JP3553116B2 - Light processing equipment - Google Patents

Description

[0001]
[Industrial application fields]
The present invention relates to an optical processing apparatus used for processing a via hole (VIA HOLE) of a printed circuit board with a laser beam using, for example, a mask.
[0002]
[Prior art]
FIG. 18 is a schematic perspective view showing an optical processing apparatus using a conventional optical processing apparatus disclosed in, for example, Japanese Patent Application No. 4-109403. In the figure, 1 is a highly reflective reflector and 2 is a reflection mirror. A highly reflective mask disposed opposite to the mirror 1 and having a reflection film made of a vapor deposition film such as aluminum, leaving a pattern of a predetermined shape, 3 is a laser beam emitted from an excimer laser or the like, 4 is a transfer lens, 5 Is a workpiece such as a printed board to be processed by laser light.
[0003]
Next, the operation will be described. The sheet-shaped (linear) laser light 3 irradiated on the mask 2 passes through the opening 2 a formed in the mask 2 and is further irradiated through the transfer lens 4 so as to form an image on the workpiece 5. , Process this. Further, light other than the light that contributes to the processing is reflected by the mask 2, and further irradiated toward the reflecting mirror 1, reflected there, and irradiated again toward the mask 2, through the opening 2a, and re-executed for the processing. Used. That is, a via hole corresponding to the pattern of the opening 2a is formed. Here, the reflecting mirror 1 may be a cylindrical mirror 1A or a concave mirror 1B as shown in FIGS. 19 (a) and 19 (b).
[0004]
Further, FIG. 20 shows the behavior of the laser beam 3 that is multiple-reflected as described above. That is, as shown in FIG. 18, in the conventional optical system, after the laser beam 3 reflected by the reflecting mirror 1 is repeatedly reflected in the incident direction, in the case of the concave mirror 1B shown in FIG. At the beginning of the return, as shown in FIG. 22, the laser beam finally comes out of the incident position, and the intensity distribution I of the laser beam between the reflecting mirror 1 and the mask 2 at this time is as shown in FIG. In general, the transfer lens 4 is unitized as a combined lens in which a plurality of lenses are combined for reduction transfer, and is shown in a cylindrical shape for convenience. In addition, this light processing apparatus enables processing of a workpiece having a large area that is larger than the irradiation area without changing the size of the optical system itself, and improves the stability of the reflective optical system against variations in the mask angle. The mask and the workpiece can be moved in parallel.
[0005]
[Problems to be solved by the invention]
Since the conventional light processing apparatus is configured as described above, the multiple-reflected laser light 3 travels backward in the incident direction, and the backward laser light 3 is scattered around the optical path, thereby generating dust and resulting In addition to causing damage to optical parts and safety problems, the laser light 3 that is reflected multiple times is scattered without being confined and exits the multiple reflection optical system, so that the effective utilization rate of light is extremely poor. was there.
[0006]
In addition, since high-intensity light is multiply reflected between the mask 2 and the reflecting mirror 1, if dust such as dust is present in the space, it adheres to the mask 2 or the reflecting mirror 1 and damages the surface. There were problems such as.
[0007]
Further, when the reflecting mirror 1 installed facing the mask 2 is damaged for some reason or the reflectance is lowered, it must be immediately removed and replaced, which takes time. There was a problem.
[0008]
The invention of claim 1 is made in order to solve the above-described problems.A laser beam introduction notch for introducing the laser beam only into a part of the reflection film of the reflector.By optimizing the light introduction angle, the scattering of light around the optical path and the generation of dust and the damage of optical components due to this dust can be prevented and the laser beam can be prevented. An object of the present invention is to obtain an optical processing apparatus capable of increasing the utilization rate of the light source.
0009]
Claim2According to the invention, the laser light is smoothly advanced in the optical path between the reflecting mirror and the mask forming the multiple reflecting mirror optical system to confine the laser light, so that the light intensity by the multiple reflection can be sufficiently increased. An object of the present invention is to obtain an optical processing apparatus capable of increasing the utilization efficiency of laser light.
0010]
Claim3It is an object of the present invention to obtain an optical processing apparatus capable of efficiently performing multiple reflections of laser light continuously with a mask by moving unused portions of different parts of one reflector and sequentially using them. To do.
0011]
Claim4An object of the present invention is to obtain an optical processing apparatus capable of preventing damage to a reflective film formed on a mask or a reflecting mirror and adhesion of dust to the reflective film.
0012]
Claim5An object of the present invention is to obtain an optical processing apparatus capable of efficiently reducing the light intensity of laser light emitted from a multiple reflection optical system.
0013]
Claim5An object of the present invention is to obtain an optical processing apparatus capable of maintaining a multiple reflection function with a mask even if a part of the reflection film is damaged.
0014]
Claim6An object of the present invention is to provide an optical processing apparatus capable of performing multiple irradiation with a sufficient light intensity distribution on a mask.
0015]
[Means for Solving the Problems]
An optical processing apparatus according to the invention of claim 1A concave reflecting mirror provided with a laser beam introduction notch for introducing the laser beam into only a part of the reflecting film of the reflecting mirror.It is what.
0016]
Claim2The light processing apparatus according to the invention is provided with a reflecting mirror,Incident in the form of dotsA concave reflecting mirror having a shape in which the optical path is periodically changed with respect to the introduction direction of the laser light and the optical path is advanced in a direction perpendicular to the light introduction direction.
0017]
Claim3In the optical processing apparatus according to the present invention, the reflecting mirror is a rotatable polygonal reflecting mirror whose portion facing the mask can be changed.
0018]
Claim4In the optical processing apparatus according to the present invention, at least one of the reflecting films on the reflecting mirror and the mask is provided on a surface on the opposite side of the surfaces facing each other of the reflecting mirror and the mask.
0019]
Claim5The optical processing apparatus according to the invention is provided with a reflective film on both surfaces of a reflecting mirror.
0020]
Claim6In the light processing apparatus according to the invention, the distance between the mask and the reflecting mirror is set to 290 mm or less.
0021]
[Action]
The optical processing apparatus according to the first aspect of the present invention is configured so that an introduction angle of the laser light from the laser light introduction notch to the multiple reflection optical system can be performed in a direction substantially perpendicular to the mask surface. The laser beam can be advanced with a larger number of reflections than before, while suppressing interference and scattering.
0022]
Claim2The optical processing apparatus according to the invention has a multiple reflection optical system comprising a concave reflecting mirror and a mask,Incident in the form of dotsWhile the laser beam is reflected a predetermined number of times, the laser beam is periodically reciprocated in the light introduction direction, and is further advanced in one direction perpendicular to the light introduction direction.
0023]
Claim3The optical processing apparatus according to the invention allows the unused reflecting film to be opposed to the mask instead of the damaged reflecting film by rotating the polygonal reflecting mirror, and always reflects the reflection efficiency and traveling performance of the laser beam. A good multiple reflection optical system is obtained.
0024]
Claim4In the optical processing apparatus according to the present invention, the reflective film provided on the mask or the reflecting mirror is formed on the surface opposite to the facing surface of the mask or the reflecting mirror, so that dust on the reflecting film on the opposite surface is formed. To prevent adhesion.
0025]
Claim5In the optical processing apparatus according to the present invention, even if the reflection film on the surface facing the mask is damaged, the reflection film on the surface opposite to the side facing the mask maintains the multiple reflection optical system, and This prevents laser light from leaking to the back side and damaging other parts.
0026]
Claim6In the optical processing apparatus of the invention, the distance between the reflecting mirror and the mask is suppressed to 290 mm or less, so that the light intensity distribution on the mask is sufficient with the set number of reflections.
0027]
【Example】
Example 1.
Embodiments of the present invention will be described below with reference to the drawings. FIGS. 1 and 2 are a plan view and a front view conceptually showing a multiple reflection optical system according to an embodiment of the present invention. In the figure, reference numeral 2 denotes a mask, which is a reflecting mirror 1 installed facing the mask 2. Is provided with a laser beam introducing hole 101 through which the laser beam 3 can be introduced. The reflecting mirror 1 is a concave reflecting mirror as shown in FIG.
0028]
The mask 2 is provided with an optical opening 2a as a light passage portion that transmits light having a pattern corresponding to the shape to be processed, and the portion where the light is optically masked is highly reflective. The film 2b is formed. The reflecting mirror 1 provided facing the mask 2 is a concave mirror, and functions to confine the laser beam 3 that is multiply reflected between the mask 2 and the reflecting mirror 1. As a result, the number of multiple reflections of the laser light incident in a dot shape is sufficiently ensured, and the light intensity is sufficiently large.
0029]
Next, the operation will be described. First, when a spot-like laser beam 3 is introduced from a laser beam introduction hole 101 provided in the reflecting mirror 1, the laser beam 3 first proceeds in the X direction in FIG. Multiple reflections are made. Then, the laser light 3 eventually travels while changing its direction in the −X direction due to the light confinement effect of the reflecting mirror 1.
0030]
At this time, the width of the laser beam 3 is gradually narrowed by the effect of the concave reflecting mirror and becomes the minimum near the center of the reflecting mirror 1. Then, the laser beam 3 is propagated in the Y direction in FIG. 1 while repeating the propagation in the X direction and the −X direction.
0031]
The condition in which the vibration of the laser beam 3 in the X direction and the −X direction coincides with the focusing period of the laser beam width of the laser beam 3 in the Y direction is d / R = 1−cos ( π / n₀). Where d is the distance between the mask and the reflecting mirror, R is the radius of curvature of the concave mirror, n₀Is the number of multiple reflections in one cycle.
0032]
As a result, the laser beam 3 is efficiently confined between the mask 2 and the reflecting mirror 1, and the effective use magnification of the light is improved. Since the light is emitted in a direction other than the direction, it is possible to avoid damage to the optical component due to scattering of return light around the optical path and generation of dust.
0033]
As described above, the introduction angle of the laser beam from the laser beam introduction hole 101 to the multiple reflection optical system can be made substantially perpendicular to the mask surface, while suppressing interference and scattering of the laser beam in the multiple reflection optical system. The laser beam can be advanced with a larger number of reflections than in the prior art.
0034]
Further, although the laser beam introduction hole 101 can be easily formed in the reflecting mirror 1, it may be difficult to accurately form a small size for entering a small diameter laser beam. Therefore, instead of drilling the laser beam introduction hole 101, a part of the reflection film of the reflecting mirror 1 is cut out to form a laser beam introduction notch, and this laser beam introduction notch is used as the laser beam introduction notch. It may be used for introduction. In this case, by leaving a part in advance and providing the other part with a metal film by vapor deposition or the like, an incident part for receiving small-diameter spot-like laser light can be formed easily and at low cost. Further, since the mask base material of the mask 2 is covered with the reflective film 2b except for the opening 2a, it is possible to prevent deterioration of the mask base material due to direct irradiation of laser light and a decrease in light transmittance due to this, and for processing. Can be prevented.
0035]
Example 2
3 and 4 are a front view and a plan view conceptually showing another embodiment of the multiple reflection optical system. In the figure, 1 is a reflecting mirror placed opposite to a highly reflective mask 2, and 3 is a laser. This laser light 3 is shaped into a sheet shape. Further, the mask 2 is provided with an optical opening 2a that transmits light of a pattern having a processed shape, and the portion where the light is optically masked is the reflective film 2b having a high reflectance as in the above embodiment. It has become.
0036]
In this embodiment, the reflecting mirror 1 is formed in a polygon (polygon), specifically, an octagon as shown in FIG. 4, so that multiple reflection is performed in the shaded portion near each side. It has become. The octagonal reflecting mirror 1 has a rotating shaft 102 at the center, and can be rotated in the direction of the arrow at an angle of 45 ° around the rotating shaft 102.
0037]
In this embodiment, when multiple reflection as shown in Embodiment 1 is performed for a long time, the reflectance of the reflecting mirror 1 is lowered and the life is reached by irradiation of the laser beam 3 of about 1 × 10 9 shots. However, by rotating the reflecting mirror 1 around the rotation axis 102, it is possible to make multiple reflections again with high reflectivity in other areas not irradiated with light, and to change the areas where multiple reflections occur one after another. Thus, the utilization efficiency of the single reflecting mirror 1 can be increased.
0038]
That is, according to this embodiment, since it is an eight-sided shape, the same operation can be performed eight times, and the life of one reflecting mirror 1 can be extended to 8 × 109 shots.
0039]
Reference example 1.
FIG. 5 shows the multiple reflection optical system of the present invention.Reference exampleThis is a front view conceptually showing thisReference example 1Then, a nozzle 6 is disposed between the reflecting mirror 1 and the mask 2 as gas blowing means for blowing the purge gas 7. The multiple reflection optical system has a conventional configuration. That is, the nozzle 6 functions to spray the purge gas 7 onto the region where the laser beam 3 is multiply reflected. As the purge gas 7, a high-purity nitrogen gas or helium gas is used.
0040]
thisReference exampleAccording to the present invention, when a multiple reflection optical system is used in a normal indoor atmosphere, dust contained in the air is struck onto the mask 2 and the reflecting mirror 1 by the laser beam and adheres to the surface, causing a decrease in reflectance and damage. However, even with such a multiple reflection optical system, dust or the like floating in the multiple reflection optical system can be reduced by irradiating with a high-purity purge gas. As a result, the reflectance can be reduced and damage can be reduced.
0041]
Reference example 2.
Although not shown in the drawings, the reflective film on the mask 2 is attached to the reflective mirror by spraying a cooling gas from a nozzle or the like as a cooling gas spraying means on at least the region of the mask 2 irradiated with the laser beam. Cooling can be performed together with the reflection film and the like, thermal damage to these reflection films can be prevented, and durability can be enhanced.
0042]
Example3.
FIG. 6 is a front view conceptually showing still another embodiment of the multiple reflection optical system of the present invention. The distance relationship between the reflecting mirror 1 and the mask 2 is optimized based on the following calculation. .
0043]
In the multiple reflection optical system, as shown in FIG. 6, the light intensity distribution on the mask 2 is given by superimposing a plurality of laser beams 3 irradiated onto the mask 2 as shown in FIG. It is done. Now, assuming that the speed of light is c, the distance Δt between the laser beams 3 superposed adjacent to each other is given by Δt = 2d / c (d is the distance between the mask 2 and the reflecting mirror 1).
0044]
Here, if the number of multiple reflections is n = 12, the time delay Δt of the laser beam 3 that is finally irradiated on the mask 2 with respect to the laser beam 3 that is initially irradiated on the mask 2._nIs Δt_n= 2nd / c, and if the condition that the time width (pulse width) of the laser beam is not exceeded at the beginning and end of these is given, Δω> Δt when the pulse width Δω of the laser beam is assumed_nThus, the allowable value of the distance d between the reflecting mirror 1 and the mask 2 is d <c · Δω / 2n.
0045]
Considering the case of using an excimer laser, n = 12, Δω = 23 (n sec), c = 30 × 10.⁹Assuming (cm), the distance d between the reflecting mirror 1 and the mask 2 is d <29, and it can be seen that the design should be 29 cm or less.
0046]
Example4.
FIG. 8 is a front view conceptually showing an embodiment of the multiple reflection optical system of the present invention. In this embodiment, the arrangement of the laser beam 3, the reflecting mirror 1 and the mask 2 is the same as the conventional one. However, the reflecting film 2b having a high reflectance is provided on the back surface (lower side) of the mask 2, and the reflecting mirror 1 is highly reflective. A reflective film 1b having a rate of reflection is provided on the back surface (upper side).
0047]
Conventionally, the dust existing between the reflecting mirror 1 and the mask 2 adheres to the mask 2 due to the energy of the laser beam 3, and the reflectance is reduced and the reflecting film 2b is damaged as described above. However, when the reflecting films 1b and 2b of the reflecting mirror 1 and the mask 2 are set so as not to face the reflecting space side of the laser light 3 as in this embodiment, the laser light 3 side of the mask 2 surface and the reflecting mirror 1 surface is Since it is a synthetic quartz substrate, it is possible to prevent dust from adhering to and damage to the reflective films 1b and 2b, and to prevent a decrease in reflectance.
0048]
Although FIG. 8 shows an example of a plane mirror as the multiple reflection mirror 1, the same effect can be obtained even when a spherical mirror is used. In this embodiment, both the mask 2 and the reflecting mirror 1 have the reflecting films 1b and 2b facing in opposite directions. However, as shown in FIGS. 9 and 10, only the mask 2 or the reflecting film 1b of the reflecting mirror 1 is used. Alternatively, a configuration in which only 2b is reversed can be arbitrarily adopted. In the configuration of FIG. 9, the reflection mirror film 2 b of the mask 2 can be hardly damaged, and in the configuration of FIG. 10, the reflection film 1 b of the reflection mirror 1 can be hardly damaged.
0049]
Reference example 3.
11 and 12 show the multiple reflection optical system of the present invention.Reference exampleIs a front view and a plan view conceptually showing theReference example 3Then, with respect to the reflecting mirror 1, a tilt angle adjusting mechanism 8 as a micrometer is installed so that the tilt angle can be adjusted around the pivot shaft 103.
0050]
That is, the structure of the reflecting mirror 1 and the mask 2 in the multiple reflection optical system is the same as the conventional structure, but the adjusting mechanism is not particularly provided for the mask 2, and the tilt angle adjusting mechanism 8 is provided for the reflecting mirror 1. Is different from the conventional one. Regarding the tilt angle adjustment of the reflecting mirror 1, the required accuracy depends on how much the fluctuation of the light intensity distribution by the multiple reflection optical system is allowed.
0051]
For example, in the case of a multiple reflection optical system using a plane reflecting mirror as the reflecting mirror 1, the fluctuation of the light intensity with respect to the light intensity is dI / I = αdθ.₁It becomes. Where α = −2 / (θ₀(RrRm-1 + 2 / (2n + 1))), where I is the light intensity, dI is the fluctuation of the light intensity, Rr and Rm are the reflectance of the reflector and the mask, respectively, θ₀Is the incident angle of the incident laser beam 3, θ₁Is the tilt angle of the reflecting mirror 1, and n is the number of multiple reflections.
0052]
Here, for example, up to a fluctuation of about dI / I = 0.1 is allowed, Rr = Rm = 0.99, n = 12, laser beam incident angle θ with respect to the normal of mask 2₀= 10 mrad, dθ₁= −30 μrad is calculated.
0053]
Accordingly, the tilt angle adjusting mechanism 8 installed in the reflecting mirror 1 may be provided with such an accuracy that the angle can be adjusted. Assuming that the tilt angle can be read about 1/10 of the above value, if the distance from the tilt fulcrum of the reflecting mirror 1 to the head which is the tilt angle adjusting mechanism 8 is 50 mm, the tilt angle adjusting mechanism 8 The distance Δ to be read is Δ = 1/10 · dθ.₁/ 50 = calculated at 60 μm.
0054]
Therefore, the tilt angle adjusting mechanism 8 of the reflecting mirror 1 in the multiple reflection optical system does not require a highly accurate mechanism such as a differential micrometer, and it is sufficient to use a micrometer having a normal minimum reading of 10 μm. .
0055]
The relative angle adjustment between the reflecting mirror 1 of the multiple reflection optical system and the mask 2 can be considered by fixing one and adjusting the other. The size of the reflecting mirror 1 of the multiple reflection optical system is laser light. 3 is determined by the multiple reflection region 3 and is at most about 30 mm square, whereas the mask 2 is, for example, 150 mm square according to the size of the workpiece to be processed. The accuracy required for the above is also required as described above, so that the mask 2 is not provided with a tilt adjustment mechanism as in the present invention, but the method of adjusting the reflecting mirror 1 with a micrometer is simplified. High-precision adjustment can be performed with a simple adjustment mechanism. The aboveReference exampleThe tilting angle adjustment direction can be arbitrarily and accurately set by supporting the reflecting mirror 1 with two axes (pivot support axes) and providing the tilt angle adjusting mechanisms 8 at two locations.
0056]
Reference example 4.
FIG. 13 shows the multiple reflection optical system of the present invention.Reference exampleThis is a front view showing thisReference exampleThen, an optical damper 9 that receives light that has passed through the multiple reflection optical system and attenuates it is provided. In this way, the incident sheet-shaped laser beam 3 is subjected to multiple reflection in one axial direction to effectively use the light, and then the multiple-reflected laser beam 301 is shaped as shown in FIGS. 14 and 15, for example. The light damper 9 received.
0057]
For example, the optical damper 9 of FIG. 14 is provided with pleats 901 on the light receiving surface, thereby increasing the surface area for receiving the laser light 301, thereby reducing the light intensity on the surface of the optical damper material and increasing the light intensity. Avoid surface damage due to strength. On the other hand, the optical damper 9 in FIG. 15 has a material that transmits laser light on the surface, for example, a synthetic quartz substrate 902, eliminates reflection of the laser light on the surface, and absorbs light by the absorbing material 903 installed on the back side. .
0058]
In the multiple reflection optical system, the laser beam 3 is reflected multiple times to effectively use the light, but the light is not reflected infinitely and is not used, and after being reflected a finite number of times (about 10 times in this case) It goes out of the multiple reflection optical system.
0059]
Therefore, in the conventional configuration, after repeating multiple reflections a finite number of times, the light emitted from the multiple reflection optical system is irradiated to the peripheral portion of the optical system and reflected or scattered, resulting in safety problems and dust. The problem such as the occurrence of. On the other hand, in this embodiment, the laser beam 301 after multiple reflection is received by the optical damper 9 so that it is not reflected or scattered around the optical system. It became possible to avoid.
0060]
Example5.
Although not shown, reflection films can be formed on both surfaces of the reflecting mirror 1, and in this case, the reflection film on the side facing the mask 2 is damaged so that the laser beam can be transmitted therethrough. Even if this is not the case, the function of the multiple reflection optical system can be maintained by the function of the reflective film on the side opposite to the facing surface to continue to reflect the laser light.
0061]
Further, since the transmission of the laser beam can be prevented as described above, it is possible to avoid an accident in which the laser beam leaks to the back side of the reflecting mirror 1 and damages the surrounding optical components.
0062]
Reference Example 5.
Further, as shown in FIGS. 16 and 17, the reflecting mirror 1 is provided at a position where it does not interfere with the incidence of the laser light on the mask 2 and the reflection and transfer of the laser light in the multiple reflection optical system, for example, on both sides. By holding with the rail-shaped holding member 21 arranged on the top and the L-shaped holding member 22 fixed to the upper surface, the laser beam can be emitted from the incident stably and efficiently while obtaining sufficient light efficiency. it can.
0063]
【The invention's effect】
As described above, according to the invention of claim 1,A laser beam introduction notch for introducing the laser beam is provided only in a part of the reflection film of the reflector.Since it is configured as a concave reflecting mirror, by introducing laser light from the laser light introduction notch of the reflecting mirror and optimizing the light introduction angle, the periphery of the optical path based on the reverse of the laser light in multiple reflection Scattering of dust and generation of dust and damage of optical components due to this dust can be prevented, and an effect of increasing the utilization rate of laser light can be obtained.In addition, an incident portion for incident laser light can be formed easily and at low cost.
0064]
Claim2According to the invention, the reflector isIncident in the form of dotsThe optical path is periodically changed with respect to the direction of introduction of the laser beam, and a concave reflecting mirror having a shape that advances the optical path in a direction perpendicular to the direction of introduction of the laser beam is configured. By confining the laser beam while smoothly proceeding to the optical path between the reflecting mirror and the mask forming the laser beam, it is possible to increase the use efficiency of the laser beam and to obtain the processing energy with the light intensity.
0065]
Claim3According to the invention, since the reflecting mirror is configured to be a rotatable polygonal reflecting mirror in which the portion facing the mask can be changed, unused reflecting surfaces of different portions of one reflecting mirror are arranged. By sequentially using the laser beamEffectThere is an effect of obtaining what can be reflected efficiently.
0066]
Claim4According to the invention, since at least one of the reflecting films on the reflecting mirror and the mask is provided on the opposite surface of the reflecting mirror and the mask, the mask or the reflecting mirror is provided. An effect is obtained that can prevent damage to the formed reflective film and adhesion of dust to the reflective film.
0067]
Claim5According to the invention, since the reflecting film is provided on both sides of the reflecting mirror, it is possible to maintain the multiple reflection function with the mask even if a part of the reflecting film is damaged. There is an effect.
0068]
Claim6According to the present invention, since the distance between the mask and the reflecting mirror is set to 290 mm or less, there is an effect that it is possible to obtain what can realize multiple reflection of a sufficient light intensity distribution on the mask.
[Brief description of the drawings]
FIG. 1 is a plan view conceptually showing an optical processing apparatus according to an embodiment of the present invention.
2 is a front view showing a state of reflection propagation of laser light in the light processing apparatus in FIG. 1. FIG.
FIG. 3 is a front view conceptually showing an optical processing apparatus according to another embodiment of the present invention.
4 is a plan view of the light processing apparatus in FIG. 1. FIG.
FIG. 5 shows the present invention.Reference exampleIt is a front view which shows notionally the optical processing apparatus by.
FIG. 6 is an explanatory diagram conceptually showing a light intensity distribution in an optical processing apparatus according to still another embodiment of the present invention.
FIG. 7 is a light intensity characteristic diagram used in the description of FIG.
FIG. 8 is a front view conceptually showing an optical processing apparatus according to another embodiment of the present invention.
FIG. 9 is a front view conceptually showing an optical processing apparatus according to still another embodiment of the present invention.
FIG. 10 is a front view conceptually showing an optical processing apparatus according to still another embodiment of the present invention.
FIG. 11 shows the present invention.Reference exampleIt is a front view which shows notionally the optical processing apparatus by.
12 is a plan view of the optical processing apparatus in FIG.
FIG. 13 is a diagram of the present invention.Reference exampleIt is a front view which shows notionally the optical processing apparatus by.
14 is a cross-sectional view showing in detail the optical damper in FIG. 13;
15 is a cross-sectional view showing another embodiment of the optical damper in FIG.
FIG. 16 shows the present invention.Reference exampleIt is a front view which shows the holding structure of the reflecting mirror in.
FIG. 17 shows the present invention.Reference exampleIt is a front view which shows the other holding structure of the reflecting mirror in.
FIG. 18 is a perspective view showing a conventional optical processing apparatus.
FIG. 19 is a perspective view illustrating the reflecting mirror in FIG. 1;
FIG. 20 is an explanatory diagram showing the behavior of laser light in conventional optical processing.
21 is a graph showing the intensity distribution of laser light in FIG.
22 is a pattern diagram showing the intensity distribution of laser light in FIG.
[Explanation of symbols]
1 Reflector
1b, 2b Reflective film
2a Opening (light passage part)
2 mask
3 Laser light
5 Workpiece
6 Nozzle (Purge gas spraying means)
7 Purge gas
8 micrometer (tilt angle adjustment mechanism)
9 Light damper
21, 22 Holding member
101 Hole for introducing laser light
103 pivot

Claims (6)

A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask In the optical processing apparatus comprising the reflecting mirror that receives the laser beam reflected by the laser beam, reflects the laser beam again toward the mask, and irradiates a part of the workpiece to the workpiece through the light passage unit. An optical processing apparatus comprising a concave reflecting mirror provided with a laser beam introduction notch for introducing the laser beam into only a part of a reflecting film of the reflecting mirror. A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask in receiving the reflected laser light, the laser light is reflected toward the mask, a portion of the example Bei a reflecting mirror for irradiating the workpiece through the light passing portion, of the reflector again Among them, a laser beam introduction notch for introducing laser light incident in a spot shape only on a part of the reflective film is provided, or a laser beam incident in a spot shape on a part of the reflecting mirror In the optical processing apparatus having a laser beam introduction hole for introducing a laser beam, the optical path of the reflector is periodically changed with respect to the direction of introduction of the laser beam incident in a dot shape, and the laser beam is introduced. Of a shape that advances the optical path in a direction perpendicular to the direction Optical processing device being characterized in that the surface reflector. A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask In the optical processing apparatus comprising the reflecting mirror that receives the laser beam reflected by the laser beam, reflects the laser beam again toward the mask, and irradiates a part of the workpiece to the workpiece through the light passage unit. An optical processing apparatus, wherein the reflecting mirror is a rotatable polygonal reflecting mirror in which a portion facing the mask can be changed. A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask In the optical processing apparatus comprising the reflecting mirror that receives the laser beam reflected by the laser beam, reflects the laser beam again toward the mask, and irradiates a part of the workpiece to the workpiece through the light passage unit. An optical processing apparatus characterized in that at least one of the reflecting films on the reflecting mirror and the mask is provided on a surface opposite to the surfaces facing each other of the reflecting mirror and the mask. A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask In the optical processing apparatus comprising the reflecting mirror that receives the laser beam reflected by the laser beam, reflects the laser beam again toward the mask, and irradiates a part of the workpiece to the workpiece through the light passage unit. An optical processing apparatus comprising a reflective film on both surfaces of the reflecting mirror. A mask having a light passage part for passing a part of the laser light from the light source and irradiating the workpiece and a reflective film for reflecting the laser light on the other part, and a reflective film of the mask disposed opposite to the mask In the optical processing apparatus comprising the reflecting mirror that receives the laser beam reflected by the laser beam, reflects the laser beam again toward the mask, and irradiates a part of the workpiece to the workpiece through the light passage unit. An optical processing apparatus, wherein the laser beam is an excimer laser beam, and the distance between the mask and the reflecting mirror is set to 290 mm or less.

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