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JP4921229B2 - Cleaning device - Google Patents

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JP4921229B2
JP4921229B2 JP2007107518A JP2007107518A JP4921229B2 JP 4921229 B2 JP4921229 B2 JP 4921229B2 JP 2007107518 A JP2007107518 A JP 2007107518A JP 2007107518 A JP2007107518 A JP 2007107518A JP 4921229 B2 JP4921229 B2 JP 4921229B2
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利隆 深瀬
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東静電気株式会社
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本発明は、油脂系の汚れ等が付着した機械部品やメッキ部品等の被処理物を洗浄溶剤に浸漬して超音波洗浄し、その後に洗浄溶剤の蒸気で洗浄する洗浄装置に関する。 The present invention relates to a cleaning apparatus that immerses an object to be processed such as a machine part or a plated part, to which oil-based dirt or the like adheres, in a cleaning solvent and ultrasonically cleans it, and then cleans it with a cleaning solvent vapor.

金属製機械部品、メッキ部品、電子部品等の各種部品には、その製造工程や組立工程等において、切削油等の工作油脂、フラックス、塵埃等をはじめとして様々な汚れが付着する。このような汚れが付着した機械部品や電子部品等の被処理物の清浄は、従来、例えば炭化水素系、塩素系等の金属洗浄溶剤を使用して、被処理物を洗浄溶剤に浸漬して超音波による振動を与えて洗浄する浸漬洗浄工程を行ない、次に、洗浄溶剤の蒸気を噴霧して洗浄を行う蒸気洗浄工程を行なうことにより成されている。そして、真空乾燥工程を行うことにより、蒸気洗浄後の被処理物を乾燥している。
特開平11−57637号公報
Various types of dirt such as machining oil such as cutting oil, flux, dust, and the like adhere to various parts such as metal machine parts, plated parts, and electronic parts in the manufacturing process and assembly process. For cleaning such objects such as machine parts and electronic parts that are contaminated with dirt, conventionally, for example, a hydrocarbon-based or chlorine-based metal cleaning solvent is used, and the object to be processed is immersed in the cleaning solvent. An immersion cleaning process for cleaning by applying vibration by ultrasonic waves is performed, and then a steam cleaning process for cleaning by spraying a vapor of a cleaning solvent is performed. And the to-be-processed object after steam washing is dried by performing a vacuum drying process.
JP 11-57637 A

ところで、超音波発生器は、振動板としてのステンレス板に振動素子を複数個接着した構成である。前述蒸気洗浄工程においては、洗浄溶剤の蒸気温度が110〜120℃以上の高温であり、この高温蒸気が洗浄槽内に供給されるので、洗浄槽の底面に設けられた超音波発生器も100℃以上の高温に晒される。このため、振動素子を接着している接着剤等が高熱となって接着力が低下して振動素子が外れる等のトラブルを発生することがある。   By the way, the ultrasonic generator has a configuration in which a plurality of vibration elements are bonded to a stainless steel plate as a vibration plate. In the steam cleaning step, the steam temperature of the cleaning solvent is a high temperature of 110 to 120 ° C. or higher, and since this high temperature steam is supplied into the cleaning tank, the ultrasonic generator provided on the bottom surface of the cleaning tank is also 100 Exposed to high temperature above ℃. For this reason, the adhesive agent etc. which adhere | attach the vibration element may generate | occur | produce troubles, such as a high heat | fever and adhesive force falling and a vibration element removing.

このため、圧縮空気や窒素ガスを超音波発生器に吹き付けて温度上昇した振動板や振動素子の放熱効率を上げることも考えられる。しかしながら、この様な手段では圧縮空気や窒素ガスの浪費となり、資源の有効利用の観点からして好ましいことではない。   For this reason, it is also conceivable to increase the heat dissipation efficiency of the diaphragm or the vibration element whose temperature has increased by blowing compressed air or nitrogen gas to the ultrasonic generator. However, such means is a waste of compressed air and nitrogen gas, which is not preferable from the viewpoint of effective use of resources.

そこで、本発明は、蒸気洗浄工程において、高温の蒸気を洗浄槽内に導入しても超音波発生器が高温に晒されることを防止することができる洗浄装置を提供することを目的とする。 Therefore, an object of the present invention is to provide a cleaning apparatus capable of preventing the ultrasonic generator from being exposed to high temperature even when high-temperature steam is introduced into the cleaning tank in the steam cleaning step.

本発明は、上記に鑑み提案されたもので、被処理物を収容する洗浄槽と、該洗浄槽の内面に臨ませた状態で装着された超音波発生器と、洗浄槽内に洗浄溶剤を給液する洗浄溶剤供給系と、洗浄槽内の洗浄溶剤を排液する洗浄溶剤排液系と、洗浄槽内に洗浄溶剤の蒸気を導入する洗浄溶剤蒸気導入系と、を備え、制御装置の制御の下で、洗浄槽内に供給した洗浄溶剤に被処理物を浸漬して超音波振動を与えて洗浄する浸漬洗浄工程と、浸漬洗浄工程の後に洗浄槽内の洗浄溶剤を排液する排液工程と、排液工程の後に洗浄溶剤の蒸気を洗浄槽内に導入して被処理物を蒸気洗浄する蒸気洗浄工程とを行う洗浄装置であって、
上記超音波発生器は洗浄槽の傾斜した底部に配設され、該超音波発生器よりも傾斜上端側の底部に洗浄溶剤供給系の噴出ノズルを配置し、底部の傾斜下端に洗浄溶剤排液系の排液口を開口し、噴出ノズルから噴出した洗浄溶剤が底部を流れる途中で超音波発生器を冷却し、底部の傾斜下端まで流下した洗浄溶剤を排液口から洗浄槽の外部に排出するようにし、
上記制御装置は、蒸気洗浄工程において、上記洗浄溶剤供給系を作動して洗浄槽内に供給した洗浄溶剤を超音波発生器に流して冷却しつつ洗浄溶剤蒸気導入系を作動して洗浄槽内に洗浄溶剤の蒸気を導入して被処理物を蒸気洗浄することを特徴とする洗浄装置である。
The present invention has been proposed in view of the above, a cleaning tank that accommodates an object to be processed , an ultrasonic generator mounted in a state facing the inner surface of the cleaning tank, and a cleaning solvent in the cleaning tank. A cleaning solvent supply system for supplying liquid, a cleaning solvent draining system for draining the cleaning solvent in the cleaning tank, and a cleaning solvent vapor introducing system for introducing the cleaning solvent vapor into the cleaning tank. Under control, an immersion cleaning process in which the object to be processed is immersed in a cleaning solvent supplied into the cleaning tank and subjected to ultrasonic vibration for cleaning, and a drain for discharging the cleaning solvent in the cleaning tank after the immersion cleaning process. A cleaning apparatus that performs a liquid process, and a steam cleaning process for introducing a cleaning solvent vapor into the cleaning tank after the draining process to steam-clean the workpiece.
The ultrasonic generator is disposed at the inclined bottom of the cleaning tank, the cleaning solvent supply system ejection nozzle is disposed at the bottom of the inclined upper end side of the ultrasonic generator, and the cleaning solvent drainage is provided at the inclined lower end of the bottom. The drainage port of the system is opened, the ultrasonic generator is cooled while the cleaning solvent ejected from the ejection nozzle flows through the bottom, and the cleaning solvent that has flowed down to the bottom inclined bottom is discharged out of the washing tank Like
In the vapor cleaning process, the control device operates the cleaning solvent vapor introduction system while operating the cleaning solvent supply system and supplying the cleaning solvent supplied into the cleaning tank to the ultrasonic generator for cooling. The cleaning apparatus is characterized in that the cleaning object is steam cleaned by introducing steam of the cleaning solvent.

本発明は前記した構成を採るので、以下の効果を奏する。
すなわち、洗浄溶剤を超音波発生器に流して冷却しつつ洗浄槽内に洗浄溶剤の蒸気を導入して被処理物を蒸気洗浄するので、超音波発生器は洗浄溶剤に覆われた状態で洗浄溶剤の蒸気に直接晒されることを防止することができる。したがって、洗浄溶剤の蒸気によって超音波発生器が高温になることを防止することができ、超音波振動子の接着剤が熱損傷して外れるなどの不都合を抑制することができる。また、圧縮空気や窒素ガスを垂れ流すこともなく超音波振動子を高熱から守ることができるので、資源の浪費を防止できる。
Since the present invention adopts the configuration described above, the following effects can be obtained.
In other words , since the cleaning solvent is introduced into the cleaning tank by introducing the cleaning solvent into the ultrasonic generator and cooled, the object to be treated is steam cleaned, so the ultrasonic generator is cleaned with the cleaning solvent covered. Direct exposure to solvent vapor can be prevented. Therefore, it is possible to prevent the ultrasonic generator from becoming hot due to the vapor of the cleaning solvent, and it is possible to suppress inconveniences such as the adhesive of the ultrasonic vibrator being removed due to thermal damage. Further, since the ultrasonic vibrator can be protected from high heat without flowing down compressed air or nitrogen gas, waste of resources can be prevented.

また、超音波発生器は洗浄槽の傾斜した底部に配設され、該超音波発生器よりも傾斜上端側の底部に洗浄溶剤供給系の噴出ノズルを配置し、底部の傾斜下端に洗浄溶剤排液系の排液口を開口し、噴出ノズルから噴出した洗浄溶剤が底部を流れる途中で超音波発生器を冷却し、底部の傾斜下端まで流下した洗浄溶剤を排液口から洗浄槽の外部に排出するので、噴出ノズルから噴出した洗浄溶剤を超音波発生器上に確実に流すことができ、効率良く冷却することができる。 The ultrasonic generator is disposed at the inclined bottom of the cleaning tank, the cleaning solvent supply system jet nozzle is disposed at the bottom of the inclined upper end of the ultrasonic generator, and the cleaning solvent is discharged at the inclined lower end of the bottom. Open the liquid drainage port, cool the ultrasonic generator while the cleaning solvent ejected from the ejection nozzle flows through the bottom, and wash the cleaning solvent that has flowed down to the bottom inclined bottom from the drainage port to the outside of the cleaning tank. Since it discharges | emits, the washing | cleaning solvent ejected from the ejection nozzle can be reliably flowed on an ultrasonic generator, and can be cooled efficiently.

以下、本発明の実施の形態を図面を参照して説明する。図1は、本発明に係る洗浄装置1の系統構成を示す概略図、図2は洗浄装置1を制御する制御装置50の概略ブロック図、図3は洗浄槽の内部を示す斜視図、図4は洗浄槽への洗浄溶剤供給系の概略図である。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1 is a schematic diagram showing a system configuration of a cleaning device 1 according to the present invention, FIG. 2 is a schematic block diagram of a control device 50 for controlling the cleaning device 1, FIG. 3 is a perspective view showing the inside of a cleaning tank, and FIG. FIG. 2 is a schematic view of a cleaning solvent supply system to a cleaning tank.

図1に示すように、工作油脂等の汚れが付着した機械部品や電子部品等の被処理物2の洗浄及び乾燥は、洗浄槽3内に、複数の被処理物2をバスケット4に入れた状態で収容して行われる。この洗浄槽3内では、例えば炭化水素等の洗浄溶剤を使用して、被処理物2を洗浄溶剤に浸漬して超音波による振動を与えて洗浄する浸漬洗浄工程を行ない、次に洗浄溶剤の蒸気を導入して被処理物2の洗浄を行う蒸気洗浄工程を行ない、さらに蒸気洗浄後の被処理物2を真空乾燥工程を行って乾燥する。   As shown in FIG. 1, cleaning and drying of workpieces 2 such as machine parts and electronic components to which dirt such as machine oils and fats adheres are performed by putting a plurality of workpieces 2 in a basket 4 in a cleaning tank 3. Accommodated in state. In this cleaning tank 3, for example, a cleaning solvent such as hydrocarbon is used to perform an immersion cleaning process in which the object to be processed 2 is immersed in the cleaning solvent and subjected to ultrasonic vibration for cleaning. A steam cleaning step for cleaning the workpiece 2 by introducing steam is performed, and the workpiece 2 after the steam cleaning is dried by performing a vacuum drying step.

洗浄溶剤としては、炭化水素系溶剤(第4類第2石油類及び第4類第3石油類;パラフィン系、ナフテン系)、塩素系溶剤(トリクロロエチレン、テトラクロロエチレン)、臭素系溶剤(ノルマルプロピルブロマイド)、フッ素系溶剤(HFC、HFE、HCFC)等が挙げられるが、環境保護の観点から炭化水素系が好ましい。   Cleaning solvents include hydrocarbon solvents (4th class 2nd petroleum and 4th class 3rd petroleums; paraffinic and naphthenic), chlorinated solvents (trichloroethylene, tetrachloroethylene), brominated solvents (normal propyl bromide) , Fluorinated solvents (HFC, HFE, HCFC) and the like, and hydrocarbons are preferred from the viewpoint of environmental protection.

洗浄槽3は、上部が開閉可能な中空箱体状の耐圧容器であり、上部開口部に形成されたフランジ部にはシール材6を介して、該開口部を密閉して覆う開閉蓋7が設けられている。この開閉蓋7は、天井面(下面)7aが傾斜するように洗浄槽3の上部開口部に開閉自在に設けられる。開閉蓋7の天井面7aを傾斜させて設けるのは、この開閉蓋7の天井面7aに溶剤ガスが結露した場合に、溶剤液滴を該天井面7aを伝わらせて傾斜側へと流下させるためであり、傾斜側に集められた溶剤液滴は洗浄槽3の側壁面3bから底面3aへと流下する。したがって、結露した溶剤滴が被処理物2に付着してシミが発生することを防止できる。
なお、開閉蓋7は、天井面が傾斜したタイプに限定されるものではなく、水平タイプでもよい。
The cleaning tank 3 is a pressure-resistant container having a hollow box shape whose upper part can be opened and closed, and an opening / closing lid 7 that seals and covers the opening via a sealing material 6 on a flange formed in the upper opening. Is provided. The open / close lid 7 is provided in an openable and closable manner at the upper opening of the cleaning tank 3 so that the ceiling surface (lower surface) 7a is inclined. The ceiling surface 7a of the opening / closing lid 7 is provided to be inclined so that when solvent gas is condensed on the ceiling surface 7a of the opening / closing lid 7, the solvent droplets flow down the inclination surface through the ceiling surface 7a. Therefore, the solvent droplets collected on the inclined side flow down from the side wall surface 3b of the cleaning tank 3 to the bottom surface 3a. Therefore, it is possible to prevent the condensed solvent droplets from adhering to the workpiece 2 and causing spots.
The open / close lid 7 is not limited to the type with the inclined ceiling surface, and may be a horizontal type.

洗浄槽3の底部3aの傾斜下端には、後述する溶剤タンク13に至る排液系8が本発明の洗浄溶剤排液系として接続されており、該排液系8にはこれを開閉する排液弁9が介設されている。   A drainage system 8, which will be described later, is connected to the lower end of the bottom 3 a of the cleaning tank 3 as a cleaning solvent drainage system according to the present invention. A liquid valve 9 is interposed.

上述の浸漬洗浄工程、蒸気洗浄工程、及び真空乾燥工程は、被処理物2を収容する洗浄槽3内を炭化水素等の可燃性洗浄溶剤の爆発下限界以下まで減圧して行われるので、洗浄槽3には、真空ポンプ10に至る排気系11が接続されており、該排気系11にはこれを開閉する洗浄槽真空弁12が介設されている。   The above-described immersion cleaning process, steam cleaning process, and vacuum drying process are performed by reducing the pressure in the cleaning tank 3 containing the workpiece 2 to below the lower explosion limit of a flammable cleaning solvent such as hydrocarbon. An exhaust system 11 reaching the vacuum pump 10 is connected to the tank 3, and a cleaning tank vacuum valve 12 for opening and closing the exhaust system 11 is interposed in the exhaust system 11.

また、洗浄槽3には、その内部に洗浄溶剤を流入して被処理物2を浸漬洗浄するとともに、後述する超音波発生器3cを冷却する洗浄溶剤を供給するために、溶剤タンク13に至る洗浄溶剤供給系14が接続されており、該洗浄溶剤供給系14の途中には洗浄溶剤供給弁(浸漬洗浄弁)15が介設されている。そして、洗浄溶剤供給弁15よりも上流側において洗浄溶剤供給系14が分岐され、分岐側の流路14aの先端は洗浄槽3の底部3aの傾斜上端に設けられた噴出ノズル5に接続され、分岐側流路の途中には冷却弁5aが介設される。また、洗浄槽3には、その内部に流入された洗浄溶剤のレベルを検出するためのレベルスイッチ16が備えられている。浸漬洗浄工程は、前述したように被処理物2を洗浄溶剤に浸漬して超音波による振動を与えて洗浄する工程であり、したがって、本実施形態の洗浄槽3の底部3aには、複数の超音波振動子を振動板としてのステンレス板に組み付けたパネル状の超音波発生器3cが底部のほぼ全面を覆うようにして液密状態で取り付けられており、この超音波発生器3cよりも傾斜上端側の底部に洗浄溶剤供給系の噴出ノズル5を超音波発生器の左右幅をカバーし得る長さに亘って配設し、底部3aの傾斜下端に洗浄溶剤排液系8の排液口を開口している。
なお、溶剤タンク13は、上部が覆われた密閉容器であり、後述する分岐排気系を介して真空ポンプ10により減圧される。
Further, the cleaning tank 3 is supplied with a cleaning solvent to immerse and clean the object 2 to be processed, and reaches the solvent tank 13 to supply a cleaning solvent for cooling an ultrasonic generator 3c described later. A cleaning solvent supply system 14 is connected, and a cleaning solvent supply valve (immersion cleaning valve) 15 is interposed in the middle of the cleaning solvent supply system 14. Then, the cleaning solvent supply system 14 is branched upstream of the cleaning solvent supply valve 15, and the tip of the branch-side flow path 14 a is connected to the ejection nozzle 5 provided at the inclined upper end of the bottom 3 a of the cleaning tank 3, A cooling valve 5a is interposed in the middle of the branch side flow path. The cleaning tank 3 is provided with a level switch 16 for detecting the level of the cleaning solvent that has flowed into the cleaning tank 3. The immersion cleaning process is a process in which the workpiece 2 is immersed in a cleaning solvent and cleaned by applying ultrasonic vibrations as described above, and therefore, the bottom 3a of the cleaning tank 3 of the present embodiment includes a plurality of cleaning processes. A panel-shaped ultrasonic generator 3c in which an ultrasonic vibrator is assembled to a stainless steel plate as a vibration plate is attached in a liquid-tight state so as to cover almost the entire bottom surface, and is inclined more than the ultrasonic generator 3c. An ejection nozzle 5 of the cleaning solvent supply system is disposed at the bottom on the upper end side over a length that can cover the left and right widths of the ultrasonic generator. Is open.
The solvent tank 13 is a sealed container with an upper part covered, and is depressurized by the vacuum pump 10 through a branch exhaust system described later.

浸漬洗浄工程の完了後、洗浄槽3内の洗浄溶剤は、前述したように、上記排液弁9を開放して両者を連通させることにより、洗浄槽3の傾斜底部3aの最下部に接続された排液系8を通じて溶剤タンク13へと排液される。   After completion of the immersion cleaning process, the cleaning solvent in the cleaning tank 3 is connected to the lowermost portion of the inclined bottom portion 3a of the cleaning tank 3 by opening the drain valve 9 and communicating the both as described above. Then, the liquid is drained to the solvent tank 13 through the drainage system 8.

溶剤タンク13から洗浄槽3への洗浄溶剤の流入、及び洗浄槽3から溶剤タンク13への排液は、溶剤タンク13と洗浄槽3との圧力差により行われる。したがって、洗浄槽3には、前述したように、真空ポンプ10に至る排気系11が接続されている。また、洗浄槽3にはその内部圧力を検出する洗浄槽圧力センサ51が備えられるとともに、内部圧力表示する洗浄槽内圧力計17が備えられており、排気系11の洗浄槽真空弁12の上流側(洗浄槽側)には洗浄槽3の内部圧力を大気開放して調整する洗浄槽大気開放弁18が分岐介設されている。   The inflow of the cleaning solvent from the solvent tank 13 to the cleaning tank 3 and the drainage from the cleaning tank 3 to the solvent tank 13 are performed by a pressure difference between the solvent tank 13 and the cleaning tank 3. Therefore, the exhaust system 11 reaching the vacuum pump 10 is connected to the cleaning tank 3 as described above. Further, the cleaning tank 3 is provided with a cleaning tank pressure sensor 51 for detecting the internal pressure of the cleaning tank 3 and a pressure gauge 17 in the cleaning tank for displaying the internal pressure, upstream of the cleaning tank vacuum valve 12 of the exhaust system 11. On the side (cleaning tank side), a cleaning tank air release valve 18 for branching and adjusting the internal pressure of the cleaning tank 3 by opening to the atmosphere is provided.

また、洗浄槽3との相対関係において溶剤タンク13の内部圧力を調整する必要があるため、排気系11の洗浄槽真空弁12の下流側(真空ポンプ側)は分岐され、溶剤タンク13に至る分岐排気系19が接続され、この分岐排気系19には溶剤タンク減圧弁20が介設されている。さらに、溶剤タンク13には、その内部圧力を検出する溶剤タンク圧力センサ52が備えられると共に、内部圧力を表示する溶剤タンク圧力計21が備えられており、その内部圧力を大気開放して調整する溶剤タンク大気開放弁22が備えられている。また、溶剤タンク13内の洗浄溶剤の温度を検出して温度管理を行うための溶剤タンク温度センサ53が設けられており、該溶剤タンク温度センサ53からの信号により洗浄溶剤が所定の温度よりも低下すると、制御装置50がヒータ13aに通電して洗浄溶剤を加熱する。   Further, since it is necessary to adjust the internal pressure of the solvent tank 13 relative to the cleaning tank 3, the downstream side (vacuum pump side) of the cleaning tank vacuum valve 12 of the exhaust system 11 is branched to reach the solvent tank 13. A branch exhaust system 19 is connected, and a solvent tank pressure reducing valve 20 is interposed in the branch exhaust system 19. Further, the solvent tank 13 is provided with a solvent tank pressure sensor 52 for detecting the internal pressure and a solvent tank pressure gauge 21 for displaying the internal pressure, and adjusts the internal pressure by opening it to the atmosphere. A solvent tank atmosphere release valve 22 is provided. Further, a solvent tank temperature sensor 53 for detecting the temperature of the cleaning solvent in the solvent tank 13 and performing temperature management is provided, and the cleaning solvent has a temperature higher than a predetermined temperature by a signal from the solvent tank temperature sensor 53. When lowered, the control device 50 energizes the heater 13a to heat the cleaning solvent.

浸漬洗浄工程の完了後、排液弁9を開放して両者を連通することにより、洗浄槽3内の使用済み洗浄溶剤が排液系8を通じて溶剤タンク13へと排液されるが、洗浄に使用した洗浄溶剤には被処理物2に付着していた各種の汚れが混入している。これらの汚れ成分は洗浄槽3や排液系8に設けるフィルタ等を通しただけでは除去しきれず、省資源および環境保護の観点から洗浄溶剤を再生して使用する。したがって、溶剤タンク13には、使用済み溶剤を蒸留して凝縮し、再生溶剤として貯留するリザーブタンク23に至る再生処理系24が接続されており、この再生処理系24には蒸留器25及びコンデンサ26が順次介設されている。   After completion of the immersion cleaning process, the drainage valve 9 is opened to allow the two to communicate with each other, so that the used cleaning solvent in the cleaning tank 3 is drained to the solvent tank 13 through the drainage system 8. The used cleaning solvent is contaminated with various kinds of dirt adhering to the workpiece 2. These dirt components cannot be removed only by passing through a filter or the like provided in the cleaning tank 3 or the drainage system 8, and the cleaning solvent is regenerated and used from the viewpoint of resource saving and environmental protection. Accordingly, the solvent tank 13 is connected to a regeneration processing system 24 that reaches the reserve tank 23 that condenses the used solvent by distillation and stores it as a regeneration solvent. The regeneration processing system 24 includes a distiller 25 and a condenser. 26 are sequentially provided.

蒸留器25は、例えば耐熱・耐圧性を有する概略円筒体状の竪型容器であり、本実施形態では蒸留器25の下部を収納する状態で、加熱機構25aが備えられている。この加熱機構25aは、例えばオイル加熱ユニットであり、熱源として電気ヒータを備えており、該ヒータにより加熱媒体としての耐熱オイルを加熱し、この加熱オイルを介して蒸留器25を加熱することにより、この蒸留器25内を流通する汚れ成分を含む洗浄溶剤を加熱して蒸発する。   The distiller 25 is, for example, a generally cylindrical bowl-shaped container having heat resistance and pressure resistance. In the present embodiment, a heating mechanism 25 a is provided in a state in which the lower part of the distiller 25 is accommodated. The heating mechanism 25a is, for example, an oil heating unit, and includes an electric heater as a heat source. The heat-resistant oil as a heating medium is heated by the heater, and the distiller 25 is heated through the heating oil. The cleaning solvent containing the dirt component flowing through the distiller 25 is heated and evaporated.

なお、沸点を低下させるために蒸留器25内を減圧する。また、溶剤タンク13から蒸留器25への汚れ成分を含む溶剤の流入は、これら溶剤タンク13と蒸留器25との圧力差により行われ、汚れ成分を含む溶剤は蒸留器25の下部に流入し、気化した溶剤蒸気は蒸留器25の上部から取り出される。   In order to lower the boiling point, the inside of the still 25 is depressurized. Further, the inflow of the solvent containing the dirt component from the solvent tank 13 to the distiller 25 is performed by the pressure difference between the solvent tank 13 and the distiller 25, and the solvent containing the dirt component flows into the lower part of the distiller 25. The vaporized solvent vapor is taken out from the upper part of the distiller 25.

再生処理系24の蒸留器25よりも下流側には、この蒸留器25によって蒸留した溶剤蒸気を凝縮して液化するためのコンデンサ26が介設されている。このコンデンサ26の本体は、例えば概略円筒体状の竪型または横型の容器であり、その内部に冷却水を通す冷却細管26aを収納した熱交換器である。コンデンサ26を通過する溶剤蒸気は冷却細管26aに接触して凝縮(液化)され、この液化した再生溶剤がリザーブタンク23内に貯溜される。コンデンサ26とリザーブタンク23との間の再生処理系24には、循環ポンプ27aにより再生溶剤を循環させて水分分離器27bに通して水分を分離してからリザーブタンク23に供給すると共に、コンデンサ26からの再生溶剤をエゼクタ27cにより循環流路内に吸引合流する水分分離機構が介設されており、リザーブタンク23には再生溶剤の貯溜量を検出するレベルスイッチ28が備えられている。なお、上記エゼクタ27cは、蒸留器25内を減圧して蒸留効率を高めている。   A condenser 26 for condensing and liquefying the solvent vapor distilled by the distiller 25 is provided downstream of the distiller 25 of the regeneration processing system 24. The main body of the condenser 26 is, for example, a generally cylindrical bowl-shaped or horizontal container, and is a heat exchanger that houses a cooling thin tube 26a through which cooling water passes. The solvent vapor passing through the condenser 26 is condensed (liquefied) in contact with the cooling thin tube 26 a, and the liquefied regenerated solvent is stored in the reserve tank 23. In the regeneration processing system 24 between the condenser 26 and the reserve tank 23, the regeneration solvent is circulated by a circulation pump 27 a, passed through a moisture separator 27 b to separate moisture, and then supplied to the reserve tank 23. A water separation mechanism for sucking and regenerating the regenerated solvent from the recycle solvent into the circulation flow path by the ejector 27c is interposed, and the reserve tank 23 is provided with a level switch 28 for detecting the storage amount of the regenerated solvent. The ejector 27c increases the distillation efficiency by reducing the pressure in the distiller 25.

また、リザーブタンク23には、上記洗浄槽3へ溶剤蒸気を導入して、該洗浄槽3内に収容された被処理物2の蒸気洗浄工程を行うために、該洗浄槽3に至る蒸気洗浄系29が本発明の洗浄溶剤蒸気導入系として接続されている。この蒸気洗浄系29には、リザーブタンク23から導入される再生溶剤を溶剤蒸気として気化させるための熱交換器30が介設されており、リザーブタンク23から熱交換器30への再生溶剤の導入、熱交換器30から洗浄槽3への溶剤蒸気の導入は、リザーブタンク23と洗浄槽3との圧力差により行われ、熱交換器30よりも上流側の蒸気洗浄系29にはこれを開閉するための蒸気洗浄補助弁31が介設され、熱交換器30よりも下流側の蒸気洗浄系29にはこれを開閉するための蒸気洗浄弁32が介設されている。   Further, in the reserve tank 23, the solvent vapor is introduced into the cleaning tank 3, and the steam cleaning process reaching the cleaning tank 3 is performed in order to perform the steam cleaning process of the workpiece 2 accommodated in the cleaning tank 3. System 29 is connected as the cleaning solvent vapor introduction system of the present invention. The steam cleaning system 29 is provided with a heat exchanger 30 for vaporizing the regenerated solvent introduced from the reserve tank 23 as solvent vapor, and the regenerative solvent is introduced from the reserve tank 23 to the heat exchanger 30. The introduction of the solvent vapor from the heat exchanger 30 to the cleaning tank 3 is performed by the pressure difference between the reserve tank 23 and the cleaning tank 3, and the steam cleaning system 29 upstream of the heat exchanger 30 is opened and closed. A steam cleaning auxiliary valve 31 is provided for this purpose, and a steam cleaning valve 32 for opening and closing the steam cleaning system 29 is provided downstream of the heat exchanger 30.

熱交換器30の本体は、例えば概略円筒体状の竪型または横型の容器であり、その内部に加熱媒体を通す加熱細管30aを収納しており、該熱交換器30を通過する再生溶剤は加熱細管30aに接触して気化され、溶剤蒸気として蒸気洗浄系29の下流端である蒸気供給口から洗浄槽3の内部に導入されることになる。熱交換器30の加熱細管30aに通す加熱媒体としては、電気ヒータ等の加熱手段により加熱したオイルが挙げられる。また、熱交換器30の導入口には、この熱交換器30内へ再生溶剤を霧状にして噴出させるための噴霧ノズル33が設けられており、該熱交換器30内へ再生溶剤を噴霧することにより発生する溶剤蒸気を確実にガス化することができる。   The main body of the heat exchanger 30 is, for example, a substantially cylindrical bowl-shaped or horizontal container, and stores therein a heating thin tube 30a through which a heating medium passes, and the regenerating solvent that passes through the heat exchanger 30 is The vaporized vapor comes into contact with the heating thin tube 30a and is introduced into the cleaning tank 3 from the vapor supply port at the downstream end of the vapor cleaning system 29 as solvent vapor. Examples of the heating medium passed through the heating thin tube 30a of the heat exchanger 30 include oil heated by heating means such as an electric heater. A spray nozzle 33 is provided at the inlet of the heat exchanger 30 for spraying the regenerated solvent into the heat exchanger 30 in the form of a mist. The regenerated solvent is sprayed into the heat exchanger 30. By doing so, the solvent vapor generated can be reliably gasified.

前記した各機器、即ち真空ポンプ、各種の弁、及び各種センサは、制御装置50に電気的に接続され、この制御装置50の制御の下で予め設定した手順と条件で作動する。   Each of the above-described devices, that is, a vacuum pump, various valves, and various sensors are electrically connected to the control device 50, and operate according to preset procedures and conditions under the control of the control device 50.

本実施形態における制御装置50は、図2に示すように、CPU、ROM、RAMなどを備えたコンピュータにより構成され、タイマ54を備える。そして、この制御装置50の入力側には、操作パネル55に設けた電源スイッチ56、スタートスイッチ57、減圧洗浄時間設定スイッチ58、復圧洗浄時間設定スイッチ59、低圧真空乾燥時間設定スイッチ60、復圧真空乾燥時間設定スイッチ61の他に、洗浄槽圧力センサ51、洗浄槽レベルスイッチ16、溶剤タンク温度センサ53、溶剤タンク圧力センサ52、リザーブタンクレベルスイッチ28などが接続され、出力側には、操作パネル55に設けた表示器62の他に、真空ポンプ10、洗浄槽真空弁12、排液弁9、洗浄溶剤供給弁15、溶剤タンクヒータ13a、洗浄槽大気開放弁18、分岐排気弁19、溶剤タンク減圧弁20、溶剤タンク大気開放弁22、蒸気洗浄補助弁31、蒸気洗浄弁32、冷却弁5a、耐熱オイル過熱ヒータなどが接続されている。   As shown in FIG. 2, the control device 50 in the present embodiment is configured by a computer including a CPU, a ROM, a RAM, and the like, and includes a timer 54. On the input side of the control device 50, a power switch 56, a start switch 57, a reduced pressure cleaning time setting switch 58, a return pressure cleaning time setting switch 59, a low pressure vacuum drying time setting switch 60 provided on the operation panel 55, In addition to the pressure vacuum drying time setting switch 61, a cleaning tank pressure sensor 51, a cleaning tank level switch 16, a solvent tank temperature sensor 53, a solvent tank pressure sensor 52, a reserve tank level switch 28, and the like are connected. In addition to the display 62 provided on the operation panel 55, the vacuum pump 10, the cleaning tank vacuum valve 12, the drain valve 9, the cleaning solvent supply valve 15, the solvent tank heater 13a, the cleaning tank air release valve 18, and the branch exhaust valve 19 , Solvent tank pressure reducing valve 20, solvent tank air release valve 22, steam cleaning auxiliary valve 31, steam cleaning valve 32, cooling valve 5a, heat-resistant oil Thermal heater is connected.

なお、復圧洗浄時間設定スイッチ59、復圧真空乾燥時間設定スイッチ61は、被処理物2の重量、表面積、微細孔や微細隙間の有無や数などの特質に応じて、復圧時間をタイマ54に設定する入力手段として機能する。また、減圧洗浄時間設定スイッチ58、低圧真空乾燥時間設定スイッチ60は、被処理物に応じて所望する時間をタイマ54に設定する入力手段として機能するものである。   The return pressure cleaning time setting switch 59 and the return pressure vacuum drying time setting switch 61 are used to set the return pressure time to a timer according to characteristics such as the weight, surface area, presence / absence and number of fine holes and fine gaps of the workpiece 2. 54 functions as an input means. Further, the reduced pressure cleaning time setting switch 58 and the low pressure vacuum drying time setting switch 60 function as input means for setting a desired time in the timer 54 according to the object to be processed.

そして、本実施形態における制御装置50は、浸漬洗浄工程において、上記洗浄槽内を200Pa以下に減圧して減圧洗浄を行うと共に、該減圧洗浄を行った後、200Paを超え洗浄溶剤の爆発下限界以下の圧力まで復圧し、この復圧状態で復圧洗浄を行う制御を実行するとともに、真空乾燥工程において、上記洗浄槽3内を真空ポンプ10の限界値まで減圧して低圧真空乾燥を行うと共に、該低圧真空乾燥を行った後、真空ポンプ10の限界値を開放し洗浄溶剤の爆発下限界以下の圧力まで復圧し、この復圧状態で復圧真空乾燥を行う制御を実行する。   In the immersion cleaning process, the control device 50 in the present embodiment performs the vacuum cleaning by reducing the pressure in the cleaning tank to 200 Pa or less, and after performing the vacuum cleaning, the lower limit of explosion of the cleaning solvent exceeds 200 Pa. In the vacuum drying process, the pressure in the cleaning tank 3 is reduced to the limit value of the vacuum pump 10 and low-pressure vacuum drying is performed. After the low-pressure vacuum drying, the limit value of the vacuum pump 10 is opened, the pressure is returned to a pressure below the lower explosion limit of the cleaning solvent, and the control for performing the pressure-reduced vacuum drying in this recovered pressure state is executed.

また、制御装置50は、減圧洗浄を所定の時間行い、該減圧洗浄を行った後、所定の時間復圧洗浄を行う操作を洗浄工程中で複数回繰り返す制御を実行する。なお、繰り返し回数は、予め設定した固定回数でもよいが、操作パネル55の図示していない操作部(外部入力手段)を操作することにより設定できるようにしてもよい。   In addition, the control device 50 performs control for repeating the vacuum cleaning for a predetermined time, repeating the vacuum cleaning for a predetermined time, and then repeating the operation for performing the pressure recovery cleaning for a predetermined time a plurality of times during the cleaning process. The number of repetitions may be a fixed number set in advance, but may be set by operating an operation unit (external input means) (not shown) of the operation panel 55.

さらに、制御装置50は、低圧真空乾燥を所定の時間行い、該低圧真空乾燥を行った後、所定の時間復圧真空乾燥する操作を乾燥工程中で複数回繰り返す制御を実行する。なお、この繰り返し回数は、予め設定した固定回数でもよいが、操作パネル55の操作部(外部入力手段)を操作することにより設定できるようにしてもよい。   Further, the control device 50 performs control for performing low-pressure vacuum drying for a predetermined time, repeating the low-pressure vacuum drying for a predetermined time, and then repeating the operation of performing vacuum decompression for a predetermined time a plurality of times during the drying process. The number of repetitions may be a fixed number set in advance, but may be set by operating the operation unit (external input means) of the operation panel 55.

次に、本実施形態における洗浄装置1の操作を具体的に説明する。
準備段階として、洗浄槽大気開放弁18を開放した後、洗浄槽3の開閉蓋7を開放して、機械部品等の被処理物2を複数個入れたバスケット4を載置部上に載置し、開閉蓋7をシール部材6を介して密閉状態で閉成する。そして、スタートスイッチ57を操作すると、制御装置50が洗浄槽大気開放弁18を閉成する。
Next, the operation of the cleaning apparatus 1 in this embodiment will be specifically described.
As a preparation stage, after opening the cleaning tank air release valve 18, the opening / closing lid 7 of the cleaning tank 3 is opened, and a basket 4 containing a plurality of objects 2 to be processed such as machine parts is placed on the placement unit. Then, the open / close lid 7 is closed in a sealed state via the seal member 6. When the start switch 57 is operated, the control device 50 closes the cleaning tank atmosphere release valve 18.

このような準備が整ったら、まず、洗浄槽3へ洗浄溶剤の給液を行う。給液操作は、制御装置50が溶剤タンク大気開放弁22を開放して溶剤タンク13の内部圧力を溶剤タンク圧力センサ52が爆発下限界以下の500Paを検出するまで大気方向へと戻す。そして、溶剤タンク13の内部圧力が500Paになったことが検出されると、制御装置50が溶剤タンク大気開放弁22を閉成し、洗浄溶剤供給系14の洗浄溶剤供給弁15、及び排気系11の洗浄槽真空弁12を開放すると共に、真空ポンプ10を駆動する。すると、洗浄溶剤供給弁15が洗浄槽3と溶剤タンク13との間を連通し、洗浄槽3と溶剤タンク13との圧力差により、溶剤タンク13内から洗浄溶剤が洗浄槽3へと給液される。このとき、制御装置50の制御により、溶剤タンク減圧弁20、蒸気洗浄弁32、冷却弁5a、蒸気洗浄補助弁31、及び排液弁9は閉成されている。そして、洗浄槽3のレベルスイッチ16の上限レベルスイッチが上限レベルを検出して制御装置50に信号を送ると、これにより、制御装置50が洗浄溶剤供給弁15及び洗浄槽真空弁12を閉成すると共に、真空ポンプ10を停止する。   When such preparation is completed, first, a cleaning solvent is supplied to the cleaning tank 3. In the liquid supply operation, the control device 50 opens the solvent tank atmospheric release valve 22 and returns the internal pressure of the solvent tank 13 to the atmospheric direction until the solvent tank pressure sensor 52 detects 500 Pa below the lower explosion limit. When it is detected that the internal pressure of the solvent tank 13 has reached 500 Pa, the control device 50 closes the solvent tank air release valve 22, the cleaning solvent supply valve 15 of the cleaning solvent supply system 14, and the exhaust system. 11 cleaning tank vacuum valve 12 is opened, and vacuum pump 10 is driven. Then, the cleaning solvent supply valve 15 communicates between the cleaning tank 3 and the solvent tank 13, and the cleaning solvent is supplied from the solvent tank 13 to the cleaning tank 3 due to the pressure difference between the cleaning tank 3 and the solvent tank 13. Is done. At this time, under the control of the control device 50, the solvent tank pressure reducing valve 20, the steam cleaning valve 32, the cooling valve 5a, the steam cleaning auxiliary valve 31, and the drainage valve 9 are closed. When the upper limit level switch of the level switch 16 of the cleaning tank 3 detects the upper limit level and sends a signal to the control device 50, the control device 50 closes the cleaning solvent supply valve 15 and the cleaning tank vacuum valve 12. At the same time, the vacuum pump 10 is stopped.

そして、真空浸漬洗浄工程を行う。この浸漬洗浄工程では被処理物2が加熱溶剤内に浸漬している状態で、超音波発生器3cにより超音波振動を与えて浸漬洗浄(超音波洗浄)を行う。具体的には、図3に示すように、真空ポンプ10により排気系11を通じて洗浄槽3内を洗浄槽圧力センサ51が200Pa以下を検出するまで減圧して減圧洗浄を行うと共に、この減圧洗浄を行った後に制御装置50が洗浄槽大気開放弁18を開放し、洗浄槽圧力センサ51による検出圧力が200Paを超え、かつ洗浄溶剤の爆発下限界以下の500Paの圧力を指示するまで大気圧方向へと復圧して、この復圧状態で復圧洗浄を行い、この復圧洗浄の所定時間が経過した後に洗浄槽大気開放弁18を閉成し、再度、真空ポンプ10により排気系11を通じて洗浄槽3内を200Pa以下に減圧して減圧洗浄を行うという、減圧洗浄と復圧洗浄を繰り返し行う。   Then, a vacuum immersion cleaning process is performed. In this immersion cleaning step, immersion cleaning (ultrasonic cleaning) is performed by applying ultrasonic vibration by the ultrasonic generator 3c while the workpiece 2 is immersed in the heating solvent. Specifically, as shown in FIG. 3, the inside of the washing tank 3 is decompressed by the vacuum pump 10 through the exhaust system 11 until the washing tank pressure sensor 51 detects 200 Pa or less, and the reduced pressure washing is performed. After that, the control device 50 opens the cleaning tank air release valve 18, and the pressure detected by the cleaning tank pressure sensor 51 exceeds 200 Pa, and the atmospheric pressure direction is indicated until a pressure of 500 Pa below the explosive lower limit of the cleaning solvent is indicated. After the predetermined time of the return pressure cleaning has elapsed, the cleaning tank atmosphere release valve 18 is closed, and the vacuum pump 10 again causes the cleaning tank to pass through the exhaust system 11. The reduced pressure cleaning and the return pressure cleaning are repeatedly performed, in which the inside of 3 is depressurized to 200 Pa or less and the reduced pressure cleaning is performed.

洗浄槽3内を200Pa以下に減圧して減圧洗浄を行うのは、洗浄溶剤の爆発下限界値との間に圧力差を確保して減圧洗浄を効果的に行うためである。
一方、200Paを超え爆発下限界以下の圧力まで復圧するのは、減圧洗浄の圧力との間に圧力差を確保すると共に、洗浄溶剤の引火を防止するためである。
The reason why the cleaning tank 3 is depressurized to 200 Pa or less to perform the depressurized cleaning is to effectively perform the depressurized cleaning while ensuring a pressure difference with the lower explosion limit value of the cleaning solvent.
On the other hand, the reason why the pressure is returned to a pressure exceeding 200 Pa and below the lower limit of explosion is to ensure a pressure difference from the pressure of the vacuum cleaning and to prevent the cleaning solvent from igniting.

このように復圧洗浄する理由は、被処理物2に微細な空間、例えば微細な孔(特に直径に比較して深い孔)が存在する場合には、洗浄溶剤中に浸漬しても微細な孔の中に空気が残留して抜け難く、すなわち孔内に洗浄溶剤が浸入し難く、超音波洗浄を施しても孔内部へ洗浄溶剤が浸透していかない。また、一度減圧しただけでは、孔内の空気が膨張して、膨張した分の空気が抜けたとしても洗浄溶剤が孔内に浸透していかない。そこで、孔の中の空気を減圧して膨張させて希薄にして膨張分は排出し、その後の復圧操作により残った空気を収縮させることによりこの収縮分の洗浄溶剤を浸透させ、この減圧と復圧とを繰り返すことにより、孔の中から空気を抜け出し易くして、孔内部へ洗浄溶剤を浸透させ、浸透した洗浄溶剤を介して孔の内周面に超音波を伝播して超音波洗浄を効率良く行うものである。   The reason for performing the pressure-recovery in this way is that if the object to be processed 2 has a minute space, for example, a minute hole (especially a hole deeper than the diameter), it is fine even if immersed in the cleaning solvent. Air remains in the hole and is difficult to escape. That is, the cleaning solvent does not easily enter the hole, and the cleaning solvent does not penetrate into the hole even if ultrasonic cleaning is performed. Further, once the pressure is reduced, the air in the hole expands, and the cleaning solvent does not penetrate into the hole even if the expanded air is removed. Therefore, the air in the hole is depressurized and expanded to dilute, and the expanded portion is discharged, and the remaining air is contracted by the subsequent return pressure operation to infiltrate the cleaning solvent for this contraction. Repeating the return pressure makes it easier for air to escape from the hole, so that the cleaning solvent penetrates into the hole, and ultrasonic waves are propagated to the inner peripheral surface of the hole through the permeated cleaning solvent to perform ultrasonic cleaning. Is performed efficiently.

浸漬洗浄の完了後に、洗浄槽3内の汚れ成分を含む溶剤を排液する。排液操作は、制御装置50からの信号により洗浄槽大気開放弁18を開放し、洗浄槽3の内部圧力を洗浄槽圧力センサ51が爆発下限界以下の500Paを検出するまで大気方向へと戻す。そして、500Paを検出したならば、洗浄槽大気開放弁18を閉成し、排液系8の排液弁9、及び分岐排気系19の溶剤タンク減圧弁20を開放すると共に、真空ポンプ10を駆動する。すると、排液弁9の開放により洗浄槽3と溶剤タンク13とが連通し、これにより洗浄槽3と溶剤タンク13との圧力差により、洗浄槽3内から汚れ成分を含む溶剤が溶剤タンク13へと排液される。そして、洗浄槽3のレベルスイッチ16の下限レベル検出により、排液弁9及び溶剤タンク減圧弁20を閉成する。   After completion of the immersion cleaning, the solvent containing the dirt component in the cleaning tank 3 is drained. In the drain operation, the cleaning tank atmosphere release valve 18 is opened by a signal from the control device 50, and the internal pressure of the cleaning tank 3 is returned to the atmosphere until the cleaning tank pressure sensor 51 detects 500 Pa below the lower explosion limit. . When 500 Pa is detected, the cleaning tank air release valve 18 is closed, the drainage valve 9 of the drainage system 8 and the solvent tank pressure reducing valve 20 of the branch exhaust system 19 are opened, and the vacuum pump 10 is turned on. To drive. Then, the drainage valve 9 is opened so that the cleaning tank 3 and the solvent tank 13 communicate with each other. Due to the pressure difference between the cleaning tank 3 and the solvent tank 13, the solvent containing the dirt component from the cleaning tank 3 is removed from the solvent tank 13. The liquid is drained. The drain valve 9 and the solvent tank pressure reducing valve 20 are closed by detecting the lower limit level of the level switch 16 of the cleaning tank 3.

排液操作の完了後、仕上げ蒸気洗浄工程に移行する。蒸気洗浄工程では、真空ポンプ10は既に駆動状態にあり、制御装置50が排気系11の洗浄槽真空弁12を開放した後、蒸気洗浄系29の蒸気洗浄弁32及び蒸気洗浄補助弁31を開放する。また、冷却弁5aを開いて洗浄溶剤供給系14からの分岐流路14aを介して溶剤タンク13から供給される洗浄溶剤を液体のまま噴出ノズル5から噴出させ、この溶剤を超音波発生器3c上に流して溶剤膜で覆い、これにより超音波発生器3cを冷却するとともに、超音波発生器3cが後述する溶剤蒸気に直接晒されて昇温することを防止する。   After the drainage operation is completed, the process proceeds to the finishing steam cleaning process. In the steam cleaning process, the vacuum pump 10 is already in operation, and after the controller 50 opens the cleaning tank vacuum valve 12 of the exhaust system 11, the steam cleaning valve 32 and the steam cleaning auxiliary valve 31 of the steam cleaning system 29 are opened. To do. Further, the cooling valve 5a is opened, and the cleaning solvent supplied from the solvent tank 13 is ejected from the ejection nozzle 5 through the branch flow path 14a from the cleaning solvent supply system 14 as a liquid, and this solvent is emitted from the ultrasonic generator 3c. This is flowed upward and covered with a solvent film, thereby cooling the ultrasonic generator 3c and preventing the ultrasonic generator 3c from being directly exposed to solvent vapor, which will be described later, to raise the temperature.

蒸気洗浄弁32及び蒸気洗浄補助弁31の開放タイミングは、超音波発生器3c上を溶剤が流れて、洗浄槽3の洗浄槽圧力センサ51が100Pa以下の減圧状態を検出したときである。すると、洗浄槽3とリザーブタンク23との圧力差により、リザーブタンク23から熱交換器30の溶剤導入口に導入され、該溶剤導入口に設けられた噴霧ノズル33のノズル口から溶剤細管へ再生溶剤が霧状に噴出されることにより、霧状溶剤が溶剤細管内を通過しながら加熱媒体の通過する加熱細管30aと熱交換してガス化し、溶剤液滴の混入しない完全なる溶剤ガスとして蒸気導入口29aから洗浄槽3の内部に導入される。したがって、熱交換器30を大型化することなく、洗浄槽3に導入する溶剤蒸気への溶剤液滴の混入を防止し、後述する真空乾燥後の被処理物2へのシミの付着を防止することができるものである。   The opening timing of the steam cleaning valve 32 and the steam cleaning auxiliary valve 31 is when the solvent flows on the ultrasonic generator 3c and the cleaning tank pressure sensor 51 of the cleaning tank 3 detects a reduced pressure state of 100 Pa or less. Then, due to the pressure difference between the cleaning tank 3 and the reserve tank 23, the solvent is introduced from the reserve tank 23 to the solvent introduction port of the heat exchanger 30, and is regenerated from the nozzle port of the spray nozzle 33 provided at the solvent introduction port to the solvent capillary. When the solvent is ejected in the form of a mist, the mist-like solvent is gasified by heat exchange with the heating capillary 30a through which the heating medium passes while passing through the solvent capillary, and vaporized as a complete solvent gas with no solvent droplets mixed therein. It is introduced into the cleaning tank 3 from the introduction port 29a. Therefore, without increasing the size of the heat exchanger 30, solvent droplets are prevented from being mixed into the solvent vapor introduced into the cleaning tank 3, and stains are prevented from adhering to the workpiece 2 after vacuum drying described later. It is something that can be done.

蒸気洗浄を所定の時間行った後に制御装置50が蒸気洗浄弁32、蒸気洗浄補助弁31、及び冷却弁5aを閉成して蒸気洗浄工程を完了し、真空乾燥工程へと移行する。移行した時点では真空ポンプ10は継続して駆動状態であり、排気系11の洗浄槽真空弁12を開放したままであり、真空ポンプ10の限界値まで減圧する。なお、真空ポンプ10は、真空乾燥に理想的な圧力である約7Pa以下まで減圧する能力を備えている。そして、限界値に達したならば、この状態を所定時間維持して低圧真空乾燥を行い、その所定時間経過後に制御装置50が洗浄槽大気開放弁18を開放して、即ち真空ポンプ10の限界値を開放し、洗浄槽圧力センサ51が爆発下限界以下の500Paを検出するまで大気方向へと戻す。すなわち、復圧する。そして、500Paを検出すると、この復圧状態を所定時間だけ維持して復圧真空乾燥を行い、その後に再度洗浄槽大気開放弁18を閉成して真空ポンプ限界値まで減圧する。   After performing the steam cleaning for a predetermined time, the control device 50 closes the steam cleaning valve 32, the steam cleaning auxiliary valve 31, and the cooling valve 5a to complete the steam cleaning process, and proceeds to the vacuum drying process. At the time of transition, the vacuum pump 10 is continuously driven, the cleaning tank vacuum valve 12 of the exhaust system 11 is kept open, and the pressure is reduced to the limit value of the vacuum pump 10. The vacuum pump 10 has a capability of reducing the pressure to about 7 Pa or less, which is an ideal pressure for vacuum drying. When the limit value is reached, this state is maintained for a predetermined time to perform low-pressure vacuum drying, and after the predetermined time has elapsed, the control device 50 opens the cleaning tank atmosphere release valve 18, that is, the limit of the vacuum pump 10. The value is released and returned to the atmosphere until the cleaning tank pressure sensor 51 detects 500 Pa below the lower explosion limit. That is, the pressure is restored. When 500 Pa is detected, the pressure-reducing state is maintained for a predetermined time to perform pressure-reducing vacuum drying, and then the cleaning tank atmosphere release valve 18 is closed again to reduce the pressure to the vacuum pump limit value.

このように乾燥工程中で復圧するのは、真空乾燥を行うと、被処理物2に付着した溶剤が気化するときに、気化熱を奪い、被処理物2の表面温度が低下し、この温度低下によって乾燥効率が低下するので、洗浄槽3の内部圧力を所定時間ごとに爆発下限界以下の500Paまで大気方向へと復圧して、復圧により蒸発が抑制、すなわち気化熱が奪われて冷却されることを一時的に抑制し、この間に被処理物2が保有する芯熱(内部の熱)を表面に呼び戻して表面温度を高め、この表面温度上昇後に、再び真空方向へと減圧することにより被処理物2の表面からの蒸発を促進させ、これにより総括的に乾燥効率を向上させるものである。   In this way, the pressure is restored during the drying process. When the vacuum drying is performed, when the solvent adhering to the object to be treated 2 is vaporized, the heat of vaporization is removed, and the surface temperature of the object to be treated 2 is lowered. Since the drying efficiency decreases due to the decrease, the internal pressure of the cleaning tank 3 is returned to the atmospheric pressure to 500 Pa below the lower explosion limit every predetermined time, and the evaporation is suppressed by the return pressure, that is, the heat of vaporization is taken away and cooled. Temporarily suppressing this, the core heat (internal heat) held by the workpiece 2 is recalled to the surface to increase the surface temperature, and after this surface temperature rises, the pressure is reduced again in the vacuum direction. Thus, the evaporation from the surface of the workpiece 2 is promoted, thereby improving the drying efficiency as a whole.

真空乾燥工程が完了したら、制御装置50が洗浄槽大気開放弁18を開放して、洗浄槽3の内部圧力を大気開放し、全工程の終了を報知する。そして、洗浄槽3の開閉蓋7を開放すれば、バスケット4と共に洗浄乾燥された複数の被処理物2を取り出すことができる。   When the vacuum drying process is completed, the control device 50 opens the cleaning tank atmosphere release valve 18 to release the internal pressure of the cleaning tank 3 to the atmosphere, and notifies the end of all processes. And if the opening-and-closing lid 7 of the washing tank 3 is opened, it is possible to take out a plurality of objects to be treated 2 that have been washed and dried together with the basket 4.

また、洗浄溶剤供給系14による溶剤タンク13から洗浄槽3への給液、排液系8による洗浄槽3から溶剤タンク13への排液、及び蒸気洗浄系29によるリザーブタンク23から洗浄槽3への溶剤蒸気の導入については、洗浄槽3と溶剤タンク13とに圧力差を与えて、あるいは洗浄槽3とリザーブタンク23とに圧力差を与えて、洗浄溶剤や溶剤蒸気の移送を行っている。したがって、駆動機器の重複使用を排除して洗浄装置1の装置コストを全体として低減することができる。   In addition, liquid supply from the solvent tank 13 to the cleaning tank 3 by the cleaning solvent supply system 14, drainage from the cleaning tank 3 to the solvent tank 13 by the drainage system 8, and from the reserve tank 23 to the cleaning tank 3 by the vapor cleaning system 29. As for the introduction of the solvent vapor, the pressure difference is given to the washing tank 3 and the solvent tank 13 or the pressure difference is given to the washing tank 3 and the reserve tank 23 to transfer the washing solvent and the solvent vapor. Yes. Accordingly, it is possible to reduce the apparatus cost of the cleaning apparatus 1 as a whole by eliminating redundant use of the driving equipment.

なお、前記実施形態においては単一の溶剤タンク13に洗浄溶剤を貯留したが、図4に示すように、最も清浄な洗浄溶剤を貯留するシャワータンク13aと、次に清浄な清浄溶剤を貯留する仕上げ洗いタンク13bと、汚れた洗浄溶剤を収容する洗浄タンク13cとを区画した溶剤タンク13を設け、蒸気洗浄工程ではシャワータンク13a内に貯留されている洗浄溶剤を噴出ノズル5から噴出させて超音波発生器3cを冷却するように構成してもよい。そして、洗浄槽3から回収した洗浄溶剤を洗浄タンク13cに収容し、この洗浄タンク13c内の洗浄溶剤を再生するようにしてもよい。この様にすると、回収した洗浄溶剤の温度が超音波発生器3cの冷却により昇温されているので、再生の際に加熱エネルギーの節約になり、省エネルギーとなり、熱効率を向上することができる。   In the embodiment, the cleaning solvent is stored in the single solvent tank 13, but as shown in FIG. 4, the shower tank 13a storing the cleanest cleaning solvent and the next clean cleaning solvent are stored. A solvent tank 13 is provided that divides the finish washing tank 13b and the washing tank 13c that stores the dirty washing solvent. In the steam washing process, the washing solvent stored in the shower tank 13a is ejected from the ejection nozzle 5 to be super You may comprise so that the sound wave generator 3c may be cooled. The cleaning solvent recovered from the cleaning tank 3 may be stored in the cleaning tank 13c, and the cleaning solvent in the cleaning tank 13c may be regenerated. In this way, since the temperature of the recovered cleaning solvent is raised by cooling the ultrasonic generator 3c, heating energy can be saved during regeneration, energy saving can be achieved, and thermal efficiency can be improved.

本発明に係る洗浄装置の系統構成を示す概略図である。It is the schematic which shows the system | strain structure of the washing | cleaning apparatus based on this invention. 制御装置の概略ブロック図である。It is a schematic block diagram of a control apparatus. 洗浄槽の内部を示す斜視図である。It is a perspective view which shows the inside of a washing tank. 3つのタンクを備えた溶剤タンクと洗浄槽の接続を示す概略図である。It is the schematic which shows the connection of the solvent tank provided with three tanks, and a washing tank.

符号の説明Explanation of symbols

1 洗浄装置
2 被処理物
3 洗浄槽
3a 底部
3c 超音波発生器
4 バスケット
5 噴出ノズル
5a 冷却弁
7 開閉蓋
8 排液系
9 排液弁
10 真空ポンプ
11 排気系
12 洗浄槽真空弁
13 溶剤タンク
13a ヒータ
14 浸漬洗浄系
14a 分岐した流路
15 洗浄溶剤供給弁
18 洗浄槽大気開放弁
19 分岐排気系
20 溶剤タンク減圧弁
21 溶剤タンク圧力計
22 溶剤タンク大気開放弁
23 リザーブタンク
24 再生処理系
25 蒸留器
26 コンデンサ
30 熱交換器
30a 加熱細管
31 蒸気洗浄補助弁
32 蒸気洗浄弁
50 制御装置
DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 2 To-be-processed object 3 Cleaning tank 3a Bottom part 3c Ultrasonic generator 4 Basket 5 Ejection nozzle 5a Cooling valve 7 Opening and closing cover 8 Drainage system 9 Drainage valve 10 Vacuum pump 11 Exhaust system 12 Cleaning tank vacuum valve 13 Solvent tank 13a heater 14 immersion cleaning system 14a branched flow path 15 cleaning solvent supply valve 18 cleaning tank air release valve 19 branch exhaust system 20 solvent tank pressure reducing valve 21 solvent tank pressure gauge 22 solvent tank air release valve 23 reserve tank 24 regeneration processing system 25 Distiller 26 Condenser 30 Heat exchanger 30a Heating capillary 31 Steam cleaning auxiliary valve 32 Steam cleaning valve 50 Control device

Claims (1)

被処理物を収容する洗浄槽と、該洗浄槽の内面に臨ませた状態で装着された超音波発生器と、洗浄槽内に洗浄溶剤を給液する洗浄溶剤供給系と、洗浄槽内の洗浄溶剤を排液する洗浄溶剤排液系と、洗浄槽内に洗浄溶剤の蒸気を導入する洗浄溶剤蒸気導入系と、を備え、制御装置の制御の下で、洗浄槽内に供給した洗浄溶剤に被処理物を浸漬して超音波振動を与えて洗浄する浸漬洗浄工程と、浸漬洗浄工程の後に洗浄槽内の洗浄溶剤を排液する排液工程と、排液工程の後に洗浄溶剤の蒸気を洗浄槽内に導入して被処理物を蒸気洗浄する蒸気洗浄工程とを行う洗浄装置であって、A cleaning tank for storing an object to be processed, an ultrasonic generator mounted in a state facing the inner surface of the cleaning tank, a cleaning solvent supply system for supplying a cleaning solvent into the cleaning tank, and a cleaning tank A cleaning solvent draining system for draining the cleaning solvent and a cleaning solvent vapor introducing system for introducing the cleaning solvent vapor into the cleaning tank, and the cleaning solvent supplied into the cleaning tank under the control of the control device An immersion cleaning process in which an object to be treated is immersed and cleaned by applying ultrasonic vibration; a draining process in which the cleaning solvent in the cleaning tank is drained after the immersion cleaning process; and a cleaning solvent vapor after the draining process. A cleaning apparatus for performing a steam cleaning process for steam cleaning the object to be processed by introducing the liquid into the cleaning tank,
上記超音波発生器は洗浄槽の傾斜した底部に配設され、該超音波発生器よりも傾斜上端側の底部に洗浄溶剤供給系の噴出ノズルを配置し、底部の傾斜下端に洗浄溶剤排液系の排液口を開口し、噴出ノズルから噴出した洗浄溶剤が底部を流れる途中で超音波発生器を冷却し、底部の傾斜下端まで流下した洗浄溶剤を排液口から洗浄槽の外部に排出するようにし、  The ultrasonic generator is disposed at the inclined bottom of the cleaning tank, the cleaning solvent supply system ejection nozzle is disposed at the bottom of the inclined upper end side of the ultrasonic generator, and the cleaning solvent drainage is provided at the inclined lower end of the bottom. The drainage port of the system is opened, the ultrasonic generator is cooled while the cleaning solvent ejected from the ejection nozzle flows through the bottom, and the cleaning solvent that has flowed down to the bottom inclined bottom is discharged from the drainage port to the outside of the cleaning tank. Like
上記制御装置は、蒸気洗浄工程において、上記洗浄溶剤供給系を作動して洗浄槽内に供給した洗浄溶剤を超音波発生器に流して冷却しつつ洗浄溶剤蒸気導入系を作動して洗浄槽内に洗浄溶剤の蒸気を導入して被処理物を蒸気洗浄することを特徴とする洗浄装置。  In the vapor cleaning process, the control device operates the cleaning solvent vapor introduction system while operating the cleaning solvent supply system and supplying the cleaning solvent supplied into the cleaning tank to the ultrasonic generator for cooling. A cleaning apparatus characterized by introducing a cleaning solvent vapor to the object to be cleaned with steam.
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