JP4660255B2 - Conductive film - Google Patents
Conductive film Download PDFInfo
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- JP4660255B2 JP4660255B2 JP2005113536A JP2005113536A JP4660255B2 JP 4660255 B2 JP4660255 B2 JP 4660255B2 JP 2005113536 A JP2005113536 A JP 2005113536A JP 2005113536 A JP2005113536 A JP 2005113536A JP 4660255 B2 JP4660255 B2 JP 4660255B2
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- film
- transparent conductive
- conductive coating
- conductive film
- coating
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- 238000000576 coating method Methods 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 34
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- 239000008199 coating composition Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 208000028659 discharge Diseases 0.000 claims description 8
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- 125000002947 alkylene group Chemical group 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
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- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 1
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- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
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- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
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- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
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- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 229940069096 dodecene Drugs 0.000 description 1
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- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical group CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
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- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
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- 125000001424 substituent group Chemical group 0.000 description 1
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- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
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Images
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Non-Insulated Conductors (AREA)
Description
本発明は、透明性および導電性に優れた導電性フィルムに関するものである。さらに詳しくは、表面抵抗率と接触抵抗との比が改善された、液晶ディスプレイ(LCD)、透明タッチパネル、有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として好適な透明導電性フィルムに関するものである。 The present invention relates to a conductive film excellent in transparency and conductivity. More specifically, the present invention relates to a transparent conductive film suitable as a transparent electrode for a liquid crystal display (LCD), a transparent touch panel, an organic electroluminescence element, an inorganic electroluminescence lamp, etc., with an improved ratio of surface resistivity and contact resistance. is there.
従来、液晶ディスプレイ、透明タッチパネル等の透明電極や電磁波シールド材として透明導電性フィルムが好適に用いられている。かかる透明導電性フィルムとしては、ポリエチレンテレフタレート(PET)、トリアセチルセルロース(TAC)等の透明フィルム表面の少なくとも片面に、酸化インジウム(In2O3)、酸化錫(SnO2)、In2O3とSnO2の混合焼結体(ITO)等を、真空蒸着法、スパッタリング法、イオンプレーティング法等のドライプロセスによって設けたものがよく知られている。 Conventionally, a transparent conductive film is suitably used as a transparent electrode such as a liquid crystal display or a transparent touch panel or an electromagnetic shielding material. Examples of such transparent conductive films include indium oxide (In 2 O 3 ), tin oxide (SnO 2 ), In 2 O 3 on at least one surface of a transparent film surface such as polyethylene terephthalate (PET) or triacetyl cellulose (TAC). It is well known that a mixed sintered body (ITO) of SnO 2 and SnO 2 is provided by a dry process such as vacuum deposition, sputtering, or ion plating.
しかし、通常透明導電性フィルムは、ウェブ状での連続加工や打ち抜き加工があり、また、表面加工中も曲げられた状態で用いられたり、また保管されたりするため、上記ドライプロセスにより得られる透明導電性フィルムは、該加工工程や保管している間にクラックが発生して、表面抵抗が増大したりすることがあった。 However, the transparent conductive film usually has continuous processing and punching processing in a web shape, and is used in a bent state during surface processing and is also stored. In the conductive film, cracks may occur during the processing step or storage, and the surface resistance may increase.
一方、透明基材フィルムの上に導電性高分子を塗布すること(ウエットプロセス)によって形成される透明導電塗膜層は、膜自体に柔軟性があり、クラックなどの問題は生じがたい。また、導電性高分子を塗布することによって透明導電性フィルムを得る方法は、ドライプロセスとは異なって製造コストが比較的安く、またコーティングスピードも一般的に速いので生産性に優れるという利点もある。このような導電性高分子の塗布によって得られる透明導電性フィルムは、これまで一般的に用いられてきたポリチオフェン、ポリアニリン、ポリピロール等は、開発の初期段階では高い導電性が得られないため、帯電防止用途などに使用が限定されていたり、導電塗膜層自体の色相が問題となったりしていた。しかし、最近では製法の改良などによりこれらの問題も改善されてきている。例えば、3,4−ジアルコキシチオフェンをポリアニオン存在下で酸化重合することによって得られるポリ(3,4−ジアルコキシチオフェン)とポリアニオンとからなる導電性高分子(特許文献1)は、近年の製法の改良(特許文献2および特許文献3)などにより、高い光線透過率を保ったまま非常に低い表面抵抗を発現している。 On the other hand, the transparent conductive coating layer formed by applying a conductive polymer on a transparent substrate film (wet process) has flexibility in the film itself, and problems such as cracks hardly occur. In addition, the method of obtaining a transparent conductive film by applying a conductive polymer has the advantage that the manufacturing cost is relatively low unlike the dry process, and the coating speed is generally high, so that the productivity is excellent. . Transparent conductive films obtained by applying such conductive polymers are charged with polythiophene, polyaniline, polypyrrole, etc., which have been generally used so far, because high conductivity cannot be obtained at the initial stage of development. The use was limited to the prevention use etc., or the hue of the conductive coating layer itself was problematic. However, these problems have recently been improved by improving the production method. For example, a conductive polymer (Patent Document 1) comprising a poly (3,4-dialkoxythiophene) obtained by oxidative polymerization of 3,4-dialkoxythiophene in the presence of a polyanion and a polyanion is a recent production method. (Patent Document 2 and Patent Document 3) improve the surface resistance while maintaining a high light transmittance.
しかしながら、かかる導電性高分子を透明導電塗膜層とした透明導電性フィルムは、塗膜の表層近辺に導電性に寄与しないポリアニオン成分が多く存在するため、例えばタッチパネル用の基材として使用した場合、接触抵抗が高いために誤操作の原因となる等の問題がある。また、有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として使用した場合でも、所定の導電性が得られないなどの問題がある。 However, a transparent conductive film having such a conductive polymer as a transparent conductive coating film layer has many polyanion components that do not contribute to conductivity near the surface of the coating film. For example, when used as a base material for a touch panel There are problems such as high contact resistance, which causes erroneous operation. In addition, even when used as a transparent electrode such as an organic electroluminescence element or an inorganic electroluminescence lamp, there is a problem that predetermined conductivity cannot be obtained.
本発明は、上記背景技術を鑑みなされたもので、その目的とするところは、導電性高分子を用いていながら、透明性および導電性に優れ、しかも、ITOを積層したものと同等以上に優れた導電性フィルムを提供することにある。 The present invention has been made in view of the above-mentioned background art, and its object is to have excellent transparency and conductivity while using a conductive polymer, and at least as excellent as a laminate of ITO. Another object is to provide a conductive film.
本発明者らは、上記課題を達成するために種々鋭意検討した結果、ポリカチオン状のポリチオフェンとポリアニオンとからなる導電性高分子を用いると共に、表面抵抗率と接触抵抗値との比を特定すれば、例えばタッチパネル用の基材として使用した場合の誤操作を抑制でき、また有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として使用した場合でも、所望の電導性を発現させ得ることを見出し、本発明に到達した。 As a result of diligent investigations to achieve the above-mentioned problems, the present inventors have used a conductive polymer composed of polycationic polythiophene and polyanion and specified the ratio between the surface resistivity and the contact resistance value. For example, it is possible to suppress erroneous operation when used as a base material for a touch panel, for example, and even when used as a transparent electrode such as an organic electroluminescence element or an inorganic electroluminescence lamp, it has been found that desired conductivity can be expressed, The present invention has been reached.
かくして本発明によれば、「基材フィルムの少なくとも片面に、下記一般式
本発明の導電性フィルムは、特定のポリチオフェン系導電性重合体を含有する透明導電性塗膜を形成したもので、表面抵抗率と接触抵抗値との比が6以下であるので、ITOと同等以上に優れた透明性、導電性を有している。したがって、液晶ディスプレイ(LCD)タッチパネル、有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として好適に使用することができる。 The conductive film of the present invention is formed by forming a transparent conductive coating film containing a specific polythiophene-based conductive polymer. Since the ratio of the surface resistivity to the contact resistance value is 6 or less, it is equivalent to ITO. It has excellent transparency and conductivity. Therefore, it can be suitably used as a transparent electrode such as a liquid crystal display (LCD) touch panel, an organic electroluminescence element, and an inorganic electroluminescence lamp.
本発明の導電性フィルムは、基材フィルムの少なくとも片面に、下記一般式
一方導電性高分子を構成するポリアニオンとしては、高分子状カルボン酸類(例えば、ポリアクリル酸、ポリメタクリル酸、ポリマレイン酸など)、高分子状スルホン酸類(例えば、ポリスチレンスルホン酸、ポリビニルスルホン酸など)などがあげられる。これらの高分子状カルボン酸およびスルホン酸類はまた、ビニルカルボン酸およびビニルスルホン酸類と他の重合可能なモノマー類、例えばアクリレート類およびスチレンなどとの共重合体であってもよい。これらのポリアニオンのなかで、ポリスチレンスルホン酸およびその全べてもしくは一部が金属塩であるものが特に好適である。なお、かかるポリアニオンの数平均分子量は、1,000〜2,000,000の範囲が適当であり、特に2,000〜500,000の範囲が好ましい。 On the other hand, the polyanion constituting the conductive polymer includes polymeric carboxylic acids (for example, polyacrylic acid, polymethacrylic acid, polymaleic acid, etc.), and polymeric sulfonic acids (for example, polystyrene sulfonic acid, polyvinyl sulfonic acid, etc.). Etc. These polymeric carboxylic acids and sulfonic acids may also be copolymers of vinyl carboxylic acids and vinyl sulfonic acids with other polymerizable monomers such as acrylates and styrene. Among these polyanions, those in which polystyrene sulfonic acid and all or a part thereof are metal salts are particularly suitable. The number average molecular weight of the polyanion is suitably in the range of 1,000 to 2,000,000, particularly preferably in the range of 2,000 to 500,000.
なお、上記の導電性高分子を含有する透明導電性塗膜には、導電性能を向上させるという観点からジエチレングリコール、トリエチレングリコール、テトラエチレングリコール、ポリエチレングリコールなどが含まれていてもよい。また、分子内にアミド結合を有する室温では液体の水溶性化合物が含まれていてもよい。 The transparent conductive coating film containing the conductive polymer may contain diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, or the like from the viewpoint of improving the conductive performance. Further, a water-soluble compound that is liquid at room temperature having an amide bond in the molecule may be contained.
これらの化合物は、前記導電性高分子100重量部に対して、10〜1000重量部の範囲、好ましくは30〜600重量部の範囲含有されていることが好ましい。この含有量が10重量部未満の場合には、導電性能の向上効果が低下し、逆に1000重量部を超える場合には、塗膜のヘイズ値が増大して透明性が低下する、塗膜自体の強度が低下して簡単に剥離が生じ、フィルムをロール状に巻き取る際に塗膜が接触した裏面に簡単に転写してしまうなどの不具合が生じやすくなる。なお、ここでいう「導電性高分子100重量部に対して」とは、「導電性高分子の固形分100重量部に対して」という意味である。 These compounds are preferably contained in the range of 10 to 1000 parts by weight, preferably in the range of 30 to 600 parts by weight, with respect to 100 parts by weight of the conductive polymer. When the content is less than 10 parts by weight, the effect of improving the conductive performance is reduced. Conversely, when the content is more than 1000 parts by weight, the haze value of the coating is increased and the transparency is lowered. Since the strength of the film itself is reduced, the film easily peels off, and when the film is wound into a roll, a problem such as easy transfer to the back surface with which the coating film comes into contact easily occurs. Here, “with respect to 100 parts by weight of the conductive polymer” means “with respect to 100 parts by weight of the solid content of the conductive polymer”.
次に、本発明にかかる透明導電性塗膜には、得られる塗膜の強度を向上させる目的で、アルコキシシラン化合物を添加してもよい。これらのシラン化合物は、加水分解され、その後の縮合反応された反応生成物の形態で塗膜中に存在する。これらのシラン化合物としては、例えばテトラメトキシシラン、テトラエトキシシラン、テトライソプロポキシシラン、テトライソブトキシシラン、メチルトリエトキシシラン、ジメチルジエトキシシラン、トリメチルエトキシシラン、フェニルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、ビニルトリエトキシシランなどのアルコキシ基以外の反応性官能基を有するトリアルコキシシランがあげられ、特にエポキシ基を有する3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルメチルジメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシランなどが好ましい。 Next, you may add an alkoxysilane compound to the transparent conductive coating film concerning this invention in order to improve the intensity | strength of the coating film obtained. These silane compounds are present in the coating film in the form of a reaction product obtained by hydrolysis and subsequent condensation reaction. Examples of these silane compounds include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetraisobutoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, trimethylethoxysilane, phenyltriethoxysilane, and γ-glycidoxy. Examples include trialkoxysilanes having reactive functional groups other than alkoxy groups such as propyltrimethoxysilane and vinyltriethoxysilane, especially 3-glycidoxypropyltrimethoxysilane and 3-glycidoxypropylmethyl having an epoxy group. Dimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane and the like are preferable.
このようなアルコキシシラン化合物の添加量は、導電性高分子100重量部に対して、20〜500重量部の範囲が好ましい。該添加量が20重量部より少ない場合には塗膜強度の改善効果が小さくなり、一方500重量部を超える場合には表面抵抗率が増大する傾向にある。 The amount of the alkoxysilane compound added is preferably in the range of 20 to 500 parts by weight with respect to 100 parts by weight of the conductive polymer. When the added amount is less than 20 parts by weight, the effect of improving the coating film strength is reduced, while when it exceeds 500 parts by weight, the surface resistivity tends to increase.
このようなシラン化合物の加水分解/縮合を効率よく進行させるためには触媒を併用することが好ましい。触媒としては酸性触媒または塩基性触媒のいずれをも用いることができる。酸性触媒としては、酢酸、塩酸、硝酸等の無機酸、酢酸、クエン酸、プロピオン酸、しゅう酸、p−トルエンスルホン酸等の有機酸が好適である。一方塩基性触媒としてはアンモニア、トリエチルアミン、トリプロピルアミン等の有機アミン化合物、ナトリウムメトキシド、カリウムメトキシド、カリウムエトキシド、水酸化ナトリウム、水酸化カリウム等のアルカリ金属化合物などが好適である。 In order to efficiently proceed such hydrolysis / condensation of the silane compound, it is preferable to use a catalyst in combination. As the catalyst, either an acidic catalyst or a basic catalyst can be used. As the acidic catalyst, inorganic acids such as acetic acid, hydrochloric acid and nitric acid, and organic acids such as acetic acid, citric acid, propionic acid, oxalic acid and p-toluenesulfonic acid are suitable. On the other hand, as the basic catalyst, organic amine compounds such as ammonia, triethylamine and tripropylamine, and alkali metal compounds such as sodium methoxide, potassium methoxide, potassium ethoxide, sodium hydroxide and potassium hydroxide are suitable.
本発明では上記透明導電塗膜層を形成するためのコーティング組成物としては、前記導電性高分子を主成分として水に分散させた分散液を用いるが、必要に応じてポリエステル、ポリアクリル、ポリウレタン、ポリ酢酸ビニル、ポリビニルブチラールなどの適当な有機高分子材料をバインダーとして添加することができる。 In the present invention, as the coating composition for forming the transparent conductive coating film layer, a dispersion liquid in which the conductive polymer as a main component is dispersed in water is used. If necessary, polyester, polyacryl, polyurethane A suitable organic polymer material such as polyvinyl acetate or polyvinyl butyral can be added as a binder.
さらに必要に応じて、バインダーを溶解させる目的、もしくは基材フィルムへの濡れ性を改善する目的、固形分濃度を調整する目的などで、水と相溶性のある適当な溶媒を添加することができる。例えば、アルコール類(メタノール、エタノール、プロパノール、イソプロパノールなど)、アミド類(ホルムアミド、N,N−ジメチルホルムアミド、アセトアミド、N−メチルアセトアミド、N,N−ジメチルアセトアミド、N−メチルプロピオンアミド)などが好ましく用いられる。 Furthermore, if necessary, an appropriate solvent compatible with water can be added for the purpose of dissolving the binder, improving the wettability to the base film, or adjusting the solid content concentration. . For example, alcohols (methanol, ethanol, propanol, isopropanol, etc.), amides (formamide, N, N-dimethylformamide, acetamide, N-methylacetamide, N, N-dimethylacetamide, N-methylpropionamide) and the like are preferable. Used.
さらに、上記コーティング組成物には、基材フィルムに対する濡れ性を向上させる目的で、少量の界面活性剤を加えてもよい。好ましい界面活性剤としては、非イオン性界面活性剤(例えば、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンアルキルエーテル、ソルビタン脂肪酸エステルなど)、およびフッ素系界面活性剤(例えばフルオロアルキルカルボン酸塩、パーフルオロアルキルベンゼンスルホン酸塩、パーフルオロアルキル4級アンモニウム塩、パーフルオロアルキルポリオキシエチレンエタノールなど)があげられる。 Furthermore, you may add a small amount of surfactant to the said coating composition in order to improve the wettability with respect to a base film. Preferred surfactants include nonionic surfactants (eg, polyoxyethylene alkylphenyl ether, polyoxyethylene alkyl ether, sorbitan fatty acid ester, etc.), and fluorosurfactants (eg, fluoroalkylcarboxylates, Fluoroalkylbenzene sulfonate, perfluoroalkyl quaternary ammonium salt, perfluoroalkyl polyoxyethylene ethanol, etc.).
本発明における基材フィルムは特に制限する必要はないが、ポリエステル、ポリスチレン、ポリイミド、ポリアミド、ポリスルホン、ポリカーボネート、ポリ塩化ビニル、ポリエチレン、ポリプロピレン、ならびにこれらのブレンドおよび共重合体、ならびにフェノール樹脂、エポキシ樹脂、ABS樹脂などからなるフィルムが好ましい。 The base film in the present invention is not particularly limited, but polyester, polystyrene, polyimide, polyamide, polysulfone, polycarbonate, polyvinyl chloride, polyethylene, polypropylene, and blends and copolymers thereof, and phenol resin and epoxy resin. A film made of ABS resin or the like is preferable.
なかでも、二軸配向したポリエステルフィルムが、寸法安定性、機械的性質、耐熱性、電気的性質などに優れているので好ましく、特にポリエチレンテレフタレートまたはポリエチレン―2,6―ナフタレートが、高ヤング率である等の機械的特性に優れ、耐熱寸法安定性がよい等の熱的特性等に優れているのでより好ましい。なお、基材フィルムの厚みも特に制限されないが、500μm以下が好ましい。500μmより厚い場合は剛性が強すぎて、得られたフィルムをディスプレイなどに貼付ける際の取扱い性が低下しやすい。 Among them, a biaxially oriented polyester film is preferable because it has excellent dimensional stability, mechanical properties, heat resistance, electrical properties, and the like. Particularly, polyethylene terephthalate or polyethylene-2,6-naphthalate has a high Young's modulus. It is more preferable because it has excellent mechanical characteristics such as excellent thermal characteristics such as excellent heat-resistant dimensional stability. The thickness of the base film is not particularly limited, but is preferably 500 μm or less. When it is thicker than 500 μm, the rigidity is too strong, and the handleability when the obtained film is attached to a display or the like tends to be lowered.
次に本発明の導電性フイルムは、その全光線(可視光線)透過率が70%以上、好ましくは80%以上であると同時に透明導電性塗膜側の表面抵抗率が10〜1×104Ω/□、好ましくは10〜5×103Ω/□であることが必要である。全光線透過率が70%未満の場合には、透明性が不充分となり、例えばタッチパネルを作成しても暗くて表示画面が見えにくくなるので好ましくない。また、表面抵抗率が1×104Ω/□を超える場合には、表面抵抗率が高すぎるため好ましくなく、逆に10Ω/□未満の場合には、導電性高分子の使用量が著しく増加するため製造コストが上がり経済的でない。 Next, the conductive film of the present invention has a total light (visible light) transmittance of 70% or more, preferably 80% or more, and simultaneously has a surface resistivity of 10 to 1 × 10 4 on the transparent conductive coating film side. It is necessary that it is Ω / □, preferably 10 to 5 × 10 3 Ω / □. When the total light transmittance is less than 70%, the transparency is insufficient, and for example, even if a touch panel is created, it is not preferable because it is too dark to see the display screen. In addition, when the surface resistivity exceeds 1 × 10 4 Ω / □, the surface resistivity is too high, which is not preferable. Conversely, when the surface resistivity is less than 10Ω / □, the amount of the conductive polymer used is remarkably increased. Therefore, the manufacturing cost increases and it is not economical.
さらに、表面抵抗率と接触抵抗値との比(接触抵抗値/表面抵抗率)が6.0以下、好ましくは5.0以下である必要がある。この比が6.0を超える場合には電導性が不充分となり、例えばタッチパネル用の基材として使用した場合には誤操作の原因となる等の問題が発生し、また、有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として使用した場合には所定の電導性が得られないなどの問題が発生するので好ましくない。 Furthermore, the ratio of the surface resistivity to the contact resistance value (contact resistance value / surface resistivity) needs to be 6.0 or less, preferably 5.0 or less. When this ratio exceeds 6.0, the electrical conductivity becomes insufficient. For example, when it is used as a base material for a touch panel, a problem such as an erroneous operation occurs, and an organic electroluminescent element or inorganic When it is used as a transparent electrode such as an electroluminescence lamp, a problem such as failure to obtain predetermined conductivity occurs, which is not preferable.
以上に説明した本発明の導電性フィルムを製造する方法は特に限定する必要はないが、上記透明導電性塗膜層を形成するためのコーティング組成物を塗布、乾燥する際にポリアニオン成分が表層に移行しやすいので、例えば2回以上に分けて塗布する、塗膜形成後にコロナ放電処理やプラズマ放電処理などでポリアニオン成分を除去する、あるいは、該コーティング組成物を塗布する前にポリアニオン成分との親和性が高い成分を予め基材フィルムに塗布しておく等の方法が好ましい例としてあげられる。なかでもコーティング組成物を2回以上重ねて塗布する方法は、ポリアニオン成分の極在化した層の厚さが、塗布された透明導電塗膜層厚さの2〜10%程度と比例していること、および、先に塗布された透明導電塗膜層の上部にポリアニオン成分層が存在するため、ポリアニオン成分との親和性が高い成分が予め塗布されていることとなるので表層のアニオン成分層を薄くでき好ましい。 The method for producing the conductive film of the present invention described above is not particularly limited, but when the coating composition for forming the transparent conductive coating layer is applied and dried, the polyanion component is on the surface layer. Because it is easy to migrate, for example, it is applied in two or more times, the polyanion component is removed by corona discharge treatment or plasma discharge treatment after forming the coating film, or the affinity with the polyanion component before applying the coating composition A preferable example is a method in which a component having high properties is previously applied to a base film. In particular, in the method of applying the coating composition twice or more times, the thickness of the polyanionic component layer is proportional to about 2 to 10% of the applied transparent conductive coating layer thickness. In addition, since the polyanion component layer is present on the upper part of the previously applied transparent conductive coating layer, a component having a high affinity with the polyanion component is applied in advance. Thinning is preferable.
また、プラズマ放電処理によるポリアニオン成分層の除去は、近年プラズマ処理技術の発展により、再現性、細かな制御が可能となり、二回重ね塗りと同様に好適な方法のひとつである。 In addition, removal of the polyanion component layer by plasma discharge treatment is one of the preferred methods as in the case of two-time overcoating, as reproducibility and fine control become possible due to recent development of plasma treatment technology.
透明導電性塗膜層の塗布方法は、それ自体公知の方法を採用できる。例えばリップダイレクト法、コンマコーター法、スリットリバース法、ダイコーター法、グラビアロールコーター法、ブレードコーター法、スプレーコーター法、エアーナイフコート法、ディップコート法、バーコーター法などが好ましくあげられる。加熱乾燥条件としては80〜160℃で10〜300秒間、特に100〜150℃で20〜120秒間が好ましい。 As a method for applying the transparent conductive coating layer, a method known per se can be adopted. For example, a lip direct method, a comma coater method, a slit reverse method, a die coater method, a gravure roll coater method, a blade coater method, a spray coater method, an air knife coat method, a dip coat method, a bar coater method and the like are preferable. The heating and drying conditions are preferably 80 to 160 ° C. for 10 to 300 seconds, particularly preferably 100 to 150 ° C. for 20 to 120 seconds.
基材フィルムがポリエステルフィルムの場合には、製膜工程中、特に未延伸フィルムをタテ延伸した後に塗液を塗布し、次いで乾燥・ヨコ延伸した後に熱処理する、インラインコーティング法を採用するのが好ましい。 When the base film is a polyester film, it is preferable to adopt an in-line coating method during the film forming process, in particular, applying the coating liquid after vertically stretching the unstretched film, and then heat-treating after drying and horizontal stretching. .
かかるインラインコーティング法によれば、オフライン加工に比べ、例えば、基材フィルムとの接着性が向上する、熱処理時にクリップでフィルムの両端を把持しているために得られるフィルムにシワが入らず平面性が保持できるといった効果が発揮される。なお、インラインコーティング法での熱処理は、200℃以上で行うことが好ましい。また、塗液を塗布する際には、必要に応じて、さらに密着性・塗工性を向上させるための予備処理として、基材フィルム表面にコロナ放電処理、プラズマ放電処理などの物理的表面処理を施しても構わない。 According to such an in-line coating method, for example, the adhesion to the base film is improved compared to the off-line processing, and the film obtained by gripping both ends of the film with a clip at the time of heat treatment does not have wrinkles and is flat. Is effective. In addition, it is preferable to perform the heat processing by an in-line coating method at 200 degreeC or more. In addition, when applying the coating liquid, if necessary, physical surface treatment such as corona discharge treatment or plasma discharge treatment is applied to the substrate film surface as a preliminary treatment for further improving the adhesion and coating properties. May be applied.
なお、全透明導電塗膜層の厚みは60nm以上、特に80nm以上とし、300nm以下、特に200nm以下とすることが好ましい。該塗膜の厚さが薄すぎると十分な導電性が得られないことがあり、逆に厚すぎると、透明性が不足したり、ブロッキングを起こしたりすることがある。 The thickness of the fully transparent conductive coating layer is preferably 60 nm or more, particularly 80 nm or more, and preferably 300 nm or less, particularly 200 nm or less. If the thickness of the coating film is too thin, sufficient conductivity may not be obtained. Conversely, if it is too thick, transparency may be insufficient or blocking may occur.
本発明の導電性フィルムは、上述のとおり基材フィルムの少なくとも片面にポリチオフェン系の透明導電性塗膜層が積層されていることが必要であるが、透明導電性塗膜層が形成される側と反対の面には必要に応じてアンカーコート層、ハードコート層などの塗膜を設けることもできる。 As described above, the conductive film of the present invention requires a polythiophene-based transparent conductive coating layer to be laminated on at least one side of the base film, but the side on which the transparent conductive coating layer is formed. A coating film such as an anchor coat layer or a hard coat layer can be provided on the opposite surface to the surface as needed.
以下、実施例をあげて本発明をさらに具体的に説明するが、本発明はこれらの実施例に限定されるものではない。なお、実施例中における各評価は下記の方法にしたがった。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples. In addition, each evaluation in an Example followed the following method.
(1)透明導電性塗膜層の厚み
導電性フィルムから、ミクロトーム ULTRACUT−Sを用いてフィルム表面に対し垂直に超薄膜切片を切り出し、この超薄膜切片を透過型電子顕微鏡LEM−2000で加速電圧100kVで観察・撮影して層厚さを測定した。
(1) Thickness of Transparent Conductive Coating Layer An ultra-thin film slice is cut out of a conductive film perpendicularly to the film surface using a microtome ULTRACUT-S, and this ultra-thin film slice is accelerated with a transmission electron microscope LEM-2000. The layer thickness was measured by observing and photographing at 100 kV.
(2)全光線透過率およびヘイズ
JIS K7150にしたがい、スガ試験機(株)製のヘイズメーターHCM−2Bにて測定した。
(2) Total light transmittance and haze Measured with a haze meter HCM-2B manufactured by Suga Test Instruments Co., Ltd. according to JIS K7150.
(3)表面固有抵抗率
三菱化学社製Lorester MCP−T600を用いて、JIS K7194に準拠して測定した。測定は任意の箇所を5回測定し、それらの平均値とした。
(3) Surface specific resistivity It measured based on JISK7194 using Mitsubishi Chemical Corporation Lorester MCP-T600. The measurement was performed five times at an arbitrary location, and the average value thereof was taken.
(4)接触抵抗値
750μmのポリエチレンテレフタレートのシートを長辺130mm、短辺70mmに切り出し、これを長辺の端より30mm、短辺の端より40mmの点を中心とした一辺30mmの正方形部分を二箇所カットし取り除き、4辺に幅5mmの紙両面テープ(ニチバン製:ナイスタック NW−5)を貼りつけたスペーサーを作成した。
導電性フイルムを、長辺130mm、短辺70mmに切り出し、短辺側の片側のみ端より3mmを残して、導電テープ(新東化学製:STRtape 幅8mm)を貼りつけたサンプルを二枚測定用サンプルとして作成した。
上記で作成した測定用サンプルを、導電テープを貼った側を右側として、その上に両面テープの離型紙を剥がしたスペーサーを重ね、さらにもう一枚の測定用サンプルを、導電テープを貼った側を左側として重ねて接触抵抗測定用セルを作成した。
太平理化工業製のrubbing testerを使用して、スペーサーの一辺30mmの窓の中心部に先端部分が直径8mmの丸棒にて荷重1.38kgをかけて導電性フイルム同士を接触させ、両端の導電テープ電極間に定電圧電源により5Vを印加し、この時の電圧を測定してセルの抵抗値を算出し接触抵抗値とした。
(4) A sheet of polyethylene terephthalate having a contact resistance value of 750 μm is cut into a long side of 130 mm and a short side of 70 mm, and this is a square with a side of 30 mm centering on a point of 30 mm from the end of the long side and 40 mm from the end of the short side. The part was cut and removed, and a spacer having a double-sided paper tape with a width of 5 mm (made by Nichiban: Nystack NW-5) on four sides was prepared.
For measuring two sheets of conductive film cut into a long side of 130 mm and a short side of 70 mm, leaving only 3 mm from the end on one side of the short side and a conductive tape (manufactured by Shinto Chemical Co., Ltd .: STRtape width 8 mm) Created as a sample.
With the measurement sample created above, the side with the conductive tape applied is the right side, and the spacer from which the release paper of the double-sided tape has been peeled is overlaid, and another measurement sample is attached to the side with the conductive tape applied. Were stacked on the left side to create a contact resistance measuring cell.
Using a rubbing tester manufactured by Taihei Rika Kogyo Co., Ltd., the conductive film is brought into contact with each other by applying a load of 1.38 kg with a round bar having a diameter of 8 mm at the center of the window with a side of 30 mm on one side of the spacer. A voltage of 5 V was applied between the tape electrodes by a constant voltage power source, and the voltage at this time was measured to calculate the resistance value of the cell to obtain the contact resistance value.
(5)タッチパネルへの適性テスト
導電性フィルムのタッチパネルへの適性の目安として、モデル的なタッチパネルを作製し、ペン入力によるリニアリティー試験を行った。本テストにおいては、導電性フィルムを100mm×100mmに切り出し、透明導電性塗膜層形成面の両端に幅5mmの電極を銀ペーストを塗布して作成した。この電極間に定電圧電源により5Vを印加し、サンプル中心部50mm×50mmの範囲を縦横1mm間隔で(x1,y1)〜(x50,y50)の2500点について電圧Vi,j(i,j=1〜50)を測定した。各電圧測定点での理論電圧Ui,j=V1,1+(V50,50−V1,1)/50×(j−1)からのズレをΔi,j=(Vi,j−Ui,j)/Ui,jで定義し、このΔi,jの絶対値の最大値をリニアリティと定義した。
テストは、導電性フィルムで構成されたパネル板側から、ポリアセタール樹脂からなるペン先半径0.8mmのタッチペンにて荷重250gfをかけて行った。
○:リニアリティーが、3%未満である。
×:リニアリティーが、3%以上である。
(5) Suitability test for touch panel As a measure of suitability of the conductive film to the touch panel, a model touch panel was prepared, and a linearity test by pen input was performed. In this test, a conductive film was cut out to 100 mm × 100 mm, and an electrode having a width of 5 mm was applied to both ends of the transparent conductive coating layer forming surface by applying silver paste. A voltage V i, j is applied to 2500 points from (x 1 , y 1 ) to (x 50 , y 50 ) in a sample center portion of 50 mm × 50 mm at intervals of 1 mm in the vertical direction by applying 5 V between the electrodes by a constant voltage power source. (I, j = 1 to 50) was measured. The deviation from the theoretical voltage U i, j = V 1,1 + (V 50,50 −V 1,1 ) / 50 × (j−1) at each voltage measurement point is expressed as Δ i, j = ( Vi, j − U i, j ) / U i, j , and the maximum absolute value of Δ i, j is defined as linearity.
The test was performed by applying a load of 250 gf with a touch pen made of polyacetal resin and having a pen tip radius of 0.8 mm from the side of the panel plate made of a conductive film.
○: Linearity is less than 3%.
X: Linearity is 3% or more.
[実施例1]
ポリ(3,4−エチレンジオキシチオフェン)とポリスチレンスルホン酸を主成分とし、シランカップリング剤、ジエチレングリコールとを含んでなる導電性塗料(日本アグファ・ゲバルト(株)社製、商品名:Orgacon S−300)を、マイヤーバーを用いて基材フィルム(PETフィルム、帝人デュポンフィルム株式会社製、商品名O3PF8W−100)上に塗布し、140℃で1分間の乾燥を行って膜厚が150nmの透明導電塗膜層を形成した。次いで、この透明導電塗膜層の上に、上記と同じ導電性塗料(日本アグファ・ゲバルト(株)社製、商品名:Orgacon S−300)を、マイヤーバーを用いて再度塗布し、140℃で1分間の乾燥を行って全膜厚が200nmの透明導電塗膜層を得た。得られた導電性フィルムの評価結果を表1に示す。
[Example 1]
Conductive paint comprising poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid as main components, and containing a silane coupling agent and diethylene glycol (Nippon Agfa Gevaert Co., Ltd., trade name: Orgacon S) -300) is applied onto a substrate film (PET film, manufactured by Teijin DuPont Films, trade name: O3PF8W-100) using a Mayer bar, and dried at 140 ° C. for 1 minute to have a film thickness of 150 nm. A transparent conductive coating layer was formed. Next, on the transparent conductive coating layer, the same conductive paint as described above (product name: Orgacon S-300, manufactured by Nippon Agfa Gevaert Co., Ltd.) was applied again using a Mayer bar, and 140 ° C. And dried for 1 minute to obtain a transparent conductive coating layer having a total film thickness of 200 nm. The evaluation results of the obtained conductive film are shown in Table 1.
[実施例2]
導電性塗料(日本アグファ・ゲバルト(株)社製、商品名:Orgacon S−300)を、マイヤーバーを用いて基材フィルム(PETフィルム、帝人デュポンフィルム株式会社製、商品名O3PF8W−100)上に塗布し、140℃で1分間の乾燥を行って膜厚が200nmの透明導電塗膜層を形成した。得られた導電性フイルムを、春日電機製卓上コロナ放電処理機CG−102型にて、アルミナ電極を使用し、印加電流4A、フイルムと電極の距離1mm、フィルムの処理速度0.1m/sにて4回処理を行なった。得られた導電性フィルムの評価結果を表1に示す。
[Example 2]
Conductive paint (Nippon Agfa Gebalt Co., Ltd., trade name: Orgacon S-300) on a base film (PET film, Teijin DuPont Films, trade name: O3PF8W-100) using a Mayer bar And dried at 140 ° C. for 1 minute to form a transparent conductive coating layer having a thickness of 200 nm. The obtained conductive film was subjected to an applied current of 4A, a distance between the film and the electrode of 1 mm, and a processing speed of the film of 0.1 m / s using a table corona discharge treatment machine CG-102 manufactured by Kasuga Electric. The treatment was performed 4 times. The evaluation results of the obtained conductive film are shown in Table 1.
[実施例3]
コロナ放電処理をプラズマ放電処理に変更する以外は、実施例2と同様の操作を行った。この時のプラズマ放電処理は、常圧プラズマ表面処理装置(積水化学工業製AP−T03−L)を用いて、窒素気流下(流量60L/分)、フィルムの処理速度0.2m/分にて、透明導電性塗膜層表面を3回処理した。得られた導電性フィルムの評価結果を表1に示す。
[Example 3]
The same operation as in Example 2 was performed except that the corona discharge treatment was changed to the plasma discharge treatment. At this time, the plasma discharge treatment was performed using a normal pressure plasma surface treatment apparatus (AP-T03-L manufactured by Sekisui Chemical Co., Ltd.) under a nitrogen stream (flow rate 60 L / min) at a film processing speed of 0.2 m / min. The surface of the transparent conductive coating layer was treated three times. The evaluation results of the obtained conductive film are shown in Table 1.
[比較例1]
導電性塗料(日本アグファ・ゲバルト(株)社製、商品名:Orgacon S−300)を、マイヤーバーを用いて基材フィルム(PETフィルム、帝人デュポンフィルム株式会社製、商品名O3PF8W−100)上に塗布し、140℃で1分間の乾燥を行って膜厚が200nmの透明導電性塗膜層を形成した。得られた導電性フィルムの評価結果を表1に示す。
[Comparative Example 1]
Conductive paint (Nippon Agfa Gebalt Co., Ltd., trade name: Orgacon S-300) on a base film (PET film, Teijin DuPont Films, trade name: O3PF8W-100) using a Mayer bar And dried at 140 ° C. for 1 minute to form a transparent conductive coating layer having a thickness of 200 nm. The evaluation results of the obtained conductive film are shown in Table 1.
[実施例4]
ポリ(3,4−エチレンジオキシチオフェン)0.5重量%とポリスチレンスルホン酸(分子量Mn=150,000)0.8重量%を含んでなる水分散体(BaytronP:バイエルAG製)100重量部にジエチレングリコール3重量部、3−グリシドキシプロピルトリメトキシシランを0.65重量部、界面活性剤として、プラスコートRY−2(互応化学工業製)を1重量部加えた導電コーティング組成物をOrgacon S−300に変えて用いる以外は、実施例1と同様の操作を行った。得られた導電性フィルムの評価結果を表1に示す。
[Example 4]
100 parts by weight of an aqueous dispersion (BaytronP: Bayer AG) comprising 0.5% by weight of poly (3,4-ethylenedioxythiophene) and 0.8% by weight of polystyrene sulfonic acid (molecular weight Mn = 150,000) Orgacon is a conductive coating composition in which 3 parts by weight of diethylene glycol, 0.65 parts by weight of 3-glycidoxypropyltrimethoxysilane and 1 part by weight of PLUSCOAT RY-2 (manufactured by Kyoyo Chemical Industry) as a surfactant are added. The same operation as in Example 1 was performed except that S-300 was used instead. The evaluation results of the obtained conductive film are shown in Table 1.
[比較例2]
導電性ポリマー(3,4−エチレンジオキシチオフェン)0.5重量%とポリスチレンスルホン酸(分子量Mn=150,000)0.8重量%を含んで成るポリマーの水分散体(BaytronP:バイエルAG製)100重量部にジエチレングリコール3重量部、3−グリシドキシプロピルトリメトキシシランを0.65重量部、界面活性剤として、プラスコートRY−2(互応化学工業製)を1重量部加えた導電コーティング組成物をOrgacon S−300に変えて用いる以外は、比較例1と同様の操作を行った。得られた導電性フィルムの評価結果を表1に示す。
[Comparative Example 2]
An aqueous dispersion of a polymer (BaytronP: Bayer AG) comprising 0.5% by weight of a conductive polymer (3,4-ethylenedioxythiophene) and 0.8% by weight of polystyrenesulfonic acid (molecular weight Mn = 150,000) ) Conductive coating in which 3 parts by weight of diethylene glycol, 0.65 parts by weight of 3-glycidoxypropyltrimethoxysilane and 1 part by weight of PLUSCOAT RY-2 (manufactured by Kyodo Chemical Co., Ltd.) as a surfactant were added to 100 parts by weight The same operation as in Comparative Example 1 was performed except that the composition was used in place of Orgacon S-300. The evaluation results of the obtained conductive film are shown in Table 1.
[参考例]
トービ製の表面抵抗率が450Ω/□である、ITOフイルム(OTEC 250B−100N)の特性を表1に示す。
[Reference example]
Table 1 shows the characteristics of ITO film (OTEC 250B-100N) having a surface resistivity of 450Ω / □ manufactured by Tobi.
表1からわかるように、本発明の導電性フィルムは透明性および導電性に優れ、接触抵抗値もITO系導電性フィルムと同等の性能を有することがわかる。 As can be seen from Table 1, it can be seen that the conductive film of the present invention is excellent in transparency and conductivity, and has a contact resistance value equivalent to that of the ITO-based conductive film.
以上に説明した本発明の導電性フィルムは、導電性高分子を用いていながら、ITOを積層したものと同等に優れた透明性、導電性および接触抵抗を有しているので、例えば液晶ディスプレイ(LCD)透明タッチパネル、有機エレクトロルミネッセンス素子、無機エレクトロルミネッセンスランプ等の透明電極として好適に使用することができる。 The conductive film of the present invention described above has a transparency, conductivity, and contact resistance equivalent to those obtained by laminating ITO while using a conductive polymer. For example, a liquid crystal display ( LCD) can be suitably used as transparent electrodes for transparent touch panels, organic electroluminescent elements, inorganic electroluminescent lamps and the like.
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JP5367939B2 (en) * | 2006-07-26 | 2013-12-11 | 帝人デュポンフィルム株式会社 | Conductive film and touch panel using the film |
JP5178231B2 (en) * | 2008-02-20 | 2013-04-10 | 帝人デュポンフィルム株式会社 | Conductive film and touch panel using the same |
JP5178265B2 (en) * | 2008-03-19 | 2013-04-10 | 帝人デュポンフィルム株式会社 | Conductive film and touch panel using the same |
JP2011108425A (en) * | 2009-11-13 | 2011-06-02 | Japan Aviation Electronics Industry Ltd | Transparent electrode structure and touch panel using the same |
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