JP3443110B2 - Adhesive sheet for dicing - Google Patents
Adhesive sheet for dicingInfo
- Publication number
- JP3443110B2 JP3443110B2 JP2001194021A JP2001194021A JP3443110B2 JP 3443110 B2 JP3443110 B2 JP 3443110B2 JP 2001194021 A JP2001194021 A JP 2001194021A JP 2001194021 A JP2001194021 A JP 2001194021A JP 3443110 B2 JP3443110 B2 JP 3443110B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- sensitive adhesive
- dicing
- adhesive sheet
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000853 adhesive Substances 0.000 title claims description 16
- 230000001070 adhesive effect Effects 0.000 title claims description 16
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 100
- 239000010410 layer Substances 0.000 claims description 44
- -1 propylene, ethylene Chemical group 0.000 claims description 27
- 238000010828 elution Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 24
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
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- 229920002725 thermoplastic elastomer Polymers 0.000 claims description 15
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 239000004711 α-olefin Substances 0.000 claims description 12
- 238000005520 cutting process Methods 0.000 claims description 11
- 238000002844 melting Methods 0.000 claims description 11
- 230000008018 melting Effects 0.000 claims description 11
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical group ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 claims description 9
- 230000000630 rising effect Effects 0.000 claims description 6
- 239000002356 single layer Substances 0.000 claims description 4
- 238000004090 dissolution Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 description 17
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 16
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
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- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
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- 239000007787 solid Substances 0.000 description 3
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- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
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- 125000005234 alkyl aluminium group Chemical group 0.000 description 2
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- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
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- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- JHVNMGWNEQGGDU-UHFFFAOYSA-N tert-butyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C(C)(C)C)OCC JHVNMGWNEQGGDU-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ダイシング用粘着
シートに関する。さらには当該ダイシング用粘着シート
を用いてダイシングを行なう方法に関する。本発明のダ
イシング用粘着シートは、半導体ウエハ等の素子小片を
切断分離(ダイシング)する際に、当該半導体ウエハ等
の被切断物を固定するために用いる半導体ウエハダイシ
ング用粘着シートとして特に有用である。例えば、本発
明のダイシング用粘着シートは、シリコン半導体ダイシ
ング用粘着シート、化合物半導体ウエハダイシング用粘
着シート、半導体パッケージダイシング用粘着シート、
ガラスダイシング用粘着シートなどとして使用できる。TECHNICAL FIELD The present invention relates to a pressure-sensitive adhesive sheet for dicing. Furthermore, the present invention relates to a method for dicing using the pressure-sensitive adhesive sheet for dicing. INDUSTRIAL APPLICABILITY The pressure-sensitive adhesive sheet for dicing of the present invention is particularly useful as a pressure-sensitive adhesive sheet for semiconductor wafer dicing used for fixing an object to be cut such as a semiconductor wafer when dicing (cutting) element pieces such as a semiconductor wafer. . For example, the pressure-sensitive adhesive sheet for dicing of the present invention is a pressure-sensitive adhesive sheet for silicon semiconductor dicing, a pressure-sensitive adhesive sheet for compound semiconductor wafer dicing, a pressure-sensitive adhesive sheet for semiconductor package dicing,
It can be used as an adhesive sheet for glass dicing.
【0002】[0002]
【従来の技術】従来よりシリコン、ガリウム、砒素など
を材料とする半導体ウエハは、大径の状態で製造された
後、素子小片に切断分離(ダイシング)され、更にマウ
ント工程に移される。この際、半導体ウエハは粘着シー
トに貼付され保持された状態でダイシング工程、洗浄工
程、エキスパンド工程、ピックアップ工程、マウント工
程の各工程が施される。前記粘着シートとしては、プラ
スチックフィルムからなる基材上にアクリル系粘着剤が
1〜200μm程度が塗布されてなるものが一般的に用
いられている。2. Description of the Related Art Conventionally, a semiconductor wafer made of silicon, gallium, arsenic, or the like is manufactured in a large diameter state, cut into small pieces (dicing) into element pieces, and then transferred to a mounting step. At this time, the semiconductor wafer is subjected to the dicing process, the cleaning process, the expanding process, the pickup process, and the mounting process while being attached and held on the adhesive sheet. As the pressure-sensitive adhesive sheet, generally used is one in which an acrylic pressure-sensitive adhesive is applied to a substrate made of a plastic film in an amount of about 1 to 200 μm.
【0003】前記ダイシング工程においては、回転しな
がら移動する丸刃によってウエハの切断が行なわれる
が、その際に半導体ウエハを保持するダイシング用粘着
シートの基材内部まで切り込みを行なうフルカットと呼
ばれる切断方式が主流となってきている。そして、フル
カットによる切断方法では、粘着シートの内部まで切り
込みが行なわれる結果、基材であるプラスチックフィル
ム自身が糸状となった切断屑が発生する。この糸状屑が
チップ(被切断体)側面などに付着すると、付着した糸
状屑は、そのまま、後工程においてマウント、封止され
てしまい、半導体素子の信頼性を著しく低下させる原因
になっているという問題があった。また、ピックアップ
工程においては個々のチップをCCDカメラで認識し位
置合わせしてた後にピックアップが行われるが、糸状屑
があると認識エラーを起こすという不具合もある。In the dicing step, the wafer is cut by a circular blade that moves while rotating, and at that time, a cutting called a full cut is performed to cut inside the base material of the pressure-sensitive adhesive sheet for dicing that holds the semiconductor wafer. The method is becoming mainstream. In the full-cut cutting method, cutting is performed inside the pressure-sensitive adhesive sheet, and as a result, the plastic film itself, which is the base material, forms cutting wastes. When the thread waste adheres to the side surface of the chip (the object to be cut) or the like, the adhered thread waste is mounted and sealed as it is in the subsequent process, which is a cause of markedly reducing the reliability of the semiconductor element. There was a problem. Further, in the pickup process, the pickup is performed after the individual chips are recognized by the CCD camera and aligned with each other, but there is a problem that a recognition error occurs if there is a thread waste.
【0004】このような問題を解決する手段として、例
えば特開平5−156214号公報には、基材としてエ
チレン−メタクリレート共重合体を用いた粘着シートが
提案されている。しかし、この粘着シートでは糸状屑の
発生は幾分かは少なくなるものの、今後、高信頼性半導
体の製造のダイシング工程に耐えうるレベルを満たし得
るものではない。As a means for solving such a problem, for example, Japanese Patent Application Laid-Open No. 5-156214 proposes an adhesive sheet using an ethylene-methacrylate copolymer as a base material. However, with this pressure-sensitive adhesive sheet, although the generation of filamentous waste is somewhat reduced, it is not possible to satisfy the level that can withstand the dicing process of manufacturing a highly reliable semiconductor in the future.
【0005】また特開平5−211234号公報では、
基材フィルムに1〜80MRadの電子線又はγ線等の
放射線を照射したフィルムを用いた粘着シートが提案さ
れている。しかし、この粘着シートでは放射線照射によ
るフィルムダメージが大きく、外観的に良好なフィルム
が得られ難いうえ、フィルム製造において多大なコスト
がかかり、品位面及び価格面で好ましくない。Further, in Japanese Unexamined Patent Publication No. 511234/1993,
A pressure-sensitive adhesive sheet has been proposed which uses a film obtained by irradiating a base film with radiation such as an electron beam or γ-ray of 1 to 80 MRad. However, with this adhesive sheet, film damage due to radiation irradiation is large, it is difficult to obtain a film having a good appearance, and a large cost is required in the film production, which is not preferable in terms of quality and price.
【0006】[0006]
【発明が解決しようとする課題】本発明は上記のような
従来技術に伴う問題を解決しようとするものであり、製
品品位の低下やコスト的な不利益が無く、しかもダイシ
ング時の糸状屑の発生の少ないダイシング用粘着シート
を提供することを目的とする。さらには、当該ダイシン
グ用粘着シートを用いたダイシング方法を提供すること
を目的とする。SUMMARY OF THE INVENTION The present invention is intended to solve the problems associated with the prior art as described above, and is free from the deterioration of product quality and cost disadvantages, and moreover, the generation of filamentous scraps during dicing. It is an object of the present invention to provide a pressure-sensitive adhesive sheet for dicing. Furthermore, it aims at providing the dicing method using the said adhesive sheet for dicing.
【0007】[0007]
【課題を解決するための手段】本発明者らは、前記課題
を解決すべくダイシング用粘着シートを構成する基材フ
ィルムについて鋭意検討した結果、基材フィルムに、特
定のオレフィン系熱可塑性エラストマーを用いること
で、前記目的を達成できることを見出し、本発明を完成
するに至った。Means for Solving the Problems The inventors of the present invention have made earnest studies on a base film constituting a pressure-sensitive adhesive sheet for dicing in order to solve the above-mentioned problems, and as a result, a specific olefinic thermoplastic elastomer was added to the base film. It was found that the above-mentioned objects can be achieved by using them, and the present invention has been completed.
【0008】すなわち本発明は、基材フィルム上の少な
くとも片面に粘着剤層が設けられてなるダイシング用粘
着シートにおいて、前記基材フィルムが、プロピレン並
びにエチレンおよび/または炭素数4〜8のα−オレフ
ィンを重合成分として含有するオレフィン系熱可塑性エ
ラストマーを含有してなり、かつ当該オレフィン系熱可
塑性エラストマーの融点ピーク温度が120℃以上であ
り、当該オレフィン系熱可塑性エラストマーは、o−ジ
クロロベンゼンを溶媒として用いた温度0〜140℃の
間の温度上昇溶離分別における0℃での溶出分が全溶出
量に対して10〜60重量%であることを特徴とするダ
イシング用粘着シート、に関する。That is, the present invention provides a pressure-sensitive adhesive sheet for dicing, which comprises a pressure-sensitive adhesive layer provided on at least one surface of a base film, wherein the base film is propylene and ethylene and / or α- having 4 to 8 carbon atoms. and also contains an olefinic thermoplastic elastomer containing olefinic as a polymerization component, and is a melting point peak temperature of the olefin-based thermoplastic elastomer is 120 ° C. or higher, the olefin-based thermoplastic elastomer, o- di
Chlorobenzene as a solvent at a temperature of 0 to 140 ° C
During the temperature rise during the elution fractionation, the elution fraction at 0 ° C is the total elution fraction
It relates to a pressure-sensitive adhesive sheet for dicing, which is 10 to 60% by weight based on the amount .
【0009】上記本発明のダイシング用粘着シートの基
材フィルムを構成するオレフィン系熱可塑性エラストマ
ーは、プロピレン並びにエチレンおよび/または炭素数
4〜8のα−オレフィンを重合成分として含有するもの
のなかでも、融点ピ−ク温度が120℃以上のものがダ
イシング時に基材フィルムの伸びが低下して、ダイシン
グ時の糸状屑の発生を抑えられることを見出したもので
ある。前記オレフィン系熱可塑性エラストマーの融点ピ
−ク温度は好ましくは140℃以上、さらに好ましくは
160℃以上である。融点ピ−ク温度は一般的にはJI
S K7121に準拠して示差走査熱量計(DSC)で
測定される。The olefin-based thermoplastic elastomer constituting the base film of the pressure-sensitive adhesive sheet for dicing of the present invention contains propylene and ethylene and / or α-olefin having 4 to 8 carbon atoms as a polymerization component. It has been found that a material having a melting point peak temperature of 120 ° C. or higher reduces the elongation of the base material film during dicing and can suppress the generation of filamentous scraps during dicing. The melting point peak temperature of the olefinic thermoplastic elastomer is preferably 140 ° C. or higher, more preferably 160 ° C. or higher. The melting point peak temperature is generally JI.
It is measured by a differential scanning calorimeter (DSC) according to SK7121.
【0010】前記ダイシング用粘着シートにおいて、前
記オレフィン系熱可塑性エラストマーは、o−ジクロロ
ベンゼンを溶媒として用いた温度0〜140℃の間の温
度上昇溶離分別における0℃での溶出分が全溶出量に対
して10〜60重量%であることが好ましい。In the pressure-sensitive adhesive sheet for dicing, the olefin-based thermoplastic elastomer has a total elution amount at 0 ° C. in the temperature rising elution fractionation using o-dichlorobenzene as a solvent at a temperature of 0 to 140 ° C. It is preferably 10 to 60% by weight.
【0011】前記オレフィン系熱可塑性エラストマーの
0℃での溶出分の全溶出量に対する割合は、ダイシング
時の糸状屑の発生を抑えられ、かつエキスパンド性や基
材フィルムの粘着剤層との接着性を満足しうる好ましい
範囲である。0℃での溶出分の割合が少なくなると、オ
レフィン系熱可塑性エラストマーを成形して得られる基
材フィルムが硬く、エキスパンド時の伸び性が悪くなる
ほか、ピックアップもし辛くなる傾向があることから、
前記0℃での溶出分の割合は20重量%以上であるのが
好ましい。また、前記0℃での溶出分の割合が多くなる
と、オレフィン系熱可塑性エラストマーを成形して得ら
れる基材フィルムの粘着剤層との接着性が劣る傾向があ
ることから前記0℃での溶出分の割合は50重量%以下
であるのが好ましい。The ratio of the elution amount of the olefinic thermoplastic elastomer to the total elution amount at 0 ° C. is such that the generation of filamentous scraps during dicing can be suppressed, and the expandability and the adhesiveness with the adhesive layer of the substrate film can be suppressed. Is a preferable range that satisfies the above condition. When the proportion of the eluate at 0 ° C. decreases, the base film obtained by molding the olefin-based thermoplastic elastomer becomes hard, the expandability at the time of expansion becomes poor, and the pickup tends to be difficult,
The elution ratio at 0 ° C. is preferably 20% by weight or more. Further, when the proportion of the elution at 0 ° C. increases, the adhesiveness of the base film obtained by molding the olefinic thermoplastic elastomer with the pressure-sensitive adhesive layer tends to be poor, and thus the elution at 0 ° C. The proportion of the minute is preferably 50% by weight or less.
【0012】なお、前記温度上昇溶離分別(Temperatu
re Rising Elution Fractionation;TREF)と
は、公知の分析法である。原理的には、高温でポリマー
を溶媒に完全に溶解させた後に冷却して、溶液中に存在
させておいた不活性坦体の表面に薄いポリマー層を形成
させる。このとき、結晶化し易い高結晶性成分から結晶
化しにくい低結晶性または非晶性成分の順にポリマー層
が形成される。次いで、連続又は段階的に昇温すると、
前記と逆に、低結晶性または非晶性成分から溶出し、最
後に高結晶性成分が溶出する。この各温度での溶出量と
溶出温度によって描かれる溶出曲線からポリマーの組成
分布を分析するものである。The temperature rising elution fractionation (Temperatu
Re-rising Elution Fractionation (TREF) is a known analysis method. In principle, the polymer is completely dissolved in the solvent at elevated temperature and then cooled to form a thin polymer layer on the surface of the inert carrier which has been in solution. At this time, the polymer layer is formed in the order of the highly crystalline component which is easily crystallized and the low crystalline or amorphous component which is hard to be crystallized. Then, when the temperature is raised continuously or stepwise,
On the contrary, the low crystalline or amorphous component elutes, and finally the high crystalline component elutes. The composition distribution of the polymer is analyzed from the elution curve drawn by the elution amount at each temperature and the elution temperature.
【0013】測定装置としては、クロス分別装置(三菱
化学(株)製,CFC・T150A)を使用した。測定
すべきサンプル(オレフィン系熱可塑性エラストマー)
を溶媒(o−ジクロロベンゼン)を用い、濃度30mg
/mlとなるように140℃で溶解し、これを測定装置
内のサンプルループ内に注入した。以下の測定は設定条
件に従って自動的に行われた。サンプルループ内に保持
された試料溶液は、溶解温度の差を利用して分別するT
REFカラム(不活性体であるガラスビーズが充填され
た内径4mm、長さ150mmの装置付属のステンレス
カラム)に0.4ml注入された。当該サンプルは、1
℃/分の速度で140℃から0°の温度まで冷却され、
上記不活性担体にコーティングされた。このとき高結晶
成分(結晶化しやすいもの)から低結晶成分(結晶化し
にくいもの)の順で不活性担体表面にポリマー層が形成
される。TREFカラムは0℃でさらに30分間保持し
た後、以下のように段階的に昇温され、それぞれの温度
において30分間保持されながら、その温度における溶
出分が測定された。溶出温度(℃):0,5,10,1
5,20,25,30,35,40,45,49,5
2,55,58,61,64,67,70,73,7
6,79,82,85,88,91,94,97,10
0,102,120,140。As the measuring device, a cross fractionation device (CFC / T150A manufactured by Mitsubishi Chemical Co., Ltd.) was used. Sample to be measured (olefin thermoplastic elastomer)
Using a solvent (o-dichlorobenzene), a concentration of 30 mg
It was dissolved at 140 ° C. so that the concentration became / ml, and this was injected into the sample loop in the measuring device. The following measurements were performed automatically according to the set conditions. The sample solution held in the sample loop is separated by utilizing the difference in melting temperature.
0.4 ml was injected into a REF column (a stainless steel column packed with inert glass beads and having an inner diameter of 4 mm and a length of 150 mm attached to the apparatus). The sample is 1
Cooled from 140 ° C to 0 ° C at a rate of ° C / min,
Coated on the inert carrier. At this time, a polymer layer is formed on the surface of the inert carrier in the order of high crystal component (those that are easily crystallized) to low crystal component (that is difficult to crystallize). After the TREF column was kept at 0 ° C. for another 30 minutes, the temperature was raised stepwise as follows, and the elution amount at that temperature was measured while being kept at each temperature for 30 minutes. Elution temperature (° C): 0, 5, 10, 1
5,20,25,30,35,40,45,49,5
2,55,58,61,64,67,70,73,7
6, 79, 82, 85, 88, 91, 94, 97, 10
0, 102, 120, 140.
【0014】前記ダイシング用粘着シートにおいて、基
材フィルムが単層フィルムであり、前記オレフィン系熱
可塑性エラストマーを50重量%以上含有していること
が好ましい。In the pressure-sensitive adhesive sheet for dicing, it is preferable that the substrate film is a monolayer film and contains the olefinic thermoplastic elastomer in an amount of 50% by weight or more.
【0015】また前記ダイシング用粘着シートにおい
て、基材フィルムが多層フィルムであり、当該多層フィ
ルムの少なくとも1層が、前記オレフィン系熱可塑性エ
ラストマーを50重量%以上含有していることが好まし
い。In the pressure-sensitive adhesive sheet for dicing, it is preferable that the substrate film is a multilayer film, and at least one layer of the multilayer film contains 50% by weight or more of the olefinic thermoplastic elastomer.
【0016】基材フィルム中の前記前記オレフィン系熱
可塑性エラストマーの含有量は、糸状屑発生防止効果か
ら、単層フィルムまたは多層フィルムの少なくとも1層
が、通常、50重量%以上、好ましくは80重量%以上
であるのがよい。基材フィルムを多層とした場合には、
例えば、前記オレフィン系系熱可塑性エラストマーを含
む伸び性の低い層をフルカットの際に丸刃の切り込みが
行なわれる深さまでの少なくとも一層に設けることでダ
イシング時の糸状屑の発生を防止することができ、他の
層にエキスパンド時に必要とされる伸び性に優れた層を
設けることにより、前記オレフィン系熱可塑性エラスト
マーの含む層の伸び性の低さを補うことができる。その
他、帯電防止性に優れる層などの機能層を設けて多層化
して帯電防止性能などの追加機能を付加することもでき
る。The content of the above-mentioned olefinic thermoplastic elastomer in the substrate film is usually 50% by weight or more, preferably 80% by weight, in order to prevent the generation of filamentous scraps, at least one layer of the monolayer film or the multilayer film. It should be at least%. When the base film is a multilayer,
For example, it is possible to prevent the generation of filamentous scraps at the time of dicing by providing at least one layer up to a depth at which a round blade is cut at the time of full cutting, with a layer having a low extensibility including the olefinic thermoplastic elastomer. It is possible to supplement the low extensibility of the layer containing the olefin-based thermoplastic elastomer by providing the layer having excellent extensibility required for the expansion in the other layer. In addition, a functional layer such as a layer having an excellent antistatic property may be provided to form a multi-layer structure, and additional functions such as antistatic performance may be added.
【0017】前記ダイシング用粘着シートにおいて、粘
着剤層の厚みは1〜200μmである場合に有効であ
る。In the pressure-sensitive adhesive sheet for dicing, it is effective when the pressure-sensitive adhesive layer has a thickness of 1 to 200 μm.
【0018】粘着剤層を厚くすることは、ダイシング中
の半導体ウエハの振動などの原因によって、ダイシング
品位を著しく低下させ、コスト的にも不利益となるた
め、粘着剤層の厚みは1〜200μm、特に好ましくは
3〜50μmとされる。通常、ダイシング工程では、ダ
イシング用粘着シートに対して丸刃が5〜230μm程
度の切込み、切断を行なっているため、粘着剤層がその
切込深さより薄く、基材フィルムまで切り込みが行わ
れ、基材フィルムによる糸状屑が問題となる場合に本発
明のダイシング用粘着シートは有効に機能する。If the pressure-sensitive adhesive layer is thickened, the dicing quality is remarkably deteriorated due to the vibration of the semiconductor wafer during dicing and the cost is disadvantageous. Therefore, the thickness of the pressure-sensitive adhesive layer is 1 to 200 μm. And particularly preferably 3 to 50 μm. Usually, in the dicing step, since the circular blade cuts and cuts the adhesive sheet for dicing to about 5 to 230 μm, the adhesive layer is thinner than the cutting depth, and the cut is made to the base film. The adhesive sheet for dicing of the present invention effectively functions when the thread-like waste due to the base film becomes a problem.
【0019】前記ダイシング用粘着シートにおいて、粘
着剤層は放射線硬化型粘着剤により形成されているもの
であることが好ましい。In the pressure-sensitive adhesive sheet for dicing, the pressure-sensitive adhesive layer is preferably formed of a radiation-curable pressure-sensitive adhesive.
【0020】放射線硬化型粘着剤層を用いれば、放射線
を照射することにより粘着力を低下させることができ、
ウエハ等を切断分離した後に、ウエハ等からの粘着シー
トの除去を容易に行うことができる。If a radiation-curable pressure-sensitive adhesive layer is used, the adhesive force can be lowered by irradiating with radiation,
After cutting and separating the wafer or the like, the adhesive sheet can be easily removed from the wafer or the like.
【0021】さらに本発明は、前記ダイシング用粘着シ
ートを、被切断物へ貼り付けた後に、前記粘着シートの
基材フィルムまで切り込みを行なうことにより被切断物
をダイシングすることを特徴とするダイシング方法、に
関する。Further, according to the present invention, after the pressure-sensitive adhesive sheet for dicing is attached to the object to be cut, the object to be cut is diced by cutting into the base film of the pressure-sensitive adhesive sheet. About.
【0022】[0022]
【発明の実施の形態】以下、本発明のダイシング用粘着
シートを、図1を参照しつつ詳細に説明する。図1に示
すように本発明のダイシング用粘着シート1は、基材フ
ィルム11と、該基材フィルム11の少なくとも一方の
面に設けられた粘着剤層12と、更に必要に応じて粘着
層と接し、基材フィルムとは反対側の面に貼り付けられ
たセパレータ13とで構成されている。図1では基材フ
ィルム11の片面に粘着剤層12を有するが、粘着剤層
は基材フィルムの両面に形成することもできる。ダイシ
ング用粘着シートはシートを巻いてテープ状とすること
もできる。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the pressure-sensitive adhesive sheet for dicing of the present invention will be described in detail with reference to FIG. As shown in FIG. 1, the pressure-sensitive adhesive sheet 1 for dicing of the present invention comprises a base film 11, a pressure-sensitive adhesive layer 12 provided on at least one surface of the base film 11, and, if necessary, a pressure-sensitive adhesive layer. The separator 13 is in contact with and is attached to the surface opposite to the base film. Although the pressure-sensitive adhesive layer 12 is provided on one side of the base film 11 in FIG. 1, the pressure-sensitive adhesive layer can be formed on both sides of the base film. The pressure-sensitive adhesive sheet for dicing may be rolled into a tape shape.
【0023】基材フィルムは、プロピレン並びにエチレ
ンおよび/または炭素数4〜8のα−オレフィンを重合
成分として含有するオレフィン系熱可塑性エラストマー
を含有してなる。炭素数4〜8のα−オレフィンとして
は、ブテン−1 、3 −メチルペンテン−1、4−メチル
ペンテン−1、ヘキセン−1、オクテン−1等があげら
れる。オレフィン系熱可塑性エラストマーとしては、プ
ロピレンとエチレンとの共重合体が好ましい。The base film contains an olefin-based thermoplastic elastomer containing propylene and ethylene and / or an α-olefin having 4 to 8 carbon atoms as a polymerization component. Examples of the α-olefin having 4 to 8 carbon atoms include butene-1,3-methylpentene-1,4-methylpentene-1, hexene-1, octene-1 and the like. As the olefin-based thermoplastic elastomer, a copolymer of propylene and ethylene is preferable.
【0024】オレフィン系熱可塑性エラストマーを構成
する各重合成分の割合は、オレフィン系熱可塑性エラス
トマーが上記融点ピーク温度、温度上昇溶離分別に係わ
る要件を満足するものであれば特に制限されないが、プ
ロピレンの割合は、通常、50〜95重量%、さらに好
ましくは60〜92重量%である。エチレンおよび/ま
たは炭素数4〜8のα−オレフィンは、プロピレンの割
合を引いた残量である。The proportion of each polymerization component constituting the olefin-based thermoplastic elastomer is not particularly limited as long as the olefin-based thermoplastic elastomer satisfies the above melting point peak temperature and the requirements relating to the temperature rising elution fraction, but is not limited to propylene. The ratio is usually 50 to 95% by weight, more preferably 60 to 92% by weight. Ethylene and / or α-olefin having 4 to 8 carbon atoms is the remaining amount after subtracting the proportion of propylene.
【0025】本発明のオレフィン系熱可塑性エラストマ
ーは、前記重合成分を含有するものであり、上記融点ピ
ーク温度、温度上昇溶離分別に係わる条件を満足するも
のであればその製造方法は制限されない。たとえば、一
段目でプロピレン単独重合体またはプロピレンと少量の
エチレンおよび/または炭素数4〜8のα−オレフィン
とのランダム共重合体を製造後、二段目以降でプロピレ
ンとエチレンおよび/または炭素数4〜8の他のα−オ
レフィンのランダム共重合体を製造する、少なくとも二
段以上の逐次重合方法;プロピレン単独重合体またはプ
ロピレンと少量のエチレンおよび/または炭素数4〜8
のα−オレフィンのランダム共重合体と、エチレンと炭
素数4〜8のα−オレフィンとのランダム共重合体、ま
たはエチレンおよび/または炭素数4〜8とプロピレン
とのランダム共重合体をそれぞれ別に重合したものをブ
レンドする製造する方法が挙げられる。これら方法とし
ては、少なくとも二段以上の逐次重合方法が好ましい。The olefinic thermoplastic elastomer of the present invention contains the above-mentioned polymerizing component, and its manufacturing method is not limited as long as it satisfies the above melting point peak temperature and temperature rising elution fractionation conditions. For example, after producing a propylene homopolymer or a random copolymer of propylene and a small amount of ethylene and / or an α-olefin having 4 to 8 carbon atoms in the first stage, propylene and ethylene and / or the number of carbon atoms in the second stage and thereafter. At least two or more steps of sequential polymerization method for producing a random copolymer of 4 to 8 other α-olefins; propylene homopolymer or propylene and a small amount of ethylene and / or carbon number of 4 to 8
A random copolymer of α-olefin and a random copolymer of ethylene and an α-olefin of 4 to 8 carbon atoms, or a random copolymer of ethylene and / or 4 to 8 carbon atoms and propylene, respectively. A method for producing by blending the polymerized materials may be mentioned. As these methods, a sequential polymerization method of at least two stages or more is preferable.
【0026】以下、この逐次重合方法について詳述す
る。逐次重合に用いられる触媒は、特に限定されるもの
ではないが、有機アルミニウム化合物と、チタン原子、
マグネシウム原子、ハロゲン原子、及び電子供与性化合
物を必須とする固体成分とからなるものが好ましい。The stepwise polymerization method will be described in detail below. The catalyst used in the sequential polymerization is not particularly limited, but an organoaluminum compound, a titanium atom,
Those composed of a magnesium atom, a halogen atom, and a solid component essentially containing an electron-donating compound are preferred.
【0027】ここで、有機アルミニウム化合物として
は、この種の重合において公知の、一般式(R1 )m A
lX(3-m) (式中、R1 は炭素数1〜12の炭化水素残
基、Xはハロゲン原子を示し、mは1〜3の整数であ
る。)で表される化合物、例えば、トリメチルアルミニ
ウム、トリエチルアルミニウム等のトリアルキルアルミ
ニウム、ジメチルアルミニウムクロリド、ジエチルアル
ミニウムクロリド等のジアルキルアルミニウムハライ
ド、メチルアルミニウムセスキクロリド、エチルアルミ
ニウムセスキクロリド等のアルキルアルミニウムセスキ
ハライド、メチルアルミニウムジクロリド、エチルアル
ミニウムジクロリド等のアルキルアルミニウジハライ
ド、ジエチルアルミニウムハイドライド等のアルキルア
ルミニウムハイドライド等があげられる。[0027] As the organoaluminum compound, known in this kind of polymerization, the general formula (R 1) m A
a compound represented by lX (3-m) (in the formula, R 1 is a hydrocarbon residue having 1 to 12 carbon atoms, X is a halogen atom, and m is an integer of 1 to 3), for example, Trialkylaluminums such as trimethylaluminum and triethylaluminum, dialkylaluminum halides such as dimethylaluminum chloride and diethylaluminum chloride, alkylaluminum sesquihalides such as methylaluminum sesquichloride, ethylaluminum sesquichloride, methylaluminum dichloride and alkyls such as ethylaluminum dichloride. Alminium halides, alkyl aluminum hydrides such as diethyl aluminum hydride and the like can be mentioned.
【0028】またチタン原子、マグネシウム原子、ハロ
ゲン原子、及び電子供与性化合物を必須とする固体成分
としては、やはりこの種の重合において公知のものを使
用できる。チタン原子の供給源となるチタン化合物とし
ては、一般式:Ti(OR2) 4-n)Xn (式中、R2
は炭素数1〜10の炭化水素残基Xはハロゲン原子を示
し、nは0〜4の整数である。)で表される化合物があ
げられ、なかでも、四塩化チタン、テトラエトキシチタ
ン、テトラブトキシチタン等が好ましい。マグネシウム
原子の供給源となるマグネシウム化合物としては、例え
ば、ジアルキルマグネシウム、マグネシウムジハライ
ド、ジアルコキシマグネシウム、アルコキシマグネシウ
ムハライド等があげられ、なかでもマグネシウムジハラ
イド等が好ましい。なお、ハロゲン原子としては、弗
素、塩素、臭素、沃素があげられ、なかでも塩素が好ま
しく、これらは、通常、前記チタン化合物から供給され
るが、アルミニウムのハロゲン化合物、珪素のハロゲン
化合物、タングステンのハロゲン化合物等の他のハロゲ
ン供給源から供給されてもよい。As the solid component which essentially contains a titanium atom, a magnesium atom, a halogen atom, and an electron-donating compound, those known in this type of polymerization can be used. The titanium compound serving as the supply source of the titanium atom is represented by the general formula: Ti (OR 2 ) 4-n) X n (wherein R 2
The hydrocarbon residue X having 1 to 10 carbon atoms represents a halogen atom, and n is an integer of 0 to 4. ), And among them, titanium tetrachloride, tetraethoxy titanium, tetrabutoxy titanium and the like are preferable. Examples of the magnesium compound that serves as the supply source of magnesium atoms include dialkyl magnesium, magnesium dihalide, dialkoxy magnesium, and alkoxy magnesium halide. Among them, magnesium dihalide and the like are preferable. Examples of the halogen atom include fluorine, chlorine, bromine, and iodine. Among them, chlorine is preferable, and these are usually supplied from the titanium compound described above, but the halogen compound of aluminum, the halogen compound of silicon, and the tungsten compound of tungsten. It may be supplied from another halogen source such as a halogen compound.
【0029】電子供与性化合物としては、アルコール
類、フェノール類、ケトン類、アルデヒド類、カルボン
酸類、有機酸または無機酸およびその誘導体等の含酸素
化合物、アンモニア、アミン類、ニトリル類、イソシア
ネート類等の含窒素化合物があげれる。なかでも無機酸
エステル、有機酸エステル、有機酸ハライド等が好まし
く、珪素エステル、酢酸セロソルブエステル、フタル酸
ハライド等が更に好ましく、一般式:R3 R4 (3-P) S
i(OR5 )p (式中、R3 は炭素数3〜20、好まし
くは4〜10の分岐状脂肪族炭化水素残基または炭素数
5〜20、好ましくは6〜10の環状脂肪族炭化水素残
基を示し、R4 は炭素数1〜20、好ましくは1〜10
の分岐または直鎖状脂族炭化水素残基を示し、pは1〜
3の整数である。)で表される有機珪素化合物、例え
ば、t−ブチル−メチル−ジエトキシシラン、シクロヘ
キシル−メチル−ジメシトキシシラン、シクロヘキシル
−メチル−ジエトキシシラン等が特に好ましい。Examples of the electron-donating compound include alcohols, phenols, ketones, aldehydes, carboxylic acids, oxygen-containing compounds such as organic acids or inorganic acids and their derivatives, ammonia, amines, nitriles, isocyanates, etc. The nitrogen-containing compounds of Among them, inorganic acid esters, organic acid esters, organic acid halides and the like are preferable, and silicon ester, acetic acid cellosolve ester, phthalic acid halide and the like are more preferable, and general formula: R 3 R 4 (3-P) S
i (OR 5 ) p (wherein R 3 is a branched aliphatic hydrocarbon residue having 3 to 20 carbon atoms, preferably 4 to 10 carbon atoms, or a cyclic aliphatic carbon atom having 5 to 20 carbon atoms, preferably 6 to 10 carbon atoms) Represents a hydrogen residue, R 4 has 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms
Represents a branched or straight chain aliphatic hydrocarbon residue, and p is 1 to
It is an integer of 3. ) Organosilicon compounds represented by, for example, t-butyl-methyl-diethoxysilane, cyclohexyl-methyl-dimesitoxysilane, cyclohexyl-methyl-diethoxysilane and the like are particularly preferable.
【0030】逐次重合法において、第一段階では、プロ
ピレンまたは、さらに少量のエチレンおよび/または炭
素数4〜8のα−オレフィンを供給して、前記触媒の存
在下に温度50〜150℃、好ましくは50〜100
℃、プロピレンの分圧0.5〜4.5MPa、好ましく
は1〜3.5MPaの条件でプロピレン単独重合体等を
重合し、引き続いて、第二段階でプロピレンとエチレン
および/または炭素数4〜8のα−オレフィンを供給し
て、前記触媒の存在下に温度50〜150℃、好ましく
は50〜100℃、プロピレンとエチレンおよび/また
は炭素数4〜8のα−オレフィンの分圧各0.3〜4.
5MPa、好ましくは0.5〜3.5MPaの条件で、
プロピレンとエチレンおよび/または炭素数4〜8のα
−オレフィン共重合体の重合を実施することによりなさ
れる。In the first step of the stepwise polymerization method, propylene or a small amount of ethylene and / or α-olefin having 4 to 8 carbon atoms is fed to the catalyst in the presence of the catalyst at a temperature of 50 to 150 ° C., preferably Is 50-100
C., propylene homopolymer and the like are polymerized under the conditions of .degree. C. and partial pressure of propylene of 0.5 to 4.5 MPa, preferably 1 to 3.5 MPa, and subsequently, in the second stage, propylene and ethylene and / or carbon number of 4 to 8 at a temperature of 50 to 150 ° C., preferably at 50 to 100 ° C. in the presence of the catalyst, propylene and ethylene and / or partial pressures of α to 4 olefins of 0 to 8 each. 3-4.
5 MPa, preferably 0.5 to 3.5 MPa,
Propylene and ethylene and / or α having 4 to 8 carbon atoms
-By carrying out the polymerization of the olefin copolymer.
【0031】なお、その際の重合は回分式、連続、半回
分式のいずれによってもよく、第一段階の重合は気相ま
たは液相中で実施し、第二段階の重合も気相または液相
中で実施するが、特に気相中で実施するのが好ましい。
各段階の滞留時間は各々0.5〜10時間、好ましくは
1〜5時間である。The polymerization at that time may be carried out in a batch system, a continuous system or a semi-batch system, the first stage polymerization is carried out in a gas phase or a liquid phase, and the second stage polymerization is also carried out in a gas phase or a liquid phase. It is carried out in the phase, preferably in the gas phase.
The residence time in each stage is 0.5 to 10 hours, preferably 1 to 5 hours.
【0032】また前記方法により製造されるオレフィン
系熱可塑性エラストマーの粉体粒子にベタツキ等の問題
が生じる際は、粉体粒子の流動性を付与する目的で、第
一段階での重合後、第二段階での重合開始前または重合
途中に、活性水素含有化合物を、触媒の固体成分中のチ
タン原子に対して100〜1000倍モルで、且つ、触
媒の有機アルミニウム化合物に対して2〜5倍モルの範
囲で添加することが好ましい。活性水素含有化合物とし
ては、例えば、水、アルコール類、フェノール類、アル
デヒド類、カルボン酸類、酸アミド類アンモニア、アミ
ン類等があげられる。Further, when problems such as stickiness occur in the powder particles of the olefinic thermoplastic elastomer produced by the above-mentioned method, after the polymerization in the first stage, the Before or during the initiation of the polymerization in two stages, the active hydrogen-containing compound is 100 to 1000 times by mole with respect to the titanium atom in the solid component of the catalyst, and 2 to 5 times by mole with respect to the organoaluminum compound of the catalyst. It is preferable to add it in a molar range. Examples of the active hydrogen-containing compound include water, alcohols, phenols, aldehydes, carboxylic acids, acid amides ammonia, amines and the like.
【0033】なお、前記方法により製造されるオレフィ
ン系熱可塑性エラストマーは、JIS K7210に準
拠して温度230℃、荷重21.18Nで測定したメル
トフロレート(MFR)は 0.1〜50g/10分、
JIS K7112に準拠して水中置換法にて測定した
密度は0.87〜0.89g/cm3 程度であって、J
IS K7203に準拠して温度23℃で測定した曲げ
弾性率が600MPa以下のものとなる。The olefinic thermoplastic elastomer produced by the above method has a melt flow rate (MFR) measured at a temperature of 230 ° C. and a load of 21.18 N according to JIS K7210 of 0.1 to 50 g / 10 min. ,
The density measured by the water displacement method according to JIS K7112 is about 0.87 to 0.89 g / cm 3 , and J
The flexural modulus measured at a temperature of 23 ° C. according to IS K7203 is 600 MPa or less.
【0034】オレフィン系熱可塑性エラストマーは、公
知の有機パーオキサイドまたはさらに二重結合を分子内
に1個以上、好ましくは2個以上を有する架橋剤の存在
下に動的に熱処理してMFRを調整することもできる。The olefin-based thermoplastic elastomer is dynamically heat-treated in the presence of a known organic peroxide or a crosslinking agent having one or more, preferably two or more double bonds in the molecule to adjust the MFR. You can also do it.
【0035】本発明の基材フィルムは前記オレフィン系
熱可塑性エラストマーを含有していればよく、当該オレ
フィン系熱可塑性エラストマー単独で基材フィルムを構
成することができる他、必要に応じて他のプラスチック
樹脂またはエラストマーとの混合体から基材フィルムを
構成することもできる。このようなプラスチック樹脂ま
たはエラストマーとしては、ポリプロピレン、ポリエチ
レン、ポリブテン等の公知のポリオレフィン、ポリエチ
レンテレフタレート、ポリ塩化ビニル、ポリウレタン、
ポリスチレン、スチレン系エラストマー、エチレンとプ
ロピレンおよび/または炭素数4〜8のα−オレフィン
からなるエチレンープロピレンゴムやエチレンーαオレ
フィン共重合体(ゴム)等の慣用のプラスチックまたは
エラストマーシート用樹脂が好適に用いることができ
る。なお、前述の通り、基材フィルム中のオレフィン系
熱可塑性エラストマーの含有量は、糸状屑発生防止効果
から、通常、50重量%以上、好ましくは80重量%以
上がよい。The base film of the present invention only needs to contain the above-mentioned olefinic thermoplastic elastomer, and the base film can be constituted by the olefinic thermoplastic elastomer alone, and if necessary, other plastics. The base film can also be composed of a mixture with a resin or an elastomer. Examples of such plastic resin or elastomer include known polyolefins such as polypropylene, polyethylene and polybutene, polyethylene terephthalate, polyvinyl chloride, polyurethane,
Conventional plastic such as polystyrene, styrene elastomer, ethylene-propylene rubber and / or ethylene-α-olefin copolymer (rubber) composed of ethylene and propylene and / or α-olefin having 4 to 8 carbon atoms, or resin for elastomer sheet is suitable. Can be used. In addition, as described above, the content of the olefinic thermoplastic elastomer in the base film is usually 50% by weight or more, preferably 80% by weight or more, from the viewpoint of the effect of preventing the generation of thread scraps.
【0036】また、基材フィルム中には、鉱油等の軟化
剤、炭酸カルシウム、シリカ、タルク、マイカ、クレー
等の充鎮材、酸化防止剤、光安定剤、帯電防止剤、滑
剤、分散剤、中和剤、α晶核剤、β晶核剤等の各種添加
剤が必要に応じて配合されてもよい。In the base film, softeners such as mineral oil, fillers such as calcium carbonate, silica, talc, mica and clay, antioxidants, light stabilizers, antistatic agents, lubricants and dispersants. Various additives such as a neutralizing agent, an α crystal nucleating agent, and a β crystal nucleating agent may be blended as necessary.
【0037】本発明の基材フィルムは押出法等の常法に
従って作製することができ、その厚さは、通常10〜3
00μm、好ましくは30〜200μm程度である。基
材フィルムは単層フィルムまたは多層フィルムの何れで
あってもよいが、粘着剤層が接する表面から150μm
程度までの、ダイシング時に丸刃が達すると想定される
層は前記オレフィン系熱可塑性エラストマーを含有して
いる層とするのが好ましい。多層フィルムは、たとえ
ば、前記ポリオレフィン等を他の層の材料に用いて、共
押出法、ドライラミネート法等の慣用のフィルム積層法
により製造できる。The base film of the present invention can be produced by a conventional method such as an extrusion method, and its thickness is usually 10 to 3
It is about 00 μm, preferably about 30 to 200 μm. The base film may be either a single-layer film or a multi-layer film, but is 150 μm from the surface in contact with the pressure-sensitive adhesive layer.
It is preferable that the layer to which the round blade is supposed to reach during dicing is a layer containing the olefinic thermoplastic elastomer. The multilayer film can be produced, for example, by using the above-mentioned polyolefin or the like as a material for the other layer and by a conventional film laminating method such as a coextrusion method or a dry laminating method.
【0038】また、得られた基材フィルムは、必要に応
じて一軸または二軸の延伸処理を施してもよい。延伸処
理を施す場合には、60〜100℃程度で行なうのが好
ましい。このようにして製膜された基材フィルムは、必
要に応じてマット処理、コロナ放電処理、プライマー処
理等の慣用の物理的または化学的処理を施すことができ
る。Further, the obtained base film may be subjected to a uniaxial or biaxial stretching treatment, if necessary. When performing the stretching treatment, it is preferable to perform the stretching treatment at about 60 to 100 ° C. The substrate film thus formed can be subjected to a conventional physical or chemical treatment such as matting treatment, corona discharge treatment and primer treatment, if necessary.
【0039】粘着剤層は、公知乃至慣用の粘着剤を使用
できる。このような粘着剤は、何ら制限されるものでは
ないが、例えばゴム系、アクリル系、シリコーン系、ポ
リビニルエーテル系等の各種粘着剤が用いられる。For the pressure-sensitive adhesive layer, a known or common pressure-sensitive adhesive can be used. Such pressure-sensitive adhesives are not particularly limited, but various pressure-sensitive adhesives such as rubber-based, acrylic-based, silicone-based, and polyvinyl ether-based pressure-sensitive adhesives are used.
【0040】前記粘着剤としてはアクリル系粘着剤が好
ましい。アクリル系粘着剤のベースポリマーであるアク
リル系ポリマーは、通常、(メタ)アクリル酸アルキル
の重合体または共重合性モノマーとの共重合体が用いら
れる。アクリル系ポリマーの主モノマーとしては、その
ホモポリマーのガラス転移温度が20℃以下の(メタ)
アクリル酸アルキルが好ましい。An acrylic adhesive is preferable as the adhesive. As the acrylic polymer that is the base polymer of the acrylic pressure-sensitive adhesive, a polymer of alkyl (meth) acrylate or a copolymer with a copolymerizable monomer is usually used. As the main monomer of the acrylic polymer, the homopolymer has a glass transition temperature of 20 ° C. or lower (meth).
Alkyl acrylate is preferred.
【0041】(メタ)アクリル酸アルキルのアルキル基
としては、例えば、メチル基、エチル基、ブチル基、2
−エチルヘキシル基、オクチル基、イソノニル基等があ
げられる。また、前記共重合性モノマーとしては、(メ
タ)アクリル酸のヒドロキシアルキルエステル(例え
ば、ヒドロキシエチルエステル、ヒドロキシブチルエス
テル、ヒドロキシヘキシルエステル等)、(メタ)アク
リル酸グリシジルエステル、(メタ)アクリル酸、イタ
コン酸、無水マレイン酸、(メタ)アクリル酸アミド、
(メタ)アクリル酸N−ヒドロキシメチルアミド、(メ
タ)アクリル酸アルキルアミノアルキル、(例えば、ジ
メチルアミノエチルメタクリレート、t −ブチルアミノ
エチルメタクリレート等)、酢酸ビニル、スチレン、ア
クリロニトリル等があげられる。Examples of the alkyl group of the alkyl (meth) acrylate include methyl group, ethyl group, butyl group, 2
Examples thereof include an ethylhexyl group, an octyl group and an isononyl group. The copolymerizable monomer may be a hydroxyalkyl ester of (meth) acrylic acid (for example, hydroxyethyl ester, hydroxybutyl ester, hydroxyhexyl ester, etc.), (meth) acrylic acid glycidyl ester, (meth) acrylic acid, Itaconic acid, maleic anhydride, (meth) acrylic acid amide,
Examples thereof include (meth) acrylic acid N-hydroxymethylamide, (meth) acrylic acid alkylaminoalkyl, (eg, dimethylaminoethyl methacrylate, t-butylaminoethyl methacrylate, etc.), vinyl acetate, styrene, acrylonitrile, and the like.
【0042】また、粘着剤としては紫外線、電子線等に
より硬化する放射線硬化型粘着剤や加熱発泡型粘着剤を
用いることもできる。さらには、ダイシング・ダイボン
ド兼用可能な粘着剤であってもよい。本発明において
は、放射線硬化型粘着剤、特に紫外線硬化型粘着剤を用
いることが好ましい。なお、粘着剤として放射線硬化型
粘着剤を用いる場合には、ダイシング工程の前又は後に
粘着剤に放射線が照射されるため前記基材フィルムは十
分な放射線透過性を有しているもの好ましい。As the pressure-sensitive adhesive, a radiation-curable pressure-sensitive adhesive which is cured by ultraviolet rays, electron beams or the like or a heat-foamable pressure-sensitive adhesive can be used. Further, it may be an adhesive that can be used for both dicing and die bonding. In the present invention, it is preferable to use a radiation-curable pressure-sensitive adhesive, particularly an ultraviolet-curable pressure-sensitive adhesive. When a radiation-curable pressure-sensitive adhesive is used as the pressure-sensitive adhesive, the pressure-sensitive adhesive is irradiated with radiation before or after the dicing step, so that the base film preferably has sufficient radiation transparency.
【0043】放射線硬化型粘着剤は、例えば、前記ベー
スポリマー(アクリル系ポリマー)と、放射線硬化成分
を含有してなる。放射線硬化成分は、分子中に炭素−炭
素二重結合を有し、ラジカル重合により硬化可能なモノ
マー、オリゴマー又はポリマーを特に制限無く使用でき
る。放射線硬化成分としては、例えば、トリメチロール
プロパントリ(メタ)アクリレート、ぺンタエリスリト
ールトリ(メタ)アクリレート、テトラエチレングリコ
ールジ(メタ)アクリレート、1 ,6 −へキサンジオー
ルジ(メタ)アクリレート、ネオぺンチルグリコールジ
(メタ)アクリレート、ジぺンタエリスリトールヘキサ
(メタ)アクリレート等の(メタ)アクリル酸と多価ア
ルコールとのエステル化物;エステルアクリレートオリ
ゴマー;2 −プロぺニルージ−3 −ブテニルシアヌレー
ト、2 −ヒドロキシエチルビス(2 −アクリロキシエチ
ル)イソシアヌレート、トリス(2−メタクリロキシエ
チル)イソシアヌレート等のイソシアヌレートまたはイ
ソシアヌレート化合物などがあげられる。The radiation-curable pressure-sensitive adhesive contains, for example, the above-mentioned base polymer (acrylic polymer) and a radiation-curable component. As the radiation-curable component, a monomer, oligomer or polymer having a carbon-carbon double bond in the molecule and curable by radical polymerization can be used without particular limitation. Examples of the radiation-curable component include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, tetraethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentane. Esterification products of (meth) acrylic acid and polyhydric alcohols such as ethyl glycol di (meth) acrylate and dipentaerythritol hexa (meth) acrylate; ester acrylate oligomers; 2-propenyl-di-3-butenyl cyanurate , 2-hydroxyethylbis (2-acryloxyethyl) isocyanurate, isocyanurates such as tris (2-methacryloxyethyl) isocyanurate, or isocyanurate compounds.
【0044】また、放射線硬化型粘着剤はベースポリマ
ー(アクリル系ポリマー)として、ポリマー側鎖に炭素
−炭素二重結合を有する放射線硬化型ポリマーを使用す
ることもでき、この場合においては特に上記放射線硬化
成分を加える必要は無い。The radiation-curable pressure-sensitive adhesive may also be a radiation-curable polymer having a carbon-carbon double bond in the polymer side chain, as the base polymer (acrylic polymer). It is not necessary to add a hardening component.
【0045】放射線硬化型粘着剤を紫外線により硬化さ
せる場合には、光重合開始剤が必要である。重合開始剤
としては、たとえば、べンゾイルメチルエーテル、ベン
ゾインプロピルエーテル、ベンゾインイソブチルエーテ
ル等のペンゾインアルキルエーテル類;べンジル、ベン
ゾイン、ベンゾフェノン、α−ヒドロキシシクロヘキシ
ルフェニルケトン等の芳香族ケトン類;べンジルジメチ
ルケタール等の芳香族ケタール類;ポリビニルベンゾフ
ェノン;クロロチオキサントン、ドデシルチオキサント
ン、ジメチルチオキサントン、ジエチルチオキサントン
等のチオキサントン類等があげられる。When the radiation-curable pressure-sensitive adhesive is cured by ultraviolet rays, a photopolymerization initiator is required. Examples of the polymerization initiator include benzoin methyl ether, benzoin propyl ether, benzoin isobutyl ether, and other benzoin alkyl ethers; benzil, benzoin, benzophenone, α-hydroxycyclohexyl phenyl ketone, and other aromatic ketones; Examples thereof include aromatic ketals such as benzil dimethyl ketal; polyvinyl benzophenone; thioxanthones such as chlorothioxanthone, dodecylthioxanthone, dimethylthioxanthone and diethylthioxanthone.
【0046】前記粘着剤には、更に必要に応じて、架橋
剤、粘着付与剤、充填剤、老化防止剤、着色剤等の慣用
の添加剤を含有させることができる。架橋剤としては、
例えば、ポリイソシアネート化合物、メラミン樹脂、尿
素樹脂、アジリジン化合物、エポキシ樹脂、無水化物、
ポリアミン、カルボキシル基含有ポリマーなどがあげら
れる。The above-mentioned pressure-sensitive adhesive may further contain conventional additives such as a cross-linking agent, a tackifier, a filler, an antioxidant and a colorant, if necessary. As a cross-linking agent,
For example, polyisocyanate compound, melamine resin, urea resin, aziridine compound, epoxy resin, anhydride,
Examples thereof include polyamines and carboxyl group-containing polymers.
【0047】本発明のダイシング用粘着シート1は、例
えば、基材フィルム11の表面に、粘着剤を塗布して乾
燥させて(必要に応じて加熱架橋させて)粘着剤層12
を形成し、必要に応じてこの粘着剤層12の表面にセパ
レータ13を貼り合わせることにより製造できる。ま
た、別途、セパレータ13に粘着剤層12を形成した
後、それらを基材フィルム11に貼り合せる方法等を採
用できる。In the pressure-sensitive adhesive sheet 1 for dicing of the present invention, for example, the pressure-sensitive adhesive layer 12 is formed by applying a pressure-sensitive adhesive to the surface of the base film 11 and drying (heat-crosslinking if necessary).
Can be formed, and a separator 13 can be attached to the surface of the pressure-sensitive adhesive layer 12 if necessary. Alternatively, a method in which the pressure-sensitive adhesive layer 12 is separately formed on the separator 13 and then the pressure-sensitive adhesive layer 12 is attached to the base film 11 can be adopted.
【0048】粘着剤層の厚さは、粘着剤の種類、あるい
はダイシング切込深さにより適宜決定することができる
が、通常は1〜200μm、好ましくは3〜50μm程
度である。The thickness of the pressure-sensitive adhesive layer can be appropriately determined depending on the type of pressure-sensitive adhesive or the dicing depth of cut, but is usually 1 to 200 μm, preferably 3 to 50 μm.
【0049】セパレータは、ラベル加工のため、または
粘着剤層を平滑にする目的のために、必要に応じて設け
られる。セパレータの構成材料としては、紙、ポリエチ
レン、ポリプロピレン、ポリエチレンテレフタレート等
の合成樹脂フィルム等があげられる。セパレータの表面
には、粘着剤層からの剥離性を高めるため、必要に応じ
てシリコーン処理、長鎖アルキル処理、フッ素処理等の
剥離処理が施されていてもよい。また、剛性を高める等
の目的に応じて、一軸または二軸の延伸処理や他のプラ
スチックフィルム等で積層を行ってもよい。セパレータ
の厚みは、通常、10〜200μm、好ましくは25〜
100μm程度である。The separator is optionally provided for label processing or for the purpose of smoothing the pressure-sensitive adhesive layer. Examples of the constituent material of the separator include paper, synthetic resin films such as polyethylene, polypropylene and polyethylene terephthalate. The surface of the separator may be subjected to a peeling treatment such as silicone treatment, long-chain alkyl treatment, or fluorine treatment, if necessary, in order to enhance the peelability from the pressure-sensitive adhesive layer. In addition, uniaxial or biaxial stretching treatment or lamination with another plastic film or the like may be performed depending on the purpose of increasing rigidity. The thickness of the separator is usually 10 to 200 μm, preferably 25 to
It is about 100 μm.
【0050】[0050]
【実施例】以下、実施例に基づいて本発明をより詳細に
説明するが、本発明はこれらの実施例により限定される
ものではない。The present invention will be described in more detail based on the following examples, but the invention is not intended to be limited by these examples.
【0051】実施例1
(基材フィルムの作製)三菱化学(株)製の「商品名:
ゼラス5053」を(株)プラコー社製Tダイ成形機
(設定温度230℃)に供給し製膜し、厚み100μ
m、幅29cmの基材フィルムを作製した。三菱化学
(株)製の「商品名:ゼラス5053」は、プロピレン
成分79重量%およびエチレン成分21重量%のオレフ
ィン系熱可塑性エラストマーであり、o−ジクロロベン
ゼンを溶媒として用いた、温度0〜140℃の間の温度
上昇溶離分別における0℃での溶出分が全溶出量に対し
て41.7重量%であり、融点ピーク温度が164℃、
密度0.88g/cm3 、MFR(230℃、21.1
8N)6.8g/10分である。Example 1 (Preparation of base material film) "Product name: manufactured by Mitsubishi Chemical Corporation"
Zelas 5053 "was supplied to a T-die molding machine (set temperature 230 ° C) manufactured by Placo Co., Ltd. to form a film, and the thickness was 100 μm.
A base film having m and a width of 29 cm was produced. "Commercial name: Zelas 5053" manufactured by Mitsubishi Chemical Corporation is an olefin-based thermoplastic elastomer containing 79% by weight of a propylene component and 21% by weight of an ethylene component, and o-dichlorobenzene was used as a solvent at a temperature of 0 to 140. The elution fraction at 0 ° C. in the temperature rising elution fractionation between 4 ° C. was 41.7% by weight based on the total elution amount, and the melting point peak temperature was 164 ° C.
Density 0.88 g / cm 3 , MFR (230 ° C, 21.1
8N) 6.8 g / 10 minutes.
【0052】(粘着剤の調製)アクリル酸ブチル95重
量部及びアクリル酸5重量部をトルエン中で常法により
共重合させて得られた重量平均分子量50万のアクリル
系共重合体を含有する溶液に、ジぺンタエリスリトール
ヘキサアクリレート(商品名「カヤラッドDPHA」,
日本化薬(株)製)60重量部、光重合開始剤(商品名
「イルガキュア184」,チバ・スペシャリティー・ケ
ミカルズ社製)3重量部、ポリイソシアネート化合物
(商品名「コロネートL」,日本ポリウレタン(株)
製)5重量部を加えて、アクリル系紫外線硬化型粘着剤
溶液を調製した。(Preparation of pressure-sensitive adhesive) A solution containing an acrylic copolymer having a weight average molecular weight of 500,000 obtained by copolymerizing 95 parts by weight of butyl acrylate and 5 parts by weight of acrylic acid in toluene by a conventional method. In addition, dipentaerythritol hexaacrylate (trade name "Kayarad DPHA",
60 parts by weight of Nippon Kayaku Co., Ltd., 3 parts by weight of a photopolymerization initiator (trade name "Irgacure 184", manufactured by Ciba Specialty Chemicals), polyisocyanate compound (trade name "Coronate L", Nippon Polyurethane) (stock)
5 parts by weight) was added to prepare an acrylic UV-curable pressure-sensitive adhesive solution.
【0053】(ダイシング用粘着シートの作製)上記で
調製した粘着剤溶液を、上記で得られた基材フィルムの
コロナ処理面上に塗布し、80℃で10分間加熱架橋し
て、厚さ20μmの紫外線硬化型粘着剤層を形成した。
次いで、当該粘着剤層面にセパレータを貼り合せて紫外
線硬化型ダイシング用粘着シートを作製した。(Preparation of pressure-sensitive adhesive sheet for dicing) The pressure-sensitive adhesive solution prepared above was applied onto the corona-treated surface of the substrate film obtained above, and heat-crosslinked at 80 ° C. for 10 minutes to give a thickness of 20 μm. The UV-curable pressure-sensitive adhesive layer was formed.
Then, a separator was attached to the pressure-sensitive adhesive layer surface to prepare a UV-curable pressure-sensitive adhesive dicing sheet.
【0054】実施例2
(基材フィルムの作製)実施例1で用いた三菱化学
(株)製の「商品名ゼラス5053」と日本ポリケム
(株)製の「商品名:カーネルKF261」を前者:後
者(重量比)=80:20の割合で、二軸混練機(シリ
ンダー径45mm,L/D=34,池貝社製「PCM−
45」 ,設定温度200℃)に供給して溶融混練する
ことによりぺレット化したものを実施例1と同様に製膜
し、基材フィルムを得た。Example 2 (Preparation of substrate film) The "trade name: Zelas 5053" manufactured by Mitsubishi Chemical Co., Ltd. and the "trade name: Kernel KF261" manufactured by Nippon Polychem Co., Ltd. used in Example 1 were used as the former: The latter (weight ratio) = 80: 20 at the ratio of the twin-screw kneader (cylinder diameter 45 mm, L / D = 34, "PCM-
45 "at a preset temperature of 200 ° C) and melt-kneaded to form a pellet, which was then formed into a film in the same manner as in Example 1 to obtain a base film.
【0055】日本ポリケム(株)製の「商品名:カーネ
ルKF261」は、密度0.898g/cm3 、MFR
(190℃,21.18N)2.2g/10分のメタロ
セン系低密度ポリエチレンである。"Product name: Kernel KF261" manufactured by Nippon Polychem Co., Ltd. has a density of 0.898 g / cm 3 and MFR.
(190 ° C, 21.18N) 2.2 g / 10 min metallocene low density polyethylene.
【0056】(ダイシング用粘着シートの作製)実施例
1で調製した粘着剤溶液を、上記で得られた基材フィル
ムのコロナ処理面上に塗布し、80℃で10分間加熱架
橋して、厚さ50μmの紫外線硬化型粘着剤層を形成し
た。次いで、当該粘着剤層面にセパレータを貼り合せて
紫外線硬化型ダイシング用粘着シートを作製した。(Preparation of pressure-sensitive adhesive sheet for dicing) The pressure-sensitive adhesive solution prepared in Example 1 was applied onto the corona-treated surface of the substrate film obtained above, and heat-crosslinked at 80 ° C. for 10 minutes to give a thick film. An ultraviolet curable pressure-sensitive adhesive layer having a thickness of 50 μm was formed. Then, a separator was attached to the pressure-sensitive adhesive layer surface to prepare a UV-curable pressure-sensitive adhesive dicing sheet.
【0057】比較例1
実施例1のダイシング用粘着シートの作製において、基
材フィルムとして、低密度ポリエチレンをTダイ押出し
法により厚さ100μmとなるように製膜しフィルムを
用いたこと以外は実施例1と同様にしてダイシング用粘
着シートを作製した。なお、低密度ポリエチレンは、融
点ピーク温度が110℃、密度0.923g/cm3 、
MFR(190℃、21.18N)1.5g/10分で
ある。Comparative Example 1 In the preparation of the pressure-sensitive adhesive sheet for dicing of Example 1, as a base film, low density polyethylene was formed by T-die extrusion method to a thickness of 100 μm, and the film was used. A pressure-sensitive adhesive sheet for dicing was produced in the same manner as in Example 1. The low-density polyethylene has a melting point peak temperature of 110 ° C., a density of 0.923 g / cm 3 ,
MFR (190 ° C, 21.18N) 1.5 g / 10 minutes.
【0058】比較例2
実施例1のダイシング用粘着シートの作製において、基
材フィルムとして、エチレン−メタクリル酸共重合体を
Tダイ押出し法により厚さ100μmとなるように製膜
しフィルムを用いたこと以外は実施例1と同様にしてダ
イシング用粘着シートを作製した。なお、エチレン−メ
タクリル酸共重合体は、融点ピーク温度が100℃、密
度0.930g/cm3 、MFR(190℃、21.1
8N)3g/10分である。Comparative Example 2 In the production of the pressure-sensitive adhesive sheet for dicing of Example 1, as the base film, a film was used in which the ethylene-methacrylic acid copolymer was formed into a film having a thickness of 100 μm by the T-die extrusion method. An adhesive sheet for dicing was produced in the same manner as in Example 1 except for the above. The ethylene-methacrylic acid copolymer has a melting point peak temperature of 100 ° C., a density of 0.930 g / cm 3 , and an MFR (190 ° C., 21.1).
8N) 3 g / 10 min.
【0059】(評価試験)実施例及び比較例で得られた
ダイシング用粘着シートを下記の方法により評価した。
結果を表1に示す。(Evaluation Test) The pressure-sensitive adhesive sheets for dicing obtained in Examples and Comparative Examples were evaluated by the following methods.
The results are shown in Table 1.
【0060】(1)ダイシング性評価
ダイシング用粘着シートに、厚さ350μmの6インチ
ウエハをマウントし、以下の条件でダイシングした。(1) Evaluation of Dicing Property A 6-inch wafer having a thickness of 350 μm was mounted on a pressure-sensitive adhesive sheet for dicing, and dicing was performed under the following conditions.
【0061】(ダイシング条件)
ダイサー:DISCO社製、DFD−651
ブレード:DISCO社製、NBC−ZH205O 2
7HEDD
ブレード回転数:45000rpm
ダイシング速度:100mm/秒
ダイシング深さ:基材フィルムに対して30μm
ダイシングサイズ:2.5mm×2.5mm
カットモード:ダウンカット
ダイシング後、切断されたチップ表面の糸状屑の発生状
況を光学顕微鏡(200)で観察し、糸状屑の大きさ毎
に個数をカウントした。(Dicing conditions) Dicer: DISCO, DFD-651 Blade: DISCO, NBC-ZH205O 2
7HEDD Blade rotation speed: 45000 rpm Dicing speed: 100 mm / sec Dicing depth: 30 μm with respect to the base film Dicing size: 2.5 mm × 2.5 mm Cut mode: Down-cut dicing after cutting The generation state was observed with an optical microscope (200), and the number was counted for each size of filamentous waste.
【0062】[0062]
【表1】
表1から、実施例のダイシング用粘着シートでは糸状屑
の発生が少ないことが認められる。しかも、100μm
以上の糸状屑は発生していない。なお、実施例、比較例
のウエハは、製品品位が低下することはなかった。[Table 1] From Table 1, it is recognized that the dicing pressure-sensitive adhesive sheets of the examples generate less filamentous waste. Moreover, 100 μm
The above filamentous waste has not occurred. The wafers of Examples and Comparative Examples did not deteriorate in product quality.
【図1】本発明のダイシング用粘着シートの一例を示す
断面図である。FIG. 1 is a sectional view showing an example of a pressure-sensitive adhesive sheet for dicing according to the present invention.
1 ダイシング用粘着シート 11 基材フィルム 12 粘着剤層 13 セパレータ 1 Adhesive sheet for dicing 11 Base film 12 Adhesive layer 13 separator
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開2000−173951(JP,A) 特開2002−155249(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 21/301 C09J 7/02 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP2000-173951 (JP, A) JP2002-155249 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H01L 21 / 301 C09J 7/02
Claims (6)
剤層が設けられてなるダイシング用粘着シートにおい
て、前記基材フィルムが、プロピレン並びにエチレンお
よび/または炭素数4〜8のα−オレフィンを重合成分
として含有するオレフィン系熱可塑性エラストマーを含
有してなり、かつ当該オレフィン系熱可塑性エラストマ
ーの融点ピーク温度が120℃以上であり、当該オレフ
ィン系熱可塑性エラストマーは、o−ジクロロベンゼン
を溶媒として用いた温度0〜140℃の間の温度上昇溶
離分別における0℃での溶出分が全溶出量に対して10
〜60重量%であることを特徴とするダイシング用粘着
シート。1. A pressure-sensitive adhesive sheet for dicing, comprising a substrate film and a pressure-sensitive adhesive layer provided on at least one surface of the substrate film, wherein the substrate film polymerizes propylene, ethylene and / or an α-olefin having 4 to 8 carbon atoms. and also contains an olefinic thermoplastic elastomer containing as a component, and has a melting point peak temperature of the olefin-based thermoplastic elastomer is 120 ° C. or higher, the Oleh
In-based thermoplastic elastomer is o-dichlorobenzene
Temperature rising dissolution between 0-140 ℃
The amount of elution at 0 ° C for separation was 10% of the total elution amount.
A pressure-sensitive adhesive sheet for dicing, wherein the pressure-sensitive adhesive sheet is about 60% by weight .
記オレフィン系熱可塑性エラストマーを50重量%以上
含有していることを特徴とする請求項1記載のダイシン
グ用粘着シート。 2. The pressure-sensitive adhesive sheet for dicing according to claim 1 , wherein the base film is a monolayer film and contains the olefinic thermoplastic elastomer in an amount of 50% by weight or more.
該多層フィルムの少なくとも1層が、前記オレフィン系
熱可塑性エラストマーを50重量%以上含有しているこ
とを特徴とする請求項1または2記載のダイシング用粘
着シート。 Wherein a base film is a multilayer film, at least one layer of the multilayer film, according to claim 1 or 2, wherein the containing the olefinic thermoplastic elastomer at least 50 wt% Adhesive sheet for dicing.
ことを特徴とする請求項1〜3のいずれかに記載のダイ
シング用粘着シート。 4. The pressure-sensitive adhesive sheet for dicing according to claim 1 , wherein the pressure-sensitive adhesive layer has a thickness of 1 to 200 μm.
成されていることを特徴とする請求項1〜4のいずれか
に記載のダイシング用粘着シート。 5. The pressure-sensitive adhesive sheet for dicing according to claim 1 , wherein the pressure-sensitive adhesive layer is formed of a radiation-curable pressure-sensitive adhesive.
ング用粘着シートを、被切断物へ貼り付けた後に、前記
粘着シートの基材フィルムまで切り込みを行なうことに
より被切断物をダイシングすることを特徴とするダイシ
ング方法。 6. An object to be cut is diced by sticking the pressure-sensitive adhesive sheet for dicing according to any one of claims 1 to 5 to an object to be cut, and then cutting the base film of the adhesive sheet. A dicing method characterized by the above.
Priority Applications (10)
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JP2001194021A JP3443110B2 (en) | 2001-06-27 | 2001-06-27 | Adhesive sheet for dicing |
US10/172,893 US7141300B2 (en) | 2001-06-27 | 2002-06-14 | Adhesive sheet for dicing |
EP20020013544 EP1270696B1 (en) | 2001-06-27 | 2002-06-18 | Adhesive sheet for dicing |
AT02013544T ATE321825T1 (en) | 2001-06-27 | 2002-06-18 | ADHESIVE FILM FOR CUTTING |
DE2002610166 DE60210166T2 (en) | 2001-06-27 | 2002-06-18 | Adhesive film for cutting |
TW91113528A TWI232235B (en) | 2001-06-27 | 2002-06-20 | Adhesive sheet for dicing |
SG200203892A SG107599A1 (en) | 2001-06-27 | 2002-06-26 | Adhesive sheet for dicing |
KR1020020036221A KR100871037B1 (en) | 2001-06-27 | 2002-06-27 | Adhesive sheet for dicing |
CNB021244154A CN1225771C (en) | 2001-06-27 | 2002-06-27 | Adhensive chip for cutting |
CNB200510074090XA CN1304509C (en) | 2001-06-27 | 2002-06-27 | Adhesive sheet for dicing |
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JP2001194021A JP3443110B2 (en) | 2001-06-27 | 2001-06-27 | Adhesive sheet for dicing |
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JP3443110B2 true JP3443110B2 (en) | 2003-09-02 |
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Cited By (1)
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US8728910B2 (en) | 2010-09-30 | 2014-05-20 | Mitsui Chemicals, Inc. | Expandable film, dicing film, and method of producing semiconductor device |
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JP4707936B2 (en) * | 2003-02-24 | 2011-06-22 | 三井化学株式会社 | Adhesive film for surface protection of semiconductor wafer, and method for protecting semiconductor wafer using the adhesive film |
JP2005068420A (en) * | 2003-08-07 | 2005-03-17 | Mitsui Chemicals Inc | Pressure-sensitive adhesive sheet |
JP5013842B2 (en) * | 2006-12-18 | 2012-08-29 | グンゼ株式会社 | Substrate film for dicing |
JP5013844B2 (en) * | 2006-12-19 | 2012-08-29 | グンゼ株式会社 | Substrate film for dicing |
JP2008153586A (en) * | 2006-12-20 | 2008-07-03 | Gunze Ltd | Substrate film for dicing |
JP5441458B2 (en) * | 2009-03-19 | 2014-03-12 | グンゼ株式会社 | Back grind film and manufacturing method thereof |
JP5519189B2 (en) * | 2009-05-27 | 2014-06-11 | 日東電工株式会社 | Adhesive sheet for dicing electronic components |
KR101283484B1 (en) * | 2012-03-30 | 2013-07-12 | 에이엠씨주식회사 | Pressure-sensitive adhesive tape for dicing semiconductor wafer |
JP6281191B2 (en) * | 2013-05-21 | 2018-02-21 | 三菱ケミカル株式会社 | Resin film for adhesive tape substrate for semiconductor manufacturing process |
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JP2000173951A (en) * | 1998-12-02 | 2000-06-23 | Okura Ind Co Ltd | Base film for dicing |
JP4780828B2 (en) * | 2000-11-22 | 2011-09-28 | 三井化学株式会社 | Adhesive tape for wafer processing, method for producing the same and method for using the same |
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