JP4682082B2 - X-ray concentrator - Google Patents

Description

  The present invention relates to an X-ray focusing apparatus, and more particularly to an X-ray focusing apparatus.

  In the third generation synchrotron radiation facility, X-rays having characteristics of high brightness, low emittance, and high coherence can be used in various wavelength regions from soft X-rays to hard X-rays. This dramatically improved the sensitivity and spatial resolution of various analyzes such as fluorescent X-ray analysis, photoelectron spectroscopy, and X-ray diffraction. Such X-ray analysis and X-ray microscopic methods using synchrotron radiation are not only high sensitivity and high resolution but also non-destructive observation, so they are currently used in fields such as medicine, biology, and materials science. It is being done.

  FZP (Fresnel zoneplate) and K-B (Kirkpatrick and Baez) mirrors are generally used for X-ray focusing optical elements, which are the main technologies of X-ray analysis and X-ray microscopy (see Patent Document 1). . FZP is simple in alignment and can be manufactured relatively easily by applying semiconductor exposure technology (see Patent Document 2). However, since the diffraction phenomenon is used, the light collection efficiency is low, and chromatic aberration is obtained. There is. The K-B mirror uses the total reflection phenomenon and thus has high light collection efficiency and almost no chromatic aberration, but is said to be difficult in terms of mirror shape processing and alignment.

The KB mirror arrangement is composed of two total reflection mirrors in which an elliptical shape having a light source and a condensing point as a focal point is formed. As shown in FIG. 1, each mirror is responsible for vertical and horizontal light collection. The mirror shape requires nanometer-level shape accuracy over the entire mirror region. A general KB mirror alignment method is to repeat the alignment and condensing test and arrange the mirror at an angle and position where X-rays can be collected most, but there are many axes to be adjusted. Therefore, it is difficult to realize an ideal arrangement of two mirrors within a limited beam time as in a synchrotron radiation experiment.
Japanese Patent Application Laid-Open No. 08-271697 Japanese Patent No. 3634866

  Therefore, in view of the above-described situation, the present invention intends to solve an X-ray condensing device for condensing hard X-rays and soft X-rays used in a synchrotron radiation facility, which has a large numerical aperture ( Provided is an X-ray condensing device equipped with a mirror manipulator capable of performing high-precision and rapid alignment of KB mirrors having NA) and capable of achieving a high spatial resolution with a condensing spot of 100 nm or less There is to do.

The present invention is an X-ray condensing device for condensing hard X-rays and soft X-rays used in a synchrotron radiation facility with a spatial resolution of a converging spot of 100 nm or less for solving the above-mentioned problems, A KB (Kirkpatrick and Baez) mirror arrangement in which a first mirror and a second mirror made of two total reflection mirrors in which an elliptical shape focusing on a light source and a condensing point is formed, is arranged perpendicular to each other. One of the two parallel laser beams is vertically incident on the first mirror disposed horizontally, and the other is vertically incident on the second mirror disposed vertically by changing the direction of 90 °. The X-ray condensing apparatus is characterized in that the reflected beam from the mirror is adjusted so as to overlap the incident beam (claim 1).

  Here, two autocollimators that generate laser beams for alignment are provided on an inclined stage whose relative angle can be adjusted, the two laser beams are adjusted in parallel in advance, and the first mirror is placed horizontally. The second mirror is arranged vertically, a pentaprism capable of changing the optical path by 90 ° is arranged in the vicinity of the normal direction of the second mirror, and one laser beam is directed to the first mirror. The first mirror and the second mirror are incident so that the other laser beam is vertically incident on the second mirror through the pentaprism and can be adjusted so that the reflected beam from both mirrors overlaps the incident beam. In addition to the X-ray incident angle adjustment function, one of the mirror holders has a function to rotate the mirror around the optical axis and keep the two laser beams parallel. It is preferred to have a tiltable feature the two autocollimator in all directions in a state (claim 2).

  In addition, the first mirror is held on the upper surface of the lower reference plate via an incident angle adjusting mechanism, and the second mirror is held via another incident angle adjusting mechanism, and a plurality of the mirrors are arranged above the lower reference plate. An upper reference plate supported by a column is provided, a first autocollimator is mounted on the tilt stage provided on the upper reference plate, and a second tilt stage is provided on the second tilt stage. More preferably, the second autocollimator is attached.

In addition, on the lower surface side of the upper reference plate, a plane mirror is detachably mounted by a support member provided on the upper reference plate, and two laser beams generated from the two autocollimators are transmitted by the plane mirror. The tilt stage is adjusted so that the reflected beam and the reflected beam overlap with the incident beam.

  Furthermore, it is preferable that the incident angle adjusting mechanism can adjust the incident angles of the first mirror and the second mirror with an accuracy of an angle step of 0.5 μrad or less by an elastic hinge.

  Since the X-ray condensing apparatus of the present invention configured as described above does not use the X-ray to be condensed, it can be performed in advance without being affected by machine time. Further, as long as the optical axes of the autocollimator are aligned in parallel, the perpendicularity between the mirrors can be adjusted easily and quickly without being affected by the placement error of the pentaprism or the autocollimator. Thereby, alignment of the KB mirror having a large numerical aperture (NA) can be performed with high precision and speed, and a high spatial resolution with a focused spot of 100 nm or less can be achieved.

  The optical system applied in the X-ray condensing apparatus of the present invention can achieve a beam size of 50 nm or less with diffraction-limited condensing, and considering a practical use of the X-ray microscope system, a relatively long 100 mm It has a working distance. The X-ray optical system has a KB mirror arrangement composed of two elliptical mirrors. The elliptical mirror is a 100mm long Si single crystal block processed with nanometer level accuracy, and the elliptical reflective surface is coated with Pt to a thickness of 50nm, allowing 15keV X-rays to be incident as large as 4mrad. It has optical properties that can be collected at the corners.

  As shown in FIG. 1, the X-ray L produced by the synchrotron radiation generator R such as SPring-8 or a free electron laser passes through the slit S, and then is an elliptical mirror arranged in a vertical direction. 1 (first mirror) and the horizontal direction condensing mirror 2 (second mirror) arranged vertically. In the present embodiment, the center distance between the first mirror 1 and the second mirror 2 is set to 102 mm, the focal length of the first mirror 1 is set to 253 mm, the focal length of the second mirror 2 is set to 150 mm, and the focal length from the second mirror end to the focal point is set. The distance is about 100 mm.

  In the mirror alignment of the X-ray focusing apparatus according to the present invention, the incident angle among the axes to be considered is the angle of the mirror surface with respect to the incident X-ray at the mirror center, and the in-plane rotation is around the normal vector at the mirror center. Rotation. Further, the perpendicularity between mirrors is defined as a value obtained by defining a normal vector at the center of two mirrors and subtracting 90 ° from an angle formed by the two axes.

  In order to realize diffraction-limited focusing using the designed mirror, first, a ray tracing simulator was used to estimate the incident angle, the mirror-to-mirror perpendicularity, and the allowable angle error in the in-plane rotation. The calculation of the allowable angle error by the ray tracing simulator was performed as follows. First, the beam size defined by the distance between the first minimum points at the diffraction limit was calculated by the following equation.

d = 2.0λf / D
Here, d is the distance between the first minimum points of the diffracted wave based on the rectangular aperture, λ is the wavelength of the X-ray, f is the focal length, and D is the mirror aperture.

  Next, the relationship between the angle error and the spot size defined by the maximum width was calculated using a ray tracing simulator. At this time, a range in which the spot size obtained by the ray tracing simulator is equal to or less than d obtained by the above equation was defined as an allowable angle error. As a result, it was found that the accuracy required for the alignment of the incident angle is ± 0.7 μrad for the vertical direction collecting mirror (first mirror) and ± 0.3 μrad for the horizontal direction collecting mirror (second mirror). . The allowable angle range at the mirror verticality was ± 40 μrad. In addition, the allowable angle range in the in-plane rotation is ± 13 mrad for the vertical direction condensing mirror and ± 16 mrad for the horizontal direction condensing mirror.

  It is expected that the allowable angle error obtained by the ray tracing simulator will be more severely estimated than the actual value near the diffraction limit. For this reason, at an incident angle where extremely strict alignment accuracy is required, it is strictly calculated by wave optical simulation. Since the ray tracing simulator approximates the wavelength to infinitesimal, the focused beam near the diffraction limit cannot be strictly discussed by this method. In contrast, wave optics simulation is a new simulator that can calculate the intensity distribution profile of the reflected beam by calculating the Fresnel Kirchhoff diffraction integral. As a result of this wave optical simulation, the relationship between the incident angle error and the focused diameter represented by FWHM was obtained, and the allowable incident angle error was obtained under ideal conditions (ideal mirror, ideal mirror alignment). When the minimum spot size is defined as an angle range extending to 120%, the allowable incident angle error was found to be ± 1.5 μrad for the vertical focusing mirror and ± 0.9 μrad for the horizontal focusing mirror.

  Therefore, in the X-ray condensing apparatus according to the present invention, the most accurate adjustment is necessary for the incident angle of the mirror, and the next is the inter-mirror perpendicularity, and the incident angle adjusting mechanism A capable of highly accurate alignment, respectively. The verticality adjustment mechanism B is used.

  The outline | summary of the X-ray condensing device of this invention is demonstrated based on FIGS. 1-3. The X-ray condensing device of the present invention holds the second mirror 2 on the output side made of an elliptical mirror in the same positional relationship as the first mirror 1 on the input side made of an elliptical mirror and enables high-precision alignment. The mirror holding part 4 holding the two mirrors 1 and 2 is placed on the base part 3, and the attitude of the mirror holding part 4 is adjusted by adjusting the base part 3 I can do it. In the present invention, the X-ray beam direction on the horizontal projection plane of the X-ray (radiated light) to be collected is defined as the X direction, the direction perpendicular thereto is defined as the Y direction, and the vertical direction is defined as the Z direction.

  That is, the base unit 3 is provided with an XY stage 6 on a base plate 5 placed on an installation surface, and Z stages 7 and 7 are provided on the XY stage 6, thereby constituting a bottom surface of the mirror holding unit 4. The lower reference plate 8 having a high height is supported at three points. The XY stage 6 has a stopper function for maintaining the adjusted state. Here, as the XY stage 6 and the Z stage 7, commercially available high-precision ones can be used.

  The incident angle adjusting mechanism A is provided inside the mirror holding unit 4 and uses an elastic hinge to adjust the incident angles of the first mirror 1 and the second mirror 2 over an angle step of at least 0.5 μrad. It can be adjusted without rush. The verticality adjusting mechanism B is provided on the upper part of the mirror holding unit 4 and reflects one laser beam at the center of the horizontal first mirror 1 with reference to two laser beams adjusted in parallel with high accuracy. And the other laser beam is reflected at the center of the second mirror 2 by changing the direction of 90 °, and the first mirror is adjusted by adjusting the mirror posture so that the reflected lights overlap with the reference laser beam, respectively. The perpendicularity between the first mirror 2 and the second mirror 2 can be adjusted with a resolution of 40 μrad or more.

  More specifically, the mirror holding unit 4 has an X stage 9 mounted on the X-ray incident side on the upper surface of the rectangular lower reference plate 8, and an incident angle adjusting mechanism A1 is provided on the X stage 9 to The first mirror 1 is held horizontally, a Y stage 10 is mounted on the exit side of the lower reference plate 8, and an incident angle adjusting mechanism A2 is provided on the Y stage 10 to hold the second mirror 2 vertically. ing. Here, the incident angle adjusting mechanism A1 and the incident angle adjusting mechanism A2 have the same basic functions as the highly accurate incident angle adjusting mechanism using an elastic hinge, and therefore, the incident angle adjusting mechanism A1 and the incident angle adjusting mechanism A2 are incident when there is no need to distinguish them. Collectively referred to as angle adjustment mechanism A.

  The verticality adjusting mechanism B has support columns 11,... Standing upright at the four corners of the lower reference plate 8, and an upper reference plate 12 serving as a reference surface at the upper end thereof is fixed in parallel with the lower reference plate 8. The lower reference plate 8 and the upper reference plate 12 are provided in a highly rigid structure connected by four support columns 11. The perpendicularity adjusting mechanism B generates two laser collimators 13 and 14 having functions of generating a laser beam and receiving a reflected beam on the upper reference plate 12 via tilt stages 15 and 16, respectively. The laser beam emitted from each of the autocollimators 13 and 14 can be adjusted so as to be accurately parallel. Here, the tilt stage 15 is supported at three points by a steel ball (not shown) and two micrometers 17 and 17 on the upper reference plate 12, and the autocollimator 13 is fixed on the tilt stage 15. In addition, the tilt stage 16 is placed. The tilt stage 16 is supported at three points by a steel ball (not shown) and two micrometers 18 and 18 on the tilt stage 15, and the autocollimator 14 is fixed on the tilt stage 16.

  The inclined stage 15 includes a circular hole or circular recess formed in one corner of a rectangular metal plate in plan view, and a steel ball having a diameter larger than that of the circular hole or circular recess formed in the upper reference plate 12. Are fitted together to form a universal joint, and a tension coil spring provided between the upper reference plate 12 and one side portion of the inclined stage 15 is connected to a pin projecting from the upper reference plate 12. The one side edge is stopped, and the posture of the tilt stage 15 can be freely changed in all directions by the micrometers 17 and 17 so that the tilt stage 15 does not rattle in any state. is doing. Similarly, the tilt stage 16 has a circular hole or circular recess opened in one corner of a rectangular metal plate in plan view, and a circular hole or circular recess opened in the tilt stage 15 having a diameter larger than the diameter. A steel ball is fitted to form a universal joint, and a tension coil spring provided between the tilt stage 15 and one side portion of the tilt stage 16 is used to connect the tilt stage 16 to a pin projecting from the tilt stage 15. The one side edge is stopped, and the posture of the tilt stage 16 can be freely changed in all directions by the micrometers 18 and 18, so that the tilt stage 16 does not rattle in any state. is doing

The laser beam emitted vertically downward from the autocollimator 13 proceeds downward through an opening (not shown) provided in the tilt stage 15 and the upper reference plate 12, and is emitted vertically downward from the autocollimator 14. The laser beam thus made travels downward through openings (not shown) provided in the tilt stages 16 and 15 and the upper reference plate 12. On the other hand, on the lower surface side of the upper reference plate 12, a flat mirror 19 is supported by a pair of support members 20, 20 having a substantially L-shaped cross section provided below the upper reference plate 12. The plane mirror 19 reflects the laser beam emitted from the autocollimators 13 and 14 at a right angle, and adjusts the two laser beams in parallel by looking at the monitor so that the reflected beams pass through the same optical path. Used to adjust. Therefore, the surface accuracy of the plane mirror 19 must be adjustable so that the two laser beams emitted from the autocollimators 13 and 14 are parallel to each other with the required accuracy. Then, as will be described later, when adjusting the perpendicularity of the first mirror 1 and the second mirror 2 using two laser beams having high parallelism, the plane mirror 19 is either removed or supported. The members 20 and 20 are moved to positions that do not get in the way.

  FIG. 4 shows details of the mirror holding part 4. The incident angle adjusting mechanism A 1 and the incident angle adjusting mechanism A 2 are installed on the upper surface of the lower reference plate 8, and the laser beam emitted from the autocollimator 14 is An optical path changing mechanism 21 for vertically irradiating the second mirror 2 by changing the 90 ° direction is installed on the Y stage 10. The optical path changing mechanism 21 constitutes a verticality adjusting mechanism B together with the autocollimators 13, 14 and the like.

  As shown in FIGS. 4 to 7, the incident angle adjusting mechanism A <b> 1 has square pillars 22, 22 standing on both sides of the X stage 9, and is predetermined along the X-direction side surface of each stationary pillar 22. Movable columns 23 are arranged at intervals, and the upper ends of the fixed columns 22 and the movable columns 23 are connected by elastic hinges 24 having thin hinge portions 24A extending in the Y direction in the center. A support plate 25 is fixed between the lower ends of the two, and a pressing plate 26 is provided on the lower surface of the support plate 25 in the middle of the movable columns 23, 23, and fixed on the X stage 9 in the X direction. In this structure, the pressing plate 26 is pushed by the driving portion of the linear actuator 27 to tilt the support plate 25 by a minute angle, and the incident angle of the first mirror 1 supported by the support plate 25 can be adjusted. Here, the drive unit of the linear actuator 27 and the pressing plate 26 are always in contact with each other with a substantially constant pressing force. When the drive portion of the linear actuator 27 is advanced, the support plate 25 is tilted in one direction around the hinge portion 24A, and when the drive portion of the linear actuator 27 is retracted, the hinge portion 24A is elastically returned to the support. The plate 25 is inclined in the other direction. Here, since the minimum adjustable angle step is inversely proportional to the distance from the hinge portion 24A of the elastic hinge 24 to the pressing point of the pressing plate 26 pressed by the driving portion of the linear actuator 27, the adjustment accuracy of the incident angle is increased. In order to increase the distance, this distance may be increased as much as possible, but the maximum value is determined by restrictions on the size of the apparatus.

  Thus, if the first mirror 1 is held on the support plate 25, the incident angle can be adjusted, but the first mirror 1 can be tilted by a minute angle around the optical axis. The first mirror 1 is stationary on the upper surface of the tilting plate 28 provided above. That is, as shown in FIG. 7, an elastic hinge 29 having a substantially H-shaped cross section is provided on the vertical line of the first mirror 1 so that the thin hinge portion 29 </ b> A is positioned, and the elastic hinge 29 tilts with the support plate 25. A plate 28 is connected, and a micrometer 30 is provided at the side end of the support plate 25 and the tilt plate 28 that extend laterally beyond one fixed column 22, and the micrometer 30 is driven to rotate to support plate 25. The first mirror 1 can be tilted left and right around the hinge 29A by adjusting the distance between the side end portions of the tilting plate 28. An elastic biasing tool 31 composed of a bolt and a coil that elastically biases the support plate 25 and the tilting plate 28 in a direction in which the support plate 25 and the tilting plate 28 approach each other is provided at an intermediate position between the elastic hinge 29 and the micrometer 30.

  Here, the support plate 25 on the side where the micrometer 30 is provided is provided with an opening 32 for loosely inserting the fixed column 22, and the fixed column 22 and the movable column 23 are loosely inserted into the tilting plate 28. An opening 33 is provided so that the operations do not interfere with each other. Further, the height is set so that the center of the hinge portion 24 </ b> A of the elastic hinge 24 is flush with the surface of the first mirror 1. The first mirror 1 is disposed along a positioning portion 34 arranged in an L shape in plan view on the upper surface of the tilting plate 28, and is allowed to stand in a state where it is supported by three steel balls. The position of the first mirror 1 can be corrected by pushing the end of the first mirror 1 with a small micrometer 35 provided horizontally at the end of the positioning portion 34 in the X direction.

  As shown in FIGS. 4 and 8 to 10, the incident angle adjusting mechanism A <b> 2 has a fixed plate 36 erected on the outer side of the Y stage 10 with its surface parallel to the Y direction, and upper and lower portions of the fixed plate 36. The fixed columns 37 and 37 of the rectangular column are provided on the side, and the movable columns 38 are arranged at predetermined intervals along the side surfaces in the Y direction of the fixed columns 37, and between the fixed columns 37 and the side ends of the movable columns 38. Are connected by an elastic hinge 39 having a thin hinge portion 39A extending in the Z direction at the center, a support plate 40 is fixed between the other ends of the movable columns 38, 38, and the upper and lower sides of both movable columns 38, 38 are fixed. In the middle, a pressing plate 41 is provided on the outer side surface of the supporting plate 40, and the pressing plate 41 is pushed by a driving portion of a linear actuator 42 fixed on the Y stage 10 in the X direction. Of the second mirror 2 supported by the support plate 40 at a slight angle. It is a structure capable of adjusting the angular.

  Further, a holding plate 43 that holds the second mirror 2 vertically is connected to the inner side surface of the support plate 40 via a minute Z stage 44, and a receiving member 45 is attached to the lower edge of the holding plate 43. A stopper member 46 perpendicular to the Y direction end (outgoing side) is provided in a substantially L shape in side view, and the receiving member 45 is provided with a pressing plate 47 that elastically presses the reflecting surface side of the second mirror 2. ing. The pressing plate 47 is substantially U-shaped in a side view, and protrudes toward the reflecting surface of the second mirror 2 from a hole penetrating the upper and lower portions of both side portions, and pressing tools 48, 48 elastically biased in that direction. I have.

  The holding plate 43 is bolted to the Z stage 44 and is movable in the vertical direction (Z direction). An urging pin 49 that elastically urges upward is attached to the block, a small micrometer 50 is attached downward to the upper block, and the urging pin 49 urges the holding plate 43 upward, The upper and lower positions of the holding plate 43 can be adjusted by pressing with a micrometer 50 from above to perform vertical positioning.

  Further, the lateral position is set so that the center of the hinge portion 39A of the elastic hinge 39 is flush with the surface of the second mirror 2. The X-ray reflected from the first mirror 1 is reflected by the central portion of the second mirror 2 through the gap between the second mirror 2 and the pressing plate 47. Here, since the central portion of the pressing plate 47 is open, alignment is performed using the laser beam from the autocollimator 14 using this portion.

  The optical path changing mechanism 21 holds a pentaprism 51 that reflects light incident on one surface and emits it from another orthogonal surface. As the pentaprism 51, one having a deviation angle accuracy of 36.4 μrad or less was used. As shown in FIGS. 4, 10, and 11, the optical path changing mechanism 21 is provided in the inner portion of the Y stage 10 and is driven in the Z direction on a rotary stage 52 fixed to the upper surface of the Y stage 10. The lifting / lowering tool 53 is provided, and the pentaprism 51 is sandwiched between two holding plates 54 and 54 and fixed to the drive unit of the lifting / lowering tool 53.

  Finally, the positional relationship among the verticality adjusting mechanism B, the first mirror 1 and the second mirror 2 is shown in FIGS. 11 and 12, and the vertical mirror adjusting mechanism B is used to A method of aligning the second mirror 2 will be described with reference to FIGS. First, as shown in FIG. 13, the plane mirror 19 is set at a position crossing the laser beam emitted from the autocollimators 13 and 14 so that the reflected beam reflected from the plane mirror 19 accurately overlaps the incident beam. In this way, the inclination of the inclination stages 15 and 16 is adjusted. By this adjustment, the two laser beams emitted from the autocollimators 13 and 14 are perpendicular to the plane mirror 19, and the parallelism of both beams is guaranteed with the guaranteed plane accuracy of the plane mirror 19. Then, the plane mirror 19 is removed from the optical path of the two laser beams (see FIG. 14), and the laser beam emitted from the autocollimator 13 is reflected at the center of the first mirror 1 as shown in FIG. The incident angle adjusting mechanism A1 is adjusted so that the reflected beam accurately overlaps the incident beam. In addition, as shown in FIG. 16, the laser beam emitted from the autocollimator 14 is converted into a 90 ° direction by the pentaprism 51 and enters the center of the second mirror 2, and the reflected beam is reflected by the pentaprism 51. The 90 ° direction is converted and returned to the autocollimator 14, and the incident angle adjusting mechanism A2 is adjusted so that the reflected beam and the incident beam are accurately overlapped. In this way, the first mirror 1 and the second mirror 2 can be adjusted to be vertical using the verticality adjusting mechanism B.

  In the alignment using the verticality adjusting mechanism B so far, the X-rays to be collected are not used, and can be performed in advance without being affected by the machine time. In addition, the feature of alignment using this perpendicularity adjustment mechanism B is that if the optical axis of the autocollimator is aligned in parallel, it is easy and quick to make the vertical mirror-to-mirror operation without being affected by the placement error of the pentaprism or autocollimator. It is possible to adjust the degree.

  Then, the incident angles of the first mirror 1 and the second mirror 2 and the focal positions of the two mirrors are finely adjusted while actually measuring the beam profile of the X-rays arranged in the condensing unit using X-rays. It is. Here, the XY stage 6, the Z stage 7, the X stage 9, and the Y stage 10 as well as the linear actuators 27 and 42 are all driven by a pulse motor, and the number of pulses and the moving distance can be monitored and accurately controlled remotely. It is like that.

It is a conceptual diagram of the X-ray condensing device of this invention. It is the whole X-ray condensing device perspective view of the present invention. It is the side view similarly seen from the Y direction. It is a perspective view of a mirror holding part. It is a perspective view of incident angle adjustment mechanism A1. Similarly, it is a perspective view of the incident angle adjusting mechanism A1 in a state in which the tilting plate and the first mirror are removed. It is the side view of incident angle adjustment mechanism A1 similarly seen from the X direction. It is a perspective view of incident angle adjustment mechanism A2. Similarly, it is a perspective view of the incident angle adjustment mechanism A2 in a state in which the pressing plate and the second mirror are removed. It is a top view of incident angle adjustment mechanism A2 similarly. It is the side view seen from the Y direction which omitted the incident angle adjustment mechanism in order to show a perpendicularity adjustment mechanism. It is the side view seen from the X direction which omitted the incident angle adjustment mechanism in order to show a perpendicularity adjustment mechanism. It is explanatory drawing which shows the process of adjusting the laser beam of two autocollimators in parallel using a plane mirror. It is explanatory drawing of the state which excluded the plane mirror in the state of FIG. It is explanatory drawing which shows the state which adjusts the attitude | position of a 1st mirror using the laser beam of one autocollimator. It is explanatory drawing which shows the state which adjusts the attitude | position of a 2nd mirror using the laser beam of the other autocollimator.

Explanation of symbols

R Synchrotron Radiation Generator S Slit L X-rays A, A1, A2 Incident Angle Adjustment Mechanism B Verticalness Adjustment Mechanism 1 First Mirror (Vertical Condensing Mirror)
2 Second mirror (horizontal focusing mirror)
3 Base unit 4 Mirror holding unit 5 Base plate 6 XY stage 7 Z stage 8 Lower reference plate 9 X stage 10 Y stage 11 Column 12 Upper reference plate 13 Autocollimator 14 Autocollimator 15 Inclination stage 16 Inclination stage 17 Micrometer 18 Micro Meter 19 Flat mirror 20 Support member 21 Optical path changing mechanism 22 Fixed column 23 Movable column 24 Elastic hinge 25 Support plate 26 Press plate 27 Linear actuator 28 Tilt plate 29 Elastic hinge 30 Micrometer 31 Elastic biasing device 32 Opening 33 Opening 34 Positioning part 35 micrometer 36 fixed plate 37 fixed column 38 movable column 39 elastic hinge 40 support plate 41 pressing plate 42 linear actuator 43 holding plate 44 Z stage 45 receiving member 46 stop member 47 pressing plate 48 pressing tool 49 biasing pin 50 micrometer 5 Pentaprism 52 rotary stage 53 lifting device 54 supporting plate

Claims (5)

An X-ray condensing device for condensing hard X-rays and soft X-rays used in synchrotron radiation facilities with a spatial resolution with a condensing spot of 100 nm or less, and an elliptical shape focusing on a light source and a condensing point A KB (Kirkpatrick and Baez) mirror arrangement in which a first mirror and a second mirror composed of two total reflection mirrors are vertically arranged with each other, and one of the two parallel laser beams, Incidently incident on the first mirror arranged horizontally, and incident on the second mirror arranged vertically on the other side by changing the direction of 90 ° so that the reflected beam from both mirrors overlaps the incident beam. An X-ray condensing device characterized by adjusting.   Two autocollimators that generate laser beams for alignment are provided on an inclined stage whose relative angle can be adjusted, the two laser beams are adjusted in advance in parallel, and the first mirror is arranged horizontally. The second mirror is arranged vertically, a pentaprism capable of changing the optical path by 90 ° is arranged in the vicinity of the normal direction of the second mirror, and one laser beam is incident on the first mirror perpendicularly. The other laser beam is incident on the second mirror perpendicularly through the pentaprism, and either the first mirror or the second mirror can be adjusted so that the reflected beam from both mirrors overlaps the incident beam. In addition to the X-ray incident angle adjustment function, one of the holders has the function of rotating the mirror around the optical axis, while maintaining the two laser beams in parallel. Serial X-ray focusing device according to claim 1, further comprising a tiltable feature two autocollimator in all directions.   The first mirror is held on the upper surface of the lower reference plate via an incident angle adjusting mechanism, and the second mirror is held via another incident angle adjusting mechanism. A supported upper reference plate is provided, a first autocollimator is mounted on the tilt stage provided on the upper reference plate, a second tilt stage is provided, and a second tilt stage is provided on the second tilt stage. The X-ray condensing device according to claim 2, wherein the autocollimator is attached. On the lower surface side of the upper reference plate, a plane mirror is detachably attached by a support member provided on the upper reference plate, and the two laser beams generated from the two autocollimators are simultaneously reflected by the plane mirror. The X-ray focusing apparatus according to claim 3, wherein the tilt stage is adjusted so that the reflected beam overlaps the incident beam.   The X-ray condensing apparatus according to claim 3, wherein the incident angle adjusting mechanism is configured to adjust the incident angles of the first mirror and the second mirror by an elastic hinge with an accuracy of an angle step of 0.5 μrad or less.

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