JP4796902B2 - Substrate spin processing equipment - Google Patents

Description

  The present invention relates to a substrate spin processing apparatus for processing a substrate held on a rotary table with a first processing liquid and a second processing liquid.

  For example, in the manufacturing process of a liquid crystal display device, a circuit pattern is formed on a rectangular glass substrate. When forming a circuit pattern, the substrate is subjected to development processing, etching processing, resist stripping processing, or the like. When performing these processes, first, a developing solution, an etching solution, or a stripping solution is supplied as a first processing solution to the substrate to perform a predetermined processing, and then a cleaning solution such as pure water is supplied as a second processing solution. Then, a cleaning process is performed.

  Since the first processing solution such as a developing solution, an etching solution, or a stripping solution is expensive, it is used in a circulating manner. When the first treatment liquid is used in a circulating manner, the first treatment liquid and the second treatment liquid are collected without being mixed.

  On the other hand, a spin processing apparatus for processing with a processing liquid while rotating a substrate has a cup body. A rotating table is provided in the cup body. The rotary table is provided with support pins for supporting the lower surface and side surfaces of the four corners of the substrate. When processing is performed while rotating the rotary table and supplying the processing liquid to the substrate, the processing liquid supplied to the substrate is scattered around the periphery by centrifugal force.

When the processing liquid scattered from the substrate is reflected by the inner peripheral surface of the cup body and returns to the direction of the substrate, it adheres to the substrate and causes contamination. Therefore, Patent Document 1 shows that a rectifying ring inclined obliquely is provided on the inner peripheral surface of the cup body. By providing the rectifying ring, it is possible to prevent the processing liquid scattered from the substrate from reflecting downward and returning to the substrate.
JP 2002-261073 A

  However, the spin processing apparatus disclosed in Patent Document 1 does not show that the substrate is sequentially processed with the first processing liquid and the second processing liquid, and these processing liquids are separated and recovered. When separating and recovering the first treatment liquid and the second treatment liquid, the treatment liquid splashes from the substrate both when the substrate is treated with the first treatment liquid and when the treatment is performed with the second treatment liquid. Must be able to prevent it from returning to the substrate.

  However, since the spin processing apparatus disclosed in Patent Document 1 does not show that the two types of processing liquids are separated and recovered, the processing liquid that is scattered from the substrate when the two types of processing liquids are separated and recovered. It has not been shown to prevent each from returning to the substrate.

  In the present invention, when the substrate is sequentially processed with the first processing liquid and the second processing liquid, each processing liquid is separated and recovered, and each processing liquid scattered from the substrate returns to the substrate and adheres. It is an object of the present invention to provide a spin processing apparatus in which there is no problem.

The present invention is a spin processing apparatus for processing with a first processing liquid and a second processing liquid while rotating a rectangular substrate,
An outer cup body,
A second part provided in the outer cup body, a base part, a plurality of arms provided in the circumferential direction of the base part to support the substrate, and provided integrally with each arm, and the outer dimensions are provided in the inner cup body, which will be described later. A rotating table that has a disk-shaped shielding plate smaller than the inner diameter of the reflecting means, and is rotated by the rotation driving means in a state where the substrate is held by the arm ;
Up and down driving is performed by a vertical driving means between a descending position lower than the substrate, the upper end of which is provided in the outer cup body, and the upper end is held by the rotary table, and the upper end of the upper cup is held by the rotary table. An inner cup body provided as possible,
The second cup that is provided on the inner peripheral portion of the outer cup body and scatters from the peripheral portion of the substrate when the substrate is rotated and processed with the second processing liquid in a state where the inner cup body is in the lowered position. First reflecting means for reflecting the treatment liquid downward;
The first cup which is provided on the inner peripheral portion of the inner cup body and is scattered from the peripheral portion of the substrate when the inner cup body is rotated and the substrate is rotated and processed with the first processing liquid. A substrate spin processing apparatus comprising: a second reflecting means for reflecting the processing liquid downward.

  According to this invention, since the reflecting means for reflecting the processing liquid splashing from the peripheral portion of the substrate downward is provided on the inner peripheral portion of the outer cup body and the inner cup body, respectively, the inner cup body is raised to remove the substrate. In either case of processing with the first processing liquid or when the inner cup body is lowered and the substrate is processed with the second processing liquid, the processing liquid scattered from the substrate is reflected in the direction returning to the substrate. Can be prevented.

  An embodiment of the present invention will be described below with reference to the drawings.

  The spin processing apparatus shown in FIGS. 1 to 3 includes an outer cup body 1. The outer cup body 1 has a bottomed rectangular tube-shaped peripheral wall 1a whose upper surface is open, and an upper inclined wall 2 inclined at an angle of about 30 degrees radially inward is provided at the upper end of the peripheral wall 1a. It has been. A cylindrical vertical wall 3 is provided on the inner peripheral edge, which is the upper end of the upper inclined wall 2.

Struts 4a are provided at predetermined intervals in the circumferential direction in the middle in the height direction of the inner peripheral surface of the outer cup body 1, and brackets 4b having an L-shaped cross-section are fixed to each of the struts 4a. It has been. On the other side of the bracket 4b , a plurality of ring-shaped first reflecting plates as first reflecting means, in this embodiment, four first reflecting plates 6 are predetermined in the vertical direction via spacers 7. They are stacked at intervals.

A screw shaft 8 is inserted through the laminated first reflecting plate 6 and spacer 7. The screw shaft 8 is fixed to the bracket 4b . The first reflecting plate 6 has a tip portion that is highly inclined toward the inside in the radial direction of the outer cup body 1 at an angle of, for example, 30 degrees, and a through hole (not shown) is formed in the base end portion. This through hole allows the second treatment liquid dropped on the upper surface side of each first reflecting plate 6 to flow downward as will be described later. The outer cup body 1 is placed and fixed on the upper surface of the gantry 9.

  A rotary table 11 is provided in the outer cup body 1. The turntable 11 has a disk-like base portion 12, and four arms 13 are provided on the base portion 12 with their base ends connected and fixed at intervals of 90 degrees in the circumferential direction. An auxiliary arm 13 a shorter than the arm 13 is provided between a pair of adjacent arms 13.

  The base 12, the arm 13, and the auxiliary arm 13a are provided with support pins 14 that support the lower surface of a rectangular glass substrate W used in a liquid crystal display device. Furthermore, an engagement pin 15 that engages with a pair of side surfaces of each corner of the substrate W is provided at the tip of each arm 13.

  The height of the substrate W supported by the support pins 14 of the turntable 11 is the upper end of the lowermost reflector 6 among the four first reflectors 6 provided on the inner peripheral surface of the outer cup body 1. Higher than the upper end of the third reflecting plate 6 from the top.

  Accordingly, the third first reflecting plate 6 from the top serves as a first reflecting portion that reflects the second processing liquid scattered in the horizontal direction from the substrate W downward as described later. The first reflecting plate 6 is a second reflecting portion that reflects downward the second processing liquid scattered obliquely upward from the substrate W.

  As shown in FIG. 1, the base 12 of the turntable 11 is connected to a control motor 17 via a connecting cylinder 16. The control motor 17 is provided with a rotor 19 in a stator 18, and the lower end of the connecting cylinder 16 is connected to the rotor 19. Therefore, when the control motor 17 is operated, the rotary table 11 is rotationally driven in the counterclockwise direction indicated by an arrow in FIG. The control motor 17 is fixedly attached to the upper surface of the gantry 9.

  An inner cup body 21 is provided in the outer cup body 1. The inner cup body 21 has a ring portion 22 whose outer dimension is smaller than the inner diameter dimension of the outer cup body 1 and whose inner diameter dimension is larger than the outer dimension of the rotary table 11. The lower end of the peripheral wall 23 is connected and fixed.

  The upper end of the peripheral wall 23 is provided with an upper inclined wall 24 as a second reflecting portion that is inclined at an angle of, for example, 30 degrees radially inward, and the inner peripheral surface is the same as the upper inclined wall 24. A second reflecting plate 25 is provided as a ring-shaped first reflecting portion inclined at an angle. A through hole (not shown) is formed in the base end portion of the second reflecting plate 25, and this through hole lowers the first processing liquid reflected downward on the lower surface of the upper inclined plate 24 as will be described later. Dripping.

  On the inner peripheral surface of the ring portion 22 of the inner cup body 21, a pair of connecting pieces 26 are extended inward in the radial direction at positions spaced 180 degrees in the circumferential direction. The upper ends of the slide shafts 28 constituting the vertical drive mechanism 27 are connected and fixed to the middle portions of the connection pieces 26, respectively. A portion of the slide shaft 28 that protrudes into the outer cup body 1 is covered with a bellows 30.

  The pair of slide shafts 28 are slidably supported by bearings 29 provided on the gantry 9. A lower end of the slide shaft 28 protruding from the bearing 29 is connected to the slider 31. The pair of sliders 31 are slidably supported by linear guides 32 provided on the gantry 9 along the vertical direction.

  The pair of sliders 31 are connected by a connecting member 33. A rod 35 of a cylinder 34 provided on the gantry 9 is connected to a middle portion of the connecting member 33 with the axis line vertical. Therefore, when the rod 35 of the cylinder 34 is urged in the protruding direction as shown in FIG. 1, the inner cup body 21 is the upper end thereof, and the upper end of the upper inclined wall 24 is from the substrate W held by the turntable 11. Are also held in a high raised position.

  When the rod 34 of the cylinder 34 is urged in the immersion direction as shown in FIG. 2, the inner cup body 21 is lowered to a lower position where the upper end of the upper inclined wall 24 is lower than the substrate W held by the rotary table 11. Retained. The lowering position may be a position where the upper end of the upper inclined wall 24 is lower than the substrate W, but it is more preferable if the upper end of the upper inclined wall 24 is lower than the upper surface of the turntable 11.

  A guide ring 37 constituting cylindrical guide means for covering the outer peripheral surface of the inner cup body 21 is provided at the inner bottom portion of the outer cup body 1. The height of the upper end of the guide ring 37 is substantially the same as the lower end of the upper inclined wall 24 of the inner cup body 21, that is, the upper end of the peripheral wall 23 when the inner cup body 21 is lowered as shown in FIG. Is set. Further, the lower end portion of the guide ring 37 is formed as an inclined portion 37 a inclined toward the lower end portion of the peripheral wall 1 a of the outer cup body 1.

As shown in FIGS. 1 and 3, the bottom wall of the outer cup body 1 has a plurality of, for example, second circumferentially spaced 180 ° positions at positions corresponding to the radially inner side of the peripheral wall 23 of the inner cup body 21. The two first discharge pipes 38 constituting the discharge section are connected. Furthermore, the bottom wall of the outer cup body 1 forms a first discharge portion at a position opposite to the inclined portion 37a of the guide ring 37, which is outside the peripheral wall 23 of the inner cup body 21, Eight second discharge pipes 39 are connected.

Between the first discharge pipe 38 and the second discharge pipe 39 on the bottom wall of the outer cup body 1, the first treatment liquid discharged through the first discharge pipe 38, as will be described later, A shielding wall 40 as a shielding means for preventing the second processing liquid flowing through the second discharge pipe 39 or discharged through the second discharge pipe 39 from flowing into the first discharge pipe 38 is circumferential. It is provided over the entire length.

  A frustoconical inclined wall 41 is provided on the inner bottom of the outer cup body 1. A ring-shaped lid member 42 into which the control motor 17 is inserted is provided at the upper end of the inclined wall 41 with its peripheral portion being liquid-tightly joined. The opening portion of the lid member 42 through which the control motor 17 is passed is liquid-tightly shielded by the seal member 43.

  Furthermore, a first nozzle body 44 for supplying a first processing liquid such as a first etching liquid or a stripping liquid and a second processing liquid such as pure water as a cleaning liquid are disposed above the outer cup body 1. A second nozzle body 45 to be supplied is arranged.

  In addition, the upper surface of each arm 13 of the rotary table 11 has a disk shape whose outer diameter is slightly smaller than the inner diameter of the upper inclined wall 24 and the second reflector 25 provided in the inner cup body 21. A shielding plate 47 is provided.

  As shown in FIG. 3, third discharge pipes 51 having a diameter larger than that of the second discharge pipe 39 are connected to the four corners of the bottom wall of the outer cup body 1. A plurality of second and third discharge pipes 39 and 51 located on the left side and the right side with the center line along the radial direction of the outer cup body 1 symmetrical are connected to a pair of gas-liquid separators 52, respectively. Each gas-liquid separator 52 is connected to an exhaust pipe 53 and a drain pipe 54.

  The exhaust pipe 53 is connected to an exhaust blower (not shown). When the exhaust blower is activated, the suction force acts on the second and third exhaust pipes 39 and 51 via the gas-liquid separator 52. As a result, a suction force acts on the inside of the outer cup body 1 and the inner cup body 21, so that the atmosphere in each cup body 1, 21 is discharged by the suction force.

  In the outer cup body 1, as shown in FIG. 3, the processing liquid splashed from the rotary table 11 rotating in the direction of the arrow is directed to the third discharge pipes 51 provided at the four corners of the outer cup body 1. An arcuate guide plate 55 for guiding is provided.

A part of the processing liquid scattered from the rotary table 11 and flowing to the outer surface side of the guide plate 55 is discharged from the third discharge pipe 51 . The processing liquid flowing along the inner surface of the guide plate 55 falls on the upper surface of the inclined portion 37a of the guide ring 37 and flows along the lower end in the inclined direction. A plurality of cutout portions 37b are formed at predetermined intervals in the circumferential direction at the lower end of the inclined portion 37a. As a result, the processing liquid that has flowed to the lower end of the inclined portion 37a passes through the cutout portion 37b and is discharged from the second discharge pipe 39.

Next, an operation when the substrate W is processed by the spin processing apparatus having the above-described configuration will be described.
The substrate W is processed with the first processing liquid and then cleaned with the second processing liquid. First, as shown in FIG. 2, the substrate W is supplied to the rotary table 11 with the inner cup body 21 lowered, the lower surface of the substrate W is supported by the support pins 14, and the four corners are engaged by the engagement pins 15. Hold.

  Next, the cylinder 34 of the vertical drive mechanism 27 is operated to bias the rod 35 in the protruding direction. As a result, the inner cup body 21 is raised as shown in FIG. 1, and the upper end of the upper inclined wall 24 is positioned at a raised position higher than the substrate W held on the turntable 11.

  When the inner cup body 21 is raised, the control motor 17 is operated to rotate the rotary table 11 at a low speed, and the first processing liquid is supplied from the first nozzle body 44 to the substantially central portion of the upper surface of the substrate W. To do.

  The first processing liquid supplied to the upper surface of the substrate W is scattered outward from the peripheral edge of the substrate W by a centrifugal force generated by the rotation of the substrate W. The first processing liquid scattered from the substrate W collides with the upper inclined wall 24 of the inner cup body 21 and the lower surface of the second reflecting plate 25 provided on the inner peripheral surface. The upper inclined wall 24 and the second reflecting plate 25 are highly inclined inward in the radial direction.

  Therefore, the first treatment liquid that has collided with the upper inclined wall 24 and the lower surface of the second reflecting plate 25 reflects downward and does not reflect toward the substrate W held on the turntable 11. The first processing liquid scattered from the substrate W does not adhere to the substrate W again and cause contamination.

  The first processing liquid supplied to the substrate W is a centrifugal force generated by the rotation of the substrate W, and a part of the first processing liquid is scattered horizontally from the upper surface of the substrate W as shown by an arrow A in FIG. As shown by an arrow B, it hits the engaging pin 15 that holds the corner of the substrate W and scatters obliquely upward.

  The first processing liquid scattered in the horizontal direction indicated by the arrow A collides with the lower surface of the second reflecting plate 25 of the inner cup body 21 and is reflected downward. The first processing liquid that has been scattered obliquely upward as indicated by an arrow B due to collision with the engaging pin 15 or the like collides with the lower surface of the upper inclined wall 24 and is reflected downward, so that it is second reflected. It drops downward through a through hole (not shown) formed in the plate 25.

  Therefore, the upper inclined wall 24 of the inner cup body 21 positioned at the rising position and the second reflection are scattered regardless of the direction of the arrows A and B in which the first processing liquid splashes from the substrate W. Since it collides with the lower surface of the plate 25 and reflects downward, the first processing liquid is prevented from returning to the substrate W side.

The first treatment liquid reflected downward by the upper inclined wall 24 and the second reflector 25 of the inner cup body 21 is dropped toward the bottom wall of the outer cup body 1. The bottom wall of the outer cup body 1 is provided with a shielding wall 40 having a ring shape having substantially the same diameter as the peripheral wall 23 of the inner cup body 21.

Therefore, the first treatment liquid dropped from the inner cup body 21 onto the bottom wall of the outer cup body 1 is discharged through the first discharge pipe 38 provided inside the shielding wall 40 and provided outside. The second discharge pipe 39 does not flow. Then, the first processing liquid discharged to the first discharge pipe 38 is collected and reused.

  When processing the substrate W with the first processing liquid, the inner cup body 21 has a second discharge pipe 39, a gas-liquid separator 52 connected to the second discharge pipe 39, and the gas-liquid separator 52. The suction force of an exhaust blower (not shown) connected to the exhaust pipe 53 acts through the exhaust pipe 53 connected to the exhaust pipe 53.

  As a result, the first processing liquid supplied into the inner cup body 21 is discharged from the first discharge pipe 38, and at the same time, the atmosphere in the inner cup body 21 is formed on the opening surface of the second discharge pipe 39. It is guided by the inclined portion 37 a of the opposing guide ring 37 and discharged from the second discharge pipe 39. Since the atmosphere in the inner cup body 21 includes the first processing liquid in the form of a mist, if the atmosphere remains in the inner cup body 21, the first processing liquid adheres to the inner cup body 21. When the substrate W is cleaned with the second processing liquid, it may transfer to the substrate W and cause contamination.

  However, in this embodiment, the atmosphere in the inner cup body 21 is sucked into the gas-liquid separation device 52 through the second discharge pipe 39. Therefore, since the atmosphere in the inner cup body 21 containing the mist-like first processing liquid is reliably discharged, it is possible to prevent the first processing liquid from remaining on the inner cup body 21.

  Thus, when the processing of the substrate W by the first processing liquid is completed, the supply of the first processing liquid is stopped, and the inner cup body 21 is lowered to the lowered position shown in FIGS. Next, the rotational speed of the rotary table 11 is increased. That is, the rotation speed of the turntable 11 is increased as compared with the case where the substrate W is processed with the first processing liquid.

  When the rotation speed of the turntable 11 is increased, the second processing liquid made of pure water is supplied from the second nozzle body 45 to the central portion of the substrate W. The second processing liquid supplied to the substrate W is scattered from the periphery to the outside by cleaning the upper surface of the substrate W.

  The second processing liquid splashed from the substrate W is lowered to the lower position where the inner cup body 21 is lower than the rotary table 11, so that it does not collide with the inner cup body 21 and hits the inner peripheral surface of the outer cup body 1. Scattered towards.

  The second treatment liquid that falls without splashing to the inner peripheral surface of the outer cup body 1 falls on the shielding plate 47 and scatters from the peripheral portion of the shielding plate 47 to the inner peripheral surface of the outer cup body 1. . That is, the second processing liquid does not fall into the inner cup body 21.

  Four first reflecting plates 6 are provided on the inner peripheral surface of the outer cup body 1 so as to be laminated at predetermined intervals in the vertical direction. The height of the substrate W held on the turntable 11 is higher than the upper end of the lowermost first reflection plate 6 and lower than the third first reflection plate 6 from the top.

  Therefore, among the second processing liquid scattered from the substrate W, the second processing liquid scattered in the horizontal direction indicated by the arrow A in FIG. 5 is applied to the lower surface of the third first reflecting plate 6 from the top. Collide and reflect downward. The second processing liquid scattered from the shielding plate 47 collides with the lower surface of the lowermost first reflecting plate 6 and is reflected downward.

  When the second processing liquid scattered from the substrate W collides with the engaging pin 15 holding the substrate W, the scattering direction may be directed upward as indicated by an arrow B in FIG. In that case, the second processing liquid collides with the lower surface of the first first reflecting plate 6 and the second first reflecting plate 6 from the uppermost and the top, and reflects downward. . Further, the second processing liquid scattered in the direction higher than the uppermost first reflecting plate 6 collides with the lower surface of the upper inclined wall 2 provided at the upper end of the peripheral wall 1a of the outer cup body 1, Reflect towards

Accordingly, when the substrate W is cleaned with the second processing liquid, the rotation speed of the substrate W is faster than when the substrate W is processed with the first processing liquid, and thus the second processing liquid scatters upward. Even in such a case, the second processing liquid is reflected downward by the first reflector 6 and the upper inclined wall 2 and reflected toward the substrate W. Absent. Therefore, the second processing liquid scattered from the substrate W does not adhere to the substrate W again and cause contamination.

Without colliding with the lower surface of the first reflecting plate 6 of the second treatment liquid is uppermost, not reflected downward in a case of a collision at the distal end of the first reflection plate 6, in Figure 5 As indicated by an arrow C, it may be reflected upward and collide with the lower surface of the upper inclined wall 2. In such a case, the second treatment liquid is reflected by the lower surface of the upper inclined wall 2, collides with the inner surface of the vertical wall 3, and drops downward. Therefore, even in such a case, it is possible to prevent the second processing liquid from returning to the substrate W.

  The second processing liquid reflected downward by the first reflecting plate 6 flows in the circumferential direction along the upper surface of the first reflecting plate 6 by the centrifugal force applied by the rotation of the rotary table 11, while guiding the guide. It is guided by the inner surface of the plate 55 and scatters toward the third discharge pipe 51 provided at the four corners of the outer cup body 1. As a result, the second processing liquid is sucked and discharged to the third discharge pipe 51 together with the atmosphere in the outer cup body 1.

The second treatment liquid that is reflected downward by the lowermost first reflecting plate 6 or dropped from the radially outer side of each first reflecting plate 6 onto the upper surface of the inclined portion 37a of the guide ring 37, It flows toward the lower end in the inclination direction of the inclined portion 37a.

  A notch 37b is formed at the lower end of the inclined portion 37a. Therefore, the second processing liquid flowing along the inclined portion 37a is sucked and discharged to the second discharge pipe 39 through the cutout portion 37b. At this time, since the shielding wall 40 is provided between the second discharge pipe 39 and the first discharge pipe 38, the second processing liquid is prevented from flowing into the first discharge pipe 38. .

  That is, since the second processing liquid is discharged through a different path from the first processing liquid, it is not mixed with the first processing liquid. Therefore, since the first processing liquid can be reliably separated from the second processing liquid and collected, the first processing liquid can be used repeatedly.

  As described above, according to the spin processing apparatus configured as described above, when the inner cup body 21 is raised and the substrate W is processed with the first processing liquid, the inner cup 21 is lowered and the substrate W is subjected to the second processing. In any case of processing with the liquid, even if the first and second processing liquids scatter from the substrate W in the horizontal direction or upward from the horizontal, the first The second treatment liquid can be collected by reflecting downward.

  Therefore, it is possible to prevent the first and second processing liquids scattered from the substrate W from being reflected on the inner peripheral surface of the inner cup body 21 or the outer cup body 1 and returning to the substrate W held on the rotary table 11. Therefore, the first and second processing liquids scattered from the substrate W do not adhere to the substrate W and cause contamination.

In addition, since the first treatment liquid and the second treatment liquid can be reliably separated and recovered by the first discharge pipe 38 and the second discharge pipe 39, the expensive first treatment liquid is repeatedly used. Can be used.

  Furthermore, since the atmosphere in the inner cup body 21 can be discharged by the second discharge pipe 39, when the substrate W is processed with the first processing liquid, it becomes a mist and floats in the inner cup body 21. Thus, the first treatment liquid does not remain attached to the inner cup body 21. Therefore, when the substrate W is processed with the first processing liquid and then cleaned with the second processing liquid, the substrate W is not contaminated with the first processing liquid. The cleaning process can be performed reliably.

  In the above embodiment, the rectangular glass substrate used in the liquid crystal display device is described as an example of the substrate, but the spin processing apparatus of the present invention is used even when the substrate is not a glass substrate but a semiconductor wafer. It is possible to apply.

The longitudinal cross-sectional view of a spin processing apparatus when the inner cup body which shows one embodiment of this invention exists in a raise position. The longitudinal cross-sectional view of a spin processing apparatus when an inner cup body exists in a lowered position. The cross-sectional view of the spin processing apparatus in which the peripheral wall of the outer cup body is cut and partially omitted. The expanded sectional view which shows a part of rotary table and inner cup body when an inner cup body exists in a raise position. The expanded sectional view which shows a part of rotary table and outer cup body when an inner cup body exists in a lowered position.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Outer cup body, 2 ... Upper inclined wall , 6 ... 1st reflecting plate (1st reflection means), 11 ... Rotary table, 17 ... Control motor, 27 ... Vertical drive mechanism (vertical drive means) , 21 ... Inner cup body, 25 ... second reflector ( first reflector ), 38 ... first discharge pipe ( second discharge section), 39 ... second discharge pipe (first discharge section).

Claims (6)

A spin processing apparatus for processing with a first processing liquid and a second processing liquid while rotating a rectangular substrate,
An outer cup body,
A second part provided in the outer cup body, a base part, a plurality of arms provided in the circumferential direction of the base part to support the substrate, and provided integrally with each arm, and the outer dimensions are provided in the inner cup body, which will be described later. A rotating table that has a disk-shaped shielding plate smaller than the inner diameter of the reflecting means, and is rotated by the rotation driving means in a state where the substrate is held by the arm ;
Up and down driving is performed by a vertical driving means between a descending position lower than the substrate, the upper end of which is provided in the outer cup body, and the upper end is held by the rotary table, and the upper end of the upper cup is held by the rotary table. An inner cup body provided as possible,
The second cup that is provided on the inner peripheral portion of the outer cup body and scatters from the peripheral portion of the substrate when the substrate is rotated and processed with the second processing liquid in a state where the inner cup body is in the lowered position. First reflecting means for reflecting the treatment liquid downward;
The first cup which is provided on the inner peripheral portion of the inner cup body and is scattered from the peripheral portion of the substrate when the inner cup body is rotated and the substrate is rotated and processed with the first processing liquid. A substrate spin processing apparatus comprising: a second reflecting means for reflecting the processing liquid downward.   The first reflecting means and the second reflecting means include a first reflecting portion for reflecting the first and second processing liquids scattered in the horizontal direction from the rotating substrate downward, and an angle from the rotating substrate. The substrate spin processing apparatus according to claim 1, further comprising a second reflecting portion that reflects the first and second processing liquids scattered upward to the lower side.   A first discharge portion for discharging the second processing liquid from the outer cup body when the substrate is processed by the second processing liquid when the inner cup body is in the lowered position; and the inner cup body is in the raised position. When the substrate is processed with the first processing liquid in this state, the second processing liquid and a second discharge portion for discharging the first processing liquid from the outer cup body through another path are provided. 2. The substrate spin processing apparatus according to claim 1, wherein: Discharging means for sucking and discharging the second processing liquid in the outer cup body through the first discharging portion when the substrate is processed with the second processing liquid at the lowered position of the inner cup body;
A guide for guiding the atmosphere in the inner cup body to be discharged through the first discharge portion by the suction force of the discharge means when the substrate is processed by the first processing liquid at the raised position of the inner cup body. The substrate spin processing apparatus according to claim 3, further comprising: means. The discharge means includes a gas-liquid separator connected to the first discharge unit, and an exhaust connected to the gas-liquid separator and sucking the second processing liquid in the outer cup into the gas-liquid separator. 5. The substrate spin processing apparatus according to claim 4, wherein the substrate spin processing apparatus is constituted by a tube. When the atmosphere in the inner cup body is guided by the guide means by the suction force of the discharge means and discharged from the first discharge section, the first processing liquid discharged from the second discharge section is 5. The substrate spin processing apparatus according to claim 4, further comprising shielding means for preventing flow to the first discharge section.

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