JP4356443B2 - Substrate transfer device - Google Patents

Description

  The present invention relates to an apparatus for transferring a blank coated with a photosensitive agent to a mask storage container before a circuit pattern of a semiconductor device is drawn, and particularly from a blank storage case in which a plurality of blanks are stored. The present invention relates to a substrate transfer apparatus for transferring a blank to a SMIF-Pod without human intervention.

  In the manufacture of semiconductor devices, a photolithography technique is widely used in which a mask pattern in which various patterns are formed on a quartz substrate is transferred onto a wafer by an electron beam drawing apparatus or the like. In pattern transfer using this photolithography technique, for example, if there is a foreign substance on a blank coated with a photosensitive agent before drawing a mask with an electron beam drawing apparatus or the like, this becomes an unexposed portion and pattern defects are caused. Will be generated.

  If there are few pattern defects, it is possible to correct the pattern using a correction device, but if there are many pattern defects, consider the time required for correction and the time to perform defect inspection again as a defective product. Make a mask again.

In a semiconductor device equivalent to 1GDRAM that requires a pattern of 0.15 μm or less on a wafer, the mask pattern is transferred after being reduced to a quarter, so that the required mask pattern is 0.6 μm. It becomes as follows.
For this reason, class 10 is insufficient, and it is expected that an environment of class 1 to class 0.1 will be required.

As a technique for realizing such an environment without increasing its construction cost and operation cost, a local cleaning technique can be cited. This local cleaning technology does not make the cleanliness of the entire conventional clean room higher, but it is a technology that keeps only the minimum target space clean.
That is, the local cleaning technology is configured by a combination of a mask storage container that stores the foreign matter and the like so as not to adhere, and a mini-environment chamber that keeps the delivery atmosphere to each apparatus clean.

This mask storage container is a SMIF (Standard Mechanical Interface) -Pod (a standard mechanical interface box mask box) which can be filled with an inert gas such as nitrogen.
Here, the standard mechanical interface mechanism means having a bottom, a lid lock, a take-out mechanism, and the like that are compatible with the standard mechanical interface SMIF system.

  In an apparatus equipped with a standard mechanical interface mechanism, a substrate (blank, mask, or wafer) can be loaded and received through the SMIF-Pod, and the substrate can be moved and transferred between the apparatuses by the SMIF-Pod. .

The mini-environment room is provided as a clean room atmosphere in which a mini-clean room different from the inside of the clean room is directly attached to the apparatus, that is, as an intermediary room.
Through this intermediary chamber, the substrate is loaded and received between the clean SMIF-Pod and the clean apparatus to avoid the adhesion of foreign matter.
It should be noted that mechanical measures are also taken for loading and receiving the substrate.

  This local cleaning technique is a technique related to the entire manufacturing process of a semiconductor device. In the mask manufacturing process, for example, a blank before drawing a circuit pattern of a semiconductor device with an electron beam drawing apparatus or the like is stored. The system is composed of a clean SMIF-Pod for storage and a mini-environment chamber for transferring a blank from the SMIF-Pod into a clean electron beam drawing apparatus without human intervention.

By the way, the blank supplied from the substrate manufacturer is obtained by depositing chromium or the like as a light shielding body on a quartz substrate polished to a predetermined size and accuracy, and further applying a photosensitive agent. This blank is supplied in a state where a plurality of blanks, for example, five blanks are stored in a single blank storage case for transportation.
In order to effectively operate the system consisting of the SMIF-Pod and the mini-environment chamber, it is necessary to transfer the blank storage case so that no foreign matter adheres to the blank when transferring from the blank storage case to the SMIF-Pod. .

However, the transfer of the blank from the blank storage case to the SMIF-Pod is all performed manually. That is, removal of the cover of the blank storage case, removal of the cover of the SMIF-Pod, removal of the blank from the blank storage case using a jig, placement on the main body of the SMIF-Pod, and the SMIF-Pod A series of transfer operations such as attaching the lid to the main body is performed manually. For this reason, the adhesion of foreign substances due to the human factors of workers is increasing.
JP 2000-138153 A JP 2001-48152 A JP 2001-53136 A

  The present invention has been made in view of the above problems, and in a mask manufacturing process, when effectively using a local cleaning system composed of elemental technologies such as the SMIF-Pod and a mini-environment chamber, a blank storage case is provided. It is an object of the present invention to provide a substrate transfer apparatus that can transfer a blank from a SMIF-Pod to a SMIF-Pod without human intervention.

The present invention provides a substrate transfer apparatus for transferring a blank stored in an open cassette to a SMIF-Pod.
1) a) a first mounting table for mounting a blank storage case in which a blank is stored;
b) a fixture for the blank storage case;
c) A lid opening / closing mechanism that consists of an air chuck, grip, claw, and support, and that holds and lifts the lid of the blank storage case.
d) a first mounting portion (A) comprising a main body rotation mechanism that rotates the first mounting table by 90 degrees in the direction of the Z-axis unit with the pivot on the X axis of the first mounting table as a rotation axis;
2) a) A claw base and a stage for placing a blank gripped by a robot hand,
b) A support column capable of rotating the stage 180 degrees with the Z axis at the center of the stage as the rotation axis,
c) A rotating stage part (B) composed of a mounting base for the column,
3) a) a second mounting table on which the SMIF-Pod is mounted;
b) the SMIF-Pod fixture;
c) A lid opening / closing mechanism that consists of an air chuck, grips, claws, and struts that grips and lifts the SMIF-Pod lid.
d) a second mounting portion (C) comprising a support base;
4) A pair of robot hands parallel to the Y-axis and parallel to the Y-axis are provided on the first mounting table side of the X-axis unit, Y-axis unit, Z-axis unit, and Z-axis unit. A direct coordinate robot part (D) as a blank conveying means composed of a hand unit having the first placement part (A), the rotary stage part (B), the second placement part ( C) is arranged in this order in the X-axis direction, and the X-axis unit of the orthogonal coordinate robot portion (D) includes the first placement portion (A), the rotary stage portion (B), and the second placement portion. It is arranged in the X-axis direction in parallel with the arrangement of (C), and when the blank is transferred from the blank storage case to the SMIF-Pod, the blank storage direction can be changed by 180 degrees. A substrate transfer apparatus characterized by the following.

  Further, the present invention provides the substrate transfer apparatus according to the above invention, wherein the hand unit has a reversing mechanism that rotates 180 degrees with the Y axis at the center of the air chuck as the rotation axis while holding the blank, and reverses the blank. It is a substrate transfer apparatus characterized by having it between the Z-axis unit.

  In the substrate transfer apparatus according to the present invention, the substrate transfer apparatus is disposed in a sealed space, and air flows from the upper portion of the space through a fan filter unit (FFU) and a chemical filter. The substrate transfer apparatus is characterized in that it is discharged from the lower discharge port, and the pressure in the space is a positive pressure with respect to the outside.

  Further, the present invention is the substrate transfer apparatus according to the above-mentioned invention, wherein the second mounting part (C) includes an RFID tag (Radio Frequency-Identification: wireless tag) writing / reading device, and the SMIF-Pod is provided in the SMIF-Pod. Is a substrate transfer device characterized in that an RFID tag is attached.

  The present invention comprises a first placement portion (A), a rotary stage portion (B), a second placement portion (C), and an orthogonal coordinate robot portion (D), and the first placement portion (A), The rotary stage unit (B) and the second mounting unit (C) are arranged in this order in the X-axis direction, and the X-axis unit of the orthogonal coordinate type robot unit (D) is the first mounting unit (A) and the rotation unit. When the blank is transferred from the blank storage case to the SMIF-Pod, it is arranged in parallel to the arrangement of the stage unit (B) and the second mounting unit (C). Since it is a substrate transfer device that can be changed by 180 degrees, when effectively operating the local clean system, the blank transfer from the blank storage case to the SMIF-Pod is performed without human intervention. It becomes a substrate transfer device that can be used.

  In the present invention, the hand unit has a reversing mechanism between the Z-axis unit that rotates 180 degrees with the Y axis at the center of the air chuck as the rotation axis while holding the blank, and reverses the blank. Even if the surface on which the photosensitive agent is applied is mistakenly stored in the blank storage case in the reverse state, it can be returned to the normal state of the front and back without human intervention.

Further, according to the present invention, the substrate transfer device is disposed in a sealed space, and air is introduced from the upper portion of the space through the fan filter unit (FFU) and the chemical filter, so the cleanliness is downgraded. Even in the environment, it is possible to transfer a blank storage case to a SMIF-Pod. In addition, it is possible to transfer the blank from the blank storage case to the SMIF-Pod even in an environment where a trace amount of chemicals used in the manufacturing process is floating.

  Further, according to the present invention, the second mounting part (C) includes an RFID tag (wireless tag) writing / reading device, and the RFID tag is attached to the SMIF-Pod. Can be read and written, and progress management, quality control, accident management, etc. in the manufacturing process become effective.

  Hereinafter, embodiments of the present invention will be described in detail.

FIG. 1A is a plan view showing an outline of an embodiment of a substrate transfer apparatus according to the present invention. FIG. 1B is a front view.
As shown in FIGS. 1 (a) and 1 (b), a substrate transfer apparatus according to the present invention includes a first placement part (A), a rotary stage part (B), a second placement part (C), and a direct drive. It is composed of a coordinate type robot part (D). The first placement unit (A), the rotary stage unit (B), and the second placement unit (C) are arranged in this order in the X-axis direction, and the X-axis unit ( (Not shown) is arranged in the X-axis direction in parallel with the arrangement of the first placement part (A), the rotary stage part (B), and the second placement part (C).

  In FIG. 1A, a broken line represents a flow line of a blank to be transferred. The hand unit (41) of the orthogonal coordinate type robot part (D) grips the blank (1) stored in the main body (12) of the blank storage case at both end surfaces of the front end, and the blank storage case. -Transfer from the main body (12) to the main body (32) of the SMIF-Pod. Alternatively, when the storage direction of the blank in the SMIF-Pod main body (32) is changed by 180 degrees, the blank is temporarily placed on the stage (20), and the blank of the blank is rotated by 180 degrees of the stage (20). The direction is changed and transferred again from the stage (20) to the SMIF-Pod body (32).

  The first mounting portion (A) is an open cassette in which a substrate is stored, for example, a first mounting table (10) on which a blank storage case (11) in which a blank is stored is mounted, and neither is shown. A lid opening / closing mechanism comprising a fixture for the blank storage case on the first mounting table, an air chuck, a grip, a claw, and a support, and holding and lifting the lid (13) of the blank storage case; A pivot (14) on the X axis of the mounting table (10) is used as a rotation axis, and the main mounting mechanism is configured to rotate the first mounting table by 90 degrees in the direction of the Z axis unit (45).

The rotary stage section (B) has a claw base (23) and a stage (20) on which the blank (1) held by the robot hand (43) is placed, and a Z axis at the center of the stage as a rotation axis. It is comprised with the support | pillar (21) which can be rotated 180 degree | times, and the support stand (22) of a support | pillar.
The second mounting portion (C) includes a second mounting table (30) on which the SMIF-Pod (31) is mounted, a support table (34), and an SMIF-Pod on the SMIF-Pod (not shown). It comprises a lid opening / closing mechanism that holds and lifts the SMIF-Pod lid (33).

The orthogonal coordinate type robot unit (D) includes an X-axis unit, a Y-axis unit provided on the X-axis unit, a Z-axis unit (45) provided on the Y-axis unit, and a hand unit (41). It is configured.
The hand unit (41) is provided on the surface of the Z-axis unit (45) on the first mounting table (10) side, and a pair of horizontal robot hands (43) parallel to the Y-axis are placed on the first mounting table (43). 10) It has toward the side. In FIG. 1, the Z-axis unit (45) and the hand unit (41) are shown, but the X-axis unit and the Y-axis unit are omitted.

FIG. 2 is a left side view of the first placement portion (A) shown in FIG. In FIG. 2 (a), as indicated by the white arrow, the blank storage case (11) is placed on the first placement table (10) from the front of the first placement portion (A), and blank storage is performed. The case main body (12) is shown as being fixed by a blank storage case fixing tool.
In FIG. 2B, the cover (13) of the blank storage case is opened by the cover opening / closing mechanism, the tip of the blank (1) is exposed, and the cover (13) of the blank storage case is exposed. Indicates a state of being held above the main body (12) of the blank storage case. FIG. 2 (c) shows the pivot (14) on the X axis of the first mounting table (10) as the rotation axis by the main body rotation mechanism, and the first mounting table (10) is shown in FIG. 1 (a). The figure shows a state rotated 90 degrees in the direction of the Z-axis unit (45).

  As shown in FIGS. 2A, 2B, and 2C, a blank storage case (11) including a main body (12) and a lid (13) has a plurality of sheets coated with a photosensitive agent. The blank (1) is stored in the vertical position. Normally, since the blank is stored in the SMIF-Pod (31) with the surface coated with the photosensitive agent as the upper surface, the blank storage case (11) is placed on the first mounting table (10). Is placed so that the surface side coated with the photosensitive agent is in the front direction of the first mounting table (10), and fixes the main body (12).

After the cover (13) of the blank storage case is opened on the first mounting table (10) and moved above the main body (12) of the blank storage case, the main body ( The first mounting table (10) to which 12) is fixed is rotated 90 degrees in the direction of the Z-axis unit (45) with the pivot (14) as the rotation axis, as indicated by a curved arrow.
By this 90-degree rotation, the blank (1) becomes horizontal with the surface side coated with the photosensitive agent as the upper surface.
The first mounting table (10) of the first mounting portion (A) and the main body (12) of the blank storage case shown in FIG. 1 are in the state shown in FIG. 2 (c), that is, the blank (1). Is in a state of being leveled.

FIG. 3A shows that the SMIF-Pod (31) is mounted on the second mounting table (30) from the front of the second mounting portion (C), and the SMIF-Pod main body (32) is connected to the SMIF. -Shows the state fixed by the Pod fixing tool.
In FIG. 3 (b), the lid opening / closing mechanism opens the SMIF-Pod lid (33), and the SMIF-Pod lid (33) is held above the SMIF-Pod body (32). It shows the state.

  Moreover, FIG.3 (c) has shown the state by which the blank (1) was mounted on the nail | claw stand (35) of the main body (32) with the hand unit (41).

  The start of transfer of the blank (1) from the main body (12) of the blank storage case to the main body (32) of the SMIF-Pod by the hand unit (41) is the first mounting table storing the blank (1). (10) The blank storage case main body (12) is in the state shown in FIG. 2 (c), and the SMIF-Pod (31) on the second mounting table (30) is shown in FIG. 3 (b). It is done after the state.

That is, in this state, the hand unit (41) shown in FIG. 1 (a) moves on the Y axis toward the main body (12) of the blank storage case. A claw (44) inside the end portion of the robot hand (43) provided horizontally is formed at the tip of the blank (1) exposed from the main body (12) of the blank storage case by the operation of the air chuck (42). Grasp both end faces.
The hand unit (41) leaves the main body (12) of the blank storage case while holding both end faces of the front end of the blank (1), and the Y-axis direction and the X-axis direction as shown by broken lines. Moving.

  When it reaches the second mounting portion (C), it moves on the Y axis in the direction of the SMIF-Pod body (32), and the blank (1) is placed on the claw base (35) of the SMIF-Pod body (32). Is placed. In the second mounting portion (C), the lid portion (33) of the SMIF-Pod is lowered by the lid portion opening / closing mechanism, the main body (32) of the SMIF-Pod is closed, and the blank (1) is SMIF-Pod (31). Sealed inside.

  On the other hand, when the storage direction of the blank (1) into the SMIF-Pod (31) is changed by 180 degrees, the hand unit (41) that holds the blank (1) is temporarily moved to the stage (B) 20) Place the blank (1) on top. By rotating this stage (20) 180 degrees, the direction of the blank (1) is changed, the hand unit (41) again grips the blank (1), the hand unit (41) leaves the stage (20), The blank (1) whose direction is changed by 180 degrees is placed on the main body (32) of the SMIF-Pod on the second placing table (30), and the transfer is completed.

  The operation of the substrate transfer device is performed by a sequencer. By setting the presence / absence of 180 ° change of blank storage direction, setting the presence / absence of blank front / back reversal, and setting automatic / manual operation in advance, automatic operation of desired transfer work or by push button Perform manual operation.

  As described above, the substrate transfer apparatus according to the present invention can transfer the blank from the blank storage case to the SMIF-Pod without manual operation. Adhesion can be prevented.

Further, according to the present invention, the hand unit has a reversing mechanism between the Z-axis unit and the Z-axis unit that rotates 180 degrees with the Y-axis at the center of the air chuck as the rotation axis while holding the blank, and reverses the blank. It is the board | substrate transfer apparatus characterized.
FIG. 4 is a perspective view of an example of a hand unit including a reversing mechanism. As shown in FIG. 4, the reversing mechanism (46) is provided between the Z-axis unit (45) and the hand unit (41), and the Y-axis at the center of the air chuck (42) is used as the rotation axis. The unit (41) can be rotated 180 degrees.

  For example, as shown in FIG. 1A, the 180 degree rotation is performed while the hand unit (41) leaves the blank storage case body (12) and moves in the Y-axis direction as indicated by a broken line. Alternatively, it can be performed while the hand unit (41) moves on the broken line in the direction of the second mounting table (30).

As described above, blanks supplied with a photosensitizer supplied from a substrate manufacturer are supplied in a state where a plurality of blanks are stored in one blank storage case. In addition, in transferring to the SMIF-Pod, the surface is coated with the surface coated with the photosensitive agent as the upper surface.
However, for example, if one of a plurality of blanks stored in the blank storage case is erroneously stored in a state where the surface coated with the photosensitive agent is turned upside down, the transfer is performed manually. If it is, it is easy to transfer it with the front and back sides returned to normal.

  In the substrate transfer apparatus, as described above, even if the front and back sides of the blank are mistakenly stored in the blank storage case, the substrate transfer apparatus has a reversing mechanism, so that the normal front and back sides can be obtained without human intervention. It will be possible to return to the state of.

According to a third aspect of the present invention, the substrate transfer device is disposed in a sealed space, and air is introduced from the upper portion of the space through the fan filter unit (FFU) and the chemical filter, and the lower discharge port. The pressure in the space is a positive pressure with respect to the outside.
For example, if the SMIF-Pod and the mini-environment chamber are introduced to all devices, the cleanliness of the clean room is intentionally achieved, for example, within the class 1 SMIF-Pod and within the device. For example, it is possible to downgrade to about class 1000.

  That is, the invention according to claim 3 enables the transfer of the blank from the blank storage case to the SMIF-Pod even in an environment where the cleanliness is downgraded.

The photomask manufacturing process includes a plurality of processes, such as a process for applying a photosensitizer on a substrate, a process for exposing the photosensitizer, a development process, an etching process, and a process for peeling the photosensitizer. For this reason, it is normal to process a blank and a mask in the environment where the trace component of the chemical | medical agent used at a manufacturing process floats, and to store temporarily.
When storing blanks and masks in such an environment, there is a problem in that they are contaminated by various chemical components floating in the environment.

Components of the chemical, for example, basic substances such as ammonia and amines, or acidic substances such as NO _x , SO _x , and organic acids adhere to the substrate coated with, for example, a chemical amplification type photosensitizer. May cause problems such as changes in pattern dimensions and changes in the photosensitizer, resulting in defective masks.

FIG. 5 is a sectional view showing an example of a fan filter unit (FFU) (50) provided with a chemical filter according to the present invention. A partition wall (60) below the fan filter unit (FFU) (50) forms a sealed space. In FIG. 5, only the upper part of the partition wall (60) is shown. In this space, a substrate transfer device is arranged below the fan filter unit (FFU) (not shown).
The whole substrate transfer apparatus shown in FIG. 1A is arranged in this space, but FIG. 5 shows the arrangement from the side of FIG. 1A when the whole substrate transfer apparatus is arranged. It is sectional drawing.

  The fan filter unit (FFU) (50) is installed in a clean room having a cleanliness class of about 1000, for example. The fan filter unit main body (51) of the fan filter unit (FFU) (50) shown as an example has a structure that allows air from the left side of FIG. 52) is sucked in by the blower (53), and the air passing through the prefilter (54) is guided.

An air filter (55) and a chemical filter (56) are provided below the fan filter unit (FFU) (50). The clean air (58) that passes through the air filter (55) and the chemical filter (56) and is blown out from the blowout opening surface (57) captures suspended dust and various gases. It is a laminar flow.
The clean air (58) blown out from the blowout opening surface (57) of the fan filter unit (FFU) (50) is blown out uniformly toward the substrate transfer device located below.

  The air filter (55) is a filter with a structure in which a paper-like filter medium in which a small amount of binder is added to very fine glass fibers is folded into nectar to increase the area of the filter medium, and a separator is inserted between them. A HEPA filter (High Efficiency Particulate Air Filter) having an efficiency of 99.99997% or more with respect to dust of 0.1 μm is used.

  The chemical filter (56) has an action of removing gas in the air by a method such as physical adsorption, chemical adsorption, and ion exchange reaction, and is selected according to the type of gas to be removed. Physical adsorption is collection by granular and crushed activated carbon or fibrous activated carbon, chemical adsorption is removal by neutralization reaction, oxidation / reduction reaction, ion exchange reaction is reaction removal by ion exchange fiber, It is used by being enclosed in a fibrous material layer having a honeycomb structure.

  In the invention according to claim 4, information necessary for managing the manufacturing process is written to and read from an RFID tag attached to the SMIF-Pod. For example, in a substrate transfer apparatus, the blank thickness, Information such as the agent and film thickness is written, and in the subsequent manufacturing apparatus and inspection apparatus, each information is read and written. In other words, progress management, quality control, accident management, etc. in the manufacturing process are effectively performed.

(A) is a top view which shows the outline of one Example of the board | substrate transfer apparatus by this invention.

(B) is a front view.
(A), (b), (c) is a left view of the 1st mounting part shown in FIG. (A), (b), (c) is a front view of a 2nd mounting part. It is a perspective view of an example of the hand unit provided with the inversion mechanism. It is sectional drawing which shows an example of the fan filter unit (FFU) with which the chemical filter concerning this invention was attached.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Blank 10 ... 1st mounting base 11 ... Blank storage case 12 ... Main body 13 of blank storage case ... Cover 14 of blank storage case ... Pivot 20 ... Stage 21 ... Post 22 ... Mounting base 23, 35 ... Claw base 30 ... Second mounting base 31 ... SMIF-Pod
32 ... SMIF-Pod body 33 ... SMIF-Pod lid 34 ... Support base 41 ... Hand unit 42 ... Air chuck 43 ... Robot hand
44 ... Claw 45 ... Z-axis unit 50 ... Fan filter unit (FFU) with chemical filter
51 ... Fan filter unit main body 52 ... Clean room air 53 ... Blower 54 ... Pre-filter 55 ... Air filter 56 ... Chemical filter 57 ... Opening surface 58 ... Blowout Clean air 60 ... partition A ... first placement part B ... rotary stage part C ... second placement part D ... direct coordinate type robot part

Claims (4)

In a substrate transfer apparatus for transferring a blank stored in an open cassette to a SMIF-Pod,
1) a) a first mounting table for mounting a blank storage case in which a blank is stored;
b) a fixture for the blank storage case;
c) A lid opening / closing mechanism that consists of an air chuck, grip, claw, and support, and that holds and lifts the lid of the blank storage case.
d) a first mounting portion (A) comprising a main body rotation mechanism that rotates the first mounting table by 90 degrees in the direction of the Z-axis unit with the pivot on the X axis of the first mounting table as a rotation axis;
2) a) A claw base and a stage for placing a blank gripped by a robot hand,
b) A support column capable of rotating the stage 180 degrees with the Z axis at the center of the stage as the rotation axis,
c) A rotating stage part (B) composed of a mounting base for the column,
3) a) a second mounting table on which the SMIF-Pod is mounted;
b) the SMIF-Pod fixture;
c) A lid opening / closing mechanism that consists of an air chuck, grips, claws, and struts that grips and lifts the SMIF-Pod lid.
d) a second mounting portion (C) comprising a support base;
4) A pair of robot hands parallel to the Y-axis and parallel to the Y-axis are provided on the first mounting table side of the X-axis unit, Y-axis unit, Z-axis unit, and Z-axis unit. A direct coordinate robot part (D) as a blank conveying means composed of a hand unit,
The first placement part (A), the rotary stage part (B), and the second placement part (C) are arranged in this order in the X-axis direction, and the direct coordinate robot part (D) The X-axis unit is arranged in the X-axis direction in parallel with the arrangement of the first placement part (A), the rotary stage part (B), and the second placement part (C), and is blanked from the blank storage case. The substrate transfer apparatus is characterized in that when transferring the substrate to the SMIF-Pod, the blank storage direction can be changed by 180 degrees.   The hand unit includes a reversing mechanism between the Z-axis unit and the Z-axis unit that rotates 180 degrees with the Y axis at the center of the air chuck as a rotation axis while holding the blank, and reverses the blank. 1. The substrate transfer apparatus according to 1.   The substrate transfer device is disposed in a sealed space, and air flows in from the upper portion of the space through a fan filter unit (FFU) and a chemical filter, and is discharged from a lower discharge port. The substrate transfer apparatus according to claim 1, wherein is a positive pressure with respect to the outside.   The second mounting unit (C) includes a writing / reading device for an RFID tag (Radio Frequency-Identification: wireless tag), and the RFID tag is attached to the SMIF-Pod. The substrate transfer apparatus according to claim 1, claim 2, or claim 3.

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