JP5700924B2 - Electroformed body, manufacturing method thereof, and watch part - Google Patents
Electroformed body, manufacturing method thereof, and watch part Download PDFInfo
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- JP5700924B2 JP5700924B2 JP2009243413A JP2009243413A JP5700924B2 JP 5700924 B2 JP5700924 B2 JP 5700924B2 JP 2009243413 A JP2009243413 A JP 2009243413A JP 2009243413 A JP2009243413 A JP 2009243413A JP 5700924 B2 JP5700924 B2 JP 5700924B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 238000005323 electroforming Methods 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 41
- 238000000034 method Methods 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000037237 body shape Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 210000003423 ankle Anatomy 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- Moulds For Moulding Plastics Or The Like (AREA)
Description
本発明は、電気めっき法による電鋳体とその製造方法、および時計部品に係り、表面部に凹部のパターンと凹部と凹部以外の表面の表面形態を異とする電鋳体の製造方法に関する。 The present invention relates to an electroformed body by an electroplating method, a manufacturing method thereof , and a timepiece component, and more particularly to a method for manufacturing an electroformed body having a concave portion pattern on a surface portion and a surface form of a surface other than the concave portion and the concave portion.
電鋳法によれば、精密に加工された電鋳型と呼ばれる部材を用いることにより、非常に高い転写性を有する部材を製造することが出来る。特に近年、シリコンプロセスにより感光性材料を用いて電鋳型形状に加工するLIGA(Lithographie Galvanofomung Abformung)法によって電鋳型を製造し、合わせて微小な形状を有する部品や金型を製造することが提案されている(例えば、特許文献1参照。)。このような電鋳型では、微小な部品を高い精度を有する電鋳体を製造することが出来ることから、複雑形状を有する機械式腕時計ムーブ部品等微小な部品への応用がなされている。 According to the electroforming method, it is possible to manufacture a member having very high transferability by using a member called an electromold that is precisely processed. In particular, in recent years, it has been proposed to manufacture electroforms by the LIGA (Lithographie Galvanofomung Abformung) method, which uses a photosensitive material to process the electroform using a silicon process, and to produce parts and molds with micro shapes. (For example, refer to Patent Document 1). In such an electroforming mold, an electroformed body having a high accuracy can be produced from a minute part, and therefore, it is applied to a minute part such as a mechanical wristwatch move part having a complicated shape.
近年、機械式腕時計では、装飾性を高めるため時計ケースや文字板等の所謂外装部品だけでなく、ケース内部が見えるように裏蓋や文字板等を透明あるいは開口部を設ける等を行い、内部すなわちムーブメントが外部から見える構造をとるようになっている。 In recent years, mechanical watches have been designed not only for so-called exterior parts such as watch cases and dials, but also by providing a transparent back or dial so that the inside of the case can be seen. That is, the movement is structured to be visible from the outside.
このため、ムーブメントを構成する歯車、受け部品や自動巻き式腕時計に具備されている回転錘等に装飾性を持たせることが望まれている。 For this reason, it is desired that the gears constituting the movement, the receiving parts, the rotating weights provided in the self-winding wristwatch and the like have a decorative property.
同様な観点から、機械式腕時計だけでなく微細部品や精密部品においても装飾性や部品の認識性、視認性を高めるといったことが広く望まれている。 From the same point of view, it is widely desired to improve the decorativeness, the recognizability of parts, and the visibility not only in mechanical wristwatches but also in fine parts and precision parts.
本発明は、上記事情に鑑みて成されたものであり、LIGA法により作製される電鋳体の少なくとも一表面の一部に凹部を有し、この凹部が文字、絵模様等任意のデザイン性、装飾性、視認性を有するパターンとして形成され、さらに、この凹部表面と凹部以外の表面の表面形態が異なる電鋳体の製造方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and has a recess in a part of at least one surface of an electroformed body produced by the LIGA method, and the recess has an arbitrary design such as a character and a picture pattern. Another object of the present invention is to provide a method for producing an electroformed body which is formed as a pattern having decorativeness and visibility, and in which the surface form of the surface of the recess is different from the surface other than the recess.
本発明は、上記課題を解決するため、以下の手段を採用する。 The present invention employs the following means in order to solve the above problems.
本発明に係る電鋳体の製造方法は、少なくとも表面に導電性を有する基板の前記表面に、パターンめっきにより金属層を形成する工程と、前記表面に電鋳型を形成する工程と、前記電鋳型の内部に前記金属層と異なる組成を有する電鋳部を形成する工程と、前記基板及び前記電鋳型を除去する工程と、前記金属層を除去する工程と、を備えることを特徴とする。 The method for producing an electroformed body according to the present invention includes a step of forming a metal layer by pattern plating on the surface of a substrate having conductivity on at least a surface, a step of forming an electroforming mold on the surface, and the electroforming mold A step of forming an electroformed part having a composition different from that of the metal layer, a step of removing the substrate and the electroforming mold, and a step of removing the metal layer.
この電鋳体の製造方法は、フォトレジストを用いたフォトリソグラフィー等による精密なめっきレジスト層形成とめっき法からなるアディティブ法による薄膜微細パターン形成技術による金属層からなる文字、絵柄模様等のパターン形成を行い、次に所望とする電鋳体形状を与える電鋳型を厚膜フォトレジストにより形成し、さらに前記金属膜パターン上とこの電鋳型内に電鋳を行い、この電鋳体を基板から分離し、金属層を除去することにより、一表面に微細パターンの凹部を有する電鋳体を提供することが出来る。 This electroformed body manufacturing method consists of precise plating resist layer formation by photolithography using a photoresist, and pattern formation such as characters and pattern patterns made of metal layers by thin film fine pattern formation technology by additive method consisting of plating method Next, an electroforming mold that gives the desired electroformed body shape is formed with a thick film photoresist, and electroforming is performed on the metal film pattern and in the electroforming mold, and the electroformed body is separated from the substrate. By removing the metal layer, it is possible to provide an electroformed body having a concave portion with a fine pattern on one surface.
また、この発明に係る電鋳体の製造方法は、基板の導電性を有する表面に、パターンめっきにより金属層を形成する工程と、前記表面に電鋳型を形成する工程と、前記電鋳型の内部の前記表面及び前記金属層の上面に、前記金属層と異なる組成を有する電鋳部を形成する工程と、前記基板及び前記電鋳型を除去する工程と、前記金属層を除去する工程と、を備えることを特徴とする。また、前記表面の表面形態と、前記金属層の前記電鋳部と接する面の表面形態と、が異なることを特徴とする。 The method for producing an electroformed body according to the present invention includes a step of forming a metal layer on a conductive surface of a substrate by pattern plating, a step of forming an electroforming mold on the surface, and an interior of the electroforming mold. Forming an electroformed part having a composition different from that of the metal layer on the surface and the upper surface of the metal layer, removing the substrate and the electroforming mold, and removing the metal layer. It is characterized by providing. Moreover, the surface form of the said surface and the surface form of the surface which contact | connects the said electroformed part of the said metal layer differ, It is characterized by the above-mentioned.
この電鋳体の製造方法は、フォトレジストを用いたフォトリソグラフィー等による精密なめっきレジスト層形成とめっき法からなるアディティブ法による薄膜微細パターン形成技術により、基板の表面形態とは異なる表面形態を有する金属層からなる文字、絵柄模様等のパターン形成を行い、次に所望とする電鋳体形状を与える電鋳型を厚膜フォトレジストにより形成し、さらに前記金属膜パターン上とこの電鋳型内に電鋳を行い、この電鋳体を基板から分離し、ついて、前記金属層を除去することにより、一表面に微細パターンの凹部を有し、且つ、凹部表面の形態とそれ以外の表面における表面形態、すなわち表面粗さが異なる電鋳体を提供することが出来る。 This electroformed body manufacturing method has a surface form different from the surface form of the substrate by a precise plating resist layer formation by photolithography using a photoresist and a thin film fine pattern forming technique by an additive method consisting of a plating method. A pattern such as letters and patterns made of a metal layer is formed. Next, an electroforming mold that gives a desired electroformed body shape is formed by a thick film photoresist, and an electric mold is formed on the metal film pattern and in the electroforming mold. Casting, separating the electroformed body from the substrate, and then removing the metal layer, so that there is a concave portion of a fine pattern on one surface, and the shape of the concave surface and the surface shape on the other surface That is, it is possible to provide electroformed bodies having different surface roughness.
このような電鋳体およびその製造方法は、部分的な表面形態の改質を行う代表的な手段であるマスキング後のホーニング等の手段と比べて、マスキング精度が高く、容易かつ均一な表面形態の変更が出来る。 Such an electroformed body and its manufacturing method have a high masking accuracy and an easy and uniform surface form compared to means such as honing after masking, which is a typical means for modifying a partial surface form. Can be changed.
この発明によれば、少なくとも一表面に装飾性、視認性等視覚的に優れた凹凸パターンを有し、微細性、精度に優れた電鋳体を提供できる。 According to the present invention, it is possible to provide an electroformed body having a concavo-convex pattern which is visually excellent such as decoration and visibility on at least one surface, and which is excellent in fineness and accuracy.
本発明に係る実施形態について、図1から図3を参照して説明する。図1(a)は本発明の第1の実施形態の電鋳体である電鋳歯車の一表面を示す図であり、図1(b)は図1(a)におけるA−A’における断面を示す図である。 Embodiments according to the present invention will be described with reference to FIGS. 1 to 3. Fig.1 (a) is a figure which shows one surface of the electroformed gearwheel which is the electrocast body of the 1st Embodiment of this invention, FIG.1 (b) is a cross section in AA 'in Fig.1 (a). FIG.
本実施形態に係る電鋳体である電鋳歯車101は、図1に示すように、軸穴102と歯車の軽量化を図るために設けた歯車開口部103を有する。また、電鋳体である電鋳歯車101の一表面を構成する部分のうち歯先表面部104、開口部縁部105の表面部および文字パターン部106の表面部は鏡面になっている。さらに、凹部107は、梨地状態の表面を有している。また電鋳体は、例えば金、ニッケル、鉄や、またはこれらの合金等で形成することができる。すなわち、歯先表面部104、開口部縁部105の表面および文字パターン部106の表面は、凹部105の表面と表面形態が異なっている。なお、すなわち、歯先表面部104、開口部縁部105の表面および文字パターン部106の表面の表面形態と、凹部105の表面形態とが異なっていればよい。
As shown in FIG. 1, an
この電鋳体の製造方法は、図2に示したように少なくとも一表面に導電性を有する基板に任意のパターンを有する金属層を形成する工程と、図3に示した電鋳型を形成する工程と、この電鋳型内に電鋳体を形成し、電鋳体を基板および型から分離し独立させる工程と、金属層を除去する工程と、から構成されている。 As shown in FIG. 2, the method for manufacturing the electroformed body includes a step of forming a metal layer having an arbitrary pattern on a conductive substrate on at least one surface, and a step of forming the electroforming mold shown in FIG. And forming the electroformed body in the electroforming mold, separating the electroformed body from the substrate and the mold and making them independent, and removing the metal layer.
金属層を形成する工程では、まず、図2(a)に示すように、表面状態が鏡面の単結晶シリコンウエハからなる基板109上に基板109側からクロム、銅の2層(図示しない)からなる導電層110を形成する。さらに図2(b)に示すように、この基板109の導電層110表面にポジ型フォトレジストを塗布し、露光、現像を順次行うことにより、文字、絵模様等所望とする開口パターンを有する厚み10μmの第1のレジスト層111を形成する。なお、導電層110は、クロム、または銅の単層でもよい。また、第1のレジスト層111は、ネガ型フォトレジストを用いてもよい。
In the step of forming the metal layer, first, as shown in FIG. 2 (a), two layers of chromium and copper (not shown) are formed on the
次に、図2(c)に示すように、電気めっき法により、表面状態が梨地状態となる7μmの厚みの銅めっきを第1のレジスト層111の開口部に施すことにより金属層112を形成する。次いで図2(d)に示すように、第1のレジスト層111をアルカリ性水溶液やアセトンのような有機溶剤等の剥離剤で剥離除去する。なお、第1のレジスト層111及び金属層112の厚さは、上記に記載した厚さに限定されるものではなく、金属層112が第1のレジスト層111より厚くなければよい。 Next, as shown in FIG. 2 (c), a metal layer 112 is formed by applying copper plating with a thickness of 7 μm, which has a matte surface state, to the opening of the first resist layer 111 by electroplating. To do. Next, as shown in FIG. 2D, the first resist layer 111 is stripped and removed with a stripper such as an alkaline aqueous solution or an organic solvent such as acetone. Note that the thicknesses of the first resist layer 111 and the metal layer 112 are not limited to the thicknesses described above, and the metal layer 112 may be thicker than the first resist layer 111.
図3(a)の電鋳型を形成する工程と電鋳体を形成し、電鋳体を分離する工程では、化学増幅型エポキシ系厚膜フォトレジストを塗布し、露光、加熱による硬化促進後、現像を行うことにより電鋳型113を形成する。この電鋳型113の厚さは、機械式腕時計用歯車では、50μmから1mm程度となる。 In the step of forming the electroforming mold of FIG. 3 (a) and the step of forming the electroformed body and separating the electroformed body, a chemically amplified epoxy thick film photoresist is applied, and after curing is accelerated by exposure and heating, The electroforming mold 113 is formed by performing development. The thickness of the electroforming mold 113 is about 50 μm to 1 mm in the mechanical wristwatch gear.
次に、図3(b)に示すように電鋳型113の開口部にニッケル電鋳を行い電鋳部114を形成する。また、必要に応じて研磨等により電鋳部114の厚さや表面形態の調整を行う。さらに、図3(c)に示すように、基板109、導電層111および電鋳型113を除去することにより電鋳物115を得る。最後に、図3(d)に示すようにこの電鋳物115からエッチングにより銅からなる金属層112を除去し、電鋳体117を得る。
Next, as shown in FIG. 3B, nickel electroforming is performed on the opening of the electroforming mold 113 to form the electroforming portion 114. Moreover, the thickness and surface form of the electroformed part 114 are adjusted by polishing or the like as necessary. Further, as shown in FIG. 3C, the electroformed product 115 is obtained by removing the
このようにして作製された電鋳体117は、基板109上の導電層110と接していた部分では鏡面部118となり、金属層112と接していた部分では表面形態が梨地状態である凹部116を有しており、表面の凹凸に加え、両者間の表面形態の違いにより、大きなコントラストが発現されることにより、凹部118として形成されたパターンがより強調された装飾性や視認性に優れた面を有するものとなる。
The electroformed body 117 manufactured in this way becomes a mirror surface portion 118 at a portion in contact with the conductive layer 110 on the
図2および図3では、金属層112は、電鋳型113開口部の内部にのみ形成されているが、内部だけに規定されるものではなく、金属層112と電鋳型113が重なる部分があってもなんら本実施形態を限定するものではない。 2 and 3, the metal layer 112 is formed only inside the opening of the electroforming mold 113, but is not limited to the inside, and there is a portion where the metal layer 112 and the electroforming mold 113 overlap. However, the present embodiment is not limited at all.
また、本実施形態では金属層112で銅めっき層、また、電鋳部108ではニッケル電鋳を用いたが、これらは限定されるものではなく、めっきとして可能な材料であればいずれも自由に選択できるものである。 In this embodiment, a copper plating layer is used for the metal layer 112, and nickel electroforming is used for the electroformed portion 108. However, these are not limited, and any material that can be plated can be freely used. You can choose.
なお、本発明の電鋳体は、回転錘、歯車、がんぎ車、アンクル、てんわなどの時計部品を形成することが可能である。また、時計部品に限らず、微細部品や精密部品を形成することができる。 The electroformed body of the present invention can form timepiece parts such as rotating weights, gears, escape wheels, ankles, and balances. Further, not only watch parts but also fine parts and precision parts can be formed.
101 電鋳歯車
102 軸穴
103 歯車開口部
104 歯先表面部
105 開口部縁部
106 文字パターン部
107 凹部
108 電鋳部
109 基板
110 導電層
111 第1のレジスト層
112 金属層
113 電鋳型
114 電鋳部
115 電鋳物
116 凹部表面部
117 電鋳体
118 鏡面部
DESCRIPTION OF
Claims (4)
前記電鋳部の前記凹部を有する面と、前記凹部の底面と、の表面粗さが異なっており、
前記電鋳部の前記凹部の底面は、梨地状態からなることを特徴とする電鋳体。 An electroformed body comprising an electroformed part having a recess,
The surface roughness of the surface having the concave portion of the electroformed portion and the bottom surface of the concave portion is different ,
The electroformed body, wherein a bottom surface of the concave portion of the electroformed portion is in a satin state .
前記表面に電鋳型を形成する工程と、
前記電鋳型の内部の前記表面及び前記金属層の上面に、前記金属層と異なる組成を有する電鋳部を形成する工程と、
前記基板及び前記電鋳型を除去する工程と、
前記金属層を除去する工程と、
を備え、
前記表面と、前記金属層の前記電鋳部と接する面と、は表面粗さが異なるように形成されることを特徴とする電鋳体の製造方法。 Forming a metal layer by pattern plating on the conductive surface of the substrate;
Forming an electroforming mold on the surface;
Forming an electroformed part having a composition different from that of the metal layer on the surface of the electroforming mold and the upper surface of the metal layer;
Removing the substrate and the electroform;
Removing the metal layer;
With
The method for producing an electroformed body, wherein the surface and the surface of the metal layer in contact with the electroformed portion are formed to have different surface roughness.
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