JP6139997B2 - Epoxy resin, epoxy resin composition, and cured product thereof - Google Patents
Epoxy resin, epoxy resin composition, and cured product thereof Download PDFInfo
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- JP6139997B2 JP6139997B2 JP2013129530A JP2013129530A JP6139997B2 JP 6139997 B2 JP6139997 B2 JP 6139997B2 JP 2013129530 A JP2013129530 A JP 2013129530A JP 2013129530 A JP2013129530 A JP 2013129530A JP 6139997 B2 JP6139997 B2 JP 6139997B2
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- Prior art keywords
- epoxy resin
- resin composition
- component
- mol
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000003822 epoxy resin Substances 0.000 title claims description 113
- 229920000647 polyepoxide Polymers 0.000 title claims description 113
- 239000000203 mixture Substances 0.000 title claims description 47
- 229920005989 resin Polymers 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 40
- 239000003795 chemical substances by application Substances 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 30
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 25
- 239000011256 inorganic filler Substances 0.000 claims description 18
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 18
- 238000005227 gel permeation chromatography Methods 0.000 claims description 17
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000047 product Substances 0.000 description 25
- 238000006243 chemical reaction Methods 0.000 description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000005259 measurement Methods 0.000 description 14
- 150000002989 phenols Chemical class 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 13
- 238000002844 melting Methods 0.000 description 13
- 230000008018 melting Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- -1 α-ethoxyethyl Chemical group 0.000 description 13
- 239000004593 Epoxy Substances 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 6
- 239000003377 acid catalyst Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 235000010290 biphenyl Nutrition 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 5
- 238000006735 epoxidation reaction Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000004203 carnauba wax Substances 0.000 description 4
- 235000013869 carnauba wax Nutrition 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- IXCOKTMGCRJMDR-UHFFFAOYSA-N 9h-fluorene;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1.C1=CC=C2CC3=CC=CC=C3C2=C1 IXCOKTMGCRJMDR-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- 150000004780 naphthols Chemical class 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 229960001755 resorcinol Drugs 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- WEERVPDNCOGWJF-UHFFFAOYSA-N 1,4-bis(ethenyl)benzene Chemical compound C=CC1=CC=C(C=C)C=C1 WEERVPDNCOGWJF-UHFFFAOYSA-N 0.000 description 2
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical group COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 125000006839 xylylene group Chemical group 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- HIACAHMKXQESOV-UHFFFAOYSA-N 1,2-bis(prop-1-en-2-yl)benzene Chemical compound CC(=C)C1=CC=CC=C1C(C)=C HIACAHMKXQESOV-UHFFFAOYSA-N 0.000 description 1
- PRJNEUBECVAVAG-UHFFFAOYSA-N 1,3-bis(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1 PRJNEUBECVAVAG-UHFFFAOYSA-N 0.000 description 1
- SLEFGCTURQPRGC-UHFFFAOYSA-N 1,4-bis(1-methoxyethyl)benzene Chemical compound COC(C)C1=CC=C(C(C)OC)C=C1 SLEFGCTURQPRGC-UHFFFAOYSA-N 0.000 description 1
- MYHFDBZSYQXJEK-UHFFFAOYSA-N 1,4-bis(1-propan-2-yloxyethyl)benzene Chemical compound CC(C)OC(C)C1=CC=C(C(C)OC(C)C)C=C1 MYHFDBZSYQXJEK-UHFFFAOYSA-N 0.000 description 1
- ODFGTXHYSZSGMJ-UHFFFAOYSA-N 1,4-bis(2-ethoxypropan-2-yl)benzene Chemical compound CCOC(C)(C)C1=CC=C(C(C)(C)OCC)C=C1 ODFGTXHYSZSGMJ-UHFFFAOYSA-N 0.000 description 1
- HYDOLURQOQWREP-UHFFFAOYSA-N 1,4-bis(2-methoxypropan-2-yl)benzene Chemical compound COC(C)(C)C1=CC=C(C(C)(C)OC)C=C1 HYDOLURQOQWREP-UHFFFAOYSA-N 0.000 description 1
- IWEPRSYOHSBMEY-UHFFFAOYSA-N 1,4-bis(2-propan-2-yloxypropan-2-yl)benzene Chemical compound CC(C)OC(C)(C)C1=CC=C(C(C)(C)OC(C)C)C=C1 IWEPRSYOHSBMEY-UHFFFAOYSA-N 0.000 description 1
- BHCGGVIVFXWATI-UHFFFAOYSA-N 1-[4-(1-hydroxyethyl)phenyl]ethanol Chemical compound CC(O)C1=CC=C(C(C)O)C=C1 BHCGGVIVFXWATI-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- LEARFTRDZQQTDN-UHFFFAOYSA-N 2-[4-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=C(C(C)(C)O)C=C1 LEARFTRDZQQTDN-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- XSTITJMSUGCZDH-UHFFFAOYSA-N 4-(4-hydroxy-2,6-dimethylphenyl)-3,5-dimethylphenol Chemical group CC1=CC(O)=CC(C)=C1C1=C(C)C=C(O)C=C1C XSTITJMSUGCZDH-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- ZDGWGNDTQZGISB-UHFFFAOYSA-N acetic acid;perchloric acid Chemical compound CC(O)=O.OCl(=O)(=O)=O ZDGWGNDTQZGISB-UHFFFAOYSA-N 0.000 description 1
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- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
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- 239000004744 fabric Substances 0.000 description 1
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- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
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- 238000004898 kneading Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
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- 239000003607 modifier Substances 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
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- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
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- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
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- 229920000058 polyacrylate Polymers 0.000 description 1
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- 229920000570 polyether Polymers 0.000 description 1
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- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical class CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
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Images
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- Epoxy Resins (AREA)
- Epoxy Compounds (AREA)
- Reinforced Plastic Materials (AREA)
Description
本発明は、硬化性、高耐熱性、機械強度、高熱伝導性及び熱分解安定性に優れるエポキシ樹脂組成物、硬化物及びそれに使用されるエポキシ樹脂に関する。 The present invention relates to an epoxy resin composition excellent in curability, high heat resistance, mechanical strength, high thermal conductivity and thermal decomposition stability, a cured product, and an epoxy resin used therefor.
エポキシ樹脂は工業的に幅広い用途で使用されてきているが、その要求性能は近年ますます高度化している。その中で、高熱伝導性に優れたエポキシ樹脂組成物としては、メソゲン構造を有するエポキシ樹脂を用いたものが知られており、例えば、特許文献1には、ビフェノール型エポキシ樹脂と多価フェノール樹脂硬化剤を必須成分としたエポキシ樹脂組成物が示され、高温下での安定性と強度に優れ、接着、注型、封止、成型、積層等の広い分野で使用できることが開示されている。また、特許文献2には、屈曲鎖で連結された二つのメソゲン構造を分子内に有するエポキシ化合物の開示がある。さらに、特許文献3には、メソゲン基を有するエポキシ化合物を含む樹脂組成物の開示がある。
Epoxy resins have been used in a wide range of industrial applications, but their required performance has become increasingly sophisticated in recent years. Among them, as an epoxy resin composition excellent in high thermal conductivity, one using an epoxy resin having a mesogenic structure is known. For example, Patent Document 1 discloses a biphenol type epoxy resin and a polyhydric phenol resin. An epoxy resin composition containing a curing agent as an essential component is shown, and it is disclosed that it is excellent in stability and strength at high temperatures and can be used in a wide range of fields such as adhesion, casting, sealing, molding and lamination. Patent Document 2 discloses an epoxy compound having in its molecule two mesogenic structures connected by a bent chain. Furthermore,
しかし、このようなメソゲン構造を有するエポキシ樹脂は融点が高く、混合処理を行う場合、高融点成分が溶解し難く溶け残りを生じるため、硬化性や耐熱性が低下する問題があった。また、このようなエポキシ樹脂を硬化剤と均一に混合するには、高温が必要である。高温では、エポキシ樹脂の硬化反応が急速に進みゲル化時間が短くなるため、混合処理は厳しく制限され取り扱いが難しいという問題があった。そして、その欠点を補うために溶解性の第3成分を添加すると、樹脂の融点が低下して均一混合しやすくなるが、その硬化物は熱伝導率が低下するという問題を生じた。 However, the epoxy resin having such a mesogenic structure has a high melting point, and when performing a mixing process, the high melting point component is difficult to dissolve and remains undissolved, resulting in a problem that curability and heat resistance are lowered. In addition, high temperature is required to uniformly mix such an epoxy resin with a curing agent. At high temperatures, the curing reaction of the epoxy resin proceeds rapidly and the gelation time is shortened, so that the mixing process is severely limited and difficult to handle. When a soluble third component is added to make up for the drawback, the melting point of the resin is lowered to facilitate uniform mixing, but the cured product has a problem that the thermal conductivity is lowered.
一方、特許文献4、5には、ビフェノールアラルキル型エポキシ樹脂及びその樹脂組成物が開示されており、耐熱性、耐湿性、機械的特性等に優れることが記載されているが、低応力性や熱伝導性に着目したものもなかった。特許文献6には、ビフェニル環を有するアラルキル型エポキシ樹脂とそれを含む組成物が記載されている。 On the other hand, Patent Documents 4 and 5 disclose a biphenol aralkyl type epoxy resin and a resin composition thereof, which are described as being excellent in heat resistance, moisture resistance, mechanical properties, etc. None focused on thermal conductivity. Patent Document 6 describes an aralkyl type epoxy resin having a biphenyl ring and a composition containing the same.
本発明の目的は、積層、成形、注型、接着等の用途において、硬化性に優れるとともに、高耐熱性、機械強度、高熱伝導性及び熱分解安定性等にも優れた硬化物を与える電気・電子部品類の封止材料、高放熱シート等の回路基板材料に有用なエポキシ樹脂組成物を提供すること、及びその硬化物を提供することにある。また、他の目的はこのエポキシ樹脂組成物に使用されるエポキシ樹脂を提供することにある。 The object of the present invention is to provide a cured product having excellent curability and high heat resistance, mechanical strength, high thermal conductivity and thermal decomposition stability in applications such as lamination, molding, casting and adhesion. It is to provide an epoxy resin composition useful for circuit board materials such as a sealing material for electronic parts, a high heat dissipation sheet, and a cured product thereof. Another object is to provide an epoxy resin used in the epoxy resin composition.
本発明は、下記一般式(1)で表されるエポキシ樹脂において、ゲルパーミエーションクロマトグラフィー(GPC)で測定した重量平均分子量(Mw)がn=0成分を除いた値で1,000〜5,000であって、n=0成分が面積%で全体の30%以下であることを特徴とするエポキシ樹脂である。
また、本発明は、ビフェノール化合物と芳香族縮合剤とをビフェノール化合物1モルに対して、芳香族縮合剤0.1〜0.55モルを反応させることにより、下記一般式(a)で表される多価ヒドロキシ樹脂を得て、これとエピクロロヒドリンとを反応させることを特徴とする上記のエポキシ樹脂の製造方法である。
さらに、本発明は上記のエポキシ樹脂、及び硬化剤を必須成分とすることを特徴とするエポキシ樹脂組成物である。このエポキシ樹脂組成物は、無機充填材を必須成分として含むことができ、この場合の無機充填材の一部又は全部として、熱伝導率が20W/m・K以上の無機充填材を使用することができる。また、このエポキシ樹脂組成物は、溶剤に溶解又は懸濁させた状態とすることにより用途が広がる。 Furthermore, the present invention is an epoxy resin composition comprising the above epoxy resin and a curing agent as essential components. This epoxy resin composition can contain an inorganic filler as an essential component, and an inorganic filler having a thermal conductivity of 20 W / m · K or more is used as a part or all of the inorganic filler in this case. Can do. Moreover, the use of this epoxy resin composition can be expanded by dissolving or suspending it in a solvent.
更に、本発明は上記のエポキシ樹脂組成物を繊維状の基材と複合させたことを特徴とするプリプレグである。また、本発明は上記のエポキシ樹脂組成物を硬化してなる硬化物である。 Furthermore, the present invention is a prepreg characterized by combining the above epoxy resin composition with a fibrous base material. Moreover, this invention is a hardened | cured material formed by hardening | curing said epoxy resin composition.
本発明のエポキシ樹脂を配合したエポキシ樹脂組成物を加熱硬化させれば、エポキシ樹脂硬化物とすることができ、この硬化物は硬化性、高耐熱性、機械強度、高熱伝導性及び熱分解安定性等の点で優れたものを与え、電気・電子部品類の封止材料、高放熱シート等の回路基板材料等の用途に好適に使用することが可能である。 If the epoxy resin composition containing the epoxy resin of the present invention is cured by heating, an epoxy resin cured product can be obtained. This cured product is curable, high heat resistance, mechanical strength, high thermal conductivity and stable thermal decomposition. It can be used suitably for applications such as sealing materials for electrical and electronic parts, circuit board materials such as high heat dissipation sheets, and the like.
本発明のエポキシ樹脂は、一般式(1)で表される。式中、nは0〜20の数を示す。nの平均値(数平均)としては、GPCで測定した重量平均分子量(Mw)がn=0成分を除いた値で1,000〜5,000であって、n=0成分がGPCの面積%で全体の30%以下であることを満足する範囲であるが、好ましくは全体として1〜6の範囲である。そして、n=0成分の含有量は1〜20%が好ましく、上記Mwは2000〜4500が好ましい。 The epoxy resin of this invention is represented by General formula (1). In formula, n shows the number of 0-20. As the average value (number average) of n, the weight average molecular weight (Mw) measured by GPC is 1,000 to 5,000 excluding n = 0 component, and n = 0 component is the area of GPC. % Is a range satisfying that it is 30% or less of the whole, but preferably 1 to 6 as a whole. The content of the n = 0 component is preferably 1 to 20%, and the Mw is preferably 2000 to 4500.
上記エポキシ樹脂は、上記一般式(a)で表される多価ヒドロキシ樹脂とエピクロロヒドリンとを反応させることにより製造することができる。しかし、この反応方法に限らない。そして、この多価ヒドロキシ樹脂は、有利にはビフェノール類と芳香族縮合剤とを反応させることにより製造することができる。具体的には、ビフェノール化合物と芳香族縮合剤とをビフェノール化合物1モルに対して、芳香族縮合剤0.1〜0.55モルを反応させることにより、上記一般式(a)で表される多価ヒドロキシ樹脂を得て、これとエピクロロヒドリンとを反応させる方法である。なお、一般式(a)において、nは一般式(2)と同意である。 The epoxy resin can be produced by reacting the polyvalent hydroxy resin represented by the general formula (a) with epichlorohydrin. However, it is not restricted to this reaction method. The polyvalent hydroxy resin can be advantageously produced by reacting a biphenol with an aromatic condensing agent. Specifically, the biphenol compound and the aromatic condensing agent are represented by the above general formula (a) by reacting 0.1 to 0.55 mol of the aromatic condensing agent with respect to 1 mol of the biphenol compound. In this method, a polyvalent hydroxy resin is obtained and this is reacted with epichlorohydrin. In general formula (a), n is the same as in general formula (2).
多価ヒドロキシ樹脂の合成原料のビフェノール類としては、4,4'−ジヒドロキシビフェニルが適する。 4,4′-dihydroxybiphenyl is suitable as a biphenol as a raw material for synthesizing the polyvalent hydroxy resin.
芳香族縮合剤としては、キシリレン系縮合剤としてp−キシリレングリコール、α,α'−ジメトキシ−p−キシレン、α,α'−ジエトキシ−p−キシレン、α,α'−ジイソプロポキシ−p−キシレン、α,α'−ジブトキシ−p−キシレン、1,4−ジ(α−ヒドロキシエチル)ベンゼン、1,4−ジ(α−メトキシエチル)ベンゼン、1,4−ジ(α−エトキシエチル)ベンゼン、1,4−ジ(α−イソプロポキシエチル)ベンゼン、1,4−ジ(2−ヒドロキシ−2−プロピル)ベンゼン、1,4−ジ(2−メトキシ−2−プロピル)ベンゼン、1,4−ジ(2−エトキシ−2−プロピル)ベンゼン、1,4−ジ(2−イソプロポキシ−2−プロピル)ベンゼン等のジアルコキシ化合物やp−ジビニルベンゼンなどが挙げられる。 As the aromatic condensing agent, p-xylylene glycol, α, α′-dimethoxy-p-xylene, α, α′-diethoxy-p-xylene, α, α′-diisopropoxy-p are used as the xylylene condensing agent. -Xylene, α, α'-dibutoxy-p-xylene, 1,4-di (α-hydroxyethyl) benzene, 1,4-di (α-methoxyethyl) benzene, 1,4-di (α-ethoxyethyl) ) Benzene, 1,4-di (α-isopropoxyethyl) benzene, 1,4-di (2-hydroxy-2-propyl) benzene, 1,4-di (2-methoxy-2-propyl) benzene, 1 , 4-di (2-ethoxy-2-propyl) benzene, dialkoxy compounds such as 1,4-di (2-isopropoxy-2-propyl) benzene, and p-divinylbenzene.
その他にo−ジビニルベンゼン、p−ジビニルベンゼン、m−ジビニルベンゼン等のジビニル化合物などが芳香族縮合剤として挙げられる。 Other examples of the aromatic condensing agent include divinyl compounds such as o-divinylbenzene, p-divinylbenzene, and m-divinylbenzene.
ビフェノール類と芳香族縮合剤との反応には、芳香族縮合剤に対して過剰量の二官能フェノール性化合物を使用する。芳香族縮合剤の使用量は、ビフェノール類1モルに対し0.1〜0.55モルである。また、後工程によりn=0成分を取り除かない場合の芳香族縮合剤の使用量は0.35〜0.55モルが好ましい。後工程により、n=0成分を取り除く場合では、0.2〜0.55モルであり、好ましくは0.3〜0.5モルである。モル比と芳香族縮合剤の使用量が0.55モルより多いとn=0成分の生成は少なくなるが分子量自体が高くなり、樹脂の軟化点、溶融粘度が高くなるため成形作業性に支障をきたし、0.1モルより少ないと反応終了後、過剰のビフェノール類の除く量が多くなり、工業的に好ましくない。このモル比(芳香族縮合剤/ビフェノール類)を上記範囲内で大きくするとnの平均値は大きくなり、n=0成分含有量は低下するので、このモル比を調整することにより、n又はMwを制御することができる。更に、上記のように後工程により、n=0成分を取り除くことによって、n=0成分含有量を大きく制御することができる。 In the reaction between the biphenols and the aromatic condensing agent, an excess amount of the bifunctional phenolic compound is used with respect to the aromatic condensing agent. The usage-amount of an aromatic condensing agent is 0.1-0.55 mol with respect to 1 mol of biphenols. Further, the amount of the aromatic condensing agent used in the case where the n = 0 component is not removed in the subsequent step is preferably 0.35 to 0.55 mol. In the case where n = 0 component is removed by a post-process, the amount is 0.2 to 0.55 mol, preferably 0.3 to 0.5 mol. When the molar ratio and the amount of the aromatic condensing agent used are more than 0.55 mol, the generation of n = 0 component is reduced, but the molecular weight itself is increased, and the softening point and melt viscosity of the resin are increased, which hinders the molding workability. If the amount is less than 0.1 mol, the amount of excess biphenols to be removed is increased after the reaction is completed, which is not industrially preferable. When this molar ratio (aromatic condensing agent / biphenol) is increased within the above range, the average value of n increases and the content of n = 0 component decreases. Therefore, by adjusting this molar ratio, n or Mw Can be controlled. Furthermore, the n = 0 component content can be largely controlled by removing the n = 0 component in the subsequent step as described above.
通常、この反応は、公知の無機酸、有機酸等の酸触媒の存在下に行う。このような酸触媒としては、例えば、塩酸、硫酸、燐酸等の鉱酸や、ギ酸、シュウ酸、トリフルオロ酢酸、p−トルエンスルホン酸等の有機酸や、塩化亜鉛、塩化アルミニウム、塩化鉄、三フッ化ホウ素等のルイス酸や、活性白土、シリカ−アルミナ、ゼオライト等の固体酸などが挙げられる。 Usually, this reaction is performed in the presence of a known acid catalyst such as an inorganic acid or an organic acid. Examples of such an acid catalyst include mineral acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, organic acids such as formic acid, oxalic acid, trifluoroacetic acid, and p-toluenesulfonic acid, zinc chloride, aluminum chloride, iron chloride, Examples include Lewis acids such as boron trifluoride and solid acids such as activated clay, silica-alumina, and zeolite.
通常、この反応は10〜250℃で1〜20時間行う。さらに、反応の際に溶剤として、例えば、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、メチルセロソルブ、エチルセロソルブ、ジグライム、トリグライム等のアルコール類や、ベンゼン、トルエン、クロロベンゼン、ジクロロベンゼン等の芳香族化合物などを使用することがよく、これらの中でエチルセロソルブ、ジグライム、トリグライムなどが特に好ましい。反応終了後、得られた多価ヒドロキシ樹脂は、減圧留去、水洗又は貧溶剤中での再沈殿等の方法により溶剤を除去してもよいが、溶剤を残したままエポキシ化反応の原料として用いてもよい。 Usually, this reaction is performed at 10 to 250 ° C. for 1 to 20 hours. Further, as a solvent in the reaction, for example, alcohols such as methanol, ethanol, propanol, butanol, ethylene glycol, methyl cellosolve, ethyl cellosolve, diglyme and triglyme, and aromatic compounds such as benzene, toluene, chlorobenzene and dichlorobenzene Of these, ethyl cellosolve, diglyme, triglyme and the like are particularly preferable. After completion of the reaction, the obtained polyvalent hydroxy resin may be removed by a method such as distillation under reduced pressure, washing with water or reprecipitation in a poor solvent, but as a raw material for the epoxidation reaction while leaving the solvent. It may be used.
また、反応終了後、得られた多価ヒドロキシ樹脂は、n=0成分を除去する工程に付すことが好ましい。この工程では、例えば、n=0成分を溶解せず、n=1以上の高分子量成分を溶解する貧溶剤を使用し、ろ過等の方法によりn=0成分を除去することが好ましい。貧溶剤としてはn=0成分をほとんど溶解しないものであれば特に限定されないが、例えばエチレングリコール、メチルセロソルブ、エチルセロソルブ、ジグライム、トリグライム等のアルコール類や、ベンゼン、トルエン、クロロベンゼン、ジクロロベンゼン等の芳香族化合物の良溶剤にアセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類を混合したものが好ましく使用できる。この工程では、n=0成分含有量を大きく低減することが可能であるが、n=0成分含有量は1〜20%が好ましく、より好ましくは2〜10%程度とすることが、有利である。 Moreover, it is preferable to attach | subject the obtained polyvalent hydroxy resin to the process of removing n = 0 component after completion | finish of reaction. In this step, for example, it is preferable to remove the n = 0 component by a method such as filtration using a poor solvent that does not dissolve the n = 0 component and dissolves the high molecular weight component of n = 1 or more. The poor solvent is not particularly limited as long as it does not substantially dissolve the n = 0 component. For example, alcohols such as ethylene glycol, methyl cellosolve, ethyl cellosolve, diglyme, triglyme, benzene, toluene, chlorobenzene, dichlorobenzene, etc. What mixed the ketones, such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, with the good solvent of an aromatic compound can use it preferably. In this step, it is possible to greatly reduce the content of the n = 0 component, but the content of the n = 0 component is preferably 1 to 20%, more preferably about 2 to 10%. is there.
n=0成分の除去工程は、エポキシ化後においても行うことができる。エポキシ化後に行う除去工程は、上記工程と同様にして、貧溶剤を使用し、ろ過等の方法によりn=0成分を除去することが好ましい。この場合の貧溶剤は、エポキシ樹脂は多価ヒドロキシ樹脂に比べて溶解性が高いので、より溶解性の劣るものが望ましいといえる。貧溶剤としてはn=0成分をほとんど溶解しないものであれば特に限定されないが、例えばアセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類が好ましい。 The removal process of n = 0 component can be performed even after epoxidation. In the removal step performed after epoxidation, it is preferable to remove the n = 0 component by a method such as filtration using a poor solvent in the same manner as in the above step. As the poor solvent in this case, since the epoxy resin has higher solubility than the polyvalent hydroxy resin, it can be said that the poor solvent is inferior in solubility. The poor solvent is not particularly limited as long as it does not substantially dissolve the n = 0 component. For example, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone are preferable.
本発明のエポキシ樹脂は、上記多価ヒドロキシ樹脂とエピクロルヒドリンとを反応させることにより製造することができる。この反応は、通常のエポキシ化反応と同様に行うことができる。例えば、多価ヒドロキシ樹脂を過剰のエピクロルヒドリンに溶解した後、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物の存在下に50〜150℃、好ましくは60〜120℃で1〜10時間反応させる方法が挙げられる。この際、アルカリ金属水酸化物の使用量は、多価ヒドロキシ化合物中の水酸基1モルに対し、0.8〜1.2モル、好ましくは0.9〜1.0モルである。また、エピクロルヒドリンは多価ヒドロキシ樹脂中の水酸基に対して過剰に用いられるが、通常多価ヒドロキシ化合物中の水酸基1モルに対し、1.5〜15モル、好ましくは2〜8モルである。反応終了後、過剰のエピクロルヒドリンを留去し、残留物をトルエン、メチルイソブチルケトン等の溶剤に溶解し、濾過し、水洗して無機塩を除去し、次いで溶剤を留去することにより、一般式(1)で表されるエポキシ樹脂を得ることができる。なお、エポキシ化する際に、生成したエポキシ化合物のエポキシ基が開環、縮合してオリゴマー化したエポキシ化合物が少量副生する場合が、かかるエポキシ化合物が存在しても差し支えない。 The epoxy resin of the present invention can be produced by reacting the above polyvalent hydroxy resin with epichlorohydrin. This reaction can be performed in the same manner as a normal epoxidation reaction. For example, after dissolving a polyvalent hydroxy resin in excess epichlorohydrin, the reaction is carried out at 50 to 150 ° C., preferably 60 to 120 ° C. for 1 to 10 hours in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. The method of letting it be mentioned. Under the present circumstances, the usage-amount of an alkali metal hydroxide is 0.8-1.2 mol with respect to 1 mol of hydroxyl groups in a polyvalent hydroxy compound, Preferably it is 0.9-1.0 mol. Epichlorohydrin is used in excess with respect to the hydroxyl group in the polyvalent hydroxy resin, but is usually 1.5 to 15 mol, preferably 2 to 8 mol, relative to 1 mol of the hydroxyl group in the polyvalent hydroxy compound. After completion of the reaction, excess epichlorohydrin is distilled off, the residue is dissolved in a solvent such as toluene, methyl isobutyl ketone, filtered, washed with water to remove inorganic salts, and then the solvent is distilled off to give a general formula. The epoxy resin represented by (1) can be obtained. In the case of epoxidation, when the epoxy group of the produced epoxy compound is ring-opened and condensed to form an oligomerized epoxy compound, a small amount of such an epoxy compound may be present.
また、このエポキシ樹脂の軟化点又は融点は、エポキシ樹脂原料である多価ヒドロキシ樹脂を合成する際のビフェノール類と架橋剤のモル比を変えることにより容易に調整可能であるが、エポキシ樹脂組成物の混合処理する際の高融点成分の溶け残りによる物性低下を抑制する観点より、その軟化点又は融点は130℃以下が好ましく、さらに好ましくは120℃以下である。これより軟化点又は融点が高い場合、硬化性や耐熱性等の物性低下を生じる傾向にある。本発明のエポキシ樹脂は、n=0成分が少なく、しかもMwが低いため、これを使用したエポキシ樹脂組成物から得られる硬化物の特性が向上する。 The softening point or melting point of the epoxy resin can be easily adjusted by changing the molar ratio of the biphenols and the crosslinking agent when synthesizing the polyvalent hydroxy resin that is the raw material of the epoxy resin. The softening point or melting point is preferably 130 ° C. or lower, more preferably 120 ° C. or lower, from the viewpoint of suppressing deterioration in physical properties due to undissolved remaining high melting point components during the mixing treatment. When the softening point or melting point is higher than this, physical properties such as curability and heat resistance tend to be lowered. Since the epoxy resin of this invention has few n = 0 components and low Mw, the characteristic of the hardened | cured material obtained from the epoxy resin composition using this improves.
本発明のエポキシ樹脂組成物は、上記の本発明のエポキシ樹脂と、硬化剤を必須成分とする。有利には、これらと無機充填材を必須成分とする。 The epoxy resin composition of the present invention contains the epoxy resin of the present invention and a curing agent as essential components. Advantageously, these and inorganic fillers are essential components.
本発明のエポキシ樹脂組成物に配合する硬化剤としては、半導体封止材等の高い電気絶縁性が要求される分野においては、多価フェノール類を硬化剤として用いることが好ましい。以下に、硬化剤の具体例を示す。 As the curing agent to be blended in the epoxy resin composition of the present invention, polyhydric phenols are preferably used as the curing agent in fields where high electrical insulation properties such as semiconductor sealing materials are required. Below, the specific example of a hardening | curing agent is shown.
多価フェノール類としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、ハイドロキノン、レゾルシン、カテコール、ビフェノール類、ナフタレンジオール類等の2価のフェノール類、更にはトリス−(4−ヒドロキシフェニル)メタン、1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン、フェノールノボラック、o−クレゾールノボラック、ナフトールノボラック、ジシクロペンタジエン型フェノール樹脂、フェノールアラルキル樹脂等に代表される3価以上のフェノール類、更にはフェノール類、ナフトール類又は、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、4,4' −ビフェノール、2,2'−ビフェノール、ハイドロキノン、レゾルシン、カテコール、ナフタレンジオール類等の2価のフェノール類とホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p−ヒドロキシベンズアルデヒド、p−キシリレングリコール、p−キシリレングリコールジメチルエーテル、ジビニルベンゼン、ジイソプロペニルベンゼン、ジメトキシメチルビフェニル類、ジビニルビフェニル、ジイソプロペニルビフェニル類等の架橋剤との反応により合成される多価フェノール性化合物、フェノール類とビスクロロメチルビフェニル等から得られるビフェニルアラルキル型フェノール樹脂、ナフトール類とパラキシリレンジクロライド等から合成されるナフトールアラルキル樹脂類等が挙げられる。 Examples of polyhydric phenols include divalent phenols such as bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, hydroquinone, resorcin, catechol, biphenols, naphthalenediols, and tris- (4-hydroxyphenyl). ) Trivalent or higher typified by methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, phenol novolak, o-cresol novolak, naphthol novolak, dicyclopentadiene type phenol resin, phenol aralkyl resin, etc. Phenols, further phenols, naphthols, or bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroxyl Divalent phenols such as ethanol, resorcin, catechol, naphthalenediols, and formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, p-xylylene glycol, p-xylylene glycol dimethyl ether, divinylbenzene, diisopropenylbenzene, dimethoxy Polyphenolic compounds synthesized by reaction with crosslinkers such as methyl biphenyls, divinyl biphenyls, diisopropenyl biphenyls, biphenyl aralkyl type phenol resins obtained from phenols and bischloromethyl biphenyls, naphthols and para Examples thereof include naphthol aralkyl resins synthesized from xylylene dichloride and the like.
また、他の硬化剤成分も使用でき、例えば、ジシアンジアミド、酸無水物類、芳香族及び脂肪族アミン類等が使用できる。本発明のエポキシ樹脂組成物には、これら硬化剤の1種又は2種以上を混合して用いることができる。 Other curing agent components can also be used, such as dicyandiamide, acid anhydrides, aromatic and aliphatic amines. In the epoxy resin composition of the present invention, one or more of these curing agents can be mixed and used.
硬化剤の配合量は、エポキシ樹脂中のエポキシ基と硬化剤の官能基(多価フェノール類の場合は水酸基)との当量バランスを考慮して配合する。エポキシ樹脂及び硬化剤の当量比は、通常、0.2から5.0の範囲であり、好ましくは0.5から2.0の範囲であり、さらに好ましくは0.8〜1.5の範囲である。これより大きくても小さくても、エポキシ樹脂組成物の硬化性が低下するとともに、硬化物の耐熱性、力学強度等が低下する。 The amount of the curing agent is blended in consideration of an equivalent balance between the epoxy group in the epoxy resin and the functional group of the curing agent (a hydroxyl group in the case of polyhydric phenols). The equivalent ratio of epoxy resin and curing agent is usually in the range of 0.2 to 5.0, preferably in the range of 0.5 to 2.0, more preferably in the range of 0.8 to 1.5. It is. If it is larger or smaller than this, the curability of the epoxy resin composition is lowered, and the heat resistance, mechanical strength and the like of the cured product are lowered.
また、このエポキシ樹脂組成物中には、エポキシ樹脂成分として、一般式(1)で表されるエポキシ樹脂以外に別種のエポキシ樹脂を配合してもよい。この場合の別種のエポキシ樹脂としては、分子中にエポキシ基を2個以上有する通常のエポキシ樹脂はすべて使用できる。例を挙げれば、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、4,4' −ビフェノール、3,3',5,5'−テトラメチル−4,4'−ジヒドロキシビフェニル、レゾルシン、ナフタレンジオール類等の2価のフェノール類のエポキシ化物、トリス−(4−ヒドロキシフェニル)メタン、1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン、フェノールノボラック、o−クレゾールノボラック等の3価以上のフェノール類のエポキシ化物、ジシクロペンタジエンとフェノール類から得られる共縮合樹脂のエポキシ化物、クレゾール類とホルムアルデヒドとアルコキシ基置換ナフタレン類から得られる共縮合樹脂のエポキシ化物、フェノール類とパラキシリレンジクロライド等から得られるフェノールアラルキル樹脂のエポキシ化物、フェノール類とビスクロロメチルビフェニル等から得られるビフェニルアラルキル型フェノール樹脂のエポキシ化物、ナフトール類とパラキシリレンジクロライド等から合成されるナフトールアラルキル樹脂類のエポキシ化物等がある。これらのエポキシ樹脂は、1種又は2種以上を混合して用いることができる。そして、エポキシ樹脂全体中の本発明のエポキシ樹脂の配合量は、5〜100wt%、好ましくは60〜100wt%の範囲であることがよく、別種のエポキシ樹脂の配合量は、0〜40wt%の範囲であることが好ましい。 Moreover, in this epoxy resin composition, you may mix | blend another kind of epoxy resin other than the epoxy resin represented by General formula (1) as an epoxy resin component. As other types of epoxy resins in this case, all ordinary epoxy resins having two or more epoxy groups in the molecule can be used. Examples include bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4′-biphenol, 3,3 ′, 5,5′-tetramethyl-4,4′-dihydroxybiphenyl, resorcin, naphthalenediols Trivalent or higher epoxides such as divalent phenols such as tris- (4-hydroxyphenyl) methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, phenol novolak, o-cresol novolak, etc. Epoxidized products of phenols, epoxidized products of cocondensation resins obtained from dicyclopentadiene and phenols, epoxidized products of cocondensation resins obtained from cresols, formaldehyde and alkoxy-substituted naphthalenes, phenols and paraxylylene dichloride Obtained from etc. E Nord aralkyl resin epoxidized product, there phenols and bis-chloromethyl biphenyl biphenyl aralkyl type phenolic resins obtained from the epoxy compound, epoxidized naphthol aralkyl resin and the like which are synthesized from naphthols and para-xylylene dichloride and the like. These epoxy resins can be used alone or in combination of two or more. And the compounding quantity of the epoxy resin of this invention in the whole epoxy resin should be 5-100 wt%, Preferably it is the range of 60-100 wt%, and the compounding quantity of another kind of epoxy resin is 0-40 wt%. A range is preferable.
更には、硬化物の応力を低減させる目的で、エポキシ樹脂組成物中に架橋弾性体を含有することもできる。架橋弾性体を配合すると、硬化物の熱衝撃テストにおけるパッケージクラックの発生を著しく少なくすることが可能である。 Furthermore, a crosslinked elastic body can be contained in the epoxy resin composition for the purpose of reducing the stress of the cured product. When a crosslinked elastic body is blended, it is possible to significantly reduce the occurrence of package cracks in a thermal shock test of a cured product.
架橋弾性体の含有量は、エポキシ樹脂100重量部に対し、3〜30重量部の範囲がよいが、好ましくは5〜20重量部であり、より好ましくは5〜15重量部である。これより小さいと低弾性が十分に発揮されない。また反対にこれより大きくなると、硬化物のTgが低くなるとともに、流動性が低くなり成形加工性に劣る傾向にある。 The content of the cross-linked elastic body is preferably in the range of 3 to 30 parts by weight with respect to 100 parts by weight of the epoxy resin, preferably 5 to 20 parts by weight, and more preferably 5 to 15 parts by weight. If it is smaller than this, low elasticity is not sufficiently exhibited. On the other hand, if it is larger than this, the Tg of the cured product is lowered, the fluidity is lowered, and the moldability tends to be inferior.
架橋弾性体としては、公知のものを用いることができるが、エポキシ樹脂との相溶性向上の観点から、スチレン系ゴム、アクリル系ゴムを用いることが好ましい。 As the cross-linked elastic body, known materials can be used, but from the viewpoint of improving compatibility with the epoxy resin, it is preferable to use styrene rubber or acrylic rubber.
無機充填材を必須成分として配合する場合、無機充填材としては、例えば、球状あるいは、破砕状の溶融シリカ、結晶シリカ等のシリカ粉末、アルミナ粉末、ガラス粉末、又はマイカ、タルク、炭酸カルシウム、アルミナ、水和アルミナ等が挙げられ、半導体封止材に用いる場合の好ましい配合量は70重量%以上であり、更に好ましくは80重量%以上である。無機充填材の形状、粒径には制限はないが、球状、破砕状、扁平状、繊維状等が使用でき、その粒径又は長径は1〜1000μmの範囲が好ましい。プリプレグとする場合の繊維状基材の繊維長は、10mm以上であることが好ましく、これに配合される無機充填材の量は、10〜70重量%の範囲であることが好ましい。 When an inorganic filler is blended as an essential component, examples of the inorganic filler include spherical or crushed fused silica, silica powder such as crystalline silica, alumina powder, glass powder, or mica, talc, calcium carbonate, and alumina. , Hydrated alumina and the like, and a preferable blending amount when used for a semiconductor encapsulant is 70% by weight or more, and more preferably 80% by weight or more. The shape and particle size of the inorganic filler are not limited, but a spherical shape, a crushed shape, a flat shape, a fiber shape, or the like can be used, and the particle size or major axis is preferably in the range of 1 to 1000 μm. When the prepreg is used, the fiber length of the fibrous base material is preferably 10 mm or more, and the amount of the inorganic filler blended therein is preferably in the range of 10 to 70% by weight.
無機充填材は、より高い熱伝導率を付与する目的で、熱伝導率が高いものほど好ましい。好ましくは20W/m・K以上、より好ましくは30W/m・K以上、さらに好ましくは50W/m・K以上である。そして、無機充填材の少なくとも一部、好ましくは50wt%以上が20W/m・K以上の熱伝導率を有する。そして、無機充填材全体としての平均の熱伝導率が、20W/m・K以上、30W/m・K以上、及び50W/m・K以上の順に好ましさが向上する。 For the purpose of imparting higher thermal conductivity, the inorganic filler is preferably as high as possible. It is preferably 20 W / m · K or more, more preferably 30 W / m · K or more, and still more preferably 50 W / m · K or more. At least a part of the inorganic filler, preferably 50 wt% or more, has a thermal conductivity of 20 W / m · K or more. The average thermal conductivity of the inorganic filler as a whole is improved in the order of 20 W / m · K or higher, 30 W / m · K or higher, and 50 W / m · K or higher.
この様な熱伝導率を有する無機充填材の例としては、窒化ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素、窒化チタン、酸化亜鉛、炭化タングステン、アルミナ、酸化マグネシウム等の無機粉末充填材等が挙げられる。 Examples of inorganic fillers having such thermal conductivity include inorganic powder fillers such as boron nitride, aluminum nitride, silicon nitride, silicon carbide, titanium nitride, zinc oxide, tungsten carbide, alumina, and magnesium oxide. It is done.
本発明のエポキシ樹脂組成物には、上記必須成分の他に、他の添加剤を加えることができる。 In addition to the above essential components, other additives can be added to the epoxy resin composition of the present invention.
本発明のエポキシ樹脂組成物中には、ポリエステル、ポリアミド、ポリイミド、ポリエーテル、ポリウレタン、石油樹脂、インデン樹脂、インデン・クマロン樹脂、フェノキシ樹脂等のオリゴマー又は高分子化合物を他の改質剤等として適宜配合してもよい。添加量は、通常、エポキシ樹脂100重量部に対して、2〜30重量部の範囲である。 In the epoxy resin composition of the present invention, an oligomer or a polymer compound such as polyester, polyamide, polyimide, polyether, polyurethane, petroleum resin, indene resin, indene-coumarone resin, phenoxy resin, etc. is used as another modifier. You may mix | blend suitably. The addition amount is usually in the range of 2 to 30 parts by weight with respect to 100 parts by weight of the epoxy resin.
また、本発明のエポキシ樹脂組成物には、顔料、難然剤、揺変性付与剤、カップリング剤、流動性向上剤等の添加剤を配合できる。 The epoxy resin composition of the present invention may contain additives such as pigments, refractory agents, thixotropic agents, coupling agents, fluidity improvers and the like.
顔料としては、有機系又は、無機系の体質顔料、鱗片状顔料等がある。揺変性付与剤としては、シリコン系、ヒマシ油系、脂肪族アマイドワックス、酸化ポリエチレンワックス、有機ベントナイト系等を挙げることができる。 Examples of the pigment include organic or inorganic extender pigments and scaly pigments. Examples of the thixotropic agent include silicon-based, castor oil-based, aliphatic amide wax, polyethylene oxide wax, and organic bentonite.
更に、本発明のエポキシ樹脂組成物には必要に応じて硬化促進剤を用いることができる。例を挙げれば、アミン類、イミダゾール類、有機ホスフィン類、ルイス酸等があり、具体的には、1,8−ジアザビシクロ(5,4,0)ウンデセン−7、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノールなどの三級アミン、2−メチルイミダゾール、2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−へプタデシルイミダゾールなどのイミダゾール類、トリブチルホスフィン、メチルジフェニルホスフイン、トリフェニルホスフィン、ジフェニルホスフィン、フェニルホスフィンなどの有機ホスフィン類、テトラフェニルホスホニウム・テトラフェニルボレート、テトラフェニルホスホニウム・エチルトリフェニルボレート、テトラブチルホスホニウム・テトラブチルボレートなどのテトラ置換ホスホニウム・テトラ置換ボレート、2−エチル−4−メチルイミダゾール・テトラフェニルボレート、N−メチルモルホリン・テトラフェニルボレートなどのテトラフェニルボロン塩などがある。添加量としては、通常、エポキシ樹脂100重量部に対して、0.2〜5重量部の範囲である。 Furthermore, a curing accelerator can be used in the epoxy resin composition of the present invention as necessary. Examples include amines, imidazoles, organic phosphines, Lewis acids, etc., specifically 1,8-diazabicyclo (5,4,0) undecene-7, triethylenediamine, benzyldimethylamine, Tertiary amines such as ethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol, 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-4-methylimidazole, 2- Imidazoles such as heptadecylimidazole, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, diphenylphosphine, and phenylphosphine, tetraphenylphosphonium tetraphenylborate, tetraphenyl Tetraphenyl such as ruphosphonium / ethyltriphenylborate, tetrabutylphosphonium / tetrabutylborate, tetrasubstituted phosphonium / tetrasubstituted borate, 2-ethyl-4-methylimidazole / tetraphenylborate, N-methylmorpholine / tetraphenylborate, etc. There is boron salt. As addition amount, it is the range of 0.2-5 weight part normally with respect to 100 weight part of epoxy resins.
更に必要に応じて、本発明の樹脂組成物には、カルナバワックス、OPワックス等の離型剤、γ-グリシドキシプロピルトリメトキシシラン等のカップリング剤、カーボンブラック等の着色剤、三酸化アンチモン等の難燃剤、ステアリン酸カルシウム等の滑剤等を使用できる。 Further, if necessary, the resin composition of the present invention includes a release agent such as carnauba wax and OP wax, a coupling agent such as γ-glycidoxypropyltrimethoxysilane, a colorant such as carbon black, and trioxide. Flame retardants such as antimony and lubricants such as calcium stearate can be used.
本発明のエポキシ樹脂組成物は、有機溶剤に一部又は全部を溶解させたワニス状態(ワニスという。)として有利に使用することができる。無機充填材等の溶剤不溶分を含む場合は、それを溶解させる必要はないが、懸濁状態にして、可級的に均一の溶液とすることが望ましい。樹脂組成物中の、エポキシ樹脂と硬化剤はその全部を溶解させることが望ましいが、本発明のエポキシ樹脂は、溶解性が優れ、保存状態において、固形分が析出しにくいという特徴を有する。ワニス中のエポキシ樹脂の一部が固形物となって分離すると、これの硬化物の特性が劣るものとなる。 The epoxy resin composition of the present invention can be advantageously used as a varnish state (referred to as varnish) in which a part or all of the epoxy resin composition is dissolved in an organic solvent. When a solvent-insoluble component such as an inorganic filler is included, it is not necessary to dissolve it, but it is desirable to make it a suspended state to obtain a uniform solution. It is desirable to dissolve the epoxy resin and the curing agent in the resin composition, but the epoxy resin of the present invention has the characteristics that the solubility is excellent and the solid content hardly precipitates in the storage state. If a part of the epoxy resin in the varnish becomes a solid and separates, the properties of the cured product are inferior.
本発明のエポキシ樹脂組成物は、有利には樹脂分を溶剤に溶解させた状態の組成物(ワニス)とした後に、ガラスクロス、アラミド不織布、液晶ポリマー系のポリエステル不織布等の繊維状の基材に含浸させた後に溶剤除去を行うことにより、エポキシ樹脂組成物と繊維状の基材を複合化したプリプレグとすることができる。また、場合により銅箔、ステンレス箔、ポリイミドフィルム、ポリエステルフィルム等のシート状物上に上記ワニスを塗布することにより積層物とすることができる。また、上記プリプレグを複数積層することにより、更にはプリプレグと上記シート状物を積層することによっても、積層物とすることができる。 The epoxy resin composition of the present invention is preferably a fibrous base material such as a glass cloth, an aramid nonwoven fabric, a liquid crystal polymer polyester nonwoven fabric, etc. after a resin component is dissolved in a solvent (varnish). By removing the solvent after impregnating, the prepreg in which the epoxy resin composition and the fibrous base material are combined can be obtained. Moreover, it can be set as a laminated body by apply | coating the said varnish on sheet-like objects, such as copper foil, stainless steel foil, a polyimide film, and a polyester film depending on the case. Moreover, it can be set as a laminated body by laminating | stacking the said prepreg two or more, and also laminating | stacking a prepreg and the said sheet-like material.
本発明のエポキシ樹脂組成物を加熱硬化させれば、エポキシ樹脂硬化物とすることができ、この硬化物は低吸湿性、高耐熱性、密着性、難燃性等の点で優れたものとなる。この硬化物は、エポキシ樹脂組成物を注型、圧縮成形、トランスファー成形等の方法により、成形加工して得ることができる。この際の温度は通常、120〜220℃の範囲である。 If the epoxy resin composition of the present invention is cured by heating, an epoxy resin cured product can be obtained, and this cured product is excellent in terms of low hygroscopicity, high heat resistance, adhesion, flame retardancy, and the like. Become. This cured product can be obtained by molding the epoxy resin composition by a method such as casting, compression molding, transfer molding or the like. The temperature at this time is usually in the range of 120 to 220 ° C.
以下、合成例、実施例及び比較例に基づき、本発明を具体的に説明する。合成例中の溶剤はジエチレングリコールジメチルエーテルである。 Hereinafter, based on a synthesis example, an Example, and a comparative example, this invention is demonstrated concretely. The solvent in the synthesis examples is diethylene glycol dimethyl ether.
合成例1(実施例1)
2Lの4口フラスコに、4,4’−ジヒドロキシビフェニル186g(1.0モル)、p−キシリレングリコール69g(0.5モル)、溶剤のジエチレングリコールジメチルエーテル743g、酸触媒としてp−トルエンスルホン酸2.55gを仕込み160℃に昇温した。次に、160℃にて攪拌しながら3時間反応させた。次に、減圧下にて溶剤を一部留去した。得られた樹脂(多価ヒドロキシ樹脂)のGPC測定におけるn=0体は27%であった。得られた樹脂237gにエピクロルヒドリン740gを仕込み溶解させた。続いて、減圧下75℃にて49%水酸化ナトリウム水溶液150.8gを4時間かけて滴下し、この滴下中に還流留出した水とエピクロルヒドリンを分離槽で分離しエピクロルヒドリンは反応容器に戻し、水は系外に除いて反応した。反応終了後、濾過により生成した塩を除き、更に水洗したのちエピクロルヒドリンを留去し、エポキシ樹脂279gを得た(エポキシ樹脂A)。得られた樹脂のエポキシ当量は185g/eq.、GPC測定におけるn=0体は25%であり、n=0成分を除いた分子量はMw:3,687, Mn:1,515, Mw/Mn:2.434であった。DSC測定におけるピーク温度(融点)は125℃、150℃における溶融粘度は0.48Pa・sであった。
Synthesis Example 1 (Example 1)
In a 2 L 4-neck flask, 186 g (1.0 mol) of 4,4′-dihydroxybiphenyl, 69 g (0.5 mol) of p-xylylene glycol, 743 g of diethylene glycol dimethyl ether as a solvent, p-toluenesulfonic acid 2 as an acid catalyst .55 g was charged and the temperature was raised to 160 ° C. Next, it was made to react for 3 hours, stirring at 160 degreeC. Next, a part of the solvent was distilled off under reduced pressure. The n = 0 body in the GPC measurement of the obtained resin (polyvalent hydroxy resin) was 27%. Into 237 g of the obtained resin, 740 g of epichlorohydrin was charged and dissolved. Subsequently, 150.8 g of a 49% aqueous sodium hydroxide solution was added dropwise at 75 ° C. under reduced pressure over 4 hours, and water and epichlorohydrin distilled under reflux during the dropping were separated in a separation tank, and epichlorohydrin was returned to the reaction vessel. Water reacted outside the system. After completion of the reaction, the salt produced by filtration was removed, and after further washing with water, epichlorohydrin was distilled off to obtain 279 g of an epoxy resin (epoxy resin A). The epoxy equivalent of the obtained resin was 185 g / eq. In the GPC measurement, n = 0 isomer was 25%, and the molecular weight excluding the n = 0 component was Mw: 3,687, Mn: 1,515, Mw / Mn: 2.434. The peak temperature (melting point) in DSC measurement was 125 ° C., and the melt viscosity at 150 ° C. was 0.48 Pa · s.
合成例2(実施例2)
2Lの4口フラスコに、4,4’−ジヒドロキシビフェニル186g(1.0モル)、p−キシリレングリコール69g(0.5モル)、溶剤743g、酸触媒としてp−トルエンスルホン酸2.55gを仕込み160℃に昇温した。次に、160℃にて攪拌しながら3時間反応させた。次に、減圧下にて溶剤を一部留去した後、トルエン415g、メチルイソブチルケトン138gを仕込み撹拌し、室温まで冷却した後、濾過により析出したn=0体を除き、溶剤を留去した。樹脂のGPC測定におけるn=0体は7%であった。得られた樹脂165gにエピクロルヒドリン477gを仕込み溶解させた。続いて、減圧下75℃にて49%水酸化ナトリウム水溶液97.1gを4時間かけて滴下し、この滴下中に還流留出した水とエピクロルヒドリンを分離槽で分離しエピクロルヒドリンは反応容器に戻し、水は系外に除いて反応した。反応終了後、濾過により生成した塩を除き、更に水洗したのちエピクロルヒドリンを留去し、エポキシ樹脂190gを得た(エポキシ樹脂B)。得られた樹脂のエポキシ当量は196g/eq.、GPC測定におけるn=0体は6%であり、n=0成分を除いた分子量はMw:3,360, Mn:1,739, Mw/Mn:1.932であった。DSC測定におけるピーク温度(融点)は109℃、150℃における溶融粘度は26.4Pa・sであった。
Synthesis Example 2 (Example 2)
In a 2 L 4-neck flask, 186 g (1.0 mol) of 4,4′-dihydroxybiphenyl, 69 g (0.5 mol) of p-xylylene glycol, 743 g of a solvent, and 2.55 g of p-toluenesulfonic acid as an acid catalyst. The temperature was raised to 160 ° C. Next, it was made to react for 3 hours, stirring at 160 degreeC. Next, after partially distilling off the solvent under reduced pressure, 415 g of toluene and 138 g of methyl isobutyl ketone were charged and stirred, and after cooling to room temperature, the n = 0 body precipitated by filtration was removed, and the solvent was distilled off. . The n = 0 body in the GPC measurement of the resin was 7%. Into 165 g of the obtained resin, 477 g of epichlorohydrin was charged and dissolved. Subsequently, 97.1 g of a 49% aqueous sodium hydroxide solution was added dropwise at 75 ° C. under reduced pressure over 4 hours, and water and epichlorohydrin refluxed during the addition were separated in a separation tank, and epichlorohydrin was returned to the reaction vessel. Water reacted outside the system. After completion of the reaction, the salt produced by filtration was removed, and after further washing with water, epichlorohydrin was distilled off to obtain 190 g of an epoxy resin (epoxy resin B). The epoxy equivalent of the obtained resin was 196 g / eq. In the GPC measurement, n = 0 isomer was 6%, and the molecular weight excluding the n = 0 component was Mw: 3,360, Mn: 1,739, Mw / Mn: 1.932. The peak temperature (melting point) in DSC measurement was 109 ° C., and the melt viscosity at 150 ° C. was 26.4 Pa · s.
合成例3
2Lの4口フラスコに、4,4’−ジヒドロキシビフェニル186g(1.0モル)、p−キシリレングリコール41g(0.3モル)、溶剤743g、酸触媒としてp−トルエンスルホン酸2.27gを仕込み160℃に昇温した。次に、160℃にて攪拌しながら3時間反応させた。次に、減圧下にて溶剤を一部留去した。得られた樹脂のGPC測定におけるn=0体は46%であった。得られた樹脂217gにエピクロルヒドリン740gを仕込み溶解させた。続いて、減圧下75℃にて49%水酸化ナトリウム水溶液137.9gを4時間かけて滴下し、この滴下中に還流留出した水とエピクロルヒドリンを分離槽で分離しエピクロルヒドリンは反応容器に戻し、水は系外に除いて反応した。反応終了後、濾過により生成した塩を除き、更に水洗したのちエピクロルヒドリンを留去し、エポキシ樹脂255gを得た(エポキシ樹脂C)。得られた樹脂のエポキシ当量は174g/eq.、GPC測定におけるn=0体は43%であった、n=0成分を除いた分子量はMw:1,875, Mn:1,118, Mw/Mn:1.677であった。DSC測定におけるピーク温度(融点)は139℃、150℃における溶融粘度は0.042Pa・sであった。
Synthesis example 3
In a 2 L four-necked flask, 186 g (1.0 mol) of 4,4′-dihydroxybiphenyl, 41 g (0.3 mol) of p-xylylene glycol, 743 g of solvent, and 2.27 g of p-toluenesulfonic acid as an acid catalyst. The temperature was raised to 160 ° C. Next, it was made to react for 3 hours, stirring at 160 degreeC. Next, a part of the solvent was distilled off under reduced pressure. The n = 0 body in the GPC measurement of the obtained resin was 46%. Into 217 g of the obtained resin, 740 g of epichlorohydrin was charged and dissolved. Subsequently, 137.9 g of a 49% aqueous sodium hydroxide solution was added dropwise at 75 ° C. under reduced pressure over 4 hours, and water and epichlorohydrin refluxed during the addition were separated in a separation tank, and epichlorohydrin was returned to the reaction vessel. Water reacted outside the system. After completion of the reaction, the salt produced by filtration was removed, and after further washing with water, epichlorohydrin was distilled off to obtain 255 g of epoxy resin (epoxy resin C). The epoxy equivalent of the obtained resin was 174 g / eq. In the GPC measurement, n = 0 isomer was 43%, and the molecular weight excluding the n = 0 component was Mw: 1,875, Mn: 1,118, Mw / Mn: 1.777. The peak temperature (melting point) in DSC measurement was 139 ° C., and the melt viscosity at 150 ° C. was 0.042 Pa · s.
合成例4
2Lの4口フラスコに、4,4’−ジヒドロキシビフェニル186g(1.0モル)、p−キシリレングリコール28g(0.2モル)、溶剤743g、酸触媒としてp−トルエンスルホン酸2.14gを仕込み160℃に昇温した。次に、160℃にて攪拌しながら3時間反応させた。次に、減圧下にて溶剤を一部留去した。得られた樹脂のGPC測定におけるn=0体は59%であった。得られた樹脂206gにエピクロルヒドリン740gを仕込み溶解させた。続いて、減圧下75℃にて49%水酸化ナトリウム水溶液131.4gを4時間かけて滴下し、この滴下中に還流留出した水とエピクロルヒドリンを分離槽で分離しエピクロルヒドリンは反応容器に戻し、水は系外に除いて反応した。反応終了後、濾過により生成した塩を除き、更に水洗したのちエピクロルヒドリンを留去し、エポキシ樹脂243gを得た(エポキシ樹脂D)。得られた樹脂のエポキシ当量は172g/eq.、GPC測定におけるn=0体は55%、DSC測定におけるピーク温度(融点)は146℃、150℃における溶融粘度は0.020Pa・sであった。
Synthesis example 4
In a 2 L four-necked flask, 186 g (1.0 mol) of 4,4′-dihydroxybiphenyl, 28 g (0.2 mol) of p-xylylene glycol, 743 g of solvent, and 2.14 g of p-toluenesulfonic acid as an acid catalyst. The temperature was raised to 160 ° C. Next, it was made to react for 3 hours, stirring at 160 degreeC. Next, a part of the solvent was distilled off under reduced pressure. The n = 0 isomer in the GPC measurement of the obtained resin was 59%. Into 206 g of the obtained resin, 740 g of epichlorohydrin was charged and dissolved. Subsequently, 131.4 g of a 49% aqueous sodium hydroxide solution was added dropwise at 75 ° C. under reduced pressure over 4 hours, and water and epichlorohydrin distilled under reflux during the dropping were separated in a separation tank, and epichlorohydrin was returned to the reaction vessel. Water reacted outside the system. After completion of the reaction, the salt produced by filtration was removed, and after further washing with water, epichlorohydrin was distilled off to obtain 243 g of an epoxy resin (epoxy resin D). The epoxy equivalent of the obtained resin was 172 g / eq. The n = 0 body in GPC measurement was 55%, the peak temperature (melting point) in DSC measurement was 146 ° C., and the melt viscosity at 150 ° C. was 0.020 Pa · s.
実施例3〜4、比較例1〜3
上記の合成例1〜4得られたエポキシ樹脂A〜D、硬化剤、無機充填材、硬化促進剤としてのトリフェニルホスフィンと、その他の添加剤を表3に示す配合割合で混練してエポキシ樹脂組成物を調製した。表中の数値は配合における重量部を示す。
Examples 3-4, Comparative Examples 1-3
Epoxy resins obtained by kneading the obtained epoxy resins A to D, curing agents, inorganic fillers, triphenylphosphine as a curing accelerator, and other additives at the blending ratios shown in Table 3 above. A composition was prepared. The numerical value in a table | surface shows the weight part in a mixing | blending.
その他の使用した成分を次に示す。なお、PNは硬化剤、球状アルミナは無機充填材、カルナバワックスは離型剤、カーボンブラックは着色剤として使用した。 Other ingredients used are shown below. PN was used as a curing agent, spherical alumina was used as an inorganic filler, carnauba wax was used as a release agent, and carbon black was used as a colorant.
エポキシ樹脂E:o-クレゾールノボラック型エポキシ樹脂(エポキシ当量200、軟化点65℃、新日鐵化学製)
PN;フェノールノボラック(PSM−4261(群栄化学製)、OH当量103、軟化点 82℃)
球状アルミナ:製品名;DAW−100、電気化学工業株式会社製、熱伝導率38W/m・K
トリフェニルホスフィン:製品名;ホクコー TPP、北興化学工業株式会社製
カルナバワックス:製品名;精製カルナバワックスNo.1、株式会社セラリカNODA製
カーボンブラック:製品名;MA−100、三菱化学株式会社製
Epoxy resin E: o-cresol novolac type epoxy resin (epoxy equivalent 200, softening point 65 ° C., manufactured by Nippon Steel Chemical Co., Ltd.)
PN: phenol novolak (PSM-4261 (manufactured by Gunei Chemical), OH equivalent 103, softening point 82 ° C.)
Spherical alumina: Product name; DAW-100, manufactured by Denki Kagaku Kogyo Co., Ltd., thermal conductivity 38 W / m · K
Triphenylphosphine: product name; Hokuko TPP, carnauba wax manufactured by Hokuko Chemical Co., Ltd .: product name; purified carnauba wax No. 1. Carbon black manufactured by Celerica NODA Co., Ltd .: Product name; MA-100, manufactured by Mitsubishi Chemical Corporation
このエポキシ樹脂組成物を用いて175℃で成形し、更に175℃にて12時間ポストキュアを行い、硬化物試験片を得た後、各種物性測定に供した。結果を表3に示す。 This epoxy resin composition was molded at 175 ° C., and further post-cured at 175 ° C. for 12 hours to obtain a cured product test piece, which was then subjected to various physical property measurements. The results are shown in Table 3.
エポキシ樹脂、エポキシ樹脂組成物及び硬化物の試験条件を次に示す。
1)エポキシ当量の測定
電位差滴定装置を用い、溶剤としてメチルエチルケトンを使用し、臭素化テトラエチルアンモニウム酢酸溶液を加え、電位差滴定装置にて0.1mol/L過塩素酸−酢酸溶液を用いて測定した。
Test conditions for the epoxy resin, the epoxy resin composition and the cured product are shown below.
1) Measurement of epoxy equivalent Using a potentiometric titrator, methyl ethyl ketone was used as a solvent, a brominated tetraethylammonium acetic acid solution was added, and a 0.1 mol / L perchloric acid-acetic acid solution was measured with a potentiometric titrator.
2)融点
示差走査熱量分析装置(エスアイアイ・ナノテクノロジー株式会社製 EXSTAR6000 DSC/6200)により、昇温速度5℃/分の条件で、DSCピーク温度を求めた。すなわち、このDSCピーク温度をエポキシ樹脂の融点とした。
2) Melting | fusing point DSC peak temperature was calculated | required on the conditions of the temperature increase rate of 5 degree-C / min with the differential scanning calorimetry apparatus (SII nanotechnology Co., Ltd. EXSTAR6000 DSC / 6200). That is, this DSC peak temperature was taken as the melting point of the epoxy resin.
3)溶融粘度
BROOKFIELD製、CAP2000H型回転粘度計を用いて、150℃にて測定した。
3) Melt viscosity The viscosity was measured at 150 ° C. using a CAP2000H rotational viscometer manufactured by BROOKFIELD.
4)ゲルタイム(秒)
JISK6910に従い、175℃にて測定した。
5)ガラス転移点(Tg)
熱機械測定装置(エスアイアイ・ナノテクノロジー株式会社製 EXSTAR6000TMA/6100)により、昇温速度10℃/分の条件でTgを求めた。
6)重量保持率(wt%)
回転枠つき恒温器を用いて、250℃における1000時間後の試験片重量と加熱前の試験片重量との差から重量保持率(wt%)を求めた。
7)曲げ強度
JISK 6911に従い、3点曲げ試験法で常温にて測定した。
4) Gel time (seconds)
According to JISK6910, it measured at 175 degreeC.
5) Glass transition point (Tg)
Tg was calculated | required on the conditions of the temperature increase rate of 10 degree-C / min with the thermomechanical measuring apparatus (SII nanotechnology Co., Ltd. product EXSTAR6000TMA / 6100).
6) Weight retention (wt%)
Using a thermostat with a rotating frame, the weight retention (wt%) was determined from the difference between the weight of the test piece after 1000 hours at 250 ° C. and the weight of the test piece before heating.
7) Bending strength According to JISK6911, it measured at normal temperature by the 3 point | piece bending test method.
8)熱伝導率
熱伝導率は、NETZSCH製LFA447型熱伝導率計を用いて非定常熱線法により測定した。
8) Thermal conductivity Thermal conductivity was measured by an unsteady hot wire method using an LFA447 type thermal conductivity meter manufactured by NETZSCH.
9)溶剤溶解性
溶剤溶解性は、溶剤にシクロペンタノンを用い、表1に示すエポキシ樹脂組成物を作成し、固形分濃度50wt%となるようにエポキシ樹脂組成物を溶解させた樹脂溶液を室温で放置し、析出物が確認されるまでの日数(時間)により評価した。結果を表2に示した。
9) Solvent Solubility Solvent solubility is a resin solution in which cyclopentanone is used as a solvent and the epoxy resin composition shown in Table 1 is prepared and the epoxy resin composition is dissolved so as to have a solid content concentration of 50 wt%. It was allowed to stand at room temperature and evaluated by the number of days (hours) until a precipitate was confirmed. The results are shown in Table 2.
Claims (10)
で表されるエポキシ樹脂において、ゲルパーミエーションクロマトグラフィーで測定した重量平均分子量(Mw)がn=0成分を除いた値で1,000〜5,000であって、n=0成分が面積%で全体の30%以下であることを特徴とするエポキシ樹脂。 The following general formula (1)
In the epoxy resin represented by the formula, the weight average molecular weight (Mw) measured by gel permeation chromatography is 1,000 to 5,000 excluding n = 0 component, and n = 0 component is area%. An epoxy resin characterized by being 30% or less of the total.
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