JP4257515B2 - Process for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane - Google Patents
Process for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane Download PDFInfo
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- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 title claims description 13
- 238000000034 method Methods 0.000 title description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 23
- AFOVZRKWLMSDSL-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]-n,n-bis(trimethylsilyl)propan-1-amine Chemical compound C[Si](C)(C)N([Si](C)(C)C)CCC[Si](C)(C)Cl AFOVZRKWLMSDSL-UHFFFAOYSA-N 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 14
- 229910052697 platinum Inorganic materials 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- JUNQXKUSRPUEPS-UHFFFAOYSA-N 3-[[[3-[bis(trimethylsilyl)amino]propyl-dimethylsilyl]amino]-dimethylsilyl]-N,N-bis(trimethylsilyl)propan-1-amine Chemical compound C[Si](N([Si](C)(C)C)CCC[Si](N[Si](C)(C)CCCN([Si](C)(C)C)[Si](C)(C)C)(C)C)(C)C JUNQXKUSRPUEPS-UHFFFAOYSA-N 0.000 claims description 11
- 239000003054 catalyst Substances 0.000 claims description 9
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 claims description 9
- CVNCFZIIZGNVFD-UHFFFAOYSA-N n,n-bis(trimethylsilyl)prop-2-en-1-amine Chemical compound C[Si](C)(C)N([Si](C)(C)C)CC=C CVNCFZIIZGNVFD-UHFFFAOYSA-N 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- -1 silane compound Chemical class 0.000 claims description 7
- 230000003301 hydrolyzing effect Effects 0.000 claims description 6
- 229910000077 silane Inorganic materials 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000006459 hydrosilylation reaction Methods 0.000 description 9
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 238000009833 condensation Methods 0.000 description 7
- 230000005494 condensation Effects 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- XJNQZDJJCREQDT-UHFFFAOYSA-N 1-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-2-amine Chemical compound CC(N)C[Si](C)(C)O[Si](C)(C)CCCN XJNQZDJJCREQDT-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 150000007514 bases Chemical class 0.000 description 4
- 238000004508 fractional distillation Methods 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000010511 deprotection reaction Methods 0.000 description 2
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- FNIUGHSZXXYXER-UHFFFAOYSA-N [Pt].ClC1=C(Cl)C=CCCCC1 Chemical compound [Pt].ClC1=C(Cl)C=CCCCC1 FNIUGHSZXXYXER-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 238000005828 desilylation reaction Methods 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明は、半導体絶縁膜、液晶配向膜等に使用されるポリイミドの変性剤や、ポリウレタン、ポリアミドの変性剤として有用な、1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法に関する。 The present invention relates to 1,3-bis (3-aminopropyl) -1,1,3, which is useful as a modifier for polyimide used in semiconductor insulating films, liquid crystal alignment films, and the like, and as a modifier for polyurethane and polyamide. The present invention relates to a method for producing 3-tetramethyldisiloxane.
1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法としては以下のような方法が知られている。(1)アミノ基を保護したアリルアミンとテトラメチルジシロキサンをヒドロシリル化反応させた後、脱保護を行なう方法(非特許文献1:J. Org. Chem.,24, 119, (1959)、特許文献1:特公平7−55953号公報)。(2)アリルアミンとジメチルアルコキシシランとをオレフィン、その誘導体またはシロキサン誘導体を配位子とする白金触媒存在下ヒドロシリル化反応させ、得られた生成物を加水分解縮合する方法(特許文献2:特開平2−304094号公報)。(3)アミノ基を保護したアリルアミンとジメチルアルコキシシランとをヒドロシリル化反応させた後、脱保護をおこない、得られた生成物を加水分解縮合する方法(特許文献3:特開平11−209385号公報)。 The following methods are known as methods for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane. (1) A method of deprotecting an amino group-protected allylamine and tetramethyldisiloxane, followed by deprotection (Non-Patent Document 1: J. Org. Chem., 24, 119, (1959), Patent Document 1: Japanese Patent Publication No. 7-55953). (2) A method in which allylamine and dimethylalkoxysilane are subjected to a hydrosilylation reaction in the presence of a platinum catalyst having an olefin, a derivative thereof or a siloxane derivative as a ligand, and the resulting product is hydrolytically condensed (Patent Document 2: Japanese Patent Laid-Open 2-304094). (3) A method in which an allylamine having an amino group protected and dimethylalkoxysilane are subjected to a hydrosilylation reaction, followed by deprotection and hydrolysis condensation of the resulting product (Patent Document 3: JP-A-11-209385) ).
しかしながら、(1)の方法ではヒドロシリル化反応の際に末端ではなく内部に付加した異性体、すなわち1−(2−アミノプロピル)−3−(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンが多く生成し、純度が低下してしまうという問題点がある。(2)の方法においてもヒドロシリル化反応の際に末端ではなく内部に付加した異性体が多く生成し、(1)と同様に純度の低下を招く。また、ジメチルアルコキシシランは不安定であり、工業的に扱いづらいという問題点もある。(3)の方法においても(2)と同様に、不安定なジメチルアルコキシシランを用いなければならず、工業的に製造するには問題となる。 However, in the method (1), an isomer added inside rather than at the end in the hydrosilylation reaction, that is, 1- (2-aminopropyl) -3- (3-aminopropyl) -1,1,3,3 -There is a problem that a large amount of tetramethyldisiloxane is produced and the purity is lowered. Also in the method (2), many isomers are added in the hydrosilylation reaction instead of at the end, and the purity is lowered as in (1). In addition, dimethylalkoxysilane is unstable and difficult to handle industrially. In the method (3), as in (2), unstable dimethylalkoxysilane must be used, which is problematic for industrial production.
本発明は上記事情に鑑みなされたもので、異性体を含まない高品質な1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの工業的に有効な製造方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and is industrially effective as a high-quality 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane containing no isomer. An object is to provide a manufacturing method.
本発明者は、上記目的を達成するため鋭意検討を重ねた結果、N,N−ビストリメチルシリルアリルアミンとジメチルクロロシランとを白金触媒存在下ヒドロシリル化反応させて得られる、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアルコールと反応させて3−アミノプロピルジメチルアルコキシシラン化合物とし、その後、水を加えて加水分解縮合すること、あるいはN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランを、アルコールと反応させる前に、アンモニアと反応させて1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンとし、これをアルコールと反応させ、得られた3−アミノプロピルジメチルアルコキシシラン化合物を水で加水分解縮合することにより、異性体を含まない高純度の1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンが高収率で製造できることを知見し、本発明を完成するに至ったものである。 As a result of intensive studies to achieve the above object, the present inventor has obtained N, N-bistrimethylsilylaminopropyl obtained by hydrosilylation reaction of N, N-bistrimethylsilylallylamine and dimethylchlorosilane in the presence of a platinum catalyst. Before reacting dimethylchlorosilane with an alcohol to give a 3-aminopropyldimethylalkoxysilane compound, followed by hydrolysis and condensation with water, or reacting N, N-bistrimethylsilylaminopropyldimethylchlorosilane with an alcohol, Reaction with ammonia yields 1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane, which is reacted with alcohol to give 3-aminopropyldimethyl Alkoxysilane compound in water It was discovered that high-purity 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane containing no isomer can be produced in high yield by hydrolytic condensation, The present invention has been completed.
従って、本発明は、N,N−ビストリメチルシリルアリルアミンとジメチルクロロシランとを白金触媒存在下反応させて得られる下記式(1)
[(CH3)3Si]2NCH2CH2CH2Si(CH3)2Cl (1)
で示されるN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアルコールと反応させ、得られた3−アミノプロピルジメチルアルコキシシラン化合物を水で加水分解縮合することを特徴とする、1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法、及び上記N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアルコールと反応させる前に、アンモニアと反応させ、下記式(2)
[{(CH3)3Si}2NCH2CH2CH2Si(CH3)2]2NH (2)
で示される1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンを得、これをアルコールと反応させ、得られた3−アミノプロピルジメチルアルコキシシラン化合物を水で加水分解縮合することを特徴とする、1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法を提供する。
Accordingly, the present invention provides the following formula (1) obtained by reacting N, N-bistrimethylsilylallylamine and dimethylchlorosilane in the presence of a platinum catalyst.
[(CH 3 ) 3 Si] 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 Cl (1)
1,3-bis (3, characterized by reacting N, N-bistrimethylsilylaminopropyldimethylchlorosilane represented by the following formula with alcohol and hydrolyzing and condensing the resulting 3-aminopropyldimethylalkoxysilane compound with water. -Aminopropyl) -1,1,3,3-tetramethyldisiloxane production method, and before the N, N-bistrimethylsilylaminopropyldimethylchlorosilane is reacted with alcohol, it is reacted with ammonia to produce the following formula (2 )
[{(CH 3 ) 3 Si} 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 ] 2 NH (2)
1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane represented by the formula (3) was reacted with alcohol, and the resulting 3-aminopropyldimethylalkoxy was obtained. Provided is a method for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane, characterized by hydrolytic condensation of a silane compound with water.
本発明によれば、N,N−ビストリメチルシリルアリルアミンとジメチルクロロシランとを白金触媒存在下反応させて得られる、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランを原料として用いることにより、異性体を含まない高純度の1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンを高収率で製造することができる。 According to the present invention, N, N-bistrimethylsilylaminopropyldimethylchlorosilane obtained by reacting N, N-bistrimethylsilylallylamine and dimethylchlorosilane in the presence of a platinum catalyst is used as a raw material, so that no isomer is contained. High purity 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane can be produced in high yield.
以下、本発明につき、更に詳しく説明する。
本発明の1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法は下記の三つの反応工程からなるものである。
Hereinafter, the present invention will be described in more detail.
The method for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane of the present invention comprises the following three reaction steps.
(i)ヒドロシリル化工程
(ii)アルコキシ化工程
(iii)加水分解縮合工程
(I) Hydrosilylation step
(Ii) alkoxylation step
(Iii) Hydrolytic condensation step
ヒドロシリル化工程は、N,N−ビストリメチルシリルアリルアミンとジメチルクロロシランとを白金触媒下反応させ、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランとするものである。 In the hydrosilylation step, N, N-bistrimethylsilylallylamine and dimethylchlorosilane are reacted in the presence of a platinum catalyst to form N, N-bistrimethylsilylaminopropyldimethylchlorosilane.
上記反応で用いられるN,N−ビストリメチルシリルアリルアミンとジメチルクロロシランとの配合比は特に限定されないが、反応性、生産性の点から、N,N−ビストリメチルシリルアリルアミン1モルに対し、ジメチルクロロシラン0.5〜2モル、特に0.8〜1.2モルの範囲が好ましい。 The blending ratio of N, N-bistrimethylsilylallylamine and dimethylchlorosilane used in the above reaction is not particularly limited. However, from the viewpoint of reactivity and productivity, 0. A range of 5-2 mol, particularly 0.8-1.2 mol is preferred.
また、上記反応で用いられる白金触媒としては、具体的には塩化白金酸、塩化白金酸のアルコール溶液、白金−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のトルエンまたはキシレン溶液、テトラキストリフェニルホスフィン白金、ジクロロビストリフェニルホスフィン白金、ジクロロビスアセトニトリル白金、ジクロロビスベンゾニトリル白金、ジクロロシクロオクタジエン白金等が例示される。 Specific examples of the platinum catalyst used in the above reaction include chloroplatinic acid, an alcohol solution of chloroplatinic acid, and toluene of platinum-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex. Alternatively, xylene solution, tetrakistriphenylphosphine platinum, dichlorobistriphenylphosphine platinum, dichlorobisacetonitrile platinum, dichlorobisbenzonitrile platinum, dichlorocyclooctadiene platinum and the like are exemplified.
白金触媒の使用量は特に限定されないが、反応性、生産性の点から、N,N−ビストリメチルシリルアリルアミン1モルに対し、0.000001〜0.01モル、特に0.00001〜0.001モルの範囲が好ましい。 The amount of the platinum catalyst used is not particularly limited, but from the viewpoint of reactivity and productivity, 0.000001 to 0.01 mol, particularly 0.00001 to 0.001 mol, with respect to 1 mol of N, N-bistrimethylsilylallylamine. The range of is preferable.
アルコキシ化工程は、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアルコールでアルコキシ化すると共に、ケイ素―窒素結合をアルコールで切断し、3−アミノプロピルジメチルアルコキシシラン化合物とするものである。 In the alkoxylation step, N, N-bistrimethylsilylaminopropyldimethylchlorosilane is alkoxylated with alcohol and the silicon-nitrogen bond is cleaved with alcohol to obtain a 3-aminopropyldimethylalkoxysilane compound.
ここで、用いられるアルコールとしては、ROH(Rは炭素数1〜20、特に1〜10のアルキル基)で示されるものが好ましく、具体的にはメタノール、エタノール、1−プロパノール、1−ブタノール等が例示されるが、反応性、価格の点から、メタノール、エタノールが好ましい。 Here, as alcohol used, what is shown by ROH (R is a C1-C20, especially 1-10 alkyl group) is preferable, Specifically, methanol, ethanol, 1-propanol, 1-butanol, etc. However, methanol and ethanol are preferable from the viewpoint of reactivity and price.
アルコールとN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランとの配合比は特に限定されないが、反応性、生産性の点から、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン1モルに対し、アルコール2.5〜20モル、特に2.8〜10モルの範囲が好ましい。 The blending ratio of alcohol and N, N-bistrimethylsilylaminopropyldimethylchlorosilane is not particularly limited, but from the viewpoint of reactivity and productivity, 2.5 moles of alcohol is used per mole of N, N-bistrimethylsilylaminopropyldimethylchlorosilane. A range of ˜20 mol, in particular 2.8 to 10 mol, is preferred.
N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランとアルコールとを反応させると、3−アミノプロピルジメチルアルコキシシランの塩酸塩の状態となるため、上記反応中、又は反応後に、塩基性化合物を添加して、フリーのアミンとするのが好ましい。用いられる塩基性化合物としては、具体的にはナトリウムメトキシド、ナトリウムエトキシド等の金属アルコキシド化合物、水酸化ナトリウム、水酸化カリウム等が例示される。 When N, N-bistrimethylsilylaminopropyldimethylchlorosilane is reacted with alcohol, it becomes a hydrochloride of 3-aminopropyldimethylalkoxysilane, so that a basic compound is added during or after the reaction, A free amine is preferred. Specific examples of the basic compound used include metal alkoxide compounds such as sodium methoxide and sodium ethoxide, sodium hydroxide and potassium hydroxide.
塩基性化合物の添加量は特に限定されないが、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン1モルに対し、0.5〜2.0モル、特に0.8〜1.2モルの範囲が好ましい。 The addition amount of the basic compound is not particularly limited, but a range of 0.5 to 2.0 mol, particularly 0.8 to 1.2 mol is preferable with respect to 1 mol of N, N-bistrimethylsilylaminopropyldimethylchlorosilane.
また、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランとアルコールとを直接反応させずに、まずN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアンモニアと反応させ、下記式(2)
[{(CH3)3Si}2NCH2CH2CH2Si(CH3)2]2NH (2)
で示される1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンとした後、アルコールと反応させ、3−アミノプロピルジメチルアルコキシシラン化合物とすることもできる。
Further, without directly reacting N, N-bistrimethylsilylaminopropyldimethylchlorosilane and alcohol, first, N, N-bistrimethylsilylaminopropyldimethylchlorosilane is reacted with ammonia to obtain the following formula (2):
[{(CH 3 ) 3 Si} 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 ] 2 NH (2)
1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane, and then reacted with alcohol to give a 3-aminopropyldimethylalkoxysilane compound. You can also.
用いられるアンモニアの量は特に限定されないが、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン1モルに対し、1.0〜3.0モル、特に1.2〜2.0モルの範囲が好ましい。 The amount of ammonia used is not particularly limited, but is preferably in the range of 1.0 to 3.0 mol, particularly 1.2 to 2.0 mol, with respect to 1 mol of N, N-bistrimethylsilylaminopropyldimethylchlorosilane.
アンモニアと反応させた後には塩化アンモニウムが生じるが、これは、ろ過又は水洗により除去することができ、また、除去せずに次工程に進んでもよい。 Ammonium chloride is formed after the reaction with ammonia, which can be removed by filtration or washing with water, and may proceed to the next step without being removed.
アルコールとの反応は、上記の直接反応させる場合と同様に行なうことができる。ただし、上記と違い反応終了時には3−アミノプロピルジメチルアルコキシシランの塩酸塩の状態になっていないので、塩基性化合物を用いてフリーのアミンとする工程は必要ではない。 The reaction with alcohol can be carried out in the same manner as in the case of direct reaction. However, unlike the above, at the end of the reaction, the hydrochloride of 3-aminopropyldimethylalkoxysilane is not in the form of a hydrochloride, so a step of making a free amine using a basic compound is not necessary.
次に、加水分解縮合工程は、上記アルコキシ化工程により得られた3−アミノプロピルジメチルアルコキシシラン化合物を、加水分解縮合により1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンとするものである。 Next, in the hydrolysis condensation step, the 3-aminopropyldimethylalkoxysilane compound obtained in the alkoxylation step is converted to 1,3-bis (3-aminopropyl) -1,1,3,3 by hydrolysis condensation. -Tetramethyldisiloxane.
この場合、アルコキシ化工程終了後の反応液に直接水を添加して行なうことも可能であるが、反応液に存在するトリメチルアルコキシシラン化合物と縮合し、収率が低下する場合があるので、反応液に残存するトリメチルアルコキシシラン化合物を分留等により除去してから行なった方がよい。 In this case, it is possible to add water directly to the reaction solution after completion of the alkoxylation step, but it may be condensed with the trimethylalkoxysilane compound present in the reaction solution, resulting in a decrease in yield. It is better to carry out after removing the trimethylalkoxysilane compound remaining in the liquid by fractional distillation or the like.
添加する水の量は特に限定されないが、3−アミノプロピルジメチルアルコキシシラン化合物1モルに対し0.3〜10モル、特に0.4〜5モルが好ましい。 The amount of water to be added is not particularly limited, but is preferably 0.3 to 10 mol, particularly preferably 0.4 to 5 mol, relative to 1 mol of the 3-aminopropyldimethylalkoxysilane compound.
なお、上記ヒドロシリル化反応、アルコキシ化反応、加水分解縮合反応、更にジシラザン生成反応は無溶媒でも進行するが、溶媒を用いることもできる。用いられる溶媒としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のエステル系溶媒、アセトニトリル、N,N−ジメチルホルムアミド等の非プロトン性極性溶媒、ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒等が例示される。これらの溶媒は単独で使用してもよく、あるいは2種以上を混合して使用してもよい。 The hydrosilylation reaction, alkoxylation reaction, hydrolysis condensation reaction, and further disilazane formation reaction proceed even without solvent, but a solvent can also be used. Solvents used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene, ether solvents such as diethyl ether, tetrahydrofuran and dioxane, and ester solvents such as ethyl acetate and butyl acetate. And aprotic polar solvents such as acetonitrile and N, N-dimethylformamide, and chlorinated hydrocarbon solvents such as dichloromethane and chloroform. These solvents may be used alone or in combination of two or more.
また、上記ヒドロシリル化反応、アルコキシ化反応、加水分解縮合反応、更にジシラザン生成反応の反応温度は特に限定されないが、0〜150℃、特に20〜120℃が好ましい。反応時間も特に限定されないが、1〜15時間、特に1〜10時間が好ましい。 The reaction temperature of the hydrosilylation reaction, alkoxylation reaction, hydrolysis condensation reaction, and further disilazane formation reaction is not particularly limited, but is preferably 0 to 150 ° C, particularly preferably 20 to 120 ° C. Although the reaction time is not particularly limited, it is preferably 1 to 15 hours, particularly 1 to 10 hours.
以下、合成例、実施例、及び比較例を示して本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES Hereinafter, although a synthesis example, an Example, and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
[合成例1] N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランの合成
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、N,N−ビストリメチルシリルアリルアミン201.5g(1.0mol)、白金−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のトルエン溶液(白金含量3質量%)0.65gを仕込み、80℃に加熱した。内温が安定した後、ジメチルクロロシラン99.3g(1.05mol)を80〜90℃で4時間かけて滴下し、その温度で1時間撹拌を行なった。反応液を蒸留し、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシランを沸点74〜75℃/0.13kPaの留分として273.6g得た(収率92%)。
[Synthesis Example 1] Synthesis of N, N-bistrimethylsilylaminopropyldimethylchlorosilane In a flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer, 201.5 g (1.0 mol) of N, N-bistrimethylsilylallylamine. Then, 0.65 g of a toluene solution of platinum-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3% by mass) was charged and heated to 80 ° C. After the internal temperature was stabilized, 99.3 g (1.05 mol) of dimethylchlorosilane was added dropwise at 80 to 90 ° C. over 4 hours, followed by stirring at that temperature for 1 hour. The reaction solution was distilled to obtain 273.6 g of N, N-bistrimethylsilylaminopropyldimethylchlorosilane as a fraction having a boiling point of 74 to 75 ° C./0.13 kPa (yield 92%).
[実施例1]
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン296.1g(1.0mol)を仕込み、28%ナトリウムメトキシドのメタノール溶液202.5gを55〜60℃で3時間かけて滴下し、その温度で1時間撹拌を行なった。生じた塩をろ過後、分留にてトリメチルメトキシシランを除去し、水27gを加えて2時間還流した後反応液を蒸留した。1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンを沸点81〜82℃/0.13kPaの留分として102.2g得た(収率82%)。
得られた化合物をガスクロマトグラフィーにて分析した結果、異性体である1−(2−アミノプロピル)−3−(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンは全く生成していないことが確認された。
[Example 1]
A flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer was charged with 296.1 g (1.0 mol) of N, N-bistrimethylsilylaminopropyldimethylchlorosilane, and 202.5 g of 28% sodium methoxide in methanol. Was added dropwise at 55 to 60 ° C. over 3 hours, and the mixture was stirred at that temperature for 1 hour. The resulting salt was filtered, trimethylmethoxysilane was removed by fractional distillation, 27 g of water was added and refluxed for 2 hours, and then the reaction solution was distilled. 102.2 g of 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was obtained as a fraction having a boiling point of 81 to 82 ° C./0.13 kPa (yield 82%).
As a result of analyzing the obtained compound by gas chromatography, the isomer 1- (2-aminopropyl) -3- (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was completely It was confirmed that it was not generated.
[実施例2]
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン296.1g(1.0mol)を仕込み、アンモニア28.1g(1.7mol)を20〜30℃で3時間かけてフィードし、その温度で1時間撹拌を行なった。生じた塩をろ過により分離し、ろ液を再びフラスコに仕込み、メタノール192.0g(6.0mol)を50〜60℃で1時間かけて滴下し、その後4時間還流した。分留にてトリメチルメトキシシランを除去し、水27gを加えて2時間還流した後反応液を蒸留した。1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンを沸点81〜82℃/0.13kPaの留分として100.3g得た(収率81%)。
得られた化合物をガスクロマトグラフィーにて分析した結果、1−(2−アミノプロピル)−3−(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンは全く生成していないことが確認された。
[Example 2]
A flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 296.1 g (1.0 mol) of N, N-bistrimethylsilylaminopropyldimethylchlorosilane and 28.1 g (1.7 mol) of ammonia in 20 parts. The mixture was fed at ˜30 ° C. over 3 hours and stirred at that temperature for 1 hour. The resulting salt was separated by filtration, the filtrate was again charged into the flask, 192.0 g (6.0 mol) of methanol was added dropwise at 50-60 ° C. over 1 hour, and then refluxed for 4 hours. Trimethylmethoxysilane was removed by fractional distillation, and 27 g of water was added and refluxed for 2 hours, and then the reaction solution was distilled. 100.3 g of 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was obtained as a fraction having a boiling point of 81 to 82 ° C./0.13 kPa (yield 81%).
As a result of analyzing the obtained compound by gas chromatography, 1- (2-aminopropyl) -3- (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was not produced at all. It was confirmed.
[実施例3] 1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンの単離
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、N,N−ビストリメチルシリルアミノプロピルジメチルクロロシラン118.4g(0.4mol)を仕込み、アンモニア11.2g(0.7mol)を20〜30℃で3時間かけてフィードし、その温度で1時間撹拌を行なった。水80gを加え、生じた塩を溶解し、水層を除いた後、有機層を蒸留し、沸点160〜165℃/27Paの留分を92.7g得た。
得られた留分の質量スペクトル、1H−NMRスペクトル、IRスペクトルを測定した。質量スペクトルの結果を下記に、NMR(重クロロホルム溶媒)、IRスペクトルの結果をそれぞれ図1、2に示した。これらの結果より、得られた化合物は1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンであることが確認された。
質量スペクトル
m/z 535, 174, 146, 73
[Example 3] Isolation of 1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane A stirrer, reflux condenser, dropping funnel and thermometer were provided. The flask was charged with 118.4 g (0.4 mol) of N, N-bistrimethylsilylaminopropyldimethylchlorosilane and fed with 11.2 g (0.7 mol) of ammonia at 20-30 ° C. over 3 hours. Stir for 1 hour. 80 g of water was added, the resulting salt was dissolved, the aqueous layer was removed, and then the organic layer was distilled to obtain 92.7 g of a fraction having a boiling point of 160 to 165 ° C./27 Pa.
A mass spectrum, 1 H-NMR spectrum, and IR spectrum of the obtained fraction were measured. The results of mass spectrum are shown below, and the results of NMR (deuterated chloroform solvent) and IR spectrum are shown in FIGS. From these results, it was confirmed that the obtained compound was 1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane.
Mass spectrum m / z 535, 174, 146, 73
[実施例4] 単離した1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンからの1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、実施例3で得られた1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザン80.3g(0.15mol)を仕込み、メタノール57.6g(1.8mol)を50〜60℃で1時間かけて滴下し、その後4時間還流した。分留にてトリメチルメトキシシランを除去し、水8.1gを加えて2時間還流した後、反応液を蒸留した。1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンを沸点81〜82℃/0.13kPaの留分として34.7g得た(収率93%)。
得られた化合物をガスクロマトグラフィーにて分析した結果、1−(2−アミノプロピル)−3−(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンは全く生成していないことが確認された。
Example 4 1,3-bis (3-aminopropyl)-from isolated 1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane Production of 1,1,3,3-tetramethyldisiloxane 1,3-bis (N, N-bis) obtained in Example 3 was placed in a flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer. Trimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane 80.3 g (0.15 mol) was charged, and 57.6 g (1.8 mol) of methanol was added dropwise at 50 to 60 ° C. over 1 hour. Thereafter, the mixture was refluxed for 4 hours. Trimethylmethoxysilane was removed by fractional distillation, 8.1 g of water was added and refluxed for 2 hours, and then the reaction solution was distilled. As a fraction having a boiling point of 81 to 82 ° C./0.13 kPa, 34.7 g of 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was obtained (yield 93%).
As a result of analyzing the obtained compound by gas chromatography, 1- (2-aminopropyl) -3- (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane was not produced at all. It was confirmed.
[比較例1]
撹拌機、還流冷却器、滴下ロート及び温度計を備えたフラスコに、N−トリメチルシリルアリルアミン129.3g(1.0mol)、4%塩化白金酸のイソプロピルアルコール溶液0.98gを仕込み、1,1,3,3−テトラメチルジシロキサン67.2g(0.5mol)を70〜80℃で3時間かけて滴下し、その温度で1時間撹拌を行なった。その後、メタノール64.0gを添加し、1時間還流し、脱シリル化反応を行なった。
得られた反応液をガスクロマトグラフィーにて分析した結果、異性体である1−(2−アミノプロピル)−3−(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンが、目的とする1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンに対して7%含まれていることが確認された。
[Comparative Example 1]
A flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 129.3 g (1.0 mol) of N-trimethylsilylallylamine, 0.98 g of 4% chloroplatinic acid in isopropyl alcohol, 6,3-tetramethyldisiloxane 67.2g (0.5mol) was dripped at 70-80 degreeC over 3 hours, and it stirred at the temperature for 1 hour. Thereafter, 64.0 g of methanol was added and refluxed for 1 hour to carry out a desilylation reaction.
As a result of analyzing the obtained reaction liquid by gas chromatography, 1- (2-aminopropyl) -3- (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane, which is an isomer, was obtained. It was confirmed that the content was 7% with respect to the desired 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane.
Claims (2)
[(CH3)3Si]2NCH2CH2CH2Si(CH3)2Cl (1)
で示されるN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアルコールと反応させ、得られた3−アミノプロピルジメチルアルコキシシラン化合物を水で加水分解縮合することを特徴とする、1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法。 The following formula (1) obtained by reacting N, N-bistrimethylsilylallylamine and dimethylchlorosilane in the presence of a platinum catalyst
[(CH 3 ) 3 Si] 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 Cl (1)
1,3-bis (3, characterized by reacting N, N-bistrimethylsilylaminopropyldimethylchlorosilane represented by the following formula with alcohol and hydrolyzing and condensing the resulting 3-aminopropyldimethylalkoxysilane compound with water. -Aminopropyl) -1,1,3,3-tetramethyldisiloxane production method.
[(CH3)3Si]2NCH2CH2CH2Si(CH3)2Cl (1)
で示されるN,N−ビストリメチルシリルアミノプロピルジメチルクロロシランをアンモニアと反応させ、下記式(2)
[{(CH3)3Si}2NCH2CH2CH2Si(CH3)2]2NH (2)
で示される1,3−ビス(N,N−ビストリメチルシリルアミノプロピル)−1,1,3,3−テトラメチルジシラザンを得、これをアルコールと反応させ、得られた3−アミノプロピルジメチルアルコキシシラン化合物を水で加水分解縮合することを特徴とする、1,3−ビス(3−アミノプロピル)−1,1,3,3−テトラメチルジシロキサンの製造方法。 The following formula (1) obtained by reacting N, N-bistrimethylsilylallylamine and dimethylchlorosilane in the presence of a platinum catalyst
[(CH 3 ) 3 Si] 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 Cl (1)
N, N-bistrimethylsilylaminopropyldimethylchlorosilane represented by the following formula (2)
[{(CH 3 ) 3 Si} 2 NCH 2 CH 2 CH 2 Si (CH 3 ) 2 ] 2 NH (2)
1,3-bis (N, N-bistrimethylsilylaminopropyl) -1,1,3,3-tetramethyldisilazane represented by the formula (3) was reacted with alcohol, and the resulting 3-aminopropyldimethylalkoxy was obtained. A method for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane, comprising hydrolyzing and condensing a silane compound with water.
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