JP4882854B2 - Glass coating composition - Google Patents
Glass coating composition Download PDFInfo
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- JP4882854B2 JP4882854B2 JP2007119414A JP2007119414A JP4882854B2 JP 4882854 B2 JP4882854 B2 JP 4882854B2 JP 2007119414 A JP2007119414 A JP 2007119414A JP 2007119414 A JP2007119414 A JP 2007119414A JP 4882854 B2 JP4882854 B2 JP 4882854B2
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- 239000011521 glass Substances 0.000 title claims description 48
- 239000008199 coating composition Substances 0.000 title description 2
- 239000002243 precursor Substances 0.000 claims description 33
- 239000011248 coating agent Substances 0.000 claims description 32
- 238000000576 coating method Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 27
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 26
- 238000010828 elution Methods 0.000 claims description 20
- 239000003513 alkali Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 14
- 229930195734 saturated hydrocarbon Chemical group 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 14
- 239000003960 organic solvent Substances 0.000 claims description 11
- 239000003377 acid catalyst Substances 0.000 claims description 10
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 10
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 10
- 239000011259 mixed solution Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 125000001424 substituent group Chemical group 0.000 claims description 7
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 40
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- 239000000758 substrate Substances 0.000 description 16
- 239000005361 soda-lime glass Substances 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 6
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 6
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 4
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007922 dissolution test Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
Description
本発明は、ゾルゲル法に用いられる原料を出発原料とする有機無機ハイブリッド材料を用いたコーティング組成物とその製造方法に関する。 The present invention relates to a coating composition using an organic-inorganic hybrid material starting from a raw material used in a sol-gel method, and a method for producing the same.
液晶ディスプレイはツイストネマチック(TN)パネルやスーパーツイストネマチック(STN)パネルに代表される単純マトリックスタイプと薄膜トランジスタ(TFT)に代表されるアクティブマトリックスタイプに分けられる。ガラス基板上に形成される成膜物質や液晶材料にとって、ガラス中のアルカリ成分(特にNa)の溶出は素子特性劣化の原因となり、その結果、画質の劣化やコントラストの低下が起こるため、どちらのタイプも当初、ガラス基板として無アルカリガラスを使用していた。 Liquid crystal displays are classified into a simple matrix type represented by a twisted nematic (TN) panel and a super twisted nematic (STN) panel and an active matrix type represented by a thin film transistor (TFT). For film-forming substances and liquid crystal materials formed on glass substrates, elution of alkali components (especially Na) in glass causes deterioration of device characteristics, resulting in degradation of image quality and reduction of contrast. Initially, the type used alkali-free glass as the glass substrate.
その後、ガラスからのアルカリ成分の溶出をSiO2系の膜で防御する技術が確立し、低価格が要求される単純マトリックスタイプには、SiO2などでコートされたソーダライム系のガラスが使用されている。現在では、ディップコート法など液相成膜過程によるコーティングが一般的に行われている(例えば、特許文献1〜3参照)。 Later, a technology to protect the elution of alkali components from glass with a SiO 2 film was established, and soda lime glass coated with SiO 2 or the like was used for the simple matrix type that required low cost. ing. Currently, coating by a liquid phase film forming process such as a dip coating method is generally performed (see, for example, Patent Documents 1 to 3).
アクティブマトリックスタイプでは、ガラスからの微量のアルカリ成分の溶出がTFT性能へ悪影響を及ぼす。ポーラスなシリカ膜では十分なアルカリ溶出防止性能が得られない。また、シリカ膜の焼成には500℃以上の加熱が必要であり、0.7mm程度の厚さのガラス基板では反りが発生しやすい。さらにシリカ膜が白濁しやすいという問題があった。そのため、シリカ膜でコートされたソーダライム系のガラスはTFT用基板には採用されていない。 In the active matrix type, elution of a trace amount of alkali components from the glass adversely affects the TFT performance. A porous silica film does not provide sufficient alkali elution prevention performance. In addition, heating of the silica film requires heating at 500 ° C. or higher, and warping is likely to occur in a glass substrate having a thickness of about 0.7 mm. Furthermore, there is a problem that the silica film tends to become cloudy. For this reason, soda lime glass coated with a silica film has not been adopted for TFT substrates.
アルカリ溶出を根本的になくし、さらに、パターニングの際に用いる酸やアルカリに対する表面劣化を少なくするために、耐薬品性や耐熱性に優れた無アルカリガラスが使用されている。無アルカリガラスとは、一般式R'O−Al2O3−SiO2(R'は2価の元素)で表されるアルカリ酸化物を含まないガラスである。ただし、工業的にガラスを生産する場合、アルカリ金属の含有量をゼロに押さえることは多くの困難を伴うため、慣例的にアルカリ含有量が0.5重量%未満のものが無アルカリガラスと呼ばれている。 Alkali-free glass having excellent chemical resistance and heat resistance is used in order to fundamentally eliminate alkali elution and to reduce surface degradation against acids and alkalis used in patterning. The alkali-free glass is a glass that does not contain an alkali oxide represented by the general formula R′O—Al 2 O 3 —SiO 2 (R ′ is a divalent element). However, when producing glass industrially, it is difficult to keep the alkali metal content to zero, so those with an alkali content of less than 0.5% by weight are conventionally called alkali-free glass. It is.
無アルカリガラスは、優れた耐熱性、化学的耐久性、高電気絶縁性、高弾性率、低熱膨張率を持ち合わせており、液晶ディスプレイ用ガラス基板の他に、有機ELディスプレイ用基板、太陽電池用基板やプリント配線基板用の布材などの繊維に用いられている。
無アルカリガラスは加工温度が650℃以上で高く、加工に多大なエネルギーを要する。さらに、通常はソーダライムガラスを製造している工場において、無アルカリガラスの製造のために頻繁に素地替えを行うと、作業に長期間(数日間)を費やすため、結果としてコストが高くなる問題があった。 The alkali-free glass has a high processing temperature of 650 ° C. or higher, and requires a lot of energy for processing. In addition, if the base is changed frequently for the production of alkali-free glass in a factory that normally manufactures soda-lime glass, it takes a long time (several days) to work, resulting in high costs. was there.
本発明は、安価で大面積化が容易なソーダライムガラスに有機無機ハイブリッドコーティング材をコートし、ガラスに反りが発生しない温度で加熱硬化させて、アルカリ溶出防止性能を付与することを特徴とする。 The present invention is characterized in that an organic-inorganic hybrid coating material is coated on soda lime glass that is inexpensive and easy to increase in area, and is heat-cured at a temperature at which the glass does not warp to provide alkali elution prevention performance. .
本発明は、芳香族または芳香族を含む炭化水素基、飽和炭化水素基、不飽和炭化水素基からなる群から選ばれる少なくとも1種の有機置換基とシロキサン結合を含む有機無機ハイブリッド物質(前駆体)を有機溶媒に溶解し、ガラスの表面に塗布、硬化させて、ガラスの表面をコートし、ガラスから水へのアルカリ成分の溶出を防止する有機無機ハイブリッドコーティング材であって、原料のアルコキシシランのうち、芳香族または芳香族を含む炭化水素基を含有するアルコキシシランがモル比で10%以上60%以下、飽和炭化水素基を含有するアルコキシシランがモル比で20%以上80%以下、不飽和炭化水素基を含有するアルコキシシランがモル比で50%以下、四官能のアルコキシシランがモル比で50%以下であることを特徴とする有機無機ハイブリッドコーティング材である。 The present invention relates to an organic-inorganic hybrid material (precursor) containing at least one organic substituent selected from the group consisting of aromatic or aromatic hydrocarbon groups, saturated hydrocarbon groups and unsaturated hydrocarbon groups and a siloxane bond. ) is dissolved in an organic solvent, applied to the surface of the glass, cured, coated surface of the glass, an organic-inorganic hybrid coating materials to prevent the elution of alkaline components from the glass into the water, the raw material of the alkoxysilane Among them, alkoxysilanes containing aromatic or aromatic hydrocarbon groups are 10% to 60% in molar ratio, and alkoxysilanes containing saturated hydrocarbon groups are 20% to 80% in molar ratio, The alkoxysilane containing a saturated hydrocarbon group is 50% or less in molar ratio, and the tetrafunctional alkoxysilane is 50% or less in molar ratio. That is an organic-inorganic hybrid coating material.
また、シロキサンネットワーク中に四官能基を含有することを特徴とする上記の有機無機ハイブリッドコーティング材である。 Moreover, it is said organic-inorganic hybrid coating material characterized by containing a tetrafunctional group in a siloxane network.
また、アルコキシシランにモル比で10〜50倍の水、10倍以下のアルコール、0.001〜1倍の酸触媒を添加し、混合溶液を50〜110℃で1時間〜1週間加熱して前駆体を合成することを特徴とする上記の有機無機ハイブリッドコーティング材である。 Also, 10-50 times water, 10 times alcohol or less, 0.001-1 times acid catalyst are added to alkoxysilane in a molar ratio, and the mixed solution is heated at 50-110 ° C. for 1 hour-1 week. The organic-inorganic hybrid coating material is characterized in that a precursor is synthesized.
また、20〜110℃で5分間〜10時間減圧加熱して前駆体を安定化することを特徴とする上記の有機無機ハイブリッドコーティング材である。 Moreover, it is said organic-inorganic hybrid coating material characterized by stabilizing a precursor by heating under reduced pressure at 20-110 degreeC for 5 minutes-10 hours.
さらに、前駆体を有機溶媒に溶解し固形分濃度3〜30重量%の溶液とし、ガラス表面に塗布することを特徴とする上記の有機無機ハイブリッドコーティング材である。 Further, the organic-inorganic hybrid coating material is characterized in that the precursor is dissolved in an organic solvent to form a solution having a solid concentration of 3 to 30% by weight and applied to the glass surface.
さらにまた、ガラス表面に塗布後、100〜500℃で加熱することにより硬化することを特徴とする上記の有機無機ハイブリッドコーティング材である。 Furthermore, it is said organic-inorganic hybrid coating material characterized by hardening | curing by heating at 100-500 degreeC after apply | coating to the glass surface.
本発明により、有機無機ハイブリッドコーティング材を安価で大面積化が容易なソーダライムガラスにコートし、ガラスに反りが発生しない温度での加熱硬化によって、アルカリ溶出防止性能を付与することができる。 According to the present invention, an organic / inorganic hybrid coating material can be coated on soda lime glass that is inexpensive and easy to increase in area, and can be imparted with alkali elution prevention performance by heat curing at a temperature at which the glass does not warp.
本発明は、芳香族または芳香族を含む炭化水素基、飽和炭化水素基、不飽和炭化水素基からなる群から選ばれる少なくとも1種の有機置換基とシロキサン結合を含む有機無機ハイブリッド物質(前駆体)を有機溶媒に溶解し、ガラスの表面に塗布、硬化させて、ガラスの表面をコートし、ガラスから水へのアルカリ成分の溶出を防止する有機無機ハイブリッドコーティング材であって、原料のアルコキシシランのうち、芳香族または芳香族を含む炭化水素基を含有するアルコキシシランがモル比で10%以上60%以下、飽和炭化水素基を含有するアルコキシシランがモル比で20%以上80%以下、不飽和炭化水素基を含有するアルコキシシランがモル比で50%以下、四官能のアルコキシシランがモル比で50%以下であることを特徴とする有機無機ハイブリッドコーティング材である。
The present invention relates to an organic-inorganic hybrid material (precursor) containing at least one organic substituent selected from the group consisting of aromatic or aromatic hydrocarbon groups, saturated hydrocarbon groups and unsaturated hydrocarbon groups and a siloxane bond. ) is dissolved in an organic solvent, applied to the surface of the glass, cured, coated surface of the glass, an organic-inorganic hybrid coating materials to prevent the elution of alkaline components from the glass into the water, the raw material of the alkoxysilane Among them, alkoxysilanes containing aromatic or aromatic hydrocarbon groups are 10% to 60% in molar ratio, and alkoxysilanes containing saturated hydrocarbon groups are 20% to 80% in molar ratio, The alkoxysilane containing a saturated hydrocarbon group is 50% or less in molar ratio, and the tetrafunctional alkoxysilane is 50% or less in molar ratio. That is an organic-inorganic hybrid coating material.
有機置換基とシロキサン結合を含む有機無機ハイブリッド物質(前駆体)を有機溶媒に溶解し、塗布、硬化させることが好ましい。前駆体が有機溶媒に溶解しない場合、塗布前の物質の粘度、膜厚、膜の均一性を制御できないためである。本発明における有機溶媒としては、特に限定されないが、アルコール類、エステル類等が好ましく、特にエタノール、イソプロピルアルコール、酢酸イソブチル等が好ましい。 It is preferable to dissolve an organic-inorganic hybrid substance (precursor) containing an organic substituent and a siloxane bond in an organic solvent, and apply and cure. This is because when the precursor is not dissolved in the organic solvent, the viscosity, film thickness, and film uniformity of the substance before coating cannot be controlled. Although it does not specifically limit as an organic solvent in this invention, Alcohol, ester, etc. are preferable, and especially ethanol, isopropyl alcohol, isobutyl acetate, etc. are preferable.
有機置換基として芳香族または芳香族を含む炭化水素基を含有することが好ましい。芳香族または芳香族を含む炭化水素基としてフェニル基、ナフチル基、ベンジル基、フェネチル基、ナフチルメチル基等があるが、特にフェニル基が好ましい。 It is preferable to contain an aromatic or aromatic hydrocarbon group as the organic substituent. Examples of the aromatic or aromatic hydrocarbon group include a phenyl group, a naphthyl group, a benzyl group, a phenethyl group, and a naphthylmethyl group, and a phenyl group is particularly preferable.
有機置換基として飽和炭化水素基を含有することが好ましい。飽和炭化水素基としてメチル基、エチル基、(n−、i−)プロピル基、(n−、i−、s−、t−)ブチル基等があるが、特にメチル基が好ましい。 It is preferable to contain a saturated hydrocarbon group as an organic substituent. Examples of the saturated hydrocarbon group include a methyl group, an ethyl group, an (n-, i-) propyl group, and an (n-, i-, s-, t-) butyl group, and a methyl group is particularly preferable.
有機置換基として不飽和炭化水素基を含有することが好ましい。不飽和炭化水素基としてビニル基、アリル基、(1−、i−)プロペニル基等があるが、特にビニル基が好ましい。 It is preferable to contain an unsaturated hydrocarbon group as an organic substituent. Examples of the unsaturated hydrocarbon group include a vinyl group, an allyl group, and a (1-, i-) propenyl group, and a vinyl group is particularly preferable.
シロキサンネットワーク中に四官能基を含有することが好ましい。四官能基の導入により、膜が緻密化し膜強度が向上する。四官能基の原料としては、テトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン等があるが、特にテトラエトキシシランが好ましい。 It is preferable to contain a tetrafunctional group in the siloxane network. By introducing tetrafunctional groups, the film becomes dense and the film strength is improved. Examples of the raw material for the tetrafunctional group include tetramethoxysilane, tetraethoxysilane, and tetra-n-propoxysilane. Tetraethoxysilane is particularly preferable.
主剤原料のアルコキシシランのうち、芳香族または芳香族を含む炭化水素基を含有するアルコキシシランがモル比で10%以上60%以下、飽和炭化水素基を含有するアルコキシシランがモル比で20%以上80%以下、不飽和炭化水素基を含有するアルコキシシランがモル比で50%以下、四官能のアルコキシシランがモル比で50%以下であることが好ましい。 Among the alkoxysilanes used as the base material, an alkoxysilane containing an aromatic or aromatic-containing hydrocarbon group is 10% to 60% in molar ratio, and an alkoxysilane containing a saturated hydrocarbon group is 20% or more in molar ratio. It is preferable that 80% or less, alkoxysilane containing an unsaturated hydrocarbon group is 50% or less in terms of molar ratio, and tetrafunctional alkoxysilane is 50% or less in terms of molar ratio.
それぞれの組成を決定付ける理由は以下の通りである。芳香族または芳香族を含む炭化水素基を含有するアルコキシシランがモル比で10%以下の場合、ゲル化やゴム化が起こりやすく、塗布できないため好ましくない。芳香族または芳香族を含む炭化水素基を含有するアルコキシシランがモル比で60%以上の場合、熱軟化性を有するため、加熱時に形状維持が困難であり好ましくない。飽和炭化水素基を含有するアルコキシシランがモル比で20%以下の場合、硬化後に温度変化によってクラックが発生しやすいため好ましくない。飽和炭化水素基を含有するアルコキシシランがモル比で80%以上の場合、ゲル化が起こりやすく、塗布できないため好ましくない。不飽和炭化水素基を含有するアルコキシシランがモル比で50%以上の場合、ゴム化しやすく、硬化後に発砲体となる、また、不飽和炭化水素基同士の架橋が熱または紫外光により不規則に起こり、物性が安定しないため好ましくない。四官能のアルコキシシランがモル比で50%以上の場合、熱処理後にクラックが発生しやすいため好ましくない。 The reason for determining each composition is as follows. If the alkoxysilane containing an aromatic or aromatic hydrocarbon group is 10% or less in molar ratio, gelation or rubberization is likely to occur and coating is not preferable. When the molar ratio of alkoxysilane containing an aromatic or aromatic hydrocarbon group is 60% or more, it is not preferable because it has a heat softening property and it is difficult to maintain its shape during heating. When the alkoxysilane containing a saturated hydrocarbon group is 20% or less by molar ratio, it is not preferable because cracks are likely to occur due to temperature changes after curing. When the alkoxysilane containing a saturated hydrocarbon group is 80% or more by molar ratio, gelation is likely to occur and coating is impossible, which is not preferable. When the alkoxysilane containing an unsaturated hydrocarbon group is 50% or more in a molar ratio, it becomes easy to rubberize and becomes a foam after curing, and the crosslinking between unsaturated hydrocarbon groups is irregular by heat or ultraviolet light. Occurs and the physical properties are not stable. A tetrafunctional alkoxysilane in a molar ratio of 50% or more is not preferable because cracks are likely to occur after heat treatment.
また、アルコキシシランに対して、モル比で10〜50倍の水、10倍以下のアルコール、0.001〜1倍の酸触媒を添加することが好ましい。それぞれの添加量を決定付ける理由は以下の通りである。水の添加量が10倍以下の場合、加水分解反応が十分に進行せずに、未反応のアルコキシ基が残留するため好ましくない。水の添加量が50倍以上の場合、加水分解・重縮合反応の急激な進行に伴い、前駆体の粘度が急激に増大し制御が困難であるため好ましくない。アルコールの添加量が10倍以上の場合、合成時間が長時間となり、生産性等の産業上のメリットが小さいため好ましくない。 Moreover, it is preferable to add 10 to 50 times water, 10 times or less alcohol, and 0.001 to 1 times acid catalyst in molar ratio with respect to alkoxysilane. The reason for determining each addition amount is as follows. When the amount of water added is 10 times or less, the hydrolysis reaction does not proceed sufficiently and unreacted alkoxy groups remain, which is not preferable. When the amount of water added is 50 times or more, the viscosity of the precursor rapidly increases with the rapid progress of the hydrolysis / polycondensation reaction, which is not preferable. When the amount of alcohol added is 10 times or more, the synthesis time is long, and industrial advantages such as productivity are small, which is not preferable.
アルコールとしてはメタノール、エタノール、1−プロパノ-ル、2−プロパノール、1−ブタノール、2−メチル−1−プロパノ-ル、2−ブタノール、1.1−ジメチル−1−エタノール等があるが、特にエタノールが好ましい。酸触媒の添加量が0.001倍以下の場合、加水分解反応が十分に進行せずに、未反応のアルコキシ基が残留するため好ましくない。酸触媒の添加量が1倍以上の場合、主剤の粘度の増大が早く制御が困難であるため好ましくない。ゾルゲル法による有機無機ハイブリッド材料の合成では、塩基性触媒が用いられる場合があるが、酸触媒を用いることが望ましい。酸触媒としては、酢酸、蟻酸、マレイン酸、フマル酸、プロピオン酸、アジピン酸、オレイン酸、ステアリン酸、リノール酸、安息香酸等の有機酸が好ましく、特に酢酸が好ましい。 Examples of the alcohol include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-methyl-1-propanol, 2-butanol, 1.1-dimethyl-1-ethanol, etc. Ethanol is preferred. When the addition amount of the acid catalyst is 0.001 times or less, the hydrolysis reaction does not proceed sufficiently and unreacted alkoxy groups remain, which is not preferable. When the addition amount of the acid catalyst is 1 or more, it is not preferable because the viscosity of the main agent increases rapidly and is difficult to control. In the synthesis of the organic-inorganic hybrid material by the sol-gel method, a basic catalyst may be used, but it is desirable to use an acid catalyst. As the acid catalyst, organic acids such as acetic acid, formic acid, maleic acid, fumaric acid, propionic acid, adipic acid, oleic acid, stearic acid, linoleic acid, and benzoic acid are preferable, and acetic acid is particularly preferable.
また、前駆体の合成温度は50〜110℃で合成時間は1時間〜1週間であることが好ましい。それぞれの合成条件を決定付ける理由は以下の通りである。前駆体の合成温度が50℃以下の場合、合成時間が長時間となり、生産性等の産業上のメリットが小さいため好ましくない。前駆体の合成温度が110℃以上の場合、混合溶液の沸騰や原料アルコキシシランの蒸発により、所望の組成の前駆体が得られないため好ましくない。前駆体の合成時間が1時間以下の場合、加水分解・重縮合反応が十分に進行しないため好ましくない。前駆体の合成時間が1週間以上の場合、合成時間が長時間となり、生産性等の産業上のメリットが小さいため好ましくない。なお、前駆体の合成は開放系で行っても良いし、還流下で行っても良い。 Further, the synthesis temperature of the precursor is preferably 50 to 110 ° C. and the synthesis time is preferably 1 hour to 1 week. The reason for determining each synthesis condition is as follows. When the synthesis temperature of the precursor is 50 ° C. or less, the synthesis time is long, and industrial advantages such as productivity are small, which is not preferable. A precursor synthesis temperature of 110 ° C. or higher is not preferable because a precursor having a desired composition cannot be obtained due to boiling of the mixed solution or evaporation of the raw material alkoxysilane. When the synthesis time of the precursor is 1 hour or less, the hydrolysis / polycondensation reaction does not proceed sufficiently, which is not preferable. When the precursor synthesis time is one week or longer, the synthesis time is long, and industrial advantages such as productivity are small, which is not preferable. The synthesis of the precursor may be performed in an open system or under reflux.
また、酸触媒の残留による黄変などの不具合の防止には、前駆体を水と不混和な有機溶媒に溶解し、純水を加え抽出・分液することにより、触媒残渣を除去することが有効である。分液後の有機層を脱水・乾燥し、安定化された前駆体が得られる。 In order to prevent problems such as yellowing due to residual acid catalyst, the catalyst residue can be removed by dissolving the precursor in an organic solvent immiscible with water, adding pure water, and extracting and separating the solution. It is valid. The separated organic layer is dehydrated and dried to obtain a stabilized precursor.
また、20〜110℃で5分間〜10時間減圧加熱して前駆体を安定化することが好ましい。20℃以下で減圧加熱した場合、未反応シラノール基の縮合や系内に残留した水、酸触媒の蒸発が不十分で、安定化の効果が得られないため好ましくない。110℃以上で減圧加熱した場合、急激な縮合反応の進行により前駆体の粘度が急激に増大し制御できないため好ましくない。5分間未満の減圧加熱の場合、未反応シラノール基の縮合や系内に残留した水、酸触媒の蒸発が不十分で、安定化の効果が得られないため好ましくない。10時間以上の減圧加熱の場合、前駆体の粘度が増大しすぎて制御が難しいため好ましくない。 Further, it is preferable to stabilize the precursor by heating under reduced pressure at 20 to 110 ° C. for 5 minutes to 10 hours. Heating under reduced pressure at 20 ° C. or less is not preferable because condensation of unreacted silanol groups and water remaining in the system and evaporation of the acid catalyst are insufficient, and a stabilizing effect cannot be obtained. Heating under reduced pressure at 110 ° C. or higher is not preferable because the viscosity of the precursor increases rapidly due to the rapid progress of the condensation reaction and cannot be controlled. Heating under reduced pressure for less than 5 minutes is not preferable because condensation of unreacted silanol groups and evaporation of water and acid catalyst remaining in the system are insufficient, and a stabilizing effect cannot be obtained. In the case of heating under reduced pressure for 10 hours or more, the viscosity of the precursor increases excessively and is difficult to control, which is not preferable.
また、前駆体を有機溶媒に溶解し固形分濃度3〜30重量%の溶液とし、ガラス表面に塗布することが好ましい。固形分濃度が3%以下の場合、膜厚が薄くなりすぎるため、所定の膜厚が得られないため好ましくない。固形分濃度が30%以上の場合、膜面にムラやクラックが生じやすいため好ましくない。本発明における有機溶媒としては、特に限定されないが、アルコール類、エステル類等が好ましく、特にエタノール、イソプロピルアルコール、酢酸イソブチル等が好ましい。塗布方法としてはディップコート、フローコート、スピンコート、バーコート、ロールコート、スプレーコート、スクリーン印刷、フレキソ印刷等があるが、これらに限定されるものではない。 Moreover, it is preferable to dissolve the precursor in an organic solvent to obtain a solution having a solid content concentration of 3 to 30% by weight and apply the solution to the glass surface. When the solid content concentration is 3% or less, the film thickness becomes too thin, and a predetermined film thickness cannot be obtained, which is not preferable. A solid content concentration of 30% or more is not preferable because unevenness and cracks are likely to occur on the film surface. Although it does not specifically limit as an organic solvent in this invention, Alcohol, ester, etc. are preferable, and especially ethanol, isopropyl alcohol, isobutyl acetate, etc. are preferable. Application methods include dip coating, flow coating, spin coating, bar coating, roll coating, spray coating, screen printing, flexographic printing, and the like, but are not limited thereto.
また、ガラス表面に塗布後、100〜500℃で加熱することにより硬化することが好ましい。加熱温度が100℃以下の場合、膜硬化が十分に進行せず好ましくない。加熱温度が500℃以上の場合、芳香族または芳香族を含む炭化水素基、飽和炭化水素基、不飽和炭化水素基が熱分解を起こしてしまい好ましくない。また、焼成前にあらかじめ予備加熱を行っても良いし、減圧下で予備加熱および焼成を行ってもよい。 Moreover, after apply | coating to the glass surface, it is preferable to harden | cure by heating at 100-500 degreeC. When the heating temperature is 100 ° C. or lower, film curing does not proceed sufficiently, which is not preferable. When the heating temperature is 500 ° C. or higher, the aromatic or aromatic hydrocarbon group, saturated hydrocarbon group, or unsaturated hydrocarbon group causes thermal decomposition, which is not preferable. In addition, preheating may be performed in advance before firing, or preheating and firing may be performed under reduced pressure.
表面をコートしたガラスからのナトリウム成分の溶出量が、Na2O換算で0.01μg/cm2以下であることが好ましい。0.01μg/cm2以上の場合、素子特性劣化が起こり、例えば液晶表示素子では、画質の劣化やコントラストの低下が起こるためである。 It is preferable that the elution amount of the sodium component from the glass coated on the surface is 0.01 μg / cm 2 or less in terms of Na 2 O. In the case of 0.01 μg / cm 2 or more, device characteristic deterioration occurs, and for example, in a liquid crystal display device, image quality deterioration and contrast decrease occur.
表面をコートした2mm厚のソーダライムガラスが波長380〜800nmのすべての領域において90%以上であることが好ましい。90%以下の場合、例えば液晶表示素子では、バックライトの光をロスしてしまい、十分な輝度、画質、コントラストを維持できないため好ましくない。 The surface-coated 2 mm soda lime glass is preferably 90% or more in the entire region of a wavelength of 380 to 800 nm. In the case of 90% or less, for example, a liquid crystal display element is not preferable because the light of the backlight is lost and sufficient luminance, image quality, and contrast cannot be maintained.
300〜400℃で24時間加熱した後も、表面をコートした2mm厚のソーダライムガラスの透過率が波長380〜800nmのすべての領域において90%以上であることが好ましい。アモルファスシリコンTFTの製造プロセス温度は300〜400℃であるため、特にこの温度域で劣化が起こらないことが望ましい。90%以下の場合、例えば液晶表示素子では、バックライトの光をロスしてしまい、十分な輝度、画質、コントラストを維持できないため好ましくない。 Even after heating at 300 to 400 ° C. for 24 hours, it is preferable that the transmittance of the 2 mm thick soda lime glass whose surface is coated is 90% or more in all regions of wavelengths of 380 to 800 nm. Since the manufacturing process temperature of the amorphous silicon TFT is 300 to 400 ° C., it is desirable that deterioration does not occur particularly in this temperature range. In the case of 90% or less, for example, a liquid crystal display element is not preferable because the light of the backlight is lost and sufficient luminance, image quality, and contrast cannot be maintained.
300〜400℃で24時間加熱した後も、表面をコートした2mm厚のソーダライムガラスの透過率が波長300〜380nmのすべての領域において50%以上であることが好ましい。50%以下の場合、UV透過性が低いため、例えば液晶ディスプレイのTFT基板とカラーフィルタをUV硬化樹脂で貼り合わせる場合、硬化時間が長くなる問題がある。特に、ガラス基板上に透明導電膜、絶縁膜、半導体膜、金属膜等を成膜した後、ガラス基板の裏面より波長300nm付近の紫外線を照射する背面露光法によるフォトリソグラフィによってTFT素子を形成する場合、紫外域におけるガラス基板の透過率も高い方が良い。 Even after heating at 300 to 400 ° C. for 24 hours, the transmittance of the 2 mm-thick soda lime glass coated on the surface is preferably 50% or more in all regions having a wavelength of 300 to 380 nm. When it is 50% or less, the UV transmittance is low, and therefore, for example, when a TFT substrate of a liquid crystal display and a color filter are bonded with a UV curable resin, there is a problem that the curing time becomes long. In particular, after forming a transparent conductive film, an insulating film, a semiconductor film, a metal film, etc. on a glass substrate, a TFT element is formed by photolithography based on a back exposure method in which ultraviolet light having a wavelength of about 300 nm is irradiated from the back surface of the glass substrate. In this case, it is preferable that the transmittance of the glass substrate in the ultraviolet region is also high.
また、近年、注目されている有機エレクトロルミネッセンス(有機EL)ディスプレイ用基板として用いる場合、赤、緑、青の有機蛍光体を発光のうち、発光効率が低い青色の光に対応する波長域におけるガラスの透過率は高い方が良い。 In addition, when used as a substrate for organic electroluminescence (organic EL) display that has been attracting attention in recent years, glass in a wavelength region corresponding to blue light with low luminous efficiency among red, green and blue organic phosphors. Higher transmittance is better.
−30℃で24時間冷却した後も、表面をコートしたガラスに剥離や外観変化が起こらないことが好ましい。膜の剥離や外観上の変化が起こると、十分なアルカリ溶出防止性能が得られないためである。 Even after cooling at −30 ° C. for 24 hours, it is preferable that the glass whose surface is coated does not peel or change its appearance. This is because when the film peels off or changes in appearance, sufficient alkali elution prevention performance cannot be obtained.
有機無機ハイブリッドコーティング材の膜厚は0.1〜2μmであることが好ましい。膜厚が0.1μm以下の場合、アルカリ成分の溶出を抑えることができず好ましくない。膜厚が2μm以上の場合、膜面にムラやクラックが発生しやすく好ましくない。 The film thickness of the organic / inorganic hybrid coating material is preferably 0.1 to 2 μm. When the film thickness is 0.1 μm or less, elution of alkali components cannot be suppressed, which is not preferable. When the film thickness is 2 μm or more, unevenness and cracks are likely to occur on the film surface, which is not preferable.
(実施例)
以下、実施例により本発明を具体的に説明する。なお、本実施例および比較例で得られたサンプルは、以下に示す方法により品質評価を行った。
(Example)
Hereinafter, the present invention will be described specifically by way of examples. The samples obtained in the examples and comparative examples were evaluated for quality by the following method.
[外観評価]:サンプルの外観、クラックの有無を目視で評価し、問題ないものを合格(○)、問題のあったものを不合格(×)とした。 [Appearance evaluation]: The appearance of the sample and the presence or absence of cracks were visually evaluated. Those having no problem were evaluated as acceptable (◯), and those having problems were regarded as unacceptable (x).
[膜厚測定]コーティング直後にあらかじめ膜を剥離させて焼成し、ソーダライムガラスとの段差を触針式表面粗さ計(小坂研究所製、ET4000A)を用いて測定した。 [Film Thickness Measurement] Immediately after coating, the film was peeled off in advance and baked, and the level difference from soda lime glass was measured using a stylus type surface roughness meter (manufactured by Kosaka Laboratory, ET4000A).
[アルカリ溶出試験]両面コーティングを施した50mm×60mmの試料8枚(面積480cm2)を純水100cc中に浸漬させ、100℃のホットバス中で1時間煮沸を行った。得られた溶出液10mlを分取し、塩酸を加え全量25mlとして測定液とした。得られた測定液の原子吸光分析(日立製、Z−5000)を行い、ナトリウム成分の溶出量を測定した。 [Alkali dissolution test] Eight 50 mm × 60 mm samples (area 480 cm 2 ) subjected to double-side coating were immersed in 100 cc of pure water and boiled in a hot bath at 100 ° C. for 1 hour. 10 ml of the obtained eluate was collected, and hydrochloric acid was added to make a total volume of 25 ml to obtain a measurement solution. The obtained measurement liquid was subjected to atomic absorption analysis (manufactured by Hitachi, Z-5000), and the elution amount of the sodium component was measured.
[透過率測定]分光光度計(日立製、U−4000)を用いて、透過スペクトルを測定した。紫外領域300−380nmの透過率が50%以上、可視光領域380−800nmの透過率が90%以上のものを合格(○)とした。 [Transmittance Measurement] The transmission spectrum was measured using a spectrophotometer (Hitachi, U-4000). A sample having a transmittance in the ultraviolet region 300-380 nm of 50% or more and a transmittance in the visible light region 380-800 nm of 90% or more was evaluated as acceptable (◯).
[耐熱試験]300℃の焼成炉で24時間サンプルを加熱し、透過率測定を行った。 [Heat resistance test] The sample was heated in a baking furnace at 300 ° C for 24 hours, and the transmittance was measured.
[低温試験]−30℃で24時間保持し、サンプルの外観、クラックの有無を目視で評価し、問題ないものを合格(○)、問題のあったものを不合格(×)とした。 [Low temperature test] The sample was held at -30 ° C for 24 hours, and the appearance of the sample and the presence or absence of cracks were visually evaluated.
結果を表1に示す。 The results are shown in Table 1.
室温で21.7mlのフェニルトリエトキシシラン(PhSi(OEt)3)、23.9mlのメチルトリエトキシシラン(MeSi(OEt)3)、5.3mlのジメチルジエトキシシラン(Me2Si(OEt)2)、12.6mlのビニルトリエトキシシラン(ViSi(OEt)3)、108mlの水、87.2mlのエタノール、1.7mlの酢酸を混合した。混合溶液を100℃で4時間加熱した後、30℃で1時間減圧加熱して前駆体を得た。前駆体を酢酸イソブチルに溶解し、固形分濃度10重量%の溶液とした。この溶液を厚さ2mmのソーダライムガラス表面に引き上げ速度4mm/secでディップコーティングし、250℃で1時間加熱して、ガラス上に厚さ0.3μmの無色透明な膜を作製した。 Phenyltriethoxysilane 21.7ml at room temperature (PhSi (OEt) 3), methyltriethoxysilane 23.9ml (MeSi (OEt) 3) , dimethyl diethoxy silane 5.3ml (Me 2 Si (OEt) 2 ), 12.6 ml vinyltriethoxysilane (ViSi (OEt) 3 ), 108 ml water, 87.2 ml ethanol, 1.7 ml acetic acid. The mixed solution was heated at 100 ° C. for 4 hours and then heated under reduced pressure at 30 ° C. for 1 hour to obtain a precursor. The precursor was dissolved in isobutyl acetate to obtain a solution having a solid concentration of 10% by weight. This solution was dip-coated on a 2 mm thick soda lime glass surface at a lifting speed of 4 mm / sec and heated at 250 ° C. for 1 hour to produce a 0.3 μm thick colorless transparent film on the glass.
上記方法にて得られた被膜は、表1に示すように、アルカリ溶出量が低く、透過率、耐熱性に優れた被膜であることが確認された。 As shown in Table 1, the film obtained by the above method was confirmed to be a film having a low alkali elution amount and excellent transmittance and heat resistance.
固形分濃度を20wt%とした以外は実施例1と同様の操作を行い、ガラス上に厚さ1.8μmの無色透明な膜を作製した。 A colorless transparent film having a thickness of 1.8 μm was produced on glass by performing the same operation as in Example 1 except that the solid content concentration was 20 wt%.
上記方法にて得られた被膜は、表1に示すように、アルカリ溶出量が低く、透過率、耐熱性に優れた被膜であることが確認された。 As shown in Table 1, the film obtained by the above method was confirmed to be a film having a low alkali elution amount and excellent transmittance and heat resistance.
室温で28.9mlのフェニルトリエトキシシラン(PhSi(OEt)3)、29.9mlのメチルトリエトキシシラン(MeSi(OEt)3)、6.7mlのテトラエトキシシラン(Si(OEt)4)、108mlの水、87.2mlのエタノール、1.7mlの酢酸を混合した。混合溶液を100℃で4時間加熱した後、30℃で1時間減圧加熱して前駆体を得た。前駆体を酢酸イソブチルに溶解し、固形分濃度10重量%の溶液とした。この溶液を厚さ2mmのソーダライムガラス表面に引き上げ速度4mm/secでディップコーティングし、250℃で1時間加熱し、ガラス上に厚さ0.3μmの無色透明な膜を作製した。 28.9 ml phenyltriethoxysilane (PhSi (OEt) 3 ), 29.9 ml methyltriethoxysilane (MeSi (OEt) 3 ), 6.7 ml tetraethoxysilane (Si (OEt) 4 ), 108 ml at room temperature Of water, 87.2 ml ethanol, 1.7 ml acetic acid. The mixed solution was heated at 100 ° C. for 4 hours and then heated under reduced pressure at 30 ° C. for 1 hour to obtain a precursor. The precursor was dissolved in isobutyl acetate to obtain a solution having a solid concentration of 10% by weight. This solution was dip-coated on a 2 mm thick soda lime glass surface at a pulling rate of 4 mm / sec and heated at 250 ° C. for 1 hour to produce a 0.3 μm thick colorless and transparent film on the glass.
上記方法にて得られた被膜は、表1に示すように、アルカリ溶出量が低く、透過率、耐熱性に優れた被膜であることが確認された。 As shown in Table 1, the film obtained by the above method was confirmed to be a film having a low alkali elution amount and excellent transmittance and heat resistance.
室温で28.9mlのフェニルトリエトキシシラン(PhSi(OEt)3)、29.8mlのメチルトリエトキシシラン(MeSi(OEt)3)、5.3mlのジメチルジエトキシシラン(Me2Si(OEt)2)、108mlの水、87.2mlのエタノール、1.7mlの酢酸を混合した。混合溶液を100℃で4時間加熱した後、30℃で1時間減圧加熱して前駆体を得た。前駆体を酢酸イソブチルに溶解し、固形分濃度10重量%の溶液とした。この溶液を厚さ2mmのソーダライムガラス表面に引き上げ速度4mm/secでディップコーティングし、250℃で1時間加熱して、ガラス上に厚さ0.3μmの無色透明な膜を作製した。 Phenyltriethoxysilane 28.9ml at room temperature (PhSi (OEt) 3), methyltriethoxysilane 29.8ml (MeSi (OEt) 3) , dimethyl diethoxy silane 5.3ml (Me 2 Si (OEt) 2 ), 108 ml water, 87.2 ml ethanol, 1.7 ml acetic acid. The mixed solution was heated at 100 ° C. for 4 hours and then heated under reduced pressure at 30 ° C. for 1 hour to obtain a precursor. The precursor was dissolved in isobutyl acetate to obtain a solution having a solid concentration of 10% by weight. This solution was dip-coated on a 2 mm thick soda lime glass surface at a lifting speed of 4 mm / sec and heated at 250 ° C. for 1 hour to produce a 0.3 μm thick colorless transparent film on the glass.
上記方法にて得られた被膜は、表1に示すように、アルカリ溶出量が低く、透過率、耐熱性に優れた被膜であることが確認された。 As shown in Table 1, the film obtained by the above method was confirmed to be a film having a low alkali elution amount and excellent transmittance and heat resistance.
室温で36.2mlのフェニルトリエトキシシラン(PhSi(OEt)3)、29.9mlのメチルトリエトキシシラン(MeSi(OEt)3)、108mlの水、87.2mlのエタノール、1.7mlの酢酸を混合した。混合溶液を100℃で4時間加熱した後、30℃で1時間減圧加熱して前駆体を得た。前駆体を酢酸イソブチルに溶解し、固形分濃度10重量%の溶液とした。この溶液を厚さ2mmのソーダライムガラス表面に引き上げ速度4mm/secでディップコーティングし、250℃で1時間加熱して、ガラス上に厚さ0.3μmの無色透明な膜を作製した。 At room temperature 36.2 ml phenyltriethoxysilane (PhSi (OEt) 3 ), 29.9 ml methyltriethoxysilane (MeSi (OEt) 3 ), 108 ml water, 87.2 ml ethanol, 1.7 ml acetic acid. Mixed. The mixed solution was heated at 100 ° C. for 4 hours and then heated under reduced pressure at 30 ° C. for 1 hour to obtain a precursor. The precursor was dissolved in isobutyl acetate to obtain a solution having a solid concentration of 10% by weight. This solution was dip-coated on a 2 mm thick soda lime glass surface at a lifting speed of 4 mm / sec and heated at 250 ° C. for 1 hour to produce a 0.3 μm thick colorless transparent film on the glass.
上記方法にて得られた被膜は、表1に示すように、アルカリ溶出量が低く、透過率、耐熱性に優れた被膜であることが確認された。 As shown in Table 1, the film obtained by the above method was confirmed to be a film having a low alkali elution amount and excellent transmittance and heat resistance.
(比較例1)
厚さ2mmのソーダライムガラスを100℃の純水中に1時間浸漬し、純水中に溶出したナトリウム成分を原子吸光分析法によって求めたところ、0.21μg/cm2であり、0.01μg/cm2を超えているため、無アルカリガラスの代替基板として使用することができなかった。
(Comparative Example 1)
A soda lime glass having a thickness of 2 mm was immersed in pure water at 100 ° C. for 1 hour, and the sodium component eluted in the pure water was determined by atomic absorption spectrometry. As a result, it was 0.21 μg / cm 2 and 0.01 μg Since it exceeded / cm 2 , it could not be used as a substitute substrate for non-alkali glass.
本発明は、液晶ディスプレイのTFT用基板、有機エレクトロルミネッセンス(有機EL)ディスプレイ用基板等の表示素子用基板として利用可能である。その他に、化粧品用瓶、薬品用瓶等、アルカリ溶出を防止したガラス製容器として利用可能である。 The present invention can be used as a substrate for a display element such as a substrate for a TFT of a liquid crystal display or a substrate for an organic electroluminescence (organic EL) display. In addition, it can be used as a glass container which prevents alkali elution, such as a cosmetic bottle and a chemical bottle.
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