JP5337760B2 - Metal surface treatment aqueous solution and method for preventing discoloration of metal surface - Google Patents
Metal surface treatment aqueous solution and method for preventing discoloration of metal surface Download PDFInfo
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- JP5337760B2 JP5337760B2 JP2010118404A JP2010118404A JP5337760B2 JP 5337760 B2 JP5337760 B2 JP 5337760B2 JP 2010118404 A JP2010118404 A JP 2010118404A JP 2010118404 A JP2010118404 A JP 2010118404A JP 5337760 B2 JP5337760 B2 JP 5337760B2
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- 239000007864 aqueous solution Substances 0.000 title claims description 46
- 238000004381 surface treatment Methods 0.000 title claims description 43
- 238000000034 method Methods 0.000 title claims description 23
- 238000002845 discoloration Methods 0.000 title description 19
- 229910052751 metal Inorganic materials 0.000 title description 8
- 239000002184 metal Substances 0.000 title description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 78
- 238000007747 plating Methods 0.000 claims description 74
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 28
- 150000003839 salts Chemical class 0.000 claims description 22
- 239000004471 Glycine Substances 0.000 claims description 14
- 229920000137 polyphosphoric acid Polymers 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 4
- 230000003213 activating effect Effects 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 28
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910001868 water Inorganic materials 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 150000003863 ammonium salts Chemical class 0.000 description 9
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 9
- 239000011976 maleic acid Substances 0.000 description 9
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 9
- 229910001128 Sn alloy Inorganic materials 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 8
- ODKSFYDXXFIFQN-BYPYZUCNSA-N L-arginine Chemical compound OC(=O)[C@@H](N)CCCN=C(N)N ODKSFYDXXFIFQN-BYPYZUCNSA-N 0.000 description 7
- 229930064664 L-arginine Natural products 0.000 description 7
- 235000014852 L-arginine Nutrition 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 235000019830 sodium polyphosphate Nutrition 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 239000004254 Ammonium phosphate Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 3
- 235000019289 ammonium phosphates Nutrition 0.000 description 3
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002689 maleic acids Chemical class 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- -1 phosphonic acid compound Chemical class 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- AICMYQIGFPHNCY-UHFFFAOYSA-J methanesulfonate;tin(4+) Chemical compound [Sn+4].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O AICMYQIGFPHNCY-UHFFFAOYSA-J 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 239000006012 monoammonium phosphate Substances 0.000 description 1
- LPUQAYUQRXPFSQ-DFWYDOINSA-M monosodium L-glutamate Chemical compound [Na+].[O-]C(=O)[C@@H](N)CCC(O)=O LPUQAYUQRXPFSQ-DFWYDOINSA-M 0.000 description 1
- 239000004223 monosodium glutamate Substances 0.000 description 1
- 235000013923 monosodium glutamate Nutrition 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229940085991 phosphate ion Drugs 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
本発明は、金属、特に錫めっき皮膜の表面処理液および錫めっき皮膜の表面処理方法に関する。詳しくは、本発明は、錫めっき方法により錫皮膜を形成するにあたり、リフロー処理の前に、錫めっき皮膜の表面に表面処理液を適用する方法およびその処理液に関する。 The present invention relates to a surface treatment solution for a metal, particularly a tin plating film, and a surface treatment method for a tin plating film. Specifically, the present invention relates to a method of applying a surface treatment liquid to the surface of a tin plating film and a treatment liquid thereof before reflow treatment in forming a tin film by a tin plating method.
錫または錫合金めっきは、その接合性、低コスト性、電気特性および半田付け性に優れるため、電気接合を必要とする部品、例えばチップ部品、水晶発振子、コネクタピン、リードフレーム、プリント回路基板などの電子部品において、また、半導体デバイスやプリント基板の製造工程におけるエッチングレジストとして、広く利用されている。 Tin or tin alloy plating is superior in its bondability, low cost, electrical characteristics and solderability, so that it requires components such as chip components, crystal oscillators, connector pins, lead frames, and printed circuit boards. And as an etching resist in the manufacturing process of semiconductor devices and printed circuit boards.
この錫または錫合金皮膜は、そのままでは、時間の経過とともにウィスカと呼ばれるひげ状の金属析出をその表面に形成する。電子部品等の基体表面上に形成された錫または錫合金皮膜の表面にウィスカが発生すると電気的な短絡を起こす可能性がある。このウィスカの発生を防ぐ目的および溶融による錫または錫合金皮膜の表面光沢の形成等の目的で、錫または錫合金皮膜の形成後、高温処理すなわちリフロー処理を施すことが公知である。しかし、リフロー処理はウィスカ発生防止の効果が認めらるが、加熱後の皮膜表面の変色や酸化を起こし易いという問題があった。めっき皮膜表面の変色は皮膜表層の酸化が原因の一つと考えられ、酸化皮膜が厚くなるにつれ、皮膜の変色も進み、また、めっき皮膜の酸化ははんだぬれ性の劣化の原因となる。酸化されやすい金属である錫皮膜のこのような問題に対応するため、従来、錫−鉛合金めっきが用いられていた。鉛は、錫の酸化およびウィスカの成長を抑制する働きをしていた。しかし、近年では、鉛の有毒性が着目され、電子部品への鉛の使用が制限されるようになってきている。そのため鉛フリーの錫または錫合金めっきが求められており、そのめっき皮膜の酸化およびウィスカ対策も必要となってきている。 As it is, this tin or tin alloy film forms whisker-like metal deposits called whiskers on the surface as time passes. When whiskers are generated on the surface of a tin or tin alloy film formed on the surface of a substrate such as an electronic component, an electrical short circuit may occur. For the purpose of preventing the generation of the whisker and forming the surface gloss of the tin or tin alloy film by melting, it is known to perform a high temperature treatment, that is, a reflow treatment after the formation of the tin or tin alloy film. However, although the reflow treatment has an effect of preventing whisker generation, there is a problem that the surface of the film after heating is likely to be discolored or oxidized. The discoloration of the surface of the plating film is considered to be one of the causes of the oxidation of the film surface layer. As the oxide film becomes thicker, the discoloration of the film progresses, and the oxidation of the plating film causes the solder wettability to deteriorate. Conventionally, tin-lead alloy plating has been used to cope with such a problem of a tin film which is a metal that is easily oxidized. Lead served to suppress tin oxidation and whisker growth. However, in recent years, attention has been focused on the toxicity of lead, and the use of lead in electronic parts has been restricted. For this reason, lead-free tin or tin alloy plating is required, and oxidation of the plating film and countermeasures against whiskers are also required.
一方、錫めっき皮膜は、錫−鉛合金めっき皮膜に比べリフロー処理により皮膜表面上にヨリが発生し易いことが知られている。ここで「ヨリ」とは、錫皮膜上に現れる波状の凸部をいい、場合によっては、木目調の模様を形成することもある。この皮膜表面上に発生したヨリは、錫膜厚の不均一性を意味し、場合によっては下地金属(例えばニッケル)が露出することもあり、はんだ付け性を確保することが困難になるなどの問題があるため、めっき皮膜上にヨリが発生することを防止することが求められている。 On the other hand, it is known that a tin plating film is likely to generate a twist on the surface of the film by reflow treatment as compared with a tin-lead alloy plating film. Here, “twist” refers to a wavy convex portion appearing on the tin film, and in some cases, a grain-like pattern may be formed. The twist generated on the surface of the film means non-uniformity of the tin film thickness. In some cases, the base metal (for example, nickel) may be exposed, making it difficult to ensure solderability. Since there is a problem, it is required to prevent twisting from occurring on the plating film.
錫めっき鋼板の表面処理方法として、各種の錫皮膜の表面処理液および処理方法が従来より使用されている。例えば、日本国特許公開昭52−53739号公報は、リン酸またはリン酸と亜リン酸もしくは次亜リン酸との組み合わせを遊離酸として5〜50g/L添加した水溶液を用いて、錫めっき鋼板表面を処理することを開示する。また、この公報においては、処理浴がpH4以下に調整されることが記載されている。この公報は、本発明に用いられる化合物および表面処理液をリフロー処理前に用いることを開示していない。
日本国特許公告昭58−1085号公報は、電気錫メッキ鋼ストリップにリフロー処理を施す前に、その表面に170〜300℃の融点を持ちリフロー時に分解する有機酸またはその塩の水溶液を塗布する、錫メッキ表面の木目模様の発生を防止する方法を開示する。この公報には、当該有機酸またはその塩として、グルコン酸ナトリウム、グルタミン酸モノナトリウム、エチレンジアミンテトラ酢酸(EDTA)ナトリウムなどが記載されている。また、この公報には、リン酸ナトリウムでは錫メッキ表面上の木目模様が消えず、この化合物は不適切であることが記載されている。この公報は、本発明に用いられる化合物の優れた効果、および電子部品への適用について開示していない。
日本国特許公開平7−286285号は、スズメッキ鋼板の表面に使用する、リン酸イオンと有機ホスホン酸化合物とスズイオンを含有し、pHが5.0以下である金属表面化成処理水溶液を開示する。この公報は、有機ホスホン酸化合物を必須成分とした化成水溶液を開示し、本発明の化合物およびその有利な効果を開示していない。
As surface treatment methods for tin-plated steel sheets, various surface treatment liquids and treatment methods for tin coating have been used. For example, Japanese Patent Publication No. 52-53739 discloses a tin-plated steel sheet using an aqueous solution to which 5 to 50 g / L of phosphoric acid or a combination of phosphoric acid and phosphorous acid or hypophosphorous acid is added as a free acid. Disclosed is a surface treatment. In addition, this publication describes that the treatment bath is adjusted to pH 4 or lower. This publication does not disclose the use of the compound and surface treatment liquid used in the present invention before the reflow treatment.
In Japanese Patent Publication No. 58-1085, an electrotin-plated steel strip is coated with an aqueous solution of an organic acid or a salt thereof having a melting point of 170 to 300 ° C. and decomposing during reflow before the reflow treatment. A method for preventing the occurrence of a grain pattern on a tinned surface is disclosed. This publication describes sodium gluconate, monosodium glutamate, sodium ethylenediaminetetraacetate (EDTA) and the like as the organic acid or a salt thereof. In addition, this publication describes that sodium phosphate does not erase the grain pattern on the tin-plated surface, and this compound is inappropriate. This publication does not disclose the excellent effects of the compounds used in the present invention and their application to electronic components.
Japanese Patent Publication No. 7-286285 discloses a metal surface chemical conversion treatment aqueous solution containing a phosphate ion, an organic phosphonic acid compound and a tin ion and having a pH of 5.0 or less, which is used on the surface of a tin-plated steel sheet. This publication discloses a chemical conversion aqueous solution containing an organic phosphonic acid compound as an essential component, and does not disclose the compound of the present invention and its advantageous effects.
本発明は、電子部品に用いられる錫または錫合金めっき皮膜に対しリフロー処理を施した後においても、めっき皮膜にヨリが発生することなく、同時に変色が抑制されており、また、良好なはんだぬれ性を有するメッキ皮膜およびその形成方法を提供することを目的とする。 In the present invention, even after a reflow treatment is applied to a tin or tin alloy plating film used for an electronic component, the plating film is not twisted, and at the same time, discoloration is suppressed, and good solder wetting is achieved. It aims at providing the plating film which has property, and its formation method.
本発明者らは、上記課題を達成するため、めっき皮膜をリフロー処理する前に用いる錫めっき皮膜表面処理水溶液を鋭意研究した結果、リン酸のアンモニウム塩など特定の化合物を添加した水溶液が、類似する構造を有する他の化合物を含む水溶液と比較し選択的有為性を有することを見出し、本発明に到達したものである。本発明の表面処理水溶液は、リフロー処理における加熱後においてもめっき皮膜が変色することなく、めっき皮膜のヨリの発生を防止し、かつ、良好なはんだぬれ性をめっき皮膜に提供することができる。 In order to achieve the above-mentioned problems, the present inventors have intensively studied a tin plating film surface treatment aqueous solution used before reflow treatment of the plating film. As a result, the present invention has been achieved by finding that it has selective potential compared with an aqueous solution containing another compound having a structure. The surface treatment aqueous solution of the present invention can prevent the plating film from being discolored even after heating in the reflow treatment, prevent the plating film from being twisted, and provide good solder wettability to the plating film.
本願発明は、第1の態様として、リン酸のアンモニウム塩を含み、pHが3〜5である、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液;ポリリン酸の塩を含み、pHが2〜10である、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液;マレイン酸の塩を含み、pHが4.5〜8.5である、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液;L−アルギニンを含み、pHが7〜12である、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液;グリシンを含み、pHが4〜7である、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液;またはリン酸のアンモニウム塩とポリリン酸の塩との混合物、リン酸のアンモニウム塩とグリシンとの混合物、またはポリリン酸の塩とグリシンとの混合物を含む、錫めっき皮膜の表面を処理するための錫めっき皮膜表面処理水溶液を提供する。
また、第2の態様として、前記錫めっき皮膜表面処理水溶液により、錫皮膜をその表面に有する基体を処理する、錫めっき皮膜の表面処理方法を提供する。
第3の態様として、錫めっきを施し錫皮膜を基体の表面に形成した後、前記錫めっき皮膜表面処理水溶液により前記錫皮膜の表面を処理する、錫めっき皮膜の表面処理方法を提供する。
第4の態様として、金属に錫めっき皮膜を形成する方法であって、表面上に金属を有する基体を準備する工程、該基体を酸により活性化処理をする工程、該活性化処理基体を錫めっきする工程、錫めっき皮膜を表面処理水溶液により処理する工程、および該錫皮膜のリフロー処理を行なう工程を含む上記方法であって、該表面処理水溶液が、前記錫めっき皮膜表面処理水溶液である方法を提供する。
第5の態様として、錫皮膜を有する電子部品を製造する方法であって、基体に錫めっきする工程と錫皮膜を有する基体をリフロー処理する工程との間に、前記錫めっき皮膜表面処理水溶液により錫めっき皮膜の表面を処理する工程を含む、前記方法を提供する。
The invention of the present application includes, as a first aspect, a tin plating film surface treatment aqueous solution for treating the surface of a tin plating film, which contains an ammonium salt of phosphoric acid and has a pH of 3 to 5; a salt of polyphosphoric acid, A tin plating film surface treatment aqueous solution for treating the surface of the tin plating film having a pH of 2 to 10; a surface of the tin plating film containing a salt of maleic acid and having a pH of 4.5 to 8.5 A tin plating film surface treatment aqueous solution for treatment; a tin plating film surface treatment aqueous solution for treating the surface of a tin plating film containing L-arginine and having a pH of 7 to 12; containing glycine and a pH of 4 to 4 A tin plating film surface treatment aqueous solution for treating the surface of the tin plating film; or a mixture of ammonium phosphate and polyphosphoric acid, a mixture of ammonium phosphate and glycine, Provides a tin plating film surface treatment aqueous solution for processing comprises a mixture of a salt of polyphosphoric acid and glycine, the surface of the tin plating film.
Moreover, the surface treatment method of the tin plating film which treats the base | substrate which has a tin film on the surface with the said tin plating film surface treatment aqueous solution as a 2nd aspect is provided.
As a third aspect, there is provided a method for treating a surface of a tin plating film, wherein the surface of the tin film is treated with the tin plating film surface treatment aqueous solution after tin plating is performed on the surface of the substrate.
As a fourth aspect, there is provided a method of forming a tin plating film on a metal, the step of preparing a substrate having a metal on the surface, the step of activating the substrate with an acid, and the activating substrate being tin A method comprising the steps of plating, treating the tin plating film with a surface treatment aqueous solution, and reflowing the tin film, wherein the surface treatment aqueous solution is the tin plating film surface treatment aqueous solution. I will provide a.
According to a fifth aspect of the present invention, there is provided a method for producing an electronic component having a tin film, wherein the tin plating film surface treatment aqueous solution is used between a step of tin plating on a substrate and a step of reflowing the substrate having a tin film. The method includes the step of treating the surface of the tin plating film.
本明細書を通じて使用される略語は、他に明示されない限り、次の意味を有する。
g=グラム;mg=ミリグラム;℃=摂氏度;V=ボルト;A=アンペア;m=メートル;cm=センチメートル;μm=マイクロメートル;L=リットル;mL=ミリリットル;dm2=平方デシメートル。全ての数値範囲は境界値を含み、さらに任意の順序で組み合わせ可能である。
本明細書を通じて用語「めっき液」および「めっき浴」は、同一の意味を持ち交換可能なものとして使用される。
Abbreviations used throughout this specification have the following meanings unless otherwise indicated.
g = gram; mg = milligram; ° C = degrees Celsius; V = volt; A = ampere; m = meter; cm = centimeter; μm = micrometer; L = liter; mL = milliliter; dm 2 = square decimeter. All numerical ranges include boundary values and can be combined in any order.
Throughout this specification, the terms “plating solution” and “plating bath” have the same meaning and are used interchangeably.
本発明の錫めっき皮膜表面処理水溶液は、リン酸のアンモニウム塩、ポリリン酸の塩、グリシン、L−アルギニンおよびマレイン酸の塩からなる群より選ばれる1種または2種以上の化合物と、水とを含むものである。
本発明において、ポリリン酸の塩またはマレイン酸の塩としては、ナトリウム塩、カリウム塩などのアルカリ金属塩、アンモニウム塩などが挙げられるが、特にこれらに限定されるものではない。
The tin plating film surface treatment aqueous solution of the present invention comprises one or more compounds selected from the group consisting of an ammonium salt of phosphoric acid, a salt of polyphosphoric acid, a salt of glycine, L-arginine and maleic acid, water, Is included.
In the present invention, the salt of polyphosphoric acid or the salt of maleic acid includes, but is not limited to, alkali metal salts such as sodium salt and potassium salt, ammonium salt and the like.
リン酸のアンモニウム塩、ポリリン酸の塩、グリシン、L−アルギニンおよびマレイン酸の塩からなる群より選ばれる1種または2種以上の化合物は、表面処理水溶液中に化合物として5〜100g/Lの範囲で、好ましくは10〜80g/Lの範囲で、より好ましくは30〜60g/Lの範囲で存在する。 One or more compounds selected from the group consisting of ammonium phosphate, polyphosphoric acid salt, glycine, L-arginine and maleic acid salt are 5 to 100 g / L as a compound in the surface treatment aqueous solution. The range is preferably 10 to 80 g / L, and more preferably 30 to 60 g / L.
本発明の錫めっき皮膜表面処理水溶液は、含まれる成分に応じて所定の至適pH範囲を有している。例えば、リン酸のアンモニウム塩を含む場合にはpHが3〜5、好ましくは4より大きく4.5以下の範囲であり;L−アルギニンを用いる場合にはpHが7〜12の範囲であり;マレイン酸の塩の場合には、pHが6〜9の範囲であり;ポリリン酸の塩の場合にはpHが2〜10、好ましくは6〜10の範囲であり;またはグリシンの場合にはpHが4〜7の範囲である。また、リン酸のアンモニウム塩とポリリン酸の塩との混合物を含む場合には、好ましくは水溶液のpHは4〜7、より好ましくは5〜6であり;リン酸のアンモニウム塩とグリシンとの混合物を含む場合には、好ましくは水溶液のpHは4〜6、より好ましくは4〜5であり;またはポリリン酸の塩とグリシンとの混合物を含む場合には、好ましくは水溶液のpHは7〜9、より好ましくは7〜8である。pH値の調整には、公知のpH調整剤が使用可能であり、例えば、pHを下げる場合は、リン酸または酢酸、pHを上げる場合はアンモニア水、水酸化ナトリウムまたは水酸化カリウムなどが挙げられる。好ましい態様においては、含まれる成分を構成する酸またはアルカリで水溶液のpHが調整される。例えば、リン酸のアンモニウム塩の場合には、リン酸またはアンモニアで水溶液のpHを調整するのが好ましい。また、ポリリン酸の塩の場合には、ポリリン酸または塩を構成するアルカリ成分で、水溶液のpHを調整するのが好ましい。さらに、マレイン酸の塩の場合には、塩を構成するアルカリ成分またはマレイン酸で、水溶液のpHを調整するのが好ましい。 The tin plating film surface treatment aqueous solution of the present invention has a predetermined optimum pH range depending on the components contained. For example, when an ammonium salt of phosphoric acid is included, the pH ranges from 3 to 5, preferably from 4 to 4.5; when L-arginine is used, the pH ranges from 7 to 12; In the case of maleic acid salts, the pH is in the range of 6-9; in the case of salts of polyphosphoric acid, the pH is in the range of 2-10, preferably in the range of 6-10; or in the case of glycine, the pH Is in the range of 4-7. When a mixture of an ammonium salt of phosphoric acid and a salt of polyphosphoric acid is included, the pH of the aqueous solution is preferably 4 to 7, more preferably 5 to 6; a mixture of an ammonium salt of phosphoric acid and glycine Preferably, the pH of the aqueous solution is 4-6, more preferably 4-5; or when it contains a mixture of polyphosphate salt and glycine, the pH of the aqueous solution is preferably 7-9. More preferably, it is 7-8. For adjusting the pH value, a known pH adjusting agent can be used. For example, phosphoric acid or acetic acid is used to lower the pH, and aqueous ammonia, sodium hydroxide, or potassium hydroxide is used to increase the pH. . In a preferred embodiment, the pH of the aqueous solution is adjusted with an acid or an alkali constituting the contained component. For example, in the case of an ammonium salt of phosphoric acid, it is preferable to adjust the pH of the aqueous solution with phosphoric acid or ammonia. In the case of a salt of polyphosphoric acid, it is preferable to adjust the pH of the aqueous solution with an alkali component constituting the polyphosphoric acid or the salt. Furthermore, in the case of a salt of maleic acid, it is preferable to adjust the pH of the aqueous solution with an alkali component or maleic acid constituting the salt.
本発明の表面処理水溶液は、一般に、浴温10〜100℃の範囲で、好ましくは室温(25℃)〜70℃の範囲、より好ましくは40〜70℃の範囲で使用される。 The surface treatment aqueous solution of the present invention is generally used in a bath temperature range of 10 to 100 ° C, preferably in a range of room temperature (25 ° C) to 70 ° C, more preferably in a range of 40 to 70 ° C.
本発明においては、必要に応じて、公知の添加剤、例えば、界面活性剤、防菌剤または溶剤等を添加することが可能であるが、これらは本質的には必要とされない。 In the present invention, known additives such as surfactants, antibacterial agents or solvents can be added as necessary, but these are not essentially required.
本発明の錫めっき皮膜表面処理剤は、公知の方法、例えば、浸漬処理またはスプレー処理等の方法により基体に塗布することができる。一般的には、錫皮膜の表面を水洗いし、次いで浸漬法またはスプレー法などにより本発明の錫めっき皮膜表面処理液を塗布する。処理時間は、一般に、5秒から120秒、好ましくは、10秒から60秒である。その後、一般的には、水洗い、純水による洗浄、乾燥の順で処理される。 The tin plating film surface treating agent of the present invention can be applied to a substrate by a known method such as dipping treatment or spray treatment. In general, the surface of the tin film is washed with water, and then the tin plating film surface treatment solution of the present invention is applied by an immersion method or a spray method. The processing time is generally from 5 seconds to 120 seconds, preferably from 10 seconds to 60 seconds. Thereafter, the treatment is generally performed in the order of washing with water, washing with pure water, and drying.
本発明の処理液は、例えば、電子部品の錫めっき皮膜を処理することに好適である。このような電子部品としては、例えば、チップ抵抗やチップコンデンサ等のチップ部品、コネクタピン、バンプ、プリント配線板、リードフレーム等の電子部品が挙げられる。 The treatment liquid of the present invention is suitable for treating a tin plating film of an electronic component, for example. Examples of such electronic components include chip components such as chip resistors and chip capacitors, and electronic components such as connector pins, bumps, printed wiring boards, and lead frames.
後に示す実施例から理解されるように、本発明に用いられる化合物、具体的には、リン酸のアンモニウム塩、ポリリン酸の塩、グリシン、L−アルギニンおよびマレイン酸の塩は、類似する他の化合物と比較して顕著な効果を示す。すなわち、本発明の表面処理液によりリフロー処理を施す前の錫めっき皮膜を表面処理すると、リフロー処理の後においても、皮膜表面の変色やヨリの発生を抑制することができ、良好なはんだぬれ性を有する錫めっき皮膜を形成することができる。 As will be understood from the examples given below, the compounds used in the present invention, specifically the ammonium salts of phosphoric acid, the salts of polyphosphoric acid, the salts of glycine, L-arginine and maleic acid, Shows significant effect compared to compounds. That is, when the tin plating film before the reflow treatment is performed with the surface treatment liquid of the present invention, discoloration and twisting of the film surface can be suppressed even after the reflow treatment, and good solder wettability. It is possible to form a tin plating film having
次に、実施例および比較例をあげて、本発明を具体的に説明する。
以下の実施例および比較例における外観、変色およびヨリは次のようにして評価された。
Next, the present invention will be specifically described with reference to examples and comparative examples.
Appearance, discoloration, and twist in the following examples and comparative examples were evaluated as follows.
(1)外観
表面処理液で処理した錫めっき皮膜を、リフロー処理を施し乾燥した後、錫めっき皮膜表面の光沢およびめっき外観の均一性(外観ムラの確認)を肉眼で観察し、4段階で評価した。
1:光沢・均一:光沢かつ均一の皮膜
2:光沢・不均一:光沢があるが不均一な皮膜
3:無光沢・均一:光沢がなく均一な皮膜
4:無光沢・不均一:光沢がなく、かつ不均一な皮膜
(1) Appearance After the tin plating film treated with the surface treatment solution was reflowed and dried, the gloss of the surface of the tin plating film and the uniformity of the plating appearance (confirmation of uneven appearance) were observed with the naked eye. evaluated.
1: Glossy / uniform: Glossy and uniform film 2: Glossy / non-uniform: Glossy but non-uniform film 3: Matte / uniform: Non-glossy uniform film 4: Matte / non-uniform: No gloss And non-uniform coating
(2)変色
表面処理液で処理した錫めっき皮膜を、リフロー処理を施し乾燥した後、錫めっき皮膜表面の変色を肉眼で観察し、4段階で評価した。
優:変色がない
良:ほとんど変色がない(光沢が鈍くなる)
可:白色、灰色、黄色などの変色がわずかにある
不可:褐色または紫色の変色がある
(2) Discoloration After the tin plating film treated with the surface treatment solution was reflowed and dried, the discoloration of the tin plating film surface was observed with the naked eye and evaluated in four stages.
Excellent: No discoloration Good: Almost no discoloration (gloss is dull)
Possible: Slight discoloration such as white, gray, yellow, etc. Impossible: Brown or purple discoloration
(3)ヨリ
表面処理液で処理した錫めっき皮膜を、リフロー処理を施し乾燥した後、錫めっき皮膜表面のヨリを肉眼で観察し、4段階で評価した。
優:ヨリがない
良:ほとんどヨリがない
可:ヨリがわずかにある
不可:ヨリがある
(3) Twist After the tin plating film treated with the surface treatment liquid was subjected to reflow treatment and dried, the tin plating film surface was observed with the naked eye and evaluated in four stages.
Excellent: No twist Good: Almost no twist Yes: There is a slight twist No: There is a twist
実施例1〜4および比較例0〜38
銅材リードフレームを、浴温60℃のアルカリ電解脱脂剤(クリーナー160:メルテックス社製の薬品)溶液中で電圧4V×1分の陰極電解脱脂を行ない、水洗し、室温の過硫酸塩系化学研磨剤溶液(アクトロナール550)中に30秒間浸漬ことにより化学研磨を行い、水洗し、10%硫酸溶液中で酸洗いし、水洗し、無添加ワット浴を浴温55℃、電流密度3A/dm2×2分の条件でニッケルめっきを施し厚さ1μmのニッケル皮膜を形成し、水洗し、公知のメタンスルホン酸錫めっき浴(ソルダロンTMBT−280錫めっき)により厚さ3μmの錫めっき皮膜を形成し、水洗した後、表1に示す組成およびpHの水溶液で25℃にて30秒間の浸漬処理をし、水洗し、乾燥した。なお、「ポリリン酸ナトリウム」としては、関東化学株式会社社のポリリン酸ナトリウムを使用した。乾燥後、リフロー装置(株式会社日本パルス技術研究所製RF−330)にて260℃、1分の条件でリフロー処理を行ない、各パーツについて、錫皮膜の外観、変色、ヨリを評価した。その評価結果を表1に示す。
Examples 1-4 and Comparative Examples 0-38
A copper lead frame was subjected to cathode electrolytic degreasing at a voltage of 4 V × 1 minute in an alkaline electrolytic degreasing agent (cleaner 160: chemical manufactured by Meltex) at a bath temperature of 60 ° C., washed with water, and a persulfate system at room temperature. Chemical polishing is performed by immersing in a chemical abrasive solution (Actronal 550) for 30 seconds, washing with water, pickling in 10% sulfuric acid solution, washing with water, and an additive watt bath at a bath temperature of 55 ° C. and a current density of 3A / Dm 2 × 2 minutes nickel plating to form a nickel film with a thickness of 1 μm, washed with water, and a tin plating film with a thickness of 3 μm using a well-known tin methanesulfonate plating bath (Solderon TMBT-280 tin plating) After being formed and washed with water, it was immersed in an aqueous solution having the composition and pH shown in Table 1 at 25 ° C. for 30 seconds, washed with water, and dried. In addition, as "sodium polyphosphate", sodium polyphosphate manufactured by Kanto Chemical Co., Ltd. was used. After drying, a reflow process was performed at 260 ° C. for 1 minute in a reflow apparatus (RF-330 manufactured by Nippon Pulse Technology Laboratory Co., Ltd.), and the appearance, discoloration, and twist of the tin film were evaluated for each part. The evaluation results are shown in Table 1.
実施例で用いた化合物により調整された表面処理水溶液は、リフロー処理された錫めっき皮膜について変色およびヨリの発生が、比較例の水溶液による処理よりも低減することが確認された。 It was confirmed that the surface treatment aqueous solution prepared with the compounds used in the examples had less discoloration and twisting than the treatment with the aqueous solution of the comparative example for the reflow-treated tin plating film.
実施例1〜4の化合物、またはマレイン酸の塩を用いて調整された表面処理水溶液を、表2に示すような処理条件で、実施例1と同様の評価を行なった。但し、各表面処理水溶液については、実施例1〜4の化合物、またはマレイン酸の50g/Lを水に添加し、リン酸一アンモニウム水溶液についてはリン酸またはアンモニア、ポリリン酸ナトリウム水溶液についてリン酸または水酸化ナトリウム、マレイン酸またはL−アルギニン水溶液については酢酸または水酸化ナトリウム、グリシン水溶液については酢酸またはアンモニアにより各pH値を調整することにより、至適pHの検討を行った。同時に、浴温を、通常の使用温度範囲に相当すると考えられる、25℃〜60℃に変更して、温度による影響も検討した。
評価結果を表2に示す。
Surface treatment aqueous solutions prepared using the compounds of Examples 1 to 4 or maleic acid salts were evaluated in the same manner as in Example 1 under the treatment conditions shown in Table 2. However, for each surface treatment aqueous solution, 50 g / L of the compounds of Examples 1 to 4 or maleic acid was added to water, phosphoric acid or ammonia for monoammonium phosphate aqueous solution, phosphoric acid or sodium polyphosphate aqueous solution for For the aqueous solution of sodium hydroxide, maleic acid or L-arginine, the optimum pH was examined by adjusting each pH value with acetic acid or sodium hydroxide and for the aqueous solution of glycine with acetic acid or ammonia. At the same time, the effect of temperature was examined by changing the bath temperature to 25 ° C. to 60 ° C., which is considered to correspond to the normal operating temperature range.
The evaluation results are shown in Table 2.
リン酸のアンモニウム塩については、pHが2および6では、「ヨリ」について良好な結果が得られなかったが(比較例39および40)、実施例1および5〜7に示されるようにpH4.21〜4.3では、外観、変色、ヨリのいずれにおいても良好な結果が認められた。また、この良好な結果は、25℃〜60℃の温度範囲において認められた。
また、ポリリン酸ナトリウムについては、実施例2、および8〜13に示されるように、pH2〜10で外観、変色、ヨリのいずれにおいても良好な結果が認められた。また、この良好な結果は、25℃〜60℃の温度範囲において認められた。
また、グリシンについては、実施例4、および14〜17に示されるように、pH4〜9で外観、変色、ヨリのいずれにおいても良好な結果が認められた。また、この良好な結果は、25℃〜60℃の温度範囲において認められた。
また、L−アルギニンについては、実施例3、18および19に示されるように、pH4〜9で外観、変色、ヨリのいずれにおいても良好な結果が認められた。
また、マレイン酸については、比較例41および42に示されるように、pH4および9では「ヨリ」が良好ではなかったが、実施例20に示されるようにpH6では、いずれの特性も良好であった。
For the ammonium salt of phosphoric acid, good results were not obtained for “Yori” at pH 2 and 6 (Comparative Examples 39 and 40), but as shown in Examples 1 and 5-7, pH 4. In 21-4.3, the favorable result was recognized in any of an external appearance, discoloration, and twist. Moreover, this good result was recognized in the temperature range of 25 degreeC-60 degreeC.
Moreover, as for sodium polyphosphate, as shown in Example 2 and 8 to 13, good results were observed in any of appearance, discoloration, and twist at pH 2 to 10. Moreover, this good result was recognized in the temperature range of 25 degreeC-60 degreeC.
As for glycine, as shown in Examples 4 and 14 to 17, good results were observed in any of appearance, discoloration and twist at pH 4 to 9. Moreover, this good result was recognized in the temperature range of 25 degreeC-60 degreeC.
As for L-arginine, as shown in Examples 3, 18 and 19, good results were observed in any of appearance, discoloration and twist at pH 4-9.
For maleic acid, as shown in Comparative Examples 41 and 42, “twist” was not good at pH 4 and 9, but as shown in Example 20, both properties were good at pH 6. It was.
2種の化合物を用いて本発明の錫皮膜表面処理液を表3に示すように調整し、実施例1と同様の評価を行なった。但し、表面処理水溶液の浴温は40℃とした。 The tin film surface treatment liquid of the present invention was prepared as shown in Table 3 using two kinds of compounds, and the same evaluation as in Example 1 was performed. However, the bath temperature of the surface treatment aqueous solution was 40 ° C.
はんだぬれ性試験
実施例27および28
実施例1および5の表面処理水溶液の処理温度を60℃とした以外は、実施例1および5と同条件にて錫皮膜表面処理を行なったリードフレームを準備した。得られたリードフレームを105℃、100%、4および8時間の耐湿試験処理(PCT(105℃ 100%Rh 4or8hr))を行ない、耐湿試験後のめっき皮膜のはんだぬれ性について、ソルダ−チェッカーSAT−5000(RHESCACo.,LTD製)を用いたメニスコグラフ法によりゼロクロスタイムを測定し評価を行なった。測定条件は以下のとおりである。
Solder wettability test examples 27 and 28
A lead frame was prepared that was subjected to a tin film surface treatment under the same conditions as in Examples 1 and 5 except that the treatment temperature of the surface treatment aqueous solution of Examples 1 and 5 was 60 ° C. The obtained lead frame was subjected to a moisture resistance test treatment (PCT (105 ° C. 100% Rh 4 or 8 hours)) at 105 ° C., 100%, 4 and 8 hours, and the solder wettability of the plating film after the moisture resistance test was determined. The zero cross time was measured and evaluated by the meniscograph method using -5000 (manufactured by RHESCACo., LTD). The measurement conditions are as follows.
ゼロクロスタイム測定条件
はんだ槽:Sn/Pb=63/37
浴温:235℃
浸漬深さ:1mm
浸漬速度:10mm/秒
浸漬時間:5秒
フラックス:ロジン系不活性タイプ
以上の測定試験より得られた結果を表4に示す。
Zero cross time measurement conditions Solder bath: Sn / Pb = 63/37
Bath temperature: 235 ° C
Immersion depth: 1mm
Immersion speed: 10 mm / second Immersion time: 5 seconds Flux: Rosin-based inert type Table 4 shows the results obtained from the above measurement test.
錫めっき時間は、めっき皮膜厚が一定となるように各電流密度において調整した。
実施例1および5の表面処理水溶液は、良好なはんだぬれ性を提供した。
The tin plating time was adjusted at each current density so that the plating film thickness was constant.
The surface treatment aqueous solutions of Examples 1 and 5 provided good solder wettability.
本発明の錫めっき皮膜表面処理液によれば、耐食性および耐ヨリ性に優れた皮膜を形成することができる。すなわち、本発明の表面処理液を錫めっき皮膜のリフロー処理前に用いることにより、加熱後の錫皮膜の変色を低減し、かつ、良好なはんだ付け性を有する錫皮膜を形成することができる。 According to the tin plating film surface treatment liquid of the present invention, a film excellent in corrosion resistance and twist resistance can be formed. That is, by using the surface treatment liquid of the present invention before the reflow treatment of the tin plating film, it is possible to reduce the discoloration of the tin film after heating and to form a tin film having good solderability.
Claims (5)
b)基体表面上の該錫皮膜を、リフロー処理する前に、ポリリン酸の塩およびグリシンを含み、pHが7〜9である水溶液で処理する工程;および
c)該錫皮膜をリフロー処理する工程
を含む錫めっき皮膜の表面処理方法。 a) plating a tin film on the surface of the substrate;
b) a step of treating the tin film on the substrate surface with an aqueous solution containing a salt of polyphosphoric acid and glycine and having a pH of 7 to 9 before the reflow treatment; and c) a step of reflowing the tin film. A method for surface treatment of a tin plating film comprising
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