JP4848826B2 - Infrared sensor - Google Patents

Description

  The present invention relates to an infrared sensor.

  Conventionally, as a thermal infrared sensor, a temperature detection unit is arranged away from one surface of a base substrate, and the temperature detection unit is attached to the base substrate via a heat insulating unit that thermally insulates the temperature detection unit and the base substrate. A supported infrared sensor has been proposed (see, for example, Patent Document 1).

  In the infrared sensor disclosed in Patent Document 1, the heat insulating portion is disposed apart from the one surface of the base substrate, and the temperature detecting portion is stacked on the side opposite to the base substrate side. It consists of two legs extended from the side edge, a gap is formed between the support part and the one surface of the base substrate, and metal wiring connected to the temperature detection part is attached to each leg part. Are formed along. Here, in the infrared sensor disclosed in Patent Document 1, the heat insulating portion is formed by patterning a laminated film of a silicon oxide film and a silicon nitride film. Moreover, in the infrared sensor disclosed in Patent Document 1, an infrared absorption layer that absorbs infrared rays is stacked on the temperature detection unit.

In Patent Document 1, an infrared sensor (infrared image) in which sensor units each including an infrared absorption layer and a temperature detection unit are arranged in a two-dimensional array (matrix shape) and each sensor unit constitutes a pixel. Sensor) is also disclosed.
JP 2000-97765 A

  By the way, in the infrared sensor disclosed in the above-mentioned Patent Document 1, improvement in performance such as sensitivity and response speed is expected, and in order to increase sensitivity by increasing the temperature change of the temperature detection unit due to infrared absorption. Increase the infrared absorption efficiency by increasing the overall length of each leg in the heat insulating part to reduce the thermal conductance of each leg (increasing the thermal resistance) and increasing the thickness of the infrared absorbing layer. It is possible.

  However, in the infrared sensor disclosed in Patent Document 1, if the length of each leg is increased without changing the size of the temperature detector, the size of the entire sensor increases, The heat capacity of the leg portion is increased and the response speed is lowered. On the other hand, when the thickness dimension of the infrared absorption layer is increased, the heat capacity of the infrared absorption layer is increased and the response speed is lowered. Further, in the infrared sensor disclosed in Patent Document 1, it is conceivable to reduce the thickness of the support portion in order to reduce the heat capacity of the support portion in the heat insulating portion. Will be limited in thickness.

  The present invention has been made in view of the above-described reasons, and an object thereof is to provide an infrared sensor capable of achieving high performance.

According to the first aspect of the present invention, there is provided a base substrate, a temperature detection unit that absorbs infrared rays and detects a temperature change due to the absorption, and a temperature detection unit such that the temperature detection unit is disposed away from one surface of the base substrate. And a heat insulating part that thermally insulates the temperature detecting part and the base substrate, the heat insulating part being spaced apart from the one surface of the base substrate and provided with a temperature detecting part, and a supporting part And a leg portion connecting the base substrate and the temperature detection portion is formed in a meandering shape on the entire surface of the support portion opposite to the base substrate side, and the support portion is the support portion. a plurality of holes penetrating in a thickness direction of, the entire plane perpendicular to the thickness direction, uniformly arranged, and the temperature detector and the holes, and characterized in that they are not interfering positionally To do.

According to this invention, since the plurality of holes penetrating in the thickness direction of the support portion are formed in the support portion, the heat capacity of the support portion can be reduced without reducing the thickness of the support portion, and the response speed Speed up .
According to a second aspect of the present invention, in the first aspect of the present invention, the supporting portion is configured such that the holes are uniformly provided along the meandering shape of the temperature detecting portion throughout the entire surface. It is characterized by.

The invention according to claim 3, in the invention of claim 1 or claim 2, wherein the supporting portion, that before Kisoraana a portion corresponding to the lattice points of a virtual two-dimensional grating is being eclipsed set Features.

  According to this invention, the heat insulation of the support part can be improved while preventing a decrease in the mechanical strength of the support part.

The invention of claim 4 is the invention of claim 1 or billed to claim 3, wherein the supporting unit is characterized by comprising formed by a porous material.

  According to this invention, compared with the case where the said support part is formed with a non-porous material, the heat capacity of the said support part can be reduced and the response speed can be further increased.

According to a fifth aspect of the present invention, in the first to fourth aspects of the present invention, the leg portion is formed of a porous material.

  According to the present invention, compared with the case where the leg is made of a non-porous material, the thermal conductance of the leg can be reduced, the sensitivity can be improved, and the heat capacity of the leg can be reduced, thereby responding. The speed can be increased.

The invention of claim 6, claim 4 or in the invention of claim 5, wherein the porous material is silicon oxide porous silicon oxide based organic polymer porous silicon oxide-based inorganic polymer porous It is a material selected from the group.

  According to this invention, in the formation of the portion formed of the porous material in the heat insulating portion, it is possible to employ a process in which a sol-gel solution is spin-coated on the one surface side of the base substrate and then dried. It is possible to easily form the heat insulating portion.

  The invention of claim 1 has the effect of achieving high performance.

  Hereinafter, the infrared sensor of the present embodiment will be described with reference to FIG.

  The infrared sensor of this embodiment absorbs infrared rays, and a rectangular plate-like base substrate 1 composed of a silicon substrate 1a and an insulating film 1b made of a silicon oxide film formed on one surface side of the silicon substrate 1a. In addition, the temperature detection unit 3 that detects a temperature change due to the absorption and the temperature detection unit 3 are supported so that the temperature detection unit 3 is spaced apart from one surface of the base substrate 1 (upper surface in FIG. 1B). And a heat insulating part 4 for thermally insulating the temperature detecting part 3 and the base substrate 1.

  The heat insulating part 4 is arranged spaced apart from the one surface of the base substrate 1 and connects the support part 41 and the base substrate 1 to the support part 41 where the temperature detection part 3 is formed on the side opposite to the base substrate 1 side. The two leg portions 42 and 42 are provided. The heat insulating part 4 will be described later.

  The temperature detection unit 3 is a bolometer-type sensing element whose electric resistance value changes according to temperature, and includes a sensor layer including a titanium film on the support unit 41 side and a titanium nitride film on the titanium film. . Here, the titanium nitride film is provided as an antioxidant film for the titanium film. Note that the material of the sensor layer is not limited to titanium, and for example, amorphous silicon, vanadium oxide, or the like may be employed. The temperature detector 3 is not limited to a sensing element whose electric resistance value changes according to temperature, but includes a sensing element whose dielectric constant changes according to temperature, a thermopile type sensing element, a pyroelectric type sensing element, and the like. Even if any sensing element is employed, it can be formed by using a general thin film forming technique by appropriately selecting a material. Here, for example, PZT, BST, or the like may be employed as the material of the sensing element whose dielectric constant changes depending on the temperature.

  The temperature detection unit 3 is formed in a meandering shape (here, a zigzag shape), and both ends extend along the legs 42, 42 of the heat insulating unit 4. Are electrically connected to the conductor patterns 10 and 10 made of a metal film (for example, an Al—Si film) on the one surface of the base substrate 1. Here, in the present embodiment, the same material as that of the sensor layer constituting the temperature detection unit 3 is adopted as the material of the wires 8 and 8 (here, a laminated film of a titanium film and a titanium nitride film), and the wires 8, 8 and the temperature detector 3 are formed simultaneously. In the present embodiment, Al—Si is adopted as the material of each conductor pattern 10, 10, and a part of each conductor pattern 10, 10 constitutes a pad. Therefore, temperature detection is performed through a pair of pads. The output of the unit 3 can be taken out to the outside.

  Moreover, in the infrared sensor of this embodiment, the infrared reflective film 6 that reflects the infrared light transmitted through the temperature detection unit 3 and the support unit 41 toward the temperature detection unit 3 is provided on the one surface of the base substrate 1. . Here, the infrared sensor of the present embodiment assumes infrared of a wavelength band of 8 μm to 13 μm radiated from the human body as the detection target infrared, and uses Al—Si as the material of the infrared reflecting film 6. ing.

  The leg portions 42 in the above-described heat insulating portion 4 include two cylindrical support post portions 42 a and 42 a erected on the conductor patterns 10 and 10 on the one surface side of the base substrate 1, and each support post portion. 42a and 42a are composed of beam portions 42b and 42b that connect the support portion 41 with the upper ends thereof, and a gap 7 is formed between the support portion 41 and the base substrate 1. Here, the outer peripheral shape of the support part 41 is a rectangular shape, and each beam part 42b, 42b is extended from the one end part of the longitudinal direction of the one side edge of the support part 41 in the direction orthogonal to the said one side edge. It is formed in a planar shape that extends along the direction from the one end to the other end of the one side edge, and has rotational symmetry with respect to the central axis along the thickness direction of the support portion 41. Is arranged. In addition, the line width of the part formed on the beam portions 42b and 42b of the leg portions 42 and 42 in the wirings 8 and 8 is the beam portion 42b in order to suppress heat transfer through the wires 8 and 8. , 42b is set to be sufficiently smaller than the width dimension. Moreover, the site | part currently formed in support post part 42a, 42a among wiring 8 and 8 is formed ranging over the whole inner peripheral surface of support post part 42a, 42a, and the surface of conductor pattern 10,10. The support post portions 42 a and 42 a are reinforced by the wires 8 and 8.

  By the way, in the infrared sensor of this embodiment, the support part 41 in the heat insulation part 4 is formed with a plurality of circular holes 41b penetrating in the thickness direction of the support part 41 (vertical direction in FIG. 1B). ing. Here, the support portion 41 is provided with a plurality of holes 41 b in a two-dimensional array in a plane orthogonal to the thickness direction of the support portion 41. Specifically, the support portion 41 is provided with holes 41b at portions corresponding to respective lattice points of a virtual two-dimensional square lattice having a square unit lattice.

  Moreover, in the infrared sensor of this embodiment, the leg parts 42 and 42 and the support part 41 of the heat insulation part 4 are formed with the porous material. Here, porous silica, which is a kind of porous silicon oxide, is employed as the porous material of the legs 42, 42 of the heat insulating part 4 and the support part 41, but a kind of porous silicon oxide-based organic polymer. Methyl-containing polysiloxane, Si-H-containing polysiloxane which is a kind of porous silicon oxide-based inorganic polymer, silica aerogel, etc. may be employed. As the porous material, porous silicon oxide, If a material selected from the group consisting of a silicon oxide organic polymer and a porous silicon oxide inorganic polymer is employed, a sol-gel solution is spin-coated on the one surface side of the base substrate 1 in forming the heat insulating portion 4. Therefore, a drying process can be adopted, and the heat insulating portion 4 can be easily formed.

  Here, the leg portions 42 and 42 in the present embodiment are composed of a porous silica film (porous silicon oxide film) having a porosity of 60%. However, if the porosity is too small, a sufficient heat insulating effect can be obtained. If the porosity is too large, the mechanical strength is weakened and it is difficult to form a structure. Therefore, the porosity of the porous silica film may be appropriately set within a range of, for example, about 40% to 80%.

Here, the total thermal conductance G of the two leg portions 42 and 42 is such that the thermal conductivity of the material of the leg portion 42 is α [W / (m · K)], the length of the leg portion 42 is L [μm], If the cross-sectional area of the leg portion 42 is S, G = 2 × α × (S / L). However, if the material of the leg portion 42 is SiO ₂ , α = 1.4 [W / (M · K)], L = 50 [μm], S = 10 [μm ² ], the thermal conductance G is
G = 2 × α × (S / L) = 560 × 10 ⁻⁹ [W / K].

On the other hand, when the leg portion 42 is composed of a porous silica film having a porosity of 60% as in this embodiment, α = 0.05 [W / (m · K)], L = 50 [μm] and S = 10 [μm ² ], the thermal conductance G is
G = 2 × α × (S / L) = 2.0 × 10 ⁻⁸ [W / K]
Thus, the thermal conductance G can be set to a value smaller than one tenth of the thermal conductance G of the comparative example in which the leg portion 42 is formed of a silicon oxide film, and the heat transfer through the leg portions 42 and 42 can be further improved. It can be suppressed and high sensitivity can be achieved.

Further, the heat capacity C of the support portion 41 is such that the volume specific heat of the support portion 41 is c _v , the area of the support portion 41 (area of the cross section perpendicular to the thickness direction) is A [μm ² ], and the thickness of the support portion 41 is d. If [μm], C = c _v × A × d. Here, if the material of the support portion 41 is SiO ₂ , c _v = 1.8 × 10 ⁶ [J / (m ³ · K)], A = 2500 [μm ² ], d = 0. If 5 [μm], the heat capacity C of the support portion 41 is
C = c _v × A × d = 22.6 × 10 ⁻¹⁰ [J / K].

On the other hand, as in the present embodiment, when the support portion 41 is made of a porous silica film having a porosity of 60% and a plurality of pores 41b are not provided, c _v = 0.88 × 10. ⁶ [J / (m ³ · K)], A = 2500 [μm ² ], d = 0.5 [μm], the heat capacity C of the support 41 is
C = c _v × A × d = 11.0 × 10 ⁻¹⁰ [J / K]
Thus, the heat capacity C of the support portion 41 can be set to a value smaller than half that of the comparative example in which the support portion 41 is made of a silicon oxide film, and the time constant is reduced to increase the response speed. I can plan. In addition, in the present embodiment, since the support portion 41 is provided with a plurality of holes 41b, the volume of the support portion 41 is reduced by providing the plurality of holes 41b compared to the case where each hole 41b is not provided. As a result, the heat capacity C of the support portion 41 is
C = 0.8 × (11.0 × 10 ⁻¹⁰ ) = 8.8 × 10 ⁻¹⁰ [J / K]
Thus, the heat capacity of the support portion 41 can be made smaller, and the response speed can be further increased.

  Hereinafter, the manufacturing method of the infrared sensor of this embodiment is demonstrated, referring FIGS. 2 to 3, similarly to FIG. 1B, a cross section of a portion corresponding to the A-A ′ cross section of FIG.

  First, an insulating film 1b made of a silicon oxide film is formed on one surface side of a single crystal silicon substrate (wafer until dicing described later) 1a as a basis of the base substrate 1 by, for example, a thermal oxidation method. The structure shown in 2 (a) is obtained.

  Thereafter, a metal film made of the material of the conductor patterns 10 and 10 and the infrared reflection film 6 (for example, on the entire surface of one surface side (the upper surface side in FIG. 2A) of the base substrate 1 made of the silicon substrate 1a and the insulating film 1b (for example, , Al-Si film, etc.) are formed by sputtering or the like, and then the metal film is patterned by using a photolithography technique and an etching technique, thereby forming conductor patterns 10, 10 each consisting of a part of the metal film, and By forming the infrared reflective film 6, the structure shown in FIG. 2B is obtained.

  Next, a sacrificial layer 21 made of a resist layer is formed by spin-coating a resist on the entire surface of the one surface side of the base substrate 1, and then the support post portions 42 a and 42 a of the sacrificial layer 21 are to be formed. The portions shown in FIG. 2C are obtained by etching the portions corresponding to the regions to form the circular opening portions 23 and 23 that expose the surfaces of part of the conductor patterns 10 and 10.

  Subsequently, a porous film 40 made of a porous material (for example, porous silica, silica airgel, etc.) that is a material of the heat insulating portion 4 is formed on the entire surface of the one surface side of the base substrate 1, thereby FIG. The structure shown in d) is obtained. Here, in forming the porous film 40, when the porous material is porous silica, a process is adopted in which a sol-gel solution is spin-coated on the one surface side of the base substrate 1 and then dried by heat treatment. When the porous material is silica aerogel, a process of spin-coating the sol-gel solution on the one surface side of the base substrate 1 and drying it by supercritical drying is adopted. By doing so, it can be easily formed.

  After forming the porous film 40 described above, the heat insulating part 4 (support part 41 and leg parts 42 and 42) is formed by patterning the porous film 40 using a photolithography technique and an etching technique. The structure shown in FIG.

  Thereafter, the sensor material layer 30 formed of a laminated film of a titanium film and a titanium nitride film serving as a base of the sensor layer and the wirings 8 and 8 is formed on the entire surface of the one surface side of the base substrate 1 by sputtering or the like. The structure shown in FIG.

  Next, by patterning the sensor material layer 30 using the photolithography technique and the etching technique, the temperature detection part 3 and the wirings 8 and 8 each consisting of a part of the sensor material layer 30 are formed, whereby FIG. The structure shown in c) is obtained.

  Subsequently, by selectively etching away the sacrificial layer 21 on the one surface side of the base substrate 1 to obtain an infrared sensor having a structure shown in FIG. 3D, individual infrared sensors are obtained by dicing. What is necessary is just to divide into.

  In the infrared sensor of the present embodiment described above, a plurality of holes 41b penetrating in the thickness direction of the support portion 41 are formed in the support portion 41 of the heat insulating portion 4 that thermally insulates the temperature detecting portion 3 and the base substrate 1. Therefore, the heat capacity of the support portion 41 can be reduced without reducing the thickness of the support portion 41, and the response speed can be increased. In the infrared sensor of this embodiment, since the plurality of holes 41b described above are provided in a two-dimensional array in a plane orthogonal to the thickness direction of the support part 41 in the support part 41, the machine of the support part 41 The heat insulation of the support part 41 can be improved while preventing a decrease in the mechanical strength.

Further, in the infrared sensor of the present embodiment, since the support portion 41 is formed by a porous material, as compared with the case where the support portion 41 is formed by a non-porous material such as SiO ₂ or Si ₃ N ₄ The heat capacity of the support portion 41 can be reduced, and the response speed can be further increased. Furthermore, in the infrared sensor of this embodiment, since the leg part 42 in the heat insulation part 4 is also formed of a porous material, the leg part 42 is formed of a non-porous material such as SiO ₂ or Si ₃ N ₄ . Compared to the case, the thermal conductance of the leg portion 42 can be reduced to increase the sensitivity, and the heat capacity of the leg portion 42 can be reduced to increase the response speed.

  Moreover, in the infrared sensor of this embodiment, the infrared reflective film 6 that reflects the infrared light transmitted through the temperature detection unit 3 and the support unit 41 toward the temperature detection unit 3 is provided on the one surface side of the base substrate 1. Therefore, the infrared absorption efficiency in the temperature detection unit 3 can be increased, and the temperature detection unit 3 can be highly sensitive.

  By the way, the support part 41 demonstrated by the above-mentioned embodiment is circular at each site | part corresponding to each lattice point of the virtual two-dimensional square lattice whose unit cell is a square with respect to a sheet-like porous silica film. The unit cell is not limited to a square but may be a regular triangle, for example, and in this case, the unit cell corresponds to each lattice point of a virtual two-dimensional triangular lattice having a regular triangle. What is necessary is just to provide the hole 41b in the site | part to perform. Moreover, the opening shape (plan view shape) of the air holes 41b formed in the support portion 41 is not limited to a circular shape, and may be another opening shape such as a triangular shape, a rectangular shape, or a regular hexagonal shape. For example, when the opening shape of the holes 41b is a regular hexagonal shape, the arrangement density of the holes 41b can be increased as compared with the case where the opening shape of the holes 41b is a circular shape, as shown in FIG. Thus, by arranging the holes 41b in a honeycomb shape, the volume of the support portion 41 can be further reduced, and the heat capacity of the support portion 41 can be reduced.

  The infrared sensor described in the above embodiment is an infrared detection element provided with only one temperature detection unit 3. However, the temperature detection unit 3 is arranged in a two-dimensional array (matrix shape), and each temperature detection unit is arranged. May be an infrared image sensor that constitutes a pixel. In the infrared sensor described in the above embodiment, the temperature detection unit 3 is provided on the side of the support unit 41 opposite to the base substrate 1 side. However, the temperature detection unit 3 is provided on the base substrate 1 side of the support unit 41. It may be provided.

1A is a schematic perspective view, and FIG. 2B is a schematic cross-sectional view taken along line A-A ′ of FIG. It is principal process sectional drawing for demonstrating the manufacturing method same as the above. It is principal process sectional drawing for demonstrating the manufacturing method same as the above. It is a principal part schematic plan view of the other structural example same as the above.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Base substrate 1a Silicon substrate 1b Insulating film 3 Temperature detection part 4 Heat insulation part 6 Infrared reflective film 7 Gap 8 Wiring 10 Conductive pattern 41 Support part 41b Hole 42 Leg part

Claims (6)

A temperature detection unit that supports the temperature detection unit so that the temperature detection unit is disposed away from one surface of the base substrate, and a temperature detection unit that absorbs infrared rays and detects a temperature change due to the absorption. And a heat insulating part that thermally insulates the base substrate, and the heat insulating part is arranged to be spaced apart from the one surface of the base substrate and the temperature detecting part is provided, and the support part and the base substrate are connected to each other. The temperature detection unit is formed in a meandering shape on the entire surface of the support unit opposite to the base substrate side, and the support unit includes a plurality of penetrating in the thickness direction of the support unit. infrared sensor cavities is across a plane orthogonal to the thickness direction, uniformly arranged, and the temperature detector and the holes, characterized in that they are not interfering positionally in. 2. The infrared sensor according to claim 1, wherein the support portion is provided with the holes uniformly along the meandering shape of the temperature detection portion throughout the surface . 3. The infrared sensor according to claim 1 , wherein the support portion is provided with the holes at portions corresponding to lattice points of a virtual two-dimensional lattice . 4. The infrared sensor according to claim 1 , wherein the support portion is formed of a porous material. The legs, or infrared sensor mounting serial to one of claims 1 to 4, characterized in that is formed by a porous material. 6. The porous material according to claim 4, wherein the porous material is a material selected from the group consisting of porous silicon oxide, porous silicon oxide organic polymer, and porous silicon oxide inorganic polymer. The described infrared sensor.

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