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JP5635819B2 - Heat treatment method and heat treatment apparatus - Google Patents

Heat treatment method and heat treatment apparatus Download PDF

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JP5635819B2
JP5635819B2 JP2010148195A JP2010148195A JP5635819B2 JP 5635819 B2 JP5635819 B2 JP 5635819B2 JP 2010148195 A JP2010148195 A JP 2010148195A JP 2010148195 A JP2010148195 A JP 2010148195A JP 5635819 B2 JP5635819 B2 JP 5635819B2
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heat treatment
processing
vacuum
processing chamber
furnace
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JP2012012637A (en
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吉雄 古田
吉雄 古田
直吉 古田
直吉 古田
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FULLTECH INC.
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Description

本発明は、炉内を真空状態にして加熱処理を行う熱処理炉に被加熱処理物を設置して加熱処理を行った後に、隣接する加工室に搬出して物理的又は化学的な加工処理を行う熱処理加工方法、前記熱処理加工方法により熱処理加工を施した熱処理加工物及び前記熱処理加工方法に基づく前記加熱処理及び前記加工処理を行う熱処理加工装置に関する。   In the present invention, after a heat treatment is performed in a heat treatment furnace that performs a heat treatment in a vacuum state in the furnace, the heat treatment is performed, and then the material is taken out to an adjacent processing chamber for physical or chemical processing. The present invention relates to a heat treatment method to be performed, a heat-treated product subjected to heat treatment by the heat treatment method, the heat treatment based on the heat treatment method, and a heat treatment apparatus for performing the heat treatment.

一般に、真空熱処理炉を用いた熱処理加工、例えば、焼入処理において、炉内を急冷したり、炉内から高温試料を一旦、取り出して冷媒槽に移送したりして熱加工処理が行われている。   Generally, in heat treatment using a vacuum heat treatment furnace, for example, quenching, the inside of the furnace is rapidly cooled, or a high-temperature sample is once taken out from the furnace and transferred to a refrigerant tank to perform heat processing. Yes.

特開平10−183236号公報(特許文献1)には従来の炉内冷却式真空熱処理炉が開示されている。この炉内冷却式真空熱処理炉においては、炉内に窒素ガスの冷媒導入路を設け、加熱処理を終えた後に炉内に冷却ファンにより送風を行い被処理物(ワーク)に窒素ガスを吹き付けて冷却する。
この炉内冷却式真空熱処理炉の場合には、ガス冷媒を用いて熱交換して冷却処理するが、水焼入れのような急速冷却処理を行うことはできず、勿論、焼入水槽を炉内に直接導入し単一炉内で加熱と急速焼入れを行うには、ワーク取扱上、また作業性の面で困難を伴う。
Japanese Unexamined Patent Publication No. 10-183236 (Patent Document 1) discloses a conventional in-furnace cooling vacuum heat treatment furnace. In this furnace cooling type vacuum heat treatment furnace, a nitrogen gas refrigerant introduction path is provided in the furnace, and after the heat treatment is completed, air is blown into the furnace by a cooling fan, and nitrogen gas is blown onto the workpiece (workpiece). Cooling.
In the case of the in-furnace cooling type vacuum heat treatment furnace, heat treatment is performed using a gas refrigerant to perform cooling treatment, but rapid cooling treatment such as water quenching cannot be performed. It is difficult to carry out heating and rapid quenching in a single furnace directly into the work piece in terms of work handling and workability.

特開平7−268451号公報(特許文献2)には、熱処理炉の下方に焼入加工槽を配設した縦型熱処理装置が開示されている。この縦型熱処理装置は、熱処理炉の下方に焼入加工槽を配置してなり、熱処理炉の底部を開いて加熱後のワークを焼入加工槽に浸漬する。   Japanese Patent Application Laid-Open No. 7-268451 (Patent Document 2) discloses a vertical heat treatment apparatus in which a quenching tank is disposed below a heat treatment furnace. In this vertical heat treatment apparatus, a quenching tank is disposed below the heat treatment furnace, the bottom of the heat treatment furnace is opened, and the heated workpiece is immersed in the quenching tank.

特開平8−319512号公報(特許文献3)には、真空加熱室と冷却室を連設した従来の2室型真空熱処理炉が開示されている。この2室型真空熱処理炉は、冷却室にワークを搬入したのち内部を真空にし、次いで中間ドアを開いて真空に保持された真空加熱室内にワークを搬送し、熱処理完了後に逆の動作により冷却室から外部にワークを搬出するようになっている。   Japanese Laid-Open Patent Publication No. 8-319512 (Patent Document 3) discloses a conventional two-chamber vacuum heat treatment furnace in which a vacuum heating chamber and a cooling chamber are connected in series. In this two-chamber vacuum heat treatment furnace, the work is brought into the cooling chamber, the inside is evacuated, then the intermediate door is opened and the work is transferred into a vacuum heating chamber held in a vacuum. Work is carried out from the room to the outside.

前記縦型熱処理装置の場合には、炉内でワークをハンガワイヤにより吊り下げて、炉内底部から焼入槽に移送するから、ワーク移送機構は簡単化することができる。しかし、焼入時には熱処理炉内を開放した状態で、吊り下げたワークを加工槽に降下するため、焼入処理の際に発生した蒸気及びガス成分が直上の熱処理炉に侵入し、ワークや熱処理炉内が水や不純物で汚染される問題を生ずる。熱処理炉内が汚染されると、洗浄等のクリーニングに手間がかかり、熱処理加工効率が低下する。   In the case of the vertical heat treatment apparatus, since the work is suspended by a hanger wire in the furnace and transferred from the bottom of the furnace to the quenching tank, the work transfer mechanism can be simplified. However, since the suspended work is lowered into the processing tank with the inside of the heat treatment furnace open at the time of quenching, the vapor and gas components generated during the quenching process enter the heat treatment furnace directly above, and the work and heat treatment This causes a problem that the inside of the furnace is contaminated with water and impurities. When the inside of the heat treatment furnace is contaminated, cleaning such as cleaning takes time and the heat treatment efficiency is lowered.

前記2室型真空熱処理炉は、中間ドアを介して真空加熱室と冷却室を分離した構造を有するので、加熱処理済みのワークを冷却室側に搬出し、前記中間ドアを閉塞した後は真空加熱室を外気と遮断可能になる。しかしながら、ワーク搬送手段として、炉内に敷設したレールに沿って走行するフォーク台車を使用しているため、フォーク台車やレール等の搬送設備の付設により熱処理炉の構成が大型化する問題があった。その大型化に伴って炉内の容積を余分に拡大する必要があり、加熱消費エネルギーの使用効率が低下する問題もあった。
特に、急速冷却を要する焼入処理においては、高温加熱位置から冷却位置までワークを短時間(1秒程度)で移動させるのが好ましいが、この移動時間は前記フォーク台車の搬送速度に依存するため通常の搬送機構では、係る短時間での高速搬送を実現するのが難しかった。このため、フォーク台車で冷却室側に搬出するまでに時間がかかり、閉塞するまで前記中間ドアの開成により開放された真空加熱室に外気が侵入し、不純物等がワークに付着したり真空加熱室内を汚染したりするおそれがあった。
Since the two-chamber vacuum heat treatment furnace has a structure in which the vacuum heating chamber and the cooling chamber are separated via an intermediate door, the heat-treated workpiece is carried out to the cooling chamber side and the vacuum is closed after the intermediate door is closed. The heating chamber can be shut off from the outside air. However, since a fork cart that travels along rails laid in the furnace is used as the workpiece transfer means, there is a problem that the configuration of the heat treatment furnace increases due to the installation of transfer equipment such as fork carts and rails. . Along with the increase in size, it is necessary to increase the volume in the furnace excessively, and there is a problem in that the efficiency of use of heating consumption energy decreases.
In particular, in a quenching process that requires rapid cooling, it is preferable to move the workpiece from a high-temperature heating position to a cooling position in a short time (about 1 second), but this movement time depends on the transport speed of the fork cart. With a normal transport mechanism, it has been difficult to achieve high-speed transport in such a short time. For this reason, it takes time until the fork cart is carried out to the cooling chamber side, and outside air enters the vacuum heating chamber opened by opening the intermediate door until it is closed, and impurities or the like adhere to the work or the vacuum heating chamber There was a risk of contamination.

特開平10−183236号公報JP-A-10-183236 特開平7−268451号公報JP 7-268451 A 特開平8−319512号公報JP-A-8-319512

本発明の目的は、上記課題に鑑み、熱処理炉内に大型の搬送設備を設けることなく、加熱位置から次の加工位置に高速移送でき、加熱済みワークの移送に伴うワークや熱処理炉内への不純物や水分等の付着、汚染を生じさせずに高品質の熱処理加工を行うことのできる熱処理加工方法、その熱処理加工方法により熱処理加工を施した熱処理物及び前記熱処理方法に基づき熱処理加工を行う熱処理加工装置を提供することである。   In view of the above problems, the object of the present invention is to provide a high-speed transfer from the heating position to the next processing position without providing a large-sized transfer facility in the heat treatment furnace. A heat treatment method capable of performing high-quality heat treatment without causing adhesion or contamination of impurities, moisture, etc., a heat treatment processed by the heat treatment method, and a heat treatment that performs heat treatment based on the heat treatment method It is to provide a processing apparatus.

本発明の第1の形態は、炉内を真空状態にして加熱処理を行う熱処理炉に被加熱処理物を設置して加熱処理を行った後に、隣接する加工室に搬出して物理的又は化学的な加工処理を行う熱処理加工方法において、前記熱処理炉は前記加工室と連通する連通部を有し、前記連通部の搬出口と前記加工室の開放口の間に開閉扉を配設し、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記連通部を通じて前記加工室に放出、搬出して加工処理を行う熱処理加工方法である。   In the first embodiment of the present invention, after a heat treatment is performed in a heat treatment furnace that performs heat treatment in a vacuum state in the furnace, the heat treatment is performed, and then the material is taken out to an adjacent processing chamber for physical or chemical treatment. In the heat treatment method for performing general processing, the heat treatment furnace has a communication portion communicating with the processing chamber, and an open / close door is disposed between a carry-out port of the communication portion and an opening of the processing chamber, In the heat treatment method, the object to be heated after the heat treatment is discharged and carried out to the processing chamber through the communication portion while the opening / closing door is instantaneously opened and closed.

本発明の第2の形態は、第1形態において、前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行う熱処理加工方法である。 According to a second aspect of the present invention, there is provided a heat treatment method according to the first aspect, wherein the heat treatment furnace is subjected to a high-temperature and high-vacuum heat treatment in a high-temperature state of at least 1000 ° C. and a high vacuum state of 1 × 10 −3 Pa or less. It is.

本発明の第3の形態は、第1又は第2形態において、前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を少なくとも前記熱処理炉の真空度より低い所定の真空度に排気して前記加工処理を行う熱処理加工方法である。   According to a third aspect of the present invention, in the first or second aspect, in the state where the opening of the processing chamber is closed by the open / close door, the processing chamber is at least a predetermined vacuum lower than the vacuum degree of the heat treatment furnace. This is a heat treatment method that exhausts the gas every time and performs the processing.

本発明の第4の形態は、第1、第2又は第3形態において、前記連通部の前記搬出口を前記加工室の前記開放口上方に配設し、被加熱処理物を前記熱処理炉内の加熱位置から前記連通部に向けて放出、搬出するための高速搬出機構を設け、前記高速搬出機構による搬出作動時間を1〜0.05秒間で行って被加熱処理物を前記連通部を通じて前記搬出口より前記加工室内に投下する熱処理加工方法である。   According to a fourth aspect of the present invention, in the first, second, or third aspect, the outlet of the communication portion is disposed above the opening of the processing chamber, and the object to be heated is placed in the heat treatment furnace. A high-speed unloading mechanism for discharging and unloading from the heating position toward the communicating portion is provided, and the unloading operation time by the high-speed unloading mechanism is performed in 1 to 0.05 seconds, and the object to be heated is passed through the communicating portion. It is a heat treatment method of dropping into the processing chamber from the carry-out port.

本発明の第5の形態は、第1〜第4形態のいずれかにおいて、前記高速搬出機構により搬出された被加熱処理物を検出する検出手段を前記連通部に設け、前記被加熱処理物の放出を検出したことを条件に前記記開閉扉の瞬時開閉を行う熱処理加工方法である。   According to a fifth aspect of the present invention, in any one of the first to fourth aspects, the communication unit is provided with detection means for detecting the heated object to be carried out by the high-speed carrying-out mechanism, It is a heat treatment processing method that instantaneously opens and closes the opening and closing door on condition that release is detected.

本発明の第6の形態は、第1〜第5形態のいずれかにおいて、前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記連通部を通じて前記焼入れ浴槽に投入して焼入れ加工を行う熱処理加工方法である。   According to a sixth aspect of the present invention, in any one of the first to fifth aspects, a quenching tub is disposed in the processing chamber, and a heat-treated object subjected to high temperature treatment by the heat treatment is placed in the quenching tub through the communication portion. This is a heat treatment method in which a quenching process is performed.

本発明の第7の形態は、第1〜第5形態のいずれかに係る熱処理加工方法により前記加熱処理と前記加工処理を施した材質特性を具備した熱処理加工物である。   A seventh aspect of the present invention is a heat treated product having material properties obtained by performing the heat treatment and the processing by the heat treatment processing method according to any one of the first to fifth embodiments.

本発明の第8の形態は、炉内を真空状態にして加熱処理を行う熱処理炉を備え、前記熱処理炉内に被加熱処理物を設置して加熱処理を行った後に、隣接する加工室に搬出して物理的又は化学的な加工処理を行う熱処理加工装置において、前記熱処理炉は前記加工室と連通する連通部と、被加熱処理物を前記熱処理炉内の加熱位置から前記連通部に向けて放出、搬出するための高速搬出機構と、前記連通部の搬出口と前記加工室の開放口の間に開閉扉とを有し、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記高速搬出機構により高速搬出し、前記連通部を通じて前記加工室に放出、搬出して前記加工処理を行う熱処理加工装置である。   The eighth embodiment of the present invention includes a heat treatment furnace for performing a heat treatment in a vacuum state in the furnace, and after the heat treatment is performed in the heat treatment furnace by installing a heat treatment object, In the heat treatment apparatus for carrying out physical or chemical processing by unloading, the heat treatment furnace has a communication part communicating with the processing chamber, and an object to be heated is directed from the heating position in the heat treatment furnace to the communication part. A high-speed unloading mechanism for discharging and unloading, and an open / close door between the unloading port of the communication portion and the opening of the processing chamber, and the object to be heated after the heat treatment is performed, It is a heat treatment processing apparatus that performs high speed carry-out by the high-speed carry-out mechanism while discharging and carrying out the high-speed carry-out mechanism to the processing chamber through the communicating portion while the door is opened and closed instantaneously.

本発明の第9の形態は、第8形態において、前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行う熱処理加工装置である。 A ninth aspect of the present invention is the heat treatment apparatus according to the eighth aspect, wherein the heat treatment furnace performs a high-temperature high-vacuum heat treatment by setting the heat treatment furnace at a high temperature state of at least 1000 ° C. or higher and a high vacuum state of 1 × 10 −3 Pa or less. It is.

本発明の第10の形態は、第8又は第9形態において、前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を、少なくとも前記熱処理炉の真空度より低い所定の真空度に排気する真空排気装置を有する熱処理加工装置である。   According to a tenth aspect of the present invention, in the eighth or ninth aspect, in the state where the opening of the processing chamber is closed by the open / close door, the processing chamber is at least a predetermined degree lower than the vacuum degree of the heat treatment furnace. It is a heat treatment processing apparatus having a vacuum exhaust apparatus that exhausts to a degree of vacuum.

本発明の第11の形態は、第8、第9又は第10形態において、前記連通部の前記搬出口を前記加工室の前記開放口上方に配設し、前記高速搬出機構による搬出作動時間を1〜0.05秒間で行って被加熱処理物を前記搬出口より前記加工室内に投下する熱処理加工装置である。   According to an eleventh aspect of the present invention, in the eighth, ninth or tenth aspect, the unloading port of the communication portion is disposed above the opening of the processing chamber, and the unloading operation time by the high-speed unloading mechanism is increased. It is a heat treatment processing apparatus that performs the treatment in 1 to 0.05 seconds and drops the object to be heated into the processing chamber from the carry-out port.

本発明の第12の形態は、第8〜第11形態のいずれかにおいて、前記連通部に前記高速搬出機構により放出された被加熱処理物を検出する検出手段を設け、前記被加熱処理物の放出を検出したことを条件に前記記開閉扉の瞬時開閉を行う熱処理加工装置である。   According to a twelfth aspect of the present invention, in any one of the eighth to eleventh aspects, the communication unit is provided with a detection unit that detects the object to be heated released by the high-speed carry-out mechanism, It is a heat treatment processing apparatus that instantaneously opens and closes the opening / closing door on condition that release is detected.

本発明の第13の形態は、第8〜第12形態のいずれかにおいて、前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記焼入れ浴槽に投入して、焼入れ加工を行う熱処理加工装置である。   In a thirteenth aspect of the present invention, in any one of the eighth to twelfth aspects, a quenching tub is disposed in the processing chamber, and a heat-treated object subjected to high temperature treatment by the heat treatment is charged into the quenching tub, It is a heat treatment processing apparatus that performs quenching.

本発明の第14の形態は、第8〜第13形態のいずれかにおいて、前記高速搬出機構は、被加熱処理物を前記連通部に向けて送り出す送出部材と、前記送出部材を往復移動させるピストン機構とからなる熱処理加工装置である。   According to a fourteenth aspect of the present invention, in any one of the eighth to thirteenth aspects, the high-speed carry-out mechanism includes a delivery member that feeds an object to be heated toward the communication portion, and a piston that reciprocates the delivery member. It is the heat processing apparatus which consists of a mechanism.

本発明の第15の形態は、第8〜第14形態のいずれかにおいて、前記熱処理炉は、電磁誘導加熱により炉内を加熱する高周波誘導加熱電熱装置を有する熱処理加工装置である。   A fifteenth aspect of the present invention is the heat treatment apparatus according to any one of the eighth to fourteenth aspects, wherein the heat treatment furnace includes a high-frequency induction heating electric heating apparatus that heats the inside of the furnace by electromagnetic induction heating.

本発明の第1の形態によれば、前記熱処理炉を用いた熱処理加工方法において、前記熱処理炉は前記加工室と連通する連通部を有し、前記連通部の搬出口と前記加工室の開放口の間に開閉扉を配設し、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記連通部を通じて前記加工室に放出、搬出して加工処理を行うので、前記熱処理炉内に大型の搬送設備を設けることなく、簡易なワーク放出機構を使用して真空加熱位置から次の加工位置に高速移送でき、加熱済みのワーク(被加熱処理物)の搬出に伴う、不純物や水分等の前記熱処理炉内の汚染やワーク自体への付着が生ずることなく高品質の熱処理加工を行え、しかも熱処理加工効率の向上を図ることができる。   According to the first aspect of the present invention, in the heat treatment method using the heat treatment furnace, the heat treatment furnace has a communication portion that communicates with the processing chamber, and an outlet of the communication portion and an opening of the processing chamber are provided. An opening / closing door is provided between the mouths, and the object to be heated after the heat treatment is discharged to the processing chamber through the communicating portion while the opening / closing door is instantaneously opened and closed, and then processed. As a result, it is possible to transfer a high-speed workpiece from a vacuum heating position to the next processing position using a simple workpiece discharge mechanism without providing a large-sized transfer facility in the heat treatment furnace, High quality heat treatment can be performed without causing contamination of the heat treatment furnace such as impurities and moisture and adhesion to the workpiece itself due to unloading, and the heat treatment efficiency can be improved.

本発明の第2形態によれば、前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行ったワークを迅速に前記加工室内に放出、搬出して、不純物や水分等の前記熱処理炉内の汚染やワーク自体への付着が生ずることなく高品質の熱処理加工を行うことができる。 According to the second embodiment of the present invention, the workpiece that has been subjected to the high-temperature high-vacuum heat treatment in a high-temperature state of at least 1000 ° C. or higher and a high vacuum state of 1 × 10 −3 Pa or less is quickly processed. High quality heat treatment can be performed by discharging into and out of the room without causing contamination of the heat treatment furnace such as impurities and moisture and adhesion to the workpiece itself.

本発明の第3の形態によれば、前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を少なくとも前記熱処理炉の真空度より低い所定の真空度に排気して前記加工処理を行うので、前記加工室内を常圧状態とした場合と比較して、前記熱処理炉と前記加工室の真空度の差異を少なくして、ワーク放出の際の前記開閉扉の瞬時開閉時に前記加工室からの気体流の逆流を抑え、しかも前記加工室内の不純物、不要ガス成分等を常圧状態より低減して、不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくすことができ、より高品質の熱処理加工を行うことができる。   According to the third aspect of the present invention, in a state where the opening of the processing chamber is closed by the open / close door, the processing chamber is exhausted to at least a predetermined vacuum level lower than the vacuum level of the heat treatment furnace. Since the processing is performed, the difference in the vacuum degree between the heat treatment furnace and the processing chamber is reduced compared with the case where the processing chamber is in a normal pressure state, and the opening / closing door is instantaneously opened and closed when the workpiece is discharged. Suppresses the backflow of the gas flow from the processing chamber and reduces impurities and unnecessary gas components in the processing chamber from the normal pressure state, thereby causing contamination in the heat treatment furnace due to impurities and moisture, and adhesion to the workpiece. Can be reliably eliminated, and higher-quality heat treatment can be performed.

本発明の第4の形態によれば、前記連通部の前記搬出口を前記加工室の前記開放口上方に配設し、被加熱処理物を前記熱処理炉内の加熱位置から前記連通部に向けて放出、搬出するための高速搬出機構を設け、前記高速搬出機構による搬出作動時間を1〜0.05秒間で行って被加熱処理物を前記連通部を通じて前記搬出口より前記加工室内に投下するので、前記熱処理炉内を開放状態にする期間を1秒以下にすることができ、前記加工室からの気体流の逆流を抑制して、前記加工室内の不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくして高品質の熱処理加工を実現することができる。   According to the fourth aspect of the present invention, the carry-out port of the communication part is disposed above the opening of the processing chamber, and the object to be heated is directed from the heating position in the heat treatment furnace to the communication part. A high-speed unloading mechanism for discharging and unloading is provided, the unloading operation time by the high-speed unloading mechanism is performed in 1 to 0.05 seconds, and the object to be heated is dropped into the processing chamber from the unloading port through the communicating portion. Therefore, the period during which the inside of the heat treatment furnace is opened can be set to 1 second or less, the back flow of the gas flow from the processing chamber is suppressed, and the inside of the heat treatment furnace due to impurities, moisture, etc. in the processing chamber can be suppressed. High quality heat treatment can be realized by reliably eliminating the occurrence of contamination and adhesion to the workpiece.

本発明の第5の形態によれば、前記連通部に設けた前記検出手段により、前記被加熱処理物の放出を検出したことを条件に前記記開閉扉の瞬時開閉を行うので、前記熱処理炉内を開放状態にする期間を最短にすることができ、前記加工室からの気体流の逆流を抑制して、前記加工室内の不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくして高品質の熱処理加工を実現することができる。   According to the fifth aspect of the present invention, since the opening / closing door is instantaneously opened / closed on the condition that the detection means provided in the communication portion detects the discharge of the object to be heated, the heat treatment furnace The period during which the inside is opened can be minimized, the backflow of the gas flow from the processing chamber is suppressed, and contamination of the heat treatment furnace due to impurities, moisture, etc. in the processing chamber and adhesion to the workpiece are prevented. It is possible to achieve high-quality heat treatment without any occurrence.

本発明の第6の形態によれば、前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記連通部を通じて前記焼入れ浴槽に投入して焼入れ加工を行うので、前記焼入れ浴槽への投入時点で前記記開閉扉の閉成を終えて、前記熱処理炉内を閉鎖状態にした状態で焼入れ加工を行え、焼入れ加工に伴って発生する蒸気やガス成分が前記熱処理炉内に侵入したりワークに付着したりせずに高品質の真空焼入れ加工を行うことができる。   According to the sixth aspect of the present invention, a quenching tub is disposed in the processing chamber, and a material to be heated that has been subjected to a high temperature treatment by the heat treatment is put into the quenching tub through the communication portion to perform a quenching process. At the time of charging into the quenching tub, the opening and closing door is closed, and the heat treatment furnace can be quenched while the heat treatment furnace is closed. Steam and gas components generated during the quenching process are generated in the heat treatment furnace. High quality vacuum quenching can be performed without penetrating inside or adhering to the workpiece.

本発明の第7の形態によれば、第1〜第5形態のいずれかに係る熱処理加工方法により前記加熱処理と前記加工処理を施すことによって、不純物等の影響を排除した良質の材質特性を具備した熱処理加工物を得ることができる。 According to the seventh aspect of the present invention, by performing the heat treatment and the processing treatment by the heat treatment method according to any one of the first to fifth embodiments, good quality material characteristics that eliminate the influence of impurities and the like are obtained. It is possible to obtain the heat-treated product provided.

本発明の第8の形態によれば、真空加熱処理を行う熱処理炉を備えた熱処理加工装置において、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記高速搬出機構により高速搬出し、前記連通部を通じて前記加工室に放出、搬出して前記加工処理を行うので、前記熱処理炉内に大型の搬送設備を設けることなく、前記放出搬送によって真空加熱位置から次の加工位置に高速移送でき、加熱済みのワークの搬出に伴う、不純物や水分等の前記熱処理炉内の汚染やワーク自体への付着が生ずることなく高品質の熱処理加工を行え、しかも熱処理加工効率の向上を図ることのできる熱処理加工装置を実現することができる。   According to the eighth aspect of the present invention, in a heat treatment apparatus equipped with a heat treatment furnace for performing vacuum heat treatment, the object to be heated after the heat treatment is performed while the door is opened and closed instantaneously. Since the high-speed carrying-out mechanism carries out the high-speed carrying-out mechanism and discharges and carries it out to the processing chamber through the communicating portion to carry out the processing, it is possible to carry out the processing from the vacuum heating position by the discharge carrying without providing a large carrying facility in the heat treatment furnace. It can be transferred to the next processing position at high speed, and it can perform high-quality heat treatment without contamination of the heat treatment furnace such as impurities and moisture caused by unloading of the heated work and adhesion to the work itself. A heat treatment apparatus capable of improving the efficiency can be realized.

本発明の第9の形態によれば、前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行ったワークを迅速に前記加工室内に放出、搬出して、不純物や水分等の前記熱処理炉内の汚染やワーク自体への付着が生ずることなく高品質の熱処理加工を行える熱処理加工装置を実現することができる。 According to the ninth aspect of the present invention, the workpiece that has been subjected to the high-temperature high-vacuum heat treatment in a high-temperature state of at least 1000 ° C. or higher and a high-vacuum state of 1 × 10 −3 Pa or less is quickly obtained. A heat treatment apparatus capable of performing high-quality heat treatment without being contaminated in the heat treatment furnace or adhering to the workpiece itself by being discharged and carried out into the processing chamber can be realized.

本発明の第10の形態によれば、前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を少なくとも前記熱処理炉の真空度より低い所定の真空度に前記真空排気装置によって排気して前記加工処理を行うので、前記加工室内を常圧状態とした場合と比較して、前記熱処理炉と前記加工室の真空度の差異を少なくして、ワーク放出の際の前記開閉扉の瞬時開閉時に前記加工室からの気体流の逆流を抑え、しかも前記加工室内の不純物、不要ガス成分等を常圧状態より低減して、不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくすことができ、より高品質の熱処理加工を行える熱処理加工装置を実現することができる。   According to the tenth aspect of the present invention, in the state where the opening of the processing chamber is closed by the open / close door, the vacuum exhaust device is at least a predetermined vacuum level lower than the vacuum level of the heat treatment furnace in the processing chamber. Since the processing is performed by exhausting the air, the opening and closing of the workpiece is released by reducing the difference in the degree of vacuum between the heat treatment furnace and the processing chamber as compared with the case where the processing chamber is in a normal pressure state. When the door is opened and closed instantaneously, the backflow of the gas flow from the processing chamber is suppressed, and impurities and unnecessary gas components in the processing chamber are reduced from the normal pressure state. It is possible to realize the heat treatment apparatus capable of reliably eliminating the occurrence of adhesion to the substrate and performing higher quality heat treatment.

本発明の第11の形態によれば、前記連通部の前記搬出口を前記加工室の前記開放口上方に配設し、前記高速搬出機構による搬出作動時間を1〜0.05秒間で行って被加熱処理物を前記搬出口より前記加工室内に投下するので、前記熱処理炉内を開放状態にする期間を1秒以下にすることができ、前記加工室からの気体流の逆流を抑制して、前記加工室内の不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくして高品質の熱処理加工を行える熱処理加工装置を実現することができる。   According to the eleventh aspect of the present invention, the unloading port of the communicating portion is disposed above the opening of the processing chamber, and the unloading operation time by the high-speed unloading mechanism is 1 to 0.05 seconds. Since the object to be heated is dropped into the processing chamber from the carry-out port, the period during which the heat treatment furnace is opened can be reduced to 1 second or less, and the backflow of the gas flow from the processing chamber is suppressed. Thus, it is possible to realize a heat treatment apparatus capable of performing high-quality heat treatment without reliably causing contamination in the heat treatment furnace or adhesion to the workpiece due to impurities, moisture, or the like in the processing chamber.

本発明の第12の形態によれば、前記連通部に設けた前記検出手段により、前記被加熱処理物の放出を検出したことを条件に前記記開閉扉の瞬時開閉を行うので、前記熱処理炉内を開放状態にする期間を最短にすることができ、前記加工室からの気体流の逆流を抑制して、前記加工室内の不純物や水分等による前記熱処理炉内の汚染やワークへの付着の発生を確実になくして高品質の熱処理加工を行える熱処理加工装置を実現することができる。   According to the twelfth aspect of the present invention, since the opening and closing door is instantaneously opened and closed on the condition that the detection means provided in the communication portion detects the discharge of the object to be heated, the heat treatment furnace The period during which the inside is opened can be minimized, the backflow of the gas flow from the processing chamber is suppressed, and contamination of the heat treatment furnace due to impurities, moisture, etc. in the processing chamber and adhesion to the workpiece are prevented. It is possible to realize a heat treatment apparatus capable of performing high-quality heat treatment without causing generation.

本発明の第13の形態によれば、前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記連通部を通じて前記焼入れ浴槽に投入して焼入れ加工を行うので、前記焼入れ浴槽への投入時点で前記記開閉扉の閉成を終えて、前記熱処理炉内を閉鎖状態にした状態で焼入れ加工を行え、焼入れ加工に伴って発生する蒸気やガス成分が前記熱処理炉内に侵入したりワークに付着したりせずに高品質の真空焼入れ加工を行える焼入れ用熱処理加工装置を実現することができる。   According to the thirteenth aspect of the present invention, a quenching tub is disposed in the processing chamber, and a material to be heated that has been subjected to a high temperature treatment by the heat treatment is put into the quenching tub through the communicating portion to perform a quenching process. At the time of charging into the quenching tub, the opening and closing door is closed, and the heat treatment furnace can be quenched while the heat treatment furnace is closed. Steam and gas components generated during the quenching process are generated in the heat treatment furnace. It is possible to realize a quenching heat treatment apparatus that can perform high-quality vacuum quenching without intruding into the workpiece or adhering to the workpiece.

本発明の第14の形態によれば、前記高速搬出機構は、被加熱処理物を前記連通部に向けて送り出す送出部材と、前記送出部材を往復移動させるピストン機構とからなるので、前記ピストン機構による前記送出部材の往復ピストン駆動により前記被加熱処理物を前記連通部に向けて送り出して前記放出を迅速に行え、前記熱処理炉内に大型のワーク移送機構を設けることなく、熱処理加工装置の簡素化を図ることができる。   According to the fourteenth aspect of the present invention, the high-speed carry-out mechanism includes a feed member that feeds the object to be heated toward the communication portion and a piston mechanism that reciprocates the feed member. By the reciprocating piston drive of the delivery member by means of the above, the object to be heated is sent out toward the communicating part and the discharge can be performed quickly, and the heat treatment processing apparatus can be simplified without providing a large work transfer mechanism in the heat treatment furnace. Can be achieved.

本発明の第15の形態によれば、前記高周波誘導加熱電熱装置により前記熱処理炉内を加熱するので、高周波誘導加熱による昇温速度の高速化により加熱処理時間の短縮化及びワーク素材への熱負荷の低減を図ることができ、高品質の熱処理加工を行える熱処理加工装置を実現することができる。   According to the fifteenth aspect of the present invention, since the inside of the heat treatment furnace is heated by the high-frequency induction heating electric heating apparatus, the heat treatment time is shortened and the heat to the workpiece material is increased by increasing the heating rate by high-frequency induction heating. A heat treatment apparatus capable of reducing the load and performing high-quality heat treatment can be realized.

本発明の実施形態に係る真空焼入処理装置の概略構成図である。It is a schematic block diagram of the vacuum hardening processing apparatus which concerns on embodiment of this invention. 前記真空焼入処理装置の制御部の概略ブロック図である。It is a schematic block diagram of the control part of the said vacuum hardening processing apparatus. 前記制御部による真空焼入処理において実行される真空自動制御及び高温加熱制御のフローチャートである。It is a flowchart of the vacuum automatic control and high temperature heating control which are performed in the vacuum hardening process by the said control part. 前記焼入処理における加工制御のフローチャートである。It is a flowchart of the process control in the said hardening process. 前記焼入処理装置におけるワーク移送処理を説明するための図である。It is a figure for demonstrating the workpiece | work transfer process in the said quenching processing apparatus. 本発明に係る連結部の変形例を示す概略構成図である。It is a schematic block diagram which shows the modification of the connection part which concerns on this invention.

以下、本発明の実施形態に係る真空焼入処理装置を添付図面に基づいて詳細に説明する。
図1は本実施形態に係る真空焼入処理装置の概略構成図である。
この真空焼入処理装置は、真空熱処理炉1と、真空熱処理炉1の一端側に配設した連通部2と、連通部2の下方に配設した焼入れ用加工室3とからなる。真空熱処理炉1は横型電気炉であり、外周面に高周波誘導加熱電熱装置の高周波誘導加熱コイル4が巻回されている。真空熱処理炉1の連通部2と反対側の端部には、連結部5を介して真空排気部6が設けられている。真空排気部6には排気管7が連結され、排気管7の吸引側には圧力制御バルブ8を介して、真空ポンプのターボ分子ポンプ(以下、TMPと称する。)9及び補助ポンプのロータリーポンプ(以下、RPと称する。)10が接続されている。TMP9とRP10の連結管路には、加工室3に開閉バルブ27を介して連通した連通管28が接続されている。連通部2下方の搬出口と加工室3上部の開放口の間の連結部23に開閉扉25が設置されている。開閉扉25により閉塞された状態で、加工室3を排気するRP26が設けられている。開閉蓋25は、パルス制御によるゲート駆動部24によって高速開閉駆動されるゲートバルブからなる。なお、図1において、RP10及びRP26を夫々、P1、P2で示している。
Hereinafter, a vacuum quenching apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic configuration diagram of a vacuum quenching processing apparatus according to the present embodiment.
The vacuum quenching apparatus includes a vacuum heat treatment furnace 1, a communication portion 2 disposed on one end side of the vacuum heat treatment furnace 1, and a quenching processing chamber 3 disposed below the communication portion 2. The vacuum heat treatment furnace 1 is a horizontal electric furnace, and a high frequency induction heating coil 4 of a high frequency induction heating electric heating device is wound around an outer peripheral surface. An evacuation unit 6 is provided at the end of the vacuum heat treatment furnace 1 on the side opposite to the communication unit 2 via a connecting unit 5. An exhaust pipe 7 is connected to the vacuum exhaust section 6, and a turbo molecular pump (hereinafter referred to as TMP) 9 of a vacuum pump and a rotary pump of an auxiliary pump are connected to a suction side of the exhaust pipe 7 through a pressure control valve 8. (Hereinafter referred to as RP) 10 is connected. A communication pipe 28 communicating with the processing chamber 3 via an opening / closing valve 27 is connected to the connection pipe line between the TMP 9 and the RP 10. An opening / closing door 25 is installed at a connecting portion 23 between the carry-out port below the communication portion 2 and the opening at the top of the processing chamber 3. RP26 which exhausts the processing chamber 3 in the state obstruct | occluded by the opening / closing door 25 is provided. The open / close lid 25 is composed of a gate valve that is driven to open and close at high speed by the gate drive unit 24 under pulse control. In FIG. 1, RP10 and RP26 are denoted by P1 and P2, respectively.

連通部2はワーク放出空間を形成する略T字形の形状を有し、上部の一端には連結部18を介して真空熱処理炉1と連通している。また、連通部2上部の他端側には、ワーク36を搬入するためのワーク搬入口19が設けられている。ワーク搬入口19は開閉自在のシャッタ構造からなり、真空加熱処理時には閉鎖される。連通部2には、真空熱処理炉1及び連通部2の真空圧を計測する圧力検出センサ29が配設されている。また、連通部2には真空圧を目視するための圧力ゲージ30aが付設されている。連通部2の下部は開放されており、その開放口がワークの搬出口を構成し、該搬出口の手前近傍に一対の投受光センサ(投光部21と受光部22)が配設されている。   The communication portion 2 has a substantially T-shape that forms a workpiece discharge space, and communicates with the vacuum heat treatment furnace 1 through a connecting portion 18 at one upper end. Further, a work carry-in port 19 for carrying the work 36 is provided on the other end side of the upper part of the communication part 2. The work carry-in port 19 has a shutter structure that can be freely opened and closed, and is closed during the vacuum heating process. The communication part 2 is provided with a pressure detection sensor 29 that measures the vacuum pressure of the vacuum heat treatment furnace 1 and the communication part 2. Further, the communication portion 2 is provided with a pressure gauge 30a for visually checking the vacuum pressure. The lower part of the communication part 2 is open, and the opening forms a work exit for the workpiece, and a pair of light projecting / receiving sensors (light projecting part 21 and light receiving part 22) are disposed in the vicinity of the exit of the work exit. Yes.

加工室3の内部には、冷却用の水32を収容した焼入れ水槽31が設置され、開閉扉25を閉鎖した状態で焼入れゾーンを形成する。加工室3には、室内の真空圧を目視するための圧力ゲージ30bを付設した配管が接続されており、その配管は開閉バルブ30cを介して外気と連通している。開閉バルブ30cを開いて該配管を通じて窒素等のパージングガス等を加工室3内に導入することができる。加工室3の底部には、開閉蓋33が設けられており、破線で示すように開成することにより、焼入れ水槽31の出し入れを行うことができる。   A quenching water tank 31 containing cooling water 32 is installed inside the processing chamber 3, and a quenching zone is formed with the open / close door 25 closed. Connected to the processing chamber 3 is a pipe provided with a pressure gauge 30b for visually checking the vacuum pressure in the room, and the pipe communicates with the outside air via an opening / closing valve 30c. A purging gas such as nitrogen can be introduced into the processing chamber 3 through the pipe by opening the opening / closing valve 30c. An opening / closing lid 33 is provided at the bottom of the processing chamber 3, and the quenching water tank 31 can be taken in and out by opening as shown by a broken line.

真空熱処理炉1の略中央部には、ワーク16を載置してセットするためのワーク設置台15が設置されている。また、その略中央部には、内部温度を検出する温度センサ17が設置されている。真空排気部6側には、ワーク設置台15にセットしたワークを連通部2に向けて放出、搬出するためのピストン機構が配設されている。このピストン機構は、真空熱処理炉1の中心軸に沿って水平往復移動するピストンロッド12と、ピストンロッド12のピストン駆動装置11からなる。ピストン駆動装置11の往復駆動により、ピストンロッド12の先端部13は連結部5付近からワーク設置台15の加熱位置までを1往復ストロークとして往復移動する。ピストンロッド12の往復移動により、ワーク設置台15のワーク16は先端部13の当接により水平押出力を受けて、図1の1点鎖線に示すように、炉内から放出されて飛び出した後、放物線の軌跡を描いて連通部2及び加工室3側に落下していく。真空排気部6のロッド導入側には、真空漏れを防止するためのシール部14が設けられている。シール部14は、ピストンロッド12の移動箇所に設けたOリングシール部材や真空熱処理炉1の高真空と外気(大気圧)を遮断するための磁気流体シールド機構(図示せず)からなる。ピストン駆動装置11には、ピストンロッド12の往復ストロークを検出する光学検出センサ34、35が配設され、また、ピストンロッド12の油圧制御部20を内蔵している。   In a substantially central part of the vacuum heat treatment furnace 1, a work installation table 15 for installing and setting the work 16 is installed. In addition, a temperature sensor 17 for detecting the internal temperature is installed at a substantially central portion. On the side of the vacuum exhaust unit 6, a piston mechanism for discharging and carrying out the workpiece set on the workpiece installation table 15 toward the communication unit 2 is disposed. The piston mechanism includes a piston rod 12 that reciprocates horizontally along the central axis of the vacuum heat treatment furnace 1, and a piston drive device 11 for the piston rod 12. By the reciprocating drive of the piston drive device 11, the tip end portion 13 of the piston rod 12 reciprocates as one reciprocating stroke from the vicinity of the connecting portion 5 to the heating position of the workpiece setting table 15. By the reciprocating movement of the piston rod 12, the workpiece 16 of the workpiece setting table 15 receives a horizontal pushing force by the contact of the tip portion 13, and is discharged from the furnace and jumped out as shown by a one-dot chain line in FIG. Then, it draws a trajectory of a parabola and falls to the communication part 2 and the processing chamber 3 side. A seal portion 14 for preventing vacuum leakage is provided on the rod introducing side of the vacuum exhaust portion 6. The seal portion 14 is composed of an O-ring seal member provided at a moving position of the piston rod 12 and a magnetic fluid shield mechanism (not shown) for shutting off the high vacuum of the vacuum heat treatment furnace 1 and the outside air (atmospheric pressure). The piston driving device 11 is provided with optical detection sensors 34 and 35 for detecting the reciprocating stroke of the piston rod 12, and the hydraulic control unit 20 for the piston rod 12 is incorporated.

図2は本実施形態に係る真空焼入処理装置の制御部の概略構成を示す。
真空焼入処理装置の制御部は、CPU41、各種制御プログラムが格納されたROM42、制御データのワークメモリであるRAM43からなるコンピュータ40により構成されている。ROM42には、CPU41の制御の下に実行される、真空熱処理炉1の真空自動制御プログラム、真空加熱温度制御プログラム及びワーク移送制御プログラム等が格納されている。本実施形態に係る真空焼入処理装置における真空焼入れ処理は真空自動制御プログラム、真空加熱温度制御プログラム及びワーク移送制御プログラムを実行することにより実行される。
FIG. 2 shows a schematic configuration of the control unit of the vacuum quenching apparatus according to the present embodiment.
The control unit of the vacuum quenching processing apparatus is configured by a computer 40 including a CPU 41, a ROM 42 storing various control programs, and a RAM 43 which is a work memory for control data. The ROM 42 stores an automatic vacuum control program, a vacuum heating temperature control program, a workpiece transfer control program, and the like of the vacuum heat treatment furnace 1 that are executed under the control of the CPU 41. The vacuum quenching process in the vacuum quenching apparatus according to the present embodiment is executed by executing a vacuum automatic control program, a vacuum heating temperature control program, and a workpiece transfer control program.

制御部のコンピュータ40には入力信号として、温度センサ17の温度検出信号B1、受光部22の受光検出信号B2、光学検出センサ34、35の検出信号B3、B4、及び圧力検出センサ29の圧力検出信号B5がインターフェイス回路(図示せず)を介して入力される。   As input signals to the computer 40 of the control unit, the temperature detection signal B1 of the temperature sensor 17, the light reception detection signal B2 of the light receiving unit 22, the detection signals B3 and B4 of the optical detection sensors 34 and 35, and the pressure detection of the pressure detection sensor 29 are detected. Signal B5 is input via an interface circuit (not shown).

前記高周波誘導加熱電熱装置は、高周波誘導加熱コイル4に供給する交流電流を発生させる高周波電流制御装置45からなる。高周波電流制御装置45はSCR制御方式により、100kHz程度の高周波による交流電流を生成して、1000℃〜2000℃の高温加熱を行うことができる。高周波電流制御装置45の駆動制御はマイクロコントローラ(PIC)44により行われる。PIC44は、CPU、ROM、RAM等で構成された制御用ICであり、高周波電流制御装置45の電流駆動制御を行う。コンピュータ40からは、真空加熱温度制御プログラムに従い、温度制御のための制御信号がPIC44に出力される。この制御信号に従って、PIC44から電流可変指示信号が高周波電流制御装置45に与えられ、それに基づいて高周波電流制御装置45は所要の交流電流A1を高周波誘導加熱コイル4に出力する。   The high-frequency induction heating electric heating device includes a high-frequency current control device 45 that generates an alternating current supplied to the high-frequency induction heating coil 4. The high-frequency current control device 45 can generate an alternating current with a high frequency of about 100 kHz and perform high-temperature heating at 1000 ° C. to 2000 ° C. by the SCR control method. Drive control of the high-frequency current control device 45 is performed by a microcontroller (PIC) 44. The PIC 44 is a control IC composed of a CPU, ROM, RAM, and the like, and performs current drive control of the high-frequency current control device 45. From the computer 40, a control signal for temperature control is output to the PIC 44 in accordance with a vacuum heating temperature control program. In accordance with this control signal, a variable current instruction signal is provided from the PIC 44 to the high-frequency current control device 45, and based on this, the high-frequency current control device 45 outputs a required alternating current A 1 to the high-frequency induction heating coil 4.

コンピュータ40の外部出力として、ワーク移送制御プログラムの実行により、ピストン駆動装置11の駆動制御用ピストンドライバ回路46に駆動指示信号が出力され、ピストンドライバ回路46は、その駆動指示信号を受けて油圧制御部20にピストン往復稼働信号A2を送出する。ピストン駆動装置11はピストンロッド12の先端部13の移動速度が往方向で0.1〜0.5秒である送出能力を有する。ワーク移送制御プログラムの実行時には、コンピュータ40から、ゲート駆動部24に対してゲートバルブ開閉信号A4が出力される。また、コンピュータ40からは、真空自動制御プログラムの実行により圧力制御バルブ8に対して開閉制御信号A3が出力される。   As an external output of the computer 40, a drive instruction signal is output to the drive driver piston driver circuit 46 of the piston drive device 11 by executing the workpiece transfer control program. The piston driver circuit 46 receives the drive instruction signal and performs hydraulic control. A piston reciprocating operation signal A2 is sent to the unit 20. The piston drive device 11 has a delivery capability in which the moving speed of the tip 13 of the piston rod 12 is 0.1 to 0.5 seconds in the forward direction. When the work transfer control program is executed, the gate valve opening / closing signal A4 is output from the computer 40 to the gate drive unit 24. Further, the computer 40 outputs an open / close control signal A3 to the pressure control valve 8 by executing the vacuum automatic control program.

更に、コンピュータ40には、真空焼入処理装置の稼働を指示するための起動スイッチ49が接続され、起動スイッチ49の押下による起動指示信号が入力される。また、コンピュータ40には、真空引き処理を開始する真空処理開始指示信号を入力するための真空スイッチ50、加熱処理を手動操作で実行するときに手動モードを指示するためのヒータスイッチ51、各種プログラムの設定に用いるキー群からなる設定スイッチ52が接続されている。コンピュータ40には、真空制御状態、加熱制御状態等の稼働状況を報知するための表示器47が接続され、また、機器異常、プログラム異常等の発生時にアラーム音を発生するブザー48が接続されている。   Further, a start switch 49 for instructing the operation of the vacuum quenching processing apparatus is connected to the computer 40, and a start instruction signal when the start switch 49 is pressed is input. Further, the computer 40 has a vacuum switch 50 for inputting a vacuum processing start instruction signal for starting the vacuum processing, a heater switch 51 for instructing the manual mode when the heating processing is executed manually, and various programs. A setting switch 52 consisting of a key group used for setting is connected. The computer 40 is connected with a display 47 for notifying the operation status such as the vacuum control state and the heating control state, and also connected with a buzzer 48 for generating an alarm sound when a device abnormality, a program abnormality or the like occurs. Yes.

上記構成の真空焼入処理装置における真空焼入処理を以下に説明する。
図3は真空焼入処理において実行される真空自動制御及び高温加熱制御の処理を示す。
真空焼入処理の前段階処理として、ワーク16がワーク搬入口19から搬入され、ワーク設置台15上に載置されセットされる。また、開閉扉25を閉鎖して連通部2と隔絶された加工室3に焼入れ水槽31をセットして、加工室3内の真空引きを予め行っておく。加工室3内を低真空にしておくことにより、開閉扉25を瞬時開閉したときに、真空熱処理炉1に侵入する加工室3内のガス成分の量を極力少なくするためである。また、加工室3内を低真空にしておけば、ワークの焼入れ時にガス成分が付着せず、高品質の真空焼入れが可能になる。加工室3内の低真空化はRP26及びRP10を起動して行われる。加工室3の真空度は例えば、1Pa程度に維持される。
The vacuum quenching process in the vacuum quenching apparatus having the above configuration will be described below.
FIG. 3 shows the vacuum automatic control and high-temperature heating control processes executed in the vacuum quenching process.
As a pre-stage process of the vacuum quenching process, the work 16 is loaded from the work carry-in port 19 and placed on the work setting table 15 and set. Moreover, the quenching water tank 31 is set in the processing chamber 3 which is closed from the communication portion 2 by closing the open / close door 25, and the processing chamber 3 is evacuated in advance. This is because by setting the inside of the processing chamber 3 to a low vacuum, the amount of gas components in the processing chamber 3 entering the vacuum heat treatment furnace 1 when the open / close door 25 is opened and closed instantaneously is minimized. If the inside of the processing chamber 3 is kept at a low vacuum, gas components do not adhere when the workpiece is quenched, and high-quality vacuum quenching is possible. The vacuum in the processing chamber 3 is reduced by starting the RP 26 and RP 10. The degree of vacuum in the processing chamber 3 is maintained at about 1 Pa, for example.

前段階処理を行った後、起動スイッチ49の押下により、真空加熱処理が開始される(ステップS1)。真空加熱条件が設定済みであれば、真空スイッチ50の押下により真空処理が開始される(ステップS3、S4)。真空加熱条件が設定されていないときは、設定スイッチ52を用いて、真空度の設定や加熱温度カーブの設定を行う(ステップS2、S3)。   After performing the pre-stage process, the vacuum heating process is started by pressing the start switch 49 (step S1). If the vacuum heating conditions have been set, the vacuum processing is started by pressing the vacuum switch 50 (steps S3 and S4). When the vacuum heating condition is not set, the setting switch 52 is used to set the degree of vacuum and the heating temperature curve (steps S2 and S3).

真空処理はTMP9及びRP10を起動して行われ、設定真空度に達するまで真空排気が継続される。設定真空度の維持、保全は圧力制御バルブ8の開閉を遠隔制御して行われる。TMP9の使用により、10−3〜10−5Pa程度までの高真空を形成することができる。高真空高温焼入れの一例として、CNT分散TiNi形状記憶合金を高度医療用ガイドワイヤーに使用するために焼入れ加工する場合には、高真空状態(10−4Pa)と高温状態(1100℃〜1300℃)に設定される。設定真空度に達したことを圧力検出センサ29の圧力検出信号B5から確認すると、加熱処理を開始する(ステップS4、S5)。 The vacuum processing is performed by starting the TMP 9 and the RP 10 and evacuation is continued until the set vacuum degree is reached. The maintenance and maintenance of the set vacuum level is performed by remotely controlling the opening and closing of the pressure control valve 8. By using TMP9, a high vacuum of about 10 −3 to 10 −5 Pa can be formed. As an example of high-vacuum high-temperature quenching, when a CNT-dispersed TiNi shape memory alloy is quenched for use in an advanced medical guide wire, a high vacuum state (10 −4 Pa) and a high temperature state (1100 ° C. to 1300 ° C.) ). When it is confirmed from the pressure detection signal B5 of the pressure detection sensor 29 that the set vacuum degree has been reached, the heating process is started (steps S4 and S5).

加熱処理は、高周波電流制御装置45により高周波誘導加熱コイル4に通電して実行される(ステップS6)。このときの高周波誘導加熱コイル4の通電制御は、設定加熱温度カーブに沿って時系列的に昇温、最高温度維持、降温等が進行するように実行される。上記CNT分散TiNi形状記憶合金のワーク例でいえば、高真空高温状態が約1〜2時間維持される。真空熱処理炉1の炉内温度管理は温度検出センサ17の温度検出信号B1の受信により行われる。設定加熱温度カーブに沿った高真空高温加熱処理が終了したとき、真空加熱処理の終了が表示器47に報知される(ステップS7)。本実施形態では真空熱処理炉1のみ真空自動制御の対象としているが、加工室3の低真空も自動制御対象としてもよい。   The heat treatment is performed by energizing the high frequency induction heating coil 4 by the high frequency current control device 45 (step S6). The energization control of the high-frequency induction heating coil 4 at this time is executed so that the temperature rise, the maximum temperature maintenance, the temperature fall, etc. proceed in time series along the set heating temperature curve. In the example of the CNT-dispersed TiNi shape memory alloy workpiece, a high vacuum and high temperature state is maintained for about 1 to 2 hours. The in-furnace temperature management of the vacuum heat treatment furnace 1 is performed by receiving the temperature detection signal B1 of the temperature detection sensor 17. When the high vacuum high temperature heat treatment along the set heating temperature curve is finished, the end of the vacuum heat treatment is notified to the display 47 (step S7). In this embodiment, only the vacuum heat treatment furnace 1 is subject to automatic vacuum control, but the low vacuum in the processing chamber 3 may also be subject to automatic control.

図4は前記焼入処理における加工処理制御を示す。
真空加熱処理を終えたワーク16は連結部2を通じて加工室3の焼入れ水槽31に投入されて焼入れ加工処理が実施される。図3の真空加熱処理が終了したとき、ピストン駆動装置11の油圧制御部20にピストン往復稼働信号A2が出力される(ステップS10、S11)。ピストンロッド12の先端部13がワーク16に衝突して、ワーク16は連結部2側に放出され、放物線を描いて加工室3に向けて落下していく。
FIG. 4 shows processing control in the quenching process.
The workpiece 16 that has been subjected to the vacuum heat treatment is put into the quenching water tank 31 of the processing chamber 3 through the connecting portion 2 and subjected to the quenching processing. When the vacuum heating process of FIG. 3 is completed, a piston reciprocation operation signal A2 is output to the hydraulic control unit 20 of the piston drive device 11 (steps S10 and S11). The tip portion 13 of the piston rod 12 collides with the workpiece 16, and the workpiece 16 is released to the connecting portion 2 side and falls toward the machining chamber 3 while drawing a parabola.

図5はワーク16の移送過程を具体的に示す図である。
図5の(5A)に示すように、放物線を描いて落下するワーク16が投受光センサ(投光部21と受光部22)の検出域に達したとき、開閉扉25の瞬時開閉処理が実行される(ステップS12)。ピストン駆動装置11の駆動後、一定時間(例えば、5秒)経過しても、受光部22からの受光出力が発生しない場合には、ワーク放出異常の発生として表示器47にエラー報知すると共に、ブザー49を作動させて警報アラームを出力する(ステップS16、S17)。
FIG. 5 is a diagram specifically illustrating the transfer process of the workpiece 16.
As shown in (5A) of FIG. 5, when the workpiece 16 that falls in a parabola reaches the detection area of the light projecting / receiving sensor (the light projecting unit 21 and the light receiving unit 22), an instantaneous opening / closing process of the door 25 is executed. (Step S12). If the light receiving output from the light receiving unit 22 does not occur even after a certain time (for example, 5 seconds) has elapsed after the piston driving device 11 is driven, an error is notified to the display 47 as the occurrence of the workpiece discharge abnormality, The buzzer 49 is operated to output a warning alarm (steps S16 and S17).

ワーク16が投受光センサ(投光部21と受光部22)の検出域に達し、受光部22の受光検出信号B2が出力されたとき、ゲート駆動部24に対してゲートバルブ開閉信号A4が出力されて、図5の(5B)に示すように、開閉扉25の瞬時開閉が行われる(ステップS12、S13)。ピストン駆動装置11によるピストンロッド12の高速送出動作により、ワーク16が放出されてから加工室3が閉鎖されるまでの所要時間、つまり、搬出作動時間を1〜0.05秒間で行うことができる。開閉扉25の瞬時開閉が終了してから所定時間経過した後、高真空高温の焼入れ処理が完了した旨、終了報知が行われる(ステップS14、S15)   When the workpiece 16 reaches the detection area of the light projecting / receiving sensor (light projecting unit 21 and light receiving unit 22) and the light receiving detection signal B2 of the light receiving unit 22 is output, the gate valve opening / closing signal A4 is output to the gate driving unit 24. Then, as shown in FIG. 5 (5B), the door 25 is opened and closed instantaneously (steps S12 and S13). Due to the high-speed feeding operation of the piston rod 12 by the piston driving device 11, the time required from when the workpiece 16 is released until the machining chamber 3 is closed, that is, the unloading operation time can be performed in 1 to 0.05 seconds. . After a predetermined time has elapsed since the instant opening and closing of the open / close door 25 has ended, an end notification is given that the high-vacuum and high-temperature quenching process has been completed (steps S14 and S15).

本実施形態に係る真空焼入処理装置によれば、真空熱処理炉1において高真空高温加熱処理を行った後のワークを、開閉扉25を瞬時開閉する間に連通部2を通じて加工室3に放出、搬出して加工処理を行うので、真空熱処理炉1内に大型の搬送設備を設けることなく、簡易なピストン機構によって真空加熱位置から次の焼入れ加工位置に高速移送することができ。従って、加熱済みのワークの搬出に伴う、不純物や水分等の真空熱処理炉1内の汚染やワーク自体への付着が生ずることなく高品質の高真空高温焼入れ加工を行うことができる。特に、加工室3内も事前に低真空化しており、不要元素のワークへの付着を皆無に近い状態で焼結加工を行うことができる。例えば、CNT分散TiNi形状記憶合金の場合には、焼入れ時の酸素増加量を0.1wt%以下にすることが可能になる。   According to the vacuum quenching apparatus according to the present embodiment, the work after the high vacuum high temperature heat treatment in the vacuum heat treatment furnace 1 is discharged into the processing chamber 3 through the communication portion 2 while the door 25 is opened and closed instantaneously. Since it is carried out and processed, it can be transferred at high speed from the vacuum heating position to the next quenching position by a simple piston mechanism without providing a large-sized transfer facility in the vacuum heat treatment furnace 1. Therefore, high-quality high-vacuum high-temperature quenching can be performed without causing contamination in the vacuum heat treatment furnace 1 such as impurities and moisture and adhesion to the work itself due to carrying out the heated work. In particular, the inside of the processing chamber 3 is also evacuated in advance, so that sintering can be performed with almost no unnecessary elements adhering to the workpiece. For example, in the case of a CNT-dispersed TiNi shape memory alloy, the amount of oxygen increase during quenching can be made 0.1 wt% or less.

本実施形態においては、略T字形状のワーク放出空間を形成する連通部2を設けて、放出ワークを自然落下させて下方に加工室3に投入しているが、連通部2はこの形状に限らず、真空熱処理炉1の炉端部分を延長した形状の空間を連通部としてもよい。
図6は本発明に係る連結部の変形例を示す概略構成図であり、真空熱処理炉1の炉端部分を延長した形状の空間を連通部52とした構成を示す。図6において、上記実施形態と同一部材には同様の符号を付している。
この変形例では、連結部52と加工室55は真空熱処理炉1に略並設されており、連結部52の加工室55近傍に放出ワークを検出する投受光センサ54が配設されている。連結部52と加工室55の間には上下方向に開閉する開閉扉53が配設されている。加工室55の一側壁には開閉扉56が設けられ、ワークの導入、焼入れ水槽31の出し入れを行うことができる。ワークの炉内への設置は開閉扉56を開成して行われる。この変形例によれば、真空熱処理炉1に対して連連結部52及び加工室55を並設して、連結部52をコンパクトに形成できるので、真空排気空間の低減、放出距離・時間の短縮化を図ることができる。
In the present embodiment, the communication portion 2 that forms a substantially T-shaped workpiece discharge space is provided, and the discharged workpiece is naturally dropped and put into the processing chamber 3 below. However, the communication portion 2 has this shape. Not limited to this, a space formed by extending the furnace end portion of the vacuum heat treatment furnace 1 may be used as the communication portion.
FIG. 6 is a schematic configuration diagram showing a modified example of the connecting portion according to the present invention, and shows a configuration in which a space having a shape obtained by extending the furnace end portion of the vacuum heat treatment furnace 1 is used as the communication portion 52. In FIG. 6, the same members as those in the above embodiment are denoted by the same reference numerals.
In this modified example, the connecting portion 52 and the processing chamber 55 are arranged substantially in parallel with the vacuum heat treatment furnace 1, and a light projecting / receiving sensor 54 for detecting a discharge work is disposed in the vicinity of the processing chamber 55 of the connecting portion 52. An open / close door 53 that opens and closes in the vertical direction is disposed between the connecting portion 52 and the processing chamber 55. An opening / closing door 56 is provided on one side wall of the processing chamber 55, and workpieces can be introduced and the quenching water tank 31 can be taken in and out. The work is installed in the furnace by opening the door 56. According to this modification, the connecting portion 52 and the processing chamber 55 can be arranged in parallel with the vacuum heat treatment furnace 1 so that the connecting portion 52 can be formed in a compact manner, thereby reducing the vacuum exhaust space and reducing the discharge distance and time. Can be achieved.

本発明は、上記実施形態や変形例に限定されるものではなく、本発明の技術的思想を逸脱しない範囲における種々変形例、設計変更などをその技術的範囲内に包含するものであることは云うまでもない。   The present invention is not limited to the above-described embodiments and modifications, and includes various modifications and design changes within the technical scope without departing from the technical idea of the present invention. Needless to say.

本発明によれば、高品質な熱処理加工を行え、真空高温焼入れ加工等の熱処理加工に好適な熱処理加工装置を提供することができる。   According to the present invention, it is possible to provide a heat treatment apparatus suitable for heat treatment such as vacuum high-temperature quenching, which can perform high-quality heat treatment.

1 真空熱処理炉
2 連通部
3 加工室
4 高周波誘導加熱コイル
5 連結部
6 真空排気部
7 排気管
8 圧力制御バルブ
9 ターボ分子ポンプ
10 ロータリーポンプ
11 ピストン駆動装置
12 ピストンロッド
13 先端部
14 シール部
15 ワーク設置台
16 ワーク
17 温度センサ
18 連結部
19 ワーク搬入口
20 油圧制御部
21 投光部
22 受光部
23 連結部
24 ゲート駆動部
25 開閉扉
26 ロータリーポンプ
27 開閉バルブ
28 連通管
29 圧力検出センサ
30a 圧力ゲージ
30b 圧力ゲージ
30c 開閉バルブ
31 焼入れ水槽
32 水
33 開閉蓋
34 光学検出センサ
35 光学検出センサ
36 ワーク
40 コンピュータ
41 CPU
42 ROM
43 RAM
44 PIC
45 高周波電流制御装置
46 ピストンドライバ回路
47 表示器
48 ブザー
49 起動スイッチ
50 ヒータスイッチ
51 設定スイッチ
52 連結部
53 開閉扉
54 投受光センサ
55 加工室
56 開閉扉
A1 交流電流
A2 ピストン往復稼働信号
A3 開閉制御信号
A4 ゲートバルブ開閉信号
B1 温度検出信号
B2 受光検出信号
B3 検出信号
B4 検出信号
B5 圧力検出信号
DESCRIPTION OF SYMBOLS 1 Vacuum heat treatment furnace 2 Communication part 3 Processing chamber 4 High frequency induction heating coil 5 Connection part 6 Vacuum exhaust part 7 Exhaust pipe 8 Pressure control valve 9 Turbo molecular pump 10 Rotary pump 11 Piston drive device 12 Piston rod 13 Tip part 14 Seal part 15 Workpiece installation table 16 Workpiece 17 Temperature sensor 18 Connecting portion 19 Workpiece inlet 20 Hydraulic control portion 21 Light emitting portion 22 Light receiving portion 23 Connecting portion 24 Gate drive portion 25 Opening and closing door 26 Rotary pump 27 Opening and closing valve 28 Communication pipe 29 Pressure detection sensor 30a Pressure gauge 30b Pressure gauge 30c Open / close valve 31 Quenching water tank 32 Water 33 Open / close lid 34 Optical detection sensor 35 Optical detection sensor 36 Work 40 Computer 41 CPU
42 ROM
43 RAM
44 PIC
45 High Frequency Current Control Device 46 Piston Driver Circuit 47 Display 48 Buzzer 49 Start Switch 50 Heater Switch 51 Setting Switch 52 Connection Port 53 Open / Close Door 54 Light Emitting / Reception Sensor 55 Processing Chamber 56 Open / Close Door A1 AC Current A2 Piston Reciprocating Operation Signal A3 Open / Close Control Signal A4 Gate valve opening / closing signal B1 Temperature detection signal B2 Light reception detection signal B3 Detection signal B4 Detection signal B5 Pressure detection signal

Claims (10)

炉内を真空状態にして加熱処理を行う熱処理炉に被加熱処理物を設置して加熱処理を行った後に、隣接する加工室に搬出して物理的又は化学的な加工処理を行う熱処理加工方法において、前記熱処理炉は前記加工室と連通する連通部を有し、前記連通部の搬出口と前記加工室の開放口の間に開閉扉を配設し、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記連通部を通じて前記加工室に放出、搬出して加工処理を行い、前記加工処理は焼入れ加工であり、被加熱処理物を前記熱処理炉内の加熱位置から前記連通部に向けて放出、搬出するための高速搬出機構を設け、前記高速搬出機構により搬出された被加熱処理物を検出する検出手段を前記連通部に設け、前記被加熱処理物の放出を検出したことを条件に前記開閉扉の瞬時開閉を行うことを特徴とする熱処理加工方法。 A heat treatment processing method in which a heat treatment furnace is installed in a heat treatment furnace in a vacuum state and heat treatment is performed and then heat treatment is performed, and then a physical or chemical processing treatment is carried out to an adjacent processing chamber. The heat treatment furnace has a communication portion communicating with the processing chamber, and an open / close door is disposed between the outlet of the communication portion and the opening of the processing chamber, and the heat treatment furnace is subjected to the heat treatment. During the moment when the door is opened and closed instantaneously, the heat treatment material is discharged into the processing chamber through the communication portion and carried out to perform the processing. The processing is quenching, and the object to be heated is placed in the heat treatment furnace. A high-speed unloading mechanism for discharging and unloading from the heating position toward the communicating portion, and a detecting means for detecting the object to be heated unloaded by the high-speed unloading mechanism is provided in the communicating portion, and the heated processing Subject to the detection of the release of Heat treatment method and performing instantaneous closing of the closing. 前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行う請求項1に記載の熱処理加工方法。 2. The heat treatment method according to claim 1, wherein the heat treatment furnace is subjected to a high temperature and high vacuum heat treatment in a high temperature state of at least 1000 ° C. and a high vacuum state of 1 × 10 −3 Pa or less. 前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を少なくとも前記熱処理炉の真空度より低い所定の真空度に排気して前記加工処理を行う請求項1又は2に記載の熱処理加工方法。 3. The processing according to claim 1, wherein the processing is performed by evacuating the processing chamber to a predetermined vacuum level lower than a vacuum level of the heat treatment furnace in a state where the opening of the processing chamber is closed by the opening / closing door. Heat treatment method. 前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記連通部を通じて前記焼入れ浴槽に投入して焼入れ加工を行う請求項1〜のいずれかに記載の熱処理加工方法。 The heat treatment processing according to any one of claims 1 to 3 , wherein a quenching tub is disposed in the processing chamber, and a to-be-heated material subjected to a high temperature treatment by the heat treatment is put into the quenching tub through the communication portion to perform a quenching process. Method. 炉内を真空状態にして加熱処理を行う熱処理炉を備え、前記熱処理炉内に被加熱処理物を設置して加熱処理を行った後に、隣接する加工室に搬出して物理的又は化学的な加工処理を行う熱処理加工装置において、前記熱処理炉は前記加工室と連通する連通部と、被加熱処理物を前記熱処理炉内の加熱位置から前記連通部に向けて放出、搬出するための高速搬出機構と、前記連通部の搬出口と前記加工室の開放口の間に開閉扉とを有し、前記加熱処理を行った後の被加熱処理物を、前記開閉扉を瞬時開閉する間に前記高速搬出機構により高速搬出し、前記連通部を通じて前記加工室に放出、搬出して前記加工処理を行い、前記加工処理は焼入れ加工であり、前記連通部に前記高速搬出機構により放出された被加熱処理物を検出する検出手段を設け、前記被加熱処理物の放出を検出したことを条件に前記開閉扉の瞬時開閉を行うことを特徴とする熱処理加工装置。 A heat treatment furnace for performing heat treatment in a vacuum state in the furnace is provided, and after the heat treatment is performed in the heat treatment furnace by placing an object to be heated, the heat treatment furnace is taken out to an adjacent processing chamber to be physically or chemically treated. In the heat treatment processing apparatus for performing the processing, the heat treatment furnace has a communication part communicating with the processing chamber, and a high-speed carry-out for discharging and carrying out the object to be heated from the heating position in the heat treatment furnace toward the communication part. A mechanism, and an opening / closing door between the unloading port of the communication portion and the opening of the processing chamber, and the object to be heated after the heat treatment is performed while the opening / closing door is opened / closed instantaneously. High-speed carrying out by a high-speed carrying-out mechanism, discharging to the processing chamber through the communicating part, carrying out the processing by carrying out the processing, the working process is quenching, and the heated part discharged by the high-speed carrying-out mechanism to the communicating part A detection means to detect the processed material is installed. Heat treatment processing apparatus and performs an instantaneous opening and closing of the door on condition that it has detected the release of the object to be heated treated. 前記熱処理炉を少なくとも1000℃以上の高温状態、且つ1×10−3Pa以下の高真空状態にして高温高真空加熱処理を行う請求項に記載の熱処理加工装置。 The heat treatment processing apparatus according to claim 5 , wherein the heat treatment furnace is subjected to a high temperature and high vacuum heat treatment in a high temperature state of at least 1000 ° C. or higher and a high vacuum state of 1 × 10 −3 Pa or less. 前記加工室の前記開放口を前記開閉扉により閉塞した状態において、前記加工室内を、少なくとも前記熱処理炉の真空度より低い所定の真空度に排気する真空排気装置を有する請求項5又は6に記載の熱処理加工装置。 7. The vacuum exhaust device according to claim 5, further comprising a vacuum exhaust device that exhausts the processing chamber to a predetermined vacuum level lower than a vacuum level of the heat treatment furnace in a state where the opening of the processing chamber is closed by the opening / closing door. Heat treatment processing equipment. 前記加工室に焼入れ浴槽を配置し、前記加熱処理により高温処理した被加熱処理物を前記焼入れ浴槽に投入して、焼入れ加工を行う請求項5〜7のいずれかに記載の熱処理加工装置。 The heat processing apparatus in any one of Claims 5-7 which arrange | position a quenching bathtub in the said process chamber, throw in into the said quenching bathtub the to-be-heated material processed at the high temperature by the said heat processing, and perform a quenching process. 前記高速搬出機構は、被加熱処理物を前記連通部に向けて送り出す送出部材と、前記送出部材を往復移動させるピストン機構とからなる請求項5〜8のいずれかに記載の熱処理加工装置。 The heat treatment apparatus according to any one of claims 5 to 8 , wherein the high-speed carry-out mechanism includes a feed member that feeds an object to be heated toward the communication portion, and a piston mechanism that reciprocates the feed member. 前記熱処理炉は、電磁誘導加熱により炉内を加熱する高周波誘導加熱電熱装置を有する請求項5〜9のいずれかに記載の熱処理加工装置。 The heat treatment apparatus according to any one of claims 5 to 9 , wherein the heat treatment furnace includes a high-frequency induction heating electric heating apparatus that heats the inside of the furnace by electromagnetic induction heating.
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