JP5630389B2 - 超硬合金台板外周切断刃及びその製造方法 - Google Patents
超硬合金台板外周切断刃及びその製造方法 Download PDFInfo
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- JP5630389B2 JP5630389B2 JP2011148045A JP2011148045A JP5630389B2 JP 5630389 B2 JP5630389 B2 JP 5630389B2 JP 2011148045 A JP2011148045 A JP 2011148045A JP 2011148045 A JP2011148045 A JP 2011148045A JP 5630389 B2 JP5630389 B2 JP 5630389B2
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- 238000005520 cutting process Methods 0.000 title claims description 308
- 230000002093 peripheral effect Effects 0.000 title claims description 96
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000006061 abrasive grain Substances 0.000 claims description 216
- 238000007747 plating Methods 0.000 claims description 86
- 229910052751 metal Inorganic materials 0.000 claims description 80
- 229910045601 alloy Inorganic materials 0.000 claims description 79
- 239000000956 alloy Substances 0.000 claims description 79
- 239000002184 metal Substances 0.000 claims description 79
- 229910003460 diamond Inorganic materials 0.000 claims description 33
- 239000010432 diamond Substances 0.000 claims description 33
- 239000002245 particle Substances 0.000 claims description 30
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 16
- 238000007772 electroless plating Methods 0.000 claims description 14
- 230000005611 electricity Effects 0.000 claims description 4
- 239000002585 base Substances 0.000 description 192
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 47
- 238000000034 method Methods 0.000 description 45
- 239000000243 solution Substances 0.000 description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- 229910052759 nickel Inorganic materials 0.000 description 25
- 229920005989 resin Polymers 0.000 description 24
- 239000011347 resin Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 21
- 229910052761 rare earth metal Inorganic materials 0.000 description 21
- 150000002910 rare earth metals Chemical class 0.000 description 20
- 239000011230 binding agent Substances 0.000 description 19
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 16
- 238000009713 electroplating Methods 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 239000000696 magnetic material Substances 0.000 description 12
- 229910052742 iron Inorganic materials 0.000 description 10
- 230000005415 magnetization Effects 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 230000004907 flux Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 238000013461 design Methods 0.000 description 7
- 238000000227 grinding Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 6
- 229940048086 sodium pyrophosphate Drugs 0.000 description 6
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 6
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 6
- 229910052718 tin Inorganic materials 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 5
- 238000007493 shaping process Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 230000035882 stress Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000002826 coolant Substances 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000007873 sieving Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910003286 Ni-Mn Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018100 Ni-Sn Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910018532 Ni—Sn Inorganic materials 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910020994 Sn-Zn Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- 229910009069 Sn—Zn Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- -1 and among them Substances 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000009036 growth inhibition Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
- B23P15/28—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools
- B23P15/40—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools shearing tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
- B24D5/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
- B24D5/12—Cut-off wheels
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Description
請求項1:
外径80〜200mm、内径30〜80mm、厚み0.1〜1.0mm及びヤング率450〜700GPaの超硬合金からなる円形リング状薄板を台板とし、該台板の外周縁部上に電気メッキ又は無電解メッキにより形成された金属又は合金により、台板と砥粒、及び砥粒と砥粒とを固着させて、台板の厚みより厚くなるように切り刃部を形成した超硬合金台板外周切断刃であって、
上記砥粒が、平均粒径が45〜310μm、かつ靭性指標TIが150以上のダイヤモンド砥粒及び/又はcBN砥粒であり、
上記切り刃部が、上記メッキ金属又は合金により台板と砥粒、及び砥粒と砥粒とを固着させた後に、更に、上記砥粒間及び砥粒と台板との間に存する空隙に、融点が350℃以下の金属及び/又は合金を含浸してなり、
上記切り刃部の、上記台板の厚み方向外方にせり出している範囲の部分において、上記せり出し部分の厚みの公差[(T3max−T3min)mm]が、下記式(1)
0.001≦T3max−T3min≦0.1×T2max (1)
(式中、T3max及びT3minは、各々、上記せり出し部分の厚みの切り刃部全周における最大値及び最小値、T2maxは、切り刃部全体の厚みの切り刃部全周における最大値を表わす)
を満たし、かつ
上記切り刃部の真円度[(ODmax/2−ODmin/2)mm]が、下記式(2)
0.001≦(ODmax/2−ODmin/2)≦0.01×ODmax (2)
(式中、ODmax及びODminは、各々、切り刃部の外径の最大値及び最小値を表わす)
を満たすことを特徴とする超硬合金台板外周切断刃。
請求項2:
外径80〜200mm、内径30〜80mm、厚み0.1〜1.0mm及びヤング率450〜700GPaの超硬合金からなる円形リング状薄板を台板とし、該台板の外周縁部上に電気メッキ又は無電解メッキにより形成された金属又は合金により、台板と砥粒、及び砥粒と砥粒とを固着させて、台板の厚みより厚くなるように切り刃部を形成した超硬合金台板外周切断刃を製造する方法であって、
上記砥粒として、平均粒径が45〜310μm、かつ靭性指標TIが150以上のダイヤモンド砥粒及び/又はcBN砥粒を用い、
上記切り刃部を、上記メッキ金属又は合金により台板と砥粒、及び砥粒と砥粒とを固着させた後に、更に、上記砥粒間及び砥粒と台板との間に存する空隙に、融点が350℃以下の金属及び/又は合金を含浸して形成し、
上記切り刃部の、上記台板の厚み方向外方にせり出している範囲の部分において、上記せり出し部分の厚みの公差[(T3max−T3min)mm]が、下記式(1)
0.001≦T3max−T3min≦0.1×T2max (1)
(式中、T3max及びT3minは、各々、上記せり出し部分の厚みの切り刃部全周における最大値及び最小値、T2maxは、切り刃部全体の厚みの切り刃部全周における最大値を表わす)
を満たし、かつ
上記切り刃部の真円度[(ODmax/2−ODmin/2)mm]が、下記式(2)
0.001≦(ODmax/2−ODmin/2)≦0.01×ODmax (2)
(式中、ODmax及びODminは、各々、切り刃部の外径の最大値及び最小値を表わす)
を満たすように形成することを特徴とする超硬合金台板外周切断刃の製造方法。
本発明の外周切断刃は、例えば、図1に示されるように、円形薄板(円形リング状薄板)の台板10の外周縁部上に、電気メッキ又は無電解メッキにより形成された金属又は合金(金属結合材)で、台板と砥粒、及び砥粒と砥粒とが固着された切り刃部20が形成されているものである。この台板10の中央部には内穴12が形成されている。
0.001≦T3max−T3min≦0.1×T2max (1)
(式中、T3max及びT3minは、各々、上記せり出し部分の厚み(図1(C)中のT3に相当)の切り刃部全周における最大値及び最小値、T2maxは、切り刃部全体の厚み(図1(C)中のT2に相当)の切り刃部全周における最大値を表わす)
を満たすように形成される。台板の厚み方向外方にせり出している範囲は、台板の板面を外方に拡張した仮想面より台板の厚み方向外方の範囲に相当し、図1(C)に示される厚みT3に対応する範囲である。この範囲は、台板の表側と裏側の双方に存在するが、それぞれの側において、上記公差範囲を満たすように形成される。
0.001≦(ODmax/2−ODmin/2)≦0.01×ODmax (2)
(式中、ODmax及びODminは、各々、切り刃部の外径の最大値及び最小値を表わす)
を満たすように形成される。
質量百分率でWCが90%、Coが10%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。この台板のヤング率は600GPa、飽和磁化は127kA/m(0.16T)であった。
質量百分率でWCが90%、Coが10%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。
質量百分率でWCが90%、Coが10%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。
質量百分率でWCが95%、Coが5%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。この台板のヤング率は580GPa、飽和磁化は40kA/m(0.05T)であった。
質量百分率でWCが90%、Coが10%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。
質量百分率でWCが90%、Coが10%の超硬合金を外径φ125mm×内径φ40mm×厚み0.3mmのドーナツ状孔あき円板に加工し、台板とした。
12 内穴
2 外周切断刃
20 切り刃部
22a、22b 挟持部
24 金属結合材
26 砥粒
50 治具本体
52 カバー
54 永久磁石
56 電気メッキ用陰極体
58 支持棒
60 ジョイント
62 エンドキャップ
64 隙間
71 合金製容器
72 ボール
81 定盤
82 治具
83 コンパレーター
Claims (2)
- 外径80〜200mm、内径30〜80mm、厚み0.1〜1.0mm及びヤング率450〜700GPaの超硬合金からなる円形リング状薄板を台板とし、該台板の外周縁部上に電気メッキ又は無電解メッキにより形成された金属又は合金により、台板と砥粒、及び砥粒と砥粒とを固着させて、台板の厚みより厚くなるように切り刃部を形成した超硬合金台板外周切断刃であって、
上記砥粒が、平均粒径が45〜310μm、かつ靭性指標TIが150以上のダイヤモンド砥粒及び/又はcBN砥粒であり、
上記切り刃部が、上記メッキ金属又は合金により台板と砥粒、及び砥粒と砥粒とを固着させた後に、更に、上記砥粒間及び砥粒と台板との間に存する空隙に、融点が350℃以下の金属及び/又は合金を含浸してなり、
上記切り刃部の、上記台板の厚み方向外方にせり出している範囲の部分において、上記せり出し部分の厚みの公差[(T3max−T3min)mm]が、下記式(1)
0.001≦T3max−T3min≦0.1×T2max (1)
(式中、T3max及びT3minは、各々、上記せり出し部分の厚みの切り刃部全周における最大値及び最小値、T2maxは、切り刃部全体の厚みの切り刃部全周における最大値を表わす)
を満たし、かつ
上記切り刃部の真円度[(ODmax/2−ODmin/2)mm]が、下記式(2)
0.001≦(ODmax/2−ODmin/2)≦0.01×ODmax (2)
(式中、ODmax及びODminは、各々、切り刃部の外径の最大値及び最小値を表わす)
を満たすことを特徴とする超硬合金台板外周切断刃。 - 外径80〜200mm、内径30〜80mm、厚み0.1〜1.0mm及びヤング率450〜700GPaの超硬合金からなる円形リング状薄板を台板とし、該台板の外周縁部上に電気メッキ又は無電解メッキにより形成された金属又は合金により、台板と砥粒、及び砥粒と砥粒とを固着させて、台板の厚みより厚くなるように切り刃部を形成した超硬合金台板外周切断刃を製造する方法であって、
上記砥粒として、平均粒径が45〜310μm、かつ靭性指標TIが150以上のダイヤモンド砥粒及び/又はcBN砥粒を用い、
上記切り刃部を、上記メッキ金属又は合金により台板と砥粒、及び砥粒と砥粒とを固着させた後に、更に、上記砥粒間及び砥粒と台板との間に存する空隙に、融点が350℃以下の金属及び/又は合金を含浸して形成し、
上記切り刃部の、上記台板の厚み方向外方にせり出している範囲の部分において、上記せり出し部分の厚みの公差[(T3max−T3min)mm]が、下記式(1)
0.001≦T3max−T3min≦0.1×T2max (1)
(式中、T3max及びT3minは、各々、上記せり出し部分の厚みの切り刃部全周における最大値及び最小値、T2maxは、切り刃部全体の厚みの切り刃部全周における最大値を表わす)
を満たし、かつ
上記切り刃部の真円度[(ODmax/2−ODmin/2)mm]が、下記式(2)
0.001≦(ODmax/2−ODmin/2)≦0.01×ODmax (2)
(式中、ODmax及びODminは、各々、切り刃部の外径の最大値及び最小値を表わす)
を満たすように形成することを特徴とする超硬合金台板外周切断刃の製造方法。
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CN201210229740.3A CN102862129B (zh) | 2011-07-04 | 2012-07-04 | 硬质合金基部外部刀刃切割轮以及制造方法 |
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