JP3532468B2 - Electrostatic deflector and electrostatic bulkhead manufacturing apparatus - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic deflector used in an injection device for taking in charged particles or an emitting device for taking out charged particles in a circular accelerator or a charged particle storage ring, and more particularly to an electrostatic partition thereof. The present invention relates to the improvement of and the manufacturing apparatus thereof.

[0002]

2. Description of the Related Art FIG. 7 is a diagram showing the structure of a conventional electrostatic deflector shown in "11th Accelerator Science Symposium Proceeding (1997) p. It has a vertical cross section. In the figure, 91 is a septum electrode which is an anode made of titanium foil, and its thickness is about 0.1 mm. 91
Reference numeral a is a partition wall portion which is a portion of the septum electrode 91 facing the charged particle orbit, reference numeral 92 is a cathode which is a counter electrode arranged so as to face the septum electrode 91, and 93 is the septum electrode 91.
It is a septum electrode fixing frame for supporting and fixing. The electrostatic deflector having this configuration is referred to as Conventional Example 1.

Next, the operation will be described. FIG. 8 is a schematic diagram schematically showing the deflection operation of charged particles when the electrostatic deflector of Conventional Example 1 is used in an emission device, and FIG. 9 is the electrostatic deflector of Conventional Example 1 used in an incident device. It is a schematic diagram which represented typically the deflection | deviation operation | movement of the charged particle when used. In the figure,
Reference numeral 95 is an acceleration trajectory of charged particles in an accelerator (not shown), 9
Reference numeral 6 denotes an emission trajectory of charged particles emitted outside the accelerator, and reference numeral 97 denotes an incidence trajectory of charged particles incident inside the accelerator. The operation will be described with reference to these drawings.

In the following, it is assumed that the sign of the charged particles is positive, and when the sign is negative, the cathode is the anode and the negative is positive. First, when used in the emission device, a negative high voltage is applied to the cathode 92 and the septum electrode 91 is grounded. At this time, a potential difference is generated between the septum electrode 91 and the cathode 92, which causes an electric field. Charged particles on an acceleration orbit 95 circulating in an accelerator (not shown) are deflected between the septum electrode 91 and the cathode 92 by the electric field as shown in FIG. 8, and are separated by the partition wall 91a of the septum electrode 91. The charged particles are emitted from the accelerator along the emission trajectory 96.

When it is used as an entrance device, a negative high voltage is applied to the cathode 92, and the septum electrode 91 is grounded to generate a potential difference between the septum electrode 91 and the cathode 92 as in the above-mentioned exit device. , This allows both electrodes 91, 92
Generate an electric field in between. An incident orbit of charged particles traveling between the septum electrode 91 and the cathode 92 is deflected by the electric field as shown in FIG. 9 and is incident on an acceleration orbit 95 circulating in an accelerator (not shown).

In the above operation, the partition wall 91a of the septum electrode 91 receives an electromagnetic force in the direction of being attracted to the cathode 92 side by the electric field generated between the septum electrode 91 and the cathode 92. At this time, if the slack is generated in the septum electrode 91 made of titanium foil, the charged particles collide with the partition wall 91a when the charged particles enter and exit to lose energy. Therefore, the septum electrode 91 is supported and fixed to the septum electrode fixing frame 93 while being stretched so as not to sag.

FIG. 10 is a diagram showing the structure of another conventional electrostatic deflector, which has a cross section in a direction perpendicular to the charged particle orbit. In the figure, 91 'is a septum electrode which is an anode made of a material that is difficult to process, such as tungsten, and is a thin partition wall 91b obtained by shaving one plate material.
And a thick plate portion for supporting and fixing to the septum electrode fixing frame 93 '. Reference numeral 91b is a partition wall portion which is a portion of the septum electrode 91 'facing the charged particle orbit, 92' is a cathode arranged to face the septum electrode 91 ', and 93' is a septum electrode for supporting and fixing the septum electrode 91 '. It is a fixed frame. The electrostatic deflector having this structure is referred to as Conventional Example 2.

[0008]

Since the conventional electrostatic deflector is constructed as described above, in the conventional example 1, when the beam size of charged particles is increased, the septum electrode 91 shown in FIG. 7 is used. It was also necessary to increase the size of the cathode 92. For this reason, the interval between the portions of the septum electrode 91 attached to the septum electrode fixing frame 93 is increased, so that the partition wall portion 91a of the septum electrode 91 is separated from both electrodes 9.
There is a problem that the electromagnetic loss between the first and the second portions causes deformation, and energy loss due to collision of charged particles entering and exiting along the partition wall 91a increases.

Further, in order to reduce the size of the electrostatic deflector, an attempt is made to shorten the lengths of the septum electrode 91 and the cathode 92 in the direction along the charged particle orbit. Since it is necessary to increase the potential difference between the electrodes 91 and 92 in order to maintain the same, the partition wall 91a of the septum electrode 91 is deformed by the electromagnetic force between the electrodes 91 and 92 in the same manner as described above, and the partition wall 91a. There was a problem that the energy loss due to the collision of charged particles entering and exiting along the path would increase.

Further, as in Conventional Example 2, the septum electrode 9
1'is carved out from one plate material to form a thin partition wall portion 91.
When b and a thick plate portion for supporting and fixing to the septum electrode fixing frame 93 'are formed, the problem of deformation due to the electromagnetic force between the two electrodes 91' and 92 'is solved, but it is rigid and difficult to work. The process of forming the septum electrode 91 'from the material
There is a problem that it often causes damage or deformation during processing.

The present invention has been made to solve the above problems, and is a rigid and difficult-to-machine material having a strength to withstand an electromagnetic force generated between a septum electrode, which is an electrostatic partition, and a cathode. It is intended to obtain an electrostatic deflector and an apparatus for manufacturing an electrostatic partition, which uses an electrostatic partition and has a reduced thickness of the electrostatic partition to improve the entrance / exit efficiency of charged particles. .

[0012]

SUMMARY OF THE INVENTION An electrostatic deflector according to the present invention is provided with an electrostatic partition wall and a facing member arranged so as to face the electrostatic partition wall.
An electrode is provided, and an electrode is provided between the electrostatic partition and the counter electrode.
The charged particles are deflected by the generated electric field, and
Electrostatics separating or fusing two charged particle trajectories via
In the deflector, the electrostatic partition wall moves the charged particles.
A tungsten partition having a thickness that does not interfere with
Bonded to both ends of the wall, the electrostatic partition and the counter electrode
The partition wall is deformed by the electromagnetic force generated by the electric field between
Tungsten reinforcement and
The electrostatic partition wall is a joint between the partition wall section and the reinforcing section.
It joins by melting and flowing metal or alloy into the gap.
is there.

In the electrostatic deflector according to the present invention, the electrostatic partition wall has reinforcing portions joined to both ends of the partition wall in the longitudinal direction so that the lateral direction of the partition wall is the traveling direction side of the charged particles. It is a thing.

[0014]

In the electrostatic deflector according to the present invention, the electrostatic partition wall joins the partition part and the reinforcing part in a vacuum container.

In the electrostatic deflector according to the present invention, the electrostatic partition wall is formed by joining the partition wall portion and the high workability member and processing the high workability member to form the reinforcing portion.

In the electrostatic deflector according to the present invention, the members to be joined are sandwiched between the base plates having high flatness, and the members are heated in the vacuum container before joining.

In the electrostatic barrier manufacturing apparatus according to the present invention, the divided bases for bonding the partition and the reinforcing portion, and the joint positions of the partition and the reinforcing portion provided on the base are provided. The partition part and the reinforcing part are joined by melting and inflowing metal or alloy into the joint gap, and the base is made of hard balls according to the thermal expansion of both parts when heating the partition part and the reinforcing part. It is something that moves.

In the electrostatic barrier manufacturing apparatus according to the present invention, the stress removing weight is arranged on the barrier.

The electrostatic barrier manufacturing apparatus according to the present invention is to install the apparatus in a vacuum container.

[0021]

BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described below. Embodiment 1. 1 is a perspective view showing an electrostatic partition wall of an electrostatic deflector according to Embodiment 1 of the present invention. In the figure, 10 is a septum electrode which is an electrostatic partition of an electrostatic deflector (not shown), and 11 is a thin plate (partition) which constitutes the septum electrode 10 and is made of tungsten or the like which has rigidity and high breakdown electric field strength. Reference numerals 12 and 13 denote support reinforcing plates (reinforcing parts) joined to both ends of the thin plate 11 in the longitudinal direction,
It is supported and fixed to a septum electrode fixing frame (not shown) through the supporting and reinforcing plates 12 and 13. Also, the support and reinforcement plates 12, 1
Reference numeral 3 is to reinforce the partition wall of the septum electrode 10 so as not to be deformed (distorted) by an electromagnetic force generated between the septum electrode 10 and a cathode (counter electrode) not shown, and even if the electromagnetic force is applied. Thin plate 1 to prevent deformation
A material sufficiently thicker than that of No. 1 is used, and tungsten or the like is used as the material. Reference numeral 14 is a brazing material (molten metal) that joins the thin plate 11 and the supporting and reinforcing plates 12 and 13 and uses a metal or alloy sufficiently lower than the melting point of the thin plate 11 and the supporting and reinforcing plates 12 and 13.

Next, an outline will be described. The thin plate 11 corresponding to the partition of the septum electrode 10, which is an electrostatic partition, is made of a rigid material such as tungsten, which has high breakdown electric field strength and does not easily distort. As described above, when the septum electrode is conventionally made of a rigid material such as tungsten, it is machined from one member, and the partition wall is processed with a certain degree of flatness due to the poor machinability due to rigidity. Was very difficult. On the other hand, the septum electrode 10 of the present invention does not adopt the conventional shaving process, but only the thin plate 11 that is the partition wall is first formed in the septum electrode 10, and the supporting and reinforcing plate 12 that is the reinforcing portion for reinforcing the septum electrode 10 is formed. , 13 were joined later to form. This has the following advantages. First,
With conventional shaving, it was very difficult to machine the partition wall of the septum electrode to a thickness of 0.3 mm or less, which can sufficiently suppress energy loss due to collision of charged particles. A thin plate material can be used as the thin plate 11. This is because, for example, a plate material made of the above-mentioned material that has been subjected to a cold rolling treatment can be made to have a very high flatness and a thinness of the above degree as it is, but in the present invention, it is used as it is. can do.

Next, the septum electrode 10 is formed in a curved shape along the trajectory of the charged particles in order to reduce the voltage applied between the electrodes. Such processing is also very difficult to perform with the conventional shaving from one member, which requires special and high precision. However, in the case of the present invention, the thin plate 1
1 is deformed into the above-mentioned curved shape, and thereafter, the supporting and reinforcing plate 1
The curved septum electrode 10 can be easily manufactured by bonding the support reinforcing plates 12 and 13 with each other or by bonding the support plate 12 and 13 while pressing the thin plate 11 against the curved mold.

Further, in the septum electrode 10 formed by joining two members, various types can be used according to the charged particle beam size handled by the electrostatic deflector using the same and the size of the electrostatic deflector. Can be easily created.
For example, the septum electrode 10 of the electrostatic deflector according to the first embodiment has the support reinforcing plate 1 at both ends of the thin plate 11 in the longitudinal direction.
2 and 13 are joined and supported and fixed to a septum electrode fixing frame (not shown) by the supporting and reinforcing plates 12 and 13, so that the thin plate 11
The short side direction of is the side of the charged particle traveling direction. Accordingly, even when the beam size is large, the length of the septum electrode 10 can be shortened, and the electrostatic deflector can be downsized.

In addition to the above, for example, when the charged particle beam size is increased to widen the interval between the portions of the septum electrode 91 attached to the septum electrode fixing frame 93, as in the case of the above-mentioned conventional example 1, the In the present invention, the size of the supporting and reinforcing plates 12 and 13 is processed to be large so as to project to the portion of the septum electrode 10 attached to the septum electrode fixing frame to the extent that it does not come into contact with the charged particle beam.
It is possible to provide the septum electrode 10 that can sufficiently reinforce the partition wall against the electromagnetic force.

Next, the joining of the thin plate 11 and the supporting and reinforcing plates 12 and 13 will be described. Thin plate 11 and supporting reinforcing plates 12, 1
3 may be joined to the extent that the joining position does not shift due to the electromagnetic force or the like, but the electrostatic deflector is installed in a container kept in a high vacuum and the septum electrode of the septum electrode is collided by collision of charged particles. Since the temperature rises and radiation is generated, it is impossible to use an adhesive containing an organic substance. Therefore, in the first embodiment, both members are joined by brazing. Next, the joining process by brazing will be described.

First, the thin plate 11 processed into a desired size and the supporting and reinforcing plates 12 and 13 are arranged on the joint surface. At this time, the thin plate 11 and the supporting and reinforcing plates 12 and 13 may be pressed by a pressing jig so that the joining position does not move. After this, these thin plates 11 and supporting and reinforcing plates 12, 1
3 is heated by a gas burner or the like, and the brazing material 14 is melted / flowed into the joint gap. In the first embodiment, the thin plate 1
1 and the supporting and reinforcing plates 12 and 13 have a melting point of about 3400 ° C.
Since it consists of tungsten, it is possible to use all common brazing filler metals, but if a metal with a too low melting point is used, it may melt during baking of the vacuum container in which the electrostatic deflector is installed. High (6
Silver solder or brass solder is used. However, a material containing a small amount of zinc that lowers the melting point is selected. Of course, a brazing material other than the above may be used depending on the material of the members to be joined. As described above, as an advantage of joining by brazing, it is possible to select a brazing material which is a joining agent according to the application of the members to be joined, and further, since the molten metal is made to flow into the joint gap of the members. ,
That is, it is possible to provide the septum electrode 10 in which the thin plate 11 and the supporting and reinforcing plates 12 and 13 are joined to each other with sufficient joining strength, which can be joined with less unevenness.

The thin plate 11 and the supporting and reinforcing plate 1 are brazed.
The septum electrode 10 formed by joining 2 and 13 is thoroughly cleaned and installed in the electrostatic deflector, but is baked and removed to increase the vacuum degree of the vacuum container in which the electrostatic deflector is installed. Do gas.

FIG. 2 is a perspective view for explaining a case where the electrostatic partition of the electrostatic deflector according to the first embodiment of the present invention is formed in a vacuum container. In the figure, 10 'is a septum electrode (electrostatic partition) created in a vacuum vessel, and 14' is a vacuum furnace 2.
It is a brazing material used in No. 1. 21 is a septum electrode 1
This is a vacuum furnace (vacuum vessel) for producing 0 ', and the outer periphery is made transparent to show the inside and is shown by a dashed line. In addition,
The same components as those in FIG.

Next, an outline will be described. The brazing is similar to that shown above, but the advantages of making the joining environment vacuum are listed below. First, since the inside of the vacuum furnace 21 is shielded from the outside, dust and the like do not adhere during processing. In addition, in the above, the thin plate 11 and the support reinforcing plate 1
It was shown that 2 and 13 were heated by using a gas burner. However, since soot due to incomplete combustion of gas adheres to this gas burner, it was necessary to sufficiently clean the septum electrode 10 after joining. On the other hand, under vacuum, direct heating by the gas burner, etc. is not possible, and generally due to current heating by heating wire or electron beam impact, etc., there is no source of impurities and impurities will adhere during bonding. Therefore, it is not necessary to go through the cleaning process as described above.

Further, in brazing under normal pressure, voids and pinholes may be generated by the dissolved gas contained in the brazing material 14 ', but under vacuum, the joint between the thin plate 11 and the supporting and reinforcing plates 12 and 13 is formed. Since the dissolved gas is drawn into the vacuum when the brazing material 14 'is melted in the gap, the above voids and pinholes are not generated, and it is possible to perform the bonding with a high bonding rate without unevenness.

Further, since the thin plate 11 and the supporting and reinforcing plates 12 and 13 are heated to a high temperature (at least above the melting point of the brazing material 14 ') under high vacuum for the brazing, the thin plate 11
It is possible to degas hydrogen, carbon monoxide and the like dissolved in the support reinforcing plates 12 and 13. As a result, the emissive gas rate after manufacturing the septum electrode 10 is reduced, and the septum electrode 10 can be used in a high vacuum without baking for a long time.

As described above, according to the first embodiment, the septum electrode 10, which is an electrostatic partition, has a thin plate 1 which is a partition part having a thickness that does not hinder the progress of the charged particle orbit.
1 and the both ends of the thin plate 11 are joined together to form a septum electrode 1
Since it is composed of the supporting and reinforcing plates 12 and 13 that reinforce the partition wall so as not to be deformed by the electromagnetic force generated by the electric field between 0 and the counter electrode, it is possible to omit difficult processing such as shaving of a difficult-to-process material. Septum electrode 10 of desired size and shape
Can be created easily. Further, since the plate material having high flatness created by the cold rolling process can be used as it is, it is advantageous in cost.

Further, according to the first embodiment, in the septum electrode 10, the supporting and reinforcing plates 12 and 13 are joined to both ends of the thin plate 11 in the longitudinal direction, and the lateral direction of the thin plate 11 is the traveling direction of the charged particles. Therefore, even when the beam size is large, the length of the septum electrode 10 can be shortened, and thus the electrostatic deflector can be downsized.

Further, according to the first embodiment, since the septum electrode 10 is melted and flows into the joint gap between the thin plate 11 and the supporting and reinforcing plates 12 and 13 to be joined, it is used as a joining member. It is possible to select a brazing material that is a suitable bonding agent, and further, it is possible to perform bonding with less unevenness. As a result, the septum electrode 10 in which the thin plate 11 and the supporting and reinforcing plates 12 and 13 are bonded with sufficient bonding strength
Can be provided.

Further, according to the first embodiment, the septum electrode 10 is brazed to the thin plate 11 which is the partition wall and the supporting and reinforcing plates 12 and 13 which are the reinforcing parts in the vacuum container. Since impurities such as dust do not adhere to the inside, cleaning work can be saved. Further, since the brazing filler metal 14 'is melted in a vacuum, the dissolved gas is degassed and voids and pinholes are not generated, and it is possible to carry out the joining with a high joining rate without unevenness. Further, since the septum electrode 10 is heated under a high vacuum, the emissive gas rate after fabrication is reduced and it can be used in a high vacuum without baking for a long time.

Embodiment 2. The second embodiment relates to an apparatus for highly accurately manufacturing the septum electrode shown in the first embodiment by brazing.

FIG. 3 is a view showing the arrangement of an electrostatic barrier rib manufacturing apparatus according to Embodiment 2 of the present invention, in which (a) is a top view,
(B) is sectional drawing which followed the AA line of (a). In the figure, 31, 32, and 33 are thin plates 11 and supporting and reinforcing plates 1.
It is a movable base (base stand) on which the sheets 2 and 13 are placed, and is provided with a heater (not shown) for heating the thin plate 11 and the supporting and reinforcing plates 12 and 13. 34 is a base stand on which the movable bases 31, 32 and 33 are mounted via steel balls 35, and 36 and 37.
Is a positioning pin (positioning portion) which is provided on each of the movable base 32 and the movable base 33 and fixes the joining position between the thin plate 11 and the supporting and reinforcing plates 12 and 13. In addition, the thin plate 11 and the support and reinforcement plates 12 and 13 include the support and reinforcement plates 12,
Holes are formed through the thin plate 11 and the supporting and reinforcing plates 12 and 13 in a state in which 13 is arranged at the joining position of the thin plates 11, and positioning pins 36 and 37 are inserted into these holes to perform positioning. In addition, the same components as those in FIG. 1 are designated by the same reference numerals, and duplicate description will be omitted.

Next, the operation will be described. First, the thin plate 11 is arranged on the movable bases 31, 32 and 33, the support and reinforcement plates 12 and 13 are arranged on the joining positions thereof, and the positioning pins 36 and 37 are inserted into the holes to support the thin plate 11 and the support and reinforcement. Board 1
The joint position with 2 and 13 is determined. Thus, the thin plate 11
And the supporting and reinforcing plates 12 and 13 are positioning pins 36 and 37.
Since it is fixed by the above, the finishing accuracy of the septum electrode can be improved, and the thin plate 11 and the supporting and reinforcing plates 12 and 13 can be prevented from being displaced during brazing.

Next, the thin plate 11 and the supporting and reinforcing plates 12 and 13 are heated by the heaters provided on the movable bases 31, 32 and 33. When the temperature rises to a certain extent, the thin plate 11, the supporting and reinforcing plates 12 and 13, and the movable bases 32 and 33 cause thermal expansion. At this time, the movable bases 31, 32, and 33 are divided as shown in FIG. 3A, and can be freely moved by the steel ball 35. Therefore, the positioning pins 36 and 37 are used as starting points. Movable base 32,3
3 moves. Thereby, the thin plate 11 and the support reinforcing plate 1
It is possible to prevent thermal stress from being applied to the thin plate 11 by absorbing the difference in thermal expansion between the movable bases 32 and 33 that fix the positioning pins 36 and 37 and the movable pins 32 and 33.

After that, the thin plate 11 and the supporting and reinforcing plates 12, 1
When the temperature of 3 is raised to the melting point of the brazing material, the brazing material is melted / flowed into the joint gap to perform joining. The joining operation and the brazing material used are the same as those described in the first embodiment.

FIG. 4 is a diagram showing another structure of the electrostatic barrier manufacturing apparatus according to the second embodiment of the present invention. FIG. 4A is a top view and FIG. 4B is a sectional view taken along line BB of FIG. FIG.
In the figure, 61, 62 and 63 are weights (stress-removing weights) respectively arranged on the portion of the thin plate 11 that serves as the partition of the septum electrode, the supporting and reinforcing plate 12 and the supporting and reinforcing plate 13.
Is. In addition, the same components as those in FIG. 3 are denoted by the same reference numerals, and overlapping description will be omitted.

The outline will be described below. When heating is performed without disposing the weights 61, 62 and 63 as described above,
When the movable bases 32 and 33 move due to thermal expansion, stress may concentrate on the portion of the thin plate 11 that will be the partition of the septum electrode. Therefore, when the weights 61, 62, 63 are arranged and then heated, the thin plate 11 and the supporting and reinforcing plates 12, 1 are
The stress relief of 3 can be performed. As a result, the manufactured septum electrode is not deformed, and the finishing accuracy can be further improved.

Further, the above septum electrode manufacturing apparatus may be installed in a vacuum container. In this case, it is necessary to create a special manipulator or the like for performing the brazing work in the container, but by brazing in a vacuum, it is possible to obtain a bonding rate without voids and pinholes as shown in the first embodiment. A high bond can be made. Further, since the thermal stress due to the thermal expansion generated by the heating of the thin plate 11 and the supporting and reinforcing plates 12 and 13 can be removed, the septum electrode can be accurately processed.

As described above, according to the second embodiment, the movable bases 31, 32, 33 for joining the thin plate 11 and the supporting and reinforcing plates 12, 13 and the movable bases 31, 3 are used.
The thin plate 11 and the supporting and reinforcing plates 12, 1 are provided with positioning pins 36, 37 which are positioning parts for fixing the joining positions of the thin plate 11 and the supporting and reinforcing plates 12, 13 provided on the thin plate 11, 2, 33.
3 is a brazing material that is a metal or an alloy that is melted and flows into the joint gap to join the brazing material, and the movable bases 31, 32 and 33 are thin plates 11
When the support and reinforcing plates 12 and 13 are heated, the thin plate 11 and the support and reinforcing plates 12 and 13 move in accordance with their thermal expansion.
It is possible to absorb the difference in thermal expansion between the movable bases 32 and 33 that fix the positioning pins 36 and 37, and to prevent thermal stress from being applied to the thin plate 11. As a result, the manufactured septum electrode is not deformed, and the finishing accuracy can be further improved.

Further, according to the second embodiment, the thin plate 1
Weights 61, 62, 63 which are stress-relieving weights on 1
By disposing, the thermal stress can be prevented from concentrating particularly on the portion of the thin plate 11 that will be the partition of the septum electrode.

Further, according to the second embodiment, since the apparatus is installed in the vacuum container, it is possible to perform the bonding with a high bonding rate without voids and pinholes, and further, the thermal stress generated by the thermal expansion. Can be removed. As a result, the septum electrode can be processed with higher accuracy.

Embodiment 3. In the third embodiment, the members to be joined before the brazing process described in the above embodiments are sandwiched between the base plates having high flatness, and the pretreatment of heating the members in the vacuum container is performed. .

FIG. 5 is a perspective view for explaining the pretreatment of the thin plate 11 which becomes the partition wall portion of the electrostatic partition wall of the electrostatic deflector according to the third embodiment of the present invention. In the figure, 71 is a plate-shaped weight (base plate) having a high flatness, and 72 is a base table (base plate) on which the weight 71 is placed via the thin plate 11, and is composed of a plate-shaped member having a high flatness. 73 is a vacuum furnace (vacuum container)
In order to show the inside, the outer circumference is made transparent and is shown by a dashed line.

Next, an outline will be described. Before performing the brazing shown in the above-mentioned embodiment, the thin plate 11 and the supporting and reinforcing plates 12 and 13 which are members to be joined are sandwiched between the weight 71 and the base pedestal 72 which are base plates having high flatness, and these are vacuum furnace. Heat in 73. In the example of FIG. 5, the thin plate 11 is sandwiched between the weight 71 and the base 72 as a member to be joined. By heating this in the vacuum furnace 73, the residual stress contained in the thin plate 11 at the time of manufacturing the thin plate 11 can be removed. As a result, deformation during heating is suppressed, and the flatness of the thin plate 11 can be increased. Further, the improved flatness allows the brazing material to be uniformly distributed during brazing, which improves the thickness accuracy of the septum electrode after brazing and joining.

As described above, according to the third embodiment, the thin plate 11 and the support / reinforcement plates 12, 1 which are members to be joined are used.
3 is sandwiched between a weight 71 and a base 72, which are base plates having high flatness, and the member is heated in a vacuum furnace 73 before joining, so that residual stress generated during manufacturing of the members to be joined can be removed. Therefore, the flatness of the members to be joined can be increased. Moreover, this allows the brazing material to be uniformly distributed, and the accuracy of the thickness of the septum electrode after brazing can be improved.

The pretreatment operation of the members to be joined shown in the third embodiment may be performed for the configurations of the first to second embodiments.

Fourth Embodiment In the above-described embodiment, the septum electrode is created by joining the partition part and the reinforcing part that are created in advance, but in the fourth embodiment, a rigid member having a high breaking electric field strength and a highly workable member. Are joined together and the high workability member is processed to form a reinforcing portion.

FIG. 6 is an explanatory view showing a process of forming an electrostatic partition of the electrostatic deflector according to the fourth embodiment of the present invention. In the figure, 10 ″ is a septum electrode which is an electrostatic partition according to the fourth embodiment, 81 is a plate member (partition) which is made of a rigid material such as tungsten, and is used in the first embodiment.
The thin plate 11 has the same thickness. Numeral 82 is a plate member (highly machinable member) made of a material such as tantalum or molybdenum having high machinability, 81a is a partition formed by shaving the plate member 82, and 82a and 82b are shaving the plate member 82. It is a support reinforcing plate (reinforcing part).

Next, an outline will be described. Plate member 81,
The joining of 82 may be performed by the brazing shown in the first embodiment, or as another joining means, explosive force may be used to explode to press members together. The plate members 81 and 82 joined in this manner are plate members 8 made of a highly workable material.
Support reinforcement plates 82a, 82b by machining only the 2 side
Are carved out to form a septum electrode 10 ″. Since tantalum, molybdenum, and the like used for the plate member 82 have good machinability unlike tungsten, they can be easily machined by shaving the septum electrode and can be deformed less during machining, which is necessary. A septum electrode of various shapes can be produced with high precision.

As described above, according to the fourth embodiment, in the septum electrode 10 ″, the plate member 81 serving as the partition wall portion and the plate member 82 serving as the high workability member are joined to each other to form the plate member 82.
Is processed to form the support reinforcing plates 82a and 82b,
Deformation during machining can be reduced, and the septum electrode 10 ″ having a required shape can be formed with high accuracy.

In the first, third and fourth embodiments, the thin plate 11 (plate member 81) and the supporting and reinforcing plates 12, 13 (plate member 82) are joined by brazing. As shown, the septum electrode of the present invention is not particularly limited to brazing, as long as the bonding strength is sufficient to withstand the electromagnetic force generated between the septum electrode and the facing cathode. . For example, the members can be fixed by screwing. In this case, processing accuracy is required to maintain the flatness, but since it is removably attached, members processed into various shapes can be used according to the application.

[0058]

As described above, according to the electrostatic deflector of the present invention, the electrostatic partition wall is joined to the partition wall portion having a thickness that does not hinder the progress of the charged particles and both end portions of the partition wall portion. , And a reinforcing portion that reinforces the partition wall so that the partition wall is not deformed by the electromagnetic force generated by the electric field between the electrostatic partition wall and the counter electrode. Therefore, it is desirable to omit difficult processing such as shaving difficult-to-machine materials. Since the partition wall and the reinforcing portion processed into the size and shape are joined to form the electrostatic partition wall, there is an effect that it can be manufactured much more easily than the conventional one. In other words, the difficulty and restrictions of conventional processing can be solved, so that it is possible to freely select the reinforcing portion having the optimum size and shape of the partition wall portion or the reinforcing portion, and it is possible to generate between the electrostatic partition wall and the counter electrode. It is possible to provide an electrostatic partition wall in which the partition wall portion is not deformed by the electromagnetic force. As a result, there is an effect that it is possible to provide an electrostatic deflector provided with an electrostatic partition wall that can reduce energy loss of charged particles entering and exiting.

Further, since the electrostatic barrier ribs can be formed only by joining the barrier rib portion and the reinforcing portion, it is possible to use the plate material having a high flatness produced by the cold rolling process as it is, which is cost effective. There is also an advantageous effect.

According to the electrostatic deflector of the present invention, the electrostatic partition wall has reinforcing portions joined to both ends of the partition wall in the longitudinal direction so that the lateral direction of the partition wall is the traveling direction side of the charged particles. Therefore, even when the beam size is large, the length of the electrostatic partition wall can be shortened, and the electrostatic deflector can be downsized.

According to the electrostatic deflector of the present invention, the electrostatic partition wall melts the metal or alloy in the joint gap between the partition section and the reinforcing section.
Since they are made to flow and are joined, it is possible to select a metal or an alloy according to the application of the members to be joined, and further, it is possible to join with less unevenness. As a result, there is an effect that it is possible to provide an electrostatic partition wall in which the partition wall portion and the reinforcing portion are bonded together with a sufficient bonding strength.

According to the electrostatic deflector of the present invention, since the electrostatic partition wall is joined to the partition part and the reinforcing part in a vacuum container, impurities such as dust do not adhere during processing, and cleaning is performed. There is an effect that you can reduce the effort.

Further, since the metal or alloy is melted in a vacuum, the dissolved gas is not degassed and voids and pinholes are not generated, and there is an effect that it is possible to carry out bonding with a high bonding rate without unevenness.

Furthermore, since the electrostatic barrier ribs are heated in a high vacuum, the radiation gas rate after fabrication is reduced, and there is an effect that they can be used in a high vacuum without baking for a long time.

According to the electrostatic deflector of the present invention, since the electrostatic partition wall joins the partition wall portion and the high workability member and processes the high workability member to form the reinforcing portion, deformation during machining. It is also possible to reduce the number of electrodes, and it is possible to produce an electrostatic barrier having a required shape with high accuracy.

According to the electrostatic deflector of the present invention, the members to be joined are sandwiched between the base plates having high flatness, and the members are heated in the vacuum container before joining. Residual stress can be removed, and the flatness of the members to be joined can be increased. Further, this allows the molten metal or alloy to be uniformly distributed, which has the effect of improving the thickness accuracy of the electrostatic barrier ribs after joining.

According to the electrostatic barrier manufacturing apparatus of the present invention,
The base part for joining the partition part and the reinforcing part and the positioning part for fixing the joining position of the partition part and the reinforcing part provided on the base stand are provided, and the partition part and the reinforcing part are made of metal or metal in the joint gap. The alloy is melted / flowed in and joined, and the base pedestal moves according to the thermal expansion of the partition wall and the reinforcing part during heating, so the thermal expansion difference between the partition part and the reinforcing part and the base pedestal is absorbed. It is possible to prevent thermal stress from being applied to the part. As a result, the produced electrostatic partition wall is not deformed, and the finishing accuracy can be further improved.

According to the electrostatic barrier manufacturing apparatus of the present invention,
Since the stress removing weight is arranged on the partition wall, it is possible to prevent the thermal stress from being concentrated on the partition wall.

According to the electrostatic barrier manufacturing apparatus of the present invention,
Since the apparatus is installed in a vacuum container, it is possible to perform bonding with a high bonding rate without voids and pinholes, and further it is possible to remove the thermal stress generated by thermal expansion.

[Brief description of drawings]

FIG. 1 is a perspective view showing an electrostatic partition wall of an electrostatic deflector according to a first embodiment of the present invention.

FIG. 2 is a perspective view illustrating a case where the electrostatic partition of the electrostatic deflector according to the first embodiment of the present invention is formed in a vacuum container.

3A and 3B are diagrams showing a configuration of an electrostatic partition manufacturing apparatus according to Embodiment 2 of the present invention, in which FIG. 3A is a top view and FIG. 3B is a sectional view taken along line AA of FIG. is there.

4A and 4B are views showing another configuration of the electrostatic partition manufacturing apparatus according to the second embodiment of the present invention, in which FIG. 4A is a top view and FIG.
FIG. 7A is a sectional view taken along line BB in FIG.

FIG. 5 is a perspective view for explaining a pretreatment of a thin plate 11 to be a partition of an electrostatic partition of an electrostatic deflector according to a third embodiment of the present invention.

FIG. 6 is an explanatory diagram showing a process of forming an electrostatic partition of an electrostatic deflector according to a fourth embodiment of the present invention.

FIG. 7 is a diagram showing a configuration of a conventional electrostatic deflector shown in “11th Accelerator Science Symposium Proceeding (1997) p. 59-61”.

FIG. 8 is a schematic diagram schematically showing a deflection operation of charged particles when the electrostatic deflector of Conventional Example 1 is used in an emission device.

FIG. 9 is a schematic diagram schematically showing a deflection operation of charged particles when the electrostatic deflector of Conventional Example 1 is used in an incident device.

FIG. 10 is a diagram showing a configuration of another conventional electrostatic deflector.

[Explanation of symbols]

10, 10 'Septum electrode (electrostatic partition), 11 Thin plate (partition part), 11a, 81a Partition part, 12, 13, 8
2a, 82b Support reinforcing plate (reinforcing part), 14, 14 '
Brazing material (metal or alloy), 21,73 vacuum furnace (vacuum container), 31, 32, 33 movable base (base stand), 3
4 base stand, 36, 37 positioning pin (positioning part), 61, 62, 63 weight (stress removing weight), 71 weight (base plate), 72 base stand (base plate), 81 plate member (partition wall part) , 82 Plate member (highly workable member).

─────────────────────────────────────────────────── --Continued from the front page (56) References JP-A-9-222524 (JP, A) JP-A-9-53112 (JP, A) JP-A-4-187371 (JP, A) JP-A-3- 204170 (JP, A) Actually open 62-112899 (JP, U) Actually open 61-11300 (JP, U) Actually open 4-43900 (JP, U) Actually open 6-79138 (JP, U) (58) Fields investigated (Int.Cl. ⁷ , DB name) G21K 1/00 H05H 13/00 H05H 7/00

Claims (8)

(57) [Claims] 1. An electrostatic partition wall and a counter electrode arranged to face the electrostatic partition wall, wherein charged particles are deflected by an electric field generated between the electrostatic partition wall and the counter electrode, In an electrostatic deflector that separates or fuses two orbits of charged particles via a partition wall, the electrostatic partition wall is a tungsten partition wall having a thickness that does not hinder the progress of the charged particles, and both ends of the partition wall. is joined to the section consists of a reinforcing portion of the tungsten the partition wall in an electromagnetic force generated by the electric field is reinforced so as not to deform between the electrostatic barrier ribs and the counter electrode, the electrostatic septum
Is made of metal or metal in the joint gap between the partition wall and the reinforcement.
An electrostatic deflector characterized by melting and inflowing gold for joining . 2. The electrostatic partition is characterized in that reinforcing portions are joined to both ends of the partition in the longitudinal direction so that the lateral direction of the partition is on the advancing direction side of the charged particles. Item 1
The electrostatic deflector described. 3. The electrostatic deflector according to claim 1 , wherein the electrostatic partition is formed by joining the partition and the reinforcing section in a vacuum container. 4. The electrostatic deflector according to claim 1, wherein the electrostatic partition wall is formed by joining the partition wall portion and the high workability member and processing the high workability member to form a reinforcing portion. . 5. The member to be joined is sandwiched between base plates having high flatness, and the member is heated in a vacuum vessel before joining, according to any one of claims 1 to 4. Electrostatic deflector. 6. A partition wall, in the manufacturing apparatus of an electrostatic barrier rib comprising a reinforcing portion joined to the opposite ends of the partition wall portion, which is respectively divided perform bonding between the partition wall and the reinforcing portion <br / > A base table and a positioning section for fixing the joining position of the partition section and the reinforcing section provided on the base table, and the partition section and the reinforcing section melt the metal or alloy in the joint gap. An apparatus for manufacturing an electrostatic partition, which is made to flow and bond, and the base table is moved by hard balls in accordance with thermal expansion of both the partition section and the reinforcing section when the partition section and the reinforcing section are heated. 7. The electrostatic partition manufacturing apparatus according to claim 6 , wherein a stress removing weight is arranged on the partition part. 8. The apparatus for manufacturing an electrostatic partition according to claim 7, wherein the apparatus is installed in a vacuum container.