JP4750519B2 - 切削方法および切削装置 - Google Patents
切削方法および切削装置 Download PDFInfo
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- JP4750519B2 JP4750519B2 JP2005269625A JP2005269625A JP4750519B2 JP 4750519 B2 JP4750519 B2 JP 4750519B2 JP 2005269625 A JP2005269625 A JP 2005269625A JP 2005269625 A JP2005269625 A JP 2005269625A JP 4750519 B2 JP4750519 B2 JP 4750519B2
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- 238000005520 cutting process Methods 0.000 title claims description 595
- 238000000034 method Methods 0.000 title claims description 84
- 239000002131 composite material Substances 0.000 claims description 99
- 239000000463 material Substances 0.000 claims description 76
- 239000011521 glass Substances 0.000 claims description 58
- 229910052710 silicon Inorganic materials 0.000 claims description 43
- 239000010703 silicon Substances 0.000 claims description 43
- 239000013078 crystal Substances 0.000 claims description 29
- 239000002178 crystalline material Substances 0.000 claims description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 60
- 239000000853 adhesive Substances 0.000 description 20
- 230000001070 adhesive effect Effects 0.000 description 20
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 17
- 230000005540 biological transmission Effects 0.000 description 15
- 230000007246 mechanism Effects 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 3
- 230000007017 scission Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/047—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by ultrasonic cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S451/00—Abrading
- Y10S451/91—Ultrasonic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S83/00—Cutting
- Y10S83/956—Ultrasonic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
- Y10T83/0524—Plural cutting steps
- Y10T83/0572—Plural cutting steps effect progressive cut
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
まず,図1に基づいて,本発明の第1の実施形態にかかる超音波振動切削装置の一例として構成された切削装置10の全体構成について説明する。なお,図1は,本実施形態にかかる切削装置10を示す全体斜視図である。
まず,図6および図7に基づいて,複合材料70に対する第1の切削方法について説明する。ここで,図6は,第1の切削方法による切削過程を示した説明図である。また,図7は,第1の切削方法を示すフローチャートである。
次に,図8および図9に基づいて,複合材料70に対する第2の切削方法について説明する。ここで,図8は,第2の切削方法により切削される複合材料70の切削状態を示した説明図である。また,図9は,第2の切削方法を示すフローチャートである。
次に,図10および図11に基づいて,複合材料70に対する第3の切削方法について説明する。ここで,図10は,第3の切削方法により切削される複合材料70の切削状態を示した説明図である。また,図11は,第3の切削方法を示すフローチャートである。
次に,図12および図13に基づいて,複合材料70に対する第4の切削方法について説明する。ここで,図12は,第4の切削方法により切削される複合材料70の切削状態を示した説明図である。また,図13は,第4の切削方法を示すフローチャートである。
実施例として使用する切削装置は,1つの切削手段で,切削ブレードを径方向に超音波振動させて切削する切削モード(第1の切削モード)と,切削ブレードを超音波振動させないで切削する通常の切削モード(第2の切削モード)とを切り替えて使用することができる。切削モードの切替は,超音波振動子の電源をオンオフして行うことができる。かかる切削装置を用いて,以下の切削条件でシリコンとガラスとを接着剤により接合させた複合材料を切削した。なお,本実施例で使用した複合材料の大きさは2インチであり,シリコン部の厚さは約100μm,ガラス部の厚さは約700μm,接着剤の厚さは約100μmである。
13 ダイシングテープ
15 チャックテーブル
20 切削ユニット
20a 第1の切削ユニット
20b 第2の切削ユニット
21 基台部
22 切削ブレード
23 切削砥石部
24 先端部
25 スピンドル
26 スピンドルハウジング
29 ボルト
33 PZT振動子
70 複合部材
71 シリコン部
73 ガラス部
75 接着剤
Claims (5)
- 切削ブレードを径方向に超音波振動させて被加工物を切削する第1の切削モードと,前記切削ブレードを超音波振動させずに被加工物を切削する第2の切削モードとを切替可能な切削手段を備える切削装置を用いて,結晶材と非結晶材とが接合された複合材料を切削する切削方法であって,
前記切削装置を前記第1の切削モードに設定して,径方向に超音波振動する前記切削ブレードにより前記複合材料の非結晶材部分を切削する工程と;
前記切削装置を前記第2の切削モードに設定して,超音波音波振動しない前記切削ブレードにより前記複合材料の結晶材部分を前記第2の切削モードで切削する工程と;
を含むことを特徴とする,切削方法。 - 第1の切削ブレードを径方向に超音波振動させて被加工物を切削する第1の切削手段と,第2の切削ブレードを超音波振動させずに被加工物を切削する第2の切削手段と,を備える切削装置を用いて,結晶材と非結晶材とが接合された複合材料を切削する切削方法であって,
前記複合材料の非結晶材部分を前記第1の切削手段によって切削する工程と;
前記複合材料の結晶材部分を前記第2の切削手段によって切削する工程と;
を含むことを特徴とする,切削方法。 - 前記非結晶材部分の切削加工と,前記結晶材部分の切削加工とは,前記複合材料に対して同一方向から前記切削ブレードを切り込ませて行われることを特徴とする,請求項1または2に記載の切削方法。
- 前記非結晶材部分の切削加工と,前記結晶材部分の切削加工とは,前記複合材料に対して反対方向から前記切削ブレードを切り込ませて行われることを特徴とする,請求項1または2に記載の切削方法。
- 前記非結晶材はガラスであり,前記結晶材はシリコンであることを特徴とする,請求項1〜4のいずれか1項に記載の切削方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005269625A JP4750519B2 (ja) | 2005-09-16 | 2005-09-16 | 切削方法および切削装置 |
US11/519,800 US7347766B2 (en) | 2005-09-16 | 2006-09-13 | Cutting method and cutting apparatus |
Applications Claiming Priority (1)
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JP2005269625A JP4750519B2 (ja) | 2005-09-16 | 2005-09-16 | 切削方法および切削装置 |
Publications (2)
Publication Number | Publication Date |
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JP2007081264A JP2007081264A (ja) | 2007-03-29 |
JP4750519B2 true JP4750519B2 (ja) | 2011-08-17 |
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JP2005269625A Active JP4750519B2 (ja) | 2005-09-16 | 2005-09-16 | 切削方法および切削装置 |
Country Status (2)
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US (1) | US7347766B2 (ja) |
JP (1) | JP4750519B2 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI342302B (en) * | 2007-03-30 | 2011-05-21 | Au Optronics Corp | A substrate splitting apparatus and a mehtod for splitting a substrate |
CN101412227B (zh) * | 2007-10-16 | 2012-03-28 | 鸿富锦精密工业(深圳)有限公司 | 剪切机和剪切方法 |
PL2377661T3 (pl) * | 2008-12-23 | 2019-03-29 | Ehwa Diamond Industrial Co., Ltd. | Sposób cięcia kamienia z zastosowaniem ramowej piły wielotarczowej o ruchu postępowo-zwrotnym |
JP2010192724A (ja) * | 2009-02-19 | 2010-09-02 | Disco Abrasive Syst Ltd | ウエーハの切削方法 |
JP2010228048A (ja) * | 2009-03-27 | 2010-10-14 | Disco Abrasive Syst Ltd | 切削装置 |
DE102010027238B4 (de) * | 2010-07-15 | 2014-05-15 | Siemens Aktiengesellschaft | Verwendung einer Sägevorrichtung und Verfahren zur Herstellung eines in Szintillatorelemente strukturierten Szintillators sowie Szintillator mit Szintillatorelementen |
US10245652B2 (en) * | 2012-11-05 | 2019-04-02 | M4 Sciences Llc | Rotating tool holder assembly for modulation assisted machining |
JP6561565B2 (ja) * | 2015-04-30 | 2019-08-21 | 三星ダイヤモンド工業株式会社 | 貼り合わせ基板の分割方法及び分割装置 |
JP6629086B2 (ja) * | 2016-02-08 | 2020-01-15 | 株式会社ディスコ | 積層ウェーハの分割方法 |
US10875138B1 (en) | 2016-08-09 | 2020-12-29 | M4 Sciences Llc | Tool holder assembly for machining system |
JP6716403B2 (ja) * | 2016-09-09 | 2020-07-01 | 株式会社ディスコ | 積層ウェーハの加工方法 |
JP6847529B2 (ja) * | 2017-06-15 | 2021-03-24 | 株式会社ディスコ | 被加工物の切削方法 |
US10603688B2 (en) * | 2017-12-11 | 2020-03-31 | The Chinese University Of Hong Kong | Microtome |
US20190363018A1 (en) * | 2018-05-24 | 2019-11-28 | Semiconductor Components Industries, Llc | Die cleaning systems and related methods |
JP7460386B2 (ja) * | 2020-02-14 | 2024-04-02 | 株式会社ディスコ | 被加工物の加工方法 |
JP7536399B2 (ja) | 2020-08-21 | 2024-08-20 | 株式会社ディスコ | 切削方法 |
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GB8611399D0 (en) * | 1986-05-09 | 1986-06-18 | York Technology Ltd | Cleaving optical fibres |
US4920946A (en) * | 1987-03-03 | 1990-05-01 | Applied Magnetic Lab. Co., Ltd. | Blade cutting apparatus for hard brittle material |
JPH01184104A (ja) * | 1988-01-18 | 1989-07-21 | Mitsubishi Electric Corp | ウエハのダイシング方法 |
JPH02113907A (ja) * | 1988-10-24 | 1990-04-26 | Tokyo Seimitsu Co Ltd | ダイシング方法及びその装置 |
JPH0567677A (ja) * | 1991-09-09 | 1993-03-19 | Yokogawa Electric Corp | シリコン・ガラス接合部材の切断方法 |
JPH07183255A (ja) * | 1993-12-24 | 1995-07-21 | Nippondenso Co Ltd | 接合基板の切断方法 |
JP3469488B2 (ja) * | 1999-01-21 | 2003-11-25 | 株式会社アルテクス | 超音波振動切断装置 |
JP2002336775A (ja) | 2001-05-18 | 2002-11-26 | Fuji Kogyo Kk | 超音波捩り振動型ブレード駆動装置 |
JP2003318134A (ja) * | 2002-04-19 | 2003-11-07 | Tokyo Seimitsu Co Ltd | ダイシング装置及びダイシング方法 |
JP4620370B2 (ja) * | 2003-03-13 | 2011-01-26 | 一正 大西 | 円盤状ブレード及び切断装置 |
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2005
- 2005-09-16 JP JP2005269625A patent/JP4750519B2/ja active Active
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2006
- 2006-09-13 US US11/519,800 patent/US7347766B2/en active Active
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US7347766B2 (en) | 2008-03-25 |
US20070066188A1 (en) | 2007-03-22 |
JP2007081264A (ja) | 2007-03-29 |
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