JP5881948B2 - 高透明性を有する三次元物品を製造するための光硬化型樹脂組成物 - Google Patents
高透明性を有する三次元物品を製造するための光硬化型樹脂組成物 Download PDFInfo
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- JP5881948B2 JP5881948B2 JP2010535087A JP2010535087A JP5881948B2 JP 5881948 B2 JP5881948 B2 JP 5881948B2 JP 2010535087 A JP2010535087 A JP 2010535087A JP 2010535087 A JP2010535087 A JP 2010535087A JP 5881948 B2 JP5881948 B2 JP 5881948B2
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- acrylate
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- 239000011342 resin composition Substances 0.000 title 1
- 239000000203 mixture Substances 0.000 claims description 179
- 150000001875 compounds Chemical class 0.000 claims description 96
- -1 oxetane compound Chemical class 0.000 claims description 91
- 239000004593 Epoxy Substances 0.000 claims description 56
- 150000003254 radicals Chemical class 0.000 claims description 34
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 33
- 239000012952 cationic photoinitiator Substances 0.000 claims description 32
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- 239000012949 free radical photoinitiator Substances 0.000 claims description 20
- 230000005855 radiation Effects 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 238000001723 curing Methods 0.000 claims description 17
- 229910052787 antimony Inorganic materials 0.000 claims description 16
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
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- 125000002091 cationic group Chemical group 0.000 claims description 10
- 239000004615 ingredient Substances 0.000 claims description 10
- 239000004480 active ingredient Substances 0.000 claims description 8
- 125000002723 alicyclic group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 230000005670 electromagnetic radiation Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
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- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 claims description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
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- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
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- 125000000524 functional group Chemical group 0.000 description 9
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 8
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
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- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 5
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 5
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- 229910052731 fluorine Inorganic materials 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 5
- 229940059574 pentaerithrityl Drugs 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
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- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 4
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 4
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
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- 125000000623 heterocyclic group Chemical group 0.000 description 4
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 4
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- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
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- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 4
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- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 3
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- CQAIBOSCGCTHPV-UHFFFAOYSA-N bis(1-hydroxycyclohexa-2,4-dien-1-yl)methanone Chemical class C1C=CC=CC1(O)C(=O)C1(O)CC=CC=C1 CQAIBOSCGCTHPV-UHFFFAOYSA-N 0.000 description 3
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- 150000007513 acids Chemical class 0.000 description 2
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- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
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- 230000008313 sensitization Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 150000005075 thioxanthenes Chemical class 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- ANEFWEBMQHRDLH-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl) borate Chemical class FC1=C(F)C(F)=C(F)C(F)=C1OB(OC=1C(=C(F)C(F)=C(F)C=1F)F)OC1=C(F)C(F)=C(F)C(F)=C1F ANEFWEBMQHRDLH-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
- Y10T428/24868—Translucent outer layer
- Y10T428/24884—Translucent layer comprises natural oil, wax, resin, gum, glue, gelatin
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Epoxy Resins (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Description
なし
連邦政府により資金援助を受けた研究開発に関する記述
なし
性光開始剤、0.01−10重量%のフリーラジカル光開始剤、および1つ以上の随意の成分を含有し、重量でのパーセントが光硬化型組成物の全重量を基準とするものである、低粘度光硬化型組成物を提供する。
(a)少なくとも1つのポリグリシジルエポキシ化合物と場合によっては少なくとも1つのオキセタンを含むカチオン硬化型成分;
(b)少なくとも1つのエトキシル化もしくはプロポキシル化ポリ(メタ)アクリレートまたはそれらの混合物と、場合によっては非芳香族ポリ(メタ)アクリレート
を含む、フリーラジカル活性成分;
(c)アンチモンを含まないカチオン性光開始剤;
(d)フリーラジカル光開始剤;および
(e)1つ以上の随意の成分
を含有し、
硬化後光硬化型組成物が高い強度を有する、無色透明な物品を生じる光硬化型組成物を提供する。一つの態様においては、成分a)は、縮合していてもよく、もしくは縮合していなくてもよい、水素化芳香族および/または多環状の脂肪族基を含有するポリグリシジル化合物である。
第1の必須成分として、本発明の光硬化型組成物は、光硬化型組成物の全重量基準で約
35−80重量%の、好ましくは約40−70重量%のカチオン硬化型成分を含む。カチオン硬化型成分は、カチオンにより開始される開環機構により、もしくはその結果として反応して、ポリマー網目を形成する能力のある官能基を有することを特徴とする少なくとも1つのカチオン硬化型化合物を包含する。このような官能基の例は、オキシラン(エポキシド)−、オキセタン−、テトラヒドロフラン−、およびラクトン環を化合物中に含む。このような化合物は、脂肪族、芳香族、脂環式(縮合環系を含む)、アリール脂環式、水素化芳香族もしくはヘテロ環構造を有し得、ならびにこれらは環基を側鎖基として含有し得、もしくは官能基は脂環式環もしくはヘテロ環系の一部を形成することができる。カチオン硬化型化合物は、二官能性、三官能性であり得るか、もしくは3個より多いカチオン硬化型基を含有し得る。
とホルムアルデヒドとの縮合生成物であるペンダント基もしくは鎖付きのフェノールのグリシジルエーテル、もしくはシロキサンジグリシジルをベースとするものである。このような化合物の水素化物が極めて好ましい。
例は、ジチオール、例えばエタン−1,2−ジチオールまたはビス(4−メルカプトメチルフェニル)エーテルから誘導されるジ−S−グリシジル誘導体である。
loxide(登録商標)3000、Epolead GT−300、Epolead GT−302、Epolead GT−400、Epolead401、Epolead403(すべてDaicel Chemical Industries Co.,Ltd.から入手可能)DCA、脂環式エポキシ(Asahi Denka Co.Ltdから入手可能);およびE1、グリシジル基により官能基化された2,2−ジメチロールプロピオン酸の重縮合により得られるエポキシハイパー分岐型ポリマー(Perstorp
ABから入手可能)。
トリス(3−エチル−3−オキセタニルメチル)エーテル、ペンタエリスリトールテトラキス(3−エチル−3−オキセタニルメチル)エーテル、ポリエチレングリコールビス(3−エチル−3−オキセタニルメチル)エーテル、ジペンタエリスリトールヘキサキス(3−エチル−3−オキセタニルメチル)エーテル、ジペンタエリスリトールペンタキス(3−エチル−3−オキセタニルメチル)エーテル、ジペンタエリスリトールテトラキス(3−エチル−3−オキセタニルメチル)エーテル、カプロラクトン変成ジペンタエリスリトールヘキサキス(3−エチル−3−オキセタニルメチル)エーテル、カプロラクトン変成ジペンタエリスリトールペンタキス(3−エチル−3−オキセタニルメチル)エーテル、ジトリメチロールプロパンテトラキス(3−エチル−3−オキセタニルメチル)エーテル、EO変成ビスフェノールAビス(3−エチル−3−オキセタニルメチル)エーテル、PO変成ビスフェノールAビス(3−エチル−3−オキセタニルメチル)エーテル、EO変成水素化ビスフェノールAビス(3−エチル−3−オキセタニルメチル)エーテル、PO変成水素化ビスフェノールAビス(3−エチル−3−オキセタニルメチル)エーテル、EO変成ビスフェノールF(3−エチル−3−オキセタニルメチル)エーテルなどを包含する。
OXT−101、OXT−121、OXT−211、OXT−212、OXT−221、OXT−610、およびOX−SQ(Toagosei Co.Ltd.から入手可能)を包含する。
%の、好ましくは約40−60重量%の、なおさらに好ましくは約45−55重量%の範囲で光硬化型組成物中に存在し得る。
第2の必須の成分として、本発明の光硬化型組成物は、光硬化型組成物の全重量基準で少なくとも約5重量%から約60重量%の、好ましくは20重量%以上で約40重量%未満の、さらに好ましくは25重量%以上で約40重量%未満の量でフリーラジカル活性成分を含む。フリーラジカル活性成分は、フリーラジカル重合を開始する能力のある開始剤の存在において活性化される少なくとも1つのフリーラジカル活性化合物を含んで、フリーラジカル活性官能基を担持する他の化合物との反応に使用可能である。
ン、フェノキシエチル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、ペンタクロロフェニル(メタ)アクリレート、ペンタブロモフェニル(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、ボルニル(メタ)アクリレートとメチルトリエチレンジグリコール(メタ)アクリレート、およびこれらの混合物を包含する。
のような化合物の例は、UVR−6105と1等量のメタクリル酸との反応生成物である。エポキシおよびフリーラジカル活性官能基を有する市販の化合物は、Daicel Chemical Industries Ltd.,Japanから入手可能なCyclomer M−100、M−101、A−200、およびA−400などの「Cyclomer」シリーズと、UCB Chemical Corp.から入手可能なEbecryl−3605および−3700を包含する。
第3の必須の成分として、本発明の光硬化型組成物は、光硬化型組成物の全重量基準で約0.1−10重量%のカチオン性光開始剤を含む。
とには、上述の水素化フェノール系化合物とポリ(メタ)アクリレートから誘導されるものなどの既知の緩反応性のポリグリシジルエポキシ化合物は、アンチモンを含まないカチオン性光開始剤と合体されると、無色透明な最終硬化物体中で良好な硬化感度、高精度、および機械的性質の良好なバランスを有する光硬化型組成物を生じるということが判明した。
R1、R2、およびR3は、各々それぞれ独立に非置換であるか、もしくは好適な基により置換されているC6−18アリールであり、
Qはホウ素またはリンであり、
Xはハロゲン原子であり、ならびに
mはQの原子価プラス1に相当する整数である)
化合物である。C6−18アリールの例は、フェニル、ナフチル、アントリル、およびフェナントリルである。好適な基は、アルキル、好ましくはメチル、エチル、n−プロピル
、イソプロピル、n−ブチル、sec−ブチル、iso−ブチル、tert−ブチル、または種々のペンチルもしくはヘキシル異性体などのC1−6アルキル、アルコキシ、好ましくはメトキシ、エトキシ、プロポキシ、ブトキシ、ペンチルオキシ、またはヘキシルオキシなどのC1−6アルコキシ、アルキルチオ、好ましくはメチルチオ、エチルチオ、プロピルチオ、ブチルチオ、ペンチルチオ、またはヘキシルチオなどのC1−6アルキルチオ、フッ素、塩素、臭素またはヨウ素などのハロゲン、アミノ基、シアノ基、ニトロ基、またはフェニルチオなどのアリールチオを包含する。好ましいQXm基はBF4およびPF6を包含する。使用に好適なQXm基のさらなる例は、ペルフルオロフェニルボレート、例えばテトラキス(ペルフルオロフェニル)ボレートである。
Denka Co.Ltd.)、Degacure KI85(Degussa Corp.)、およびSarCat KI−85(Sartomer Co.Inc.から入手可能);(iii)SP−150(Asahi Denka Co.Ltd.)ビス[4−(ジ(4−(2−ヒドロキシエチル)フェニル)スルホニオ)−フェニル]スルフィドビス−ヘキサフルオロホスフェート;(iv)Esacure(登録商標)1187(Lamberti s.p.a.)変成スルホニウムヘキサフルオロホスフェート塩;(v)クメニルシクロペンタジエニル鉄(II)ヘキサフルオロホスフェート、Irgacure(登録商標)261(Ciba Specialty Chemicals)、ナフタレニルシクロペンタジエニル鉄(II)ヘキサフルオロホスフェート、ベンジルシクロペンタジエニル鉄(II)ヘキサフルオロホスフェート、シクロペンタジエニルカルバゾール鉄(II)ヘキサフルオロホスフェートを含むメタロセン塩;(vi)UV1242ビス(ドデシルフェニル)ヨードニウムヘキサフルオロホスフェート(Deuteron)、UV2257ビス(4−メチルフェニル)ヨードニウムヘキサフルオロホスフェート(Deuteron)、およびOmnicat 440(IGM Resins B.V.)、Irgacure(登録商標)250(Ciba Specialty Chemicals)(4−メチルフェニル)(4−(2−メチルプロピル)フェニル)ヨードニウムヘキサフルオロホスフェートを含むヨードニウム塩;(vii)Omnicat 550(IGM Resins B.V.)10−ビフェニル−4−イル−2−イソプロピル−9−オキソ−9H−チオキサンテン−10iumヘキサフルオロホスフェート、Omnicat 650(IGM Resins B.V.)10−ビフェニル−4−イル−2−イソプロピル−9−オキソ−9H−チオキサンテン−10iumヘキサフルオロホスフェートとポリオールとの付加物を含むチオキサンテン塩;および(2)Rhodorsil 2074(Rhodia)(トリルクミル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレートを含むペンタフルオロフェニルボレート塩を包含する。アンチモンを含まないカチオン性光開始剤は、1つのアンチモンを含まないカチオン性光開始剤または2つ以上のアンチモンを含まないカチオン性光開始剤の混合物を含有し得る。
開始剤は、光硬化型組成物の全重量基準で約0.1−10重量%の、好ましくは約0.5−8重量%の、さらに好ましくは約2−7重量%の範囲で存在する
本発明の光硬化型組成物は、光硬化型組成物の全重量基準で0.01−10重量%の、好ましくは約1−5重量%のフリーラジカル光開始剤も含む。フリーラジカル光開始剤は、ラジカル光重合の開始に慣用されるものから選択され得る。フリーラジカル光開始剤の例は、ベンゾイン、例えばベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインフェニルエーテルなどのベンゾインエーテル、およびベンゾインアセテート;アセトフェノン、例えばアセトフェノン、2,2−ジメトキシアセトフェノン、および1,1−ジクロロアセトフェノン;ベンジルケタール、例えばベンジルジメチルケタールおよびベンジルジエチルケタール;アントラキノン、例えば2−メチルアントラキノン、2−エチルアントラキノン、2−tertブチルアントラキノン、1−クロロアントラキノン、および2−アミルアントラキノン;トリフェニルホスフィン;ベンゾイルホスフィンオキシド、例えば2,4,6−トリメチルベンゾイル−ジフェニルホスフィンオキシド(Luzirin TPO);ビスアシルホスフィンオキシド;ベンゾフェノン、例えばベンゾフェノンおよび4,4’−ビス(N,N’−ジメチルアミノ)ベンゾフェノン;チオキサントンおよびキサントン;アクリジン誘導体;フェナジン誘導体;キノキサリン誘導体;1−フェニル−1,2−プロパンジオン2−O−ベンゾイルオキシム;4−(2−ヒドロキシエトキシ)フェニル−(2−プロピル)ケトン(Irgacure(登録商標)2959);1−アミノフェニルケトンまたは1−ヒドロキシフェニルケトン、例えば1−ヒドロキシシクロヘキシルフェニルケトン、2−ヒドロキシイソプロピルフェニルケトン、フェニル1−ヒドロキシイソプロピルケトン、および4−イソプロピルフェニル1−ヒドロキシイソプロピルケトンを包含する。
本発明の光硬化型組成物は、光硬化型組成物の全重量基準で0−40重量%の、好ましくは約0.0001−40重量%の1つ以上の随意の成分も含み得る。
、参照によりこの明細書に組み込まれている、米国特許第4,853,434号で開示されている方法により製造され得る。この特許は、繊維補強プラスチック、構造用接着剤、積層プラスチックの製造、およびラッカーのアニーリングにおいて有用な反応性粒子を開示している。
EP2240に対してはビスフェノールAグリシジルエーテル中に、Albidur VE3320に対してはビスフェノールAビニルエステル中に、ならびにAlbidur
EP5340に対しては脂環式エポキシド中に分散され得る。
、なおさらに好ましくは少なくとも約1.5重量%の反応性粒子を含有し得る。もう一つの態様においては、存在する反応性粒子は、光硬化型組成物の全重量基準で多くとも約40重量%、さらに好ましくは多くとも約15重量%、なおさらに好ましくは多くとも約10重量%である。さらにもう一つの態様においては、反応性粒子は、光硬化型組成物の全重量基準で約0.01−40重量%の、好ましくは約0.5−15重量%の、なおさらに好ましくは約1−5重量%の反応性粒子の範囲で存在する。
、光の存在しない状態で、所望ならば約30℃から約60℃までの範囲の若干高い温度で行われる。さらには、光硬化型組成物は、50−1000cpsの、好ましくは70−700cpsの範囲の25℃での粘度を有することが望ましい。
(i)引っ張り弾性率(MPa);少なくとも2000
(ii)破断伸び(%);少なくとも7
(iii)引っ張り強度(MPa);少なくとも35
(iv)曲げ弾性率(MPa);少なくとも1000、好ましくは1600−2600
(v)曲げ強度(MPa);少なくとも50
(vi)ノッチ付きアイゾット衝撃(ft−lbs/in);少なくとも0.5、好ましくは0.66−0.86。
域で第1の層を硬化させるのに充分な化学線照射に第1の層をモデルのそれぞれの断面層に対応するパターンで露光すること;硬化した第1の層上に光硬化型組成物の第2の層を形成すること;像形成された領域で第2の層を硬化させるのに充分な化学線照射に第2の層をモデルのそれぞれの断面層に対応するパターンで露光すること;および前の2つの段階を繰り返して、連続層を所望のように形成し、三次元物品を形成することにより、物品のモデルにしたがって三次元物品を逐次的な断面層で製造するための方法を包含する。これらの物品は、種々の用途、例えば、化粧品業界、自動車業界、航空機業界、および消費者業界で使用可能である。例えば、三次元物品は、容器、ヘッドライト、シェードまたは装飾用物体として使用され得る。
ソグラフィーにより初期に形成される三次元物品である。このことによって、さらに硬化した場合一緒に結合することにより、連続層が良好に接着することが可能となる。「グリーン強度」は、弾性率、歪み、強度、硬度、および層間接着を含む、グリーンモデルの機械的性能に対する一般的な用語である。例えば、曲げ弾性率(ASTM D790)、引っ張り性質(ASTMD638)またはノッチ付きアイゾット衝撃(ASTM D256)を測定することにより、グリーン強度を示し得る。低グリーン強度を有する物品は、それ自身の重量下で変形するか、もしくは硬化時に垂れ下がるか、潰れることもある。
透明度を評価した。
Claims (18)
- (a)ポリグリシジルエポキシ化合物を含む、35〜80重量%のカチオン硬化型成分;(b)エトキシル化および/またはプロポキシル化ポリ(メタ)アクリレートを含む、15〜60重量%のフリーラジカル活性成分;
(c)0.1〜10重量%のアンチモンを含まないカチオン性光開始剤;
(d)0.01〜10重量%のフリーラジカル光開始剤;および
(e)0〜40重量%の1つ以上の随意の成分;
を含み、アンチモンを含有しない光硬化型組成物であって、
上記重量%が光硬化型組成物の全重量を基準とするものであり、硬化後光硬化型組成物が透明であり、70未満の黄色度指数/インチ厚さと少なくとも1000MPaの曲げ弾性率を有し、
カチオン硬化型成分とフリーラジカル活性成分が、少なくとも3.5:5.0:1のC:H:O比となる、上記光硬化型組成物。 - フリーラジカル活性成分が非芳香族ポリ(メタ)アクリレートをさらに含んでなる、請求項1に記載の光硬化型組成物。
- フリーラジカル活性成分が脂環式ポリ(メタ)アクリレートを含む、請求項1または2に記載の光硬化型組成物。
- ポリグリシジルエポキシ化合物が水素化ビスフェノールエポキシ含有化合物を含んでなる、請求項1〜4のいずれかに記載の光硬化型組成物。
- カチオン硬化型成分がオキセタン化合物をさらに含んでなる、請求項1〜5のいずれかに記載の光硬化型組成物。
- カチオン性光開始剤がトリアリールスルホニウムヘキサフルオロホスフェート塩である、請求項1〜6のいずれかに記載の光硬化型組成物。
- (a)1つ以上のエポキシ含有化合物と1つ以上のオキセタン化合物を含む、35〜80重量%のカチオン硬化型成分;
(b)以下の(i)および(ii)を含む15〜60重量%のフリーラジカル活性成分:
(i)少なくとも1つのエトキシル化もしくはプロポキシル化ポリ(メタ)アクリレートまたはそれらの混合物、および
(ii)非芳香族ポリ(メタ)アクリレート;
(c)0.1〜10重量%のアンチモンを含まないカチオン性光開始剤;
(d)0.1〜10重量%のフリーラジカル光開始剤;
(e)0〜40重量%の1つ以上の随意の成分
を含み、アンチモンを含有しない光硬化型組成物であって、
化学線照射への露光および場合によっては熱による硬化後、光硬化型組成物が70未満の黄色度指数/インチ厚さを有し、
カチオン硬化型成分とフリーラジカル活性成分が、少なくとも3.5:5.0:1のC:H:O比となる、上記光硬化型組成物。 - エトキシル化もしくはプロポキシル化ポリ(メタ)アクリレートまたはそれらの混合物の量がフリーラジカル活性成分の全量の40重量%以上である、請求項8に記載の光硬化型組成物。
- カチオン硬化型成分が水素化ビスフェノールエポキシ含有化合物を含んでなる、請求項8または9に記載の光硬化型組成物。
- (a)請求項1〜10のいずれかに記載の光硬化型組成物の第1の層を表面上に形成する段階;
(b)露光領域中の層の実質的な硬化を引き起こすのに充分な強度の化学線照射に層を画像様に露光して、像形成された断面を形成する段階;
(c)請求項1〜10のいずれかに記載の組成物の第2の層を以前に露光した像形成された断面上に形成する段階;
(d)露光領域中の第2の層の実質的な硬化と、以前に露光した像形成された断面への接着を引き起こすのに充分な強度の化学線照射に段階(c)からの第2の層を像様に露光して、さらなる像形成された断面を形成する段階;および
(e)三次元物品を積み上げにより作製するために、段階(c)および段階(d)を充分な回数繰り返す段階;
を含んでなる、無色の三次元物品を製造する方法。 - 請求項1〜10のいずれかに記載の組成物を積層硬化した医療用三次元物品。
- 物品が、容器、ヘッドライト、シェードまたは装飾用物体である、請求項12に記載の三次元物品。
- (a)コンピューターファイル上に保存された所望の形状にしたがって請求項1〜10のいずれかに記載の光硬化型組成物の連続した液滴を基材上の標的とされる場所に塗布する段階;
(b)液滴を電磁照射線に露光して、露光領域中の液滴を硬化する段階;
(c)三次元物品を積み上げにより作製するために、段階(a)および(b)を充分な回数繰り返す段階;
を含んでなる、インキジェット印刷により三次元物品を製造する方法。 - 基材が、紙、テキスタイル、タイル、印刷版、壁紙、プラスチック、粉末またはペーストを含んでなる、請求項14に記載の方法。
- 数層を形成した後ならびに/もしくは全層を形成した後に、光硬化型組成物がピクセルごと、ラインごと、層ごとに電磁照射線に露光される、請求項15に記載の方法。
- 使用される電磁照射線が、UV光、マイクロウエーブ照射線、可視光またはレーザービームである、請求項16に記載の方法。
- (a)水素化芳香族ポリグリシジルエポキシ化合物を含む、35〜80重量%のカチオン硬化型成分;
(b)エトキシル化および/またはプロポキシル化ポリ(メタ)アクリレートを含む、15〜60重量%のフリーラジカル活性成分;
(c)0.1〜10重量%のアンチモンを含まないカチオン性光開始剤;
(d)0.01〜10重量%のフリーラジカル光開始剤;および
(e)0〜40重量%の1つ以上の随意の成分;
(f)5〜25%の1個のオキセタン環を有するオキセタン化合物;
を含み、アンチモンを含有しない光硬化型組成物であって、
上記重量%が光硬化型組成物の全重量を基準とするものであり、光硬化型組成物のC:H:O比が少なくとも3.5:5.0:1であり、硬化後光硬化型組成物が透明であり、70未満の黄色度指数/インチ厚さと少なくとも1000MPaの曲げ弾性率を有するものである、光硬化型組成物。
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WO2009070500A1 (en) | 2009-06-04 |
EP2215525B1 (en) | 2018-01-10 |
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JP2011509313A (ja) | 2011-03-24 |
US20100304100A1 (en) | 2010-12-02 |
US8377623B2 (en) | 2013-02-19 |
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