JP4993116B2 - Amino group silylation method - Google Patents
Amino group silylation method Download PDFInfo
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- JP4993116B2 JP4993116B2 JP2007314135A JP2007314135A JP4993116B2 JP 4993116 B2 JP4993116 B2 JP 4993116B2 JP 2007314135 A JP2007314135 A JP 2007314135A JP 2007314135 A JP2007314135 A JP 2007314135A JP 4993116 B2 JP4993116 B2 JP 4993116B2
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- amino group
- carbon atoms
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- reaction
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- 125000003277 amino group Chemical group 0.000 title claims description 33
- 238000006884 silylation reaction Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 12
- -1 chlorosilane compound Chemical class 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 239000005046 Chlorosilane Substances 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 8
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 8
- 238000004817 gas chromatography Methods 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 229940098779 methanesulfonic acid Drugs 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 5
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- 239000007806 chemical reaction intermediate Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- CNBFINHDTHWNJY-UHFFFAOYSA-N 2,2,5,5-tetramethyl-1-phenyl-1,2,5-azadisilolidine Chemical compound C[Si]1(C)CC[Si](C)(C)N1C1=CC=CC=C1 CNBFINHDTHWNJY-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- ZORXUKVCUGPVQT-UHFFFAOYSA-N 3-chlorosilyl-N,N-diethylprop-2-en-1-amine Chemical compound Cl[SiH2]C=CCN(CC)CC ZORXUKVCUGPVQT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- MQWJCFBYOCOAQO-UHFFFAOYSA-N N-[diethylamino(prop-1-enyl)silyl]-N-ethylethanamine Chemical compound C(C)N(CC)[SiH](C=CC)N(CC)CC MQWJCFBYOCOAQO-UHFFFAOYSA-N 0.000 description 2
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- VGQOKOYKFDUPPJ-UHFFFAOYSA-N chloro-[2-[chloro(dimethyl)silyl]ethyl]-dimethylsilane Chemical compound C[Si](C)(Cl)CC[Si](C)(C)Cl VGQOKOYKFDUPPJ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- MXBZZBXMVQSEEX-UHFFFAOYSA-N n-[tert-butyl(dimethyl)silyl]-n-ethylethanamine Chemical compound CCN(CC)[Si](C)(C)C(C)(C)C MXBZZBXMVQSEEX-UHFFFAOYSA-N 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- GKNWQHIXXANPTN-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-N 0.000 description 1
- DFXIGNRYXLVEDF-UHFFFAOYSA-N 1,2,2,2-tetrafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)C(F)(F)F DFXIGNRYXLVEDF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- CDULGHZNHURECF-UHFFFAOYSA-N 2,3-dimethylaniline 2,4-dimethylaniline 2,5-dimethylaniline 2,6-dimethylaniline 3,4-dimethylaniline 3,5-dimethylaniline Chemical group CC1=CC=C(N)C(C)=C1.CC1=CC=C(C)C(N)=C1.CC1=CC(C)=CC(N)=C1.CC1=CC=C(N)C=C1C.CC1=CC=CC(N)=C1C.CC1=CC=CC(C)=C1N CDULGHZNHURECF-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- CMBXEXDBVNIIKT-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propanenitrile Chemical compound C[Si](C)(Cl)CCC#N CMBXEXDBVNIIKT-UHFFFAOYSA-N 0.000 description 1
- OKQXCDUCLYWRHA-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)Cl OKQXCDUCLYWRHA-UHFFFAOYSA-N 0.000 description 1
- PXKPPXIGPAIWDZ-UHFFFAOYSA-N 3-[dichloro(methyl)silyl]propanenitrile Chemical compound C[Si](Cl)(Cl)CCC#N PXKPPXIGPAIWDZ-UHFFFAOYSA-N 0.000 description 1
- QXKMQBOTKLTKOE-UHFFFAOYSA-N 3-[dichloro(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(Cl)Cl QXKMQBOTKLTKOE-UHFFFAOYSA-N 0.000 description 1
- CNWZDXMFPRCFFL-UHFFFAOYSA-N 3-[dichloro(methyl)silyl]propyl acetate Chemical compound CC(=O)OCCC[Si](C)(Cl)Cl CNWZDXMFPRCFFL-UHFFFAOYSA-N 0.000 description 1
- GBAQKTTVWCCNHH-UHFFFAOYSA-N 3-[dichloro(methyl)silyl]propyl prop-2-enoate Chemical compound C[Si](Cl)(Cl)CCCOC(=O)C=C GBAQKTTVWCCNHH-UHFFFAOYSA-N 0.000 description 1
- OLBGECWYBGXCNV-UHFFFAOYSA-N 3-trichlorosilylpropanenitrile Chemical compound Cl[Si](Cl)(Cl)CCC#N OLBGECWYBGXCNV-UHFFFAOYSA-N 0.000 description 1
- VAZGKQJHXXBSSK-UHFFFAOYSA-N 3-trichlorosilylpropyl acetate Chemical compound CC(=O)OCCC[Si](Cl)(Cl)Cl VAZGKQJHXXBSSK-UHFFFAOYSA-N 0.000 description 1
- LEPRPXBFZRAOGU-UHFFFAOYSA-N 3-trichlorosilylpropyl prop-2-enoate Chemical compound Cl[Si](Cl)(Cl)CCCOC(=O)C=C LEPRPXBFZRAOGU-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- SAIKULLUBZKPDA-UHFFFAOYSA-N Bis(2-ethylhexyl) amine Chemical compound CCCCC(CC)CNCC(CC)CCCC SAIKULLUBZKPDA-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- NUHPRPBUYOGFHX-UHFFFAOYSA-N butan-2-yl(trichloro)silane Chemical compound CCC(C)[Si](Cl)(Cl)Cl NUHPRPBUYOGFHX-UHFFFAOYSA-N 0.000 description 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-N butane-1-sulfonic acid Chemical compound CCCCS(O)(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-N 0.000 description 1
- FQEKAFQSVPLXON-UHFFFAOYSA-N butyl(trichloro)silane Chemical compound CCCC[Si](Cl)(Cl)Cl FQEKAFQSVPLXON-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- UANDAQWXKUOGLV-UHFFFAOYSA-N chloro(tricyclohexyl)silane Chemical compound C1CCCCC1[Si](C1CCCCC1)(Cl)C1CCCCC1 UANDAQWXKUOGLV-UHFFFAOYSA-N 0.000 description 1
- HOOMRPALMNVKFZ-UHFFFAOYSA-N chloro(tricyclopentyl)silane Chemical compound C1CCCC1[Si](C1CCCC1)(Cl)C1CCCC1 HOOMRPALMNVKFZ-UHFFFAOYSA-N 0.000 description 1
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
- ACTAPAGNZPZLEF-UHFFFAOYSA-N chloro(tripropyl)silane Chemical compound CCC[Si](Cl)(CCC)CCC ACTAPAGNZPZLEF-UHFFFAOYSA-N 0.000 description 1
- BJLJNLUARMMMLW-UHFFFAOYSA-N chloro-(3-chloropropyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCCCl BJLJNLUARMMMLW-UHFFFAOYSA-N 0.000 description 1
- ITKVLPYNJQOCPW-UHFFFAOYSA-N chloro-(chloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCl ITKVLPYNJQOCPW-UHFFFAOYSA-N 0.000 description 1
- CTASGGUMBWOTOH-UHFFFAOYSA-N chloro-[3-[chloro(dimethyl)silyl]-4-bicyclo[2.2.1]heptanyl]-dimethylsilane Chemical compound C1CC2([Si](C)(C)Cl)C([Si](C)(Cl)C)CC1C2 CTASGGUMBWOTOH-UHFFFAOYSA-N 0.000 description 1
- SEEQROYMPAMQOF-UHFFFAOYSA-N chloro-[6-[chloro(dimethyl)silyl]hexyl]-dimethylsilane Chemical compound C[Si](C)(Cl)CCCCCC[Si](C)(C)Cl SEEQROYMPAMQOF-UHFFFAOYSA-N 0.000 description 1
- HKPQSAMLXJHFSU-UHFFFAOYSA-N chloro-cyclopentyl-dimethylsilane Chemical compound C[Si](C)(Cl)C1CCCC1 HKPQSAMLXJHFSU-UHFFFAOYSA-N 0.000 description 1
- ZLZGHBNDPINFKG-UHFFFAOYSA-N chloro-decyl-dimethylsilane Chemical compound CCCCCCCCCC[Si](C)(C)Cl ZLZGHBNDPINFKG-UHFFFAOYSA-N 0.000 description 1
- PDNUHAXBKKDGAM-UHFFFAOYSA-N chloro-diethyl-methylsilane Chemical compound CC[Si](C)(Cl)CC PDNUHAXBKKDGAM-UHFFFAOYSA-N 0.000 description 1
- KBAZUXSLKGQRJF-UHFFFAOYSA-N chloro-dimethyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)F KBAZUXSLKGQRJF-UHFFFAOYSA-N 0.000 description 1
- IHMWVSNXULAOAZ-UHFFFAOYSA-N chloro-dimethyl-(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F IHMWVSNXULAOAZ-UHFFFAOYSA-N 0.000 description 1
- GZGREZWGCWVAEE-UHFFFAOYSA-N chloro-dimethyl-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)(C)Cl GZGREZWGCWVAEE-UHFFFAOYSA-N 0.000 description 1
- DBKNGKYVNBJWHL-UHFFFAOYSA-N chloro-dimethyl-octylsilane Chemical compound CCCCCCCC[Si](C)(C)Cl DBKNGKYVNBJWHL-UHFFFAOYSA-N 0.000 description 1
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 1
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 description 1
- AVDUEHWPPXIAEB-UHFFFAOYSA-N chloro-ethyl-dimethylsilane Chemical compound CC[Si](C)(C)Cl AVDUEHWPPXIAEB-UHFFFAOYSA-N 0.000 description 1
- JQYKSDDVPXVEOL-UHFFFAOYSA-N chloro-hexyl-dimethylsilane Chemical compound CCCCCC[Si](C)(C)Cl JQYKSDDVPXVEOL-UHFFFAOYSA-N 0.000 description 1
- OJZNZOXALZKPEA-UHFFFAOYSA-N chloro-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C)C1=CC=CC=C1 OJZNZOXALZKPEA-UHFFFAOYSA-N 0.000 description 1
- TZPZCTBZJKZFGY-UHFFFAOYSA-N chloro-tris(2-methylpropyl)silane Chemical compound CC(C)C[Si](Cl)(CC(C)C)CC(C)C TZPZCTBZJKZFGY-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- NISGSNTVMOOSJQ-UHFFFAOYSA-N cyclopentanamine Chemical compound NC1CCCC1 NISGSNTVMOOSJQ-UHFFFAOYSA-N 0.000 description 1
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- JXHIFYNEHLBJFI-UHFFFAOYSA-N dichloro-[3-[dichloro(methyl)silyl]-4-bicyclo[2.2.1]heptanyl]-methylsilane Chemical compound C1CC2([Si](C)(Cl)Cl)C([Si](Cl)(Cl)C)CC1C2 JXHIFYNEHLBJFI-UHFFFAOYSA-N 0.000 description 1
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- OHABWQNEJUUFAV-UHFFFAOYSA-N dichloro-methyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)F OHABWQNEJUUFAV-UHFFFAOYSA-N 0.000 description 1
- SNVXETNSVRUKHB-UHFFFAOYSA-N dichloro-methyl-(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNVXETNSVRUKHB-UHFFFAOYSA-N 0.000 description 1
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- QHBMMABVNRSRHW-UHFFFAOYSA-N dichloro-methyl-octylsilane Chemical compound CCCCCCCC[Si](C)(Cl)Cl QHBMMABVNRSRHW-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
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- 229940043279 diisopropylamine Drugs 0.000 description 1
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- 238000004821 distillation Methods 0.000 description 1
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- YCIGMXVAUVFHGG-UHFFFAOYSA-N ditert-butyl-chloro-methylsilane Chemical compound CC(C)(C)[Si](C)(Cl)C(C)(C)C YCIGMXVAUVFHGG-UHFFFAOYSA-N 0.000 description 1
- HFKAXIJVUWWRDN-UHFFFAOYSA-N ditert-butyl-chloro-phenylsilane Chemical compound CC(C)(C)[Si](Cl)(C(C)(C)C)C1=CC=CC=C1 HFKAXIJVUWWRDN-UHFFFAOYSA-N 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
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- 229930195733 hydrocarbon Natural products 0.000 description 1
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- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
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- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
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- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
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- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 239000005053 propyltrichlorosilane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- MOOUPSHQAMJMSL-UHFFFAOYSA-N tert-butyl(trichloro)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)Cl MOOUPSHQAMJMSL-UHFFFAOYSA-N 0.000 description 1
- MHYGQXWCZAYSLJ-UHFFFAOYSA-N tert-butyl-chloro-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C(C)(C)C)C1=CC=CC=C1 MHYGQXWCZAYSLJ-UHFFFAOYSA-N 0.000 description 1
- CAJIIZKPZKCXOG-UHFFFAOYSA-N tert-butyl-dichloro-methylsilane Chemical compound CC(C)(C)[Si](C)(Cl)Cl CAJIIZKPZKCXOG-UHFFFAOYSA-N 0.000 description 1
- OCXPCSGIIJESOA-UHFFFAOYSA-N tert-butyl-dichloro-phenylsilane Chemical compound CC(C)(C)[Si](Cl)(Cl)C1=CC=CC=C1 OCXPCSGIIJESOA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- DOVSWWRKFANNHT-UHFFFAOYSA-N tri(butan-2-yl)-chlorosilane Chemical compound CCC(C)[Si](Cl)(C(C)CC)C(C)CC DOVSWWRKFANNHT-UHFFFAOYSA-N 0.000 description 1
- JSQJUDVTRRCSRU-UHFFFAOYSA-N tributyl(chloro)silane Chemical compound CCCC[Si](Cl)(CCCC)CCCC JSQJUDVTRRCSRU-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- GBXOGFTVYQSOID-UHFFFAOYSA-N trichloro(2-methylpropyl)silane Chemical compound CC(C)C[Si](Cl)(Cl)Cl GBXOGFTVYQSOID-UHFFFAOYSA-N 0.000 description 1
- WDVUXWDZTPZIIE-UHFFFAOYSA-N trichloro(2-trichlorosilylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CC[Si](Cl)(Cl)Cl WDVUXWDZTPZIIE-UHFFFAOYSA-N 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- ZCVOUFBEEYGNOL-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl ZCVOUFBEEYGNOL-UHFFFAOYSA-N 0.000 description 1
- VIFIHLXNOOCGLJ-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl VIFIHLXNOOCGLJ-UHFFFAOYSA-N 0.000 description 1
- OOXSLJBUMMHDKW-UHFFFAOYSA-N trichloro(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)Cl OOXSLJBUMMHDKW-UHFFFAOYSA-N 0.000 description 1
- ICJGKYTXBRDUMV-UHFFFAOYSA-N trichloro(6-trichlorosilylhexyl)silane Chemical compound Cl[Si](Cl)(Cl)CCCCCC[Si](Cl)(Cl)Cl ICJGKYTXBRDUMV-UHFFFAOYSA-N 0.000 description 1
- SIPHWXREAZVVNS-UHFFFAOYSA-N trichloro(cyclohexyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCCC1 SIPHWXREAZVVNS-UHFFFAOYSA-N 0.000 description 1
- FCMZRNUHEXJWGB-UHFFFAOYSA-N trichloro(cyclopentyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCC1 FCMZRNUHEXJWGB-UHFFFAOYSA-N 0.000 description 1
- HLWCOIUDOLYBGD-UHFFFAOYSA-N trichloro(decyl)silane Chemical compound CCCCCCCCCC[Si](Cl)(Cl)Cl HLWCOIUDOLYBGD-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- RCHUVCPBWWSUMC-UHFFFAOYSA-N trichloro(octyl)silane Chemical compound CCCCCCCC[Si](Cl)(Cl)Cl RCHUVCPBWWSUMC-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- GPWLZOISJZHVHX-UHFFFAOYSA-N trichloro(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(Cl)Cl GPWLZOISJZHVHX-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- ZPEZQDHBVHYQRG-UHFFFAOYSA-N trichloro-(3-trichlorosilyl-4-bicyclo[2.2.1]heptanyl)silane Chemical compound C1CC2([Si](Cl)(Cl)Cl)C([Si](Cl)(Cl)Cl)CC1C2 ZPEZQDHBVHYQRG-UHFFFAOYSA-N 0.000 description 1
- YHVKBMGCQCHIMZ-VOTSOKGWSA-N trichloro-[(e)-2-phenylethenyl]silane Chemical compound Cl[Si](Cl)(Cl)\C=C\C1=CC=CC=C1 YHVKBMGCQCHIMZ-VOTSOKGWSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- DJECDCLXTNZYDL-UHFFFAOYSA-N tritert-butyl(chloro)silane Chemical compound CC(C)(C)[Si](Cl)(C(C)(C)C)C(C)(C)C DJECDCLXTNZYDL-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明は、アミノ基をシリル化する方法に関するものである。 The present invention relates to a method for silylating an amino group.
シリル基で保護されたアミノ基を含有する化合物は、医薬品類や農薬類の合成中間体、塗料添加剤、高分子変性剤として有用である。 Compounds containing an amino group protected with a silyl group are useful as synthetic intermediates for pharmaceuticals and agricultural chemicals, paint additives, and polymer modifiers.
アミノ基をシリル化する方法としては、アミノ基含有化合物とクロロシラン化合物とを反応させる方法が公知である。しかしながら、クロロシラン化合物を用いたアミノ基のシリル化反応は、ヒドロキシ基のシリル化反応に比べて反応性が悪く、特に嵩高い基を有しているクロロシラン化合物を用いたアミノ基のシリル化反応は、反応速度が非常に遅いため、製造に長時間を要し、かつ低収率であるという問題点を有している。例えばt−ブチルジメチルクロロシランを用いたアミノ基のシリル化反応は困難であることが報告されている(非特許文献1:PROTECTIVE GROUPS IN ORGANIC SYNTHESIS p.77)。 As a method for silylating an amino group, a method of reacting an amino group-containing compound with a chlorosilane compound is known. However, the silylation reaction of an amino group using a chlorosilane compound is less reactive than the silylation reaction of a hydroxy group, and the silylation reaction of an amino group using a chlorosilane compound having a particularly bulky group is Since the reaction rate is very slow, the production takes a long time and has a problem of low yield. For example, it has been reported that the silylation reaction of an amino group using t-butyldimethylchlorosilane is difficult (Non-patent document 1: PROTECTIVE GROUPS in ORGANIC SYNTHESIS p. 77).
本発明は上記事情に鑑みなされたもので、反応速度が速く、工業的に実施可能なアミノ基のシリル化方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object thereof is to provide an amino group silylation method which has a high reaction rate and can be carried out industrially.
本発明者らは、上記目的を達成するため鋭意検討を重ねた結果、下記一般式(1)
R1R2NH (1)
(式中、R1、R2は水素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基である。或いは、R1とR2は互いに結合してこれらが結合する窒素原子と共に炭素数2〜20の環を形成してもよい。)
で示されるアミノ基含有化合物のアミノ基を下記一般式(2)
R3R4R5SiCl (2)
(式中、R3、R4、R5は水素原子、塩素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基であり、R3とR4、R3とR5又はR4とR5は互いに結合してこれらが結合するケイ素原子と共に炭素数2〜20の環を形成してもよい。)
で示されるクロロシラン化合物にてシリル化する方法において、触媒としてスルホン酸化合物又はその塩を用いることにより、効率よくシリル化反応を行うことができることを知見し、本発明を完成するに至ったものである。
As a result of intensive studies to achieve the above object, the present inventors have found that the following general formula (1)
R 1 R 2 NH (1)
(Wherein R 1 and R 2 are a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms. Alternatively, R 1 and R 2 are bonded to each other and bonded to each other) And may form a ring having 2 to 20 carbon atoms.)
The amino group of the amino group-containing compound represented by the following general formula (2)
R 3 R 4 R 5 SiCl (2)
(In the formula, R 3 , R 4 and R 5 are a hydrogen atom, a chlorine atom, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms, and R 3 and R 4 , R 3 and R 5, or R 4 and R 5 may be bonded to each other to form a ring having 2 to 20 carbon atoms together with the silicon atom to which they are bonded.
In the method of silylation with the chlorosilane compound represented by the above, it was found that by using a sulfonic acid compound or a salt thereof as a catalyst, the silylation reaction can be performed efficiently, and the present invention has been completed. is there.
従って、本発明は、上記式(1)のアミノ基含有化合物のアミノ基を式(2)のクロロシラン化合物にてシリル化する方法において、触媒としてスルホン酸化合物又はその塩を用いることを特徴とするアミノ基のシリル化方法を提供する。 Accordingly, the present invention is characterized in that a sulfonic acid compound or a salt thereof is used as a catalyst in the method of silylating the amino group of the amino group-containing compound of the above formula (1) with the chlorosilane compound of the formula (2). A method for silylation of an amino group is provided.
本発明によれば、医薬品類や農薬類の合成中間体、塗料添加剤、高分子変性剤として有用な、シリル基で保護されたアミノ基を含有する化合物を効率よく製造することができる。 ADVANTAGE OF THE INVENTION According to this invention, the compound containing the amino group protected by the silyl group useful as a synthetic intermediate of pharmaceuticals and agricultural chemicals, a coating additive, and a polymer modifier can be manufactured efficiently.
本発明のアミノ基のシリル化方法は、下記一般式(1)のアミノ基含有化合物のアミノ基を下記一般式(2)のクロロシラン化合物にてシリル化するものである。
R1R2NH (1)
(式中、R1、R2は水素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基である。或いは、R1とR2は互いに結合してこれらが結合する窒素原子と共に炭素数2〜20、特に3〜10の環を形成してもよい。)
R3R4R5SiCl (2)
(式中、R3、R4、R5は水素原子、塩素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基であり、R3とR4、R3とR5又はR4とR5は互いに結合してこれらが結合するケイ素原子と共に炭素数2〜20、特に3〜10の環を形成してもよい。)
The amino group silylation method of the present invention is to silylate an amino group of an amino group-containing compound of the following general formula (1) with a chlorosilane compound of the following general formula (2).
R 1 R 2 NH (1)
(Wherein R 1 and R 2 are a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms. Alternatively, R 1 and R 2 are bonded to each other and bonded to each other) And may form a ring having 2 to 20 carbon atoms, particularly 3 to 10 carbon atoms.)
R 3 R 4 R 5 SiCl (2)
(In the formula, R 3 , R 4 and R 5 are a hydrogen atom, a chlorine atom, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms, and R 3 and R 4 , R 3 and R 5, or R 4 and R 5 may be bonded to each other to form a ring having 2 to 20 carbon atoms, particularly 3 to 10 carbon atoms, together with the silicon atom to which they are bonded.
ここで、上記炭素数1〜20の置換もしくは非置換の1価炭化水素基としては、直鎖状、分岐状又は環状のアルキル基、アルケニル基、アリール基、アラルキル基等が挙げられ、また置換1価炭化水素基としては、これら非置換1価炭化水素基の1又は2以上の水素原子をフッ素原子、塩素原子等のハロゲン原子、シアノ基、アクリロキシ基、メタクリロキシ基、アセトキシ基などで置換したものを挙げることができる。 Here, examples of the substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms include linear, branched or cyclic alkyl groups, alkenyl groups, aryl groups, aralkyl groups, and the like. As monovalent hydrocarbon groups, one or more hydrogen atoms of these unsubstituted monovalent hydrocarbon groups are substituted with halogen atoms such as fluorine atoms, chlorine atoms, cyano groups, acryloxy groups, methacryloxy groups, acetoxy groups, and the like. Things can be mentioned.
この場合、上記式(1)のアミノ基含有化合物としては、具体的にはアンモニア、メチルアミン、エチルアミン、プロピルアミン、イソプロピルアミン、アリルアミン、ブチルアミン、ペンチルアミン、ヘキシルアミン、オクチルアミン、2−エチルヘキシルアミン、ベンジルアミン、シクロペンチルアミン、シクロヘキシルアミン、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、1,6−ジアミノヘキサン、アニリン、トルイジン、キシリジン、ナフチルアミン、キシリレンジアミン、ジメチルアミン、ジエチルアミン、ジプロピルアミン、ジイソプロピルアミン、ジアリルアミン、ジブチルアミン、ジペンチルアミン、ジオクチルアミン、ジ(2−エチルヘキシル)アミン、エチレンイミン、ピロリジン、ピペリジン、ピペラジン、モルホリン、イミダゾール、N−メチルアニリン、ジフェニルアミン等が例示される。 In this case, specific examples of the amino group-containing compound of the above formula (1) include ammonia, methylamine, ethylamine, propylamine, isopropylamine, allylamine, butylamine, pentylamine, hexylamine, octylamine, 2-ethylhexylamine. , Benzylamine, cyclopentylamine, cyclohexylamine, ethylenediamine, diethylenetriamine, triethylenetetramine, 1,6-diaminohexane, aniline, toluidine, xylidine, naphthylamine, xylylenediamine, dimethylamine, diethylamine, dipropylamine, diisopropylamine, diallylamine , Dibutylamine, dipentylamine, dioctylamine, di (2-ethylhexyl) amine, ethyleneimine, pyrrolidine, piperi Emissions, piperazine, morpholine, imidazole, N- methylaniline, diphenylamine and the like.
また、式(2)のクロロシラン化合物としては、具体的にはジメチルクロロシラン、トリメチルクロロシラン、ジエチルクロロシラン、エチルジメチルクロロシラン、ジエチルメチルクロロシラン、トリエチルクロロシラン、ビニルジメチルクロロシラン、トリプロピルクロロシラン、トリイソプロピルクロロシラン、トリブチルクロロシラン、t−ブチルジメチルクロロシラン、ジt−ブチルメチルクロロシラン、トリt−ブチルクロロシラン、トリイソブチルクロロシラン、トリsec−ブチルクロロシラン、ヘキシルジメチルクロロシラン、テキシルジメチルクロロシラン、オクチルジメチルクロロシラン、デシルジメチルクロロシラン、オクタデシルジメチルクロロシラン、シクロペンチルジメチルクロロシラン、シクロヘキシルジメチルクロロシラン、トリシクロペンチルクロロシラン、トリシクロヘキシルクロロシラン、ジメチルフェニルクロロシラン、メチルジフェニルクロロシラン、トリフェニルクロロシラン、t−ブチルジフェニルクロロシラン、ジt−ブチルフェニルクロロシラン、スチリルジメチルクロロシラン、2−シアノエチルジメチルクロロシラン、アセトキシプロピルジメチルクロロシラン、3−アクリロキシプロピルジメチルクロロシラン、3−メタクリロキシプロピルジメチルクロロシラン、クロロメチルジメチルクロロシラン、3−クロロプロピルジメチルクロロシラン、3,3,3−トリフルオロプロピルジメチルクロロシラン、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルジメチルクロロシラン、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシルジメチルクロロシラン、ジクロロシラン、メチルジクロロシラン、ジメチルジクロロシラン、エチルジクロロシラン、ジエチルジクロロシラン、ビニルメチルジクロロシラン、ジビニルジクロロシラン、プロピルメチルジクロロシラン、ジブチルジクロロシラン、t−ブチルメチルジクロロシラン、ジt−ブチルジクロロシラン、ジイソブチルジクロロシラン、ジsec−ブチルジクロロシラン、ヘキシルメチルジクロロシラン、テキシルメチルジクロロシラン、オクチルメチルジクロロシラン、デシルメチルジクロロシラン、オクタデシルメチルジクロロシラン、シクロペンチルメチルジクロロシラン、シクロヘキシルメチルジクロロシラン、ジシクロペンチルジクロロシラン、ジシクロヘキシルジクロロシラン、メチルフェニルジクロロシラン、ジフェニルジクロロシラン、t−ブチルフェニルジクロロシラン、スチリルメチルジクロロシラン、2−シアノエチルメチルジクロロシラン、アセトキシプロピルメチルジクロロシラン、3−アクリロキシプロピルメチルジクロロシラン、3−メタクリロキシプロピルメチルジクロロシラン、クロロメチルメチルジクロロシラン、3−クロロプロピルメチルジクロロシラン、3,3,3−トリフルオロプロピルメチルジクロロシラン、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルメチルジクロロシラン、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシルメチルジクロロシラン、トリクロロシラン、メチルトリクロロシラン、エチルトリクロロシラン、ビニルトリクロロシラン、プロピルトリクロロシラン、イソプロピルトリクロロシラン、ブチルトリクロロシラン、t−ブチルトリクロロシラン、イソブチルトリクロロシラン、sec−ブチルトリクロロシラン、ヘキシルトリクロロシラン、テキシルトリクロロシラン、オクチルトリクロロシラン、デシルトリクロロシラン、オクタデシルトリクロロシラン、シクロペンチルトリクロロシラン、シクロヘキシルトリクロロシラン、フェニルトリクロロシラン、スチリルトリクロロシラン、2−シアノエチルトリクロロシラン、アセトキシプロピルトリクロロシラン、3−アクリロキシプロピルトリクロロシラン、3−メタクリロキシプロピルトリクロロシラン、クロロメチルトリクロロシラン、3−クロロプロピルトリクロロシラン、3,3,3−トリフルオロプロピルトリクロロシラン、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルトリクロロシラン、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシルトリクロロシラン、テトラクロロシラン、1,2−ビス(ジメチルクロロシリル)エタン、1,2−ビス(メチルジクロロシリル)エタン、1,2−ビス(トリクロロシリル)エタン、1,6−ビス(ジメチルクロロシリル)ヘキサン、1,6−(メチルジクロロシリル)ヘキサン、1,6−ビス(トリクロロシリル)ヘキサン、ビス(ジメチルクロロシリル)ノルボルナン、ビス(メチルジクロロシリル)ノルボルナン、ビス(トリクロロシリル)ノルボルナン等が例示される。 Specific examples of the chlorosilane compound of formula (2) include dimethylchlorosilane, trimethylchlorosilane, diethylchlorosilane, ethyldimethylchlorosilane, diethylmethylchlorosilane, triethylchlorosilane, vinyldimethylchlorosilane, tripropylchlorosilane, triisopropylchlorosilane, and tributylchlorosilane. , T-butyldimethylchlorosilane, di-t-butylmethylchlorosilane, tri-t-butylchlorosilane, triisobutylchlorosilane, trisec-butylchlorosilane, hexyldimethylchlorosilane, texyldimethylchlorosilane, octyldimethylchlorosilane, decyldimethylchlorosilane, octadecyldimethylchlorosilane , Cyclopentyldimethylchlorosilane, cyclohexyldi Tylchlorosilane, tricyclopentylchlorosilane, tricyclohexylchlorosilane, dimethylphenylchlorosilane, methyldiphenylchlorosilane, triphenylchlorosilane, t-butyldiphenylchlorosilane, di-t-butylphenylchlorosilane, styryldimethylchlorosilane, 2-cyanoethyldimethylchlorosilane, acetoxypropyldimethylchlorosilane 3-acryloxypropyldimethylchlorosilane, 3-methacryloxypropyldimethylchlorosilane, chloromethyldimethylchlorosilane, 3-chloropropyldimethylchlorosilane, 3,3,3-trifluoropropyldimethylchlorosilane, 3,3,4,4,5 , 5,6,6,6-nonafluorohexyldimethylchlorosilane, 3,3,4,4,5, , 6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyldimethylchlorosilane, dichlorosilane, methyldichlorosilane, dimethyldichlorosilane, ethyldichlorosilane, diethyldichlorosilane, vinyl Methyldichlorosilane, divinyldichlorosilane, propylmethyldichlorosilane, dibutyldichlorosilane, t-butylmethyldichlorosilane, di-t-butyldichlorosilane, diisobutyldichlorosilane, disec-butyldichlorosilane, hexylmethyldichlorosilane, texylmethyl Dichlorosilane, Octylmethyldichlorosilane, Decylmethyldichlorosilane, Octadecylmethyldichlorosilane, Cyclopentylmethyldichlorosilane, Cyclohexylmethyldichlorosilane, Dicyclope Nthyldichlorosilane, dicyclohexyldichlorosilane, methylphenyldichlorosilane, diphenyldichlorosilane, t-butylphenyldichlorosilane, styrylmethyldichlorosilane, 2-cyanoethylmethyldichlorosilane, acetoxypropylmethyldichlorosilane, 3-acryloxypropylmethyldichlorosilane , 3-methacryloxypropylmethyldichlorosilane, chloromethylmethyldichlorosilane, 3-chloropropylmethyldichlorosilane, 3,3,3-trifluoropropylmethyldichlorosilane, 3,3,4,4,5,5,6 , 6,6-Nonafluorohexylmethyldichlorosilane, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl Methyl dichloroshi , Trichlorosilane, methyltrichlorosilane, ethyltrichlorosilane, vinyltrichlorosilane, propyltrichlorosilane, isopropyltrichlorosilane, butyltrichlorosilane, t-butyltrichlorosilane, isobutyltrichlorosilane, sec-butyltrichlorosilane, hexyltrichlorosilane, textile Siltrichlorosilane, octyltrichlorosilane, decyltrichlorosilane, octadecyltrichlorosilane, cyclopentyltrichlorosilane, cyclohexyltrichlorosilane, phenyltrichlorosilane, styryltrichlorosilane, 2-cyanoethyltrichlorosilane, acetoxypropyltrichlorosilane, 3-acryloxypropyltrichlorosilane , 3-Methacryloxypropyltrichlorosilane Chloromethyltrichlorosilane, 3-chloropropyltrichlorosilane, 3,3,3-trifluoropropyltrichlorosilane, 3,3,4,4,5,5,6,6,6-nonafluorohexyltrichlorosilane, 3, 3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyltrichlorosilane, tetrachlorosilane, 1,2-bis (dimethylchloro Silyl) ethane, 1,2-bis (methyldichlorosilyl) ethane, 1,2-bis (trichlorosilyl) ethane, 1,6-bis (dimethylchlorosilyl) hexane, 1,6- (methyldichlorosilyl) hexane, 1,6-bis (trichlorosilyl) hexane, bis (dimethylchlorosilyl) norbornane, bis (methyldichlorosilyl) norbornane And bis (trichlorosilyl) norbornane and the like.
本発明のクロロシラン化合物の使用量は特に限定されないが、反応性、生産性の点から、アミノ基含有化合物のアミノ基1モルに対し、クロロシラン化合物のケイ素−塩素結合換算で0.1〜4.0モル、特に0.2〜3.0モルの範囲が好ましい。 Although the usage-amount of the chlorosilane compound of this invention is not specifically limited, From the point of reactivity and productivity, it is 0.1-4 in conversion of the silicon- chlorine bond of a chlorosilane compound with respect to 1 mol of amino groups of an amino group containing compound. A range of 0 mol, particularly 0.2 to 3.0 mol, is preferred.
本発明においては、上記式(1)のアミノ基含有化合物のシリル化反応に際して、スルホン酸化合物又はその塩を触媒としてアミノ基含有化合物のアミノ基をクロロシラン化合物にてシリル化するものである。 In the present invention, in the silylation reaction of the amino group-containing compound of the above formula (1), the amino group of the amino group-containing compound is silylated with a chlorosilane compound using a sulfonic acid compound or a salt thereof as a catalyst.
上記スルホン酸化合物としては、具体的には硫酸、メタンスルホン酸、エタンスルホン酸、プロパンスルホン酸、ブタンスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸、ドデシルベンゼンスルホン酸、トリフルオロメタンスルホン酸、1,1,2,2−テトラフルオロエタンスルホン酸、1,1,2,2,2−ペンタフルオロエタンスルホン酸等が例示される。また、塩としては、上記スルホン酸のアンモニウム塩、トリエチルアミン塩、ピリジン塩等が例示される。 Specific examples of the sulfonic acid compound include sulfuric acid, methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, butanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, trifluoromethanesulfonic acid, 1 1,2,2,2-tetrafluoroethanesulfonic acid, 1,1,2,2,2-pentafluoroethanesulfonic acid and the like. Examples of the salt include the ammonium salt, triethylamine salt, pyridine salt and the like of the sulfonic acid.
本発明のスルホン酸化合物又はその塩の使用量は特に限定されないが、反応性、生産性の点から、アミノ基含有化合物のアミノ基1モルに対し、0.0001〜0.1モル、特に0.001〜0.05モルの範囲が好ましい。 The amount of the sulfonic acid compound or a salt thereof of the present invention is not particularly limited, but from the viewpoint of reactivity and productivity, 0.0001 to 0.1 mol, particularly 0, with respect to 1 mol of the amino group of the amino group-containing compound. A range of 0.001 to 0.05 mol is preferred.
本発明のアミノ基含有化合物のシリル化反応においては、塩化水素が副生するが、これは上記一般式(1)で示されるアミノ基含有化合物自身を塩基として捕捉してもよく、他のアミン化合物を塩基として捕捉してもよい。他のアミン化合物としては上記一般式(1)で示されるアミノ基含有化合物の他、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、エチルジイソプロピルアミン、ピリジン、ジメチルアミノピリジン、ジメチルアニリン、メチルイミダゾール、テトラメチルエチレンジアミン、1,8−ジアザビシクロ[5.4.0]ウンデセン−7等が例示される。 In the silylation reaction of the amino group-containing compound of the present invention, hydrogen chloride is produced as a by-product, which may be captured as a base of the amino group-containing compound itself represented by the above general formula (1). The compound may be captured as a base. As other amine compounds, in addition to the amino group-containing compound represented by the general formula (1), trimethylamine, triethylamine, tripropylamine, tributylamine, ethyldiisopropylamine, pyridine, dimethylaminopyridine, dimethylaniline, methylimidazole, tetra Examples include methylethylenediamine and 1,8-diazabicyclo [5.4.0] undecene-7.
他のアミン化合物の使用量は特に限定されないが、反応性、生産性の点から、アミノ基含有化合物のアミノ基1モルに対し、0.3〜10.0モル、特に0.5〜5.0モルの範囲が好ましい。 Although the usage-amount of another amine compound is not specifically limited, From the point of reactivity and productivity, it is 0.3-10.0 mol with respect to 1 mol of amino groups of an amino group containing compound, Especially 0.5-5. A range of 0 mole is preferred.
上記反応の反応温度は特に限定されないが、0〜200℃、特に10〜180℃が好ましい。 Although the reaction temperature of the said reaction is not specifically limited, 0-200 degreeC, Especially 10-180 degreeC is preferable.
なお、上記反応は無溶媒でも進行するが、溶媒を用いることもできる。用い得る溶媒としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のエステル系溶媒、アセトニトリル、N,N−ジメチルホルムアミド等の非プロトン性極性溶媒、ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒等が例示される。これらの溶媒は1種を単独で使用してもよく、また2種以上を混合して使用してもよい。 In addition, although the said reaction advances even without a solvent, a solvent can also be used. Solvents that can be used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene, ether solvents such as diethyl ether, tetrahydrofuran and dioxane, and ester solvents such as ethyl acetate and butyl acetate. And aprotic polar solvents such as acetonitrile and N, N-dimethylformamide, and chlorinated hydrocarbon solvents such as dichloromethane and chloroform. These solvents may be used alone or in a combination of two or more.
反応終了後にはアミン化合物の塩酸塩が生じるが、これは反応液を濾過、又は水、水酸化ナトリウム水溶液、エチレンジアミン、1,8−ジアザビシクロ[5.4.0]ウンデセン−7等を添加し、分離する等の方法により除去できる。以上のようにして塩を除去した反応液からは、蒸留等の通常の方法で目的物を回収することができる。 After completion of the reaction, a hydrochloride of the amine compound is produced, which is filtered or added with water, aqueous sodium hydroxide, ethylenediamine, 1,8-diazabicyclo [5.4.0] undecene-7, It can be removed by a method such as separation. From the reaction solution from which the salt has been removed as described above, the target product can be recovered by an ordinary method such as distillation.
以下、実施例と比較例を示して本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
[実施例1]
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、トリイソプロピルクロロシラン38.6g(0.2モル)、トリエチルアミン22.3g(0.21モル)、メタンスルホン酸0.19g(0.002モル)を仕込み、80℃に加熱した。内温が安定した後、アリルアミン12.0g(0.21モル)を1時間かけて滴下し、更にその温度で3時間撹拌した。この時点での、ガスクロマトグラフィー分析による、目的物であるトリイソプロピルシリルアリルアミンと、原料であるトリイソプロピルクロロシランとの質量比は97:3であった。
[Example 1]
In a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 38.6 g (0.2 mol) of triisopropylchlorosilane, 22.3 g (0.21 mol) of triethylamine, and 0.19 g of methanesulfonic acid (0. 002 mol) and heated to 80 ° C. After the internal temperature was stabilized, 12.0 g (0.21 mol) of allylamine was added dropwise over 1 hour, and the mixture was further stirred at that temperature for 3 hours. At this time, the mass ratio of triisopropylsilylallylamine as the target product to triisopropylchlorosilane as the raw material was 97: 3 by gas chromatography analysis.
[比較例1]
メタンスルホン酸を添加しなかった以外は実施例1と同様にして反応を行った。滴下終了後、3時間撹拌時点での、ガスクロマトグラフィー分析による、目的物であるトリイソプロピルシリルアリルアミンと、原料であるトリイソプロピルクロロシランとの質量比は21:79であった。
[Comparative Example 1]
The reaction was performed in the same manner as in Example 1 except that methanesulfonic acid was not added. After completion of dropping, the mass ratio of triisopropylsilylallylamine as the target product to triisopropylchlorosilane as the raw material was 21:79 by gas chromatography analysis at the time of stirring for 3 hours.
[実施例2]
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、t−ブチルジメチルクロロシラン30.1g(0.2モル)、トルエン30ml、メタンスルホン酸0.19g(0.002モル)を仕込み、70℃に加熱した。内温が安定した後、ジエチルアミン32.2g(0.44モル)を1時間かけて滴下し、更にその温度で8時間撹拌した。この時点での、ガスクロマトグラフィー分析による、目的物であるt−ブチルジメチルシリルジエチルアミンと、原料であるt−ブチルジメチルクロロシランとの質量比は85:15であった。
[Example 2]
In a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 30.1 g (0.2 mol) of t-butyldimethylchlorosilane, 30 ml of toluene, 0.19 g (0.002 mol) of methanesulfonic acid were charged. Heated to 70 ° C. After the internal temperature was stabilized, 32.2 g (0.44 mol) of diethylamine was added dropwise over 1 hour, and the mixture was further stirred at that temperature for 8 hours. At this time, the mass ratio of the target t-butyldimethylsilyldiethylamine and the raw material t-butyldimethylchlorosilane by gas chromatography analysis was 85:15.
[比較例2]
メタンスルホン酸を添加しなかった以外は実施例2と同様にして反応を行った。滴下終了後、8時間撹拌時点での、ガスクロマトグラフィー分析による、目的物であるt−ブチルジメチルシリルジエチルアミンと、原料であるt−ブチルジメチルクロロシランとの質量比は3:97であった。
[Comparative Example 2]
The reaction was performed in the same manner as in Example 2 except that methanesulfonic acid was not added. After the completion of dropping, the mass ratio of t-butyldimethylsilyldiethylamine as a target product and t-butyldimethylchlorosilane as a raw material was 3:97 by gas chromatography analysis at the time of stirring for 8 hours.
[実施例3]
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、メチルビニルジクロロシラン14.1g(0.1モル)、トルエン60ml、メタンスルホン酸0.19g(0.002モル)を仕込み、40℃に加熱した。内温が安定した後、ジエチルアミン30.7g(0.42モル)を1時間かけて滴下し、更にその温度で1時間撹拌した。この時点での、ガスクロマトグラフィー分析による、目的物であるビス(ジエチルアミノ)メチルビニルシランと、反応中間体であるジエチルアミノメチルビニルクロロシランとの質量比は99.5:0.5であった。
[Example 3]
A flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 14.1 g (0.1 mol) of methylvinyldichlorosilane, 60 ml of toluene, and 0.19 g (0.002 mol) of methanesulfonic acid. Heated to ° C. After the internal temperature was stabilized, 30.7 g (0.42 mol) of diethylamine was added dropwise over 1 hour, and the mixture was further stirred at that temperature for 1 hour. At this time, the mass ratio of bis (diethylamino) methylvinylsilane, which is the target product, to diethylaminomethylvinylchlorosilane, which is the reaction intermediate, was 99.5: 0.5 by gas chromatography analysis.
[比較例3]
メタンスルホン酸を添加しなかった以外は実施例3と同様にして反応を行った。滴下終了後、1時間撹拌時点での、ガスクロマトグラフィー分析による、目的物であるビス(ジエチルアミノ)メチルビニルシランと、反応中間体であるジエチルアミノメチルビニルクロロシランとの質量比は23:77であった。
[Comparative Example 3]
The reaction was performed in the same manner as in Example 3 except that methanesulfonic acid was not added. The mass ratio of the target product bis (diethylamino) methylvinylsilane to the reaction intermediate diethylaminomethylvinylchlorosilane was 23:77, as determined by gas chromatography analysis after stirring for 1 hour.
[実施例4]
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、1,2−ビス(ジメチルクロロシリル)エタン22.6g(0.105モル)、トリエチルアミン22.3g(0.22モル)、トリフルオロメタンスルホン酸0.3g、トルエン60mlを仕込み、100℃に加熱した。内温が安定した後、アニリン9.3g(0.1モル)を1時間かけて滴下し、更にその温度で10時間撹拌した。この時点での、ガスクロマトグラフィー分析による、目的物である1−フェニル−2,2,5,5−テトラメチル−1−アザ−2,5−ジシラシクロペンタンと、反応中間体である1−フェニルアミノ−3−クロロ−1,1,4,4−テトラメチル−1,4−ジシラブタンとの質量比は91:9であった。
[Example 4]
In a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, 22.6 g (0.105 mol) of 1,2-bis (dimethylchlorosilyl) ethane, 22.3 g (0.22 mol) of triethylamine, trifluoro 0.3 g of romethanesulfonic acid and 60 ml of toluene were charged and heated to 100 ° C. After the internal temperature was stabilized, 9.3 g (0.1 mol) of aniline was added dropwise over 1 hour, and the mixture was further stirred at that temperature for 10 hours. At this point, 1-phenyl-2,2,5,5-tetramethyl-1-aza-2,5-disilacyclopentane, which is the target product, and 1 which is a reaction intermediate are obtained by gas chromatography analysis. - phenylamino-3-chloro-1,1, 4, 4 - tetramethyl-1, 4 - mass ratio of the disilabutane was 91: 9.
[比較例4]
トリフルオロメタンスルホン酸を添加しなかった以外は実施例4と同様にして反応を行った。滴下終了後、10時間撹拌時点での、ガスクロマトグラフィー分析による、目的物である1−フェニル−2,2,5,5−テトラメチル−1−アザ−2,5−ジシラシクロペンタンと、反応中間体である1−フェニルアミノ−3−クロロ−1,1,4,4−テトラメチル−1,4−ジシラブタンとの質量比は11:89であった。
[Comparative Example 4]
The reaction was performed in the same manner as in Example 4 except that trifluoromethanesulfonic acid was not added. 1-phenyl-2,2,5,5-tetramethyl-1-aza-2,5-disilacyclopentane, which is the target product, as determined by gas chromatography analysis at the time of stirring for 10 hours after completion of the dropping; is a reaction intermediate 1-phenyl-amino-3-chloro-1,1, 4, 4 - tetramethyl-1, 4 - mass ratio of the disilabutane was eleven eighty-nine.
Claims (1)
R1R2NH (1)
(式中、R1、R2は水素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基である。或いは、R1とR2は互いに結合してこれらが結合する窒素原子と共に炭素数2〜20の環を形成してもよい。)
で示されるアミノ基含有化合物のアミノ基を下記一般式(2)
R3R4R5SiCl (2)
(式中、R3、R4、R5は水素原子、塩素原子又は炭素数1〜20の置換もしくは非置換の1価炭化水素基であり、R3とR4、R3とR5又はR4とR5は互いに結合してこれらが結合するケイ素原子と共に炭素数2〜20の環を形成してもよい。)
で示されるクロロシラン化合物にてシリル化する方法において、触媒としてスルホン酸化合物又はその塩を用いることを特徴とするアミノ基のシリル化方法。 The following general formula (1)
R 1 R 2 NH (1)
(Wherein R 1 and R 2 are a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms. Alternatively, R 1 and R 2 are bonded to each other and bonded to each other) And may form a ring having 2 to 20 carbon atoms.)
The amino group of the amino group-containing compound represented by the following general formula (2)
R 3 R 4 R 5 SiCl (2)
(In the formula, R 3 , R 4 and R 5 are a hydrogen atom, a chlorine atom, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms, and R 3 and R 4 , R 3 and R 5, or R 4 and R 5 may be bonded to each other to form a ring having 2 to 20 carbon atoms together with the silicon atom to which they are bonded.
In the method of silylation with a chlorosilane compound represented by the formula (1), a sulfonic acid compound or a salt thereof is used as a catalyst.
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