JP5520237B2 - ナノ粒子ゾル−ゲル複合ハイブリッドの透明コーティング材料 - Google Patents
ナノ粒子ゾル−ゲル複合ハイブリッドの透明コーティング材料 Download PDFInfo
- Publication number
- JP5520237B2 JP5520237B2 JP2010549814A JP2010549814A JP5520237B2 JP 5520237 B2 JP5520237 B2 JP 5520237B2 JP 2010549814 A JP2010549814 A JP 2010549814A JP 2010549814 A JP2010549814 A JP 2010549814A JP 5520237 B2 JP5520237 B2 JP 5520237B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- sol
- boehmite
- substrate
- dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims description 90
- 239000011248 coating agent Substances 0.000 title claims description 76
- 239000002131 composite material Substances 0.000 title claims description 13
- 239000002105 nanoparticle Substances 0.000 title description 41
- 239000000463 material Substances 0.000 title description 4
- 229910001593 boehmite Inorganic materials 0.000 claims description 46
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 44
- 239000000203 mixture Substances 0.000 claims description 40
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 23
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 21
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 18
- 238000006460 hydrolysis reaction Methods 0.000 claims description 16
- 239000006185 dispersion Substances 0.000 claims description 15
- 230000007062 hydrolysis Effects 0.000 claims description 12
- 239000002064 nanoplatelet Substances 0.000 claims description 10
- 239000012530 fluid Substances 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 5
- 230000001680 brushing effect Effects 0.000 claims description 3
- 238000007766 curtain coating Methods 0.000 claims description 3
- 238000007598 dipping method Methods 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 230000007480 spreading Effects 0.000 claims description 3
- 238000003892 spreading Methods 0.000 claims description 3
- 238000010345 tape casting Methods 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 238000001879 gelation Methods 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 239000012815 thermoplastic material Substances 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 239000008199 coating composition Substances 0.000 description 24
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 23
- 229910000077 silane Inorganic materials 0.000 description 23
- 239000010408 film Substances 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 229920002799 BoPET Polymers 0.000 description 12
- -1 acrylooxy group Chemical group 0.000 description 11
- 230000004888 barrier function Effects 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 239000004033 plastic Substances 0.000 description 11
- 229920003023 plastic Polymers 0.000 description 11
- 239000012702 metal oxide precursor Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 10
- 239000005020 polyethylene terephthalate Substances 0.000 description 10
- 150000004703 alkoxides Chemical class 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 238000012643 polycondensation polymerization Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000001723 curing Methods 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 230000035699 permeability Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- 238000007142 ring opening reaction Methods 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- 238000012644 addition polymerization Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229920000307 polymer substrate Polymers 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 150000004677 hydrates Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical group OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 230000010512 thermal transition Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- YFICSDVNKFLZRQ-UHFFFAOYSA-N 3-trimethylsilylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)C YFICSDVNKFLZRQ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 240000004307 Citrus medica Species 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical group 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical group 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical group 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- GRJISGHXMUQUMC-UHFFFAOYSA-N silyl prop-2-enoate Chemical compound [SiH3]OC(=O)C=C GRJISGHXMUQUMC-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 239000003799 water insoluble solvent Substances 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1212—Zeolites, glasses
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/122—Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/56—Boron-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/54—Inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/54—Inorganic substances
- C08L2666/58—SiO2 or silicates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
- Y10T428/257—Iron oxide or aluminum oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Ceramic Engineering (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Dispersion Chemistry (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Silicon Polymers (AREA)
Description
ベーマイトを含まないゾル−ゲルコーティングの調製
エタノール中における様々なモル比率のGPTMSをTEOSに加えることにより調製した。当該混合物を攪拌し、0.001N HCl溶液を、Siに対する水のモル比が6若しくは3になるよう加えた。加水分解をFT IR及びラマン分光法によりモニターした。ここで、図2に示すように、910cm−1におけるIRバンドの持続により、TTBの添加後の最初の80分間でわずかなエポキシ開環が明らかとなった。一方、2840cm−1のピークにおけるロスにより示されているように、かなりのメトキシシリル基が加水分解された。ゾル−ゲル混合物に対して、エタノール中における様々な量のTTBを加えた。攪拌を2時間継続した。沈殿は観測されなかった。混合物の厚い透明フィルムは、ガラス基板をゾル−ゲル混合物にディップコーティングすることにより形成することができた。除去後、コートされた基板を2時間120℃まで加熱した。様々なゾル−ゲル混合物のための試薬の割合、並びにこれらの混合物に起因するコーティングの厚さ及び硬さを以下の表1に示す。当該コーティングの厚さは、コーティング配合物中のテトラアルコキシ成分の割合にしたがって増加した。しかしながら、すべてのケースにおいて、ハードフィルムが得られた。
基板上にハイブリッドフィルムを形成するための化合物を、2gのエタノール中のTEOS1.26gの溶液と、0.001N水溶性HNO32.5gとを混合することにより調製した。当該混合物に対して、GPTMS10gを添加し、当該混合物を2時間室温で攪拌し、シリカゾルを生成した。エタノール2g中におけるTTB4.1gの溶液を攪拌しながらシリカゾルに加え、そして当該混合物をさらに2時間攪拌した。当該ゾル混合物に対して、ジメチルホルムアミド25g中のベーマイトプレートレット12.5gを加えた。PETフィルム基板をベーマイト−ゾル分散液でディップコートした。コートされたPETを2.5時間120℃まで加熱し、基板の各面に析出された6μmの厚さを有しベーマイトプレートレットの重量パーセントが60であるハイブリッドフィルムを形成した。同様に、30、40、50及び70重量パーセントを有するハイブリッドフィルムを作製した。
図3は、0、40、60重量パーセントのベーマイトナノプレートレットを含むコーティングであって、上述のようにして調製されたコーティングのUV−VISスペクトルを示している。図3から分かるように、当該フィルムは可視スペクトルに亘って高度の透過率を有する。
ベーマイトゾル−ゲルハイブリッドコーティングの機械的特性を測定するため、ナノインデンテイションをハイシトロンのトリボインデンターを用いて測定した。当該プロセスにおいて、増加する負荷を加え、その後当該負荷をハイブリッドフィルムの部分的な若しくは完全なリラクシゼーションが起こるまで減少させることによりサンプル内にインデンターチップを挿入した。結果として得られる負荷−深さ曲線であって、0、30、40、50及び60パーセントベーマイト含有ゾル−ゲルハイブリッドフィルムについての曲線を図4に示す。図5に示すように、30%以上のベーマイトプレートレットを加えることにより、ベーマイトを含まないゾル−ゲルフィルムの係数が2倍となる。ベーマイトを硬化されたフィルムにおいて60重量パーセントまで増加させることにより、ベーマイトを含まないゾル−ゲルフィルムに対する係数は6倍に増加する。当該コーティングは、ベーマイトプレートレットのすべての負荷においても透明である。
差圧変動流量測定法(differential pressure method)を用いてバリアー特性を測定した。当該差圧変動流量測定法においては、空気若しくは他のガスが、チャンバー内において、一シートのコートされた基板の一方の面に接触して一定圧力で流下し、当該シートの反対の面が、真空下にあるチャンバーに向けられる。当該フィルム及び基板を介して浸透するガスを真空サイドにおいて収集し、そして、ガスクロマトグラフィーを用いて測定する。100μmPETフィルム、12μm市販シリカコートPETフィルム、100μmPET基板上にコートされた40重量%及び60重量%ベーマイトナノ粒子含有ゾル-ゲルハイブリッドコーティング、及び12μm市販シリカコートPETフィルム上にコートされた40重量%ベーマイトナノ粒子含有ゾル-ゲルハイブリッドコーティングについての水及び酸素の透過率に関し拡散の実験を行った。物理気相成長法によりシリカ層を塗布した。水蒸気及び酸素のそれぞれについて、図6及び図7のグラフにその結果を示す。
Claims (9)
- テトラエトキシシラン(TEOS)、γ−グリシドオキシプロピルトリメトキシシラン(GPTMS)、及び、水を含み、少なくともいくらかの加水分解が起こるまで室温に維持される流体混合物と、エタノールにチタンテトラブトキシド(TTB)を混合した溶液と、の混合物から生じるゾル−ゲルガラスと、
ジメチルホルムアミド(DMF)に、直径100nm未満のベーマイトナノプレートレットを分散させた分散液と、を含み、
完全な硬化時上記コーティングは少なくとも5μmの厚さを有し、
上記ベーマイトナノプレートレットは、最終硬化コーティングの30〜75パーセントである透明な複合ハイブリッドコーティング。 - 上記ベーマイトプレートレットは、直径2〜50nmである、請求項1記載のコーティング。
- 上記ベーマイトプレートレットは、直径5〜20nmである、請求項1記載のコーティング。
- 透明の複合ハイブリッドで基板を被覆する方法であって、
エタノール中にテトラエトキシシラン(TEOS)およびγ−グリシドオキシプロピルトリメトキシシラン(GPTMS)を加えたものを含む水溶液から生じたゾルを調製する工程と、
エタノール中に混合されたチタンテトラブトキシド(TTB)を含む第2溶液を上記ゾルに加える工程と、
ジメチルホルムアミド(DMF)に加えた複数のベーマイトナノプレートレットを上記ゾルに分散させ分散液を生成する工程と、
上記分散液を基板にコートする工程と、
上記基板上において上記分散液をゲル化する工程と、を備え、
結果として得られたコーティングは可視光に対して透明であり、少なくとも5μmの厚さにおいて少なくとも85%の透過率を有することを特徴とする方法。 - 上記コーティング工程が、ディッピング、スプレッディング、ブラッシング、ナイフコーティング、ローリング、噴霧、スピンコーティング、スクリーン印刷、及びカーテンコーティングを含む、請求項4記載の方法。
- 上記ゲル化工程は、上記分散液で被覆された基板を加熱することを含む、請求項4記載の方法。
- 上記加熱が、180℃未満の温度まで行われる、請求項6記載の方法。
- 上記基板が、有機系材料を含む請求項4記載の方法。
- 上記有機系材料が熱可塑性材料を含む、請求項8記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3314208P | 2008-03-03 | 2008-03-03 | |
US61/033,142 | 2008-03-03 | ||
PCT/US2009/035864 WO2009151664A2 (en) | 2008-03-03 | 2009-03-03 | Nanoparticle sol-gel composite hybride transparent coating materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011513553A JP2011513553A (ja) | 2011-04-28 |
JP5520237B2 true JP5520237B2 (ja) | 2014-06-11 |
Family
ID=41417306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010549814A Expired - Fee Related JP5520237B2 (ja) | 2008-03-03 | 2009-03-03 | ナノ粒子ゾル−ゲル複合ハイブリッドの透明コーティング材料 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110003142A1 (ja) |
EP (1) | EP2250226A4 (ja) |
JP (1) | JP5520237B2 (ja) |
KR (1) | KR20100125339A (ja) |
CN (1) | CN102015934A (ja) |
WO (1) | WO2009151664A2 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010062436A1 (en) * | 2008-10-31 | 2010-06-03 | University Of Florida Research Foundation, Inc. | Transparent inorganic-organic hybrid materials via aqueous sol-gel processing |
KR100970462B1 (ko) * | 2010-02-09 | 2010-07-16 | 엘베스트지에이티 주식회사 | 에너지 절감형 방식용 금속도막 조성물 및 그 제조방법 |
KR101140841B1 (ko) * | 2010-10-28 | 2012-05-03 | 동아대학교 산학협력단 | 항균 코팅용액과 그의 제조방법 및 그를 이용한 항균 코팅방법 |
KR101276192B1 (ko) * | 2011-08-22 | 2013-06-18 | 충남대학교산학협력단 | 면역분석용 마이크로 입자 및 이를 사용한 면역분석 방법 |
KR101949204B1 (ko) * | 2011-12-13 | 2019-02-20 | 삼성전자주식회사 | 하드 코팅 조성물 |
DE102012103645A1 (de) * | 2012-04-25 | 2013-10-31 | BUZIL-WERK Wagner GmbH & Co. KG | Beschichtungszusammensetzung |
KR101512881B1 (ko) * | 2012-05-31 | 2015-04-16 | 주식회사 엘지화학 | 가스 차단 필름 및 이의 제조방법 |
ES2631680T3 (es) | 2013-02-08 | 2017-09-04 | Council Of Scientific And Industrial Research | Un revestimiento solar selectivo híbrido multicapa para aplicaciones solares térmicas a alta temperatura y un proceso para la preparación del mismo |
JP5889261B2 (ja) * | 2013-10-18 | 2016-03-22 | 第一稀元素化学工業株式会社 | 酸化ジルコニウム−酸化チタン複合ゾル及びその製造方法 |
US20170088759A1 (en) * | 2014-05-25 | 2017-03-30 | Shengguo WANG | Method and apparatus for producing alumina monohydrate and sol gel abrasive grain |
CN104087086B (zh) * | 2014-06-16 | 2016-03-02 | 华南理工大学 | 一种有机无机杂化涂料的亲水铝箔及其制备方法和应用 |
US10472277B2 (en) * | 2014-07-28 | 2019-11-12 | Dell Products L.P. | Composite plastic display cover |
US10737467B2 (en) | 2014-08-25 | 2020-08-11 | Dell Products L.P. | Multilayer glass composite display cover |
US10457562B2 (en) * | 2015-03-27 | 2019-10-29 | Trent University | Anti-corrosion sol-gel material |
US10642154B2 (en) | 2015-06-02 | 2020-05-05 | University-Industry Foundation(Uif), Yonsei University | Surface functional composite film and method of fabricating the same |
KR20170009228A (ko) | 2015-07-16 | 2017-01-25 | 홍형준 | 약초 팥빙수 |
KR102267504B1 (ko) | 2017-12-22 | 2021-06-21 | 주식회사 엘지화학 | 메조포러스 실리카 코팅층을 포함하는 광학 부재의 제조방법 및 이를 이용하여 제조된 광학 부재 |
KR102267503B1 (ko) * | 2017-12-22 | 2021-06-21 | 주식회사 엘지화학 | 저반사 실리카 코팅층을 포함하는 광학 부재의 제조방법 및 이를 이용하여 제조된 광학 부재 |
KR102267506B1 (ko) * | 2017-12-22 | 2021-06-21 | 주식회사 엘지화학 | 저굴절 실리카 코팅층을 포함하는 광학 부재의 제조방법 및 이를 이용하여 제조된 광학 부재 |
KR102405449B1 (ko) * | 2020-03-31 | 2022-06-07 | 국방과학연구소 | 코팅 용액 제조방법 |
CN112831076B (zh) * | 2021-02-04 | 2022-12-02 | 浙江中科玖源新材料有限公司 | 一种高阻水透明聚酰亚胺薄膜的制备方法 |
US11814542B2 (en) * | 2021-07-22 | 2023-11-14 | Nano And Advanced Materials Institute Limited | Composite coating and fabrication method thereof |
CN113980321B (zh) * | 2021-11-30 | 2022-08-02 | 常州艾龙森汽车饰件有限公司 | 用于薄膜基材表面的耐高温分散剂、制备方法、用途及施涂方法 |
CN114539916A (zh) * | 2022-02-23 | 2022-05-27 | 浙江弘康半导体技术股份有限公司 | 一种降低水汽透过率的有机/无机杂化聚合物 |
DE102022110131A1 (de) * | 2022-04-27 | 2023-11-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Zusammensetzung für Hybridpolymere mit Barrierefunktion |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3451838A (en) * | 1965-12-03 | 1969-06-24 | Owens Illinois Inc | Process of coating plastics with organopolysiloxanes and articles made thereby |
US3707397A (en) * | 1971-02-26 | 1972-12-26 | Owens Illinois Inc | Process for providing uniform organopolysiloxane coatings on polycarbonate and acrylic surfaces |
US4027073A (en) * | 1974-06-25 | 1977-05-31 | Dow Corning Corporation | Pigment-free coating compositions |
US3986997A (en) * | 1974-06-25 | 1976-10-19 | Dow Corning Corporation | Pigment-free coating compositions |
US4242381A (en) * | 1979-04-18 | 1980-12-30 | General Electric Company | Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating |
US4284685A (en) * | 1980-01-10 | 1981-08-18 | General Electric Company | Abrasion resistant silicone coated polycarbonate article |
US4472510A (en) * | 1982-12-23 | 1984-09-18 | Dow Corning Corporation | Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process |
US5041313A (en) * | 1990-05-11 | 1991-08-20 | General Electric Company | Method for making silicone hardcoat composites and primer compositions |
JP2725441B2 (ja) * | 1990-06-13 | 1998-03-11 | 信越化学工業株式会社 | ハードコーティング剤及びプラスチック製光学製品 |
US5035745A (en) * | 1990-06-29 | 1991-07-30 | Ppg Industries, Inc. | Ion-exchanged abrasion resistant coatings |
JP2611093B2 (ja) * | 1992-07-07 | 1997-05-21 | ホーヤ株式会社 | 硬化膜を有する光学部材 |
US5384159A (en) * | 1993-09-22 | 1995-01-24 | General Electric Company | Process for restoring discharded silicone-polycarbonate parts |
DE4338361A1 (de) * | 1993-11-10 | 1995-05-11 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung von Zusammensetzungen auf der Basis von Epoxidgruppen-haltigen Silanen |
JP3488965B2 (ja) * | 1996-05-21 | 2004-01-19 | 日本山村硝子株式会社 | ゾル−ゲル法による独立膜の製造方法 |
JPH1025431A (ja) * | 1996-07-11 | 1998-01-27 | Kawaken Fine Chem Co Ltd | 無機塗料バインダー組成物および無機塗料組成物 |
DE19737328A1 (de) * | 1997-08-27 | 1999-03-04 | Bayer Ag | Beschichtungszusammensetzungen auf der Basis von Epoxidgruppen enthaltenden Silanen |
DE19816136A1 (de) * | 1998-04-09 | 1999-10-14 | Inst Neue Mat Gemein Gmbh | Nanostrukturierte Formkörper und Schichten und deren Herstellung über stabile wasserlösliche Vorstufen |
US6051665A (en) * | 1998-05-20 | 2000-04-18 | Jsr Corporation | Coating composition |
DE19840009A1 (de) * | 1998-09-02 | 2000-03-09 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung thermisch verformter, mit einem Sol-Gel-Lack beschichteter Substrate |
DE19952040A1 (de) * | 1999-10-28 | 2001-05-03 | Inst Neue Mat Gemein Gmbh | Substrat mit einem abriebfesten Diffusionssperrschichtsystem |
DE10018935A1 (de) * | 2000-04-17 | 2001-10-18 | Bayer Ag | Kratzfeste Beschichtungen |
JP2002161238A (ja) * | 2000-09-14 | 2002-06-04 | Matsushita Electric Works Ltd | コーティング材組成物およびその塗装品 |
JP2002128898A (ja) * | 2000-10-26 | 2002-05-09 | Fuji Kagaku Kk | 無機高分子化合物の製造方法、無機高分子化合物、および無機高分子化合物膜 |
JP2002371245A (ja) * | 2001-06-14 | 2002-12-26 | Nippon Shokubai Co Ltd | 紫外線カットガスバリア用コーティング剤 |
US6939908B1 (en) * | 2001-09-17 | 2005-09-06 | Nanopowder Enterprises Inc | Optically clear abrasion resistant polymer-ceramic composite coatings |
DE10213036A1 (de) * | 2002-03-22 | 2003-10-02 | Clariant Gmbh | Kunststofffolie mit Mehrschicht-Interferenzbeschichtung |
DE10245725A1 (de) * | 2002-10-01 | 2004-04-15 | Bayer Ag | Schichtsystem und Verfahren zu dessen Herstellung |
DE10245729A1 (de) * | 2002-10-01 | 2004-04-15 | Bayer Ag | Beschichtungszusammensetzung und Verfahren zu deren Herstellung |
US7226953B1 (en) * | 2003-11-17 | 2007-06-05 | Los Alamos National Security, Llc | Nanocrystal/sol-gel nanocomposites |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
JP2005298570A (ja) * | 2004-04-07 | 2005-10-27 | Asahi Glass Co Ltd | 無機塗料組成物及び親水性塗膜 |
KR100614976B1 (ko) * | 2004-04-12 | 2006-08-25 | 한국과학기술원 | 광소자 또는 디스플레이에 이용되는 무기/유기혼성올리고머, 나노혼성고분자 및 그 제조방법 |
JP4466846B2 (ja) * | 2004-09-24 | 2010-05-26 | 信越化学工業株式会社 | 室温硬化性オルガノポリシロキサン組成物 |
US7264872B2 (en) * | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
KR20060118906A (ko) * | 2005-05-17 | 2006-11-24 | 엘지전자 주식회사 | 표면 개질된 나노 입자를 함유하는 발수성 코팅 조성물 및이를 이용하여 접촉각과 투명도가 조절된 코팅층을형성하는 방법 |
US8685123B2 (en) * | 2005-10-14 | 2014-04-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
JP5448301B2 (ja) * | 2006-02-24 | 2014-03-19 | 出光興産株式会社 | コーティング組成物及び樹脂積層体 |
US8592042B2 (en) * | 2006-11-09 | 2013-11-26 | The Boeing Company | Sol-gel coating method and composition |
WO2010062436A1 (en) * | 2008-10-31 | 2010-06-03 | University Of Florida Research Foundation, Inc. | Transparent inorganic-organic hybrid materials via aqueous sol-gel processing |
KR101183544B1 (ko) * | 2012-01-31 | 2012-09-20 | (주)케이피텍 | 가스배리어성 코팅액의 제조방법 |
-
2009
- 2009-03-03 WO PCT/US2009/035864 patent/WO2009151664A2/en active Application Filing
- 2009-03-03 EP EP09762960A patent/EP2250226A4/en not_active Withdrawn
- 2009-03-03 JP JP2010549814A patent/JP5520237B2/ja not_active Expired - Fee Related
- 2009-03-03 CN CN2009801158240A patent/CN102015934A/zh active Pending
- 2009-03-03 KR KR1020107020940A patent/KR20100125339A/ko active IP Right Grant
- 2009-03-03 US US12/920,790 patent/US20110003142A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP2250226A2 (en) | 2010-11-17 |
CN102015934A (zh) | 2011-04-13 |
JP2011513553A (ja) | 2011-04-28 |
EP2250226A4 (en) | 2012-05-23 |
WO2009151664A2 (en) | 2009-12-17 |
WO2009151664A3 (en) | 2010-04-01 |
US20110003142A1 (en) | 2011-01-06 |
KR20100125339A (ko) | 2010-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5520237B2 (ja) | ナノ粒子ゾル−ゲル複合ハイブリッドの透明コーティング材料 | |
CN1221324C (zh) | 包括耐磨扩散阻挡层体系的基材 | |
EP0486469B1 (en) | Organic-inorganic hybrid polymer | |
EP2591060B1 (en) | Coating systems capable of forming ambiently cured highly durable hydrophobic coatings on substrates | |
TWI671362B (zh) | 混成材料之用途、其塗布方法及光電元件 | |
JP5859308B2 (ja) | 水性ゾル−ゲル法を用いた透明な無機−有機ハイブリッド材料 | |
JPWO2007060884A1 (ja) | 中空シリカ微粒子、それを含む透明被膜形成用組成物、および透明被膜付基材 | |
JPWO2004070436A1 (ja) | 低反射処理物品の製造方法、低反射層形成用溶液および低反射処理物品 | |
EP2720808A1 (en) | Hydrophobic hydrocarbon coatings | |
WO2014061606A1 (ja) | 防汚性反射防止膜、物品およびその製造方法 | |
US10253190B2 (en) | Transparent durable superhydrophobic ceramic coating | |
KR101949204B1 (ko) | 하드 코팅 조성물 | |
JP2006501063A (ja) | 耐引掻性層状系の製造方法 | |
US20040126573A1 (en) | Layered system and process for its preparation | |
JP2006526494A (ja) | 防曇性耐引掻性層システムの製造方法 | |
CN111542550A (zh) | 聚合物刷形成用基体和该基体的制造方法以及该方法中使用的前体液 | |
JP5754884B2 (ja) | リン酸(ただし、リン酸の塩を除く)処理金属酸化物微粒子およびその製造方法、該リン酸(ただし、リン酸の塩を除く)処理金属酸化物微粒子を含む透明被膜形成用塗布液ならびに透明被膜付基材 | |
US20190177573A1 (en) | Curable Silsesquioxane Polymer Comprising Inorganic Oxide Nanoparticles, Articles, and Methods | |
JP2003202960A (ja) | タッチパネル | |
CN113692432B (zh) | 保护性涂料组合物和包括其的经涂覆的金属基底 | |
JP7463164B2 (ja) | コーティング液 | |
KR101152244B1 (ko) | 저온 경화형 세라믹계 유무기 하이브리드 초친수 자외선 차단 코팅제 및 그의 제조 방법 | |
KR100838614B1 (ko) | 표면-변형 입자를 함유하는 경화형 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110418 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130116 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130212 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130510 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130517 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130612 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130619 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130712 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140311 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140404 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5520237 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |