JP6000589B2 - Solid-state imaging device - Google Patents

Description

  The present invention relates to a solid-state imaging device including a plurality of photoelectric conversion elements that convert incident light into electrical signals.

  Conventionally, as a pixel circuit of a MOS type solid-state imaging device, a pixel circuit described in FIG. Patent Document 1 includes a configuration in which pixels are arranged two-dimensionally and means for electrically connecting floating diffusions (hereinafter also referred to as “FD”) of pixels adjacent in the vertical direction via a connection switch. Is disclosed.

JP 2009-33316 A

  In the configuration as shown in FIG. 4 of Patent Document 1, the condition for turning on the FD connection transistor that connects the FDs of adjacent pixels is (gate high voltage of FD connection transistor) − (FD reset voltage)> ( FD connection transistor threshold). If the threshold value of the FD connection transistor is high, the FD connection transistor is not turned on and the FD voltage cannot be averaged. Therefore, the reset voltage of the FD shifts for each connected FD, and the correct reference voltage (dark level) is read out. I can't. As a result, the image quality deteriorates because the subtraction between the optical signal voltage and the reference voltage cannot be performed correctly.

  An object of the present invention is to enable a FD connection transistor to be reliably turned on when the FD connection transistor is turned on in a solid-state imaging device having the FD connection transistor.

  The solid-state imaging device of the present invention is a solid-state imaging device having a plurality of pixels arranged two-dimensionally, wherein the pixels are generated by a photoelectric conversion element that generates charges by photoelectric conversion and the photoelectric conversion element. A transfer transistor for transferring the charged charge, a floating diffusion for holding the charge transferred by the transfer transistor, an amplifying unit for outputting a signal corresponding to the charge of the floating diffusion, and a reset transistor for resetting the potential of the floating diffusion And a connection transistor for connecting the floating diffusions of a plurality of the pixels, wherein a threshold value of the connection transistor is lower than a threshold value of the reset transistor.

  According to the present invention, the connection transistor for connecting the floating diffusions can be reliably turned on by setting the threshold value of the connection transistor lower than the threshold value of the reset transistor. This makes it possible to read out a correct reference voltage and obtain a correct image signal.

It is a figure which shows the structural example of the solid-state imaging device by the 1st Embodiment of this invention. It is a figure which shows the detailed structural example of the solid-state imaging device shown in FIG. FIG. 6 is a timing diagram illustrating an operation example of the solid-state imaging apparatus according to the first embodiment. It is a pixel circuit diagram of the solid-state imaging device by the 2nd Embodiment of this invention. It is a pixel circuit diagram of the solid-state imaging device by the 2nd Embodiment of this invention. It is a pixel layout figure of the solid-state imaging device by the 3rd Embodiment of this invention. It is a pixel layout figure of the solid-state imaging device by the 4th Embodiment of this invention. It is a pixel circuit diagram of the solid-state imaging device by the 5th Embodiment of this invention. It is a pixel circuit diagram of the solid-state imaging device by the 5th Embodiment of this invention. It is a figure which shows the structural example of the imaging system by the 6th Embodiment of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First embodiment)
A first embodiment of the present invention will be described.
FIG. 1 is a block diagram illustrating a configuration example of the solid-state imaging device according to the first embodiment. The solid-state imaging device includes a pixel array A, a pixel constant current source 102, a vertical scanning circuit 103, a signal amplification unit 104, a signal holding unit 105, a signal amplification unit and signal holding unit control unit 106, and a switch 107. The solid-state imaging device also includes a horizontal scanning circuit 108, an output amplifier 109, horizontal output lines 217 and 218, and horizontal output lines 217 and 218 with a reset unit 111.

  The pixel array A has a plurality of pixels 101, and these pixels 101 are arranged two-dimensionally so as to form a plurality of rows and a plurality of columns. FIG. 1 shows an example in which the pixel array A is composed of pixels 101 arranged in 3 rows and 3 columns, but this is intended to simplify the description. It is not intended to limit the configuration of array A. The pixel 101 includes a photoelectric conversion element that generates charges by photoelectric conversion, and a signal obtained by the photoelectric conversion element is supplied to the signal amplification unit 104 via a column signal line.

  The signal amplifying unit 104 is configured to read a signal from the pixel array A. The signal holding unit 105 holds the signal read by the signal amplification unit 104. The output amplifier 109 is configured to read out the signal held in the signal holding unit 105 via the switch 107. The signal amplification unit 104 and the signal holding unit 105 may be provided for each column or may be provided for each of a plurality of columns.

  The vertical scanning circuit 103 typically includes a shift resist, and selects a row in the pixel array A. The horizontal scanning circuit 108 typically includes a shift resist, and selects a column in the pixel array A. In this example, a column in the pixel array A is selected by selectively activating the switch 107 so that a signal is transferred from the signal holding unit 105 to the output amplifier 109. The reset unit 111 resets the horizontal output lines 217 and 218 to a predetermined potential.

  FIG. 2 is a diagram illustrating a detailed configuration example of the pixel 101 (101a, 101b), the signal amplifying unit 104, the signal holding unit 105, and the reset unit 111. The pixel unit 101a includes, for example, a photodiode (photoelectric conversion element) 201a, a transfer transistor 202a, an amplification transistor (source follower transistor) 203a, a reset transistor 204a, and a selection transistor 205a. The pixel unit 101b includes, for example, a photodiode 201b, a transfer transistor 202b, an amplification transistor (source follower transistor) 203b, a reset transistor 204b, and a selection transistor 205b. The pixel portion 101a includes a floating diffusion (hereinafter also referred to as “FD”) connection transistor 206a, and the pixel portion 101b includes an FD connection transistor 206b.

  The photodiode 201a generates charges by photoelectric conversion. The charge generated by photoelectric conversion in the photodiode 201a is transferred to the FD 207a by the transfer transistor 202a. This electric charge determines the potential of the FD 207a. The FD 207a is a common node with the gate of the amplification transistor 203a. A signal based on the charge transferred to the FD 207a is amplified by the amplification transistor 203a and output to the column signal line 110 through the selection transistor 205a. The column signal line 110 is connected to the constant current source 102 to constitute a source follower circuit. The pixel portion 101b is configured similarly to the pixel portion 101a and is connected to the column signal line 110.

  The FD 207a is connected to the reset transistor 204a, and the FD 208b is connected to the reset transistor 204b. Between the FD 207a and the FD 207b, an FD connection transistor 206a that makes the FD 207a and the FD 207b conductive or non-conductive is provided. When the FD connection transistor 206a is turned off, the signals of the respective photodiodes 201a and 201b can be individually output. When the FD connection transistor 206a is turned on, the signal charges of the adjacent photodiodes 201a and 201b are added on the FD. Can be output. The reset transistors 204a and 204b and the amplification transistors 203a and 203b are connected to the power source SVDD of the pixel.

  In the pixel portion 101a, the drive line PTX_a is connected to the gate electrode of the transfer transistor 202a. A drive line PRES_a is connected to the gate electrode of the reset transistor 204a. A drive line PSEL_a is connected to the gate electrode of the selection transistor 205a. A drive line PADD_a is connected to the gate electrode of the FD connection transistor 206a. The same applies to the pixel portion 101b.

  The signal amplifying unit 104 includes, for example, a clamp capacitor 230, an inverting amplifier 208, a feedback capacitor 209, a clamp switch 210, and the like. The column signal line 110 is connected to one end of the clamp capacitor 230 of the signal amplification unit 104. The feedback capacitor 209 and the clamp switch 210 are connected in parallel between the input terminal and the output terminal of the inverting amplifier 208.

  The output terminal of the signal amplification unit 104 is connected to the signal holding unit 105. The signal holding unit 105 includes switches 211 and 212 and holding capacitors 213 and 214, for example. The holding capacitors 213 and 214 preferably have the same capacitance value. The output terminal of the signal amplification unit 104 is connected to the holding capacitors 213 and 214 via the switches 211 and 212, respectively. The control unit 106 controls the clamp switch 210 and the switches 211 and 212.

  The signals held in the holding capacitors 213 and 214 are turned on by the column selection switches 215 and 216 in accordance with the PH pulse provided from the horizontal scanning circuit 108, whereby the horizontal output line (noise component) 217 and the horizontal output line (optical signal). Component) 218. The holding capacitors 213 and 214 respectively hold N (noise) output and S (optical signal) output, and the output amplifier 109 amplifies and outputs the difference between the N output and the S output.

  The reset unit 111 includes switches 219 and 220, for example. A horizontal output line (noise component) 217 is connected to the voltage VCHR via the switch 219, and a horizontal output line (optical signal component) 218 is connected to the voltage VCHR via the switch 220. By turning on the switches 219 and 220 at the timing of the drive pulse PCHR, the horizontal output line (noise component) 217 and the horizontal output line (optical signal component) 218 are reset.

FIG. 3 is a timing diagram illustrating an operation example of the solid-state imaging device illustrated in FIGS. 1 and 2. The operation of the solid-state imaging device will be described with reference to FIG.
In the initial state at time t0, the reset signals PRES_a and PRES_b are at a high level (ON state), and the FD 207a and FD 207b are reset by the reset voltage SVDD via the reset transistors 204a and 204b. Further, the signal PADD_a is at a high level, and the FD 207a and the FD 207b are electrically connected via the FD connection transistor 206a. The signal PCHR is at a high level, and the horizontal output lines 217 and 218 are reset to the voltage VCHR.

  At time t1, the selection signals PSEL_a and PSEL_b input to the gates of the selection transistors 205a and 205b become high level. As a result, the selection transistors 205a and 205b are turned on, and the amplification transistors 203a and 203b are activated. In this state, since the reset transistors 204a and 204b are on, the FD 207a and FD 207b are reset by the reset voltage SVDD. At time t2, the clamp pulse PC0R becomes high level, the clamp switch 210 is turned on, the inverting amplifier 208 enters the unity gain buffer state, and the voltage of VC0R is output.

  At time t3, the reset signals PRES_a and PRES_b input to the gates of the reset transistors 204a and 204b become low level, the reset transistors 204a and 204b are turned off, and the potentials of the FD 207a and FD 207b are fixed to the black signal level. Since the FD connection transistor 206a is on, the FD 207a and the FD 207b have the same potential, and the reference potential VN of the column signal line 110 is determined. At time t4, the clamp pulse PC0R becomes low level, the clamp switch 210 is turned off, and the reference potential VN of the column signal line 110 is clamped.

  At time t5, the PTN pulse becomes high level, the switch 211 of the signal holding unit 105 is turned on, and writing of a value obtained by adding the voltage of VC0R and the offset voltage of the inverting amplifier 208 to the holding capacitor 213 starts. At time t6, the PTN pulse becomes low level, and this writing is completed.

  At time t7, the transfer pulses PTX_a and PTX_b that are input to the gates of the transfer transistors 202a and 202b become high level. Accordingly, the transfer transistors 202a and 202b are turned on, and the signal charges of the photodiodes 201a and 201b are transferred to the FD 207a and FD 207b. At time t8, the transfer pulses PTX_a and PTX_b become low level, and the transfer of signal charges is completed. Here, since the FD connection transistor 206a is on, the signal charges of the photodiodes 201a and 201b are added on the FD 207a and the FD 207b to have the same potential. After that, at time t9, the PTS pulse becomes high level, the switch 212 of the signal holding unit 105 is turned on, and a signal is written in the holding capacitor 214.

  As the transfer pulses PTX_a and PTX_b become high level, the potential of the column signal line 110 changes from VN to VS. When the signal charge is an electron, the relationship is VS <VN. The voltage change amount (VS−VN) is inverted by the ratio (C0 / Cf) of the capacitance value C0 of the clamp capacitor 230 and the capacitance value of the feedback capacitor 209, the voltage of VC0R, and the offset voltage of the inverting amplifier 208. And are added. The added voltage is written to the holding capacitor 214 via the switch 212 of the signal holding unit 105. At time t10, the PTS pulse is set to low level, the switch 212 is turned off, and this writing is completed.

  Thereafter, at time t11, the reset signals PRES_a and PRES_b become high level, the reset transistors 204a and 204b are turned on, and the FD 207a and FD 207b are reset. At the same time, the selection signals PSEL_a and PSEL_b are set to the low level, and the selection transistors 205a and 205b are turned off. Thereby, the selection of the line is released. Thereafter, at time t12, the column selection switches 215 and 216 are turned on by the PH pulse provided from the horizontal scanning circuit 108, and the output amplifier 109 calculates the difference between the N output and the S output, and outputs an image signal. This is completed at time t13, and thereafter, the signals of each column are sequentially output by alternately resetting the horizontal output lines 217 and 218 by PCHR and column selection by PH pulse.

  Here, bias conditions of each transistor in the period from time t1 to time t2 will be described. When the voltage SVDD is 5.0V, the gate high voltage of the reset transistors 204a and 204b is 5.0V, and the threshold value (Vth) of the reset transistor is 0.3V, the voltages of the FDs 207a and 207b are 4.7V. At this time, it is assumed that the gate high voltage of the FD connection transistor 206a is 5.0V and the threshold value of the FD connection transistor 206a is 0.4V. In this case, the expression (gate high voltage of FD connection transistor) − (FD reset voltage)> (threshold value of FD connection transistor) cannot be satisfied, and the FD connection transistor 206a cannot be turned on. After that, at time t7, the transfer pulses PTX_a and PTX_b input to the gates of the transfer transistors 202a and 202b become high level, and the signal charges of the photodiodes 201a and 201b are transferred to the FDs 207a and 207b, so that the potential of the FD becomes descend. As a result, it is assumed that the potentials of the FDs 207a and 207b are 4.0V. In this state, the expression (gate high voltage of FD connection transistor) − (reset voltage of FD)> (threshold value of FD connection transistor) can be satisfied, and the FD connection transistor 206a is turned on. When the FD connection transistor 206a is turned on, the channel capacity becomes visible. Therefore, the capacity of the FDs 207a and 207b differs between the output of the reference voltage VN and the output of the signal voltage VS, and the output linearity deteriorates. In order to prevent such inconvenience, in this embodiment, the threshold of the FD connection transistor 206 is set lower than that of other transistors such as the reset transistor 204. For example, by setting the threshold value of the FD connection transistor 206 to 0.1 V, the FD connection transistor 206a is reliably turned on regardless of the influence of power supply fluctuation or manufacturing variation of the threshold value. As a result, it is possible to read the reference voltage VN and read the addition signal voltage VS of the signal charge while keeping the capacitance in the FDs 207a and 207b constant, and a correct image signal can be obtained by (S−N). .

  In the operation example described above, two of the selection transistors 205a and 205b are turned on, and signals are output from the amplification transistors 203a and 203b. However, the present invention is not limited to this. For example, the selection signal PSEL_b may be fixed at a low level, the selection transistor 205b may be turned off, and the signal may be output only by the amplification transistor 203a. However, the use of the two amplification transistors 203a and 203b doubles the effective area of the amplification transistor, so that 1 / f noise caused by the amplification transistor can be reduced. Further, by using two of the amplification transistors 203a and 203b, the channel width of the amplification transistor is effectively doubled, so that the overdrive voltage can be reduced and the dynamic range of the column signal line 110 is expanded. It becomes possible.

(Second Embodiment)
Next, a second embodiment of the present invention will be described.
FIG. 4 is a pixel circuit diagram of the solid-state imaging device according to the second embodiment. In the pixel of the solid-state imaging device illustrated in FIG. 4, a photodiode 201a1 is connected to the FD 207a via a transfer transistor 202a1, and a photodiode 201a2 is connected to the FD 207a via a transfer transistor 202a2. In addition, a photodiode 201b1 is connected to the FD 207a via a transfer transistor 202b1, and a photodiode 201b2 is connected to the FD 207a via a transfer transistor 202b2. That is, the structure shown in FIG. 4 has a structure in which there are two pairs of pixels having a common FD for two photodiodes, and the FD 207a and the FD 207b are connected by the FD connection transistor 206a.

  The charge generated by photoelectric conversion in the first photodiode 201a1 is transferred to the FD 207a by the transfer transistor 202a1. In addition, the charge generated by the photoelectric conversion in the second photodiode 201a2 is transferred to the FD 207a by the transfer transistor 202a2. Similarly, the charge generated by photoelectric conversion in the third photodiode 201b1 is transferred to the FD 207b by the transfer transistor 202b1. In addition, the charge generated by the photoelectric conversion in the fourth photodiode 201b2 is transferred to the FD 207b by the transfer transistor 202b2.

  In this case, in the case of a Bayer color filter, the first photodiode PD201a1 and the third photodiode PD201b1 have the same color, and the second photodiode PD201a2 and the fourth photodiode 201b2 have the same color. Is possible.

  Note that the read timing is basically the same although the transfer pulse PTX and the like increase in addition to those shown in FIG. The bias conditions of each transistor are basically the same as those in the first embodiment. By making the threshold value of the FD connection transistor 206a lower than the threshold value of the reset transistor 204a, the FD connection transistor 206a can be reliably turned on regardless of the influence of power supply fluctuation or manufacturing variation of the threshold value. Accordingly, it is possible to read the reference voltage VN and read the signal charge addition signal voltage VS while keeping the capacitances in the FDs 207a and 207b constant, and a correct image signal can be obtained.

  In the present embodiment, a pixel structure having one common FD for two photodiodes is shown, but the present invention is not limited to this. As shown in FIG. 5, for example, a pixel structure having one FD common to a plurality of photodiodes, such as a pixel structure having one FD common to three photodiodes, has the same effect. is there.

(Third embodiment)
Next, a third embodiment of the present invention will be described.
FIG. 6 is a diagram illustrating a pixel layout of the solid-state imaging device according to the third embodiment. The reference numerals in the figure correspond to the circuit diagram shown in FIG. The pixel portion 101a includes a photodiode 201a, a transfer transistor 202a, an amplification transistor 203a, a reset transistor 204a, a selection transistor 205a, an FD connection transistor 206a, an FD 207a, and a well contact 601. The well contact 601 is for fixing the well of the pixel portion to the reference potential (0 V), and is connected to the reference potential SGND of the pixel. In the pixel portion 101a, the drive line PTX_a is connected to the gate electrode of the transfer transistor 202a. A drive line PRES_a is connected to the gate electrode of the reset transistor 204a. A drive line PSEL_a is connected to the gate electrode of the selection transistor 205a. A drive line PADD_a is connected to the gate electrode of the FD connection transistor 206a. The same applies to the pixel portion 101b.

  In the third embodiment, ion implantation for lowering the threshold values of the FD connection transistors 206a and 206b is performed in the dotted frame in FIG. That is, the impurity doping amount for the channel regions of the FD connection transistors 206a and 206b is made different from the impurity doping amount for the channel regions of other transistors such as the reset transistor 204a. Thereby, the threshold values of the FD connection transistors 206a and 206b can be lowered as compared with other transistors. N-type impurities are ion-implanted when the FD connection transistors 206a and 206b are NMOS transistors, and P-type impurities are ion-implanted when the transistors are PMOS transistors.

  According to the third embodiment, the FD connection transistors 206a and 206b can be reliably turned on regardless of the influence of power supply fluctuations and manufacturing variations in threshold values. Therefore, it is possible to read the reference voltage VN and read the signal charge addition signal voltage VS with a constant capacitance in the FDs 207a and 207b, and a correct image signal can be obtained.

(Fourth embodiment)
Next, a fourth embodiment of the present invention will be described.
FIG. 7 is a diagram illustrating a pixel layout of the solid-state imaging device according to the fourth embodiment. The reference numerals in the figure are the same as those shown in FIG. In the fourth embodiment, in order to lower the threshold values of the FD connection transistors 206a and 206b, the channel lengths L of the FD connection transistors 206a and 206b are made shorter than other transistors such as the reset transistors 204a and 204b. As a result, the threshold value of the FD connection transistors 206a and 206b can be lowered due to the short channel effect, and the FD connection transistors 206a and 206b can be reliably turned on regardless of the influence of power supply fluctuations and manufacturing variations of threshold values. . Therefore, it is possible to read the reference voltage VN and read the signal charge addition signal voltage VS with a constant capacitance in the FDs 207a and 207b, and a correct image signal can be obtained. Here, since the FD connection transistors 206a and 206b are operated as an ON fixed switch or an OFF fixed switch, the side effect of the short channel effect does not appear in the output as long as punch-through does not occur. The fourth embodiment has an advantage that the ion implantation process can be reduced as compared with the third embodiment.

(Fifth embodiment)
Next, a fifth embodiment of the present invention will be described.
8 and 9 are pixel circuit diagrams of the solid-state imaging device according to the fifth embodiment. In the above-described embodiment, the example in which the FD connection transistor 206 that makes the floating diffusions in the vertical direction (column direction) conductive or non-conductive is provided. However, the floating diffusions in the horizontal direction (row direction), or the floating diffusions in the vertical direction (column direction) and the horizontal direction (row direction) may be made conductive or non-conductive.

  FIG. 8 shows an example in which an FD connection transistor 206 is provided to make the FDs of the floating diffusions in the horizontal direction (row direction), that is, the FDs of the pixels arranged in the same row conductive or non-conductive. In the example shown in FIG. 8, there is an effect that the same color addition in the horizontal direction is possible. Further, FIG. 9 shows conduction or non-conduction between vertical diffusion (column direction) and horizontal (row direction) floating diffusions, that is, FD of pixels arranged in the same column and FD of pixels arranged in the same row. An example in which an FD connection transistor 206 is provided is shown. In the example shown in FIG. 9, there is an effect that the same color addition in the vertical direction and the horizontal direction is possible. The driving method may be basically the same as the method described in the first embodiment.

  Also in the examples shown in FIGS. 8 and 9, by making the threshold of the FD connection transistor 206 lower than the threshold of the reset transistor 204, the FD connection transistor 206 can be surely connected regardless of the influence of power supply fluctuation or manufacturing variation of the threshold. It can be turned on. Accordingly, it is possible to read the reference voltage VN and read the signal charge addition signal voltage VS with a constant capacitance in the FD, and a correct image signal can be obtained.

(Sixth embodiment)
FIG. 10 is a diagram illustrating a configuration example of an imaging system (still video camera) according to the sixth embodiment. The imaging system is a system using the solid-state imaging device according to any embodiment described above. The configuration of the imaging system will be described. The barrier 1 serves as a protection for the lens 2 and a main switch. The lens 2 forms an optical image of the subject on the solid-state imaging device 4. The diaphragm 3 varies the amount of light that has passed through the lens 2. The solid-state imaging device 4 corresponds to the solid-state imaging device of the above-described embodiment, and takes in the subject imaged by the lens 2 as an image signal. The imaging signal processing circuit 5 performs various correction, clamping, and other processes on the image signal output from the solid-state imaging device 4. The A / D converter 6 performs analog-digital conversion of the image signal output from the imaging signal processing circuit 5. The signal processing unit 7 performs various corrections on the image data output from the A / D converter 6 and compresses the data. The timing generation unit 8 outputs various timing signals to the solid-state imaging device 4, the imaging signal processing circuit 5, the A / D converter 6, and the signal processing unit 7. Each circuit of 5 to 8 may be formed on the same chip as the solid-state imaging device 4. The overall control / calculation unit 9 controls various computations and the entire imaging system. The memory unit 10 temporarily stores image data. The recording medium control interface unit 11 performs recording or reading on the recording medium 12. The recording medium 12 is a detachable medium such as a semiconductor memory for recording or reading image data. An external interface (I / F) unit 13 communicates with an external computer or the like.

  Next, the operation of FIG. 10 will be described. When the barrier 1 is opened, the main power supply is turned on, the control system power supply is turned on, and the power supply of the imaging system circuit such as the A / D converter 6 is turned on. Then, in order to control the exposure amount, the overall control / arithmetic unit 9 opens the aperture 3, and the signal output from the solid-state imaging device 4 passes through the imaging signal processing circuit 5 to the A / D converter 6. Is output. The A / D converter 6 performs A / D conversion on the signal and outputs it to the signal processing unit 7. The signal processing unit 7 performs an exposure calculation by the overall control / calculation unit 9 based on the data.

  The brightness is determined based on the result of the photometry, and the overall control / calculation unit 9 controls the diaphragm 3 according to the result. Next, based on the signal output from the solid-state imaging device 4, the high-frequency component is extracted and the distance to the subject is calculated by the overall control / calculation unit 9. Thereafter, the lens 2 is driven to determine whether or not it is in focus. When it is determined that the lens is not in focus, the lens 2 is driven again to perform distance measurement.

  Then, after the in-focus state is confirmed, the main exposure starts. When the exposure is completed, the image signal output from the solid-state imaging device 4 is corrected in the imaging signal processing circuit 5, further A / D converted by the A / D converter 6, and totally controlled through the signal processing unit 7. Accumulated in the memory unit 10 by the arithmetic unit 9 Thereafter, the data stored in the memory unit 10 is recorded on a removable recording medium 12 such as a semiconductor memory through the recording medium control I / F unit 11 under the control of the overall control / arithmetic unit 9. Further, the image may be processed by directly entering the computer or the like through the external I / F unit 13.

  The above-described embodiments are merely examples of implementation in carrying out the present invention, and the technical scope of the present invention should not be construed as being limited thereto. That is, the present invention can be implemented in various forms without departing from the technical idea or the main features thereof.

101 pixels, 110 column signal lines, 201 photodiodes, 202 transfer transistors, 203 amplification transistors, 204 reset transistors, 205 selection transistors, 206 FD connection transistors, 207 floating diffusion (FD)

Claims (8)

A solid-state imaging device having a plurality of pixels arranged two-dimensionally,
The pixel is
A photoelectric conversion element that generates charges by photoelectric conversion; and
A transfer transistor for transferring the charge generated by the photoelectric conversion element;
A floating diffusion holding the charge transferred by the transfer transistor;
An amplifier that outputs a signal corresponding to the charge of the floating diffusion;
A reset transistor for resetting the potential of the floating diffusion,
A connection transistor for connecting the floating diffusions of the plurality of pixels;
A solid-state imaging device, wherein a threshold value of the connection transistor is lower than a threshold value of the reset transistor. Before SL solid-state imaging device according to claim 1, wherein the doping amount of impurity for the channel region and the doping amount of impurity for the channel region of the reset transistor are different from each other in the connected transistors. A solid-state imaging device having a plurality of pixels arranged two-dimensionally,
The pixel is
A photoelectric conversion element that generates charges by photoelectric conversion; and
A transfer transistor for transferring the charge generated by the photoelectric conversion element;
A floating diffusion holding the charge transferred by the transfer transistor;
An amplifier that outputs a signal corresponding to the charge of the floating diffusion;
A reset transistor for resetting the potential of the floating diffusion,
A connection transistor for connecting the floating diffusions of the plurality of pixels;
A solid-state imaging device, wherein a channel length of the connection transistor is shorter than a channel length of the reset transistor.   4. The solid-state imaging device according to claim 1, wherein a plurality of the transfer transistors are commonly connected to one floating diffusion. 5.   5. The solid-state imaging device according to claim 1, wherein charges of the plurality of photoelectric conversion elements are added by the plurality of floating diffusions connected by the connection transistor. 6. The transfer transistor according to claim 1, wherein when the connection transistor is on, the transfer transistors of the plurality of pixels connected to the floating diffusion by the connection transistor operate in synchronization. Solid-state imaging device. The pixel includes a selection transistor for connecting the amplification unit and a column signal line,
7. The selection transistor according to claim 1, wherein when the connection transistor is on, the selection transistors of a plurality of the pixels connected to the floating diffusion by the connection transistor operate in synchronization. Solid-state imaging device. The pixel includes a selection transistor for connecting the amplification unit and a column signal line,
7. The device according to claim 1, wherein when the connection transistor is turned on, the selection transistors of the plurality of pixels to which the floating diffusion is connected by the connection transistor are turned on in parallel. The solid-state imaging device described.

Images