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JP3778426B2 - Semiconductor device mounting device - Google Patents

Semiconductor device mounting device Download PDF

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Publication number
JP3778426B2
JP3778426B2 JP2001322693A JP2001322693A JP3778426B2 JP 3778426 B2 JP3778426 B2 JP 3778426B2 JP 2001322693 A JP2001322693 A JP 2001322693A JP 2001322693 A JP2001322693 A JP 2001322693A JP 3778426 B2 JP3778426 B2 JP 3778426B2
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JP
Japan
Prior art keywords
solder
work
station
opening
mounting
Prior art date
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Expired - Fee Related
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JP2001322693A
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Japanese (ja)
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JP2003133342A (en
Inventor
良雄 市川
恒史 赤石
守道 高木
将晃 大澤
浩志 酒井
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Hitachi High Tech Instruments Co Ltd
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Hitachi High Tech Instruments Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L2224/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor element mounting device, on which a hermetically closed space is formed inside the mounting device including a work transfer passage, and a solder-applying operation can be carried out, without deteriorating an antioxidant atmosphere by feeding a gas containing nitrogen to the hermetically closed space. SOLUTION: An X table 21 and a Y table 23 are moved horizontally, to apply a wire solder 25 on a work 3 like drawing as the wire solder 25 is fed by a drive motor 26, through the intermediary of an application nozzle 29 on the work 3 on a transfer passage 6 inside a hermetically closed space 4 of a device body 1A. At this point, an opening 30 is bored in the stainless steel device body 1A which serves as the top surface of the hermetically closed space 4, and the opening 30 is blocked with a lid 31, in a state with the application nozzle 29 penetrating.

Description

【0001】
【発明の属する技術分野】
本発明は、ヒートシンク又はセラミック基板に半導体素子を装着する半導体素子の装着装置に関する。詳述すれば、搬送装置により間欠送りされるヒートシンクやセラミック基板等のワークが供給装置により供給ステーションで搬送路上に供給され、はんだ塗布ステーションで前記ワーク上にはんだ塗布装置によりはんだが塗布され、装着ステーションで装着装置により半導体素子が前記ワーク上にはんだを介して装着され、排出ステーションで排出取出し装置により前記半導体素子が装着されたワークが取出される半導体素子の装着装置に関する。
【0002】
【従来の技術】
かかる半導体素子の装着装置においては、半導体素子と基板等との接合に高温下ではんだ材料を使用する場合には高温下でのワーク(ヒートシンク又はセラミック基板)の酸化防止対策が必要となる。
【0003】
そして、従来はキャリア等を使用して間欠送りされるワークに対して、接合材の供給部において、窒素やこれに水素ガスを加えたものを吹付けることで酸化防止や還元対策を行なってきた。
【0004】
【発明が解決しようとする課題】
しかし、上述せる方法では、局所的に雰囲気を作り出すことは可能であるが、その前後の搬送中でも酸化の可能性があるにも拘わらず、完全な雰囲気を作ることは困難である。
【0005】
そこで本発明は、ワークの搬送路を含む装着装置本体内に密閉空間を形成し、この密閉空間に少なくとも窒素を含むガスを供給することにより形成された酸化防止雰囲気を損なうことなく、はんだ塗布作業が行なえるようにした半導体素子の装着装置を提供することを目的とする。
【0006】
【課題を解決するための手段】
このため第1の発明は、搬送装置により間欠送りされるヒートシンクやセラミック基板等のワークが供給装置により供給ステーションで搬送路上に供給され、はんだ塗布ステーションで前記ワーク上にはんだ塗布装置によりはんだが塗布され、装着ステーションで装着装置により半導体素子が前記ワーク上にはんだを介して装着され、排出ステーションで排出取出し装置により前記半導体素子が装着されたワークが取出される半導体素子の装着装置において、前記ワークの搬送路を含む装着装置本体内に密閉空間を形成し、少なくとも窒素を含むガスを前記密閉空間に供給すると共に、前記はんだ塗布ステーションにおける装着装置本体に開口を形成し、前記装置本体上面の前記開口の周囲において摺動可能に設けられて前記はんだ塗布装置の塗布ノズルが貫通した状態の蓋体で前記開口を閉塞したことを特徴とする。
【0007】
また第2の発明は、前記蓋体はその下面が平滑な面であることを特徴とする。
【0008】
更に第3の発明は、搬送装置により間欠送りされるヒートシンクやセラミック基板等のワークが供給装置により供給ステーションで搬送路上に供給され、はんだ塗布ステーションで前記ワーク上にはんだ塗布装置によりはんだが塗布され、装着ステーションで装着装置により半導体素子が前記ワーク上にはんだを介して装着され、排出ステーションで排出取出し装置により前記半導体素子が装着されたワークが取出される半導体素子の装着装置において、前記ワークの搬送路を含む装着装置本体内に密閉空間を形成し、少なくとも窒素を含むガスを前記密閉空間に供給すると共に、前記はんだ塗布ステーションにおける装着装置本体に開口を形成して前記はんだ塗布装置の塗布ノズルが貫通した状態の蓋体で前記開口を閉塞し、前記蓋体を絶縁性の良好な材料で作製したことを特徴とする。
【0009】
【発明の実施の形態】
以下図面に基づき、本発明の実施の形態を説明する。1は半導体素子の装着装置で、この装着装置1外から供給されるヒートシンクやセラミック基板等のワーク3を搬送装置2により間欠送りしながら、このワーク3上に所定作業を施した後、装着装置1外に取出されるものである。
【0010】
前記装着装置1は、上流から供給ステーションI、はんだ塗布ステーションII、装着ステーションIII及び排出ステーションIVを有して、図2の各ステーションにおける前記装着装置1の縦断側面図及び図3の各ステーション間の装着装置1の縦断側面図に示すように、装置本体1Aには密閉空間4が形成される。
【0011】
前記密閉空間4内に設けられる前記搬送装置2は、前記ワーク3の搬送方向に沿って設けられるトランスファ5と、搬送路6上の各ワーク3に係止して移動させるために該トランスファ5に所定間隔毎に設けられる複数の送り爪7と、前記トランスファ5を所定長さの1ピッチずつ往復動させる往復駆動源(図示せず)と、該駆動源によりトランスファ5を1ピッチ往動作により移動させた後下端を支点として揺動させてワーク3と送り爪7との係止を解除する揺動駆動源(図示せず)とを備えている。
【0012】
図3において、10は前記密閉空間4内の前記ワーク3の酸化を防止したり還元させるために窒素ガスや、窒素及び水素の混合ガスを前記密閉空間4内に供給する複数の供給パイプで、この各供給パイプ10は図示しないガス供給源に各流量調節器を介して接続されている。
【0013】
そして、図2の装着ステーションIIIにおける装着装置1の縦断側面図に示すように、前記密閉空間4の上面に開口11を形成して、該開口11をシリンダー12により開閉するシャッター13を設けるが、この構成は前記供給ステーションI、はんだ塗布ステーションII及び排出ステーションIVにおいても同様な構成である。
また、各ステーション間には透明なガラス窓14を設けて、この窓14を介して装置本体1A内、例えばワイヤはんだの塗布状態やベアチップなどの半導体素子の装着状態などを作業者が覗くことができる。
【0014】
先ず、供給ステーションIでは、トレイ15上に整列されて収納されている前記ワーク3を供給装置の吸着ノズル5が図示しない駆動源により平面方向及び上下方向に移動しながら取出して、前記シリンダー12によりシャッター13を移動させて開口11を介して搬送路6上に順次供給し、この供給後シャッター13を移動させて開口11を閉塞する。そして、前述したように搬送装置2により搬送路6上のワークを順次1ピッチずつ間欠送りすることとなる。
【0015】
次のはんだ塗布ステーションIIでは、前記シリンダー12によりシャッター13を移動させて開口11を介して搬送路6上のワーク3上に図示しないはんだ塗布装置により接合材であるワイヤはんだを塗布し、この塗布後シャッター13を移動させて開口11を閉塞する。尚、このはんだ塗布装置は、平面方向及び上下方向に図示しない駆動源により移動可能な構成である。また、図示しないヒータが埋設されたヒータブロックが設けられ、搬送路6の形成ブロック6Aを介してワーク3を加熱し、前記ワイヤはんだを溶融しながら塗布することとなるものである。
【0016】
次の装着ステーションIIIでは、装着装置の吸着ノズル16が図示しない駆動源により平面方向及び上下方向に移動しながら半導体供給装置よりベアチップなどの半導体素子を取出して、前記シリンダー12によりシャッター13を移動させて開口11を介して搬送路6上の前記ワーク3上にワイヤはんだを介して装着し、この装着後シャッター13を移動させて開口11を閉塞する。
【0017】
最後の排出ステーションIVでは、前記シリンダー12によりシャッター13を移動させて開口11を介して搬送路6上の前記半導体素子が装着されたワーク3が図示しない駆動源により平面方向及び上下方向に移動する排出取出し装置の吸着ノズル17により取出され、収納装置であるトレイ18上に収納されるが、前記取出し後シャッター13を移動させて開口11を閉塞する。
【0018】
以上説明したように、供給ステーションIで供給された搬送路6上の前記ワーク3を搬送装置2により順次1ピッチずつ間欠送りしながら、各作業、即ちワーク3上にワイヤはんだを塗布したり、該ワーク3上に半導体素子を装着したり、該ワーク3を搬送路6上から取出して収納したりするものである。
【0019】
しかも、装置本体1Aには密閉空間4を形成して、前述したようなワーク供給、ワイヤはんだ塗布、半導体素子の装着、ワーク取出し作業を行うときのみ、前記シリンダー12によりシャッター13を移動させて開口11を開くようにするため、酸化防止雰囲気を損なうことなく、各種の作業を行なうことができる。
【0020】
次に図4に基づき、はんだ塗布装置の他の実施形態について説明する。先ず、基台20上に沿ってX軸モータ(図示せず)によりX方向に移動可能なXテーブル21上に、Y軸モータ22によりY方向に移動可能なYテーブル23を設け、このYテーブル23にワイヤはんだ駆動部24を固定する。
【0021】
前記ワイヤはんだ駆動部24は、はんだ供給ローラ(図示せず)に巻かれたワイヤはんだ25を駆動モータ26により回転する駆動ローラ27及び従動ローラ28にて塗布ノズル29を介して繰り出すものである。
【0022】
そして、装置本体1Aの密閉空間4内の搬送路6上のワーク3上に、前記駆動モータ26により塗布ノズル29を介してワイヤはんだ25を繰り出しながら、Xテーブル21及びYテーブル23を平面方向に移動させて、描画する如くワイヤはんだ25を塗布するものである。
【0023】
このとき、前記密閉空間4の上面を形成するステンレス製の装置本体1Aに開口30を形成して、該開口30を前記塗布ノズル29が貫通した状態の少なくとも下面を平滑な面とした蓋体31で閉塞する構成とする。従って、前記蓋体31は少なくとも開口30の周囲の面を平滑な面とした装置本体1A上面を摺動可能であり、かつ前記塗布ノズル29が該蓋体31を上下動可能に貫通しているので、前記Xテーブル21及びYテーブル23が平面方向に移動してワイヤはんだ25を塗布する際でも、前記開口30内のどこに移動しても該開口30を閉塞できる面積(大きさ)を有する円板状の蓋体31で開口30を閉塞しているから、酸化防止雰囲気を損なうことがない。
【0024】
尚、はんだの塗布確認のため、鋼鉄製の塗布ノズル29とワーク3との接地確認を行なうので、この確認を阻害することがないよう前記蓋体31は絶縁性の良好な材料、例えばガラス、セラミックなどの材料で作製するが、特に透明なガラスで構成すれば前記確認に便宜である。
【0025】
また、33はヒータが埋設されたヒータブロックで、搬送路6の形成ブロック34を介してワーク3を加熱し、前記ワイヤはんだ25を溶融しながら塗布することとなるものである。
【0026】
以上本発明の実施態様について説明したが、上述の説明に基づいて当業者にとって種々の代替例、修正又は変形が可能であり、本発明はその趣旨を逸脱しない範囲で前述の種々の代替例、修正又は変形を包含するものである。
【0027】
【発明の効果】
以上のように本発明によれば、はんだ塗布ステーションにおける装着装置本体に開口を形成し、前記装置本体上面の前記開口の周囲において摺動可能に設けられて前記はんだ塗布装置の塗布ノズルが貫通した状態の蓋体で前記開口を閉塞したので、ワークの搬送路を含む装着装置本体内に密閉空間を形成し、この密閉空間に少なくとも窒素を含むガスを供給することにより形成された酸化防止雰囲気を損なうことなく、塗布ノズルが貫通した状態の蓋体を前記開口の周囲において摺動させてはんだ塗布作業が行なえるようにした半導体素子の装着装置を提供することができる。
また、蓋体を絶縁性の良好な材料で作製したので、蓋体により阻害されることなく、はんだの塗布確認のための塗布ノズルとワークとの接地確認をすることができる。
【図面の簡単な説明】
【図1】半導体素子の装着装置の平面図である。
【図2】装着ステーションIIIにおける装着装置1の縦断右側面図である。
【図3】各ステーション間の縦断右側面図である。
【図4】はんだ塗布装置の他の実施形態を示す縦断右側面図である。
【図5】はんだ塗布ステーションの要部平面図である。
【符号の説明】
1 半導体素子の装着装置
1A 装置本体
2 搬送装置
3 ワーク
4 密閉空間
6 搬送路
10 供給パイプ
25 ワイヤはんだ
29 塗布ノズル
30 開口
31 蓋体
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a semiconductor element mounting apparatus for mounting a semiconductor element on a heat sink or a ceramic substrate. More specifically, a work such as a heat sink or a ceramic substrate intermittently fed by the transfer device is supplied to the transfer path at the supply station by the supply device, and solder is applied to the work by the solder application device at the solder application station and mounted. The present invention relates to a semiconductor device mounting apparatus in which a semiconductor element is mounted on a workpiece by a mounting device at a station via solder, and a work having the semiconductor device mounted thereon is taken out by a discharge / takeout device at a discharge station.
[0002]
[Prior art]
In such a semiconductor element mounting apparatus, when a solder material is used at a high temperature for joining the semiconductor element and the substrate or the like, it is necessary to take measures to prevent oxidation of the work (heat sink or ceramic substrate) at a high temperature.
[0003]
Conventionally, for workpieces that are intermittently fed using a carrier or the like, anti-oxidation and reduction measures have been performed by blowing nitrogen or a material in which hydrogen gas is added thereto in the joining material supply section. .
[0004]
[Problems to be solved by the invention]
However, with the method described above, it is possible to create an atmosphere locally, but it is difficult to create a perfect atmosphere despite the possibility of oxidation during transport before and after that.
[0005]
Therefore, the present invention forms a sealed space in the mounting apparatus main body including the workpiece conveyance path, and solder application work without impairing the antioxidant atmosphere formed by supplying a gas containing at least nitrogen to the sealed space. An object of the present invention is to provide a semiconductor device mounting apparatus that can perform the above.
[0006]
[Means for Solving the Problems]
Therefore, according to the first aspect of the present invention, a work such as a heat sink or a ceramic substrate intermittently fed by the transport device is supplied onto the transport path by the supply device at the supply station, and solder is applied onto the work by the solder application device at the solder application station. In the mounting device for a semiconductor element, the semiconductor element is mounted on the workpiece by the mounting device at the mounting station via the solder, and the workpiece on which the semiconductor element is mounted is taken out by the discharge / extraction device at the discharge station. Forming a sealed space in the mounting apparatus body including the transfer path, supplying a gas containing at least nitrogen to the sealed space, forming an opening in the mounting apparatus body in the solder application station , and It said slidably provided around the opening solder coating apparatus Coating nozzle is characterized in that it has closed the opening in the lid in a state of penetrating.
[0007]
The second invention is characterized in that the lower surface of the lid body is a smooth surface .
[0008]
In a third aspect of the invention, a work such as a heat sink or a ceramic substrate intermittently fed by a carrying device is supplied onto a carrying path by a supply station by a supply device, and solder is applied onto the work by a solder applying device at a solder application station. In the mounting device for a semiconductor element, the semiconductor element is mounted on the workpiece by the mounting device at the mounting station via the solder, and the workpiece on which the semiconductor element is mounted is taken out by the discharge / extraction device at the discharge station. Forming a sealed space in the mounting apparatus body including the conveyance path, supplying a gas containing at least nitrogen to the sealed space, and forming an opening in the mounting apparatus body in the solder application station to apply the coating nozzle of the solder coating apparatus There was close the opening in the lid in a state of penetrating, absolute the lid Characterized in that prepared in sexual good materials.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. Reference numeral 1 denotes a semiconductor device mounting apparatus. After a work 3 such as a heat sink or a ceramic substrate supplied from the outside of the mounting apparatus 1 is intermittently fed by a transport apparatus 2, a predetermined operation is performed on the work 3, and then the mounting apparatus 1 1 is taken out.
[0010]
The mounting apparatus 1 has a supply station I, a solder application station II, a mounting station III, and a discharge station IV from the upstream, and a vertical side view of the mounting apparatus 1 in each station of FIG. 2 and between each station of FIG. As shown in the vertical side view of the mounting apparatus 1, a sealed space 4 is formed in the apparatus main body 1 </ b> A.
[0011]
The transfer device 2 provided in the sealed space 4 has a transfer 5 provided along the transfer direction of the workpiece 3 and a transfer 5 for locking and moving each workpiece 3 on the transfer path 6. A plurality of feed claws 7 provided at predetermined intervals, a reciprocating drive source (not shown) that reciprocates the transfer 5 by one pitch of a predetermined length, and the transfer 5 is moved by a one-pitch forward operation by the drive source. After that, a swing drive source (not shown) that swings around the lower end as a fulcrum to release the engagement between the work 3 and the feed claw 7 is provided.
[0012]
In FIG. 3, reference numeral 10 denotes a plurality of supply pipes for supplying nitrogen gas or a mixed gas of nitrogen and hydrogen into the sealed space 4 in order to prevent or reduce the oxidation of the work 3 in the sealed space 4. Each supply pipe 10 is connected to a gas supply source (not shown) via each flow rate regulator.
[0013]
Then, as shown in a vertical side view of the mounting device 1 in the mounting station III of FIG. 2, an opening 11 is formed on the upper surface of the sealed space 4 and a shutter 13 is provided to open and close the opening 11 with a cylinder 12. This configuration is the same in the supply station I, the solder application station II, and the discharge station IV.
In addition, a transparent glass window 14 is provided between the stations, and an operator can look into the apparatus main body 1A, for example, a state in which a wire solder is applied or a semiconductor element such as a bare chip, through the window 14. it can.
[0014]
First, at the supply station I, the workpiece 3 arranged and stored on the tray 15 is taken out while the suction nozzle 5 of the supply device is moved in a plane direction and a vertical direction by a driving source (not shown), and is taken out by the cylinder 12. The shutter 13 is moved and sequentially supplied onto the conveyance path 6 through the opening 11. After this supply, the shutter 13 is moved to close the opening 11. Then, as described above, the workpiece on the conveyance path 6 is intermittently fed one pitch at a time by the conveyance device 2.
[0015]
In the next solder application station II, the shutter 13 is moved by the cylinder 12, and wire solder as a bonding material is applied to the work 3 on the transport path 6 through the opening 11 by a solder application device (not shown). The rear shutter 13 is moved to close the opening 11. In addition, this solder application | coating apparatus is a structure which can be moved by the drive source which is not illustrated in a plane direction and an up-down direction. In addition, a heater block in which a heater (not shown) is embedded is provided, and the workpiece 3 is heated via the forming block 6A of the conveyance path 6 to apply the wire solder while melting.
[0016]
At the next mounting station III, the suction nozzle 16 of the mounting device is moved in the plane direction and the vertical direction by a driving source (not shown), and a semiconductor element such as a bare chip is taken out from the semiconductor supply device, and the shutter 13 is moved by the cylinder 12. Then, it is mounted on the workpiece 3 on the conveying path 6 via the opening 11 via wire solder, and after this mounting, the shutter 13 is moved to close the opening 11.
[0017]
At the final discharge station IV, the shutter 13 is moved by the cylinder 12, and the workpiece 3 on which the semiconductor element is mounted on the transport path 6 is moved through the opening 11 in the plane direction and the vertical direction by a driving source (not shown). The paper is taken out by the suction nozzle 17 of the discharge / take-out device and stored on the tray 18 as a storage device. After the extraction, the shutter 13 is moved to close the opening 11.
[0018]
As described above, the work 3 on the transport path 6 supplied at the supply station I is intermittently fed one pitch at a time sequentially by the transport device 2, while applying wire solder to each work, that is, the work 3, A semiconductor element is mounted on the workpiece 3, or the workpiece 3 is taken out from the conveying path 6 and stored.
[0019]
Moreover, a sealed space 4 is formed in the apparatus main body 1A, and the shutter 13 is moved by the cylinder 12 and opened only when the work supply, wire solder application, semiconductor element mounting, and work removal work as described above are performed. Since 11 is opened, various operations can be performed without impairing the oxidation-preventing atmosphere.
[0020]
Next, another embodiment of the solder coating apparatus will be described with reference to FIG. First, a Y table 23 that is movable in the Y direction by a Y axis motor 22 is provided on an X table 21 that can be moved in the X direction by an X axis motor (not shown) along the base 20. The wire solder driving unit 24 is fixed to 23.
[0021]
The wire solder drive unit 24 feeds wire solder 25 wound around a solder supply roller (not shown) through a coating roller 29 by a drive roller 27 and a driven roller 28 that are rotated by a drive motor 26.
[0022]
The X table 21 and the Y table 23 are moved in the plane direction while feeding the wire solder 25 through the application nozzle 29 by the drive motor 26 onto the work 3 on the conveying path 6 in the sealed space 4 of the apparatus main body 1A. It is moved and the wire solder 25 is applied as drawn.
[0023]
At this time, an opening 30 is formed in the stainless steel device main body 1A forming the upper surface of the sealed space 4, and at least the lower surface in a state where the coating nozzle 29 penetrates the opening 30 is a smooth surface 31. It is set as the structure closed by. Accordingly, the lid 31 can slide on the upper surface of the apparatus main body 1A having a smooth surface at least around the opening 30, and the coating nozzle 29 penetrates the lid 31 so as to move up and down. Therefore, even when the X table 21 and the Y table 23 move in the plane direction to apply the wire solder 25, a circle having an area (size) that can close the opening 30 regardless of where it moves in the opening 30. Since the opening 30 is closed by the plate-shaped lid body 31, the antioxidant atmosphere is not impaired.
[0024]
For confirmation of solder application, since the ground contact between the steel application nozzle 29 and the work 3 is confirmed, the lid body 31 is made of a material having good insulating properties such as glass, so as not to disturb this confirmation. Although it is made of a material such as ceramic, it is convenient for the confirmation if it is made of transparent glass.
[0025]
Reference numeral 33 denotes a heater block in which a heater is embedded, which heats the workpiece 3 via the formation block 34 of the transport path 6 and applies the wire solder 25 while melting.
[0026]
Although the embodiments of the present invention have been described above, various alternatives, modifications, and variations can be made by those skilled in the art based on the above description, and the present invention is not limited to the various alternatives described above without departing from the spirit of the present invention. It includes modifications or variations.
[0027]
【The invention's effect】
As described above , according to the present invention, an opening is formed in the mounting apparatus main body at the solder application station, and the application nozzle of the solder application apparatus is slidably provided around the opening on the upper surface of the apparatus main body. Since the opening is closed with the lid in a state, an anti-oxidation atmosphere is formed by forming a sealed space in the mounting apparatus main body including the work conveyance path and supplying a gas containing at least nitrogen to the sealed space. It is possible to provide a semiconductor device mounting apparatus in which a soldering operation can be performed by sliding a lid with a coating nozzle penetrating therearound without damaging the periphery of the opening .
In addition, since the lid is made of a material having good insulation, it is possible to confirm the grounding between the application nozzle for confirming the application of solder and the workpiece without being obstructed by the lid.
[Brief description of the drawings]
FIG. 1 is a plan view of a semiconductor device mounting apparatus.
FIG. 2 is a vertical right side view of the mounting apparatus 1 in the mounting station III.
FIG. 3 is a right side view of a longitudinal section between stations.
FIG. 4 is a vertical right side view showing another embodiment of the solder application apparatus.
FIG. 5 is a plan view of a main part of a solder application station.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Semiconductor device mounting apparatus 1A Apparatus main body 2 Conveying apparatus 3 Work piece 4 Sealed space 6 Conveying path 10 Supply pipe 25 Wire solder 29 Coating nozzle 30 Opening 31 Lid

Claims (3)

搬送装置により間欠送りされるヒートシンクやセラミック基板等のワークが供給装置により供給ステーションで搬送路上に供給され、はんだ塗布ステーションで前記ワーク上にはんだ塗布装置によりはんだが塗布され、装着ステーションで装着装置により半導体素子が前記ワーク上にはんだを介して装着され、排出ステーションで排出取出し装置により前記半導体素子が装着されたワークが取出される半導体素子の装着装置において、前記ワークの搬送路を含む装着装置本体内に密閉空間を形成し、少なくとも窒素を含むガスを前記密閉空間に供給すると共に、前記はんだ塗布ステーションにおける装着装置本体に開口を形成し、前記装置本体上面の前記開口の周囲において摺動可能に設けられて前記はんだ塗布装置の塗布ノズルが貫通した状態の蓋体で前記開口を閉塞したことを特徴とする半導体素子の装着装置。A work such as a heat sink or a ceramic substrate that is intermittently fed by the transfer device is supplied to the transfer path by the supply device at the supply station, and solder is applied to the work by the solder application device at the solder application station. A semiconductor device mounting apparatus in which a semiconductor element is mounted on the work via solder, and a work on which the semiconductor element is mounted is taken out by a discharge / removal device at a discharge station. Forming a sealed space in the interior, supplying a gas containing at least nitrogen to the sealed space, forming an opening in the mounting device body in the solder application station , and being slidable around the opening on the upper surface of the device body coating nozzle of provided with the solder coating device penetrates Mounting apparatus for a semiconductor device characterized by closing the said opening in the lid of the condition. 前記蓋体はその下面が平滑な面であることを特徴とする請求項1に記載の半導体素子の装着装置。The lid is mounted device as claimed in claim 1, characterized in that the lower surface is a smooth surface. 搬送装置により間欠送りされるヒートシンクやセラミック基板等のワークが供給装置により供給ステーションで搬送路上に供給され、はんだ塗布ステーションで前記ワーク上にはんだ塗布装置によりはんだが塗布され、装着ステーションで装着装置により半導体素子が前記ワーク上にはんだを介して装着され、排出ステーションで排出取出し装置により前記半導体素子が装着されたワークが取出される半導体素子の装着装置において、前記ワークの搬送路を含む装着装置本体内に密閉空間を形成し、少なくとも窒素を含むガスを前記密閉空間に供給すると共に、前記はんだ塗布ステーションにおける装着装置本体に開口を形成して前記はんだ塗布装置の塗布ノズルが貫通した状態の蓋体で前記開口を閉塞し、前記蓋体を絶縁性の良好な材料で作製したことを特徴とする半導体素子の装着装置。 A work such as a heat sink or a ceramic substrate that is intermittently fed by the transfer device is supplied to the transfer path by the supply device at the supply station, and solder is applied to the work by the solder application device at the solder application station. A semiconductor device mounting apparatus in which a semiconductor element is mounted on the work via solder, and a work on which the semiconductor element is mounted is taken out by a discharge / removal device at a discharge station. A lid body in which a sealed space is formed, a gas containing at least nitrogen is supplied to the sealed space, and an opening is formed in the mounting device body in the solder coating station so that the coating nozzle of the solder coating device penetrates in closing the opening, the lid with a material having good insulating properties Mounting device for a semiconductor device characterized by being manufactured.
JP2001322693A 2001-10-19 2001-10-19 Semiconductor device mounting device Expired - Fee Related JP3778426B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001322693A JP3778426B2 (en) 2001-10-19 2001-10-19 Semiconductor device mounting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001322693A JP3778426B2 (en) 2001-10-19 2001-10-19 Semiconductor device mounting device

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JP2003133342A JP2003133342A (en) 2003-05-09
JP3778426B2 true JP3778426B2 (en) 2006-05-24

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