JP3987554B2 - 高反復率のフェムト秒再生増幅装置 - Google Patents
高反復率のフェムト秒再生増幅装置 Download PDFInfo
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- JP3987554B2 JP3987554B2 JP2006000291A JP2006000291A JP3987554B2 JP 3987554 B2 JP3987554 B2 JP 3987554B2 JP 2006000291 A JP2006000291 A JP 2006000291A JP 2006000291 A JP2006000291 A JP 2006000291A JP 3987554 B2 JP3987554 B2 JP 3987554B2
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- 230000001172 regenerating effect Effects 0.000 claims description 53
- 239000006185 dispersion Substances 0.000 claims description 36
- 230000003321 amplification Effects 0.000 claims description 33
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 15
- 238000005086 pumping Methods 0.000 claims description 12
- 239000005304 optical glass Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 description 24
- 238000007906 compression Methods 0.000 description 12
- 230000006835 compression Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 230000010287 polarization Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 108010076504 Protein Sorting Signals Proteins 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/162—Solid materials characterised by an active (lasing) ion transition metal
- H01S3/1625—Solid materials characterised by an active (lasing) ion transition metal titanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1631—Solid materials characterised by a crystal matrix aluminate
- H01S3/1636—Al2O3 (Sapphire)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/235—Regenerative amplifiers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
13 連続波アルゴンレーザ
15 第1ビームスプリッタ
17,25,47 反射ミラー
21 共振器
22 ブラッグセル(音響光学的変調器)
23 Ti:S利得媒質
24 Qスイッチ
31 平面ミラー
32 第1プリズムセット
34 第2プリズムセット
41 偏光ビームスプリッタ
43 ファラディ回転子
45 1/2波長板
200 拡大器
202 第1ピックアップミラー
205 第1プリズム
207 第2プリズム
210 第1ミラー
212 第2ミラー
215 第2ピックアップミラー
217 第1回折格子
220 第2回折格子
222 第3ミラー
225 第4ミラー
230 第1テレスコープ
232,235,245,390 ミラー
240 ビームスプリッタ
242 ファラディ孤立系
20,300 再生増幅器
302 ピックアップミラー
305 第1チャープミラー
307 第2チャープミラー
310 第5ミラー
315 音響光学的変調器
317 第6ミラー
320 第3チャープミラー
322 第7ミラー
325 利得媒質
327 第8ミラー
330 第4チャープミラー
350 ポンプレーザ
353 第2テレスコープ
355 第1反射ミラー
357 第2反射ミラー
360 レンズ
30,400 圧縮器
CM1,CM2,CM3 曲率ミラー
RM 再集束ミラー
Claims (8)
- フェムト秒パルスを放出するレーザ発振器と、
前記パルスにダウンチャープ増幅方式により負の分散を与えてパルスの幅を拡大する拡大器と、
20〜200kHzの反復率パルススイッチングのための音響光学的変調器、Ti:S結晶より構成された利得媒質、利得媒質を高反復率でポンピングするためのパルス型ポンプレーザ、複数のミラーを介してパルスを往復させる共振器、及び負の分散を与える少なくとも1つのチャープミラーを備え、前記共振器の往復時累積される正の分散を補償することによりダウンチャープ増幅方式で発生するパルス幅減少効果を相殺しつつ前記パルスを増幅させる再生増幅器と、
光学ガラスブロックを用いて前記パルスを圧縮する圧縮器とを備える高反復率のフェムト秒再生増幅装置。 - 前記ポンプレーザは、高反復率パルス型緑色レーザにより構成されることを特徴とする請求項1に記載の高反復率のフェムト秒再生増幅装置。
- 前記ポンプレーザは、周波数倍化されたNd:YAGレーザまたはNd:YVO4レーザにより構成されることを特徴とする請求項2に記載の高反復率のフェムト秒再生増幅装置。
- 前記レーザ発振器は、Ti:Sフェムト秒レーザ、あるいはTi:S利得媒質の650〜1,100nm波長範囲でフェムト秒パルスを発生させることができるレーザにより構成されることを特徴とする請求項1に記載の高反復率のフェムト秒再生増幅装置。
- 前記拡大器は、一対以上のプリズムと一対以上の対面する回折格子とを備えることを特徴とする請求項1から請求項4のうちいずれか1項に記載の高反復率のフェムト秒再生増幅装置。
- 前記拡大器と圧縮器とにより二次分散及び三次分散を補償することによってパルス幅を圧縮することを特徴とする請求項1から請求項4のうちいずれか1項に記載の高反復率のフェムト秒再生増幅装置。
- 前記圧縮器から圧縮されるパルスの最小パルス幅が50フェムト秒以下になることを特徴とする請求項6に記載の高反復率のフェムト秒再生増幅装置。
- 前記圧縮器から出力されるパルスが20〜100kHzの反復率を有するとき、パルス当たり20μJ以上のエネルギーを発生させることを特徴とする請求項1から請求項4のうちいずれか1項に記載の高反復率のフェムト秒再生増幅装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050105068 | 2005-11-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007129174A JP2007129174A (ja) | 2007-05-24 |
JP3987554B2 true JP3987554B2 (ja) | 2007-10-10 |
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JP2006000291A Expired - Fee Related JP3987554B2 (ja) | 2005-11-03 | 2006-01-04 | 高反復率のフェムト秒再生増幅装置 |
Country Status (2)
Country | Link |
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US (1) | US7630416B2 (ja) |
JP (1) | JP3987554B2 (ja) |
Families Citing this family (34)
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US8921733B2 (en) | 2003-08-11 | 2014-12-30 | Raydiance, Inc. | Methods and systems for trimming circuits |
US9022037B2 (en) | 2003-08-11 | 2015-05-05 | Raydiance, Inc. | Laser ablation method and apparatus having a feedback loop and control unit |
US8135050B1 (en) | 2005-07-19 | 2012-03-13 | Raydiance, Inc. | Automated polarization correction |
US8232687B2 (en) | 2006-04-26 | 2012-07-31 | Raydiance, Inc. | Intelligent laser interlock system |
US8189971B1 (en) | 2006-01-23 | 2012-05-29 | Raydiance, Inc. | Dispersion compensation in a chirped pulse amplification system |
US9130344B2 (en) | 2006-01-23 | 2015-09-08 | Raydiance, Inc. | Automated laser tuning |
US7444049B1 (en) | 2006-01-23 | 2008-10-28 | Raydiance, Inc. | Pulse stretcher and compressor including a multi-pass Bragg grating |
US7822347B1 (en) | 2006-03-28 | 2010-10-26 | Raydiance, Inc. | Active tuning of temporal dispersion in an ultrashort pulse laser system |
US7813035B2 (en) * | 2006-05-18 | 2010-10-12 | Polaronyx, Inc. | Nonlinearity and dispersion management for pulse reshaping in high energy fiber amplifier |
FR2903819B1 (fr) * | 2006-07-11 | 2008-08-22 | Thales Sa | Dispositif d'etirement et de controle spectral pour lasers impulsionnels a forte puissance crete |
JP2009032916A (ja) * | 2007-07-27 | 2009-02-12 | Fujifilm Corp | 分散補償器およびそれを用いた固体レーザ装置並びに分散補償方法 |
US7903326B2 (en) | 2007-11-30 | 2011-03-08 | Radiance, Inc. | Static phase mask for high-order spectral phase control in a hybrid chirped pulse amplifier system |
TWI331945B (en) * | 2007-12-17 | 2010-10-21 | Ind Tech Res Inst | Method and system pf controlled optical beam for mold fabrication by ultra-fast laser technique |
US8498538B2 (en) | 2008-11-14 | 2013-07-30 | Raydiance, Inc. | Compact monolithic dispersion compensator |
TWI408912B (zh) * | 2009-12-04 | 2013-09-11 | Univ Ishou | Optical fiber communication method and transmitting device |
US8279901B2 (en) * | 2010-02-24 | 2012-10-02 | Alcon Lensx, Inc. | High power femtosecond laser with adjustable repetition rate and simplified structure |
US9054479B2 (en) * | 2010-02-24 | 2015-06-09 | Alcon Lensx, Inc. | High power femtosecond laser with adjustable repetition rate |
US8953651B2 (en) * | 2010-02-24 | 2015-02-10 | Alcon Lensx, Inc. | High power femtosecond laser with repetition rate adjustable according to scanning speed |
CN101950115B (zh) * | 2010-09-01 | 2012-05-23 | 天津大学 | 多通脉冲压缩器及其使用方法 |
WO2012037468A1 (en) | 2010-09-16 | 2012-03-22 | Raydiance, Inc. | Singulation of layered materials using selectively variable laser output |
US8537866B2 (en) * | 2011-05-20 | 2013-09-17 | Calmar Optcom, Inc. | Generating laser pulses of narrow spectral linewidth based on chirping and stretching of laser pulses and subsequent power amplification |
US10239160B2 (en) | 2011-09-21 | 2019-03-26 | Coherent, Inc. | Systems and processes that singulate materials |
JP5818084B2 (ja) * | 2011-09-22 | 2015-11-18 | アイシン精機株式会社 | テラヘルツ波発生検出装置、およびフェムト秒レーザ発生装置 |
WO2013066631A1 (en) * | 2011-10-18 | 2013-05-10 | The General Hospital Corporation | Apparatus and methods for producing and/or providing recirculating optical delay(s) |
US8649188B2 (en) | 2011-10-31 | 2014-02-11 | General Electric Company | Solid state pulsed power generator |
US8908739B2 (en) | 2011-12-23 | 2014-12-09 | Alcon Lensx, Inc. | Transverse adjustable laser beam restrictor |
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JP6202316B2 (ja) * | 2013-10-17 | 2017-09-27 | 国立研究開発法人産業技術総合研究所 | チャープパルス増幅装置 |
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2006
- 2006-01-04 JP JP2006000291A patent/JP3987554B2/ja not_active Expired - Fee Related
- 2006-06-22 US US11/425,840 patent/US7630416B2/en not_active Expired - Fee Related
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Publication number | Publication date |
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US20070098025A1 (en) | 2007-05-03 |
JP2007129174A (ja) | 2007-05-24 |
US7630416B2 (en) | 2009-12-08 |
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