JP5424984B2 - Manufacturing method of semiconductor module - Google Patents

Description

  The present invention is a semiconductor module for producing a semiconductor module in which a semiconductor element is mounted on an upper surface side and heat generated by the semiconductor element is transmitted, and a semiconductor module in which a heat sink is bonded to the lower surface side of the heat spreader via an insulating sheet. It relates to a manufacturing method.

2. Description of the Related Art Conventionally, a semiconductor module packaged by molding a semiconductor element with a resin has been widely used. In the semiconductor module, the junction temperature is usually constant because the semiconductor element generates heat when energized. Various heat dissipating means are provided to prevent the above-described rise.
As such means, there is generally known a method in which a member called a heat spreader is provided to quickly take away heat generated from a semiconductor element, and the semiconductor element is mounted on the upper surface of the member and arranged in a module. Yes.
The heat spreader usually employs a member such as a metal block because quick heat diffusibility and sufficient heat capacity are required.
However, as the temperature of the heat spreader rises, the speed at which heat is taken from the semiconductor element is reduced, which may increase the temperature of the semiconductor element.
For this reason, in a conventional semiconductor module or the like, a member called a heat sink that has a surface exposed to the outer surface of the semiconductor module and discharges internal heat from the exposed surface to the outside of the module is a lower surface of the heat spreader. It is provided on the side.
Since this heat sink needs to secure a wide heat dissipation area, it is usually formed of a metal plate larger than the heat spreader, and in many cases, it is formed of a metal plate having a size covering the entire lower surface of the semiconductor module. Yes.

In order to improve the heat dissipation in such a semiconductor module, it is advantageous to reduce the thermal resistance value between the heat spreader and the heat sink. On the other hand, the heat spreader and the heat sink are insulated for safety. It is required to ensure sex.
For this reason, an insulating sheet using a thermosetting resin composition in which inorganic particles (inorganic filler) are blended to improve thermal conductivity is interposed between the heat spreader and the heat sink, The heat spreader and the heat sink are bonded with the insulating sheet.

For example, Patent Document 1 discloses a semiconductor module in which the lower surface of the metal layer is exposed using an insulating sheet with a metal layer including an insulating resin layer made of a thermosetting resin composition such as an epoxy resin and a metal layer. A manufacturing method is described, in which the insulating sheet with a metal layer is brought into contact with the lower surface of a heat spreader in a heated state to thermally bond the insulating resin layer to the heat spreader.
In addition, since the metal layer of this patent document 1 is formed with metal foils, such as copper foil, and heat capacity is not fully ensured, the function as a heat sink is not enough, and this kind of semiconductor module has the said metal layer. A heat radiator such as a heat radiating fin is separately attached to the surface (lower surface) of the material via heat radiating grease.

  However, since the heat dissipation grease has a lower thermal conductivity than a metal or the like, a layer having a high thermal resistance is formed between the metal sheet layer and the radiator. In such a semiconductor module, it is difficult to ensure sufficient heat dissipation.

JP 2004-165281 A

In order to solve the above problems, for example, a simple insulating sheet composed only of a thermosetting resin composition that is not provided with a metal layer or the like is used, and one surface side thereof is thermally bonded to a heat spreader and the other surface. It can be considered that a semiconductor module is produced by thermally bonding the side to a heat sink having a sufficient heat capacity so that the semiconductor module exhibits excellent heat dissipation.
However, since the insulating sheet is highly filled with an inorganic filler in order to exhibit excellent thermal conductivity and is easily broken, it is generally difficult to use it alone without providing a metal layer or the like.
Therefore, when the front and back of the insulating sheet are thermally bonded to the heat sink and the heat spreader, it is difficult to thermally bond them simultaneously, and either the heat sink or the heat spreader is supported with the insulating sheet supported on a substrate such as a separator film. In order to ensure insulation reliability, it is preferable to employ a method in which the separator film is peeled off and thermally bonded to the other after bonding.

When an insulating sheet is interposed between the heat spreader and the heat sink, it is preferable that the heat sink is covered with the insulating sheet over a wider area than the lower surface of the heat spreader because of the creepage distance.
For this reason, if the insulating sheet is first bonded to the heat spreader, the insulating sheet protrudes from the heat spreader, and careful handling is required to prevent cracking. It is preferable to make it.
Here, in order to reduce the thermal resistance at the bonding interface between the heat sink and the insulating sheet, for example, by adopting a high temperature condition, the thermal curing of the insulating sheet proceeds when a stronger thermal bonding is performed. Therefore, there is a possibility that the adhesive force between the heat spreader and the heat spreader to be bonded thereafter is lowered.
That is, it is difficult to form a good adhesion state on both the heat spreader and the heat sink, and it is difficult to impart excellent heat dissipation.
This invention is made | formed in view of such a problem, and makes it the subject to provide the manufacturing method of the semiconductor module which can produce the semiconductor module excellent in heat dissipation.

  In order to solve the above problems, the present invention provides a heat sink for dissipating the heat to the outside of the module via an insulating sheet on the lower surface side of a heat spreader on which a semiconductor element is mounted on the upper surface side and heat generated by the semiconductor element is transmitted. In order to fabricate a semiconductor module to which is bonded, an insulating sheet formed of a thermosetting resin composition is used, and the heat spreader is thermally bonded to one surface side of the insulating sheet in an uncured state and the other surface side. A method of manufacturing a semiconductor module in which the heat sink is thermally bonded to the insulating sheet, and the thermally bonded insulating sheet is thermally cured, wherein the one surface side and the other surface side are different as the insulating sheet. An insulating sheet formed of a material and having the other surface side formed of a thermosetting resin composition having a higher reaction rate of the thermosetting reaction than the one surface side Used, to provide a method for manufacturing a semiconductor module, characterized in that to thermally bonding the one surface side to the heat spreader after the other surface of the insulating sheet was thermally bonded to the heat sink.

In the method for manufacturing a semiconductor module of the present invention, the other surface side that is thermally bonded to the heat sink is formed with a thermosetting resin composition that has a faster reaction rate than the one surface side of the insulating sheet that is thermally bonded to the heat spreader.
Therefore, after the thermal bonding between the insulating sheet and the heat sink, it is possible to reduce the possibility of causing an excessive thermosetting reaction on the side to be thermally bonded to the heat spreader and causing a problem in the adhesion with the heat spreader.
That is, according to the present invention, it is possible to provide a method for manufacturing a semiconductor module capable of producing a semiconductor module having excellent heat dissipation.

Sectional drawing which shows the structure of a semiconductor module. Sectional drawing of the insulating sheet used for the manufacturing method of the semiconductor module which concerns on one Embodiment. Sectional drawing of the semiconductor module obtained by the method of Comparative Examples 1 and 2. FIG.

The preferred embodiments of the present invention will be described below.
First, an example is given and demonstrated about the semiconductor module manufactured by the manufacturing method of this invention.
FIG. 1 is a view showing a cross section of the semiconductor module of the present embodiment. As shown in FIG. 1, the semiconductor module 1 of the present embodiment has a flat rectangular parallelepiped shape. A semiconductor element 50 is accommodated in a state of being molded with a mold resin 90 inside a rectangular tubular casing 80 that constitutes a side wall portion of the semiconductor module 1.
The semiconductor element 50 is bonded to the upper surface of a heat spreader 30 made of a rectangular metal block having a flat rectangular parallelepiped shape by solder 40 so as to remove the heat generated by the semiconductor element 50, and the terminal portion of the lead frame 70 is bonded to the upper surface. The other end portion of the bonding wire 60 having one end portion bonded thereto is bonded.
In addition, another lead frame 70 is joined to the heat spreader 30, and the heat spreader 30 not only plays a role of depriving the heat of the semiconductor element 50 during the operation of the semiconductor module 1, but also has electricity. It also functions as a flowing electric circuit.

The semiconductor module 1 according to the present embodiment is provided with a heat sink 20 made of a metal plate for removing the heat of the semiconductor element 50 transmitted to the heat spreader 30 from the semiconductor module 1. The one surface side is provided in a state of being exposed on the lower surface of the semiconductor module 1.
The heat sink 20 is exposed over substantially the entire lower surface of the semiconductor module 1, and the exposed exposed surface 21 functions as a heat radiating surface for radiating heat from the semiconductor module 1 to the outside of the system. .

The heat sink 20 has a surface opposite to the exposed surface 21 bonded to the lower surface of the heat spreader 30 through an insulating sheet 10.
This insulating sheet 10 is formed of a thermosetting resin composition containing an inorganic filler, and in this embodiment, two layers are laminated in the thickness direction as shown in FIG. 2 which is a sectional view thereof. The structure is formed, and the two layers are composed of different thermosetting resin compositions. Note that although details are not shown in FIG. 1, in this embodiment, the insulating sheet 10 is on one side thereof. Layer 11 (hereinafter also referred to as “first layer 11”) is thermally bonded to the heat spreader 30, and the layer 12 (hereinafter also referred to as “second layer 12”) forming the other side is referred to as the above. It is used by thermally bonding to the heat sink 20.
That is, in the semiconductor module 1 according to the present embodiment, the heat generated by the semiconductor element 50 can be quickly transferred from the heat spreader 30 to the heat sink 20 through the insulating sheet 10 and released from the exposed surface 21 to the outside of the system. Is formed.
In addition, the semiconductor module 1 according to the present embodiment is configured such that the heat spreader 30 and the heat sink 20 are insulated from each other on the exposed surface 21 when the heat spreader 30 is energized because the insulating sheet 10 is insulated. It is formed so that there is no electric shock even if touched.

The insulating layer sheet 10 does not cover the entire top surface of the heat sink 20, but is formed slightly smaller than the heat sink 20.
The heat spreader 30 is formed to be smaller than the insulating sheet 10, and the lower surface thereof, that is, the adhesive surface with the insulating sheet 10 is formed to be smaller than the insulating sheet 10.
Therefore, the insulating sheet 10 is bonded to the upper surface of the heat sink 20 in a state of extending outward from the bonding surface of the heat spreader 30, and from the heat spreader 30 by the length that the insulating sheet 10 extends. A creepage distance to the heat sink 20 is ensured and insulation is ensured.

In this semiconductor module 1, the higher the thermal conductivity of the resin composition forming the insulating sheet 10, the better the thermal conductivity from the heat spreader 30 to the heat sink 20.
Further, the thinner the insulating sheet 10 is, the better the heat conductivity from the heat spreader 30 to the heat sink 20 is.
Furthermore, the contact thermal resistance at the interface can be reduced by the better adhesion on the adhesive surface A1 between the heat spreader 30 and the insulating sheet 10 and the adhesive surface A2 between the insulating sheet 10 and the heat sink 20, and the heat spreader 30 The heat conductivity to the heat sink 20 is improved.

As the resin composition for forming the first layer 11 and the second layer 12, a thermosetting resin composition containing an inorganic filler at a high content is usually used.
As the base polymer of the thermosetting resin composition, an epoxy resin is used because it has high insulation reliability and excellent heat resistance, and also exhibits excellent adhesion to metal bodies such as the heat sink 20 and the heat spreader 30. Is preferred.
Moreover, a room temperature solid epoxy resin is preferred.
This room temperature solid epoxy is preferable because when the room temperature liquid epoxy resin is mainly used, when the insulating layer 10 is heated to adhere to the heat sink 20 or the heat spreader 30, the viscosity of the epoxy resin decreases. This is because there is a possibility that the thickness after bonding becomes thin and the insulating property is lowered.

On the other hand, if the viscosity does not decrease to some extent when adhering to the adherend (heat sink 20, heat spreader 30), a gap or the like is likely to occur between the adherend and the adhesive surfaces A1 and A2, and from the heat spreader 30 side to the heat sink 20 side. There is also a risk of reducing the thermal conductivity to.
The epoxy resin has an epoxy equivalent of 450 to 2000 g / eq and is solid bisphenol at room temperature in that the resin composition for forming the insulating sheet 10 is imparted with an appropriate flowability to suppress these problems more reliably. A type epoxy resin and a novolac type epoxy resin having a softening point between 87 ° C. and 93 ° C. with a polyfunctional room temperature solid having an epoxy equivalent of 160 to 220 g / eq (bisphenol A type epoxy resin / novolak type epoxy resin) = It is preferable to use what is mixed by the mass ratio used as 40/60-60/40.
In addition, this epoxy equivalent can be calculated | required by JISK7236.

Thus, when an epoxy resin is contained in a resin composition as a polymer component, the hardening | curing agent and hardening accelerator of an epoxy resin are normally contained in a resin composition.
The curing agent is not particularly limited, and examples thereof include amine curing agents such as diaminodiphenyl sulfone, dicyandiamide, diaminodiphenylmethane, and triethylenetetramine, phenol novolac resins, aralkyl type phenol resins, and dicyclopentadiene-modified phenols. Resin, phenolic curing agents such as naphthalene type phenolic resin and bisphenolic phenolic resin, acid anhydrides and the like can be used.
Among these, phenol novolac resin and diaminodiphenyl sulfone are preferable in that it is easy to ensure reliability in electrical characteristics.
The curing accelerator is not particularly limited, but amine-based curing accelerators such as imidazoles, triphenyl phosphate (TPP), and boron trifluoride monoethylamine are preferable in terms of storage stability.

Boron nitride particles can be suitably employed for the inorganic filler in that it has excellent thermal conductivity.
Moreover, it is preferable to use particles (aggregated particles) having a shape in which a plurality of plate-like primary particles of boron nitride are aggregated with a sintered material or the like.
As the aggregated particles, aggregated particles (granular particles) formed in an overall granular state or aggregated particles (aggregated state) exhibiting an aggregated state aggregated to such an extent that the scaly structure of the primary particles of boron nitride can be distinguished. Particles) and the like.

In addition, although it depends on the thickness of the insulating sheet 10 to be formed, etc., the thermosetting resin composition can usually contain aggregated particles having an average particle diameter of 10 to 100 μm.
The “average particle diameter” can be determined by, for example, measuring the D50 value by performing particle size distribution measurement using a laser diffraction method.

  The inorganic filler may also contain inorganic particles formed of a substance other than boron nitride (for example, aluminum nitride, silicon nitride, gallium nitride, aluminum oxide, silicon carbide, silicon dioxide, diamond, etc.). .

  In addition, the content of the inorganic filler in the thermosetting resin composition for forming the insulating sheet 10 is preferably 50% by volume or more in terms of imparting excellent thermal conductivity to the insulating sheet 10, More preferably, it is 55 volume% or more.

  Further, although not described in detail here, the thermosetting resin composition for forming the insulating sheet 10 includes a polymer other than the epoxy resin component as described above, a dispersant, a tackifier, an anti-aging agent, an oxidation agent, and the like. Those generally used as rubber and plastic compounding chemicals such as inhibitors, processing aids, stabilizers, antifoaming agents, flame retardants, thickeners, pigments and the like can be added as appropriate.

  Here, the thermosetting resin composition constituting the first layer 11 thermally bonded to the heat spreader 30 is the thermosetting resin composition constituting the second layer 12 thermally bonded to the heat sink 20. It is an important factor for reducing the thermal resistance from the heat spreader 30 to the heat sink 20 that the reactivity in the thermosetting reaction is lower than that of the product (the reaction speed of the second layer 12 is faster than that of the first layer 11). It becomes.

Examples of a specific method for imparting such a difference in reactivity to the insulating sheet 10 include a method of changing the type of epoxy resin, the type of curing agent, and the type and amount of curing accelerator.
Generally, polyfunctional epoxy resins such as cresol novolac type have a faster curing reaction speed than bisphenol type epoxy resin, so blend bisphenol type epoxy resin and cresol novolac type epoxy resin as described above. In the case of using the first layer 11 and the second layer 12, it is possible to make a difference in the curing reaction rate by changing the blend ratio.
However, in terms of ease of blending adjustment, the epoxy resin blending itself is not changed between the first layer 11 and the second layer 12, and the reaction rate is adjusted by the amount of the curing agent or curing accelerator. It is preferable.

As will be described later, the thermal bonding between the second layer 12 and the heat sink 20 can be performed by a relatively simple method such as hot pressing, but in the thermal bonding between the first layer 11 and the heat spreader 30. When a high pressure is applied, stress is concentrated on the edge portion 30e on the lower surface of the heat spreader, which may cause a crack in the insulating sheet 10.
Further, depending on the process, it may be necessary to thermally bond the heat spreader 30 to which the semiconductor element 50 has already been soldered to the first layer 11, which may make it difficult to apply pressure.
In such a case, the first layer 11 is bonded to the heat spreader 30 by positively adopting a liquid epoxy resin at room temperature or a flexible epoxy resin modified with rubber as a material for forming the first layer 11. It is preferable to improve the property.

  In addition, as a confirmation method of hardening reaction rate, it can confirm by the measurement of the viscosity change on the fixed temperature conditions using a dynamic viscoelasticity measuring apparatus, for example, comprises the 1st layer 11 and the 2nd layer 12. According to the “torsion mode” at a frequency of 1 Hz under heating conditions (for example, any temperature within the range of 100 to 200 ° C.) on a sheet-like sample having a thickness of 100 to 200 μm prepared with the thermosetting resin composition Viscosity measurement is performed, and the curing reaction rate can be determined by the curing time from the time when the viscosity is the lowest to the time when the viscosity does not change.

The insulating sheet 10 is used to thermally bond the first layer 11 to the heat spreader 30 after the second layer 12 is thermally bonded to the heat sink 20.
Therefore, the first layer 11 is configured to give excellent adhesion to both the insulating sheet 10 and the heat sink 20 and the insulating sheet 10 and the heat spreader 30 and to reduce the thermal resistance from the heat spreader 30 to the heat sink 20. For the difference in curing reaction rate between the thermosetting resin composition that forms the second layer 12 and the thermosetting resin composition that forms the first layer 11, the curing time of the thermosetting resin composition that forms the first layer 11 It is preferable to set so that the curing time of the thermosetting resin composition constituting the second layer 12 is 5 minutes or less (usually 1 minute or more) at a temperature of 10 to 20 minutes.

The insulating sheet 10 is usually formed in a state having a volume resistivity of 1 × 10 ¹³ Ω · cm or more and a thickness of 50 to 200 μm in a general semiconductor module.
In that case, the ratio of the thickness of the first layer 11 and the second layer 12 is not particularly limited, and is usually any ratio in the range of about 1: 9 to 9: 1.
In the present embodiment, the insulating sheet 10 having a two-layer structure is illustrated, but the insulating sheet 10 has a three-layer structure or more having a new layer between the first layer 11 and the second layer 12. However, it can be employed in the semiconductor module manufacturing method of the present embodiment.

  Note that the metal plate for forming the heat sink 20 and the metal square block for forming the heat spreader 30 are not particularly limited, and those conventionally used for the same kind of purpose can be used. Aluminum, copper or the like can be used.

Next, a method for manufacturing the semiconductor module 1 as described above will be described.
In the method for manufacturing a semiconductor module according to this embodiment,
a) Insulating sheet manufacturing step of manufacturing an insulating sheet having the first layer 11 and the second layer 12 b) First thermal bonding step of thermally bonding the second layer 12 to a predetermined position of the heat sink 20 c) A second thermal bonding step is further performed in which the heat spreader 30 is thermally bonded to the insulating sheet 10 bonded to the heat sink 20 in the first thermal bonding step.

Each of these steps can be performed as follows, for example.
(A: Insulating sheet manufacturing process)
In the insulating sheet manufacturing step according to the present embodiment, first, a thermosetting resin composition for forming the first layer 11 is prepared, and a coating solution is prepared using an appropriate solvent.
For example, in the case of using an epoxy resin as a base, a coating liquid (hereinafter also referred to as “varnish”) in which a compounding material such as the epoxy resin or an inorganic filler is dispersed in a soluble organic solvent is prepared. .
A base material roll, which is a base material such as a metal foil or a resin film, wound in a roll is set in a coating machine, and the varnish is supplied to the coating machine to continuously coat the base material. A film is formed and introduced into a drying furnace to form the first layer 11 on the substrate so as to be in an uncured and uncured dry state called a so-called B stage state.
Next, a thermosetting resin composition for forming the second layer 12 is prepared, and a varnish is produced in the same manner as the first layer 11.
And the roll in which the 1st layer 11 was formed is set anew in a coating machine, and the varnish for forming said 2nd layer 12 is supplied to the said coating machine, and coating drying is carried out similarly to the 1st layer 11. To form the insulating sheet 10 supported on the substrate.

Alternatively, instead of the above method, the first layer 11 is formed on the base material as described above, and the second layer 12 is formed on the other base material in the same manner as the first layer 11, and then A method of manufacturing the insulating sheet 10 by directly bonding the first layer 11 and the second layer 12 may be employed.
In this case, as a method of bonding the first layer 11 and the second layer 12, for example, heating and pressurizing such as a method of bonding by hot pressing or a method of bonding by passing between two heating rollers. The method of integrating by is mentioned.

The insulating sheet 10 can be processed into a predetermined size, for example, by punching the whole base material, and can be used for the first thermal bonding step.

(B: First heat bonding step)
In the insulating sheet manufacturing step, the first layer 11 is covered with the base material, and the insulating sheet is manufactured in the form of a punched sheet or the like with the second layer 12 exposed.
In the first heat bonding step, the exposed second layer 12 is brought into contact with the surface of a metal plate or the like constituting the heat sink 20, and heat bonding is performed by hot pressing or the like.
Thereafter, the base material is peeled off and removed from the insulating sheet in which the surface of the second layer 12 is thermally bonded to the heat sink 20 to expose the first layer 11 and supplied to the subsequent second thermal bonding step.

(C: Second heat bonding step)
In the second thermal bonding step, the lower surface of the heat spreader 30 is further thermally bonded to the insulating sheet 10 thermally bonded to the heat sink 20 in the first thermal bonding step.
This thermal bonding method can be carried out using an apparatus capable of applying pressure under heating conditions such as a general hot press or autoclave.
If the semiconductor module 1 to which the resin mold is applied is manufactured as illustrated in FIG. 1, the heat and pressure in the resin mold are used for thermal bonding between the insulating sheet 10 and the heat spreader 30. Is preferred.

For example, the heat sink 20 is disposed in the casting mold with the surface to which the insulating sheet is bonded facing upward, and the heat spreader 30 to which the semiconductor element 50 is soldered is placed in the region where the insulating sheet is bonded to the heat sink 20. A resin composition for molding that is placed on a substantially central portion, is covered with a casing 80, is thermally melted inside the casing 80, and the heat spreader 30 on which the semiconductor element 50 is mounted is molded with the resin composition. In addition, a method in which the first layer 11 of the insulating sheet 10 and the lower surface of the heat spreader 30 are thermally bonded can be employed.
By adopting such a method, it is possible to simplify the process in manufacturing the semiconductor module and reduce the amount of energy necessary for manufacturing the semiconductor module.

In the method for manufacturing a semiconductor module according to the present embodiment, an insulating sheet formed of a thermosetting resin composition having a surface to be bonded to the heat spreader 30 and a surface to be bonded to the heat sink 20 is used to bond to the heat spreader 30. An insulating sheet is used in which the other surface side to be bonded to the heat sink 20 is made of a thermosetting resin composition having a faster reaction rate of the thermosetting reaction than the one surface side.
Accordingly, in the first thermal bonding step, the thermosetting resin composition constituting the first layer 11 still has the curing reactivity after the sufficiently strong thermal bonding with the heat sink 20 is performed. In addition, it is possible to suppress the risk of insufficient adhesive force due to excessive progress of the curing reaction in the thermal bonding in the second thermal bonding step.

For example, in the first layer 11 of the insulating sheet 10, if the curing reaction proceeds to a certain extent before heat bonding with the heat spreader 30, tackiness is exhibited without softening the surface during heat bonding with the heat spreader 30. Without having a risk of reducing the adhesion at the interface A1 between the insulating sheet 10 and the heat spreader 30.
On the other hand, when the temperature in the thermal bonding between the insulating sheet 10 and the heat sink 20 is lowered so as to leave sufficient reactivity in the thermosetting resin composition constituting the first layer 11, this time, May reduce the adhesion at the interface A2 between the heat sink 20 and the insulating sheet 10.

When this occurs, the thermal resistance at this interface increases, and the thermal resistance until the heat generated by the semiconductor element 50 is released outside the system through the heat sink 20 is not sufficiently reduced, resulting in poor heat dissipation. There is a risk of becoming something.
However, in this embodiment, since a thermosetting resin composition having a slow reaction rate is used on the first layer 11 side, sufficient adhesion between the heat sink 20 and the heat spreader 30 is ensured. Can be easily implemented.
That is, in this embodiment, a semiconductor module having excellent heat dissipation can be easily produced.

  If the insulating sheet 10 is uncured and does not completely cure even after such a strong bond is formed between the heat sink 20 and the heat spreader 30, it is necessary if necessary. Then, the semiconductor module may be accommodated in a hot air circulation oven for a predetermined time to perform a post cure of the insulating sheet 10.

In the present embodiment, the semiconductor module manufacturing method of the present invention and the semiconductor module manufactured by the manufacturing method are exemplified as described above. However, the present invention relates to the semiconductor module and the manufacturing method thereof. It is not limited to the illustration.
For example, in the present embodiment, a plate-shaped heat sink is illustrated, but the present invention also applies to a case where a heat sink in which fins and pins are erected on the lower surface (exposed surface) side to improve air cooling performance is used. Is within the intended range.

(Manufacturing method 1: Comparative example 1)
A thermosetting resin composition (epoxy resin composition) containing 50% by volume of an inorganic filler (boron nitride) is dispersed in an organic solvent to form a varnish, which is applied to a copper foil having a thickness of 105 μm and dried to form a metal. A layered insulating sheet (insulating layer thickness 200 μm) was prepared.
By temporarily adhering the insulating sheet with a metal layer to the lower surface of the heat spreader on which the semiconductor element is mounted on the upper surface side, setting the casing, and injection-molding the mold resin melted in the casing, the heat and pressure Then, the adhesion between the insulating sheet with metal layer and the heat spreader was performed.
Thereafter, this is heated to perform post-cure of the epoxy resin composition to produce a semiconductor module having a structure as shown in FIG. 3 (a), and heat radiation grease is applied to the surface of the copper foil exposed on the lower surface. A heat sink was attached separately.
At this time, the thermal resistance value from the “semiconductor element” to the “heat sink” was measured and found to be 1.0 ° C./W.
Moreover, when the withstand voltage test between a lead frame and a heat sink was implemented, the dielectric breakdown voltage was 10 kV.

(Production method 2: Comparative example 2)
A heat spreader that is not temporarily bonded to an insulating sheet with a metal layer is set in the casing and the molding resin is injection-molded in such a manner that the lower surface of the heat spreader is exposed, and then the same metal as in Comparative Example 1 is formed on the exposed surface of the heat spreader. The insulating sheet with a layer was heated and pressed to be thermally bonded.
Thereafter, post-curing was conducted in the same manner as in Production Example 1 to produce a semiconductor module as shown in FIG.
When heat dissipation grease was applied to the copper foil exposed on the lower surface of the semiconductor module and a separate heat sink was attached, the thermal resistance was measured in the same manner as in Comparative Example 1, and the dielectric breakdown voltage was measured. And values of 10 kV were obtained.

(Manufacturing method 3: Comparative example 3)
Using a varnish containing the same thermosetting resin composition as used in the production of the insulating sheet with a metal layer, the insulating sheet is made to have a thickness equivalent to the insulating layer thickness of the insulating sheet with the metal layer. Formed.
The insulating sheet was thermally bonded to a heat sink separately used in the manufacturing method 1 within a relatively short time so that the insulating sheet would not be completely cured, and a heat spreader on which a semiconductor element was mounted was placed thereon. The bottom surface of the heat spreader was thermally bonded to the insulating sheet by heating and pressing with the mold resin in the same manner as in the manufacturing method 1 described above.
Thereafter, post-curing was performed in the same manner as described above to produce a semiconductor module as shown in FIG. Is different).
When the thermal resistance of the obtained semiconductor module was measured in the same manner as in Comparative Example 1 and the dielectric breakdown voltage was measured, values of 3.0 ° C./W and 2 kV were obtained, respectively.
About this result, when the semiconductor module obtained by the manufacturing method of Comparative Example 3 was observed, it was found that peeling occurred at a part of the interface between the heat sink and the insulating sheet, and an air layer was formed. .

(Manufacturing method 4: Example 1)
The substrate was coated with the same varnish as the insulating sheet of Production Example 3 (Comparative Example 3), and then dried to form an insulating layer (first layer) of about 100 μm on the substrate.
The varnish is formed by varnishing the thermosetting resin composition in which the amount of the curing agent and the curing accelerator is increased so that the curing reaction time in the temperature condition where the curing reaction time of the insulating layer is about 1 hour is about 15 minutes. Was coated on the insulating layer (first layer) and dried to form an insulating layer (second layer) of about 100 μm (total of about 200 μm).
After the second layer of this insulating sheet was hot-pressed and adhered to a heat sink, the substrate was removed.
Thereafter, a semiconductor module having a structure as shown in FIG. 1 was produced in the same manner as in Production Example 3 for heat bonding between the first layer side and the heat spreader.
For the semiconductor module obtained in Example 1, the thermal resistance was measured and the dielectric breakdown voltage was measured in the same manner as before, and values of 0.5 ° C./W and 10 kV were obtained, respectively.
This also shows that according to the present invention, a semiconductor module excellent in heat dissipation can be obtained.

1: Semiconductor module, 10: Insulating sheet, 11: First layer, 12: Second layer, 20: Heat sink, 30: Heat spreader, 40: Solder, 50: Semiconductor element, 60: Bonding wire, 70: Lead frame, 80 : Casing, 90: Mold resin

Claims (2)

To manufacture a semiconductor module in which a semiconductor element is mounted on the upper surface side, and a heat sink for dissipating the heat to the outside of the module is bonded to the lower surface side of the heat spreader to which heat generated by the semiconductor element is transmitted via an insulating sheet And using an insulating sheet formed of a thermosetting resin composition, the heat spreader is thermally bonded to one surface side of the insulating sheet in an uncured state, and the heat sink is thermally bonded to the other surface side. A method for manufacturing a semiconductor module, wherein the insulating sheet is thermally cured,
As the insulating sheet, the one surface side and the other surface side are formed of different thermosetting resin compositions, and the other surface is a thermosetting resin composition having a faster reaction rate of the thermosetting reaction than the one surface side. A method of manufacturing a semiconductor module, comprising: using an insulating sheet having a surface side, and thermally bonding the other surface side of the insulating sheet to the heat sink and then thermally bonding the one surface side to the heat spreader.   The method of manufacturing a semiconductor module according to claim 1, further comprising a step of molding a heat spreader on which the semiconductor element is mounted with a heat-melted resin composition, and performing the thermal bonding between the heat spreader and the insulating sheet during the molding.

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