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JP3951157B2 - Metal mask plate cleaning method - Google Patents

Metal mask plate cleaning method Download PDF

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Publication number
JP3951157B2
JP3951157B2 JP19944298A JP19944298A JP3951157B2 JP 3951157 B2 JP3951157 B2 JP 3951157B2 JP 19944298 A JP19944298 A JP 19944298A JP 19944298 A JP19944298 A JP 19944298A JP 3951157 B2 JP3951157 B2 JP 3951157B2
Authority
JP
Japan
Prior art keywords
cleaning
tank
cleaning liquid
metal mask
mask plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19944298A
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Japanese (ja)
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JPH11348243A (en
Inventor
英夫 古海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tietech Co Ltd
Original Assignee
Tietech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tietech Co Ltd filed Critical Tietech Co Ltd
Priority to JP19944298A priority Critical patent/JP3951157B2/en
Publication of JPH11348243A publication Critical patent/JPH11348243A/en
Application granted granted Critical
Publication of JP3951157B2 publication Critical patent/JP3951157B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、メタルマスク版全体を洗浄槽に溜めた洗浄液に漬けた状態にて、超音波洗浄する方法の改良発明に係わるものであり、メタルマスク版洗浄方法に関する。
【0002】
【従来の技術】
メタルマスク版(以後、メタル版とも称する)全体を洗浄液中にドブンと漬ける、いわゆるドブ漬けした状態で超音波洗浄する装置が知られ、使われてきている。
従来、洗浄槽中で洗浄液にメタル版をドブ漬けして、超音波洗浄した後の洗浄液には、クリームハンダの滓(残滓)やメタル版から剥離した各種の汚れが、特に洗浄液表面付近に、浮遊しており、洗浄液を洗浄槽底部のバルブから(洗浄液タンクへ)落と(排出)すると、それらの残滓または汚れがメタル版に付着してしまう、という問題点があった。
【0003】
【発明が解決しようとする課題】
本発明は、従来の技術の有する問題点に鑑み、成されたもので、その目的とするところは、ドブ漬け超音波洗浄方式のメタル版洗浄装置において、通常の従来の超音波洗浄工程後、メタル版に付着してくる残滓または汚れを洗い流すことのできるメタルマスク版洗浄方法を提供することにある。
【0004】
本発明に係わる請求項1のメタルマスク版洗浄方法は、上記した課題を解決したもので、次のようなものである。
【0006】
洗浄液タンクから洗浄槽へ洗浄液をポンプで送り出し、前記洗浄槽でメタルマスク版全体を洗浄液中に漬けた状態で超音波洗浄した後、前記洗浄槽底部のバルブを開けて該洗浄液を前記洗浄液槽へ戻す方式の超音波洗浄装置において、前記超音波洗浄後、該洗浄液が前記洗浄槽へ戻ってきてから、前記洗浄槽底部のバルブを閉め、前記ポンプで該洗浄液を汲み上げて前記洗浄槽へ送り出し、前記メタルマスク版が洗浄槽中に漬った状態となったとき、前記洗浄槽底部の前記バルブを開けた状態にて、所定時間、メタルマスク版を超音波洗浄しながら、前記ポンプで前記洗浄液タンクから前記洗浄槽へ該洗浄液を送り込み続ける。
当業者が定める前記所定時間経過後、前記メタルマスク版は、前記洗浄槽から取り出されることになる。
すなわち、請求項2の発明は、通常のドブ漬け超音波洗浄後、メタル版を洗浄液に漬けて超音波を掛けながら、かつ洗浄液ですすぎ洗いし得るようにしたことを特徴としている。
【0007】
【発明の実施の形態】
先ず、請求項1の実施の形態を説明する。
【0009】
請求項1の発明においては、通常のドブ漬け状態での超音波洗浄後、メタルマスク洗浄装置の制御装置は、洗浄槽底部の電磁バルブを開けて、洗浄液を洗浄液タンクへ戻す。洗浄液タンクへ洗浄液が戻ってきたら、前記制御装置は、前記電磁バルブを閉めるとともに、ポンプを駆動させ、洗浄液タンクの洗浄液を洗浄槽へ放出する。前記電磁バルブは、閉じているので、洗浄槽には、洗浄液が溜まっていく。洗浄槽に所定量、洗浄液が溜まると、前記制御装置は、それを認識することができる。従来のドブ漬けのメタルマスク版洗浄装置は、通常フロートを備えており、洗浄槽へ必要量の洗浄液が溜まったことを検出できるようになっているからである。
【0010】
洗浄槽に所要量の洗浄液が溜まったことを前記制御装置が認識すると、前記制御装置は、前記電磁バルブを開けて、メタル版を超音波洗浄する。このとき、ポンプは駆動させたままであり、洗浄液は、洗浄槽へ放出され続けている。前記電磁バルブは開いており、洗浄槽のメタル版は、洗浄液に漬かった状態で超音波洗浄されており、洗浄液は、洗浄槽から洗浄液タンク洗浄液タンクから洗浄槽と循環している状態で所定時間、すなわち前記メタル版を所定時間、超音波すすぎ洗いすると、前記制御装置は、超音波を停止させ、前記ポンプを停止させるとともに、前記電磁バルブを開ける。洗浄槽から洗浄液が洗浄液タンクへ戻れば、ユーザは、メタル版を洗浄槽から取り出すことができる。
【0011】
【実施例】
本発明に係わるメタルマスク版洗浄装置は、その構成は、従来のドブ漬けの超音波洗浄装置と同様である。すなわち、洗浄液タンク、洗浄槽、電磁バルブ、ポンプ、超音波振動子及び制御装置を主構成要素としている。請求項1の発明は、制御装置にプログラムが実質的にはROMに内臓されている。請求項1の発明であるすすぎ洗いのプログラムが制御装置に搭載してある。
【0012】
図1は、本発明に係わるメタルマスク版洗浄装置の一実施例を示す略斜視図である。
図1は、従来のドブ漬け超音波洗浄後、掛け洗いをしているところを示している。
なお、図1においてメタル版は図示していないが、実際には、当然、洗浄槽3の中に入っている。
【0013】
電磁バルブ4が開いており、洗浄液は、洗浄液タンク1から洗浄槽3、洗浄槽3から洗浄液タンク1へと循環している。つまり、メタル版を洗浄液で掛け洗いしている。なお、洗浄液循環系のどこかにフィルタ6を設け、洗浄液を濾過することが望まれる。このようにして、いわゆる掛け洗いにより、メタル版に付着しているクリームハンダ等の残滓を洗い流すことができる。
【0014】
図2は、本発明に係わるメタルマスク版洗浄装置の一実施例を示す斜視図である。
図2は、従来のドブ漬け洗浄後、メタル版(図示せず)をすすぎながら、超音波洗浄しているところを示したものである。
従来のドブ漬け洗浄後、洗浄液を一旦排出し、電磁バルブ4を閉める。ポンプ2は、洗浄液を洗浄槽3へ入れてメタル版をドブ漬け状態にする。しかる後、図2のように、電磁バルブ4を開け、洗浄液を循環させながら、メタル版を超音波洗浄する。
【0015】
つまり、超音波を掛けながら、メタル版を洗浄液ですすぎ洗いするわけである。
通常のドブ漬け超音波洗浄後に洗浄液に浮遊しているために、メタル版に付着してくるクリームハンダ等の残滓を除去することができる。
特に、洗浄液循環系にフィルタ6を設けている場合は、前記残滓を強力に除去することができる。
【0016】
【発明の効果】
本発明は、以上説明してきたように構成されているので、次に記載する効果を奏する。従来のドブ漬け式のメタル版超音波洗浄装置と同様の構成で、通常の超音波洗浄後、メタル版を超音波すすぎ洗いできる。制御装置5に電磁バルブ4、ポンプ2及び超音波振動子7を制御するプログラムをそれぞれ搭載することによって可能である。
【0017】
従って、従来の通常の超音波洗浄後、メタル版にクリームハンダ等の残滓ないし汚れが付着してきたとしても、それらを掛け洗いまたは超音波すすぎ洗いで除去できるメタルマスク版洗浄方法を提供することができる。
【図面の簡単な説明】
【図1】本発明に係わるメタルマスク版洗浄装置の一実施例を示す略斜視図
【図2】本発明に係わるメタルマスク版洗浄装置の一実施例を示す略斜視図
【符号の説明】
1 洗浄液タンク
2 ポンプ
3 洗浄槽
4 電磁バルブ
5 制御装置
6 フィルタ
7 超音波振動子
開 電磁バルブの開閉状態
ON、OFF 超音波振動子の駆動状態
[0001]
BACKGROUND OF THE INVENTION
The present invention, in a state where immersed in the cleaning solution reservoir across metal mask plate in the cleaning tank, which according to the improved invention of a process of ultrasonic cleaning, to the metal mask plate cleaning method.
[0002]
[Prior art]
2. Description of the Related Art An apparatus for ultrasonic cleaning in which a whole metal mask plate (hereinafter also referred to as a metal plate) is immersed in a cleaning liquid, that is, a so-called soaked state is known and used.
Conventionally, the metal plate is soaked in the cleaning solution in the cleaning tank, and after cleaning with ultrasonic waves, the solder residue (residue) and various stains peeled off from the metal plate, especially near the surface of the cleaning solution, There is a problem that when the cleaning liquid is floating and dropped (discharged) from the valve at the bottom of the cleaning tank (to the cleaning liquid tank), those residues or dirt adhere to the metal plate.
[0003]
[Problems to be solved by the invention]
The present invention has been made in view of the problems of the prior art, and the object of the present invention is a dove-immersion ultrasonic cleaning type metal plate cleaning apparatus, after a normal conventional ultrasonic cleaning process, An object of the present invention is to provide a metal mask plate cleaning method capable of washing away residues or dirt adhering to a metal plate.
[0004]
The metal mask plate cleaning method according to the first aspect of the present invention solves the above-mentioned problems and is as follows.
[0006]
The cleaning liquid is pumped from the cleaning liquid tank to the cleaning tank, and after ultrasonic cleaning with the entire metal mask plate immersed in the cleaning liquid in the cleaning tank, the valve at the bottom of the cleaning tank is opened and the cleaning liquid is transferred to the cleaning liquid tank. In the ultrasonic cleaning apparatus of the returning method, after the ultrasonic cleaning, after the cleaning liquid returns to the cleaning tank, the valve at the bottom of the cleaning tank is closed, the cleaning liquid is pumped up by the pump, and sent to the cleaning tank. When the metal mask plate is immersed in the cleaning tank, the cleaning liquid is cleaned by the pump while ultrasonically cleaning the metal mask plate for a predetermined time with the valve at the bottom of the cleaning tank opened. The cleaning liquid is continuously fed from the tank to the cleaning tank.
After the predetermined time determined by those skilled in the art, the metal mask plate is taken out from the cleaning tank.
That is, the invention according to claim 2 is characterized in that, after normal ultrasonic cleaning by dipping, the metal plate can be rinsed with a cleaning liquid while being immersed in a cleaning liquid and subjected to ultrasonic waves.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
First, an embodiment of claim 1 will be described.
[0009]
In the first aspect of the present invention, after the ultrasonic cleaning in a normal soaked state, the control device of the metal mask cleaning device opens the electromagnetic valve at the bottom of the cleaning tank and returns the cleaning liquid to the cleaning liquid tank . When the cleaning liquid returns to the cleaning liquid tank , the control device closes the electromagnetic valve and drives the pump to discharge the cleaning liquid in the cleaning liquid tank to the cleaning tank. Since the electromagnetic valve is closed, the cleaning liquid accumulates in the cleaning tank. When a predetermined amount of cleaning liquid has accumulated in the cleaning tank, the control device can recognize it. This is because a conventional dough-immersed metal mask plate cleaning apparatus is usually provided with a float and can detect that a necessary amount of cleaning liquid has accumulated in the cleaning tank.
[0010]
When the control device recognizes that a required amount of cleaning liquid has accumulated in the cleaning tank, the control device opens the electromagnetic valve and ultrasonically cleans the metal plate. At this time, the pump remains driven, and the cleaning liquid continues to be discharged into the cleaning tank. Said electromagnetic valve is open, the metal plate of the washing tank, in a state where immersed in the cleaning liquid is ultrasonically cleaned, the cleaning liquid solution tank from the basin, predetermined while circulating the cleaning bath from the solution tank When the metal plate is rinsed with ultrasonic waves for a predetermined time, the control device stops the ultrasonic waves, stops the pump, and opens the electromagnetic valve. When the cleaning liquid returns from the cleaning tank to the cleaning liquid tank , the user can take out the metal plate from the cleaning tank.
[0011]
【Example】
The configuration of the metal mask plate cleaning apparatus according to the present invention is the same as that of the conventional ultrasonic cleaning apparatus. That is, the main components are a cleaning liquid tank , a cleaning tank, an electromagnetic valve, a pump, an ultrasonic transducer, and a control device. According to the first aspect of the present invention, the program is substantially built in the ROM in the control device. The rinsing program according to the invention of claim 1 is mounted on the control device.
[0012]
FIG. 1 is a schematic perspective view showing an embodiment of a metal mask plate cleaning apparatus according to the present invention.
FIG. 1 shows a state where washing is carried out after conventional ultrasonic pickling.
Although the metal plate is not shown in FIG. 1, it is naturally in the cleaning tank 3 in practice.
[0013]
Electromagnetic valve 4 is open, the cleaning liquid, the cleaning tank 3 from the cleaning liquid tank 1 circulates from the cleaning tank 3 to the solution tank 1. That is, the metal plate is washed with a cleaning solution. It is desirable to provide a filter 6 somewhere in the cleaning liquid circulation system and filter the cleaning liquid. Thus, residues such as cream solder attached to the metal plate can be washed away by so-called washing.
[0014]
FIG. 2 is a perspective view showing an embodiment of a metal mask plate cleaning apparatus according to the present invention.
FIG. 2 shows a state where ultrasonic cleaning is performed while rinsing a metal plate (not shown) after the conventional dobbling cleaning.
After the conventional dough pickling cleaning, the cleaning liquid is once discharged and the electromagnetic valve 4 is closed. The pump 2 puts the cleaning liquid into the cleaning tank 3 and puts the metal plate in a doggy state. Thereafter, as shown in FIG. 2, the electromagnetic valve 4 is opened, and the metal plate is ultrasonically cleaned while circulating the cleaning liquid.
[0015]
That is, the metal plate is rinsed with a cleaning solution while applying ultrasonic waves.
Residue such as cream solder adhering to the metal plate can be removed because it floats in the cleaning solution after normal ultrasonic pickling.
In particular, when the filter 6 is provided in the cleaning liquid circulation system, the residue can be strongly removed.
[0016]
【The invention's effect】
Since the present invention is configured as described above, the following effects can be obtained. In conventional gutter pickled type metal plate ultrasonic cleaning device the same configuration, the following typical ultrasonic cleaning can rinse ultrasonic metal plate. This is possible by installing programs for controlling the electromagnetic valve 4, the pump 2, and the ultrasonic transducer 7 in the control device 5.
[0017]
Accordingly, it is possible to provide a method for cleaning a metal mask plate that can be removed by washing or ultrasonic rinsing even if residues or dirt such as cream solder adheres to the metal plate after conventional normal ultrasonic cleaning. it can.
[Brief description of the drawings]
FIG. 1 is a schematic perspective view showing an embodiment of a metal mask plate cleaning apparatus according to the present invention. FIG. 2 is a schematic perspective view showing an embodiment of a metal mask plate cleaning apparatus according to the present invention.
DESCRIPTION OF SYMBOLS 1 Washing liquid tank 2 Pump 3 Washing tank 4 Electromagnetic valve 5 Control device 6 Filter 7 Ultrasonic transducer opening The electromagnetic valve open / closed state ON / OFF Ultrasonic transducer driving state

Claims (1)

洗浄液タンクから洗浄槽へ洗浄液をポンプで送り出し、前記洗浄槽でメタルマスク版全体を洗浄液中に漬けた状態で超音波洗浄した後、前記洗浄槽底部のバルブを開けて該洗浄液を前記洗浄液タンクへ戻す方式の超音波洗浄装置において、前記超音波洗浄後、該洗浄液が前記洗浄液タンクへ戻ってきてから、前記洗浄槽底部のバルブを閉め、前記ポンプで該洗浄液を汲み上げて前記洗浄槽へ送り出し、前記メタルマスク版が洗浄槽中に漬った状態となったとき、前記洗浄槽底部の前記バルブを開けた状態にて、所定時間、メタルマスク版を超音波洗浄しながら、前記ポンプで前記洗浄液タンクから前記洗浄槽へ該洗浄液を送り込み続けることを特徴とするメタルマスク版洗浄方法The cleaning liquid is pumped from the cleaning liquid tank to the cleaning tank, and after ultrasonic cleaning with the entire metal mask plate immersed in the cleaning liquid in the cleaning tank, the valve at the bottom of the cleaning tank is opened and the cleaning liquid is transferred to the cleaning liquid tank. In the ultrasonic cleaning apparatus of the returning method, after the ultrasonic cleaning, after the cleaning liquid returns to the cleaning liquid tank, the valve at the bottom of the cleaning tank is closed, the cleaning liquid is pumped up by the pump, and sent to the cleaning tank. When the metal mask plate is immersed in the cleaning tank, the cleaning liquid is cleaned by the pump while ultrasonically cleaning the metal mask plate for a predetermined time with the valve at the bottom of the cleaning tank opened. A metal mask plate cleaning method , wherein the cleaning liquid is continuously fed from a tank to the cleaning tank.
JP19944298A 1998-06-11 1998-06-11 Metal mask plate cleaning method Expired - Fee Related JP3951157B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19944298A JP3951157B2 (en) 1998-06-11 1998-06-11 Metal mask plate cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19944298A JP3951157B2 (en) 1998-06-11 1998-06-11 Metal mask plate cleaning method

Publications (2)

Publication Number Publication Date
JPH11348243A JPH11348243A (en) 1999-12-21
JP3951157B2 true JP3951157B2 (en) 2007-08-01

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105944997A (en) * 2016-06-06 2016-09-21 江苏大亿智能科技有限公司 Suspension type high-frequency conduction washing device
CN110280534A (en) * 2019-06-27 2019-09-27 云谷(固安)科技有限公司 A kind of cleaning systems of mask plate and the clean method of mask plate

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