JP4234844B2 - Color filter and manufacturing method thereof - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a color filter and a method for producing the same, and more specifically, a color filter having a black matrix having a light shielding film having a high optical density and a spacer function, and the color filter can be simply and accurately. The present invention relates to a method for manufacturing a color filter that can be manufactured.
[0002]
[Prior art]
Conventionally, in order to keep the thickness (cell gap) of a liquid crystal layer at a constant interval, a liquid crystal display device has plastic beads and ceramic beads having a predetermined particle size between two substrates including a color filter substrate and a counter electrode substrate. The two substrates are bonded to each other by spraying spacer beads. However, the above-described method has a problem that it is difficult to uniformly disperse spacer beads, and the cell gap cannot be made constant over the entire display area. In addition, if a large amount of spacer beads are used, the cell gap is kept constant, but the aperture ratio of the display area decreases due to the spacers present in the display area, and the spacer beads are aligned when the two substrates are bonded together. There were problems such as damage to the film and the transparent electrode, resulting in display defects.
[0003]
In order to solve such a problem, Japanese Patent Laid-Open Nos. 63-8254 and 5-196946 propose that a colored layer of two to three colors of a color filter substrate is laminated to form a spacer. In this method, in order to form a spacer having a thickness corresponding to the required thickness (cell gap) of the liquid crystal layer, sufficient thickness and thickness accuracy of each colored layer are required.
[0004]
As a method for forming a color filter, 1) printing method, 2) ink jet method, 3) micelle electrodeposition method, 4) pigment dispersion method and the like are known. However, there is a concern that it is difficult to superimpose with high accuracy in the printing method, and it is difficult to stably control the height of the overlapping portion of the colored layer in the ink jet method. There are concerns that the micelle electrodeposition method requires a step of forming an electrodeposition pattern and that it is difficult to stably produce a color filter because it is difficult to stabilize the pigment-charged micelle dispersion.
[0005]
Currently, the most common method is the pigment dispersion method. The pigment dispersion method is carried out by repeating the application of a colored photosensitive resin solution, exposure, and development. The thickness of the colored layer usually produced by this method can provide the required spacer height even by superposition. I can't. In addition, when trying to increase the coating thickness of the colored layer, unevenness in the thickness of the central portion and the peripheral portion of the substrate is likely to occur, and the coating after the second color is applied to the previously formed color. Since it is performed on the pattern, unevenness in thickness tends to occur at that portion, and it is difficult to uniformly control the thickness.
[0006]
In order to improve these problems, Japanese Patent Application Laid-Open No. 9-43425 and Japanese Patent Application Laid-Open No. 10-177109 describe a method of laminating a colored layer composed of three primary colors on a resin matrix composed of a resin and a light-shielding agent. Although a method of laminating layers has been proposed, it is necessary to laminate four or more layers, and precise height control as a spacer is difficult.
[0007]
[Problems to be solved by the invention]
An object of the present invention is to solve the above-described problems, to have a color filter having a black matrix having a light shielding film having a high optical density and having a spacer function, and to easily and accurately use this color filter. An object of the present invention is to provide a color filter manufacturing method that can be manufactured.
[0008]
[Means for Solving the Problems]
In the color filter in which a plurality of colored layers composed of three primary colors and a black matrix are arranged on a transparent substrate , a black matrix is disposed in a gap between the colored layers, and protrudes from at least a part of the black matrix. This is achieved by a color filter characterized in that the spacer is formed of the same composition as the black matrix and has an integral structure with the black matrix .
Further, the above-described objects are as follows: (1) a step of providing a light-shielding photosensitive resin composition layer on the entire surface on which a surface having red, green and blue pixels is formed on a transparent substrate; a step of exposing the transparent substrate side, (3) selecting exposing the portion to be a light-shielding photosensitive resin composition layer side of the spacer over the (4) light-shielding photosensitive resin composition layer selectively exposed And a developing process. This is achieved by a method for producing a color filter.
Furthermore, the step (1) preferably includes a step of transferring the light-shielding photosensitive resin composition layer provided on the temporary support to a surface having red, green and blue pixels on the transparent substrate. The light-shielding photosensitive resin composition contains (1) an alkali-soluble binder, (2) a photopolymerization initiator, (3) an addition polymerizable monomer having an ethylenically unsaturated double bond, and (4) a light-shielding agent. It is desirable.
In the present invention, when the light-shielding photosensitive resin composition layer obtained in the step (1) is exposed from the transparent substrate side, each pixel portion functions as a light-shielding film, and the light-shielding photosensitive property at the periphery of each pixel. The resin composition layer is cured. Next, when selective exposure is performed from the light-shielding photosensitive resin composition layer side, for example, only a portion corresponding to the spacer portion is exposed, only this portion is cured. Thereafter, when development processing is performed, the area except for the light-shielding photosensitive resin composition layer and the light-shielding photosensitive resin composition layer in the peripheral portion of each pixel is removed, and only the peripheral portion and the spacer portion of each pixel remain. To do. Therefore, a black matrix having a light shielding function and a spacer function can be easily and accurately manufactured.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a preferred embodiment of the present invention will be described.
A method for producing a color filter of the present invention will be described with reference to the drawings. The step (1) includes a step of providing a light-shielding photosensitive resin composition layer on the entire surface on which a surface having red, green, and blue pixels is formed on a transparent substrate. In this step, first, as shown in FIG. 1A, a surface having red (R), green (G), and blue (B) pixels is formed on the transparent substrate 10.
[0010]
Here, as the transparent substrate, a known substrate used for a color filter can be used. Specifically, in addition to glass such as quartz glass, pyrex glass, synthetic quartz glass, a transparent resin film, an optical resin plate. Etc. The method for forming red (R), green (G), and blue (B) pixels on the surface of the transparent substrate 10 is not particularly limited, and a photosensitive resin composition containing a colorant is used. A known method such as a pigment dispersion method, a printing method, an electrodeposition method, an electroless plating method or the like can be employed, but a transfer material provided with a photosensitive resin composition layer containing each colorant on a temporary support. A method of providing each pixel using a transfer method is desirable from the viewpoint of simplicity and uniformity of thickness.
[0011]
Next, as shown in FIG.1 (b), the light-shielding photosensitive resin composition layer 12 is provided in the whole surface in which each pixel on the transparent substrate 10 was formed. The light-shielding photosensitive resin composition constituting the light-shielding photosensitive resin composition layer 12 includes an alkali-soluble binder, (2) a photopolymerization initiator, and (3) an addition polymerization having an ethylenically unsaturated double bond. Monomers and (4) those containing a light-shielding agent are desirable.
[0012]
Examples of the alkali-soluble binder include polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-sho. Methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer as described in the specifications of JP-A-59-53836 and JP-A-59-71048. There are polymers, partially esterified maleic acid copolymers, and the like, and cellulose derivatives having a carboxylic acid group in the side chain. In addition, a polymer having a hydroxyl group added to a polymer having a hydroxyl group is also useful. Particularly preferably, a copolymer of benzyl (meth) acrylate and (meth) acrylic acid or a multicomponent copolymer of benzyl (meth) acrylate, (meth) acrylic acid and other monomers described in US Pat. No. 4,139,391 Can be mentioned. The above mentioned water-insoluble binders, but examples of water-soluble polymers include polyvinyl pyrrolidone, polyethylene oxide, and polyvinyl alcohol.
[0013]
In addition to the above, in order to improve various performances, for example, the strength of the cured film, an alkali-insoluble polymer can be added within a range that does not adversely affect developability and the like. These polymers include alcohol-soluble nylon or epoxy resin.
[0014]
The solid content in the solid content of the light-shielding photosensitive resin composition of the binder is 10 to 95% by weight, more preferably 20 to 90% by weight. If it is less than 10% by weight, the adhesiveness of the photosensitive resin layer is too high, and if it exceeds 95% by weight, the strength of the formed image and the light sensitivity are poor.
[0015]
Examples of the photopolymerization initiator include vicinal polyketaldonyl compounds disclosed in US Pat. No. 2,367,660, acyloin ether compounds described in US Pat. No. 2,448,828, and US Pat. No. 2,722,512. Aromatic acyloin compounds substituted with α-hydrocarbons described in U.S. Patents, polynuclear quinone compounds described in U.S. Pat. Nos. 3,046,127 and 2,951,758, triaryls described in U.S. Pat. No. 3,549,367 Combination of imidazole dimer and p-aminoketone, benzothiazole compound and trihalomethyl-s-triazine compound described in JP-B 51-48516, trihalomethyl-s- described in US Pat. No. 4,239,850 Triazine compound, U.S. Pat. No. 4,221,976 Trihalomethyl oxadiazole compounds are mounting, and the like. Particularly preferred are trihalomethyl-s-triazine, trihalomethyloxadiazole, and triarylimidazole dimer. Among them, a compound having substantially no sensitivity to light of 400 nm or more can be appropriately selected. Having substantially no sensitivity is determined by the spectral sensitivity spectrum of the photopolymerization initiator and the spectral characteristics of the substrate on which the light-shielding film is formed, and the area (A) of 400 nm or more of the spectral sensitivity spectrum of the photopolymerization initiator. And the ratio (A / B) of the area (B) of 400 nm or less from the lowest wavelength at which the transmittance of the substrate is 10% or more, which means that the value of A / B is 0.1 or less. For example, when borosilicate glass is used as the substrate, the wavelength at which the light transmittance is 10% or more is 290 nm. Therefore, in this case, the area B is an area from 290 nm to 400 nm.
A suitable specific example of the photopolymerization initiator is described in JP-A-7-159592.
[0016]
The solid content in the photopolymerizable composition solid content of the photopolymerization initiator is 0.5 to 20% by weight, more preferably 1 to 15% by weight. If it is less than 0.5% by weight, the photosensitivity and the image strength are low, and if it exceeds 20% by weight, a good effect on the performance is not recognized.
[0017]
The addition-polymerizable monomer having an ethylenically unsaturated double bond is a compound having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. For example, monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate. Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylol ethane triacrylate, trimethylol propane triacrylate, trimethylol propane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate , Pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxy) Ethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (Meth) acrylate, polyfunctional alcohols such as trimethylolpropane and glycerine, which are subjected to addition reaction of ethylene oxide and propylene oxide and then (meth) acrylate; Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50-6034 Urethane acrylates described in JP-A-51-37193; polyester acrylates described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490 And polyfunctional acrylates and methacrylates such as epoxy acrylates, which are reaction products of epoxy resin and (meth) acrylic acid. More preferred examples include trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate.
[0018]
The solid content in the light-shielding photosensitive resin composition solid content of the addition polymerizable monomer having an ethylenically unsaturated double bond is 5 to 50% by weight, more preferably 10 to 40% by weight. If it is less than 5% by weight, the photosensitivity and image strength are low, and if it exceeds 50% by weight, the adhesiveness of the photosensitive resin layer becomes excessive.
[0019]
Moreover, it is desirable that the light-shielding photosensitive resin composition contains at least one colorant. As this colorant, various colorants described in Japanese Patent Application No. 5-110487 are used. Among these, a mixture of pigments that increases transparency in the ultraviolet region described in the specification is particularly preferable. The solid content in the solid content of the light-shielding photosensitive resin composition of the colorant is preferably 1 to 50% by weight.
[0020]
In addition to the above components, it is preferable to further add a thermal polymerization inhibitor. Examples thereof include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6-t-butylphenol), 2 , 2′-methylenebis (4-methyl-6-tert-butylphenol), 2-mercaptobenzimidazole, phenothiazine and the like.
[0021]
Furthermore, a known additive such as a plasticizer, a surfactant, a solvent, and the like can be added to the light-shielding photosensitive resin composition as necessary.
[0022]
And as shown in FIG.1 (b), the light-shielding photosensitive resin composition layer 12 is provided in the whole surface in which the pixel was formed. As a means for providing the light-shielding photosensitive resin composition layer 12, specifically, a spinner, a wheeler, a roller coater, a curtain coater, a knife coater, a wire bar coater, an extruder, and the like are applied, dried, and light-shielded. Although a light-sensitive resin layer can be provided, a method of transferring onto a substrate using a light-shielding photosensitive transfer material having a light-shielding photosensitive resin composition layer on a temporary support is particularly preferable. Specific transfer materials are described in Japanese Patent Application Nos. 2-400047, 3-9292, 3-120223, 3-153227, 4-64870, and 5-110487. These transfer materials are used.
[0023]
As the temporary support in the transfer material, one having flexibility and not causing deformation, shrinkage or elongation under pressure or under pressure and heat is desirable. Examples of such a support include polyethylene terephthalate, Examples include triacetate cellulose film, polystyrene film, polycarbonate film and the like, and biaxially stretched polyethylene terephthalate is particularly preferable. Moreover, it is desirable to provide a colored light-shielding photosensitive resin composition layer directly or on an intermediate layer having ultraviolet ray permeability and low oxygen permeability on the support. Moreover, it is desirable to provide a thermoplastic composition resin layer for the purpose of preventing air bubbles from being mixed when the light-shielding photosensitive resin composition layer is transferred to the surface on which each pixel is formed. In this case, the temporary support, the thermoplastic composition resin layer, the intermediate layer, and the light-shielding photosensitive resin composition layer are desirably laminated in this order.
[0024]
It is desirable that the surface of the light-shielding photosensitive fat composition layer in the transfer material is covered with a coating sheet until transfer, and after the transfer, the coating sheet is peeled from the light-shielding photosensitive resin composition layer. As the covering sheet, a resin film such as polypropylene is preferably used.
[0025]
After the light-shielding photosensitive resin layer on the transfer material is transferred onto each pixel surface, exposure is performed from the transparent substrate 10 side. At the time of this exposure, the light source is selected according to the photosensitivity of the light-shielding photosensitive resin layer, and known materials such as an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc lamp, and an argon laser can be used. 1 to 300 mj / cm ² , preferably 10 to 200 mj / cm ² . When the exposure condition is less than 10 mj / cm ^2, no sufficient light-shielding property is obtained, and when it exceeds 200 mj / cm ^2, there is a R, G, light-shielding film on the B pixel remains a problem. In this case, red, green, and blue pixels formed on the substrate in advance have a light transmittance of 2 in the photosensitive wavelength region of the light-shielding photosensitive resin composition layer as described in Japanese Patent Application No. 4-150691. When the exposure is performed under such conditions, the light-sensitive photosensitive resin composition layer 12 on the surface on which each pixel is formed is cured by light because each pixel functions as a light-shielding film. There is nothing. On the other hand, the light-shielding photosensitive resin composition layer 12 provided directly on the surface of the transparent substrate 10 is cured by light only in a region close to the surface of the transparent substrate 10 (mirror-curing), and the light-shielding photosensitive resin composition is formed from this region. Other regions in the thickness direction of the physical layer 12 are not cured. Therefore, the thickness of each pixel and the thickness of the photocured portion of the light-shielding photosensitive resin composition layer 12 are substantially the same.
[0026]
Next, as shown in FIG. 1 (c), a light-shielding photosensitive resin composition layer 12 side when pattern exposure portion of the order to form a spacer portion through a photo mask 14, to form the spacer portion part content to light curing. Thereafter, when the light-shielding photosensitive resin composition layer 12 is developed in this state, the light-shielding photosensitive resin composition layer 12 has only a peripheral portion 12a and a spacer portion 12s of each pixel as shown in FIG. Remains. Therefore, the black matrix is formed with a portion that exhibits the light blocking function that constitutes the peripheral portion 12a of each pixel and a portion that exhibits the spacer function that constitutes the spacer portion 12s.
[0027]
FIG. 2 is a schematic perspective view of an essential part shown for easy illustration of the state at this time. 2, black Matrix Tsu Rikusu each pixel (R, G, B) and a light-shielding portion 12a constituting the peripheral portion of the scan pacer unit 12s that protrudes from a portion of the at least one light-shielding portion of these light-shielding portion Have.
The location where the spacer portion 12s is provided is appropriately selected depending on the size of each liquid crystal filling region, the ease of liquid crystal injection, and the like.
[0028]
Further, the thickness (height) of the spacer portion 12s is arbitrarily selected according to the thickness of the cell gap, and therefore, the light-shielding photosensitive resin composition layer 12 provided on the surface on which each pixel is formed. Is selected in consideration of the thickness (height) of the spacer portion 12s. In general, the thickness of each pixel is preferably 1 to 3 μm. If the thickness of each pixel is less than 1 μm, the pigment concentration in the light-shielding film becomes high to obtain the required optical density, and the developability deteriorates. If it exceeds 3 μm, problems such as poor developability and poor image formation reproducibility occur. The thickness of the light shielding film can be arbitrarily set within the above range.
[0029]
The thickness (height) of the spacer portion is preferably 1 to 10 μm and more preferably 2 to 8 μm within a range larger than the thickness of each pixel.
[0030]
Therefore, the thickness of the light-shielding photosensitive resin composition layer 12 provided on each pixel surface is preferably 1 to 10 μm, more preferably 2 to 8 μm. When the thickness is less than 1 μm, the spacer portion is sufficient to satisfy the cell gap. If the height of 12 s cannot be formed, and the thickness exceeds 10 μm, the photocuring of the portion corresponding to the spacer portion 12 s is insufficient when exposed through the photomask 14, and the cell gap is too large. A problem arises in that it is used unnecessarily.
[0031]
When pattern exposure of the light-shielding photosensitive resin composition layer 12 through the photomask 14 is performed, a light source similar to the case of exposing the entire surface from the transparent substrate 10 can be used.
[0032]
EXAMPLES Hereinafter, although this invention is demonstrated further in detail based on an Example, this invention is not limited to these.
【Example】
Example 1
(Preparation of light-shielding photosensitive transfer material) On a 100 μm thick polyethylene terephthalate film temporary support, a coating liquid comprising the following formulation H1 was applied and dried to provide a thermoplastic resin layer having a dry film thickness of 20 μm. .
[0033]
Thermoplastic resin layer formulation H1:
Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55 / 28.8 / 11.7 / 4.5, weight average molecular weight = 80000) 15.0 Parts by weight, BPE-500 (polyfunctional acrylate manufactured by Shin-Nakamura Chemical Co., Ltd.) 7.0 parts by weight, F177P (fluorine surfactant manufactured by Dainippon Ink and Co., Ltd.) 0.3 parts by weight, methanol, 30.0 parts by weight, methyl ethyl ketone 1.0 part by weight 1-methoxy-2-propanol 10.0 parts by weight
Next, a coating liquid comprising the following formulation B1 was applied onto the thermoplastic resin layer and dried to provide an intermediate layer having a dry film thickness of 1.6 μm.
[0035]
Separation layer formulation B1:
Polyvinyl alcohol (Kuraray Co., Ltd. PVA205, saponification rate = 80%) 130 parts by weight Polyvinylpyrrolidone (GAP Corporation PVP, K-30) 60 parts by weight Distilled water 2110 parts by weight Methanol 1750 parts by weight ]
On the temporary support body which has the said thermoplastic resin layer and an intermediate | middle layer, the coating liquid which consists of the following prescription C1 was apply | coated and dried, and the light-shielding photosensitive resin composition layer whose dry film thickness is 7 micrometers was formed.
[0037]
Formula C1:
Benzyl methacrylate / methacrylic acid copolymer (molar ratio = 70/30, limiting viscosity = 0.12) 11.00 parts by weight dipentaerythritol hexaacrylate 10.60 parts by weight bis [4- [N- [4 -(4,6-bistrichloromethyl-S-triazin-2-yl) phenyl] carbamoyl]
Phenyl] sebacate (photopolymerization initiator) 0.52 parts by weight Pigment Red 177 4.00 parts by weight Pigment Blue 15: 6 2.86 parts by weight Pigment Yellow 139 2.27 parts by weight Pigment Violet 23 0.39 Parts by weight, carbon black, 1.70 parts by weight, hydroquinone monomethyl ether, 0.01 parts by weight, F177P (surfactant manufactured by Dainippon Ink and Co., Ltd.) 0.07 parts by weight, methyl cellosolve acetate, 40.00 parts by weight, methyl ethyl ketone, 80.00 Weight part [0038]
Further, a coating sheet of polypropylene (thickness: 12 μm) was pressure-bonded on the light-shielding photosensitive resin layer to produce a light-shielding photosensitive transfer material.
[0039]
On the borosilicate glass substrate (thickness 1.1 mm), a color filter having R, G and B pixels having the same film thickness of 2 μm as in Example 1 described in Japanese Patent Application No. 4-150691 was prepared. In this case, the light transmittance of 400 nm or more of the B pixel was 10% or more. The coated sheet of the light-sensitive photosensitive transfer material is peeled off from the above R, G, B color filters, and a light-sensitive photosensitive resin layer surface is laminated on the color filter surface using a laminator (VP-II manufactured by Taisei Laminator Co., Ltd.). Bonding was performed by applying pressure (0.8 kg / cm 2) and heating (130 ° C.), followed by peeling at the interface between the temporary support and the thermoplastic resin layer to remove the temporary support.
[0040]
Next, the entire surface was exposed from the side opposite to the color filter surface (transparent substrate side) using an ultrahigh pressure mercury lamp at an exposure amount of 100 mj / cm ² . Next, pattern exposure was performed from the color filter surface using a spacer mask at an exposure amount of 50 mj / cm ² .
Thereafter, development was performed with a 1% aqueous sodium carbonate solution to remove unnecessary portions, and heat treatment was performed at 220 ° C. for 120 minutes to form a light-shielding film and a spacer portion constituting the peripheral portion of each R, G, B pixel. The height of the spacer portion (height from the transparent substrate surface) was 6.3 μm. Further, there was no overlap between the light shielding film and the RGB layer, and the light shielding film having a high optical density having a CIE colorimetric Y value of 0.2 was provided. Further, the variation in the thickness of the light shielding film portion and the variation in the thickness of the spacer portion were both as small as ± 0.1 μm.
[0041]
【The invention's effect】
The color filter of the present invention has a structure in which the black matrix has a light shielding function and a spacer function, and the spacer function is exhibited in the black matrix. It is possible to provide a color filter that has a uniform height, can easily form a uniform liquid crystal layer, and has excellent display quality without luminance unevenness and color unevenness.
Moreover, according to the method for producing a color filter of the present invention, a color filter having the above characteristics can be produced easily and accurately.
[Brief description of the drawings]
FIG. 1 is a process diagram showing a preferred embodiment of a method for producing a color filter of the present invention.
FIG. 2 is a schematic perspective view of an essential part showing an embodiment of a color filter of the present invention.
[Explanation of symbols]
R pixel (red)
G pixel (green)
B pixel (blue)
DESCRIPTION OF SYMBOLS 10 Transparent substrate 12 Light-shielding photosensitive resin composition layer 12a Peripheral part ( light-shielding part)
12s spacer portion 14 photomask

Claims (4)

In a color filter in which a plurality of colored layers composed of three primary colors and a black matrix are arranged on a transparent substrate , a black matrix is arranged in a gap between the colored layers, and a spacer protruding from at least a part of the black matrix is formed. A color filter , wherein the spacer is made of the same composition as that of the black matrix and has an integral structure with the black matrix . (1) A step of providing a light-shielding photosensitive resin composition layer on the entire surface on which a surface having red, green and blue pixels is formed on a transparent substrate; and (2) a step of exposing from the transparent substrate side. If, (3) selecting exposing the portion to be a light-shielding photosensitive resin composition layer side of the spacer over, and a step of developing the (4) light-shielding photosensitive resin composition layer selectively exposed a method for manufacturing a color filter, which comprises producing a color filter according to claim 1 comprising.   The step (1) comprises a step of transferring a light-shielding photosensitive resin composition layer provided on a temporary support to a surface having red, green and blue pixels on a transparent substrate. Item 3. A method for producing a color filter according to Item 2.   The light-shielding photosensitive resin composition contains (1) an alkali-soluble binder, (2) a photopolymerization initiator, (3) an addition polymerizable monomer having an ethylenically unsaturated double bond, and (4) a light-shielding agent. The method for producing a color filter according to claim 3.

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