JP5248032B2 - Silicon-containing compound, curable composition, and cured product - Google Patents
Silicon-containing compound, curable composition, and cured product Download PDFInfo
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- JP5248032B2 JP5248032B2 JP2007112735A JP2007112735A JP5248032B2 JP 5248032 B2 JP5248032 B2 JP 5248032B2 JP 2007112735 A JP2007112735 A JP 2007112735A JP 2007112735 A JP2007112735 A JP 2007112735A JP 5248032 B2 JP5248032 B2 JP 5248032B2
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- Prior art keywords
- silicon
- containing compound
- group
- parts
- carbon atoms
- Prior art date
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- 239000002210 silicon-based material Substances 0.000 title claims description 106
- 239000000203 mixture Substances 0.000 title claims description 81
- -1 Z is Chemical group 0.000 claims description 147
- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- 239000003054 catalyst Substances 0.000 claims description 31
- 125000001931 aliphatic group Chemical group 0.000 claims description 21
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 15
- 125000003342 alkenyl group Chemical group 0.000 claims description 11
- 125000000304 alkynyl group Chemical group 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 7
- 229920006395 saturated elastomer Polymers 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 description 101
- 229920001296 polysiloxane Polymers 0.000 description 73
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 70
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 48
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 46
- 125000002015 acyclic group Chemical group 0.000 description 40
- 239000002904 solvent Substances 0.000 description 38
- 239000000463 material Substances 0.000 description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 31
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 238000006243 chemical reaction Methods 0.000 description 23
- 229910052697 platinum Inorganic materials 0.000 description 23
- 239000000243 solution Substances 0.000 description 23
- 125000004122 cyclic group Chemical group 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 16
- 229910000077 silane Inorganic materials 0.000 description 16
- 238000005342 ion exchange Methods 0.000 description 15
- 238000005227 gel permeation chromatography Methods 0.000 description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 13
- 229910052731 fluorine Inorganic materials 0.000 description 13
- 239000011737 fluorine Substances 0.000 description 13
- 125000003545 alkoxy group Chemical group 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 12
- 238000006482 condensation reaction Methods 0.000 description 12
- 125000005843 halogen group Chemical group 0.000 description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000006460 hydrolysis reaction Methods 0.000 description 11
- 230000007062 hydrolysis Effects 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 9
- 230000001588 bifunctional effect Effects 0.000 description 9
- 239000007809 chemical reaction catalyst Substances 0.000 description 9
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 8
- 229910052794 bromium Inorganic materials 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 8
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 8
- 229910052740 iodine Inorganic materials 0.000 description 8
- 239000011630 iodine Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000002243 precursor Substances 0.000 description 8
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 150000003613 toluenes Chemical class 0.000 description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- 229910010272 inorganic material Inorganic materials 0.000 description 7
- 239000011147 inorganic material Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 6
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 description 6
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 6
- 239000011256 inorganic filler Substances 0.000 description 6
- 229910003475 inorganic filler Inorganic materials 0.000 description 6
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical group [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 229910052805 deuterium Inorganic materials 0.000 description 5
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 5
- 229910003471 inorganic composite material Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003963 antioxidant agent Substances 0.000 description 4
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 4
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 239000000499 gel Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 125000005372 silanol group Chemical group 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- 229920005573 silicon-containing polymer Polymers 0.000 description 3
- RMZNKGBPQWTSFN-UHFFFAOYSA-N 2,2-diphenylethoxy(methyl)silane Chemical compound C[SiH2]OCC(C1=CC=CC=C1)C1=CC=CC=C1 RMZNKGBPQWTSFN-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 208000034189 Sclerosis Diseases 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 2
- YETKAVVSNLUTEQ-UHFFFAOYSA-N diethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OCC)(OCC)CCCCCCCC YETKAVVSNLUTEQ-UHFFFAOYSA-N 0.000 description 2
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 2
- TYXIAHKLJMLPIP-UHFFFAOYSA-N dimethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)CCCCCCCC TYXIAHKLJMLPIP-UHFFFAOYSA-N 0.000 description 2
- DVYUOQXRGHUWKE-UHFFFAOYSA-N dimethyl(2-phenylethoxy)silane Chemical compound C[SiH](C)OCCC1=CC=CC=C1 DVYUOQXRGHUWKE-UHFFFAOYSA-N 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- DFJDZTPFNSXNAX-UHFFFAOYSA-N ethoxy(triethyl)silane Chemical compound CCO[Si](CC)(CC)CC DFJDZTPFNSXNAX-UHFFFAOYSA-N 0.000 description 2
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 2
- ZVJXKUWNRVOUTI-UHFFFAOYSA-N ethoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OCC)C1=CC=CC=C1 ZVJXKUWNRVOUTI-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000002530 phenolic antioxidant Substances 0.000 description 2
- XHTWKNPMPDIELI-UHFFFAOYSA-N phenylmethoxysilane Chemical compound [SiH3]OCC1=CC=CC=C1 XHTWKNPMPDIELI-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- HUZZQXYTKNNCOU-UHFFFAOYSA-N triethyl(methoxy)silane Chemical compound CC[Si](CC)(CC)OC HUZZQXYTKNNCOU-UHFFFAOYSA-N 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 description 1
- RDIQSILFKNEUQG-UHFFFAOYSA-N 2,4,6,8,10,12,14-heptakis(ethenyl)-2,4,6,8,10,12,14-heptamethyl-1,3,5,7,9,11,13-heptaoxa-2,4,6,8,10,12,14-heptasilacyclotetradecane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 RDIQSILFKNEUQG-UHFFFAOYSA-N 0.000 description 1
- WZBJIDCEZGPVHX-UHFFFAOYSA-N 2,4,6,8,10,12-hexaethyl-1,3,5,7,9,11-hexaoxa-2$l^{3},4$l^{3},6$l^{3},8$l^{3},10$l^{3},12$l^{3}-hexasilacyclododecane Chemical compound CC[Si]1O[Si](CC)O[Si](CC)O[Si](CC)O[Si](CC)O[Si](CC)O1 WZBJIDCEZGPVHX-UHFFFAOYSA-N 0.000 description 1
- JDLPYWQTHJDXFQ-UHFFFAOYSA-N 2,4,6,8,10,12-hexakis(ethenyl)-2,4,6,8,10,12-hexamethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 JDLPYWQTHJDXFQ-UHFFFAOYSA-N 0.000 description 1
- KHRAMGTWHCXSPR-UHFFFAOYSA-N 2,4,6,8,10,12-hexakis-phenyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound O1[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH](C=2C=CC=CC=2)O[SiH]1C1=CC=CC=C1 KHRAMGTWHCXSPR-UHFFFAOYSA-N 0.000 description 1
- UGKULRZSGOCTNI-UHFFFAOYSA-N 2,4,6,8,10-pentaethyl-1,3,5,7,9,2$l^{3},4$l^{3},6$l^{3},8$l^{3},10$l^{3}-pentaoxapentasilecane Chemical compound CC[Si]1O[Si](CC)O[Si](CC)O[Si](CC)O[Si](CC)O1 UGKULRZSGOCTNI-UHFFFAOYSA-N 0.000 description 1
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- 229910052623 talc Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- RSNQKPMXXVDJFG-UHFFFAOYSA-N tetrasiloxane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH3] RSNQKPMXXVDJFG-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 230000026683 transduction Effects 0.000 description 1
- 238000010361 transduction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
本発明は、特定の構造を有する新規なケイ素含有化合物、該化合物を含有してなる硬化性組成物、及び該組成物を熱硬化させてなる硬化物に関し、詳しくは、ハンドリング性及び硬化性に優れ、透明性及び可撓性に優れた硬化物を形成する硬化性組成物を与えるケイ素含有化合物、これを含有する硬化性組成物、並びに透明性及び可撓性に優れた硬化物に関する。 The present invention relates to a novel silicon-containing compound having a specific structure, a curable composition containing the compound, and a cured product obtained by thermally curing the composition, and more particularly to handling properties and curability. The present invention relates to a silicon-containing compound that provides a curable composition that forms a cured product excellent in transparency, flexibility, and a curable composition containing the same, and a cured product excellent in transparency and flexibility.
有機性素材及び無機性素材を組み合わせた複合材料は、さまざまな研究がなされており、工業的にも、有機高分子に無機充填剤を複合させる手法や、金属表面を有機高分子で修飾するコーティングの手法等が利用されている。これらの有機・無機複合材料では、それを構成している素材がマイクロメートルオーダー以上の大きさを持っているため、一部の物性を予想以上に向上させることはできるものの、他の多くの性能や物性は、単純に有機性素材及び無機性素材それぞれの性能や物性の加成則から予想される値を示すに過ぎない。 Various researches have been conducted on composite materials combining organic and inorganic materials, and industrially, techniques for combining inorganic fillers with organic polymers, and coatings that modify metal surfaces with organic polymers. These methods are used. In these organic / inorganic composite materials, the material that composes them is larger than the micrometer order, so some physical properties can be improved more than expected, but many other performances. The physical properties simply indicate values expected from the addition rules of the performance and physical properties of the organic material and the inorganic material, respectively.
一方、近年、有機性素材及び無機性素材の各素材のドメインの大きさがナノメートルオーダー、更には分子レベルで組み合わされた有機・無機複合材料が盛んに研究されている。このような材料は、各素材としての特性を併せ持つのみならず、各素材の長所を兼ね備え、更には加成則では予想ができない、各素材自体とは全く異なる新しい機能性を有する材料となることが期待される。 On the other hand, in recent years, organic / inorganic composite materials in which the sizes of domains of organic materials and inorganic materials are in the order of nanometers and are combined at the molecular level have been actively studied. Such materials not only have the characteristics of each material, but also have the advantages of each material, and also have a new functionality that is completely different from each material itself, which cannot be predicted by the additive law. There is expected.
このような有機・無機複合材料には、共有結合を介して一方の素材及び他方の素材が分子レベルで結合された化学結合型、並びに、一方の素材をマトリックスとして、この中に他方の素材を微細に分散・複合化させた混合型がある。これらの有機・無機複合材料に使用される無機性素材を合成する手法としてゾル・ゲル法がよく利用されているが、このゾル・ゲル法とは、前駆体分子の加水分解とそれに続く重縮合反応により、架橋した無機酸化物が低温で得られる反応である。このゾル・ゲル法で得られる無機性素材は、短期間でゲル化する等、保存安定性が悪いという問題がある。 Such an organic / inorganic composite material includes a chemical bond type in which one material and the other material are bonded at a molecular level through a covalent bond, and one material as a matrix, and the other material is contained therein. There is a mixed type that is finely dispersed and combined. The sol-gel method is often used as a method for synthesizing inorganic materials used in these organic-inorganic composite materials. This sol-gel method involves hydrolysis of precursor molecules followed by polycondensation. This reaction is a reaction in which a crosslinked inorganic oxide is obtained at a low temperature. The inorganic material obtained by this sol-gel method has a problem of poor storage stability, such as gelation in a short period of time.
非特許文献1では、アルキルトリアルコキシシランのアルキル基の鎖長による縮合速度の相違に着目し、メチルトリメトキシシランの重縮合後に、重縮合速度の遅い長鎖アルキルトリアルコキシシランを添加して、ポリシロキサン中のシラノール基を封止すること、更には、アルミニウム触媒を用いてメチルトリメトキシシランの重縮合反応を行い、所定の分子量に到達した時点でアセチルアセトンを添加して、反応系中で配位子交換を行うことにより、保存安定性の改良を試みている。しかし、これらの方法では、保存安定性の改善は不充分であった。また、ゾル・ゲル法で得られた無機性素材は可撓性に問題があった。 In Non-Patent Document 1, paying attention to the difference in condensation rate due to the chain length of the alkyl group of the alkyltrialkoxysilane, after the polycondensation of methyltrimethoxysilane, a long-chain alkyltrialkoxysilane having a slow polycondensation rate is added, Sealing the silanol groups in the polysiloxane, and further performing a polycondensation reaction of methyltrimethoxysilane using an aluminum catalyst, adding acetylacetone when the molecular weight is reached, and distributing it in the reaction system. We are trying to improve storage stability by exchanging ligands. However, these methods have been insufficient in improving storage stability. In addition, the inorganic material obtained by the sol-gel method has a problem in flexibility.
これに対し、化学結合型の有機・無機複合材料として、特定のケイ素含有重合体を含有する硬化性組成物が提案されている。例えば、特許文献1には、橋かけ構造を有しアルケニル又アルキニル基を有するケイ素含有重合体(A)と、橋かけ構造を有しシラン基を有する珪素含有重合体(B)と、白金系触媒(D)とを含有し、ハンドリング性及び硬化性に優れ、得られる硬化物の耐熱性にも優れたケイ素含有硬化性組成物が開示されている。しかし、このケイ素含有硬化性組成物は、硬化特性が必ずしも充分とは言えず、低温、短時間で充分な性能を有する硬化物を得ることができないという問題を有していた。 On the other hand, a curable composition containing a specific silicon-containing polymer has been proposed as a chemically bonded organic / inorganic composite material. For example, Patent Document 1 discloses a silicon-containing polymer (A) having a crosslinked structure and an alkenyl or alkynyl group, a silicon-containing polymer (B) having a crosslinked structure and a silane group, and a platinum-based polymer. A silicon-containing curable composition containing a catalyst (D), excellent in handling properties and curability, and excellent in heat resistance of the resulting cured product is disclosed. However, this silicon-containing curable composition does not necessarily have sufficient curing characteristics, and has a problem that a cured product having sufficient performance cannot be obtained at a low temperature in a short time.
本発明の目的は、ハンドリング性及び硬化性に優れ、得られる硬化物が透明性及び可撓性に優れる硬化性組成物を提供することにある。 The objective of this invention is providing the curable composition which is excellent in handling property and sclerosis | hardenability, and the obtained hardened | cured material is excellent in transparency and flexibility.
本発明者らは、上記課題を解決すべく検討を進めた結果、特定の構造を有するケイ素含有化合物及びこれを含有してなる硬化性組成物が、上記の課題を解決することを見出し、本発明を完成するに至った。 As a result of investigations to solve the above-mentioned problems, the present inventors have found that a silicon-containing compound having a specific structure and a curable composition containing the same solve the above-mentioned problems. The invention has been completed.
本発明は、下記一般式(1)で表されるケイ素含有化合物を提供するものである。 The present invention provides a silicon-containing compound represented by the following general formula (1).
また、本発明は、(A1)下記一般式(1’)で表されるケイ素含有化合物、(B1)上記ケイ素含有化合物、及び(C)ヒドロシリル化反応触媒を含有してなる硬化性組成物を提供するものである。
Further, the present invention is, (A1) a silicon-containing compound represented by the following general formula (1 '), (B1) the upper Symbol silicon-containing compound, and (C) curable composition containing the hydrosilylation catalyst Is to provide.
また、本発明は、上記硬化性組成物を硬化させてなるケイ素含有硬化物を提供するものである。 The present invention also provides a silicon-containing cured product obtained by curing the above curable composition.
本発明によれば、ハンドリング性及び硬化性に優れた硬化性組成物、耐熱性、透明性及び柔軟性に優れた硬化物、並びにこれらを与えるケイ素含有化合物を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the curable composition excellent in handling property and sclerosis | hardenability, the hardened | cured material excellent in heat resistance, transparency, and a softness | flexibility, and the silicon-containing compound which gives these can be provided.
まず、上記一般式(1)で表される本発明のケイ素含有化合物について説明する。
上記一般式(1)において、Ra〜Reで表される炭素原子数1〜12の飽和脂肪族炭化水素基としては、メチル、エチル、プロピル、イソプロピル、ブチル、第2ブチル、第3ブチル、イソブチル、アミル、イソアミル、第3アミル、ヘキシル、2−ヘキシル、3−ヘキシル、シクロヘキシル、1−メチルシクロヘキシル、ヘプチル、2−ヘプチル、3−ヘプチル、イソヘプチル、第3ヘプチル、n−オクチル、イソオクチル、第3オクチル、2−エチルヘキシル、ノニル、イソノニル、デシル、ドデシル等が挙げられる。
First, the silicon-containing compound of the present invention represented by the general formula (1) will be described.
In the general formula (1), the saturated aliphatic hydrocarbon group having 1 to 12 carbon atoms represented by R a to R e is methyl, ethyl, propyl, isopropyl, butyl, secondary butyl, tertiary butyl. , Isobutyl, amyl, isoamyl, tertiary amyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, tertiary heptyl, n-octyl, isooctyl, Tertiary octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl and the like can be mentioned.
また、Reで表される飽和脂肪族炭化水素基で置換されていてもよい炭素原子数6〜12の芳香族炭化水素基は、置換基である飽和脂肪族炭化水素基も含めた全体で炭素原子数が6〜12である。置換基である飽和脂肪族炭化水素基としては、例えば、上に例示した飽和脂肪族炭化水素基のうち、上記炭素原子数を満たすことができるものを採用することができる。従って、Reで表される飽和脂肪族炭化水素基で置換されていてもよい炭素原子数6〜12の芳香族炭化水素基としては、フェニル、ナフチル、2−メチルフェニル、3−メチルフェニル、4−メチルフェニル、3−イソプロピルフェニル、4−イソプロピルフェニル、4−ブチルフェニル、4−イソブチルフェニル、4−第3ブチルフェニル、4−ヘキシルフェニル、4−シクロヘキシルフェニル、2,3−ジメチルフェニル、2,4−ジメチルフェニル、2,5−ジメチルフェニル、2,6−ジメチルフェニル、3,4−ジメチルフェニル、3,5−ジメチルフェニル、シクロヘキシルフェニル、ビフェニル、2,4,5−トリメチルフェニル等が挙げられる。 Further, the aromatic hydrocarbon group having a saturated aliphatic hydrocarbon group carbon atoms which may be substituted with 6-12 represented by R e is a whole, including the saturated aliphatic hydrocarbon group that is a substituent The number of carbon atoms is 6-12. As a saturated aliphatic hydrocarbon group which is a substituent, what can satisfy | fill the said carbon atom number can be employ | adopted among the saturated aliphatic hydrocarbon groups illustrated above, for example. Therefore, the aromatic hydrocarbon group having a saturated aliphatic hydrocarbon group carbon atoms which may be substituted with 6-12 represented by R e, phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 3-isopropylphenyl, 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl, 4-tert-butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 2,3-dimethylphenyl, 2 , 4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, cyclohexylphenyl, biphenyl, 2,4,5-trimethylphenyl, etc. It is done.
また、Yで表される炭素原子数2〜4のアルキレン基としては、−CH2CH2−、−CH2CH2CH2−、−CH2CH2CH2CH2−、−CH(CH3)CH2−、−CH2CH(CH3)−等が挙げられる。
Zで表される炭素原子数2〜4のアルケニル基としては、CH2=CH−、CH2=CH−CH2−、CH2=CH−CH2−CH2−、CH2=C(CH3)−、CH2=C(CH3)−CH2−、CH2=CH−CH(CH3)−等が挙げられ、Zで表される炭素原子数2〜4のアルキニル基としては、例えば下記の基が挙げられる。
Further, the alkylene group having 2 to 4 carbon atoms represented by Y, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH 2 CH 2 CH 2 CH 2 -, - CH (CH 3) CH 2 -, - CH 2 CH (CH 3) - , and the like.
Examples of the alkenyl group having 2 to 4 carbon atoms represented by Z include CH 2 ═CH—, CH 2 ═CH—CH 2 —, CH 2 ═CH—CH 2 —CH 2 —, CH 2 ═C (CH 3 )-, CH 2 ═C (CH 3 ) —CH 2 —, CH 2 ═CH—CH (CH 3 ) — and the like, and examples of the alkynyl group having 2 to 4 carbon atoms represented by Z include For example, the following groups are mentioned.
上記一般式(1)で表される本発明のケイ素含有化合物の好ましい形態は、下記一般式(2)で表されるケイ素含有化合物である。下記一般式(2)で表されるケイ素含有化合物は、上記一般式(1)で表されるケイ素含有化合物のうち、T=Kのものである。通常の合成手法により得られるものは、下記一般式(2)で表されるケイ素含有化合物か、上記一般式(1)で表されるケイ素含有化合物の複数種の混合物であって、下記一般式(2)で表されるケイ素含有化合物を主な成分とするものである。例えば、上記一般式(1)のK−Tが1より大きい数である化合物は、シクロポリシロキサン環を導入する化合物として多官能の(RaSiHO)Kで表されるシクロポリシロキサンを用いた場合であっても、生成はわずかである。これは、シクロポリシロキサンの2つ以上のSi−Hに非環状のポリシロキサンがYを介して結合した化合物の生成は、エネルギー的に大きく不利であるためである。 A preferred form of the silicon-containing compound of the present invention represented by the general formula (1) is a silicon-containing compound represented by the following general formula (2). The silicon-containing compound represented by the following general formula (2) is T = K among the silicon-containing compounds represented by the above general formula (1). What is obtained by the usual synthesis method is a silicon-containing compound represented by the following general formula (2) or a mixture of a plurality of silicon-containing compounds represented by the above general formula (1), The main component is the silicon-containing compound represented by (2). For example, the compound in which KT in the general formula (1) is a number larger than 1 uses a polyfunctional (R a SiHO) K cyclopolysiloxane as a compound for introducing a cyclopolysiloxane ring. Even in cases, production is negligible. This is because the formation of a compound in which an acyclic polysiloxane is bonded to two or more Si—H of cyclopolysiloxane via Y is greatly disadvantageous in terms of energy.
上記一般式(1)又は一般式(2)におけるRa〜Rdは、得られる硬化物の耐熱性が良好であるので、メチル基が好ましい。 R a to R d in the general formula (1) or the general formula (2) are preferably methyl groups because the resulting cured product has good heat resistance.
また、上記一般式(1)又は一般式(2)におけるReは、得られる硬化物の耐光性が良好であるので、炭素原子数1〜12の飽和脂肪族炭化水素基が好ましく、得られる硬化物の耐熱性も良好であるので、メチル基がより好ましい。 In addition, R e in the above general formula (1) or general formula (2) is preferably a saturated aliphatic hydrocarbon group having 1 to 12 carbon atoms because the cured product obtained has good light resistance. Since the cured product has good heat resistance, a methyl group is more preferable.
また、上記一般式(2)におけるkは、2〜7である。7より大きいと、官能基数が多すぎて得られる硬化物に必要な可撓性が得られない。kは、2〜5であるものが工業的に容易に原料入手が可能であり、官能基の数が適正なので好ましく、3が最も好ましい。 Moreover, k in the said General formula (2) is 2-7. When it is larger than 7, the flexibility required for the cured product obtained by having too many functional groups cannot be obtained. The k is preferably 2 to 5, since it can be easily obtained industrially and the number of functional groups is appropriate, and 3 is most preferable.
本発明のケイ素含有化合物の質量平均分子量は、3000〜100万である。3000より小さいと得られる硬化物の耐熱性が不充分となり、100万より大きいと粘度が大きくなりハンドリングに支障をきたす。質量平均分子量は、5000〜50万が好ましく、1万〜10万がより好ましい。 The mass average molecular weight of the silicon-containing compound of the present invention is 3,000 to 1,000,000. If it is less than 3000, the resulting cured product has insufficient heat resistance, and if it is greater than 1 million, the viscosity increases and hinders handling. The mass average molecular weight is preferably 5,000 to 500,000, and more preferably 10,000 to 100,000.
本発明のケイ素含有化合物は、その製造方法により、特に制限されることはなく、周知の反応を応用して製造することができる。以降の製造方法は、本発明のケイ素含有化合物の上記一般式(2)で表されるものを代表として、上記一般式(2)におけるZが水素原子であるものと、Zが炭素原子数2〜4のアルケニル基又はアルキニル基であるものについて、順に説明する。
尚、以下、上記一般式(1)又は(2)におけるZが水素原子であるものを、それぞれケイ素含有化合物(A1)又は(A2)、上記一般式(1)又は(2)におけるZが炭素原子数2〜4のアルケニル基又はアルキニル基であるものを、それぞれケイ素含有化合物(B1)又は(B2)とする。
The silicon-containing compound of the present invention is not particularly limited by the production method, and can be produced by applying a known reaction. Subsequent production methods are represented by the general formula (2) of the silicon-containing compound of the present invention as a representative. In the general formula (2), Z is a hydrogen atom, and Z is 2 carbon atoms. What is -4 alkenyl group or alkynyl group is demonstrated in order.
Hereinafter, those in which Z in the above general formula (1) or (2) is a hydrogen atom, respectively, the silicon-containing compound (A1) or (A2), Z in the above general formula (1) or (2) is carbon. What is an alkenyl group or alkynyl group having 2 to 4 atoms is defined as a silicon-containing compound (B1) or (B2), respectively.
上記一般式(2)におけるZが水素原子であるケイ素含有化合物(A2)の製造方法について以下に説明する。
ケイ素含有化合物(A2)は、例えば、不飽和結合を有する非環状ポリシロキサン化合物(a1)を前駆体として、環状ポリシロキサン化合物(a2)を反応させることで得ることができる。
上記の不飽和結合を有する非環状ポリシロキサン化合物(a1)は、1種類又は2種類以上の2官能シラン化合物を加水分解による縮合反応を行った後、pが1の場合は1官能モノシラン化合物、pが3の場合は3官能モノシラン化合物、pが4の場合は4官能モノシラン化合物と反応させ、更に不飽和基を有する1官能シラン化合物と反応させて得ることができる。pが2の場合は、縮合反応の後、不飽和基を有する1官能のシラン化合物と反応させて得ることができる。これらのシラン化合物の官能基として代表的なものは、アルコキシ基、ハロゲン基又は水酸基である。不飽和結合を有する非環状ポリシロキサン化合物(a1)と環状ポリシロキサン化合物(a2)は、(a1)の不飽和結合炭素と(a2)のSi−H基との反応により結合させる。
A method for producing the silicon-containing compound (A2) in which Z in the general formula (2) is a hydrogen atom will be described below.
The silicon-containing compound (A2) can be obtained, for example, by reacting the cyclic polysiloxane compound (a2) with the acyclic polysiloxane compound (a1) having an unsaturated bond as a precursor.
The acyclic polysiloxane compound (a1) having an unsaturated bond is obtained by subjecting one or two or more types of bifunctional silane compounds to a condensation reaction by hydrolysis. When p is 3, it can be obtained by reacting with a trifunctional monosilane compound, when p is 4, it is reacted with a tetrafunctional monosilane compound, and further reacted with a monofunctional silane compound having an unsaturated group. When p is 2, it can be obtained by reacting with a monofunctional silane compound having an unsaturated group after the condensation reaction. A typical functional group of these silane compounds is an alkoxy group, a halogen group or a hydroxyl group. The acyclic polysiloxane compound (a1) and the cyclic polysiloxane compound (a2) having an unsaturated bond are bonded by a reaction between the unsaturated bond carbon of (a1) and the Si—H group of (a2).
上記の不飽和結合を有する非環状ポリシロキサン化合物(a1)の製造に用いられる上記2官能シラン化合物の例としては、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジブチルジメトキシシラン、ジブチルジエトキシシラン、ジオクチルジメトキシシラン、ジオクチルジエトキシシラン等のジアルコキシモノシラン化合物;これらのジアルコキシモノシラン化合物のアルコキシ基の1つ又は2つを、フッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物;これらのモノシラン化合物が2つ以上縮合したジシロキサン化合物及びオリゴシロキサン化合物が挙げられる。 Examples of the bifunctional silane compound used for the production of the acyclic polysiloxane compound (a1) having the unsaturated bond include dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, and dibutyldimethoxy. Dialkoxymonosilane compounds such as silane, dibutyldiethoxysilane, dioctyldimethoxysilane, dioctyldiethoxysilane; one or two alkoxy groups of these dialkoxymonosilane compounds are selected from the group consisting of fluorine, chlorine, bromine and iodine. Monosilane compounds substituted with selected halogen atoms or hydroxyl groups; disiloxane compounds and oligosiloxane compounds in which two or more of these monosilane compounds are condensed.
上記1官能モノシラン化合物としては、例えば、トリメチルエトキシシラン、トリメチルメトキシシラン、トリエチルエトキシシラン、トリエチルメトキシシラン、トリブチルメトキシシラン、トリブチルエトキシシラン、トリオクチルメトキシシラン、トリオクチルエトキシシラン、トリフェニルエトキシシラン、トリフェニルメトキシシラン、メチルジフェニルエトキシシラン、ジメチルフェニルエトキシシラン等のモノアルコキシシラン化合物;これらのモノアルコキシシラン化合物のアルコキシ基をフッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
上記3官能モノシラン化合物としては、トリスエトキシメチルシラン、トリスメトキシメチルシラン、トリスエトキシエチルシラン、トリスメトキシエチルシラン、トリスエトキシブチルシラン、トリスメトキシブチルシラン、トリスエトキシオクチルシラン、トリスメトキシオクチルシラン、トリスエトキシフェニルシラン、トリスメトキシフェニルシラン等のトリスアルコキシシラン化合物;これらのトリスアルコキシシラン化合物の1〜3個のアルコキシ基を、フッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
上記4官能モノシラン化合物としては、テトラキスエトキシシラン、テトラキスメトキシシラン等のテトラキスアルコキシシラン化合物;これらのテトラキスアルコキシシラン化合物の1〜4個のアルコキシ基をフッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
Examples of the monofunctional monosilane compound include trimethylethoxysilane, trimethylmethoxysilane, triethylethoxysilane, triethylmethoxysilane, tributylmethoxysilane, tributylethoxysilane, trioctylmethoxysilane, trioctylethoxysilane, triphenylethoxysilane, tri Monoalkoxysilane compounds such as phenylmethoxysilane, methyldiphenylethoxysilane, dimethylphenylethoxysilane; the alkoxy groups of these monoalkoxysilane compounds are replaced with halogen atoms or hydroxyl groups selected from the group consisting of fluorine, chlorine, bromine and iodine And monosilane compounds.
Examples of the trifunctional monosilane compound include trisethoxymethylsilane, trismethoxymethylsilane, trisethoxyethylsilane, trismethoxyethylsilane, trisethoxybutylsilane, trismethoxybutylsilane, trisethoxyoctylsilane, trismethoxyoctylsilane, and trisethoxy. Trisalkoxysilane compounds such as phenylsilane and trismethoxyphenylsilane; 1 to 3 alkoxy groups of these trisalkoxysilane compounds are replaced with halogen atoms or hydroxyl groups selected from the group consisting of fluorine, chlorine, bromine and iodine And monosilane compounds.
The tetrafunctional monosilane compound is selected from the group consisting of tetrakisalkoxysilane compounds such as tetrakisethoxysilane and tetrakismethoxysilane; 1-4 alkoxy groups of these tetrakisalkoxysilane compounds are composed of fluorine, chlorine, bromine and iodine. And monosilane compounds substituted with halogen atoms or hydroxyl groups.
上記の不飽和基を有する1官能のシラン化合物としては、ジメチルビニルクロロシラン、ジメチルビニルメトキシシラン、ジメチルビニルエトキシシラン、ジフェニルビニルクロロシラン、ジフェニルビニルエトキシシラン、ジフェニルビニルメトキシシラン、メチルフェニルビニルクロロシラン、メチルフェニルエトキシシラン、メチルフェニルメトキシシラン等が挙げられる。 Examples of the monofunctional silane compound having an unsaturated group include dimethylvinylchlorosilane, dimethylvinylmethoxysilane, dimethylvinylethoxysilane, diphenylvinylchlorosilane, diphenylvinylethoxysilane, diphenylvinylmethoxysilane, methylphenylvinylchlorosilane, and methylphenyl. Examples include ethoxysilane and methylphenylmethoxysilane.
上記環状ポリシロキサン化合物(a2)としては、1,3,5−トリメチルシクロトリシロキサン、1,3,5,7−テトラメチルシクロテトラシロキサン、1,3,5,7,9−ペンタメチルシクロペンタシロキサン、1,3,5,7,9,11−ヘキサメチルシクロヘキサシロキサン、1,3,5,7,9,11,13−ヘプタメチルシクロヘプタシロキサン、1,3,5,7,9,11,13,15−オクタメチルシクロオクタシロキサン、1,3,5−トリエチルシクロトリシロキサン、1,3,5,7−テトラエチルシクロテトラシロキサン、1,3,5,7,9−ペンタエチルシクロペンタシロキサン、1,3,5,7,9,11−ヘキサエチルシクロヘキサシロキサン、1,3,5−トリフェニルシクロトリシロキサン、1,3,5,7−テトラフェニルシクロテトラシロキサン、1,3,5,7,9−ペンタフェニルシクロペンタシロキサン、1,3,5,7,9,11−ヘキサフェニルシクロヘキサシロキサン等が挙げられる。 Examples of the cyclic polysiloxane compound (a2) include 1,3,5-trimethylcyclotrisiloxane, 1,3,5,7-tetramethylcyclotetrasiloxane, 1,3,5,7,9-pentamethylcyclopenta. Siloxane, 1,3,5,7,9,11-hexamethylcyclohexasiloxane, 1,3,5,7,9,11,13-heptamethylcycloheptasiloxane, 1,3,5,7,9, 11,13,15-octamethylcyclooctasiloxane, 1,3,5-triethylcyclotrisiloxane, 1,3,5,7-tetraethylcyclotetrasiloxane, 1,3,5,7,9-pentaethylcyclopenta Siloxane, 1,3,5,7,9,11-hexaethylcyclohexasiloxane, 1,3,5-triphenylcyclotrisiloxane, , 5,7-tetraphenyl cyclotetrasiloxane, 1,3,5,7,9 penta phenyl cyclopentasiloxane, 1,3,5,7,9,11 hexaphenyl cyclohexasiloxane and the like.
尚、上記の2官能シラン化合物、1官能モノシラン化合物、3官能モノシラン化合物、4官能モノシラン化合物、不飽和基を有する1官能のシラン化合物、又は環状ポリシロキサン化合物(a2)として、それぞれの化合物が有する水素原子の一部又は全部が、重水素及び/又はフッ素に置換されているものを用いると、後述する、本発明のケイ素含有化合物の水素原子の一部又は全部が、重水素及び/又はフッ素に置換された化合物を得ることができる。 In addition, each compound has as said bifunctional silane compound, monofunctional monosilane compound, trifunctional monosilane compound, tetrafunctional monosilane compound, monofunctional silane compound having an unsaturated group, or cyclic polysiloxane compound (a2). When a hydrogen atom in which part or all of the hydrogen atom is substituted with deuterium and / or fluorine is used, part or all of the hydrogen atom of the silicon-containing compound of the present invention described later is deuterium and / or fluorine. A compound substituted with can be obtained.
ケイ素含有化合物(A2)の前駆体である不飽和結合を有する非環状ポリシロキサン化合物(a1)を得るための加水分解による縮合反応は、いわゆるゾル・ゲル反応により行えばよい。2官能シラン化合物の加水分解・縮合反応は、アルコキシ基やハロゲン基が水によって加水分解しシラノール基(Si−OH基)を生成し、この生成したシラノール基同士、シラノール基とアルコキシ基、又はシラノール基とハロゲン基が縮合することにより進行する。この加水分解反応を速やかに進ませるためには、適量の水を加えることが好ましく、触媒を加えてもよい。また、空気中の水分、又は水以外の溶媒中に含まれる微量の水によってもこの縮合反応は進行する。この反応には溶媒を用いてもよく、溶媒としては、特に限定されないが、具体的には、例えば、水や、メタノール、エタノール、n−プロパノール、イソプロパノール、n−ブタノール、イソブタノール、アセトン、メチルエチルケトン、ジオキサン、テトラヒドロフラン等の親水性有機溶剤が挙げられ、これらは1種で又は2種以上を混合して用いることができる。 The condensation reaction by hydrolysis for obtaining an acyclic polysiloxane compound (a1) having an unsaturated bond which is a precursor of the silicon-containing compound (A2) may be carried out by a so-called sol-gel reaction. In the hydrolysis / condensation reaction of the bifunctional silane compound, an alkoxy group or a halogen group is hydrolyzed with water to generate a silanol group (Si-OH group), and the generated silanol groups, the silanol group and the alkoxy group, or the silanol It proceeds by the condensation of the group and the halogen group. In order to advance this hydrolysis reaction quickly, it is preferable to add an appropriate amount of water, and a catalyst may be added. In addition, this condensation reaction proceeds also with a minute amount of water contained in water or a solvent other than water. A solvent may be used for this reaction, and the solvent is not particularly limited. Specifically, for example, water, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, acetone, methyl ethyl ketone are used. And hydrophilic organic solvents such as dioxane, tetrahydrofuran and the like. These may be used alone or in combination of two or more.
また、上記の触媒としては、酸又は塩基を使用することができ、具体的には、例えば、塩酸、リン酸、硫酸等の無機酸類;酢酸、p−トルエンスルホン酸、リン酸モノイソプロピル等の有機酸類;水酸化ナトリウム、水酸化カリウム、水酸化リチウム、アンモニア等の無機塩基類;トリエチルアミン、トリエチルアミン、モノエタノールアミン、ジエタノールアミン等のアミン化合物(有機塩基)類;テトライソプロピルチタネート、テトラブチルチタネート等のチタン化合物類;ジブチル錫ラウレート、オクチル錫酸等の錫化合物類;トリフルオロボラン等のホウ素化合物類;アルミニウムトリスアセチルアセテート等のアルミニウム化合物類;鉄、コバルト、マンガン、亜鉛等の金属の塩化物、並びにこれらの金属のナフテン酸塩及びオクチル酸塩等の金属カルボン酸塩類等が挙げられ、これらは1種類で又は2種以上併用で使用することができる。また、2種以上の2官能シラン化合物からの加水分解・縮合反応を行う場合、それぞれ単独である程度加水分解を行ってから、両者を混合して更に加水分解縮合反応を行ってもよく、すべてを混合して一度に加水分解・縮合反応を行ってもよい。 Moreover, as said catalyst, an acid or a base can be used, Specifically, for example, inorganic acids, such as hydrochloric acid, phosphoric acid, a sulfuric acid; Acetic acid, p-toluenesulfonic acid, monoisopropyl phosphate, etc. Organic acids; inorganic bases such as sodium hydroxide, potassium hydroxide, lithium hydroxide and ammonia; amine compounds (organic bases) such as triethylamine, triethylamine, monoethanolamine and diethanolamine; tetraisopropyl titanate, tetrabutyl titanate, etc. Titanium compounds; tin compounds such as dibutyltin laurate and octyl stannic acid; boron compounds such as trifluoroborane; aluminum compounds such as aluminum trisacetylacetate; chlorides of metals such as iron, cobalt, manganese and zinc; As well as naphthenates and esters of these metals. Metal carboxylates such as chill salts and the like, which can be used in combination one kind or two or more types. In addition, when performing a hydrolysis / condensation reaction from two or more types of bifunctional silane compounds, each of them may be hydrolyzed to some extent, and then both may be mixed for further hydrolysis-condensation reaction. You may mix and perform a hydrolysis and a condensation reaction at once.
前駆体である不飽和結合を有する非環状ポリシロキサン化合物(a1)は、上述したように、上記の加水分解・縮合反応の後、さらに、pが1の場合は1官能モノシラン化合物と、pが3の場合は3官能モノシラン化合物と、pが4の場合は4官能モノシラン化合物と反応させてから、不飽和基を有する1官能のシラン化合物と反応させて得ることができ、pが2の場合は、不飽和基を有する1官能のシラン化合物と反応させて得ることができる。 As described above, the acyclic polysiloxane compound (a1) having an unsaturated bond as a precursor is further subjected to the hydrolysis / condensation reaction described above, and when p is 1, a monofunctional monosilane compound and p is When 3 is a trifunctional monosilane compound and when p is 4, it can be obtained by reacting with a monofunctional silane compound having an unsaturated group after reacting with a tetrafunctional monosilane compound. Can be obtained by reacting with a monofunctional silane compound having an unsaturated group.
前駆体である不飽和結合を有する非環状ポリシロキサン化合物(a1)と環状ポリシロキサン化合物(a2)との反応は、ヒドロシリル化反応による方法を用いればよい。例えば、ケイ素含有化合物(A2)は、非環状ポリシロキサン化合物(a1)と環状ポリシロキサン化合物(a2)とを混合し、白金触媒を任意量添加した後に加熱することで得られる。 The reaction between the precursor acyclic polysiloxane compound (a1) having an unsaturated bond and the cyclic polysiloxane compound (a2) may be a method based on a hydrosilylation reaction. For example, the silicon-containing compound (A2) can be obtained by mixing an acyclic polysiloxane compound (a1) and a cyclic polysiloxane compound (a2), adding an arbitrary amount of platinum catalyst, and heating.
上記一般式(2)におけるZが炭素原子数2〜4のアルケニル基又はアルキニル基であるケイ素含有化合物(B2)の製造方法について以下に説明する。 A method for producing the silicon-containing compound (B2) in which Z in the general formula (2) is an alkenyl group or alkynyl group having 2 to 4 carbon atoms will be described below.
ケイ素含有化合物(B2)は、例えば、非環状ポリシロキサン化合物(b1)を前駆体として、不飽和結合を有する環状ポリシロキサン化合物(b2)を反応させることで得ることができる。非環状ポリシロキサン化合物(b1)は、1種類又は2種類以上の2官能のシラン化合物を加水分解による縮合反応を行った後、pが1の場合は1官能モノシラン化合物と、pが3の場合は3官能モノシラン化合物と、pが4の場合は4官能モノシラン化合物と反応させ、更にSi−H基導入化合物と反応させて得ることができる。非環状ポリシロキサン化合物(b1)と不飽和結合を有する環状ポリシロキサン化合物(b2)とは、(b1)のSi−H基と(b2)の不飽和基との反応により結合させる。上記の2官能シラン化合物の代表的な官能基は、アルコキシ基、ハロゲン基又は水酸基である。 The silicon-containing compound (B2) can be obtained, for example, by reacting the cyclic polysiloxane compound (b2) having an unsaturated bond with the acyclic polysiloxane compound (b1) as a precursor. The acyclic polysiloxane compound (b1) is obtained by subjecting one or more bifunctional silane compounds to a condensation reaction by hydrolysis. When p is 1, the monofunctional monosilane compound and p is 3. Can be obtained by reacting a trifunctional monosilane compound with a tetrafunctional monosilane compound when p is 4, and further reacting with a Si—H group-introducing compound. The acyclic polysiloxane compound (b1) and the cyclic polysiloxane compound (b2) having an unsaturated bond are bonded together by a reaction between the Si—H group of (b1) and the unsaturated group of (b2). A typical functional group of the bifunctional silane compound is an alkoxy group, a halogen group or a hydroxyl group.
上記の非環状ポリシロキサン化合物(b1)の製造に用いられる上記2官能シラン化合物の例としては、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジブチルジメトキシシラン、ジブチルジエトキシシラン、ジオクチルジメトキシシラン、ジオクチルジエトキシシラン等のジアルコキシモノシラン化合物;これらのジアルコキシモノシラン化合物のアルコキシ基の1つ又は2つを、フッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物;これらのモノシラン化合物が2つ以上縮合したジシロキサン化合物及びオリゴシロキサン化合物が挙げられる。 Examples of the bifunctional silane compound used in the production of the acyclic polysiloxane compound (b1) include dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, dibutyldimethoxysilane, and dibutyldiethoxy. Dialkoxymonosilane compounds such as silane, dioctyldimethoxysilane, dioctyldiethoxysilane; halogen atoms selected from the group consisting of fluorine, chlorine, bromine and iodine for one or two alkoxy groups of these dialkoxymonosilane compounds; Or monosilane compounds substituted with hydroxyl groups; disiloxane compounds and oligosiloxane compounds in which two or more of these monosilane compounds are condensed.
上記1官能モノシラン化合物としては、例えば、トリメチルエトキシシラン、トリメチルメトキシシラン、トリエチルエトキシシラン、トリエチルメトキシシラン、トリブチルメトキシシラン、トリブチルエトキシシラン、トリオクチルメトキシシラン、トリオクチルエトキシシラン、トリフェニルエトキシシラン、トリフェニルメトキシシラン、メチルジフェニルエトキシシラン、ジメチルフェニルエトキシシラン等のモノアルコキシシラン化合物;これらのモノアルコキシシラン化合物のアルコキシ基をフッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
上記3官能モノシラン化合物としては、例えば、トリスエトキシメチルシラン、トリスメトキシメチルシラン、トリスエトキシエチルシラン、トリスメトキシエチルシラン、トリスエトキシブチルシラン、トリスメトキシブチルシラン、トリスエトキシオクチルシラン、トリスメトキシオクチルシラン、トリスエトキシフェニルシラン、トリスメトキシフェニルシラン等のトリスアルコキシシラン化合物;これらのトリスアルコキシシラン化合物の1〜3個のアルコキシ基を、フッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
上記4官能モノシラン化合物としては、例えば、テトラキスエトキシシラン、テトラキスメトキシシラン等のテトラキシアルコキシシラン化合物;これらのテトラキスアルコキシシラン化合物の1〜4個のアルコキシ基を、フッ素、塩素、臭素及びヨウ素からなる群から選択されるハロゲン原子又は水酸基に置き換えたモノシラン化合物が挙げられる。
Examples of the monofunctional monosilane compound include trimethylethoxysilane, trimethylmethoxysilane, triethylethoxysilane, triethylmethoxysilane, tributylmethoxysilane, tributylethoxysilane, trioctylmethoxysilane, trioctylethoxysilane, triphenylethoxysilane, tri Monoalkoxysilane compounds such as phenylmethoxysilane, methyldiphenylethoxysilane, dimethylphenylethoxysilane; the alkoxy groups of these monoalkoxysilane compounds are replaced with halogen atoms or hydroxyl groups selected from the group consisting of fluorine, chlorine, bromine and iodine And monosilane compounds.
Examples of the trifunctional monosilane compound include trisethoxymethylsilane, trismethoxymethylsilane, trisethoxyethylsilane, trismethoxyethylsilane, trisethoxybutylsilane, trismethoxybutylsilane, trisethoxyoctylsilane, trismethoxyoctylsilane, Trisalkoxysilane compounds such as trisethoxyphenylsilane and trismethoxyphenylsilane; 1 to 3 alkoxy groups of these trisalkoxysilane compounds are halogen atoms or hydroxyl groups selected from the group consisting of fluorine, chlorine, bromine and iodine And monosilane compounds replaced by.
Examples of the tetrafunctional monosilane compound include tetrakisalkoxysilane compounds such as tetrakisethoxysilane and tetrakismethoxysilane; 1-4 alkoxy groups of these tetrakisalkoxysilane compounds are composed of fluorine, chlorine, bromine and iodine. And monosilane compounds substituted with a halogen atom or a hydroxyl group selected from the group.
上記の不飽和結合を有する環状ポリシロキサン化合物(b2)としては、1,3,5−トリメチル−1,3,5−トリビニルシクロトリシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン、1,3,5,7,9−ペンタメチル−1,3,5,7,9−ペンタビニルシクロペンタシロキサン、1,3,5,7,9,11−ヘキサメチル1,3,5,7,9,11−ヘキサビニルシクロヘキサシロキサン、1,3,5,7,9,11,13−ヘプタメチル−1,3,5,7,9,11,13−ヘプタビニルシクロヘプタシロキサン、1,3,5,7,9,11,13,15−オクタメチル−1,3,5,7,9,11,13,15−オクタビニルシクロオクタシロキサン、1,3,5−トリフェニル−1,3,5−トリビニルシクロトリシロキサン、1,3,5,7−テトラフェニル−1,3,5,7−テトラビニルシクロテトラシロキサン、1,3,5,7,9−ペンタフェニル−1,3,5,7,9−ペンタビニルシクロペンタシロキサン等が挙げられる。 Examples of the cyclic polysiloxane compound (b2) having an unsaturated bond include 1,3,5-trimethyl-1,3,5-trivinylcyclotrisiloxane, 1,3,5,7-tetramethyl-1, 3,5,7-tetravinylcyclotetrasiloxane, 1,3,5,7,9-pentamethyl-1,3,5,7,9-pentavinylcyclopentasiloxane, 1,3,5,7,9, 11-hexamethyl 1,3,5,7,9,11-hexavinylcyclohexasiloxane, 1,3,5,7,9,11,13-heptamethyl-1,3,5,7,9,11,13 -Heptavinylcycloheptasiloxane, 1,3,5,7,9,11,13,15-octamethyl-1,3,5,7,9,11,13,15-octavinylcyclooctasiloxane, 1,3 , 5-Triffe 1,3,5-trivinylcyclotrisiloxane, 1,3,5,7-tetraphenyl-1,3,5,7-tetravinylcyclotetrasiloxane, 1,3,5,7,9-penta Examples include phenyl-1,3,5,7,9-pentavinylcyclopentasiloxane.
上記Si−H基導入化合物としては、ジメチルクロロシラン、ジメチルメトキシシラン、ジメチルエトキシシラン、ジフェニルクロロシラン、ジフェニルメトキシシラン、ジフェニルエトキシシラン、フェニルメチルクロロシラン、フェニルメチルメトキシシラン、フェニルメチルエトキシシラン、ヒドロキシジメチルシラン、ヒドロキシジフェニルシラン、ヒドロキシフェニルメチルシラン等が挙げられる。 Examples of the Si-H group-introducing compound include dimethylchlorosilane, dimethylmethoxysilane, dimethylethoxysilane, diphenylchlorosilane, diphenylmethoxysilane, diphenylethoxysilane, phenylmethylchlorosilane, phenylmethylmethoxysilane, phenylmethylethoxysilane, hydroxydimethylsilane, Examples thereof include hydroxydiphenylsilane and hydroxyphenylmethylsilane.
尚、上記の2官能シラン化合物、1官能モノシラン化合物、3官能モノシラン化合物、4官能モノシラン化合物、Si−H基導入化合物、又は不飽和結合を有する環状ポリシロキサン化合物(b2)として、それぞれの化合物が有する水素原子の一部又は全部が重水素及び/又はフッ素に置換されているものを用いると、後述する、本発明のケイ素含有化合物の水素原子の一部又は全部が、重水素及び/又はフッ素に置換された化合物を得ることができる。 In addition, as said bifunctional silane compound, 1 functional monosilane compound, 3 functional monosilane compound, 4 functional monosilane compound, Si-H group introduction | transduction compound, or cyclic polysiloxane compound (b2) which has an unsaturated bond, each compound is as follows. When a hydrogen atom having part or all of hydrogen atoms substituted by deuterium and / or fluorine is used, part or all of the hydrogen atoms of the silicon-containing compound of the present invention described later are deuterium and / or fluorine. A compound substituted with can be obtained.
ケイ素含有化合物(B2)の前駆体である非環状ポリシロキサン化合物(b1)を得るための加水分解による縮合反応は、いわゆるゾル・ゲル反応により行えばよく、これについては、前記の不飽和結合を有する非環状ポリシロキサン化合物(a1)で説明したゾル・ゲル反応と同様である。 The condensation reaction by hydrolysis for obtaining the acyclic polysiloxane compound (b1) which is the precursor of the silicon-containing compound (B2) may be carried out by a so-called sol-gel reaction. This is the same as the sol-gel reaction described in the acyclic polysiloxane compound (a1).
前駆体である非環状ポリシロキサン化合物(b1)と不飽和結合を有する環状ポリシロキサン化合物(b2)との反応は、ヒドロシリル化反応による方法を用いればよい。例えば、非環状ポリシロキサン化合物(b1)と不飽和結合を有する環状ポリシロキサン化合物(b2)とを混合し、白金触媒を任意量添加した後に加熱することで、ケイ素含有化合物(B2)が得られる。 For the reaction between the precursor acyclic polysiloxane compound (b1) and the cyclic polysiloxane compound (b2) having an unsaturated bond, a method based on a hydrosilylation reaction may be used. For example, the silicon-containing compound (B2) can be obtained by mixing the acyclic polysiloxane compound (b1) and the cyclic polysiloxane compound (b2) having an unsaturated bond, adding an arbitrary amount of platinum catalyst, and then heating. .
本発明のケイ素含有化合物は、後述するように硬化性組成物の主成分として用いることができるほか、他の高分子化合物や高分子組成物と混合されて、樹脂、プラスチック改質剤等の用途に用いることもできる。 The silicon-containing compound of the present invention can be used as a main component of a curable composition as will be described later, and is mixed with other polymer compounds or polymer compositions to be used for resins, plastic modifiers, etc. It can also be used.
尚、本発明のケイ素含有化合物の範囲外ではあるが、前記一般式(1)又は(2)中の非環状のシロキサン鎖中には、ホウ素、マグネシウム、アルミニウム、リン、チタン、ジルコニウム、ハフニウム、鉄、亜鉛、ニオブ、タンタル、スズ、テルル等のケイ素以外の元素を導入することが可能である。その方法としては、例えば、これらの他元素供給誘導体を併用して加水分解・縮合反応を行い、シロキサン鎖中にケイ素以外の元素を組み込む方法が挙げられる。また、前記のケイ素含有化合物の水素原子の一部又は全部が、重水素及び/又はフッ素に置換されたものも存在し得る。 Although not within the scope of the silicon-containing compound of the present invention, in the acyclic siloxane chain in the general formula (1) or (2), boron, magnesium, aluminum, phosphorus, titanium, zirconium, hafnium, Elements other than silicon, such as iron, zinc, niobium, tantalum, tin and tellurium, can be introduced. As the method, for example, a method of carrying out hydrolysis / condensation reaction using these other element supply derivatives in combination and incorporating an element other than silicon into the siloxane chain can be mentioned. There may also be those in which part or all of the hydrogen atoms of the silicon-containing compound are substituted with deuterium and / or fluorine.
次に、本発明の硬化性組成物について説明する。
本発明の硬化性組成物は、上記一般式(1)におけるZが水素原子であるケイ素含有化合物(A1)、上記一般式(1)におけるZが炭素原子数2〜4のアルケニル基又はアルキニル基であるケイ素含有化合物(B1)、及びヒドロシリル化反応触媒(C)を必須成分として含有する組成物である。本発明の硬化性組成物は、ケイ素含有化合物(A1)のZ基とケイ素含有化合物(B1)のZ基とを、熱及びヒドロシリル化反応触媒(C)の作用により反応させて硬化する。本発明の硬化性組成物が含有するケイ素含有化合物(A1)及びケイ素含有化合物(B1)それぞれの好ましい形態は、前述したケイ素含有化合物(A2)及びケイ素含有化合物(B2)である。
本発明の硬化性組成物は、ケイ素含有化合物(A1)100質量部に対して、ケイ素含有化合物(B1)を5〜5000質量部含有することが好ましく、10〜1000質量部がより好ましい。また、ヒドロシリル化反応触媒(C)の含有量は、硬化性及び保存安定性の点で、本発明の硬化性組成物中において5質量%以下が好ましく、0.0001〜1.0質量%がより好ましい。5質量%よりも多いと硬化性組成物の安定性に影響を及ぼす場合がある。
Next, the curable composition of this invention is demonstrated.
The curable composition of the present invention includes a silicon-containing compound (A1) in which Z in the general formula (1) is a hydrogen atom, and Z in the general formula (1) is an alkenyl group or alkynyl group having 2 to 4 carbon atoms. The silicon-containing compound (B1) and the hydrosilylation reaction catalyst (C) are essential components. The curable composition of the present invention is cured by reacting the Z group of the silicon-containing compound (A1) and the Z group of the silicon-containing compound (B1) by the action of heat and the hydrosilylation reaction catalyst (C). Preferred forms of the silicon-containing compound (A1) and the silicon-containing compound (B1) contained in the curable composition of the present invention are the silicon-containing compound (A2) and the silicon-containing compound (B2) described above.
The curable composition of the present invention preferably contains 5 to 5000 parts by mass of the silicon-containing compound (B1), more preferably 10 to 1000 parts by mass with respect to 100 parts by mass of the silicon-containing compound (A1). In addition, the content of the hydrosilylation reaction catalyst (C) is preferably 5% by mass or less in the curable composition of the present invention in terms of curability and storage stability, and is 0.0001 to 1.0% by mass. More preferred. If it is more than 5% by mass, the stability of the curable composition may be affected.
本発明に係るヒドロシリル化反応触媒(C)は、ヒドロシリル化反応を促進する白金、パラジウム及びロジウムからなる群から選択される一種以上の金属を含有する公知の触媒である。例えば、白金系触媒としては、白金−カルボニルビニルメチル錯体、白金−ジビニルテトラメチルジシロキサン錯体、白金−シクロビニルメチルシロキサン錯体、白金−オクチルアルデヒド錯体等が挙げられる。パラジウム系触媒及びロジウム系触媒としては、例えば、該白金系触媒において、白金の代わりに同じく白金系金属であるパラジウム又はロジウム等を含有する化合物が挙げられる。これらは一種で用いてもよく、二種以上を併用してもよい。特に硬化性の点から、白金を含有するものが好ましく、具体的には、白金−カルボニルビニルメチル錯体が好ましい。また、クロロトリストリフェニルホスフィンロジウム(I)等の、上記白金系金属を含有するいわゆるWilkinson触媒も、ヒドロシリル化反応触媒(C)に含まれる。 The hydrosilylation reaction catalyst (C) according to the present invention is a known catalyst containing one or more metals selected from the group consisting of platinum, palladium and rhodium that promote the hydrosilylation reaction. For example, examples of the platinum-based catalyst include a platinum-carbonylvinylmethyl complex, a platinum-divinyltetramethyldisiloxane complex, a platinum-cyclovinylmethylsiloxane complex, and a platinum-octylaldehyde complex. Examples of the palladium-based catalyst and the rhodium-based catalyst include compounds containing palladium or rhodium, which are also platinum-based metals, instead of platinum in the platinum-based catalyst. These may be used alone or in combination of two or more. In particular, those containing platinum are preferable from the viewpoint of curability, and specifically, platinum-carbonylvinylmethyl complex is preferable. In addition, so-called Wilkinson catalysts containing the above platinum-based metals such as chlorotristriphenylphosphine rhodium (I) are also included in the hydrosilylation reaction catalyst (C).
本発明の硬化性組成物には、必要に応じて、ケイ素含有化合物(A1)あるいはケイ素含有化合物(B1)と反応できる化合物(D)を含有させてもよい。
該化合物(D)は、例えば密着性向上の目的で使用することができる。該化合物(D)は、前記のケイ素含有化合物(A1)中のSi−H基と反応する化合物、又は前記のケイ素含有化合物(B1)中のアルケニル基若しくはアルキニル基と反応する化合物であり、1種類で又は2種類以上混合で用いられる。化合物種としては、特に限定されないが、ポリシロキサン化合物が硬化物の耐熱性の観点から好ましい。該ポリシロキサン化合物としては、例えば、直鎖又は分岐を有するポリジメチルシロキサンの両末端にビニル基、アセチレン基、Si−H基等の基を有するシリコーン;直鎖又は分岐を有するジメチルシロキサンとジフェニルシロキサンのランダム及び/又はブロック体の両末端に、ビニル基、アセチレン基、Si−H基等の基を有するシリコーン;直鎖又は分岐を有するポリジメチルシロキサンのメチル基の一部がビニル基、アセチレン基及びSi−H基から選ばれる基に置換されたシリコーン;直鎖又は分岐を有するジメチルシロキサンとジフェニルシロキサンのランダム及び/又はブロック体のメチル基又はフェニル基の一部が、ビニル基、アセチレン基及びSi−H基から選ばれる基と置換されたシリコーン;ビニル基、アセチレン基、Si−H基等の基を有するレジン等が挙げられる。
You may make the curable composition of this invention contain the compound (D) which can react with a silicon containing compound (A1) or a silicon containing compound (B1) as needed.
The compound (D) can be used, for example, for the purpose of improving adhesion. The compound (D) is a compound that reacts with the Si—H group in the silicon-containing compound (A1) or a compound that reacts with the alkenyl group or alkynyl group in the silicon-containing compound (B1). It is used by type or by mixing two or more types. Although it does not specifically limit as a compound seed | species, A polysiloxane compound is preferable from a heat resistant viewpoint of hardened | cured material. Examples of the polysiloxane compound include linear or branched polydimethylsiloxanes having silicone groups having vinyl groups, acetylene groups, Si-H groups, etc. at both ends; linear or branched dimethylsiloxanes and diphenylsiloxanes. Random and / or silicone having a vinyl group, acetylene group, Si-H group or the like at both ends of the block body; a part of methyl group of a linear or branched polydimethylsiloxane is a vinyl group or an acetylene group And a silicone substituted with a group selected from Si-H groups; a methyl group or a phenyl group in a random and / or block body of a linear or branched dimethylsiloxane and diphenylsiloxane is a vinyl group, an acetylene group, and Silicone substituted with a group selected from Si-H groups; vinyl group, acetylene , Resin or the like having a group such as Si-H group.
該化合物(D)を使用する場合の使用量は、反応する相手であるケイ素含有化合物(A1)及びケイ素含有化合物(B1)の合計量に対して50質量%以下が好ましい。50質量%より多いと、得られる硬化物の柔軟性及び耐光性が低下する場合がある。 The amount of the compound (D) to be used is preferably 50% by mass or less based on the total amount of the silicon-containing compound (A1) and the silicon-containing compound (B1) that are the reaction partners. When it is more than 50% by mass, the flexibility and light resistance of the obtained cured product may be lowered.
本発明の硬化性組成物には、更に任意の成分として、無機性のフィラー、耐候性付与剤等の成分を配合してもよい。 The curable composition of the present invention may further contain components such as an inorganic filler and a weather resistance imparting agent as optional components.
上記の無機性のフィラーとしては、例えば、いわゆる充填剤、鉱物等の無機材料や、これらを有機変性処理等によって改質したものが挙げられる。具体的には、例えば、コロイダルシリカ、シリカフィラー、シリカゲル等の二酸化ケイ素類;酸化アルミニウム、酸化亜鉛、酸化チタン等の金属酸化物;マイカ、モンモリロナイト、けい石、珪藻土類、セリサイト、カオリナイト、フリント、長石粉、蛭石、アタパルジャイト、タルク、ミネソタイト、パイロフィライト等の鉱物類;これらを有機変性処理等によって改質したしたものが挙げられる。 Examples of the inorganic filler include so-called fillers, inorganic materials such as minerals, and those modified by organic modification treatment or the like. Specifically, for example, silicon dioxides such as colloidal silica, silica filler, silica gel; metal oxides such as aluminum oxide, zinc oxide, titanium oxide; mica, montmorillonite, silica, diatomaceous earth, sericite, kaolinite, Minerals such as flint, feldspar powder, meteorite, attapulgite, talc, minnesotite, pyrophyllite; those obtained by modifying these by organic modification or the like.
上記の無機性のフィラーの粒径は、耐熱性の点から100μm以下が好ましく、50μm以下がより好ましい。また、硬化物の用途が透明性を重視する場合は、少ない使用量で効果の大きい1μm以下の微粒子が好ましい。本発明の硬化性組成物における無機性のフィラーの含有量は、透明性を重視する場合は使用しないかできる限り少ない使用が好ましいので、0〜10質量%が好ましく、耐熱性向上、増粘、チクソ性付与のために使用する場合は、10〜90質量%が好ましい。 The particle size of the inorganic filler is preferably 100 μm or less and more preferably 50 μm or less from the viewpoint of heat resistance. Further, when the use of the cured product places importance on transparency, fine particles of 1 μm or less having a large effect with a small amount of use are preferable. The content of the inorganic filler in the curable composition of the present invention is preferably 0 to 10% by mass because it is preferably not used or used as little as possible when importance is placed on transparency. When used for imparting thixotropy, 10 to 90% by mass is preferable.
上記耐候性付与剤としては、光安定剤、紫外線吸収剤、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤等の周知一般に用いられているものを使用することができる。例えば、光安定剤としてはヒンダードアミン類が挙げられ、紫外線吸収剤としては、2−ヒドロキシベンゾフェノン類、2−(2−ヒドロキシフェニル)ベンゾトリアゾール類、2−(2−ヒドロキシフェニル)−4,6−ジアリール−1,3,5−トリアジン類、ベンゾエート類、シアノアクリレート類が挙げられ、フェノール系酸化防止剤としてはトリエチレングリコール−ビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、ジブチルヒドロキシトルエン(BHT)、2,6−ジ−t−ブチル−パラクレゾール(DBPC)等が挙げられ、硫黄系酸化防止剤としては、ジアルキルチオジプロピオネート類、β−アルキルメルカプトプロピオン酸エステル類が挙げられ、リン系酸化防止剤としては、有機ホスファイト類が挙げられる。 As the weather resistance imparting agent, well-known and commonly used materials such as a light stabilizer, an ultraviolet absorber, a phenolic antioxidant, a sulfurous antioxidant, and a phosphorus antioxidant can be used. Examples of the light stabilizer include hindered amines, and examples of the ultraviolet absorber include 2-hydroxybenzophenones, 2- (2-hydroxyphenyl) benzotriazoles, 2- (2-hydroxyphenyl) -4,6- And diaryl-1,3,5-triazines, benzoates, and cyanoacrylates. Examples of phenolic antioxidants include triethylene glycol-bis [3- (3-tert-butyl-5-methyl-4-hydroxy). Phenyl) propionate], dibutylhydroxytoluene (BHT), 2,6-di-t-butyl-paracresol (DBPC) and the like, and as the sulfur-based antioxidant, dialkylthiodipropionates, β-alkyl Mercaptopropionic acid esters can be mentioned, and phosphorus antioxidants include Machine phosphites, and the like.
上記耐候性付与剤を使用する場合、その含有量は、耐熱性、電気特性、硬化性、力学特性、保存安定性、ハンドリング性の点から、本発明の硬化性組成物中において0.0001〜50質量%が好ましく、0.001〜10質量%がさらに好ましい。 When the weather resistance imparting agent is used, the content thereof is 0.0001 to in the curable composition of the present invention in terms of heat resistance, electrical properties, curability, mechanical properties, storage stability, and handling properties. 50 mass% is preferable and 0.001-10 mass% is further more preferable.
本発明の硬化性組成物には、本発明の目的とする性能を損なわない範囲で、その他の公知の各種樹脂、添加剤、充填剤等を配合することができる。任意に配合できる各種樹脂の例としては、ポリイミド樹脂、ポリエチレングリコールやポリプロピレングリコール等のポリエーテル樹脂、ポリウレタン樹脂、エポキシ樹脂、フェノール樹脂、ポリエステル樹脂、メラミン樹脂、ポリアミド樹脂、ポリフェニレンスルフィド樹脂等が挙げられ、任意に配合できる添加剤の例としては、帯電防止剤等が挙げられる。
ケイ素含有化合物(A1)、ケイ素含有化合物(B1)及びヒドロシリル化反応触媒(C)以外の任意成分の使用量は、本発明の目的とする性能を損なわないために、ケイ素含有化合物(A1)とケイ素含有化合物(B1)との合計量100質量部に対して、好ましくは合計で10質量部以下とする。
In the curable composition of the present invention, other known various resins, additives, fillers, and the like can be blended within a range that does not impair the target performance of the present invention. Examples of various resins that can be arbitrarily blended include polyimide resins, polyether resins such as polyethylene glycol and polypropylene glycol, polyurethane resins, epoxy resins, phenol resins, polyester resins, melamine resins, polyamide resins, polyphenylene sulfide resins, and the like. Examples of additives that can be optionally blended include antistatic agents.
In order that the usage-amount of arbitrary components other than a silicon-containing compound (A1), a silicon-containing compound (B1), and a hydrosilylation reaction catalyst (C) does not impair the target performance of this invention, silicon-containing compound (A1) and The total amount is preferably 10 parts by mass or less with respect to the total amount of 100 parts by mass with the silicon-containing compound (B1).
本発明の硬化性組成物は、室温(25℃)で良好な流動性があり、ハンドリング性に優れる。流動性に関しては、無機性のフィラーを含まない状態で、室温(25℃)においてE型粘度計で測定した粘度が50Pa・S以下であるのが好ましく、10Pa・S以下であるのがより好ましい。
また、本発明の硬化性組成物の硬化物は、耐熱性、耐クラック性、透明性、耐光性等に優れている。詳しくは、本発明の硬化性組成物からは、硬化物の5質量%の質量減少を来たす温度が300℃以上、より好ましくは400℃以上の硬化物が好適に得られる。また、クラック発生の少ない硬化物が好適に得られる。
The curable composition of the present invention has good fluidity at room temperature (25 ° C.) and excellent handling properties. Regarding fluidity, the viscosity measured with an E-type viscometer at room temperature (25 ° C.) without containing an inorganic filler is preferably 50 Pa · S or less, more preferably 10 Pa · S or less. .
Moreover, the hardened | cured material of the curable composition of this invention is excellent in heat resistance, crack resistance, transparency, light resistance, etc. In detail, from the curable composition of this invention, the temperature which brings about the mass reduction of 5 mass% of hardened | cured material is 300 degreeC or more, More preferably, hardened | cured material more preferably 400 degreeC or more is obtained. Moreover, the hardened | cured material with few crack generations is obtained suitably.
本発明の硬化物は、本発明の硬化性組成物を硬化させてなるものである。硬化させる際の加熱温度は0〜300℃が好ましく、100〜200℃がより好ましい。硬化時間は0.1〜10時間が好ましく、0.5〜6時間がより好ましい。これらの硬化反応条件下で硬化反応を行うことにより、本発明の硬化性組成物から、耐熱性、耐クラック性等に優れた性能を有する硬化物を得ることができる。 The cured product of the present invention is obtained by curing the curable composition of the present invention. The heating temperature for curing is preferably 0 to 300 ° C, more preferably 100 to 200 ° C. The curing time is preferably 0.1 to 10 hours, more preferably 0.5 to 6 hours. By performing a curing reaction under these curing reaction conditions, a cured product having performance excellent in heat resistance, crack resistance and the like can be obtained from the curable composition of the present invention.
本発明の硬化物は、優れた物性を有し、特に、透明性、耐熱性、耐クラック性、耐光性、耐溶剤性、耐アルカリ性、耐候性、耐汚染性、難燃性、耐湿性、ガスバリヤ性、可撓性、伸びや強度、電気絶縁性、低誘電率性等の力学特性、光学特性、電気特性等に優れた材料である。 The cured product of the present invention has excellent physical properties, in particular, transparency, heat resistance, crack resistance, light resistance, solvent resistance, alkali resistance, weather resistance, stain resistance, flame resistance, moisture resistance, It is a material excellent in mechanical properties such as gas barrier properties, flexibility, elongation and strength, electrical insulation, low dielectric constant, optical properties, electrical properties and the like.
本発明のケイ素含有化合物を含有してなる本発明の硬化性組成物は、安定性、硬化性等に優れ、更にその硬化物は、耐クラック性、耐熱性、耐溶剤性、耐アルカリ性、耐候性、光学特性、電気特性等の諸物性に優れる。本発明の硬化性組成物は、電気・電子材料分野における表示材料・光材料・記録材料・半導体等の封止材料、高電圧絶縁材料、絶縁・防振・防水・防湿を目的としたポッティング・シーリング材、プラスチック部品の試作母型、コーティング材料、層間絶縁膜、絶縁用パッキング、熱収縮ゴムチューブ、O−リング、表示デバイス用シール剤・保護材、光導波路、光ファイバー保護材、光学レンズ、光学機器用接着剤、高耐熱性接着剤、高放熱性材料、高耐熱シール材、太陽電池・燃料電池用部材、電池用固体電解質、絶縁被覆材、複写機用感光ドラム、ガス分離膜等に応用できる。また、土木・建材分野におけるコンクリート保護材、ライニング、土壌注入剤、シーリング剤、蓄冷熱材、ガラスコーティング等へも応用することが可能であり、さらに医療用材料分野においても、チューブ、シール材、コーティング材料、滅菌処理装置用シール材、コンタクトレンズ、酸素富化膜等に応用することが可能である。 The curable composition of the present invention comprising the silicon-containing compound of the present invention is excellent in stability, curability and the like, and further, the cured product has crack resistance, heat resistance, solvent resistance, alkali resistance, weather resistance. Excellent in various physical properties such as properties, optical properties, and electrical properties. The curable composition of the present invention is a sealing material for display materials, optical materials, recording materials, semiconductors, etc. in the field of electrical and electronic materials, high voltage insulating materials, potting for insulation, vibration proofing, waterproofing and moisture proofing purposes. Sealing material, prototype mold for plastic parts, coating material, interlayer insulation film, insulating packing, heat shrink rubber tube, O-ring, sealant / protective material for display device, optical waveguide, optical fiber protective material, optical lens, optical Application to equipment adhesives, high heat resistant adhesives, high heat dissipation materials, high heat resistant sealing materials, solar and fuel cell materials, solid electrolytes for batteries, insulation coating materials, photosensitive drums for copying machines, gas separation membranes, etc. it can. It can also be applied to concrete protection materials, linings, soil injection agents, sealing agents, cold storage materials, glass coatings, etc. in the civil engineering / building materials field, and in the medical materials field, tubes, sealing materials, The present invention can be applied to coating materials, sterilization apparatus sealing materials, contact lenses, oxygen-enriched films, and the like.
以下、実施例等により本発明を更に説明するが、本発明はこれらの実施例等によって限定されるものではない。尚、実施例中の「部」や「%」は質量基準によるものである。尚、以下の実施例1〜15のうち、実施例1、3及び5は参考例である。
EXAMPLES Hereinafter, although an Example etc. demonstrate this invention further, this invention is not limited by these Examples. In the examples, “parts” and “%” are based on mass. Of the following Examples 1 to 15, Examples 1, 3 and 5 are reference examples.
[合成例1]
ジクロロジメチルシラン100部を、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後に、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルビニルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、不飽和結合を有する非環状ポリシロキサン化合物(a1−1)を得た。下記条件でのGPCによる分析の結果、非環状ポリシロキサン化合物(a1−1)の分子量はMw=20,000であった。なお、以降のGPCは全てこの条件で行った。
(GPCの測定条件)
カラム:東ソー株式会社製TSK-GEL MULTIPORE HXL M、7.8mm X 300mm、
展開溶媒:テトラヒドロフラン
[Synthesis Example 1]
100 parts of dichlorodimethylsilane was dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide solution and polymerized at 105 ° C. for 5 hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylvinylchlorosilane was further added, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound (a1-1) having an unsaturated bond. As a result of analysis by GPC under the following conditions, the molecular weight of the acyclic polysiloxane compound (a1-1) was Mw = 20,000. All subsequent GPCs were performed under these conditions.
(GPC measurement conditions)
Column: TSK-GEL MULTIPORE HXL M, 7.8mm X 300mm, manufactured by Tosoh Corporation
Developing solvent: Tetrahydrofuran
[実施例1]
合成例1で得た非環状ポリシロキサン化合物(a1−1)100部をトルエン200部に溶かし、白金触媒0.003部、及び環状ポリシロキサン化合物である1,3,5,7−テトラメチルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(A−1)を得た。GPCによる分析の結果、ケイ素含有化合物(A−1)の分子量は、Mw=22,000であった。
[Example 1]
100 parts of the acyclic polysiloxane compound (a1-1) obtained in Synthesis Example 1 is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5,7-tetramethylcyclo which is a cyclic polysiloxane compound. 10 parts of tetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (A-1). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (A-1) was Mw = 22,000.
[合成例2]
ジクロロジメチルシラン100部を、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、非環状ポリシロキサン化合物(b1−1)を得た。GPCによる分析の結果、非環状ポリシロキサン化合物(b1−1)の分子量はMw=20,000であった。
[Synthesis Example 2]
100 parts of dichlorodimethylsilane was dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide solution and polymerized at 105 ° C. for 5 hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylchlorosilane was further added thereto, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound (b1-1). As a result of analysis by GPC, the molecular weight of the acyclic polysiloxane compound (b1-1) was Mw = 20,000.
[実施例2]
合成例2で得た非環状ポリシロキサン化合物(b1−1)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(B−1)を得た。GPCによる分析の結果、ケイ素含有化合物(B−1)の分子量はMw=22,000であった。
[Example 2]
100 parts of the acyclic polysiloxane compound (b1-1) obtained in Synthesis Example 2 is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1, 3, 5, which are cyclic polysiloxane compounds having an unsaturated bond. 10 parts of 7-tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (B-1). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (B-1) was Mw = 22,000.
[合成例3]
ジクロロジメチルシラン100部を、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水した。ピリジンを20部加え、さらにメチルトリクロロシラン0.5部を加え、室温で30分、さらに70℃で30分攪拌した後、この溶液を半分に分割した。
一方に、不飽和結合を有する1官能シラン化合物であるジメチルビニルクロロシラン2.5部を加え、室温で30分、さらに70℃で30分攪拌した後、イオン交換水で水洗することでピリジン塩酸塩を除いて、不飽和結合を有する非環状ポリシロキサン化合物(a1−2)を得た。
他方に、Si−H基導入化合物であるジメチルクロロシラン2.5部を加え、室温で30分、さらに70℃で30分攪拌した後、イオン交換水で水洗することでピリジン塩酸塩を除いて、非環状ポリシロキサン化合物(b1−2)を得た。
[Synthesis Example 3]
100 parts of dichlorodimethylsilane was dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide solution and polymerized at 105 ° C. for 5 hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated. After adding 20 parts of pyridine and 0.5 part of methyltrichlorosilane and stirring at room temperature for 30 minutes and further at 70 ° C. for 30 minutes, the solution was divided in half.
On the other hand, 2.5 parts of dimethylvinylchlorosilane, which is a monofunctional silane compound having an unsaturated bond, is added, stirred at room temperature for 30 minutes and further at 70 ° C. for 30 minutes, and then washed with ion-exchanged water to wash pyridine hydrochloride. Was removed to obtain an acyclic polysiloxane compound (a1-2) having an unsaturated bond.
On the other hand, 2.5 parts of dimethylchlorosilane, which is a Si—H group-introducing compound, was added, stirred at room temperature for 30 minutes and further at 70 ° C. for 30 minutes, and then washed with ion-exchanged water to remove pyridine hydrochloride, A non-cyclic polysiloxane compound (b1-2) was obtained.
[実施例3]
合成例3で得た不飽和結合を有する非環状ポリシロキサン化合物(a1−2)100部をトルエン200部に溶かし、白金触媒0.003部、及びと環状ポリシロキサン化合物である1,3,5,7−テトラメチルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(A−2)を得た。GPCによる分析の結果、ケイ素含有化合物(A−2)の分子量はMw=42,000であった。
[Example 3]
100 parts of an acyclic polysiloxane compound (a1-2) having an unsaturated bond obtained in Synthesis Example 3 is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5 which is a cyclic polysiloxane compound. , 7-tetramethylcyclotetrasiloxane (10 parts) was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (A-2). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (A-2) was Mw = 42,000.
[実施例4]
合成例3で得た非環状ポリシロキサン化合物(b1−2)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(B−2)を得た。GPCによる分析の結果、ケイ素含有化合物(B−2)の分子量はMw=42,000であった。
[Example 4]
100 parts of the acyclic polysiloxane compound (b1-2) obtained in Synthesis Example 3 is dissolved in 200 parts of toluene, and 0.003 part of a platinum catalyst and 1,3, 5, which are cyclic polysiloxane compounds having an unsaturated bond 10 parts of 7-tetramethyl-1,3,5,7-tetravinylcyclotetraloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Then, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (B-2). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (B-2) was Mw = 42,000.
[合成例4]
ジクロロジメチルシラン100部を、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間反応させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水した。ピリジンを20部加え、さらにテトラクロロシラン0.5部を加え、室温で30分、さらに70℃で30分攪拌した後、この溶液を半分に分割した。
一方に、不飽和結合を有する1官能シラン化合物であるジメチルビニルクロロシラン2.5部を加え、室温で30分、さらに70℃で30分攪拌した後、イオン交換水で水洗することでピリジン塩酸塩を除いて、不飽和結合を有する非環状ポリシロキサン化合物(a1−3)を得た。
他方に、Si−H基導入化合物であるジメチルクロロシラン2.5部を加え、室温で30分、さらに70℃で30分攪拌した後、イオン交換水で水洗することでピリジン塩酸塩を除いて、非環状ポリシロキサン化合物(b1−3)を得た。
[Synthesis Example 4]
100 parts of dichlorodimethylsilane was dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide, and reacted at 105 ° C. for 5 hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated. After adding 20 parts of pyridine and 0.5 part of tetrachlorosilane and stirring at room temperature for 30 minutes and further at 70 ° C. for 30 minutes, the solution was divided in half.
On the other hand, 2.5 parts of dimethylvinylchlorosilane, which is a monofunctional silane compound having an unsaturated bond, is added, stirred at room temperature for 30 minutes and further at 70 ° C. for 30 minutes, and then washed with ion-exchanged water to wash pyridine hydrochloride. Was removed to obtain an acyclic polysiloxane compound (a1-3) having an unsaturated bond.
On the other hand, 2.5 parts of dimethylchlorosilane, which is a Si—H group-introducing compound, was added, stirred for 30 minutes at room temperature, and further for 30 minutes at 70 ° C. An acyclic polysiloxane compound (b1-3) was obtained.
[実施例5]
合成例4で得た不飽和結合を有する非環状ポリシロキサン化合物(a1−3)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(A−3)を得た。GPCによる分析の結果、ケイ素含有化合物(A−3)の分子量はMw=52,000であった。
[Example 5]
100 parts of an acyclic polysiloxane compound (a1-3) having an unsaturated bond obtained in Synthesis Example 4 is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1 is a cyclic polysiloxane compound having an unsaturated bond , 3,5,7-tetramethylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Then, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (A-3). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (A-3) was Mw = 52,000.
[実施例6]
合成例4で得た非環状ポリシロキサン化合物(b1−3)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチル−1,3,5,7−ビニルシクロテトラロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(B−3)を得た。GPCによる分析の結果、ケイ素含有化合物(B−3)の分子量はMw=52,000であった。
[Example 6]
100 parts of the acyclic polysiloxane compound (b1-3) obtained in Synthesis Example 4 is dissolved in 200 parts of toluene, and 0.003 part of a platinum catalyst and 1,3, 5, which are cyclic polysiloxane compounds having an unsaturated bond 10 parts of 7-tetramethyl-1,3,5,7-vinylcyclotetraloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (B-3). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (B-3) was Mw = 52,000.
[実施例7]
実施例1で得たケイ素含有化合物(A−1)50部と実施例2で得たケイ素含有化合物(B−1)50部とを混合したものに、ヒドロシリル化反応触媒(C)として白金-カルボニルビニルメチル錯体0.005部を混合して、硬化性組成物No.1を得た。
[Example 7]
A mixture of 50 parts of the silicon-containing compound (A-1) obtained in Example 1 and 50 parts of the silicon-containing compound (B-1) obtained in Example 2 was mixed with platinum as a hydrosilylation reaction catalyst (C). Mixing 0.005 part of carbonyl vinyl methyl complex, the curable composition No. 1 was obtained.
[実施例8]
実施例3で得たケイ素含有化合物(A−2)50部と実施例4で得たケイ素含有化合物(B−2)50部とを混合したものに、ヒドロシリル化反応触媒(C)として白金-カルボニルビニルメチル錯体0.005部を混合して、硬化性組成物No.2を得た。
[Example 8]
A mixture of 50 parts of the silicon-containing compound (A-2) obtained in Example 3 and 50 parts of the silicon-containing compound (B-2) obtained in Example 4 was mixed with platinum as a hydrosilylation reaction catalyst (C). Mixing 0.005 part of carbonyl vinyl methyl complex, the curable composition No. 2 was obtained.
[実施例9]
実施例5で得たケイ素含有化合物(A−3)50部と実施例6で得たケイ素含有化合物(B−3)50部とを混合したものに、ヒドロシリル化反応触媒(C)として白金-カルボニルビニルメチル錯体0.005部を混合して、硬化性組成物No.3を得た。
[Example 9]
A mixture of 50 parts of the silicon-containing compound (A-3) obtained in Example 5 and 50 parts of the silicon-containing compound (B-3) obtained in Example 6 was mixed with platinum as a hydrosilylation reaction catalyst (C). Mixing 0.005 part of carbonyl vinyl methyl complex, the curable composition No. 3 was obtained.
[比較例1]
上記合成例1で得た不飽和結合を有する非環状ポリシロキサン(a1−1)50部と上記合成例2で得た非環状ポリシロキサン化合物(b1−1)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−1)を得た。
[Comparative Example 1]
To a mixture of 50 parts of the acyclic polysiloxane (a1-1) having an unsaturated bond obtained in Synthesis Example 1 and 50 parts of the acyclic polysiloxane compound (b1-1) obtained in Synthesis Example 2, As a curing catalyst, 0.005 part of a platinum-carbonylvinylmethyl complex was mixed to obtain a comparative curable composition (ratio-1).
[比較例2]
ジメチルジメトキシシラン及びビニルメチルジメトキシシランをモノマーとしてランダム縮合させたポリシロキサン(Mw:30,000、ビニル基量:3.5mmol/g)50部と、ジメチルジメトキシシラン及びメチルジメトキシシランをモノマーとしてランダム縮合させたポリシロキサン(Mw:30,000、Si−H基量:3.5mmol/g)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−2)を得た。
[Comparative Example 2]
50 parts of polysiloxane (Mw: 30,000, vinyl group content: 3.5 mmol / g) randomly condensed with dimethyldimethoxysilane and vinylmethyldimethoxysilane as monomers, and random condensation with dimethyldimethoxysilane and methyldimethoxysilane as monomers To a mixture of 50 parts of polysiloxane (Mw: 30,000, Si—H group amount: 3.5 mmol / g) mixed with 0.005 part of platinum-carbonylvinylmethyl complex as a curing catalyst, A comparative curable composition (ratio-2) was obtained.
[比較例3]
ビニルトリメトキシシラン、メチルトリメトキシシラン及びジメチルジメトキシシランをモノマーとして、モル比で1:4:5の割合でランダム縮合させたポリシロキサンレジン(Mw:30,000、ビニル基量:3.5mmol/g)50部と、トリメトキシシラン、メチルトリメトキシシラン及びジメチルジメトキシシランをモノマーとして、モル比で1:4:5の割合でランダム縮合させたポリシロキサンレジン(Mw:30,000、Si−H基量:3.5mmol/g)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−3)を得た。
[Comparative Example 3]
Polysiloxane resin (Mw: 30,000, vinyl group content: 3.5 mmol / m) obtained by random condensation at a molar ratio of 1: 4: 5 using vinyltrimethoxysilane, methyltrimethoxysilane and dimethyldimethoxysilane as monomers. g) Polysiloxane resin (Mw: 30,000, Si-H) obtained by random condensation at a molar ratio of 1: 4: 5 using 50 parts of trimethoxysilane, methyltrimethoxysilane and dimethyldimethoxysilane as monomers. (Base amount: 3.5 mmol / g) 50 parts of a mixture is mixed with 0.005 parts of a platinum-carbonylvinylmethyl complex as a curing catalyst to obtain a comparative curable composition (ratio-3). It was.
[比較例4]
実施例1で得たケイ素含有化合物(A−1)50部と、両末端ビニル基ポリジメチルシロキサン(Mw:20,000)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−4)を得た。
[Comparative Example 4]
A platinum-carbonylvinylmethyl complex as a curing catalyst was prepared by mixing 50 parts of the silicon-containing compound (A-1) obtained in Example 1 and 50 parts of both terminal vinyl group polydimethylsiloxane (Mw: 20,000). 0.005 part was mixed and the curable composition for comparison (ratio-4) was obtained.
[比較例5]
実施例2で得たケイ素含有化合物(B−1)50部と、両末端Si−H基ポリジメチルシロキサン(Mw:20,000)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−5)を得た。
[Comparative Example 5]
A mixture of 50 parts of the silicon-containing compound (B-1) obtained in Example 2 and 50 parts of Si-H group polydimethylsiloxane (Mw: 20,000) at both ends was mixed with platinum-carbonylvinyl as a curing catalyst. 0.005 part of a methyl complex was mixed to obtain a comparative curable composition (ratio-5).
[比較例6]
ジクロロジメチルシラン90部とジクロロジフェニルシラン9部とを混合し、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルビニルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、不飽和結合を有する非環状ポリシロキサン化合物(比a1−1)を得た。
得られた不飽和結合を有する非環状ポリシロキサン化合物(比a1−1)100部をトルエン200部に溶かし、白金触媒0.003部、及び環状ポリシロキサン化合物である1,3,5,7−テトラメチルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(比A−1)を得た。GPCによる分析の結果、ケイ素含有化合物(比A−1)の分子量は、Mw=22,000であった。
[Comparative Example 6]
90 parts of dichlorodimethylsilane and 9 parts of dichlorodiphenylsilane are mixed and dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide, and polymerized at 105 ° C. for 5 hours. I let you. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylvinylchlorosilane was further added, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound having an unsaturated bond (ratio a1-1).
100 parts of the obtained acyclic polysiloxane compound having an unsaturated bond (ratio a1-1) was dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5,7- 10 parts of tetramethylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Then, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (Ratio A-1). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (ratio A-1) was Mw = 22,000.
一方、ジクロロジメチルシラン90部とジクロロジフェニルシラン10部とを混合し、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、非環状ポリシロキサン化合物(比b1−1)を得た。
得られた非環状ポリシロキサン化合物(比b1−1)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(比B−1)を得た。GPCによる分析の結果、ケイ素含有化合物(比B−1)の分子量はMw=22,000であった。
On the other hand, 90 parts of dichlorodimethylsilane and 10 parts of dichlorodiphenylsilane were mixed and dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide solution at 105 ° C. Polymerized for hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylchlorosilane was further added thereto, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound (ratio b1-1).
100 parts of the obtained acyclic polysiloxane compound (ratio b1-1) is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5,7- which is a cyclic polysiloxane compound having an unsaturated bond 10 parts of tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (ratio B-1). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (ratio B-1) was Mw = 22,000.
上記ケイ素含有化合物(比A−1)50部と上記ケイ素含有化合物(比B−1)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−6)を得た。 A mixture of 50 parts of the silicon-containing compound (ratio A-1) and 50 parts of the silicon-containing compound (ratio B-1) is mixed with 0.005 part of a platinum-carbonylvinylmethyl complex as a curing catalyst. A comparative curable composition (ratio-6) was obtained.
[比較例7]
ジクロロジメチルシラン75部とジクロロジフェニルシラン24部とを混合し、100部のイオン交換水、50部のトルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルビニルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、不飽和結合を有する非環状ポリシロキサン化合物(比a1−2)を得た。
得られた不飽和結合を有する非環状ポリシロキサン化合物(比a1−2)100部をトルエン200部に溶かし、白金触媒0.003部、及び環状ポリシロキサン化合物である1,3,5,7−テトラメチルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(比A−2)を得た。GPCによる分析の結果、ケイ素含有化合物(比A−2)の分子量は、Mw=22,000であった。
[Comparative Example 7]
75 parts of dichlorodimethylsilane and 24 parts of dichlorodiphenylsilane are mixed and dropped into a mixture of 100 parts of ion exchange water, 50 parts of toluene and 450 parts of 48% sodium hydroxide aqueous solution, and polymerized at 105 ° C. for 5 hours. I let you. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylvinylchlorosilane was further added, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound having an unsaturated bond (ratio a1-2).
100 parts of the obtained acyclic polysiloxane compound having an unsaturated bond (ratio a1-2) is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5,7- which is a cyclic polysiloxane compound 10 parts of tetramethylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Then, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (Ratio A-2). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (ratio A-2) was Mw = 22,000.
一方、ジクロロジメチルシラン75部とジクロロジフェニルシラン24部とを混合し、100部のイオン交換水、50の部トルエン及び450部の48%水酸化ナトリウム水溶液の混合物中に滴下し、105℃で5時間重合させた。得られた反応溶液を500部のイオン交換水で水洗した後、このトルエン溶液を脱水し、ピリジンを20部加え、これにさらにジメチルクロロシラン20部を加えて70℃で30分間攪拌した。その後、100部のイオン交換水で水洗した後、150℃で溶媒を減圧留去した。次に100部のアセトニトリルで洗浄し、その後、70℃で溶媒を減圧留去し、非環状ポリシロキサン化合物(比b1−2)を得た。
得られた非環状ポリシロキサン化合物(比b1−2)100部をトルエン200部に溶かし、白金触媒0.003部、及び不飽和結合を有する環状ポリシロキサン化合物である1,3,5,7−テトラメチル−1,3,5,7−テトラビニルシクロテトラシロキサン10部を加え、105℃で2時間反応させた。70℃で溶媒を減圧留去した後にアセトニトリル100部で洗浄した。その後、70℃で溶媒を減圧留去し、ケイ素含有化合物(比B−2)を得た。GPCによる分析の結果、ケイ素含有化合物(比B−2)の分子量はMw=22,000であった。
On the other hand, 75 parts of dichlorodimethylsilane and 24 parts of dichlorodiphenylsilane were mixed and dropped into a mixture of 100 parts of ion-exchanged water, 50 parts of toluene and 450 parts of 48% aqueous sodium hydroxide solution at 105 ° C. Polymerized for hours. The obtained reaction solution was washed with 500 parts of ion exchange water, and then this toluene solution was dehydrated, 20 parts of pyridine was added, 20 parts of dimethylchlorosilane was further added thereto, and the mixture was stirred at 70 ° C. for 30 minutes. Then, after washing with 100 parts of ion exchange water, the solvent was distilled off under reduced pressure at 150 ° C. Next, it was washed with 100 parts of acetonitrile, and then the solvent was distilled off under reduced pressure at 70 ° C. to obtain an acyclic polysiloxane compound (ratio b1-2).
100 parts of the obtained acyclic polysiloxane compound (ratio b1-2) is dissolved in 200 parts of toluene, 0.003 part of a platinum catalyst, and 1,3,5,7- which is a cyclic polysiloxane compound having an unsaturated bond 10 parts of tetramethyl-1,3,5,7-tetravinylcyclotetrasiloxane was added and reacted at 105 ° C. for 2 hours. The solvent was distilled off under reduced pressure at 70 ° C. and then washed with 100 parts of acetonitrile. Thereafter, the solvent was distilled off under reduced pressure at 70 ° C. to obtain a silicon-containing compound (ratio B-2). As a result of analysis by GPC, the molecular weight of the silicon-containing compound (ratio B-2) was Mw = 22,000.
上記ケイ素含有化合物(比A−2)50部と上記ケイ素含有化合物(比B−2)50部とを混合したものに、硬化触媒として白金-カルボニルビニルメチル錯体0.005部を混合して、比較用の硬化性組成物(比−7)を得た。 A mixture of 50 parts of the silicon-containing compound (ratio A-2) and 50 parts of the silicon-containing compound (ratio B-2) was mixed with 0.005 part of a platinum-carbonylvinylmethyl complex as a curing catalyst. A comparative curable composition (ratio-7) was obtained.
[実施例10〜12、比較例8〜12]
上記実施例7〜9で得た硬化性組成物No.1〜3及び比較例1〜5で得た比較用硬化性組成物(比−1)〜(比−5)それぞれを、アルミ板上に膜厚約1mmに製膜し、150℃で30分加熱して硬化させて、硬化物No.1〜3及び硬化物 比1〜5を得た。尚、使用した硬化性組成物の番号と得られた硬化物の番号とはそれぞれ対応している。これらの硬化物について、硬化状態の評価及び180度曲げ試験を、以下のようにして行なった。
[Examples 10 to 12, Comparative Examples 8 to 12]
The curable composition No. obtained in Examples 7-9 above. 1 to 3 and Comparative Examples 1 to 5 and Comparative curable compositions (Ratio-1) to (Ratio-5) were each formed on an aluminum plate to a film thickness of about 1 mm, and 150 ° C. for 30 minutes. It is cured by heating, and cured product No. 1-3 and hardened | cured material ratio 1-5 were obtained. In addition, the number of the used curable composition and the number of the obtained hardened | cured material respectively respond | correspond. About these hardened | cured material, the evaluation of the hardening state and the 180 degree | times bending test were done as follows.
硬化状態については、所定硬化時間後の硬化膜のタック感有無で判断し、流動性のある状態は×、流動性がなくともタック感のあるものはその度合いにより△〜○、タックフリーであれば◎とした。
180度曲げ試験においては、アルミ板上に膜厚約1mmに製膜して得た硬化膜を180度曲げた時の膜の状態を観察した。180度折り曲げ時に、膜にクラックや剥がれが無いサンプルは○、180度ではクラックが発生するが、90度ではクラックや剥がれが発生しないサンプルは△、90度でクラックが発生するサンプルは×とした。
結果を表1に示す。
The cured state is judged based on the presence or absence of tackiness of the cured film after a predetermined curing time. The fluidity state is X, the one with tackiness even without fluidity is Δ to ○, and tack free. ◎.
In the 180-degree bending test, the state of the film was observed when a cured film obtained by forming a film with a thickness of about 1 mm on an aluminum plate was bent 180 degrees. Samples with no cracks or peeling on the film when bent at 180 degrees are marked as ◯, cracks are generated at 180 degrees, samples with no cracks or peeling at 90 degrees are marked with Δ, and samples with cracks at 90 degrees are marked with x. .
The results are shown in Table 1.
表1から明らかなように、実施例10〜12の硬化物No.1〜3は、比較例9〜12の硬化物 比2〜5と比べて、硬化状態については同等であるか向上しており、180度曲げ試験についてはいずれも向上している。また、硬化性組成物(比−1)からは、充分な固形硬化物が得られなかった。これらのことから、本発明の構成をとることにより、硬化状態及び柔軟性が向上することが確認できた。 As apparent from Table 1, the cured product Nos. 1 to 3, compared with the cured products ratios 2 to 5 of Comparative Examples 9 to 12, the cured state is the same or improved, and the 180 degree bending test is improved. Moreover, sufficient solid hardened | cured material was not obtained from the curable composition (ratio-1). From these facts, it was confirmed that the cured state and flexibility were improved by adopting the configuration of the present invention.
[実施例13〜15、比較例13、14]
上記実施例7〜9で得た硬化性組成物No.1〜3、及び上記比較例6、7で得た硬化性組成物(比−6)、(比−7)を、それぞれ、20mm×20mm×3mmの型に流し込み、150℃で1hr加熱して、厚さ3mmの硬化物No.4〜6及び比6、比7を得た。これらの硬化物について、高圧水銀灯を用いて、365nmでの出力9.96W/cmの放射線2時間照射による光劣化試験を行った。光劣化試験前後の400nmの透過率を表2に示す。
[Examples 13 to 15, Comparative Examples 13 and 14]
The curable composition No. obtained in Examples 7-9 above. 1-3, and the curable compositions (Ratio-6) and (Ratio-7) obtained in Comparative Examples 6 and 7 were each poured into a 20 mm × 20 mm × 3 mm mold and heated at 150 ° C. for 1 hr. , 3 mm thick cured product No. 4-6, ratio 6, and ratio 7 were obtained. About these hardened | cured material, the optical deterioration test by the irradiation for 2 hours of radiation of the output of 9.96 W / cm in 365 nm was done using the high pressure mercury lamp. Table 2 shows the transmittance at 400 nm before and after the light degradation test.
表2から明らかなように、実施例13〜15の硬化物No.4〜6は、いずれも、比較例11、12の硬化物 比6、比7と比べて耐光性が向上している。このことから、Ra〜Reが脂肪族のみからなる硬化性組成物を硬化させた硬化物は、耐光性が良好であることが確認できた。 As is clear from Table 2, the cured product Nos. Of Examples 13 to 15 were obtained. In all of 4 to 6, the light resistance is improved as compared with the cured product ratios 6 and 7 of Comparative Examples 11 and 12. From this, it was confirmed that a cured product obtained by curing a curable composition in which R a to R e consist only of an aliphatic group has good light resistance.
Claims (9)
炭化水素基で置換されていてもよい炭素原子数6〜12の芳香族炭化水素基であり、Re
が複数ある場合は、それらは同一でも異なってもよい。Yは炭素原子数2〜4のアルキレン基であり、Zは、炭素原子数2〜4のアルケニル基又はアルキニル基であり、kは2〜7の数であり、pは1〜4の数である。mは一般式(2)で表されるケイ素含有化合物の質量平均分子量を3000〜100万とする数である。) A silicon-containing compound represented by the following general formula (2).
When there are a plurality of these, they may be the same or different. Y is an alkylene group having 2 to 4 carbon atoms, Z is, or alkenyl group of carbon atom number 2-4 alkynyl group, k is the number of 2 to 7, p is 1 to 4 Is a number. m is a number that makes the mass average molecular weight of the silicon-containing compound represented by the general formula (2) 3000 to 1,000,000. )
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KR1020097017296A KR101478803B1 (en) | 2007-04-23 | 2008-04-21 | Silicon-containing compound, curable composition and cured product |
PCT/JP2008/057663 WO2008133227A1 (en) | 2007-04-23 | 2008-04-21 | Silicon-containing compound, curable composition and cured product |
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US9080077B2 (en) * | 2009-12-21 | 2015-07-14 | Dow Corning Corporation | Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins |
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US10370574B2 (en) | 2013-02-11 | 2019-08-06 | Dow Silicones Corporation | Method for forming thermally conductive thermal radical cure silicone compositions |
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