JP4671231B2 - Method for producing fluorene derivative - Google Patents
Method for producing fluorene derivative Download PDFInfo
- Publication number
- JP4671231B2 JP4671231B2 JP2005364996A JP2005364996A JP4671231B2 JP 4671231 B2 JP4671231 B2 JP 4671231B2 JP 2005364996 A JP2005364996 A JP 2005364996A JP 2005364996 A JP2005364996 A JP 2005364996A JP 4671231 B2 JP4671231 B2 JP 4671231B2
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- JP
- Japan
- Prior art keywords
- group
- mol
- formula
- fluorene
- fluorenone
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 title description 2
- 239000011964 heteropoly acid Substances 0.000 claims description 23
- 238000006243 chemical reaction Methods 0.000 claims description 21
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 claims description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 239000003054 catalyst Substances 0.000 claims description 14
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 claims description 13
- 229960005323 phenoxyethanol Drugs 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 150000008376 fluorenones Chemical class 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 150000008064 anhydrides Chemical class 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims 1
- PWVDFPINYKVAFM-UHFFFAOYSA-N fluoren-4-one Chemical class C1=CC=CC2=C3C(=O)C=CC=C3C=C21 PWVDFPINYKVAFM-UHFFFAOYSA-N 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 239000013078 crystal Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- -1 phenoxy alcohols Chemical class 0.000 description 16
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- NQXNYVAALXGLQT-UHFFFAOYSA-N 2-[4-[9-[4-(2-hydroxyethoxy)phenyl]fluoren-9-yl]phenoxy]ethanol Chemical compound C1=CC(OCCO)=CC=C1C1(C=2C=CC(OCCO)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 NQXNYVAALXGLQT-UHFFFAOYSA-N 0.000 description 13
- 150000002220 fluorenes Chemical class 0.000 description 13
- 238000007664 blowing Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 239000012295 chemical reaction liquid Substances 0.000 description 10
- 238000001816 cooling Methods 0.000 description 10
- 238000004128 high performance liquid chromatography Methods 0.000 description 10
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 9
- 229910052717 sulfur Inorganic materials 0.000 description 9
- 239000011593 sulfur Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000012299 nitrogen atmosphere Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 230000018044 dehydration Effects 0.000 description 7
- 238000006297 dehydration reaction Methods 0.000 description 7
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 208000005156 Dehydration Diseases 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 238000011403 purification operation Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical class OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 239000012024 dehydrating agents Substances 0.000 description 3
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 3
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052901 montmorillonite Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000005233 alkylalcohol group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- DPNIGJLGMQBNNY-UHFFFAOYSA-N 1-(2,3-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC(C)=C1C DPNIGJLGMQBNNY-UHFFFAOYSA-N 0.000 description 1
- GRCCRGZIGHCSEO-UHFFFAOYSA-N 1-(2,5-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=CC(C)=CC=C1C GRCCRGZIGHCSEO-UHFFFAOYSA-N 0.000 description 1
- MPAYJGGBUYKVNE-UHFFFAOYSA-N 1-(2,6-dibutylphenoxy)ethanol Chemical compound CCCCC1=CC=CC(CCCC)=C1OC(C)O MPAYJGGBUYKVNE-UHFFFAOYSA-N 0.000 description 1
- MMLWQANUZJTBLY-UHFFFAOYSA-N 1-(2,6-dimethylphenoxy)ethanol Chemical compound CC(O)OC1=C(C)C=CC=C1C MMLWQANUZJTBLY-UHFFFAOYSA-N 0.000 description 1
- SADPEYKYRHAWLO-UHFFFAOYSA-N 1-(2-methoxyphenoxy)ethanol Chemical compound COC1=CC=CC=C1OC(C)O SADPEYKYRHAWLO-UHFFFAOYSA-N 0.000 description 1
- GJWUEORLYBSRLX-UHFFFAOYSA-N 1-(2-methylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC=C1C GJWUEORLYBSRLX-UHFFFAOYSA-N 0.000 description 1
- BVFULMNNRVECNI-UHFFFAOYSA-N 1-(2-methylphenoxy)propan-1-ol Chemical compound CCC(O)OC1=CC=CC=C1C BVFULMNNRVECNI-UHFFFAOYSA-N 0.000 description 1
- ISIQEWJJVXFCDP-UHFFFAOYSA-N 1-(2-methylphenoxy)propan-2-ol Chemical compound CC(O)COC1=CC=CC=C1C ISIQEWJJVXFCDP-UHFFFAOYSA-N 0.000 description 1
- GSOBKKBOWPKAMP-UHFFFAOYSA-N 1-(2-phenylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC=C1C1=CC=CC=C1 GSOBKKBOWPKAMP-UHFFFAOYSA-N 0.000 description 1
- OPQCAIWFWZZCRH-UHFFFAOYSA-N 1-(3-butylphenoxy)ethanol Chemical compound CCCCC1=CC=CC(OC(C)O)=C1 OPQCAIWFWZZCRH-UHFFFAOYSA-N 0.000 description 1
- GUFGXAIZAAYYKA-UHFFFAOYSA-N 1-(3-ethylphenoxy)ethanol Chemical compound CCC1=CC=CC(OC(C)O)=C1 GUFGXAIZAAYYKA-UHFFFAOYSA-N 0.000 description 1
- LKJDBVNNYVCLRZ-UHFFFAOYSA-N 1-(3-methylphenoxy)ethanol Chemical compound CC(O)OC1=CC=CC(C)=C1 LKJDBVNNYVCLRZ-UHFFFAOYSA-N 0.000 description 1
- HAVRFPKUVJJVCT-UHFFFAOYSA-N 1-(3-methylphenoxy)propan-1-ol Chemical compound CCC(O)OC1=CC=CC(C)=C1 HAVRFPKUVJJVCT-UHFFFAOYSA-N 0.000 description 1
- BWWOFKDFAGVASS-UHFFFAOYSA-N 1-[4-[9-[4-(2-hydroxypropoxy)-3-methylphenyl]fluoren-9-yl]-2-methylphenoxy]propan-2-ol Chemical compound C1=C(C)C(OCC(O)C)=CC=C1C1(C=2C=C(C)C(OCC(C)O)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 BWWOFKDFAGVASS-UHFFFAOYSA-N 0.000 description 1
- PCALKHSQMLZQEQ-UHFFFAOYSA-N 1-phenoxybutan-1-ol Chemical compound CCCC(O)OC1=CC=CC=C1 PCALKHSQMLZQEQ-UHFFFAOYSA-N 0.000 description 1
- OAAZUWWNSYWWHG-UHFFFAOYSA-N 1-phenoxypropan-1-ol Chemical compound CCC(O)OC1=CC=CC=C1 OAAZUWWNSYWWHG-UHFFFAOYSA-N 0.000 description 1
- MOEFFSWKSMRFRQ-UHFFFAOYSA-N 2-ethoxyphenol Chemical compound CCOC1=CC=CC=C1O MOEFFSWKSMRFRQ-UHFFFAOYSA-N 0.000 description 1
- 229940061334 2-phenylphenol Drugs 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- KBKLXLYSUOMJQE-UHFFFAOYSA-N 4-[9-(4-hydroxy-2-methylphenyl)fluoren-9-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2C2=CC=CC=C21 KBKLXLYSUOMJQE-UHFFFAOYSA-N 0.000 description 1
- YWFPGFJLYRKYJZ-UHFFFAOYSA-N 9,9-bis(4-hydroxyphenyl)fluorene Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 YWFPGFJLYRKYJZ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UBXYXCRCOKCZIT-UHFFFAOYSA-N biphenyl-3-ol Chemical compound OC1=CC=CC(C=2C=CC=CC=2)=C1 UBXYXCRCOKCZIT-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229960001867 guaiacol Drugs 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- JYINMLPNDRBKKZ-UHFFFAOYSA-N hydroperoxybenzene Chemical group OOC1=CC=CC=C1 JYINMLPNDRBKKZ-UHFFFAOYSA-N 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000013308 plastic optical fiber Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- WQEVDHBJGNOKKO-UHFFFAOYSA-K vanadic acid Chemical compound O[V](O)(O)=O WQEVDHBJGNOKKO-UHFFFAOYSA-K 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明はポリエステル、ポリウレタン、ポリカーボネート、エポキシ樹脂、変性アクリル樹脂等の原料として有用なフルオレン誘導体の製造方法に関する。 The present invention relates to a method for producing a fluorene derivative useful as a raw material for polyester, polyurethane, polycarbonate, epoxy resin, modified acrylic resin and the like.
近年、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンなどのフルオレン誘導体は、耐熱性、透明性に優れ、高屈折率を備えたポリマー原料として有望であり、光学レンズ、フィルム、プラスチック光ファイバー、光ディスク基盤、耐熱性樹脂やエンジニヤリングプラスチックなどの原料として期待されている。 In recent years, fluorene derivatives such as 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene have been promising as polymer raw materials having excellent heat resistance and transparency and a high refractive index. Optical lenses and films It is expected as a raw material for plastic optical fibers, optical disk substrates, heat resistant resins and engineering plastics.
9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンの製造方法としては、硫酸とチオールを触媒としてフルオレノンとフェノキシエタノールを脱水縮合させる方法が開示されている(特許文献1)。しかし、この方法では大量の硫酸を用いるため、反応後の精製に煩雑な操作が必要であり、多量の中和排水が出る。また製品中に触媒由来のイオウ分が混入することにより、製品の着色や安定性低下、純度低下などの問題が生じる。更に光学樹脂原料など、高純度の製品を得るためにはイオウ分を除くために精製を繰り返す必要があり、工業的に有利な方法とは言えない。 As a method for producing 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene, a method of dehydrating and condensing fluorenone and phenoxyethanol using sulfuric acid and thiol as catalysts is disclosed (Patent Document 1). However, since a large amount of sulfuric acid is used in this method, a complicated operation is required for purification after the reaction, and a large amount of neutralized wastewater is discharged. Further, when the sulfur component derived from the catalyst is mixed into the product, problems such as coloring of the product, deterioration of stability, and deterioration of purity occur. Furthermore, in order to obtain a high-purity product such as an optical resin raw material, it is necessary to repeat purification in order to remove sulfur, and this is not an industrially advantageous method.
硫酸を使用しない方法として、金属交換型モンモリロナイトを使用する方法が開示されている(特許文献2)。しかし、この方法では、市販のモンモリロナイトと金属塩化物等を反応させて金属置換モンモリロナイト触媒を製造する必要がある。また反応収率を上げるためには、助触媒としてβ−メルカプトプロピオン酸などのチオール類が使用されており、製品中にイオウ分が混入することから、高純度の製品を得るためには精製操作が必要であり、工業的に有利な方法とは言えない。 As a method not using sulfuric acid, a method using metal exchange montmorillonite is disclosed (Patent Document 2). However, in this method, it is necessary to produce a metal-substituted montmorillonite catalyst by reacting commercially available montmorillonite with a metal chloride or the like. In order to increase the reaction yield, thiols such as β-mercaptopropionic acid are used as a co-catalyst, and since sulfur is mixed in the product, purification operation is required to obtain a high-purity product. Therefore, it is not an industrially advantageous method.
本発明は、フルオレノン類とフェノキシアルコール類の反応によるフルオレン誘導体の製造において、煩雑な触媒除去操作や精製操作を行なうことなく、イオウ分を含まない高品質な製品を工業的有利に製造する方法を提供することを目的とする。 The present invention provides a method for industrially producing a high-quality product free from sulfur without performing complicated catalyst removal operations and purification operations in the production of fluorene derivatives by the reaction of fluorenones and phenoxy alcohols. The purpose is to provide.
本発明者らは、前記の課題を解決すべく鋭意研究を重ねた結果、フルオレノン類とフェノキシアルコール類をヘテロポリ酸触媒存在下に反応させることにより、高収率で高品質なフルオレン誘導体を製造できることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors can produce a high-quality fluorene derivative in a high yield by reacting fluorenones and phenoxy alcohols in the presence of a heteropolyacid catalyst. As a result, the present invention has been completed.
すなわち、本発明は、ヘテロポリ酸触媒の存在下、式(1)
で表されるフルオレノン類と式(2)
で表される化合物を反応させることを特徴とする、式(3)
で表されるフルオレン誘導体の製造方法に関する。
That is, the present invention provides a compound of formula (1) in the presence of a heteropolyacid catalyst.
Fluorenones represented by the formula (2)
A compound represented by the formula (3):
The manufacturing method of the fluorene derivative represented by these.
本発明に用いられるヘテロポリ酸とは、一般的には異なる2種以上の酸化物複合体からなる複合酸化物酸、およびこれらのプロトンの一部もしくはすべてを他のカチオンで置き換えたものである。ヘテロポリ酸は、例えば、リン、ヒ素、スズ、ケイ素、チタン、ジルコニウムなどの元素の酸素酸イオン(例えば、リン酸、ケイ酸)とモリブデン、タングステン、バナジウム、ニオブ、タンタルなどの元素の酸素酸イオン(バナジン酸、モリブデン酸、タングステン酸)とで構成されており、その組み合わせにより種々のヘテロポリ酸が可能である。 The heteropolyacid used in the present invention is generally a complex oxide acid composed of two or more different oxide complexes, and a part or all of these protons replaced with other cations. Heteropolyacids include, for example, oxyacid ions of elements such as phosphorus, arsenic, tin, silicon, titanium, and zirconium (for example, phosphoric acid and silicic acid) and oxyacid ions of elements such as molybdenum, tungsten, vanadium, niobium, and tantalum. (Vanadic acid, molybdic acid, tungstic acid) and various heteropolyacids are possible depending on the combination thereof.
ヘテロポリ酸を構成する酸素酸の元素は特に限定されるものではないが、例えば、銅、ベリリウム、ホウ素、アルミニウム、炭素、ケイ素、ゲルマニウム、スズ、チタン、ジルコニウム、セリウム、トリウム、窒素、リン、ヒ素、アンチモン、バナジウム、ニオブ、タンタル、クロム、モリブデン、タングステン、ウラン、セレン、テルル、マンガン、ヨウ素、鉄、コバルト、ニッケル、ロジウム、オスミウム、イルジウム、白金などが挙げられる。好ましいヘテロポリ酸は、リン、ケイ素、バナジウム、モリブデン、タングステンから選ばれたの少なくとも1種の元素を含有しており、さらに好ましくはリン又はケイ素と、バナジウム、モリブデンおよびタングステンから選ばれた少なくとも1種の元素とを含有している。 The element of oxygen acid constituting the heteropolyacid is not particularly limited, but for example, copper, beryllium, boron, aluminum, carbon, silicon, germanium, tin, titanium, zirconium, cerium, thorium, nitrogen, phosphorus, arsenic , Antimony, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, uranium, selenium, tellurium, manganese, iodine, iron, cobalt, nickel, rhodium, osmium, ildium, platinum, and the like. A preferred heteropolyacid contains at least one element selected from phosphorus, silicon, vanadium, molybdenum and tungsten, and more preferably at least one element selected from phosphorus or silicon and vanadium, molybdenum and tungsten. Element.
ヘテロポリ酸骨格を構成するヘテロポリ酸アニオンとしては種々の組成のものを使用できる。例えば、XM12O40、XM12O42、XM18O62、XM6O24などが挙げられる。好ましいヘテロポリ酸アニオンの組成は、XM12O40である。各式中、Xはケイ素、リンなどの元素であり、Mはバナジウム、モリブデン、タングステンなどの元素である。これらの組成を有するヘテロポリ酸として、具体的には、リンモリブデン酸、リンタングステン酸、ケイモリブデン酸、ケイタングステン酸、リンバナドモリブデン酸などが例示される。 As the heteropolyacid anion constituting the heteropolyacid skeleton, those having various compositions can be used. For example, such XM 12 O 40, XM 12 O 42, XM 18 O 62, XM 6 O 24 and the like. A preferred heteropolyacid anion composition is XM 12 O 40 . In each formula, X is an element such as silicon or phosphorus, and M is an element such as vanadium, molybdenum, or tungsten. Specific examples of heteropolyacids having these compositions include phosphomolybdic acid, phosphotungstic acid, silicomolybdic acid, silicotungstic acid, and phosphovanadomolybdic acid.
ヘテロポリ酸は、遊離のヘテロポリ酸であってもよく、プロトンの一部もしくはすべてを他のカチオンで置き換えて、ヘテロポリ酸の塩として使用することもできる。従って、本発明で言うヘテロポリ酸とはこれらのヘテロポリ酸の塩も含まれる。プロトンと置換可能なカチオンとしては、例えば、アンモニウム、アルカリ金属、アルカリ土類金属などが挙げられる。 The heteropolyacid may be a free heteropolyacid, and may be used as a salt of a heteropolyacid by replacing some or all of the protons with other cations. Accordingly, the heteropolyacid referred to in the present invention includes salts of these heteropolyacids. Examples of cations that can be substituted with protons include ammonium, alkali metals, alkaline earth metals, and the like.
ヘテロポリ酸は無水物であってもよく、結晶水含有物であってもよいが、無水物の方がより反応が早く、また副生成物の生成が抑制され好ましい。結晶水含有物の場合、予め減圧乾燥や溶媒との共沸脱水等の脱水処理を行なうことにより無水物と同様の効果を得ることができる。ヘテロポリ酸は活性炭、アルミナ、シリカ−アルミナ、ケイソウ土などの担体に担持した形態で用いてもよい。これらのヘテロポリ酸は単独で使用してもよく、2種以上を組み合わせて使用することもできる。また、必要に応じて、本発明の目的を損なわない範囲でヘテロポリ酸以外の他の触媒を併用してもよい。 The heteropolyacid may be an anhydride or a crystal water-containing product, but the anhydride is preferred because the reaction is faster and the formation of by-products is suppressed. In the case of a crystal water-containing material, effects similar to those of the anhydride can be obtained by performing dehydration treatment such as drying under reduced pressure or azeotropic dehydration with a solvent in advance. The heteropolyacid may be used in a form supported on a support such as activated carbon, alumina, silica-alumina, or diatomaceous earth. These heteropolyacids may be used alone or in combination of two or more. Moreover, you may use together other catalysts other than heteropoly acid in the range which does not impair the objective of this invention as needed.
ヘテロポリ酸の使用量は特に限定されるものではないが、充分な反応速度を得るには、原料であるフルオレノン類に対して、0.0001重量倍以上、好ましくは0.001〜30重量倍、更に好ましくは0.01〜5重量倍である。 The amount of heteropolyacid used is not particularly limited, but in order to obtain a sufficient reaction rate, it is 0.0001 times by weight or more, preferably 0.001 to 30 times by weight with respect to the raw material fluorenone, More preferably, it is 0.01-5 weight times.
前記式(1)で表されるフルオレノン類は、前記式(3)で表されるフルオレン誘導体のフルオレン骨格に対応している。式中、R1aおよびR1bで表される置換基としては、特に限定されるものではないが、例えば、メチル基、エチル基、プロピル基、ブチル基、t−ブチル基などの炭素数1〜20のアルキル基、シクロペンチル基、シクロヘキシル基などの炭素数5〜16のシクロアルキル基、フェニル基、アルキルフェニル基などの炭素数6〜16のアリール基、ベンジル基、フェネチル基などの炭素数7〜16のアラルキル基、メトキシ基、エトキシ基などの炭素数1〜12のアルコキシ基、アセチル基などの炭素数1〜12のアシル基、メトキシカルボニル基などの炭素数1〜12のアルコキシカルボニル基、フッ素原子、塩素原子などのハロゲン原子、ニトロ基、シアノ基などが挙げられる。好ましくは炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜10のシクロアルキル基、炭素数6〜10のアリ−ル基であり、更に好ましくはアルキル基である。アルキル基の中でも特にメチル基が好ましい。R1aおよびR1bは互いに同一もしくは異なっていてもよい。またR1a(又はR1b)は、同一のベンゼン環において同一もしくは異なっていてもよい。なお、R1a(又はR1b)の置換位置は特に限定されるものではない。置換基数k1およびk2は0又は1〜4であり、好ましくは0又は1、さらに好ましくは0である。k1およびk2は同一もしくは異なっていてもよいが、通常、同一である。代表的なフルオレノン類としては9−フルオレノンが挙げられる。 The fluorenones represented by the formula (1) correspond to the fluorene skeleton of the fluorene derivative represented by the formula (3). In the formula, the substituent represented by R 1a and R 1b is not particularly limited, and examples thereof include 1 to 1 carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group, and a t-butyl group. 20 alkyl groups, cyclopentyl groups, cyclohexyl groups, etc., C5-C16 cycloalkyl groups, phenyl groups, alkylphenyl groups, etc., C6-C16 aryl groups, benzyl groups, phenethyl groups, etc., 7-carbon atoms 16 aralkyl groups, methoxy groups, ethoxy groups and other C1-C12 alkoxy groups, acetyl groups and other C1-C12 acyl groups, methoxycarbonyl groups and other C1-C12 alkoxycarbonyl groups, fluorine Examples thereof include halogen atoms such as atoms and chlorine atoms, nitro groups, and cyano groups. Preferably they are a C1-C6 alkyl group, a C1-C6 alkoxy group, a C6-C10 cycloalkyl group, a C6-C10 aryl group, More preferably, it is an alkyl group. . Of the alkyl groups, a methyl group is particularly preferred. R 1a and R 1b may be the same or different from each other. R 1a (or R 1b ) may be the same or different in the same benzene ring. In addition, the substitution position of R 1a (or R 1b ) is not particularly limited. The number of substituents k1 and k2 is 0 or 1 to 4, preferably 0 or 1, and more preferably 0. k1 and k2 may be the same or different, but are usually the same. Typical fluorenones include 9-fluorenone.
前記式(2)で表される化合物(フェノキシアルコール類)は、前記式(3)で表されるフルオレン誘導体において、9位に置換したフェノキシアルコール基に対応しており、R2はR2a又はR2bに、R3はR3a又はR3bに、mはm1又はm2に、nはn1又はn2にそれぞれ対応している。 The compound represented by the formula (2) (phenoxy alcohols) corresponds to the phenoxy alcohol group substituted at the 9-position in the fluorene derivative represented by the formula (3), and R 2 represents R 2a or to R 2b, R 3 to R 3a or R 3b, m is the m1 or m @ 2, n respectively correspond to n1 or n2.
R2aおよびR2bで表される置換基としては、特に限定されるものではないが、例えば、メチル基、エチル基、プロピル基、ブチル基、t−ブチル基などの炭素数1〜20のアルキル基、シクロペンチル基、シクロヘキシル基などの炭素数5〜16のシクロアルキル基、フェニル基、アルキルフェニル基などの炭素数6〜16のアリール基、ベンジル基、フェネチル基などの炭素数7〜16のアラルキル基、メトキシ基、エトキシ基などの炭素数1〜12のアルコキシ基、アセチル基などの炭素数1〜12のアシル基メトキシカルボニル基などの炭素数1〜12のアルコキシカルボニル基、フッ素原子、塩素原子などのハロゲン原子、ニトロ基、シアノ基などが挙げられる。好ましくは炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、炭素数6〜10のシクロアルキル基、炭素数6〜10のアリ−ル基である。R2aおよびR2bは互いに同一もしくは異なっていてもよいが、通常、同一である。またR2a(又はR2b)は、同一のベンゼン環において同一もしくは異なっていてもよい。なお、R2a(又はR2b)の置換位置は特に限定されるものではない。置換基数m1およびm2は0又は1〜4であり、好ましくは0〜2、さらに好ましくは0である。m1およびm2は同一もしくは異なっていてもよいが、通常、同一である。 Although it does not specifically limit as a substituent represented by R < 2a> and R <2b> , For example, C1-C20 alkyl, such as a methyl group, an ethyl group, a propyl group, a butyl group, t-butyl group Aralkyl having 7 to 16 carbon atoms such as a cycloalkyl group having 5 to 16 carbon atoms such as a group, a cyclopentyl group and a cyclohexyl group, an aryl group having 6 to 16 carbon atoms such as a phenyl group and an alkylphenyl group, a benzyl group and a phenethyl group. Group, alkoxy group having 1 to 12 carbon atoms such as methoxy group and ethoxy group, acyl group having 1 to 12 carbon atoms such as acetyl group, alkoxycarbonyl group having 1 to 12 carbon atoms such as methoxycarbonyl group, fluorine atom, chlorine atom And halogen atoms such as nitro group, cyano group and the like. Preferred are an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a cycloalkyl group having 6 to 10 carbon atoms, and an aryl group having 6 to 10 carbon atoms. R 2a and R 2b may be the same or different from each other, but are usually the same. R 2a (or R 2b ) may be the same or different in the same benzene ring. In addition, the substitution position of R 2a (or R 2b ) is not particularly limited. The number of substituents m1 and m2 is 0 or 1 to 4, preferably 0 to 2, and more preferably 0. m1 and m2 may be the same or different, but are usually the same.
R3aおよびR3bで表されるアルキレン基としては、特に限定されるものではないが、例えば、エチレン基、プロピレン基、トリメチレン基、テトラメチレン基、ヘキサメチレン基などが挙げられる。好ましくは炭素数1〜6のアルキレン基、さらに好ましくは炭素数2〜3のアルキレン基である。R3aおよびR3bは互いに同一もしくは異なっていてもよいが、通常、同一である。R3a(又はR3b)の置換位置は特に限定されるものではない。置換基数n1およびn2は0又は1以上であり、同一もしくは異なっていてもよい。好ましくは0〜15、さらに好ましくは0〜5である。なお、 n1(又はn2)が2以上の場合、ポリアルコキシ基は、同一のアルコキシ基で構成されていてもよく、異種のアルコキシ基(例えばエトキシ基とプロピレンオキシ基)が混在して構成されていてもよいが、通常、同一のアルコキシ基で構成されている。 The alkylene group represented by R 3a and R 3b is not particularly limited, and examples thereof include an ethylene group, a propylene group, a trimethylene group, a tetramethylene group, and a hexamethylene group. Preferably it is a C1-C6 alkylene group, More preferably, it is a C2-C3 alkylene group. R 3a and R 3b may be the same or different from each other, but are usually the same. The substitution position of R 3a (or R 3b ) is not particularly limited. The number of substituents n1 and n2 is 0 or 1 or more and may be the same or different. Preferably it is 0-15, More preferably, it is 0-5. In addition, when n1 (or n2) is 2 or more, the polyalkoxy group may be composed of the same alkoxy group, or a mixture of different types of alkoxy groups (for example, ethoxy group and propyleneoxy group). However, it is usually composed of the same alkoxy group.
前記式(2)で表される化合物の具体例としては、例えば、n=0の化合物として、フェノール、2−メチルフェノール、3−メチルフェノール、などのアルキルフェノール、2,3−キシレノール、2,6−キシレノール、3,5−キシレノールなどのジアルキルフェノール、2−メトキシフェノール、2−エトキシフェノールなどのアルコキシフェノール、2−フェニルフェノール、3−フェニルフェノールなどのフェニルフェノールなどが挙げられる。n=1の化合物として、フェノキシエタノール、フェノキシプロパノール、フェノキシブタノールなどのフェノキシアルキルアルコール、(2−メチル−フェノキシ)エタノール、(3−メチル−フェノキシ)エタノール、(3−エチル−フェノキシ)エタノール、(3−ブチル−フェノキシ)エタノール、(2−メチル−フェノキシ)プロパノール、(3−メチル−フェノキシ)プロパノールなどのアルキルフェノキシアルキルアルコール、(2,3−ジメチルフェノキシ)エタノール、(2,5−ジメチルフェノキシ)エタノール、(2,6−ジメチルフェノキシ)エタノール、(2,6−ジブチルフェノキシ)エタノールなどのジアルキルフェノキシアルキルアルコール、(2−メトキシフェノキシ)エタノールなどのアルコキシフェノキシアルキルアルコール、(2−シクロヘキシルフェノキシ)エタノールなどのシクロアルキルフェノキシアルキルアルコール、ビフェニリルオキシエタノールなどのアリールフェノキシアルキルアルコールなどが挙げられる。また、nが2以上の化合物としては、これらフェノキシアルキルアルコールに対応するポリオキシアルキレンフェニルエーテルなどが挙げられる。好ましくはフェノキシC2−6アルキルアルコール又はC1−4アルキルフェノキシC2−6アルキルアルコールであり、特に好ましくはフェノキシエタノールである。 Specific examples of the compound represented by the formula (2) include, for example, n = 0 compounds such as phenol, 2-methylphenol, 3-methylphenol, alkylphenols, 2,3-xylenol, 2,6, and the like. -Dialkylphenols such as xylenol and 3,5-xylenol, alkoxyphenols such as 2-methoxyphenol and 2-ethoxyphenol, and phenylphenols such as 2-phenylphenol and 3-phenylphenol. Examples of compounds with n = 1 include phenoxyalkyl alcohols such as phenoxyethanol, phenoxypropanol, and phenoxybutanol, (2-methyl-phenoxy) ethanol, (3-methyl-phenoxy) ethanol, (3-ethyl-phenoxy) ethanol, (3- Butyl-phenoxy) ethanol, (2-methyl-phenoxy) propanol, alkylphenoxyalkyl alcohols such as (3-methyl-phenoxy) propanol, (2,3-dimethylphenoxy) ethanol, (2,5-dimethylphenoxy) ethanol, Dialkylphenoxyalkyl alcohols such as (2,6-dimethylphenoxy) ethanol, (2,6-dibutylphenoxy) ethanol, and alkoxyphenes such as (2-methoxyphenoxy) ethanol. Alkoxyalkyl alcohols, (2-cyclohexyl-phenoxy) cycloalkyl phenoxyalkyl alcohols such as ethanol, an aryl phenoxyalkyl alcohols such biphenylyloxy ethanol. Examples of the compound having n of 2 or more include polyoxyalkylene phenyl ethers corresponding to these phenoxyalkyl alcohols. Preferred is phenoxy C 2-6 alkyl alcohol or C 1-4 alkylphenoxy C 2-6 alkyl alcohol, and particularly preferred is phenoxyethanol.
前記式(2)で表される化合物の使用量は、特に限定されるものではないが、副反応抑制及び経済性の点から、通常、フルオレノン類1モルに対して、2〜50モル、好ましくは2.5〜20モル、さらに好ましくは3〜10モルである。また、これらの化合物を反応溶媒として用いることもできる。 The amount of the compound represented by the formula (2) is not particularly limited, but it is generally 2 to 50 mol, preferably 1 to 1 mol with respect to 1 mol of fluorenone from the viewpoint of side reaction suppression and economy. Is 2.5 to 20 mol, more preferably 3 to 10 mol. Moreover, these compounds can also be used as a reaction solvent.
本発明におけるフルオレン誘導体の合成方法は、特に限定されるものではないが、通常、原料のフルオレノン類とフェノキシアルコール類、およびヘテロポリ酸触媒を反応装置に仕込み、空気中又は窒素、ヘリウムなどの不活性ガス雰囲気下、トルエン、キシレンなどの不活性溶媒存在下又は非存在下で加熱攪拌することにより行うことができる。
この際、触媒含有水や反応生成水など、反応系内の水分を除去する、脱水条件下で反応を行うことにより、脱水しない場合より反応が早く進行し、副生成物の生成が抑制され、より高収率で目的物を得ることができる。脱水方法としては、特に限定されるものではないが、例えば、脱水剤の添加による脱水、減圧による脱水、常圧又は減圧下、溶媒との共沸による脱水などが挙げられる。
The method for synthesizing the fluorene derivative in the present invention is not particularly limited, but usually, the raw material fluorenones and phenoxy alcohols, and the heteropolyacid catalyst are charged into the reaction apparatus, and in the air or inert such as nitrogen or helium. It can be performed by heating and stirring in the presence or absence of an inert solvent such as toluene or xylene under a gas atmosphere.
At this time, by removing the water in the reaction system, such as catalyst-containing water and reaction product water, by performing the reaction under dehydrating conditions, the reaction proceeds faster than when not dehydrating, and the production of by-products is suppressed, The target product can be obtained with higher yield. The dehydration method is not particularly limited, and examples thereof include dehydration by adding a dehydrating agent, dehydration by reduced pressure, dehydration by azeotropy with a solvent under normal pressure or reduced pressure, and the like.
反応に用いられる脱水剤としては、特に限定されるものではないが、モレキュラーシーブ、硫酸ナトリウム、硫酸マグネシウムなどが挙げられる。脱水剤の使用量は特に限定されるものではないが、脱水効果および経済性の点から、通常フルオレノンに対して、0.0001重量倍以上、好ましくは0.001〜100重量倍、更に好ましくは0.01〜50重量倍である。 Although it does not specifically limit as a dehydrating agent used for reaction, A molecular sieve, sodium sulfate, magnesium sulfate, etc. are mentioned. The amount of the dehydrating agent is not particularly limited, but from the viewpoint of dehydrating effect and economy, it is usually 0.0001 times by weight or more, preferably 0.001 to 100 times by weight, more preferably fluorenone. 0.01 to 50 times by weight.
反応に用いられる共沸脱水溶媒としては、特に限定されるものではないが、トルエン、キシレンなどの芳香族炭化水素類、クロロベンゼン、ジクロロベンゼンなどのハロゲン化芳香族炭化水素類、ペンタン、ヘキサン、ヘプタンなどの脂肪族炭化水素類、ジクロロメタン、1,2−ジクロロエタンなどのハロゲン化炭化水素類、ジエチルエーテル、ジ−iso−プロピルエーテル、メチル−t−ブチルエーテル、ジフェニルエーテル、テトラヒドロフラン、ジオキサンなどの脂肪族および環状エーテル類、酢酸エチル、酢酸ブチルなどのエステル類、アセトニトリル、プロピオニトリル、ブチロニトリル、ベンゾニトリルなどのニトリル類、N,N−ジメチルホルムアルデヒド、N,N−ジメチルアセトアルデヒド、1−メチル−2−ピロリジノンなどのアミン類などが挙げられる。好ましくは芳香族炭化水素類、ハロゲン化芳香族炭化水素類であり、さらに好ましくはトルエン、キシレン、クロロベンゼン、ジクロロベンゼンである。その使用量は特に限定されるものではないが経済性の点から、通常フルオレノン類に対して0.1重量倍以上、好ましくは0.5〜100重量倍、さらに好ましくは1〜20重量倍である。
反応温度は使用する原料、溶媒の種類により異なるが、通常、50〜300℃、好ましくは80〜250℃、更に好ましくは120〜180℃である。反応は液体クロマトグラフィーなどの分析手段で追跡することができる。
The azeotropic dehydration solvent used in the reaction is not particularly limited, but aromatic hydrocarbons such as toluene and xylene, halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene, pentane, hexane and heptane. Aliphatic hydrocarbons such as dichloromethane, halogenated hydrocarbons such as dichloromethane and 1,2-dichloroethane, aliphatic and cyclic such as diethyl ether, di-iso-propyl ether, methyl-t-butyl ether, diphenyl ether, tetrahydrofuran and dioxane Ethers, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, propionitrile, butyronitrile and benzonitrile, N, N-dimethylformaldehyde, N, N-dimethylacetaldehyde, 1-methyl-2-pyrrole And amines such as non thereof. Preferred are aromatic hydrocarbons and halogenated aromatic hydrocarbons, and more preferred are toluene, xylene, chlorobenzene and dichlorobenzene. Although the amount of use is not particularly limited, from the economical point of view, it is usually 0.1 times or more, preferably 0.5 to 100 times, more preferably 1 to 20 times the weight of the fluorenone. is there.
The reaction temperature varies depending on the raw materials used and the type of solvent, but is usually 50 to 300 ° C, preferably 80 to 250 ° C, and more preferably 120 to 180 ° C. The reaction can be followed by analytical means such as liquid chromatography.
反応後、反応液に溶媒を加え、冷却晶析することにより結晶としてフルオレン誘導体を得ることができ、析出した結晶は濾過等により回収される。また必要に応じて洗浄、吸着、水蒸気蒸留、再晶析などの精製操作を行うことができる。晶析および精製に用いられる溶媒は、反応溶媒をそのまま使用してもよいし、別の溶媒を使用することもできる。晶析溶媒としては、メタノール、エタノール、プロパノールなどの脂肪族低級アルコール類、アセトン、メチルエチルケトンなどの脂肪族低級ケトン類、トルエン、キシレンなどの芳香族炭化水素類、酢酸エチルなどのエステル類、水などが特に好ましい。 A fluorene derivative can be obtained as a crystal by adding a solvent to the reaction solution after the reaction and crystallization by cooling, and the precipitated crystal is recovered by filtration or the like. If necessary, purification operations such as washing, adsorption, steam distillation, and recrystallization can be performed. As the solvent used for crystallization and purification, the reaction solvent may be used as it is, or another solvent may be used. Crystallization solvents include aliphatic lower alcohols such as methanol, ethanol and propanol, aliphatic lower ketones such as acetone and methyl ethyl ketone, aromatic hydrocarbons such as toluene and xylene, esters such as ethyl acetate, water, etc. Is particularly preferred.
本発明において生成する、前記式(3)で表されるフルオレン誘導体としては、例えば、9,9−ビス(ヒドロキシ(ポリ)アルコキシフェニル)フルオレン、9,9−ビス(ヒドロキシ(ポリ)アルコキシ−アルキルフェニル)フルオレン、9,9−ビス(ヒドロキシ(ポリ)アルコキシ−ジアルキルフェニル)フルオレン、9,9−ビス(ヒドロキシ(ポリ)アルコキシ−アルコキシフェニル)フルオレン、9,9−ビス(ヒドロキシ(ポリ)アルコキシ−シクロアルキルフェニル)フルオレン、9,9−ビス(ヒドロキシ(ポリ)アルコキシ−アリールフェニル)フルオレンなどが挙げられる。本発明は、これらのフルオレン誘導体の中でも9,9−ビス(ヒドロキシ(ポリ)アルコキシフェニル)フルオレンの製造において、特に9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンの製造において有効である。 Examples of the fluorene derivative represented by the formula (3) produced in the present invention include 9,9-bis (hydroxy (poly) alkoxyphenyl) fluorene and 9,9-bis (hydroxy (poly) alkoxy-alkyl. Phenyl) fluorene, 9,9-bis (hydroxy (poly) alkoxy-dialkylphenyl) fluorene, 9,9-bis (hydroxy (poly) alkoxy-alkoxyphenyl) fluorene, 9,9-bis (hydroxy (poly) alkoxy- Cycloalkylphenyl) fluorene, 9,9-bis (hydroxy (poly) alkoxy-arylphenyl) fluorene, and the like. Among these fluorene derivatives, the present invention is effective in the production of 9,9-bis (hydroxy (poly) alkoxyphenyl) fluorene, particularly in the production of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene. It is.
フルオレノン類とフェノキシアルコール類からフルオレン誘導体を製造するに際し、イオウ分を含まない高品質なフルオレン誘導体を煩雑な触媒除去操作や精製操作を行なうことなく工業的有利に製造する方法を提供することができる。 When producing a fluorene derivative from fluorenones and phenoxy alcohols, it is possible to provide a method for producing an industrially advantageous production of a high-quality fluorene derivative that does not contain sulfur without complicated catalyst removal and purification operations. .
(実施例)
以下に実施例を挙げて、本発明を更に詳細に説明するが、本発明はこれに限定されるものではない。
(Example)
The present invention will be described in more detail with reference to examples below, but the present invention is not limited thereto.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン54.0g(0.300モル)、フェノキシエタノール330.0g(2.388モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]5.4gを加え、温度を170℃に保ちながら、窒素雰囲気下で約2時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが112.5g(0.257モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 54.0 g (0.300 mol) of fluorenone, 330.0 g (2.388 mol) of phenoxyethanol and phosphotungstic acid [(H 3 5.4 g of PW 12 O 40 ) · nH 2 O] was added, and the mixture was stirred for about 2 hours under a nitrogen atmosphere while maintaining the temperature at 170 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 11,2.5 g (0.257 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン18.0g(0.100モル)、フェノキシエタノール550.0g(3.980モル)および触媒としてケイタングステン酸[(H4SiW12O40)・nH2O]15.0gを加え、温度を140℃に保ちながら、窒素雰囲気下で約16時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが37.0g(0.084モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 18.0 g (0.100 mol) of fluorenone, 550.0 g (3.980 mol) of phenoxyethanol and silicotungstic acid [(H 4 15.0 g of SiW 12 O 40 ) · nH 2 O] was added, and the mixture was stirred for about 16 hours under a nitrogen atmosphere while maintaining the temperature at 140 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 9,7.0 g (0.084 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン18.0g(0.100モル)、フェノキシエタノール220.0g(1.592モル)および触媒としてリンモリブデン酸[(H3PMo12O40)・nH2O]7.5gを加え、温度を170℃に保ちながら、窒素雰囲気下で約4時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが34.4g(0.078モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 18.0 g (0.100 mol) of fluorenone, 220.0 g (1.592 mol) of phenoxyethanol and phosphomolybdic acid [(H 3 PMo 12 O 40 ) · nH 2 O] 7.5 g was added, and the mixture was stirred for about 4 hours under a nitrogen atmosphere while maintaining the temperature at 170 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 3,4.4 g (0.078 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン54.0g(0.300モル)、フェノキシエタノール330.0g(2.388モル)および触媒としてリンバナドモリブデン酸[(H7PV4Mo8O40)・nH2O]5.0gを加え、温度を170℃に保ちながら、窒素雰囲気下で約4時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが109.0g(0.249モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 54.0 g (0.300 mol) of fluorenone, 330.0 g (2.388 mol) of phenoxyethanol and phosphovanadomolybdic acid [(H 7 PV 4 Mo 8 O 40 ) · nH 2 O] was added, and the mixture was stirred for about 4 hours under a nitrogen atmosphere while maintaining the temperature at 170 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 9,9.0 g (0.249 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン18.0g(0.100モル)、フェノキシエタノール550.0g(3.980モル)および触媒としてリンタングステン酸ナトリウム[(Na3PW12O40)・nH2O]15.0gを加え、温度を170℃に保ちながら、窒素雰囲気下で約4時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが9.9g(0.023モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 18.0 g (0.100 mol) of fluorenone, 550.0 g (3.980 mol) of phenoxyethanol and sodium phosphotungstate [(Na 3 PW 12 O 40 ) · nH 2 O] was added, and the mixture was stirred for about 4 hours under a nitrogen atmosphere while maintaining the temperature at 170 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 9.9 g (0.023 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン0.90g(0.005モル)、1−(2−メチル−フェノキシ)−2−プロパノール4.99g(0.030モル)、キシレン4gおよび触媒としてリンタングステン酸[(H3PW12O40)・nH2O]0.7gを加え、温度を160℃に保ちながら、窒素雰囲気下で約4時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシプロポキシ)−3−メチル−フェニル)フルオレンが1.85g(0.0037モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 0.90 g (0.005 mol) of fluorenone and 4.99 g of 1- (2-methyl-phenoxy) -2-propanol (0.030). Mol), 4 g of xylene and 0.7 g of phosphotungstic acid [(H 3 PW 12 O 40 ) · nH 2 O] as a catalyst were added, and the mixture was stirred for about 4 hours under a nitrogen atmosphere while maintaining the temperature at 160 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 1.85 g (0.0037 mol) of 9,9-bis (4- (2-hydroxypropoxy) -3-methyl-phenyl) fluorene was produced. It was.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン10.0g(0.056モル)、フェノール30.0g(0.319モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]2.0gを加え、温度を140℃に保ちながら、窒素雰囲気下で約10時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−ヒドロキシフェニル)フルオレンが17.2g(0.049モル)生成していた。 In a glass reactor equipped with a stirrer, nitrogen blowing tube, thermometer and cooling tube, 10.0 g (0.056 mol) of fluorenone, 30.0 g (0.319 mol) of phenol and phosphotungstic acid [(H 3 PW 12 O 40 ) · nH 2 O] 2.0 g was added, and the mixture was stirred for about 10 hours under a nitrogen atmosphere while maintaining the temperature at 140 ° C. As a result of analyzing the obtained reaction solution by high performance liquid chromatography, 17.2 g (0.049 mol) of 9,9-bis (4-hydroxyphenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン10.0g(0.056モル)、o−クレゾール36.7g(0.339モル)および触媒としてリンタングステン酸[(H3PW12O40)・nH2O]2.0gを加え、温度を160℃に保ちながら、窒素雰囲気下で約5時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−ヒドロキシ−2−メチル−フェニル)フルオレンが18.5g(0.049モル)生成していた。 In a glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube, 10.0 g (0.056 mol) of fluorenone, 36.7 g (0.339 mol) of o-cresol and phosphotungstic acid [( H 3 PW 12 O 40 ) · nH 2 O] was added, and the mixture was stirred for about 5 hours under a nitrogen atmosphere while maintaining the temperature at 160 ° C. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 18.5 g (0.049 mol) of 9,9-bis (4-hydroxy-2-methyl-phenyl) fluorene was produced.
攪拌機、窒素吹込管、温度計および冷却管を付けた水分離器を備えたガラス製反応器にフルオレノン86.4g(0.48モル)、フェノキシエタノール397.9g(2.88モル)、トルエン350gおよび100℃で減圧乾燥し結晶水を除いたリンタングステン酸[(H3PW12O40)]4.3gを加え、トルエン還流下、生成水を反応系外に除去しながら12時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが197.3g(0.45モル)生成していた。この反応液にトルエン300gを加え、水100gを用いて80℃で水洗をおこなった。次いでこの液を室温まで徐々に冷却し、析出した結晶をろ過、乾燥することにより白色結晶[9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレン]158.0g(収率75.1%、LC純度99.0%)を得た。得られた結晶中のイオウ分は0.2ppm以下であった。 In a glass reactor equipped with a water separator equipped with a stirrer, a nitrogen blowing tube, a thermometer and a condenser, fluorenone 86.4 g (0.48 mol), phenoxyethanol 397.9 g (2.88 mol), toluene 350 g and 4.3 g of phosphotungstic acid [(H 3 PW 12 O 40 )], which was dried at 100 ° C. under reduced pressure to remove water of crystallization, was added, and the mixture was stirred for 12 hours while refluxing toluene and removing the generated water from the reaction system. As a result of analyzing the obtained reaction liquid by high performance liquid chromatography, 19,7.3 g (0.45 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced. Toluene (300 g) was added to the reaction solution, and the mixture was washed with water at 80 ° C. using 100 g of water. Next, this liquid was gradually cooled to room temperature, and the precipitated crystals were filtered and dried to obtain 158.0 g of white crystals [9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene] (yield 75.75). 1%, LC purity 99.0%). The sulfur content in the obtained crystal was 0.2 ppm or less.
攪拌機、窒素吹込管、温度計および冷却管を付けた水分離器を備えたガラス製反応器にフルオレノン86.4g(0.48モル)、フェノキシエタノール663.2g(4.80モル)、トルエン350gおよび100℃で減圧乾燥し結晶水を除いたケイタングステン酸[(H4SiW12O40)]4.3gを加え、トルエン還流下、生成水を反応系外に除去しながら8時間攪拌した。得られた反応液を高速液体クロマトグラフィ−で分析した結果、9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレンが201.5g(0.46モル)生成していた。この反応液にトルエン300gを加え、水100gを用いて80℃で水洗をおこなった。次いで加熱下、減圧濃縮によりトルエンおよび過剰のフェノキシエタノールを除去した。この濃縮液にトルエン600gを加え、80℃で約1時間加熱攪拌した後、室温まで徐々に冷却し、析出した結晶をろ過、乾燥することにより白色結晶[9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレン]、162.1g(収率92.0%、LC純度96.2%)を得た。得られた結晶中のイオウ分は0.2ppm以下であった。 In a glass reactor equipped with a water separator equipped with a stirrer, a nitrogen blowing tube, a thermometer and a condenser, fluorenone 86.4 g (0.48 mol), phenoxyethanol 663.2 g (4.80 mol), toluene 350 g and 4.3 g of silicotungstic acid [(H 4 SiW 12 O 40 )], which was dried under reduced pressure at 100 ° C. to remove crystal water, was added, and the mixture was stirred for 8 hours while removing the produced water out of the reaction system under reflux of toluene. As a result of analyzing the obtained reaction liquid by high-performance liquid chromatography, 201.5 g (0.46 mol) of 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene was produced. Toluene (300 g) was added to the reaction solution, and the mixture was washed with water at 80 ° C. using 100 g of water. Subsequently, toluene and excess phenoxyethanol were removed by concentration under reduced pressure under heating. To this concentrated liquid was added 600 g of toluene, and the mixture was heated and stirred at 80 ° C. for about 1 hour, and then gradually cooled to room temperature. The precipitated crystals were filtered and dried to obtain white crystals [9,9-bis (4- (2 -Hydroxyethoxy) phenyl) fluorene], 162.1 g (92.0% yield, 96.2% LC purity). The sulfur content in the obtained crystal was 0.2 ppm or less.
(比較例1)
攪拌機、窒素吹込管、温度計および冷却管を備えたガラス製反応器にフルオレノン45.0g(0.25モル)、フェノキシエタノール138.0g(1.00モル)、α−メルカプトプロピオン酸0.2mlを加え、均一に溶解。この液に95%硫酸45mlを約30分かけたて滴下した後、65℃で4時間攪拌した。得られた反応液にトルエン360gを加え、水90gを用いて80℃で水洗を3回繰り返した。次いでこの液を室温まで徐々に冷却し、析出した結晶をろ過、乾燥することにより淡黄色結晶[9,9−ビス(4−(2−ヒドロキシエトキシ)フェニル)フルオレン]81.8g(収率74.8%)を得た。この結晶中のイオウ分は600ppmであった。さらにこの結晶をトルエン523gに溶解後活性炭1.6gおよび陰イオン交換樹脂(住友化学社製デュオライトA−378)4.1gを加えて80℃で約1時間加熱攪拌した後、熱ろ過により活性炭およびイオン交換樹脂を除去した。得られたろ液を室温まで徐々に冷却し、析出した結晶をろ過、乾燥することにより白色結晶71.6g(収率65.2%)を得た。この結晶中のイオウ分は55ppmであった。
(Comparative Example 1)
A glass reactor equipped with a stirrer, a nitrogen blowing tube, a thermometer and a cooling tube was charged with 45.0 g (0.25 mol) of fluorenone, 138.0 g (1.00 mol) of phenoxyethanol, and 0.2 ml of α-mercaptopropionic acid. In addition, evenly dissolved. To this solution, 45 ml of 95% sulfuric acid was added dropwise over about 30 minutes, followed by stirring at 65 ° C. for 4 hours. Toluene 360g was added to the obtained reaction liquid, and water washing was repeated 3 times at 80 degreeC using 90g of water. Next, this liquid was gradually cooled to room temperature, and the precipitated crystals were filtered and dried to give 81.8 g of light yellow crystals [9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene] (yield 74). 8%). The sulfur content in the crystals was 600 ppm. Further, the crystals were dissolved in 523 g of toluene, 1.6 g of activated carbon and 4.1 g of anion exchange resin (Duolite A-378, manufactured by Sumitomo Chemical Co., Ltd.) were added, and the mixture was heated and stirred at 80 ° C. for about 1 hour. And the ion exchange resin was removed. The obtained filtrate was gradually cooled to room temperature, and the precipitated crystals were filtered and dried to obtain 71.6 g (yield 65.2%) of white crystals. The sulfur content in the crystals was 55 ppm.
Claims (5)
(式中、R 3a 及びR 3b は炭素数2〜6のアルキレン基を示し、R 2a 及びR 2b は炭素数1〜6のアルキル基を示す。n 1 及びn 2 は0又は1〜5の整数を示し、同一もしくは異なってもよい。m 1 及びm 2 はは0又は1〜2の整数を示し、同一もしくは異なっても良い。)で表されるフルオレノン誘導体の製造方法。 Fluorenone and formula (2) in the presence of a heteropolyacid catalyst
(Wherein, R 3a and R 3b represents an alkylene group having 2 to 6 carbon atoms, R 2a and R 2b are the .n 1 and n 2 are 0 or 1 to 5 represents an alkyl group having 1 to 6 carbon atoms An integer, which may be the same or different, and m 1 and m 2 each represents 0 or an integer of 1 to 2, and may be the same or different .
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