JP4895065B2 - Epoxy resin composition and cured product thereof - Google Patents
Epoxy resin composition and cured product thereof Download PDFInfo
- Publication number
- JP4895065B2 JP4895065B2 JP2001197999A JP2001197999A JP4895065B2 JP 4895065 B2 JP4895065 B2 JP 4895065B2 JP 2001197999 A JP2001197999 A JP 2001197999A JP 2001197999 A JP2001197999 A JP 2001197999A JP 4895065 B2 JP4895065 B2 JP 4895065B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- weight
- acid
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 50
- 229920000647 polyepoxide Polymers 0.000 title claims description 50
- 239000000203 mixture Substances 0.000 title claims description 34
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 34
- 239000002904 solvent Substances 0.000 claims description 34
- 235000013824 polyphenols Nutrition 0.000 claims description 32
- 229920005989 resin Polymers 0.000 claims description 29
- 239000011347 resin Substances 0.000 claims description 29
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 27
- 239000004760 aramid Substances 0.000 claims description 17
- 229920003235 aromatic polyamide Polymers 0.000 claims description 17
- 150000008442 polyphenolic compounds Chemical class 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 239000002966 varnish Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000011888 foil Substances 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 20
- 239000000047 product Substances 0.000 description 19
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000006482 condensation reaction Methods 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 229910052801 chlorine Inorganic materials 0.000 description 12
- 238000005406 washing Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- -1 amine compounds Chemical class 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- 229920000459 Nitrile rubber Polymers 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 5
- 239000003377 acid catalyst Substances 0.000 description 5
- 150000004984 aromatic diamines Chemical class 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- QNVNLUSHGRBCLO-UHFFFAOYSA-N 5-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(O)=CC(C(O)=O)=C1 QNVNLUSHGRBCLO-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229920001400 block copolymer Polymers 0.000 description 4
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- CDOWNLMZVKJRSC-UHFFFAOYSA-N 2-hydroxyterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(O)=C1 CDOWNLMZVKJRSC-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- BCEQKAQCUWUNML-UHFFFAOYSA-N 4-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(O)C(C(O)=O)=C1 BCEQKAQCUWUNML-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000005001 aminoaryl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000001463 antimony compounds Chemical class 0.000 description 2
- 239000003849 aromatic solvent Substances 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- VKCYHJWLYTUGCC-UHFFFAOYSA-N nonan-2-one Chemical compound CCCCCCCC(C)=O VKCYHJWLYTUGCC-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- IITXQNWTFNSHRU-UHFFFAOYSA-N 1-hydroxycyclohexa-3,5-diene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC(O)(C(O)=O)C1 IITXQNWTFNSHRU-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- CZAZXHQSSWRBHT-UHFFFAOYSA-N 2-(2-hydroxyphenyl)-3,4,5,6-tetramethylphenol Chemical compound OC1=C(C)C(C)=C(C)C(C)=C1C1=CC=CC=C1O CZAZXHQSSWRBHT-UHFFFAOYSA-N 0.000 description 1
- NKGDIYDBPVBXBW-UHFFFAOYSA-N 2-[(2-carboxyphenyl)methyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1CC1=CC=CC=C1C(O)=O NKGDIYDBPVBXBW-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- UHIDYCYNRPVZCK-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C=1C=C(O)C(N)=CC=1C(C)(C)C1=CC=C(O)C(N)=C1 UHIDYCYNRPVZCK-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- WVDGHGISNBRCAO-UHFFFAOYSA-N 2-hydroxyisophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1O WVDGHGISNBRCAO-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- WFNVGXBEWXBZPL-UHFFFAOYSA-N 3,5-diaminophenol Chemical compound NC1=CC(N)=CC(O)=C1 WFNVGXBEWXBZPL-UHFFFAOYSA-N 0.000 description 1
- LRIJABIIRVPYBD-UHFFFAOYSA-N 3-(2-propylphenoxy)aniline Chemical compound CCCC1=CC=CC=C1OC1=CC=CC(N)=C1 LRIJABIIRVPYBD-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- HVEAQFIZKONJJG-UHFFFAOYSA-N 3-(3-carboxybenzoyl)benzoic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=C(C=CC=2)C(O)=O)=C1 HVEAQFIZKONJJG-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- IPWGAPCYYMTTLT-UHFFFAOYSA-N 3-propylaniline Chemical compound CCCC1=CC=CC(N)=C1 IPWGAPCYYMTTLT-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- DPYROBMRMXHROQ-UHFFFAOYSA-N 4,6-diaminobenzene-1,3-diol Chemical compound NC1=CC(N)=C(O)C=C1O DPYROBMRMXHROQ-UHFFFAOYSA-N 0.000 description 1
- MITHMOYLTXMLRB-UHFFFAOYSA-N 4-(4-aminophenyl)sulfinylaniline Chemical compound C1=CC(N)=CC=C1S(=O)C1=CC=C(N)C=C1 MITHMOYLTXMLRB-UHFFFAOYSA-N 0.000 description 1
- LFEWXDOYPCWFHR-UHFFFAOYSA-N 4-(4-carboxybenzoyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C=C1 LFEWXDOYPCWFHR-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- FJXIPWRKSXGKSY-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfanylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1SC1=CC=C(C(O)=O)C=C1 FJXIPWRKSXGKSY-UHFFFAOYSA-N 0.000 description 1
- SQJQLYOMPSJVQS-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfonylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C=C1 SQJQLYOMPSJVQS-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- LMQUUAKBJYIBFE-UHFFFAOYSA-N 4-[(4-amino-3,5-dipropylphenyl)methyl]-2,6-dipropylaniline Chemical compound CCCC1=C(N)C(CCC)=CC(CC=2C=C(CCC)C(N)=C(CCC)C=2)=C1 LMQUUAKBJYIBFE-UHFFFAOYSA-N 0.000 description 1
- CBEVWPCAHIAUOD-UHFFFAOYSA-N 4-[(4-amino-3-ethylphenyl)methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=CC=2)=C1 CBEVWPCAHIAUOD-UHFFFAOYSA-N 0.000 description 1
- NZLCYYXBMHMASW-UHFFFAOYSA-N 4-[(4-amino-3-propylphenyl)methyl]-2-propylaniline Chemical compound C1=C(N)C(CCC)=CC(CC=2C=C(CCC)C(N)=CC=2)=C1 NZLCYYXBMHMASW-UHFFFAOYSA-N 0.000 description 1
- VTDMBRAUHKUOON-UHFFFAOYSA-N 4-[(4-carboxyphenyl)methyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C=C1 VTDMBRAUHKUOON-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- NUXMNYLOPKHECO-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenoxy)phenyl]phenyl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC=C1C1=CC=CC(C=2C(=CC=CC=2)OC=2C=CC(N)=CC=2)=C1 NUXMNYLOPKHECO-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229920013646 Hycar Polymers 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- MYMCSQDRHUQQDW-UHFFFAOYSA-N bis(4-amino-3-methylphenyl)methanone Chemical compound C1=C(N)C(C)=CC(C(=O)C=2C=C(C)C(N)=CC=2)=C1 MYMCSQDRHUQQDW-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
Description
【0001】
【発明の属する技術分野】
本発明はハロゲン系難燃剤やアンチモン化合物を含有しなくても難燃性及び耐熱性に優れる硬化物を与え、しかもフィルム状に形成した場合、十分なフレキシビリティーを有するエポキシ樹脂組成物およびその硬化物に関する。
【0002】
【従来の技術】
エポキシ樹脂は種々の硬化剤で硬化させることにより、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。従来、最も一般的に使用されてきたエポキシ樹脂としてはビスフェノールA型エポキシ樹脂が挙げられる。その他難燃剤としてはテトラブロモビスフェノールA及びそのエポキシ化物、或いはテトラブロモビスフェノールAにビスフェノールA型エポキシ樹脂を反応させた化合物などが一般的に知られている。またエポキシ樹脂の硬化剤としては酸無水物やアミン系化合物が知られているが電気・電子部品分野では耐熱性などの信頼性の面からフェノールノボラックが使用されることが多い。
【0003】
【発明が解決しようとする課題】
しかしながら、前記したような臭素を含有する化合物は、難燃性には優れているものの廃棄、焼却時に環境汚染の原因となる物質を発生させる可能性がある点が指摘されている。また難燃性助剤として使用されるアンチモン化合物も同様にその毒性が懸念されている。近年の環境保護意識の高まりからエポキシ樹脂組成物においてもハロゲンフリー、アンチモンフリーの要望が高まっている。また、フェノールノボラックによるエポキシ樹脂の硬化物は信頼性には優れているものの、その硬化物は剛直でフレキシビリティーに欠ける。近年の電気・電子部品の形態は従来の大型パッケージやガラス繊維を基材とした基板だけではなく、ポリイミドやPET(ポリエチレングリコールテレフタレート)フィルム、金属箔上にワニスの状態で塗布した後、溶剤を除去するシート状の成形物が開発されている。この様な場合使用される樹脂には十分なフレキシビリティーが要求される。また、電気・電子部品の信頼性という面からは硬化物の耐熱性が要求されている。
【0004】
【課題を解決するための手段】
本発明者らはこうした実状に鑑み、難燃性、耐熱性に優れた硬化物を与え、シート状に成形しても十分なフレキシビリティーを有するエポキシ樹脂組成物を求めて鋭意研究した結果、本発明を完成させるに到った。
【0005】
すなわち本発明は
【0006】
(1)(a)エポキシ樹脂、
(b)下記式(1)
【0007】
【化3】
【0008】
(式中、pは平均重合度であって5〜15の正数を表す。)
で表されGPCによる重量平均分子量が3000以上であるポリフェノール樹脂及び(c)フェノール性水酸基含有芳香族ポリアミド樹脂を必須成分として含有するエポキシ樹脂組成物。
(2)フェノール性水酸基含有芳香族ポリアミド樹脂が下記式(2)
【0009】
【化4】
【0010】
(式中、x、y、z、l、m及びnは、それぞれ平均重合度であって、x=3〜7、y=1〜4、z=5〜15、l+m=2〜200の正数を示し、m/(m+l)≧0.04である。)で表される上記(1)記載のエポキシ樹脂組成物、
(3)硬化促進剤を含有する上記(1)または(2)に記載のエポキシ樹脂組成物、
(4)上記(1)または(3)に記載のエポキシ樹脂組成物を溶剤に溶解してなるワニス、
(5)平面状支持体の両面または片面に上記(1)乃至(4)のいずれか1項に記載の組成物の層を有するシート、
(6)平面状支持体がポリイミドフィルムである上記(5)に記載のシート、
(7)平面状支持体が金属箔である上記(5)に記載のシート、
(6)平面状支持体が剥離フィルムである上記(5)に記載のシート、
(7)上記(1)乃至(8)のいずれか1項に記載のエポキシ樹脂組成物を硬化してなる硬化物
を提供するものである。
【0011】
【発明の実施の形態】
前記式(1)で表される構造を有し、GPC(ゲルパーミエーションクロマトグラフィー)による重量平均分子量が3000以上であるポリフェノール樹脂の製造方法は特に限定はされない。例えば下記式(3)
【0012】
【化5】
【0013】
(式中、Xは塩素原子、メトキシ基または水酸基を表す。)
で表される化合物1モルに対しフェノールを通常1.5〜10モル、好ましくは2〜8モルの割合で縮合反応(1段目縮合反応)させた後、未反応のフェノールを除去し、得られた化合物のフェノール性水酸基1当量に対して、前記式(3)におけるXが塩素原子である化合物を、水に対する溶解性が低い沸点が100℃以上の溶剤の存在下で0.01〜0.45モル、好ましくは0.05〜0.4モルの割合で縮合反応(2段目縮合反応)させ、反応終了後、系内の温度を70〜100℃に下げた後、系中に水を加え撹拌下で、溶剤中に残存する塩酸を水側に溶解せしめた後、再度100℃以上に加熱し塩酸を含む水を系外に留去することにより得ることができる。また、上記のような2段階反応ではなく、始めから前記式(3)で表される化合物1モルに対してフェノールを1.01〜1.5モル、好ましくは1.02〜1.45モル縮合反応させ反応が終了した後、過剰のフェノールを加えて反応液の粘度を下げ、水を加えて水洗を行い酸触媒を除去した後、油層からフェノールを除去することにより得ることも出来る。
【0014】
2段階反応により本発明におけるポリフェノール樹脂を得る場合、1段目の縮合反応において、Xが塩素の場合は触媒は特に必要ではないが、メトキシ基又は、水酸基の場合は酸触媒を用いる。用い得る酸触媒としては塩酸、硫酸、パラトルエンスルホン酸などが挙げられるが、特にパラトルエンスルホン酸が好ましい。酸触媒の使用量としては前記式(3)で表される化合物1モルに対し通常0.001〜0.1重量部、好ましくは0.005〜0.05重量部である。
【0015】
1段目の縮合反応は無溶剤下でも溶剤の存在下でも行うことが出来る。溶剤を使用する場合、用い得る溶剤としてはメタノール、エタノール、イソプロパノール、メチルエチルケトン、メチルイソブチルケトン等が挙げられる。溶剤の使用量としては前記式(3)で表される化合物とフェノールの合計重量に対して通常10〜300重量%、好ましくは20〜250重量%である。
【0016】
1段目の縮合反応は前記式(3)で表される化合物が完全に消失するまで行う。反応温度としては通常40〜150℃、反応時間としては通常1〜10時間である。
【0017】
縮合反応終了後、中和、水洗などにより酸触媒を除去し、次いで加熱減圧下で溶剤及び未反応のフェノールを除去する。
【0018】
こうして得られた縮合物は、ビフェニル分子とフェノール分子がメチレン結合を介して結合した構造を取り、その重量平均分子量は通常500〜1500となり、平均分子量によって異なり一概には言えないがその軟化点は通常50〜100℃程度となる。
次いで得られた縮合物と前記式(3)で表されXが塩素原子である化合物とを反応させ2段目の縮合反応を行う。
【0019】
2段目の縮合反応は生成物の分子量が大きくなるにつれ粘度も上昇するため溶剤を使用する。用い得る溶剤としては沸点が100℃以上、好ましくは100〜200℃で酸に対して不活性であり水との親和性が低く比重が水より小さいものが好ましい。具体的な例としてはプロピレングリコールモノメチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル等が挙げられる。溶剤は、生成物の重量に対して通常2〜200重量%、好ましくは3〜150重量%となるよう予め反応系に添加するか、適宜反応中に分割して添加する。
【0020】
反応は前記式(3)で表される化合物が完全に消失するまで行う。反応温度としては通常100〜180℃、反応時間としては通常1〜20時間である。
【0021】
尚、1段目、2段目の縮合反応とも式(3)のXが塩素原子である化合物を使用した場合、反応器の一方から窒素を吹き込み、他方から副反応物として生成する塩酸ガスをチューブなどで取り出す。取り出された塩酸は水酸化ナトリウム水溶液などのアルカリ性水溶液中にバブリングしてトラップすることが好ましい。
【0022】
反応終了後、70〜100℃まで冷却を行う。この温度範囲において粘度が上昇し、撹拌が困難な場合は上記の溶剤の量を調節する。具体的な溶剤の量としては生成物の重量に対して10〜150重量%、好ましくは15〜100重量%である。
【0023】
系内を70〜100℃に保ち、撹拌下で温水を加える。温水の量としては生成物の重量に対し通常10〜300重量%であり、好ましくは20〜200重量%である。充分撹拌を行った後、100℃から溶剤の沸点まで昇温し分流管を用いて塩酸を含んだ水を系外に除去する。共沸により溶剤も同時に流出するが、分流管を用いて分液し、溶剤は系中に戻す。
【0024】
留去された水が中性に近くなるまで、上記の水洗工程を繰り返す。通常、必要な水洗回数は2〜10回である。水洗終了後、更に上記の溶剤か或いは別の溶剤を加えて常温での取り扱いが容易な溶液粘度に調節することも可能である。用いられる溶剤としては、例えばγ−ブチロラクトン類、N−メチルピロリドン(NMP)、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N,N−ジメチルイミダゾリジノン等のアミド系溶剤、テトラメチレンスルフォン等のスルフォン類、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコール、プロピレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテルモノアセテート、プロピレングリコールモノブチルエーテル等のエーテル系溶剤、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン等のケトン系溶剤、トルエン、キシレンなどの芳香族系溶剤が挙げられる。溶媒は、得られた溶液中の固形分濃度が通常10〜80重量%、好ましくは20〜70重量%となる範囲で使用する。こうして得られた溶液は、(a)及び(c)成分を加えてそのままワニスとして使用することができる。
である。
【0025】
また、1段のみの縮合反応で平均重量分子量が3000以上のポリフェノール樹脂を調製した場合も上記と同様の溶剤を用いてワニス化することが出来る。
【0026】
本発明で用いられるフェノール性水酸基含有芳香族ポリアミド樹脂は、ポリマー構造中にフェノール性水酸基を持つ芳香族ポリアミド樹脂で有れば良く、特に限定されない。フェノール性水酸基含有芳香族ポリアミド樹脂の合成方法については、例えば特開平8−143661号公報等に記載されている、水酸基を有する芳香族ジアミン及び/または芳香族ジカルボン酸を混入させて、芳香族ジアミン成分と芳香族ジカルボン酸成分との縮重合を行うことにより製造することが出来る。
【0027】
さらに、可撓性、柔軟性、接着性を向上させるために、フェノール性水酸基含有芳香族ポリアミド樹脂として、アミノアリール基を両末端とするフェノール性水酸基含有芳香族ポリアミド樹脂と両末端基にカルボキシル基を有するポリ(ブタジエン−アクリロニトリル)共重合体を反応させて得られるブロック共重合体を用いることが好ましい。
ポリアミド樹脂の両末端基をアミノアリール基にするには、芳香族ジアミン成分を芳香族ジカルボン酸成分より過剰量で縮重合反応することにより、容易に達成することが出来る。
この重縮合は例えば特開平6−299133号公報等に記載されている、従来の公知の方法で行うことができる。
本発明において好ましいのは式(2)の構造で表されるブロック共重合体である。
【0028】
【化6】
【0029】
(式中、x、y、z、l、m及びnは、それぞれ平均重合度であって、x=3〜7、y=1〜4、z=5〜15、l+m=2〜200の正数を示し、m/(m+l)≧0.04である。)
【0030】
フェノール性水酸基含有芳香族ポリアミド樹脂を製造するために使用する芳香族ジアミンとしては、例えばm−フェニレンジアミン、p−フェニレンジアミン、m−トリレンジアミン、4,4’−ジアミノジフェニルエーテル、3,3’−ジメチル−4,4’−ジアミノジフェニルエーテル、3,4’−ジアミノジフェニルエーテル、4,4’−ジアミノジフェニルチオエーテル、3,3’−ジメチル−4,4’−ジアミノジフェニルチオエーテル、3,3’−ジエトキシ−4,4’−ジアミノジフェニルチオエーテル、3,3’−ジアミノジフェニルチオエーテル、4,4’−ジアミノベンゾフェノン、3,3’−ジメチル−4,4’−ジアミノベンゾフェノン、3,3’−ジアミノジフェニルメタン、4,4’−ジアミノジフェニルメタン、3,3’−ジメトキシ−4,4’−ジアミノジフェニルチオエーテル、2,2’−ビス(3−アミノフェニル)プロパン、2,2’−ビス(4−アミノフェニル)プロパン、4,4’−ジアミノジフェニルスルフォキサイド、4,4’−ジアミノジフェニルスルフォン、ベンチジン、3,3’−ジメチルベンチジン、3,3’−ジメトキシベンチジン、3,3’−ジアミノビフェニル、p−キシリレンジアミン、m−キシリレンジアミン、o−キシリレンジアミン、2,2’−ビス(3−アミノフェノキシフェニル)プロパン、2,2’−ビス(4−アミノフェノキシフェニル)プロパン、1,3−ビス(4−アミノフェノキシフェニル)ベンゼン、1,3’−ビス(3−アミノフェノキシフ)プロパン、ビス(4−アミノ−3−メチルフェニル)メタン、ビス(4−アミノ−3,5−ジメチルフェニル)メタン、ビス(4−アミノ−3−エチルフェニル)メタン、ビス(4−アミノ−3,5−ジエチルフェニル)メタン、ビス(4−アミノ−3−プロピルフェニル)メタン、ビス(4−アミノ−3,5−ジプロピルフェニル)メタン等があるがこれらに限定されるものではない。これらは1種又は2種以上混合して用いても良い。
フェノール性水酸基含有芳香族ポリアミド樹脂を製造するために使用するジカルボン酸類としては、例えばフタル酸、イソフタル酸、テレフタル酸、4,4’−オキシ二安息香酸、4,4’−ビフェニルジカルボン酸、3,3’−、メチレン二安息香酸、4,4’−メチレン二安息香酸、4,4’−チオ二安息香酸、3,3’−カルボニル二安息香酸、4,4’−カルボニル二安息香酸、4,4’−スルフォニル二安息香酸、1,5−ナフタレンジカルボン酸、1,4−ナフタレンジカルボン酸、2,6−ナフタレンジカルボン酸、1,2−ナフタレンジカルボン酸等があるがこれらに限定されるものではない。
【0031】
更に、芳香族ポリアミド樹脂にフェノール性水酸基を導入するために使用する水酸基含有芳香族ジカルボン酸又は水酸基含有芳香族ジアミンとしては、5−ヒドロキシイソフタル酸、4−ヒドロキシイソフタル酸、2−ヒドロキシイソフタル酸、3−ヒドロキシイソフタル酸、2−ヒドロキシテレフタル酸、3,3’−ジヒドロキシ−4,4’−ジアニリン、2,2−ビス(3’−アミノ−4−ヒドロキシフェニル)プロパン、2,4−ジヒドロキシ−1,5−ジアミノベンゼン、5−ヒドロキシ−1,3−ジアミノベンゼン等を使用することが出来る。しかし、本発明ではこれらに限定されるものではない。
【0032】
本発明のエポキシ樹脂組成物において(c)成分であるフェノール性水酸基含有芳香族ポリアミド樹脂の占める割合は(b)成分であるポリフェノール樹脂に対して通常1〜50重量%であり、より好ましくは2〜40重量%である。
【0033】
本発明のエポキシ樹脂組成物に用い得るエポキシ樹脂としては1分子中にエポキシ基を2個以上有するものであれば特に制限はない。具体的にはノボラック型エポキシ樹脂、ジシクロペンタジエンフェノール縮合型エポキシ樹脂、キシリレン骨格含有フェノールノボラック型エポキシ樹脂、ビフェニル骨格含有ノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、テトラメチルビフェノール型エポキシ樹脂などが挙げられるがこれらに限定されるものではない。 これらのエポキシ樹脂は2種以上を併用することも出来る。
【0034】
本発明のエポキシ樹脂組成物において硬化剤としては、式(1)で表されるポリフェノール樹脂以外に他の硬化剤を併用しても良い。併用し得る硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、フェノ−ルノボラック、トリフェニルメタン及びこれらの変性物、イミダゾ−ル、BF3 −アミン錯体、グアニジン誘導体などが挙げられるがこれらに限定されるものではない。これらを併用する場合、式(1)で表されるポリフェノール樹脂が全硬化剤中に占める割合としては通常20重量%以上、好ましくは30重量%以上である。
【0035】
本発明のエポキシ樹脂組成物において硬化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対して0.7〜1.2当量が好ましい。エポキシ基1当量に対して、0.7当量に満たない場合、あるいは1.2当量を超える場合、いずれも硬化が不完全となり良好な硬化物性が得られない恐れがある。
【0036】
また上記硬化剤を用いる際に硬化促進剤を併用しても差し支えない。用いうる硬化促進剤の具体例としては例えば2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾ−ル類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズ等の金属化合物等が挙げられる。硬化促進剤はエポキシ樹脂100重量部に対して0.1〜5.0重量部が必要に応じ用いられる。
【0037】
本発明のエポキシ樹脂組成物は必要により無機充填材を含有する。用いうる無機充填材の具体例としてはシリカ、アルミナ、タルク等が挙げられる。無機充填材は本発明のエポキシ樹脂組成物中において0〜90重量%を占める量が用いられる。更に本発明のエポキシ樹脂組成物には、シランカップリング剤、ステアリン酸、パルミチン酸、ステアリン酸亜鉛、ステアリン酸カルシウム等の離型剤、顔料等の種々の配合剤を添加することができる。
【0038】
本発明のエポキシ樹脂組成物のワニスは、上記に説明したエポキシ樹脂、硬化剤、フェノール性水酸基含有芳香族ポリアミド樹脂を溶剤に溶解して得られる。用いられる溶剤としては、例えばγ−ブチロラクトン類、N−メチルピロリドン(NMP)、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N,N−ジメチルイミダゾリジノン等のアミド系溶剤、テトラメチレンスルフォン等のスルフォン類、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルモノアセテート、プロピレングリコールモノブチルエーテル等のエーテル系溶剤、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン等のケトン系溶剤、トルエン、キシレンなどの芳香族系溶剤が挙げられる。得られたワニス中の固形分濃度は通常10〜80重量%、好ましくは20〜70重量%である。
【0039】
本発明のエポキシ樹脂組成物を用いたシートは上記のワニスをそれ自体公知のグラビアコート法、スクリーン印刷、メタルマスク法、スピンコート法などの各種塗工方法により平面状支持体上に乾燥後の厚さが所定の厚さ、例えば5〜100μmになるように塗布後乾燥して得られるが、どの塗工法を用いるかは基材の種類、形状、大きさ、塗膜の膜厚により適宜選択される。基材としては、例えばポリアミド、ポリアミドイミド、ポリアリレート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルケトン、ポリケトン、ポリエチレン、ポリプロピレン等の各種高分子及び/またはその共重合体から作られるフィルム、或いは銅箔等の金属箔であり、特に好ましくは、ポリイミド又は金属箔である。また更に加熱することによりシート状の硬化物を得ることが出来る。
【0040】
また本発明のエポキシ樹脂組成物をトルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン等の溶剤に溶解させ、ガラス繊維、カ−ボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維、紙などの基材に含浸させ加熱乾燥して得たプリプレグを熱プレス成形して硬化物を得ることもできる。この際の溶剤は、本発明のエポキシ樹脂組成物と該溶剤の混合物中で通常10〜70重量%、好ましくは15〜70重量%を占める量を用いる。
【0041】
【実施例】
次に本発明を更に実施例、比較例により具体的に説明するが、以下において部は特に断わりのない限り重量部である。またGPCの測定条件は以下の通りである。
【0042】
合成例1
重量平均分子量が3000以上であるポリフェノール樹脂の合成
温度計、冷却管、撹拌器を取り付けたフラスコに窒素ガスパージを施しながら下記式(4)
【0043】
【化7】
【0044】
で表される化合物121部、フェノール188部を仕込み撹拌下で130℃まで昇温し、溶解させた。次いでパラトルエンスルホン酸0.5部を添加し、その後、生成するメタノールを分留管を用いて系外に除去しながら時間反応を行った。反応終了後メチルイソブチルケトン260部を加え3回水洗を行った後、油層からエバポレーターを用いて加熱減圧下、メチルイソブチルケトン及び未反応のフェノールを除去することにより化合物(A)168部を得た。得られた化合物(A)の軟化点は70℃、150℃における溶融粘度は0.8Pa・s、水酸基当量は203g/eqであった。またGPCを用いて重量平均分子量を測定したところ960であった。
【0045】
温度計、分留管、冷却管、撹拌器、冷却管の先端に容器内に発生した塩酸ガスを系外に追い出せるようシリコンチューブを取り付けたフラスコに窒素ガスパージを施しながら、得られた化合物(A)101.5部、下記式(5)
【0046】
【化8】
【0047】
で表される化合物31.4部、プロピレングリコールモノブチルエーテル12.4部を仕込んだ。次いで、撹拌下で165℃まで昇温させ還流下で脱塩酸反応を行った。発生した塩酸ガスはシリコンチューブを通じて系外に除去した。GPC分析により反応を追跡し式(5)で表される化合物が反応開始後3時間で完全に消失したことを確認した後、更に3時間撹拌を続け反応を終了させた。系内の温度を140℃まで冷却したところでプロピレングリコールモノブチルエーテル37.1部を更に追加し溶液粘度を下げた。系内の温度を90℃まで冷却し70℃の温水を60部加え、90℃で30分撹拌した。その後165℃まで昇温し、共沸脱水により塩酸を含む水とプロピレングリコールモノブチルエーテルの一部を系外に留去した。更に分留管を用いて分液を行い塩酸を含む水は除去しプロピレングリコールモノブチルエーテルは系内に戻した。その後、同様に系内の温度を90℃まで下げ、70℃の温水60部を再び加えて水洗を行った。この水洗工程を4回行った。各水洗工程において留去された水中の塩素量を硝酸銀滴定により測定したところ、表1のような結果となった。
【0048】
表1
水洗回数 水洗水中の塩素量(ppm)
1回目 1420
2回目 230
3回目 130
4回目 40
【0049】
4回目の水洗を行った後、系中の温度を80℃まで下げ、シクロペンタノン62部を加えて希釈し前記式(1)で表されるポリフェノール樹脂の溶液232.7部を得た。得られた式(1)で表される化合物はGPCを用いて重量平均分子量を測定したところ12800であった。また、水酸基当量は245g/eqであった。この溶液中に含まれる全塩素量と溶剤を蒸発させた固形分中の塩素量とを試料燃焼装置及びイオンクロマトグラフィーを用いて測定した。その結果溶液中に含まれる全塩素量は90ppm、固形分中に含まれる全塩素量は140ppmであった。この結果から換算すると溶液の溶剤中に含まれる塩素量は20ppmと計算される。
【0050】
合成例2
フェノール性水酸基含有芳香族ポリアミド−ポリ(ブタジエン−アクリロニトリル)ブロック共重合体(式(2)で示される共重合体の一例、以下BPAM)の合成
イソフタル酸19.93g(120ミリモル)、3,4’−ジアミノジフェニルエーテル30.63g(153ミリモル)、5−ヒドロキシイソフタル酸3.64g(20ミリモル)、塩化リチウム3.9g、塩化カルシウム12.1g、N−メチル−2−ピロリドン240ml、ピリジン54mlを1リットルの4ツ口丸底フラスコの中に入れ、攪拌溶解させた後、亜リン酸トリフェニル74gを加えて、90℃で4時間反応させて、フェノール性水酸基含有芳香族ポリアミドオリゴマー体を生成させた。これに両末端にカルボキシル基を持つポリ(ブタジエンアクリロニトリル)共重合体(Hycar CTBN、BF Goodrich 製。ポリ(ブタジエン−アクリロニトリル)部に含有するアクリロニトリル成分が17モル%で、分子量が約3600)48gを240mlのN−メチル−2−ピロリドンに溶解した液を加えて、更に4時間反応させた後、室温に冷却、この反応液をメタノール20リットルに投入して本発明に使用するポリ(ブタジエンアクリロニトリル)共重合体部の含有量が50重量%であり、フェノール性水酸基を約14モル%含有する芳香族ポリアミド−ポリ(ブタジエン−アクリロニトリル)ブロック共重合体を析出させた。この析出ポリマーを更にメタノールで洗浄とメタノール還流して精製した。このポリマーの固有粘度は0.85dl/g(ジメチルアセトアミド、30℃)であった。ポリマー粉末を拡散反射法により赤外スペクトルを測定したところ、1674cm-1にアミドカルボニル基を、2856−2975cm-1にブタジエン部分のC−H結合に基づく吸収を、2245cm-1にニトリル基に基づく吸収を認めた。
【0051】
実施例1
合成例1で得られたポリフェノール樹脂の溶液232.7部に合成例2で得られたフェノール性水酸基含有芳香族ポリアミド樹脂12.3部を添加し、完溶させ前記式(1)で表されるポリフェノール樹脂が50重量%、前記式(2)で表されるフェノール性水酸基含有芳香族ポリアミド樹脂が5重量%の溶液を調製した。この溶液100部に対しエポキシ樹脂として下記式(5)
【0052】
【化9】
【0053】
で表される化合物NC−3000P(日本化薬株式会社製、エポキシ当量270g/eq、軟化点58℃、q=2.5(平均値))を55部、硬化促進剤としてトリフェニルホスフィン(TPP)0.55部を加えて本発明のワニスを得た。この様にして得たワニスをアプリケータを用いて、乾燥後の厚さが25μmになるようにポリイミドに塗布した。この試験片を150℃で3時間加熱することにより硬化物を得た。
得られたポリイミド上の硬化物はポリイミドを丸めてもひび割れすることが無く、十分なフィルム形成能を有していた。この硬化物をUL94−VTMに従って難燃性の試験を行ったところ、VTM−0をクリアすることが確認された。
【0054】
実施例2
本発明のワニスをPETフィルム上に乾燥後の厚さが100μになるように塗布し150℃で5分間加熱して溶剤を除去したところ、Bステージ状態において折り曲げてもひび割れることはなかった。これを更に150℃で3時間加熱することにより硬化せしめ、PETフィルムを除去してDMA(Differential Mechanical Analysis)によりガラス転移温度を測定したところ160℃であった。
【0055】
【発明の効果】
本発明のエポキシ樹脂組成物は、薄膜状に成形した場合、従来一般的に使用されてきたエポキシ樹脂組成物と比較して、Bステージ状態でも、硬化物でも十分なフレキシビリティーを有し、しかもその硬化物は難燃性、耐熱性に優れているため、成形材料、注型材料、積層材料、塗料、接着剤、レジストなどの広範囲の用途にきわめて有用である。[0001]
BACKGROUND OF THE INVENTION
The present invention provides a cured product excellent in flame retardancy and heat resistance without containing a halogen-based flame retardant or antimony compound, and when formed into a film, an epoxy resin composition having sufficient flexibility and its It relates to a cured product.
[0002]
[Prior art]
Epoxy resins are generally cured with various curing agents, resulting in cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., adhesives, paints, laminates, moldings It is used in a wide range of fields such as materials and casting materials. Conventionally, the most commonly used epoxy resin includes bisphenol A type epoxy resin. As other flame retardants, tetrabromobisphenol A and its epoxidized product, or a compound obtained by reacting tetrabromobisphenol A with a bisphenol A type epoxy resin are generally known. Further, acid anhydrides and amine compounds are known as curing agents for epoxy resins, but phenol novolac is often used from the viewpoint of reliability such as heat resistance in the field of electric and electronic parts.
[0003]
[Problems to be solved by the invention]
However, it has been pointed out that a compound containing bromine as described above is excellent in flame retardancy, but may generate substances that cause environmental pollution during disposal and incineration. Similarly, antimony compounds used as flame retardant aids are also concerned about toxicity. Due to the recent increase in environmental protection awareness, there is an increasing demand for halogen-free and antimony-free epoxy resin compositions. In addition, a cured product of epoxy resin with phenol novolac is excellent in reliability, but the cured product is rigid and lacks flexibility. In recent years, electrical and electronic components are not only used for conventional large packages and glass fiber-based substrates, but are also applied to varnish on polyimide, PET (polyethylene glycol terephthalate) films, and metal foils. Sheet-like moldings to be removed have been developed. In such a case, the resin used is required to have sufficient flexibility. Moreover, the heat resistance of hardened | cured material is requested | required from the surface of the reliability of an electrical / electronic component.
[0004]
[Means for Solving the Problems]
In light of these circumstances, the present inventors gave a cured product excellent in flame retardancy and heat resistance, and as a result of earnest research for an epoxy resin composition having sufficient flexibility even when molded into a sheet, The present invention has been completed.
[0005]
That is, the present invention
[0006]
(1) (a) epoxy resin,
(B) The following formula (1)
[0007]
[Chemical 3]
[0008]
(In the formula, p is an average degree of polymerization and represents a positive number of 5 to 15.)
An epoxy resin composition containing, as essential components, a polyphenol resin having a weight average molecular weight of 3000 or more by GPC and (c) a phenolic hydroxyl group-containing aromatic polyamide resin.
(2) A phenolic hydroxyl group-containing aromatic polyamide resin is represented by the following formula (2)
[0009]
[Formula 4]
[0010]
(Wherein x, y, z, l, m and n are average degrees of polymerization, respectively, and x = 3-7, y = 1-4, z = 5-15, l + m = 2-200 positive. The epoxy resin composition according to the above (1), represented by the following formula: m / (m + 1) ≧ 0.04
(3) The epoxy resin composition according to the above (1) or (2), which contains a curing accelerator,
(4) A varnish obtained by dissolving the epoxy resin composition according to the above (1) or (3) in a solvent,
(5) A sheet having a layer of the composition according to any one of (1) to (4) on both sides or one side of a planar support,
(6) The sheet according to (5), wherein the planar support is a polyimide film,
(7) The sheet according to (5), wherein the planar support is a metal foil,
(6) The sheet according to (5), wherein the planar support is a release film,
(7) Hardened | cured material formed by hardening | curing the epoxy resin composition of any one of said (1) thru | or (8).
Is to provide.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
A method for producing a polyphenol resin having a structure represented by the formula (1) and having a weight average molecular weight of 3000 or more by GPC (gel permeation chromatography) is not particularly limited. For example, the following formula (3)
[0012]
[Chemical formula 5]
[0013]
(In the formula, X represents a chlorine atom, a methoxy group or a hydroxyl group.)
The phenol is usually subjected to a condensation reaction (first stage condensation reaction) at a ratio of 1.5 to 10 moles, preferably 2 to 8 moles per mole of the compound represented by The compound in which X in the formula (3) is a chlorine atom with respect to 1 equivalent of the phenolic hydroxyl group of the obtained compound is 0.01 to 0 in the presence of a solvent having a low solubility in water and a boiling point of 100 ° C. or higher. .45 mol, preferably 0.05 to 0.4 mol, at a rate of condensation reaction (second stage condensation reaction), after the completion of the reaction, the temperature in the system is lowered to 70 to 100 ° C. The hydrochloric acid remaining in the solvent is dissolved on the water side with stirring, and then heated to 100 ° C. or higher again to distill water containing hydrochloric acid out of the system. In addition, instead of the two-step reaction as described above, 1.01 to 1.5 mol, preferably 1.02 to 1.45 mol of phenol is used per 1 mol of the compound represented by the formula (3) from the beginning. After the condensation reaction is completed, excess phenol is added to lower the viscosity of the reaction solution, water is added to wash with water to remove the acid catalyst, and then the phenol is removed from the oil layer.
[0014]
When the polyphenol resin in the present invention is obtained by a two-stage reaction, a catalyst is not particularly required when X is chlorine in the first-stage condensation reaction, but an acid catalyst is used when the methoxy group or hydroxyl group. Examples of the acid catalyst that can be used include hydrochloric acid, sulfuric acid, and paratoluenesulfonic acid, and paratoluenesulfonic acid is particularly preferable. The amount of the acid catalyst used is usually 0.001 to 0.1 parts by weight, preferably 0.005 to 0.05 parts by weight, with respect to 1 mole of the compound represented by the formula (3).
[0015]
The first stage condensation reaction can be carried out in the absence of a solvent or in the presence of a solvent. When a solvent is used, examples of the solvent that can be used include methanol, ethanol, isopropanol, methyl ethyl ketone, and methyl isobutyl ketone. The amount of the solvent used is usually 10 to 300% by weight, preferably 20 to 250% by weight, based on the total weight of the compound represented by the formula (3) and phenol.
[0016]
The first-stage condensation reaction is carried out until the compound represented by the formula (3) has completely disappeared. The reaction temperature is usually 40 to 150 ° C., and the reaction time is usually 1 to 10 hours.
[0017]
After completion of the condensation reaction, the acid catalyst is removed by neutralization, washing with water, etc., and then the solvent and unreacted phenol are removed under heating and reduced pressure.
[0018]
The condensate thus obtained has a structure in which a biphenyl molecule and a phenol molecule are bonded via a methylene bond, and its weight average molecular weight is usually 500 to 1500, which differs depending on the average molecular weight, but it cannot be generally stated, but its softening point is Usually, it is about 50 to 100 ° C.
Next, the obtained condensate is reacted with a compound represented by the formula (3) where X is a chlorine atom to carry out a second-stage condensation reaction.
[0019]
The second-stage condensation reaction uses a solvent because the viscosity increases as the molecular weight of the product increases. As the solvent that can be used, a solvent having a boiling point of 100 ° C. or higher, preferably 100 to 200 ° C., inert to the acid, low affinity with water and specific gravity smaller than water is preferable. Specific examples include propylene glycol monomethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether and the like. The solvent is usually added to the reaction system in advance so as to be 2 to 200% by weight, preferably 3 to 150% by weight, based on the weight of the product, or added in portions during the reaction as appropriate.
[0020]
The reaction is carried out until the compound represented by the formula (3) has completely disappeared. The reaction temperature is usually 100 to 180 ° C., and the reaction time is usually 1 to 20 hours.
[0021]
In the first and second stage condensation reactions, when a compound in which X in the formula (3) is a chlorine atom is used, nitrogen gas is blown from one side of the reactor, and hydrochloric acid gas generated as a side reaction product from the other side. Remove with a tube. The extracted hydrochloric acid is preferably trapped by bubbling in an alkaline aqueous solution such as an aqueous sodium hydroxide solution.
[0022]
After completion of the reaction, cooling is performed to 70 to 100 ° C. When the viscosity increases in this temperature range and stirring is difficult, the amount of the solvent is adjusted. The specific amount of the solvent is 10 to 150% by weight, preferably 15 to 100% by weight, based on the weight of the product.
[0023]
The inside of the system is kept at 70 to 100 ° C., and warm water is added with stirring. The amount of warm water is usually 10 to 300% by weight, preferably 20 to 200% by weight, based on the weight of the product. After sufficiently stirring, the temperature is raised from 100 ° C. to the boiling point of the solvent, and water containing hydrochloric acid is removed out of the system using a diverter tube. Although the solvent also flows out simultaneously by azeotropy, it is separated using a flow dividing tube, and the solvent is returned to the system.
[0024]
The above water washing step is repeated until the distilled water is almost neutral. Usually, the required number of washings is 2 to 10 times. After completion of washing with water, the above solvent or another solvent may be added to adjust the solution viscosity so that it can be easily handled at room temperature. Examples of the solvent used include amide solvents such as γ-butyrolactone, N-methylpyrrolidone (NMP), N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N, N-dimethylimidazolidinone and the like. , Sulfones such as tetramethylene sulfone, ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol dimethyl ether, propylene glycol monomethyl ether monoacetate, propylene glycol monobutyl ether, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopenta Examples thereof include ketone solvents such as non- and cyclohexanone, and aromatic solvents such as toluene and xylene. The solvent is used in the range where the solid content concentration in the obtained solution is usually 10 to 80% by weight, preferably 20 to 70% by weight. The solution thus obtained can be used as it is as a varnish after adding the components (a) and (c).
It is.
[0025]
Also, when a polyphenol resin having an average weight molecular weight of 3000 or more is prepared by a single-stage condensation reaction, it can be varnished using the same solvent as described above.
[0026]
The phenolic hydroxyl group-containing aromatic polyamide resin used in the present invention is not particularly limited as long as it is an aromatic polyamide resin having a phenolic hydroxyl group in the polymer structure. Regarding the method for synthesizing a phenolic hydroxyl group-containing aromatic polyamide resin, for example, aromatic diamine and / or aromatic dicarboxylic acid having a hydroxyl group described in JP-A-8-143661 and the like are mixed, and the aromatic diamine is mixed. It can be produced by performing polycondensation of a component and an aromatic dicarboxylic acid component.
[0027]
Furthermore, in order to improve flexibility, softness, and adhesiveness, the phenolic hydroxyl group-containing aromatic polyamide resin is a phenolic hydroxyl group-containing aromatic polyamide resin having aminoaryl groups at both ends and a carboxyl group at both end groups. It is preferable to use a block copolymer obtained by reacting a poly (butadiene-acrylonitrile) copolymer having
To make both terminal groups of the polyamide resin an aminoaryl group, it can be easily achieved by subjecting the aromatic diamine component to a polycondensation reaction in excess of the aromatic dicarboxylic acid component.
This polycondensation can be carried out by a conventionally known method described in, for example, JP-A-6-299133.
In the present invention, a block copolymer represented by the structure of the formula (2) is preferable.
[0028]
[Chemical 6]
[0029]
(Wherein x, y, z, l, m and n are average degrees of polymerization, respectively, and x = 3-7, y = 1-4, z = 5-15, l + m = 2-200 positive. Number, m / (m + 1) ≧ 0.04.)
[0030]
Examples of the aromatic diamine used for producing the phenolic hydroxyl group-containing aromatic polyamide resin include m-phenylenediamine, p-phenylenediamine, m-tolylenediamine, 4,4′-diaminodiphenyl ether, and 3,3 ′. -Dimethyl-4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl thioether, 3,3'-dimethyl-4,4'-diaminodiphenyl thioether, 3,3'-diethoxy -4,4'-diaminodiphenyl thioether, 3,3'-diaminodiphenyl thioether, 4,4'-diaminobenzophenone, 3,3'-dimethyl-4,4'-diaminobenzophenone, 3,3'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,3'-dimethoxy Si-4,4′-diaminodiphenylthioether, 2,2′-bis (3-aminophenyl) propane, 2,2′-bis (4-aminophenyl) propane, 4,4′-diaminodiphenyl sulfoxide 4,4′-diaminodiphenylsulfone, benzidine, 3,3′-dimethylbenzidine, 3,3′-dimethoxybenzidine, 3,3′-diaminobiphenyl, p-xylylenediamine, m-xylylenediamine, o-xylylenediamine, 2,2′-bis (3-aminophenoxyphenyl) propane, 2,2′-bis (4-aminophenoxyphenyl) propane, 1,3-bis (4-aminophenoxyphenyl) benzene, 1,3′-bis (3-aminophenoxyf) propane, bis (4-amino-3-methylphenyl) methane, bis (4-amino- , 5-dimethylphenyl) methane, bis (4-amino-3-ethylphenyl) methane, bis (4-amino-3,5-diethylphenyl) methane, bis (4-amino-3-propylphenyl) methane, bis (4-Amino-3,5-dipropylphenyl) methane and the like are not limited thereto. You may use these 1 type or in mixture of 2 or more types.
Examples of dicarboxylic acids used for producing the phenolic hydroxyl group-containing aromatic polyamide resin include phthalic acid, isophthalic acid, terephthalic acid, 4,4′-oxydibenzoic acid, 4,4′-biphenyldicarboxylic acid, 3 , 3′-, methylene dibenzoic acid, 4,4′-methylene dibenzoic acid, 4,4′-thiodibenzoic acid, 3,3′-carbonyl dibenzoic acid, 4,4′-carbonyl dibenzoic acid, Examples include, but are not limited to, 4,4′-sulfonyldibenzoic acid, 1,5-naphthalenedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 1,2-naphthalenedicarboxylic acid, and the like. It is not a thing.
[0031]
Furthermore, as the hydroxyl group-containing aromatic dicarboxylic acid or hydroxyl group-containing aromatic diamine used for introducing a phenolic hydroxyl group into an aromatic polyamide resin, 5-hydroxyisophthalic acid, 4-hydroxyisophthalic acid, 2-hydroxyisophthalic acid, 3-hydroxyisophthalic acid, 2-hydroxyterephthalic acid, 3,3′-dihydroxy-4,4′-dianiline, 2,2-bis (3′-amino-4-hydroxyphenyl) propane, 2,4-dihydroxy- 1,5-diaminobenzene, 5-hydroxy-1,3-diaminobenzene and the like can be used. However, the present invention is not limited to these.
[0032]
In the epoxy resin composition of the present invention ( c ) The proportion of the component phenolic hydroxyl group-containing aromatic polyamide resin is ( b ) Is usually 1 to 50% by weight, more preferably 2 to 40% by weight, based on the polyphenol resin as a component.
[0033]
The epoxy resin that can be used in the epoxy resin composition of the present invention is not particularly limited as long as it has two or more epoxy groups in one molecule. Specifically, novolac type epoxy resin, dicyclopentadiene phenol condensation type epoxy resin, xylylene skeleton-containing phenol novolak type epoxy resin, biphenyl skeleton containing novolak type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, tetramethylbiphenol Examples thereof include, but are not limited to, type epoxy resins. Two or more of these epoxy resins can be used in combination.
[0034]
In the epoxy resin composition of the present invention, as the curing agent, other curing agents may be used in addition to the polyphenol resin represented by the formula (1). Specific examples of curing agents that can be used in combination include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, polyamide resin synthesized from linolenic acid and ethylenediamine, phthalic anhydride, anhydrous Trimellitic acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol novolak, triphenylmethane and these Modified products, imidazole, BF Three -Examples include, but are not limited to, amine complexes and guanidine derivatives. When these are used in combination, the proportion of the polyphenol resin represented by the formula (1) in the total curing agent is usually 20% by weight or more, preferably 30% by weight or more.
[0035]
In the epoxy resin composition of the present invention, the amount of the curing agent used is preferably 0.7 to 1.2 equivalents relative to 1 equivalent of the epoxy group of the epoxy resin. When less than 0.7 equivalent or more than 1.2 equivalent with respect to 1 equivalent of epoxy group, curing may be incomplete and good cured properties may not be obtained.
[0036]
Moreover, when using the said hardening | curing agent, a hardening accelerator may be used together. Specific examples of the curing accelerator that can be used include, for example, imidazoles such as 2-methylimidazole, 2-ethylimidazole, and 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, and 1,8-diaza. -Tertiary amines such as bicyclo (5,4,0) undecene-7, phosphines such as triphenylphosphine, and metal compounds such as tin octylate. The curing accelerator is used as necessary in an amount of 0.1 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin.
[0037]
The epoxy resin composition of the present invention contains an inorganic filler as necessary. Specific examples of the inorganic filler that can be used include silica, alumina, talc and the like. The inorganic filler is used in an amount of 0 to 90% by weight in the epoxy resin composition of the present invention. Furthermore, various compounding agents such as silane coupling agents, mold release agents such as stearic acid, palmitic acid, zinc stearate, calcium stearate, and pigments can be added to the epoxy resin composition of the present invention.
[0038]
The varnish of the epoxy resin composition of the present invention is obtained by dissolving the above-described epoxy resin, curing agent, and phenolic hydroxyl group-containing aromatic polyamide resin in a solvent. Examples of the solvent used include amide solvents such as γ-butyrolactone, N-methylpyrrolidone (NMP), N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N, N-dimethylimidazolidinone and the like. , Sulfones such as tetramethylene sulfone, ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, propylene glycol monobutyl ether, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone And ketone solvents such as cyclohexanone and aromatic solvents such as toluene and xylene. The solid content concentration in the obtained varnish is usually 10 to 80% by weight, preferably 20 to 70% by weight.
[0039]
In the sheet using the epoxy resin composition of the present invention, the above varnish is dried on a planar support by various coating methods such as a gravure coating method, screen printing, metal mask method, and spin coating method known per se. It is obtained by drying after coating so that the thickness becomes a predetermined thickness, for example, 5 to 100 μm, but which coating method to use is appropriately selected depending on the type, shape, size, and film thickness of the coating film Is done. Examples of the base material include various polymers such as polyamide, polyamideimide, polyarylate, polyethylene terephthalate, polybutylene terephthalate, polyether ether ketone, polyether imide, polyether ketone, polyketone, polyethylene, and polypropylene, and / or their co-polymers. It is a film made from a coalescence or a metal foil such as a copper foil, particularly preferably a polyimide or a metal foil. Further, a sheet-like cured product can be obtained by further heating.
[0040]
In addition, the epoxy resin composition of the present invention is dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc., and is applied to a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper, etc. A prepreg obtained by impregnation and drying by heating can be subjected to hot press molding to obtain a cured product. The solvent used here is usually 10 to 70% by weight, preferably 15 to 70% by weight in the mixture of the epoxy resin composition of the present invention and the solvent.
[0041]
【Example】
Next, the present invention will be described more specifically with reference to Examples and Comparative Examples. In the following, parts are parts by weight unless otherwise specified. The measurement conditions for GPC are as follows.
[0042]
Synthesis example 1
Synthesis of polyphenol resin having a weight average molecular weight of 3000 or more
While applying nitrogen gas purge to a flask equipped with a thermometer, condenser, and stirrer, the following formula (4)
[0043]
[Chemical 7]
[0044]
121 parts of a compound represented by the formula, and 188 parts of phenol were charged and heated to 130 ° C. with stirring to be dissolved. Next, 0.5 part of paratoluenesulfonic acid was added, and then the reaction was carried out for a time while removing the produced methanol out of the system using a fractionating tube. After completion of the reaction, 260 parts of methyl isobutyl ketone was added and washed with water three times, and then 168 parts of compound (A) was obtained by removing methyl isobutyl ketone and unreacted phenol from the oil layer under heating and reduced pressure using an evaporator. . The softening point of the obtained compound (A) was 70 ° C., the melt viscosity at 150 ° C. was 0.8 Pa · s, and the hydroxyl group equivalent was 203 g / eq. Moreover, it was 960 when the weight average molecular weight was measured using GPC.
[0045]
While purging the flask with a silicon tube attached to the tip of the thermometer, fractionating tube, cooling tube, stirrer, and the hydrochloric acid gas generated in the vessel at the end of the cooling tube, nitrogen gas purge was performed, and the obtained compound ( A) 101.5 parts, the following formula (5)
[0046]
[Chemical 8]
[0047]
31.4 parts of the compound represented by the formula (1) and 12.4 parts of propylene glycol monobutyl ether were charged. Subsequently, the temperature was raised to 165 ° C. with stirring, and dehydrochlorination reaction was performed under reflux. The generated hydrochloric acid gas was removed from the system through a silicon tube. The reaction was traced by GPC analysis, and after confirming that the compound represented by the formula (5) had completely disappeared 3 hours after the start of the reaction, stirring was further continued for 3 hours to complete the reaction. When the temperature in the system was cooled to 140 ° C., 37.1 parts of propylene glycol monobutyl ether was further added to lower the solution viscosity. The temperature in the system was cooled to 90 ° C, 60 parts of 70 ° C warm water was added, and the mixture was stirred at 90 ° C for 30 minutes. Thereafter, the temperature was raised to 165 ° C., and water containing hydrochloric acid and a part of propylene glycol monobutyl ether were distilled out of the system by azeotropic dehydration. Further, the solution was separated using a fractionating tube, water containing hydrochloric acid was removed, and propylene glycol monobutyl ether was returned to the system. Thereafter, the temperature in the system was similarly lowered to 90 ° C., and 60 parts of warm water of 70 ° C. was added again for washing with water. This washing step was performed 4 times. When the amount of chlorine in the water distilled off in each washing step was measured by silver nitrate titration, the results shown in Table 1 were obtained.
[0048]
Table 1
Number of washings Chlorine content in washing water (ppm)
First time 1420
Second time 230
Third time 130
4th 40
[0049]
After washing with water for the fourth time, the temperature in the system was lowered to 80 ° C., and 62 parts of cyclopentanone was added for dilution to obtain 232.7 parts of a polyphenol resin solution represented by the above formula (1). The compound represented by the formula (1) thus obtained was 12800 when its weight average molecular weight was measured using GPC. The hydroxyl equivalent was 245 g / eq. The total amount of chlorine contained in this solution and the amount of chlorine in the solid content obtained by evaporating the solvent were measured using a sample combustion apparatus and ion chromatography. As a result, the total chlorine content contained in the solution was 90 ppm, and the total chlorine content contained in the solid content was 140 ppm. When converted from this result, the amount of chlorine contained in the solvent of the solution is calculated to be 20 ppm.
[0050]
Synthesis example 2
Synthesis of phenolic hydroxyl group-containing aromatic polyamide-poly (butadiene-acrylonitrile) block copolymer (an example of a copolymer represented by formula (2), hereinafter BPAM)
19.93 g (120 mmol) of isophthalic acid, 30.63 g (153 mmol) of 3,4'-diaminodiphenyl ether, 3.64 g (20 mmol) of 5-hydroxyisophthalic acid, 3.9 g of lithium chloride, 12.1 g of calcium chloride, N-methyl-2-pyrrolidone (240 ml) and pyridine (54 ml) were placed in a 1-liter four-necked round bottom flask and dissolved by stirring. Then, 74 g of triphenyl phosphite was added and reacted at 90 ° C. for 4 hours. A phenolic hydroxyl group-containing aromatic polyamide oligomer was produced. 48 g of a poly (butadiene acrylonitrile) copolymer having a carboxyl group at both ends (Hycar CTBN, manufactured by BF Goodrich. The poly (butadiene-acrylonitrile) part contains 17 mol% of acrylonitrile component and has a molecular weight of about 3600). After adding a solution dissolved in 240 ml of N-methyl-2-pyrrolidone, the mixture was further reacted for 4 hours, cooled to room temperature, poured into 20 liters of methanol, and poly (butadiene acrylonitrile) used in the present invention. An aromatic polyamide-poly (butadiene-acrylonitrile) block copolymer having a copolymer part content of 50% by weight and containing about 14 mol% of a phenolic hydroxyl group was precipitated. The precipitated polymer was further purified by washing with methanol and refluxing with methanol. The intrinsic viscosity of this polymer was 0.85 dl / g (dimethylacetamide, 30 ° C.). When the infrared spectrum of the polymer powder was measured by the diffuse reflection method, it was 1673 cm. -1 An amidocarbonyl group, 2856-2975 cm -1 The absorption based on the C—H bond of the butadiene moiety is 2245 cm. -1 The absorption based on the nitrile group was observed.
[0051]
Example 1
12.3 parts of the phenolic hydroxyl group-containing aromatic polyamide resin obtained in Synthesis Example 2 is added to 232.7 parts of the polyphenol resin solution obtained in Synthesis Example 1 and completely dissolved. A solution containing 50% by weight of the polyphenol resin and 5% by weight of the phenolic hydroxyl group-containing aromatic polyamide resin represented by the formula (2) was prepared. The following formula (5) is used as an epoxy resin for 100 parts of this solution.
[0052]
[Chemical 9]
[0053]
Compound NC-3000P (Nippon Kayaku Co., Ltd., epoxy equivalent 270 g / eq, softening point 58 ° C., q = 2.5 (average value)) 55 parts, triphenylphosphine (TPP) as a curing accelerator ) 0.55 part was added to obtain the varnish of the present invention. The varnish thus obtained was applied to polyimide using an applicator so that the thickness after drying was 25 μm. The test piece was heated at 150 ° C. for 3 hours to obtain a cured product.
The cured product on the obtained polyimide did not crack even when the polyimide was rolled up, and had sufficient film forming ability. When this cured product was tested for flame retardancy according to UL94-VTM, it was confirmed to clear VTM-0.
[0054]
Example 2
When the varnish of the present invention was applied onto a PET film so that the thickness after drying was 100 μm and heated at 150 ° C. for 5 minutes to remove the solvent, it was not cracked even when bent in the B-stage state. This was further cured by heating at 150 ° C. for 3 hours, the PET film was removed, and the glass transition temperature was measured by DMA (Differential Mechanical Analysis) to be 160 ° C.
[0055]
【Effect of the invention】
The epoxy resin composition of the present invention, when molded into a thin film, has sufficient flexibility even in a B-stage state or in a cured product, compared to an epoxy resin composition that has been generally used conventionally, Moreover, since the cured product is excellent in flame retardancy and heat resistance, it is extremely useful for a wide range of applications such as molding materials, casting materials, laminated materials, paints, adhesives, and resists.
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