JP4267496B2 - Hot cathode, method for manufacturing the same, and discharge lamp - Google Patents

Description

  The present invention relates to a hot cathode, a manufacturing method thereof, and a discharge lamp, and more particularly to a hot cathode using n-type diamond in an electron emission portion, a manufacturing method thereof, and a discharge lamp.

  Conventionally, a hot cathode using thermoelectrons emitted when a substance is heated to high temperature operates as an electron source of a vacuum tube that operates in a vacuum such as an X-ray tube or a high-frequency electron tube, or in a gas such as a fluorescent lamp. Widely used as an electron source for discharge tubes. The current density of thermionic electrons in the hot cathode is determined by the work function and operating temperature of the cathode surface. When the temperature is constant, a larger current density can be obtained when the work function of the hot cathode material is reduced. Further, when the current density is constant, the operation can be performed at a lower temperature when the work function of the hot cathode material is reduced.

  When such a hot cathode is operated in a vacuum, the life of the hot cathode is determined by the degree of evaporation of the cathode material. For this reason, if the operating temperature is lowered, evaporation of the cathode material can be suppressed and the life of the hot cathode can be extended. Furthermore, the power required for heating the hot cathode can be reduced by lowering the operating temperature. An oxide cathode such as BaO is well known as a hot cathode that operates at a low temperature, but a hot cathode material that operates at a lower temperature is required.

  Diamond is an excellent hot cathode material candidate that can satisfy these requirements. Diamond is also an excellent cold cathode material candidate, and a technique for extending the life of a cold cathode using diamond as a cold cathode material has also been proposed (for example, see Patent Document 1). On the other hand, research on the technology using diamond is also underway in the hot cathode, and the polycrystalline N-doped diamond film produced by the plasma CVD method emits thermoelectrons at 725 ° C. when the surface is terminated with hydrogen. Although current can be obtained, it decreases with time because hydrogen is detached from the surface due to high temperature, and when the surface is covered with 0.3 nm of thin Ti instead of hydrogen, a stable thermoelectron emission current is obtained, which is 950 ° C. However, it has been found that thermionic emission is observed (see, for example, Non-Patent Document 1).

  Hereinafter, the thermoelectron emission characteristics of the diamond film will be described with reference to a band diagram of N-doped diamond shown in FIG. In FIG. 16, Ec and Ev indicate the energy at the lower end of the conduction band and the upper end of the valence band, respectively, and the band gap of diamond is Eg = 5.5 eV. N-doped diamond is an n-type semiconductor, and its donor level Ed is 1.4 eV below Ec. The difference between the vacuum levels Evac and Ec is the so-called electron affinity χ = Evac−Ec. In diamond, χ is positive when the surface is clean (PEA: Positive Electron Affinity), and the surface is terminated with hydrogen. Then, it is known that χ becomes negative (NEA: Negative Electron Affinity).

  In FIG. 16, χ1 corresponds to the state of PEA, and χ2 corresponds to the state of NEA. Ef shown in FIG. 16 is a Fermi level and is between Ec and Ed. The work function φ which is a problem in thermionic emission is the difference between the vacuum level Evac and the Fermi level Ef. In the figure, φ1 corresponds to the PEA state, and φ2 corresponds to the NEA state. However, since electrons are emitted from the conduction band in the NEA state, actually, the difference φ2 ′ between the energy Ec at the bottom of the conduction band and the Fermi level Ef becomes an effective work function instead of φ2 in the figure. . From FIG. 16, it can be seen that the work function is small in the NEA state at the hydrogen termination, and the PEA state is reached and the work function is increased when the temperature rises and the hydrogen termination is lost. From the above, it can be explained that the thermionic emission current is reduced in the hydrogen-terminated diamond film. Further, the thin Ti film has the same effect as the hydrogen termination, and is considered to be stable even at high temperatures.

JP 2002-298777 A F. A. M.M. Cook et al. Diamond and Related Materials vol. 11, p774, 2002

  However, the above-described semiconductor hot cathode using n-type diamond has the following serious problems. The n-type diamond emits thermoelectrons at a low temperature when the surface is hydrogen-terminated or when the surface is thinly coated with Ti. However, as described above, there is a problem that the hydrogen termination on the surface of the n-type diamond is lost at a high temperature. Although the coating with thin Ti is more stable than hydrogen termination, there is a similar problem because Ti evaporates in a long time at a temperature at which thermionic emission occurs.

  The above is a problem when a hot cathode using n-type diamond is used in a vacuum such as a vacuum tube. However, when a hot cathode using n-type diamond is used for a discharge tube, the problem is more serious and is accompanied by discharge. The hydrogen termination and the thin Ti film are easily lost by ion sputtering or the like. Therefore, there has been a problem that it is difficult to realize a semiconductor hot cathode using n-type diamond that emits thermoelectrons stably for a long time.

  The present invention has been made in view of the above, and is a long-life and low-power consumption hot cathode capable of stably emitting thermoelectrons from n-type diamond even in low-temperature operation, and a method for producing the same, And to obtain a discharge lamp.

In order to solve the above-described problems and achieve the object, a hot cathode according to the present invention includes an n-type diamond layer formed of an electron emitting material that emits thermoelectrons upon heating on the surface of a substrate. The n-type diamond layer is formed of the electron emission material and has a surface layer portion containing a transition metal element.

The method for producing a hot cathode according to the present invention comprises a step of forming an n-type diamond layer formed of an electron emitting material that emits thermoelectrons upon heating on the surface of a substrate, and the n-type diamond layer. And a step of incorporating a transition metal element from the surface layer side of the n-type diamond layer into the surface layer portion formed of the electron emission material .

The discharge lamp according to the present invention is provided on an envelope having a light transmission portion and sealed with a discharge gas, a pair of electrodes disposed in the envelope, and an inner surface of the envelope. The electrode comprises an n-type diamond layer formed of an electron-emitting material that emits thermoelectrons upon heating on the surface of the substrate, the n-type diamond layer comprising: It is characterized by having a surface layer portion formed of an electron emitting material and containing a transition metal element.

  According to the present invention, the n-type diamond layer on the electrode surface contains a transition metal element in the surface layer portion. Therefore, when the n-type diamond layer is heated, the n-type diamond layer is stable from the n-type diamond layer even at a low temperature. Thermal electrons are emitted. Further, for example, when a transition metal element is arranged on the surface of the n-type diamond layer, the transition metal element evaporates due to heating or aging of the n-type diamond layer. I can't stay. However, in the present invention, since the transition metal element is contained in the surface layer portion of the n-type diamond layer, evaporation of the transition metal element is suppressed, and the transition metal element remains in the surface layer portion of the n-type diamond layer. .

  Even if the transition metal element is somewhat evaporated on the surface of the n-type diamond layer, the transition metal element is contained in the depth direction of the n-type diamond layer. It will stay in the surface layer part. Therefore, in the present invention, since the n-type diamond layer contains the transition metal element in the depth direction of the surface layer portion, the transition metal element is prevented from evaporating and disappearing due to heating or aging. The metal element is retained on the surface layer of the n-type diamond layer for a long period of time.

  As the n-type diamond layer, a general n-type diamond layer doped with nitrogen, phosphorus or sulfur can be used. Moreover, Ti is suitable as the transition metal element. When the transition metal element is contained in the surface portion of the n-type diamond layer from the surface side of the n-type diamond layer, the depth and concentration of the transition metal element can be easily controlled by using ion implantation. can do.

  According to the present invention, by including a transition metal element in the surface layer portion of the n-type diamond layer on the electrode surface, it is possible to stably emit thermoelectrons from the n-type diamond layer even at low temperature heating. In addition, a hot cathode with low power consumption, a manufacturing method thereof, and a discharge lamp can be obtained.

  Below, the hot cathode concerning this invention and its manufacturing method are demonstrated in detail, referring drawings. In addition, this invention is not limited to the following description, In the range which does not deviate from the summary of this invention, it can change suitably. Moreover, in the figure shown below, the scale may differ depending on each member for convenience of explanation.

(First embodiment)
First, a first embodiment of a hot cathode and a manufacturing method thereof according to the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic view showing a configuration example of a hot cathode discharge lamp including a hot cathode to which the present invention is applied. A hot cathode discharge lamp 1 shown in FIG. 1 is a hot cathode fluorescent lamp including a hot cathode to which the present invention is applied.

  As shown in FIG. 1, a hot cathode discharge lamp 1 according to the present embodiment is attached to both ends of a glass tube 10 that is an envelope having a light transmission portion with an inner surface coated with a phosphor 12, and the glass tube 10. A pair of electrodes (hot cathodes) 11a and 11b, lead wires 11c and 11d, and a pair of stems 14a and 14b are provided. The lead-in wires 11c and 11d are for holding the electrodes 11a and 11b and conducting electricity, and are held by a pair of stems 14a and 14b, respectively. The electrodes (hot cathodes) 11a and 11b are configured by forming an electron-emitting material layer called an emitter on a substrate. In the glass tube 10, argon or a mixed rare gas and a small amount of mercury are sealed as a sealing gas 13 at a pressure of about 2 to 4 hPa to facilitate discharge.

  At the time of discharging, when current is passed through the electrodes (hot cathodes) 11a and 11b and preheating is performed, electrons are emitted from the emitter. The emitted electrons move to the counter electrode (anode) and discharge starts. Here, in general, an AC voltage is applied to the electrodes 11a and 11b to cause discharge, and when one of the electrodes 11a and 11b acts as an emitter, the other serves as a counter electrode (anode). Works. Due to this discharge, electrons collide with mercury atoms sealed in the glass tube 10. Mercury atoms receive energy by collision and emit ultraviolet rays. The phosphor 12 is excited by the ultraviolet rays to generate visible light. The emission color varies depending on the type of phosphor, and various types of light such as white, daylight, and blue are emitted from the lamp.

  FIG. 2 is an enlarged cross-sectional view showing the configuration of the electrodes (hot cathodes) 11a and 11b, and shows the characteristic configuration of the hot cathode according to the present invention. As shown in FIG. 2, in the electrodes (hot cathodes) 11a and 11b, an n-type diamond layer 24 is formed on the surface of a silicon (Si) substrate 21 as a base. The n-type diamond layer 24 has a Ti-containing layer 23 containing titanium (Ti) as a transition metal element in its surface layer portion, and an n-type diamond layer 22 containing no titanium in the lower layer. It is said that. Here, as the n-type diamond, a general n-type diamond layer doped with nitrogen, phosphorus or sulfur can be used.

  N-type diamond has the characteristics that stable thermoelectron emission is possible at a low temperature and that the surface temperature is uniform because of its high thermal conductivity, and as a result, uniform thermoelectron emission can be obtained. Thereby, in these electrodes (hot cathodes) 11a and 11b, stable thermoelectron emission can be obtained with low power consumption. In the electrodes (hot cathodes) 11a and 11b, the electron emission area is increased by using a hot cathode as a planar structure instead of a normal filament structure. Thereby, a hot cathode discharge lamp with a large current can be realized.

  The thickness of the Ti-containing layer 23 described above is 5 nm or more, and Ti is contained from the surface layer of the n-type diamond layer 24 to a depth of 5 nm or more. As a result, when these electrodes (hot cathodes) 11a and 11b are used in a vacuum, even if Ti exposed on the surface of the n-type diamond layer 24 evaporates due to a high temperature or a change with time, the n-type diamond layer 24 Ti exists in the very vicinity of the outermost surface in the depth direction.

  Since Ti is trapped in the n-type diamond layer 24, more specifically, in the Ti-containing layer 23, it is difficult to evaporate. Further, even if Ti is evaporated to some extent, Ti moves from the other region to the n-type diamond layer 24, more specifically, to the surface of the Ti-containing layer 23 due to thermal diffusion in the Ti-containing layer 23. Ti is always present in the very vicinity in the depth direction of the outermost surface of the diamond layer 24. In addition, when the thickness of the Ti-containing layer 23 is less than 5 nm, the depth of the n-type diamond layer 24 from the surface layer is small, and Ti may be easily evaporated. Therefore, in order to keep Ti in the very vicinity in the depth direction of the outermost surface of the n-type diamond layer 24 for a longer period, the thickness of the Ti-containing layer 23 is preferably set to 5 nm or more.

  For these reasons, the electrodes (hot cathodes) 11a and 11b can stably emit thermionic electrons over a long period of time. That is, the electrodes (hot cathodes) 11a and 11b effectively extend the life.

  Further, even when the electrodes (hot cathodes) 11a and 11b are used for discharge in a gas, even if the n-type diamond layer 24 (Ti-containing layer 23) is consumed by ion sputtering or the like, the Ti-containing layer 23 remains. As long as this is achieved, stable thermionic emission can be obtained at low temperature operation, and the effect of extending the life and reducing the power consumption can be obtained. The n-type diamond layer 24 can be heated by energizing the Si substrate 21 or the n-type diamond layer 24.

  Therefore, in the hot cathodes 11a and 11b using the n-type diamond according to the present embodiment, stable thermionic emission can be obtained even when the n-type diamond layer 24 is operated at a low temperature to operate at a low temperature, and the lifetime is further increased. A hot cathode with low power consumption has been realized.

  Next, a method for manufacturing the above-described electrodes (hot cathodes) 11a and 11b will be described. First, as shown in FIG. 3, a Si substrate 21 is prepared as a base of a hot cathode. Then, after cleaning the Si substrate 21, an n-type polycrystalline diamond layer 24 having a thickness of about 5 μm is formed as an n-type diamond layer on the Si substrate 21 by microwave plasma CVD as shown in FIG. Here, the thickness of the diamond layer is not limited to the above value, and can be changed as appropriate. Further, the method for forming the n-type polycrystalline diamond layer 24 is not limited to this, and other methods can be used.

The growth conditions of the n-type polycrystalline diamond layer 24 may be, for example, a microwave power of 1.5 kW, a hydrogen flow rate of 200 sccm, a methane gas flow rate of 4 sccm, and a methane concentration of the source gas of 2%. The pressure of the source gas is 80 Torr, and the substrate is heated to 850 ° C. P is used as the n-type dopant, and PH ₃ gas is supplied simultaneously during the growth of the diamond film. By performing the microwave plasma CVD method under such conditions, the n-type polycrystalline diamond layer 24 having a thickness of about 5 μm can be formed.

Next, as shown in FIG. 5, titanium (Ti) ions are implanted as a transition metal element into the n-type diamond layer 24 from the surface side of the n-type diamond layer 24 at room temperature, as shown in FIG. A Ti-containing layer 26 containing Ti ions is formed on 24 surface layers. The Ti-containing layer 26 is composed of a Ti-containing layer 25 having a low Ti concentration located in the outermost layer portion of the n-type diamond layer 24 and a layer Ti-containing layer 23 having a high Ti concentration located thereunder. The depth and concentration of the Ti-containing layer 26 can be controlled by the accelerating voltage and dose amount of ions. For example, the accelerating voltage can be 25 keV and the dose amount can be ¹ × 10 ¹⁵ / cm ² . The method of incorporating Ti element into the surface layer portion of the n-type diamond layer 24 is not limited to the above-described ion implantation as the method of incorporating Ti element into the surface layer portion of the n-type diamond layer 24, and thermal diffusion. It is also possible to use other methods. However, the ion implantation method is preferable because the depth and concentration of the Ti-containing layer 23 can be easily controlled and can be controlled with high accuracy.

  Next, for example, the surface layer of the n-type diamond layer 24 is etched by RIE (Reactive Ion Etching) using oxygen to remove the Ti-containing layer 25 having a low Ti ion concentration, and as shown in FIG. A high Ti-containing layer 23 is exposed on the surface of the diamond layer. This is because the concentration is distributed in the depth direction in ion implantation, and the Ti ion concentration is low in the vicinity of the outermost surface of the n-type diamond layer 24 into which Ti ions are implanted. This is performed to expose a layer having a high ion concentration on the surface of the diamond layer. Thus, the hot cathodes 11a and 11b according to the present embodiment described above can be manufactured.

(Second Embodiment)
Next, a second embodiment of the hot cathode and the manufacturing method thereof according to the present invention will be described in detail with reference to the drawings. FIG. 8 is a schematic view showing a configuration example of a hot cathode discharge lamp including a hot cathode to which the present invention is applied. A hot cathode discharge lamp 31 shown in FIG. 8 is a hot cathode fluorescent lamp including a hot cathode to which the present invention is applied. In FIG. 8, the same members as those in FIG. 1 are denoted by the same reference numerals as those in FIG. 1, and detailed description thereof is omitted.

  As shown in FIG. 8, the hot cathode discharge lamp 31 according to the present embodiment includes a glass tube 10 that is an envelope having an inner surface coated with a phosphor 12 and a pair of electrodes attached to both ends of the glass tube 10. (Hot cathode) 41a, 41b, lead wires 11c and 11d, and a pair of stems 14a, 14b. The lead-in wires 11c and 11d are for holding the electrodes 41a and 41b and conducting electricity, and are held by the pair of stems 14a and 14b, respectively. The electrodes (hot cathodes) 41a and 41b are configured by forming an electron-emitting material layer called an emitter on a substrate. In the glass tube 10, argon or a mixed rare gas and a small amount of mercury are sealed as a sealing gas 13 at a pressure of about 2 to 4 hPa to facilitate discharge.

  FIG. 9 is an enlarged cross-sectional view showing the configuration of the electrodes (hot cathodes) 41a and 41b. FIG. 10 is a cross-sectional view taken along line AA ′ in FIG. 9 and shows a characteristic configuration of the hot cathode according to the present embodiment. As shown in FIG. 9, in the electrodes (hot cathodes) 41 a and 41 b, a linear tungsten (W) layer 52 is formed on the surface of the quartz substrate 51. A non-doped polycrystalline diamond layer 53 is formed on the quartz substrate 51 and the linear tungsten layer 52, and an n-type polycrystalline diamond layer 56 doped with phosphorus (P) is further formed thereon. The n-type polycrystalline diamond layer 56 has a Ti-containing layer 55 containing titanium (Ti), which is a transition metal element, in its surface layer portion, and an n-type polycrystalline diamond layer 54 containing no titanium in the lower layer. It is set as the structure which has. Here, as the n-type diamond, a general n-type diamond layer doped with nitrogen, phosphorus or sulfur can be used.

  The electrodes (hot cathodes) 41a and 41b according to the present embodiment are so-called indirectly heated hot cathodes in which a portion to be heated and a thermoelectron emitting portion are separated, and energize the linear tungsten layer 52. Is used for heating. The non-doped polycrystalline diamond layer 53 is used to electrically separate the linear tungsten wire 52 and the polycrystalline diamond layer 56 doped with phosphorus (P).

  As described above, n-type diamond has the characteristics that stable thermoelectron emission is possible at a low temperature and that the surface temperature is uniform because of its high thermal conductivity, resulting in uniform thermoelectron emission. . Thereby, in these electrodes (hot cathodes) 41a and 41b, stable thermoelectron emission can be obtained with low power consumption. In the electrodes (hot cathodes) 11a and 11b, the electron emission area is increased by using a hot cathode as a planar structure instead of a normal filament structure. Thereby, a hot cathode discharge lamp with a large current can be realized.

  Further, the thickness of the Ti-containing layer 55 described above is 5 nm or more, and Ti is contained from the surface layer of the n-type polycrystalline diamond layer 56 to a depth of 5 nm or more. As a result, when the electrodes (hot cathodes) 41a and 41b are used in a vacuum as in the case of the electrodes (hot cathodes) 11a and 11b of the first embodiment, the n-type Even if Ti exposed on the surface of the crystalline diamond layer 56 evaporates, Ti exists in the very vicinity in the depth direction of the outermost surface of the n-type polycrystalline diamond layer 56.

  Since Ti is trapped in the n-type polycrystalline diamond layer 56, more specifically, in the Ti-containing layer 55, it is difficult to evaporate. In addition, even if Ti slightly evaporates, Ti moves from the other region to the surface of the n-type polycrystalline diamond layer 56, more specifically, to the surface of the Ti-containing layer 55 by thermal diffusion in the Ti-containing layer 55. Ti is always present in the very vicinity in the depth direction of the outermost surface of the n-type polycrystalline diamond layer 56. Further, when the thickness of the Ti-containing layer 55 is less than 5 nm, the depth from the surface layer of the n-type polycrystalline diamond layer 56 is small, and Ti may be easily evaporated. Therefore, in order to keep Ti in the very vicinity in the depth direction of the outermost surface of the n-type polycrystalline diamond layer 56 for a longer period of time, the thickness of the Ti-containing layer 55 is preferably 5 nm or more.

  For these reasons, the electrodes (hot cathodes) 41a and 41b can stably emit thermoelectrons over a long period of time. That is, in the electrodes (hot cathodes) 41a and 41b, as in the case of the electrodes (hot cathodes) 11a and 11b of the first embodiment, the lifetime is effectively extended.

  Further, even when the electrodes (hot cathodes) 41a and 41b are used for discharge in gas, even if the n-type polycrystalline diamond layer 56 (Ti-containing layer 55) is consumed by ion sputtering or the like, the Ti-containing layer 55 is used. As long as the residual amount remains, stable thermionic emission can be obtained at low temperature operation, and the effect of extending the life and reducing the power consumption can be obtained.

  Therefore, also in the hot cathodes 41a and 41b using the n-type polycrystalline diamond according to the present embodiment, the n-type diamond layer 24 is formed at a low temperature as in the electrodes (hot cathodes) 11a and 11b of the first embodiment. Even when heated and operated at a low temperature, a stable thermal electron emission can be obtained, and a hot cathode with a longer life and lower power consumption has been realized.

  Next, a method for manufacturing the above-described electrodes (hot cathodes) 41a and 41b will be described. First, as shown in FIG. 11, a quartz substrate 51 is prepared as a base of a hot cathode. Then, after the quartz substrate 51 is washed, a tungsten layer is formed on the quartz substrate 51 by sputtering, and the tungsten layer is processed by photolithography. As shown in FIG. 12, for example, linear tungsten having a width of 30 μm is formed. Layer 52 is formed.

  Next, the non-doped polycrystalline diamond layer 53 and the n-type polycrystalline diamond layer doped with phosphorus (P) as shown in FIG. 13 are formed by the microwave plasma CVD method in the same manner as in the first embodiment described above. 56 are formed sequentially. The thicknesses of the non-doped polycrystalline diamond layer 53 and the n-type polycrystalline diamond layer 56 doped with phosphorus (P) are, for example, about 5 μm, respectively. The thicknesses of the non-doped polycrystalline diamond layer 53 and the n-type polycrystalline diamond layer 56 doped with phosphorus (P) are not limited to the above values and can be changed as appropriate. The method for forming the non-doped polycrystalline diamond layer 53 and the n-type polycrystalline diamond layer 56 doped with phosphorus (P) is not limited to this, and other methods can be used.

  Next, as shown in FIG. 14, Ti is ion-implanted into the surface of the polycrystalline diamond layer 56 doped with phosphorus (P) in the same manner as in the first embodiment, and then the polycrystalline doped with phosphorus (P). The surface of the diamond layer 56 is etched by RIE using oxygen to expose a Ti-containing layer 55 having a high Ti ion concentration on the surface as shown in FIG. Thus, the hot cathodes 41a and 41b according to the present embodiment described above can be manufactured.

  In addition, the above description is only an example of this invention, for example, the hot cathode of this invention can also be used for a vacuum tube instead of a discharge lamp. Further, the material of the substrate on which diamond is formed is not limited to the above-described silicon (Si) or tungsten (W), and the shape is not limited to a plate shape. Other modifications can be made without departing from the spirit of the present invention.

  As described above, the hot cathode according to the present invention is useful as a hot cathode operating at a low temperature, and is particularly suitable for applications requiring a long life and low power consumption.

It is the schematic which shows one structural example of the hot cathode discharge lamp provided with the hot cathode concerning 1st Embodiment. It is sectional drawing which expands and shows the structure of the electrode (hot cathode) concerning 1st Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 1st Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 1st Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 1st Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 1st Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 1st Embodiment. It is the schematic which shows one structural example of the hot cathode discharge lamp provided with the hot cathode concerning 2nd Embodiment. It is a top view which expands and shows the structure of the electrode (hot cathode) concerning 2nd Embodiment. It is sectional drawing which expands and shows the structure of the electrode (hot cathode) concerning 2nd Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 2nd Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 2nd Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 2nd Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 2nd Embodiment. It is sectional drawing explaining the manufacturing method of the hot cathode concerning 2nd Embodiment. It is a characteristic view explaining the characteristic of the semiconductor hot cathode using an n-type diamond film.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Hot cathode discharge lamp 10 Glass tube 11a, 11b Electrode (hot cathode)
11c, 11d lead-in line 12 phosphor 13 sealing gas 14a, 14b stem 21 silicon substrate 22 n-type polycrystalline diamond layer not containing titanium 23 Ti-containing layer 24 n-type diamond layer 31 hot cathode discharge lamp 41a, 41b electrode (heat cathode)
51 quartz substrate 52 tungsten (W) layer 53 non-doped polycrystalline diamond layer 54 n-type polycrystalline diamond layer not containing titanium 55 Ti-containing layer 56 n-type polycrystalline diamond layer doped with phosphorus (P)

Claims (6)

An n-type diamond layer formed of an electron-emitting material that emits thermoelectrons upon heating is provided on the surface of the substrate. The n-type diamond layer is formed of the electron-emitting material and contains a transition metal element. A hot cathode comprising a surface layer portion to be contained. The hot cathode according to claim 1, wherein the surface layer portion has a thickness of 5 nm or more from the surface of the n-type diamond layer.   The hot cathode according to claim 1, wherein the transition metal element is titanium (Ti). Forming an n-type diamond layer formed of an electron emitting material that emits thermoelectrons upon heating on the surface of the substrate;
Adding a transition metal element to the surface layer portion of the n-type diamond layer formed of the electron-emitting substance from the surface layer side of the n-type diamond layer;
A method for producing a hot cathode, comprising: The method for producing a hot cathode according to claim 4, wherein the transition metal element is contained in a surface layer portion of the n-type diamond layer by ion implantation. An envelope having a light transmission part and sealed with a discharge gas;
A pair of electrodes disposed within the envelope;
A phosphor provided on the inner surface of the envelope;
With
The electrode includes an n-type diamond layer formed of an electron-emitting material that emits thermoelectrons upon heating on the surface of the substrate, and the n-type diamond layer is formed of the electron-emitting material, and Having a surface layer portion containing a transition metal element,
A discharge lamp characterized by

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