, the recovery jig 30 includes a gas supply unit 34, a first jig 31, a second jig 32, and a flange 33.
The recovery jig 30 may include a gas supply means 34, a first jig 31, a second jig 32, and a pressure measuring device 35.
For example, the recovery jig 30 includes a gas supply unit 34, a first jig 31, a second jig 32, a flange 33, and a pressure measuring device 35.

ガス供給手段34は、ガスを供給する手段である。
ガスは、エアー、窒素、その他である。
ガス供給手段34が、ガスを後述する隙間空間Sに供給する。
ガス供給手段34が、ガスを、ガス導入孔Kを通過して、後述する隙間空間Sに供給する。
The gas supply means 34 is a means for supplying gas.
The gas is air, nitrogen, or the like.
The gas supply means 34 supplies gas to the gap space S described later.
The gas supply means 34 supplies the gas through the gas introduction hole K to the gap space S described later.

第一治具31は、基板1の縁部1aに付着した液滴4を保持するものである。
第一治具31は、軸芯を基板1の中心軸に沿う方向に向ける筒状部31aを持ち、筒状部が側面に基板1の縁部1aに付着した液滴4を保持する凹みDを設けられてもよい。
例えば、基板1の中心軸が垂直である場合に、第一治具31は、軸芯を上下方向に向ける筒状部31aを持ち、筒状部31aが側面に基板1の縁部1aに付着した液滴4を保持する凹みDを設けられる。
The first jig 31 holds the droplet 4 attached to the edge 1 a of the substrate 1.
The first jig 31 has a cylindrical portion 31 a whose axis is directed in the direction along the central axis of the substrate 1, and the cylindrical portion holds a droplet D attached to the edge portion 1 a of the substrate 1 on the side surface. May be provided.
For example, when the central axis of the substrate 1 is vertical, the first jig 31 has a cylindrical portion 31a whose axis is directed in the vertical direction, and the cylindrical portion 31a is attached to the edge 1a of the substrate 1 on the side surface. A recess D for holding the droplet 4 is provided.

筒状部31aの側面が、円筒状であってもよい。   The side surface of the cylindrical portion 31a may be cylindrical.

筒状部31aの一方の端部が、後述するフランジ33に連結してもよい。   One end of the cylindrical portion 31a may be connected to a flange 33 described later.

第一治具31が、筒状部31aの他方の端部に凸の形状をした端面をもっていてもよい。
第一治具31が、筒状部31aの他方の端部に球状の凸の形状をした端面をもっていてもよい。
The first jig 31 may have a convex end surface at the other end of the cylindrical portion 31a.
The first jig 31 may have a spherical convex end surface at the other end of the cylindrical portion 31a.

凹みDが、基板1の中心軸に交差する方向に延びる溝である第一溝31bにより形成されてもよい。
後述する開口Оを横から見て後述する第一溝31bが後述する第二溝32bから覗ける様になっていてもよい。
The recess D may be formed by a first groove 31 b that is a groove extending in a direction intersecting the central axis of the substrate 1.
A first groove 31b, which will be described later, may be seen from a second groove 32b, which will be described later, when an opening OA described later is viewed from the side.

後述する開口Оを正面から見て、後述する凹みDが後述する第二溝32bから覗ける様になっていてもよい。   When a later-described opening O is viewed from the front, a later-described recess D may be seen from a second groove 32b described later.

第一治具31が液体を貯留可能な内部空間Hをもち、凹みDが該内部空間Hに連通してもよい。   The first jig 31 may have an internal space H in which liquid can be stored, and the recess D may communicate with the internal space H.

第一治具31が液体を貯留可能な内部空間Hをもち、第一溝31bが該内部空間Hと後述する隙間空間Sとを連通してもよい。
第一溝31bの幅が基板1の厚みより大きくてもよい。
The first jig 31 may have an internal space H in which liquid can be stored, and the first groove 31b may communicate the internal space H with a gap space S described later.
The width of the first groove 31 b may be larger than the thickness of the substrate 1.

第二治具32が、ガスを第一治具31に保持される液滴4が基板1の縁部1aに付着する領域である付着領域の輪郭に沿って基板1の面に吹き付ける様に案内するものである。
第二治具32が、ガスを第一治具31に保持される液滴4が基板1の縁部1aに付着する領域である付着領域の輪郭の全周に沿って基板1の面に吹き付ける様に案内してもよい。
The second jig 32 guides the gas to be sprayed onto the surface of the substrate 1 along the outline of the adhesion area, which is an area where the droplet 4 held by the first jig 31 adheres to the edge 1 a of the substrate 1. To do.
The second jig 32 sprays the gas onto the surface of the substrate 1 along the entire circumference of the adhesion area, which is an area where the droplet 4 held by the first jig 31 adheres to the edge 1 a of the substrate 1. You may be guided.

第二治具32が、筒状部31aを側面の少なくとも凹みDを設けられる箇所との間に隙間空間Sを設けて覆う壁部32aを持ち、壁部32aは凹みDに対面する位置に隙間空間Sと雰囲気の空間と連通する開口Wを設けられてもよい。
ガスが隙間空間Sへ供給される様になった。
The second jig 32 has a wall portion 32a that covers and covers the cylindrical portion 31a with at least a portion where the recess D is provided on the side surface, and the wall portion 32a has a gap at a position facing the recess D. An opening W that communicates with the space S and the space of the atmosphere may be provided.
Gas is supplied to the gap space S.

開口Wが、基板1の厚みより僅かに大きい幅寸法をもち基板1の中心軸に交差する方向に延びる溝である第二溝により形成されてもよい。   The opening W may be formed by a second groove which is a groove having a width dimension slightly larger than the thickness of the substrate 1 and extending in a direction intersecting the central axis of the substrate 1.

使用時の姿勢において、第二溝32bが基板1の表面に対面する面と基板1の裏面に対面する面と基板1の縁部1aに対面する一対の面とで形成されてもよい。
例えば、使用時の姿勢において、第二溝32bが基板1の表面に平行に対面する面と基板1の裏面に平行に対面する面と基板1の縁部1aに対面する一対の面とで形成される。
In the posture during use, the second groove 32b may be formed of a surface facing the surface of the substrate 1, a surface facing the back surface of the substrate 1, and a pair of surfaces facing the edge 1a of the substrate 1.
For example, in the posture during use, the second groove 32b is formed by a surface facing parallel to the surface of the substrate 1, a surface facing parallel to the back surface of the substrate 1, and a pair of surfaces facing the edge 1a of the substrate 1. Is done.

壁部32aが、筒状部31aを、側面と間に隙間空間Sを設けて、覆ってもよい。   The wall portion 32a may cover the tubular portion 31a by providing a gap space S between the side surfaces.

壁部32aが、筒状部31aを、側面の全周と間に隙間空間Sを設けて、覆ってもよい。   The wall portion 32a may cover the tubular portion 31a by providing a gap space S between the entire periphery of the side surfaces.

壁部32aが、筒状部31aを、側面と端面と間に隙間空間Sを設けて、覆ってもよい。   The wall portion 32a may cover the tubular portion 31a by providing a gap space S between the side surface and the end surface.

壁部32aが、筒状部31aを、端面と間に隙間空間Sを設けて、覆ってもよい。   The wall portion 32a may cover the cylindrical portion 31a by providing a gap space S between the end surfaces.

ガスが、隙間空間Sへ供給される。   Gas is supplied to the gap space S.

ガスが、隙間空間Sへ筒状部31aの一方の端の側から供給されてもよい。
例えば、筒状部材の軸芯が上下方向に延びる場合、ガスが、隙間空間Sへ上方から供給される。
The gas may be supplied to the gap space S from one end side of the cylindrical portion 31a.
For example, when the axial center of the cylindrical member extends in the vertical direction, the gas is supplied to the gap space S from above.

フランジ33は、回収治具30を回収治具ホルダー24に取り付けるためのフランジ状部分である。   The flange 33 is a flange-shaped portion for attaching the recovery jig 30 to the recovery jig holder 24.

圧力測定器35は、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力2を測定するための測定管である。   The pressure measuring device 35 is a measuring tube for measuring the pressure 2 at a location near the opening W on either the front surface or the back surface of the substrate 1.

図9は、回収治具30が圧力測定器35をもつ様子を示す。
図8は、回収治具30が圧力測定器35をもたない様子を示す。
FIG. 9 shows a state where the recovery jig 30 has a pressure measuring device 35.
FIG. 8 shows a state where the recovery jig 30 does not have the pressure measuring device 35.

図1乃至7は、第一治具31が内部空間Hを設けられ、ガスが隙間空間Sへ上方から供給させる様子を示す。   1 to 7 show a state in which the first jig 31 is provided with the internal space H, and gas is supplied to the gap space S from above.

図8は、第一治具31が内部空間Hを設けられておらず、凹みDが溝型である様子を示す。   FIG. 8 shows a state where the first jig 31 is not provided with the internal space H and the recess D is a groove shape.

以下に、本発明の実施形態にかかる基板検査装置における回収治具の使用方法を説明する。   Below, the usage method of the collection | recovery jig in the board | substrate inspection apparatus concerning embodiment of this invention is demonstrated.

基板1の縁部1aが開口Wに挿入されるときに、隙間空間Sの圧力に応じて基板1と回収治具との相対距離を調整してもよい。
基板1の縁部1aが開口Wに挿入されるときに、隙間空間Sの圧力に応じて基板1と回収治具30との基板1の中心軸に沿った向きの相対距離を調整してもよい。
基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、隙間空間の圧力に応じて基板1と回収治具30との上下方向の相対距離を調整してもよい。
基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、隙間空間の圧力に応じて、回収治具保持機器20が回収治具30の上下方向の距離を調整してもよい。
基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、隙間空間の圧力が所定の圧力により、回収治具保持機器20が回収治具30の上下方向の距離を調整してもよい。
所定の圧力は、開口Wと基板1の表面、裏面との隙間が所定の値になる様に予め設定される値である。
When the edge 1a of the substrate 1 is inserted into the opening W, the relative distance between the substrate 1 and the recovery jig may be adjusted according to the pressure in the gap space S.
When the edge 1a of the substrate 1 is inserted into the opening W, the relative distance of the substrate 1 and the recovery jig 30 in the direction along the central axis of the substrate 1 is adjusted according to the pressure in the gap space S. Good.
When the center axis of the substrate 1 is vertical, when the edge 1a of the substrate 1 is inserted into the opening W, the relative distance in the vertical direction between the substrate 1 and the recovery jig 30 is set according to the pressure in the gap space. You may adjust.
When the central axis of the substrate 1 is vertical, when the edge 1a of the substrate 1 is inserted into the opening W, the recovery jig holding device 20 moves in the vertical direction of the recovery jig 30 according to the pressure in the gap space. The distance may be adjusted.
When the central axis of the substrate 1 is vertical, when the edge portion 1a of the substrate 1 is inserted into the opening W, the recovery jig holding device 20 causes the recovery jig 30 to You may adjust the distance of an up-down direction.
The predetermined pressure is a value set in advance so that the gap between the opening W and the front and back surfaces of the substrate 1 has a predetermined value.

基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて基板1と回収治具30との相対距離を調整してもよい。
基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて基板1と回収治具30との基板1の中心軸に沿った向きの相対距離を調整してもよい。
基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて基板1と回収治具30との上下方向の相対距離を調整してもよい。
基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて、回収治具保持機器20が回収治具30の上下方向の距離を調整してもよい。
例えば、基板1の中心軸が垂直である場合に、基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力が所定の圧力になる様に、回収治具保持機器20が回収治具30の上下方向の距離を調整する。
所定の圧力は、開口Wと基板1の表面、裏面との隙間が所定の値になる様に予め設定される値である。
When the edge 1a of the substrate 1 is inserted into the opening W, the relative distance between the substrate 1 and the recovery jig 30 according to the pressure near the opening W on either the front surface or the back surface of the substrate 1 May be adjusted.
When the edge portion 1a of the substrate 1 is inserted into the opening W, the substrate 1 of the substrate 1 and the recovery jig 30 according to the pressure at a location close to the opening W on either the front surface or the back surface of the substrate 1. The relative distance in the direction along the central axis may be adjusted.
When the edge 1a of the substrate 1 is inserted into the opening W when the central axis of the substrate 1 is vertical, the pressure depends on the pressure at a location close to the opening W on either the front surface or the back surface of the substrate 1. Thus, the relative distance in the vertical direction between the substrate 1 and the collection jig 30 may be adjusted.
When the edge 1a of the substrate 1 is inserted into the opening W when the central axis of the substrate 1 is vertical, the pressure depends on the pressure at a location close to the opening W on either the front surface or the back surface of the substrate 1. Thus, the collection jig holding device 20 may adjust the vertical distance of the collection jig 30.
For example, when the central axis of the substrate 1 is vertical, when the edge 1a of the substrate 1 is inserted into the opening W, the pressure at a location near the opening W on either the front surface or the back surface of the substrate 1 The recovery jig holding device 20 adjusts the vertical distance of the recovery jig 30 so that the pressure becomes a predetermined pressure.
The predetermined pressure is a value set in advance so that the gap between the opening W and the front and back surfaces of the substrate 1 has a predetermined value.

以上説明したように、本発明の実施形態に係る回収治具は、その構成により、以下の効果を有する。
第一治具31が基板1の縁部1aに付着した液滴4を保持し、ガスを第一治具31に保持される液滴4が縁部1aに付着する付着領域の輪郭に沿って基板1の面に吹き付ける様にしたので、基板1の縁部1aに付着した液滴4を付着領域から漏らすことなく保持できる。
また、基板1の中心軸に沿う方向に向ける軸芯をもつ筒状部に基板1の縁部1aに付着した液滴4を保持する凹みを設け、第二治具32の壁部が筒状部31aを側面の少なくとも凹みDを設けられる箇所との間に隙間空間Sを設けて覆い、隙間空間Sと雰囲気を連通する開口Wを壁部の凹みDに対面する位置に設け、隙間空間Sへガスを供給する様にしたので、ガスが隙間空間Sに入り、凹みDに保持される液滴4の付着領域の輪郭に沿って基板1の表面に吹き付けられて、基板1の縁部1aに付着した液滴4を付着領域から漏らすことなく保持できる、
また、開口Wが基板1の厚みより僅かに大きい幅寸法をもち基板1の中心軸に交差する方向に延びる溝である第二溝32bにより形成される様にしたので、開口Wに挿入される基板1の縁部1aと第二溝32bで形成される開口Wとの隙間寸法を安定して維持できる。
また、使用時の姿勢において、第二溝32bが基板1の表面に対面する面と基板1の裏面に対面する面と基板1の縁部1aに対面する一対の面とで形成される様にしたので、開口Wに挿入される基板1の縁部1aと第二溝32bで形成される開口Wとの隙間寸法をより安定して維持できる。
また、使用時の姿勢において、第二溝32bが基板1の表面に平行に対面する面と基板1の裏面に平行に対面する面と基板1の縁部1aに対面する一対の面とで形成される様にしたので、開口Wに挿入される基板1の縁部1aと第二溝32bで形成される開口Wとの隙間寸法をより安定して維持できる。
また、壁部32aが筒状部31aを側面と間に隙間空間Sを設けて覆う様にしたので、ガスが側面の全周との間に設けた隙間空間Sに一端充満してから開口Wと基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着領域から漏らすことなく保持できる。
また、ガスが隙間空間Sへ筒状部31aの一方の端の側から供給される様にしたので、ガスが隙間空間Sに充満してから開口Wと基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着領域から漏らすことなく保持できる。
また、壁部32aが筒状部31aを側面と端面と間に隙間空間Sを設けて覆う様にしたので、側面の全周及び端面と壁部32aとの隙間空間Sに充満してから開口と基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着漁領域から漏らすことなく保持できる。
また、壁部32aが筒状部31aを側面の全周及び凸の形状をした端面と間に隙間空間Sを設けて覆う様にしたので、側面の全周及び凸の形状をした端面と壁部との隙間空間Sに充満してから開口Wと基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着漁領域から漏らすことなく保持できる。
また、開口Wを正面から見て基板1の中心軸に交差する方向に延びる第一溝が第二溝から覗ける様にしたので、第二溝32bに倣って開口Wに挿入された基板1の縁が第一溝31bに倣って凹みDに対面し、基板1の縁部1aに付着した液滴4を付着漁領域から漏らすことなく保持できる。
また、凹みDが液体を貯留可能な内部空間Hに連通する様にしたので、内部空間Hに貯留される液体の一部が液滴4として基板1の縁部1aに付着できる。
また、壁部32aが筒状部31aを側面の全周と間に隙間空間Sを設けて覆う様にしたので、ガスが側面の全周との間に設けた隙間空間Sに一端充満してから開口Wと基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着漁領域から漏らすことなく保持できる。
また、壁部32aが筒状部31aを端面と間に隙間空間Sを設けて覆う様にしたので、端面と壁部32aとの隙間空間Sに充満してから開口Wと基板1の縁部1aとの隙間から出て、基板1の縁部1aに付着した液滴4を付着漁領域から漏らすことなく保持できる。
As described above, the recovery jig according to the embodiment of the present invention has the following effects due to its configuration.
The first jig 31 holds the droplet 4 attached to the edge 1a of the substrate 1, and the gas follows the outline of the attachment region where the droplet 4 held on the first jig 31 adheres to the edge 1a. Since the liquid is sprayed on the surface of the substrate 1, the droplet 4 attached to the edge 1a of the substrate 1 can be held without leaking from the attachment region.
In addition, a recess for holding the droplet 4 attached to the edge 1a of the substrate 1 is provided in the cylindrical portion having an axial center directed in the direction along the central axis of the substrate 1, and the wall portion of the second jig 32 is cylindrical. A gap space S is provided between the portion 31a and at least a portion where the depression D is provided on the side surface, and an opening W that communicates the gap space S and the atmosphere is provided at a position facing the depression D of the wall portion. Since the gas is supplied to the gas, the gas enters the gap space S and is sprayed on the surface of the substrate 1 along the outline of the adhesion region of the droplet 4 held in the recess D, so that the edge 1a of the substrate 1 is blown. It is possible to hold the droplet 4 attached to the liquid without leaking from the adhesion area.
Further, since the opening W is formed by the second groove 32b having a width dimension slightly larger than the thickness of the substrate 1 and extending in a direction intersecting the central axis of the substrate 1, the opening W is inserted into the opening W. The gap dimension between the edge 1a of the substrate 1 and the opening W formed by the second groove 32b can be stably maintained.
Further, in the posture during use, the second groove 32b is formed by a surface facing the surface of the substrate 1, a surface facing the back surface of the substrate 1, and a pair of surfaces facing the edge 1a of the substrate 1. Therefore, the gap dimension between the edge 1a of the substrate 1 inserted into the opening W and the opening W formed by the second groove 32b can be maintained more stably.
Further, in the posture during use, the second groove 32b is formed by a surface facing parallel to the surface of the substrate 1, a surface facing parallel to the back surface of the substrate 1, and a pair of surfaces facing the edge 1a of the substrate 1. Thus, the gap dimension between the edge 1a of the substrate 1 inserted into the opening W and the opening W formed by the second groove 32b can be maintained more stably.
Further, since the wall portion 32a covers the cylindrical portion 31a with the gap space S between the side surfaces, the opening W is formed after the gap space S provided between the gas and the entire circumference of the side surface is fully filled. It is possible to hold the droplets 4 coming out of the gap between the substrate 1 and the edge 1a of the substrate 1 without leaking from the adhesion region.
In addition, since the gas is supplied to the gap space S from one end side of the cylindrical portion 31a, the gas fills the gap space S and then from the gap between the opening W and the edge 1a of the substrate 1. It is possible to hold the droplet 4 that has come out and adhered to the edge 1a of the substrate 1 without leaking from the adhesion region.
Further, since the wall portion 32a covers the cylindrical portion 31a by providing a gap space S between the side surface and the end surface, the entire space of the side surface and the gap space S between the end surface and the wall portion 32a are filled before opening. It is possible to hold the droplets 4 that come out of the gap between the edge 1a of the substrate 1 and adhere to the edge 1a of the substrate 1 without leaking from the attached fishing region.
Further, since the wall portion 32a covers the cylindrical portion 31a by providing a gap space S between the side surface and the end surface having the convex shape, the end surface and the wall having the entire side surface and the convex shape are provided. After the gap space S with the portion is filled, the droplets 4 coming out of the gap between the opening W and the edge 1a of the substrate 1 and adhering to the edge 1a of the substrate 1 can be held without leaking from the attached fishing region.
In addition, since the first groove extending in the direction intersecting the central axis of the substrate 1 when viewed from the front is viewed from the second groove, the substrate 1 inserted into the opening W following the second groove 32b. The edge faces the dent D following the first groove 31b, and the droplet 4 attached to the edge 1a of the substrate 1 can be held without leaking from the attached fishing area.
Further, since the recess D communicates with the internal space H in which the liquid can be stored, a part of the liquid stored in the internal space H can adhere to the edge 1 a of the substrate 1 as the droplet 4.
Further, since the wall portion 32a covers the cylindrical portion 31a by providing the gap space S between the entire circumference of the side surface, the gas fills the gap space S provided between the entire circumference of the side surface. From the gap between the opening W and the edge 1a of the substrate 1, the droplet 4 attached to the edge 1a of the substrate 1 can be held without leaking from the attached fishing area.
Further, since the wall portion 32a covers the cylindrical portion 31a with a gap space S provided between the end surfaces, the gap portion S between the end surface and the wall portion 32a fills the opening W and the edge portion of the substrate 1. It is possible to hold the droplets 4 coming out of the gap with 1a and adhering to the edge 1a of the substrate 1 without leaking from the attached fishing area.

以上説明したように、本発明の実施形態に係る基板検査装置2は、その構成により、以下の効果を有する。
回収治具保持機器20が上記にうちの一つに記載の回収治具30を保持し、基板回転機器10が基板1を保持して基板1の中心軸の回りに回転させる様にしたので、液滴4を基板1の縁部1aに付着させて基板1の周囲に沿って移動させることをできる。
また、基板1の縁部1aが開口Wに挿入されるときに、隙間空間Sの圧力に応じて基板11と回収治具30との相対距離を調整する様にしたので、隙間空間の圧力を基に基板1の面と回収治具の開口と凹みとのギャップを調整できる。
また、基板1の縁部1aが開口Wに挿入されるときに、隙間空間Sの圧力に応じて基板1と回収治具30との基板1の中心軸に沿った向きの相対距離を調整する様にしたので、隙間空間Sの圧力を基に基板1の面と回収治具30の開口Wと凹みDとのギャップを調整できる。
また、基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて基板1と回収治具30との相対距離を調整する様にしたので、基板1の面の開口Wに近い個所の圧力を基に基板1の面と回収治具の開口Wと凹みDとのギャップを調整できる。、
また、基板1の縁部1aが開口Wに挿入されるときに、基板1の表面または裏面のどちらか一方の面の開口Wに近い箇所の圧力に応じて基板1と回収治具30との基板1の中心軸に沿った向きの相対距離を調整する様にしたので、基板1の面の開口Wに近い個所の圧力を基に基板1の面と回収治具30の開口Wと凹みDとのギャップを調整できる。、
As described above, the substrate inspection apparatus 2 according to the embodiment of the present invention has the following effects due to its configuration.
Since the collection jig holding device 20 holds the collection jig 30 described in one of the above, and the substrate rotating device 10 holds the substrate 1 and rotates it around the central axis of the substrate 1, The droplet 4 can be attached to the edge 1 a of the substrate 1 and moved along the periphery of the substrate 1.
In addition, when the edge 1a of the substrate 1 is inserted into the opening W, the relative distance between the substrate 11 and the recovery jig 30 is adjusted according to the pressure in the gap space S. Based on this, the gap between the surface of the substrate 1 and the opening and recess of the recovery jig can be adjusted.
When the edge 1a of the substrate 1 is inserted into the opening W, the relative distance of the substrate 1 and the recovery jig 30 in the direction along the central axis of the substrate 1 is adjusted according to the pressure in the gap space S. Thus, the gap between the surface of the substrate 1, the opening W of the recovery jig 30 and the recess D can be adjusted based on the pressure in the gap space S.
Further, when the edge portion 1a of the substrate 1 is inserted into the opening W, the substrate 1 and the recovery jig 30 are changed according to the pressure at a location close to the opening W on either the front surface or the back surface of the substrate 1. Since the relative distance is adjusted, the gap between the surface of the substrate 1 and the opening W of the recovery jig and the recess D can be adjusted based on the pressure near the opening W on the surface of the substrate 1. ,
Further, when the edge portion 1a of the substrate 1 is inserted into the opening W, the substrate 1 and the recovery jig 30 are changed according to the pressure at a location close to the opening W on either the front surface or the back surface of the substrate 1. Since the relative distance in the direction along the central axis of the substrate 1 is adjusted, the surface of the substrate 1, the opening W of the recovery jig 30, and the dent D are based on the pressure near the opening W of the surface of the substrate 1. And the gap can be adjusted. ,

本発明は以上に述べた実施形態に限られるものではなく、発明の要旨を逸脱しない範囲で各種の変更が可能である。
基板1の中心軸が垂直である場合を例に説明したが、これに限定されない。例えば、基板1の中心軸が水平であってもよい。例えば、基板1の中心軸が傾いていてもよい。
The present invention is not limited to the embodiments described above, and various modifications can be made without departing from the scope of the invention.
Although the case where the central axis of the substrate 1 is vertical has been described as an example, the present invention is not limited to this. For example, the central axis of the substrate 1 may be horizontal. For example, the central axis of the substrate 1 may be inclined.

H 内部空間
W 開口
D 凹み
K ガス導入孔
1 基板
1a 縁部1a
2 基板検査装置
3 下部構造体
4 液滴
10 基板回転機器
20 回収治具保持機器
21 水平アーム
22 アーム回転軸
23 アーム回転基台
24 回収治具フォルダー
30 回収治具
31 第一治具
31a 筒状部
31b 第一溝
32 第二治具
32a 壁部
32b 第二溝
33 フランジ
34 ガス供給手段
35 圧力測定器
40 液滴回収機器
50 基板芯だし機器
H Internal space W Opening D Recess K Gas introduction hole 1 Substrate 1a Edge 1a
DESCRIPTION OF SYMBOLS 2 Substrate inspection apparatus 3 Substructure 4 Droplet 10 Substrate rotation apparatus 20 Collection jig holding apparatus 21 Horizontal arm 22 Arm rotation shaft 23 Arm rotation base 24 Collection jig folder 30 Collection jig 31 First jig 31a Cylindrical shape Portion 31b First groove 32 Second jig 32a Wall 32b Second groove 33 Flange 34 Gas supply means 35 Pressure measuring device 40 Droplet recovery device 50 Substrate centering device

特開平02−272359号JP 02-272359 A 特開平02−028533号JP 02-028533 特開平08−233709号JP 08-233709 A 特開平02−229428号Japanese Patent Laid-Open No. 02-229428 WО2005/073692WO2005 / 073692 特開2010−040548号JP 2010-040548 A

Claims (15)

基板を検査するために基板に液滴を付着させて保持する回収治具であって、
ガスを供給するガス供給手段と、
基板の縁部に付着した液滴を保持する第一治具と、
前記ガスを前記第一治具に保持される液滴が基板の縁部に付着する領域である付着領域の輪郭に沿って基板のと裏面と縁部とに吹き付ける様に案内する第二治具と、
を備える、
ことを特徴とする回収治具。
A recovery jig for attaching and holding droplets on a substrate to inspect the substrate,
Gas supply means for supplying gas;
A first jig for holding droplets adhering to the edge of the substrate;
Second droplets held the gas to the first jig guide as blown to the front surface and the back surface and edge of the substrate along the contour of the attachment region is a region adhered to the edge of the substrate A jig,
Comprising
A recovery jig characterized by that.
基板を検査するために基板に液滴を付着させて保持する回収治具であって、
ガスを供給するガス供給手段と、
基板の縁部に付着した液滴を保持する第一治具と、
前記ガスを前記第一治具に保持される液滴が基板の縁部に付着する領域である付着領域の輪郭に沿って基板の面に吹き付ける様に案内する第二治具と、
を備え、
前記第一治具が軸芯を基板の中心軸に沿う方向に向ける筒状部を持ち、前記筒状部が側面に基板の縁部が挿入される姿勢になると基板の縁部に付着した液滴を保持する凹みを設けられ、
前記第二治具が前記筒状部を側面の少なくとも前記凹みを設けられる箇所との間に隙間空間を設けて覆う壁部を持ち、該壁部は前記凹みに対面する位置に該隙間空間と雰囲気の空間と連通する開口を設けられ、
前記ガスが前記隙間空間へ供給される様になった、
ことを特徴とする回収治具。
A recovery jig for attaching and holding droplets on a substrate to inspect the substrate,
Gas supply means for supplying gas;
A first jig for holding droplets adhering to the edge of the substrate;
A second jig for guiding the gas to be sprayed onto the surface of the substrate along the outline of the adhesion region, which is an area where the droplets held in the first jig adhere to the edge of the substrate;
With
The first jig has a cylindrical portion whose axis is directed in the direction along the central axis of the substrate, and the liquid adhered to the edge portion of the substrate when the cylindrical portion is in a posture in which the edge portion of the substrate is inserted into the side surface. Provided with a dent to hold the drop,
The second jig has a wall portion that covers the cylindrical portion by providing a clearance space between at least a portion of the side surface where the recess is provided, and the wall portion and the clearance space at a position facing the recess. An opening communicating with the atmosphere space is provided,
The gas is supplied to the gap space.
A recovery jig characterized by that.
前記開口が基板の厚みより僅かに大きい幅寸法をもち基板の中心軸に交差する方向に延びる溝である第二溝により形成される、
ことを特徴とする請求項2に記載の回収治具。
The opening is formed by a second groove which is a groove having a width dimension slightly larger than the thickness of the substrate and extending in a direction intersecting the central axis of the substrate.
The recovery jig according to claim 2, wherein:
使用時の姿勢において、前記第二溝が基板の表面に対面する面と基板の裏面に対面する面と基板の縁部に対面する面とで形成される、
ことを特徴とする請求項3に記載の回収治具。
In posture during use, the second groove is formed in a surface facing the edge of the surface and the substrate which faces the back side of the surface and the substrate facing the surface of the substrate,
The recovery jig according to claim 3.
前記壁部が前記筒状部を前記側面と間に前記隙間空間を設けて覆う、
ことを特徴とする請求項4に記載の回収治具。
The wall portion covers the cylindrical portion by providing the gap space between the side surfaces;
The recovery jig according to claim 4, wherein:
前記ガスが前記隙間空間へ前記筒状部の一方の端の側から供給される、
ことを特徴とする請求項5に記載の回収治具。
The gas is supplied to the gap space from one end side of the cylindrical portion,
The recovery jig according to claim 5, wherein:
前記筒状部が他方の端部に端面をもち、
前記壁部が前記筒状部を前記側面と前記端面と間に前記隙間空間を設けて覆う、
ことを特徴とする請求項6に記載の回収治具。
The cylindrical portion has an end face at the other end,
The wall portion covers the tubular portion by providing the gap space between the side surface and the end surface;
The recovery jig according to claim 6.
前記筒状部が他方の端に凸の形状をした端面をもち、
前記壁部が前記筒状部を前記側面の全周と前記端面と間に前記隙間空間を設けて覆う、
ことを特徴とする請求項7に記載の回収治具。
Has an end face the cylindrical portion has a convex shape at the other end,
The wall portion covers the cylindrical portion by providing the gap space between the entire circumference of the side surface and the end surface;
The recovery jig according to claim 7, wherein:
前記凹みが基板の中心軸に交差する方向に延びる溝である第一溝により形成され、
前記開口を正面から見て前記第一溝が前記第二溝から覗ける様になった、
ことを特徴とする請求項2に記載に回収治具。
The recess is formed by a first groove which is a groove extending in a direction intersecting the central axis of the substrate,
The first groove can be seen from the second groove when the opening is viewed from the front,
The recovery jig according to claim 2, wherein:
前記第一治具が液体を貯留可能な内部空間をもち、前記凹みが該内部空間に連通する、
ことを特徴とする請求項9に記載の回収治具。
The first jig has an internal space in which liquid can be stored, and the recess communicates with the internal space;
The recovery jig according to claim 9.
前記壁部が前記筒状部を前記側面の全周と間に前記隙間空間を設けて覆う、
ことを特徴とする請求項2に記載の回収治具。
The wall portion covers the tubular portion by providing the gap space between the entire circumference of the side surface;
The recovery jig according to claim 2, wherein:
前記筒状部が他方の端部に端面をもち、
前記壁部が前記筒状部を前記端面と間に前記隙間空間を設けて覆う、
ことを特徴とする請求項2に記載の回収治具。
The cylindrical portion has an end face at the other end,
The wall portion covers the cylindrical portion by providing the gap space between the end faces;
The recovery jig according to claim 2, wherein:
基板を検査するための基板に液滴を付着して移動させる基板検査装置であって、
基板を保持して基板の中心軸の回りに回転させる基板回転機器と、
請求項1乃至12のうちの一つに記載の回収治具と、
前記回収治具を保持可能な回収治具保持機器と、
を備えることを特徴とする基板検査装置。
A substrate inspection apparatus for attaching and moving droplets on a substrate for inspecting the substrate,
A substrate rotating device that holds the substrate and rotates it around the central axis of the substrate;
A recovery jig according to one of claims 1 to 12,
A collection jig holding device capable of holding the collection jig;
A board inspection apparatus comprising:
基板を検査するための基板に液滴を付着して移動させる基板検査装置であって、
基板を保持して基板の中心軸の回りに回転させる基板回転機器と、
請求項2に記載の回収治具と、
前記回収治具を保持して基板との相対距離を調整可能な回収治具保持機器と、
を備え、
基板の縁部が前記開口に挿入されるときに、前記回収治具保持機器が前記隙間空間の圧力に応じて基板と前記回収治具との相対距離を調整する、
ことを特徴とする基板検査装置。
A substrate inspection apparatus for attaching and moving droplets on a substrate for inspecting the substrate,
A substrate rotating device that holds the substrate and rotates it around the central axis of the substrate;
The recovery jig according to claim 2;
A collection jig holding device capable of holding the collection jig and adjusting the relative distance from the substrate ;
With
When the edge of the substrate is inserted into the opening, the recovery jig holding device adjusts the relative distance between the substrate and the recovery jig in accordance with the pressure in the gap space;
A substrate inspection apparatus.
基板を検査するための基板に液滴を付着して移動させる基板検査装置であって、
基板を保持して基板の中心軸の回りに回転させる基板回転機器と、
請求項2に記載の回収治具と、
前記回収治具を保持して基板との相対距離を調整可能な回収治具保持機器と、
を備え、
基板の縁部が前記開口に挿入されるときに、前記回収治具保持機器が前記基板の表面または裏面のどちらか一方の面の前記開口に近い箇所の圧力に応じて基板と前記回収治具との相対距離を調整する、
ことを特徴とする基板検査装置。
A substrate inspection apparatus for attaching and moving droplets on a substrate for inspecting the substrate,
A substrate rotating device that holds the substrate and rotates it around the central axis of the substrate;
The recovery jig according to claim 2;
A collection jig holding device capable of holding the collection jig and adjusting the relative distance from the substrate ;
With
When the edge of the substrate is inserted into the opening, the recovery jig holding device is adapted to the substrate and the recovery jig according to the pressure at a location close to the opening on either the front surface or the back surface of the substrate. Adjust the relative distance between
A substrate inspection apparatus.
JP2013239360A 2013-11-19 2013-11-19 Recovery jig and board inspection device Active JP6285156B2 (en)

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