JP5303717B2 - Polymer blend material and method for producing the same - Google Patents

Description

  The present invention relates to a polymer blend material and a manufacturing method thereof, and more particularly to a polymer blend material having a phase separation structure in an arbitrary exposure pattern and a manufacturing method thereof.

  A material having a fine structure such as a semiconductor device is usually processed using a photomask in which a portion that transmits light and a portion that does not transmit light are geometrically engraved. In microfabrication using a photomask, a photoresist is applied to the material, the mask pattern is transferred to the material by exposure using the photomask, and then the photoresist on the light irradiated or non-irradiated portion is removed. It is done by.

  However, the photomask has a problem that the pattern that can be created is limited. Specifically, in the photomask, the light intensity can be changed depending on the place, but spots are generated in the light intensity irradiated to the material. In other words, the photomask controls the light transmittance by applying chromium plating to the surface of quartz glass, etc., so the thickness of the quartz glass becomes a problem, and the interface between the chromium plating and the quartz glass in the photomask. Then, the diffraction of irradiation light will arise by the difference in the transmittance | permeability. For this reason, it is difficult to form a pattern as designed on a sample.

As a pattern forming method that does not use a photomask, a method of directly projecting an arbitrary pattern designed on a computer using light to transfer the pattern onto a material is known (for example, Non-Patent Documents 1 and 2). reference).
Murakami Taiji, Hidaka Takahiro, Ohashi Takeshi, "Photosensitive film for laser exposure", Hitachi Chemical Technical Report, No. 37 (2001-7), pages 21-24 Akihisa Ichihashi, Makoto Blacksmith, Takashi Kumaki, Takeshi Ohashi, Junichi Tsuji, “Photosensitive film for micromirror array direct drawing”, Hitachi Chemical Technical Report, No. 44 (2005-1), pages 9-12

  However, the above-described conventional configuration has a problem that a fine structure on a molecular scale cannot be arbitrarily formed due to a theoretical limit determined by the wavelength of light to be irradiated.

  As a method of forming a fine structure on a molecular scale, a method using a phase separation structure is known, but a phase separation structure is formed in an exposure pattern formed by irradiating light having an arbitrary light intensity distribution. The knowledge to do is not known at all.

  The present invention has been made in view of the above-mentioned problems, and the object thereof is a polymer blend material in which a phase separation structure is formed in an exposure pattern formed by irradiating light having an arbitrary light intensity distribution. Is to realize. Furthermore, it is to realize a method for producing a polymer blend material having a phase separation structure in an exposure pattern based on an arbitrary pattern.

  In order to solve the above problems, a polymer blend material according to the present invention is a polymer blend material containing at least two types of polymers, and has an exposure pattern corresponding to light having a light intensity distribution. It is characterized by having a separation structure.

  According to the said structure, there exists an effect that the polymer blend material in which not only the exposure pattern formed with the irradiated light but the phase-separation structure further formed in this exposure pattern can be provided. Since the phase separation structure is configured on a molecular scale, a filter capable of separating various compounds due to a difference in molecular size, an optical filter in which an arbitrary fine structure is formed by molecules having different optical properties, By building a microstructure on a molecular scale, a material with increased strength can be realized.

  Further, in order to solve the above problems, the polymer blend material according to the present invention is a polymer blend material containing at least two types of polymers, and the exposure pattern is formed by phase separation structures having different characteristic lengths. It is a feature.

  According to the said structure, there exists an effect that the polymer blend material by which arbitrary patterns with a high freedom degree (complex) were formed by the phase-separation structure from which characteristic length differs can be provided. That is, in the above configuration, since the fine structure is formed by the phase separation structure, the fine structure is formed on a molecular scale. Therefore, a filter that can separate various compounds due to the difference in molecular size, an optical filter in which an arbitrary fine structure is formed by molecules with different optical characteristics, and a fine structure built on a molecular scale. It is possible to realize a material with an improved resistance.

  In the polymer blend material according to the present invention, the characteristic length of the phase separation structure is preferably in the range of 1 to 6 μm.

  According to the said structure, there exists the further effect that the material of the fine structure which cannot be formed by conventional techniques, such as a photomask, can be provided.

  In order to solve the above problems, a method for producing a polymer blend material according to the present invention provides light having a light intensity distribution for at least two types of compounds selected from the group consisting of at least two types of monomers and / or polymers. And an exposure pattern is formed on the compound, and a phase separation structure is formed in the exposure pattern by performing a multimerization reaction of the compound at a reaction rate corresponding to the intensity of light. Yes.

  According to the said method, there exists an effect that the polymer blend material in which arbitrary fine structures (complex) with a high freedom degree were formed by the phase-separation structure can be manufactured. Therefore, a filter that can separate various compounds due to the difference in molecular size, an optical filter in which an arbitrary fine structure is formed by molecules with different optical characteristics, and a fine structure built on a molecular scale. It is possible to manufacture a material with increased resistance.

  In the method for producing a polymer blend material according to the present invention, the light is preferably irradiated by a projector.

  In the above method, light having an arbitrary light intensity distribution can be easily irradiated. Further, in the projector, for example, compared with the case where a photomask is used, the irradiation light is not diffracted due to the difference in transmittance, so that a finer exposure pattern can be formed. Furthermore, the projector is inexpensive and can emit light with various light intensity distributions at low cost. Therefore, according to the said method, there exists the further effect that the polymer blend material in which the microstructure was formed can be manufactured easily at low cost.

  Furthermore, the degree of freedom is increased by using a projector that can change the exposure pattern dynamically with time as well as irradiating a pre-designed exposure pattern statically. Polymer blend materials with (complex) microstructures formed can be produced.

  In the method for producing a polymer blend material according to the present invention, the light is preferably visible light.

  In the above method, since visible light is used, there is an additional effect that it can be manufactured more safely than the case of using ultraviolet rays or the like.

  In the method for producing a polymer blend material according to the present invention, the compound is methyl methacrylate and polystyrene, and the methyl methacrylate is preferably subjected to a multimerization reaction by the light.

  Since the monomer and the polymer are excellent in compatibility, there is a further effect that the characteristic length of the phase separation structure can be freely controlled according to the light intensity to be irradiated.

  In the method for producing a polymer blend material according to the present invention, the polystyrene preferably has a substituent that reacts with the light.

  According to the above-described method, a multimerization reaction such as a cross-linking reaction can be caused by the above-described substituent, and therefore, there is a further effect that the phase separation structure can be more stably fixed.

  In the method for producing a polymer blend material according to the present invention, the polystyrene is represented by the following formula.

(In the formula, n and m are each independently an arbitrary integer, and may be block copolymerization or random copolymerization.)
It is preferable to have the structure shown by these.

  According to the above method, since the cinnamic acid, which is stable against heat and moisture, is substituted on the polystyrene as compared with other photoreactive substituents, the phase separation structure is more firmly fixed. There is a further effect that it is possible.

In the production method of the polymer blend material according to the present invention, the intensity of the light is preferably in the range 0.1 mW / cm ² or more 3.0 mW / cm ² below.

  According to the above method, the above-mentioned multimerization reaction can be caused at a suitable rate, so that the characteristic length of the phase separation structure can be freely controlled.

  As described above, the polymer blend material according to the present invention is a polymer blend material containing at least two types of polymers, and has an exposure pattern corresponding to light having a light intensity distribution, and the exposure pattern has a phase separation structure. It is characterized by providing.

  For this reason, there exists an effect that not only the exposure pattern formed with the irradiated light but the polymer blend material by which the fine structure by the phase-separation structure was further formed in this exposure pattern can be provided.

  The polymer blend material according to the present invention is a polymer blend material containing at least two kinds of polymers, and is characterized in that an exposure pattern is formed by phase separation structures having different characteristic lengths.

  For this reason, there is an effect that it is possible to provide a polymer blend material in which an arbitrary fine structure having a high degree of freedom (complex) is formed by a phase separation structure with different special growth.

  As described above, the method for producing a polymer blend material according to the present invention irradiates two or more types of compounds selected from the group consisting of at least two types of monomers and / or polymers with light having a light intensity distribution. Thus, the compound is subjected to a multimerization reaction at a reaction rate corresponding to the intensity of light, thereby forming an exposure pattern on the compound and forming a phase separation structure in the exposure pattern.

  For this reason, there exists an effect that not only the exposure pattern formed with the irradiated light but the polymer blend material by which the fine structure by the phase-separation structure was further formed in this exposure pattern can be manufactured.

  An embodiment of the present invention will be described as follows, but the present invention is not limited to this.

  The polymer blend material according to the present embodiment is a polymer blend material containing at least two types of polymers, and has an exposure pattern corresponding to light having a light intensity distribution, and the exposure pattern has a phase separation structure. .

  In addition, the polymer blend material according to the present embodiment includes at least two types of polymers, and an exposure pattern is formed by a phase separation structure having different characteristic lengths.

  In this specification, “phase separation” means a thermodynamically uniform state, that is, when a substance system in one phase changes variables such as temperature and pressure, the two phases (Science Dictionary 5th edition, page 769, Iwanami Shoten). That is, it means that at least two types of polymers in a system (one phase region) containing at least two types of polymers having molecular compatibility are not mixed uniformly but have a structure composed of two or more phases. In such a phase separation structure, the molecular structure of at least one polymer contained in one phase region is changed by a multimerization reaction such as polymerization described later, and is different from the molecular structure of the compound contained in one phase region. It is caused by becoming a thing. For example, when the phase separation structure is made of polystyrene and polymethacrylate, the phase containing many polystyrenes and the phase containing many polymethacrylates form a continuous phase together. In addition, the “characteristic length” in the present specification means an average value of the size (length) of the periodic structure in the phase separation structure.

  In the present specification, the “exposure pattern” refers to a pattern formed on a polymer blend material based on a specific pattern projected by, for example, a projector. Further, “A to B” indicating a range means that the range is A or more and B or less.

  The at least two kinds of polymers need to be compatible with each other before irradiation with light in order to cause phase separation. Examples of such polymer combinations include, for example, a combination of polymethyl methacrylate and polystyrene, a combination of polystyrene and polyvinyl methyl ether, a combination of polystyrene and polybutadiene, a combination of polystyrene and polyacrylate, a polystyrene and polybutyl methacrylate, The combination etc. are mentioned.

  The exposure pattern is formed by the difference in the phase separation state of the at least two kinds of polymers. In the exposure pattern, a phase separation structure having a specific characteristic length is formed. Hereinafter, this will be specifically described with reference to FIG.

  FIG. 2 is a drawing showing the state of the polymer blend material in Example 1 described later.

  For example, as shown in FIG. 2A, a black spherical portion is a phase containing a lot of polymethyl methacrylate, and a light-colored portion is a phase containing a lot of PS, and a phase separation structure is formed by the two portions. ing.

  The characteristic length is not particularly limited, but is more preferably in the range of 1 to 100 μm, and still more preferably in the range of 1 to 6 μm.

  The polymer blend material mentioned above can be manufactured by the manufacturing method shown below, for example.

  The method for producing a polymer blend material according to the present embodiment irradiates two or more kinds of compounds selected from the group consisting of at least two kinds of monomers and / or polymers with light having a light intensity distribution, and Production of a polymer blend material characterized in that an exposure pattern is formed on the compound and a phase separation structure is formed in the exposure pattern by subjecting the compound to a multimerization reaction at a reaction rate corresponding to the intensity of light. Is the method.

  In the present embodiment, the “multimerization reaction” is a reaction in which a bond is formed between two or more molecules, such as polymerization and crosslinking reaction. Further, in the above multimerization reaction, when polymerization of monomers and cross-linking of the polymerized monomers occur, when cross-linking of the polymers occurs, the polymer chain length is extended, and further, the polymers with extended chain length are Any of the cases where it is crosslinked are included.

  In the method for producing a polymer blend material according to the present embodiment, an arbitrary exposure pattern is formed by changing the increase rate of the molecular weight due to the monomer and / or polymer multimerization reaction according to the intensity of light to be irradiated. Specifically, for example, in the case of a mixture of a monomer that is polymerized by light irradiation and a polymer that does not react by light irradiation, the monomer is polymerized at a reaction rate according to the light irradiation intensity by irradiating the mixture with light. To do. Then, the monomers are polymerized to induce phase separation in the mixture. The phase separation speed at this time depends on the viscosity of the mixture resulting from the polymerization of the monomers. For this reason, in the portion irradiated with intense light, the polymerization rate of the monomer increases, and the mixture solidifies before the phase separation structure grows sufficiently, so the phase separation structure has a small period (small characteristic length). It becomes. On the other hand, in the portion irradiated with weak light, the polymerization rate of the monomer is slow, and the mixture is solidified after the phase separation structure is sufficiently grown, resulting in a phase separation structure with a large period (large characteristic length). .

  The combination of the monomer and / or polymer is not particularly limited as long as they are compatible with each other. For example, when there are two types of compounds, any combination of monomers and monomers, monomers and polymers, and polymers and polymers can be used as long as they have compatibility.

  Specifically, for example, methyl methacrylate, styrene and its derivatives, alkyl methacrylate, or the like can be used as the monomer. As the polymer, polystyrene, polymethyl methacrylate, polyalkyl methacrylate, and derivatives thereof can be used. In these, since it is excellent in compatibility, the combination of methyl methacrylate and styrene is more preferable.

  Moreover, if the said monomer and / or polymer become a polymer after light irradiation, it is not necessary for all kinds of compounds to cause a multimerization reaction. It is sufficient that at least one of these compounds causes a multimerization reaction by irradiated light. For example, a combination of a reactive monomer and a non-reactive polymer, a reactive monomer and a reactive polymer, a reactive polymer and a non-reactive polymer, a reactive polymer and a reactive polymer, or the like may be used.

  If the said monomer reacts with the light irradiated, it does not need to react with the monomer itself with light like the monomer which has a photoreactive group. In that case, the monomer may be subjected to a multimerization reaction with a polymerization initiator or the like that acts on the irradiated light. The polymerization initiator is not particularly limited as long as it acts by the light. For example, diphenyl- (2,4,6-trimethylbenzoyl) phosphine oxide, Irgacure 651, Irgacure 184, Irgacure 784 and the like are conventionally known. A polymerization initiator can be used.

  The degree of polymerization of the polymer is not particularly limited, and may be a dimer or more. That is, the polymer includes oligomers such as dimers and trimers. For example, the number average molecular weight within the range of 1,000 to 10,000 can be used.

  Examples of the polymer that reacts with light include compounds having a structure in which the above-described polymer is substituted with a photoreactive group (a substituent that reacts with light). The substitution position of the photoreactive group is not particularly limited, and examples thereof include a polymer side chain, a polymer main chain, and a polymer main chain end. The photoreactive group may react directly with the light or may react indirectly with a photosensitizer or the like.

  Examples of the photoreactive group include a cinnamoyl group and an anthryl group.

  As the polymer that reacts by the light,

(In the formula, n and m are each independently an arbitrary integer, and may be block copolymerization or random copolymerization.)
What has the structure represented by these is preferable.

  The photosensitizer is not particularly limited as long as it absorbs the light and causes the reaction of the photoreactive group. Examples thereof include 5-nitroacenaphthene and 2,4-dimethylthioxanthone. It is done.

  The said light can be irradiated with a projector, for example. The projector is not particularly limited as long as it is a conventionally known projector capable of irradiating light having an arbitrary light intensity distribution. More preferably, it is a projector. Since a DLP projector can output a high-luminance and high-definition image, it can emit light having a light intensity distribution with a finer pattern.

  Light having a light intensity distribution based on the pattern can be irradiated by projecting a gray scale pattern with a projector or the like, for example. Specifically, the light intensity emitted from the color closer to black in the gray scale becomes weaker and the light intensity emitted from the color closer to white becomes stronger. By increasing the types of colors used in the gray scale, phase-separated structures having different characteristic lengths corresponding to the types of colors can be formed.

  The pattern can be easily produced by creating a geometric pattern with commercially available software or the like. In the photomask, it takes cost and time to change the pattern. However, if the method according to this embodiment is used, various patterns can be manufactured instantaneously at low cost. Furthermore, in the method according to the present embodiment, light interference does not occur unlike a photomask, so that an arbitrary pattern can be irradiated without spots, and a clear exposure pattern can be formed.

  Furthermore, it is preferable not only to irradiate a pre-designed exposure pattern statically but also to irradiate a pre-programmed space-time pattern. Specifically, the spatio-temporal pattern is a program that changes the exposure pattern dynamically with time, or moves the exposure pattern with time using an XYZ stage, etc. Is a pattern in which the shape (space) of the exposure pattern is changed with time by using together. By irradiating such a spatiotemporal pattern, it is possible to produce a polymer blend material in which a more flexible (complex) microstructure is formed.

  As an apparatus for producing a polymer blend material using the projector, for example, an apparatus having the configuration shown in FIG.

  FIG. 1 is a plan view showing a schematic configuration of an apparatus for producing a polymer blend material according to the present embodiment.

  As shown in FIG. 1, the projector 1 is connected to a computer 4, and an image pattern input by the computer 4 can be projected by the projector 1. Further, a series of lenses 2 are provided between the projector 1 and the sample 3 in order to irradiate the sample 3 (polymer blend material before light irradiation) with light from the projector 1. In addition, a microscope 5 linked to the computer 7 and the CCD camera 6 is provided on the opposite side of the sample 3 from which light is irradiated so that the state of phase separation of the polymer blend material during light irradiation can be observed.

  The apparatus includes a microscope 5, a CCD camera 6, and a computer 7 for observing the phase separation state while irradiating, but these configurations are provided when it is not necessary to observe the phase separation state. May not be provided.

The intensity of light to be irradiated is selected according to the monomer and / or polymer to be used. For example, when methyl methacrylate is used as the monomer and a polystyrene derivative is used as the polymer, 0.1 mW / cm ² or more and 3.0 mW / It can be in the range of cm ² or less. If the light intensity is weaker than 0.1 mW / cm ² , the multimerization reaction cannot be performed. If the light intensity exceeds 3.0 W / cm ² , the multimerization reaction proceeds rapidly and the polymer is cured. Therefore, phase separation cannot be caused.

  The irradiation time is also selected according to the intensity of light to be irradiated and the monomer and / or polymer used, and can be performed in about 1 hour, for example.

  Since the reaction rate can be controlled by changing the light intensity in the above range, the characteristic length of the phase separation structure can be arbitrarily adjusted by adjusting the light intensity, and an arbitrary light intensity distribution can be obtained. It is possible to produce a polymer blend material in which a fine structure is formed by a phase separation structure having a different characteristic length in an exposure pattern formed by irradiating light having the same.

  Since the polymer blend material has a pattern formed by phase separation structures having different characteristic lengths, for example, a material having a fine structure is provided by removing only a portion of an arbitrary phase separation structure with a solvent or the like. be able to. The above material can be used for, for example, a filter having a fine structure. Since such a filter has a fine structure with a molecular size, it can separate substances on a molecular scale.

  Moreover, in the said polymer blend material, the optical filter with which the fine structure was formed in molecular size is realizable by combining two or more types of polymers from which an optical characteristic differs, and forming a fine structure, for example.

  Furthermore, by forming a fine structure by combining two or more kinds of polymers having different physical properties, a material having various characteristics in which a fine structure is formed with a molecular size can be realized.

〔Example〕
EXAMPLES The present invention will be described below in more detail with reference to examples, but the present invention is not limited to these examples. In this embodiment, U3-810SF manufactured by Plus Vision Co., Ltd. was used as the projector.

Example 1
The following structure in which cinnamic acid is substituted for polystyrene as a polymer

(In the formula, n and m are each independently an arbitrary integer, and may be block copolymerization or random copolymerization.)
(Hereinafter referred to as PSC) and methyl methacrylate (hereinafter referred to as MMA) was used as a monomer. PSC was obtained by copolymerizing 90 g of styrene as a monomer and 10 g of chloromethylstyrene at 60 ° C. under vacuum for 120 hours to obtain a random copolymer of styrene and chloromethylstyrene, and then cinnamic acid prepared in methanol. Together with 1.5 g of the potassium salt, PSC was obtained by stirring at 65 ° C. for 10 hours in 1.5 L of a solvent such as dimethylformamide. The number average molecular weight of PSC was 300,000. In addition, although the polymerization initiator is not used in the present Example, reaction time can also be accelerated | stimulated using the polymerization initiator mentioned above.

  PSC and MMA are mixed at a weight ratio of 20:80, and diphenyl- (2,4,6-trimethylbenzoyl) phosphine oxide (trade name: Lucillin TPO, manufactured by BASF Japan Ltd.) is 2 with respect to the weight of MMA. %, 5-nitroacenaphthene was added at 10% based on the weight of the PSC. After stirring for 1 hour, the mixture was filled between two cover glasses using an aluminum spacer (thickness: 25 μm) and used as a sample.

The sample was set in the apparatus shown in FIG. 1, and the sample was irradiated with light having a uniform light intensity of 0.1 mW / cm ² for 60 minutes. Further, the light intensity ^{0.5mW / cm 2, 1.0mW / cm} 2, was carried out in the same manner on the case of changing each 3.0 mW / cm ^2. The results are shown in FIG. 2 and FIG.

Figure 2 is a view representing a state of the polymer blend material, (a) is a case where the light intensity is 0.1mW / cm ^2, (b) is the case of light intensity is 0.5 mW / cm ² , (c) is a case where the light intensity is 1.0mW / cm ^2, (d) is a case where the light intensity is 3.0 mW / cm ^2. Note that the 2 μm ⁻¹ scale images shown in the upper right of (a) to (b) in FIG. 2 are obtained by fast Fourier transforming each 20 μm scale image. The characteristic length was obtained by evaluating the size of the periodic structure using the fast Fourier transform method. Specifically, if a donut-shaped circle is present in a 2 μm ⁻¹ scale image, it can be determined that the image has a specific periodic structure. Such Fourier transform can be performed by using, for example, commercially available analysis software.

  FIG. 3 is a graph showing the relationship between the irradiated light intensity and the characteristic length.

As shown in FIG. 2, when the light intensity is as weak as 0.1 mW / cm ² , the phase separation structure grows because the polymerization rate of MMA and the crosslinking rate of PSC are slow, and the bicontinuous phase separation structure having a large period Is expressed. Then, as the light intensity increases, the solidification of the phase separation structure becomes faster, and therefore the period of the phase separation structure that appears is reduced. Further, as shown in FIG. 3, when the light intensity increases, the characteristic length in the phase separation structure tends to decrease linearly.

When the light intensity was higher than 3.0 mW / cm ² , the polymerization of MMA proceeded in an instant, so that the phase separation structure could not be confirmed with a microscope. Further, when the light intensity was made weaker than 0.1 mW / cm ² , the developed co-continuous phase separation structure was cut and a droplet structure was formed. The droplet structure is a structure in which phases are discontinuous and cut into a ball shape, and there is a risk that the strength may be weaker or the transmission characteristics may be deteriorated compared to the case of a bicontinuous structure. is there.

From this, it can be seen that when the light intensity is in the range of 0.1 to 3.0 mW / cm ² , a co-continuous phase separation structure appears, and the characteristic length of the structure changes depending on the light intensity. It was.

(Example 2)
In Example 1, a polymer blend material was manufactured in the same manner as in Example 1 except that a concentric pattern as shown in FIG. 4 was used as the pattern of light intensity to be irradiated. In the concentric circle pattern shown in FIG. 4, the radius of the outermost circle is 4000 μm on the sample, a circle is drawn every radius of 250 μm, and the light intensity is different in adjacent regions. Specifically, the light intensity pattern is as shown in FIG.

  FIG. 6 shows a photomicrograph of the polymer blend material after irradiation with the above pattern for 1 hour. In FIG. 6, since the magnification of the microscope is low (40 times), the phase separation structure in each pattern cannot be confirmed, but the size of the phase separation structure can be indirectly confirmed. That is, if the phase separation structure is large, the observation light of the microscope is easily scattered and the transmitted light is weakened. For this reason, an image is projected darkly. On the other hand, if the phase separation structure is small, the observation light of the microscope is difficult to be scattered, so that the transmitted light becomes strong. For this reason, an image is projected brightly.

  FIG. 7 shows an image obtained by a microscope having a magnification of 400 times. As shown in FIG. 7, it can be confirmed that the phase separation structure is expressed depending on the light intensity. The characteristic lengths (ξ) of A, B, and C in FIG. 7 were 2.5 μm, 4.2 μm, and 3.0 μm, respectively.

  As described above, it is possible to produce a polymer blend material in which a phase separation structure is formed in an exposure pattern formed by irradiating light having an arbitrary light intensity distribution.

  Since the polymer blend material of the present invention has a phase separation structure, it has a fine structure on a molecular scale. For this reason, it can be suitably used for various materials that can be widely used in medicine, bioindustry, general material fields, etc., such as filters and optical filters having a fine structure formed on a molecular scale.

It is a top view which shows schematic structure of the apparatus for manufacturing the polymer blend material which concerns on this Embodiment. It is drawing which shows the state of the polymer blend material in Example 1, (a) is a case where light intensity is 0.1 mW / cm < ² >, (b) is a case where light intensity is 0.5 mW / cm < ² >. , (c) is a case where the light intensity is 1.0mW / cm ^2, (d) is a case where the light intensity is 3.0 mW / cm ^2. It is a graph which shows the relationship between light intensity and a characteristic wavelength. 6 is a plan view showing a concentric pattern used in Example 2. FIG. It is a graph which shows the relationship between the distance from the center in the said concentric circle pattern, and light intensity. 6 is a diagram illustrating a state of a polymer blend material in Example 2. It is drawing which shows the state of the polymer blend material in Example 2, (a) shows the area | region A, (b) shows the area | region B, (c) shows the area | region C.

Claims (7)

A polymer blend material containing a polymer obtained by multimerization reaction of alkyl methacrylate and a polymer obtained by multimerization reaction of polystyrene having cinnamoyl group or anthryl group , corresponding to light having light intensity distribution A polymer blend material comprising: an exposed pattern, wherein the exposed pattern has a phase separation structure having different characteristic lengths.   The polymer blend material according to claim 1, wherein the alkyl methacrylate is methyl methacrylate. Irradiating visible light having a light intensity distribution with a projector to polystyrene having an alkyl methacrylate and a cinnamoyl group or an anthryl group causes the compound to undergo a multimerization reaction at a reaction rate corresponding to the intensity of the light. Thus, an exposure pattern is formed on the compound, and a phase separation structure having a different characteristic length is formed in the exposure pattern. The alkyl methacrylate, the production method of the polymer blend material according to claim 3, characterized in that the methyl methacrylate. At least two types of compounds selected from the group consisting of at least two types of monomers and / or polymers are irradiated with light having a light intensity distribution, and the amount of the compounds is increased at a reaction rate corresponding to the intensity of the light. It is a method for producing a polymer blend material that forms an exposure pattern on the compound by reacting, and forms a phase separation structure having a different characteristic length in the exposure pattern.
The compound is methyl methacrylate and polystyrene, and by the light, methyl methacrylate multimerizes,
The polystyrene has a substituent that reacts with the light,
The polystyrene is
(In the formula, n and m are each independently an arbitrary integer, and may be block copolymerization or random copolymerization.)
The manufacturing method of the polymer blend material characterized by having the structure shown by these. The intensity of the light, 0.1 mW / cm ² or more, the production method of the polymer blend material according to claim 5, characterized in that in the range of 3.0 mW / cm ² or less.   The polymer blend material manufactured by the manufacturing method of any one of Claims 3-6.