JP4678620B2 - Multi-source mechanism for film deposition equipment - Google Patents

Description

  The present invention relates to a multi-source mechanism suitable for a film forming apparatus for producing a thin film, particularly a combinatorial film forming apparatus.

In recent years, film forming apparatuses for forming thin films made of materials having various compositions, combinatorial film forming apparatuses, and the like have been used.
By using such a combinatorial deposition system, a library of substance groups with various compositions can be formed on the same substrate at the same time in the same vacuum process. Theoretical predictions can be obtained from the discovery of the library or the characteristics of the library. As a result, it is said that the exploration of a substance that takes 100 years in the conventional method can be shortened to about one month if a combinatorial film forming apparatus is used.

  The combinatorial film forming apparatus requires means for limiting material supply to only a desired part on the substrate, film forming means for different types of thin films, and structure analysis means for analyzing the structure of the desired part on the substrate. For example, it has a film thickness monitor such as a plurality of mask devices, a target switching device, an ablation / laser light introducing device, a substrate heating laser device, and a RHEED device (for example, see Patent Document 1).

  Conventionally, a multi-target mechanism is known as the target switching device, and such a multi-target mechanism is configured, for example, as shown in FIG. 6, the multi-target mechanism 50 includes a target stage mechanism 53 disposed in the vacuum chamber 52, a first driving mechanism 54 that rotates the target stage mechanism 53 in the direction of arrow A, and the target stage mechanism. And a second drive mechanism 56 for rotating the target 55 mounted on the head 53 in the direction of arrow B.

  The target stage mechanism 53 is attached to the tip of a rotary shaft 53b that is rotatably supported with respect to the base 53a, and in the illustrated case, a target head 53c provided at equiangular intervals around the rotary shaft 53b. I have. Here, the target head 53c is configured such that the target 55 can be mounted on the surface thereof and can rotate in the direction of arrow B.

The first drive mechanism 54 includes a first drive shaft 54a extending from the base 53a to the opposite side of the rotation shaft 53b, and rotational drive force is transmitted from the outside to the first drive shaft 54a. Thus, the rotary shaft 53b is driven to rotate in the direction of arrow A.
The second drive mechanism 56 includes a second drive shaft 56a extending in parallel to the first drive shaft 54a of the first drive mechanism 54 from the base 53a to the opposite side of the rotation shaft 53b. Thus, the rotational driving force is transmitted to the second drive shaft 56a, so that each target head 53c is rotationally driven in the direction of arrow B.
The first drive shaft 54a of the first drive mechanism 54 and the second drive shaft 56a of the second drive mechanism 56 both project outward from the vacuum chamber 52 during film formation by the film formation apparatus. It has become.

  According to the multi-target mechanism 50 having such a configuration, different types of targets 55 are mounted on the target heads 53c of the target stage mechanism 53, set in the vacuum chamber 52, and the interior of the vacuum chamber 52 is set. Evacuate. Then, by rotating the first drive shaft 54a of the first drive mechanism 54 protruding outside the vacuum chamber 52, the entire target stage mechanism 53 is rotated in the direction of arrow A, and a desired target 55 is mounted. The selected target head 53c is selected and brought to a predetermined position.

Next, by rotating the second drive shaft 56a of the second drive mechanism 56 protruding outside the vacuum chamber 52, the selected target head 53c and the target 55 attached thereto are moved in the direction of arrow B. While rotating, the target 55 is irradiated with an ablation laser light L from an ablation laser light introducing device (not shown).
As a result, when the target 55 is heated by the ablation laser beam L and evaporated, the target 55 is deposited on the surface of the substrate (not shown) disposed in the vacuum chamber 52, and a thin film made of the material of the target 55 is deposited on the substrate. Will be formed. Then, by repeating the selection of the target 55 and the rotation of the target 55 while irradiating the target 55 with the ablation laser beam L, thin films made of various materials of the target 55 are formed in the same vacuum. Can be formed on top.

  Further, Non-Patent Document 1 discloses a multi-target mechanism 60 configured as shown in FIG. In FIG. 7, a multi-target mechanism 60 is a target on which a plurality of, in the illustrated case, four targets 55 are mounted on a circular (or fan-shaped) target stage mechanism 57a. Similarly, the target stage mechanism 57a is rotationally driven in the direction of arrow A by the first drive shaft 57c, and each target head 57b is rotated in the direction of arrow B by the second drive shaft 57d. Thus, the target 55 mounted on the selected target head 57b is irradiated with the ablation laser beam L.

  A multi-target mechanism 70 configured as shown in FIG. 8 is also known. In FIG. 8, a multi-target mechanism 70 includes a target head 58b on which a plurality of, in the illustrated case, four targets 55 are to be mounted on a rectangular plate-like target stage mechanism 58a in a line in the longitudinal direction. The drive shaft 58c is reciprocated along the axial direction in the direction of arrow C to select each target head 58b, and the drive shaft 58c is rotationally driven to rotate each target head 58b in the direction of arrow B. Thus, the target 55 mounted on the selected target head 58b is irradiated with the ablation laser light L.

Japanese Patent Application No. 2000-259777 R. Takahashi and 6 others, "Development of a new combinatorial mask for addressable ternary phase diagramming: application to rare earth doped phosphors", Applied Surface Science, Vol.223, pp.249-252 (2004)

  However, in the conventional multi-target mechanisms 50 and 60, the two drive shafts 54a, 56a and 57c, 57d protrude from the vacuum chamber 2 to the outside. Therefore, in order to project the two drive shafts 54a, 56a or 57c, 57d from the vacuum chamber 2 to the outside, it is necessary to make the rotating part airtight, the structure becomes complicated, and the multi-target mechanism is downsized. There is a problem that it is difficult to meet the demands of

  Further, in the conventional multi-target mechanism 70, only one drive shaft 58c protrudes from the vacuum chamber 52 to the outside, and this drive shaft 58c performs axial thrust motion together with rotational motion. The direction also needs to be hermetically configured, and there is a problem that the structure is similarly complicated and it is difficult to meet the demand for downsizing of the multi-target mechanism.

  In view of the above-described problems, an object of the present invention is to provide a multi-source mechanism for a film forming apparatus that can easily cope with downsizing with a simple configuration.

  According to the present invention, the above object is achieved by a vacuum flange that is attached so as to seal the opening of the vacuum chamber, a drive shaft that extends through the vacuum flange to the outside and is applied with a rotational driving force at the outer end, and a drive A source stage mechanism rotatably attached to the inner end of the shaft, and a plurality of source heads dispersedly arranged along the circumferential direction of the source stage mechanism and rotatably supported around a rotation axis perpendicular to the surface thereof And a ratchet mechanism that allows rotation in only one direction of the source stage mechanism, and a transmission unit that transmits rotation of the drive shaft to each source head, and rotates the source stage mechanism by driving in one direction of the drive shaft, This is achieved by a multi-source mechanism for a film forming apparatus, wherein each source head is rotated by driving in the other direction of the drive shaft.

  The multi-source mechanism for a film forming apparatus according to the present invention includes a vacuum flange that is attached so as to seal the opening of the vacuum chamber, a drive that passes through the vacuum flange and extends to the outside, and a rotational driving force is applied to the outer end. A shaft, a source stage mechanism rotatably attached to the inner end of the drive shaft, and a distributed arrangement along the circumferential direction of the source stage mechanism, and rotatably supported around a rotation axis perpendicular to the outer peripheral surface It has a plurality of source heads, a ratchet mechanism that allows rotation in only one direction of the source stage mechanism, and a transmission unit that transmits the rotation of the drive shaft to each source head, and the drive shaft is driven to rotate in one direction. When this is done, the ratchet mechanism allows the source stage mechanism to rotate, so that the entire source stage mechanism is rotationally driven by the drive shaft, and each source head is sequentially positioned. When the drive shaft is driven to rotate in the opposite direction, the ratchet mechanism prevents the rotation of the source stage mechanism, so that the source stage mechanism does not rotate and the rotation of the drive shaft is transmitted Each source head is rotated by being transmitted to each source head via the.

  According to the above configuration, each source head is mounted with a deposition source or sputtering target made of different materials, and the multi-source mechanism mechanism is inserted into the vacuum chamber from the opening provided in the vacuum chamber. At the same time, the opening is closed with a vacuum flange, and the vacuum chamber is evacuated.

  From this state, by rotating the rotating shaft in one direction, the entire source stage mechanism is rotated without operating the ratchet mechanism. As a result, when a selected one of the plurality of source heads distributed along the peripheral direction on the outer peripheral surface of the source stage mechanism is brought to a predetermined position, it is attached to the selected source head. The target is placed, for example, at the introduction position of the ablation laser beam.

  Then, by rotating the rotation shaft in the other direction, the ratchet mechanism is operated, and each source head is rotated from the rotation shaft via the transmission unit without rotating the source stage mechanism. At the same time, by irradiating the target mounted on the source head at a predetermined position with the ablation laser light, the target material is evaporated by the ablation laser light and deposited on the surface of the substrate accommodated in the vacuum chamber. A thin film of this material is formed.

  Therefore, since the entire source stage mechanism can be rotated according to the direction of rotation using only one rotation axis, or only the source head can be rotated, only one rotation axis protrudes from the vacuum chamber to the outside. Therefore, the configuration can be simplified, the part cost and the assembly cost can be reduced, and the entire multi-source mechanism can be configured in a small size.

  In the above configuration, the source head is preferably disposed on the outer peripheral surface around the rotation center axis of the source stage mechanism. According to this configuration, the multi-target mechanism is introduced into the vacuum chamber with the drive shaft horizontal, and the source head disposed on the outer peripheral surface of the source stage mechanism is moved upward by rotation of the drive shaft in one direction. Can be brought in place.

In the above configuration, preferably, the transmission unit includes a first bevel gear provided at the tip of the drive shaft and a second bevel gear meshing with the first bevel gear. The gear is provided at the radially inner end of the rotation axis of each source head with respect to the rotation center axis of the source stage mechanism. According to this configuration, the rotation of the rotating shaft can be transmitted to each source head with fewer parts.

  In the above configuration, the source head is preferably disposed on an end surface perpendicular to the rotation center axis of the source stage mechanism. According to this configuration, by introducing the multi-source mechanism into the vacuum chamber with the drive shaft vertical, each source head disposed on the end surface of the source stage mechanism can be disposed on the end surface facing upward. it can.

  According to the multi-source mechanism for a film forming apparatus of the present invention, the rotation of the entire source stage mechanism and the rotation of each source head can be switched and driven using only one rotating shaft. Compact and low cost.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
First, a first embodiment of a multi-source mechanism 10 for a film forming apparatus according to the present invention will be described with reference to FIGS. In FIG. 1, a multi-source mechanism 10 is a multi-source mechanism for a film forming apparatus, and includes a vacuum flange 11, a drive shaft 12, and a source stage mechanism 13.
Here, as long as the film forming apparatus includes the multi-source mechanism 10, any of various vapor deposition apparatuses, sputtering apparatuses, laser deposition apparatuses, combinatorial film forming apparatuses, and the like may be used. Hereinafter, the film forming apparatus will be described as a combinatorial film forming apparatus.
The multi-source mechanism 10 in the present invention is defined as a mechanism that supplies at least two kinds of film forming materials. For example, in various vapor deposition apparatuses, in a vapor deposition source, a sputtering apparatus, and a laser deposition apparatus, a material called a target corresponds to the source.

  The vacuum flange 11 is a so-called ICF 203 flange, for example, a flange marketed as a Conflat flange of Varian USA, and can maintain high airtightness even in high vacuum using an oxygen-free copper gasket or the like. It has become.

  The drive shaft 12 is supported so as to be airtightly rotatable with respect to the vacuum flange 11 via a bearing portion 11a so as to penetrate the vacuum flange 11, and the vacuum flange 11 is supported in the vacuum chamber 14 (see FIG. 2). When attached to the opening 14 a on the side wall, the outer end protrudes to the outside of the vacuum flange 11. The drive shaft 12 is driven to rotate by connecting the outer end of the drive shaft 12 to a drive source such as a drive motor.

  The source stage mechanism 13 is attached to the inner end of the drive shaft 12. The source stage mechanism 13 includes a plurality of source heads 15 distributed in the circumferential direction on the outer peripheral surface: in the case of illustration, four source heads 15.

Here, as shown in detail in FIG. 2, the source stage mechanism 13 is rotatably attached to the drive shaft 12 via a rotating portion 13 a and includes a ratchet mechanism 16. The ratchet mechanism 16 includes a ratchet 16a that is fixedly disposed with respect to the vacuum flange 11, and a ratchet claw 16c that is mounted on a ratchet holder 16b that is provided on the surface of the source stage mechanism 13 by processing or the like. . By this ratchet mechanism 16, the source stage mechanism 13 is allowed to rotate only in one direction.
At this time, when the drive shaft 12 is rotationally driven in one direction (arrow A direction in FIG. 1), the source stage mechanism 13 is rotated integrally with the drive shaft 12 in the arrow A direction. At the same time, when the drive shaft 12 is rotationally driven in the other direction (the direction of arrow B in FIG. 1), the ratchet mechanism 16 functions, that is, the ratchet pawl 16c engages with the ratchet 16a, and the source stage mechanism 13 Is prevented from rotating.

Each source head 15 is attached to a rotation shaft 15 a extending in the radial direction with respect to the rotation center axis of the source stage mechanism 13. The rotary shaft 15 a is rotatably supported with respect to the source stage mechanism 13 and is connected to the drive shaft 12 via the transmission unit 17.
Here, the transmission portion 17 is provided at the inner end of the first bevel gear 17a provided at the inner end of the drive shaft 12 and the rotation shaft 15a of each source head 15, and meshes with the first bevel gear 17a. And a second gear 17b. As a result, when the drive shaft 12 is rotationally driven in the other direction (the direction of arrow B in FIG. 1), the source stage mechanism 13 is prevented from rotating by the ratchet mechanism 16, whereby the drive shaft 12 is fixed. It rotates relative to the stage mechanism 13. Therefore, the rotational drive of the drive shaft 12 is transmitted to each source head 15 via the transmission unit 17. Therefore, each source head 15 rotates as indicated by an arrow B around its rotation axis 15a.
Furthermore, the target 18 can be mounted on the surface of each source head 15.

  3 is a schematic perspective view showing a usage state of the multi-source mechanism for the film forming apparatus of FIG. As shown in FIG. 3, the multi-source mechanism 10 is inserted into the inside from the opening 14 a of the vacuum chamber 14, and the substrate 20 is disposed above the target 18 via the masking mechanism 21.

Next, the operation of the multi-source mechanism 10 according to the first embodiment of the present invention will be described. First, different types of targets 18 are mounted on the source heads 15 of the source stage mechanism 13, the multi-source mechanism 10 is introduced into the inside through an opening provided on the side wall of the vacuum chamber 14, and the vacuum flange 11 is installed. By attaching to the opening, the opening is hermetically closed against high vacuum, and the multi-source mechanism 10 is attached to the vacuum chamber 14.
Then, after evacuating the inside of the vacuum chamber 14, the drive shaft 12 is rotationally driven in one direction by a drive source such as a drive motor. In this case, since the ratchet mechanism 16 does not function, the source stage mechanism 13 is rotated together with the drive shaft 12 as shown by an arrow A in FIG. 1, and the selected source head 15 is brought to a predetermined position above. .
As a result, a desired type of target 18 is selected and placed at the ablation / laser beam introduction position.

Next, while the drive shaft 12 is driven to rotate in the other direction by the drive source in the same manner, the ablation laser beam L from the ablation / laser beam introducing device (not shown) is mounted on the source head 15 selected as described above. The target 18 is irradiated.
In this case, since the ratchet mechanism 16 functions, the source stage mechanism 13 does not rotate, and the rotational drive of the drive shaft 12 is transmitted to each source head 15 via the transmission unit 17. It rotates around the rotating shaft 15a.
Therefore, the target 18 is heated by the irradiated ablation laser beam L, evaporated in the vacuum chamber 14, and deposited on the surface of the substrate 19 disposed above the target 18 in the vacuum chamber 14. A thin film 20 made of the material of the target 14 is formed on the substrate 19 (see FIG. 3). At this time, when the source head 15 rotates around the rotation shaft 15a, the target 14 placed on the source head 15 also rotates. For this reason, evaporation of the ablation laser beam L by the target 14 occurs uniformly, and local heating of the target 14 does not occur.
The thin film 20 is appropriately masked by a combinatorial masking mechanism 21 disposed between the target 18 and the substrate 19, whereby the deposition time is controlled, and can be formed, for example, as a ternary composition gradient film.

  In this case, in the multi-source mechanism 10, only one drive shaft 12 protrudes from the vacuum chamber 14 to the outside, and this drive shaft 12 only performs rotational movement. The structure that can be rotatably and airtightly attached to the lens 14 is simplified, and is configured at a low cost and in a small size.

  Next, a second embodiment of the multi-source mechanism for a film forming apparatus according to the present invention will be described. FIG. 4 shows the configuration of the second embodiment of the multi-source mechanism for a film forming apparatus according to the present invention. In FIG. 4, a multi-source mechanism 30 is a multi-source mechanism for a film forming apparatus using electron beam evaporation, and has substantially the same configuration as the multi-source mechanism 10 shown in FIG. 1, but differs in the following points. It is configured. That is, in the multi-source mechanism 30, the drive shaft 12 is arranged vertically, the source stage mechanism 13 attached to the tip of the multi-source mechanism 30 is formed in a disc shape, and each source head 15 is arranged on the upper surface of the source stage mechanism 13. Are arranged on the same circumference.

  In this case, an electron beam is irradiated from the electron beam source 31 provided near the periphery of the vacuum flange 11 to the vapor deposition source 18 mounted on the source head 15 selected by the rotation of the source stage mechanism 13. As a result, the evaporation source 18 is heated and evaporated, and a thin film made of the material of the evaporation source 18 is formed on a substrate (not shown) disposed above the evaporation source 18.

  According to the multi-source mechanism 30 having such a configuration, the vapor deposition source 18 attached to the source head 15 brought to a predetermined position by rotational driving in one direction (A direction) of the drive shaft 12 is similarly provided. The thin film can be formed on the substrate by being irradiated with the electron beam while rotating by the rotational drive in the other direction (B direction) of the drive shaft 12.

  Next, a third embodiment of the multi-source mechanism for a film forming apparatus according to the present invention will be described. FIG. 5 shows the configuration of a third embodiment of the multi-source mechanism for a film forming apparatus according to the present invention. In FIG. 5, a multi-source mechanism 40 is a multi-source mechanism for a sputtering film forming apparatus, and has substantially the same configuration as the multi-source mechanism 10 shown in FIG. 1, but differs in the following points. Yes. That is, in this multi-source mechanism 40, the source stage mechanism 13 has a regular hexagonal outer shape with respect to the rotation center axis, and has a source head 15 on each surface, so that six types of targets 18 can be mounted. .

  In this case, for example, high-energy particles such as argon from a plasma intermediate source (not shown) generated by discharge with respect to the target 18 mounted on the source head 15 selected by the rotation of the source stage mechanism 13. Collide. Due to this collision, the constituent elements are desorbed from the target 18, that is, sputtered, so that a thin film made of the material of the target 18 is formed on the substrate (not shown) disposed above the target 18. become.

  According to the multi-source mechanism 40 having such a configuration, similarly, the target 18 mounted on the source head 15 brought to a predetermined position by rotational driving in one direction (A direction) of the drive shaft 12 is While the component elements of the sputtered target are deposited while rotating by the rotational drive of the drive shaft 12 in the other direction (B direction), a thin film is formed on the substrate by the sputtering method.

In each of the above-described embodiments, the multi-source mechanism 10 for the combinatorial film forming apparatus and the multi-source mechanisms 30 and 40 for the electron beam evaporation type and sputtering film forming apparatuses have been described. On the substrate surface, various vapor phase growth methods, for example, physical deposition methods such as vacuum deposition method, MBE method, and CVD methods such as thermal CVD method, plasma CVD method, MOCVD method, etc. It is obvious that the present invention can be applied to any film forming apparatus that forms a thin film.
Thus, according to the present invention, it is possible to provide a multi-source mechanism for a film forming apparatus that can easily cope with downsizing with a simple configuration.

Hereinafter, the present invention will be described in more detail based on examples.
The multi-source mechanism 10 for a film forming apparatus described in the first embodiment was mounted on a pulse laser deposition (PLD) apparatus. The multi-source mechanism 10 can be equipped with four types of targets, the target can be selected by the drive shaft 12, and the rotation of the target 18 can be varied between about 10 to 100 rpm.
Eu _0.01 Y _1.99 O ₃ , Tb _0.01 Y _1.99 O ₃ , Tm _0.01 Y _1.99 O ₃ are used as the target 18, glass is used as the substrate 19, and rare earth element M is added to yttrium oxide (Y ₂ O ₃ ). Thus, an M _0.01 Y _1.99 O ₃ thin film could be deposited (where M is any element of Eu (europium), Tb (terbium), and Tm (thulium)). An example of deposition is shown below.
Oxygen having a pressure of 1.33 × 10 ⁻³ Pa was introduced into the vacuum chamber, and the substrate was kept at room temperature. As a laser light source, a pulsed KrF laser was used, and irradiation of ² J / cm ² and 10 Hz was performed for 12.5 hours, whereby Eu _0.01 Y _1.99 O ₃ could be deposited to a thickness of 300 nm.
As a result, an M _0.01 Y _1.99 O ₃ thin film could be efficiently formed by selecting a target and rotating.

An M _0.01 Y _1.99 O ₃ thin film in which a rare earth element M is added to yttrium oxide (Y ₂ O ₃ ) is deposited by a PLD combinatorial film forming apparatus in which a combinatorial mask is further attached to the film forming apparatus of Example 1, and a rare earth A ternary composition gradient thin film having three kinds of element M could be deposited to a thickness of 300 nm. The film forming conditions are almost the same as those in Example 1.
At this time, the rare earth element M was Eu, Tb, and Tm. The obtained ternary composition gradient film was irradiated with an electron beam, and its emission, that is, cathodoluminescence was measured. As a result, it was found that the gradient composition includes red emission by adding Eu, green emission by adding Tb, and blue-green emission by adding Tm. Corresponding luminescence was obtained.
As a result, in the M _0.01 Y _1.99 O ₃ thin film, a ternary composition gradient film thin film in which the rare earth element M was changed to Eu, Tb, and Tm could be efficiently formed by target selection and rotation.

  From the above results, according to the multi-source mechanism for the film forming apparatus of the present invention, the rotation of the entire source stage mechanism and the rotation of each source head can be switched and driven using only one rotating shaft. The device could be configured at a low cost with a simple configuration. Furthermore, by using such a film forming apparatus, a complex oxide such as a phosphor, a ternary composition gradient film, and the like can be easily formed at low cost.

  The present invention is not limited to these examples, and various modifications are possible within the scope of the invention described in the claims, and it goes without saying that these are also included in the scope of the present invention. Nor. For example, the source stage mechanism and the like can be appropriately designed and manufactured according to the material to be formed.

It is a schematic perspective view which shows the structure of 1st embodiment of the multi-source mechanism for film-forming apparatuses by this invention. FIG. 2 is a partial enlarged cross-sectional view illustrating a detailed configuration of a main part of the multi-source mechanism for the film forming apparatus in FIG. 1. It is a schematic perspective view of the use condition of the multi-source mechanism for film-forming apparatuses of FIG. It is a schematic perspective view which shows the structure of 2nd embodiment of the multi-source mechanism for film-forming apparatuses by this invention. It is a schematic perspective view which shows the structure of 3rd embodiment of the multi-source mechanism for film-forming apparatuses by this invention. It is a schematic perspective view which shows the structure of an example of the multi-target mechanism in the conventional combinatorial film-forming apparatus. It is a schematic perspective view which shows the structure of the other example of the multi-target mechanism in the conventional combinatorial film-forming apparatus. It is a schematic perspective view which shows the structure of the further another example of the multi-target mechanism in the conventional combinatorial film-forming apparatus.

Explanation of symbols

10, 30, 40: Multi-source mechanism 11: Vacuum flange 12: Drive shaft 13: Source stage mechanism 13a: Rotating unit 14: Vacuum chamber 15: Source head 15a: Rotating shaft 16: Ratchet mechanism 16a: Ratchet mechanism 16b: Ratchet holder 16c: Ratchet claw 17: Transmitter 18: Target (deposition source)
19: Substrate 20: Thin film 21: Masking mechanism 31: Electron beam source

Claims (5)

A vacuum flange attached to seal the opening of the vacuum chamber;
A drive shaft that penetrates the vacuum flange and extends to the outside, and a rotational driving force is applied to the outer end;
A source stage mechanism rotatably attached to the inner end of the drive shaft;
A plurality of source heads distributed along the circumferential direction of the source stage mechanism and rotatably supported around a rotation axis perpendicular to the surface thereof;
A ratchet mechanism that allows rotation in only one direction of the source stage mechanism;
A transmission unit that transmits the rotation of the drive shaft to each source head;
The source stage mechanism is rotated by driving the drive shaft in one direction,
A multi-source mechanism for a film forming apparatus, wherein the source heads are rotated by driving in the other direction of the drive shaft. A vacuum flange attached to seal the opening of the vacuum chamber;
A drive shaft that penetrates the vacuum flange and extends to the outside, and a rotational driving force is applied to the outer end;
A source stage mechanism rotatably attached to the inner end of the drive shaft;
A plurality of source heads distributed along the circumferential direction of the source stage mechanism and rotatably supported around a rotation axis perpendicular to the surface thereof;
A ratchet mechanism that allows rotation in only one direction of the source stage mechanism;
A transmission unit for transmitting the rotation of the drive shaft to each source head;
With
When the drive shaft is rotationally driven in one direction, the ratchet mechanism allows the source stage mechanism to rotate, whereby the entire source stage mechanism is rotationally driven by the drive shaft, and the source heads are sequentially moved to predetermined positions. And brought to
When the drive shaft is rotationally driven in the opposite direction, the ratchet mechanism prevents the source stage mechanism from rotating, so that the source stage mechanism does not rotate, and the rotation of the drive shaft is performed via the transmission unit. A multi-source mechanism for a film forming apparatus, wherein each source head is rotated by being transmitted to each source head. The multi-source mechanism for a film forming apparatus according to claim 1, wherein the source head is disposed on an outer peripheral surface around a rotation center axis of the source stage mechanism. The transmission unit is composed of a first bevel gear provided at the tip of the drive shaft and a second bevel gear meshing with the first bevel gear,
Said second bevel gear is characterized in that provided on the end portion of the radially inner with respect to the axis of rotation of each source head, the central axis of rotation of the source stage mechanism, any of claims 1 to 3 A multi-source mechanism for a film forming apparatus according to claim 1. 3. The multi-source mechanism for a film forming apparatus according to claim 1, wherein the source head is disposed on an end surface perpendicular to a rotation center axis of the source stage mechanism.