JP3138298B2 - Abstract pattern plate making system and printed matter making method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plate making system for printing a building material having an abstract pattern and a method for producing a printed matter.

[0002]

2. Description of the Related Art In recent years, the shortage of natural materials such as wood has been called out, and various building materials such as plywood and gypsum board have been developed as substitutes for such materials. As a result, the role played by building material printing has become important. There are two types of printing patterns for building materials: wood grain patterns that imitate natural wood patterns such as wood grain or stone grain, and abstract patterns related to human creation, such as geometric patterns, sand grain patterns, ground patterns, and floral patterns. However, since the present invention relates to the latter abstract pattern, plate making of the abstract pattern will be described below.

FIG. 17 schematically shows a conventional plate making process for an abstract pattern. As shown in FIG. 17A, first, when a material sample of an abstract pattern including a design image, a photograph, and the like is submitted, the material sample is photographed with a plate-making camera to create a separation film, and this is separated from an adjacent material. In order to eliminate the steps of the sample, the plates are successively printed and repeated by film synthesis while applying an appropriate mask to create a plate for proof printing (hereinafter, this plate is referred to as a baby plate). The film from which the material sample was photographed is usually about 3 to 5 cm square, but as shown in FIG. 17B, the film 101 is repeated nine times each in the vertical and horizontal directions to create a plate 102 about 1 m square. can do. This is the version usually called the baby version. Next, gravure engraving is performed based on the baby plate, a printing plate for gravure printing is created and proof printing is performed, and when a desired abstract pattern is obtained, the baby plate is repeated and used for the main plate. A plate is created, a printing plate is created based on the plate, and proof printing is performed again. When a desired abstract pattern is obtained, printing is performed by this machine.

[0004] The above is a process for producing a baby plate by film synthesis, and all of the processes are manually performed by an operator. In recent years, a film scanner is used, for example, by photographing a material sample by using a layout scanner. Attempts have been made to digitize a part of the above process by performing the steps of reading the image data, repeating the image data, outputting the film as a film, and creating a baby plate with a layout scanner. However, also in this case, the step of repeating the baby version to create the main version is performed by manually combining the baby version photographically.

[0005]

However, as described above, in the past, the plate making process of printing a building material with an abstract pattern is usually performed manually, which is not only problematic in that it is extremely expensive. There were also the following problems.
In other words, the material sample may have uneven density or an uneven pattern. The unevenness of density and the unevenness of the pattern do not cause any problems in the material sample itself, but when a baby plate is created by repeating, the unevenness of the density or the unevenness of the pattern is emphasized and the creation is performed. It appears as a repetition pattern that is not intended by the creator or designer, and the repetition pattern is more prominent than the original abstract pattern, which is a major problem. Name). For example, as shown in FIG. 18A, it is assumed that density unevenness as shown by 104 has occurred in a material sample 103 having a fine pattern (not shown), and as shown in FIG. If the baby plate 105 is created four times in the vertical direction and a baby plate 105 is created, a printing plate is created based on the baby plate 105, and when gravure printing is performed, the density unevenness is reduced as shown in FIG. The repetitive pattern is emphasized, resulting in a pattern. On the other hand, when joints are added as shown in FIG. D, the pattern is relatively inconspicuous because the lattice pattern of the joints is conspicuous. There is no problem.

As described above, since the occurrence of pattern distortion is a fatal defect for an abstract pattern building material, an operation for confirming the presence or absence of pattern distortion is performed in the middle of the process of printing this plate. Conventionally, means for confirming by proof printing has been adopted. Of course, it is conceivable to check the pattern on the plate making film, but since the pattern changes depending on the color, it is not possible to reliably grasp whether the pattern is black and white on the plate making film which is a black and white film. Very difficult,
In the end, although the cost was high, it had to be confirmed by proof printing using a baby version.

[0007] The work of removing the pattern is called a retouching operation. The mask is re-created, the pattern is rearranged, or the pattern is rotated to synthesize a film, and the baby is printed. The retouching work is performed, but the retouching work requires not only a great skill but also a large work load, and it takes a long time since all the work is performed manually, and as a result, it takes a long time until the delivery date Plate making cost was high. Moreover,
There are not many patterns that cannot be removed by manual retouching, and in such cases, the planning itself is canceled,
In some cases, plate making ends in vain.

[0008] Such a situation is the same when a layout scanner is used. Although the creation of a baby plate pattern is automated, the retouching operation still relies on manual work. Is something that has not been resolved. Of course, the pattern of the material sample read by the input scanner can be displayed on the monitor screen and rotated, or repeated using an appropriate mask pattern. The operation was the same as the operation, and instead of using an optical operation using a film, the operation was merely performed on a monitor using a pointing device such as a mouse or a stylus pen, and the time and effort were exactly the same. In addition, since the entire pattern of the baby plate having a size of about 1 m square cannot be displayed on the screen as described above, whether the pattern has been removed even if the retouching work is performed on the display screen. Could not be confirmed. In other words, it is not possible to know whether pattern habits will occur from the pattern of the material sample alone, but it is possible to confirm the occurrence of pattern habits only after repeating the material sample and creating a baby version, Therefore, in order to be able to confirm the presence or absence of the pattern, it is necessary to be able to display the entire baby plate pattern on the monitor screen, but the monitor of the conventional layout scanner cannot display it.

[0009] Furthermore, even if the entire pattern of the baby version can be displayed, even though the pattern cannot be confirmed with the baby version, the pattern will be lost when the baby version is repeated and the main version is created. In some cases, such a situation cannot be handled by a conventional abstract pattern plate making system using a layout scanner.

SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems, and provides an abstract pattern plate making system capable of removing a pattern pattern in an abstract pattern, and a method of producing a printed material in which the pattern pattern in the abstract pattern is removed. The purpose is to do so.

[0011]

In order to achieve the above-mentioned object, an abstract pattern making system according to the present invention comprises a pattern data at two positions randomly selected from the created pattern data. The pattern data of the first location and the pattern data of the second location are combined using a mask pattern having a predetermined pattern, the result is replaced with the pattern data of the second location, and the second pattern before the combination is replaced. The pattern data of the first place before being combined with the pattern data of the place are combined using a mask pattern having a predetermined pattern, and the result is replaced with the pattern data of the first place, thereby removing the pattern. It is characterized by having habit removing means. Further, the printed matter creating method according to the present invention is characterized in that, of the pattern data at two locations randomly selected from the created first design data, the design data of the first location and the design data of the second location are selected. Are synthesized using a mask pattern having a predetermined pattern, and the result is replaced with the pattern data at the second location. The pattern data at the second location before the synthesis and the pattern data at the first location before the synthesis are combined. Are synthesized using a mask pattern having a predetermined pattern, and the pattern of the second pattern data obtained by replacing the result with the pattern data of the first location is trimmed as it is or after being trimmed to a predetermined size. And printing using a printing plate created based on a pattern obtained by repeating a predetermined number of times in the horizontal direction.

[0012]

The created pattern data is divided into blocks of a predetermined size. Then, two blocks are randomly selected from the divided blocks, and the images of these two blocks are synthesized with reference to the designated mask pattern.

[0013]

Embodiments will be described below with reference to the drawings.
FIG. 1 is a diagram showing the configuration of an embodiment of an abstract pattern making system according to the present invention, wherein 1 is an input scanner, 2 is an output scanner, 3 is control means, 4 is input means, and 5 is storage means. , 6 is a gravure engraving machine, 7 is a color printer, 8 is an abstract pattern plate making means, 9 is an endless processing section, 11 is a pattern removal processing section, 12 is a repeat processing section, 13 is a display processing section, and 14 is a color processing section. Indicates a monitor.

First, the configuration of each section shown in FIG. 1 will be briefly described as follows. The input scanner 1 scans a color film obtained by photographing a material sample, decomposes each pixel into four colors of cyan (C), magenta (M), yellow (Y), and black (K). It is output as digital image data of a number, for example, 8 bits, and has the same configuration as the input scanner used in the conventional layout scanner. Output scanner 2
Is for outputting a plurality of color separation plates on a film, and has a configuration similar to that of an output scanner used in a conventional layout scanner. The control means 3 manages the operation of the abstract pattern making system in an integrated manner, and is composed of a microcomputer and its peripheral devices. The input means 4 is constituted by an input device such as a keyboard and a pointing device.

The storage means 5 comprises a storage device such as a RAM and / or a hard disk. The gravure engraving machine 6 performs engraving of a baby version and engraving of a main version. The color printer 7 is composed of a sublimation transfer printer, an ink jet printer, or the like, and is capable of outputting a color hard copy of at least the size of a baby plate, and more preferably a device capable of outputting a color hard copy of the size of the main plate. Good.

The abstract pattern plate making means 8 comprises an endless processing section 9, a pattern removal processing section 11, and a repeat processing section 12.
including. The operation of each of these units will be described later. The display processing means 12 controls the display of the color monitor 14 and includes a video RAM having a predetermined capacity corresponding to the number of pixels of the color monitor 14. The color monitor 14 is constituted by a display device such as a color CRT, but is desirably one capable of displaying with high definition.

Next, the operation of the configuration shown in FIG. 1 will be described with reference to FIG. FIG. 2 is a flowchart showing an example of steps of a plate making and printed matter creating method when the abstract pattern making system having the configuration shown in FIG. 1 is used. First, when a unit material, which is the minimum unit for repeating the abstract pattern, is input, the unit material is set in the input scanner 1 and read (step S1). If the unit material is a film, it can be set in the input scanner 1 as it is. However, in the case of a design image other than a film, it is once photographed and read using a color film, or a plate Create a separation film by shooting with a camera and read it. The image data of the unit material thus read is stored in the storage unit 5.

Next, when the endless processing is instructed from the input means 4, the control means 3 activates the endless processing section 9 of the abstract pattern plate making processing means 8 to execute the endless processing (step S2). . Here, the endless process is a process in which masking processing is performed on a unit material, and the upper and lower adjacent unit materials are watermark-synthesized and quadrupled or 9 times in area.
This is the process of creating pattern data about twice the size (hereinafter, the pattern obtained by the endless processing is called the endless pattern). The image data for the baby version simply repeats the endless pattern data a predetermined number of times. Is created. That is, the endless pattern is located at an intermediate stage between the unit material and the baby version, and thus the workload of the operator can be significantly reduced. In other words, conventionally, a baby version was directly created by repeating the unit material while performing a masking process, but as described above, the unit material is about 3 to 5 cm square, and the baby version is about 1 m square. Because of the size, it takes a great deal of time to create a baby version. On the other hand, for an endless pattern, mask processing is performed, but the unit material only needs to be synthesized at most nine times, and synthesis is performed automatically. It will be
Since the baby version simply repeats the endless pattern created in this way without performing mask processing, the work load is greatly reduced as compared with the related art.

Hereinafter, the details of the endless processing will be described with reference to FIG. Now, assuming that an instruction to create an endless pattern by combining the unit materials three times in the horizontal and vertical directions is given, the endless processing unit 9 combines the unit materials three times in the horizontal direction and three times in the vertical direction. At this time, FIG.
As shown in A, when performing the lateral synthesis performs superposition by the width of W _Y, when performing vertical synthesis W _T
, And the second row is horizontal W
Shift by _O. Then, the watermark synthesis in the proportions indicated by a region R ₂ in FIG. 3B is a transverse overlapping area and vertical overlap region. For example, taking the synthesis of a unit material 15 ₁ and the unit elements 15 ₂ as an example, although the handle region R ₁ in the unit material 15 ₁ in FIG. 3B is 100%, the region R ₂ in the unit material 15 ₁ of the handle is while linearly decreasing to 0%, the unit material 15 ₂ of the handle increases from 0% linearly to 100%, the handle region R ₃ in the unit material 15 ₂ is 100%. The same applies to the vertical composition.

The unit materials can be automatically synthesized as described above. However, when it is expected that a step will occur in the overlapping portion of the unit materials, or when a pattern having a relatively large area exists in the overlapping portion. When it is predicted that the pattern is destroyed by the composition, the above-described automatic composition is not appropriate. Therefore, in addition to the above-described mode of performing the automatic synthesis, the endless processing unit 9 also includes a mode in which a mask for synthesis can be arbitrarily set. In this mode, for example, as shown in FIG. , Two masks M ₁ and M ₂ are set in the overlapped area, and watermark synthesis can be performed in a region sandwiched between these two masks at a rate indicated by a region R ₂ in FIG. 3B. The same applies to the vertical direction. However, it is natural that a mask is separately set at the time of vertical composition.

The overlap width W _{Y in} the horizontal direction, the overlap width W _{T in} the vertical direction, and the shift amount W _O of the second stage may be determined in advance in the endless processing unit 9 as fixed values.
The setting may be made by the operator through the input means 4 each time. Also, the setting of the two mask patterns
For example, the pattern of the horizontal overlapping portion and the pattern of the vertical overlapping portion are displayed on the color monitor 14, and the mask line is traced with a mouse or a stylus pen on the screen, and the traced pattern data is masked. What is necessary is just to take in as pattern data. The mask set for the horizontal synthesis is used in common in the horizontal synthesis, and the mask set for the vertical synthesis is common in the vertical synthesis. Used.

When the synthesis of the unit materials is completed as described above, the endless processing section 9 displays the synthesis result on the screen of the color monitor 14. Therefore, for example, a unit material 15 arbitrary point P ₁ on ₁ located in the upper left corner (FIG. 3A) is assumed to be indicated, the endless processing unit 9, the unit material 15 ₃ located in the upper right corner of the synthetic pattern, unit material 15 ₇ located in the lower left corner, the unit material 15 ₉ located in the lower right corner, at each indicated point in the unit on the material P ₁ and P ₂ that have the same address, P _3, the synthesis pattern P ₄ A coordinate value is obtained, a rectangle defined by these four points P ₁ , P ₂ , P ₃ , and P ₄ is cut out, registered as an endless pattern, and stored in a predetermined area of the storage means 5.

The reason for performing such cutting is to prevent a step from occurring when a baby version is prepared. That is, the baby plate, as will be described later is created by simply repeating the endless pattern, by performing a cut as described above, both sides of the handle of a straight line connecting two points P ₁ and P ₂ in Figure 3A , because it is exactly the same as a straight line on both sides of the handle connecting two points P ₃ and P _4, is not able step is generated even repeat the endless pattern vertically. The same applies to the horizontal direction. This is why it is called an endless pattern. The processing in step S2 in FIG. 2 has been described above. By creating a pattern located at an intermediate stage between the unit material called the endless pattern and the baby plate, it is possible to significantly reduce the workload as compared with the related art. it can.

After the endless processing is completed, it is next determined whether or not the endless pattern has a habit (step S3). This determination is made, for example, by repeating the endless pattern data created as described above a predetermined number of times in the vertical and horizontal directions, and transferring the pattern data to the color printer 7.
And observing the color hard copy. If the occurrence of pattern distortion is not confirmed, the data of the baby version is created (step S5). If the occurrence of pattern distortion is confirmed, the pattern distortion is removed. For this purpose, the printing abstract pattern plate making system shown in FIG. 1 replaces a pattern located at a predetermined address of an endless pattern with a pattern located at another address based on a predetermined mask pattern (hereinafter referred to as scrambling). The system is provided with a pattern removal processing unit 11 that removes the pattern removal by using a method.

Hereinafter, the pattern removal processing by the scramble method will be described. The scramble method is a method suitable for removing a pattern of an abstract pattern having fine patterns such as a grain pattern and a tint block, and has a configuration shown in FIG. 4 and a display mode for simulating the pattern removal and a display mode for actually removing the pattern. And a batch mode for removal.

The pattern removal processing section 11 is started by the control means 3 when the processing for removing the pattern removal is instructed by the input means 4, but first, the display mode is started. The display mode is a mode for confirming by simulation whether or not the pattern removal can be satisfactorily removed by the pattern removal processing. First, the display mode is stored in the storage means 5 in order to end the simulation in a short time. The image data of the endless pattern is thinned out so that the number of pixels becomes 2 k pixels × 2 k pixels or less, developed in the frame memory 22, and sent to the display processing means 13.
The image is displayed on the color monitor 14. Then, the pixels of the endless pattern from which the image data has been thinned out have a predetermined size, for example, 2 pixels.
It is divided into blocks of size about 00 pixels x 200 pixels. This block size may be fixed or may be arbitrarily set by the operator.

The random address generator 24 is instructed by the input means 4 to execute the pixel block replacement specified by the operator. By generating random numbers, an address pair indicating two different pixel blocks is executed. It is generated by the number of times and sent to the pixel block transfer unit 23. In the mask data section 25, various binary mask patterns used in the display mode as shown in FIGS. 5A to 5E, and multi-value mask patterns used in the batch mode corresponding to the respective binary mask patterns are registered. ing. FIG. 6 shows an example of a multi-level mask pattern corresponding to the binary mask pattern shown in FIG. 5E. In the pattern shown in FIG. 6, the coefficient α at the time of watermark synthesis indicated by the outermost white is used.
A predetermined gradation is set from the portion where = 0 to the portion where the coefficient α = 1 indicated by solid black. The same applies to other multi-value masks. Here, it is assumed that the mask data unit 25 has two pattern data of a binary mask and a multi-value mask for one mask pattern, but has only the pattern data of the binary mask,
The pattern data of the multi-valued mask may have a function of being created by shifting the binary mask by a predetermined width and / or a predetermined number of times in the vertical and / or horizontal directions each time.

When the mask shape is designated, the mask data unit 25 calls a binary mask pattern having the designated shape from the registered mask patterns and sends it to the pixel block transfer unit 23. Pixel block transfer unit 2
3 fetches the pixel data of the block located at the address pair AD ₁ , AD ₂ of the pixel block generated by the random address generation unit 24, and converts the pixels in these blocks according to the mask pattern sent from the mask data unit 25. Replace and write to original address location. Thus, the inside of the block of the mask pattern of the address AD ₁ pixels within the mask pattern of the block address AD ₂ is written inside the mask of the block address AD ₁ of the mask pattern of the address AD ₂ blocks Pixels inside the pattern are written. At this time, the pixel block transfer unit 23 writes in the scramble table 26 which block and which block have been replaced. For example, as shown in FIG. 7A, if the endless pattern is divided into 16 blocks, and the sixth block and the fifteenth block are replaced by the first block replacement, the pixel block transfer unit 23 is configured as shown in FIG. The scramble table 26 in the state shown in FIG. 7A is rewritten as shown in FIG.

The pixel block transfer unit 23 repeats the above operation for the number of times specified. Now, for example, the thinned endless pattern 30 is 9 (horizontal) × as shown in FIG.
It is assumed that the mask pattern is divided into 8 (vertical) 72 blocks and a mask pattern having the shape shown in FIG. 5A is selected. Then, the random address generation unit 24 performs BL ₁ , B
When generated the address pair L _2, the pixel block transfer unit 23 addresses captures pixel of a block of the BL ₂ blocks BL _1, replacing the pixels included in the circular mask. Next, as a second replacement, the address pair BL
₃ and BL ₄ are generated, the pixel block transfer unit 2
3 addresses captures pixel blocks of the block and BL ₄ of BL _3, replacing the pixels included in the circular mask. Hereinafter, this operation is performed by the number of times of execution.

When the pixels in the block are replaced by the specified number of executions, the image data in the frame memory 22 is sent to the display processing means 13 and displayed on the color monitor 14. This allows the operator to confirm whether or not the pattern has been removed on the color monitor 14. If the pattern has been removed, the display mode ends and the batch mode is executed. If not, the number of executions is subsequently input and the above operation is repeated.

The operation in the display mode has been described above. The mask shape data at the end of the display mode is stored in a predetermined file, and the scramble table 26 indicates which block is finally replaced with which block position. The indicated data is written. An example is shown in FIG. According to FIG. 9, the eighth block is finally replaced by the first block, and the fourth block is finally replaced by the second block. The same applies to other blocks.

Next, the operation in the batch mode will be described. If the removal of the pattern is confirmed by the display mode, the batch mode is instructed. In the batch mode, the image data of the original endless pattern is directly transferred to the image memory 20, the scramble table from the scramble table 26 is sent to the pixel block synthesizing unit 21, and the mask pattern used in the display mode is sent from the mask data unit 25. Is transferred. Then, the pixel block combining unit 21 watermark-combines the images of the two blocks based on the scramble table. For example, assuming that the scramble table is as shown in FIG. 9, the pixel block combining unit 21 watermark-combines the image of the eighth block into the first block and combines the image into the second block according to the coefficient α of the multi-value mask pattern. Performs watermark synthesis on the image of the fourth block. That is, when the image of the first block and the image of the eighth block are watermark-synthesized using a predetermined multi-valued mask, the pixel block synthesizing unit 21 outputs the C, M, Y, and K images corresponding to the respective pixels. Then, the following calculation is performed. C = α × C ₈ + (1-α) × C ₁ M = α × M ₈ + (1-α) × M ₁ Y = α × Y ₈ + (1-α) × Y ₁ K = α × K _{8 + (1-α) ×} K 1 where a 0 ≦ alpha ≦ 1, shows a C _8, C ₁ pixel value of the eighth block and the first block in each initial state.

The image data of the endless pattern synthesized in this manner is written into the storage means 5. In the display mode, the image size is reduced, whereas the image to be processed in the batch mode is an original image. Naturally, the size of the binary mask pattern used is enlarged by the reduction ratio.

In the display mode, the simple pixel replacement is performed by using the binary mask. In the batch mode, the watermark synthesis of the image of the two blocks is performed by using the multi-value mask for the following reason. by. That is, in the display mode, it is only necessary to check whether or not the pattern can be removed. Therefore, it is desired that the processing speed is high. Therefore, a binary mask which can be easily processed is used. In this mode, it is preferable to use a binary mask to perform the replacement, since it is inevitable that the gradation of the image at the boundary of the mask pattern will have a step, and the continuity of the pattern may be lost. is not. So, in batch mode,
By performing watermark synthesis using a multi-valued mask, the step in the gradation of the image is eliminated and the continuity of the pattern is maintained.

By the way, various means for watermark-synthesizing the image of the two blocks can be considered. For example, a method is conceivable in which two image memories are provided, and an image of a predetermined block of one image memory and an image of a predetermined block of the other image memory are combined according to the coefficient α of the multi-valued mask. That is, provided with two image memory 20 _1, 20 ₂ as shown in FIG. 10, both of advance transfers image data endless pattern, when the scramble table 26 now has to be as shown in FIG. 9 , one image memory, for example, from the image memory 20 ₁ captures image data of the first block and captures the image data of the eighth block from the other image memory 20 _2, above calculations in accordance with the coefficient of the multi-level mask α Subject to
The image data obtained as a result is written into one of the image memories.

However, according to this method, the memory capacity required for the image memory becomes enormous, and the cost of the system becomes high. Therefore, here, the pixel block combining unit 21 includes two image buffer memories IB ₁ and IB ₂ and an address buffer memory AB as shown in FIG.
The following processing is performed. Each of the image buffer memories IB ₁ and IB ₂ has a capacity capable of storing one block of image data.

First, the pixel block synthesizing unit 21 searches for a number other than 0 from the upper left of the scramble table, and writes an address where a number other than 0 is written in the address buffer memory AB. Assuming that the scramble table is as shown in FIG.
First writes "1" into the address buffer memory AB. Then, the image data of the block having the number written in the address, in this case, the image data of the eighth block in the initial state is stored in the image memory 2.
0, and is copied to _one image buffer memory, for example, the image buffer memory IB1, and further written to the address buffer memory AB. The image data of the number block, in this case, the image data of the first block, for example while copying the image buffer memory IB _2, data of the address 1 of the scramble table clears the 0 written in since already loaded.
This is shown in FIG. In FIG. 12, ST indicates a scramble table, and B1 and B8 indicate image data of the first block and the eighth block, respectively, in the initial state. The same applies hereinafter.

[0038] Then the pixel block combining unit 21, the image data written in the image buffer memory IB _1, the image data in this case the eighth block, the image data written in the image buffer memory IB _2, in this case Watermark synthesis is performed on the image data of the first block with reference to the coefficient α of the multi-valued mask pattern sent from the mask data unit 25, and the result is written in a block of values written in the address buffer memory AB; in this case the write to the first block, to clear the image buffer memory IB _1.
As a result, image data obtained by watermark-synthesizing the images of the first block and the eighth block is written in the first block of the image memory 20.

Next, the pixel block synthesizing section 21 outputs the address
The number written in the buffer memory AB is
Search for the address in the bull table,
Write the address value to the address buffer memory AB
At the same time, the address in the scramble table is
Cleared by writing 0, and has the value of the relevant address
The image data of the block
Copy to the cleared image buffer memory. in this case
"1" is written at address 7 of the scramble table.
13A, the pixel block combining unit 21
"7" is stored in the address buffer memory AB as shown in FIG.
Write and image buffer memory IB ₁ The image
Copy the image data of the seventh block from the memory 20,
Further, as shown in FIG.
Clear address 7.

Next, the pixel block combining unit 21, the image data written in the image buffer memory IB _2, the image data in this case the first block, the image data written in the image buffer memory IB _1, the Case 7
The block image data and the coefficient α of the multi-valued mask pattern
, And the result is written in the block of the value written in the address buffer memory AB, in this case, the seventh block, and the image buffer memory IB
Clear ₂ Thereby, the seventh memory of the image memory 20 is
In the block, image data obtained by watermark-synthesizing the images of the seventh block and the first block is written.

Next, the pixel block synthesizing section 21 searches the scramble table for the number written in the address buffer memory AB, in this case "7", and finds the address value, in this case " 1
1 "into the address buffer memory AB,
The address 11 in the scramble table is cleared by writing 0, and the image data of the block having the value of the address is cleared from the image memory 20 in the image buffer memory previously cleared, in this case, the image buffer memory IB ₂
Copy to Therefore, in this case, the image buffer memories IB ₁ , IB ₂ and AB are as shown in FIG. 14A, and the scramble table ST is as shown in FIG.

Hereinafter, the pixel block synthesizing section 21 repeatedly executes the above-described processing until all the addresses of the scramble table ST are cleared. However, if the scramble table is as shown in FIG. 9, 7 → 11 →
When processing is performed in the order of 12 → 3 → 15 → 10 → 6 → 8, the scramble table ST becomes as shown in FIG. 15, so that “8” cannot be searched. In such a case, the pixel block synthesizing unit 21 temporarily suspends the processing, searches again for a number other than 0 from the upper left of the scramble table, and stores the address where the number other than 0 is written in the address buffer memory AB. Write and perform the above processing. The endless pattern image data from which the pattern has been removed in this way is registered in a predetermined file in the storage means 5.

In the above description, the case where only one mask pattern is used has been described. However, the mask pattern to be used may be changed for each synthesis by generating a random number or the like. Furthermore, in the above-described embodiment, in the display mode, the pixel replacement is displayed on the color monitor 14 after the number of executions instructed is performed. An image may be displayed each time the operation is performed, and the replacement operation may be forcibly stopped when the operator determines that the pattern has been removed. As described above,
It is possible to automatically and quickly perform the pattern removal work that has been conventionally performed manually.

The above is the step S4 in FIG.
When the pattern is removed at the stage of the endless pattern, baby version data is created (step S5). Figure 16 for the baby version
As shown in (1), the endless pattern is created by simply repeating it vertically and horizontally. For this purpose, a repeat processing unit 12 is provided. That is, when the creation of the baby version is instructed by the input means 4, the repeat processing unit 12 is activated, and the endless pattern image data is repeated a predetermined number of times in the vertical and horizontal directions to create the baby version. The baby version data created in this way is registered in the storage means 5.

When the creation of the baby version is completed, it is confirmed again whether or not the pattern has occurred at the stage of the baby version (step S6). In this case, the presence / absence of the pattern may be confirmed by thinning out the baby version data and displaying it on the color monitor 14, but the baby version is large and presented to the ordering party. Therefore, the baby version data is supplied from the storage means 5 to the color printer 7 and hard-copyed.

If the occurrence of pattern distortion is confirmed in step S6, the flow returns to step S4 to perform the pattern distortion removal described above. If the occurrence of pattern distortion is not recognized, baby version data is output. (Step S7). There are two ways to output this baby version. One method is to directly supply the baby plate data to the gravure engraving machine 6 to directly produce a printing plate, and the other is to output the baby plate data to the output scanner 2 as a film and print the plate data via the film. How to create Which method is adopted is arbitrary.

After the baby printing plate has been prepared as described above, proof printing is performed using the printing plate, and it is confirmed whether or not the pattern has been regenerated (step S).
8). If the pattern has occurred, the process returns to step S1 to start over from reading a new unit material, or returns to step S4 to remove the pattern at the endless pattern stage. When returning to step S1, the steps up to that point are completely wasted, but the cost is reduced and the work load is reduced because the steps are automated as compared with the related art, so that the waste is minimized. be able to.

If there is no occurrence of pattern distortion in the proof printing using the baby plate, this plate data is output (step S).
9). This is performed by repeating the baby version data a predetermined number of times vertically and horizontally by the repeat processing unit 12,
The created version data is registered in the storage means 5 and output. The output of this plate data may be directly supplied to the gravure engraving machine 6 to create the plate directly, as in the case of the output of the baby plate data, or may be output to a film by the output scanner 2 to form a plate from the film. May be.

After outputting the plate data as described above, proof printing is again performed (step S10), and a final check is performed. If it is acceptable, the main printing is performed using the plate (step S11). , The process ends. If it is confirmed that the pattern is proofed as a result of the proof printing, the process returns to step S1 or step S4 to start over.

Although one embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiment, and various modifications are possible. For example, in the above embodiment, the size of the divided block and the size of the mask pattern are fixed, but these may be set to a desired size. It is also possible for an operator to create a desired pattern and register the mask pattern. Further, in the above-described embodiment, the endless pattern has a multi-gradation, but it is a matter of course that a binary image may be used. In that case, a binary mask may be used even in the batch mode.

[0051]

As is apparent from the above description, according to the present invention, it is possible to automate a retouching operation which was extremely troublesome and took a long time in the past. Not only can costs be reduced, but also delivery times can be shortened. Further, it is possible to easily cope with a pattern that could not be removed by a manual retouching operation, so that the number of items can be greatly increased. Further, in the printed matter creating method according to the present invention, it is possible to create a printed matter having no abstract pattern.

[Brief description of the drawings]

FIG. 1 is a diagram showing the configuration of an embodiment of an abstract pattern making system according to the present invention.

FIG. 2 is a flowchart showing an example of a plate making process when using the abstract pattern plate making system according to the present invention.

FIG. 3 is a diagram for explaining watermark synthesis when creating an endless pattern.

FIG. 4 is a diagram illustrating a configuration example of a pattern checking processing unit;

FIG. 5 is a diagram showing an example of the shape of a binary mask used in a display mode.

FIG. 6 is a diagram illustrating an example of a multi-value mask used in a batch mode.

FIG. 7 is a diagram illustrating a scramble table.

FIG. 8 is a diagram illustrating replacement of blocks in a display mode.

FIG. 9 is a diagram showing an example of the contents of a scramble table at the end of the display mode.

FIG. 10 is a diagram showing an example of means for watermark-synthesizing two blocks of images.

FIG. 11 is a diagram illustrating a configuration example of a pixel block synthesis unit.

FIG. 12 is a diagram for explaining the operation of the pixel block synthesizing unit.

FIG. 13 is a diagram for explaining the operation of the pixel block synthesizing unit.

FIG. 14 is a diagram for explaining the operation of the pixel block synthesizing unit.

FIG. 15 is a diagram for explaining the operation of the pixel block synthesizing unit.

FIG. 16 is a diagram for explaining creation of a baby version.

FIG. 17 is a view showing an example of a conventional plate making process of an abstract pattern for printing on building materials.

FIG. 18 is a diagram for explaining a pattern habit.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Input scanner, 2 ... Output scanner, 3 ... Control means,
4 input means, 5 storage means, 6 gravure engraving machine, 7
... color printer, 8 ... abstract pattern plate making processing means, 9 ... endless processing section, 11 ... pattern removal processing section, 12 ... repeat processing section, 13 ... display processing means, 14 ... color monitor.

────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Eisuke Arai 311 Takemazawa, Miyoshi-cho, Iruma-gun, Saitama Prefecture Japan Total Process Building Materials (56) References JP-A-54-161401 (JP, A) (58) ) Surveyed field (Int.Cl. ⁷ , DB name) G03F 1/00 B41C 1/00 B41M 3/00

Claims (6)

(57) [Claims] 1. A mask having a predetermined pattern, wherein a pattern data at a first position and a pattern data at a second position are selected from pattern data at two positions randomly selected from generated pattern data. A pattern is synthesized using a pattern, and the result is replaced with the pattern data of the second location. The pattern data of the second location before the synthesis and the pattern data of the first location before the synthesis are mask patterns having a predetermined pattern. , And by replacing the result with the pattern data of the first location,
An abstract printing plate system comprising a pattern removal device for removing pattern removal. 2. The system according to claim 1, wherein said mask data is multi-valued data having gradation. 3. The abstract pattern plate making system according to claim 2, wherein said combining is watermark combining. 4. Pattern data of a first location and pattern data of a second location are selected from pattern data at two locations randomly selected from the created first pattern data. Are synthesized using a mask pattern having the following pattern, and the result is replaced with the pattern data of the second location. The pattern data of the second location before the synthesis and the pattern data of the first location before the synthesis are converted into a predetermined pattern. The pattern of the second pattern data obtained by synthesizing using the mask pattern having the pattern and replacing the result with the pattern data of the first portion is trimmed to a predetermined size as it is or after being trimmed to a predetermined size in the vertical and horizontal directions. printed materials work, characterized in that the printing using a printing plate created based on the pattern obtained by the number of repeat
Method . 5. The method according to claim 4, wherein multi-value data having gradation is used as the mask data. 6. The method according to claim 5, wherein the combining is performed by watermark combining.