JP4380618B2 - センサ装置 - Google Patents
センサ装置 Download PDFInfo
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- JP4380618B2 JP4380618B2 JP2005307031A JP2005307031A JP4380618B2 JP 4380618 B2 JP4380618 B2 JP 4380618B2 JP 2005307031 A JP2005307031 A JP 2005307031A JP 2005307031 A JP2005307031 A JP 2005307031A JP 4380618 B2 JP4380618 B2 JP 4380618B2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 244000126211 Hericium coralloides Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
- B81C1/0023—Packaging together an electronic processing unit die and a micromechanical structure die
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P1/00—Details of instruments
- G01P1/02—Housings
- G01P1/023—Housings for acceleration measuring devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05568—Disposition the whole external layer protruding from the surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05573—Single external layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05617—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/05624—Aluminium [Al] as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/0612—Layout
- H01L2224/0613—Square or rectangular array
- H01L2224/06134—Square or rectangular array covering only portions of the surface to be connected
- H01L2224/06135—Covering only the peripheral area of the surface to be connected, i.e. peripheral arrangements
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Gyroscopes (AREA)
- Pressure Sensors (AREA)
- Wire Bonding (AREA)
Description
図1は、本発明の第1実施形態に係るセンサ装置としての角速度センサ装置100の全体概略断面構成を示す図である。また、図2は、図1に示される角速度センサ装置100の回路チップ20における一面すなわち半導体チップ10の搭載面側の面構成を半導体チップ10とともに示す概略平面図である。
図4は、本発明の第2実施形態に係るセンサ装置としての角速度センサ装置200の全体概略断面構成を示す図である。本実施形態では、上記実施形態に対して、センサチップ10の他面に接合された第2のフィルム52を変形したものである。
図5は、本発明の第3実施形態に係るセンサ装置としての角速度センサ装置300の全体概略断面構成を示す図である。
図7は、本発明の第4実施形態に係るセンサ装置としての角速度センサ装置400の要部概略断面構成を示す図である。本実施形態は、上記第1実施形態において、両チップ10、20間に介在する第1のフィルム51を変形したものである。
なお、第1のフィルム51を、センシング部である振動体11と離間させるためには、上記した凹部51aや凸部51b以外のものでもよい。また、センシング部が半導体チップの一面から凹んで配置されている場合などには、第1のフィルムは平板形状であっても、センシング部と離間させることが可能になる。
20…回路チップ、40…バンプ、
51…第1のフィルム、51a…第1のフィルムの凹部、
52…第2のフィルム、52a…第2のフィルムの凹部、
53…第3のフィルム。
Claims (11)
- 一面側に力学量を検出するセンシング部(11)を有する半導体チップ(10)と回路チップ(20)とが積層され、これら両チップ(10、20)がバンプ(40)を介して電気的に接続されてなるセンサ装置において、
前記半導体チップ(10)は、前記センシング部(11)を前記回路チップ(20)の一面に対向させた状態で前記バンプ(40)を介して前記回路チップ(20)に積層されており、
前記半導体チップ(10)の前記一面には、前記センシング部(11)を被覆する樹脂よりなる第1のフィルム(51)が接合されており、
前記半導体チップ(10)における前記一面とは反対側の他面には、樹脂よりなる第2のフィルム(52)が接合されており、
前記第1のフィルム(51)は、前記センシング部(11)と離間した状態で前記半導体チップ(10)の前記一面に接合されており、
前記第2のフィルム(52)は、前記半導体チップ(10)の前記他面のうち前記センシング部(11)に対応する部位から離間した状態で、前記半導体チップ(10)の前記他面に接合されており、
前記第2のフィルム(52)において、前記半導体チップ(10)の前記他面のうち前記センシング部(11)に対応する部位に凹部(52a)が形成されており、この凹部(5
2a)にて、前記第2のフィルム(52)は前記半導体チップ(10)の前記他面と離間
していることを特徴とするセンサ装置。 - 前記第1のフィルム(51)と前記第2のフィルム(52)とで、フィルムを構成する樹脂が同一材料であることを特徴とする請求項1に記載のセンサ装置。
- 前記第1のフィルム(51)のうち前記センシング部(11)に対応する部位に凹部(51a)が形成されており、この凹部(51a)によって前記第1のフィルム(51)は前記センシング部(11)と離間していることを特徴とする請求項1または2に記載のセンサ装置。
- 前記第1のフィルム(51)と前記第2のフィルム(52)とで、前記半導体チップ(10)に接合されている部分の面積が同一であることを特徴とする請求項1ないし3のいずれか1つに記載のセンサ装置。
- 前記第1のフィルム(51)と前記第2のフィルム(52)とで、前記半導体チップ(10)に接合されている部分の平面パターンが同一であることを特徴とする請求項4に記載のセンサ装置。
- 前記第1のフィルム(51)は、前記半導体チップ(10)の前記一面と前記回路チップ(20)の前記一面との間を埋めるように配置され、前記回路チップ(20)の前記一面にも接合されていることを特徴とする請求項1ないし5のいずれか1つに記載のセンサ装置。
- 前記回路チップ(20)における前記一面とは反対側の他面には、樹脂よりなる第3のフィルム(53)が接合されていることを特徴とする請求項6に記載のセンサ装置。
- 前記第1のフィルム(51)と前記第3のフィルム(53)とで、フィルムを構成する樹脂が同一材料であることを特徴とする請求項7に記載のセンサ装置。
- 前記第1のフィルム(51)と前記第3のフィルム(53)とで、前記回路チップ(20)に接合されている部分の面積が同一であることを特徴とする請求項7または8に記載のセンサ装置。
- 前記第1のフィルム(51)と前記第3のフィルム(53)とで、前記回路チップ(20)に接合されている部分の平面パターンが同一であることを特徴とする請求項9に記載のセンサ装置。
- 前記第1のフィルム(51)、前記第2のフィルム(52)および前記第3のフィルム(53)は、互いに同一の形状およびサイズを有するものであり、これら3個のフィルム(51〜53)は、前記半導体チップ(10)と前記回路チップ(20)との積層方向からみて互いに重なるように同じ位置に設けられていることを特徴とする請求項7ないし10のいずれか1つに記載のセンサ装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005307031A JP4380618B2 (ja) | 2005-10-21 | 2005-10-21 | センサ装置 |
US11/522,916 US20070090536A1 (en) | 2005-10-21 | 2006-09-19 | Sensor having semiconductor chip and circuit chip |
DE102006049004A DE102006049004B4 (de) | 2005-10-21 | 2006-10-17 | Sensor mit Halbleiterchip und Schaltkreischip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005307031A JP4380618B2 (ja) | 2005-10-21 | 2005-10-21 | センサ装置 |
Publications (2)
Publication Number | Publication Date |
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JP2007115964A JP2007115964A (ja) | 2007-05-10 |
JP4380618B2 true JP4380618B2 (ja) | 2009-12-09 |
Family
ID=37905518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2005307031A Expired - Fee Related JP4380618B2 (ja) | 2005-10-21 | 2005-10-21 | センサ装置 |
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US (1) | US20070090536A1 (ja) |
JP (1) | JP4380618B2 (ja) |
DE (1) | DE102006049004B4 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005053682A1 (de) * | 2005-11-10 | 2007-05-16 | Bosch Gmbh Robert | Sensor, Sensorbauelement und Verfahren zur Herstellung eines Sensors |
JP2008101980A (ja) * | 2006-10-18 | 2008-05-01 | Denso Corp | 容量式半導体センサ装置 |
JP2009092545A (ja) | 2007-10-10 | 2009-04-30 | Panasonic Corp | 角速度および加速度検出用複合センサ |
DE102008043735A1 (de) * | 2008-11-14 | 2010-05-20 | Robert Bosch Gmbh | Anordnung von mindestens zwei Wafern mit einer Bondverbindung und Verfahren zur Herstellung einer solchen Anordnung |
WO2010110828A1 (en) * | 2009-01-27 | 2010-09-30 | Arizona Board Of Regents, For And On Behalf Of Arizona State University | Embedded mems sensors and related methods |
DE102009007837A1 (de) * | 2009-02-06 | 2010-08-19 | Epcos Ag | Sensormodul und Verfahren zum Herstellen von Sensormodulen |
JP2010199148A (ja) * | 2009-02-23 | 2010-09-09 | Fujikura Ltd | 半導体センサデバイス及びその製造方法、パッケージ及びその製造方法、モジュール及びその製造方法、並びに電子機器 |
US8847375B2 (en) * | 2010-01-28 | 2014-09-30 | Qualcomm Incorporated | Microelectromechanical systems embedded in a substrate |
JP5880877B2 (ja) * | 2012-05-15 | 2016-03-09 | 株式会社デンソー | センサ装置 |
US9315378B2 (en) * | 2014-08-12 | 2016-04-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Methods for packaging a microelectromechanical system (MEMS) wafer and application-specific integrated circuit (ASIC) dies using wire bonding |
IT201800003693A1 (it) | 2018-03-16 | 2019-09-16 | St Microelectronics Srl | Sensore di sforzi, sistema di monitoraggio di integrita' strutturale per costruzioni e processo di fabbricazione di un sensore di sforzi |
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FR2738705B1 (fr) * | 1995-09-07 | 1997-11-07 | Sagem | Dispositif capteur electromecanique et procede de fabrication d'un tel dispositif |
JP3278363B2 (ja) * | 1996-11-18 | 2002-04-30 | 三菱電機株式会社 | 半導体加速度センサ |
US6249046B1 (en) * | 1997-02-13 | 2001-06-19 | Seiko Epson Corporation | Semiconductor device and method for manufacturing and mounting thereof, and circuit board mounted with the semiconductor device |
JP3962499B2 (ja) * | 1999-01-27 | 2007-08-22 | 三菱電機株式会社 | 半導体加速度センサ及びその製造方法 |
JP2001217280A (ja) * | 2000-02-07 | 2001-08-10 | Matsushita Electric Ind Co Ltd | 半導体実装構造 |
JP2001227902A (ja) * | 2000-02-16 | 2001-08-24 | Mitsubishi Electric Corp | 半導体装置 |
JP2002289768A (ja) * | 2000-07-17 | 2002-10-04 | Rohm Co Ltd | 半導体装置およびその製法 |
DE10246283B3 (de) * | 2002-10-02 | 2004-03-25 | Infineon Technologies Ag | Verfahren zur Herstellung von Kanälen und Kavitäten in Halbleitergehäusen und elektronisches Bauteil mit derartigen Kanälen und Kavitäten |
TW567566B (en) * | 2002-10-25 | 2003-12-21 | Siliconware Precision Industries Co Ltd | Window-type ball grid array semiconductor package with lead frame as chip carrier and method for fabricating the same |
JP4165360B2 (ja) * | 2002-11-07 | 2008-10-15 | 株式会社デンソー | 力学量センサ |
JP4969822B2 (ja) * | 2004-12-06 | 2012-07-04 | 株式会社デンソー | センサ装置 |
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2005
- 2005-10-21 JP JP2005307031A patent/JP4380618B2/ja not_active Expired - Fee Related
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2006
- 2006-09-19 US US11/522,916 patent/US20070090536A1/en not_active Abandoned
- 2006-10-17 DE DE102006049004A patent/DE102006049004B4/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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DE102006049004A1 (de) | 2007-04-26 |
US20070090536A1 (en) | 2007-04-26 |
JP2007115964A (ja) | 2007-05-10 |
DE102006049004B4 (de) | 2011-03-31 |
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