JP3173231B2 - Method for manufacturing electron gun cathode structure - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron gun cathode structure in which a spacer for defining a distance between a first grid and a second grid and an electron gun cathode structure in which the first grid is fixed to the same plane of a support made of an insulator. And a method for producing the same. Such an electron gun cathode structure is mounted on a cathode ray tube such as a television receiver or a terminal display device.

[0002]

2. Description of the Related Art In an electron gun cathode structure, the first
The distance d ₁₂ between the grid and the second grid is one of the important parameters that determine the cathode cutoff voltage (E _KCO). That is, there is a relationship between E _KCO and d ₁₂ that E _KCO = k / d ₁₂ ^m . Note that k and m are constants. Therefore,
When the distance d ₁₂ varies, the cathode cutoff voltage E _KCO
It will scatter.

For this reason, in order to keep the distance d ₁₂ constant,
In the prior art, as shown in FIG. 3A, a structure in which a spacer 11 made of an insulator is interposed between a first grid 12 and a second grid 13 is employed. In order to obtain the electron gun cathode structure shown in FIG. 3A, metallization processing is performed on both surfaces of the spacer 11 in advance, and the first grid 12, the spacer 11, and the second grid 13 are brazed. 14, and the opposing surfaces of the first grid 12 and the spacer 11 and the opposing surfaces of the spacer 11 and the second grid 13 are brazed.

However, in the electron gun cathode structure shown in FIG. 3A, variations in the thickness of the spacer 11, the thickness of the brazing material or the thickness of the metallization process, and the flatness of the first grid 12 or the second grid 13 are considered. Depending on the degree
Variations in the distance d ₁₂ between the first grid and the second grid.

Therefore, as shown in FIG. 3B, a metal spacer 15 and a first grid 16 are fixed to the same plane 17a of a support 17 made of an insulating material.
An electron gun cathode structure was considered in which a second grid (not shown) was fixed to the surface 15a of the spacer 15 opposite to the surface fixed to 7. In such an electron gun cathode structure, the step between the surface 15a of the spacer 15 and the surface 16a of the first grid 16 opposite to the surface fixed to the support 17 is caused by the first grid and the second grid. corresponds to the distance d ₁₂ between grid.

In order to manufacture the electron gun cathode structure shown in FIG. 3B, a flat surface 17a of the support 17 is subjected to metallization in advance, and the support 17 is attached to the shaft 18a of the brazing jig 18. Then, the first grid 16 and the spacer 15 are placed on the plane 17a. Then, while pressing the first grid 16 and the spacer 15 with the pressing portion 18b,
The opposing surface of the first grid 16 and the support 17 and the opposing surface of the spacer 15 and the support 17 are brazed.

[0007]

In the electron gun cathode structure shown in FIG. 3 THE INVENTION Problems to Solved] (B), the distance d ₁₂ is tentatively than the electron gun cathode structure shown in exactly (A) in FIG. 3 Can be specified. However, in the method of manufacturing the electron gun cathode structure shown in FIG.
7. No measures are taken against variations in the flatness of the first grid 16 or the spacer 15, the thickness of the brazing material, the thickness of the metallization process, the thickness of the spacer 15, the plate thickness of the first grid 16, and the like. Therefore, the distance d ₁₂
Is not always accurately defined, and the variation in the cathode cutoff voltage E _KCO cannot always be reduced.

[0008] For this reason, the present applicant has filed Japanese Patent Application No. 3-351.
No. 977 proposed a novel method for manufacturing an electron gun cathode structure. This manufacturing method will be described in detail later, but this production method, was the distance d ₁₂ to be able to define accurately.

However, in order to improve the characteristics of the electron gun cathode structure, the distance d ₁₂ defines more accurately and variations without has been desired.

[0010] Accordingly, an object of the present invention is to provide a Japanese Patent Application No. Hei.
1977, the manufacturing method of the electron gun cathode structure was improved, and the distance d ₁₂ between the first grid and the second grid was improved.
Is to provide a method for manufacturing an electron gun cathode structure, which can more accurately and accurately define the electron gun cathode structure.

[0011]

[Means for Solving the Problems] The above object, affixed to the same flat surface of a support space Sa及 beauty first grid which defines the distance between the first grid and the second grid made of an insulating material a manufacturing method of an electron gun cathode structure is, (a) has first and second surfaces, the first surface and the second
A step of the step between the surface to prepare equal parts material to said distance, (b) mounting the steps of placing the first grid on the first surface, the space Sa to the (c) a second surface a step of location, (d) the flat surface Sessu <br/> so that the support to the first grid及 beauty space Sa, step of placing the support in a first grid及 beauty space on Sa If, (e) while the support is pressed against the member, the first grid
A step of fixing the 及 beauty space flattened surface of the support, (f) as distance between the first grid and the second grid becomes a desired value, on the opposite side to the fixed surface was support Polishing the surface of the spacer, which can be achieved by the method for manufacturing an electron gun cathode structure according to the present invention.

[0012]

The above-mentioned steps (a) to (e) are described in Japanese Patent Application No.
This is the same as the method for manufacturing an electron gun cathode structure proposed in JP-A-351977. By adopting such a manufacturing method, anchoring portion of the support and the first grid, or any of the anchoring portion of the support and the space Sa since role of the buffer, support, first grid door Rui and <br/> flatness of space Sa, the thickness of the adhesive member, the thickness and the thickness or space Sa metallization process, even if there are variations in the thickness or the like of the first grid, the step parts material the first grid and the distance between the second grayed <br/> liter de can be defined accurately by. Furthermore,
Since the fixed to the support surface for polishing a surface of the space Sa opposite, it is possible to define more accurately yet variation without the distance.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the manufacturing method of the present invention applied to the manufacture of an electron gun cathode structure having the same structure as that shown in FIG. 3B will be described below with reference to FIGS. . Electron gun cathode structure, the spacer 15 and the first grid 16 to define the distance d ₁₂ between the first grid and the second grid
Are fixed to the same plane 17a of the support 17 made of an insulating material. Note that the same components as those in FIG.
The same reference numerals are given.

In this embodiment, as shown in FIG. 1A, a member 2 having a first surface 21b and a second surface 21c is provided.
Prepare 1 This member 21 is specifically a brazing jig, and has a shape different from that of the brazing jig 18 shown in FIG. A shaft 21a is provided on the first surface 21b of the member 21. The second surface 21c is provided outside the first surface 21b, and has a lower height than the first surface 21b. This first
The surface 21b of the step between the second surface 21c, equal to the distance d ₁₂ between the first grid 16 and the second grid 24 (see FIG. 2). However, here, the first surface 21b and the second surface 21c
Is equal to the distance d ₁₂ , this step corresponds to the distance d ₁₂
And slightly different from the above.

With the first grid 16 inserted through the shaft 21a provided on the member 21, the first surface 21b of the member 21
The first grid 16 is placed thereon. Further, a metal spacer 15 made of, for example, an iron-nickel alloy or an iron-cobalt-nickel alloy is placed on the second surface 21 c of the member 21.

Next, the first grid 16 and the spacer 1
The support 17 is placed on the first grid 16 and the spacer 15 such that the plane 17 a of the support 17 is in contact with 5.
The plane 17a is previously subjected to a metallizing process.
The support 17 can be made of, for example, alumina. An emission hole (not shown) is formed at the center of the first grid 16. In addition, a through hole (not shown) is provided in the support 17 corresponding to the emission hole.

Thereafter, the first grid 16 and the spacer 15 are fixed to the flat surface 17a of the support 17 by a brazing method while pressing the support 17 against the member 21 using the pressing member 21d. Thereby, the opposing surface of the first grid 16 and the support 17 and the opposing surface of the spacer 15 and the support 17 are brazed.

When fixing the first grid 16 and the spacer 15 to the flat surface 17a of the support 17, the support 17 and the first
The fixed portion of the grid 16 or the fixed portion of the support 17 and the spacer 15 serves as a buffer. For this reason, the flatness of the support 17, the first grid 16 or the spacer 15, the thickness of the fixing material (brazing material), the thickness of the metallization process or the thickness of the spacer 15, the thickness of the first grid 16, and the like are determined. Even if there is a variation, the distance d ₁₂ between the first grid 16 and the second grid 24 can be accurately defined by the step of the member 21. Therefore, as the support 17, a support that has been sintered but has not been polished on the flat surface 17a or the like can be used. In addition, the degree of control over the thickness of the brazing material, the thickness of the metallization process, and the like can be reduced.

Thereafter, the obtained electron gun cathode structure is removed from the member 21. Then, as shown in FIG. 1B, the distance d between the first grid 16 and the second grid 24 is determined.
The surface 15a of the spacer 15 opposite to the surface fixed to the support 17 is polished so that ₁₂ has a desired value. That is,
The spacer 15 is positioned on the basis of the surface 16 a of the first grid 16.
The surface 15a of the metal spacer 15 is polished using alumina or diamond powder in a usual manner so that the distance between the surface 15a of the first grid 16 and the surface 16a of the first grid 16 becomes a predetermined value.

The variation (σ) of the distance d ₁₂ before polishing is 3 to
It was 5 μm. On the other hand, the variation (σ) of the distance d ₁₂ after polishing was 1 μm or less, and the processing accuracy of the distance d ₁₂ was dramatically improved.

After the spacer 15 is polished, the sleeve holder 22 is brazed to the surface of the support 17 opposite to the surface to which the first grid 16 is fixed, as shown in FIG. After that, the inner sleeve 23 is inserted into the sleeve holder 22. A cathode is formed on the inner sleeve 23 by, for example, spraying an oxide. Then, an inner sleeve attaching step of fixing the inner sleeve 23 in the sleeve holder 22 by laser welding, resistance welding, or the like is performed while checking the distance d ₀₁ between the cathode and the first grid 16.

Thereafter, the spacer 15 and the like and the second grid 2
4 is fixed to each other by laser welding or resistance welding. Further, the structure obtained in this way and a third grid or the like (not shown) are beaded. Then, a heater (not shown) is attached by laser welding or resistance welding, and connection is performed to complete the electron gun.

[0023]

In the present invention, the fixed to the support surface so that polishing the surface of the opposite spacer defines more accurately yet variation without the distance d ₁₂ between the first grid and the second grid be able to. As a result, it is possible to easily manufacture an electron gun cathode structure having excellent characteristics with little variation in cathode cutoff voltage (E _KCO ).

[Brief description of the drawings]

FIG. 1 is a side view for explaining one embodiment of a manufacturing method of the present invention.

FIG. 2 is a process flow diagram showing an entire manufacturing process of an electron gun cathode structure including one embodiment of the present invention.

FIG. 3 is a side view for explaining a method for manufacturing a conventional electron gun cathode structure.

[Explanation of symbols]

 Reference Signs List 15 spacer 15a spacer surface 16 first grid 17 support 17a support plane 21 member 21b first surface 21c of member 21 second surface 22 of member 21 sleeve holder 23 inner sleeve 24 second grid

Continuation of the front page (56) References JP-A-2-230642 (JP, A) JP-A-5-166457 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01J 9 / 18

Claims (1)

(57) [Claims] 1. A method of manufacturing an electron gun cathode structure in which a spacer for defining a distance between a first grid and a second grid and the first grid are fixed to the same plane of a support made of an insulator. (A) a step of preparing a member having a first surface and a second surface, wherein a step between the first surface and the second surface is equal to the distance; and (b) providing a member on the first surface. (C) placing a spacer on the second surface; and (d) placing the first grid and the spacer such that the plane of the support comes into contact with the first grid and the spacer. (E) fixing the first grid and the spacer to the plane of the support while pressing the support against the member; and (f) first grid and the first grid. 2 Opposite to the surface fixed to the support so that the distance to the grid is the desired value Manufacturing method of the electron gun cathode structure characterized by comprising the surface of the spacer step of polishing from.