JP5692621B1 - Measuring apparatus and measuring method - Google Patents

Abstract

[PROBLEMS] To improve the throughput by suppressing the increase in the installation area and the increase in the apparatus cost while maintaining the accuracy of the movement position of the alignment apparatus shared by each measurement unit. A plurality of measurement units, a wafer chuck for holding a wafer that is a measurement object, a base that is a fixed unit, and a wafer that is movable to the plurality of measurement units. Alignment device 50 that performs relative alignment between wafer W held on chuck 16 and measurement unit 14 and alignment device 50 that is provided for each measurement unit 14 and moves to each measurement unit 14 are positioned and fixed. A positioning and fixing device. [Selection] Figure 1

Description

  The present invention relates to a measurement apparatus and a measurement method that can share an alignment apparatus among a plurality of measurement units.

  The semiconductor manufacturing process has a large number of processes, and various inspections are performed in various manufacturing processes in order to guarantee quality and improve yield. For example, when a plurality of chips of a semiconductor device are formed on a semiconductor wafer, electrode pads of the semiconductor device of each chip are connected to a test head, a power supply and a test signal are supplied from the test head, and the semiconductor device outputs A wafer level inspection is performed in which a signal is measured by a test head to electrically inspect whether it operates normally.

  After wafer level inspection, the wafer is affixed to the frame and cut into individual chips with a dicer. For each chip that has been cut, only chips that have been confirmed to operate normally are packaged in the next assembly process, and defective chips are excluded from the assembly process. Further, the packaged final product is subjected to shipping inspection.

  The wafer level inspection is performed using a prober in which a probe is brought into contact with an electrode pad of each chip on the wafer. The probe is electrically connected to the terminals of the test head, and power and test signals are supplied from the test head to each chip through the probe, and whether the output signal from each chip is detected by the test head and is operating normally Measure.

  In the semiconductor manufacturing process, in order to reduce the manufacturing cost, the wafer is increased in size and further miniaturized (integrated), and the number of chips formed on one wafer becomes very large. ing. Along with this, the time required for inspecting a single wafer with a prober has also become longer, and an improvement in throughput is required. Therefore, in order to improve the throughput, multi-probing is performed in which a large number of probes are provided so that a plurality of chips can be inspected simultaneously. In recent years, the number of chips to be inspected at the same time has increased, and attempts have been made to inspect all chips on a wafer at the same time. For this reason, the tolerance of alignment for bringing the electrode pad and the probe into contact with each other is small, and it is required to improve the positional accuracy of the movement in the prober.

  On the other hand, as the simplest method for increasing the throughput, it is conceivable to increase the number of probers. However, when the number of probers is increased, there is a problem that the installation area of the prober in the production line also increases. Further, if the number of probers is increased, the cost of the apparatus will increase accordingly. Therefore, it is required to increase the throughput while suppressing an increase in installation area and an increase in apparatus cost.

  Under such a background, for example, Patent Document 1 proposes a test apparatus having a plurality of measurement units each having a probe card to which a test head is electrically connected. In this test apparatus, an alignment apparatus that performs relative alignment between the wafer and the probe card is configured to be able to move between the measurement units.

JP 2010-186998 A

  However, although the test apparatus described in Patent Document 1 can achieve space saving and cost reduction by sharing the alignment apparatus among the measurement units, there are the following problems.

  That is, when the movement distance of the alignment apparatus becomes longer, the movement mechanism for moving the alignment apparatus to each measurement unit and the support member (frame) to which the movement mechanism is attached are affected by the weight of the alignment apparatus, thermal expansion, or thermal contraction. As a result, distortion is likely to occur, which causes a decrease in the positional accuracy of the alignment apparatus moved to each measurement unit. For this reason, it takes time to detect the positions of the electrode pads and probes on the wafer using the imaging means, resulting in a problem that the alignment operation takes time and throughput is slow.

  The present invention has been made in view of such circumstances, and improves the throughput by suppressing the increase in the installation area and the increase in the apparatus cost while maintaining the accuracy of the movement position of the alignment apparatus shared by each measurement unit. It is an object of the present invention to provide a measuring apparatus and a measuring method that can be used.

  In order to achieve the above object, a measuring apparatus of the present invention is configured to be movable to a plurality of measuring units, a holding chuck for holding an object to be measured, and a plurality of measuring units, and has a fixed part to be held. An alignment device that performs relative alignment between the measurement object held by the chuck and the measurement unit, and a positioning device that is provided for each measurement unit and positions and fixes the fixed unit of the alignment device that has moved to each measurement unit A fixing device.

  According to one aspect of the measuring apparatus of the present invention, the positioning and fixing device includes a clamp mechanism that positions and fixes at least three portions of the fixed portion of the alignment device in a detachable manner.

  In one aspect of the measuring apparatus of the present invention, the positioning and fixing device includes positioning means for positioning at least three positions of the fixed portion of the alignment device.

  In one aspect of the measuring apparatus of the present invention, the positioning and fixing device is configured separately from the positioning unit, and includes a holding unit that detachably holds at least one portion of the fixed portion of the alignment device.

  In one aspect of the measuring apparatus of the present invention, the positioning and fixing device includes a height adjusting unit that can adjust the horizontal direction of the fixed portion of the alignment device.

  In one aspect of the measurement apparatus of the present invention, the plurality of measurement units are two-dimensionally arranged along the first direction and the second direction orthogonal to the first direction. Further, the first direction or the second direction may be a vertical direction.

  In order to achieve the above object, the measuring method of the present invention includes a plurality of measuring units, a holding chuck that holds an object to be measured, and a plurality of measuring units that are movable and have a fixed portion. A probe inspection method in a measuring apparatus comprising: an alignment apparatus that performs relative alignment between an object to be measured held by a holding chuck and a measuring section, wherein the alignment apparatus is moved between the measuring sections. Holding the holding chuck by the alignment device with the moving step, the positioning and fixing step for positioning and fixing the fixed portion of the alignment device moved to each measuring unit, and the fixed portion of the alignment device positioned and fixed An alignment step for performing relative alignment between the measured object and the measurement unit.

  According to the present invention, since the positioning / fixing device for positioning and fixing the alignment device moved to each measurement unit is provided, the increase in the installation area and the increase in the device cost are suppressed while maintaining the accuracy of the movement position of the alignment device. Throughput can be improved.

The figure which shows schematic structure of the system which performs wafer level inspection of embodiment of this invention Diagram showing the configuration around the probe card Upper perspective view showing schematic configuration of alignment apparatus Lower perspective view showing schematic configuration of alignment apparatus Plan view schematically showing a configuration example of a moving device Side view schematically showing a configuration example of a moving device Plan view schematically showing another configuration example of the moving device Diagram showing the alignment and positioning of the alignment device The figure which showed the composition by which the measurement part group which consists of a plurality of measurement parts was piled up in the perpendicular direction

  Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

  FIG. 1 is a diagram showing a schematic configuration of a system for performing wafer level inspection according to an embodiment of the present invention. A system for performing wafer level inspection includes a prober 10 for contacting a probe to an electrode pad of each chip on a wafer, and a power supply and a test signal to each chip for electrical inspection, while being electrically connected to the probe. It comprises a tester 20 that detects output signals from each chip and measures whether they operate normally.

  In FIG. 1, a base 11, a side plate 12, and a head stage 13 constitute a housing of the prober 10. In some cases, an upper plate supported by the side plate 12 is provided, and the head stage 13 is provided on the upper plate.

  The prober 10 is provided with a plurality of measurement units (first to third measurement units) 14A to 14C. Each of the measurement units 14A to 14C includes a wafer chuck 16 for holding the wafer W and a probe card 18 having a number of probes 28 corresponding to the electrodes of each chip of the wafer W, and each of the measurement units 14A to 14C. At the same time, all the chips on the wafer W held by the wafer chuck 16 are simultaneously inspected. In addition, since the structure of each measurement part 14A-14C is common, below, a measurement part shall be shown with the code | symbol 14 on behalf of these.

  FIG. 2 is a diagram showing a configuration around the probe card.

  The wafer chuck 16 sucks and fixes the wafer by vacuum suction or the like. The wafer chuck 16 is detachably supported by an alignment device 50 described later, and can be moved in the XYZ-θ direction by the alignment device 50.

  The wafer chuck 16 is provided with a sealing mechanism. The sealing mechanism includes an elastic ring-shaped seal member 40 provided near the outer periphery of the upper surface of the wafer chuck 16. A suction port 42 is provided between the wafer W and the ring-shaped seal member 40 on the upper surface of the wafer chuck 16. The suction port 42 is connected to a suction control unit 46 that controls the vacuum pressure via a suction path 43 formed inside the wafer chuck 16. The suction control unit 46 is connected to the vacuum pump 44. When the suction controller 46 is operated in a state where the ring-shaped seal member 40 is in contact with the probe card 18, the sealed internal space S formed between the probe card 18 and the wafer chuck 16 is decompressed, and the wafer chuck 16 is It is drawn toward the probe card 18. As a result, the probe card 18 and the wafer chuck 16 are brought into close contact with each other, and each probe 28 comes into contact with the electrode pad of each chip so that the inspection can be started.

  The head stage 13 is provided with a mounting hole (card mounting portion) 26 for each measuring unit 14, and a probe card 18 is mounted in each mounting hole 26 in a replaceable manner. In the portion of the probe card 18 facing the respective chips on the wafer W, a plurality of spring pin type elastic probes 28 corresponding to the electrodes of all the chips are formed. Here, the configuration in which the probe card 18 is directly attached to the head stage 13 is shown, but a card holder may be provided on the head stage 13 and the probe card 18 may be attached to the card holder.

  The tester 20 includes a plurality of test heads 22 (22A to 22C) provided for each measurement unit 14. Each test head 22 is placed on the upper surface of the head stage 13. Each test head 22 may be held above the head stage 13 by a support mechanism (not shown).

  The terminals of each test head 22 are connected to the corresponding terminals of the probe card 18 through a large number of connection pins of the contact ring 24. As a result, the terminals of the test heads 22 are electrically connected to the probe 28.

  Each measurement unit 14 is provided with a support mechanism (chuck removal prevention mechanism) to prevent the wafer chuck 16 from falling off. The support mechanism includes a plurality of holding units 30 that hold the wafer chuck 16. Each holding portion 30 is provided around the mounting hole 26 of the head stage 13 at predetermined intervals. In this example, four holding portions 30 are provided around the mounting hole 26 at intervals of 90 degrees (only two holding portions 30 are shown in FIGS. 1 and 2).

  Each holding part 30 is configured to be movable (expandable in diameter) so as to be close to / separated from each other around the mounting hole 26. A moving mechanism (not shown) of each holding unit 30 is constituted by, for example, a ball screw or a motor. In a state where the holding portions 30 are close to each other (a state indicated by a solid line in FIGS. 1 and 2), the inner diameter of the passage hole 32 formed in the central portion of each holding portion 30 is smaller than the diameter of the wafer chuck 16. Therefore, the wafer chuck 16 is held by each holding unit 30. On the other hand, when the holding portions 30 are separated from each other (shown by broken lines in FIGS. 1 and 2), the inner diameter of the passage hole 32 is larger than the diameter of the wafer chuck 16, so that the alignment device 50 is used for the wafer chuck. 16 can be supplied or recovered.

  In addition, about the structure of a support mechanism, it is possible to employ | adopt various modifications as described in the above-mentioned patent document 1. FIG.

  The prober 10 of the present embodiment includes an alignment apparatus 50 that detachably supports the wafer chuck 16 and performs an alignment operation of the wafer W held on the wafer chuck 16, and a direction in which the measurement units 14 are arranged in the alignment apparatus 50. And a moving device 100 that moves between the measurement units 14 along the (X-axis direction).

  The alignment apparatus 50 includes a moving / rotating mechanism for moving the wafer chuck 16 in the XYZ-θ direction, an electrode of each chip of the wafer W held by the wafer chuck 16, and each probe 28 of the probe card 18. An alignment mechanism that detects a relative positional relationship, and detachably supports the wafer chuck 16 to perform an alignment operation of the wafer W held on the wafer chuck 16. That is, the relative positional relationship between the electrode of each chip of the wafer W held on the wafer chuck 16 and each probe 28 of the probe card 18 is detected, and based on the detection result, the electrode of the chip to be inspected is detected by the probe 28. The wafer chuck 16 is moved so as to come into contact with.

  The alignment apparatus 50 sucks and fixes the wafer chuck 16 by vacuum suction or the like. However, any fixing means other than vacuum suction may be used as long as the wafer chuck 16 can be fixed. For example, it is fixed by mechanical means. May be. The alignment device 50 is provided with a positioning member (not shown) so that the relative positional relationship with the wafer chuck 16 is always constant.

  3 and 4 are diagrams showing a schematic configuration of the alignment apparatus 50. FIG. Specifically, FIG. 3 is an upper perspective view of the alignment apparatus 50, and FIG. 4 is a lower perspective view of the alignment apparatus 50. 3 and 4 show a state where the wafer chuck 16 is supported on the upper surface of the alignment apparatus 50. FIG.

  As shown in FIGS. 1 and 3, the alignment apparatus 50 includes a Z-axis moving / rotating unit that detachably supports the wafer chuck 16 and moves the wafer chuck 16 in the Z-axis direction and rotates about the Z-axis. 52, a probe position detection camera 54 that detects the position of the probe 28, a camera movement mechanism 56 that moves the probe position detection camera 54 in the Z-axis direction, a Z-axis movement / rotation unit 52, and a camera movement mechanism 56. An X-axis moving table 58 that moves in the X-axis direction, a Y-axis moving table 60 that supports the X-axis moving table 58 and moves in the Y-axis direction, a base 62 that supports the Y-axis moving table 60, and a column 64. And an alignment camera 66 supported by. The moving / rotating mechanism for moving the wafer chuck 16 in the XYZ-θ direction includes a Z-axis moving / rotating unit 52, an X-axis moving table 58, and a Y-axis moving table 60. The alignment mechanism includes a probe position detection camera 54, an alignment camera 66, a camera moving mechanism 56, and an image processing unit (not shown).

  Two guide rails 68 are provided in parallel on the base 62, and the Y-axis moving base 60 is movable on the guide rails 68. A drive motor and a ball screw 70 rotated by the drive motor are provided in a portion between the two guide rails 68 on the base 62. The ball screw 70 is engaged with the bottom surface of the Y-axis moving table 60, and the Y-axis moving table 60 slides on the guide rail 68 by the rotation of the ball screw 70.

  Two parallel guide rails 72 orthogonal to the above-described two guide rails 68 are provided on the Y-axis moving table 60, and the X-axis moving table 58 can move on the guide rail 72. It has become. A drive motor and a ball screw 74 that is rotated by the drive motor are provided in a portion between the two guide rails 72 on the Y-axis moving table 60. The ball screw 74 is engaged with the bottom surface of the X-axis moving table 58, and the X-axis moving table 58 slides on the guide rail 72 by the rotation of the ball screw 74.

  A linear motor may be used instead of the ball screw.

  Next, the configuration of the moving device 100 will be described.

  As shown in FIG. 1, the moving device 100 includes a transport pallet 102 on which the alignment device 50 is placed and transported. The conveyance pallet 102 is configured to be movable between the measurement units 14 along the X-axis direction. The moving mechanism (horizontal feed mechanism) for moving the transport pallet 102 may be a linear moving mechanism, and includes, for example, a belt driving mechanism, a linear guide mechanism, a ball screw mechanism, and the like. The transport pallet 102 is provided with a lifting mechanism 106 that lifts and lowers the alignment device 50 in the Z-axis direction. The elevating mechanism 106 is configured by a known cylinder mechanism or the like. Thereby, the alignment apparatus 50 is configured to be movable between the measuring units 14 along the X-axis direction and configured to be movable up and down in the Z-axis direction. Note that the movement mechanism and the lifting mechanism 106 of the transport pallet 102 are driven by control by a control unit (not shown).

  5 and 6 are schematic diagrams illustrating a configuration example of the moving device 100. FIG. Specifically, FIG. 5 is a plan view of the moving device 100, and FIG. 6 is a side view of the moving device 100.

  As shown in FIGS. 5 and 6, two guide rails 101 are provided in parallel on the base 11, and the transport pallet 102 can move on the guide rail 101. A timing belt 110 that is parallel to the guide rail 101 and fixed at both ends to the base 11 is provided on the outer portion of the two guide rails 101.

  A drive unit 108 is fixed to the transport pallet 102. The drive unit 108 includes a drive motor 112, a drive pulley 114 connected to the rotation shaft of the drive motor 112, and two idle pulleys 116 disposed around the drive pulley 114. A timing belt 110 is wound around the driving pulley 114, and the tension of the timing belt 110 is adjusted by idle pulleys 116 disposed on both sides thereof. When the drive motor 112 is driven, the conveyance pallet 102 slides on the guide rail 101 by the rotation of the drive pulley 114. Thereby, the alignment apparatus 50 supported by the conveyance pallet 102 moves between each measurement part 14 along an X-axis direction.

  FIG. 7 is a schematic diagram illustrating another configuration example of the moving apparatus 100. The configuration example shown in FIG. 7 uses a ball screw mechanism. That is, the base 11 is provided with a drive unit composed of the drive motor 118 and the ball screw 120 between the two guide rails 101. The ball screw 120 is engaged with the bottom surface of the conveyance pallet 102, and the conveyance pallet 102 slides on the guide rail 101 by the rotation of the ball screw 120. Thereby, the alignment apparatus 50 supported by the conveyance pallet 102 moves between the measurement units 14 along the X-axis direction.

  In the present embodiment, there is provided a positioning and fixing device having a clamp mechanism that positions and positions three positions of the alignment device 50 moved to the respective measurement units 14 and detachably holds and fixes them. Specifically, the alignment device 50 is provided with a plurality of positioning pins 130 (130 </ b> A to 130 </ b> C) at three locations on the base 62. On the other hand, the base 11 of the housing is provided with a plurality of chuck members (positioning holes) 134 (134A to 134C) for clamping the positioning pins 130, and these are provided for each measurement unit 14. The clamp mechanism includes a positioning pin 130 and a chuck member 134.

  As the clamp mechanism, for example, a well-known clamp mechanism such as a ball lock system or a taper sleeve system is applied, and detailed description thereof is omitted here.

  When positioning and fixing the alignment device 50 moved to each measuring unit 14, the alignment device 50 is lowered by the lifting mechanism 106, and each positioning pin 130 is fitted into the corresponding chuck member 134 as shown in FIG. And clamp. As a result, the alignment device 50 is positioned in the horizontal direction and the vertical direction, and the alignment device 50 is fixed to the base 11 in a state where the rotation of the alignment device 50 around the vertical direction is restricted. On the other hand, when the alignment device 50 is moved to another measuring unit 14, the alignment device 50 is raised by the lifting mechanism 106, and the positioning pins 130 are detached from the chuck members 134. As a result, the positioning and fixing of the alignment apparatus 50 is released, and the alignment apparatus 50 becomes movable to the other measurement unit 14 by the moving apparatus 100.

  Next, an inspection operation using the prober of this embodiment will be described.

  First, the alignment device 50 is moved to the measuring unit 14 to be inspected and positioned and fixed, and then the Z-axis moving / rotating unit 52 is raised to hold the wafer chuck 16 on the alignment device 50. In this state, the decompression of the internal space S by the suction control unit 46 is released, and the holding units 30 of the support mechanism are separated from each other, and then the wafer chuck 16 is lowered by the Z-axis moving / rotating unit 52.

  Next, the alignment device 50 that supports the wafer chuck 16 is moved to a predetermined delivery position, and the wafer W is loaded on the wafer chuck 16 by a wafer delivery mechanism (loader) (not shown) and fixed by vacuum suction.

  Next, an alignment operation is performed. Specifically, the X-axis moving table 58 is moved so that the probe position detection camera 54 is located below the probe 28, and the probe position detection camera 54 is moved in the Z-axis direction by the camera moving mechanism 56 to focus. In addition, the tip position of the probe 28 is detected by the probe position detection camera 54. The position (X and Y coordinates) of the tip of the probe 28 in the horizontal plane is detected by the coordinates of the camera, and the position in the vertical direction is detected by the focal position of the camera. The probe card 18 is usually provided with hundreds to thousands or more of probes 28, and usually the tip positions of specific probes are detected without detecting the tip positions of all the probes 28.

  Next, with the wafer W to be inspected held by the wafer chuck 16, the X-axis moving table 58 is moved so that the wafer W is positioned under the alignment camera 66, and the position of the electrode pad of each chip of the wafer W is moved. Is detected. It is not necessary to detect the positions of all the electrode pads of one chip, and the positions of several electrode pads may be detected. Further, it is not necessary to detect the electrode pads of all the chips on the wafer W, and the positions of the electrode pads of several chips are detected.

  Next, based on the arrangement of the probes 28 and the arrangement of the electrode pads detected as described above, the wafer chuck is performed by the Z-axis moving / rotating unit 52 so that the arrangement direction of the probes 28 and the arrangement direction of the electrode pads coincide with each other. After rotating 16, the wafer chuck 16 is moved in the X-axis direction and the Y-axis direction so that the electrode pad of the chip to be inspected is located below the probe 28, and the Z-axis moving / rotating unit 52 moves the wafer chuck 16 to Z. Raise in the axial direction.

  In this state, the elevation of the wafer chuck 16 is stopped at a height at which the corresponding electrode pad contacts the probe. At this time, the ring-shaped sealing member 40 comes into contact with the probe card 18, and a sealed internal space S is formed between the probe card 18 and the wafer chuck 16. When the suction controller 46 is operated to reduce the pressure in the internal space S, the wafer chuck 16 is drawn toward the probe card 18, and the probe card 18 and the wafer chuck 16 are brought into close contact with each other. The probe 28 contacts the corresponding electrode pad with a uniform contact pressure.

  On the other hand, when the probe card 18 and the wafer chuck 16 are brought into close contact with each other due to the decompression of the internal space S by the vacuum pump 44, the Z-axis moving / rotating unit 52 is lowered in the Z-axis direction to remove the wafer chuck 16 from the alignment device 50. Let Further, in order to prevent the wafer chuck 16 from falling off, the holding portions 30 of the support mechanism are brought close to each other.

  Next, power and a test signal are supplied from the test head 22 to each chip of the wafer W, and an electric operation test is performed by detecting a signal output from the chip.

  Thereafter, the other measurement units 14 are loaded in the same procedure on the wafer chuck 16 and after the alignment operation and the contact operation are completed in each measurement unit 14, the respective chips on the wafer W are simultaneously inspected. It is done sequentially. That is, power and a test signal are supplied from the test head 22 to each chip on the wafer W, and an electric operation test is performed by detecting a signal output from the chip. The wafer chuck 16 may be inspected while being supported by the alignment apparatus 50.

  When the inspection is completed in each measurement unit 14, the alignment apparatus 50 is sequentially moved to each measurement unit 14 to collect the wafer chuck 16 on which the inspected wafer W is held.

  That is, when the inspection is completed in each measuring unit 14, the alignment device 50 is moved to the measuring unit 14 that has been inspected, and after positioning and fixing, the Z-axis moving / rotating unit 52 is raised in the Z-axis direction, After the wafer chuck 16 is supported by the alignment apparatus 50, the decompression of the internal space S by the suction control unit 46 is released, specifically, atmospheric pressure is introduced into the internal space S. Thereby, the contact state between the probe card 18 and the wafer chuck 16 is released. And each holding part 30 of a support mechanism is made into an expanded state. After that, the wafer chuck 16 is lowered in the Z-axis direction by the Z-axis moving / rotating unit 52 to release the positioning and fixing of the alignment apparatus 50, and then the alignment apparatus 50 is moved to a predetermined delivery position. The fixation is released, and the inspected wafer W is unloaded from the wafer chuck 16. The unloaded inspected wafer W is collected by the delivery mechanism.

  In the present embodiment, as shown in FIG. 1, one wafer chuck 16 is assigned to each measurement unit 14, but the plurality of wafer chucks 16 are arranged between the plurality of measurement units 14. May be handed over.

  As described above, in the present embodiment, since each measurement unit 14 includes a positioning and fixing device that positions and fixes the alignment device 50 shared by each measurement unit 14, the position reproducibility of the alignment device 50 moved to each measurement unit 14. The position of the electrode pad and the probe 28 on the wafer W can be easily detected, and the alignment time can be shortened. Therefore, while maintaining the accuracy of the movement position of the alignment apparatus 50, an increase in installation area and an increase in apparatus cost can be suppressed and throughput can be improved.

  In the present embodiment, it is not necessary to perform the alignment operation from the beginning every time the wafer W is replaced, and a part of the alignment operation can be simplified. For example, when inspecting the first wafer W, the relative positional relationship between the wafer W and the probe card 18 is detected and the alignment data is stored, and when inspecting the second and subsequent wafers W, Based on the alignment data acquired when the eye wafer W is inspected, the wafer W and the probe card 18 can be relatively aligned.

  Further, in this embodiment, since the positioning and fixing device is provided, the accuracy of the movement position of the alignment device 50 can be ensured. Therefore, a belt drive mechanism that is relatively difficult to move with high accuracy is preferably used as the moving device 100. Can do.

  Further, in this embodiment, the positioning and fixing device has a clamp mechanism that positions and fixes the three positions of the alignment device 50 so as to be detachable, so that the alignment device 50 has a so-called three-point support configuration in the horizontal direction and the vertical direction. The alignment device 50 can be fixed to the base 11 in a state where the alignment device 50 is positioned in the direction and the rotation of the alignment device 50 around the vertical direction is restricted. Thereby, it becomes possible to position and fix the alignment device 50 moved to each measurement unit 14 with high accuracy at the same position every time.

  In the present embodiment, the configuration in which the three positions of the alignment device 50 are positioned and fixed by the clamp mechanism is shown. However, it is possible to position the alignment device 50 in the horizontal direction, the vertical direction, and the rotation direction around the vertical direction. For example, not only the three positions of the alignment device 50 but also four or more positions may be positioned and fixed by the clamp mechanism.

  Further, in this embodiment, the positioning and fixing are performed at the same position at the three positions of the alignment device 50 by the clamp mechanism, but these positions do not necessarily have to be the same position. The fixed positions may be configured separately.

  For example, in a state in which the three positions of the alignment device 50 are positioned in the horizontal direction, the vertical direction, and the rotation direction around the vertical direction (that is, in a state where they are not fixed), one or a plurality of positions different from these positions are known holding means. You may make it hold | maintain and fix with. As the holding means, for example, a configuration in which the front and back surfaces of the base 62 are sandwiched from above and below by an urging force of an elastic member such as a torsion coil spring is suitable.

  In the present embodiment, the clamp mechanism preferably has a height adjustment mechanism that adjusts the horizontal direction of the alignment device 50. As the height adjustment mechanism, for example, a known screw type height adjustment mechanism using a push screw or a pull screw can be used. Thereby, for example, even if the surface accuracy of the base 11 to which the alignment device 50 is fixed deteriorates due to deformation, the alignment device 50 can be adjusted in parallel by the height adjustment function, thereby preventing a decrease in alignment accuracy. Is possible.

  In the present embodiment, the alignment apparatus 50 is equipped with an alignment camera 66 (first imaging means) and a probe position detection camera 54 (second imaging means). For this reason, compared with the case where an imaging means is provided for each measurement unit 14, it is less affected by distortion such as heat caused by a difference in temperature change for each measurement unit 14, and the alignment camera 66 and the probe position detection camera 54 are not affected. There is no relative displacement. Therefore, the alignment operation can be performed with high accuracy and in a short time.

  Further, in the present embodiment, the configuration in which the three measurement units 14 are arranged along the X-axis direction is shown, but the number and arrangement of the measurement units 14 are not particularly limited, and for example, the X-axis direction and A plurality of measurement units 14 may be two-dimensionally arranged in the Y-axis direction.

  Moreover, it is good also as a multistage structure by which the measurement part group which consists of several measurement part 14 was piled up in the Z-axis direction. For example, the configuration example illustrated in FIG. 9 is a configuration in which measurement unit groups 15 (15A to 15C) including four measurement units 14 are stacked in three stages in the Z-axis direction. In this configuration, an alignment device 50 is provided for each measurement unit group 15, and the alignment device 50 is shared between the measurement units 14 in the same measurement unit group 15. Note that the alignment apparatus 50 may be shared by all the measurement units 14. According to such a configuration, the footprint of the entire apparatus can be reduced, the processing capacity per unit area can be increased, and the cost can be reduced.

  Although the measurement apparatus and the measurement method of the present invention have been described in detail above, the present invention is not limited to the above examples, and various improvements and modifications may be made without departing from the gist of the present invention. Of course.

  DESCRIPTION OF SYMBOLS 10 ... Prober, 11 ... Base part, 12 ... Side plate, 13 ... Head stage, 14 ... Measuring part, 15 ... Measuring part group, 16 ... Wafer chuck, 18 ... Probe card, 20 ... Tester, 22 ... Test head, 24 ... Contact Ring, 26 ... mounting hole, 28 ... probe, 30 ... holding part, 32 ... passage hole, 40 ... ring-shaped sealing member, 42 ... suction port, 43 ... suction path, 44 ... vacuum pump, 46 ... suction control part, 50 Alignment device, 52 Z-axis moving / rotating unit, 54 Probe position detection camera, 56 Camera moving mechanism, 58 X-axis moving table, 60 Y-axis moving table, 62 Base, 64, Support column, 66 Alignment camera, 68 ... guide rail, 70 ... ball screw, 72 ... guide rail, 74 ... ball screw, 100 ... moving device, 101 ... guide rail, 102 ... conveying pallet 106 ... lift mechanism, 108 ... drive unit, 110 ... timing belt, 112 ... driving motor, 114 ... driving pulley, 116 ... idle pulley, 118 ... driving motor, 120 ... ball screw, 130 ... positioning pin, 134 ... chuck member

Claims (8)

Multiple measuring units;
A holding chuck for holding an object to be measured;
An alignment apparatus configured to be movable to the plurality of measurement units, having a fixed portion, and performing relative alignment between the measurement object held by the holding chuck and the measurement unit;
A positioning and fixing device that is provided for each measurement unit and positions and fixes the fixed portion of the alignment apparatus that has moved to each measurement unit;
A measuring apparatus comprising:   The measuring apparatus according to claim 1, wherein the positioning and fixing device includes a clamp mechanism that positions and fixes the detachable portion of the alignment device so as to be detachable.   The measuring apparatus according to claim 1, wherein the positioning and fixing device includes positioning means for positioning at least three positions of the fixed part of the alignment device.   The measuring apparatus according to claim 3, wherein the positioning and fixing device includes a holding unit that is configured separately from the positioning unit and that detachably holds at least one portion of the fixed portion of the alignment device.   The measuring apparatus according to any one of claims 1 to 4, wherein the positioning and fixing device includes a height adjusting unit capable of adjusting a horizontal direction of the fixed portion of the alignment device.   The measurement device according to claim 1, wherein the plurality of measurement units are two-dimensionally arranged along a first direction and a second direction orthogonal to the first direction.   The measuring apparatus according to claim 6, wherein one of the first direction and the second direction is a vertical direction. A plurality of measuring units, a holding chuck for holding an object to be measured, and a plurality of measuring units configured to be movable to the plurality of measuring units, having a fixed part, and the object to be measured and the measuring unit held by the holding chuck An alignment apparatus that performs relative alignment with the probe inspection method in a measurement apparatus comprising:
A movement step of moving the alignment device between the measurement units;
A positioning and fixing step for positioning and fixing the fixed part of the alignment apparatus moved to each measuring unit;
An alignment step of performing relative alignment between the measurement object and the measurement object held by the holding chuck by the alignment device in a state where the fixed part of the alignment device is positioned and fixed;
A measuring method comprising:

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