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JP4080506B2 - Optical information recording medium - Google Patents

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JP4080506B2
JP4080506B2 JP2005343958A JP2005343958A JP4080506B2 JP 4080506 B2 JP4080506 B2 JP 4080506B2 JP 2005343958 A JP2005343958 A JP 2005343958A JP 2005343958 A JP2005343958 A JP 2005343958A JP 4080506 B2 JP4080506 B2 JP 4080506B2
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film
protective film
substrate
recording medium
information recording
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JP2006073198A (en
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秀春 田島
信之 高森
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Sharp Corp
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Description

この発明は、情報を記録又は再生する光情報記録媒体に関し、特に、環境変化による反りを抑制できる光情報記録媒体に関する。   The present invention relates to an optical information recording medium for recording or reproducing information, and more particularly to an optical information recording medium capable of suppressing warpage due to environmental changes.

図1に、光情報記録媒体の構成を示す断面模式図を示す。図8に、従来の光情報記録媒体の平面図(a)及び側面図(b)を示す。
従来、光情報記録媒体10は図1に示すように、ポリカーボネート等からなる円盤状の基盤20上に、スパッタ等により、誘電体膜41,43(窒化シリコン等)、記録膜42(TbFeCo等)、反射膜44(Al等)等の薄膜からなる単層または多層の薄膜層40が形成されている。また、これら薄膜層40上に樹脂膜等による薄膜保護膜50が形成され、基板20の光入射面側の表面上には樹脂等からなる基板保護膜30が形成されている。
FIG. 1 is a schematic cross-sectional view showing the configuration of the optical information recording medium. FIG. 8 shows a plan view (a) and a side view (b) of a conventional optical information recording medium.
Conventionally, as shown in FIG. 1, an optical information recording medium 10 has a dielectric film 41, 43 (silicon nitride, etc.) and a recording film 42 (TbFeCo, etc.) on a disk-shaped substrate 20 made of polycarbonate or the like by sputtering or the like. A single or multilayer thin film layer 40 made of a thin film such as a reflective film 44 (Al, etc.) is formed. A thin film protective film 50 made of a resin film or the like is formed on the thin film layer 40, and a substrate protective film 30 made of a resin or the like is formed on the surface of the substrate 20 on the light incident surface side.

これらの層のそれぞれの厚さは、基板20が約1.2[mm]、スパッタ等で形成される単層あるいは多層薄膜層40の厚さは10〜300[nm]、薄膜保護膜50の厚さが1〜30[μm]、基板保護膜30の厚さが0.1〜30[μm]であり、媒体の全厚のほとんどがポリカーボネート基板20によって占められている。   The thickness of each of these layers is about 1.2 [mm] for the substrate 20, the thickness of the single layer or multilayer thin film layer 40 formed by sputtering or the like is 10 to 300 [nm], and the thickness of the thin film protective film 50. The thickness is 1 to 30 [μm], the thickness of the substrate protective film 30 is 0.1 to 30 [μm], and most of the total thickness of the medium is occupied by the polycarbonate substrate 20.

このため光情報記録媒体の剛性は、そのほとんどが、ポリカーボネート基板20に依存しており、ポリカーボネート基板20が十分に厚いため、環境変化(温湿度変化)による変形は非常に小さく、各層に発生する応力や曲げモーメントのバランスは考慮する必要がなかった。   For this reason, most of the rigidity of the optical information recording medium depends on the polycarbonate substrate 20, and since the polycarbonate substrate 20 is sufficiently thick, deformation due to environmental changes (temperature and humidity changes) is very small and occurs in each layer. There was no need to consider the balance of stress and bending moment.

ところが、近年光情報記録媒体の高密度記録再生の高密度化が求められ、高密度化のためにビームスポットを小径化するための対物レンズの高NA化と基板の薄型化が図られる傾向にある。特に、基板厚さとしては、従来の1.2mm厚から、0.6mm厚、0.5mm厚へと半分もしくはそれ以下へと薄くなる傾向がある。基板が薄くなると、当然、光情報記録媒体10の剛性は低下する。   However, in recent years, there has been a demand for high-density recording / reproducing of optical information recording media, and there is a tendency to increase the NA of the objective lens and reduce the thickness of the substrate in order to reduce the beam spot diameter for higher density. is there. In particular, the substrate thickness tends to be reduced to half or less from the conventional 1.2 mm thickness to 0.6 mm thickness and 0.5 mm thickness. Naturally, as the substrate becomes thinner, the rigidity of the optical information recording medium 10 decreases.

このように剛性が低下すると、環境変化(温湿度変化)によって、光情報記録媒体10を形成している各層に発生する応力による変形が大きくなり、情報の記録再生が困難になるという問題が生じる。
したがって、透明基板20が薄くなり剛性が低下した場合においても、できるだけ基板の変形を抑制し、対環境性能の高い光情報記録媒体を提供することが求められている。
When the rigidity is reduced in this way, there is a problem that deformation due to stress generated in each layer forming the optical information recording medium 10 increases due to environmental changes (temperature / humidity changes), making it difficult to record and reproduce information. .
Therefore, even when the transparent substrate 20 is thin and the rigidity is lowered, it is required to suppress the deformation of the substrate as much as possible and provide an optical information recording medium having high environmental performance.

光情報記録媒体の変形を制御する方法として、特許文献1には基板の裏面(薄膜層の形成されていない側の面)に反り防止用の誘電体膜を設ける手法が提案されている。
図5に、この従来の光情報記録媒体の構成を示す断面図を示す。なお、図5において図1と同一部分については同一符号を付している。図5に示すように、ここではポリカーボネート基板20の光入射側に誘電体層60を設けて、透明基板20の両側に位置する薄膜層40と誘電体層60との膨張率を同等にすることで、光情報記録媒体を透明基板20に対して対称構造として、これにより光情報記録媒体の反りを防止できるようにしている。
As a method for controlling the deformation of the optical information recording medium, Patent Document 1 proposes a method of providing a dielectric film for preventing warpage on the back surface of the substrate (the surface on which the thin film layer is not formed).
FIG. 5 is a sectional view showing the structure of this conventional optical information recording medium. 5 that are the same as those in FIG. 1 are denoted by the same reference numerals. As shown in FIG. 5, here, a dielectric layer 60 is provided on the light incident side of the polycarbonate substrate 20, and the expansion rates of the thin film layer 40 and the dielectric layer 60 located on both sides of the transparent substrate 20 are made equal. Thus, the optical information recording medium has a symmetrical structure with respect to the transparent substrate 20 so that the warp of the optical information recording medium can be prevented.

また、特許文献2には、図1と同じ構成で基板の剛性よりも高い剛性の基板保護膜を形成することにより、環境変化時の変形を低減させた光情報記録媒体が記載されている。   Patent Document 2 describes an optical information recording medium in which deformation at the time of environmental change is reduced by forming a substrate protective film having the same configuration as that of FIG. 1 and having a rigidity higher than that of the substrate.

また、特許文献3には、湿度変化による反りを防止することを目的とした情報記録媒体が記載されている。図6に、この特許文献3に記載された情報記録媒体の構成の断面図を示す。
この記録媒体は薄膜保護膜50、薄膜層40、基板20、基板保護膜(誘電体層)30を備え、さらに湿度変化による反りを防止するために、基板20と基板保護膜30との間に、SiO2やAlNからなる透湿防止膜70を設けたものである。なお、図6においては同一部分については同一符号を付している。
Patent Document 3 describes an information recording medium for the purpose of preventing warpage due to a change in humidity. FIG. 6 shows a cross-sectional view of the configuration of the information recording medium described in Patent Document 3.
This recording medium includes a thin film protective film 50, a thin film layer 40, a substrate 20, and a substrate protective film (dielectric layer) 30, and further, between the substrate 20 and the substrate protective film 30 in order to prevent warpage due to a change in humidity. A moisture permeation preventive film 70 made of SiO 2 or AlN is provided. In FIG. 6, the same parts are denoted by the same reference numerals.

さらに、特許文献4には図1に示すような薄膜保護膜50、薄膜層40、基板20、基板保護膜30を有する光情報記録媒体において、薄膜保護膜50よりも小さな透湿度を有する基板保護膜30を形成することにより、湿度変化による反りを小さくした光情報記録媒体が記載されている。
特開平4−195745号公報 特開平11−16211号公報 特開平4−364248号公報 特開2000−311381号公報
Furthermore, Patent Document 4 discloses that an optical information recording medium having a thin film protective film 50, a thin film layer 40, a substrate 20, and a substrate protective film 30 as shown in FIG. An optical information recording medium is described in which a warp due to a change in humidity is reduced by forming a film 30.
JP-A-4-195745 Japanese Patent Laid-Open No. 11-16211 JP-A-4-364248 JP 2000-311381 A

しかしながら、特許文献1に記載の記録媒体も、特許文献3に記載の記録媒体も、基板の光入射側にスパッタ等により誘電体層(60,30)を設ける必要があるため、生産において、基板に対して一方側の面に薄膜層40を形成した後、その基板をひっくり返して反対側の面に誘電体層(60,30)を形成する必要があり、工程が複雑化すると共に生産設備の高価格化を招き、コストアップに繋がるという問題がある。   However, both the recording medium described in Patent Document 1 and the recording medium described in Patent Document 3 require that a dielectric layer (60, 30) be provided on the light incident side of the substrate by sputtering or the like. On the other hand, after forming the thin film layer 40 on one surface, it is necessary to turn the substrate over to form the dielectric layer (60, 30) on the opposite surface, which complicates the process and produces production equipment. There is a problem that this leads to an increase in price and leads to an increase in cost.

また、特許文献2に記載の方法においても、基板保護膜として、プラズマCVD等によりSiO2を基板上に形成する必要があるので、特許文献1と同様の問題がある。
さらに、特許文献3の記載の手法においても基板光入射側にスパッタ等により、AlNやSiO2を設ける必要があるため、特許文献1と同様の理由により問題がある。
The method described in Patent Document 2 also has the same problem as Patent Document 1 because it is necessary to form SiO 2 on the substrate by plasma CVD or the like as a substrate protective film.
Further, the method described in Patent Document 3 also has a problem for the same reason as Patent Document 1 because AlN or SiO 2 needs to be provided on the substrate light incident side by sputtering or the like.

また、特許文献4に記載の手法では、アクリル系、ポリオレフィン系、ポリカーボネート等の透明樹脂からなる基板20を使用する場合、湿度変化時に、ほとんどの場合基板20以上に湿度膨張する樹脂などで作られた薄膜保護膜50が存在するため、変形する現象を完全には防止できないという問題がある。   Further, in the method described in Patent Document 4, when a substrate 20 made of a transparent resin such as acrylic, polyolefin, or polycarbonate is used, it is made of a resin that expands to a humidity higher than the substrate 20 in most cases when the humidity changes. Further, since the thin protective film 50 exists, there is a problem that the phenomenon of deformation cannot be completely prevented.

この発明は、このような課題を解決するためになされたものであって、湿度変化時に伴う変形(反り)をより効果的に抑制できる光情報記録媒体を提供することを課題とする。   The present invention has been made to solve such problems, and an object of the present invention is to provide an optical information recording medium that can more effectively suppress deformation (warpage) associated with changes in humidity.

この発明は、ポリカーボネート、アクリル系樹脂、ポリオレフィン系樹脂のいずれかの樹脂からなる透明基板と、透明基板の一方の表面上に形成された薄膜層と、薄膜層の上に形成された紫外線硬化樹脂からなる薄膜保護膜と、前記透明基板の他方の表面上に薄膜保護膜の膜厚よりも薄く形成された紫外線硬化樹脂からなる基板保護膜とを備えた光情報記録媒体であって、前記薄膜層が、誘電体膜、記録膜及び反射膜の少なくとも一つの層からなる単層膜又は多層膜であり、基板保護膜の湿度膨張係数が、薄膜保護膜の湿度膨張係数よりも大きく、湿度変化時に薄膜保護膜が透明基板に与える曲げモーメントと基板保護膜が透明基板に与える曲げモーメントとが釣り合うことを特徴とする光情報記録媒体を提供するものである。 The present invention relates to a transparent substrate made of any one of polycarbonate, acrylic resin, and polyolefin resin, a thin film layer formed on one surface of the transparent substrate, and an ultraviolet curable resin formed on the thin film layer An optical information recording medium comprising: a thin film protective film comprising: a thin film protective film; and a substrate protective film made of an ultraviolet curable resin formed on the other surface of the transparent substrate to be thinner than a film thickness of the thin film protective film. The layer is a single layer film or a multilayer film composed of at least one of a dielectric film, a recording film and a reflective film, and the humidity expansion coefficient of the substrate protective film is larger than the humidity expansion coefficient of the thin film protective film, and the humidity changes It is an object of the present invention to provide an optical information recording medium characterized in that the bending moment that the thin film protective film sometimes gives to the transparent substrate balances the bending moment that the substrate protective film gives to the transparent substrate.

これによれば、湿度変化時における変形(反り)をより効果的に抑制できる。
ここで、基板保護膜は、1.6×10-5(1/%)以上の湿度膨張係数を有するものを利用することができる。
According to this, deformation (warpage) at the time of humidity change can be more effectively suppressed.
Here, a substrate protective film having a humidity expansion coefficient of 1.6 × 10 −5 (1 /%) or more can be used.

また、温度による膨張を考慮すると、前記基板保護膜の線膨張係数を、前記透明基板の線膨張係数と同等かあるいはより小さくすることが好ましい。
さらに、前記基板保護膜を、透明基板より高い硬度を有するようにすること、透明基板より高い導電性を有するようにすること、短波長領域において80%以上の透過率を有するようにすることの、いずれかあるいはすべてを満たすようにしてもよい。ここで短波長領域とは405nm近辺の波長を意味する。
In consideration of expansion due to temperature, it is preferable that the linear expansion coefficient of the substrate protective film is equal to or smaller than the linear expansion coefficient of the transparent substrate.
Further, the substrate protective film has a higher hardness than the transparent substrate, has a higher conductivity than the transparent substrate, and has a transmittance of 80% or more in a short wavelength region. , Any or all of them may be satisfied. Here, the short wavelength region means a wavelength around 405 nm.

また、この発明は、前記透明基板はポリカーボネート、アクリル系樹脂、ポリオレフィン系樹脂のいずれかの樹脂からなり、前記薄膜保護膜および前記基板保護膜は紫外線硬化樹脂からなることを特徴とする。   In the invention, the transparent substrate is made of any one of polycarbonate, acrylic resin, and polyolefin resin, and the thin film protective film and the substrate protective film are made of an ultraviolet curable resin.

この発明において、湿度膨張係数とは、温度一定(25℃)時に、対象物周辺の相対湿度が上昇した場合の単位長あたりの伸び量を、湿度1%あたりの湿度膨張率に換算したものである。
前記透明基板の材料は、たとえばポリカーボネートまたはポリオレフィンを用いることができる。また、媒体の反りを効果的に防止するために、前記基板保護膜及び薄膜保護膜は、前記した湿度膨張係数の関係を満たすような材料で形成されるが、たとえば紫外線(UV)硬化樹脂、特に、ポリエステルアクリレート、エポキシアクリレート、ウレタンアクリレート、またはポリエーテルアクリレートなどを主成分とする紫外線硬化樹脂で形成することができる。
また、基板保護膜の材質としては、湿度膨張係数をできるだけ大きなものを用いるという観点からは、親水性に富んだ成分を多く含むものが好ましい。
In the present invention, the humidity expansion coefficient is obtained by converting the amount of elongation per unit length when the relative humidity around the object is increased at a constant temperature (25 ° C.) into a humidity expansion coefficient per 1% humidity. is there.
For example, polycarbonate or polyolefin can be used as the material of the transparent substrate. Further, in order to effectively prevent the warp of the medium, the substrate protective film and the thin film protective film are formed of a material that satisfies the relationship of the above-described humidity expansion coefficient. For example, an ultraviolet (UV) curable resin, In particular, it can be formed of an ultraviolet curable resin mainly composed of polyester acrylate, epoxy acrylate, urethane acrylate, or polyether acrylate.
Moreover, as a material for the substrate protective film, a material containing a lot of hydrophilic components is preferable from the viewpoint of using a material having a humidity expansion coefficient as large as possible.

(1)光情報記録媒体の透明基板上に、薄膜保護膜より大きな湿度膨張係数を持つ基板保護膜を形成しているので、湿度変化時における反りを抑制でき、記録再生の信頼性を高めることができる。
(2)基板保護膜の線膨張係数を、透明基板の線膨張係数と同等かそれより小さくしているので、温度変化時における反りを悪化させることなく、湿度変化時における反りを抑制でき、記録再生の信頼性を高めることができる。
(3)透明基板の硬度より高い硬度を有する基板保護膜を設けることにより、基板表面に傷が入り難くなり、記録再生の信頼性を高めることができる。
(4)透明基板の導電率より高い導電率を有する基板保護膜を設けることにより、粉塵等のゴミが付着し難くなり、記録再生の信頼性を高めることができる。
(5)短波長領域における透過率が高い基板保護膜を設けることにより、信号の記録再生時に青色レーザ等の短波長レーザが使用可能となり、信頼性の高い高密度記録ができる。
(1) Since a substrate protective film having a larger coefficient of humidity expansion than that of the thin film protective film is formed on the transparent substrate of the optical information recording medium, it is possible to suppress warpage when the humidity changes and to improve the reliability of recording and reproduction. Can do.
(2) Since the linear expansion coefficient of the substrate protective film is equal to or smaller than the linear expansion coefficient of the transparent substrate, the warpage at the time of humidity change can be suppressed without deteriorating the warpage at the time of temperature change, and recording. The reliability of reproduction can be increased.
(3) By providing a substrate protective film having a hardness higher than that of the transparent substrate, the substrate surface is less likely to be damaged, and the reliability of recording and reproduction can be improved.
(4) By providing a substrate protective film having a conductivity higher than that of the transparent substrate, dust and other dusts are less likely to adhere, and the reliability of recording and reproduction can be improved.
(5) By providing a substrate protective film having a high transmittance in the short wavelength region, a short wavelength laser such as a blue laser can be used during signal recording and reproduction, and high-density recording with high reliability can be achieved.

以下、図面に示す実施の形態に基づいてこの発明を詳述する。なお、これによってこの発明が限定されるものではない。
この発明で対象となる光情報記録媒体は、図1に示すものとほぼ同様の外観構成を有する。
The present invention will be described in detail below based on the embodiments shown in the drawings. However, this does not limit the present invention.
The optical information recording medium that is the subject of the present invention has an appearance configuration substantially similar to that shown in FIG.

たとえば、ポリカーボネート、アクリル系やポリオレフィン系等の樹脂からなる透明基板20上に、スパッタ等により、第1、第2誘電体膜41,43(窒化シリコン等)、記録膜42(TbFeCo等)、反射膜44(Al等)等の薄膜からなる単層、又は多層の薄膜層40を形成し、さらに該薄膜層40の上に樹脂を主成分とする薄膜保護膜50を形成し、該透明基板20の反対の面上に透明基板20を保護するために樹脂を主成分とする基板保護膜30が形成されたものである。
ここで、透明基板20の厚さは0.5mm、薄膜層40の厚さは48nm、薄膜保護膜50の厚さは15μm、基板保護膜30の厚さは5μm程度とする。
For example, the first and second dielectric films 41 and 43 (silicon nitride, etc.), the recording film 42 (TbFeCo, etc.), the reflection, etc. are sputtered on the transparent substrate 20 made of polycarbonate, acrylic resin, polyolefin resin or the like. A single-layer or multi-layer thin film layer 40 made of a thin film such as a film 44 (Al or the like) is formed, and a thin film protective film 50 mainly composed of a resin is formed on the thin film layer 40, and the transparent substrate 20 In order to protect the transparent substrate 20 on the opposite surface, a substrate protective film 30 mainly composed of a resin is formed.
Here, the transparent substrate 20 has a thickness of 0.5 mm, the thin film layer 40 has a thickness of 48 nm, the thin film protective film 50 has a thickness of 15 μm, and the substrate protective film 30 has a thickness of about 5 μm.

このように各層は異なる材質であり、膜厚も異なるので、各層の物性値である湿度膨張係数が異なり、湿度変化時に各層に発生する応力も異なる。図1の構成の場合、一般的には基板保護膜30、及び薄膜保護膜50の湿度膨張係数は、透明基板20や単層、又は多層の薄膜層40のそれに比較して大きく、透明基板20や単層、又は多層の薄膜層40の基板半径方向への膨張は、その他の各層に比較して非常に小さくなる。   Since each layer is made of a different material and has a different thickness, the humidity expansion coefficient, which is a physical property value of each layer, is different, and the stress generated in each layer when the humidity is changed is also different. In the case of the configuration of FIG. 1, the humidity expansion coefficient of the substrate protective film 30 and the thin film protective film 50 is generally larger than that of the transparent substrate 20, single layer, or multilayer thin film layer 40. In addition, the expansion of the single-layer or multi-layer thin film layer 40 in the radial direction of the substrate is very small as compared with the other layers.

このため、湿度変化時の変形の原因は、基板保護膜30と薄膜保護膜50の膨張率と各膜厚が支配的になり易い。また、基板保護膜30は、光入射面側にあることから、レーザの透過性や膜厚分布等にも様々な制約を受けるので、薄膜保護膜50より薄く形成される。
一般的に、湿度が上昇した場合、両表面の膜の材料が同じであれば膜厚が厚い方が薄いものよりも発生する応力が大きいので、膜厚が薄い膜が形成された面側に反りが生じる。
For this reason, the cause of deformation when the humidity changes is likely to be dominated by the expansion rates and the respective film thicknesses of the substrate protective film 30 and the thin film protective film 50. In addition, since the substrate protective film 30 is on the light incident surface side, the substrate protective film 30 is formed thinner than the thin film protective film 50 because it is subject to various restrictions on the laser transmission and film thickness distribution.
Generally, when the humidity rises, if the material of the film on both surfaces is the same, the thicker the film, the greater the stress generated than the thinner film. Warping occurs.

したがって、この発明では、基板保護膜30が薄膜保護膜50よりも薄いので、図2のように湿度変化時において、光情報記録媒体10は、その半径方向に垂直であり、媒体の厚さ方向の基板保護膜30の形成面側に反りが生じやすい。
図2において、左側方向に反るときの反り角(θ)を正(+)の方向とすると、この場合は、反り角が負の方向となるように反りが生じることになる。
Therefore, in the present invention, since the substrate protective film 30 is thinner than the thin film protective film 50, the optical information recording medium 10 is perpendicular to the radial direction when the humidity changes as shown in FIG. Warp tends to occur on the side of the surface where the substrate protective film 30 is formed.
In FIG. 2, assuming that the warp angle (θ) when warping in the left direction is a positive (+) direction, the warp occurs in such a manner that the warp angle becomes a negative direction.

そこで、この負の方向への反りを抑制するために、この発明では、膜厚の薄い基板保護膜30の湿度膨張係数を、薄膜保護膜50の湿度膨張係数よりも大きくなるように、両保護膜を形成する。たとえば、薄膜保護膜50の湿度膨張係数を1.6×10-5[1/%]程度とした場合、基板保護膜30の湿度膨張係数は、これ以上の数値を持つものを採用すればよい。
これによれば、湿度変化時に薄膜保護膜50が透明基板20に与える曲げモーメントと基板保護膜30が透明基板20に与える逆向きの曲げモーメントとを釣り合わすことが可能となる。
Therefore, in order to suppress the warping in the negative direction, in the present invention, both protections are performed so that the humidity expansion coefficient of the thin substrate protective film 30 is larger than the humidity expansion coefficient of the thin film protective film 50. A film is formed. For example, when the humidity expansion coefficient of the thin film protective film 50 is set to about 1.6 × 10 −5 [1 /%], the humidity expansion coefficient of the substrate protective film 30 may be a value having a value larger than this. .
According to this, it is possible to balance the bending moment that the thin film protective film 50 gives to the transparent substrate 20 and the reverse bending moment that the substrate protective film 30 gives to the transparent substrate 20 when the humidity changes.

ところで、基板保護膜30の線膨張係数が透明基板20のそれよりも大きい場合は、温度変化時において、基板保護膜30が無い時に比較して、湿度変化時と反対方向(反り角が正の場合)に反りが生じ易い。
この点を考慮すれば、基板保護膜30の線膨張係数は、透明基板20の線膨張係数と同等であるか、またはより小さいことが好ましい。たとえば、透明基板20の線膨張係数を6.6×10-5[1/℃]とした場合、基板保護膜30の線膨張係数を6.3×10-5[1/℃]程度とすればよい。
By the way, when the linear expansion coefficient of the substrate protective film 30 is larger than that of the transparent substrate 20, when the temperature changes, compared to when the substrate protective film 30 is not present, the direction opposite to the humidity change (the warp angle is positive). Warp easily).
Considering this point, the linear expansion coefficient of the substrate protective film 30 is preferably equal to or smaller than the linear expansion coefficient of the transparent substrate 20. For example, when the linear expansion coefficient of the transparent substrate 20 is 6.6 × 10 −5 [1 / ° C.], the linear expansion coefficient of the substrate protective film 30 is about 6.3 × 10 −5 [1 / ° C.]. That's fine.

また、基板保護膜30本来の役割を果たすのに必要な条件でもあるが、表面に傷がつくのを防止するために基板保護膜30の硬度を透明基板20よりも高くすることが好ましい。
また、粉塵等のゴミの付着を防止するために、基板保護膜30は、透明基板20よりも導電性が高いことが好ましい。
さらに、高密度記録をする場合、主として短波長レーザが用いられるが、高密度記録の十分な信頼性を確保するために、波長405nm程度の短波長レーザの領域において、高い透過率(たとえば80%程度)を有する基板保護膜30を利用することが好ましい。
In addition, although it is a necessary condition for fulfilling the original role of the substrate protective film 30, it is preferable to make the hardness of the substrate protective film 30 higher than that of the transparent substrate 20 in order to prevent the surface from being damaged.
In addition, the substrate protective film 30 preferably has higher conductivity than the transparent substrate 20 in order to prevent dust and other dust from adhering.
Further, in the case of high density recording, a short wavelength laser is mainly used. However, in order to ensure sufficient reliability of high density recording, a high transmittance (for example, 80%) in the region of a short wavelength laser having a wavelength of about 405 nm. It is preferable to use a substrate protective film 30 having a degree of

したがって、温度変化による反りに悪影響を与えることなく、湿度変化時の反りを抑制するためには、基板保護膜30の湿度膨張係数を薄膜保護膜50の湿度膨張係数よりも大きくした上で、さらに基板保護膜30の線膨張係数、硬度、導電性及び短波長領域での透過率の条件を満たすことが好ましい。   Therefore, in order to suppress the warpage when the humidity changes without adversely affecting the warp due to the temperature change, the humidity expansion coefficient of the substrate protective film 30 is made larger than the humidity expansion coefficient of the thin film protective film 50, and further It is preferable to satisfy the conditions of the linear expansion coefficient, hardness, conductivity, and transmittance in the short wavelength region of the substrate protective film 30.

次に、この発明の光情報記録媒体の一実施例について説明する。
この発明の一実施例の光情報記録媒体として、前記したように図1に示すのと同様な層構造を持つものを作製した。すなわち、光の照射方向から見て、基板保護膜30、透明基板20、薄膜層40(誘電体膜41、記録膜42、誘電体膜43、反射膜44)、及び薄膜保護膜50の順に積層された媒体を作製した。
比較のために、基板保護膜30を用いない媒体1と、基板保護膜30を形成したこの発明の一実施例である媒体2とを作製した。
図7に、両媒体の構成部材の材質と厚さを示す。
Next, an embodiment of the optical information recording medium of the present invention will be described.
As described above, an optical information recording medium according to an embodiment of the present invention was manufactured having the same layer structure as shown in FIG. That is, the substrate protective film 30, the transparent substrate 20, the thin film layer 40 (the dielectric film 41, the recording film 42, the dielectric film 43, the reflective film 44), and the thin film protective film 50 are stacked in this order when viewed from the light irradiation direction. The prepared media was produced.
For comparison, a medium 1 that does not use the substrate protective film 30 and a medium 2 that is an embodiment of the present invention in which the substrate protective film 30 is formed were produced.
FIG. 7 shows the material and thickness of the constituent members of both media.

ここで、薄膜保護膜50には、樹脂の中でも、比較的湿度膨張係数が小さく、湿度変化による反り角の変化量も小さいと考えられる、膜厚15μm程度のUV硬化樹脂を用いた。透明基板20には、厚さ0.5mm程度のポリオレフィン系樹脂を用いた。また、薄膜層40は、前記したように多層膜でも形成できるが、反りの原因として、誘電体膜41、43が最も影響が大きいので、この実施例では、膜厚48nm程度のAlNからなる単層膜を用いた。   Here, a UV curable resin having a film thickness of about 15 μm, which is considered to have a relatively small humidity expansion coefficient and a small amount of change in the warping angle due to a change in humidity, is used for the thin film protective film 50. For the transparent substrate 20, a polyolefin resin having a thickness of about 0.5 mm was used. The thin film layer 40 can also be formed as a multilayer film as described above. However, since the dielectric films 41 and 43 have the greatest influence as a cause of warping, in this embodiment, a single layer made of AlN having a film thickness of about 48 nm is used. A layer film was used.

媒体1及び2の薄膜保護膜50はどちらも同じ材質のUV硬化樹脂1を用いた。媒体2の基板保護膜30は、薄膜保護膜50とその湿度膨張係数が異なるUV硬化樹脂2を用いた。特に前記したように、基板保護膜30の湿度膨張係数は、薄膜保護膜50よりも大きくした方がよいので、ここでは、薄膜保護膜50のUV硬化樹脂1の湿度膨張係数は1.6×10-5[1/%]であり、基板保護膜30のUV硬化樹脂2の湿度膨張係数は2.5×10-5[1/%]とする。 Both the thin film protective films 50 of the media 1 and 2 used the UV curable resin 1 made of the same material. As the substrate protective film 30 of the medium 2, the UV curable resin 2 having a humidity expansion coefficient different from that of the thin film protective film 50 is used. In particular, as described above, the humidity expansion coefficient of the substrate protective film 30 is preferably larger than that of the thin film protective film 50. Therefore, here, the humidity expansion coefficient of the UV curable resin 1 of the thin film protective film 50 is 1.6 ×. 10 −5 [1 /%], and the humidity expansion coefficient of the UV curable resin 2 of the substrate protective film 30 is 2.5 × 10 −5 [1 /%].

さらに、透明基板20であるポリオレフィン系樹脂の線膨張係数は6.6×10-5[1/℃]とし、基板保護膜30であるUV硬化樹脂2の線膨張係数は透明基板20よりもわずかに小さい6.3×10-5[1/℃]とする。
また、媒体1,2のどちらも、内径を7mm、外径を50mmとした円形媒体を用いた。
Furthermore, the linear expansion coefficient of the polyolefin resin that is the transparent substrate 20 is 6.6 × 10 −5 [1 / ° C.], and the linear expansion coefficient of the UV curable resin 2 that is the substrate protective film 30 is slightly smaller than that of the transparent substrate 20. 6.3 × 10 −5 [1 / ° C.].
Both media 1 and 2 were circular media having an inner diameter of 7 mm and an outer diameter of 50 mm.

図3に、この2つの媒体について、主として湿度変化に対する反り角(θ)の経時変化を比較したグラフを示す。
これは、温度及び湿度を、(23℃、50%)から(38℃、90%)まで変化したときのグラフである。また、測定した反り角(θ)は、媒体の外周部、すなわち中心から半径(r=)22mmの位置におけるものである。このグラフにおいて、黒丸は、この発明の媒体2の反り角(θ)の実測値であり、白丸は媒体1の反り角(θ)の実測値である。また実線は温度、破線は湿度である。
FIG. 3 shows a graph comparing the temporal change of the warp angle (θ) with respect to the humidity change for these two media.
This is a graph when the temperature and humidity are changed from (23 ° C., 50%) to (38 ° C., 90%). Further, the measured warp angle (θ) is at the outer peripheral portion of the medium, that is, at a position of a radius (r =) 22 mm from the center. In this graph, the black circle is an actual measurement value of the warp angle (θ) of the medium 2 of the present invention, and the white circle is an actual measurement value of the warp angle (θ) of the medium 1. The solid line is temperature, and the broken line is humidity.

図3によれば、この発明の媒体2では、湿度が変化しても反り角の変化はほとんどないが、基板保護膜30のない媒体1は、湿度が大きく上昇すると、反り角も大きく変化していることがわかる。この媒体1の反り角の変化量Δθ1は約4[mrad]であるのに対し、この発明の媒体2の反り角の変化量Δθ2はほぼ0に等しく、高々0.5[mrad]である。
すなわち、図3より、湿度膨張係数の大きな基板保護膜30を形成した方が、全く形成しない場合よりも、反りを抑制できることがわかる。
According to FIG. 3, in the medium 2 of the present invention, there is almost no change in the warp angle even when the humidity changes, but in the medium 1 without the substrate protective film 30, the warp angle also changes greatly when the humidity increases greatly. You can see that The change amount Δθ1 of the warp angle of the medium 1 is about 4 [mrad], whereas the change amount Δθ2 of the warp angle of the medium 2 of the present invention is substantially equal to 0 and is 0.5 [mrad] at most.
That is, it can be seen from FIG. 3 that the formation of the substrate protective film 30 having a large humidity expansion coefficient can suppress the warpage compared to the case where it is not formed at all.

図4に、この2つの媒体について、主として、温度変化に対する反り角(θ)の経時変化を比較したグラフを示す。
これは、温度及び湿度を、(23℃、45%)から(65℃、25%)まで変化したときのグラフである。また、反り角(θ)の測定部位は、図3と同じである。
FIG. 4 shows a graph comparing mainly the change with time of the warp angle (θ) with respect to the temperature change for these two media.
This is a graph when the temperature and humidity are changed from (23 ° C., 45%) to (65 ° C., 25%). Moreover, the measurement site | part of curvature angle ((theta)) is the same as FIG.

図4によれば、大きく温度が変化した場合でも、反り角(θ)の変化量は、どちらの媒体でもほとんど差がないことがわかる。
このように反り角(θ)の変化量にほとんど差がないことは、基板保護膜30と透明基板20の線膨張係数を同等とした場合でも、同じである。
すなわち、この発明の媒体2では、線膨張係数が、透明基板20と同等かあるいは小さい基板保護膜30を用いているので、温度変化によって反りを悪化させることはないことがわかる。
According to FIG. 4, it can be seen that even when the temperature changes greatly, the amount of change in the warp angle (θ) is almost the same in either medium.
The fact that there is almost no difference in the amount of change in the warp angle (θ) is the same even when the linear expansion coefficients of the substrate protective film 30 and the transparent substrate 20 are made equal.
That is, in the medium 2 of the present invention, since the substrate protective film 30 having a linear expansion coefficient equal to or smaller than that of the transparent substrate 20 is used, it can be understood that the warp is not deteriorated by the temperature change.

以上の結果より、この発明では、薄膜保護膜の湿度膨張係数より大きな湿度膨張係数を有し、さらに透明基板と同等であるかより小さい線膨張係数を有する基板保護膜を透明基板上に形成しているので、温度変化による反り角の変化を悪化させることなしに、湿度変化時における反り角を小さくすることができることがわかる。   From the above results, in the present invention, a substrate protective film having a humidity expansion coefficient larger than that of the thin film protective film and having a linear expansion coefficient equal to or smaller than that of the transparent substrate is formed on the transparent substrate. Therefore, it can be seen that the warp angle at the time of humidity change can be reduced without deteriorating the change of the warp angle due to temperature change.

この発明の光情報記録媒体の構成を示す断面図である。It is sectional drawing which shows the structure of the optical information recording medium of this invention. 光情報記録媒体の変形状態の説明図である。It is explanatory drawing of the deformation | transformation state of an optical information recording medium. 2つの媒体の湿度変化時における反り角の経時変化の比較図である。It is a comparison figure of the time-dependent change of the curvature angle at the time of the humidity change of two media. 2つの媒体の温度変化時における反り角の経時変化の比較図である。It is a comparison figure of the time-dependent change of the curvature angle at the time of the temperature change of two media. 従来の光情報記録媒体の構成を示す断面図である。It is sectional drawing which shows the structure of the conventional optical information recording medium. 従来の光情報記録媒体の構成を示す断面図である。It is sectional drawing which shows the structure of the conventional optical information recording medium. 2つの媒体の構成部材の材質と厚さの比較図である。It is a comparison figure of the material and thickness of the structural member of two media. 従来の光情報記録媒体の平面図及び側面図である。It is the top view and side view of the conventional optical information recording medium.

符号の説明Explanation of symbols

10:光情報記録媒体
20:基板
30:基板保護膜
40:薄膜層
41:第1誘電体膜
42:記録膜
43:第2誘電体膜
44:反射膜
50:薄膜保護膜
60:誘電体膜
70:透湿防止膜
10: Optical information recording medium 20: Substrate 30: Substrate protective film 40: Thin film layer 41: First dielectric film 42: Recording film 43: Second dielectric film 44: Reflective film 50: Thin film protective film 60: Dielectric film 70: Moisture permeation prevention film

Claims (5)

ポリカーボネート、アクリル系樹脂、ポリオレフィン系樹脂のいずれかの樹脂からなる透明基板と、透明基板の一方の表面上に形成された薄膜層と、薄膜層の上に形成された紫外線硬化樹脂からなる薄膜保護膜と、前記透明基板の他方の表面上に薄膜保護膜の膜厚よりも薄く形成された紫外線硬化樹脂からなる基板保護膜とを備えた光情報記録媒体であって、
前記薄膜層が、誘電体膜、記録膜及び反射膜の少なくとも一つの層からなる単層膜又は多層膜であり、基板保護膜の湿度膨張係数が、薄膜保護膜の湿度膨張係数よりも大きく、湿度変化時に薄膜保護膜が透明基板に与える曲げモーメントと基板保護膜が透明基板に与える曲げモーメントとが釣り合うことを特徴とする光情報記録媒体。
Transparent substrate made of polycarbonate, acrylic resin or polyolefin resin , thin film layer formed on one surface of transparent substrate, and thin film protection made of UV curable resin formed on the thin film layer An optical information recording medium comprising a film and a substrate protective film made of an ultraviolet curable resin formed on the other surface of the transparent substrate to be thinner than the film thickness of the thin film protective film,
The thin film layer is a single layer film or a multilayer film composed of at least one of a dielectric film, a recording film, and a reflective film, and the humidity expansion coefficient of the substrate protective film is larger than the humidity expansion coefficient of the thin film protective film, An optical information recording medium characterized in that the bending moment given to the transparent substrate by the thin film protective film when the humidity changes is balanced with the bending moment given to the transparent substrate by the substrate protective film.
前記基板保護膜の線膨張係数が、前記透明基板の線膨張係数と同等かあるいはより小さいことを特徴とする請求項1の光情報記録媒体。   2. The optical information recording medium according to claim 1, wherein a linear expansion coefficient of the substrate protective film is equal to or smaller than a linear expansion coefficient of the transparent substrate. 前記基板保護膜が、前記透明基板より高い硬度を有することを特徴とする請求項1の光情報記録媒体。   The optical information recording medium according to claim 1, wherein the substrate protective film has a hardness higher than that of the transparent substrate. 前記基板保護膜が、前記透明基板より高い導電性を有することを特徴とする請求項1の光情報記録媒体。   The optical information recording medium according to claim 1, wherein the substrate protective film has higher conductivity than the transparent substrate. 前記基板保護膜が、短波長領域において80%以上の透過率を有することを特徴とする請求項1の光情報記録媒体。   2. The optical information recording medium according to claim 1, wherein the substrate protective film has a transmittance of 80% or more in a short wavelength region.
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