JP4693003B2 - Processing method of micro-processing multi-sensor on substrate - Google Patents

Abstract

A micro-machined multi-sensor that provides 1-axis of acceleration sensing and 2-axes of angular rate sensing. A method of fabricating the micro-machined multi-sensor includes depositing a layer of sacrificial material or structural material onto the substrate surface. The deposited layer of sacrificial or structural material is then masked with a predetermined mask pattern formed using a rectilinear grid having multiple horizontal and vertical spacings. The mask pattern defines the functional components of the sensor device. In the event the multi-sensor includes at least one functional component whose alignment on the substrate is critical to the optimal performance of the sensor, the critical component is defined so that its longitudinal axis is substantially parallel to the horizontal or vertical axis of the mask. In the event the multi-sensor includes at least one functional component whose alignment on the substrate surface is not critical to optimal sensor performance, the non-critical component may be defined so that its longitudinal axis is not parallel to the horizontal and vertical axes of the mask.

Description

Cross-reference to related applications This application is a US Provisional Patent Application No. 60 / 466,082, filed Apr. 28, 2003, entitled "Microfabricated Device Structure with On-axis and Off-axis Orientation". Claim priority.

Federal Academic Research or Development Statement N / A

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates generally to integrated angular velocity and acceleration sensors ("multi-sensors"), and more particularly to a micromachined multisensor capable of providing uniaxial acceleration detection and biaxial angular velocity detection, and its The present invention relates to a technique for manufacturing such a multisensor.

  Microfabricated multi-sensors are known as comprising at least one accelerometer for providing acceleration and angular velocity sensing readings with a single sensor device. A conventional micromachined multi-sensor as disclosed in US Pat. No. 5,392,650 issued February 28, 1995 under the name “micromachined accelerometer gyroscope” comprises a pair of accelerometers. Each accelerometer includes a rigid accelerometer frame fixed to the substrate and an inertial mass (proof mass) suspended from the rigid frame by a plurality of flexures. Microfabricated multisensors typically have a single acceleration sensing axis associated therewith and a single rotation sensing axis perpendicular to the acceleration axis. Further, microfabricated multisensors are typically configured to simultaneously vibrate a plurality of inertial masses in opposite phase along a vibration axis perpendicular to the acceleration and rotation axes.

  In the case of a conventional micromachined multisensor that undergoes linear and rotational motion while the inertial mass is simultaneously vibrated in anti-phase behavior, linear and Coriolis acceleration forces are generated to deflect the inertial mass with respect to the substrate. The multi-sensor is configured to detect a deflection of each inertial mass and generate a corresponding acceleration detection signal having a value proportional to the magnitude of the deflection. The response of inertial mass during vibration to linear acceleration is in phase, and the response of inertial mass to Coriolis acceleration is out of phase, so the linear acceleration component (including acceleration detection information) and rotational acceleration component (angular velocity detection) of the detection signal Can be separated by suitably adding or subtracting the signals to cancel the rotation or linear components.

  One drawback of the conventional microfabricated multisensor described above is that it typically provides only one axis of acceleration detection and only one axis of angular velocity detection. However, it is often advantageous to provide more than one axis acceleration sensing and / or angular velocity sensing in a single sensor device.

  A second conventional microfabricated sensor capable of measuring the speed of rotation with respect to two rotation detection axes is a U.S. patent issued on Feb. 9, 1999 under the name "microfabrication apparatus having rotational vibration type mass". No. 5,869,760. This microfabricated sensor includes a pair of accelerometers. Each accelerometer has a mass in the form of a circular beam suspended on a substrate by a plurality of flexures and an adjacent pair of acceleration sensing electrodes. The two rotation detection axes associated with this microfabricated sensor are in the plane of the substrate. Furthermore, this microfabricated sensor is designed to rotate and vibrate a circular beam in anti-phase behavior, ie while rotating one circular beam alternately clockwise / counterclockwise, the other circular beam is reversed. It is configured to rotate by substantially the same amount.

  In the case of a second conventional microfabricated sensor that undergoes linear and rotational motion while the circular beam is simultaneously vibrated in anti-phase behavior, linear and Coriolis acceleration forces are generated to deflect the beam relative to the substrate. . The acceleration detection electrode detects the deflection of each beam and generates a corresponding acceleration detection signal proportional to the magnitude of the deflection and the speed of rotation relative to the rotation detection axis. Since the sign of the rotational acceleration component (including angular velocity detection information) of the detection signal corresponds to the direction of rotation of the circular beam, the rotational component is preferably subtracted from these signals to cancel the linear component, It can be separated from the linear acceleration component of the sense signal. However, although this microfabricated sensor can provide angular velocity detection of more than one axis, it typically has the disadvantage that it does not provide acceleration detection information.

Prior known techniques for fabricating microfabricated sensors and multi-sensors use sacrificial and structural material layers in the manufacturing process. One such manufacturing technique is known as surface micromachining, in which the micromachining device is manufactured substantially on the surface of the substrate. Conventional surface micromachining techniques deposit a layer of sacrificial material (eg, silicon dioxide SiO ₂ ) or structural material (eg, polysilicon) on the surface of a substrate (eg, silicon). The structural material is used to build the functional parts of the microfabrication device and the sacrificial material is subsequently removed in the final step of the manufacturing process. The deposited layer of sacrificial or structural material is masked by a mask pattern. This mask pattern is typically transferred using a photolithographic method. The underlying material that is not protected by the mask is then etched to transfer the mask pattern to that special material layer. The step of depositing, the step of masking, and the step of etching are repeated until the construction of the functional parts of the microfabrication apparatus is completed. Finally, one or more portions of the structural material are released by etching or otherwise removing the underlying and / or surrounding sacrificial material. Conventional surface micromachining techniques are typically low cost and generally allow electronic circuitry to be incorporated near the functional components of the micromachining equipment.

However, conventional surface micromachining techniques have drawbacks when used in the manufacture of micromachined sensors and multisensors. For example, microfabricated multi-sensors typically have at least one functional component whose alignment and / or width is important for optimal performance of the sensor device. Since the mask pattern used to build the functional parts of the sensor device is typically laid out according to the horizontal and vertical space of the linear grid, it is difficult to obtain the alignment and width of such important functional sensor parts. .
Therefore, it is desirable to have a microfabricated multi-sensor device that provides both acceleration and angular velocity detection and avoids the disadvantages of the conventional microfabricated sensor devices described above.

BRIEF SUMMARY OF THE INVENTION In accordance with the present invention, a micromachined multisensor that provides uniaxial acceleration sensing and biaxial angular velocity sensing is disclosed. The microfabricated multi-sensor disclosed here includes at least a pair of accelerometers, and each accelerometer provides an electrically independent detection signal including information belonging to acceleration detection and angular velocity detection for one or more detection axes. .

  In the first embodiment, the microfabricated multi-sensor includes a pair of accelerometers, and each accelerometer is suspended on the substrate by a plurality of flexures and has a mass fixed thereto. The multi-sensor has two associated rotation sensing axes that are orthogonal to each other in the plane of the substrate and one associated acceleration sensing axis that is perpendicular to the two rotation axes. Furthermore, each mass has a transverse and longitudinal symmetry axis associated with it and a drive rotation axis perpendicular to the transverse and longitudinal symmetry axis. Each accelerometer further includes a first pair of acceleration sensing electrode structures disposed along a horizontal axis of the respective mass and a second pair of acceleration sensing electrode structures disposed along a vertical axis. And have. The multisensor further has a fork member. The fork member couples the two masses to allow relative reverse phase movement of the masses and resists in-phase movement. The configuration of the plurality of flexures that fix the mass to the substrate forces the mass to move only in a rotational manner relative to the substrate.

  In the embodiment disclosed herein, the microfabricated multisensor has a drive electrode structure. The drive electrode structure is configured to rotate and vibrate the mass in the opposite phase, that is, while rotating one mass alternately clockwise / counterclockwise about the rotation axis, About the same amount in the opposite direction. When a multi-sensor with a mass that oscillates in rotation undergoes linear and / or rotational motion, the first and second pairs of acceleration sensing electrodes generate electrically independent sensing signals for linear and Coriolis acceleration applied to the mass. Generate based on force. The multisensor (1) detects the difference in acceleration detected by the first pair of acceleration detection electrodes of the first accelerometer, and determines the difference in acceleration detected by the first pair of acceleration detection electrodes of the second accelerometer. In order to add to the difference to obtain information belonging to angular velocity detection with respect to the horizontal rotation axis of the multi-sensor, and (2) the difference in acceleration detected by the second pair of acceleration detection electrodes of the first accelerometer, (3) First (3) so as to obtain information belonging to angular velocity detection with respect to the longitudinal rotation axis of the multisensor by adding to the difference in acceleration detected by the second pair of acceleration detection electrodes of the second accelerometer The sum of acceleration detected by the first pair of acceleration sensing electrodes of the accelerometer, the sum of acceleration detected by the first pair of acceleration sensing electrodes of the second accelerometer, and the acceleration of the first accelerometer By a second pair of sensing electrodes So as to obtain the information belonging to the acceleration detection with respect to the acceleration axis of the multi-sensor by summing the sum of the accelerations detected in this step and the sum of the accelerations detected by the second pair of acceleration detection electrodes of the second accelerometer. It is configured.

  In the second embodiment, the microfabricated multi-sensor includes two pairs of accelerometers arranged to form a quadrangle. Each accelerometer is suspended on a substrate and has a mass fixed thereto. The microfabricated multisensor further includes respective fork members that couple adjacent pairs of masses to allow relative reverse phase movement of adjacent masses and resist in-phase movement. The multi-sensor has two associated rotation sensing axes that are orthogonal to each other in the plane of the substrate and one associated acceleration sensing axis perpendicular to the two rotation sensing axes. Each mass further includes a first pair of acceleration sensing electrode structures disposed along a horizontal axis of the respective mass, and a second pair of acceleration sensing electrode structures disposed along a vertical axis. Have The two pairs of accelerometers are arranged in mirror images on opposite sides of the respective rotation axes. Because of the enhanced symmetry of the second embodiment of the microfabricated multisensor, the multisensor device can be more easily centered on the die, thereby reducing the deleterious effects of die surface area distortion and gradient. it can.

  In a third embodiment, a method of manufacturing a microfabricated multisensor deposits a layer of sacrificial material or structural material on a substrate surface. The structural material is used to build the functional parts of the sensor device, and the sacrificial material is subsequently removed in the final step of the manufacturing process. The deposited layer of sacrificial or structural material is masked by a mask pattern. This mask pattern is formed using a linear grid having a plurality of horizontal and vertical spaces. The mask pattern is used to define the functional parts of the sensor device. If the microfabricated multi-sensor has at least one first functional component, and the alignment and / or width is important for the optimal performance of the sensor device, the first functional component has its longitudinal axis It is defined by the mask pattern so as to be substantially parallel to the horizontal or vertical axis of the mask. If the microfabricated multi-sensor has at least one second functional component and its alignment and / or width is not important for optimal sensor performance, the second functional component has its vertical axis horizontal to the mask. And is defined by the mask pattern so as not to be parallel to the vertical axis.

The microfabricated multi-sensor described above includes at least a pair of accelerometers, each accelerometer having a mass, each of two pairs of electrically independent acceleration sensing signals along the transverse and longitudinal symmetry axes of the mass. When configured to give, by appropriately adding and / or subtracting this acceleration detection signal, it is possible to obtain one-axis acceleration detection and two-axis angular velocity detection. Furthermore, the functional parts of the sensor device are defined by at least one mask, and parts having important (critical) alignments and / or physical dimensions are arranged substantially parallel to the horizontal or vertical axis of the mask. Also, non-critical (non-critical) parts are oriented off the mask axis to achieve improved sensor performance.
Other features, functions and forms of the invention will become apparent from the detailed description of the invention that follows.

BRIEF DESCRIPTION OF THE DRAWINGS The invention will be more fully understood by reference to the following detailed description of the invention taken in conjunction with the drawings. In the drawing
FIG. 1 is a simplified block diagram of a microfabricated multisensor according to the present invention,
2 is a detailed plan view of the microfabricated multi-sensor of FIG.
FIG. 3 is a schematic diagram of an acceleration detection signal processing circuit for the microfabricated multisensor of FIG.
FIG. 4 is a simplified block diagram of an alternative embodiment of the microfabricated multisensor of FIG.
5 is a detailed plan view of the microfabricated multi-sensor of FIG.
6 is a flow diagram of a method for operating the microfabricated multi-sensor of FIG.
7a-7d are detailed views of functional parts of the microfabricated multi-sensor of FIG.
8a-8b are cross-sectional views of the microfabricated multisensor of FIG. 4 showing a method of manufacturing a multisensor device,
FIG. 9 is a flow diagram of a method of manufacturing the microfabricated multisensor of FIG.

DETAILED DESCRIPTION OF THE INVENTION US Provisional Patent Application No. 60 / 466,082, filed April 28, 2003, entitled “Microfabricated Device Structure with On-Axis and Off-Axis Orientation”, is hereby incorporated by reference. Incorporated into.

  A micromachined multi-sensor that provides single axis acceleration detection and biaxial angular velocity detection in a single sensor device is disclosed. The microfabricated multisensor disclosed herein is placed symmetrically on the die, thereby improving yield and improving the overall performance of the multisensor device.

  FIG. 1 shows an illustrative embodiment of a microfabricated multisensor 100 according to the present invention. In this illustrative embodiment, multisensor 100 includes a pair of accelerometers 102 and 104. Accelerometers 102 and 104 have masses 103 and 105, respectively, that are each substantially circular. It should be understood that the masses 103 and 105 may instead be substantially square, hexagonal, octagonal, or other suitable geometric shapes. The circular masses 103 and 105 are fixed to the substrate 101 by a plurality of flexures (not shown) and suspended thereon. The multisensor 100 further includes a fork member 106. The fork member is configured to couple two circular masses 103 and 105 to allow relative reverse phase movement of these masses and to resist in-phase movement. The configuration of the multiple flexures that fix the circular masses 103 and 105 and suspend them on the substrate 101 forces the masses to move relative to the substrate 101 only in a substantially rotational behavior.

  For example, the substrate 101 may be a silicon substrate or other suitable type of substrate. Furthermore, the substrate 101 can be subjected to a suitable bulk micromachining process, for example, surface micromachining, to form a multi-electromechanical system (MEMS) multisensor. It should be noted here that the circular masses 103 and 105 and the coupling fork 106 of the MEMS multi-sensor 100 can be formed by conventional suitable processes.

  As shown in FIG. 1, the multi-sensor 100 includes two related rotation detection axes X and Y that are orthogonal to each other in the plane of the substrate 101 and perpendicular to the rotation axes X and Y (ie, on the substrate 101). And one associated acceleration sensing axis Z (vertical). The multi-sensor 100 is configured to give two indications of angular velocity detection with respect to the rotation axes X and Y and one indication of acceleration detection with respect to the acceleration axis Z. Furthermore, each of the circular masses 103 and 105 is associated with a transverse and longitudinal symmetry axis (unsigned) and a rotational axis perpendicular to the transverse and longitudinal axes (ie, rotational axes 142 and 144, respectively, FIG. 1). Reference).

  Multi-sensor 100 also has acceleration sensing electrode structures 108-115 disposed along the vertical and horizontal axes of respective circular masses 103 and 105, respectively. Specifically, the acceleration detection electrode structures 108 to 109 and 112 to 113 are opposed to each other along the vertical and horizontal axes of the circular mass 103, respectively, and the acceleration detection electrode structures 110 to 111 and 114 to 115 are , Opposite each other along the vertical and horizontal axes of the circular mass 105. Each structure of the acceleration detection electrode structures 108 to 115 is disposed on the surface of the substrate 101 so as to face the first electrode and the first electrode disposed on the surface of each circular mass. A differential capacitor having a capacitance value that increases or decreases based on the distance between the first and second electrodes. The multi-sensor 100 includes a circuit configured to detect a change in capacitance value and to provide an electrically independent acceleration detection signal. These acceleration detection signals include information belonging to angular velocity detection and acceleration detection with respect to the rotation axes X and Y and the acceleration axis Z, respectively. For example, each of the first and second electrodes of the acceleration sensing electrode structures 108-115 can be made of polycrystalline silicon ("polysilicon"), a diffusion region, metal, or other suitable material.

  FIG. 2 shows a detailed plan view 200 of the microfabricated multisensor 100 (see FIG. 1). As shown in FIG. 2, the microfabricated multisensor 200 has a pair of accelerometers 202 and 204. Accelerometers 202 and 204 have substantially circular masses 203 and 205, respectively. These masses are fixed to a substrate 201 such as a silicon substrate by a plurality of flexible structures, and are suspended on the substrate 201. Specifically, each of the flexible structures that fix and suspend the circular mass 203 includes an anchor 270 and a stress relief member 260, and each of the flexible structures that fix and suspend the circular mass 205 includes an anchor 272. And a stress reducing member 262. In this illustrative embodiment, each of the stress relief members 260 and 262 is folded in half with a free center to relieve stress. This configuration creates some local asymmetry of restoring force and moment so that the folded members 260 and 262 are placed in pairs to maintain balance (see FIG. 2).

  The multi-sensor 200 further includes a fork member 206 and acceleration detection electrode structures 208 to 215. Fork member 206 is configured to combine two circular masses 203 and 205 to allow relative anti-phase rotational movement of these masses and to resist in-phase rotational movement, as is known in the art. Yes. The acceleration sensing electrode structures 208-215 are disposed along the vertical and horizontal axes of the respective circular masses 203 and 205.

  It should be noted that the circular masses 203 and 205, the fork member 206, and the acceleration detection electrode structures 208 to 215 are the circular masses 103 and 105 of the multisensor 100, the fork member 106, and the acceleration detection, respectively. That is, it is substantially equivalent to the electrode structures 108 to 115 (see FIG. 1). Further, as shown in FIG. 3, the rotation detection axes X and Y and the acceleration detection axis Z correspond to the rotation detection axes X and Y and the acceleration detection axis Z described above with reference to FIG. .

  As shown in FIG. 2, the multi-sensor 200 has a plurality of drive electrode structures 240 and 242 fixed to the substrate 201. These drive electrode structures are designed to rotate and vibrate the circular masses 203 and 205 in opposite phases, that is, while rotating one mass alternately in the clockwise / counterclockwise direction around its rotation axis. The circular mass is configured to rotate substantially the same amount in the opposite direction about its axis of rotation. Specifically, the drive electrode structure 240 is used to rotate and oscillate the circular mass 203 around the rotation axis 282, and the drive electrode structure 242 rotates and oscillates the circular mass 205 around the rotation axis 284. Used to make. In the embodiment disclosed herein, the drive electrode structures 240 and 242 are disposed along the radial axes of the circular masses 203 and 205, respectively. Each of the drive electrode structures 240 and 242 has a plurality of electrodes (“fingers”) meshed with corresponding fingers extending from at least one radial edge of the circular masses 203 and 205, respectively. Drive electrode structures 240 and 242 are coupled to a signal source (not shown). This signal source is for generating a drive signal that operates to cause the masses 203 and 205 to oscillate in a reverse-phase oscillation behavior, as indicated by the directional arrows 280.

  Multi-sensor 200 further includes a plurality of velocity sensing electrode structures 250 and 252 that are fixed to substrate 201 and configured to sense the vibration velocity of circular masses 203 and 205, respectively. In the embodiment disclosed herein, velocity sensing electrode structures 250 and 252 are disposed along the radial axes of circular masses 203 and 205, respectively. In addition, the velocity sensing electrode structures 250 and 252 have a plurality of fingers meshed with corresponding fingers extending from the radial edges of the circular masses 203 and 205, respectively. Engaged fingers of the speed sensing electrode structures 250 and 252 form a differential capacitance with a capacitance value that increases or decreases based on whether the circular masses 203 and 205 are rotating clockwise or counterclockwise. To do. The multi-sensor 200 is configured to detect these changes in the capacitance value and to provide a speed detection signal indicating the vibration speed of the circular masses 203 and 205 based on the changing capacitance value (not shown). Have

  As will be appreciated by those skilled in the art, when the multi-sensor 200 rotates about the radial axis (unsigned) of the masses 203 and 205 while the circular masses 203 and 205 vibrate about the rotation axes 282 and 284, respectively, the mass 203 And 205 are subjected to Coriolis acceleration along their respective rotational axes 282 and 284. Furthermore, since the circular masses 203 and 205 vibrate in opposite phases, Coriolis acceleration is applied to each mass in the opposite direction. As a result, an apparent Coriolis force is applied to the circular masses 203 and 205 to deflect the masses 203 and 205 in the opposite direction relative to the substrate 201.

  For example, the “+” and “−” signs in FIG. 2 are used to indicate the relative direction of deflection of the circular masses 203 and 205 due to the applied Coriolis force. As shown in FIG. 2, the acceleration detection electrode structures 208 to 209 and 212 to 213 having a mass 203 are given −, +, −, and +, respectively. Further, the corresponding acceleration detection electrode structures 210 to 211 and 214 to 215 of the mass 205 are given the opposite signs +, −, +, and −, respectively. This is to show that the applied Coriolis force deflects these corresponding regions of mass 203 and 205 in the opposite direction relative to substrate 201.

  It should be noted that the acceleration detection electrode structures 208 to 209 along the vertical axis of the circular mass 203 and the acceleration detection electrode structures 212 to 213 along the horizontal axis have opposite signs − and +, respectively. Is attached. Similarly, the acceleration detection electrode structures 201 to 211 along the vertical axis of the circular mass 205 and the acceleration detection electrode structures 214 to 215 along the horizontal axis are provided with opposite signs + and −, respectively. This is because in the embodiment disclosed herein, the circular masses 203 and 205 are rigid structures configured to tilt relative to the substrate 201 in response to the applied Coriolis force.

  Furthermore, since the applied Coriolis force deflects the circular masses 203 and 205 in the opposite direction, the response of the masses 203 and 205 to the Coriolis acceleration about the rotational axes X and Y is in reverse phase. In contrast, the response of the circular masses 203 and 205 to the linear acceleration about the acceleration axis Z is in phase. Therefore, the electrically independent detection signals provided via the acceleration detection electrode structures 208 to 215 are preferably added and / or subtracted to obtain information corresponding to linear acceleration from the detection signals (ie, acceleration detection information). And information corresponding to the Coriolis acceleration (that is, angular velocity detection information) can be extracted.

  FIG. 3 shows an illustrative embodiment of the acceleration detection signal processing circuit 300. This circuit is configured to extract acceleration detection information and angular velocity detection information from an acceleration detection signal provided by the acceleration detection electrode structures 208 to 215 (see FIG. 2). For example, the signal processing circuit 300 can be mounted on the same substrate as the multisensor 200. The detection signal processing circuit 300 of this illustrative embodiment includes a plurality of summing amplifiers 302 to 306 and a plurality of differential amplifiers 308 to 309. These add / subtract accelerations detected by the acceleration detection electrode structures 208 to 215 to extract information on acceleration and angular velocity detection.

Specifically, the acceleration detected by the acceleration detection electrode structures 208 to 209 includes a linear component Az with respect to the acceleration axis Z and a time-varying rotation component ay (w) with respect to the rotation axis Y, and the acceleration detection electrode. The acceleration detected by the structures 210 to 211 includes a linear component Bz with respect to the acceleration axis Z and a temporally changing rotational component by (w) with respect to the rotational axis Y. It should be noted here that the rotational components ay (w) and by (w) change at the angular vibration frequency w and are proportional to the speed of rotation about the radial axis perpendicular to the vibration speed vector. Yes. Since the vibration speeds of the masses 203 and 205 are opposite to each other , the acceleration detected by the acceleration detection electrode structures 208 to 209 is Az + ay (w) and Az−ay (w), respectively, and the acceleration detection electrode structure 210 The acceleration detected by ˜211 is Bz + by (w) and Bz−by (w), respectively. Similarly, the accelerations detected by the acceleration detection electrode structures 212 to 213 are Az + ax (w) and Az−ax (w), respectively, and the accelerations detected by the acceleration detection electrode structures 214 to 215 are Bz + bx, respectively. (W) and Bz-bx (w).

  As described above, the response of the circular masses 203 and 205 (see FIG. 2) to the Coriolis acceleration for the rotation axes X and Y is in reverse phase, whereas the response of the circular masses 203 and 205 to the linear acceleration about the acceleration axis Z is The response is in phase. Therefore, the response of the circular masses 203 and 205 to the Coriolis acceleration about the rotation axes X and Y is the acceleration ay (w) and -ay (w), by (w) and -by (w), and ax (w). And -ax (w) and bx (w) and -bx (w) are out of phase, whereas the response of masses 203 and 205 to linear acceleration about acceleration axis Z is As represented by accelerations Az and Bz, they are in phase.

  As shown in FIG. 3, signals representing accelerations Az−ax (w) and Bz + bx (w) detected by the electrode structures 213 to 214 are supplied to the summing amplifier 302. The summing amplifier is configured to add these accelerations and provide the resulting sum to the differential amplifier 308. Similarly, signals representing accelerations Az + ax (w) and Bz−bx (w) detected by the electrode structures 212 and 215, respectively, are supplied to the summing amplifier 303. The summing amplifier is configured to add these accelerations and provide the resulting sum to the differential amplifier 308. The amplifier 308 generates a signal 2ax (w) + 2bx (w) indicating an angular velocity detection ("X-angular velocity") with respect to the rotation axis X by subtracting the respective signal sums given thereto.

  Further, signals representing accelerations Az + ay (w) and Bz−by (w) detected by the electrode structures 208 and 211, respectively, are supplied to the summing amplifier 304. The summing amplifier is configured to add these accelerations and provide the resulting sum to the differential amplifier 309. Signals representing accelerations Az−ay (w) and Bz + by (w) detected by the electrode structures 209 to 210 are supplied to the summing amplifier 305, respectively. The summing amplifier is configured to add these accelerations and provide the resulting sum to the differential amplifier 309. The amplifier 309 subtracts the signal sum applied thereto to generate a signal 2ay (w) + 2by (w) indicating angular velocity detection (“Y−angular velocity”) with respect to the rotation axis Y. Further, the summing amplifiers 302-305 supply their respective signal outputs to the summing amplifier 306. This summing amplifier generates a signal 4Az + 4Bz indicating acceleration detection ("Z-acceleration") with respect to the acceleration axis Z.

  FIG. 4 shows a second illustrative embodiment of a microfabricated multisensor 400 according to the present invention. The multi-sensor 400 of this illustrative embodiment comprises two pairs of accelerometers 402 and 404 and 406 and 408 arranged to form a square. The accelerometers 402, 404, 406, and 408 have masses 403, 405, 407, and 409, respectively, each of which is substantially rectangular. However, it should be understood that the masses 403, 405, 407, and 409 may be substantially circular, hexagonal, octagonal, or other suitable geometric shapes.

  The square masses 403, 405, 407 and 409 are suspended on the substrate 401 by a plurality of flexures (not shown) and fixed thereto. The multi-sensor 400 is further adjacent to a fork member 410 that connects adjacent masses 403 and 405, a fork member 412 that connects adjacent masses 403 and 407, and a fork member 414 that connects adjacent masses 407 and 409. And a fork member 416 that couples the masses 405 and 409. Fork members 410, 412, 414, and 416 combine masses 403, 405, 407, and 409 to allow relative reverse phase rotational movement of adjacent masses about rotation axes 452, 454, 456, and 458. And resists in-phase rotational movement.

  Similar to the substrate 201 (see FIG. 2) of the multisensor 200, the substrate 401 (see FIG. 4) of the multisensor 400 is comprised of a silicon substrate or other suitable type of substrate. Furthermore, the substrate 401 can be subjected to a suitable bulk micromachining process, such as surface micromachining, to form a MEMS multi-sensor device.

  As shown in FIG. 4, the multi-sensor 400 has two associated rotation sensing axes X and Y that are orthogonal to each other in the plane of the substrate 401 and one associated perpendicular to the rotation axes X and Y. And an acceleration detection axis Z. Similar to multi-sensor 200 (see FIG. 2), multi-sensor 400 provides two readings of angular velocity detection for rotational axes X and Y and one reading of acceleration detection for acceleration axis Z.

  Multi-sensor 400 also includes acceleration sensing electrode structures 418-421, 426-429 and 422-425, 430-433 disposed diametrically opposite along the vertical and horizontal axes of masses 403, 405, 407 and 409, respectively. Have. Each of the acceleration detection electrode structures 418 to 433 includes a first electrode disposed on the surface of the respective mass, and a second electrode disposed on the surface of the substrate 401 facing the first electrode. And a differential capacitor having a capacitance value that changes based on the distance between the first and second electrodes. Such a capacitance value is used for providing an electrically independent acceleration detection signal including information belonging to angular velocity detection and acceleration detection for the rotation axes X and Y and the acceleration axis Z, respectively.

  For example, acceleration detection electrode structures 418 to 419, 420 to 421, 426 to 427, and 428 to 429 have acceleration readings Az + ay (w) and Az−ay (w), Bz + by (w), and Used to provide Bz-by (w), Cz + cy (w) and Cz-cy (w), and Dz + dy (w) and Dz-dy (w). Here, Az, Bz, Cz, and Dz are linear acceleration components with respect to the acceleration axis Z, and ay (w), by (w), cy (w), and dy (w) are temporal changes with respect to the rotation axis Y. It is a rotational acceleration component of sex. Further, the acceleration detection electrode structures 422 to 423, 430 to 431, 424 to 425, and 432 to 433 are acceleration indications Az + ax (w) and Az−ax (w), Bz + bx (w) and Used to provide Bz-bx (w), Cz + cx (w) and Cz-cx (w), Dz + dx (w) and Dz-dx (w). Here, ax (w), bx (w), cx (w), and dx (w) are rotational acceleration components that change with time with respect to the rotation axis X. By suitably subtracting the respective accelerations, the linear component is canceled and the rotation component including information belonging to angular velocity detection with respect to the rotation axes X and Y is left. Furthermore, by suitably adding the respective accelerations, the rotation component is canceled and a linear component including information belonging to acceleration detection with respect to the acceleration axis Z is left.

  FIG. 5 shows a detailed plan view 500 of the microfabricated multisensor 400 (see FIG. 4). As shown in FIG. 5, the microfabricated multi-sensor 500 includes two pairs of accelerometers 502, 504 and 506, 508. The accelerometers 502, 504, 506 and 508 are secured to the substrate 501 by a plurality of flexures and have substantially square masses 503, 505, 507 and 509, respectively, suspended thereon. Specifically, each of the flexible structures that fix and suspend the mass 503 includes an anchor 570 and a stress reducing member 560. Each flexure that secures / suspends the mass 505 includes an anchor 572 and a stress relief member 562. Each flexure that secures / suspends the mass 507 includes an anchor 574 and a stress relief member 564. Each flexure that secures / suspends the mass 509 includes an anchor 576 and a stress relief member 566. It should be noted here that the anchor / stress relief member pairs are disposed along the vertical and horizontal axes of their respective masses 503, 505, 507 and 509. Similar to stress relief members 260 and 262 (see FIG. 2), each of stress relief members 560, 562, 564 and 566 is folded in half with the center free to relieve stress. This configuration creates some local asymmetry of restoring force and moment so that the folded members 560, 562, 564 and 566 are placed in pairs to maintain balance (see FIG. 5). The multi-sensor 500 further couples adjacent masses, as is known in the art, to permit relative anti-phase rotational movement of these masses and to resist in-phase rotational movement. , 512, 514 and 516.

  It should be noted that the masses 503, 505, 507, and 509 and the fork members 510, 512, 514, and 516 are the masses 403, 405, 407, and 409 of the multi-sensor 400 (see FIG. 4) and the forks. That is, the members 410, 412, 414 and 416 are substantially equivalent to each other. Further, as shown in FIG. 5, the rotation detection axes X and Y and the acceleration detection axis Z correspond to the rotation detection axes X and Y and the acceleration detection axis Z described above with reference to FIG.

  The multi-sensor 500 (see FIG. 5) has a plurality of drive electrode structures 540, 542, 544 and 546 fixed to the substrate 501. These drive electrode structures are configured such that the masses 503, 505, 507, and 509 rotate and vibrate, and the adjacent masses vibrate in opposite phases. Each of the drive electrode structures 540, 542, 544 and 546 has a plurality of fingers disposed along a radial axis of mass. The fingers are engaged with corresponding fingers extending from at least one radial edge of the mass. In a preferred embodiment, drive electrode structures 540, 542, 544 and 546 are diagonally disposed on masses 503, 505, 507 and 509, respectively.

  Multi-sensor 500 also includes a plurality of velocity sensing electrode structures 550, 552, 554, and 556 that are fixed to substrate 501 and configured to sense the vibration velocity of masses 503, 505, 507, and 509, respectively. Similar to drive electrode structures 540, 542, 544 and 546, each of speed sensing electrode structures 550, 552, 554 and 556 has a plurality of fingers disposed along a radial axis of mass. The fingers are engaged with corresponding fingers extending from at least one radial edge of the mass. In the illustrated embodiment, the speed sensing electrode structures 550, 552, 554, and 556 are disposed along the horizontal axis of masses 503, 505, 507, and 509, respectively. It should be noted here that the “+” and “−” signs in FIG. 5 indicate the Coriolis force applied to the mass when the multi-sensor 500 rotates about the mass radius axis (no sign). Is used to indicate the relative direction of deflection of the masses 503, 505, 507 and 509 that vibrate due to.

  It should be noted that the accelerometers 502, 504, 506 and 508 and the fork members 510, 512, 514 and 516 are on each side of the lateral symmetry axis of the multi-sensor 500 and on each side of the longitudinal symmetry axis. It is arranged in a mirror image type. Thus, the multi-sensor 500 can be symmetrically centered on a die (not shown) to reduce the deleterious effects of die surface area distortion and gradients on the multi-sensor 500 performance.

  A method of operating a microfabricated multi-sensor such as the multi-sensor 200 disclosed herein (see FIG. 2) will be described with reference to FIG. As shown in step 602, masses 203 and 205 are rotationally oscillated in opposite phases about rotational axes 282 and 284, respectively. During this time, the multi-sensor 200 undergoes linear / rotational motion. It should be understood that the rotation axes X and Y are in the plane of the sensor substrate 201 and the linear acceleration axis Z is perpendicular to the rotation axis. Next, as shown in step 604, the acceleration detection signals Az + ay (w) and Az-ay (w) respectively generated by the acceleration detection electrode structures 208 to 209 are subtracted, and the detection signal difference 2ay ( w). Further, as shown in step 604, the acceleration detection signals Bz + by (w) and Bz−by (w) respectively generated by the acceleration detection electrode structures 210 to 211 are subtracted, and the detection signal difference 2by (w ) Is generated. Then, as shown in step 606, the signals 2ay (w) and 2by (w) are added to produce a signal sum 2ay (w) + 2by (w). This sum includes information (Y-rotation) belonging to angular velocity detection with respect to the rotation axis Y. Next, as shown in step 608, the acceleration detection signals Az + ax (w) and Az−ax (w) respectively generated by the acceleration detection electrode structures 212 to 213 are subtracted to detect the difference 2ax ( w). Also, as shown in step 608, Bz + bx (w) and Bz−bx (w) respectively generated by the acceleration detection electrode structures 214 to 215 are subtracted to generate a detection signal difference 2bx (w). To do. Then, as shown in step 610, the signals 2ax (w) and 2bx (w) are added to produce a signal sum 2ax (w) + 2bx (w). This sum includes information (X-rotation) belonging to angular velocity detection with respect to the rotation axis X. Finally, as shown in step 612, signals Az + ay (w), Az-ay (w), Bz + by (w), Bz-by (w), Az + ax (w), Az-ax (w), Bz + bx (w) and Bz−bx (w) are added to produce the sum 4Az + 4Bz. This sum includes information (Z-acceleration) belonging to acceleration detection with respect to the acceleration axis Z.

  A method of manufacturing the microfabricated multisensor disclosed herein is illustrated by reference to FIGS. 7a-7d, 8a-8b, and FIG. 7a to 7d show detailed views of functional components of the microfabricated multisensor 500 (see FIG. 5). Specifically, FIG. 7 a shows a flexure 700 a having an anchor 774 and a stress relaxation member 764. The flexible body 700a is the same as the flexible body having the anchor 574 and the stress relaxation member 564 shown in FIG. Further, FIG. 7b shows a drive electrode structure 700b having electrode portions 744-745. The drive electrode structure 700b is the same as the drive electrode structure 544 shown in FIG. 7a-7d also show a conceptual diagram of a linear grid 720 that can be used to form a predetermined mask pattern for manufacturing a sensor device. As shown in FIGS. 7a-7d, the linear grid 720 has a plurality of horizontal and vertical spaces.

  It should be appreciated that the microfabricated multisensor disclosed herein has a large number of functional components where alignment on the substrate surface is critical to the optimal performance of the sensor device. For example, special flexure alignment, such as flexure 700a (see FIG. 7a), is generally important for optimal sensor performance. It should be further appreciated that microfabricated multi-sensors have a large number of functional components whose alignment on the substrate surface is not critical to the optimal performance of the sensor device. For example, the alignment of the drive electrode structure 700b (see FIG. 7b) is generally not critical for optimal sensor performance. It should be noted here that the alignment of the velocity sensing electrode structures 550, 552, 554 and 556 (see FIG. 5) is also generally not important for optimum sensor performance.

In a preferred embodiment, the functional component having a critical (critical) alignment on the substrate surface is defined by the mask pattern and is associated with its respective critical axis, for example the longitudinal axis L _a (FIG. 7a) of the flexure 700a. Is substantially parallel to the horizontal or vertical axis of the mask. In other words, critically aligned functional components are oriented parallel to or on the horizontal or vertical axis of the mask. For example, the flexure 700a is substantially parallel to the horizontal lines (not numbered) that form the linear grid 720. This horizontal line is parallel to the horizontal axis of the mask in this example. It should be noted that in this example, the vertical lines (unnumbered) forming the linear grid 720 are parallel to the vertical axis of the mask. Furthermore, functional components having an insignificant (non-critical) alignment on the substrate surface are defined by the mask pattern and associated with each insignificant axis, eg, the longitudinal axis L _b (FIG. 7b) of the drive electrode structure 700b. Is not parallel to the horizontal and vertical axes of the mask. That is, unimportant functional components are oriented off the horizontal and vertical mask axes. For example, the drive electrode structure 700b is not parallel to the horizontal or vertical lines of the linear grid 720.

  As a result, the electrode portions 744-745 and the fingers (not numbered) extending from the electrode portions 744-745 and meshed together are the horizontal and vertical spaces of the linear grid 720 used to define the electrode structure. Due to this, it has a stepped outer shape. In contrast, the outer shape of the flexure 700a is not stepped, but instead is constituted by substantially straight lines that facilitate important horizontal and vertical alignment of the parts. Since the outer shape of the drive electrode structure 700b is constituted by stepped sections, it is difficult to achieve alignment of such important parts.

  The use of the linear grid 720 to form the mask pattern for the multi-sensor device disclosed herein leads to a lack of accuracy that defines the width of the flexure. In particular, the stiffness of the flexure generally changes when the cube of the flexure width, and thus a relatively small error in its width, has an excessive effect on the stiffness of the flexure. If the stiffnesses of the flexures fixing and suspending the mass on the substrate are not essentially the same, the suspension center of the rotating mass will not correspond to its center of inertia. As a result, instead of rotating smoothly, the mass has a tendency to translate. That is, the mass will “sway”. This couples the driving mode of vibration directly to the sensing motion and produces a relatively large interference signal. In an actual multi-sensor, it is desirable to keep such interference below about 10 ppm of drive vibration. This interference is comparable to the maximum Coriolis signal, even at such a relatively small level.

  Since the width of each flexure of the disclosed multisensor is about 2 microns, meeting this width accuracy requirement is a difficult constraint. The mask making process typically involves transferring the production drawing onto a linear grid, such as grid 720 (see FIGS. 7a-7d). As described above, when the flexures are not aligned with the grid, their respective outlines are adapted to a stepped approximation on the grid. In general, there are several different approximations for a given angle, and existing algorithms for generating these approximations are complex. As a result, there is currently no easy way to ensure that if two identical flexures on the same structure are not aligned with the linear grid, they have the same width.

Figures 7c-7d show two representative identical flexures 700c-700d. These flexures may be included in the microfabricated multisensor 500 (see FIG. 5). As shown in FIG 7C～7d, flexures 700c~700d is defined by the mask pattern, each of the longitudinal axis _{L c} and _{L d,} is oriented to the outside of the horizontal and vertical masks axis. Furthermore, the flexible bodies 700c to 700d have alternate grid points corresponding to the inclined line portions 701c to 701d, respectively. These grid points have approximately the same average deviation from their respective lines 701c-701d. Staggered grid points corresponding to the inclined line 701c gives rise to effective flexure width W _c, also staggered grid points corresponding to the inclined line 701d causes the effective flexure width W _d. However, flexures 700c~700d are the same, the effective width _{W d} of the flexures 700 d, larger than the effective width _{W c} of the flexure 700c. Therefore, if the flexures 700c-700d are important for proper operation of the multi-sensor, for example, if the flexures 700c-700d have an important function of fixing / suspending the mass on the substrate, the flexures 700c~700d is defined by the mask pattern, the respective axes _{L c} and _{L d,} like the flexures 700a (see FIG. 7a), it is oriented in the horizontal or vertical axis parallel to or on the axis of the mask The

8a-8b show cross-sectional views 800a-800b of an illustrative microfabricated multisensor. It should be appreciated that the microfabricated multisensors of FIGS. 8a-8b are also manufactured by surface micromachining using multiple layers of sacrificial and structural materials. In this illustrative embodiment, the microfabricated multisensor 800a has a substrate 802 formed of silicon (Si) or other suitable material. Multiple portions of a layer of sacrificial material (eg, silicon dioxide SiO ₂ ) are deposited on the substrate surface. This sacrificial material is removed in the final step of the manufacturing process. After the sacrificial material is optionally etched, a layer of structural material (eg, polysilicon) 806 is deposited on the sacrificial layer 805. It should be noted that the structural layer 806 is also etched. Furthermore, electronic circuitry may be incorporated into one or more regions 804 near the structural layer 806 of the sensor device. As shown in FIG. 8 b, the sacrificial layer 805 is then etched or otherwise removed, and the structural layer 806 is secured to the substrate 802 by at least one post 808. By doing so, the layer of structural material 806 is released. For example, as shown in FIG. 8b, the substrate 802 has a width A of about 3 mm and the structural layer 806 has a total width B of about 1 mm and a thickness C of about 4 μm, separated from the structural layer 806 . The region is a distance D of about 2 μm from the substrate surface.

  The method of manufacturing the microfabricated multisensor disclosed herein will be better understood with reference to FIG. As shown in step 902, a layer of sacrificial or structural material is deposited on the surface of the substrate. Next, the layer of sacrificial or structural material is masked with a predetermined mask pattern, as shown in step 904. As described above, the mask pattern is used to define functional parts of the sensor device. If the functional component has alignment and / or physical dimensions that are important to the optimal performance of the sensor device, the component is defined by the mask pattern and parallel to the horizontal or vertical axis of the mask, as shown in step 906. Or it is oriented on its axis. If the component alignment is not critical to sensor performance, the component is defined by the mask pattern and oriented off the horizontal and vertical axes of the mask, as shown in step 908. The underlying material that is not protected by the mask is then preferably etched to transfer the mask pattern to its special material layer, as shown in step 910. The depositing, masking, and etching steps 902, 904, and 910 are repeated until the construction of the functional component of the microfabricated sensor device is completed. Finally, as shown in step 912, one or more portions of the structural material are released by etching or otherwise removing the underlying and / or surrounding sacrificial material.

  It will be further appreciated by those skilled in the art that modifications and variations can be made to the microfabrication device structures having the on-axis and off-axis orientations described above without departing from the inventive concept disclosed herein. I will. Accordingly, the invention should not be viewed as limited except as by the spirit and scope of the appended claims.

Simplified block diagram of a micromachined multisensor according to the present invention Detailed plan view of the microfabricated multi-sensor of FIG. Schematic diagram of acceleration detection signal processing circuit for the microfabricated multi-sensor of FIG. A simplified block diagram of an alternative embodiment of the microfabricated multi-sensor of FIG. Detailed plan view of the microfabricated multi-sensor of FIG. Flow diagram of a method for operating the microfabricated multi-sensor of FIG. Detailed view of functional parts of micromachined multi-sensor of FIG. Detailed view of functional parts of micromachined multi-sensor of FIG. Detailed view of functional parts of micromachined multi-sensor of FIG. Detailed view of functional parts of micromachined multi-sensor of FIG. 4 is a cross-sectional view of the microfabricated multisensor of FIG. 4 showing a method of manufacturing a multisensor device. 4 is a cross-sectional view of the microfabricated multisensor of FIG. 4 showing a method of manufacturing a multisensor device. FIG. 4 is a flowchart of a method for manufacturing the microfabricated multi-sensor of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 100 Micro processing multi sensor 101 Substrate 102, 104 Accelerometer 103, 105 Circular mass 106 Coupling fork 108-115 Acceleration detection electrode structure 142, 144 Rotation axis

Claims (11)

Micromachining a multi sensor a method for processing a substrate, said microfabricated multi-sensor has at least one first component having a first physical dimensions or alignment with a predetermined accuracy requirements on the substrate When, and at least one second component having a second physical dimensions or alignment on the substrate, the method comprising
Depositing at least one layer on the surface of the substrate;
A step of masking by the deposition layer using a predetermined mask pattern,
Etching the mask layer and transferring a mask pattern to the layer,
In the step of the mask, the mask pattern has a horizontal and vertical axes, a first region corresponding to the first part of the fine processing multi-sensor on the deposited layer, the fine processing multi-sensor A second region corresponding to each of the second parts, and the first region satisfies a predetermined accuracy requirement of the first physical dimension, so that the first region of the mask pattern has a first axis that is substantially oriented parallel to the horizontal or vertical axis, the region of said second, second axis, which is oriented to the outside of the horizontal and vertical axes of the mask pattern wherein the has a. The method of claim 1, wherein the depositing deposits the layer on a substrate surface, the deposited layer comprising at least one layer of sacrificial material and at least one layer of structural material . The method of claim 2, further comprising the step of releasing the layer of structural material by removing said sacrificial material. 4. The method of claim 3, wherein the step of separating the layer of structural material is performed by etching the layer of sacrificial material. Wherein the step of depositing, the process masks, and the step of etching method of claim 1, further comprising the step of repeating to production of the first and second part is completed. The method of claim 1, wherein the masking step further comprises forming a predetermined mask pattern using a linear grid. The masking step masks the deposited layer using a predetermined mask pattern, and the first axis of the first component is oriented substantially parallel to a horizontal or vertical axis of the mask pattern. the method according to claim 1, wherein the vertical axis is. The masking step masks the deposited layer using a predetermined mask pattern, and the second axis of the second component is a longitudinal axis oriented outside the horizontal and vertical axes of the mask pattern. The method of claim 1, which is an axis. The masking step masks the deposited layer using a predetermined mask pattern, and the first axis of the first part is oriented substantially above the horizontal or vertical axis of the mask pattern. The method according to claim 1. The step of the mask is to mask the deposited layer using a predetermined mask pattern, horizontal and vertical axes of the mask pattern are respectively substantially parallel to the horizontal and vertical lines of the straight grid associated with the mask pattern The method of claim 1 , wherein The step of the mask is to mask the deposited layer using a predetermined mask pattern, the first and second regions corresponding to each of said first and second parts are defined with respect to the linear grid by the mask pattern The method according to claim 10.

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