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JP5171210B2 - Method for manufacturing piezoelectric vibrator - Google Patents

Method for manufacturing piezoelectric vibrator Download PDF

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JP5171210B2
JP5171210B2 JP2007284549A JP2007284549A JP5171210B2 JP 5171210 B2 JP5171210 B2 JP 5171210B2 JP 2007284549 A JP2007284549 A JP 2007284549A JP 2007284549 A JP2007284549 A JP 2007284549A JP 5171210 B2 JP5171210 B2 JP 5171210B2
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substrate body
wafer
metal film
lid
wiring pattern
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JP2009111930A (en
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義紀 那須
和也 高橋
宏和 小林
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Kyocera Crystal Device Corp
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Description

本発明は、電子機器に用いられる圧電振動子の製造方法に関する。   The present invention relates to a method for manufacturing a piezoelectric vibrator used in an electronic device.

従来から、電子機器に用いられる表面実装可能な圧電振動子として、例えば、水晶振動子が用いられている。この水晶振動子は、基板体に水晶振動素子が実装された状態で凹部が設けられた蓋体で気密封止した構造のものが提案されている(例えば、特許文献1参照)。この水晶振動子の製造方法は、基板体に接合用金属膜と配線パターンとを設けておき、これに水晶振動素子を実装して、凹部内に水晶振動子素子が入るように蓋体を基板体に接触させた状態で陽極接合を行って、水晶振動子を製造する。
接合の際、例えば、真空中で陽極接合を行えば、凹部内は真空状態で気密封止されることとなる。
Conventionally, as a surface-mountable piezoelectric vibrator used for electronic equipment, for example, a crystal vibrator has been used. As this crystal resonator, one having a structure in which a quartz resonator element is mounted on a substrate body and hermetically sealed with a lid provided with a recess has been proposed (for example, see Patent Document 1). In this method of manufacturing a crystal resonator, a bonding metal film and a wiring pattern are provided on a substrate body, a crystal resonator element is mounted on the substrate body, and the lid body is placed on the substrate so that the crystal resonator element is placed in the recess. A quartz crystal unit is manufactured by performing anodic bonding in contact with the body.
At the time of bonding, for example, if anodic bonding is performed in a vacuum, the inside of the recess is hermetically sealed in a vacuum state.

ここで、基板体の一方の主面の表面に設けた配線パターンは、この基板体に設けられたスルーホールを介して裏面側に設けられた外部電極と電気的に接続した状態となっている。
具体的に説明すると、例えば、基板体スルーホールを形成した後に無電解メッキを行って金属膜を形成する。その面に、レジストを塗布、露光、現像して配線パターンの形状を決める。この状態でスルーホールを穴埋めして、不要なメッキを除去し、レジストも除去する。これによって配線パターンを完成させる。その後、接合用の金属膜を形成するために、基板体にレジストを塗布し、露光、現像を行う。そして金属膜を成膜してレジストを除去する。このようにして基板体が形成されていた。
Here, the wiring pattern provided on the surface of one main surface of the substrate body is in a state of being electrically connected to an external electrode provided on the back surface side through a through hole provided in the substrate body. .
More specifically, for example, after forming a substrate body through hole, electroless plating is performed to form a metal film. On the surface, a resist is applied, exposed and developed to determine the shape of the wiring pattern. In this state, the through hole is filled, unnecessary plating is removed, and the resist is also removed. This completes the wiring pattern. Thereafter, in order to form a metal film for bonding, a resist is applied to the substrate body, and exposure and development are performed. Then, a metal film is formed and the resist is removed. Thus, the substrate body was formed.

このような水晶振動子は、複数の基板体又は蓋体が行列状に配列されウェハの状態で製造される。従って、水晶振動素子は、ウェハの状態で複数個並べられた1つ1つの基板体に1個ずつ実装される。全ての基板体に水晶振動素子の実装が終了したら、ウェハの状態で複数個並べられた蓋体をウェハの状態となる基板体に接触させ、陽極接合によりウェハの状態で蓋体と基板体とを接合する。
その後、隣り合う基板体の間、若しくは、隣り合う蓋体の間を切断や割断して複数の水晶振動子を得る。
Such a crystal resonator is manufactured in a wafer state in which a plurality of substrate bodies or lid bodies are arranged in a matrix. Accordingly, one crystal vibration element is mounted on each of the substrate bodies arranged one by one in a wafer state. When mounting of the crystal resonator elements on all the substrate bodies is completed, a plurality of lid bodies arranged in a wafer state are brought into contact with the substrate body in the wafer state, and the lid body and the substrate body in the wafer state are bonded by anodic bonding. Join.
Thereafter, a plurality of crystal resonators are obtained by cutting or cleaving between adjacent substrate bodies or between adjacent lid bodies.

特開2007−013628JP2007-013628

しかしながら、市場からの圧電振動子の小型化の要求に答えると、接合用金属膜と配線パターンとの間隔が狭くなってしまうため、接合用金属膜と配線パターンとを形成する際に精密性が求められる。そのため、基板体の正確な位置にレジストを塗布してマスクとしなければならず、接合用金属膜の形成及び配線パターンの形成の作業が困難になりつつある。
また、基板体に設けられたスルーホールに対しては、気密封止を確実にするために導電性材料で埋める必要がある。しかし、この工程ではゴミの発生が懸念されるが、接合用金属膜へのゴミ等の付着を防ぐために、工程が煩雑となっていた。
However, in response to market demands for miniaturization of piezoelectric vibrators, the gap between the bonding metal film and the wiring pattern is narrowed, so that accuracy is required when forming the bonding metal film and the wiring pattern. Desired. For this reason, a resist must be applied to a precise position of the substrate body to form a mask, and it is becoming difficult to form a bonding metal film and a wiring pattern.
In addition, it is necessary to fill the through hole provided in the substrate body with a conductive material in order to ensure hermetic sealing. However, although there is concern about the generation of dust in this process, the process is complicated in order to prevent the adhesion of dust and the like to the bonding metal film.

そこで、本発明では、前記した問題を解決し、小型化に対応可能で、容易に製造可能な圧電振動子の製造方法を提供することを課題とする。   Accordingly, an object of the present invention is to provide a method of manufacturing a piezoelectric vibrator that solves the above-described problems, can be reduced in size, and can be easily manufactured.

前記課題を解決するため、本発明は、一方の主面に配線パターンが設けられ他方の主面に外部端子が設けられた平板状の基板体に圧電振動素子が実装され凹部を有する蓋体を前記基板体に接合して前記圧電振動素子を前記凹部内に気密封止した圧電振動子の製造方法であって、前記基板体の前記配線パターンに対応した位置にスルーホールを設けるスルーホール形成工程と、前記基板体に前記配線パターンと前記外部端子とを形成し、前記スルーホールを導電性材料で埋めるパターン形成工程と、前記配線パターンに前記圧電振動素子を実装する圧電振動素子実装工程と、平板部と枠部とによる凹部を有する前記蓋体における前記凹部内及び前記凹部の底面と同一方向を向く前記枠部の面に接合用金属膜を設ける接合用金属膜形成工程と、前記蓋体を前記基板体に接触させ陽極接合により前記基板体と前記蓋体とを接合する接合工程とからなり、前記接合用金属膜形成工程が、前記スルーホール形成工程から前記圧電振動素子実装工程までの工程のいずれかの工程と同時または先に行われることを特徴とする圧電振動子の製造方法である。 In order to solve the above-described problems, the present invention provides a lid body having a concave portion in which a piezoelectric vibration element is mounted on a flat substrate body having a wiring pattern on one main surface and an external terminal on the other main surface. A method of manufacturing a piezoelectric vibrator in which the piezoelectric vibration element is hermetically sealed in the recess by bonding to the substrate body, and a through hole forming step of providing a through hole at a position corresponding to the wiring pattern of the substrate body A pattern forming step of forming the wiring pattern and the external terminal on the substrate body and filling the through hole with a conductive material; and a piezoelectric vibration element mounting step of mounting the piezoelectric vibration element on the wiring pattern; and bonding metal film forming step of providing a bonding metal layer on the surface of the frame portion facing the bottom surface in the same direction of the recess and the recess in the lid to have a concave portion by a flat plate portion and the frame portion, before Ri Do and a bonding step of bonding the cover member and the substrate member by anodic bonding by contacting the lid to the substrate body, the bonding metal layer forming step, the piezoelectric vibrating element mounted from the through-hole forming step A method of manufacturing a piezoelectric vibrator, which is performed simultaneously with or before any of the steps up to the step .

また、本発明は、前記基板体が行列状に並べられてウェハ状となっており、かつ、前記蓋体が行列状に並べられてウェハ状となっており、前記ウェハ状の基板体と前記ウェハ状の蓋体とが共にウェハ状で接合してもよい。   In the present invention, the substrate bodies are arranged in a matrix to form a wafer, and the lid bodies are arranged in a matrix to form a wafer. The wafer-shaped substrate and the substrate The wafer-shaped lid may be bonded together in a wafer shape.

また、本発明は、前記接合用金属膜がAl(アルミニウム)であることを特徴とする。   Further, the present invention is characterized in that the bonding metal film is Al (aluminum).

このような圧電振動子の製造方法によれば、基板体に接合用金属膜を設けずに配線パターンのみを設け、蓋体の凹部内の全面及び凹部を形成する枠部の凹部の底面と同じ方向を向く面に接合用金属膜を設けたので、圧電振動子が小型化されても、配線パターンの形成に精密性の要求がなくなり、圧電振動子の製造を容易にすることができる。   According to such a method for manufacturing a piezoelectric vibrator, only the wiring pattern is provided on the substrate body without providing the bonding metal film, and the entire surface in the concave portion of the lid body and the bottom surface of the concave portion of the frame portion forming the concave portion are the same. Since the bonding metal film is provided on the surface that faces the direction, even if the piezoelectric vibrator is downsized, there is no need for precision in the formation of the wiring pattern, and the manufacture of the piezoelectric vibrator can be facilitated.

また、蓋体に設けた接合用金属膜は、レジスト等のマスクを用いなくても設けることができるので、マスクを正確に設ける作業が省略され、作業性を向上させることができる。
また、接合用金属膜を蓋体に設ける接合用金属膜形成工程を、スルーホール形成工程から前記圧電振動素子実装工程までの工程のいずれかの工程と同時又は先に行うことで、それぞれが別の場所で行われる工程となり、接合用金属膜形成工程が基板体への配線パターン等の形成に関わらず、接合用金属膜へのゴミの付着を防ぐことができる。
Further, since the bonding metal film provided on the lid can be provided without using a mask such as a resist, the work of accurately providing the mask is omitted, and the workability can be improved.
In addition, the bonding metal film forming process for providing the bonding metal film on the lid body is performed simultaneously with or before any one of the processes from the through-hole forming process to the piezoelectric vibration element mounting process. The bonding metal film forming step can prevent dust from adhering to the bonding metal film regardless of the formation of the wiring pattern or the like on the substrate body.

また、ウェハの状態で基板体と蓋体とが接合されるので、複数の圧電振動子を一括で形成することができる。   In addition, since the substrate body and the lid body are bonded in the state of a wafer, a plurality of piezoelectric vibrators can be formed at a time.

また、接合用金属膜をAl(アルミニウム)としたことで、基板体と蓋体との接合を容易にさせることができる。   Further, since the bonding metal film is made of Al (aluminum), it is possible to easily bond the substrate body and the lid body.

次に、本発明を実施するための最良の形態(以下、「実施形態」という。)について、適宜図面を参照しながら詳細に説明する。なお、本発明の圧電振動子には、圧電素子として矩形形状の水晶が用いられる場合について説明する。
図1は実装・接合前の状態を示す斜視図である。図2は図1のA−A断面において、(a)はウェハ状の基板体の一例を示す概念図であり、(b)は基板体となる位置にスルーホールを設けた状態を示す概念図であり、(c)は基板体となる位置に配線パターンと外部端子を設けた状態を示す概念図であり、(d)は配線パターンに圧電振動素子を実装した状態を示す概念図である。図3は図1のA−A断面の位置に対応する断面において、(a)はウェハ状の蓋体の一例を示す概念図であり、(b)は蓋体となる位置に凹部を設けた状態を示す概念図であり、(c)は凹部が形成された面に接合用金属膜を設けた状態を示す概念図である。図4は(a)は基板体と蓋体とを接合する前の状態を示す概念図であり、(b)は基板体と蓋体とを接合した状態を示す概念図である。図5は圧電振動素子の一例を示す断面図である。
Next, the best mode for carrying out the present invention (hereinafter referred to as “embodiment”) will be described in detail with reference to the drawings as appropriate. The case where a rectangular crystal is used as the piezoelectric element will be described in the piezoelectric vibrator of the present invention.
FIG. 1 is a perspective view showing a state before mounting and joining. 2A is a conceptual diagram illustrating an example of a wafer-like substrate body, and FIG. 2B is a conceptual diagram illustrating a state in which a through hole is provided at a position serving as a substrate body. (C) is a conceptual diagram showing a state in which a wiring pattern and external terminals are provided at a position to be a substrate body, and (d) is a conceptual diagram showing a state in which a piezoelectric vibration element is mounted on the wiring pattern. FIG. 3 is a cross-sectional view corresponding to the position of the AA cross section of FIG. 1, (a) is a conceptual diagram showing an example of a wafer-like lid, and (b) is provided with a recess at a position to be a lid. It is a conceptual diagram which shows a state, (c) is a conceptual diagram which shows the state which provided the metal film for joining in the surface in which the recessed part was formed. 4A is a conceptual diagram illustrating a state before the substrate body and the lid body are joined, and FIG. 4B is a conceptual diagram illustrating a state in which the substrate body and the lid body are joined. FIG. 5 is a cross-sectional view showing an example of a piezoelectric vibration element.

図1及び図5に示すように、本発明の圧電振動子の製造方法で製造される圧電振動子100は、基板体10、圧電振動素子20、蓋体30とから主に構成されている。   As shown in FIGS. 1 and 5, the piezoelectric vibrator 100 manufactured by the method for manufacturing a piezoelectric vibrator of the present invention is mainly composed of a substrate body 10, a piezoelectric vibration element 20, and a lid body 30.

基板体10は、例えば、ガラスで構成され、図1に示すように、形状が平面視矩形形状の平板状となっており、一方の主面に配線パターン11が設けられ、他方の主面に外部端子12が矩形形状の四隅に設けられている。
配線パターン11は、圧電振動素子20を搭載するための2つ一対の搭載部11Aと所定の外部端子12と接続するための引回し部11Bとから構成される。
引回し部11Bは、一方の端部が1つの搭載部11Aと接続し、他方の端部が基板体10に設けられたスルーホール13を介して所定の1つの外部端子12と電気的に接続している。
なお、もう一つの搭載部11Aは、基板体10に設けられた別のスルーホール13を介して、引回し部11Bと接続している外部端子12とは別の外部端子12と接続している。
The substrate body 10 is made of, for example, glass, and as shown in FIG. 1, the substrate body 10 is a flat plate having a rectangular shape in plan view. A wiring pattern 11 is provided on one main surface, and the other main surface is provided with a wiring pattern 11. External terminals 12 are provided at four corners of the rectangular shape.
The wiring pattern 11 includes two pairs of mounting portions 11 </ b> A for mounting the piezoelectric vibration element 20 and a routing portion 11 </ b> B for connecting to a predetermined external terminal 12.
One end of the routing portion 11B is connected to one mounting portion 11A, and the other end is electrically connected to one predetermined external terminal 12 through a through hole 13 provided in the substrate body 10. doing.
The other mounting portion 11A is connected to an external terminal 12 different from the external terminal 12 connected to the routing portion 11B through another through hole 13 provided in the substrate body 10. .

圧電振動素子20は、例えば、圧電片である平面視矩形形状の水晶片21の両主面に励振電極22が設けられており、それぞれの主面に設けられた励振電極22からこの水晶片21の端部側に伸びる引回しパターン23が形成されている(図1参照)。
この圧電振動素子20は、励振電極22と接続している引回しパターン23と基板体10に設けられた配線パターン11の搭載部11Aに導電性接着材Dにより接合される。
これにより、圧電振動素子20は基板体10に実装される。
In the piezoelectric vibration element 20, for example, excitation electrodes 22 are provided on both main surfaces of a crystal piece 21 having a rectangular shape in plan view, which is a piezoelectric piece, and the crystal piece 21 is formed from the excitation electrodes 22 provided on the respective main surfaces. A routing pattern 23 is formed extending toward the end portion side (see FIG. 1).
The piezoelectric vibration element 20 is bonded to the lead pattern 23 connected to the excitation electrode 22 and the mounting portion 11A of the wiring pattern 11 provided on the substrate body 10 by the conductive adhesive D.
Thereby, the piezoelectric vibration element 20 is mounted on the substrate body 10.

蓋体30は、図1及び図5に示すように、平板部31と枠部32とで凹部33が形成されており、この凹部内の全面及び凹部33の底面と同じ方向を向く枠部32の面とに接合用金属膜34が設けられている。
この接合用金属膜34は、Al(アルミニウム)からなり、基板体10と蓋体20とを接合する際に用いられる。
なお、この蓋体は、例えば、ガラスで構成されている。
As shown in FIGS. 1 and 5, the lid 30 has a concave portion 33 formed of a flat plate portion 31 and a frame portion 32, and the frame portion 32 faces the same direction as the entire surface in the concave portion and the bottom surface of the concave portion 33. A metal film for bonding 34 is provided on the surface of this.
The bonding metal film 34 is made of Al (aluminum) and is used when the substrate body 10 and the lid body 20 are bonded.
The lid is made of glass, for example.

このような圧電振動子100は、接合用金属膜34が蓋体30に設けられており、基板体10には配線パターン11と外部端子12以外に接合用金属膜が設けられることがないので、接合用金属膜と配線パターン11とがショートすることがなく、また、小型化されても、配線パターン11の形成が容易に行うことができる。また、蓋体30の凹部内の全面及び凹部33の底面と同じ方向を向く枠部32の面とに接合用金属膜34が設けられた構造であるため、従来のような接合用のパターンを基板体10に形成する必要がなく、容易に蓋体30に接合用金属膜34を設けることができる。   In such a piezoelectric vibrator 100, the bonding metal film 34 is provided on the lid body 30, and the bonding metal film other than the wiring pattern 11 and the external terminal 12 is not provided on the substrate body 10. The bonding metal film and the wiring pattern 11 are not short-circuited, and the wiring pattern 11 can be easily formed even when the size is reduced. In addition, since the bonding metal film 34 is provided on the entire surface in the concave portion of the lid 30 and the surface of the frame portion 32 facing the same direction as the bottom surface of the concave portion 33, a conventional pattern for bonding is provided. There is no need to form the substrate body 10, and the bonding metal film 34 can be easily provided on the lid body 30.

次に、本発明の実施形態に係る圧電振動素子の製造方法について説明する。
なお、圧電振動素子20は、予め、圧電片である水晶片21に励振電極22と引回しパターン23が形成された状態となっているとして説明する。
Next, a method for manufacturing a piezoelectric vibration element according to an embodiment of the present invention will be described.
In the following description, it is assumed that the piezoelectric vibration element 20 is in a state in which the excitation electrode 22 and the lead pattern 23 are formed in advance on a crystal piece 21 that is a piezoelectric piece.

まず、図2(a)〜(b)に示すように、基板体10より面積が大きい板状のウェハに所定の間隔をあけて複数のスルーホール13を設ける(スルーホール形成工程)。このとき、スルーホール13が2つ一対の状態で行列状に並べた状態となるようにする。
このウェハの全面に無電解メッキ法や従来周知のスパッタを用いて銅の膜を設ける。
そして、配線パターン11の形状となるようにレジストをウェハに塗布し、露光、現像を行う。このとき、スルーホール13は、配線パターン11内に位置している。
そしてスルーホール13を銅で埋めて配線パターン11と接続させる。
メッキされている不要な銅を除去、及び、レジストを除去して、配線パターン11を形成する(図2(c)参照)(パターン形成工程)。
First, as shown in FIGS. 2A to 2B, a plurality of through holes 13 are provided at a predetermined interval on a plate-like wafer having a larger area than the substrate body 10 (through hole forming step). At this time, the through holes 13 are arranged in a matrix with two pairs.
A copper film is formed on the entire surface of the wafer by using an electroless plating method or a conventionally known sputtering.
Then, a resist is applied to the wafer so as to have the shape of the wiring pattern 11, and exposure and development are performed. At this time, the through hole 13 is located in the wiring pattern 11.
Then, the through hole 13 is filled with copper and connected to the wiring pattern 11.
Unnecessary plated copper is removed and the resist is removed to form a wiring pattern 11 (see FIG. 2C) (pattern formation step).

なお、パターン形成工程において、ウェハの配線パターン11を設けた面とは反対側の面に4つ一対の外部端子12を設けても良いし、別工程で外部端子12を設けても良い。これら4つの外部端子12のうち、2つの外部端子12がそれぞれ1つずつスルーホール13を内部に位置させている。従って、スルーホール13を銅で埋められることで、配線パターン11と外部端子12とがスルーホール13を介して電気的に接続された状態となる。
また、4つの外部端子12を囲む領域が基板体10となっている。この状態で複数の基板体10が行列状に並べられてウェハ状になっている。
In the pattern forming step, a pair of four external terminals 12 may be provided on the surface opposite to the surface on which the wiring pattern 11 of the wafer is provided, or the external terminals 12 may be provided in a separate step. Of these four external terminals 12, two external terminals 12 each have one through hole 13 positioned therein. Therefore, by filling the through hole 13 with copper, the wiring pattern 11 and the external terminal 12 are electrically connected via the through hole 13.
A region surrounding the four external terminals 12 is a substrate body 10. In this state, a plurality of substrate bodies 10 are arranged in a matrix to form a wafer.

図2(d)に示すように、このウェハ状になっている複数の基板体10のそれぞれの配線パターン11に圧電振動素子20を導電性接着材により実装する(圧電振動素子実装工程)。   As shown in FIG. 2D, the piezoelectric vibration element 20 is mounted on each wiring pattern 11 of the plurality of substrate bodies 10 in a wafer shape with a conductive adhesive (piezoelectric vibration element mounting step).

図3(a)〜(b)に示すように、蓋体30より面積が大きい板状のウェハに所定の間隔をあけて複数の凹部33を設ける。このとき、凹部33が行列状に並べた状態となるようにする。
なお、凹部33は、例えば、ウェハの所定の領域にレジストを塗布し、エッッチャントに浸すことで形成することができる。
As shown in FIGS. 3A to 3B, a plurality of recesses 33 are provided at a predetermined interval on a plate-like wafer having a larger area than the lid 30. At this time, the recesses 33 are arranged in a matrix.
The recess 33 can be formed, for example, by applying a resist to a predetermined region of the wafer and immersing it in an etchant.

図3(c)に示すように、このウェハの凹部33を形成した面及び凹部33内に接合用金属膜34を成膜する(接合用金属膜形成工程)。
このように接合用金属膜34を設けたウェハは、隣り合う凹部33の間を境にして複数の蓋体30が形成された状態となる。この状態で複数の蓋体30が行列状に並べられてウェハ状になっている。
As shown in FIG. 3C, a bonding metal film 34 is formed on the surface of the wafer where the recess 33 is formed and in the recess 33 (bonding metal film forming step).
Thus, the wafer provided with the bonding metal film 34 is in a state in which a plurality of lids 30 are formed with the boundary between adjacent recesses 33 as a boundary. In this state, a plurality of lids 30 are arranged in a matrix to form a wafer.

この接合用金属膜形成工程は、スルーホール形成工程、パターン形成工程、圧電振動素子実装工程までの工程のいずれかの工程と同時または先に行ってもよい。
これにより、接合用金属膜形成工程が、スルーホール形成工程、パターン形成工程、圧電振動素子実装工程のどの工程についても別の場所で行われる工程となり、特に、接合用金属膜形成工程が基板体への配線パターン等の形成に関わらず、接合用金属膜へのゴミの付着を防ぐことができる。
This bonding metal film forming step may be performed simultaneously with or before any of the steps up to the through hole forming step, the pattern forming step, and the piezoelectric vibration element mounting step.
As a result, the bonding metal film forming step is performed at a different location for any of the through hole forming step, the pattern forming step, and the piezoelectric vibration element mounting step. In particular, the bonding metal film forming step is performed on the substrate body. Regardless of the formation of the wiring pattern or the like, it is possible to prevent dust from adhering to the bonding metal film.

図4(a)〜(b)に示すように、圧電振動素子20が実装されたウェハ状の複数の基板体10に、凹部33内に圧電振動素子20が入るように、ウェハ状の複数の蓋体30を重ねて、接合用金属膜34を基板体10に接触させる。
この状態で、所定の電圧を印加して陽極接合を行い、前記ウェハ状の基板体と前記ウェハ状の蓋体とが共にウェハ状で接合させる。
As shown in FIGS. 4A to 4B, a plurality of wafer-shaped substrates 20 are mounted in the recesses 33 on the plurality of wafer-shaped substrate bodies 10 on which the piezoelectric vibration elements 20 are mounted. The lid 30 is stacked and the bonding metal film 34 is brought into contact with the substrate body 10.
In this state, a predetermined voltage is applied to perform anodic bonding, and the wafer-shaped substrate body and the wafer-shaped lid body are bonded together in a wafer shape.

接合が完了すると、複数の圧電振動子100が行列状に並べられた状態となる。
この状態で、例えば、隣り合う凹部33の間を切断や割断することで個々の圧電振動子100とすることができる(図5参照)。
When the joining is completed, a plurality of piezoelectric vibrators 100 are arranged in a matrix.
In this state, for example, the individual piezoelectric vibrators 100 can be formed by cutting or cleaving between the adjacent recesses 33 (see FIG. 5).

このように、本発明の実施形態に係る圧電振動子の製造方法によれば、基板体10に配線パターン11を設け、蓋体30に接合用金属膜34を設けたので、圧電振動子100が小型化されても、配線パターン11の形成に精密性の要求がなくなり、圧電振動子100の製造を容易にすることができる。
また、蓋体30に設けた接合用金属膜34は、レジスト等のマスクを用いなくても設けることができるので、マスクを正確に設ける作業が省略され、作業性を向上させることができる。
As described above, according to the method of manufacturing a piezoelectric vibrator according to the embodiment of the present invention, the wiring pattern 11 is provided on the substrate body 10 and the bonding metal film 34 is provided on the lid body 30. Even if the size is reduced, the precision of the formation of the wiring pattern 11 is eliminated, and the manufacture of the piezoelectric vibrator 100 can be facilitated.
Further, since the bonding metal film 34 provided on the lid 30 can be provided without using a mask such as a resist, the work of accurately providing the mask is omitted, and the workability can be improved.

また、接合用金属膜34を蓋体30に設ける接合用金属膜形成工程をスルーホール形成工程、パターン形成工程、圧電振動素子実装工程までの工程のいずれかの工程と同時または先に行うことで、接合用金属膜形成工程が、スルーホール形成工程、パターン形成工程、圧電振動素子実装工程のどの工程についても別の場所で行われる工程となり、接合用金属膜34へのゴミの付着を防ぐことができる。
また、ウェハの状態で基板体10と蓋体30とが接合されるので、複数の圧電振動子100を一括で形成することができる。
また、接合用金属膜34をAl(アルミニウム)としたことで、基板体10と蓋体30との接合を容易にさせることができる。
Further, the bonding metal film forming process for providing the bonding metal film 34 on the lid 30 is performed at the same time as or before any of the processes from the through hole forming process, the pattern forming process, and the piezoelectric vibration element mounting process. In addition, the bonding metal film forming process is performed at a different location for any of the through hole forming process, the pattern forming process, and the piezoelectric vibration element mounting process, thereby preventing dust from adhering to the bonding metal film 34. Can do.
In addition, since the substrate body 10 and the lid body 30 are bonded in the state of a wafer, a plurality of piezoelectric vibrators 100 can be formed at a time.
Further, since the bonding metal film 34 is made of Al (aluminum), the substrate body 10 and the lid body 30 can be easily bonded.

以上、本発明の実施形態について説明したが、本発明は前記実施形態には限定されない。例えば、圧電素子としてセラミック等を用いることもできる。また、圧電振動素子が音叉型の形状となっていても良い。
また、このような構造の圧電振動子では、接合用金属膜34が蓋体30の凹部33の全面に設けられているため、外部からのレーザー照射により、接合用金属膜34に印字させることが出来る。
なお、外部端子は、基板体10の四隅に設ける以外に、相対するように2箇所に設けても良い。
As mentioned above, although embodiment of this invention was described, this invention is not limited to the said embodiment. For example, ceramic or the like can be used as the piezoelectric element. Further, the piezoelectric vibration element may have a tuning fork shape.
Further, in the piezoelectric vibrator having such a structure, since the bonding metal film 34 is provided on the entire surface of the recess 33 of the lid 30, printing can be performed on the bonding metal film 34 by external laser irradiation. I can do it.
The external terminals may be provided at two locations so as to face each other in addition to the four corners of the substrate body 10.

実装・接合前の状態を示す斜視図である。It is a perspective view which shows the state before mounting and joining. 図1のA−A断面において、(a)はウェハ状の基板体の一例を示す概念図であり、(b)は、基板体となる位置にスルーホールを設けた状態を示す概念図であり、(c)は基板体となる位置に配線パターンと外部端子を設けた状態を示す概念図であり、(d)は配線パターンに圧電振動素子を実装した状態を示す概念図である。1A is a conceptual diagram illustrating an example of a wafer-like substrate body, and FIG. 1B is a conceptual diagram illustrating a state in which a through hole is provided at a position to be a substrate body. (C) is a conceptual diagram which shows the state which provided the wiring pattern and the external terminal in the position used as a board | substrate body, (d) is a conceptual diagram which shows the state which mounted the piezoelectric vibration element in the wiring pattern. 図1のA−A断面の位置に対応する断面において、(a)はウェハ状の蓋体の一例を示す概念図であり、(b)は、蓋体となる位置に凹部を設けた状態を示す概念図であり、(c)は凹部が形成された面に接合用金属膜を設けた状態を示す概念図である。In the cross section corresponding to the position of the AA cross section of FIG. 1, (a) is a conceptual diagram which shows an example of a wafer-like cover body, (b) is the state which provided the recessed part in the position used as a cover body. It is a conceptual diagram to show, (c) is a conceptual diagram which shows the state which provided the metal film for joining in the surface in which the recessed part was formed. (a)は基板体と蓋体とを接合する前の状態を示す概念図であり、(b)は基板体と蓋体とを接合した状態を示す概念図である。(A) is a conceptual diagram which shows the state before joining a board | substrate body and a cover body, (b) is a conceptual diagram which shows the state which joined the board body and the cover body. 圧電振動素子の一例を示す断面図である。It is sectional drawing which shows an example of a piezoelectric vibration element.

符号の説明Explanation of symbols

100 圧電振動子
10 基板体
11 配線パターン
12 外部端子
13 スルーホール
20 圧電振動素子
21 水晶片(圧電片)
22 励振電極
23 引回しパターン
30 蓋体
31 平板部
32 枠部
33 凹部
34 接合用金属膜
DESCRIPTION OF SYMBOLS 100 Piezoelectric vibrator 10 Substrate body 11 Wiring pattern 12 External terminal 13 Through hole 20 Piezoelectric vibration element 21 Crystal piece (piezoelectric piece)
22 Excitation Electrode 23 Leading Pattern 30 Lid 31 Flat Plate 32 Frame 33 Recess 34 Bonding Metal Film

Claims (3)

一方の主面に配線パターンが設けられ他方の主面に外部端子が設けられた平板状の基板体に圧電振動素子が実装され凹部を有する蓋体を前記基板体に接合して前記圧電振動素子を前記凹部内に気密封止した圧電振動子の製造方法であって、
前記基板体の前記配線パターンに対応した位置にスルーホールを設けるスルーホール形成工程と、
前記基板体に前記配線パターンと前記外部端子とを形成し、前記スルーホールを導電性材料で埋めるパターン形成工程と、
前記配線パターンに前記圧電振動素子を実装する圧電振動素子実装工程と、
平板部と枠部とによる前記凹部を有する前記蓋体における前記凹部内及び前記凹部の底面と同一方向を向く前記枠部の面に接合用金属膜を設ける接合用金属膜形成工程と、
前記蓋体を前記基板体に接触させ陽極接合により前記基板体と前記蓋体とを接合する接合工程とからなり、
前記接合用金属膜形成工程が、前記スルーホール形成工程から前記圧電振動素子実装工程までの工程のいずれかの工程と同時または先に行われる
ことを特徴とする圧電振動子の製造方法。
A piezoelectric vibration element is mounted on a flat substrate body provided with a wiring pattern on one main surface and an external terminal is provided on the other main surface, and a lid body having a recess is joined to the substrate body. Is a method of manufacturing a piezoelectric vibrator hermetically sealed in the recess,
A through hole forming step of providing a through hole at a position corresponding to the wiring pattern of the substrate body;
Forming the wiring pattern and the external terminal on the substrate body, and filling the through hole with a conductive material;
A piezoelectric vibration element mounting step of mounting the piezoelectric vibration element on the wiring pattern;
And bonding metal film forming step of providing a bonding metal layer on the surface of the frame portion facing the bottom surface in the same direction of the recess and the recess in the lid to have the said recess by a plate portion and a frame portion,
Ri Do and a bonding step of bonding the cover member and the substrate member by anodic bonding by contacting the lid to the substrate body,
The method for manufacturing a piezoelectric vibrator, wherein the bonding metal film forming step is performed simultaneously with or before any of the steps from the through hole forming step to the piezoelectric vibrating element mounting step .
前記基板体が行列状に並べられてウェハ状となっており、かつ、前記蓋体が行列状に並べられてウェハ状となっており、前記ウェハ状の基板体と前記ウェハ状の蓋体とが共にウェハ状で接合されることを特徴とする請求項1に記載の圧電振動子の製造方法。 The substrate bodies are arranged in a matrix to form a wafer, and the lid bodies are arranged in a matrix to form a wafer, and the wafer-shaped substrate body and the wafer-shaped lid method for manufacturing a piezoelectric vibrator according to claim 1 but characterized by Rukoto joined together in the wafer form. 前記接合用金属膜がAl(アルミニウム)であることを特徴とする請求項1又は請求項2に記載の圧電振動子の製造方法。 Method for manufacturing a piezoelectric vibrator according to claim 1 or claim 2 wherein the bonding metal film is characterized in Al (aluminum) der Rukoto.
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JP5452264B2 (en) * 2010-02-05 2014-03-26 エスアイアイ・クリスタルテクノロジー株式会社 Piezoelectric vibrator and oscillator using the same
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