JP5482552B2 - Photosensitive resin composition and cured product thereof - Google Patents

Description

  The present invention relates to a photosensitive resin composition used for surface protective films (passivation films, overcoat films, etc.) for semiconductor elements, interlayer insulating films, planarization films, solder resists, photosensitive adhesives, pressure sensitive adhesives, etc. And a cured product obtained by curing the same.

Printed wiring boards usually prevent solder from adhering to parts other than those required when soldering electronic components, and circuit conductors are directly exposed to air and are not corroded by oxidation or humidity. In order to prevent this, a solder resist film is formed.
Conventionally, such a solder resist film is formed by patterning a resin composition for forming a solder resist on a substrate by screen printing, drying to remove the solvent, and then curing by ultraviolet rays or heat. Is formed. Furthermore, in recent years, with the demand for improving the wiring density of printed wiring boards, the composition for forming a solder resist is also required to have high resolution and high precision. There has been proposed a liquid photo solder resist method (photographic development method) that is excellent in the coverage of parts.

  Specific compositions used for forming the solder resist include, for example, [1] (1) an oxazine ring-containing compound obtained by reacting aromatic diamines, paraform, and phenols, and (2) a novolak type. A flame retardant resin composition for copper clad laminates that contains at least one of phenolic resin, (3) inorganic flame retardant, phosphorus flame retardant, and nitrogen flame retardant as an essential component, and does not contain a substantial halogen element ( Patent Document 1), [2] A phenol resin composition comprising a triazine-modified novolak resin obtained by reacting a phenol containing an ortho-substituted phenol with a triazine and an aldehyde (see Patent Document 2) [3] (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a compound having a phenol and a triazine ring and an aldehyde A phenol resin composition comprising a compound or a condensate and substantially free of unreacted aldehydes and methylol groups, (C) a rubber component, and (D) a curing accelerator as essential components. Epoxy resin composition (see Patent Document 3), [4] (A) active energy ray-curable resin having one ethylenically unsaturated double bond in the molecule, (B) epoxy resin, and (C) light A photocurable resin composition containing a polymerization initiator. (See Patent Document 4), [5] (A) an active energy ray-curable resin having at least two ethylenically unsaturated bonds in one molecule, (B) a photopolymerization initiator, (C) a diluent, and (D) A photosensitive resin composition containing a partially esterified product of an epoxy group obtained by reacting an epoxy compound having at least two epoxy groups in one molecule with a radically polymerizable unsaturated monocarboxylic acid (patent) Reference 6), [6] (A) One molecule has two or more ethylenically unsaturated groups and one or more carboxyl groups, and the acid strength pKa of the carboxyl groups is 5.0 or less. A photo-curing / thermosetting material containing a carboxyl group-containing photosensitive resin, (B) a diluent, (C) a photopolymerization initiator, (D) melamine or an organic acid salt thereof, and (E) an inorganic filler. Liquid solder resist composition (special Document 6 reference) have been proposed.

JP-A-11-228786 JP 2003-119345 A JP-A-11-1547 JP 2001-172364 A JP 2005-250004 A JP 2008-020632 A

  However, the conventional composition used for forming the solder resist has the adhesion, electroless gold plating resistance, resolution, thermal shock resistance, electrical insulation, and solvent resistance required for the recent solder resist. In terms of balance of performance such as performance, it is still not sufficient, and the current situation is that further improvement in performance balance is required.

  The present invention has been made in view of the above circumstances, and forms a cured product such as a cured film having excellent adhesion, electroless gold plating resistance, resolution, thermal shock, electrical insulation, and solvent resistance. It aims at providing the photosensitive resin composition which can be manufactured, and the hardened | cured material formed by hardening | curing this composition.

The present invention is as follows.
[1] (A) a polymer having a phenolic hydroxyl group;
(B) a compound having two or more alkyl etherified amino groups in the molecule;
(C) a cyclic ether structure-containing compound;
(D) a photosensitive acid generator;
(E) a triazine structure-containing novolak resin, a photosensitive resin composition comprising:
The component (A) has neither a cyclic ether structure nor a triazine structure,
The said (C) component does not have a triazine structure, The photosensitive resin composition characterized by the above-mentioned.
[2] The photosensitive resin composition according to [1], wherein the component (B) contains a compound in which all or part of the active methylol groups in the methylolated melamine are alkyl etherified.
[3] The photosensitive resin composition according to [1] or [2], which contains a novolak resin as the component (A).
[4] The photosensitive resin composition according to any one of [1] to [3], further comprising (F) crosslinked fine particles.
[5] A cured product obtained by curing the photosensitive resin composition according to any one of [1] to [4].

According to the photosensitive resin composition of the present invention, it is possible to form a cured product such as a cured film having excellent adhesion, electroless gold plating resistance, resolution, thermal shock, electrical insulation, and solvent resistance. it can. In particular, a cured film having excellent adhesion can be formed even on a non-roughened substrate such as a copper substrate, and defects such as peeling can be sufficiently suppressed. Furthermore, even if the obtained cured film is subjected to a plating treatment (for example, electroless gold plating treatment), problems such as peeling can be sufficiently suppressed. Therefore, it is suitably used for surface protective films (passivation films, overcoat films, etc.) for semiconductor elements, interlayer insulating films, planarization films, solder resists, photosensitive adhesives, pressure sensitive adhesives, etc. (especially solder resists). be able to.
The cured product of the present invention is obtained by curing the photosensitive resin composition of the present invention, and is excellent in adhesion, electroless gold plating resistance, resolution, thermal shock, electrical insulation, and solvent resistance.

It is a schematic diagram explaining the cross section of the base material for thermal-impact evaluation. It is a schematic diagram explaining the base material for thermal shock evaluation. It is a schematic diagram explaining the base material for electrical insulation evaluation.

  The present invention will be described in detail below. In the present specification, “(meth) acryl” means “acryl” or “methacryl”. “(Meth) acrylate” means “acrylate” or “methacrylate”. Furthermore, “(meth) allyl” means “allyl” or “methallyl”. “(Meth) acryloxy” means “acryloxy” or “methacryloxy”.

[1] Photosensitive resin composition The photosensitive resin composition of the present invention comprises (A) a polymer having a phenolic hydroxyl group, and (B) a compound having two or more alkyl etherified amino groups in the molecule. (C) a cyclic ether structure-containing compound, (D) a photosensitive acid generator, (E) a triazine structure-containing novolak resin [hereinafter also referred to as “triazine structure-containing novolak resin (E)”. And containing.

[(A) Polymer having phenolic hydroxyl group]
Polymer having a phenolic hydroxyl group [hereinafter also referred to as “polymer (A)”. ] Is a polymer which is alkali-soluble and has neither a cyclic ether structure nor a triazine structure.
As this polymer (A), for example, a novolak resin obtained by condensing phenols and aldehydes in the presence of a catalyst can be used.
Phenols include phenol, o-cresol, m-cresol, p-cresol, o-ethylphenol, m-ethylphenol, p-ethylphenol, o-butylphenol, m-butylphenol, p-butylphenol, 2,3- Xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol, 2,3,5-trimethylphenol, 3,4,5-trimethylphenol, Catechol, resorcinol, pyrogallol, α-naphthol, β-naphthol and the like can be mentioned.
Examples of aldehydes include formaldehyde, paraformaldehyde, acetaldehyde, benzaldehyde and the like.
Specific novolak resins include phenol / formaldehyde condensed novolak resins, cresol / formaldehyde condensed novolak resins, phenol-naphthol / formaldehyde condensed novolak resins, and the like.

  Further, as the polymer (A), in addition to the above-mentioned novolak resin, polyhydroxystyrene, polyisopropenylphenol, phenol / xylylene glycol condensed resin, cresol / xylylene glycol condensed resin, phenol / dicyclopentadiene condensed resin Etc.

Furthermore, as a polymer (A), the copolymer of the monomer which has a phenolic hydroxyl group, and another monomer other than the above-mentioned thing can be used.
Examples of the monomer having a phenolic hydroxyl group include p-hydroxystyrene, m-hydroxystyrene, o-hydroxystyrene, p-isopropenylphenol, m-isopropenylphenol, o-isopropenylphenol and the like. These monomers may be used individually by 1 type, and may be used in combination of 2 or more type.

Examples of other monomers include methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, and tert-butyl (meth). (Meth) acrylic acid alkyl esters such as acrylate, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate; styrene, α-methylstyrene, o-methylstyrene, Aromatic vinyl compounds such as m-methylstyrene, p-methylstyrene, ethylstyrene, vinylxylene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene; unsaturated acid anhydrides such as maleic anhydride and citraconic anhydride object; (Meth) acrylic acid, maleic acid, fumaric acid, crotonic acid, mesaconic acid, citraconic acid, itaconic acid, 4-vinylbenzoic acid and other unsaturated carboxylic acids or unsaturated dicarboxylic acids; unsaturated carboxylic acid esters; unsaturated dicarboxylic acids Monoesters of acids; unsaturated nitriles such as methacrylonitrile, acrylonitrile, maleinonitrile, fumaronitrile, mesaconitrile, citraconitrile, itacon nitrile; (meth) acrylamide, crotonamide, maleinamide, fumaramide, mesacamide, itaconamide, itacone Unsaturated amides such as amides; Unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; Unsaturated alcohols such as (meth) allyl alcohol; N-vinylaniline, vinylpyridine, N-biphenyl Nyl-ε-caprolactam, N-vinylpyrrolidone, N-vinylimidazole, N-vinylcarbazole and the like can be mentioned. These other monomers may be used individually by 1 type, and may be used in combination of 2 or more type.
In addition, the hydrogen atom of the alkyl group in the (meth) acrylic acid alkyl ester may be substituted with a hydroxyl group.

  Among these polymers (A), novolak resin, polyhydroxystyrene, phenol / xylylene glycol condensation resin are preferable, and novolak resin is more preferable.

  The polystyrene equivalent weight average molecular weight (Mw) of the polymer (A) by gel permeation chromatography is not particularly limited, but is preferably 1000 to 100,000, more preferably 3000 to 50000, and still more preferably 5000 to 20000. is there. When this Mw is in the above-mentioned range, the photosensitive resin composition is excellent in resolution, and excellent in the mechanical properties, heat resistance and electrical insulation of the resulting cured film.

  In addition, the photosensitive resin composition of this invention may contain only 1 type of polymers (A), and may contain 2 or more types.

  Although the content rate of a polymer (A) is not specifically limited, It is preferable that it is 30-90 mass% when the sum total of other components except the below-mentioned solvent is 100 mass%, More preferably, it is 40-80. It is 50 mass%, More preferably, it is 50-70 mass%. When the content rate of this polymer (A) is 30-90 mass%, since the photosensitive resin composition has sufficient developability by alkaline aqueous solution, it is preferable. Furthermore, it is preferable because the obtained cured film is excellent in mechanical properties, heat resistance and electrical insulation.

In addition, the photosensitive resin composition of the present invention may contain a phenolic low molecular weight compound in order to further improve alkali solubility. As this phenolic low molecular weight compound, for example, 4,4 ′-{1- [4- [2- (4-hydroxyphenyl) -2-propyl] phenyl] ethylidene} bisphenol, 4,4 ′-{1- [4- [1- (4-hydroxyphenyl) -1-methylethyl] phenyl] ethylidene} bisphenol, 4,4′-dihydroxydiphenylmethane, 4,4′-dihydroxydiphenyl ether, tris (4-hydroxyphenyl) methane, 1 , 1-bis (4-hydroxyphenyl) -1-phenylethane, tris (4-hydroxyphenyl) ethane, 1,3-bis [1- (4-hydroxyphenyl) -1-methylethyl] benzene, 1,4 -Bis [1- (4-hydroxyphenyl) -1-methylethyl] benzene, 4,6-bis [1- (4-hydroxyphenyl) Enyl) -1-methylethyl] -1,3-dihydroxybenzene, 1,1-bis (4-hydroxyphenyl) -1- [4- [1- (4-hydroxyphenyl) -1-methylethyl] phenyl] Examples include ethane, 1,1,2,2-tetra (4-hydroxyphenyl) ethane, and the like.
These phenolic low molecular weight compounds may be used alone or in combination of two or more.

  The compounding amount of the phenolic low molecular compound is preferably 40 parts by mass or less, more preferably 1 to 30 parts by mass, when the polymer (A) is 100 parts by mass. When this compounding quantity is in the above-mentioned range, the alkali solubility can be improved without impairing the mechanical properties, heat resistance and electrical insulation of the resulting cured product.

[(B) Compound having two or more alkyl etherified amino groups in the molecule]
Compound having two or more alkyl etherified amino groups in the molecule [hereinafter also referred to as “amino group-containing compound (B)”. ] Acts as a crosslinking component (curing component) that reacts with the polymer (A) described above.
As the amino group-containing compound (B), for example, an active methylol group in a nitrogen compound such as (poly) methylolated melamine, (poly) methylolated glycoluril, (poly) methylolated benzoguanamine, (poly) methylolated urea ( And a compound in which all or a part of (CH ₂ OH group) or at least two (CH ₂ OH groups) is alkyl etherified. Among these, compounds in which all or part of the active methylol groups in the methylolated melamine are alkyl etherified are preferable.
Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, and a butyl group, and these may be the same as or different from each other. In addition, the methylol group that is not alkyletherified may be self-condensed within one molecule, or may be condensed between two molecules, and as a result, an oligomer component may be formed. Specifically, hexamethoxymethyl melamine, hexabutoxymethyl melamine, tetramethoxymethyl glycoluril, tetrabutoxymethyl glycoluril and the like can be used.

  In addition, the photosensitive resin composition of this invention may contain only 1 type of amino group containing compounds (B), and may contain 2 or more types.

  The content of the amino group-containing compound (B) is preferably 1 to 100 parts by mass, more preferably 5 to 70 parts by mass, further preferably 10 when the polymer (A) is 100 parts by mass. -40 mass parts. When the content of the amino group-containing compound (B) is 1 to 100 parts by mass, the curing reaction proceeds sufficiently, the formed cured film has a high resolution and a good pattern shape, and adhesion, It is preferable because of its excellent heat resistance and electrical insulation.

[(C) Cyclic ether structure-containing compound]
The cyclic ether structure-containing compound [hereinafter also referred to as “cyclic ether structure-containing compound (C)”. ] Acts as a crosslinking component (curing component) that reacts with the polymer (A) described above.
In addition, this cyclic ether structure containing compound (C) is a compound which does not have a triazine structure.

The cyclic ether structure contained in the cyclic ether structure-containing compound (C) is not particularly limited, but is preferably a 3- to 6-membered cyclic ether structure.
Specific examples of the cyclic ether structure-containing compound (C) include an oxirane ring-containing compound (c1) and an oxetanyl group-containing compound (c2).

The oxirane ring-containing compound (c1) is not particularly limited as long as it contains an oxirane ring in the molecule. For example, a phenol novolac epoxy resin, a cresol novolac epoxy resin, a bisphenol epoxy resin, a trisphenol type Epoxy resin, tetraphenol type epoxy resin, phenol-dicyclopentadiene type epoxy resin (polyglycidyl ether of a polymer of phenol and dicyclopentadiene), phenol-xylylene type epoxy resin, naphthol-xylylene type epoxy resin, phenol-naphthol Type epoxy resin, alicyclic epoxy resin, aliphatic epoxy resin and the like.
Among these, phenol novolac type epoxy resins, phenol-dicyclopentadiene type epoxy resins, bisphenol type epoxy resins, alicyclic epoxy resins, aliphatic epoxy resins and the like are preferable.
In particular, it is preferable to contain at least one of a phenol novolac type epoxy resin and a phenol-dicyclopentadiene type epoxy resin, and it is more preferable to contain both. In the case of containing at least one of a phenol novolac type epoxy resin and a phenol-dicyclopentadiene type epoxy resin, it is preferable because the obtained cured product is excellent in mechanical properties, heat resistance and electrical insulation.

  The oxetanyl ring-containing compound (c2) is not particularly limited as long as the oxetanyl ring is contained in the molecule, and examples thereof include compounds represented by the following general formulas (c2-1) to (c2-3) Can be mentioned.

In each of the general formulas (c2-1) to (c2-3), R is an alkyl group such as a methyl group, an ethyl group, or a propyl group, and R ¹ is an alkylene group such as a methylene group, an ethylene group, or a propylene group. R ² is an alkyl group such as a methyl group, an ethyl group, a propyl group or a hexyl group; an aryl group such as a phenyl group or a xylyl group; a dimethylsiloxane residue represented by the following formula (i); a methylene group or an ethylene group , An alkylene group such as a propylene group; a phenylene group; or a group represented by the following formulas (ii) to (vi), wherein i is equal to the valence of R ² and is an integer of 1 to 4. In the following formulas (i) to (vi), “*” represents a binding site.

X and y in the formulas (i) and (ii) are each independently an integer of 0 to 50.
Z in the formula (iii) is a single bond or a divalent group represented by —CH ₂ —, —C (CH ₃ ) ₂ —, —C (CF ₃ ) ₂ — or —SO ₂ —. It is a group.

  Specific examples of the compounds represented by the general formulas (c2-1) to (c2-3) include 1,4-bis {[(3-ethyloxetane-3-yl) methoxy] methyl} benzene (trade name “OXT”). -121 ", manufactured by Toa Gosei Co., Ltd.), 3-ethyl-3-{[(3-ethyloxetane-3-yl) methoxy] methyl} oxetane (trade name" OXT-221 ", manufactured by Toa Gosei Co., Ltd.), 4, 4′-bis [(3-ethyl-3-oxetanyl) methoxymethyl] biphenyl (trade name “ETERRNACOLL OXBP” manufactured by Ube Industries, Ltd.), bis [(3-ethyl-3-oxetanylmethoxy) methyl-phenyl] ether, bis [(3-Ethyl-3-oxetanylmethoxy) methyl-phenyl] propane, bis [(3-ethyl-3-oxetanylmethoxy) methyl-phenyl] sulfone Bis [(3-ethyl-3-oxetanylmethoxy) methyl-phenyl] ketone, bis [(3-ethyl-3-oxetanylmethoxy) methyl-phenyl] hexafluoropropane, tri [(3-ethyl-3-oxetanylmethoxy) Methyl] benzene, tetra [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, and compounds represented by the following chemical formulas (c2-a) to (c2-e).

  In addition to these compounds, compounds having a high molecular weight polyvalent oxetane ring can be used. Specifically, for example, oxetane oligomers (trade name “Oligo-OXT”, manufactured by Toagosei Co., Ltd.) and compounds represented by the following chemical formulas (c2-f) to (c2-h) can be exemplified. .

  P, q, and s in formulas (c2-f) to (c2-h) are each independently an integer of 0 to 10,000.

  Among these oxetanyl ring-containing compounds (c2), 1,4-bis {[(3-ethyloxetane-3-yl) methoxy] methyl} benzene (trade name “OXT-121”, manufactured by Toagosei Co., Ltd.), 3-ethyl-3-{[(3-ethyloxetane-3-yl) methoxy] methyl} oxetane (trade name “OXT-221”, manufactured by Toagosei Co., Ltd.), 4,4′-bis [(3-ethyl- 3-Oxetanyl) methoxymethyl] biphenyl (manufactured by Ube Industries, trade name “ETERNACOLL OXBP”) is preferred.

  In addition, the photosensitive resin composition of this invention may contain 1 type of cyclic ether structure containing compounds (C), and may contain 2 or more types.

  The content of the cyclic ether structure-containing compound (C) is preferably 1 to 100 parts by mass, more preferably 1 to 70 parts by mass, and still more preferably, when the polymer (A) is 100 parts by mass. 5 to 40 parts by mass. When the content of the cyclic ether structure-containing compound (C) is 1 to 100 parts by mass, the curing reaction proceeds sufficiently, the formed cured film has a high resolution and a good pattern shape, and adhesion. It is preferable because of its excellent heat resistance and electrical insulation.

[(D) Photosensitive acid generator]
The photosensitive acid generator [hereinafter also referred to as “acid generator (D)”. ] Is a compound that generates an acid upon irradiation with radiation or the like, and by the catalytic action of this acid, the alkyl ether group in the amino group-containing compound (B) and the polymer (A) or the phenolic low molecular compound When the phenol ring reacts with dealcoholization, a negative pattern is formed.
The acid generator (D) is not particularly limited as long as it is a compound that generates an acid upon irradiation with radiation or the like. For example, an onium salt compound, a halogen-containing compound, a diazoketone compound, a sulfone compound, a sulfonic acid compound, and a sulfonimide compound And diazomethane compounds.

  Examples of the onium salt compounds include iodonium salts, sulfonium salts, phosphonium salts, diazonium salts, pyridinium salts, and the like. Specifically, for example, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium p-toluenesulfonate, diphenyliodonium hexafluoroantimonate, diphenyliodonium hexafluorophosphate, diphenyliodonium tetrafluoroborate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, 4-t-butylphenyl diphenylsulfonium trifluoromethanesulfonate, 4-t-butylphenyl diphenylsulfonium p-toluenesulfonate, 4,7-di-n-butoxynaphthyl Tetrahydrothiophenium trifluoromethanesulfonate Etc. The.

  Examples of the halogen-containing compound include haloalkyl group-containing hydrocarbon compounds and haloalkyl group-containing heterocyclic compounds. Specifically, for example, 1,10-dibromo-n-decane, 1,1-bis (4-chlorophenyl) -2,2,2-trichloroethane, phenyl-bis (trichloromethyl) -s-triazine, 4- Examples include s-triazine derivatives such as methoxyphenyl-bis (trichloromethyl) -s-triazine, styryl-bis (trichloromethyl) -s-triazine, and naphthyl-bis (trichloromethyl) -s-triazine.

  Examples of the diazoketone compound include 1,3-diketo-2-diazo compounds, diazobenzoquinone compounds, diazonaphthoquinone compounds, and the like. Specific examples include 1,2-naphthoquinonediazide-4-sulfonic acid ester compounds of phenols.

  Examples of the sulfone compounds include β-ketosulfone compounds, β-sulfonylsulfone compounds, and α-diazo compounds of these compounds. Specific examples include 4-trisphenacyl sulfone, mesityl phenacyl sulfone, bis (phenacylsulfonyl) methane, and the like.

  Examples of the sulfonic acid compounds include alkyl sulfonic acid esters, haloalkyl sulfonic acid esters, aryl sulfonic acid esters, and imino sulfonates. Specific examples include benzoin tosylate, pyrogallol tris trifluoromethane sulfonate, o-nitrobenzyl trifluoromethane sulfonate, o-nitrobenzyl p-toluene sulfonate, and the like.

  Examples of the sulfonimide compound include N- (trifluoromethylsulfonyloxy) succinimide, N- (trifluoromethylsulfonyloxy) phthalimide, N- (trifluoromethylsulfonyloxy) diphenylmaleimide, N- (trifluoromethylsulfonyloxy). ) Bicyclo [2.2.1] hept-5-ene-2,3-dicarboximide, N- (trifluoromethylsulfonyloxy) naphthylimide and the like.

  Examples of the diazomethane compound include bis (trifluoromethylsulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, bis (phenylsulfonyl) diazomethane, and the like.

  Among these, a halogen-containing compound, an onium salt compound, and a sulfonimide compound are preferable in terms of adhesion to a metal film whose surface is not roughened.

  In addition, the photosensitive resin composition of this invention may contain only 1 type of acid generators (D), and may contain 2 or more types.

  The content of the acid generator (D) is 0.1 to 10 masses when the polymer (A) is 100 parts by mass from the viewpoint of ensuring the sensitivity, resolution, pattern shape and the like of the photosensitive resin composition. Part, preferably 0.3 to 7 parts by mass, and more preferably 0.5 to 5. When this content is less than 0.1 parts by mass, curing may be insufficient and heat resistance may be reduced. On the other hand, when it exceeds 10 mass parts, the transparency with respect to a radiation will fall and it may cause deterioration of pattern shape.

[(E) Triazine structure-containing novolak resin]
Triazine structure-containing novolak resin [hereinafter also referred to as “triazine structure-containing novolak resin (E)”. ] Is composed of a mixture or a condensate of a phenol and a compound having a triazine ring and an aldehyde (for example, JP-A-11-1547, JP-A-8-253557, and JP-A-8-311142). Issue gazette). The mixture or condensate preferably contains substantially no unreacted aldehydes and methylol groups.

The phenols are not particularly limited. For example, phenol, cresol, xylenol; alkylphenols such as ethylphenol, butylphenol, nonylphenol, octylphenol; polyhydric phenols such as bisphenol A, bisphenol F, bisphenol S, resorcin, and catechol; halogen Phenol, phenylphenol, aminophenol and the like.
These phenols may be used individually by 1 type, and may be used in combination of 2 or more type.

  Although the compound which has the said triazine ring is not specifically limited, For example, the compound represented by the following general formula (1), the compound represented by the following general formula (2), etc. are mentioned.

〔一般式（１）において、Ｒ^１１、Ｒ^１２及びＲ^１３は、相互に独立に、アミノ基、アルキル基、フェニル基、ヒドロキシル基、ヒドロキシルアルキル基、エーテル基、エステル基、酸基、不飽和基、シアノ基、又はハロゲン原子を示す。〕

[In the general formula (1), R ¹¹ , R ¹² and R ¹³ are independently of each other an amino group, alkyl group, phenyl group, hydroxyl group, hydroxylalkyl group, ether group, ester group, acid group, unsaturated group. A group, a cyano group, or a halogen atom; ]

〔一般式（２）において、Ｒ^１４、Ｒ^１５及びＲ^１６は、相互に独立に、水素原子、アルキル基、フェニル基、ヒドロキシル基、ヒドロキシルアルキル基、エステル基、酸基、不飽和基、シアノ基、又はハロゲン原子を示す。〕

[In the general formula (2), R ¹⁴ , R ¹⁵ and R ¹⁶ are each independently a hydrogen atom, alkyl group, phenyl group, hydroxyl group, hydroxylalkyl group, ester group, acid group, unsaturated group, cyano group, A group or a halogen atom; ]

In the general formula (1), it is preferable that at least one of R ¹¹ , R ¹² and R ¹³ is an amino group.

Specific examples of the compound represented by the general formula (1) include melamine; guanamine derivatives such as acetoguanamine and benzoguanamine; cyanuric acid; cyanuric acid derivatives such as methyl cyanurate, ethyl cyanurate, acetyl cyanurate, and cyanuric chloride. Etc. Among these, guanamine derivatives such as melamine, acetoguanamine, and benzoguanamine, in which any two or three of R ¹¹ , R ^12, and R ¹³ are amino groups, and cyanuric acid are preferable.

In the general formula (2), it is preferable that at least one of R ¹⁴ , R ¹⁵ and R ¹⁶ is a hydrogen atom.

Specific compounds represented by the general formula (2) include, for example, isocyanuric acid; methyl isocyanurate, ethyl isocyanurate, allyl isocyanurate, 2-hydroxyethyl isocyanurate, 2-carboxylethyl isocyanurate, chlorinated isocyanurate. Examples include isocyanuric acid derivatives such as acids. Among these, isocyanuric acid in which all of R ¹⁴ , R ¹⁵ and R ¹⁶ are hydrogen atoms is preferable.

  In addition, the compound which has these triazine rings may be used individually by 1 type, and may be used in combination of 2 or more type.

  Here, as the specific triazine structure-containing novolak resin (E), “Phenolite 7050” series (“Phenolite KA-7052”, “Pholylite KA-7052”, “Triazine structure-containing novolak resin represented by the following structural formula (e1)” Phenolite LA-7052 "," Phenolite LA-7054 "; manufactured by Dainippon Ink & Chemicals, Inc.).

  The content of the triazine structure-containing novolak resin (E) is preferably 0.1 to 30 parts by mass, more preferably 0.5 to 20 parts by mass, when the polymer (A) is 100 parts by mass. More preferably, it is 1-10 mass parts. When the content of the triazine structure-containing novolak resin (E) is from 0.1 to 30 parts by mass, it is preferable because a cured product having good adhesion can be formed.

[(F) Crosslinked fine particles]
The photosensitive resin composition of the present invention is also referred to as crosslinked fine particles [hereinafter referred to as “crosslinked fine particles (F)” in order to improve the durability and thermal shock resistance of the cured product. ] Can be further contained.
The crosslinked fine particles (F) are composed of a crosslinkable monomer having two or more unsaturated polymerizable groups (hereinafter simply referred to as “crosslinkable monomer”) and one or more kinds of “other units”. It is a copolymer obtained by copolymerizing a “mer”. In particular, two or more other monomers are used in combination, and at least one of the other monomers is a functional group other than a polymerizable group such as a carboxyl group, an epoxy group, an amino group, an isocyanate group, or a hydroxyl group. It is more preferable to have a group.

  Examples of the crosslinkable monomer include divinylbenzene, diallyl phthalate, ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, polyethylene Examples thereof include compounds having a plurality of polymerizable unsaturated groups such as glycol di (meth) acrylate and polypropylene glycol di (meth) acrylate. Of these, divinylbenzene is preferred.

  The crosslinkable monomer used for producing the crosslinked fine particles (F) is preferably 1 to 20% by mass, based on 100% by mass of all monomers used for copolymerization, and 2 to 10%. More preferably, it is mass%.

  Examples of other monomers include diene compounds such as butadiene, isoprene, dimethylbutadiene, chloroprene and 1,3-pentadiene; methacrylonitrile, acrylonitrile, α-chloroacrylonitrile, α-chloromethylacrylonitrile, α- Unsaturated nitrile compounds such as methoxyacrylonitrile, α-ethoxyacrylonitrile, crotonic acid nitrile, cinnamic acid nitrile, itaconic acid dinitrile, maleic acid dinitrile, and fumaric acid dinitrile; (meth) acrylamide, N, N′-methylenebis (meth) Acrylamide, N, N′-ethylenebis (meth) acrylamide, N, N′-hexamethylenebis (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N- (2-hydroxyethyl) (meth) a Unsaturated amides such as rilamide, N, N-bis (2-hydroxyethyl) (meth) acrylamide, crotonic acid amide, and cinnamic acid amide; methyl (meth) acrylate, ethyl (meth) acrylate, (meth) (Meth) acrylate compounds such as propyl acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate; styrene, Aromatic vinyl compounds such as α-methylstyrene, o-methoxystyrene, p-hydroxystyrene, p-isopropenylphenol; diglycidyl ether of bisphenol A, diglycidyl ether of glycol, (meth) acrylic acid, hydroxyalkyl ( Meta) Acu Epoxy (meth) acrylates obtained by reaction with rate, urethane (meth) acrylates obtained by reaction of hydroxyalkyl (meth) acrylate and polyisocyanate, glycidyl (meth) acrylate, (meth) allyl glycidyl ether Epoxy group-containing unsaturated compounds such as: (meth) acrylic acid, itaconic acid, succinic acid-β- (meth) acryloxyethyl, maleic acid-β- (meth) acryloxyethyl, phthalic acid-β- (meth) Unsaturated acid compounds such as acryloxyethyl and hexahydrophthalic acid-β- (meth) acryloxyethyl; amino group-containing unsaturated compounds such as dimethylamino (meth) acrylate and diethylamino (meth) acrylate; (meth) acrylamide, Ami such as dimethyl (meth) acrylamide Group-containing unsaturated compounds; hydroxyl group-containing unsaturated compounds such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, and hydroxybutyl (meth) acrylate.

  Among these other monomers, butadiene, isoprene, methacrylonitrile, acrylonitrile, alkyl (meth) acrylates, styrene, p-hydroxystyrene, p-isopropenylphenol, glycidyl (meth) acrylate, ( Preferred are meth) acrylic acid, hydroxyalkyl (meth) acrylates and the like.

In the production of the crosslinked fine particles (F), at least one diene compound, specifically, butadiene is preferably used as the other monomer. Such a diene compound is preferably 20 to 80% by mass, and more preferably 30 to 70% by mass, when the total amount of monomers used for copolymerization is 100% by mass. If the diene compound is 20 to 80% by mass, the crosslinked fine particles (F) become rubbery soft fine particles, and it is possible to prevent cracks from occurring in a cured product such as an insulating film formed. It can be set as the insulating film etc. which are excellent in durability.
These crosslinked fine particles (F) may be used singly or in combination of two or more.

Moreover, the average particle diameter of crosslinked fine particles (F) is 30-500 nm normally, Preferably it is 40-200 nm, More preferably, it is 50-120 nm. The method for controlling the particle size of the crosslinked fine particles (F) is not particularly limited. For example, when the crosslinked fine particles are synthesized by emulsion polymerization, the number of micelles during emulsion polymerization is controlled by the amount of the emulsifier used. The diameter can be adjusted.
The average particle diameter of the crosslinked fine particles (F) was measured by diluting the dispersion of the crosslinked fine particles according to a conventional method using a light scattering flow distribution measuring device (manufactured by Otsuka Electronics Co., Ltd., model “LPA-3000”). Value.

  The content of the crosslinked fine particles (F) is preferably 0.5 to 50 parts by mass, more preferably 1 to 30 parts by mass, when the polymer (A) is 100 parts by mass. When the content is 0.5 to 50 parts by mass, the compatibility with other components or dispersibility is excellent, and the thermal shock resistance and heat resistance of the formed insulating film and the like can be improved.

[(G) Solvent]
The photosensitive resin composition of the present invention is also referred to as a solvent [hereinafter referred to as “solvent (G)” in order to improve the handleability of the composition or to adjust the viscosity and storage stability. ] Can be further contained.
Examples of the solvent (G) include ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate and ethylene glycol monoethyl ether acetate; propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene Propylene glycol monoalkyl ethers such as glycol monobutyl ether; propylene glycol dialkyl ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol dibutyl ether; propylene glycol monomethyl ether acetate, propylene glycol monoethyl Propylene glycol monoalkyl ether acetates such as ether acetate, propylene glycol monopropyl ether acetate and propylene glycol monobutyl ether acetate; cellosolves such as ethyl cellosolve and butyl cellosolve; carbitols such as butyl carbitol; methyl lactate, ethyl lactate and lactic acid Lactic acid esters such as n-propyl and isopropyl lactate; ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, isopropyl propionate, n-butyl propionate, propion Aliphatic carboxylic acid esters such as isobutyl acid; methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, Other esters such as ethyl xylpropionate, methyl pyruvate and ethyl pyruvate; aromatic hydrocarbons such as toluene and xylene; ketones such as 2-heptanone, 3-heptanone, 4-heptanone and cyclohexanone; N- Examples include amides such as dimethylformamide, N-methylacetamide, N, N-dimethylacetamide, and N-methylpyrrolidone; lactones such as γ-butyrolacun.
These solvent (G) may be used individually by 1 type, and may be used in combination of 2 or more type.

[Other additives]
If necessary, the photosensitive resin composition of the present invention can contain other additives to the extent that the characteristics of the present invention are not impaired. Examples of other additives include inorganic fillers, sensitizers, heat-sensitive acid generators, adhesion assistants, acid diffusion control agents, leveling agents, and surfactants.

[2] Manufacturing method of photosensitive resin composition The manufacturing method of the photosensitive resin composition of this invention is not specifically limited, It can manufacture by a well-known method. Moreover, it can manufacture also by throwing each component into a sample bottle, sealing after that, and stirring on a wave rotor.

[3] Cured product The cured product of the present invention is obtained by curing the above-described photosensitive resin composition of the present invention.
The above-mentioned photosensitive resin composition is excellent in various properties such as resolution, adhesion (particularly adhesion to a metal film), thermal shock, electrical insulation, patterning performance, and elongation. Therefore, this cured product is suitably used as a surface protective film, an interlayer insulating film, a planarizing film, a solder resist, a photosensitive adhesive, a pressure sensitive adhesive, etc. for electronic components such as circuit boards (semiconductor elements) and semiconductor packages. be able to. In particular, the cured product can be a circuit board provided with a solder resist, an interlayer insulating film, or a planarizing film.

  The cured product of the present invention is obtained by applying the photosensitive resin composition described above to a support (a copper foil with resin, a copper-clad laminate, a silicon wafer provided with a metal sputtered film, an alumina substrate, etc.), and drying. The solvent is volatilized to form a coating film, and then exposed through a desired mask pattern, subjected to heat treatment (hereinafter, this heat treatment is referred to as “PEB”), the polymer (A), A desired pattern is formed by accelerating the reaction with the amino group-containing compound (B) and the cyclic ether structure-containing compound (C) and then developing with an alkaline developer to dissolve and remove the unexposed areas. Thereafter, the film can be formed by heat treatment in order to develop the insulating film characteristics.

  As a method for applying the photosensitive resin composition to the support, for example, various coating methods such as a dipping method, a spray method, a bar coating method, a roll coating method, or a spin coating method can be employed. Further, the thickness of the coating film can be appropriately controlled by adjusting the coating means, the solid content concentration and the viscosity of the photosensitive resin composition solution, and the like.

Examples of radiation used for exposure include ultraviolet rays, electron beams, and laser beams emitted from low-pressure mercury lamps, high-pressure mercury lamps, metal halide lamps, g-line steppers, h-line steppers, i-line steppers, gh-line steppers, and ghi-line steppers. Etc. The exposure amount can be appropriately set depending on the light source used, the resin film thickness, and the like. For example, in the case of ultraviolet rays irradiated from a high-pressure mercury lamp, the resin film thickness is 1 to 50 μm, and 100 to 20,000 J / m ^2. Can be about.

  After the exposure, the above-described PEB treatment is carried out to promote the curing reaction of the polymer (A), the amino group-containing compound (B) and the cyclic ether structure-containing compound (C) with the generated acid. The PEB condition varies depending on the blending amount and film thickness of each component in the photosensitive resin composition, but is usually 70 to 150 ° C, preferably 80 to 120 ° C, and about 1 to 60 minutes. Thereafter, development is performed with an alkaline developer, and a desired pattern is formed by dissolving and removing unexposed portions. Examples of the developing method include shower developing method, spray developing method, immersion developing method, paddle developing method and the like. The development conditions are usually about 20 to 40 ° C. and about 1 to 10 minutes.

Examples of the alkaline developer include an alkaline aqueous solution in which an alkaline compound such as sodium hydroxide, potassium hydroxide, ammonia water, tetramethylammonium hydroxide, and choline is dissolved in water so as to have a concentration of 1 to 10% by mass. Can be mentioned.
In addition, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like can be added to the alkaline aqueous solution. In addition, after developing with an alkaline developer, it is washed with water and dried.

  Furthermore, in order to fully develop the characteristics as an insulating film after development, it can be sufficiently cured by heat treatment. Such curing conditions are not particularly limited, but can be cured by heating at a temperature of 50 to 250 ° C. for about 30 minutes to 10 hours depending on the use of the cured product. Moreover, in order to advance hardening fully or to prevent the deformation | transformation of the formed pattern shape, it can also heat in two steps, for example, at the temperature of 50-120 degreeC in a 1st step, 5 minutes-2 It can also be cured by heating for about an hour and further heating for about 10 minutes to 10 hours at a temperature of 80 to 250 ° C. Under such curing conditions, a general oven, an infrared furnace, or the like can be used as a heating facility.

  Hereinafter, the embodiment of the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples. Here, “part” and “%” are based on mass unless otherwise specified.

[1] Preparation of negative photosensitive resin composition <Example 1>
As shown in Table 1, 100 parts of polymer (A-1), 25 parts of amino group-containing compound (B-1), 15 parts of cyclic ether structure-containing compound (C-1), acid generator (D -1) 3 parts, triazine structure-containing novolak resin (E-1) 3 parts, and crosslinked fine particles (F-1) 10 parts, and each component was dissolved in 150 parts of solvent (G-1). A photosensitive resin composition of Example 1 was prepared.

<Examples 2-16 and Comparative Examples 1-2>
Except that the various components shown in Table 1 were blended in the amounts shown in Table 1, the negative photosensitive resin compositions of Examples 2 to 16 and Comparative Examples 1 and 2 were the same as in Example 1 above. Prepared.

The detail of each component described in Table 1 is as follows.
<Polymer (A)>
A-1: Cresol novolak resin comprising m-cresol / p-cresol = 60/40 (molar ratio) (polystyrene equivalent weight average molecular weight = 8700)
A-2: Polyhydroxystyrene (manufactured by Maruzen Petrochemical Co., Ltd., trade name “Marcalinker S-2P”)
<Amino group-containing compound (B)>
B-1: Hexamethoxymethylmelamine (Mitsui Cytec Co., Ltd., trade name "Cymel 300")
<Cyclic ether structure-containing compound (C)>
C-1; o-phenol novolac type epoxy resin (Oilized Shell Co., Ltd., trade name “EP-152”)
C-2: Phenol-dicyclopentadiene type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., trade name “XD-1000”)
C-3: Bisphenol A type epoxy resin (trade name “EP-828” manufactured by Japan Epoxy Resin Co., Ltd.)
C-4; Alicyclic epoxy resin (Daicel Chemical Industries, trade name “Celoxide 2021P”)
C-5; aliphatic epoxy resin (manufactured by Nagase ChemteX Corporation, trade name “Denacol EX-321”)
<Acid generator (D)>
D-1; 4,7-di-n-butoxynaphthyltetrahydrothiophenium trifluoromethanesulfonate D-2: N- (trifluoromethylsulfonyloxy) naphthylimide (manufactured by Midori Chemical Co., Ltd., trade name “NAI-105”) ")
D-3: 4-methoxystyryl-bis (trichloromethyl) -s-triazine (product name “Triazine PMS” manufactured by Nippon Siebel Hegner Co., Ltd.)
D-4: 2- [2- (5-methylfuran-2-yl) ethynyl] -4,6-bis (trichloromethyl) -s-triazine (manufactured by Sanwa Chemical Co., Ltd., trade name “TME-triazine”)
<Triazine structure-containing novolak resin (E)>
E-1: Triazine-containing phenol novolak resin (manufactured by Dainippon Ink and Chemicals, trade name “Phenolite LA-7052”, polystyrene-converted weight average molecular weight; 1,000, nitrogen content; 8%)
E-2: Triazine-containing phenol novolak resin (manufactured by Dainippon Ink and Chemicals, trade name “Phenolite LA-7054”, polystyrene equivalent weight average molecular weight; 1,000, nitrogen content; 15%)
<Crosslinked fine particles (F)>
F-1; fine particles copolymerized with butadiene / hydroxybutyl methacrylate / methacrylic acid / divinylbenzene = 67/25/6/2 (mass ratio) (average particle diameter: 60 nm)
<Solvent (G)>
G-1; Ethyl lactate G-2; Cyclopentanone <Other additive (H)>
H-1; γ-glycidoxypropyltrimethoxysilane (manufactured by Nippon Unicar Co., Ltd., trade name “A-187”)

[2] Evaluation of photosensitive resin composition The characteristics of the photosensitive resin compositions of Examples 1 to 16 and Comparative Examples 1 and 2 were evaluated according to the following methods. The results are shown in Table 2.

(1) Adhesiveness A photosensitive resin composition was applied to a copper-clad laminate (substrate thickness: 0.6 mm, size: 10 cm square) whose surface was not roughened, and the temperature was 15 at 90 ° C. using a convection oven. Heated for 30 minutes to produce a uniform coating having a thickness of 30 μm. Thereafter, ultraviolet rays of 10,000 J / m ² were exposed using a high-pressure mercury lamp and heated at 170 ° C. for 2 hours to obtain a cured film. Next, this cured film was treated for 200 hours under conditions of a temperature of 130 ° C., a humidity of 85%, and a pressure of 2.2 atm using a pressure cooker test apparatus (manufactured by Tabai Espec Co., Ltd.). And the adhesiveness before and behind a test performed the crosscut test (cross cut tape method) based on JISK5400, and evaluated it with the following references | standards.
○: No peeling at all △: Slight peeling is observed ×: There is peeling

(2) Resistance to electroless gold plating A photosensitive resin composition is applied to a copper-clad laminate (substrate thickness: 0.6 mm, size: 10 cm square) whose surface has not been roughened, and the surface is 90 using a convection oven. Heated at 15 ° C. for 15 minutes to prepare a uniform coating film having a thickness of 30 μm. Thereafter, using an aligner (“MA-200”, manufactured by Karl Suss), UV light from a high-pressure mercury lamp was exposed through a pattern mask so that the exposure amount at a wavelength of 350 nm was 4000 J / m ² . Next, PEB was performed for 20 minutes at 90 ° C. using a convection oven, and shower development (pressure; ² Kgf / cm ² ) was performed for 2 minutes at 30 ° C. using a 1% aqueous sodium hydroxide solution to form an opening pattern with a diameter of 50 μm. Obtained. Then, it heated at 170 degreeC for 2 hours, and obtained the cured film. Then, this cured film is plated using a commercially available electroless nickel plating bath and electroless gold plating bath under the conditions of nickel 5 μm and gold 1 μm, and peeling of the cured film and soaking of the plating is caused by tape peeling. The presence or absence was evaluated. The evaluation criteria are shown below.
○: No peeling at all △: Slight peeling or penetration is observed ×: There is peeling

(3) Resolution The photosensitive resin composition was applied to a copper-clad laminate (substrate thickness: 0.6 mm, size: 10 cm square), heated at 90 ° C. for 15 minutes using a convection oven, and 30 μm thick A uniform coating was produced. Thereafter, using an aligner (manufactured by Karl Suss, “MA-200”), UV light from a high-pressure mercury lamp was exposed through a pattern mask so that the exposure amount at a wavelength of 350 nm was 3000 to 5000 J / m ² . Subsequently, PEB was carried out at 90 ° C. for 20 minutes using a convection oven, and shower development (pressure; ² Kgf / cm ² ) was performed at 30 ° C. for 2 minutes using a 1% aqueous sodium hydroxide solution. The minimum dimension of the pattern obtained at this time was defined as the resolution.

(4) Thermal shock property A photosensitive resin composition is applied to a substrate 3 for thermal shock evaluation (see FIGS. 1 and 2) having a patterned copper foil 1 on a substrate 2, and convection is performed. A uniform oven with a thickness of 30 μm was obtained by heating at 90 ° C. for 15 minutes using an oven. Thereafter, ultraviolet rays of 10,000 J / m ² were exposed using a high-pressure mercury lamp and heated at 170 ° C. for 2 hours to obtain a cured film. Next, the substrate on which the cured film is formed is resistant to a cycle of −65 ° C./30 minutes to 150 ° C./30 minutes using a thermal shock tester (“TSA-40L” manufactured by Tabai Espec Co., Ltd.). A test was conducted to confirm the number of cycles in which defects such as cracks occurred in the cured film.

(5) Electrical insulation (migration test)
A photosensitive resin composition is applied to a base 6 for electrical insulation evaluation (see FIG. 3) having a patterned copper foil 4 on a substrate 5, and 15 ° C. at 90 ° C. using a convection oven. A substrate having a resin coating film having a thickness of 10 μm on the copper foil was prepared by heating for a minute. Thereafter, the resin coating film was cured by heating at 170 ° C. for 2 hours using a convection oven to obtain a cured film. This base material was put into a migration evaluation system (“AEI, EHS-221MD” manufactured by Tabai Espec Co., Ltd.) and 200 hours under conditions of a temperature of 130 ° C., a humidity of 85%, a pressure of 2.2 atmospheres, and an applied voltage of 10 V. Processed. Next, the resistance value (Ω) of the test substrate was measured to confirm the insulation.

(6) Chemical resistance (solvent resistance)
The photosensitive resin composition was applied to a SUS substrate and heated at 90 ° C. for 15 minutes using a convection oven to obtain a uniform resin film having a thickness of 30 μm. Thereafter, this coating film was exposed using a high-pressure mercury lamp so that the exposure amount at a wavelength of 350 nm was 10,000 J / m ² . Subsequently, it heated at 170 degreeC for 2 hours using the convection-type oven, and obtained the cured film. The obtained cured film was immersed in various chemicals (alkali, organic solvent) to confirm the resistance of the film. At this time, the alkali resistance was immersed in a 10% aqueous sodium hydroxide solution (40 ° C.) for 30 minutes, and the organic solvent resistance was immersed in acetone (30 ° C.) for 30 minutes.
○: No change △; Part of the film surface is whitened. ×: Peeling or film surface roughness is observed.

  According to Table 2, when the negative photosensitive resin compositions of Examples 1 to 16 were used, adhesion, electroless gold plating resistance, resolution, thermal shock, electrical insulation, and solvent resistance It was found that a cured film having excellent properties can be obtained.

  DESCRIPTION OF SYMBOLS 1; Copper foil, 2; Board | substrate, 3; Base material for thermal shock property evaluation, 4; Copper foil, 5; Board | substrate, 6; Base material for insulation evaluation.

Claims (5)

(A) a polymer having a phenolic hydroxyl group;
(B) a compound having two or more alkyl etherified amino groups in the molecule;
(C) a cyclic ether structure-containing compound;
(D) a photosensitive acid generator;
(E) a triazine structure-containing novolak resin, a photosensitive resin composition comprising:
The component (A) has neither a cyclic ether structure nor a triazine structure,
The said (C) component does not have a triazine structure, The photosensitive resin composition characterized by the above-mentioned.   The photosensitive resin composition of Claim 1 containing the compound by which all or one part of the active methylol group in methylolation melamine was alkyletherified as said (B) component.   The photosensitive resin composition of Claim 1 or 2 containing a novolak resin as said (A) component.   Furthermore, the photosensitive resin composition of any one of Claims 1 thru | or 3 containing the (F) crosslinked fine particle.   A cured product obtained by curing the photosensitive resin composition according to any one of claims 1 to 4.

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