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JP6031405B2 - Benzotriazole compounds - Google Patents

Benzotriazole compounds Download PDF

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JP6031405B2
JP6031405B2 JP2013096263A JP2013096263A JP6031405B2 JP 6031405 B2 JP6031405 B2 JP 6031405B2 JP 2013096263 A JP2013096263 A JP 2013096263A JP 2013096263 A JP2013096263 A JP 2013096263A JP 6031405 B2 JP6031405 B2 JP 6031405B2
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謙一郎 日渡
謙一郎 日渡
晃子 田崎
晃子 田崎
哲也 池島
哲也 池島
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Adeka Corp
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Description

本発明は、特に乳化重合に好適に使用できる、ラジカル反応が可能で親水性基を有するベンゾトリアゾール化合物に関する。   The present invention relates to a benzotriazole compound capable of radical reaction and having a hydrophilic group, which can be suitably used particularly for emulsion polymerization.

2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物は、高分子材料等の光照射による劣化を防止するために用いられる紫外線吸収剤として有用である。2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物の多くは、低分子量の化合物であることから、高分子材料を加熱加工する際の揮散や、加工後の高分子材料からのブリード等の欠点があった。このため、高分子材料に2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物を結合させ、揮散やブリードを防止することを目的として、ラジカル反応性基を有する2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物(例えば、特許文献1〜4を参照)が検討されている。   The 2- (2-hydroxyphenyl) benzotriazole compound is useful as an ultraviolet absorber that is used to prevent deterioration of a polymer material or the like due to light irradiation. Since many 2- (2-hydroxyphenyl) benzotriazole compounds are low molecular weight compounds, there are drawbacks such as volatilization when heat-treating the polymer material and bleeding from the polymer material after processing. It was. Therefore, a 2- (2-hydroxyphenyl) benzotriazole compound having a radical reactive group for the purpose of bonding a 2- (2-hydroxyphenyl) benzotriazole compound to a polymer material and preventing volatilization and bleeding. (See, for example, Patent Documents 1 to 4).

特開昭60−38411号公報JP 60-38411 A 特開昭63−185969号公報JP-A 63-185969 特開平2−142778号公報JP-A-2-142778 特表2002−514662号公報Japanese translation of PCT publication No. 2002-514661

しかしながら、これらの化合物は、乳化重合時の水への分散性が不十分であることから高分子材料に均一に結合されず、紫外線の吸収効果が十分発揮できないという問題があった。   However, these compounds have a problem in that they are not uniformly bonded to the polymer material due to insufficient dispersibility in water at the time of emulsion polymerization, and the ultraviolet absorption effect cannot be sufficiently exhibited.

本発明者らは、上記課題を解決すべく、水への分散性に優れたベンゾトリアゾール化合物について種々検討を進めた結果、本発明を完成するに至った。即ち本発明は、下記一般式(1)で表されるベンゾトリアゾール化合物である。

Figure 0006031405
(式中、R1及びR2はそれぞれ独立して水素原子又は炭素数1〜5のアルキル基を表わし、R3は炭素数1〜4のアルキレン基を表わし、R4は直接結合又は炭素数1〜8の2価炭化水素基を表わし、R5は水素原子又はメチル基を表わし、Xは下記一般式(2)〜(5)のいずれかで表される基を表わし、aは0〜1000の数を表わす。)
Figure 0006031405
(式中、R6は水素原子又は炭素数1〜5のアルキル基を表わし、bは1〜1000の数を表わす。)
Figure 0006031405
(式中、R7は水素原子又は炭素数1〜5のアルキル基を表わし、cは1〜1000の数を表わす。)
Figure 0006031405
(式中、R8は炭素数1〜5のアルキル基を表わし、dは1〜1000の数を表わす。)
Figure 0006031405
(式中、R9は炭素数1〜5のアルキル基を表わし、eは1〜1000の数を表わす。) In order to solve the above-mentioned problems, the present inventors have made various studies on benzotriazole compounds having excellent dispersibility in water, and as a result, the present invention has been completed. That is, the present invention is a benzotriazole compound represented by the following general formula (1).
Figure 0006031405
(In the formula, R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R 3 represents an alkylene group having 1 to 4 carbon atoms, and R 4 represents a direct bond or a carbon number. 1 to 8 divalent hydrocarbon groups, R 5 represents a hydrogen atom or a methyl group, X represents a group represented by any one of the following general formulas (2) to (5), and a represents 0 to Represents the number 1000)
Figure 0006031405
(In the formula, R 6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and b represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and c represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 8 represents an alkyl group having 1 to 5 carbon atoms, and d represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 9 represents an alkyl group having 1 to 5 carbon atoms, and e represents a number of 1 to 1000.)

本発明の効果は、ラジカル反応性基を有し、水分散性が良好な、ベンゾトリアゾール化合物を提供したことにある。   The effect of the present invention is to provide a benzotriazole compound having a radical reactive group and good water dispersibility.

本発明の化合物A1の1H−NMRチャートである。1 is a 1 H-NMR chart of Compound A1 of the present invention. 本発明の化合物A2の1H−NMRチャートである。 1 is a 1 H-NMR chart of Compound A2 of the present invention. 本発明の化合物A3の1H−NMRチャートである。 1 is a 1 H-NMR chart of Compound A3 of the present invention.

本発明の前記一般式(1)で表されるベンゾトリアゾール化合物について説明する。
前記一般式(1)において、R1及びR2はそれぞれ独立して水素原子又は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、sec−ブチル基、t−ブチル基、イソブチル基、ペンチル基、sec−ペンチル基、t−ペンチル基、イソペンチル基等が挙げられる。R1としては、原料の入手が容易であり、紫外線吸収効果が大きいことから、水素原子、メチル基、t−ブチル基、t−ペンチル基が好ましく、メチル基、t−ブチル基が更に好ましく、t−ブチル基が最も好ましい。R2としては、原料の入手が容易であり、紫外線吸収効果が大きいことから、メチル基、t−ブチル基、t−ペンチル基が好ましく、メチル基、t−ブチル基が更に好ましく、メチル基が最も好ましい。R3は炭素数1〜4のアルキレン基を表わす。炭素数1〜4のアルキレン基としては、メチレン基、エチレン基、メチルメチレン基、プロピレン基、1−メチルエチレン基、2−メチルエチレン基、エチルメチレン基、ブチレン基、2−メチルプロピレン基等が挙げられる。R3としては、原料の入手が容易であり、副反応が少ないことから、エチレン基が好ましい。
The benzotriazole compound represented by the general formula (1) of the present invention will be described.
In the general formula (1), R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Examples of the alkyl group having 1 to 5 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, t-butyl, isobutyl, pentyl, sec-pentyl, and t-pentyl. Group, isopentyl group and the like. R 1 is preferably a hydrogen atom, a methyl group, a t-butyl group or a t-pentyl group, more preferably a methyl group or a t-butyl group, since the raw materials are easily available and the ultraviolet absorption effect is great. A t-butyl group is most preferred. R 2 is preferably a methyl group, a t-butyl group, or a t-pentyl group, more preferably a methyl group or a t-butyl group, and more preferably a methyl group because the raw material is easily available and has a large ultraviolet absorption effect. Most preferred. R 3 represents an alkylene group having 1 to 4 carbon atoms. Examples of the alkylene group having 1 to 4 carbon atoms include methylene group, ethylene group, methylmethylene group, propylene group, 1-methylethylene group, 2-methylethylene group, ethylmethylene group, butylene group, and 2-methylpropylene group. Can be mentioned. R 3 is preferably an ethylene group because raw materials are easily available and there are few side reactions.

4は直接結合又は炭素数1〜8の2価炭化水素基を表わす。R4を、R4に隣接する2つのカルボニル基と組み合わせて下記一般式(1x)で表される基としてとらえると、下記一般式(1x)で表される基は炭素数2〜10の二塩基酸から2つの水酸基を除いた残基、R4は炭素数2〜10の二塩基酸から2つのカルボキシル基を除いた残基とみることも可能である。本発明のベンゾトリアゾール化合物を製造する場合には、工業的な入手が容易であり、反応も容易であることから、原料として炭素数2〜10の二塩基酸又はその酸無水物、中でも炭素数2〜10の二塩基酸の酸無水物を使用することが好ましい。炭素数2〜10の二塩基酸としては、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、マレイン酸、フマル酸、イタコン酸、フタル酸、イソフタル酸、テレフタル酸、テトラヒドロフタル酸、1,2−シクロヘキサンジカルボン酸、1,3−シクロヘキサンジカルボン酸、1,4−シクロヘキサンジカルボン酸等が挙げられ、炭素数2〜10の二塩基酸の酸無水物としては、コハク酸無水物、マレイン酸無水物、フタル酸無水物、テトラヒドロフタル酸無水物、1,2−シクロヘキサンジカルボン酸無水物等が挙げられる。従って、R4は、炭素数2〜10の二塩基酸から2つのカルボキシル基を除いた残基であることが好ましく、コハク酸、マレイン酸、フタル酸、テトラヒドロフタル酸又は1,2−シクロヘキサンジカルボン酸から2つのカルボキシル基を除いた残基であることが更に好ましく、コハク酸から2つのカルボキシル基を除いた残基であることが最も好ましい。

Figure 0006031405
(式中、R4は一般式(1)と同義である。) R 4 represents a direct bond or a divalent hydrocarbon group having 1 to 8 carbon atoms. When R 4 is combined with two carbonyl groups adjacent to R 4 as a group represented by the following general formula (1x), the group represented by the following general formula (1x) is a group having 2 to 10 carbon atoms. A residue obtained by removing two hydroxyl groups from a basic acid, R 4 can also be regarded as a residue obtained by removing two carboxyl groups from a dibasic acid having 2 to 10 carbon atoms. In the case of producing the benzotriazole compound of the present invention, it is easy to obtain industrially and the reaction is easy, so that the dibasic acid having 2 to 10 carbon atoms or its acid anhydride, particularly the carbon number, is used as a raw material. Preference is given to using acid anhydrides of 2 to 10 dibasic acids. Examples of the dibasic acid having 2 to 10 carbon atoms include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, maleic acid, fumaric acid, itaconic acid, phthalic acid , Isophthalic acid, terephthalic acid, tetrahydrophthalic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, etc., and a dibasic acid having 2 to 10 carbon atoms Examples of the anhydride include succinic anhydride, maleic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, 1,2-cyclohexanedicarboxylic anhydride, and the like. Therefore, R 4 is preferably a residue obtained by removing two carboxyl groups from a dibasic acid having 2 to 10 carbon atoms. Succinic acid, maleic acid, phthalic acid, tetrahydrophthalic acid, or 1,2-cyclohexanedicarboxylic acid A residue obtained by removing two carboxyl groups from an acid is more preferred, and a residue obtained by removing two carboxyl groups from succinic acid is most preferred.
Figure 0006031405
(In the formula, R 4 has the same meaning as in general formula (1).)

5は水素原子又はメチル基を表わし、本発明のベンゾトリアゾール化合物の保存安定性が良好であることから、R5はメチル基が好ましい。 R 5 represents a hydrogen atom or a methyl group, and R 5 is preferably a methyl group since the storage stability of the benzotriazole compound of the present invention is good.

前記一般式(1)において、aは0〜1000の数を表わし、製造が容易であることから、aは0の数であることが好ましい。   In the said General formula (1), a represents the number of 0-1000, and since manufacture is easy, it is preferable that a is the number of 0.

前記一般式(1)において、Xは下記一般式(2)〜(5)のいずれかで表される基を表わし、本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点から、下記一般式(4)又は(5)で表される基が好ましく、下記一般式(5)で表される基が更に好ましい。

Figure 0006031405
(式中、R6は水素原子又は炭素数1〜5のアルキル基を表わし、bは1〜1000の数を表わす。)
Figure 0006031405
(式中、R7は水素原子又は炭素数1〜5のアルキル基を表わし、cは1〜1000の数を表わす。)
Figure 0006031405
(式中、R8は炭素数1〜5のアルキル基を表わし、dは1〜1000の数を表わす。)
Figure 0006031405
(式中、R9は炭素数1〜5のアルキル基を表わし、eは1〜1000の数を表わす。) In the general formula (1), X represents a group represented by any one of the following general formulas (2) to (5), and from the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, A group represented by the formula (4) or (5) is preferable, and a group represented by the following general formula (5) is more preferable.
Figure 0006031405
(In the formula, R 6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and b represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and c represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 8 represents an alkyl group having 1 to 5 carbon atoms, and d represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 9 represents an alkyl group having 1 to 5 carbon atoms, and e represents a number of 1 to 1000.)

前記一般式(2)において、R6は水素原子又は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、一般式(1)のR1及びR2で例示したアルキル基が挙げられる。R6としては原料の工業的な入手が容易であることから水素原子が好ましい。bは1〜1000の数を表わす。本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点からは、bは大きい数であることが好ましいが、あまりにも大きい場合には、分子内に占めるベンゾトリアゾール部分の割合が少なくなり、本発明のベンゾトリアゾール化合物の紫外線吸収効果が低下することから、a+bが、2〜60の数であることが好ましく、2〜30の数であることが更に好ましく、2〜15の数であることが最も好ましい。 In the general formula (2), R 6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. As a C1-C5 alkyl group, the alkyl group illustrated by R < 1 > and R < 2 > of General formula (1) is mentioned. R 6 is preferably a hydrogen atom because the raw material is easily available industrially. b represents the number of 1-1000. From the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, b is preferably a large number, but if it is too large, the proportion of the benzotriazole moiety in the molecule decreases, Since the ultraviolet absorption effect of the benzotriazole compound of the invention is reduced, a + b is preferably a number of 2 to 60, more preferably a number of 2 to 30, and a number of 2 to 15. Most preferred.

前記一般式(3)において、R7は水素原子又は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、一般式(1)のR1及びR2で例示したアルキル基が挙げられる。R7としては原料の工業的な入手が容易であることから水素原子が好ましい。cは1〜1000の数を表わす。本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点からは、cは大きい数であることが好ましいが、あまりにも大きい場合には、分子内に占めるベンゾトリアゾール部分の割合が少なくなり、本発明のベンゾトリアゾール化合物の紫外線吸収効果が低下することから、a+cが、2〜60の数であることが好ましく、2〜30の数であることが更に好ましく、2〜15の数であることが最も好ましい。 In the general formula (3), R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. As a C1-C5 alkyl group, the alkyl group illustrated by R < 1 > and R < 2 > of General formula (1) is mentioned. R 7 is preferably a hydrogen atom because it is easy to obtain industrial raw materials. c represents a number from 1 to 1000. From the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, c is preferably a large number, but if it is too large, the proportion of the benzotriazole moiety in the molecule decreases, Since the ultraviolet absorption effect of the benzotriazole compound of the invention is lowered, a + c is preferably a number of 2 to 60, more preferably a number of 2 to 30, and a number of 2 to 15. Most preferred.

前記一般式(4)において、R8は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、一般式(1)のR1及びR2で例示したアルキル基が挙げられる。R8としては、本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点から、炭素数の少ないアルキル基が好ましいが、製造が容易であることから、炭素数3〜4のアルキル基が好ましく、ブチル基又はイソブチル基が更に好ましい。dは1〜1000の数を表わす。本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点からは、dは大きい数であることが好ましいが、あまりにも大きい場合には、分子内に占めるベンゾトリアゾール部分の割合が少なくなり、本発明のベンゾトリアゾール化合物の紫外線吸収効果が低下することから、a+dが、2〜60の数であることが好ましく、2〜30の数であることが更に好ましく、2〜15の数であることが最も好ましい。 In the general formula (4), R 8 represents an alkyl group having 1 to 5 carbon atoms. As a C1-C5 alkyl group, the alkyl group illustrated by R < 1 > and R < 2 > of General formula (1) is mentioned. As R 8 , an alkyl group having a small number of carbon atoms is preferable from the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, but an alkyl group having 3 to 4 carbon atoms is preferable because of easy production. More preferred are a butyl group and an isobutyl group. d represents a number from 1 to 1000. From the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, d is preferably a large number, but if it is too large, the proportion of the benzotriazole moiety in the molecule decreases, Since the ultraviolet absorption effect of the benzotriazole compound of the invention is lowered, a + d is preferably a number of 2 to 60, more preferably a number of 2 to 30, and a number of 2 to 15. Most preferred.

前記一般式(5)において、R9は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、一般式(1)のR1及びR2で例示したアルキル基が挙げられる。R9としては、本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点から、炭素数の少ないアルキル基が好ましいが、製造が容易であることから、炭素数3〜4のアルキル基が好ましく、ブチル基又はイソブチル基が更に好ましい。eは1〜1000の数を表わす。本発明のベンゾトリアゾール化合物の水溶性又は水分散性の点からは、eは大きい数であることが好ましいが、あまりにも大きい場合には、分子内に占めるベンゾトリアゾール部分の割合が少なくなり、本発明のベンゾトリアゾール化合物の紫外線吸収効果が低下することから、a+eが、2〜60の数であることが好ましく、2〜30の数であることが更に好ましく、2〜15の数であることが最も好ましい。 In the general formula (5), R 9 represents an alkyl group having 1 to 5 carbon atoms. As a C1-C5 alkyl group, the alkyl group illustrated by R < 1 > and R < 2 > of General formula (1) is mentioned. As R 9 , an alkyl group having a small number of carbon atoms is preferable from the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, but an alkyl group having 3 to 4 carbon atoms is preferable because of easy production. More preferred are a butyl group and an isobutyl group. e represents a number from 1 to 1000. From the viewpoint of water solubility or water dispersibility of the benzotriazole compound of the present invention, e is preferably a large number, but if it is too large, the proportion of the benzotriazole moiety in the molecule decreases, and Since the ultraviolet absorption effect of the benzotriazole compound of the invention is reduced, a + e is preferably a number of 2 to 60, more preferably a number of 2 to 30, and a number of 2 to 15. Most preferred.

次に、本発明のベンゾトリアゾール化合物の製造方法について説明する。
一般式(1)で表されるベンゾトリアゾール化合物のうち、Xが一般式(2)で表される基である化合物、即ち、下記一般式(1−2)で表されるベンゾトリアゾール化合物は、下記の反応式で示すように一般式(1a)で表わされる化合物に一般式(6)で表わされる酸無水物を反応させて一般式(1b)で表わされる化合物とし、一般式(1b)で表わされる化合物のカルボキシル基を、カルボン酸クロライド基に変換して一般式(1c)で表わされる化合物とし、一般式(1c)で表わされる化合物と一般式(7)で表わされるアミン化合物とを反応させて得られる一般式(1−2a)で表わされる化合物に、更に一般式(8)で表わされる酸クロライド化合物を反応させることにより得ることができる。

Figure 0006031405
(式中、R1〜R5及びaは一般式(1)と同義であり、R6及びbは一般式(2)と同義である。) Next, the manufacturing method of the benzotriazole compound of this invention is demonstrated.
Among the benzotriazole compounds represented by the general formula (1), a compound in which X is a group represented by the general formula (2), that is, a benzotriazole compound represented by the following general formula (1-2), As shown in the following reaction formula, the compound represented by the general formula (1a) is reacted with the acid anhydride represented by the general formula (6) to obtain a compound represented by the general formula (1b). The carboxyl group of the represented compound is converted into a carboxylic acid chloride group to obtain a compound represented by the general formula (1c), and the compound represented by the general formula (1c) and the amine compound represented by the general formula (7) are reacted. It can obtain by making the compound represented by general formula (1-2a) obtained by making it react with the acid chloride compound further represented by general formula (8).
Figure 0006031405
(In formula, R < 1 > -R < 5 > and a are synonymous with General formula (1), and R < 6 > and b are synonymous with General formula (2).)

一般式(1a)で表わされる化合物のうち、aが1〜1000の数である化合物は、一般式(1a)においてaが0の数である化合物に、エチレンオキシドを付加反応することのより得ることができる。一般式(1a)においてaが0の数である化合物へのエチレンオキシドの付加は、公知の方法によればよく、例えば、水酸化ナトリウム、水酸化カリウム等を触媒として、80〜150℃で反応させればよい。一般式(1a)においてaが0の数である化合物は、特開平2−142778号公報に記載のベンゾトリアゾール化合物の製造方法により得ることができる。   Among the compounds represented by the general formula (1a), a compound in which a is a number of 1 to 1000 is obtained by addition reaction of ethylene oxide to a compound in which a is a number of 0 in the general formula (1a). Can do. Addition of ethylene oxide to a compound in which a is 0 in general formula (1a) may be carried out by a known method, for example, by reacting at 80 to 150 ° C. using sodium hydroxide, potassium hydroxide or the like as a catalyst. Just do it. In general formula (1a), a compound in which a is 0 can be obtained by the method for producing a benzotriazole compound described in JP-A-2-142778.

一般式(1a)で表わされる化合物と一般式(6)で表わされる酸無水物との反応は、トリエチルアミン等の塩基触媒、メタンスルホン酸、p−トルエンスルホン酸等の酸触媒を用いることにより行うことができる。一般式(7)で表わされるアミン化合物のうち、R6が水素原子である化合物は、ポリエチレングリコールに水素及びアンモニアを、特開平7−003009号公報、特開平8−020643号公報に記載の方法により反応させることにより得ることができる。一般式(7)で表わされるアミン化合物のうち、R6が炭素数1〜5のアルキル基である化合物は、R6が水素原子である化合物のアミノ基に公知の方法により、炭素数1〜5のアルキル基を導入すればよい。一般式(1b)で表わされる化合物のカルボキシル基は、塩化チオニル、三塩化リン等を用いることにより、カルボン酸クロライド基に変換できる。
一般式(1c)で表わされる化合物と一般式(7)で表わされるアミン化合物の反応、及び一般式(1−2a)で表わされる化合物と一般式(8)で表わされる酸クロライド化合物との反応は、ピリジン、ピリミジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。
The reaction of the compound represented by the general formula (1a) and the acid anhydride represented by the general formula (6) is performed by using a base catalyst such as triethylamine, and an acid catalyst such as methanesulfonic acid or p-toluenesulfonic acid. be able to. Among the amine compounds represented by the general formula (7), a compound in which R 6 is a hydrogen atom is a method described in Japanese Patent Application Laid-Open Nos. 7-003009 and 8-020643, in which hydrogen and ammonia are added to polyethylene glycol. It can obtain by making it react. Among the amine compounds represented by the general formula (7), a compound in which R 6 is an alkyl group having 1 to 5 carbon atoms is obtained by a known method for the amino group of the compound in which R 6 is a hydrogen atom. 5 alkyl groups may be introduced. The carboxyl group of the compound represented by the general formula (1b) can be converted to a carboxylic acid chloride group by using thionyl chloride, phosphorus trichloride or the like.
Reaction of compound represented by general formula (1c) and amine compound represented by general formula (7), and reaction of compound represented by general formula (1-2a) and acid chloride compound represented by general formula (8) May be carried out in a basic solvent such as pyridine, pyrimidine, triethylamine, tributylamine and the like.

一般式(1)で表されるベンゾトリアゾール化合物のうち、Xが一般式(3)で表される基である化合物、即ち、下記一般式(1−3)で表されるベンゾトリアゾール化合物は、下記の反応式で示すように、前記一般式(1c)で表わされる化合物と一般式(9)で表わされるアミン化合物とを反応させて得られる一般式(1−3a)で表わされる化合物に更に一般式(10)で表わされるエポキシ化合物を反応させることにより得ることができる。

Figure 0006031405
(式中、R1〜R5及びaは一般式(1)と同義であり、R7及びcは一般式(3)と同義である。) Among the benzotriazole compounds represented by the general formula (1), a compound in which X is a group represented by the general formula (3), that is, a benzotriazole compound represented by the following general formula (1-3), As shown in the following reaction formula, the compound represented by the general formula (1-3a) obtained by reacting the compound represented by the general formula (1c) with the amine compound represented by the general formula (9) is further added. It can be obtained by reacting an epoxy compound represented by the general formula (10).
Figure 0006031405
(In formula, R < 1 > -R < 5 > and a are synonymous with General formula (1), and R < 7 > and c are synonymous with General formula (3).)

一般式(1c)で表わされる化合物と一般式(9)で表わされるアミン化合物との反応は、ピリジン、ピリミジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。尚、一般式(9)で表わされるアミン化合物は、前記一般式(7)で表わされるアミン化合物と同様の化合物である。   The reaction of the compound represented by the general formula (1c) and the amine compound represented by the general formula (9) may be performed in a basic solvent such as pyridine, pyrimidine, triethylamine, tributylamine. The amine compound represented by the general formula (9) is the same compound as the amine compound represented by the general formula (7).

一般式(1)で表されるベンゾトリアゾール化合物のうち、Xが一般式(4)で表される基である化合物、即ち、下記一般式(1−4)で表されるベンゾトリアゾール化合物は、下記の反応式で示すように、前記一般式(1c)で表わされる化合物と一般式(11)で表わされるアミン化合物とを反応させて得られる一般式(1−4a)で表わされる化合物に更に一般式(8)で表わされる酸クロライド化合物を反応させることにより得ることができる。

Figure 0006031405
(式中、R1〜R5及びaは一般式(1)と同義であり、R8及びdは一般式(4)と同義である。) Among the benzotriazole compounds represented by the general formula (1), a compound in which X is a group represented by the general formula (4), that is, a benzotriazole compound represented by the following general formula (1-4), As shown in the following reaction formula, the compound represented by the general formula (1-4a) obtained by reacting the compound represented by the general formula (1c) with the amine compound represented by the general formula (11) is further added. It can be obtained by reacting an acid chloride compound represented by the general formula (8).
Figure 0006031405
(In formula, R < 1 > -R < 5 > and a are synonymous with General formula (1), and R < 8 > and d are synonymous with General formula (4).)

一般式(1c)で表わされる化合物と一般式(11)で表わされるアミン化合物との反応、及び一般式(1−4a)で表わされる化合物と一般式(8)で表わされる酸クロライド化合物の反応は、ピリジン、ピリミジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。   Reaction of a compound represented by general formula (1c) with an amine compound represented by general formula (11), and reaction of a compound represented by general formula (1-4a) with an acid chloride compound represented by general formula (8) May be carried out in a basic solvent such as pyridine, pyrimidine, triethylamine, tributylamine and the like.

一般式(11)で表わされるアミン化合物は、下記の反応式で示すように、前記一般式(12)で表わされるエポキシ化合物に一般式(13)で表わされるアミン化合物を反応させることにより得ることができる。

Figure 0006031405
The amine compound represented by the general formula (11) is obtained by reacting the epoxy compound represented by the general formula (12) with the amine compound represented by the general formula (13) as shown in the following reaction formula. Can do.
Figure 0006031405

一般式(1)で表されるベンゾトリアゾール化合物のうち、Xが一般式(5)で表される基である化合物、即ち、下記一般式(1−5)で表されるベンゾトリアゾール化合物は、下記の反応式で示すように、前記一般式(1c)で表わされる化合物と一般式(14)で表わされるアミン化合物とを反応させて得られる一般式(1−5a)で表わされる化合物に更に一般式(10)で表わされるエポキシ化合物を反応させることにより得ることができる。

Figure 0006031405
(式中、R1〜R5及びaは一般式(1)と同義であり、R9及びeは一般式(5)と同義である。) Among the benzotriazole compounds represented by the general formula (1), a compound in which X is a group represented by the general formula (5), that is, a benzotriazole compound represented by the following general formula (1-5), As shown in the following reaction formula, the compound represented by the general formula (1-5a) obtained by reacting the compound represented by the general formula (1c) with the amine compound represented by the general formula (14) is further added. It can be obtained by reacting an epoxy compound represented by the general formula (10).
Figure 0006031405
(Wherein, R 1 to R 5 and a are as in formula (1) the same meaning, R 9 and e in formula (5) interchangeably.)

一般式(1c)で表わされる化合物と一般式(14)で表わされるアミン化合物との反応は、ピリジン、ピリミジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。   The reaction of the compound represented by the general formula (1c) and the amine compound represented by the general formula (14) may be performed in a basic solvent such as pyridine, pyrimidine, triethylamine, tributylamine and the like.

一般式(14)で表わされるアミン化合物は、前記一般式(11)で表わされるアミン化合物と同様の反応により得ることができる。   The amine compound represented by the general formula (14) can be obtained by the same reaction as the amine compound represented by the general formula (11).

本発明のベンゾトリアゾール化合物は、ラジカル反応性基を有しており、他のラジカル重合性化合物と反応することが可能である。反応方式に制限はなく、塊状重合、溶液重合、懸濁重合、乳化重合の何れでも反応可能であるが、水への分散性に優れていることから、乳化重合で反応させることが好ましい。   The benzotriazole compound of the present invention has a radical reactive group and can react with other radical polymerizable compounds. There is no limitation on the reaction method, and any of bulk polymerization, solution polymerization, suspension polymerization, and emulsion polymerization can be used. However, because of its excellent dispersibility in water, the reaction is preferably carried out by emulsion polymerization.

本発明のベンゾトリアゾール化合物が使用される乳化重合に用いられるラジカル重合性化合物に特に制限はなく、例えば、スチレン、m−メチルスチレン、p−メチルスチレン、2,5−ジメチルスチレン、p−クロロスチレン、p−ブロモスチレン、ジビニルベンゼン、ジビニルナフタレン等のビニル芳香族類;(メタ)アクリル酸、クロトン酸、マレイン酸、フマル酸、シトラコン酸、イタコン酸等の不飽和カルボン酸類;メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、グリシジル(メタ)アクリレート、ベンジル(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、テトラメチレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ヘキサメチレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、グリセロールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ソルビトールペンタ(メタ)アクリレート、ソルビトールヘキサ(メタ)アクリレート等の(メタ)アクリル酸エステル類;(メタ)アクリルアルデヒド、(メタ)アクリロニトリル、(メタ)アクリルアミド等の不飽和カルボン酸誘導体類;N−ビニルピリジン、N−ビニルピロリドン等のN−ビニル化合物類;蟻酸ビニル、酢酸ビニル、プロピオン酸ビニル等のビニルエステル類;塩化ビニル、臭化ビニル、塩化ビニリデン等のハロゲン化ビニル化合物類、アリルアルコール、アリルメチルエーテル、アリルエチルエーテル、アリルメチルケトン、アリル酢酸、アリルフェノール等のアリル化合物類;N−メチロールアクリルアミド、N−エチロールアクリルアミド、N−プロパノールアクリルアミド、N−メチロールマレインアミド酸、N−メチロールマレインアミド酸エステル、N−メチロールマレイミド、N−エチロールマレイミド等のN−置換不飽和アミド類;ブタジエン、イソプレン等の共役ジエン類;ジビニルシクロヘキサン等の多官能ビニル化合物類等が挙げられる。   There is no particular limitation on the radically polymerizable compound used in the emulsion polymerization in which the benzotriazole compound of the present invention is used. For example, styrene, m-methylstyrene, p-methylstyrene, 2,5-dimethylstyrene, p-chlorostyrene , P-bromostyrene, divinylbenzene, vinyl aromatics such as divinylnaphthalene; unsaturated carboxylic acids such as (meth) acrylic acid, crotonic acid, maleic acid, fumaric acid, citraconic acid, itaconic acid; methyl (meth) acrylate , Ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, glycidyl (meth) acrylate, benzyl (meth) acrylate , Ethile Glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, tetramethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, hexamethylene glycol di (meth) acrylate, tri Methylolpropane tri (meth) acrylate, glycerol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, sorbitol penta (meth) acrylate, sorbitol hexa (Meth) acrylates such as (meth) acrylate; (meth) acrylaldehyde, (meth) acrylonitrile, Unsaturated carboxylic acid derivatives such as (meth) acrylamide; N-vinyl compounds such as N-vinylpyridine and N-vinylpyrrolidone; vinyl esters such as vinyl formate, vinyl acetate and vinyl propionate; vinyl chloride and vinyl bromide , Vinyl halide compounds such as vinylidene chloride, allyl compounds such as allyl alcohol, allyl methyl ether, allyl ethyl ether, allyl methyl ketone, allyl acetic acid, allyl phenol; N-methylol acrylamide, N-ethylol acrylamide, N- N-substituted unsaturated amides such as propanolacrylamide, N-methylol maleamic acid, N-methylol maleamic acid ester, N-methylol maleimide and N-ethylol maleimide; conjugated dienes such as butadiene and isoprene; divinyl Examples include polyfunctional vinyl compounds such as cyclohexane.

本発明のベンゾトリアゾール化合物と他のラジカル重合性化合物とを重合させて得られる重合物において、本発明のベンゾトリアゾール化合物の含有量は、該重合物の用途にもよるが、一般に、他のラジカル重合性化合物100質量部に対する本発明のベンゾトリアゾール化合物の配合量が、0.001〜2質量部であることが好ましく、0.01〜1質量部であることが更に好ましい。   In the polymer obtained by polymerizing the benzotriazole compound of the present invention and another radical polymerizable compound, the content of the benzotriazole compound of the present invention depends on the use of the polymer, but in general, other radicals It is preferable that the compounding quantity of the benzotriazole compound of this invention with respect to 100 mass parts of polymeric compounds is 0.001-2 mass parts, and it is still more preferable that it is 0.01-1 mass part.

得られた重合物は、各種プラスチック製品、塗料、接着剤、粘着剤、インク、フィルム、コーティング剤、紙塗工剤、サイズ剤、シーラー等に使用することができるが、他の物質に塗布する用途や他の物質の塗布を補助する用途である、塗料、接着剤、粘着剤、コーティング剤や、紙塗工剤、シーラー等に使用することが好ましい。   The obtained polymer can be used for various plastic products, paints, adhesives, pressure-sensitive adhesives, inks, films, coating agents, paper coating agents, sizing agents, sealers, etc., but applied to other substances. It is preferably used for paints, adhesives, pressure-sensitive adhesives, coating agents, paper coating agents, sealers, and the like, which are uses and applications that assist the application of other substances.

以下、実施例により本発明を更に説明するが、本発明はこれらの実施例によって限定されるものではない。尚、特に限定のない限り、実施例中の「部」や「%」は質量基準によるものである。   EXAMPLES Hereinafter, although an Example demonstrates this invention further, this invention is not limited by these Examples. Unless otherwise specified, “parts” and “%” in the examples are based on mass.

〔製造例1〕
撹拌装置、温度計を備えたガラス製反応容器に、2−(2−ヒドロキシ−3−t−ブチル−5−メチルフェニル)−5−(2−ヒドロキシエチル)ベンゾトリアゾール6.5g(20mmol)、無水コハク酸2.1g(21mmol)、触媒としてp−トルエンスルホン酸40mg及び溶媒としてトルエン50gを仕込み、80℃で2時間加熱撹拌し反応させた。反応終了後、水洗により副生成物を除去し、減圧してトルエンと水を除去した。続いて溶媒としてトルエン50g、触媒としてN,N−ジメチルホルムアミド100mgを仕込み、冷却しながら、塩化チオニル63g(250mmol)を15℃で30分かけて滴下し、更に、30℃で1時間撹拌して反応させた。トルエンを追加し、過剰の塩化チオニルをトルエンとの共沸により除去し、中間体Aのトルエン溶液を得た。中間体Aは一般式(1c)において、R1がt−ブチル基、R2がメチル基、R3がエチレン基、R4がコハク酸からカルボキシル基を除いた残基、aが0の数である化合物である。尚、2−(2−ヒドロキシ−3−t−ブチル−5−メチルフェニル)−5−(2−ヒドロキシエチル)ベンゾトリアゾールは、特開平2−142778号公報に記載の方法により製造した。
[Production Example 1]
In a glass reaction vessel equipped with a stirrer and a thermometer, 6.5 g (20 mmol) of 2- (2-hydroxy-3-tert-butyl-5-methylphenyl) -5- (2-hydroxyethyl) benzotriazole, 2.1 g (21 mmol) of succinic anhydride, 40 mg of p-toluenesulfonic acid as a catalyst and 50 g of toluene as a solvent were charged, and the mixture was heated and stirred at 80 ° C. for 2 hours to be reacted. After completion of the reaction, by-products were removed by washing with water, and toluene and water were removed under reduced pressure. Subsequently, 50 g of toluene as a solvent and 100 mg of N, N-dimethylformamide as a catalyst were added. While cooling, 63 g (250 mmol) of thionyl chloride was added dropwise at 15 ° C. over 30 minutes, and the mixture was further stirred at 30 ° C. for 1 hour. Reacted. Toluene was added, and excess thionyl chloride was removed by azeotropy with toluene to obtain a toluene solution of intermediate A. Intermediate A is a general formula (1c) in which R 1 is a t-butyl group, R 2 is a methyl group, R 3 is an ethylene group, R 4 is a residue obtained by removing a carboxyl group from succinic acid, and a is 0 It is a compound which is. 2- (2-Hydroxy-3-t-butyl-5-methylphenyl) -5- (2-hydroxyethyl) benzotriazole was produced by the method described in JP-A-2-142778.

〔実施例1〕
攪拌機、温度計を備えたガラス製反応容器にポリエチレングリコール400ジグリシジルエーテル4.5g(9.0mmol)、イソブチルアミン6.58g(90mmol)を仕込み、40℃で15時間加熱撹拌し反応させた後、過剰のイソブチルアミンを減圧により除去した。溶媒としてピリジン50gを仕込み、冷却しながら、中間体Aを2.0g(4.5mmol)含有するトルエン溶液を15℃で30分かけて滴下し、更に、30℃で1時間撹拌し反応させた。続いてメタクリル酸グリシジル2.82g(19.84mmol)、ヒドロキノン0.45g(4.5mmol)を加えて100℃で5時間撹拌し反応させた。反応終了後トルエン50gを追加して水洗した後、有機層から溶媒と水を減圧除去した。この反応物をトルエンに溶解後、ヘキサンにより再結晶し、生成物(収率33%、純度56%)を得た。得られた生成物が、本発明の化合物である化合物A1であることを、1H−NMRにて確認した。得られた1H−NMRのチャートを図1に示す。化合物A1は、一般式(1−5)においてR1がt−ブチル基、R2及びR5がメチル基、R3がエチレン基、R4がコハク酸からカルボキシル基を除いた残基、R9がイソブチル基、aが0、eが10の数である化合物である。
[Example 1]
A glass reaction vessel equipped with a stirrer and a thermometer was charged with 4.5 g (9.0 mmol) of polyethylene glycol 400 diglycidyl ether and 6.58 g (90 mmol) of isobutylamine and reacted by heating and stirring at 40 ° C. for 15 hours. Excess isobutylamine was removed by vacuum. Toluene solution containing 2.0 g (4.5 mmol) of Intermediate A was added dropwise at 15 ° C. over 30 minutes while charging 50 g of pyridine as a solvent, and the mixture was further stirred at 30 ° C. for 1 hour for reaction. . Subsequently, 2.82 g (19.84 mmol) of glycidyl methacrylate and 0.45 g (4.5 mmol) of hydroquinone were added and stirred at 100 ° C. for 5 hours for reaction. After completion of the reaction, 50 g of toluene was added and washed with water, and then the solvent and water were removed from the organic layer under reduced pressure. This reaction product was dissolved in toluene and recrystallized from hexane to obtain a product (yield 33%, purity 56%). It was confirmed by 1 H-NMR that the obtained product was Compound A1, which is a compound of the present invention. The obtained 1 H-NMR chart is shown in FIG. Compound A1 has the following formula (1-5): R 1 is a t-butyl group, R 2 and R 5 are methyl groups, R 3 is an ethylene group, R 4 is a residue obtained by removing a carboxyl group from succinic acid, R A compound in which 9 is an isobutyl group, a is 0, and e is a number of 10.

〔実施例2〕
実施例1において、メタクリル酸グリシジル2.82g(19.84mmol)の代わりに、塩化メタクリロイル2.10g(20.09mmol)に変更した以外は実施例1と同じ操作を行い、生成物(収率50%、純度63%)を得た。得られた生成物が、本発明の化合物である化合物A2であることを、1H−NMRにて確認した。得られた1H−NMRのチャートを図2に示す。化合物A2は、一般式(1−4)においてR1がt−ブチル基、R2及びR5がメチル基、R3がエチレン基、R4がコハク酸からカルボキシル基を除いた残基、R8がイソブチル基、aが0、dが10の数である化合物である。
[Example 2]
In Example 1, instead of 2.82 g (19.84 mmol) of glycidyl methacrylate, the same operation as in Example 1 was carried out except that methacryloyl chloride was changed to 2.10 g (20.09 mmol). %, Purity 63%). It was confirmed by 1 H-NMR that the obtained product was Compound A2, which is a compound of the present invention. The obtained 1 H-NMR chart is shown in FIG. Compound A2 has the following formula (1-4): R 1 is a t-butyl group, R 2 and R 5 are methyl groups, R 3 is an ethylene group, R 4 is a residue obtained by removing a carboxyl group from succinic acid, R A compound in which 8 is an isobutyl group, a is 0, and d is a number of 10.

〔実施例3〕
攪拌機、温度計を備えたガラス製反応容器に、2,2’−(エチレンジオキシ)ビス(エチルアミン)2.67g(18.0mmol)、溶媒としてピリジン50gを仕込み、冷却しながら、中間体Aを2.0g(4.5mmol)含有するトルエン溶液を15℃で30分かけて滴下し、更に、30℃で1時間撹拌し反応させた。反応終了後、水洗により未反応の2,2’−(エチレンジオキシ)ビス(エチルアミン)を除去した後、有機層から溶媒と水を減圧除去した。続いてメタクリル酸グリシジル2.82g(19.84mmol)、ヒドロキノン0.45g(4.5mmol)、溶媒としてトルエン100gを加えて100℃で5時間撹拌し反応させた。反応終了後トルエン50gを追加して水洗した後、有機層から溶媒と水を減圧除去した。この反応物をトルエンに溶解後、ヘキサンにより再結晶し、生成物を得た(収率35%、純度58%)。得られた生成物が、本発明の化合物である化合物A3であることを、1H−NMRにて確認した。得られた1H−NMRのチャートを図3に示す。化合物A3は、一般式(1−3)においてR1がt−ブチル基、R2及びR5がメチル基、R3がエチレン基、R4がコハク酸からカルボキシル基を除いた残基、R7が水素原子、aが0、cが2の数である化合物である。
Example 3
A glass reaction vessel equipped with a stirrer and a thermometer was charged with 2.67 g (18.0 mmol) of 2,2 ′-(ethylenedioxy) bis (ethylamine) and 50 g of pyridine as a solvent. A toluene solution containing 2.0 g (4.5 mmol) was added dropwise at 15 ° C. over 30 minutes, and the mixture was further stirred at 30 ° C. for 1 hour to be reacted. After completion of the reaction, unreacted 2,2 ′-(ethylenedioxy) bis (ethylamine) was removed by washing with water, and then the solvent and water were removed from the organic layer under reduced pressure. Subsequently, 2.82 g (19.84 mmol) of glycidyl methacrylate, 0.45 g (4.5 mmol) of hydroquinone and 100 g of toluene as a solvent were added, and the mixture was stirred and reacted at 100 ° C. for 5 hours. After completion of the reaction, 50 g of toluene was added and washed with water, and then the solvent and water were removed from the organic layer under reduced pressure. This reaction product was dissolved in toluene and recrystallized from hexane to obtain a product (yield 35%, purity 58%). It was confirmed by 1 H-NMR that the obtained product was Compound A3, which is a compound of the present invention. The obtained 1 H-NMR chart is shown in FIG. Compound A3 has a general formula (1-3) in which R 1 is a t-butyl group, R 2 and R 5 are methyl groups, R 3 is an ethylene group, R 4 is a residue obtained by removing a carboxyl group from succinic acid, R A compound in which 7 is a hydrogen atom, a is 0, and c is a number 2.

Figure 0006031405
Figure 0006031405

Figure 0006031405
Figure 0006031405

Figure 0006031405
Figure 0006031405

Figure 0006031405
Figure 0006031405

実施例1〜3で得られた化合物A1〜A3、上記の比較の化合物B1〜B3、重合性モノマーとしてのアクリル酸ブチル、アクリル酸メチル及びアクリル酸、並びに上記乳化剤Cを、下記表1に示す質量比にて配合して、実施例4〜9及び比較例1〜4のモノマー溶液を調製し、下記の乳化重合方法にて乳化重合を行い乳化重合物を得た。各乳化重合物は下記の方法にて光沢保持率を測定した。結果を下記表1に示す。尚、光沢保持率が高いほど、紫外線吸収効果が優れ、長期間維持されることを示す。   The compounds A1 to A3 obtained in Examples 1 to 3, the comparative compounds B1 to B3, butyl acrylate, methyl acrylate and acrylic acid as polymerizable monomers, and the emulsifier C are shown in Table 1 below. It mix | blended by mass ratio, the monomer solution of Examples 4-9 and Comparative Examples 1-4 was prepared, emulsion polymerization was performed with the following emulsion polymerization method, and the emulsion polymer was obtained. Each emulsion polymer was measured for gloss retention by the following method. The results are shown in Table 1 below. In addition, it shows that the higher the gloss retention, the better the ultraviolet absorption effect and the longer it can be maintained.

〔乳化重合方法〕
撹拌機、温度計及び窒素導入管を備えたガラス製反応容器に、脱イオン水120gを仕込み、系内を窒素ガスで置換した。モノマー溶液10gと過硫酸アンモニウム0.08gとを添加した後60℃に昇温し、モノマー溶液90gを2時間かけて滴下し、滴下終了後、更に60℃で2時間撹拌して熟成し乳化重合物を得た。
[Emulsion polymerization method]
A glass reaction vessel equipped with a stirrer, a thermometer and a nitrogen introduction tube was charged with 120 g of deionized water, and the system was replaced with nitrogen gas. After adding 10 g of the monomer solution and 0.08 g of ammonium persulfate, the temperature was raised to 60 ° C., 90 g of the monomer solution was added dropwise over 2 hours, and after completion of the dropwise addition, the mixture was further aged by stirring for 2 hours at 60 ° C. Got.

〔光沢保持率〕
上記乳化重合物を、50mm×70mmのガラス板に厚さ1mmになるように塗布し、12時間風乾後、100℃恒温槽で1時間乾燥したものを試験片とした。下記測定条件にて各試験片の光沢を測定した後、下記条件にて促進耐候性試験を行い、促進耐候性試験後の各試験片の光沢を測定した。この促進耐候性試験前の光沢に対する促進耐候性試験後の光沢の100分率を光沢保持率とした。
<光沢の測定条件> 使用機器:精密光沢計(村上色彩技術研究所製、型式:GM26D)、測定角:60°
<促進耐候性試験の条件> 使用機器:サンシャインウエザオメーター(スガ試験機製、型式:WEL−SUN−HCH−B)、試験条件:温度:63±3℃、サイクル:120分中18分降雨、試験時間:2,000時間
[Gloss retention]
The emulsion polymer was applied to a 50 mm × 70 mm glass plate to a thickness of 1 mm, air-dried for 12 hours, and then dried in a 100 ° C. constant temperature bath for 1 hour to obtain a test piece. After measuring the gloss of each test piece under the following measurement conditions, an accelerated weather resistance test was performed under the following conditions, and the gloss of each test piece after the accelerated weather resistance test was measured. The gloss retention after 100 minutes of the gloss after the accelerated weather resistance test with respect to the gloss before the accelerated weather resistance test was determined.
<Gloss measurement conditions> Equipment used: Precision gloss meter (Murakami Color Research Laboratory, Model: GM26D), Measurement angle: 60 °
<Conditions for accelerated weathering test> Equipment used: Sunshine weatherometer (manufactured by Suga Test Instruments, model: WEL-SUN-HCH-B), test conditions: temperature: 63 ± 3 ° C., cycle: rain for 18 minutes in 120 minutes, Test time: 2,000 hours

Figure 0006031405
Figure 0006031405

表1の結果から、実施例4〜9の試験片は光沢保持率が高く、本発明のベンゾトリアゾール化合物を使用した乳化重合物から得られる塗膜が、厳しい自然環境の条件下においても長期間、優れた紫外線吸収効果を維持できることを示している。これは、本発明のベンゾトリアゾール化合物が、ラジカル反応性基により他のモノマーと反応して塗膜を形成しているだけでなく、乳化重合において、反応系で分散することにより塗膜中に均一に存在するためと考えられる。   From the results of Table 1, the test pieces of Examples 4 to 9 have a high gloss retention, and the coating film obtained from the emulsion polymer using the benzotriazole compound of the present invention has a long period even under severe natural environment conditions. This indicates that an excellent ultraviolet absorption effect can be maintained. This is because not only the benzotriazole compound of the present invention reacts with other monomers by a radical reactive group to form a coating film, but also in emulsion polymerization, it is uniform in the coating film by being dispersed in the reaction system. It is thought that it exists in.

Claims (2)

下記一般式(1)で表されるベンゾトリアゾール化合物。
Figure 0006031405
(式中、R1及びR2はそれぞれ独立して水素原子又は炭素数1〜5のアルキル基を表わし、R3は炭素数1〜4のアルキレン基を表わし、R4は直接結合又は炭素数1〜8の2価炭化水素基を表わし、R5は水素原子又はメチル基を表わし、Xは下記一般式(2)〜(5)のいずれかで表される基を表わし、aは0〜1000の数を表わす。)
Figure 0006031405
(式中、R6は水素原子又は炭素数1〜5のアルキル基を表わし、bは1〜1000の数を表わす。)
Figure 0006031405
(式中、R7は水素原子又は炭素数1〜5のアルキル基を表わし、cは1〜1000の数を表わす。)
Figure 0006031405
(式中、R8は炭素数1〜5のアルキル基を表わし、dは1〜1000の数を表わす。)
Figure 0006031405
(式中、R9は炭素数1〜5のアルキル基を表わし、eは1〜1000の数を表わす。)
A benzotriazole compound represented by the following general formula (1).
Figure 0006031405
(In the formula, R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R 3 represents an alkylene group having 1 to 4 carbon atoms, and R 4 represents a direct bond or a carbon number. 1 to 8 divalent hydrocarbon groups, R 5 represents a hydrogen atom or a methyl group, X represents a group represented by any one of the following general formulas (2) to (5), and a represents 0 to Represents the number 1000)
Figure 0006031405
(In the formula, R 6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and b represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and c represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 8 represents an alkyl group having 1 to 5 carbon atoms, and d represents a number of 1 to 1000.)
Figure 0006031405
(In the formula, R 9 represents an alkyl group having 1 to 5 carbon atoms, and e represents a number of 1 to 1000.)
請求項1に記載のベンゾトリアゾール化合物と他のラジカル重合性化合物とを重合させて得られる重合物。   A polymer obtained by polymerizing the benzotriazole compound according to claim 1 and another radical polymerizable compound.
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