JP3327450B2 - Package for electronic components - Google Patents
Package for electronic componentsInfo
- Publication number
- JP3327450B2 JP3327450B2 JP04793596A JP4793596A JP3327450B2 JP 3327450 B2 JP3327450 B2 JP 3327450B2 JP 04793596 A JP04793596 A JP 04793596A JP 4793596 A JP4793596 A JP 4793596A JP 3327450 B2 JP3327450 B2 JP 3327450B2
- Authority
- JP
- Japan
- Prior art keywords
- hole
- package
- gap
- plating
- package body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007747 plating Methods 0.000 claims description 40
- 238000004140 cleaning Methods 0.000 claims description 33
- 238000010992 reflux Methods 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 239000007788 liquid Substances 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000010931 gold Substances 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 5
- 238000005219 brazing Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、集積回路チップ等
の電子部品の封止に用いられる電子部品用パッケージに
関し、詳しくはセラミック製パッケージ本体に放熱部材
(ヒートシンク)が固着されてなる電子部品用パッケー
ジ(以下、単に「パッケージ」ともいう)に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for an electronic component used for sealing an electronic component such as an integrated circuit chip, and more particularly, to a package for an electronic component having a heat radiating member (heat sink) fixed to a ceramic package body. It relates to a package (hereinafter, also simply referred to as “package”).
【0002】[0002]
【従来の技術】放熱部材を備えたセラミックパッケージ
であって、集積回路チップ等の電子部品(以下、単に集
積回路チップともいう)が放熱部材に固着(接合)され
るヒートスラグ型といわれるものは、パッケージ本体と
放熱部材等から構成されている。図6〜8は、このヒー
トスラグ型のパッケージ61の一例を示している。この
ものは、パッケージ本体(以下、単に本体ともいう)6
2のボンディングパッド(一部のみ図示)63の形成部
位64の内側が上下(上面から下面)に貫通(開口)し
ていると共に、その貫通孔65に、本体62の下面66
側から段付き状(縦断面凸型)をなす放熱部材81がそ
の上段部82を隙間嵌め状態で挿入され、下段部83の
上面(肩面)84を本体62の下面66にロー材67に
よりロー付けされた構成とされている。2. Description of the Related Art A ceramic package having a heat dissipating member, which is called a heat slug type in which electronic components such as an integrated circuit chip (hereinafter, also simply referred to as an integrated circuit chip) are fixed (joined) to the heat dissipating member, is known. , A package body and a heat radiating member. 6 to 8 show an example of the heat slug type package 61. FIG. This is a package body (hereinafter, simply referred to as a body) 6
The inside of the formation site 64 of the second bonding pad (only part of which is shown) penetrates (opens) vertically (from the upper surface to the lower surface), and the through hole 65 is provided with the lower surface 66 of the main body 62.
A heat dissipating member 81 having a stepped shape (longitudinal cross section) is inserted from its side with its upper step 82 fitted in a gap, and the upper surface (shoulder surface) 84 of the lower step 83 is attached to the lower surface 66 of the main body 62 by the brazing material 67. It has a brazed configuration.
【0003】このように構成されたパッケージ61は、
放熱部材81の上段部82の上面がダイアタッチ面(集
積回路チップが固着される部位)85をなし、このダイ
アタッチ面85と本体62の貫通孔65の内側面68の
上寄り部位とでダイアタッチキャビティを構成してい
る。なお、パッケージ本体62は、放熱部材81とのロ
ー付け面とされる下面66の貫通孔65の周縁面がW
(タングステン)やMo(モリブデン)等でメタライズ
され、その上にNi(ニッケル)鍍金が施されており、
放熱部材81は、Ni鍍金が施されたCu−W(銅タン
グステン)等から形成されている。[0003] The package 61 thus configured is
The upper surface of the upper portion 82 of the heat dissipating member 81 forms a die attach surface (a portion to which the integrated circuit chip is fixed) 85, and the die attach surface 85 and the upper portion of the inner surface 68 of the through hole 65 of the main body 62 form a die. Make up the touch cavity. In the package body 62, the peripheral surface of the through hole 65 in the lower surface 66, which is a surface to be brazed to the heat radiating member 81, is W
(Tungsten) or Mo (Molybdenum) metallized with Ni (nickel) plating on it,
The heat radiating member 81 is made of Ni-plated Cu-W (copper tungsten) or the like.
【0004】ところで、このようなパッケージ61は、
放熱部材81がロー付けにより一体化された後、腐食防
止等のため、放熱部材81のダイアタッチ面(部)85
及び外部の放熱面及び本体62のボンディングパッド6
3、ピン等の入出力端子(図示せず)等にNi鍍金及び
Au(金)鍍金が施される。一方、放熱部材81の上段
部82はパッケージ本体62の貫通孔65に隙間嵌めさ
れていることから、その貫通孔65の内側面68と放熱
部材81の上段部82の外側面86との間には、図示の
ように所定幅Wで、奥所が閉塞された溝状の隙間(空
隙)Sが平面視(上から見て)枠状にできるが、この隙
間(以下、単に隙間ともいう)Sには、鍍金後の鍍金液
の洗浄工程において洗浄液が環流し難い。これは、隙間
Sの幅Wが小さく、しかも洗浄液が隙間Sの開口側(図
示上)からしか出入りできないためであり、したがっ
て、上記の従来のパッケージにおいては、その隙間Sに
鍍金液が残留し易いといった問題があった。By the way, such a package 61 is
After the heat dissipating member 81 is integrated by brazing, the die attach surface (part) 85 of the heat dissipating member 81 is used for corrosion prevention and the like.
And the external heat dissipation surface and the bonding pad 6 of the main body 62
3. Ni plating and Au (gold) plating are applied to input / output terminals (not shown) such as pins. On the other hand, since the upper portion 82 of the heat radiating member 81 is gap-fitted in the through hole 65 of the package body 62, between the inner surface 68 of the through hole 65 and the outer surface 86 of the upper portion 82 of the heat radiating member 81. As shown in the figure, a groove-shaped gap (gap) S having a predetermined width W and a closed back portion can be formed in a frame shape in a plan view (as viewed from above). For S, the cleaning liquid is unlikely to reflux in the cleaning step of the plating liquid after plating. This is because the width W of the gap S is small and the cleaning liquid can enter and exit only from the opening side (on the illustration) of the gap S. Therefore, in the above-described conventional package, the plating solution remains in the gap S. There was a problem that it was easy.
【0005】この隙間Sに鍍金液が残留していると、そ
れが触れている表面の鍍金に変質や変色を起こし、その
ような変質がダイアタッチ面85などにも拡散し、パッ
ケージ61の外観不良の原因となる。また、ダイアタッ
チ面85に、図中、2点鎖線で示したように集積回路チ
ップ91がロー付けにより固着された後においては、集
積回路チップ91の性能の低下や寿命の低下を招いてし
まうといった問題を生じる原因ともなる。If the plating solution remains in the gap S, the plating on the surface touched by the plating solution is altered or discolored, and such alteration is diffused to the die attach surface 85 and the like, and the appearance of the package 61 is reduced. Failure to do so. Further, after the integrated circuit chip 91 is fixed to the die attach surface 85 by brazing as shown by a two-dot chain line in the figure, the performance of the integrated circuit chip 91 and the life of the integrated circuit chip 91 are reduced. This can cause problems.
【0006】[0006]
【発明が解決しようとする課題】このような問題を生じ
させないため、すなわち、隙間Sに鍍金液を残留さない
ようにするため、従来よりその隙間Sは洗浄液の環流に
支障のない所定の幅W(通常、片側0.25mm程度)
を確保する必要があり、これがパッケージ61の小形化
を妨げる一因となっていた。In order to prevent such a problem from occurring, that is, to prevent the plating solution from remaining in the gap S, the gap S has a predetermined width which does not hinder the reflux of the cleaning solution. W (normally about 0.25 mm on one side)
, Which has been a factor in preventing the package 61 from being downsized.
【0007】また、この隙間Sが大きいほど、パッケー
ジ61のボンディングパッド63と集積回路チップ91
の入出力端子(電極)との間の距離が長くなり、ボンデ
ィングワイヤ(以下、単にワイヤともいう)92が長く
なってしまう。そして、長くなるほど、たるみ等により
隣接するワイヤ相互間で接触しやすくなり、或いは、ワ
イヤのもつインダクタンスが大きくなる等の問題を生じ
る。The larger the gap S, the more the bonding pad 63 of the package 61 and the integrated circuit chip 91
And the distance between the input and output terminals (electrodes) becomes longer, and the bonding wire (hereinafter, also simply referred to as a wire) 92 becomes longer. Then, as the length becomes longer, the adjacent wires are more likely to come into contact with each other due to slack or the like, or a problem such as an increase in inductance of the wires occurs.
【0008】しかも、放熱部材81を挿入して固着する
際に横ずれがあると、対辺をなす隙間Sの幅Wに大小を
生じるが、隙間が小さい側では洗浄液の環流に問題を生
じる上に、隙間が大きい側ではボンディングワイヤが長
くなることによる前記の問題がより顕著なものとなって
しまう。このことから理解されるが、隙間Sの幅Wは、
鍍金液の洗浄処理のための洗浄液の環流に問題がないか
ぎりは、本来、なるべく小さい方が好ましい。Further, if there is a lateral displacement when the heat radiating member 81 is inserted and fixed, the width W of the gap S forming the opposite side will be large or small. On the side where the gap is small, a problem will occur in the recirculation of the cleaning liquid. On the side where the gap is large, the above-mentioned problem due to the longer bonding wire becomes more pronounced. As understood from this, the width W of the gap S is
As long as there is no problem with the recirculation of the cleaning solution for the plating solution cleaning process, the smaller the size, the better.
【0009】本発明は、放熱部材を備えたヒートスラグ
型のパッケージにおけるこうした点に鑑みて案出したも
のであって、その目的とするところは、上記隙間に鍍金
液を残留させないようにするための洗浄液の環流に支障
を及ぼすことなく、その隙間の幅を可及的に小さくする
ことにある。The present invention has been made in view of such a point in a heat slug type package provided with a heat radiating member. An object of the present invention is to prevent a plating solution from remaining in the gap. The purpose of the present invention is to reduce the width of the gap as much as possible without affecting the reflux of the cleaning liquid.
【0010】[0010]
【課題を解決するための手段】上記の目的を達成するた
め、請求項1に記載の本発明は、パッケージ本体の上下
に貫通する貫通孔に、段付き状に形成された放熱部材が
その上段部を該パッケージ本体の下方から隙間嵌め状態
で挿入されてなる電子部品用パッケージであって、該放
熱部材が前記パッケージ本体に一体化された後でNi鍍
金及びAu鍍金が施されるものにおいて、前記貫通孔の
内側面に、該貫通孔の上縁(開口)から下縁側に延びる
凹溝を形成して前記隙間の幅を局所的に広げたことを特
徴とする。そして、請求項2に記載の本発明は、パッケ
ージ本体の上下に貫通する貫通孔に、段付き状に形成さ
れた放熱部材がその上段部を該パッケージ本体の下方か
ら隙間嵌め状態で挿入されてなる電子部品用パッケージ
であって、該放熱部材が前記パッケージ本体に一体化さ
れた後でNi鍍金及びAu鍍金が施されるものにおい
て、 前記貫通孔の内側面と前記上段部の外側面とのなす
隙間に、前記鍍金後の鍍金液の洗浄における洗浄液の環
流を容易にするため、前記貫通孔の内側面に、該貫通孔
の上縁から下縁側に延びる凹溝を形成して前記隙間の幅
を局所的に広げたことを特徴とする。 さらに、請求項3
に記載の本発明は、パッケージ本体の上下に貫通する貫
通孔に、段付き状に形成された放熱部材がその上段部を
該パッケージ本体の下方から隙間嵌め状態で挿入され、
前記パッケージ本体の下面側におけるメタライズ層に前
記放熱部材の下段部の上面がロー付けされてなる電子部
品用パッケージであって、該放熱部材が前記パッケージ
本体に一体化された後でNi鍍金及びAu鍍金が施され
るものにおいて、 前記貫通孔の内側面と前記上段部の外
側面とのなす隙間に、前記鍍金後の鍍金液の洗浄におけ
る洗浄液の環流を容易にするため、前記貫通孔の内側面
に、該貫通孔の上縁から下縁側に延びる凹溝を形成して
前記隙間の幅を局所的に広げたことを特徴とする。 本発
明において、凹溝の平面視形状若しくはその横断面形状
は、円弧状若しくはそれに近似の形状(例えばU溝状)
とするのが製造も容易であり好ましい。According to a first aspect of the present invention, there is provided a heat radiation member having a stepped shape formed in a through hole vertically penetrating a package body. A package for an electronic component having a part inserted from below the package body in a clearance-fitted state .
After the heat member is integrated with the package body, Ni plating is performed.
In the case where gold and Au plating are applied, the inner surface of the through hole extends from the upper edge (opening) to the lower edge side of the through hole.
The width of the gap is locally increased by forming a concave groove . The present invention described in claim 2 is a package
Formed in a stepped shape through through holes that penetrate the top and bottom of the
Of the upper heat sink is below the package body.
For electronic components inserted in a gap-fitted state
Wherein the heat radiation member is integrated with the package body.
Smell after plating with Ni and Au
Between the inner surface of the through hole and the outer surface of the upper section.
In the gap, a ring of the cleaning solution in the cleaning of the plating solution after plating is provided.
In order to facilitate the flow, the through hole is provided on the inner surface of the through hole.
Forming a concave groove extending from the upper edge to the lower edge to form the width of the gap
Is locally expanded. Further, claim 3
The present invention described in (1), the penetrating through the package body
In the through hole, a stepped radiating member
It is inserted in a clearance fit state from below the package body,
Before the metallization layer on the lower surface side of the package body
The electronic part with the upper surface of the lower part of the heat dissipation member brazed
An article package, wherein the heat radiating member is the package.
After being integrated with the main body, Ni plating and Au plating are applied.
In shall, outside of the upper portion and the inner surface of the through hole
In the gap made with the side surface, wash the plating solution after plating.
In order to facilitate the reflux of the cleaning solution,
Forming a groove extending from the upper edge to the lower edge of the through hole;
The width of the gap is locally widened. Departure
In the description, the shape of the concave groove in plan view or its cross-sectional shape is an arc shape or a similar shape (for example, a U-groove shape).
It is preferable because the production is easy.
【0011】上記の手段においては貫通孔の上縁に開口
する凹溝があることから、隙間は凹溝のある部位で局所
的に大きく開口している。したがって、洗浄液は隙間の
上部(上縁開口)から出入りできるだけでなく、局所的
に大きく開口した凹溝からその奥所(隙間の溝底側)に
容易に入り込み、凹溝の奥所にわたる側方(横)からも
隙間に出入りすることができ、隙間に環流しやすい構造
とされている。なお、洗浄液が隙間の溝底側に入り込み
やすいように、本発明における凹溝は、貫通孔の下縁ま
で延びているのが好ましい。なお、凹溝は、貫通孔の上
下方向に沿って形成するのが、洗浄液の環流や製造上に
おいても好ましいといえるが、傾斜していてもよい。In the above-mentioned means, since there is a concave groove opening at the upper edge of the through-hole, the gap is locally large at a portion where the concave groove exists. Therefore, the cleaning liquid can not only enter and exit from the upper part (upper edge opening) of the gap, but also easily enter the depth (groove bottom side of the gap) from the locally wide groove, and extend to the side of the depth of the groove. It is designed to be able to get in and out of the gap from the side (horizontal) and to easily recirculate into the gap. It is preferable that the concave groove in the present invention extends to the lower edge of the through hole so that the cleaning liquid easily enters the groove bottom side of the gap. It is preferable that the concave groove is formed along the up and down direction of the through hole in terms of the circulation of the cleaning liquid and the production. However, the groove may be inclined.
【0012】すなわち、本発明においては凹溝がある
分、洗浄液が隙間を環流しやすいので、鍍金液を残留さ
せることなく、隙間を小さくできる。したがって、隙間
を小さくできる分、パッケージの小形化を図ることがで
きるし、パッケージのボンディングパッドと集積回路チ
ップの入出力端子との間の距離を短くでき、ボンディン
グワイヤの短小化を図ることができる。That is, in the present invention, since the cleaning liquid easily flows through the gap due to the presence of the concave groove, the gap can be reduced without leaving the plating solution. Therefore, the size of the package can be reduced as much as the gap can be reduced, the distance between the bonding pad of the package and the input / output terminal of the integrated circuit chip can be shortened, and the bonding wire can be shortened. .
【0013】また、上記手段において、前記貫通孔の内
側面及び前記上段部の外側面(ダイアタッチキャビテ
ィ)が平面視、略四角形とされている場合には、前記凹
溝を少なくとも該貫通孔の内側面の四角形の各辺の略中
央に形成(合計4か所形成)するのが洗浄液の隙間への
環流のために好ましい。ここに「少なくとも」としたの
は、平面視における貫通孔の一辺の長さや凹溝の開口幅
などによっては、各辺にさらに設けてもよいことを意味
する。集積回路チップの入出力端子に対応するボンディ
ングパッドの形成位置に影響がない範囲(位置又は数)
で適宜に設計すればよい。そして、上記手段において、
前記貫通孔の内側面及び前記上段部の外側面が平面視、
それぞれ略四角形とされている場合には、前記凹溝を少
なくとも該貫通孔の内側面の四角形の各隅角に形成(合
計4か所形成)してもよい。ここに「少なくとも」とし
たのは、前記同様、平面視における一辺の長さや凹溝の
開口幅などによっては、各辺にさらに設けてもよいこと
を意味する。In the above means, when the inner side surface of the through hole and the outer side surface (die attach cavity) of the upper portion are substantially square in plan view, at least the concave groove is formed in the through hole. It is preferable that the cleaning liquid is formed substantially at the center of each side of the square on the inner surface (a total of four places) to recirculate the cleaning liquid into the gap. Here, “at least” means that an additional portion may be provided on each side depending on the length of one side of the through hole in plan view, the opening width of the concave groove, and the like. A range (position or number) that does not affect the formation position of the bonding pad corresponding to the input / output terminal of the integrated circuit chip
May be appropriately designed. And in the above means,
The inner surface of the through hole and the outer surface of the upper step are viewed in plan,
In the case where each of the through-holes is substantially square, the concave groove may be formed at least at each corner of the square on the inner surface of the through hole (a total of four corners). Here, “at least” means that, as described above, depending on the length of one side in plan view, the opening width of the concave groove, and the like, it may be further provided on each side.
【0014】[0014]
【発明の実施の形態】本発明の実施の形態例を図1〜4
を参照しながら詳細に説明する。図中1は、本例のヒー
トスラグ型のパッケージであって、セラミック製のパッ
ケージ本体2と放熱部材21とを主体として次のように
構成されている。すなわち、セラミック製のパッケージ
本体2は、詳しくは図示しないが複数の所定のグリーン
シートを積層、熱圧着して焼成することにより略正方形
の薄板状に形成されてなるもので、内寄り部位にはボン
ディングパッド(一部のみ図示)3の形成面4が平面
視、枠状に凹設され、その内側には、略正方形にて上下
(上面から下面)に貫通(開口)する貫通孔5が形成さ
れている。そして、本例では、本体2の貫通孔5の内側
面(内壁面)6をなす各辺の平面視ほぼ中央に、半円弧
状に切り込まれた形で凹溝7が貫通孔5の上縁(開口)
5aから下縁5bまで上下方向に沿って形成されてい
る。なお、本体2の下面8側における貫通孔5の開口の
周縁面には所定の幅でもってWメタライズ層が本体2と
同時焼成により形成され、その表面にはNi鍍金が施さ
れている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention are shown in FIGS.
This will be described in detail with reference to FIG. In the figure, reference numeral 1 denotes a heat slug type package of the present embodiment, which is mainly constituted by a ceramic package body 2 and a heat radiation member 21 as follows. That is, although not shown in detail, the ceramic package body 2 is formed in a substantially square thin plate shape by laminating a plurality of predetermined green sheets, thermocompression bonding, and firing. A forming surface 4 of a bonding pad (only part of which is shown) is formed in a frame shape and recessed in a plan view, and a through hole 5 is formed in the inside thereof so as to penetrate (open) vertically (upper surface to lower surface) in a substantially square shape. Have been. In the present example, a concave groove 7 is formed above the through-hole 5 in a semi-circular shape at the approximate center of each side forming the inner side surface (inner wall surface) 6 of the through-hole 5 of the main body 2 in plan view. Edge (opening)
It is formed along the up-down direction from 5a to lower edge 5b. Note that a W metallized layer having a predetermined width is formed on the peripheral surface of the opening of the through hole 5 on the lower surface 8 side of the main body 2 by simultaneous firing with the main body 2, and the surface thereof is plated with Ni.
【0015】一方、放熱部材21は、本例では銅タング
ステンからなり、本体2の貫通孔5の内側面6の平面形
状より大きい略正方形板状をなす下段部22と、この上
面中央に一体的に形成された上段部23とからなる断面
凸型をなし、全面にNi鍍金が施されている。なお、上
段部23は、貫通孔5の内側面6の平面形状よりやや小
さい略正方形板状をなしている。On the other hand, the heat dissipating member 21 is made of copper tungsten in this embodiment, and has a lower step portion 22 having a substantially square plate shape larger than the planar shape of the inner side surface 6 of the through hole 5 of the main body 2. The upper section 23 is formed in a convex shape in cross section, and is entirely plated with Ni. The upper portion 23 has a substantially square plate shape slightly smaller than the planar shape of the inner surface 6 of the through hole 5.
【0016】しかして、本例では、本体2の貫通孔5に
その下面8側から、放熱部材21がその上段部23を隙
間嵌め状態で挿入され、その中央に位置決めされ、下段
部22の上面(肩面)24を本体2の下面8側における
Ni鍍金付きWメタライズ層に、銀ロー25を介してロ
ー付けにより固着されている。そして、放熱部材21の
上段部23の上面がダイアタッチ面26をなし、このダ
イアタッチ面26と貫通孔5の内側面6の上寄り部位と
でダイアタッチキャビティが形成されている。In this embodiment, however, the heat radiating member 21 is inserted into the through hole 5 of the main body 2 from the lower surface 8 side thereof with the upper step 23 fitted in the gap, is positioned at the center thereof, and is positioned at the center thereof. The (shoulder surface) 24 is fixed to the Ni-plated W metallized layer on the lower surface 8 side of the main body 2 by soldering via a silver solder 25. The upper surface of the upper portion 23 of the heat dissipating member 21 forms a die attach surface 26, and a die attach cavity is formed by the die attach surface 26 and an upper portion of the inner surface 6 of the through hole 5.
【0017】このように形成された本例のパッケージ1
においては、放熱部材21の上段部23の外側面27と
パッケージ本体2の貫通孔5の内側面6との間に幅Wの
隙間Sが存在している。そして、この隙間Sにおける貫
通孔5の内側面6に形成された凹溝7の部位では、局所
的に隙間Sの幅が大きくなっている。なお、本例の隙間
Sは、その幅Wが従来における設計標準値(例えば0.
25mm)の半分以下(0.1mm)に設定されてお
り、また、凹溝7は、半円弧形状でその半径は0.3m
mに設定されており、したがって、隙間Sは凹溝7の部
位で最大0.4mmになるように設定されている。The package 1 of the present embodiment thus formed
, A gap S having a width W exists between the outer side surface 27 of the upper portion 23 of the heat radiation member 21 and the inner side surface 6 of the through hole 5 of the package body 2. The width of the gap S is locally increased at the concave groove 7 formed in the inner side surface 6 of the through hole 5 in the gap S. The width S of the gap S in the present example has a conventional design standard value (for example, 0.
25 mm) or less (0.1 mm), and the concave groove 7 has a semicircular arc shape with a radius of 0.3 m.
m, so that the gap S is set to be 0.4 mm at the maximum at the concave groove 7.
【0018】さて、本例のパッケージ1は、上記のよう
にして本体2と放熱部材21とを一体化した後、腐食防
止等のため、放熱部材21のダイアタッチ面26及び外
部の放熱面等にNi鍍金及びAu鍍金が施される。そし
て、鍍金液の洗浄処理のために洗浄液槽に浸漬される。
その際、洗浄液は、隙間Sに上部から出入りできるだけ
でなく、図4中矢印で示したように、凹溝7の開口7a
からその奥所(隙間Sの溝底側)に幅が広いため容易に
出入りでき、凹溝7の奥所にわたってその両側方(横)
からも隙間Sに出入りすることができる。すなわち、本
例においては凹溝7がある分、洗浄液が隙間Sを環流し
やすくなっており、したがって、隙間Sの幅Wが小さく
とも鍍金液を効率的に洗浄できる。しかも、本例では、
凹溝7が各辺の中央にあることから、洗浄液が左右の隅
角9まで環流する距離が同じとなり、したがって、洗浄
がその左右にわたって略平均に行われる。In the package 1 of the present embodiment, after the main body 2 and the heat radiating member 21 are integrated as described above, the die attach surface 26 of the heat radiating member 21 and the external heat radiating surface etc. Is subjected to Ni plating and Au plating. Then, it is immersed in a cleaning liquid tank for cleaning the plating liquid.
At that time, the cleaning liquid can not only enter and exit the gap S from above, but also as shown by the arrow in FIG.
From the bottom (the groove bottom side of the gap S), so that it is easy to get in and out.
Can enter and leave the gap S. That is, in the present example, the cleaning liquid is easily circulated through the gap S by the presence of the concave groove 7, and therefore, even if the width W of the gap S is small, the plating liquid can be efficiently cleaned. Moreover, in this example,
Since the concave groove 7 is located at the center of each side, the distance at which the cleaning liquid circulates to the left and right corners 9 is the same, and therefore, the cleaning is performed substantially equally on the left and right sides.
【0019】このように、本例においては隙間Sの幅W
が小さくとも、貫通孔5の各辺の中央に凹溝7が形成さ
れていることから、洗浄液等は凹溝7の両側方から隙間
Sに、或いは隙間Sから凹溝7に流れることができる。
すなわち、凹溝7を設けたことにより、洗浄液が隙間S
を環流しやすくなったことから隙間Sの幅Wを小さくす
ることができる。この結果、その分、パッケージ1の小
形化を図ることができる。また、図示はしないが集積回
路チップがダイアタッチ面にロー材(Au−Sn等)で
ロー付けされて固着された後においてワイヤボンディン
グする際には、隙間Sの幅Wが小さい分、パッケージ本
体2のボンディングパッド3と集積回路チップの入出力
端子との距離が短くなり、したがってボンディングワイ
ヤの短小化を図ることができる。As described above, in this embodiment, the width W of the gap S is
Even if is small, the concave groove 7 is formed at the center of each side of the through hole 5, so that the cleaning liquid or the like can flow into the gap S from both sides of the concave groove 7 or into the concave groove 7 from the gap S. .
That is, the provision of the concave groove 7 allows the cleaning liquid to pass through the gap S.
Is easily circulated, the width W of the gap S can be reduced. As a result, the size of the package 1 can be reduced accordingly. Further, although not shown, when the integrated circuit chip is wire-bonded after being fixed to the die-attached surface by brazing (Au-Sn or the like), the width W of the gap S is smaller than that of the package body. The distance between the second bonding pad 3 and the input / output terminal of the integrated circuit chip is shortened, so that the bonding wire can be shortened.
【0020】図5は、本発明の実施形態の別例を示すも
のである。ただし、前例がダイアタッチキャビティーが
平面から見て略正方形の場合で、凹溝を貫通孔の内側面
の各辺の略中央に1か所(合計4か所)設けたものであ
るのに対して、本例では凹溝37を貫通孔5の隅角4か
所に各1か所(合計4か所)平面視、略3/4円弧でも
って切り込ませた形で設けた点のみが前例と相違するだ
けであり、その作用、効果ともに前例と基本的に共通す
ることから、同一の部位には同一の符号を付し、その説
明を省略する。なお、本例では、凹溝37が全隅角(四
隅)にあることから、図示したように放熱部材21の角
の面取が小さい場合でも、その上段部23をパッケージ
本体2の貫通孔5に挿入し易いといった効果がある。FIG. 5 shows another example of the embodiment of the present invention. However, in the previous example, the die attach cavity was substantially square when viewed from above, and the concave groove was provided at one location (a total of four locations) substantially at the center of each side of the inner surface of the through hole. On the other hand, in this example, only the point where the concave groove 37 is provided at the four corners of the through hole 5 at one corner (a total of four places) in a plan view, substantially 3/4 arc is provided. Is different from the previous example only, and since its operation and effect are basically common to the previous example, the same portions are denoted by the same reference numerals and description thereof will be omitted. In this example, since the concave groove 37 is located at all corners (four corners), even if the corner of the heat radiating member 21 is small as shown in the figure, the upper step 23 is connected to the through hole 5 of the package body 2. This has the effect of being easy to insert into
【0021】なお、本発明における凹溝の平面視形状若
しくはその横断面形状については、円弧状若しくはU字
形状に限定されるものではなく、洗浄液の環流のしやす
さを考慮して適宜の形状とすればよい。また凹溝の大き
さ(横断面積)、形成位置、或いは数は、搭載される集
積回路チップの入出力端子の設計に応じかつ隙間の幅等
を考慮して適切に設計すればよい。また、本発明に係る
電子部品用パッケージは、PGA(ピングリッドアレ
イ)、LGA(ランドグリッドアレイ)やチップキャリ
アなどの各種のセラミック製等の電子部品用パッケージ
に広く適用できる。The shape of the concave groove in plan view or its cross-sectional shape in the present invention is not limited to an arc shape or a U-shape, but may be an appropriate shape in consideration of the ease of circulation of the cleaning liquid. And it is sufficient. The size (cross-sectional area), formation position, or number of the concave grooves may be appropriately designed according to the design of the input / output terminals of the integrated circuit chip to be mounted and in consideration of the width of the gap. Further, the electronic component package according to the present invention can be widely applied to various ceramic electronic component packages such as PGA (pin grid array), LGA (land grid array), and chip carriers.
【0022】[0022]
【発明の効果】以上の説明から明らかなように、本発明
に係るパッケージによれば、パッケージ本体の貫通孔の
内側面に、貫通孔の上縁から下縁側に延びる凹溝を設け
たことにより、鍍金後における鍍金液の洗浄をする際に
おいて、その内側面と放熱部材の上段部の外側面とがな
す隙間が小さくとも、その隙間における洗浄液の環流が
容易となる。すなわち、本発明においては、凹溝がある
分、洗浄液が隙間を環流しやすいので、鍍金液を残留さ
せることなく隙間を小さくすることができる。したがっ
て、隙間を小さくできる分、パッケージの小形化やボン
ディングワイヤの短小化に有効である。As is apparent from the above description, according to the package of the present invention, a concave groove extending from the upper edge to the lower edge of the through hole is provided on the inner surface of the through hole of the package body. When the plating solution is cleaned after plating, even if the gap between the inner surface and the outer surface of the upper portion of the heat radiating member is small, the circulation of the cleaning solution in the gap becomes easy. That is, in the present invention, since the cleaning liquid easily flows around the gap due to the presence of the concave groove, the gap can be reduced without leaving the plating solution. Therefore, since the gap can be reduced, it is effective in reducing the size of the package and the bonding wire.
【図1】本発明に係るパッケージを具体化した実施形態
例をダイアタッチ面側(上側)から見た説明用平面図。FIG. 1 is an explanatory plan view of an embodiment embodying a package according to the present invention as viewed from a die attach surface side (upper side).
【図2】図1のA−A線断面図。FIG. 2 is a sectional view taken along line AA of FIG.
【図3】図2の部分拡大図。FIG. 3 is a partially enlarged view of FIG. 2;
【図4】鍍金液の洗浄時において洗浄液が隙間を環流す
る状態の説明用部分斜視図。FIG. 4 is a partial perspective view for explaining a state in which the cleaning liquid flows around the gap when the plating liquid is cleaned.
【図5】本発明に係るパッケージを具体化した別の実施
形態例をダイアタッチ面側(上側)から見た説明用平面
図。FIG. 5 is an explanatory plan view of another embodiment embodying the package according to the present invention as viewed from the die attach surface side (upper side).
【図6】従来のヒートスラグ型のパッケージの一例を示
す断面図。FIG. 6 is a sectional view showing an example of a conventional heat slug type package.
【図7】図6のパッケージをダイアタッチ面側(上側)
から見た説明用平面図。FIG. 7 shows the package of FIG.
FIG.
【図8】図6の部分拡大図。FIG. 8 is a partially enlarged view of FIG. 6;
1 パッケージ 2 本体 5 貫通孔 5a 貫通孔の上縁 5b 貫通孔の下縁 6 貫通孔の内側面 7,37 凹溝 21 放熱部材 23 放熱部材の上段部 27 上段部の外側面 S 隙間 DESCRIPTION OF SYMBOLS 1 Package 2 Main body 5 Through-hole 5a Upper edge of through-hole 5b Lower edge of through-hole 6 Inner surface of through-hole 7, 37 Groove 21 Heat-dissipating member 23 Upper portion of heat-dissipating member 27 Outer surface of upper portion S Gap
Claims (5)
に、段付き状に形成された放熱部材がその上段部を該パ
ッケージ本体の下方から隙間嵌め状態で挿入されてなる
電子部品用パッケージであって、該放熱部材が前記パッ
ケージ本体に一体化された後でNi鍍金及びAu鍍金が
施されるものにおいて、 前記貫通孔の内側面に、該貫通孔の上縁から下縁側に延
びる凹溝を形成して前記隙間の幅を局所的に広げたこと
を特徴とする電子部品用パッケージ。An electronic component package in which a stepped heat radiating member is inserted into a through hole vertically penetrating a package body from above the package body with a gap fitted from below the package body. The heat dissipating member is
After being integrated with the cage body, Ni plating and Au plating
In those applied to the inside surface of the through hole, and wherein the <br/> locally unfolded to the width of the gap to form a groove extending lower edge side from the upper edge of the through hole Package for electronic components.
に、段付き状に形成された放熱部材がその上段部を該パ
ッケージ本体の下方から隙間嵌め状態で挿入されてなる
電子部品用パッケージであって、該放熱部材が前記パッ
ケージ本体に一体化された後でNi鍍金及びAu鍍金が
施されるものにおいて、 前記貫通孔の内側面と前記上段部の外側面とのなす隙間
に、前記鍍金後の鍍金液の洗浄における洗浄液の環流を
容易にするため、前記貫通孔の内側面に、該貫通孔の上
縁から下縁側に延びる凹溝を形成して前記隙間の幅を局
所的に広げたことを特徴とする電子部品用パッケージ。 2. A through hole penetrating up and down of a package body.
In addition, a radiating member formed in a stepped shape has
Inserted from below the package body with a clearance fit
An electronic component package, wherein the heat radiating member is the package.
After being integrated with the cage body, Ni plating and Au plating
A gap formed between an inner surface of the through hole and an outer surface of the upper portion.
The reflux of the cleaning solution in the cleaning of the plating solution after the plating is
For ease, the inner surface of the through hole is
A concave groove extending from the edge to the lower edge side is formed to locally control the width of the gap.
A package for electronic components characterized by a localized expansion.
に、段付き状に形成された放熱部材がその上段部を該パ
ッケージ本体の下方から隙間嵌め状態で挿入され、前記
パッケージ本体の下面側におけるメタライズ層に前記放
熱部材の下段部の上面がロー付けされてなる電子部品用
パッケージであって、該放熱部材が前記パッケージ本体
に一体化された後でNi鍍金及びAu鍍金が施されるも
のにおいて、 前記貫通孔の内側面と前記上段部の外側面とのなす隙間
に、前記鍍金後の鍍金液の洗浄における洗浄液の環流を
容易にするため、前記貫通孔の内側面に、該貫通孔の上
縁から下縁側に延びる凹溝を形成して前記隙間の幅を局
所的に広げたことを特徴とする電子部品用パッケージ。 3. A through hole penetrating up and down of a package body.
In addition, a radiating member formed in a stepped shape has
Inserted from below the package body in a clearance fit state,
Release the metallized layer on the underside of the package body.
For electronic components with the upper surface of the lower part of the heat member brazed
A package, wherein the heat radiating member is the package body.
After being integrated with Ni, Ni plating and Au plating are applied.
A gap formed between an inner surface of the through hole and an outer surface of the upper portion.
The reflux of the cleaning solution in the cleaning of the plating solution after the plating is
For ease, the inner surface of the through hole is
A concave groove extending from the edge to the lower edge side is formed to locally control the width of the gap.
A package for electronic components characterized by a localized expansion.
側面が平面視、それぞれ略四角形とされ、前記凹溝が少
なくとも該貫通孔の内側面の四角形の各辺の略中央に形
成されていることを特徴とする請求項1、2又は3のい
ずれかに記載の電子部品用パッケージ。4. An inner surface of the through-hole and an outer surface of the upper step are each substantially rectangular in plan view, and the concave groove is formed at least substantially at a center of each side of the square on the inner surface of the through-hole. The electronic component package according to any one of claims 1, 2 and 3, wherein:
側面が平面視、それぞれ略四角形とされ、前記凹溝が少
なくとも該貫通孔の内側面の四角形の各隅角に形成され
ていることを特徴とする請求項1、2又は3のいずれか
に記載の電子部品用パッケージ。5. An inner surface of the through hole and an outer surface of the upper portion are each substantially rectangular in plan view, and the concave groove is formed at least at each corner of the square of the inner surface of the through hole. The electronic component package according to claim 1, wherein:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04793596A JP3327450B2 (en) | 1996-02-09 | 1996-02-09 | Package for electronic components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04793596A JP3327450B2 (en) | 1996-02-09 | 1996-02-09 | Package for electronic components |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09219464A JPH09219464A (en) | 1997-08-19 |
JP3327450B2 true JP3327450B2 (en) | 2002-09-24 |
Family
ID=12789242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04793596A Expired - Fee Related JP3327450B2 (en) | 1996-02-09 | 1996-02-09 | Package for electronic components |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3327450B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6258768B2 (en) * | 2013-05-30 | 2018-01-10 | 京セラ株式会社 | Wiring board and electronic device |
-
1996
- 1996-02-09 JP JP04793596A patent/JP3327450B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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JPH09219464A (en) | 1997-08-19 |
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