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JP5337620B2 - Workpiece adhesive holding device and vacuum bonding machine - Google Patents

Workpiece adhesive holding device and vacuum bonding machine Download PDF

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JP5337620B2
JP5337620B2 JP2009182438A JP2009182438A JP5337620B2 JP 5337620 B2 JP5337620 B2 JP 5337620B2 JP 2009182438 A JP2009182438 A JP 2009182438A JP 2009182438 A JP2009182438 A JP 2009182438A JP 5337620 B2 JP5337620 B2 JP 5337620B2
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plate
workpiece
adhesive
suction
pressure
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JP2011035301A (en
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義和 大谷
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Shin Etsu Engineering Co Ltd
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Description

本発明は、例えば液晶ディスプレー(LCD)やプラズマディスプレー(PDP)やフレキシブルディスプレーなどのフラットパネルディスプレーの製造過程において、CFガラスやTFTガラスなどのガラス製基板か又はPES(Poly-Ether-Sulphone)などのプラスチックフィルムなどからなる合成樹脂製基板などの板状ワークを着脱自在に保持して貼り合わせる基板貼り合わせ機を含む基板組立装置や、このような基板などの絶縁体、導電体又は半導体ウエハなどの板状ワーク(被処理体)を搬送する基板搬送装置などに用いられるワーク粘着保持装置、及び、それを用いた真空貼り合わせ機に関する。   The present invention relates to a glass substrate such as CF glass or TFT glass or PES (Poly-Ether-Sulphone) in the manufacturing process of a flat panel display such as a liquid crystal display (LCD), a plasma display (PDP), and a flexible display. Substrate assembling apparatus including a substrate laminating machine that detachably holds and attaches a plate-shaped workpiece such as a synthetic resin substrate made of plastic film, etc., an insulator such as a substrate, a conductor or a semiconductor wafer, etc. The present invention relates to a workpiece adhesive holding device used for a substrate transfer device for transferring a plate-shaped workpiece (object to be processed), and a vacuum bonding machine using the same.

従来、この種のワーク粘着保持装置及び真空貼り合わせ機としては、テーブルに基板保持機構の粘着部材である粘着シートと、この粘着シートを基板面から剥がす複数の剥離機構として設けられる押し軸(押し部材)とを備え、ロボット等で搬入される下基板を、テーブル上の粘着シートで粘着して固定し、貼り合わせ終了後の上下基板を、テーブルから押し軸が上昇して粘着シートから押し剥がすものがある(例えば、特許文献1参照)。
また、保持板の基板側表面に凹部を凹設し、この凹部の開口を、金属製薄板やゴムなどの弾性変形可能なダイヤフラムからなる変形膜で密閉状に覆い、基板と対向して粘着保持する粘着部材を設け、凹部から真空引きして減圧したり気体を導入して、変形膜を出没変形させることにより、粘着部材の表面と基板を当接して粘着保持するとともに、これら両者を強制的に引き離して、粘着部材の表面から基板を剥離するものもある(例えば、特許文献2参照)。
Conventionally, as this kind of work pressure-sensitive adhesive holding device and vacuum bonding machine, a pressure-sensitive adhesive sheet that is a pressure-sensitive adhesive member of a substrate holding mechanism on a table and a push shaft provided as a plurality of peeling mechanisms for peeling the pressure-sensitive adhesive sheet from the substrate surface (pushing) The lower substrate that is carried in by a robot or the like is fixed by adhering with an adhesive sheet on the table, and the upper and lower substrates after bonding are lifted from the table and pushed off from the adhesive sheet. There are some (see, for example, Patent Document 1).
Also, a concave portion is formed on the substrate side surface of the holding plate, and the opening of the concave portion is hermetically covered with a deformable film made of an elastically deformable diaphragm such as a metal thin plate or rubber, and holds the adhesive facing the substrate. The pressure-sensitive adhesive member is evacuated and decompressed by introducing a gas or introducing a gas to cause the deformed film to appear and retract, thereby bringing the surface of the pressure-sensitive adhesive member into contact with the substrate and holding both of them together. In some cases, the substrate is peeled away from the surface of the adhesive member (see, for example, Patent Document 2).

特開2003−283185号公報JP 2003-283185 A 特許第3882004号公報Japanese Patent No. 3882004

しかし乍ら、このような従来のワーク粘着保持装置及び真空貼り合わせ機では、特許文献1のように剥離機構として複数の押し軸を用いる場合、基板と粘着部材とが粘着される粘着作用部の面積に対して押し軸による剥離作用部の面積は極一部であり、押し軸の集中的押圧によって生じる基板の変形に伴う剥離作用は、該押し軸から離れた粘着作用部にまで及んでしまうため、基板の押圧箇所を中心として曲がりが発生し易く、特に精度良く貼り合わせが完了した両基板を押し軸で部分的に押圧して粘着部材から押し剥がすと、両基板の押圧箇所で合わせズレが発生してしまい、僅かな合わせズレでも光漏れなどの原因となるばかりでなく、最悪の場合には押し軸による部分的な押圧によって、基板が破損する可能性もあるという問題があった。
また、特許文献2において、ダイヤフラムからなる変形膜を膨らませて、精度良く貼り合わせが完了した両基板を粘着部材から押し剥がす場合には、ダイヤフラムの膨張方向及び膨張量にバラツキが発生し易く、貼り合わされた両基板の一部をダイヤフラムの膨張に応じて部分的に押圧すると、押圧箇所が曲がって両基板の合わせズレが発生するおそれがあるという問題があった。
さらに、下方の保持板に粘着保持される基板を、ダイヤフラムの出没変形により上方へ剥がすように配備した場合には、出没変形させていないフリー状態において、ダイヤフラムが重力により垂れ下がって凹部の底面にくっつき、その次に上方へ変形し難くなって、粘着と剥離を繰り返し安定して行えないおそれがあった。
However, in such a conventional workpiece adhesive holding device and vacuum bonding machine, when a plurality of push shafts are used as a peeling mechanism as in Patent Document 1, the adhesive action portion where the substrate and the adhesive member are adhered to each other is used. The area of the peeling action part by the push shaft with respect to the area is a very small part, and the peeling action due to the deformation of the substrate caused by the concentrated pressing of the push shaft reaches the adhesive action part away from the push shaft. Therefore, it is easy to bend around the pressed part of the substrate, and when both substrates that have been pasted together are partially pressed with the push shaft and peeled off from the adhesive member, the misalignment occurs at the pressed part of both substrates. A slight misalignment not only causes light leakage, but in the worst case, the substrate may be damaged due to partial pressing by the push shaft. .
Also, in Patent Document 2, when the deformed film made of a diaphragm is inflated and both substrates that have been bonded together are pushed away from the adhesive member, variations in the expansion direction and the expansion amount of the diaphragm are likely to occur. When part of the combined substrates is partially pressed in accordance with the expansion of the diaphragm, there is a problem that the pressed portion may be bent and misalignment between the substrates may occur.
Furthermore, when the substrate that is adhesively held on the lower holding plate is arranged so as to be peeled upward by the deformation of the diaphragm, the diaphragm hangs down due to gravity and sticks to the bottom surface of the recess in the free state that is not deformed. Then, it becomes difficult to be deformed upward, and there is a possibility that repeated sticking and peeling cannot be performed stably.

本発明は、このような問題に対処することを課題とするものである。
すなわち、本発明は、押し軸やダイヤフラムによる剥離手段の不具合を解消すべく、板状ワークとの粘着及び剥離を互い接近した位置で板状ワークの変形を極力避けながら行うこと、粘着パッドの位置を同一の安定した状態に保つこと、粘着チャックを低コストで作成すること、板状ワークの搬入及び搬出に連動して粘着と剥離を繰り返し安定して行うこと、などを目的とするものである。
An object of the present invention is to deal with such a problem.
That is, the present invention performs the adhesion and peeling with the plate-like workpiece while avoiding deformation of the plate-like workpiece as much as possible in order to eliminate the problem of the peeling means due to the push shaft and the diaphragm, and the position of the adhesive pad. To maintain the same in a stable state, to make an adhesive chuck at low cost, and to repeatedly and stably perform adhesion and peeling in conjunction with loading and unloading of a plate-like workpiece. .

このような目的を達成するために本発明は、保持板と、該保持板の表面側に配置されて板状ワークを着脱自在に粘着保持する粘着チャックとを有し、前記粘着チャックは、前記板状ワークと対向して複数配置される粘着パッドと、前記粘着パッドの裏面に連続して前記板状ワークに沿うように形成され、前記粘着チャックを前記板状ワークとの対向方向へ移動自在に支持する支持板と、前記粘着パッドと隣接して前記板状ワークと対向するように形成される気圧調整可能な吸着溝と、前記支持板の裏面から連続して前記板状ワークとの対向方向へ伸縮自在に形成される支持柱と、前記支持柱の周囲に形成される気圧調整可能な調圧室とを備え、前記吸着溝が負圧になることで、前記粘着パッドを前記板状ワーク及び前記支持板の両側から圧縮して該粘着パッドと前記板状ワークの表面とを当接させ、前記調圧室が負圧になることで、前記支持柱を前記板状ワークの表面から前記粘着パッドが離隔するように圧縮させることを特徴とする。
前述した特徴に加えて、前記支持柱を弾性変形可能な材料で形成し、前記調圧室の負圧時を除いて、前記粘着パッドが前記保持板の表面と接近するように該支持柱を伸張させることを特徴とする。
さらに前述した特徴に加えて、前記支持板及び前記支持柱を弾性変形可能な材料で一体形成することを特徴とすることを特徴とする。
さらに前述した特徴に加えて、前記吸着溝に通ずる吸引手段と、前記調圧室に通ずる気圧調整手段と、これら吸引手段及び気圧調整手段をそれぞれ作動制御する制御手段とを備え、この制御手段は、前記板状ワークの搬入後に前記吸引手段を作動させて前記吸着溝を負圧にし、前記板状ワークの搬出直前に、前記気圧調整手段を作動させて前記調圧室を負圧にすることを特徴とする。
また前述した特徴を有するワーク粘着保持装置を、対向する一対の保持板のいずれか一方か又は両方に設け、このワーク粘着保持装置で真空中に板状ワークを粘着保持して、もう一つの板状ワークに貼り合わせることを特徴とする。
In order to achieve such an object, the present invention includes a holding plate, and an adhesive chuck that is disposed on the surface side of the holding plate and detachably adheres and holds a plate-like workpiece. A plurality of adhesive pads arranged opposite to the plate-like workpiece, and formed so as to follow the plate-like workpiece continuously on the back surface of the adhesive pad, and the adhesive chuck can be moved in a direction facing the plate-like workpiece. A support plate that is supported by the pressure pad, an adsorbable groove that is adjustable so as to be opposed to the plate-like workpiece adjacent to the adhesive pad, and is opposed to the plate-like workpiece continuously from the back surface of the support plate. A pressure-adjustable chamber formed around the support column and adjustable in pressure, and the suction groove has a negative pressure, whereby the adhesive pad is formed into the plate shape. Compressed from both sides of workpiece and support plate The adhesive pad and the surface of the plate workpiece are brought into contact with each other, and the pressure adjusting chamber becomes negative pressure, so that the support column is compressed so that the adhesive pad is separated from the surface of the plate workpiece. It is characterized by that.
In addition to the above-described features, the support column is formed of an elastically deformable material, and the support column is arranged so that the adhesive pad approaches the surface of the holding plate except during negative pressure in the pressure adjusting chamber. It is characterized by extending.
Further, in addition to the above-described features, the support plate and the support pillar are integrally formed of a material that can be elastically deformed.
Further, in addition to the above-described features, a suction unit that communicates with the suction groove, an atmospheric pressure adjustment unit that communicates with the pressure adjusting chamber, and a control unit that controls the operation of each of the suction unit and the atmospheric pressure adjustment unit. The suction means is operated to bring the suction groove into a negative pressure after the plate-like work is carried in, and the pressure adjusting chamber is made to be a negative pressure by the air pressure adjusting means just before the plate-like work is carried out. It is characterized by.
Also, the workpiece adhesive holding device having the above-described features is provided on either one or both of a pair of opposing holding plates, and the workpiece adhesive holding device adheres and holds the plate-like workpiece in a vacuum. It is characterized by being bonded to a workpiece.

前述した特徴を有する本発明は、吸着溝を負圧にして板状ワークとの間を真空にすることにより、粘着パッド及び支持板が板状ワーク側に移動して、該板状ワークの変形を可能な限り小さく抑えるとともに、これら板状ワーク及び支持板の両側から粘着パッドを圧縮し、それに伴い板状ワークの表面が粘着パッドに当接して確実に密着し、また調圧室を負圧にして支持柱の周囲空間を真空にすることにより、その容積が収縮しようとして支持柱が板状ワークの表面から離れる方向へ圧縮し、それに伴い支持板を介して粘着パッドが同方向へ移動して板状ワークの表面から無理なく引き剥がされるので、板状ワークとの粘着と剥離を確実に行うことができる。
その結果、板状ワークを保持板に対して位置ズレや破損が発生せずに正確でしかもスムーズに剥離でき、繰り返し安定した粘着及び剥離を実現することができる。
In the present invention having the above-described features, the suction pad and the support plate are moved to the plate-shaped workpiece side by applying a vacuum to the plate-shaped workpiece by setting the suction groove to a negative pressure, and the plate-shaped workpiece is deformed. The pressure-sensitive adhesive pad is compressed from both sides of the plate-shaped workpiece and the support plate, and the surface of the plate-shaped workpiece is brought into contact with and firmly adhered to the pressure-sensitive adhesive pad. The space around the support column is evacuated to compress the support column in a direction away from the surface of the plate-like work as the volume of the support column tends to shrink, and the adhesive pad moves in the same direction via the support plate. Therefore, it can be peeled off from the surface of the plate-like workpiece without difficulty, so that adhesion and peeling from the plate-like workpiece can be reliably performed.
As a result, the plate-like workpiece can be accurately and smoothly peeled from the holding plate without causing displacement or damage, and repeated and stable adhesion and peeling can be realized.

さらに、支持柱を弾性変形可能な材料で形成し、調圧室の負圧時を除いて、粘着パッドが保持板の表面と接近するように該支持柱を伸張させる場合には、調圧室を負圧にすることにより、支持柱が板状ワークの表面から離れる方向へ弾性的に圧縮変形するが、支持柱は必要量以上に圧縮されないため、支持板の内面が調圧室の対向面に接着することもなく、また調圧室の負圧を解除して大気開放することにより、支持柱の形状が弾性的に復元して圧縮変形前の状態に戻るので、粘着パッドの位置を同一の安定した状態に保つことができる。   Further, when the support column is formed of an elastically deformable material and the support column is extended so that the adhesive pad approaches the surface of the holding plate except when the pressure adjustment chamber is under negative pressure, the pressure adjustment chamber The support column is elastically compressed and deformed in a direction away from the surface of the plate-shaped workpiece by making the pressure negative, but the support column is not compressed more than necessary, so the inner surface of the support plate is the opposite surface of the pressure adjustment chamber Without releasing the negative pressure of the pressure adjusting chamber and releasing it to the atmosphere, the shape of the support column is elastically restored and returns to the state before compression deformation, so the position of the adhesive pad is the same Can be kept stable.

さらに、支持板及び支持柱を弾性変形可能な材料で一体形成する場合には、1回の型成形で支持板及び支持柱が吸着溝及び調圧室を含めて一体成形されるので、粘着チャックを低コストで作成することができる。   Furthermore, when the support plate and the support column are integrally formed of a material that can be elastically deformed, the support plate and the support column are integrally formed including the suction groove and the pressure adjusting chamber by a single mold forming. Can be created at low cost.

さらに、吸着溝に通ずる吸引手段と、調圧室に通ずる気圧調整手段と、これら吸引手段及び気圧調整手段をそれぞれ作動制御する制御手段とを備え、この制御手段は、板状ワークの搬入後に吸引手段を作動させて吸着溝を負圧にし、板状ワークの搬出直前に、気圧調整手段を作動させて調圧室を負圧にする場合には、搬入した板状ワークの表面に粘着パッドが密着し、搬出直前の板状ワークから粘着パッドが引き剥がされるので、板状ワークの搬入及び搬出に連動して粘着と剥離を繰り返し安定して行うことができる。   Furthermore, a suction means that communicates with the suction groove, an atmospheric pressure adjustment means that communicates with the pressure adjusting chamber, and a control means that controls the operation of each of the suction means and the atmospheric pressure adjustment means, the control means is configured to perform suction after the plate-like workpiece is loaded. When the suction groove is made negative by operating the means and the pressure adjusting chamber is made negative by operating the air pressure adjusting means immediately before carrying out the plate-like workpiece, an adhesive pad is placed on the surface of the loaded plate-like workpiece. Since the adhesive pad is peeled off from the plate-like workpiece immediately before being brought out, adhesion and peeling can be repeatedly and stably performed in conjunction with the loading and unloading of the plate-like workpiece.

また、前述した特徴を有するワーク粘着保持装置を、対向する一対の保持板のいずれか一方か又は両方に設け、このワーク粘着保持装置で真空中に板状ワークを粘着保持して、もう一つの板状ワークに貼り合わせる場合には、粘着チャック装置により、精度良く貼り合わせが完了した両板状ワークの表面から粘着パッドが無理なく引き剥がされるので、精度良く貼り合わせが完了した両板状ワークの合わせズレを防止することができる。
したがって、光漏れなどの作動不良が減少して歩留まりの向上を図ることができる。
In addition, a workpiece adhesive holding device having the above-described features is provided on either or both of a pair of opposing holding plates, and the workpiece adhesive holding device adheres and holds the plate-like workpiece in a vacuum. When bonding to plate-shaped workpieces, the adhesive chuck device will forcefully peel the adhesive pad from the surface of both plate-shaped workpieces that have been bonded together with high accuracy. Misalignment can be prevented.
Accordingly, malfunctions such as light leakage can be reduced and yield can be improved.

本発明の一実施形態に係るワーク粘着保持装置を示す部分的な縦断正面図であり、(a)がワーク粘着時を示し、(b)がワーク剥離時を示し、(c)が剥離後の復元時を示している。It is a partial longitudinal section front view showing a work adhesion holding device concerning one embodiment of the present invention, (a) shows at the time of work adhesion, (b) shows at the time of work exfoliation, and (c) is after exfoliation. Indicates the time of restoration. 図1(a)の横断平面図であり、(a)が(2A)−(2A)線に沿える部分的な横断平面図、(b)が(2B)−(2B)線に沿える部分的な横断平面図である。2A is a cross-sectional plan view of FIG. 1A, in which FIG. 1A is a partial cross-sectional plan view along line (2A)-(2A), and FIG. 1B is a part along line (2B)-(2B). FIG. 本発明の他の実施形態に係るワーク粘着保持装置を示す部分的な縦断正面図であり、(a)がワーク粘着時を示し、(b)がワーク剥離時を示し、(c)が剥離後の復元時を示している。It is a partial vertical front view which shows the workpiece adhesion holding apparatus which concerns on other embodiment of this invention, (a) shows the time of workpiece | work adhesion, (b) shows the time of workpiece peeling, (c) is after peeling Shows the restoration time. 本発明の一実施例に係る真空貼り合わせ機を示す部分的な縮小縦断正面図であり、(a)がワーク粘着時を示し、(b)がワーク剥離時を示し、(c)が剥離後の復元時を示している。BRIEF DESCRIPTION OF THE DRAWINGS It is a partial reduction | decrease vertical front view which shows the vacuum bonding machine which concerns on one Example of this invention, (a) shows the time of workpiece | work adhesion, (b) shows the time of workpiece | work peeling, (c) is after peeling. Shows the restoration time.

以下、本発明の実施形態を図面に基づいて説明する。
本発明の実施形態に係るワーク粘着保持装置Aは、図1〜図3に示すように、保持板1と、この保持板1の表面1aに配置されて板状ワークWと着脱自在に粘着する粘着チャック2とを有し、粘着チャック2により保持板1に対して板状ワークWを着脱自在に粘着保持している。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
As shown in FIGS. 1 to 3, the workpiece adhesive holding device A according to the embodiment of the present invention is disposed on the holding plate 1 and the surface 1 a of the holding plate 1 and detachably adheres to the plate-like workpiece W. The plate-like workpiece W is detachably adhered to the holding plate 1 by the adhesive chuck 2.

粘着チャック2は、図1及び図2に示すように、板状ワークWと対向して複数配置される粘着パッド2aと、粘着パッド2aの裏面に連続して板状ワークWに沿うように形成されるとともに粘着パッド2aを板状ワークWとの対向方向へ移動自在に支持する支持板2bと、粘着パッド2aと隣接して板状ワークWと対向するように形成される気圧調整可能な吸着溝2cと、支持板2bの裏面から連続して板状ワークWとの対向方向、すなわち支持板2bの厚さ方向へ伸縮自在に形成される支持柱2dと、支持柱2dの周囲に区画形成される気圧調整可能な調圧室2eとを備えている。   As shown in FIGS. 1 and 2, the adhesive chuck 2 is formed so as to be along the plate-like workpiece W continuously with the adhesive pads 2 a arranged opposite to the plate-like workpiece W and the back surface of the adhesive pad 2 a. And a support plate 2b that supports the adhesive pad 2a so as to be movable in a direction opposite to the plate-like workpiece W, and an adsorption capable of adjusting the pressure formed adjacent to the adhesive pad 2a and facing the plate-like workpiece W. A support column 2d formed to be able to expand and contract in the direction facing the plate-like workpiece W continuously from the groove 2c and the back surface of the support plate 2b, that is, the thickness direction of the support plate 2b, and a partition formed around the support column 2d And a pressure regulating chamber 2e capable of adjusting the atmospheric pressure.

粘着パッド2aは、図1(a)及び図2(a)に示すように、吸着溝2cを挟んで所定間隔毎に配置され、それぞれの板状ワークWと対向する表面に粘着面2a1を形成し、これら粘着面2a1が、保持板1の表面1aとほぼ面一となるように配置されている。   As shown in FIGS. 1 (a) and 2 (a), the adhesive pads 2a are arranged at predetermined intervals across the suction groove 2c, and an adhesive surface 2a1 is formed on the surface facing each plate-like workpiece W. The adhesive surface 2a1 is arranged so as to be substantially flush with the surface 1a of the holding plate 1.

支持板2bは、複数の粘着パッド2aの裏面、すなわち粘着面2a1と反対側の面と連続し、且つ粘着チャック2の全体又は略全体を覆うように平板状に形成されている。
さらに、支持板2bは、粘着パッド2aを板状ワークWとの対向方向、すなわち支持板2bの厚さ方向へ移動自在に支持するための手段を有している。
この手段の一例を挙げれば、支持板2bの一部又は全部を弾性変形可能な材料で形成して支持板2bの厚さ方向へ弾性変形させることにより、粘着パッド2aが支持板2bの厚さ方向へ往復動可能になる。
また、その他の例として、支持板2bを剛性材料で形成し、その端部を保持板1に対して支持板2bの厚さ方向へ平行移動自在に支持することにより、粘着パッド2aを支持板2bの厚さ方向へ往復動させることも可能である。
The support plate 2b is formed in a flat plate shape so as to be continuous with the back surface of the plurality of adhesive pads 2a, that is, the surface opposite to the adhesive surface 2a1, and to cover the whole or substantially the entire adhesive chuck 2.
Furthermore, the support plate 2b has means for supporting the adhesive pad 2a so as to be movable in the direction facing the plate-like workpiece W, that is, in the thickness direction of the support plate 2b.
As an example of this means, a part or all of the support plate 2b is formed of a material that can be elastically deformed and elastically deformed in the thickness direction of the support plate 2b, whereby the adhesive pad 2a has a thickness of the support plate 2b. It can be reciprocated in the direction.
As another example, the support plate 2b is formed of a rigid material, and its end is supported to the holding plate 1 so as to be movable in the thickness direction of the support plate 2b. It is also possible to reciprocate in the thickness direction 2b.

粘着パッド2aの間には、吸着溝2cを凹設し、これら複数の粘着パッド2aが吸着溝2cでそれぞれ囲まれるようにするとともに、板状ワークWの表面W1と支持板2bとの間に気密空間が形成されるようにしている。
粘着パッド2aの粘着面2a1は、支持板2bに全く圧力が作用していない状態で、保持板1の表面1aよりも僅かに凹むように配置することが好ましい。
吸着溝2cは、支持板2bの厚さ方向へ延びるように形成される吸引孔2fと連通している。
この吸引孔2fは、粘着チャック2の外周部を貫通してその一端が板状ワークWと対向するように開口し、他端が後述する吸引手段3に通じている。
A suction groove 2c is provided between the adhesive pads 2a so that the plurality of adhesive pads 2a are respectively surrounded by the suction grooves 2c, and between the surface W1 of the plate-like workpiece W and the support plate 2b. An airtight space is formed.
The pressure-sensitive adhesive surface 2a1 of the pressure-sensitive adhesive pad 2a is preferably disposed so as to be slightly recessed from the surface 1a of the holding plate 1 in a state where no pressure is applied to the support plate 2b.
The suction groove 2c communicates with a suction hole 2f formed so as to extend in the thickness direction of the support plate 2b.
The suction hole 2f opens through the outer peripheral portion of the adhesive chuck 2 so that one end thereof faces the plate-like workpiece W, and the other end communicates with a suction means 3 described later.

支持柱2dは、例えばエラストマーなどの弾性変形可能な材料により、吸着溝2cで囲まれた粘着パッド2aがそれぞれ形成される支持板2bの各部分の裏面から支持板2bの厚さ方向へ連続して同方向へ伸縮変形可能に立設され、支持柱2dの周囲には調圧室2eを凹設し、調圧室2eの負圧時を除いて、粘着パッド2aの粘着面2a1が保持板1の表面1aと接近するように該支持柱2dを伸張させている。
調圧室2eは、支持板2bの厚さ方向へ延びるように形成される通気孔2gと連通している。
この通気孔2gは、後述する気圧調整手段4に通じている。
The support column 2d is continuous in the thickness direction of the support plate 2b from the back surface of each portion of the support plate 2b on which the adhesive pad 2a surrounded by the suction groove 2c is formed by an elastically deformable material such as an elastomer, for example. The pressure adjusting chamber 2e is recessed around the support column 2d, and the pressure-sensitive adhesive surface 2a1 of the pressure-sensitive adhesive pad 2a is held by the holding plate except when negative pressure is applied to the pressure adjusting chamber 2e. The support column 2d is extended so as to be close to the surface 1a of 1.
The pressure regulating chamber 2e communicates with a vent 2g formed so as to extend in the thickness direction of the support plate 2b.
The air hole 2g communicates with the atmospheric pressure adjusting means 4 described later.

これら粘着パッド2a、支持板2b及び支持柱2dは、それら全てを例えばエラストマーなどの弾性変形可能な材料で一体形成するか、又は個別な材料で形成する。
その一例としては、少なくとも支持板2bと支持柱2dを弾性率が異なる弾性材料で形成し、必要に応じて粘着パッド2aを含めて全て接着等の固着により一体化させる。
また、その他の例として、支持柱2dのみを弾性材料で形成し、必要に応じて粘着パッド2aを含めて全て接着等の固着により一体化させることも可能である。
このように少なくとも支持板2bと支持柱2dを別部材で形成する場合には、支持柱2dの材料や形状を変更させることによって、支持板2bの材料に関係なく、全ての支持柱2dの伸縮量や任意の支持柱2dの伸縮量が調整可能となる。
The adhesive pad 2a, the support plate 2b, and the support column 2d are all integrally formed of an elastically deformable material such as an elastomer, or are formed of individual materials.
As an example, at least the support plate 2b and the support column 2d are formed of elastic materials having different elastic moduli, and all of them including the adhesive pad 2a are integrated by adhesion or the like as necessary.
As another example, it is also possible to form only the support column 2d from an elastic material and to integrate them by adhesion such as adhesion, including the adhesive pad 2a as necessary.
In this way, when at least the support plate 2b and the support column 2d are formed as separate members, the expansion and contraction of all the support columns 2d can be performed regardless of the material of the support plate 2b by changing the material and shape of the support column 2d. The amount and the amount of expansion / contraction of the arbitrary support column 2d can be adjusted.

さらに、図示例では、図1(a)及び図2(a)(b)に示すように、支持板2bは円板状に形成され、この支持板2bを含む粘着チャック2の全体形状を円形としている。
この支持板2bの表面は、その外周部を除いて粘着パッド2aとし、吸着溝2cを複数の円環状に凹設するとともに、これら円環状の吸着溝2c同士を十字状の吸着溝2cで連絡している。
なお、その他の例として、支持板2bを含む粘着チャック2の全体形状を楕円形又は矩形や多角形などに変更したり、粘着パッド2aを吸着溝2cで矩形や多角形などに仕切ることも可能である。
Further, in the illustrated example, as shown in FIGS. 1A and 2A and 2B, the support plate 2b is formed in a disc shape, and the entire shape of the adhesive chuck 2 including the support plate 2b is circular. It is said.
The surface of the support plate 2b is formed as an adhesive pad 2a except for the outer peripheral portion thereof, and suction grooves 2c are formed in a plurality of annular shapes, and the annular suction grooves 2c are connected to each other by a cross-shaped suction groove 2c. doing.
As another example, the entire shape of the adhesive chuck 2 including the support plate 2b can be changed to an ellipse, a rectangle, a polygon, or the like, or the adhesive pad 2a can be partitioned into a rectangle or a polygon by the suction groove 2c. It is.

粘着チャック2の外周部には、板状ワークWと対向として、例えば金属などの非粘着性の材料からなる外周リング2hを、粘着パッド2aを囲むように設けることが好ましい。それによって、板状ワークWの剥離が容易になり、特に金属製の外周リング2hを固着した場合には、剥離時において変形しないため、更に剥離し易くなる。
さらに、外周リング2hには、後述する吸引手段3に通じる吸引孔2fが、板状ワークWの表面W1と対向するように開穿される。
図示例では、外周リング2hは、支持板2bの外周部に板状ワークWに向け突出するように固着されている。
なお、その他の例として、外周リング2hに代えて非粘着性の材料からなる薄膜などの層を形成したり、粘着チャック2の外周部に何も配置せずに凹み部としても良い。
An outer peripheral ring 2h made of a non-adhesive material such as metal is preferably provided on the outer peripheral portion of the adhesive chuck 2 so as to face the plate-like workpiece W so as to surround the adhesive pad 2a. As a result, the plate-like workpiece W can be easily peeled off. In particular, when the metal outer ring 2h is fixed, the plate-like workpiece W is not easily deformed at the time of peeling, so that it is further easily peeled off.
Further, a suction hole 2f communicating with suction means 3 described later is opened in the outer ring 2h so as to face the surface W1 of the plate-like workpiece W.
In the illustrated example, the outer peripheral ring 2h is fixed to the outer peripheral portion of the support plate 2b so as to protrude toward the plate-like workpiece W.
As another example, a layer such as a thin film made of a non-adhesive material may be formed instead of the outer peripheral ring 2h, or a recess may be formed without arranging anything on the outer peripheral portion of the adhesive chuck 2.

支持柱2dの末端側には、支持基板2iが設けられ、この支持基板2iと支持板2bとをそれらの間に支持柱2dが挟み込まれるように一体的に積層することで、粘着チャック2がユニット化され、該ユニットを保持板1に対して適宜間隔毎に分散配置することが好ましい。
図示例では、保持板1の表面1aの適宜位置に凹部1bが形成され、この凹部1bに該ユニットを挿着することで、凹部1b内に粘着チャック2を収納配置している。
支持基板2iには、調圧室2eと後述する気圧調整手段4とを連絡する通気孔2gが開穿されている。
A support substrate 2i is provided on the end side of the support column 2d, and the adhesive chuck 2 is formed by integrally stacking the support substrate 2i and the support plate 2b so that the support column 2d is sandwiched therebetween. It is preferable to form a unit and to disperse the unit with respect to the holding plate 1 at appropriate intervals.
In the illustrated example, a concave portion 1b is formed at an appropriate position on the surface 1a of the holding plate 1, and the adhesive chuck 2 is accommodated in the concave portion 1b by inserting the unit into the concave portion 1b.
The support substrate 2i has a vent hole 2g that communicates the pressure regulating chamber 2e and a pressure adjusting means 4 described later.

そして、吸着溝2cに通ずる吸引手段3と通気孔2gに通ずる気圧調整手段4は、例えば真空ポンプやコンプレッサなどで構成され、これら吸引手段3及び気圧調整手段4を、後述する制御手段Bによって作動制御することが好ましい。
制御手段Bは、吸引手段3、気圧調整手段4や後述するワーク移送手段Cなどと電気的に接続したコントローラであり、予め設定されたプログラムに従い後述するワーク移送手段Cなどと連動して吸引手段3、気圧調整手段4をそれぞれ作動制御することが好ましい。
The suction means 3 that communicates with the suction groove 2c and the atmospheric pressure adjustment means 4 that communicates with the ventilation hole 2g include, for example, a vacuum pump or a compressor. The suction means 3 and the atmospheric pressure adjustment means 4 are operated by a control means B described later. It is preferable to control.
The control means B is a controller that is electrically connected to the suction means 3, the atmospheric pressure adjustment means 4, the workpiece transfer means C described later, and the like, and is operated in conjunction with the workpiece transfer means C described later according to a preset program. 3. It is preferable to control the operation of the atmospheric pressure adjusting means 4 respectively.

このワーク移送手段Cは、板状ワークWを例えば吸着パッドなどで着脱自在に保持する搬送用ロボットなどからなり、保持板1が配備される領域の外部から板状ワークWを保持板1及び粘着チャック2へ向け搬入し、その後、保持板1aから板状ワークWを外部領域へ向け搬出するように構成されている。   The workpiece transfer means C is composed of a transfer robot that detachably holds the plate-like workpiece W with, for example, a suction pad, and the plate-like workpiece W is adhered to the holding plate 1 and the adhesive from outside the area where the holding plate 1 is provided. It carries in toward the chuck | zipper 2, and is comprised so that the plate-shaped workpiece | work W may be carried out toward an external area | region from the holding plate 1a after that.

制御手段Bによる吸引手段3及び気圧調整手段4の制御の一例を挙げると、制御手段Bは、ワーク移送手段Cによる板状ワークWの搬入後において、吸引手段3を作動開始させることにより、吸引孔2fから真空吸引して吸着溝2cを負圧にし、その後に吸引手段3による真空吸引を停止させて吸引孔2fを大気状態に戻し、ワーク移送手段Cによる板状ワークWの搬出直前において、気圧調整手段4を作動開始させることにより、通気孔2gから真空吸引して調圧室2eを負圧にし、ワーク移送手段Cによる板状ワークWの搬出後に、気圧調整手段4による真空吸引を停止させて通気孔2gを大気状態に戻すようにしている。   As an example of the control of the suction means 3 and the atmospheric pressure adjustment means 4 by the control means B, the control means B performs the suction by starting the operation of the suction means 3 after loading the plate-like workpiece W by the work transfer means C. Vacuum suction is performed from the hole 2f to make the suction groove 2c have a negative pressure, and then the vacuum suction by the suction means 3 is stopped to return the suction hole 2f to the atmospheric state, immediately before the plate-like workpiece W is unloaded by the workpiece transfer means C. By starting the operation of the atmospheric pressure adjusting means 4, vacuum suction is performed from the air vent 2 g to make the pressure adjusting chamber 2 e negative, and after the plate-like workpiece W is carried out by the work transfer means C, the vacuum suction by the atmospheric pressure adjusting means 4 is stopped. Thus, the ventilation hole 2g is returned to the atmospheric state.

このような実施形態では、図1(a)に示すように、先ず、ワーク移送手段Cにより板状ワークWが保持板1及び粘着チャック2へ向け搬入されると、保持板1の表面1aに沿って載置し、その後、吸引手段3が作動開始され、吸引孔2fの一端開口から吸引するとともに、吸着溝2cを負圧にして、板状ワークWの表面W1と支持板2bとの間(気密空間)が所定の真空度に達する。
それにより、粘着チャック2の外周部又はそこに固着された外周リング2hに対し、板状ワークWの表面W1が吸着保持される。
これと同時に、粘着パッド2a及び支持板2bが板状ワークW側に移動して、該板状ワークWの変形をできるだけ小さく抑えるととともに、これら板状ワークW及び支持板2bの両側から粘着パッド2aを板状ワークWとの対向方向、すなわち支持板2bの厚さ方向へ圧縮する。それに伴い、粘着パッド2a及び支持板2bが弾性変形するか又は平行移動して、板状ワークWの表面W1が粘着パッド2aに当接し、これら両者が確実に密着する。
In such an embodiment, as shown in FIG. 1A, first, when the plate-like workpiece W is carried into the holding plate 1 and the adhesive chuck 2 by the workpiece transfer means C, the surface 1 a of the holding plate 1 is applied. Then, the suction means 3 is started to operate, and suction is performed from one end opening of the suction hole 2f, and the suction groove 2c is set to a negative pressure so that the surface W1 of the plate-like workpiece W is placed between the support plate 2b. (Airtight space) reaches a predetermined degree of vacuum.
Thereby, the surface W1 of the plate-like workpiece W is sucked and held on the outer peripheral portion of the adhesive chuck 2 or the outer peripheral ring 2h fixed thereto.
At the same time, the adhesive pad 2a and the support plate 2b move to the plate-like workpiece W side to suppress the deformation of the plate-like workpiece W as much as possible, and the adhesive pad from both sides of the plate-like workpiece W and the support plate 2b. 2a is compressed in the direction facing the plate-like workpiece W, that is, in the thickness direction of the support plate 2b. Along with this, the adhesive pad 2a and the support plate 2b are elastically deformed or moved in parallel, so that the surface W1 of the plate-like workpiece W comes into contact with the adhesive pad 2a, and both of them are securely adhered.

その後、吸引手段3が作動停止して、吸引孔2fの一端開口からの真空吸引が停止され、吸引孔2f及び吸着溝2cが大気状態に戻る。
しかし、この状態では、吸引孔2fの一端開口から吸引による板状ワークWの吸着保持は開放されるが、粘着パッド2aの粘着面2a1が板状ワークWの表面W1に粘着しているため、保持板1の表面1aに対して板状ワークWが位置ズレすることはない。
Thereafter, the suction means 3 stops operating, vacuum suction from one end opening of the suction hole 2f is stopped, and the suction hole 2f and the suction groove 2c return to the atmospheric state.
However, in this state, the suction holding of the plate-like workpiece W by suction is released from one end opening of the suction hole 2f, but the adhesive surface 2a1 of the adhesive pad 2a is adhered to the surface W1 of the plate-like workpiece W. The plate-like workpiece W is not displaced relative to the surface 1a of the holding plate 1.

そして、ワーク移送手段Cによる板状ワークWの搬出直前には、図1(b)に示すように、気圧調整手段4が作動開始して、通気孔2gから真空吸引して調圧室2eを負圧にする。
それにより、支持柱2dの周囲空間が真空になって、その容積を収縮しようとして支持板2b全体が支持基板2iへ向け引っ張られて、支持柱2dが板状ワークWの表面W1から離れる方向へ圧縮変形し、それに伴い支持板2bを介して粘着パッド2aが同方向へ移動して板状ワークWの表面W1から粘着面2a1が無理なく引き剥がされる。
この際、支持柱2dは必要量以上に圧縮されないため、支持板2bの調圧室2e側に位置する内面2b′が、調圧室2eの対向面2e′に接着して作動不良を起こすこともない。
Then, immediately before the plate-like workpiece W is carried out by the workpiece transfer means C, as shown in FIG. 1B, the air pressure adjusting means 4 starts to operate, and the pressure adjusting chamber 2e is opened by vacuum suction from the vent hole 2g. Use negative pressure.
As a result, the space around the support column 2d is evacuated, the entire support plate 2b is pulled toward the support substrate 2i in an attempt to shrink its volume, and the support column 2d moves away from the surface W1 of the plate-like workpiece W. As a result, the adhesive pad 2a moves in the same direction via the support plate 2b, and the adhesive surface 2a1 is peeled off from the surface W1 of the plate-like workpiece W without difficulty.
At this time, since the support column 2d is not compressed more than necessary, the inner surface 2b 'located on the pressure regulating chamber 2e side of the support plate 2b adheres to the opposing surface 2e' of the pressure regulating chamber 2e, causing malfunction. Nor.

その後、ワーク移送手段Cによる板状ワークWの搬出が完了すると、図1(c)に示すように、気圧調整手段4の作動が停止して、通気孔2gからの真空吸引が停止され、調圧室2eが大気状態に戻る。
それにより、支持柱2dの周囲空間がその容積を膨張しようとして支持柱2dが板状ワークWの表面W1に接近する方向へ伸張変形し、それに伴い支持柱2dの形状が弾性的に復元して、支持板2b及び粘着パッド2aが保持板1の表面1aへ向け移動し、該表面1aの延長線近くまで粘着パッド2aの粘着面2a1が移動して、初期状態に戻る。
それ以降は、上述した作動が繰り返される。
Thereafter, when unloading of the plate-like workpiece W by the workpiece transfer means C is completed, as shown in FIG. 1 (c), the operation of the atmospheric pressure adjusting means 4 is stopped, the vacuum suction from the vent hole 2g is stopped, and the adjustment is performed. The pressure chamber 2e returns to the atmospheric state.
As a result, the surrounding space of the support column 2d expands and deforms in a direction in which the support column 2d approaches the surface W1 of the plate-like workpiece W in an attempt to expand its volume, and the shape of the support column 2d is elastically restored accordingly. Then, the support plate 2b and the adhesive pad 2a move toward the surface 1a of the holding plate 1, and the adhesive surface 2a1 of the adhesive pad 2a moves to near the extension line of the surface 1a, returning to the initial state.
Thereafter, the above-described operation is repeated.

したがって、このような実施形態によると、板状ワークWの粘着保持を確実に行うことができるとともに、板状ワークWからの剥離を確実に行うことができる。   Therefore, according to such an embodiment, the plate-like workpiece W can be securely held to be adhered, and can be reliably peeled off from the plate-like workpiece W.

また、図示例では、図2(a)(b)に示すように、吸着溝2cで囲まれた粘着パッド2aの略中心位置を複数の支持柱2dでそれぞれ支えるように、支持柱2dが配置されている。
なお、その他の例として、粘着パッド2aの面積が比較的に小さい場合には、吸着溝2cで囲まれた粘着パッド2aの略中心位置を一つの支持柱2dのみで支えるように配置したり、吸着溝2cで囲まれた粘着パッド2aのいずれかの箇所を支持柱2dで支持するものであれば、例えば図3(a)〜(c)に示すように、吸着溝2cの配置とは関係なく、支持柱2dを等間隔毎に配置しても良い。
このような場合でも、上述した実施形態と同様な作用効果が得られる。
次に、本発明の一実施例を図面に基づいて説明する。
Further, in the illustrated example, as shown in FIGS. 2A and 2B, the support columns 2d are arranged so that the substantially center positions of the adhesive pads 2a surrounded by the suction grooves 2c are supported by the plurality of support columns 2d, respectively. Has been.
As another example, when the area of the adhesive pad 2a is relatively small, the adhesive pad 2a surrounded by the suction groove 2c is disposed so as to be supported by only one support column 2d, If any part of the adhesive pad 2a surrounded by the suction groove 2c is supported by the support pillar 2d, for example, as shown in FIGS. 3A to 3C, it is related to the arrangement of the suction groove 2c. Alternatively, the support columns 2d may be arranged at equal intervals.
Even in such a case, the same effect as the above-described embodiment can be obtained.
Next, an embodiment of the present invention will be described with reference to the drawings.

この実施例は、図4(a)〜(c)に示すように、上下対向する一対の保持板1,1′に対し、板状ワークWとして液晶ディスプレー(LCD)やプラズマディスプレー(PDP)やフレキシブルディスプレーなどのパネルに用いられるガラス基板又はプラスチックフィルム基板を着脱自在に粘着保持させ、これら二枚の基板W,W′を相互に貼り合わせる真空貼り合わせ機に、本発明の実施形態に係るワーク粘着保持装置Aが組み込まれる場合を示している。   In this embodiment, as shown in FIGS. 4 (a) to 4 (c), a pair of holding plates 1 and 1 'that are vertically opposed to each other is used as a plate-like work W such as a liquid crystal display (LCD), a plasma display (PDP), A workpiece according to an embodiment of the present invention is applied to a vacuum laminating machine that detachably adheres and holds a glass substrate or a plastic film substrate used for a panel such as a flexible display and bonds these two substrates W and W ′ to each other. The case where the adhesion holding device A is incorporated is shown.

この真空貼り合わせ機は、例えば金属やセラミックスなどの剛体で歪み(撓み)変形しない厚さの平板状に形成された定盤からなる上下一対の保持板1,1′の平行な表面1a,1a′に、上下基板W,W′をそれぞれ着脱自在に保持させ、それらの周囲に区画形成された閉空間D内が所定の真空度に達してから、上下保持板1,1′を相対的にXYθ方向(水平方向)へ調整移動して、上記基板W,W′同士の位置合わせが行われ、その後、少なくとも基板W,W′のいずれか一方を上下保持板1,1′の表面1a,1a′のいずれか一方から剥離して重ね合わせた後、上記閉空間D内の真空破壊を行い、両基板W,W′の内外に生じる気圧差で基板W,W′の間を所定のギャップまで加圧するものである。   This vacuum bonding machine is a parallel surface 1a, 1a of a pair of upper and lower holding plates 1, 1 'formed of a platen having a thickness that does not deform (bend) with a rigid body such as metal or ceramics. ', The upper and lower substrates W, W' are detachably held, and the upper and lower holding plates 1, 1 'are relatively moved after the inside of the closed space D defined by the surroundings reaches a predetermined degree of vacuum. Adjusting and moving in the XYθ direction (horizontal direction), the substrates W and W ′ are aligned with each other, and then at least one of the substrates W and W ′ is placed on the surfaces 1 a and 1 a of the upper and lower holding plates 1 and 1 ′. After peeling from one of 1a 'and overlapping, a vacuum break in the closed space D is performed, and a predetermined gap is formed between the substrates W and W' due to a pressure difference generated between the inside and outside of the substrates W and W '. To pressurize.

詳しく説明すれば、図4(a)の実線に示すように、上下保持板1,1′が昇降手段(図示せず)でZ方向(上下方向)へ相対的に移動可能に支持され、大気圧の雰囲気中、これら上下保持板1,1′を上下方向へ離した状態でそれぞれの表面1a,1a′に向け、真空貼り合わせ機の外部からワーク移送手段Cにより基板W,W′を搬入し、これら上下保持板1,1′の表面1a,1a′にセットしてそれぞれ保持される。   More specifically, as shown by the solid line in FIG. 4A, the upper and lower holding plates 1 and 1 'are supported by a lifting means (not shown) so as to be relatively movable in the Z direction (up and down direction). In the atmosphere of atmospheric pressure, with the upper and lower holding plates 1 and 1 'separated in the vertical direction, the substrates W and W' are carried in from the outside of the vacuum bonding machine by the work transfer means C toward the respective surfaces 1a and 1a '. The upper and lower holding plates 1 and 1 'are set and held on the surfaces 1a and 1a', respectively.

上記ワーク移送手段(B)によって基板W,W′がセットされた後は、図4(a)の二点鎖線に示すように、前述した昇降手段の作動により上下保持板1,1′を接近移動させて、これら両者間に閉空間Dが区画形成される。   After the substrates W and W 'are set by the work transfer means (B), the upper and lower holding plates 1 and 1' are moved closer to each other by the operation of the elevating means described above, as shown by the two-dot chain line in FIG. By moving, a closed space D is defined between them.

これに続いて、この閉空間Dから吸気手段(図示せず)の作動により、空気を抜いて所定の真空度に達したところで、水平移動手段(図示せず)の作動により、上下保持板1,1′のいずれか一方を他方に対しXYθ方向へ調整移動させることで、それらに保持された基板W,W′同士の位置合わせ(アライメント)として粗合わせと微合わせが順次行われる。   Subsequently, when the air is exhausted from the closed space D by the operation of the intake means (not shown) to reach a predetermined vacuum level, the upper and lower holding plates 1 are operated by the operation of the horizontal moving means (not shown). , 1 ′ is adjusted and moved in the XYθ direction with respect to the other, so that rough alignment and fine alignment are sequentially performed as alignment between the substrates W and W ′ held by them.

これらの位置合わせが完了した後は、上下保持板1,1′に保持された基板W,W′のいずれか一方を他方へ向け移動して、上下基板W,W′の対向面のいずれか一方又は両方に塗布された環状接着剤(シール材)Sを挟むように圧着させることにより、両者間を封止して重ね合わせる。
図示例では、上保持板1′に保持された上基板W′を下動して、下保持板1に保持された下基板Wに対し、該下基板W上の環状接着剤(シール材)Sを挟んで瞬間的に圧着させている。
After these alignments are completed, one of the substrates W and W ′ held by the upper and lower holding plates 1 and 1 ′ is moved toward the other, and one of the opposing surfaces of the upper and lower substrates W and W ′ is moved. By pressure-bonding the annular adhesive (seal material) S applied to one or both, the two are sealed and overlapped.
In the illustrated example, the upper substrate W ′ held on the upper holding plate 1 ′ is moved downward, and the annular adhesive (seal material) on the lower substrate W is moved with respect to the lower substrate W held on the lower holding plate 1. It is crimped instantaneously across S.

その後は、図4(b)に示すように、互いに重ね合わされた上下基板W,W′のいずれか一方に対する上下保持板1,1′の一方の保持を解除し、前述した昇降手段の作動により上下保持板1,1′を互い離隔する方向へ移動させている。
図示例では、上基板W′に対する上保持板1′の保持を解除した後に、この上保持板1′を上動して上基板W′から離隔させている。
Thereafter, as shown in FIG. 4B, the holding of one of the upper and lower holding plates 1 and 1 'with respect to one of the upper and lower substrates W and W' overlapped with each other is released, and the above-described lifting means is operated. The upper and lower holding plates 1, 1 ′ are moved away from each other.
In the illustrated example, after the upper holding plate 1 ′ is released from the upper substrate W ′, the upper holding plate 1 ′ is moved up and separated from the upper substrate W ′.

さらに、これと略同時に前述した吸気手段を逆作動させるか又は別の機構で閉空間D内に空気や窒素を供給して、該閉空間D内の雰囲気を大気圧に戻すことにより、両基板W,W′の内外に生じる気圧差で上下基板W,W′が均等に加圧され、液晶が封入された状態で所定のギャップまで押し潰れて貼り合わせ工程を完了させている。   Further, at the same time, the air intake means described above is reversely operated, or air or nitrogen is supplied into the closed space D by another mechanism, and the atmosphere in the closed space D is returned to atmospheric pressure. The upper and lower substrates W and W ′ are evenly pressed by the pressure difference generated between the inside and outside of W and W ′, and the liquid crystal is squeezed to a predetermined gap to complete the bonding process.

この貼り合わせ工程が完了した後は、上下基板W,W′の他方に対する上下保持板1,1′の他方の保持を解除し、図4(c)に示すように、貼り合わせられた上下基板W,W′をワーク移送手段Cにより真空貼り合わせ機の外部へ搬出させている。
図示例では、下基板Wに対する下保持板1の保持を解除した後に、貼り合わせられた上下基板W,W′をワーク移送手段Cで搬出している。
After this bonding step is completed, the other holding of the upper and lower holding plates 1 and 1 'with respect to the other of the upper and lower substrates W and W' is released, and as shown in FIG. W and W ′ are carried out of the vacuum bonding machine by the work transfer means C.
In the illustrated example, after the holding of the lower holding plate 1 with respect to the lower substrate W is released, the bonded upper and lower substrates W and W ′ are carried out by the work transfer means C.

そして、このような構造の真空貼り合わせ機の上下保持板1,1′のいずれか一方か又は両方には、本発明の実施形態に係るワーク粘着保持装置Aの粘着チャック2を配備している。
図示例では、下保持板1のみに粘着チャック2を配備している。
詳しくは、下保持板1の表面1aのみに凹部1bが形成され、支持板2bと支持基板2iとの間に支持柱2dを挟み込むように積層することでユニット化された粘着チャック2を収納配置している。
さらに、図示例では、スペースの関係上、粘着チャック2を2組しか配置していないが、下基板Wの大きさに対応してそれを移動不能に粘着保持することが可能な数だけ配置している。
The adhesive chuck 2 of the workpiece adhesive holding device A according to the embodiment of the present invention is disposed on either one or both of the upper and lower holding plates 1 and 1 'of the vacuum bonding machine having such a structure. .
In the illustrated example, the adhesive chuck 2 is provided only on the lower holding plate 1.
Specifically, the concave portion 1b is formed only on the surface 1a of the lower holding plate 1, and the unitized adhesive chuck 2 is stored and disposed by stacking so that the support pillar 2d is sandwiched between the support plate 2b and the support substrate 2i. doing.
Furthermore, in the illustrated example, only two sets of the adhesive chucks 2 are arranged because of space, but as many as the number of adhesive chucks that can be immovably held according to the size of the lower substrate W are arranged. ing.

また、上保持板1′の表面1a′には、図示しないが、上述した粘着チャック2、又はその他の構造の粘着チャックや真空吸着チャックや静電チャックなど、若しくはそれらの併用からなる従来周知構造の保持手段と剥離手段を配備している。   Further, although not shown, the surface 1a 'of the upper holding plate 1' has a conventionally well-known structure composed of the above-described adhesive chuck 2, the adhesive chuck of other structure, the vacuum chuck, the electrostatic chuck, or the like, or a combination thereof. The holding means and the peeling means are provided.

このように複数配置された粘着チャック2は、図4(a)に示すように、それぞれの吸引孔2f同士が配管接続されて吸引手段3に通じ、図4(b)(c)に示すように、それぞれの通気孔2g同士が配管接続されて気圧調整手段4に通じている。
これら吸引手段3と気圧調整手段4は、制御手段Bによって前述した実施形態と同様に、前述したワーク移送手段Cや昇降手段や吸気手段や水平移動手段などと連動するように作動制御される。
As shown in FIG. 4 (a), the plurality of adhesive chucks 2 arranged in this way are connected to the suction means 3 by connecting the respective suction holes 2f to each other, as shown in FIGS. 4 (b) and 4 (c). In addition, the air holes 2g are connected to each other by pipes and communicated with the atmospheric pressure adjusting means 4.
The suction means 3 and the atmospheric pressure adjusting means 4 are controlled by the control means B so as to be interlocked with the workpiece transfer means C, the lifting means, the suction means, the horizontal movement means, etc., as in the above-described embodiment.

制御手段Bは、図4(a)の実線に示すような大気圧の雰囲気中で、ワーク移送手段Cによる上下基板W,W′の搬入後に、吸引手段3を作動開始させることにより、各粘着チャック2の吸引孔2fから真空吸引して吸着溝2cを負圧にし、図4(a)の二点鎖線に示すような上下基板W,W′の重ね合わせ後(閉空間Dが真空状態)に、吸引手段3による真空吸引を停止させて吸引孔2fを大気状態に戻し、図4(b)に示すような上下基板W,W′の貼り合わせ完了後(閉空間Dが大気状態)に、気圧調整手段4を作動開始させることにより、通気孔2gから真空吸引して調圧室2eを負圧にし、図4(c)に示すようなワーク移送手段Cによる上下基板W,W′の搬出後に、気圧調整手段4による真空吸引を停止させて通気孔2gを大気状態に戻すように制御している。   The control means B starts the operation of the suction means 3 in the atmosphere of atmospheric pressure as shown by the solid line in FIG. After vacuum suction from the suction hole 2f of the chuck 2 to make the suction groove 2c have a negative pressure, the upper and lower substrates W and W ′ are overlapped as shown by the two-dot chain line in FIG. 4A (the closed space D is in a vacuum state). Then, the vacuum suction by the suction means 3 is stopped to return the suction hole 2f to the atmospheric state, and after the bonding of the upper and lower substrates W and W ′ as shown in FIG. 4B is completed (the closed space D is in the atmospheric state). By starting the operation of the atmospheric pressure adjusting means 4, the pressure adjusting chamber 2e is vacuumed by vacuum suction from the air vent 2g, and the upper and lower substrates W, W 'by the work transferring means C as shown in FIG. After carrying out, vacuum suction by the atmospheric pressure adjusting means 4 is stopped to make the vent hole 2g large. It is controlled to return to the state.

このような実施例では、図4(a)の実線に示すように、ワーク移送手段Cにより下基板Wが下保持板1及び粘着チャック2へ向け搬入されると、吸引手段3が作動開始して、吸引孔2fの一端開口から吸引し、粘着チャック2の外周部又は外周リング2hに下基板Wの表面W1を吸着保持するとともに、吸着溝2cも負圧になる。
この際、例えば板状ワークWの硬度よりも支持板2bの方が柔らかい場合には、板状ワークWに比べて支持板2bの方が下基板Wの表面W1へ向け引っ張られ、それに伴い粘着パッド2aも板状ワークWの表面W1に向け引き寄せられ、ついには粘着パッド2aの粘着面2a1が下基板Wの表面W1に当接して密着する。
In such an embodiment, as shown by the solid line in FIG. 4A, when the lower substrate W is carried into the lower holding plate 1 and the adhesive chuck 2 by the work transfer means C, the suction means 3 starts to operate. Then, suction is performed from one end opening of the suction hole 2f, and the surface W1 of the lower substrate W is sucked and held on the outer peripheral portion of the adhesive chuck 2 or the outer peripheral ring 2h, and the suction groove 2c also becomes negative pressure.
At this time, for example, when the support plate 2b is softer than the hardness of the plate-like workpiece W, the support plate 2b is pulled toward the surface W1 of the lower substrate W as compared with the plate-like workpiece W, and accordingly, the adhesive is adhered. The pad 2a is also drawn toward the surface W1 of the plate-like workpiece W. Finally, the adhesive surface 2a1 of the adhesive pad 2a comes into contact with and adheres to the surface W1 of the lower substrate W.

その後、図4(a)の二点鎖線に示すように、上下基板W,W′の重ね合わせが完了すると、吸引手段3が作動停止して、吸引孔2fからの真空吸引が停止され、吸引孔2f及び吸着溝2cが大気状態に戻る。
しかし、この状態では、粘着パッド2aの粘着面2a1が下基板Wの表面W1に粘着しているため、下保持板1の表面1aに対して下基板Wが位置ズレすることはない。
Thereafter, as shown by a two-dot chain line in FIG. 4A, when the upper and lower substrates W and W ′ are superposed, the suction means 3 is stopped, the vacuum suction from the suction hole 2f is stopped, and the suction is performed. The holes 2f and the suction grooves 2c return to the atmospheric state.
However, in this state, since the adhesive surface 2a1 of the adhesive pad 2a is adhered to the surface W1 of the lower substrate W, the lower substrate W is not displaced with respect to the surface 1a of the lower holding plate 1.

そして、図4(b)に示すように、上下基板W,W′の貼り合わせが完了すると、気圧調整手段4が作動開始して、通気孔2gから真空吸引して調圧室2eが負圧になる。
それにより、支持柱2dの周囲空間が真空になって、その容積を収縮しようとして支持板2b全体が支持基板2iへ向け引っ張られ、それに伴って支持柱2dが下基板Wの表面W1から離れる方向へ圧縮変形し、それにより粘着パッド2aも同方向へ移動して下基板Wの表面W1から粘着パッド2aの粘着面2a1が無理なく引き剥がされる。
この際、支持柱2dは必要量以上に圧縮されないため、支持板2bの調圧室2e側に位置する内面2b′が、調圧室2eの対向面2e′に接着して作動不良を起こすことはない。
Then, as shown in FIG. 4B, when the bonding of the upper and lower substrates W and W ′ is completed, the atmospheric pressure adjusting means 4 starts to operate and is vacuum-sucked from the vent hole 2g, so that the pressure adjusting chamber 2e is negative pressure. become.
As a result, the space around the support column 2d is evacuated, the entire support plate 2b is pulled toward the support substrate 2i in an attempt to shrink its volume, and the support column 2d moves away from the surface W1 of the lower substrate W accordingly. Thus, the adhesive pad 2a also moves in the same direction, and the adhesive surface 2a1 of the adhesive pad 2a is peeled off from the surface W1 of the lower substrate W without difficulty.
At this time, since the support column 2d is not compressed more than necessary, the inner surface 2b 'located on the pressure regulating chamber 2e side of the support plate 2b adheres to the opposing surface 2e' of the pressure regulating chamber 2e, causing malfunction. There is no.

その後、ワーク移送手段Cによる上下基板W,W′の搬出が完了すると、図4(c)に示すように、気圧調整手段4の作動が停止して、通気孔2gからの真空吸引が停止され、調圧室2eが大気状態に戻る。
それにより、支持柱2dの周囲空間がその容積を膨張しようとして支持柱2dが伸張変形し、それに伴い支持柱2dの形状が弾性的に復元して、支持板2bと粘着パッド2aが上昇を開始し、その粘着面2a1が下保持板1の表面1aと略同じ高さ位置まで上昇して、初期状態に戻る。
それ以降は、上述した作動が繰り返される。
Thereafter, when unloading of the upper and lower substrates W, W ′ by the workpiece transfer means C is completed, the operation of the atmospheric pressure adjusting means 4 is stopped as shown in FIG. 4C, and the vacuum suction from the vent hole 2g is stopped. The pressure regulating chamber 2e returns to the atmospheric state.
As a result, the space around the support column 2d expands and the support column 2d expands and deforms, and the shape of the support column 2d is restored elastically, and the support plate 2b and the adhesive pad 2a start to rise. Then, the adhesive surface 2a1 rises to a height position substantially the same as the surface 1a of the lower holding plate 1, and returns to the initial state.
Thereafter, the above-described operation is repeated.

したがって、このような実施例によると、下基板Wの粘着保持を確実に行うことができるとともに、貼り合わされた上下基板W,W′からの剥離を確実に行うことができる。
それにより、精度良く貼り合わせが完了した上下基板W,W′の合わせズレを防止することができる。
Therefore, according to such an embodiment, the lower substrate W can be securely adhered and peeled off from the bonded upper and lower substrates W and W ′.
Thereby, it is possible to prevent misalignment of the upper and lower substrates W and W ′ that have been bonded together with high accuracy.

なお、前示実施例では、本発明のワーク粘着保持装置Aが、上下対向する一対の保持板1,1′に対し、板状ワークWとして液晶ディスプレーなどのパネルに用いられるガラス基板又はプラスチックフィルム基板を着脱自在に粘着保持させ、これら二枚の基板W,W′を相互に貼り合わせる真空貼り合わせ機に、本発明の実施形態に係るワーク粘着保持装置Aが組み込まれる場合を示したが、これに限定されず、この真空貼り合わせ機以外の基板組立装置や、基板を搬送する基板搬送装置に該ワーク粘着保持装置Aを組み込んだり、LCDパネル用ガラス基板又はプラスチックフィルム基板以外の板状ワークを粘着保持しても良い。   In the embodiment shown above, the workpiece adhesive holding device A of the present invention is a glass substrate or plastic film used for a panel such as a liquid crystal display as a plate-like workpiece W with respect to a pair of holding plates 1 and 1 'opposed to each other vertically. Although the substrate is detachably adhered and held, and the workpiece adhesion holding device A according to the embodiment of the present invention is incorporated in a vacuum bonding machine that bonds these two substrates W and W ′ to each other, However, the present invention is not limited thereto, and the workpiece adhesive holding device A is incorporated into a substrate assembly device other than this vacuum bonding machine or a substrate transfer device for transferring a substrate, or a plate-like workpiece other than a glass substrate for LCD panels or a plastic film substrate. May be adhered and held.

A ワーク粘着保持装置 B 制御手段
C ワーク移送手段 D 閉空間
S 環状接着剤(シール材) W,W′ 板状ワーク(基板)
W1 表面 1,1′ 保持板
1a,1a′ 表面 2 粘着チャック
2a 粘着パッド 2b 支持板
2c 吸着溝 2d 支持柱
2e 調圧室 2f 吸引孔
2g 通気孔 2h 外周リング
2i 支持基板 3 吸引手段
4 気圧調整手段
A Workpiece adhesive holding device B Control means C Workpiece transfer means D Closed space S Annular adhesive (sealing material) W, W 'Plate work (substrate)
W1 surface 1,1 'holding plate 1a, 1a' surface 2 adhesive chuck 2a adhesive pad 2b support plate 2c suction groove 2d support column 2e pressure regulating chamber 2f suction hole 2g vent hole 2h outer ring 2i support substrate 3 suction means 4 pressure adjustment means

Claims (5)

保持板(1)と、該保持板(1)の表面側に配置されて板状ワーク(W)を着脱自在に粘着保持する粘着チャック(2)とを有し、
前記粘着チャック(2)は、
前記板状ワーク(W)と対向して複数配置される粘着パッド(2a)と、
前記粘着パッド(2a)の裏面に連続して前記板状ワーク(W)に沿うように形成され、前記粘着チャック(2)を前記板状ワーク(W)との対向方向へ移動自在に支持する支持板(2b)と、
前記粘着パッド(2a)と隣接して前記板状ワーク(W)と対向するように形成される気圧調整可能な吸着溝(2c)と、
前記支持板(2b)の裏面から連続して前記板状ワーク(W)との対向方向へ伸縮自在に形成される支持柱(2d)と、
前記支持柱(2d)の周囲に形成される気圧調整可能な調圧室(2e)とを備え、
前記吸着溝(2c)が負圧になることで、前記粘着パッド(2a)を前記板状ワーク(W)及び前記支持板(2b)の両側から圧縮して該粘着パッド(2a)と前記板状ワーク(W)の表面(W1)とを当接させ、
前記調圧室(2e)が負圧になることで、前記支持柱(2d)を前記板状ワーク(W)の表面(W1)から前記粘着パッド(2a)が離隔するように圧縮させることを特徴とするワーク粘着保持装置。
A holding plate (1), and an adhesive chuck (2) disposed on the surface side of the holding plate (1) to detachably hold the plate-like workpiece (W);
The adhesive chuck (2)
A plurality of adhesive pads (2a) arranged opposite to the plate-like workpiece (W);
The adhesive pad (2a) is continuously formed on the back surface of the adhesive pad (2a) along the plate-like workpiece (W), and supports the adhesive chuck (2) so as to be movable in a direction facing the plate-like workpiece (W). A support plate (2b);
A suction groove (2c) capable of adjusting the atmospheric pressure, which is formed adjacent to the adhesive pad (2a) and facing the plate-like workpiece (W);
A support column (2d) formed so as to be stretchable in a direction facing the plate-like workpiece (W) continuously from the back surface of the support plate (2b);
A pressure regulation chamber (2e) capable of adjusting the atmospheric pressure formed around the support column (2d),
When the suction groove (2c) becomes a negative pressure, the adhesive pad (2a) is compressed from both sides of the plate-like work (W) and the support plate (2b), and the adhesive pad (2a) and the plate are compressed. The surface (W1) of the workpiece (W),
When the pressure regulating chamber (2e) becomes a negative pressure, the support column (2d) is compressed so that the adhesive pad (2a) is separated from the surface (W1) of the plate-like workpiece (W). A workpiece adhesive holding device.
前記支持柱(2d)を弾性変形可能な材料で形成し、前記調圧室(2e)の負圧時を除いて、前記粘着パッド(2a)が前記保持板(1)の表面(1a)と接近するように該支持柱(2d)を伸張させることを特徴とする請求項1記載のワーク粘着保持装置。   The support column (2d) is formed of an elastically deformable material, and the adhesive pad (2a) is formed on the surface (1a) of the holding plate (1) except when negative pressure is applied to the pressure regulating chamber (2e). 2. The work adhesive holding device according to claim 1, wherein the support pillar (2d) is extended so as to approach. 前記支持板(2b)及び前記支持柱(2d)を弾性変形可能な材料で一体形成することを特徴とする請求項1又は2記載のワーク粘着保持装置。   The work adhesive holding device according to claim 1 or 2, wherein the support plate (2b) and the support column (2d) are integrally formed of an elastically deformable material. 前記吸着溝(2c)に通ずる吸引手段(3)と、前記調圧室(2e)に通ずる気圧調整手段(4)と、これら吸引手段(3)及び気圧調整手段(4)をそれぞれ作動制御する制御手段(B)とを備え、
この制御手段(B)は、前記板状ワーク(W)の搬入後に前記吸引手段(3)を作動させて前記吸着溝(2c)を負圧にし、前記板状ワーク(W)の搬出直前に、前記気圧調整手段(4)を作動させて前記調圧室(2e)を負圧にする
ことを特徴とする請求項1、2又は3記載のワーク粘着保持装置。
The suction means (3) communicating with the suction groove (2c), the atmospheric pressure adjusting means (4) communicating with the pressure regulating chamber (2e), and the suction means (3) and the atmospheric pressure adjusting means (4) are controlled to operate. Control means (B),
This control means (B) operates the suction means (3) after carrying in the plate-like workpiece (W) to make the suction groove (2c) negative pressure, and immediately before carrying out the plate-like workpiece (W). The work pressure-sensitive adhesive holding device according to claim 1, 2, or 3, wherein the pressure adjusting chamber (2e) is set to a negative pressure by operating the atmospheric pressure adjusting means (4).
請求項1〜4のいずれか一つに記載のワーク粘着保持装置(A)を、対向する一対の保持板(1,1′)のいずれか一方か又は両方に設け、このワーク粘着保持装置(A)で真空中に板状ワーク(W)を粘着保持して、もう一つの板状ワーク(W′)に貼り合わせることを特徴とする真空貼り合わせ機。   The workpiece adhesive holding device (A) according to any one of claims 1 to 4 is provided on either one or both of a pair of opposing holding plates (1, 1 '), and the workpiece adhesive holding device ( A vacuum bonding machine characterized in that the plate-like workpiece (W) is adhered and held in a vacuum in A) and bonded to another plate-like workpiece (W ′).
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