JP5791732B2 - 高分子電解質及びその製造方法 - Google Patents
高分子電解質及びその製造方法 Download PDFInfo
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- JP5791732B2 JP5791732B2 JP2013544408A JP2013544408A JP5791732B2 JP 5791732 B2 JP5791732 B2 JP 5791732B2 JP 2013544408 A JP2013544408 A JP 2013544408A JP 2013544408 A JP2013544408 A JP 2013544408A JP 5791732 B2 JP5791732 B2 JP 5791732B2
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Description
多孔度(%)=(空気体積/全体体積)×100 (1)
この際、前記多孔性ナノウェブ支持体の全体体積は矩状の多孔性ナノウェブ支持体のサンプルを製造して横縦及び厚さを測定して計算し、前記多孔性ナノウェブ支持体の空気体積は前記多孔性ナノウェブ支持体サンプルの質量を測定し、その密度から逆算した高分子体積を前記多孔性ナノウェブ支持体の全体体積から除いて得ることができる。
(実施例1)
濃度12重量%のポリアミド酸/THF紡糸溶液を、30kVの電圧が印加された状態で電気紡糸し、ポリアミド酸ナノウェブ前駆体を形成した後、350℃のオーブンで5時間熱処理して15μmの平均厚さを有するポリイミド多孔性ナノウェブ支持体を製造した。この際、前記電気紡糸は、25℃でスプレーゼットノズルに30kVの電圧を印加した状態で行った。前記製造されたポリイミド多孔性ナノウェブ支持体は平均直径1μmのナノ繊維を含み、多孔度90%、気孔の平均直径は2μmであった。
前記イオン伝導体溶液に前記多孔性ナノウェブを浸漬したが、具体的には室温で20分間3回浸漬工程を行い、この際、微小気泡を除去するために減圧雰囲気を約1時間適用した。その後、175℃の熱を加えて前記イオン伝導体を架橋し、NMPを除去して高分子電解質を製造した。
イオン伝導体として下記式(7)で表されるイオン伝導体を用いることを除いては前記実施例1と同じ方法を実施して高分子電解質を製造した。
(参考例)
濃度12重量%のポリアミド酸/THF紡糸溶液を、30kVの電圧が印加された状態で電気紡糸し、ポリアミド酸ナノウェブ前駆体を形成した後、350℃のオーブンで5時間熱処理して15μmの平均厚さを有するポリイミド多孔性ナノウェブ支持体を製造した。この際、前記電気紡糸は、25℃でスプレーゼットノズルに30kVの電圧を印加した状態で行った。
前記実施例及び参考例で製造された多孔性ナノウェブ支持体の物性をASTM 638により測定し、その結果を下記表1に示す。この際、具体的な測定条件は次の通りである。
−グリップ間隔:6.35cm
−温度及び湿度:25℃×50%
前記実施例及び参考例で製造された高分子電解質の物性を測定し、その結果を下記表2に示す。
製造された高分子電解質を超純水に24時間担持させた後、取り出してぬれた状態の重量を測定し(Wwet)、同じ高分子電解質を100℃の真空状態で24時間乾燥させて乾燥状態の重量を測定し(Wdry)、下記式により膜の水揚げ(Water uptake)を算出した。
2)膨潤比(Swelling ratio)の測定
製造された高分子電解質を超純水に24時間担持させた後、取り出してぬれた状態の面積(lwet)または厚さ(twet)を測定し、同じ高分子電解質を100℃の真空状態で24時間乾燥させて乾燥状態の面積(ldry)または厚さ(tdry)を測定し、下記式により膜の膨潤比(Swelling ratio)を面積と厚さによりそれぞれ算出した。
膨潤比(△t、%)=((twet−tdry)/tdry)×100
製造された高分子電解質を3wt%の過酸化水素に硫酸鉄七水和物(Iron sulfate heptahydrate)2ppmを添加したフェントン(Fenton)溶液に担持させ、80℃でラジカルによる膜の劣化現象を一定時間テストした後、担持前後の膜の重量を測定した。その結果を下記表3に示す。
Claims (7)
- 有機溶媒に可溶性の前駆体ナノウェブを製造し、熱処理方法又は化学的処理方法を用いて前記前駆体ナノウェブから有機溶媒に不溶性の多孔性ナノウェブ支持体を製造する段階と、
多孔性ナノウェブ支持体の気孔に架橋可能なイオン伝導体を充填させる段階と、
前記多孔性ナノウェブ支持体の気孔に充填されたイオン伝導体を架橋させる段階と、
を含み、
前記架橋可能なイオン伝導体は、下記式(1)で表される化合物であり、
(式中、
前記SAr 1 は2価のスルホン化芳香族炭化水素であり、
前記Ar 1 及びAr 2 はそれぞれ独立して2価の芳香族炭化水素であり、
前記Xは架橋可能な置換基を含む2価の芳香族炭化水素であり、
前記Z 1 及びZ 2 はそれぞれ独立して架橋可能な置換基または架橋可能な置換基を含む1価の芳香族炭化水素であり、
前記a、c及びdはそれぞれ独立して0〜0.999であり、前記bは0.001〜1.000であり、
前記nは10〜500の整数である。)
前記SAr 1 は下記式(2−1)から(2−4)で表される化合物からなる群から選択される何れか1つであり、
前記Ar 1 及びAr 2 はそれぞれ独立して下記式(3−1)及び(3−2)で表される化合物からなる群から選択される何れか1つであり、
前記Xは下記式(4−1)及び(4−2)で表される化合物からなる群から選択される何れか1つであり、
前記Z 1 及びZ 2 はそれぞれ独立して下記式(5−1)から(5−4)で表される化合物からなる群から選択される何れか1つであることを特徴とする高分子電解質の製造方法。
(式中、
前記B 1 〜B 3 はそれぞれ独立してハロゲン基及び炭素数1〜5のペルフルオロアルキル基からなる群から選択される何れか1つであり、
前記R’ 1 及びR’ 2 は、
であり、
前記M + は1価の陽イオン電荷を有する対イオンであり、
前記e 1 は0または1の整数であり、前記f 1 は1〜3の整数であり、
前記e 2 は0または3の整数であり、前記f 2 は1〜3の整数であり、
前記e 3 は0または4の整数であり、前記f 3 は1〜4の整数であり、
前記g 1 〜g 3 はそれぞれ独立して0〜4の整数であり、
前記h 1 〜h 6 はそれぞれ独立して0〜4の整数であり、
前記iは0〜2の整数であり、
前記Y 1 及びY 2 はそれぞれ独立して単一結合、
、
、
、
、
、
、
及び
、からなる群から選択される何れか一つであり、
前記R 1 〜R 3 はそれぞれ独立して水素、ハロゲン基及び炭素数1〜5のペルフルオロアルキル基からなる群から選択される何れか1つであり、
前記R 4 〜R 5 はそれぞれ独立して水素、ハロゲン基、炭素数1〜5のアルキル基、及び炭素数1〜5のペルフルオロアルキル基からなる群から選択される何れか1つである。) - 前記イオン伝導体の架橋は150〜200℃の熱を加えて行われることを特徴とする請求項1に記載の高分子電解質の製造方法。
- 前記架橋可能なイオン伝導体は重量平均分子量1000〜50000g/molの低分子量イオン伝導体であることを特徴とする請求項1に記載の高分子電解質の製造方法。
- 熱処理方法又は化学的処理方法を用いて有機溶媒に可溶性の前駆体ナノウェブを有機溶媒に不溶性とした、請求項1に記載の多孔性ナノウェブ支持体と、
前記多孔性ナノウェブ支持体の内部に充填され架橋されたイオン伝導体と、
を含むことを特徴とする高分子電解質。 - 前記多孔性ナノウェブ支持体は、ナイロン、ポリイミド、ポリベンズオキサゾール、ポリエチレンテレフタレート、ポリエチレン、ポリプロピレン、ポリテトラフルオロエチレン、ポリアリーレンエーテルスルホン、ポリエーテルエーテルケトン、これらの共重合体及びこれらの組み合わせからなる群から選択される何れか1つを含むことを特徴とする請求項4に記載の高分子電解質。
- 前記多孔性ナノウェブ支持体は、平均直径0.005〜5μmのナノ繊維を含むことを特徴とする請求項4に記載の高分子電解質。
- 前記多孔性ナノウェブ支持体は、多孔度50〜98%で、気孔の平均直径0.05〜30μmであることを特徴とする請求項4に記載の高分子電解質。
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