JP3796456B2 - Cantilever with measuring hole and beam measuring method using the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a cantilever used in a scanning probe microscope, and more specifically, a measurement hole is formed in the vicinity of the probe point in the direction of the protrusion while leaving the probe point at the tip of the protrusion of the cantilever. The scanning probe microscope function can be exhibited at the needle point, and the secondary beam emitted from a very small region of the sample surface is measured by entering the primary beam through a minute measurement hole, or 2 emitted from the sample surface. The present invention relates to a cantilever with a measurement hole that can detect the next beam through a minute measurement hole and a beam measurement method using the cantilever.
[0002]
[Prior art]
In order to observe the undulations at the atomic level on the sample surface and to measure physical properties, a scanning probe microscope represented by an atomic force microscope (abbreviated as AFM for atomic force microscope) is used to measure the surface shape and physical properties of the surface. in use.
[0003]
Many of the scanning probe microscopes detect surface information of a sample by bringing a probe called a cantilever very close to or in contact with the sample surface. Therefore, the structure of the cantilever serving as the probe has a strong correlation with the observation accuracy and the measured physical property amount.
[0004]
The cantilever literally means a so-called cantilever. That is, this cantilever is composed of a cantilever portion that is cantilevered and a protruding portion that protrudes from the tip, and the tip of the protruding portion is formed sharply as a probe point, which is used as the probe surface. The surface information of the sample is detected by approaching or contacting the surface.
[0005]
In the AFM operation, if one end of the cantilever is cantilevered and the probe point is brought very close to the sample surface and scanned by a scanning piezo or the like parallel to the sample surface, the probe is moved by the atomic force acting on the probe point and the surface. The needle point receives force in the vertical direction. This force is detected by the following method, and AFM measurement is performed.
[0006]
The first method is to irradiate the back surface of the cantilever with a laser beam, and when the cantilever bends due to the force acting on the probe point, the reflection direction of the laser beam changes, and this reflected beam is detected by a photodiode or the like. It is.
[0007]
In the second method, an excitation piezo element is provided at the mounting portion of the cantilever, and the cantilever is self-oscillated using the excitation piezo and the piezo for detecting the deflection of the cantilever tip, and the force acting on the probe point is used. In this method, the oscillation frequency changes and this change in oscillation frequency is detected.
[0008]
In the third method, an excitation piezo element is provided at the mounting portion of the cantilever, the optical fiber is brought close to the tip of the cantilever, the reflected light is detected by a photodiode, and the output of the photodiode is fed back to the excitation piezo. In this method, the cantilever is self-excited and the oscillation frequency changes due to the force acting on the probe point, and this oscillation frequency change is detected.
[0009]
In AFM, the cantilever acting force measured by these methods is converted into a voltage, this voltage is fed back to the Z direction control piezo of the cantilever, and a servo operation is performed to keep the distance between the probe and the sample surface constant, The probe point is scanned in the XY directions without touching the sample surface, and the three-dimensional shape of the sample surface is imaged on the display using the servo voltage as a height signal.
[0010]
In such an AFM field, a small hole is made in the cantilever, a laser beam is passed through the hole, the laser beam is leached from the tip of the hole, and the interaction between the leached beam and the sample surface is detected. Research is going on. This type of microscope is a SNOM (scanning nearfield optical microscope).
microscopy).
[0011]
FIG. 12 is a perspective view of a used cantilever with a measurement hole used in a conventional SNOM. The cantilever 2 with a measurement hole is composed of a cantilever portion 4 and a protruding portion 6 protruding from the tip.
[0012]
A hollow portion 10 is formed inside the protruding portion 6, and the protruding portion 6 is formed of a thin wall body. A measurement hole 12 is formed through the tip of the protrusion 6. Therefore, the tip of the protruding portion 6 does not become a sharp probe point, but is a probe surface 7 having a cross section of the measurement hole 12. The area of the probe surface 7 is at least the size of the cross-sectional area of the measurement hole 12. The probe surface 7 is disposed opposite to the sample surface 16 of the sample 14.
[0013]
Usually, since the opening diameter (cross-sectional diameter) of the measurement hole 12 is about 100 nm, it is sufficiently smaller than the wavelength of visible light, and visible light cannot pass through the measurement hole due to the diffraction limit. However, light oozes out from the opening by about the wavelength, and the light intensity abruptly attenuates further away from the wavelength. This oozing area is called a near field (evanescent field) of light.
[0014]
It is known that this near-field light interacts with the sample surface and causes diffraction, transmission, reflection, and fluorescence. By measuring the intensity of the transmitted light or reflected light, the optical properties of the sample can be observed with a resolution exceeding the diffraction limit of light.
[0015]
In order to perform near-field measurement using the cantilever 12 with the measurement hole, the probe surface 7 of the cantilever 2 is brought close to the sample surface 14. Do not touch at this time. In this state, visible light is irradiated from the cavity side 10 in the direction of arrow a, and a near field S is formed downward from the probe surface 7.
[0016]
When the near field S comes into contact with the sample surface 16, an interaction occurs, and light passes through the sample 14 or fluorescence is emitted from the sample 14 to the surroundings. By detecting the secondary light, the optical properties of the sample 14 can be measured with high spatial resolution.
[0017]
[Problems to be solved by the invention]
A problem arises when AFM measurement of the sample surface is performed using the cantilever 2 with the measurement hole. FIG. 13 is a cross-sectional view taken along the line CC of FIG. 12 when AFM measurement is performed. Since the measurement hole 12 is opened through the tip of the protrusion 6, the probe surface 7 comes into contact with the sample surface 16 in the AFM measurement.
[0018]
The sample surface 16 has irregularities on the order of nanometers, and in order to accurately reproduce the irregularities, the probe surface 7 is required to be formed as small as possible so as to reliably follow the irregularities. However, since the area of the probe surface 7 is larger than the cross-sectional area of the measurement hole 12, when the cross-sectional diameter is 100 nm as described above, the resolution becomes considerably large as 100 nm.
[0019]
Even when the specimen surface 16 is scanned with the large probe surface 7 as described above, the entire image is not clear due to poor resolution. Since the probe point at the tip of a normal cantilever has a radius of curvature of about 10 nm, it can be said that it has a resolution of 10 nm or less. Therefore, when there is the measurement hole 12 as shown in FIG. 13, the resolution is reduced to 1/10 or less.
[0020]
Therefore, an object of the present invention is to provide a cantilever with a measurement hole that can perform highly accurate AFM measurement while leaving a probe point. In addition, the measurement hole of this cantilever is used to cause the interaction between many kinds of beams and the sample material, and the position of the interaction on the sample surface can be narrowed down to the minimum region and measured. .
[0021]
[Means for Solving the Problems]
The present invention has been made to solve the above-mentioned problems, and the first invention is a cantilever portion that is supported at one end, a protruding portion that protrudes from the cantilever portion, and a tip of the protruding portion. With a measurement hole characterized by comprising a sharply formed probe point and a measurement hole formed through the protruding portion in the protruding direction while leaving the probe point in the vicinity of the probe point It is a cantilever.
[0022]
According to a second aspect of the present invention, a cantilever portion supported at one end, a projecting portion projecting from the cantilever portion, a measurement hole penetrating in the projecting direction of the projecting portion, and a base end portion on the projecting portion are provided. A cantilever with a measurement hole, which is composed of a nanotube that is fixed and has a tip protruded, and the tip of the nanotube is brought into contact with or close to a sample to be an effective probe point.
[0023]
The third invention comprises a cantilever part supported at one end, a protrusion or a nanotube projecting from the cantilever part, and a measurement hole formed through the cantilever part near the protrusion or the nanotube. The cantilever with a measurement hole is characterized in that the tip of the protrusion or the tip of the nanotube is used as a probe point.
[0024]
According to a fourth aspect of the present invention, a cantilever composed of at least a cantilever portion and a projecting portion having a sharply formed probe point is disposed in the focused ion beam chamber, and a focused ion beam is projected on the projecting portion in the vicinity of the probe point. And forming a measurement hole penetrating the protruding portion in the protruding direction while leaving the probe point, and a method for manufacturing a cantilever with a measuring hole.
[0025]
The fifth invention is characterized in that these cantilevers with measurement holes are used, a primary beam is passed through the measurement holes to irradiate the surface of the sample, and a secondary beam emitted from the sample is measured in the vicinity. This is a beam measurement method using a cantilever with a measurement hole.
[0026]
The sixth invention uses these cantilevers with measurement holes, irradiates the sample surface from the periphery with a primary beam, and measures the secondary beam emitted from the sample through the measurement hole. This is a beam measurement method using a characteristic cantilever with a measurement hole.
[0027]
A seventh invention is a beam measurement method using a cantilever with a measurement hole, wherein the primary beam is light, X-ray, electron beam or ion beam.
[0028]
The eighth invention is a beam measurement method using a cantilever with a measurement hole, wherein the secondary beam is light, X-ray, electron beam or ion beam.
[0029]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of a cantilever with a measurement hole and a beam measurement method using the same according to the present invention will be described in detail with reference to the drawings.
[0030]
FIG. 1 is a perspective view of an AFM measurement state of a cantilever with a measurement hole according to the present invention. The cantilever 2 with a measurement hole is composed of a cantilever portion 4 and a protruding portion 6 protruding from the tip. Since the cavity part 10 is formed in the back side of the protrusion part 6, the protrusion part 10 is comprised from a thin wall body.
[0031]
The tip of the protrusion 6 is formed at a sharp probe point 8, and the probe point 8 contacts the surface 16 of the sample 14 at one point, so that the surface information of the sample can be detected locally with high resolution. . Since the radius of curvature of the probe point 8 can be reduced to about 10 nm, the measurement resolution by the probe point 8 reaches several nm or less.
[0032]
On the other hand, in the present invention, while the probe point 8 remains, the measurement hole 12 is formed in the vicinity of the probe point 8 so as to penetrate in the protruding direction of the protruding portion 6. Although the cross-sectional diameter of the measurement hole 12 depends on the processing method, it has reached the point where the measurement hole 12 having a minute diameter of several hundred nm to several tens of nm can be opened. That is, the cantilever 2 of the present invention is characterized in that it shares both the measurement hole 12 and the sharp probe point 8.
[0033]
2 is a cross-sectional view taken along line AA in FIG. By performing AFM scanning on the sample surface 16 using the probe point 8, the position of the sample 14 to be measured for physical properties is found. Since the probe point 8 is composed of a sharp point, the sample surface 16 can be scanned with high accuracy and the measurement position can be detected accurately.
[0034]
FIG. 3 is a schematic explanatory diagram of drilling a measurement hole in a cantilever. The holeless cantilever 1 is usually formed of a material such as silicon or silicon nitride. A small-diameter measurement hole 12 can be formed in the holeless cantilever 1 by the focused ion beam I.
[0035]
In order to irradiate the ion beam I onto the cantilever 1 without a hole with a fine focus, a focused ion beam apparatus (also abbreviated as FIB apparatus) that can freely focus the ion beam and process an object is used.
[0036]
This FIB apparatus normally ionizes Ga atoms, accelerates by applying an electric field to the ions, focuses the ion beam with an electric field lens, and makes the ion beam cross section ultra-fine to a high energy density. It is an apparatus for processing a target by irradiating the target with a beam. In order to perform these functions, the FIB apparatus is composed of partial devices such as an ion source, an acceleration device, a beam focusing device, and a beam scanning device.
[0037]
In this FIB apparatus, the acceleration voltage can be freely adjusted, and the energy of the ion beam can be arbitrarily set. Depending on the thickness of the protrusion 6 of the cantilever 1, the beam energy can be varied to drill various cantilevers 1.
[0038]
In FIG. 3, the ion beam I is irradiated from the cavity 10 side, but irradiation may be performed from the opposite direction. In order to reduce the cross-sectional diameter of the measurement hole 12, the beam diameter of the ion beam I may be finely reduced. By making the sectional diameter of the ion beam I variable, the sectional diameter of the measurement hole 12 can be arbitrarily changed.
[0039]
What is important in drilling is to drill near the probe point 8 while leaving the probe point 8 remaining. The closer the position of the measurement hole 12 is to the position of the probe point 8, the easier it is to apply various beams from the measurement hole 12 to the position of the sample surface designated by the probe point 8.
[0040]
FIG. 4 is an explanatory diagram of a first measurement method using a cantilever with a measurement hole. This first measurement method irradiates the sample surface with a fine focus so that various primary beams pass through the measurement hole, and surrounds the secondary beam emitted from the sample by the interaction between the sample and the primary beam. It is to measure with.
[0041]
As the primary beam, a wide range of particle beams and wave beams can be used, such as an electron beam, an ion beam, an X-ray beam, and a light beam. There are various types of secondary beams that are emitted when the primary beam reacts with the sample. For example, there are fluorescence and electrons emitted by irradiating light, secondary electrons and X-rays emitted by irradiating electrons, and light, X-rays and electrons emitted by irradiating ions. Of course, the secondary beam also includes a beam which is reflected, transmitted, refracted, scattered and emitted to the surroundings.
[0042]
In the present invention, the secondary beam includes not only a beam radiated in a straight line but also waves and particles radiated in a distributed manner around the secondary beam. In particular, the primary beam can be narrowed linearly, but the secondary beam is often emitted in a dispersed manner from the sample surface. For example, fluorescence emitted from the sample surface is radiated in a wide range, and these are also comprehensively expressed by the concept of a secondary beam in the present invention.
[0043]
AFM scanning is performed with the probe point 8 to find the measurement point 18 on the sample surface 16. When the measurement point 18 is determined, the probe point 8 is moved to the upper vicinity. A beam generator 20 is disposed above the cantilever 2 with a measurement hole, and a primary beam 22 is emitted from the beam generator 20 to pass through the measurement hole 12.
[0044]
The primary beam 22 that has passed through the measurement hole 12 is irradiated to the measurement point 18 on the sample surface 16 or in the vicinity thereof, and interacts (reacts) with the sample 14. As a result, the secondary beam 24 is emitted from the measurement point 18 to the surroundings. A beam measuring device 26 is arranged around the periphery, and measures the energy and intensity of the emitted secondary beam 24.
[0045]
Since the secondary beam 24 is radiated in a wide range, the distribution of the secondary beam 24 is measured by moving the beam measuring device 26. In some cases, the sample 14 may pass through and be emitted downward. A beam measuring device 26 indicated by a dotted line measures the transmitted secondary beam 24.
[0046]
Since the cross-sectional diameter of the measurement hole 12 can be formed extremely small, the reaction region of the sample surface 16 that interacts with the primary beam 22 is extremely small. Accordingly, an accurate reaction map of the sample surface can be obtained while accurately specifying the surface coordinates of the sample surface 16.
[0047]
As the measurement hole 12 is formed closer to the probe point 8, the measurement point confirmed at the probe point 8 and the measurement point 18 irradiated with the primary beam 22 are closer to each other. Moreover, in the present invention, since the measurement hole 12 is formed in the vicinity of the probe point 8, the probe point 8 remains effectively. As a result, the beam measurement by the measurement hole 12 can be made to function for a long time while the AFM function by the probe point 8 is exhibited.
[0048]
FIG. 5 is an explanatory diagram of a second measurement method using a cantilever with a measurement hole. In this second method, the surface of the sample is irradiated with the primary beam, and the secondary beam emitted from the sample is measured through the measurement hole 12.
[0049]
A beam generator 20 is arranged around the cantilever 2 with a measurement hole, and a primary beam 22 is irradiated from the beam generator 20 toward the measurement point 18 on the sample surface 16. The primary beam 22 interacts with the material on the sample surface 16 and a secondary beam 24 is emitted around.
[0050]
By scanning the cantilever 2 with the measurement hole, the secondary beam 24 that has passed through the measurement hole 12 is measured by the beam measuring device 26. Since the beam measurement corresponding to each measurement point 18 can be performed according to the scanning, the intensity distribution of the secondary beam 24 is accurately measured. Further, the secondary beam 24 can be measured by arranging the beam generator 20 at the position indicated by the dotted line.
[0051]
FIG. 6 is an explanatory diagram of a third measurement method using a cantilever with a measurement hole. In this third method, the primary beam that has passed through the measurement hole is irradiated onto the sample surface, the primary beam is blocked, and then the secondary beam that has passed through the measurement hole is measured.
[0052]
In FIG. 6A, the primary beam 22 emitted from the beam generator 20 is passed through the measurement hole 12 to irradiate the sample surface 16. The primary beam 22 irradiated to the measurement point 18 reacts with the sample 14 and emits a secondary beam 24 to the surroundings.
[0053]
As shown in FIG. 6B, after the primary beam 22 is cut off, a beam measuring device 26 is arranged in place of the beam generator 20. The time delayed secondary beam 24 that has passed through the measurement hole 12 is measured by the beam measuring device 26. In this way, it is possible to irradiate the very small region of the sample surface 16 with the primary beam 22 and simultaneously measure the secondary beam from the very small region.
[0054]
Further, the beam measuring device 26 may be arranged beside the beam generator 20, and a secondary beam 24 may be measured by inserting a mirror in the path of the secondary beam 24. You can also
[0055]
FIG. 7 is a sectional view of a second embodiment of the cantilever with a measurement hole. In the second embodiment, the measurement hole 12 is formed at a position behind the probe point 8, and the measurement hole 12 is formed on the opposite side of the cantilever 2 with the measurement hole shown in FIG. Since the operation and effect are the same as those in FIG.
[0056]
FIG. 8 is a perspective view of a third embodiment of the cantilever with a measurement hole. The cantilever 2 is configured by attaching a nanotube 34 to the rear wall 6 a of the cantilever 2. The proximal end portion 34a of the nanotube 34 is fixed to the rear wall 6a by a known method.
[0057]
The tip 34b of the nanotube 34 protrudes downward from the probe point 8, and the tip 34c becomes an effective probe point and comes into contact with the sample surface 16 to perform AFM scanning. In other words, since the nanotube 34 is disposed through the probe point 8, the probe point 8 of the protruding portion 6 does not function as the probe point. The cross-sectional diameter of the nanotube 34 can be selected from 1 nm, and AFM measurement can be performed with extremely high accuracy.
[0058]
9 is a cross-sectional view taken along line BB in FIG. It can be understood that the tip of the nanotube 34, that is, the effective probe point 34 c acts as an actual probe point on the sample surface 16. Further, the measurement hole 12 is formed in the protruding portion 6, and the above-described first measurement method to third measurement method can be executed using the measurement hole 12.
[0059]
FIG. 10 is an explanatory view of a fourth embodiment of the cantilever with a measurement hole. The upper figure is a plan view of the cantilever 2 with a measurement hole, and the lower figure is a sectional view of the main part thereof. This cantilever 2 has a cantilever portion 4 having a tip formed in a substantially triangular shape, a minute projection 6 projecting from the lower surface of the tip of the cantilever 4, and the tip of the projection 6 serves as a probe point 8. Yes.
[0060]
The feature of the fourth embodiment is that a measurement hole 12 is formed in the cantilever portion 4 in the vicinity of the protruding portion 6. Since the protrusion 6 is extremely small, a high level of technology is required to make the measurement hole 12 in the protrusion 6. On the other hand, it is relatively easy to make the measurement hole 12 in the large cantilever part 4.
[0061]
The primary beam can be irradiated to the sample surface 16 through the measurement hole 12 in the cantilever portion 6, and the secondary beam emitted from the sample surface 16 can be detected through the measurement hole 12.
[0062]
FIG. 11 is an explanatory view of a fifth embodiment of the cantilever with a measurement hole. The upper figure is a plan view of the cantilever 2 with a measurement hole, and the lower figure is a sectional view of the main part thereof. This cantilever with a measurement hole is composed of a cantilever part 4 having a tip part formed in a substantially trapezoidal shape, and a nanotube 34 fixed in a suspended manner to the tip surface 4a of the cantilever part 4, and the tip 34c of the nanotube 34 is a probe point. Function as.
[0063]
The feature of the fifth embodiment is that, like the fourth embodiment, the measurement hole 12 is formed in the cantilever portion 4 in the vicinity of the nanotube 34. In this embodiment, since the protruding portion 6 is not formed, the nanotube 34 is fixed to a specific portion of the cantilever portion 6 (for example, the distal end surface 4a). Therefore, it is desirable that the measurement hole 12 is also formed in the cantilever portion 6 and is formed as close to the nanotube 34 as possible.
[0064]
The present invention is not limited to the above-described embodiment, and various modifications, design changes and the like within the scope not departing from the technical idea of the present invention are included in the technical scope. Absent.
[0065]
【The invention's effect】
According to the first invention, since the measurement hole is formed so as to penetrate in the protruding direction of the protruding portion while leaving the probe point in the vicinity of the probe point, the function of the scanning probe microscope such as AFM can be achieved by the probe point. Since the beam is measured by passing the primary beam and / or the secondary beam through the measurement hole at the same time, the coordinate accuracy of the interaction occurring on the sample surface can be detected with extremely high accuracy.
[0066]
According to the second invention, since the tip of the nanotube is used as the actual probe point, the detection accuracy of the scanning probe microscope can be dramatically improved, and the primary beam and / or the secondary beam can be used as the measurement hole. Since the beam is measured after passing through, the coordinate accuracy of the interaction occurring on the sample surface can be detected with extremely high accuracy.
[0067]
According to the third invention, since the measurement hole is formed in the cantilever portion having a relatively large size, it is easy to drill the measurement hole, and the measurement hole can be freely arranged in the vicinity of the protruding portion or the nanotube.
[0068]
According to the fourth invention, since the focused ion beam is used, it is possible to form the measurement hole penetrating the protruding portion in the protruding direction while leaving the probe point, and the cantilever with the measuring hole of the present invention can be easily and inexpensively formed. Can be manufactured.
[0069]
According to the fifth aspect of the invention, the primary beam is passed through the measurement hole to irradiate the surface of the sample, and the secondary beam emitted from the sample is measured at the periphery, so that the positional accuracy can be reduced to the local region. The interaction between various beams and the sample can be measured while increasing.
[0070]
According to the sixth aspect of the invention, the primary beam is irradiated from the periphery onto the sample surface, and the secondary beam emitted from the sample is measured through the measurement hole, thereby increasing the position accuracy to the local region. However, the interaction between various beams and the sample can be measured.
[0071]
According to the seventh invention, since a light beam, an X-ray, an electron beam or an ion beam is used as the primary beam, these primary beams interact with the sample surface to emit various secondary beams. It is possible not only to obtain physical property information by measuring the secondary beam, but also to promote the creation of new substances.
[0072]
According to the eighth invention, a light beam, an X-ray, an electron beam or an ion beam can be used as a secondary beam, and these secondary beams are measured to obtain physical property information of various substances to create and measure new substances. It is possible to make dramatic progress in technology.
[Brief description of the drawings]
FIG. 1 is a perspective view of an AFM measurement state of a first embodiment of a cantilever with a measurement hole according to the present invention.
FIG. 2 is a cross-sectional view taken along line AA in FIG.
FIG. 3 is a schematic explanatory diagram of drilling a measurement hole in a cantilever.
FIG. 4 is an explanatory diagram of a first measurement method using a cantilever with a measurement hole.
FIG. 5 is an explanatory diagram of a second measurement method using a cantilever with a measurement hole.
FIG. 6 is an explanatory diagram of a third measurement method using a cantilever with a measurement hole.
FIG. 7 is a cross-sectional view of a second embodiment of the cantilever with a measurement hole.
FIG. 8 is a perspective view of a third embodiment of a cantilever with a measurement hole.
9 is a cross-sectional view taken along line BB in FIG.
FIG. 10 is an explanatory diagram of a fourth embodiment of a cantilever with a measurement hole.
FIG. 11 is an explanatory diagram of a fifth embodiment of the cantilever with a measurement hole.
FIG. 12 is a perspective view of a used state of a cantilever with a measurement hole used in a conventional SNOM.
13 is a cross-sectional view taken along the line CC of FIG. 12 when AFM measurement is performed.
[Explanation of symbols]
2 is a cantilever with a measurement hole, 4 is a cantilever portion, 4a is a tip surface of the cantilever portion, 6 is a protrusion, 6a is a front wall, 6b is an inner surface of the protrusion, 6c is an outer surface of the protrusion, 7 is a probe surface, 8 is the probe point, 10 is the cavity, 12 is the measurement hole, 14 is the sample, 16 is the sample surface, 18 is the measurement point, 20 is the beam generator, 22 is the primary beam, 24 is the secondary beam, 26 is A beam measuring instrument, 30 is a focused ion beam chamber, 34 is a nanotube, 34a is a proximal end, 34b is a distal end, 34c is an effective probe point, I is an ion beam, and S is a near field.

Claims (2)

In a cantilever used for an atomic force microscope, a cantilever part supported at one end, a measurement hole for passing a beam formed through the cantilever part, and a nanotube protruding and fixed to the cantilever part near the measurement hole, A cantilever with a measurement hole , wherein the tip of the nanotube is a probe point . A cantilever with a measurement hole according to claim 1 is used, a primary beam is irradiated from the periphery of the cantilever to a sample surface, and a secondary beam emitted from the sample is passed through the measurement hole to pass the secondary beam. A beam measuring method using a cantilever with a measuring hole,

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