JP6019310B1 - 蒸着装置及び蒸着装置による成膜工程を含む製造方法 - Google Patents
蒸着装置及び蒸着装置による成膜工程を含む製造方法 Download PDFInfo
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000000034 method Methods 0.000 title claims description 5
- 230000005540 biological transmission Effects 0.000 claims abstract description 68
- 230000008021 deposition Effects 0.000 claims abstract description 17
- 230000033001 locomotion Effects 0.000 claims description 48
- 239000012528 membrane Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000009987 spinning Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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Abstract
Description
図4(a)及び図4(c)に示すように、第1のギヤ部150のアイドラーギヤ1501は、一方でドーム310の回転軸軸受部に取り付けられた固定ギヤ3101に係合し、他方で第1のギヤ部150の駆動ギヤ1503に係合している。第1のギヤ部150はドーム310上に固定されているので、ドーム310が中心軸の周りに回転すると、固定ギヤ3101に係合したアイドラーギヤ1501が回転させられる。さらに、アイドラーギヤ1501が回転すると、アイドラーギヤ1501に係合した駆動ギヤ1503が回転させられる。駆動ギヤ1503の回転運動は、スパイラルギヤ1505によって回転伝達軸155Aの回転運動に変換される。このように、第1のギヤ部150は、ドーム310の回転運動から、回転伝達軸155Aの回転運動を生じさせる。
Claims (5)
- 中心軸の周りに回転するように構成されたドームと、
該中心軸を囲んで該ドーム上に配置される環状のチェーンと、
該ドームの回転運動を伝達する伝達軸と、
該ドームの回転運動を該伝達軸の回転運動に変換する第1のギヤ部と、
チェーン駆動スプロケットを備え、該伝達軸の回転運動を該チェーン駆動スプロケットの回転運動に変換する第2のギヤ部と、
該ドーム上に該環状のチェーンに沿って配置され、該ドームに固定される固定部と、該固定部に回転可能に支えられた第1の内部伝達軸と、該固定部に回転可能に支えられた揺動軸に固定され、揺動するように構成された揺動部と、該第1の内部伝達軸にユニバーサルジョイントで結合され、該揺動部に回転可能に支えられた第2の内部伝達軸と、該第2の内部伝達軸によって支えられ、トレイを保持するように構成された回転部とを備えたトレイ保持具と、を備えた蒸着装置であって、
該ドームの回転によって、該チェーン駆動スプロケットを回転させて該環状のチェーンを駆動し、該環状のチェーンの運動によって該トレイ保持具の該第1の内部伝達軸を回転させ、該第1の内部伝達軸の回転によって、該回転部が、該第2の内部伝達軸とともに回転し、該揺動部とともに揺動するように構成された蒸着装置。 - 複数の環状のチェーンと、該複数の環状のチェーンのそれぞれに対応する複数の伝達軸と、を備えた請求項1に記載の蒸着装置。
- 該トレイ保持具は、クランク回転板とクランクロッドを含むクランク機構を備え、該クランク回転板は、該第1の内部伝達軸の回転によって回転するように構成され、該クランクロッドは、該クランク回転板と該揺動部を結合し、該第1の内部伝達軸の回転によって該揺動部を揺動させるように構成された請求項1に記載の蒸着装置。
- 該トレイ保持具は、揺動による、基準位置からのトレイの面の傾き角度の最大値を変えることができるように、該クランクロッドの、該クランク回転板への結合位置の該クランク回転板の中心位置からの距離を変更することができるように構成された請求項3に記載の蒸着装置。
- 中心軸の周りに回転するように構成されたドームと、
該中心軸を囲んで該ドーム上に配置された環状のチェーンと、
該ドームの回転運動を伝達する伝達軸と、
該ドームの回転運動を該伝達軸の回転運動に変換する第1のギヤ部と、
チェーン駆動スプロケットを備え、該伝達軸の回転運動を該チェーン駆動スプロケットの回転運動に変換する第2のギヤ部と、
該ドーム上に該環状のチェーンに沿って配置され、蒸着装置のドームに固定される固定部と、該固定部に回転可能に支えられた第1の内部伝達軸と、該固定部に回転可能に支えられた揺動軸に固定され、揺動するように構成された揺動部と、該第1の内部伝達軸にユニバーサルジョイントで結合され、該揺動部に回転可能に支えられた第2の内部伝達軸と、該第2の内部伝達軸によって支えられ、トレイを保持するように構成された回転部とを備えたトレイ保持具と、を備えた蒸着装置による成膜工程を含む製造方法であって、
該ドームの回転によって、該チェーン駆動スプロケットを回転させて該環状のチェーンを駆動し、該環状のチェーンの運動によって該トレイ保持具の該第1の内部伝達軸を回転させ、該第1の内部伝達軸の回転によって、該回転部が、該第2の内部伝達軸とともに回転し、該揺動部とともに揺動するようにしながら、該トレイ保持具に保持されたトレイに取り付けられたワークに蒸着によって膜を生成する、蒸着装置による成膜工程を含む製造方法。
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JP2015084205A JP6019310B1 (ja) | 2015-04-16 | 2015-04-16 | 蒸着装置及び蒸着装置による成膜工程を含む製造方法 |
US15/095,325 US10507488B2 (en) | 2015-04-16 | 2016-04-11 | Deposition apparatus and manufacturing process including film forming step by deposition apparatus |
CN201610227063.XA CN106048550B (zh) | 2015-04-16 | 2016-04-13 | 蒸镀装置及包含基于蒸镀装置的成膜工序的制造方法 |
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JP6019310B1 (ja) * | 2015-04-16 | 2016-11-02 | ナルックス株式会社 | 蒸着装置及び蒸着装置による成膜工程を含む製造方法 |
FR3058424B1 (fr) * | 2016-11-10 | 2022-06-10 | Bnl Eurolens | Installation de depot par evaporation d'un revetement sur des articles |
JP7581692B2 (ja) * | 2020-08-03 | 2024-11-13 | 株式会社島津製作所 | ブレーズド回折格子およびブレーズド回折格子の製造方法 |
DE102023200603A1 (de) * | 2023-01-26 | 2024-08-01 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen einer Spiegelanordnung, sowie Beschichtungsanlage |
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CN106048550A (zh) | 2016-10-26 |
US20160303607A1 (en) | 2016-10-20 |
JP2016204681A (ja) | 2016-12-08 |
US10507488B2 (en) | 2019-12-17 |
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