JP4212437B2 - Substrate processing equipment - Google Patents

Description

  The present invention relates to a substrate processing apparatus that performs processing on a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display (hereinafter simply referred to as a substrate), and in particular, exhausts in a cup that prevent scattering of processing liquid. It relates to the technology to be performed.

Conventionally, as this type of apparatus, a spin chuck that supports a substrate, a splash prevention cup that surrounds the spin chuck, a nozzle that supplies a processing liquid to the substrate, and a processing liquid that has been scattered by rotation are placed in a downflow. And an exhaust port that exhausts air from the scattering prevention cup (see, for example, Patent Document 1). The anti-scattering cup has an upper cup and a lower cup, and the upper cup is mounted so that its lower outer peripheral surface enters the upper inner peripheral surface of the lower cup, and the upper cup moves up and down relative to the lower cup according to processing. It is configured freely.
Japanese Patent Laid-Open No. 11-33468 (FIGS. 1, 3 and 4)

  However, the conventional example having such a configuration has the following problems.

  That is, the conventional apparatus has a gap between them so that the upper cup moves up and down smoothly with respect to the lower cup. Therefore, when exhausting in the anti-scattering cup, there is a problem that the airflow flows from the side of the anti-scattering cup through the gap, and the exhaust of the airflow flowing down the edge of the substrate from the upper part of the anti-scattering cup is weakened. . When the exhaust efficiency is lowered in this way, there is a problem in that the mist and particles of the processing liquid are not exhausted sufficiently and adhere to the substrate, thereby contaminating the substrate.

  The present invention has been made in view of such circumstances, and is a substrate processing apparatus capable of processing the substrate with high cleanliness by enhancing the exhaust efficiency in the cup by sealing the gap with a liquid seal. The purpose is to provide.

  In order to achieve such an object, the present invention has the following configuration.

That is, the invention according to claim 1, the substrate processing apparatus for performing a predetermined process by supplying the processing liquid to the substrate via the processing liquid supply means, the rotation support means for rotatably supporting the substrate, A lower cup that encloses a side of the rotation support means; a first seal member that projects from the lower cup; an upper cup that is disposed so as to be movable up and down relative to the lower cup; and the first seal. A second seal member that protrudes toward the member and is formed on the upper cup and is close to the first seal member during relative elevation, an exhaust port that exhausts gas in the lower cup, and the second seal member A liquid supply unit, a through-hole formed in a side surface of the lower cup, a standby pot on which the processing liquid supply unit waits, and a cleaning unit for cleaning the processing liquid supply unit in the standby pot And a liquid supply means having a cleaning liquid supply means for supplying a cleaning liquid and a pipe for supplying the cleaning liquid of the cleaning liquid supply means to the through-hole, and when the upper cup is moved up and down relatively, the first seal member And the second seal member are hermetically sealed with a liquid.

[Operation / Effect] When the substrate is processed, the upper cup moves up and down relative to the lower cup, and the first seal member and the second seal member come close to each other, but the liquid is supplied to the second seal member by the liquid supply means. Therefore, the gap between the first seal member and the second seal member is liquid-sealed. Therefore, when the processing liquid is supplied from the processing liquid supply means to the substrate supported by the rotation support means, the exhaust may leak from the gap between the upper cup and the lower cup even if exhaust is performed from the exhaust port. In addition, the exhaust efficiency can be increased. As a result, the air flow containing mist and particles can be efficiently exhausted, and the substrate can be processed with high cleanliness. Further, since the standby pot is cleaned by the cleaning liquid supply means, the liquid seal can be formed by supplying the cleaning liquid from here to the through-hole through the pipe.

(Delete)

(Delete)

(Delete)

(Delete)

(Delete)

(Delete)

According to a second aspect of the present invention, in the substrate processing apparatus for performing a predetermined process by supplying a processing liquid to the substrate via the processing liquid supply means, the rotation support means for rotatably supporting the substrate; A lower cup that encloses a side of the rotation support means; a first seal member that projects from the lower cup; an upper cup that is disposed so as to be movable up and down relative to the lower cup; and the first seal. A second seal member that protrudes toward the member and is formed on the upper cup and is close to the first seal member during relative elevation, an exhaust port that exhausts gas in the lower cup, and the second seal member A liquid is supplied, and includes a through-hole formed in the upper surface of the upper cup, and when the processing liquid supply means moves above the substrate to supply the processing liquid, the through-hole is also provided. Supply processing solution And a liquid supply means that, when the upper cup is relative elevation is characterized in that between the second sealing member and the first seal member is airtight with liquid.

[ Operation / Effect] When the substrate is processed, the upper cup moves up and down relative to the lower cup, and the first seal member and the second seal member come close to each other, but the liquid is supplied to the second seal member by the liquid supply means. Therefore, the gap between the first seal member and the second seal member is liquid-sealed. Therefore, when the processing liquid is supplied from the processing liquid supply means to the substrate supported by the rotation support means, the exhaust may leak from the gap between the upper cup and the lower cup even if exhaust is performed from the exhaust port. In addition, the exhaust efficiency can be increased. As a result, the air flow containing mist and particles can be efficiently exhausted, and the substrate can be processed with high cleanliness. Further, since the processing liquid supply means moves from the outer edge of the upper cup to the center, the processing liquid for liquid sealing is supplied at this time. The supplied processing liquid reaches the second seal member through the through hole of the upper cup and forms a liquid seal. In particular, when the processing liquid is developed, the processing liquid is supplied from a state in which the processing liquid supply means is located on the side of the upper cup, and therefore, it can be easily applied only by providing a through hole. .

According to the substrate processing apparatus of the present invention, the gap between the first seal member and the second seal member is liquid-sealed by the liquid supplied from the liquid supply means. Therefore, when the processing liquid is supplied from the processing liquid supply means to the substrate supported by the rotation support means, the exhaust may leak from the gap between the upper cup and the lower cup even if exhaust is performed from the exhaust port. In addition, the exhaust efficiency can be increased. As a result, the airflow containing mist and particles can be efficiently exhausted, and the substrate can be processed with high cleanliness. Further, since the standby pot is cleaned by the cleaning liquid supply means, the liquid seal can be formed by supplying the cleaning liquid from here to the through-hole through the pipe.

  The present invention is characterized in that the gap between the upper cup and the lower cup is sealed with a liquid. Hereinafter, a configuration suitable for sealing with a liquid in the substrate processing apparatus will be described.

  Embodiment 1 of the present invention will be described below with reference to FIGS.

  FIG. 1 is a longitudinal sectional view showing a schematic configuration of the substrate processing apparatus according to the first embodiment, and FIG. 2 is a longitudinal sectional view showing an essential part.

  This substrate processing apparatus is a developing apparatus that performs a developing process on the substrate W. The substrate W is previously coated with a photoresist film, and a predetermined pattern is further baked thereon. A developing solution is supplied to the substrate W as a processing solution, and pure water is supplied as a rinsing solution to perform the developing process.

The substrate processing apparatus includes a rotation motor 1 at the center. The rotary shaft 3 of the rotary motor 1 has a suction spin chuck 5 fitted on the upper end thereof. An inner cover 7 is attached around the rotary motor 1, and an outer cover 9 is attached to the upper portion of the inner cover 7. The outer cover 9 is positioned is the upper edge slightly lower than the upper surface of the suction type spin chuck 5, is provided so as to reach the bottom of the inner cover 7 smoothly draw a song surface therefrom.

  The suction spin chuck 5 described above corresponds to the rotation support means in the present invention. Although the suction spin chuck 5 is used in this embodiment, a so-called mechanical chuck that contacts and supports the edge of the substrate W may be employed instead.

  The lower part of the inner cover 7 is attached to the outer periphery of the base 11 that covers the periphery of the lower part of the rotary motor 1. A bat 13 is provided around the lower portion of the base 11. The bat 13 having a flat plate shape is for collecting a processing solution such as a developing solution or a rinsing solution described later. The bat 13 is attached to the frame 15 of the developing device. In one part of the bat 13 and the frame 15, a drainage port 19 that communicates with a discharge space 17 provided in the lower part of the frame 15 is formed.

  A lower cup 21 is erected on the outer edge of the bat 13. The lower cup 21 has a cylindrical shape and is provided so as to surround the rotary motor 1. The lower cup 21 includes a side wall portion 23, an upper wall portion 25, an overhang member 27, and a hanging member 29. The upper wall portion 25 is erected on the upper edge of the side wall portion 23 via an overhang member 27. The projecting member 27 is formed so as to project slightly inward from the inner wall of the cylindrical side wall portion 23. A drooping member 29 is attached to the inner peripheral surface of the protruding portion. The drooping member 29 is attached to the projecting member 27 at a portion slightly above the center in the height direction of the inner peripheral surface. The overhang member 27 and the hanging member 29 constitute an upper hook-shaped piece 31. Further, the side wall portion 23 is formed with exhaust ports 33 at two positions apart from each other. In FIG. 1, only one exhaust port 33 is shown for the purpose of illustration.

  The upper hook-shaped piece 31 corresponds to the first seal member in the present invention.

  An upper cup 35 is provided on the inner peripheral side of the lower cup 21. The upper cup 35 is configured to be movable up and down with respect to the lower cup 21 by a lifting mechanism (not shown). The elevation height is a “standby position” indicated by a solid line in FIGS. 1 and 2 and a “processing position” indicated by a two-dot chain line in FIGS. 1 and 2. The upper cup 35 includes a cylindrical member 37, an upper inclined member 39, and a lower hook-shaped piece 43.

  The cylindrical member 37 is provided so that its outer peripheral surface is located slightly apart from the inner peripheral surface of the hanging member 29 of the lower cup 35 in terms of elevation. The upper inclined member 39 is attached to the upper edge portion of the cylindrical member 37, and has an outer inclined surface together with a central inclined piece 39a rising toward the center side and an outer inclined piece 39b inclined downward toward the outer side. A hanging piece 39c formed by dripping the outer periphery of the piece 39b substantially vertically.

  The lower hook-like piece 43 corresponding to the second seal member in the present invention is attached to the lower end portion of the cylindrical member 37. The lower hook-shaped piece 43 protrudes from the cylindrical member 37 toward the side wall portion 23 and is bent in a “hook shape” so that the tip end portion 43 a does not contact the inner peripheral surface of the side wall portion 23. Further, the concave portion 43b is formed by bending in a “hook shape”. The recess 43b has an annular shape in plan view.

  1 and 2, when the upper cup 35 is raised with respect to the lower cup 21, the lower hook-like piece 43 and the upper hook-like piece 31 are engaged with each other. It has become. Specifically, the drooping member 29 of the upper hook-shaped piece 31 enters the recess 43b. However, the bottom of the recess 43b is in a positional relationship where the lower end of the hanging member 29 does not come into contact. In other words, even when the upper cup 35 is raised to the “processing position”, the inner space of the lower cup 21 and the outer space of the lower cup 21 and the upper cup 35 communicate with each other through the slight gap. Yes.

As shown in FIG. 1, a standby pot 45 is disposed at a position adjacent to the lower cup 21 (left side in FIG. 1). This standby pot 45, two developing nozzle 47 for supplying a developing solution as a processing solution is configured to be waiting. In the standby pot 45, a nozzle cleaning unit 49 for cleaning the tip 47a of the developing nozzle 47 with pure water is provided. The developing nozzle 47 is configured to linearly move to a retracting pot 51 on the opposite side (right side in FIG. 1) across the suction spin chuck 5 during the developing process.

  The developing nozzle 47 corresponds to the processing liquid supply unit in the present invention.

  A temporary storage tank 53 is disposed on the outside adjacent to the retreat pot 51. In the temporary storage tank 53, a rinse nozzle 55 that supplies a rinse liquid to the substrate W after supplying the developer from the developing nozzle 47 stands by. The rinse liquid is, for example, pure water. Therefore, an operation called “slow leak” is generally performed not for the purpose of supplying pure water but for the purpose of disposal so that the quality of the pure water does not deteriorate. That is, the rinse liquid is continuously flowed from the rinse nozzle 55 to the temporary storage tank 53 at a slight flow rate during standby. As a result, the rinse liquid does not stay in the rinse nozzle 55, and deterioration of the quality of the rinse liquid can be prevented.

  The temporary storage tank 53 has a drain hole 57 formed in the lower portion of the left side wall thereof. One end of a pipe 59 is connected to the drain hole 57 in communication. The other end of the pipe 59 is connected to a through-hole 61 formed in the upper part of the side wall 23 of the lower cup 21. Therefore, the rinse liquid stored in the temporary storage tank 53 due to the slow leak is discharged through the drain hole 57 formed in the lower side wall of the temporary storage tank 53, the pipe 59, and the through-hole 61. The discharged rinse liquid flows downward along the inner wall of the side wall 23, and when the upper cup 35 is in the “standby position”, a part of the rinse liquid is stored in the recess 43 b of the lower hook-shaped piece 43, and the rest 13 is collected. Further, the rinse liquid or the like collected in the bat 13 is collected through the discharge space 17 through the drain port 19 described above.

  The rinse nozzle 55, the temporary storage tank 53, the pipe 59, and the through-hole 61 correspond to the liquid supply means in the present invention. The rinse nozzle 55 corresponds to the supply means in the present invention, and the temporary storage tank corresponds to the storage means.

  Next, the operation of the substrate processing apparatus configured as described above will be described with reference to FIGS. 3 and 4 are diagrams for explaining the operation. FIG. 3 shows the supply of the developer and FIG. 4 shows the paddle development. Further, as for the development processing, “paddle development” in which a developing solution is deposited on the upper surface of the substrate W is taken as an example.

  In the initial state, the upper cup 35 is in the “standby position”. In this state, the pure water that has been slowly leaked from the rinse nozzle 55 is stored in the recess 43 b of the lower hook-shaped piece 43 through the pipe 59. The overflowing pure water is discarded through the bat 13.

  In order to perform the developing process, the developer is discharged from the developing nozzle 47 and moved from the standby pot 45 side to the standby pot 51 side through the center of the substrate W. As a result, the developer is deposited on the upper surface of the substrate W. At this time, the inside of the lower cup 21 is exhausted through the exhaust port 33. However, since only the developer is accumulated, the odor is weak and no odor leaks even if the exhaust is somewhat weak. .

  When a predetermined time elapses after liquid filling, the upper cup 35 is moved to the “processing position”. That is, the upper cup 35 is raised above the lower cup 21. Then, as shown in FIG. 4, the drooping member 29 of the upper hook-shaped piece 31 fits into the recess 43 b of the lower hook-shaped piece 43 with a slight gap. However, since pure water is stored in the recess 43b to form a liquid seal, it is possible to prevent outside air from entering from the side of the upper cup 35. Further, since the pure water is configured to accumulate in the recess 43b, the pure water does not easily leak out, and the liquid seal can be maintained for a long time.

  In this state, the rotary motor 1 is driven to rotate the substrate W for a certain period of time, and the accumulated developer is shaken off. At this time, the developer is shaken off, and the shaken developer is directed downward to the upper cup 35 and collected. Therefore, the upper cup 35 and the lower cup 21 are particularly filled with odors from the developer that scatters. However, because the liquid seal is configured, the exhaust does not leak from the gap between the upper cup 35 and the lower cup 21, and the exhaust efficiency can be improved. As a result, the odor does not overflow to the surroundings, and the air flow including mist and particles can be efficiently exhausted, and the substrate W can be processed with high cleanliness.

  Next, pure water is supplied from the rinse nozzle 55 at a larger flow rate than in the case of a slow leak. Then, by swinging and moving above the substrate W for a certain time, the development chemical reaction is stopped and the developer is washed away. Thereafter, the rinse nozzle 55 is returned to the original position, and the rotary motor 1 is driven at a high speed to shake off pure water and dry the substrate W.

  Next, Embodiment 2 of the present invention will be described with reference to FIG. FIG. 5 is a diagram illustrating a schematic configuration of the substrate processing apparatus according to the second embodiment. About the structure which is common in Example 1 mentioned above, detailed description is abbreviate | omitted by attaching | subjecting a same sign.

  One end of the pipe 59 is connected to the through hole 61 of the lower cup 21, while the other end is connected to the cleaning liquid supply pipe 63. The cleaning liquid supply pipe 63 (cleaning liquid supply means) is a pipe that supplies a cleaning liquid for cleaning the developing nozzle 47 of the standby pot 45. An opening / closing valve 65 is attached to the cleaning liquid supply pipe 63. When the opening / closing valve 65 is opened, the cleaning liquid is also supplied to the through-hole 61.

  As described above, even when the structure for supplying the cleaning liquid to the standby pot 45 is used, liquid sealing can be performed in the same manner as in the first embodiment, and the same effect as described above can be obtained.

Next, with reference to FIG. 6 illustrating a third embodiment of the present invention. FIG. 6 is a vertical cross-sectional view illustrating the main part of the substrate processing apparatus according to the third embodiment. About the structure which is common in Example 1 mentioned above, detailed description is abbreviate | omitted by attaching | subjecting a same sign.

  Of the upper inclined member 39 of the upper cup 35, a through hole 65 is formed in the outer inclined piece 39 b. The position to be formed is preferably between the outer peripheral surface of the cylindrical member 37 and the inner peripheral surface of the hanging member 29 in plan view for the reason described later.

  Next, the operation will be described with reference to FIG. FIG. 6 is a diagram for explaining the operation of the apparatus configured as described above.

  The developing nozzle 47 moves from the standby pot 45, passes over the substrate W and moves to the standby pot 51 while supplying the developer. At this time, the developer is not supplied only while it is located above the substrate W, but is supplied when it is located above the upper inclined member 39 of the upper cup 35. Therefore, the developer supplied until the developing nozzle 47 reaches the upper opening of the upper cup 35 is not only collected by the bat 13 through the lower cup 21 but also through the through-hole 65 and the lower hook-like piece 43. In the recess 43b. Therefore, a liquid seal can be formed when the upper cup 35 is raised to the “processing position”, and the same effects as those of the first and second embodiments can be obtained.

  As described above, when the substrate processing apparatus is a developing apparatus, the developer is supplied from the state in which the developing nozzle 47 is positioned on the side of the upper cup 35, and therefore the upper inclined member 39 of the upper cup 35 is penetrated. It can be easily configured only by providing the mouth 65.

  The present invention is not limited to the above-described embodiment, and can be modified as follows.

  (1) In each of the above-described embodiments, the developing apparatus is described as an example of the substrate processing apparatus. However, the present invention is not limited to the developing apparatus. It can be applied even to the rotary coating apparatus.

  (2) The shape of the first seal member and the second seal member is not limited to the above form, and the second seal member may be close to the first seal member when the upper cup is raised. If applicable.

  (3) In each of the above-described embodiments, a configuration is adopted in which the liquid supply means already provided in the apparatus is used to guide it to the recess 43b. However, the dedicated liquid supply means for supplying the liquid to the recess 43b. May be provided.

  (4) The configuration in which the upper cup 35 is raised with respect to the lower cup 21 is taken as an example, but the lower cup 21 may be lowered with respect to the upper cup 35.

1 is a longitudinal sectional view illustrating a schematic configuration of a substrate processing apparatus according to Embodiment 1. FIG. It is a longitudinal cross-sectional view which shows the principal part. It is a figure for explanation of operation, and is a figure showing supply of a developing solution. It is a figure for explanation of operation, and is a figure showing during paddle development. 6 is a longitudinal sectional view illustrating a schematic configuration of a substrate processing apparatus according to Embodiment 2. FIG. FIG. 6 is a longitudinal sectional view showing a main part of a substrate processing apparatus according to a third embodiment. It is a figure where it uses for operation | movement description.

Explanation of symbols

W ... Substrate 1 ... Rotation motor 5 ... Suction spin chuck (rotation support means)
DESCRIPTION OF SYMBOLS 21 ... Lower cup 23 ... Side wall part 25 ... Upper wall part 27 ... Overhang member 29 ... Drooping member 31 ... Upper hook-shaped piece (1st seal member)
33 ... Exhaust port 35 ... Upper cup 37 ... Tube member 39 ... Upper inclined member 39a ... Center side inclined piece 39b ... Outer inclined piece 39c ... Drooping piece 43 ... Lower hook-like piece (second seal member)
43a ... tip 43b ... recess 47 ... developing nozzle (processing liquid supply means)
53 ... Temporary storage tank (storage means)
55 ... Rinse nozzle (supply means, liquid supply means)
57… drainage hole (liquid supply means)
59… Piping (liquid supply means)
61 ... Through- hole (liquid supply means)

Claims (2)

In a substrate processing apparatus for performing a predetermined process by supplying a processing liquid to a substrate via a processing liquid supply means,
Rotation support means for rotatably supporting the substrate;
A lower cup surrounding a side of the rotation support means;
A first seal member formed to project from the lower cup;
An upper cup disposed so as to be movable up and down relative to the lower cup;
A second seal member that protrudes toward the first seal member and is formed in the upper cup and is close to the first seal member during relative elevation;
An exhaust port for exhausting the gas in the lower cup;
A liquid is supplied to the second seal member, and a through-hole formed in a side surface of the lower cup, a standby pot on which the processing liquid supply means stands by, and the processing liquid in the standby pot A cleaning liquid supplying means for supplying a cleaning liquid for cleaning the supplying means; and a liquid supplying means having a pipe for supplying the cleaning liquid of the cleaning liquid supplying means to the through-hole ,
The substrate processing apparatus, wherein when the upper cup moves up and down relatively, the space between the first seal member and the second seal member is hermetically sealed with a liquid. In a substrate processing apparatus for performing a predetermined process by supplying a processing liquid to a substrate via a processing liquid supply means,
Rotation support means for rotatably supporting the substrate;
A lower cup surrounding a side of the rotation support means;
A first seal member formed to project from the lower cup;
An upper cup disposed so as to be movable up and down relative to the lower cup;
A second seal member that protrudes toward the first seal member and is formed in the upper cup and is close to the first seal member during relative elevation;
An exhaust port for exhausting the gas in the lower cup;
A liquid is supplied to the second seal member, and includes a through-hole formed in the upper surface of the upper cup, and the processing liquid supply means moves above the substrate to supply the processing liquid. And a liquid supply means for supplying a treatment liquid also to the through-hole ,
The substrate processing apparatus, wherein when the upper cup moves up and down relatively, the space between the first seal member and the second seal member is hermetically sealed with a liquid.

Images