JP3423540B2 - Processing equipment - Google Patents

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a processing apparatus.

[0002]

2. Description of the Related Art For example, in a photolithography process in a semiconductor device manufacturing process, a resist coating process for forming a resist film on the surface of a semiconductor wafer (hereinafter referred to as "wafer") and a wafer after resist coating are performed. After the exposure process, a development process of developing the wafer is performed. Conventionally, the resist coating process and the development process are described in Japanese Patent Publication No. 2-3, for example.
As is known from Japanese Patent Laid-Open No. 0194, it is performed according to a predetermined sequence in a complex processing system in which corresponding various processing units are installed in one system.

The sequence control in such a system is generally performed by a control system using a personal computer or the like. A man-machine interface, for example, a touch panel type display unit is connected to the control system, and system time setting, operator registration, language setting, and the like are performed via this display unit.

A default screen (initial screen) is displayed on the display unit when the system is started up, for example, a screen corresponding to the contents of the process is selected, and desired settings and the like are performed through the selected display screen. It is supposed to be.

By the way, in the case where such screens are sequentially selected, it can be imagined that the next screen overlaps the screen, for example. Figure 1
8 shows an example of such a case. When the system starts up, the default screen A is displayed first (Fig. 18).
(A)). Next, when the screen B is selected, the screen B is displayed so as to overlap the default screen A (see FIG. 18).
(B)). Further, when the screen C is selected, the screen C is displayed so as to overlap the screen B (FIG. 18 (c)). Further, when the screen D is selected, the screen D is displayed so as to overlap the screen C (FIG. 18 (d)).

On the other hand, this screen D is displayed (see FIG. 1).
If the screen D is closed from 8 (d)), the screen C below will be displayed (FIG.18 (e)). Further, if the screen C is closed from the state in which the screen C is displayed (FIG. 18 (e)), the screen B below it is displayed (FIG. 18 (f)).

[0007]

In the control system of such a system, a display history as shown in, for example, FIG. 19 is stored in the storage unit in order to perform the above display. FIG. 19 shows the display history of FIGS. 18A to 18F. That is, when a new screen is selected, the display history of the new screen is overlaid on the display history already stored. It is supposed to be remembered. However, when display control is performed using such a display history, a considerable amount of storage capacity for storing them in the storage unit is required. In particular, in the semiconductor manufacturing apparatus as described above, that is, in a system in which various processing units are combined into one system, the control content is complicated and diversified,
A large number of screens are selected one after another, and a large amount of storage capacity tends to be required for that purpose.

Further, in the above system, when the screen B is selected after selecting, for example, A → B → C → D → C → D → C → D as the display screen, D → C → D. → C →
In some cases, the screen may be reached for the first time by closing the sequence from D to C, and in such a case, the desired screen,
For example, in the above case, displaying the screen B requires a considerable amount of work.

The present invention has been made in view of the above points, and an object of the present invention is to provide a processing device capable of constructing a display history of a screen with a very small storage capacity.

It is another object of the present invention to provide a processing device capable of selecting a desired screen with a simple operation.

[0011]

In order to solve the above-mentioned problems, the invention according to claim 1 performs a predetermined treatment on an object to be treated.
A processing unit and a transfer mechanism for transferring the object to be processed
In a processing device including: a display unit that displays a selected desired screen, a storage unit that stores a display history of the screen displayed on the display unit; and the selected desired display screen is the storage unit. already when stored as the display history, to remove the display history that is the storage, a display and means for storing the display history of the displayed screen in the storage means
Characterized by comprising.

According to the second aspect of the invention , the object to be processed is predetermined.
A processing unit for performing processing and a carrying unit for carrying the object to be processed.
In a processing device including a sending mechanism, a display unit that first displays an initial screen and then displays a selected desired screen, a storage unit that stores a display history of the screen displayed on the display unit, and When the initial screen is selected as the desired display screen, all display histories already stored in the storage means are removed, and the display history of the displayed initial screen is stored in the storage means. And a display device including the means.

According to a third aspect of the invention , the object to be processed is predetermined.
A processing unit for performing processing and a carrying unit for carrying the object to be processed.
In a processing device including a sending mechanism, a display unit that first displays an initial screen and then displays a selected desired screen, a storage unit that stores a display history of the screen displayed on the display unit, and When the selected desired display screen is already stored in the storage means as the display history,
The stored display history is removed, and when the initial screen is selected as the desired display screen, all display history already stored in the storage means is removed, and the display including the initial screen is displayed. table and means for storing the display history of the current screen in the storage means
A display device is provided .

According to a fourth aspect of the invention , the object to be processed is predetermined.
A processing unit for performing processing and a carrying unit for carrying the object to be processed.
In a processing device including a sending mechanism, a display unit that first displays an initial screen and then displays a selected desired parent screen or a desired child screen belonging to a group of each parent screen, and a display unit that is displayed on this display unit. When the storage means for storing the display history of the initial screen, the parent screen and the child screen and the parent screen or the child screen of the group to which the selected desired display screen belongs are already stored as the display history in the storage means. , The stored display history is removed, and when the initial screen is selected as the desired display screen, all display history already stored in the storage means is removed, and the initial screen is also included. It is characterized by comprising a display device having a control means for storing the display history of the displayed screen in the storage means.

The invention according to claim 5 is the processing according to claim 4.
In the processing device, when the selected desired display screen is a child screen, the control means stores the display history of the child screen in the storage means as the display history of the displayed screen. to. Invention 請 Motomeko 6, in the processing <br/> apparatus of claims 1 to 5 any one of claims, wherein the display device, the screen selection menu screen, shutdown screen, the language setting screen, alarm logs screen, search key At least one of a setting screen and a data detail display screen is displayed. According to a seventh aspect of the invention, in the processing apparatus according to any one of claims 1 to 6, characterized by comprising a plurality of said processing unit for performing a predetermined process on a semiconductor wafer in a coating and developing processes. The invention of claim 8 is any one of claims 1 to 7.
In the processing apparatus described above, the object to be processed is a substrate to be processed.
It is characterized by being. The invention of claim 9 relates to claim 8.
In the processing device described above, the processing device is a semiconductor manufacturing device.
Is characterized in that.

In the present invention, when the selected desired display screen is already stored as the display history, the stored display history is deleted, and the display history of the displayed screen is stored. When the initial screen is selected as the desired display screen, all the display history that has already been stored is removed, and the display history for the displayed initial screen is stored. The display history of the screen can be configured by the capacity.

Further, in the present invention, since there is no overlapping display history, it is possible to select a desired screen with a simple operation when selecting a screen by referring to the display history.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIGS. 1 to 3 each show a semiconductor wafer (hereinafter referred to as “wafer”) to which the embodiments of the present invention are adopted. 1 is a plan view, FIG. 2 is a front view, and FIG. 3 is a back view.

In this coating / developing processing system 1, a plurality of wafers W as substrates to be processed are transferred into or out of the system in units of a plurality of wafer cassettes CR, for example, 25 wafers, and the wafer cassette CR is transferred to the wafer cassette CR. Cassette station 10 for loading and unloading wafers W, and one wafer W in the coating and developing process.
A wafer W between a processing station 11 in which various single-wafer processing units that perform predetermined processing are arranged at predetermined positions in multiple stages, and an exposure apparatus (not shown) provided adjacent to the processing station 11. It has a configuration in which the interface section 12 for delivering and receiving is integrally connected.

In the cassette station 10, FIG.
As shown in FIG.
At the position 0a, a plurality of wafer cassettes CR, for example, up to four wafer cassettes CR are placed in a line in the X direction (vertical direction in FIG. 1) with the respective wafer entrances and exits facing the processing station 11 side.
This cassette arrangement direction (X direction) and the wafer arrangement direction of wafers stored in the wafer cassette CR (Z direction;
A wafer transfer body 21 movable in the vertical direction) selectively accesses each wafer cassette CR.

Further, the wafer carrier 21 is configured to be rotatable in the θ direction, and as will be described later, an alignment unit (ALIM) belonging to the multi-stage unit section of the third processing unit group G ₃ on the processing station 11 side. The extension unit (EXT) is also accessible.

As shown in FIG. 1, the processing station 11 is provided with a vertical transfer type main wafer transfer mechanism 22 having a wafer transfer device, and all processing units are surrounded by one set or a plurality of sets. They are arranged in multiple stages across the ground.

As shown in FIG. 3, the main wafer transfer mechanism 22 is equipped with a wafer transfer device 46 inside the cylindrical support 49 so as to be vertically movable (Z direction). The cylindrical support 49 is connected to a rotating shaft of a motor (not shown), and is rotated integrally with the wafer transfer device 46 about the rotating shaft by the rotational driving force of the motor, thereby transferring the wafer. The device 46 is rotatable in the θ direction. The cylindrical support 49 may be connected to another rotation shaft (not shown) rotated by the motor.

The wafer transfer device 46 includes a plurality of holding members 48 that are movable in the front-rear direction of the transfer base 47, and these holding members 48 realize the transfer of the wafer W between the processing units. .

In this example, five processing unit groups G ₁ , G ₂ , G ₃ , G ₄ and G ₅ can be arranged, and the first and second processing unit groups G ₁ and G ₂ can be arranged. Of the third processing unit group G ₃ is arranged adjacent to the cassette station 10, and the multi-stage unit of the fourth processing unit group G ₄ is arranged on the front side (front side in FIG. 1) of the system. The unit is arranged adjacent to the interface unit 12, and the multi-stage unit of the _fifth processing unit group G ₅ can be arranged on the back side.

As shown in FIG. 2, in the first processing unit group G ₁ , two spinner type processing units, for example, a resist coating unit (wherein the wafer W is placed on the spin chuck in the cup CP to perform a predetermined process). The COT) and the developing unit (DEV) are stacked in two stages in order from the bottom. Also in the second processing unit group G ₂ , two spinner type processing units, for example, a resist coating unit (COT)
And the developing units (DEV) are stacked in two stages in order from the bottom. These resist coating units (COT)
Since it is troublesome to drain the resist liquid both mechanically and in terms of maintenance, it is preferable to arrange the resist liquid in the lower stage. However, it is, of course, possible to arrange them in the upper stage as needed.

As shown in FIG. 3, in the third processing unit group G ₃ , an oven type processing unit for carrying out a predetermined processing by placing the wafer W on the mounting table SP, for example, a cooling unit (COL) for carrying out a cooling processing. , An adhesion unit (AD) that performs a so-called hydrophobic treatment for improving the fixability of the resist, an alignment unit (ALIM) that performs alignment, an extension unit (EX
T), a pre-baking unit (PREBAKE) that performs a heating process before the exposure process, and a post-baking unit (POBAKE) that performs a heating process after the exposure process are stacked in, for example, eight stages from the bottom. Also in the fourth processing unit group G ₄ , an oven type processing unit, for example, a cooling unit (COL), an extension cooling unit (EXTCOL), an extension unit (EXT), a cooling unit (COL), a prebaking unit (COL). PREBAKE) and post-baking units (POBAKE) are stacked in order from the bottom, for example, in eight stages.

As described above, the cooling unit (COL) and the extension cooling unit (EXTCOL) having a low processing temperature are arranged in the lower stage, and the baking unit (PREBAKE), the post-baking unit (POBAKE) and the adhesion which have a high processing temperature are arranged. By arranging the units (AD) on the upper stage, thermal mutual interference between the units can be reduced. Of course, a random multi-stage arrangement may be used.

The interface section 12 has the same size as the processing station 11 in the depth direction (X direction), but is set to have a smaller size in the width direction. And this interface unit 12
In the front part of the, there is a portable pickup cassette CR,
The stationary buffer cassettes BR are arranged in two stages, on the other hand, a peripheral exposure device 23 is arranged on the rear surface portion, and a wafer carrier 24 is arranged on the central portion. The wafer carrier 24 moves in the X and Z directions to access both cassettes CR, BR and the peripheral exposure device 23. The wafer carrier 24 is configured to be rotatable also in the θ direction, and an extension unit (EXT) belonging to the multi-stage unit of the fourth processing unit group G ₄ on the processing station 11 side, and further Is a wafer transfer table (not shown) on the adjacent exposure apparatus side
Is also accessible.

In the coating and developing treatment system 1, the multi-stage unit of the _fifth treatment unit group G ₅ indicated by the broken line can be arranged on the back side of the main wafer transfer mechanism 22 as described above. , This fifth processing unit group G ₅
The multi-stage unit is configured so that it can be shifted laterally when viewed from the main wafer transfer mechanism 22 along the guide rail 25. Therefore, even when the multi-stage unit of the fifth processing unit group G ₅ is provided as shown in the drawing, the space is secured by sliding along the guide rail 25, so that the main wafer transfer mechanism 22 can be secured. The maintenance work can be easily done from behind. The multi-stage unit of the fifth processing unit group G ₅ is not limited to the linear slide shift along the guide rail 25 as described above, but as shown by the reciprocating rotation arrow of the one-dot chain line in FIG. Even if it is configured to be rotationally shifted to the outside of the system, it is easy to secure a space for maintenance work for the main wafer transfer mechanism 22.

Above the middle part of the front surface of the interface section 12 described above, a touch panel type display section 2 as a man-machine interface connected to a control system described later is provided.
6 are arranged. Various screens are displayed on the display unit 26, and the system time is set, the operator is registered, and the language is set via the display unit 26. The input by the user is performed, for example, by touching the display unit 26 with a fingertip. However, it is also possible to make such an input using a keyboard, a mouse, or the like. Next, the control system of the coating and developing treatment system 1 configured as described above will be described. FIG. 4 is a block diagram showing the configuration of this control system.

As shown in FIG. 4, the control system 28 is provided with a control unit 29 for controlling the entire apparatus as a whole, a storage unit 30 for storing a program necessary for control, a display history described later, and the like, and an interface. (I / F) section 31, 32, 33
The display system 26a and the input system 26b of the display unit 26, and each unit of the coating and developing treatment system 1, for example, a motor or the like are connected via the.

5 to 11 show examples of screens displayed on the display unit 26.

FIG. 5 shows the default screen (initial screen), and FIG.
Is the screen selection menu screen, Fig. 7 is the shutdown screen,
8 shows a language setting screen, FIG. 9 shows an alarm log screen, and FIG.
Shows a search key setting screen, and FIG. 11 shows a data detail display screen.

As shown in these figures, a display bar 34 is displayed in the upper part of the screen separately from these display screens. On the left side of the display bar 34, a title column 35 indicating the processing content,
Screen selection buttons 36 are displayed on the right side.

The default screen as the initial screen shown in FIG. 5 is a screen for setting the user level at the time of login operation, for example, the user name and the operation level of the user.

Further, the shutdown screen shown in FIG.
The language setting screen shown in FIG. 8 and the alarm log screen shown in FIG. 9 are parent screens, respectively, and the search key setting screen shown in FIG. 10 and the data detail display screen shown in FIG. 11 are child screens. The parent screen of the child screen is the alarm log screen shown in FIG.

In the following, the default screen (initial screen) of FIG. 5 is screen A, the screen selection menu screen of FIG. 6 is screen S,
The shutdown screen of FIG. 7 is screen B, the language setting screen of FIG. 8 is screen C, the alarm log screen of FIG. 9 is screen D, and FIG.
The search key setting screen of No. 2 is screen D-1, and the data detail display screen of FIG. 11 is screen D-2.

On the display unit 26, first, a screen A as an initial screen is displayed when the system is started up, then a screen corresponding to the content of the process is selected, and desired settings are made through the selected display screen. It is like this. For example, when the screen selection button 36 is pressed while the screen A is displayed, the screen S as a screen selection menu screen is displayed, and when the screen menu displayed on the screen S is selected, "time setting" is performed. , "Operator registration", "Language setting"
A menu such as is displayed. The various screens described above are selected from these menus.

In the display method in the system of the present example, when such a screen selection is performed sequentially, it is possible to imagine that the next screen overlaps the screen, for example. However, for example, the screens may be sequentially divided and displayed, or the screens may be organized by using icons, for example.

On the other hand, when the above selection is made, the display history is sequentially stored in the storage unit 30. 12 to 16 show examples of the display history stored in the storage unit 30.

As shown in FIGS. 12A to 12D, when, for example, screen A → screen B → screen C → screen D is selected as the display screen, B → C is displayed above A in the storage unit 30. → The display history is overlaid in the order of D. In this example, the image is displayed as if the display histories are overlapped, but any storage method of the display histories by such storage means may be used.
For example, the display history may be connected in a chain.

Further, as shown in FIG. 13, after selecting, for example, screen A → screen B → screen C → screen D as a display screen ((a) to (d) in the figure), screen B is selected. Then, the display history of the screen B already stored as the display history is removed, and the display history of the newly selected screen B is placed on the display history of the screen D ((e) to (f) in the figure). ). Further, as shown in FIG. 14, as a display screen, for example, screen A
→ After selecting the screen B → the screen C → the screen D ((a) in the same figure), and selecting the default screen A ((b) in the same figure), all display histories already stored as the display history Is removed, and the display history of the newly selected screen A is stored as the first display history ((c) in the same figure).

As shown in FIG. 15, after the screen A → screen D-1 → screen B → screen C is selected as the display screen (FIG. 15A), screen D-2 is selected. And ((b) in the figure), screen D already stored as the display history.
-1 display history is removed, and newly selected screen D-
The display history of No. 2 is placed on the display history of screen C ((c) in the same figure).

Further, as shown in FIG. 16, after the screen A → screen D → screen B → screen C is selected as the display screen (FIG. 16A), screen D-1 is selected ( In the same figure (b)), the display history of the screen D already stored as the display history, that is, the parent screen of the child screen D-1 is removed, and the display history of the newly selected screen D-1 is displayed on the screen C. It is placed on the history ((c) of the same figure). However, for example, instead of leaving the child screen as the display history, it is possible to leave only the parent screen as the display history.

FIG. 17 is a flow chart showing the control operation relating to the above display history by the control unit 29.

That is, when the screen is selected (step 171), it is determined whether the selected screen is the default screen (step 172).

When it is not the default screen, it is determined whether the parent screen or the child screen of the group to which the selected screen belongs is a screen already stored as a display history (step 173).

When the selected screen is stored as the display history as described above, the display history already stored is removed and the display history for the selected screen is stored (step 174).

When the selected screen is not stored as the display history as described above, the display history of the selected screen is stored as it is (step 175).

On the other hand, when the selected screen is the default screen, all the display histories already stored are removed and the display history of the displayed initial screen is stored (step 176).

As described above, in the display device in the coating and developing treatment system 1 of the present embodiment, when the selected screen is already stored in the storage unit 30 as the display history, the stored display history is removed, Store the display history for the selected screen, remove all display history that has already been stored when the initial screen is selected, and store the display history for the displayed initial screen. Since it is configured, the storage area regarding the display history in the storage unit 30 can be reduced. In particular, in the coating and developing treatment system 1 of the present embodiment, since the resist coating treatment and the developing treatment are combined, the control contents are complicated and diversified, and there are many occasions where a large number of screens are sequentially selected. Therefore, the effect of reducing the storage area for the display history in the storage unit 30 as described above is great.

Further, in the display device in the coating and developing treatment system 1 of this embodiment, the display screen is, for example, A → B.
After selecting C → D → C → D → C → D, if you select screen B, you can open screen B by closing D → C sequentially. You will be able to choose.

Further, as a display screen, for example, A → B → C →
When the default screen A is selected after D is selected, all display histories (A → B → C → D) already stored as display histories are removed, and the newly selected screen A is displayed. Since the history is stored as the first display history, the storage area for the display history in the storage unit 30 can be reduced. In particular, since the screen A as the default screen is a screen for setting the user name and the operation level of the user as described above, it means that the default screen A is selected. Since there is a change in the operation level and so on, the display history (A->B->C-> D above) by the user name and the operation level of the user so far becomes unnecessary. Therefore, by the operation of this embodiment, unnecessary display history can be erased and the storage area for the display history in the storage unit 30 can be reduced.

Further, as shown in FIGS. 15 and 16,
When a sub screen is selected and a parent screen of the same group or a different sub screen exists as past display history,
Since the selected child screen, that is, the immediately preceding child screen is left as the display history, it is possible to easily select the screen that was most recently worked in the same group, which is the most important one, by scrolling the display history. be able to.

The present invention is not limited to the above-mentioned embodiments, but various modifications can be made within the scope of the technical idea thereof.

In the above-described embodiment, the present invention is applied to the display device in the coating and developing system 1, but the present invention can be applied to the display devices in other systems. In particular, it is suitable for a display device in a system in which control contents are complicated and diversified, and a large number of screens are sequentially selected.

[0058]

As described above in detail, according to the present invention, according to the present onset Akira,
Display means for displaying the selected desired screen and storage means for storing the display history of the screen displayed on the display means are provided, and the selected desired display screen is already stored in the storage means as the display history. When it is stored, the stored display history is removed, and the display history of the displayed screen is stored in the storage means. Therefore, the display history of the screen is stored with a very small storage capacity. Can have

[0059] Further, according to this onset bright, the initial screen is first displayed, and display means for displaying the selected desired screen below, storage means for storing a display history of the displayed screen on the display unit And when the initial screen is selected as the desired display screen, all display histories already stored in the storage means are removed, and the display history for the displayed initial screen is stored. Since it is configured to be stored in the means, the display history of the screen can be held with a very small storage capacity as in the above.

[0060] According to the present onset Akira, because the overlapping display history that does not exist, it becomes possible to select a desired screen by a simple operation if you select the screen back in the display history.

[Brief description of drawings]

FIG. 1 is a plan view of the overall configuration of a semiconductor wafer coating and developing treatment system 1 to which an embodiment of the present invention is adopted.

FIG. 2 is a front view of the overall configuration of the coating and developing treatment system 1 shown in FIG.

3 is a rear view of the overall configuration of the coating and developing treatment system 1 shown in FIG.

FIG. 4 is a block diagram showing a configuration of a control system of the coating and developing treatment system 1 shown in FIG.

5 is a default screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

6 is a screen selection menu screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

7 is a shutdown screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

8 is a language setting screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

9 is an alarm log screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

10 is a search key setting screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

11 is a data detail display screen displayed on the display unit of the coating and developing treatment system 1 shown in FIG.

FIG. 12 is an example of a display history according to the embodiment of the present invention.

FIG. 13 is an example of a display history according to the embodiment of the present invention.

FIG. 14 is an example of a display history according to the embodiment of the present invention.

FIG. 15 is an example of a display history according to the embodiment of the present invention.

FIG. 16 is an example of a display history according to the embodiment of the present invention.

FIG. 17 is a flowchart showing a control operation regarding a display history according to the embodiment of the present invention.

FIG. 18 is a diagram showing a conventional screen display example when sequential screens are selected.

FIG. 19 is an example of a conventional display history.

[Explanation of symbols]

26 Touch panel display 28 Control system 29 Control unit 30 storage A default screen (initial screen) S screen selection menu screen B Shutdown screen C language setting screen D Alarm log screen D-1 Search key setting screen D-2 Data detail display screen

Front page continuation (58) Fields surveyed (Int.Cl. ⁷ , DB name) H01L 21/02 G06F 3/14 G09G 5/14 H01L 21/027

Claims (9)

(57) [Claims] A processing unit 1. A subjected to the treatment object to a predetermined processing, processing that and a transport mechanism for transporting the object to be treated
In the processing device, display means for displaying the selected desired screen, storage means for storing the display history of the screen displayed on the display means, and the selected desired display screen is already displayed in the storage means. When stored as a history, the display device is provided with a unit that removes the stored display history and stores the display history of the displayed screen in the storage unit. Processing equipment. A processing unit wherein performing object to be processed to a predetermined processing, processing that and a transport mechanism for transporting the object to be treated
In the processing device, an initial screen is first displayed, and a display unit that displays a desired screen selected below, a storage unit that stores a display history of the screen displayed on the display unit, and the desired display screen are the above-mentioned display screens. When the initial screen is selected, all display histories already stored in the storage means are removed, and a display history for the displayed initial screen is stored in the storage means. A processing device comprising a device. A processing unit 3. subjected to the treatment object to a predetermined processing, processing that and a transport mechanism for transporting the object to be treated
In the processing device, an initial screen is first displayed, and then a display unit that displays a desired screen selected below, a storage unit that stores a display history of the screen displayed on the display unit, and the selected desired display When the screen is already stored in the storage means as the display history, the stored display history is removed, and when the initial screen is selected as the desired display screen, it is already stored in the storage means. A processing device comprising: a display device including a unit that removes all display histories that are present and stores the display histories of the displayed screens including the initial screen in the storage unit. A processing unit wherein performing object to be processed to a predetermined processing, processing that and a transport mechanism for transporting the object to be treated
In the processing device, an initial screen is first displayed and then a desired parent screen selected or a desired child screen belonging to each parent screen group is displayed, and an initial screen and a parent screen displayed on this display unit. And storage means for storing the display history of the child screen, and when the parent screen or child screen of the group to which the selected desired display screen belongs is already stored as the display history in the storage means, it is stored. When the display history is removed, and when the initial screen is selected as the desired display screen, all display histories already stored in the storage means are removed, and the displayed screen including the initial screen is displayed. A processing device comprising: a display device having a control means for storing a display history in the storage means. 5. The processing device according to claim 4 , wherein when the selected desired display screen is a child screen, the control unit sets the display history of the displayed child screen as a display history of the displayed screen. processing apparatus according to claim to be stored in the storage means. In the processing <br/> apparatus 6. The method of claim 1 to 5 any one of claims, wherein the display device, the screen selection menu screen, shutdown screen, the language setting screen, alarm logs screen, the search key setting screen, A processing device displaying at least one of data detail display screens. 7. A process <br/> apparatus according to any one of claims 1 to 6, and characterized by including a plurality of said processing unit for performing a predetermined process on a semiconductor wafer in a coating and developing process Processing device. 8. The processing apparatus according to claim 1, wherein the object to be processed is a substrate to be processed. 9. The processing apparatus according to claim 8, wherein the processing apparatus is a semiconductor manufacturing apparatus.