JP3163812U - Barrel polishing machine - Google Patents

Abstract

In a barrel polishing machine in which a rotating disk is provided at the bottom of a polishing tank and the mass is made to flow by rotating the rotating disk, a fine gap between the rotating disk and the polishing tank is generated between the rotating disk lining and the polishing tank lining. Welding may occur due to deformation caused by thermal expansion. Provided is a barrel polishing machine capable of ensuring a clearance in which a rotating disk lining and a polishing tank lining do not cause welding. When a rotating disk 9 rotates horizontally, a cutting tool is provided on the outer peripheral surface of the rotating disk 9 that forms a minute gap and the inner peripheral surface of a polishing tank 8 that faces the outer peripheral surface. The clearance S is automatically and self-created using the amount as the cutting amount of the cutting tool. [Selection] Figure 3

Description

  The present invention relates to a fluid barrel polishing machine that polishes a mass composed of a workpiece and media while centrifugally flowing in a polishing tank.

  In the fluid barrel polishing method, a mass composed of workpieces, media, water, polishing aids, etc., which are workpieces, is put into a polishing tank, and a rotating plate provided at the bottom of a fixed polishing tank is rotated. The mass is made to flow by the centrifugal force obtained in step 1 to polish the workpiece. One example is shown in Patent Document 1. Moreover, what does not use water for a mass is called dry-type barrel polishing, and an example thereof is shown in Patent Document 2. An example of a conventional fluid barrel polishing machine (for both wet and dry processes) is shown in FIG.

  In the structure of the fluid barrel polishing machine, it is essential to have a gap between the fixed polishing tank and the rotating disk, and it is desirable that the gap is as narrow as possible in order to cope with fine workpieces and media. In addition, it is known that fluid barrel polishing provides a strong polishing force, but it is known that the temperature rise during polishing is large, and even in wet barrel polishing using water as a mass, the water temperature rarely reaches 60 ° C to 70 ° C. is not. FIG. 2 is a schematic sectional view showing the gap between the polishing tank and the rotating disk of the fluid barrel polishing machine.

  The thermal expansion of the polishing tank and the rotating disk, or the related apparatus structural parts accompanying the temperature rise, changes the size and shape of the gap on the opposing surfaces of the polishing tank and the rotating disk when the rotating disk rotates. If the amount of change in the clearance is large, it will lead to direct contact between the polishing tank and the rotating disk during the polishing process, causing galling and lining applied to the polishing tank and the rotating disk to cause serious accidents such as equipment shutdown. Sometimes.

  As a countermeasure against troubles caused by the thermal expansion of the opposing surfaces of the polishing tank and the rotating disk so far, as a permitting means so that the lower lining layer inside the polishing tank can thermally expand to the polishing tank wall side, specifically, the metal of the polishing tank There is a method of providing an elastic layer or an air layer in which the lining layer can be easily deformed by thermal expansion between the wall and the lining layer (Patent Document 1). In dry barrel polishing machines, compressed gas is discharged from the gap between the opposing surfaces of the polishing tank and the rotating disk into the polishing tank, the gap is cooled, and dust and high-temperature gas in the polishing tank are discharged with a dust collector. Yes (Patent Document 2). Furthermore, a method in which a stopper for restricting thermal expansion deformation of the lining is provided inside the lining near the outer periphery of the rotating disk (Patent Document 3, Patent Document 4), or a method in which different materials are used for the facing surfaces of the polishing tank and the rotating disk (patent) Document 5) or a method (Patent Document 6, Patent Document 7) relating to clearance adjustment between a polishing tank and a rotating disk. There is also a method (Patent Document 8) in which polishing is performed by rotating a rotating disk while always sliding a resin lining of a polishing tank on a ceramic ring provided on the rotating disk.

  The conventional technology predicts the degree of change of the gap from past data and experience for each device, and determines the size and shape of the elastic layer and the air layer that are deformation permission means. The adjustment fee and adjustment method are determined from past data and experience. In any case, advanced dimensions and shape accuracy of related parts and assembly accuracy of the device are required. Further, the clearance adjustment type is not capable of following the clearance change during polishing, but is adjusted while the apparatus is stopped.

Patent No. 3062800 Japanese Patent No. 3343701 Japanese Patent Laid-Open No. 05-038670 Japanese Utility Model Publication No. 03-130358 Japanese Utility Model Publication No. 57-053858 Japanese Utility Model Publication No. 48-074392 Japanese Utility Model Publication No. 51-062191 Japanese Patent No. 4130922

  In general, the polishing tank is provided with a polishing tank lining on the polishing tank base, and the rotating disk is similarly provided with a rotating disk lining on the rotating disk base (see FIG. 2). The clearance formed between the polishing tank and the rotating disk when the rotating disk rotates is maintained by the opposing surfaces of the polishing tank lining and the rotating disk lining. One of the major factors that change the size and shape of the gap is the thermal expansion of the polishing tank lining and the rotating disk lining caused by the temperature rise during the polishing process. .

  In many cases, urethane is used for the lining material in consideration of wear resistance, but the amount of change due to thermal expansion is larger than that of a metal material generally used as a polishing tank substrate or a rotating disk substrate. Therefore, when the dimension of the gap changes due to thermal expansion, the polishing tank lining and the rotating disk lining forming the clearance change while being restricted by the size and shape of the polishing tank substrate and the rotating disk substrate. The temperature rise during polishing varies depending on the processing conditions such as the size, shape, weight, or total mass of the workpiece and media put into the polishing tank, the speed of the rotating disk, processing time, etc. Of course.

  Factors that change the gap are not only due to thermal expansion, but also swelling due to moisture, elastic deformation due to the weight of the mass put into the polishing tank, load during operation of the polishing apparatus, etc. The component machining accuracy and assembly accuracy can be a major factor. For example, the degree of cylindricity and roundness of the part forming the gap, the rotational flare of the rotating disk, the concentricity when the polishing tank and the rotating disk are assembled, and the like vary from apparatus to apparatus.

  According to the inventor's investigation and observation, in the apparatus using the urethane lining, the welding and galling phenomenon of the gap portion occurs when the turntable rotates while contacting even if the facing surface forming the gap is a part. There are many cases. Also, the welding phenomenon is a measure that contributes to cooling of the polishing tank and the rotating disk, such as discharge of the mass, by stopping the apparatus while the temperature of the mass in the polishing tank is 40 ° C. or higher after the polishing process is completed. It is likely to occur even when it is not performed. In both cases, it was confirmed that the urethane in the surface layer forming the gap between the polishing tank lining and the rotating disk lining softened and melted to become liquid or colloidal and adhered to a part or the entire circumference of the gap. . Normally, the temperature at which urethane is altered is said to be about 80 ° C., but the above phenomenon causes thermal expansion of the lining material even in frictional heat generated by sliding between the linings forming a gap or when the apparatus is stopped, This is considered to be because the surface temperature of the lining surface in contact with the deformation is further compressed to increase the surface temperature of the urethane and reach the temperature of alteration of urethane.

  In the prior art, the basic idea is that the dimension and shape of the gap are set so that they do not come into contact with each other even if there is thermal expansion, rotational flutter of the rotating disk, or mechanical deformation. However, as described above, there are a variety of factors that change the size and shape of the gap. All of these factors are covered to prevent problems before they occur, and the size of the gap is set to the minimum value that meets various polishing conditions, and a device is made. That required a lot of effort and man-hours. The size of the Ikioi clearance is large and the device tends to be made, and the size tends to be the greatest common divisor based on past experience, and it is easy to cause the biting of minute workpieces and minute media into the gap. Alternatively, it is possible to make a gap in one dish according to the polishing conditions, but it tends to be a trial-and-error approach, and it often leads to trouble in spite of the effort.

  In the present invention, there are a wide variety of variation factors in changing the gap, and many of these vary depending on the polishing conditions. However, it is intended to automatically and self-create the gap while following these variations. Therefore, it is intended to contribute to the reduction of man-hours for parts processing and assembly adjustment at the time of manufacturing the apparatus while avoiding the welding of the lining and the galling phenomenon of the gap portion due to thermal expansion.

  The barrel polishing machine according to the present invention based on the above knowledge includes a fixed polishing tank and a rotating disk disposed at the bottom of the polishing tank so as to be horizontally rotatable, and by rotating the rotating disk horizontally. A fluid barrel polishing machine for polishing while swirling a mass, wherein an inner surface of the polishing tank forms a minute gap between the outer peripheral surface of the rotating disk and the outer peripheral surface when the rotating disk rotates horizontally. It is characterized in that a cutting tool having a cutting or grinding function is disposed on both or one side of the peripheral surface.

  Furthermore, as a result of examining the materials, shapes, dimensions, cutting mechanisms, and the like of various blades, the inventors have confirmed that the following conditions must be satisfied. The conditions are that the generated chips are not squeezed into the gap, the urethane does not weld due to heat generated by the cutting resistance, and the cutting function is not lost even if the cutting tools collide with each other. It is desirable that both wet and dry methods can be used.

  Therefore, the barrel polishing machine of the present invention is a cutting tool disposed on both or one of the outer peripheral surface of the rotating disk and the inner peripheral surface of the polishing tank, and the outer peripheral surface of the rotating disk and the outer peripheral surface. Abrasive grains of hard and brittle material are held on the inner peripheral surfaces of the opposing polishing tanks, and the abrasive grains are # 8 to # 400 (JIS R 6001-1987).

  Furthermore, the barrel polishing machine of the present invention is characterized in that the polishing tank and the rotating disk are lined, and the abrasive grains are scattered in the lining.

  According to the barrel polishing machine of the present invention, the size and shape of the gap change due to thermal expansion and other factors during the polishing process, the gap becomes small even if it is partial, and finally a polishing tank lining that forms a gap. Part or all of the facing surface of the rotating disk lining comes into contact. And it will be pressed sequentially as change further advances. At this time, the abrasive grains held on both the polishing tank lining and the opposing surface of the rotating disk lining collide with each other by the rotational force of the rotating disk, and the action of scraping the mating surface occurs. The abrasive grains cause a brittle fracture by colliding, and act to widen the clearance by being lost or falling off the holding surface. In addition, the abrasive grains are chipped due to brittle fracture and are constantly renewed with a new cutting edge to cut the mating surface. After the opposing surfaces of the polishing tank lining and the rotating disk lining come into contact with each other in this way, if the change further proceeds due to thermal expansion etc., the amount of change becomes the cutting amount of the cutting blade, and the clearance is automatically and self-created. The Rukoto. This is because the speed of change due to thermal expansion is not abrupt, but a relatively slow speed enables fine cutting of the blade. This also reduces the burden on the processing of the polishing tank and the turntable and the assembly of the apparatus, which has conventionally been required for setting the clearance.

  The cutting tool is optimally used as both a polishing tank and a rotating disk, but can also be implemented in either the polishing tank or the rotating disk. If it is carried out only on one side, it is preferred to carry out it on a rotating disk. Further, it is more effective to carry out the entire circumference forming the gap between the polishing tank and the rotating disk, but the invention is not limited to this.

It is a schematic diagram which shows the flow of the mass in the polishing tank of the conventional fluid barrel polishing machine. It is a schematic sectional drawing which shows the clearance part of the grinding | polishing tank of a conventional fluid barrel grinder, and a rotary disk. It is a schematic sectional drawing of the clearance gap vicinity of the polishing tank and a turntable in Example 1 of this invention. It is a schematic sectional drawing of the clearance gap vicinity of the polishing tank and a turntable in Example 2 of this invention. It is a schematic diagram when the block-shaped cutting tool holding an abrasive grain is arrange | positioned to a rotary disk (a) and a polishing tank (b).

Hereinafter, the best mode for carrying out the present invention will be described.
As the abrasive grain 1 of the hard and brittle material in the present invention, an alumina abrasive, a silicon carbide abrasive, or a natural abrasive can be used.

FIG. 3 shows a schematic sectional view of the vicinity of the clearance S between the polishing tank 8 and the rotating disk 9 in the first embodiment. The fluid barrel polishing machine according to the first embodiment includes a fixed polishing tank 8, a rotating disk 9 provided at the bottom, and rotating means Mo for rotating the rotating disk 9. When the rotating disk 9 is rotated horizontally, a minute gap S is formed between the outer peripheral surface of the rotating disk 9 and the inner peripheral surface of the polishing layer 8 facing the outer peripheral surface of the rotating disk 9. In the polishing tank 8, the polishing tank base 6 is coated with the polishing tank lining 4. Similarly, the turntable 9 also has a turntable lining 5 coated on a turntable base 7. The polishing tank lining 4 and the turntable lining 5 are both formed of urethane. Therefore, the minute gap S is formed by the outer peripheral surface of the rotating disk lining 5 and the inner peripheral surface of the polishing tank lining 4 facing the outer peripheral surface. The polishing tank lining 4 and the rotating disk lining 5 are formed by dispersing the abrasive grains 1 in the vicinity of the surface from the surfaces of the polishing tank lining 4 and the rotating disk lining 5 that form the clearance S. A part of the abrasive grains 1 is exposed and held on the surfaces of the opposing surfaces of the polishing tank lining 4 and the rotating disk lining 5 that form the clearance S. At this time, urethane, which is a lining material, acts as a binder for bonding the abrasive grains 1.
In the first embodiment, the abrasive grains 1 are held over the entire opposing surface of the polishing tank lining 4 and the rotating disk lining 5 where the clearance S is formed, and in both the polishing tank lining 4 and the rotating disk lining 5.

  The mass M is put into the barrel polishing machine configured as in the first embodiment, the rotating disk 8 is rotated by the rotating means Mo, and the polishing process is started. Then, the dimension and shape of the gap S change due to thermal expansion and other factors during the polishing process, and the gap S becomes small even if it is partial. Finally, the polishing tank lining 4 of the polishing tank 6 that forms the gap S Part or all of the opposed surfaces of the rotating disk lining 5 of the rotating disk 7 come into contact. At this time, the abrasive grains held on both the facing surfaces of the polishing layer lining 4 and the rotating disk lining 5 collide with each other by the rotational force of the rotating disk 9, and the action of scraping the mating surface occurs. The abrasive grain 1 causes a brittle fracture by colliding, and acts to widen the clearance S by being lost or falling off the holding surface. Further, on the surfaces of the opposing surfaces of the polishing tank lining 4 and the rotating disk lining 5 that form the clearance S, the abrasive grains 1 are broken and dropped due to brittle fracture, so that new abrasive grains 1 are exposed and always become a new cutting edge. Updated. After the facing surfaces of the polishing tank lining 4 and the rotating disk lining 5 that form the clearance S contact with each other as described above, if the change further proceeds due to thermal expansion or the like, the amount of change becomes the cutting amount of the cutting edge, and automatically and self-created. Therefore, the gap shape will be cut out.

In addition, as for the abrasive grain 1 mixed with the polishing tank lining 4 and the turntable lining 5, it is suitable to use the particle size of # 8 to # 220 (JIS R 6001-1987). If it is coarser than # 8, the wear of the lining is large, and if finer than # 220, the grinding ability is too small.
In Example 1, urethane is used as the lining material of the polishing tank lining 4 and the rotating disk lining 5, but it may be a rubber lining.
When the abrasive grains 1 are held only on one side of the polishing tank 8 or the rotating disk 9, brittle fracture of the abrasive grains 1 cannot be expected, and only the cutting is performed.

  FIG. 4 is a schematic cross-sectional view of the vicinity of the gap between the polishing tank 8 and the rotating disk 9 in the second embodiment. In Example 2, a polishing blade lining 4a and a rotating disk lining 5a made of urethane are formed from a block-shaped cutting tool 10 in which a member formed by using a binder 3 different from a lining material is held on a base material 2. When this is done, the outer peripheral surface of the turntable lining 5a and the inner peripheral surface of the polishing bath lining 4a facing the outer peripheral surface are cast. For example, a grindstone can be used as a member obtained by molding the abrasive grains 1 using the binder 3. Further, as this grindstone, for example, a grindstone molded by a production method such as a vitrified method, a resinoid method, a rubber method, a magnesia method, a silicate method, or a shellac method can be used.

  FIG. 5 (a) schematically shows an example in which the block-shaped cutting tool 10 is arranged on the surface of the polishing tank 8 and the rotating plate 9 where the gap is formed. However, there are no particular restrictions on this arrangement, and there is no restriction on the number of arrangements. A range that does not cause inconvenience in the flow of the mass M at the time of polishing and the finishing of the work may be used. However, the block-shaped cutting tool 10 needs to be arranged so as to form the outer diameter of the rotating disk lining 5a in the rotating disk 9 and to form the inner diameter of the polishing tank lining 4a in the polishing tank 8. Also in the second embodiment, the block-shaped cutting tool 10 is disposed in both the polishing tank 8 and the rotating disk 9.

  In the second embodiment, the block-shaped blade 10 is cast when the polishing tank lining 4a and the rotating disk lining 5a are formed. Instead of the block-shaped blade 10, the abrasive grains 1 are formed on the surface of the flexible sheet-shaped member. It is good also as a blade tool holding. The sheet-like member having flexibility refers to a sheet-like member having flexibility such as paper, cloth, and film. As a cutting tool in which the abrasive grains 1 are held on the surface of a flexible sheet-like member, for example, a commercially available abrasive cloth, abrasive paper, or the like can be used.

DESCRIPTION OF SYMBOLS S Clearance 1 Abrasive grain 2 Base material 3 Binder 4, 4a Polishing tank lining 5, 5a Rotary disk lining 6 Polishing tank base 7 Rotary disk base 8 Polishing tank 9 Rotary disk 10 Block-shaped cutting tool

Claims (5)

A fixed polishing tank, and a turntable disposed horizontally at the bottom of the polishing tank,
A fluid barrel polishing machine that polishes the mass while swirling the mass by horizontally rotating the rotating disk,
When the rotating disk rotates horizontally, a cutting tool having a cutting or grinding function is arranged on both or one of the outer peripheral surface of the rotating disk and the inner peripheral surface of the polishing tank that forms a minute gap between the outer peripheral surface. A fluid barrel polishing machine characterized by being installed. A cutting tool disposed on one or both of the outer peripheral surface of the rotating disk and the inner peripheral surface of the polishing tank,
Abrasive grains of hard and brittle material are held on the outer peripheral surface of the rotating disk and the inner peripheral surface of the polishing tank facing the outer peripheral surface, and the abrasive grains are # 8 to # 220 (JIS R 6001-1987). The fluid barrel polishing machine according to claim 1.   3. The fluid barrel polishing machine according to claim 2, wherein the polishing tank and the turntable are lined, and the abrasive grains are scattered in the lining.   The fluid barrel polishing machine according to claim 2, wherein the blade is a member formed by molding the abrasive grains.   The fluid barrel polishing machine according to claim 2, wherein the abrasive grains are held on a surface of a sheet-like member in which the blade has flexibility.